WO2019015308A1 - 阵列基板和显示装置 - Google Patents

阵列基板和显示装置 Download PDF

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Publication number
WO2019015308A1
WO2019015308A1 PCT/CN2018/075737 CN2018075737W WO2019015308A1 WO 2019015308 A1 WO2019015308 A1 WO 2019015308A1 CN 2018075737 W CN2018075737 W CN 2018075737W WO 2019015308 A1 WO2019015308 A1 WO 2019015308A1
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WIPO (PCT)
Prior art keywords
conductive portion
substrate
orthographic projection
comb
signal line
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Application number
PCT/CN2018/075737
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English (en)
French (fr)
Inventor
李琳
徐彦彬
Original Assignee
京东方科技集团股份有限公司
北京京东方显示技术有限公司
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Application filed by 京东方科技集团股份有限公司, 北京京东方显示技术有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US16/077,527 priority Critical patent/US11282868B2/en
Priority to EP18749279.8A priority patent/EP3657240B1/en
Publication of WO2019015308A1 publication Critical patent/WO2019015308A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1345—Conductors connecting electrodes to cell terminals
    • G02F1/13458—Terminal pads
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
    • H01L27/1244—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits for preventing breakage, peeling or short circuiting
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136204—Arrangements to prevent high voltage or static electricity failures
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136286—Wiring, e.g. gate line, drain line
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136286—Wiring, e.g. gate line, drain line
    • G02F1/13629—Multilayer wirings
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
    • G09G3/20—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/50—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor for integrated circuit devices, e.g. power bus, number of leads
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/50—Protective arrangements
    • G02F2201/506—Repairing, e.g. with redundant arrangement against defective part
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G2300/00—Aspects of the constitution of display devices
    • G09G2300/04—Structural and physical details of display devices
    • G09G2300/0421—Structural details of the set of electrodes
    • G09G2300/0426—Layout of electrodes and connections

Definitions

  • the present disclosure relates to the field of display technology, and in particular to an array substrate and a display device.
  • the switching structure In the manufacturing process of the display device, in order to meet the electrical connection between the signal lines of different layers, it is often necessary to arrange the switching structure at the peripheral position of the display panel, that is, to form a via hole on the insulating layer between the two signal lines, and then The two layers of signal lines are connected by a connection structure such as indium tin oxide (ITO).
  • ITO indium tin oxide
  • the present disclosure proposes an array substrate and display device to address one or more of the problems in the prior art.
  • an array substrate including first and second signal lines arranged on different layers of an insulating and spaced apart substrate, wherein one end of the first signal line includes a first a conductive portion, one end of the second signal line includes a second conductive portion, the first conductive portion and the second conductive portion are electrically connected by a connection structure, and wherein a region where the first conductive portion is located and the second conductive portion
  • the orthographic projections of the regions in which the portions are located on the substrate at least partially overlap.
  • the second conductive portion is located on a side of the first conductive portion away from the substrate, and an insulating layer is disposed between the layer where the first conductive portion is located and the layer where the second conductive portion is located. And a passivation layer is disposed on a side of the second conductive portion away from the substrate;
  • connection structure is connected to the first conductive portion through at least one first via hole penetrating through the passivation layer and the insulating layer, and through at least one second via hole penetrating the passivation layer
  • the second conductive portions are connected.
  • the number of the first via holes and the second via holes are multiple, and the plurality of first via holes are in one-to-one correspondence with the plurality of second via holes.
  • an orthographic projection of the first conductive portion on the substrate and an orthographic projection of the second conductive portion on the substrate at least partially overlap.
  • an orthographic projection of each of the plurality of second vias on the substrate is located within an orthographic projection range of the second conductive portion on the substrate, the plurality of first passes An orthographic projection of each of the holes on the substrate is outside an orthographic projection of the second conductive portion on the substrate, and an orthographic projection of each first via and a corresponding second via The orthographic projections do not overlap and are adjacent to each other.
  • the second conductive portion includes at least one slit penetrating the second conductive portion, and an orthographic projection of at least one of the first via holes on the substrate is located in the at least one slit Within the orthographic projection range on the substrate, a projection of a second via corresponding to at least one of the first vias on the substrate is located on the at least one slit on the substrate Outside the orthographic projection range, the orthographic projection of each first via does not overlap with the orthographic projection of the corresponding second via and is adjacent to each other.
  • the orthographic projection of each of the at least one slit on the substrate is rectangular.
  • the second conductive portion includes a plurality of slits penetrating the second conductive portion, and an orthographic projection of the plurality of slits on the substrate covers a plurality of first vias in the lining Orthographic projection on the bottom.
  • the first conductive portion includes a first comb portion and a plurality of spaced apart first comb portions connected to the first comb portion, wherein the first conductive portion is in the first region a sum of the area of the gap between the comb shank portion, the plurality of first comb tooth portions, and the plurality of first comb tooth portions;
  • the second conductive portion includes a second comb portion and a plurality of spaced apart second comb portions connected to the second comb portion, wherein the second conductive portion is located in the second comb portion, a sum of a plurality of second comb portions and an area between the plurality of second comb portions;
  • the orthographic projection of the plurality of first comb teeth on the substrate and the orthographic projection of the plurality of second comb portions on the substrate are alternately distributed, the at least one first via
  • An orthographic projection on the substrate is located within an orthographic projection of the plurality of first comb teeth on the substrate, and an orthographic projection of the at least one second via on the substrate is located
  • the plurality of second comb portions are within an orthographic projection on the substrate.
  • the substrate includes a display area and a non-display area surrounding the display area, and the first signal line, the first conductive portion, the second signal line, and the second conductive portion Both are arranged in the non-display area.
  • the display area is further arranged with a gate line and a data line arranged in different layers, and wherein the first signal line, the first conductive part and the gate line are arranged in the same layer and adopt the same material And the second signal line, the second conductive portion and the data line are arranged in the same layer and using the same material.
  • the display area of the substrate is further disposed with an electrode layer disposed on a side of the data line away from the substrate, and the connection structure and the electrode layer are disposed in the same layer and Use the same materials.
  • the material of the connection structure is a transparent conductive material.
  • a display device comprising any of the array substrates described above.
  • 1 is a schematic diagram showing the connection of two layers of signal line transitions in the technique known to the inventors;
  • Figure 2 is a cross-sectional view taken along line A-A of Figure 1;
  • FIG. 3 is a plan view showing a first connection manner of a first conductive portion and a second conductive portion provided in an embodiment of the present disclosure
  • Figure 4 is a cross-sectional view taken along line B-B of Figure 3;
  • FIG. 5 is a top plan view of a second connection manner of a first conductive portion and a second conductive portion provided in some embodiments of the present disclosure
  • Figure 6 is a cross-sectional view taken along line C-C of Figure 5;
  • FIG. 7 is a top plan view of a second connection manner of a first conductive portion and a second conductive portion provided in some embodiments of the present disclosure
  • FIG. 8 is a plan view showing a third connection manner of the first conductive portion and the second conductive portion provided in the embodiment of the present disclosure
  • Figure 9 is a cross-sectional view taken along line D-D of Figure 8.
  • connection structures in the art known to the inventors 20: substrates; 21: first signal lines; 22: second Signal line; 23: first conductive portion; 23a: first comb portion; 23b, first comb portion; 24: second conductive portion; 24a, second comb portion; 24b, second comb portion; : slit; 25: connection structure in the present disclosure; 26: first via; 27: second via; 28: insulating layer; 29: passivation layer.
  • FIG. 1 is a schematic view showing the connection of two layers of signal line transitions in the technique known to the inventors
  • FIG. 2 is a cross-sectional view of FIG. 1 taken along line AA. Since the projections of the two layers of signal lines 11 and 12 on the substrate are relatively arranged but do not overlap each other, in the case where an electric signal is applied to the signal line 11 or 12, the ends of the two signal lines 11 and 12 which are close to each other are accumulated. A large amount of static charge. In this case, the tip discharge is liable to occur, causing electrostatic breakdown at the gap between the two signal lines 11 and 12, causing the portion of the connection structure 13 located at the gap to be broken. Once a break occurs, it is easy to cause an open circuit between the two signal lines 11 and 12, thereby affecting signal transmission.
  • the present disclosure provides an array substrate as shown in FIGS. 3 to 9.
  • the array substrate includes a first signal line 21 and a second signal line 22 disposed on the substrate 20 in different layers insulated and spaced apart.
  • One end of the first signal line 21 includes a first conductive portion 23, and one end of the second signal line 22 includes a second conductive portion 24.
  • the first conductive portion 23 and the second conductive portion 24 are electrically connected by the connection structure 25, and the area where the first conductive portion 23 is located and the orthographic projection of the region where the second conductive portion 24 is located on the substrate 20 at least partially overlap.
  • the first conductive portion 23 and the first signal line 21 may be an integral structure, and the second conductive portion 24 and the second signal line 22 may be of a unitary structure.
  • the region where the first conductive portion 23 is located may be determined to be formed such that the largest dimension of the first conductive portion 23 along the length direction of the substrate 20 is long and the maximum dimension of the first conductive portion 23 along the width direction of the substrate 20 is wide.
  • the rectangular region; the region where the second conductive portion 24 is located can be regarded as having a maximum dimension of the second conductive portion 24 along the length direction of the substrate 20 and a width of the second conductive portion 24 along the width direction of the substrate 20 being wide.
  • the overlap between the region where the first conductive portion 23 is located and the region where the second conductive portion 24 is located includes two cases: (1) the orthographic projection of the first conductive portion 23 and the second conductive portion 24 on the substrate 20. There is overlap between them, so that the phenomenon that the tips are opposed to each other can be avoided, thereby preventing electrostatic breakdown due to the tip discharge, thereby reducing the occurrence of the fracture phenomenon of the connection structure 25; (2) the first conductive portion 23 and the second conductive portion 24 Each includes a plurality of conductive portions, wherein in the case where the conductive portions of the first conductive portion 23 overlap with the orthographic projections of the conductive portions of the second conductive portion 24 on the substrate 20, the phenomenon of tip relative can be avoided.
  • the conductive portion of the first conductive portion 23 and the conductive portion of the second conductive portion 24 are not overlapped, even if one conductive portion of the first conductive portion 23 is disconnected from a conductive portion of the second conductive portion 24, The other conductive portions of one of the conductive portions 23 are also connected to the other conductive portions of the second conductive portion 24, thereby reducing the probability that the first conductive portion 23 and the second conductive portion 24 are completely disconnected. Therefore, in either case, the phenomenon that the first conductive portion 23 and the second conductive portion 24 are disconnected due to the tip discharge can be reduced, thereby ensuring electrical connection between the first signal line 21 and the second signal line 22.
  • the second conductive portion 24 is located on a side of the first conductive portion 23 away from the substrate, and is disposed between the layer where the first conductive portion 23 is located and the layer where the second conductive portion 24 is located.
  • the connection structure 25 is connected to the first conductive portion 23 through at least one first via 26 penetrating through the passivation layer 29 and the insulating layer 28, and passes through at least one second via 27 and the second conductive portion penetrating the passivation layer 29. 24 connected.
  • the depth of the first via in a direction perpendicular to the substrate is greater than the depth of the second via in a direction perpendicular to the substrate.
  • the material of the connection structure 25 may be a transparent conductive material such as indium tin oxide (ITO) or the like.
  • ITO indium tin oxide
  • the layer in which the second conductive portion is located herein refers to a pattern formed by the same film forming process as the second conductive portion or the second signal line, and the term "through” refers herein to a substrate perpendicular to the substrate. Pass in the direction.
  • the number of the first via holes 26 and the second via holes 27 is plural, thereby increasing the contact area of the connection structure 25 with the first conductive portion 23 and the second conductive portion 24.
  • the width of the first conductive portion 23 may be greater than the width of the first signal line 21, and the width of the second conductive portion 24 may be greater than the second signal line 22.
  • the first via 26 and the second via 27 may correspond one-to-one.
  • the substrate 20 includes a display area and a non-display area surrounding the display area, and the first signal line 21, the first conductive portion 23, the second signal line 22, and the second conductive portion 24 are all disposed at the non-display area Display area.
  • the first signal line 21 may be connected to the gate line in the display area
  • the second signal line 22 may be connected to the driving circuit to provide a scanning signal for the gate line.
  • the first signal line 21 and the second signal line 22 can also be used for transmission of other signals.
  • the orthographic projection of the first conductive portion 23 on the substrate 20 at least partially overlaps the orthographic projection of the second conductive portion 24 on the substrate 20. That is, the conductive bodies of the first conductive portion 23 and the second conductive portion 24 are at least partially overlapped, thereby preventing the phenomenon that the tip is opposed, and thus preventing the tip from being discharged, thereby preventing the connection structure from being broken due to the tip discharge. occur.
  • the first type of connection of the first conductive portion 23 and the second conductive portion 24 is as shown in FIGS. 3 and 4.
  • a portion (approximately half) of the orthographic projection of the first conductive portion 23 on the substrate 20 is located within the orthographic projection range of the second conductive portion 24 on the substrate 20, and another portion is located on the substrate 20 of the second conductive portion 24. Outside the orthographic projection.
  • the orthographic projection of each of the second vias 27 on the substrate 20 is within the orthographic projection of the second conductive portion 24 on the substrate 20, and the orthographic projection of each of the first vias 26 on the substrate 20 is located at the second The conductive portion 24 is outside the orthographic projection range on the substrate 20, and the orthographic projection of each of the first via holes 26 on the substrate 20 does not overlap with the orthographic projection of the corresponding second via hole 27 on the substrate 20 and Adjacent.
  • each of the second via holes 27 is located on a side of the edge of the second conductive portion 24 away from the substrate, and each of the first via holes 26 is located on a side of the first conductive portion 23 away from the substrate and close to the second
  • the edges of the conductive portions 24 are positioned such that each of the first vias 26 and the corresponding second vias 27 communicate to form a large via.
  • the connection structure 25 can electrically connect the first conductive portion 23 and the second conductive portion 24 simultaneously through such a large via. Therefore, such a connection manner of the first conductive portion 23 and the second conductive portion 24 is such that the effective conductive area in the same area is increased as compared with the technique known to the inventors, thereby ensuring the conductive effect.
  • the second connection manner of the first conductive portion 23 and the second conductive portion 24 is as shown in FIGS. 5 and 6. Most or all of the orthographic projection of the first conductive portion 23 on the substrate 20 is within the orthographic projection of the second conductive portion 24 on the substrate 20. At least one slit 241 penetrating the second conductive portion 24 is formed on the second conductive portion 24.
  • An orthographic projection of at least one of the first vias 26 on the substrate 20 is within an orthographic projection of the at least one slit 241 on the substrate 20, a second pass corresponding to at least one of the first vias
  • the projection of the aperture 27 on the substrate is outside the orthographic projection of at least one of the slits 241 on the substrate 20, and the orthographic projection of each of the first vias 26 on the substrate 20 is associated with a corresponding second via 27
  • the orthographic projections on the substrate 20 do not overlap and are adjacent to each other. Similar to the manner in FIG. 4, each of the first vias 26 and the corresponding second vias 27 of FIG. 6 are also in communication, thereby increasing the effective conductive area. After the slit 241 is formed on the second conductive portion 24, the formation of the first via hole 26 can be facilitated, and the slit 241 can also reduce the overlap capacitance between the first conductive portion 23 and the second conductive portion 24.
  • first via hole 26 corresponds to two second via holes 27, as shown in FIG.
  • an orthographic projection of at least one of the first vias 26 on the substrate 20 is within an orthographic projection of at least one of the slits 241 on the substrate 20, with the first The projection of at least one of the corresponding two second vias 27 on the substrate is outside the orthographic projection range of the at least one slit 241 on the substrate 20, and each of the first vias 26 is on the substrate 20.
  • the orthographic projection on the upper and the corresponding two orthogonal vias 27 on the substrate 20 do not overlap and abut each other.
  • Each of the first vias 26 and the corresponding two second vias 27 are in communication, thereby further increasing the effective conductive area.
  • the shape of the slit 241 is not specifically limited, and the shape in FIG. 5 may be employed as an example.
  • the orthographic projection of each slit 241 on the substrate 20 can be rectangular.
  • the orthographic projection of the plurality of slits 241 on the substrate 20 may cover the orthographic projection of the plurality of first vias 26 on the substrate 20.
  • the manner described in FIG. 3 can be employed, and the first via hole 26 and the second via hole 27 are formed larger.
  • the manner described in FIG. 5 may be employed such that the first conductive portion 23 and the second conductive portion 24 form a large area overlap so as to form a plurality of rows and/or columns.
  • a via 26 and a second via 27 may be employed such that the first conductive portion 23 and the second conductive portion 24 form a large area overlap so as to form a plurality of rows and/or columns.
  • a third connection manner of the first conductive portion 23 and the second conductive portion 24 is as shown in FIGS. 8 and 9.
  • the connection structure 25 is represented by a transparent film layer in FIG. 8 without pattern filling.
  • the first conductive portion 23 includes a first comb portion 23a and a plurality of spaced apart first comb portions 23b connected to the first comb portion 23a.
  • the area where the first conductive portion 23 is located is the sum of the regions where the first comb portion 23a, the plurality of first comb portions 23b, and the plurality of first comb portions 23b are spaced apart.
  • the second conductive portion 24 includes a second comb portion 24a and a plurality of spaced apart second comb portions 24b connected to the second comb portion 24a.
  • the area where the second conductive portion 24 is located is the sum of the regions where the second comb portion 24a, the plurality of second comb portions 24b, and the plurality of second comb portions 24b are spaced apart.
  • the orthographic projection of the plurality of first comb-tooth portions 23b on the substrate 20 and the orthographic projection of the plurality of second comb-tooth portions 24b on the substrate 20 are alternately distributed, and the orthographic projection of the first via 26 on the substrate 20 is located
  • the orthographic projection of the plurality of first comb-tooth portions 23b on the substrate 20, the orthographic projection of the second vias 27 on the substrate 20 is located at the orthographic projection of the plurality of second comb-tooth portions 24b on the substrate 20.
  • the orthographic projection of the plurality of first comb-tooth portions 23b and the plurality of second comb-tooth portions 24b on the substrate 20 may be partially heavy, which may reduce damage to the connection structure 25 due to tip discharge.
  • the orthographic projections of the plurality of first comb-tooth portions 23b and the plurality of second comb-tooth portions 24b on the substrate 20 may not overlap, in which case even if the connecting structure 25 is located at a first comb-tooth portion 23b A portion between the corresponding one of the second comb-tooth portions 24b is broken by the tip discharge, and the other first comb-tooth portion 23b and the second comb-tooth portion 24b are still electrically connected, and the first conductive portion 23 and The second conductive portion 24 is electrically connected through the first comb portion 23a and the second comb portion 24a, thereby reducing the possibility that the first conductive portion 23 and the second conductive portion 24 are completely disconnected, while avoiding The double layer is superimposed to form a thick island.
  • the display area of the substrate 20 is arranged with gate lines and data lines (not shown) arranged in different layers.
  • the first signal line 21, the first conductive portion 23, and the gate may be disposed under the condition that the first signal line 21, the second signal line 22, the first conductive portion 23, and the second conductive portion 24 are disposed in the non-display region.
  • the wires are arranged in the same layer, and the three can be of the same material (all using a metal such as copper); and the second signal line 22 and the second conductive portion 24 can be arranged in the same layer as the data line, and the three can be the same Materials (all using metals such as copper).
  • the first signal line 21, the first conductive portion 23 and the gate line can be fabricated by the same patterning process, and the second signal line 22, the second conductive portion 24 and the data line can be fabricated by the same patterning process to simplify the process. .
  • An electrode layer may also be formed in the display region of the substrate, the electrode layer being formed on a side of the layer where the data line is located away from the substrate.
  • the connection structure 25 may be arranged in the same layer as the electrode layer and of the same material, so that the electrode layer and the connection structure 25 can be fabricated simultaneously to simplify the process.
  • the display area may include a plurality of pixel units, each of which is provided with a thin film transistor, and the electrode layer includes pixel electrodes that are in one-to-one correspondence with the plurality of pixel units.
  • the process of forming the electrode layer and the connection structure 25 includes: after forming the data line, the second conductive portion 24, and the second signal line 22, forming a passivation layer 29 covering the display region and the non-display region; simultaneously forming by a photolithography patterning process a pixel electrode via corresponding to a drain of the thin film transistor, at least one first via 26 corresponding to the first conductive portion 23, and at least one second via 27 corresponding to the second conductive portion 24; then, forming a transparent conductive A material layer is subjected to a photolithographic patterning process to form a pattern including the pixel electrode and the connection structure 25.
  • Embodiments of the present disclosure also provide a display device including the above array substrate.
  • the display device may be any product or component having an display function such as an electronic paper, an organic electro-display panel, a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, and the like.
  • the display device using the array substrate has better signal transmission effect and higher display quality.

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Abstract

一种阵列基板，包括在衬底(20)上以绝缘且间隔的不同层布置的第一信号线(21)和第二信号线(22)，其中第一信号线(21)的一端包括第一导电部(23)，第二信号线(22)的一端包括第二导电部(24)，第一导电部(23)和第二导电部(24)通过连接结构(25)电连接，并且其中第一导电部(23)所在区域与第二导电部(24)所在区域在衬底(20)上的正投影至少部分重叠。阵列基板能够减少信号线(21,22)之间断路的发生，以及改善不同信号线(21,22)之间的连接效果。

Description

阵列基板和显示装置
相关申请
本PCT申请要求申请日为2017年7月17日、申请号为NO.201710579004.3的中国专利申请的优先权，该优先权申请的整体内容通过引用的方式被合并于此。
技术领域
本公开涉及显示技术的领域，具体涉及一种阵列基板和显示装置。
背景技术
在显示装置的制作过程中，为满足不同层信号线之间的电连接，经常需要在显示面板的周边位置布置转接结构，即在两层信号线之间的绝缘层上形成过孔，然后利用氧化铟锡(ITO)等连接结构将两层信号线相连。转接处的设计直接影响了电连接的质量。
发明内容
本公开提出了一种阵列基板和显示装置，以解决现有技术中存在的一个或多个问题。
根据本公开的一个方面，提供了一种阵列基板，包括在衬底上以绝缘且间隔的不同层布置的第一信号线和第二信号线，其中所述第一信号线的一端包括第一导电部，所述第二信号线的一端包括第二导电部，所述第一导电部和第二导电部通过连接结构电连接，并且其中所述第一导电部所在区域与所述第二导电部所在区域在所述衬底上的正投影至少部分重叠。
可选地，所述第二导电部位于所述第一导电部远离所述衬底的一侧，所述第一导电部所在层与所述第二导电部所在层之间布置有绝缘层，并且所述第二导电部远离所述衬底的一侧布置有钝化层；以及
其中，所述连接结构通过同时贯穿所述钝化层和所述绝缘层的至少一个第一过孔与所述第一导电部相连，并通过贯穿钝化层的至少一个第二过孔与所述第二导电部相连。
可选地，所述第一过孔和所述第二过孔的数量均为多个，且所述 多个第一过孔与所述多个第二过孔一一对应。
可选地，所述第一导电部在所述衬底上的正投影与所述第二导电部在所述衬底上的正投影至少部分重叠。
可选地，所述多个第二过孔中每一个在所述衬底上的正投影位于所述第二导电部在所述衬底上的正投影范围内，所述多个第一过孔中每一个在所述衬底上的正投影位于所述第二导电部在所述衬底上的正投影范围外，且每个第一过孔的正投影与对应的第二过孔的正投影不重叠且相互邻接。
可选地，所述第二导电部包括至少一个贯穿所述第二导电部的狭缝，所述第一过孔中的至少一个在所述衬底上的正投影位于所述至少一个狭缝在所述衬底上的正投影范围内，与所述第一过孔中的至少一个对应的第二过孔在所述衬底上的投影位于所述至少一个狭缝在所述衬底上的正投影范围外，且每个第一过孔的正投影与对应的第二过孔的正投影不重叠且相互邻接。
可选地，所述至少一个狭缝中的每一个在所述衬底上的正投影为矩形。
可选地，所述第二导电部包括多个贯穿所述第二导电部的狭缝，所述多个狭缝在所述衬底上的正投影覆盖多个第一过孔在所述衬底上的正投影。
可选地，所述第一导电部包括第一梳柄部和与该第一梳柄部相连的多个间隔布置的第一梳齿部，所述第一导电部所在区域为所述第一梳柄部、多个第一梳齿部以及所述多个第一梳齿部之间的间隔所在区域总和；以及
所述第二导电部包括第二梳柄部和与该第二梳柄部相连的多个间隔布置的第二梳齿部，所述第二导电部所在区域为所述第二梳柄部、多个第二梳齿部以及所述多个第二梳齿部之间的间隔所在区域的总和；
其中，所述多个第一梳齿部在所述衬底上的正投影与所述多个第二梳齿部在所述衬底上的正投影交替分布，所述至少一个第一过孔在所述衬底上的正投影位于所述多个第一梳齿部在所述衬底上的正投影内，并且所述至少一个第二过孔在所述衬底上的正投影位于所述多个第二梳齿部在所述衬底上的正投影内。
可选地，所述衬底包括显示区和环绕所述显示区的非显示区，并 且所述第一信号线、所述第一导电部、所述第二信号线和所述第二导电部均布置在所述非显示区。
可选地，所述显示区还布置有异层布置的栅线和数据线，并且其中所述第一信号线、所述第一导电部与所述栅线被同层布置且采用相同的材料，以及所述第二信号线、所述第二导电部与所述数据线被同层布置且采用相同的材料。
可选地，述衬底的显示区还布置有电极层，所述电极层布置在所述数据线远离所述衬底的一侧，并且所述连接结构与所述电极层被同层布置且采用相同的材料。
可选地，所述连接结构的材料为透明导电材料。
根据本公开的另一方面，还提供一种显示装置，包括上面描述的的任意阵列基板。
附图说明
附图被用来提供对本公开的进一步理解，并且构成说明书的一部分，但并不构成对本公开的限制。在附图中：
图1是发明人所知技术中两层信号线转接处的连接示意图；
图2是图1沿A-A线的剖示图；
图3是本公开实施例中提供的第一导电部与第二导电部的第一种连接方式的俯视图；
图4是图3沿B-B线的剖示图；
图5是本公开一些实施例中提供的第一导电部与第二导电部的第二种连接方式的俯视图；
图6是图5沿C-C线的剖示图；
图7是本公开一些实施例中提供的第一导电部与第二导电部的第二种连接方式的俯视图；
图8是本公开实施例中提供的第一导电部与第二导电部的第三种连接方式的俯视图；
图9是图8沿D-D线的剖示图。
具体实施方式
附图标记被列出为：11、12：发明人所知技术中的信号线；13： 发明人所知技术中的连接结构；20：衬底；21：第一信号线；22：第二信号线；23：第一导电部；23a：第一梳柄部；23b、第一梳齿部；24：第二导电部；24a、第二梳柄部；24b、第二梳齿部；241：狭缝；25：本公开中的连接结构；26：第一过孔；27：第二过孔；28：绝缘层；29：钝化层。
以下结合附图对本公开的具体实施方式进行详细说明。应当理解的是，此处所描述的具体实施方式仅用于说明和解释本公开，并不用于限制本公开。
图1是发明人所知技术中的两层信号线转接处的连接示意图，图2是图1沿AA线的剖示图。由于两层信号线11和12在衬底上的投影相对布置但互不重叠，因此，在信号线11或12上加载电信号的情况下，两个信号线11和12相互靠近的一端会累积大量的静电荷。在这种情况下，容易发生尖端放电，使得在两个信号线11和12之间的间隙处产生静电击穿，导致连接结构13位于间隙处的部分发生断裂。一旦发生断裂，就容易导致两个信号线11和12之间发生断路，从而影响信号传输。
本公开提供了一种阵列基板，如图3至图9所示。所述阵列基板包括以绝缘且间隔的不同层在衬底20上布置的第一信号线21和第二信号线22。第一信号线21的一端包括第一导电部23，第二信号线22的一端包括第二导电部24。第一导电部23和第二导电部24通过连接结构25电连接，并且第一导电部23所在区域与第二导电部24所在区域在衬底20上的正投影至少部分重叠。第一导电部23和第一信号线21可以为一体结构，第二导电部24和第二信号线22可以为一体结构。
第一导电部23所在区域可以被确定为：以第一导电部23沿衬底20长度方向的最大尺寸为长、以第一导电部23沿衬底20宽度方向的最大尺寸为宽，形成的矩形区域；第二导电部24所在区域可以看作：以第二导电部24沿衬底20长度方向的最大尺寸为长、以第二导电部24沿衬底20宽度方向的最大尺寸为宽，形成的矩形区域。
在本公开中，第一导电部23所在区域和第二导电部24所在区域有重叠包括两种情况：(1)第一导电部23与第二导电部24在衬底20上的正投影之间有交叠，这样可以避免尖端彼此相对的现象，从而防止由于尖端放电而产生的静电击穿，进而减少连接结构25断裂现象的 发生；(2)第一导电部23和第二导电部24每个均包括多个导电部分，其中在第一导电部23的导电部分与第二导电部24的导电部分在衬底20上的正投影有交叠的情形下，可以避免尖端相对的现象，以及在第一导电部23的导电部分和第二导电部24的导电部分无交叠情形下，即使第一导电部23的一个导电部分与第二导电部24的一个导电部分之间断开，第一导电部23的其他导电部分与第二导电部24的其他导电部分也是连接在一起的，从而减少了第一导电部23和第二导电部24完全断开的概率。因此，不论哪种情况都可以减少因尖端放电而导致的第一导电部23与第二导电部24断开的现象，从而保证第一信号线21和第二信号线22的电连接。
如图4、图6和图9所示，第二导电部24位于第一导电部23远离所述衬底的一侧，第一导电部23所在层与第二导电部24所在层之间布置有绝缘层28，并且第二导电部24远离所述衬底的一侧布置有钝化层29。连接结构25通过同时贯穿钝化层29和绝缘层28的至少一个第一过孔26与第一导电部23相连，并通过贯穿钝化层29的至少一个第二过孔27与第二导电部24相连。通常来说，第一过孔在垂直于衬底的方向上的深度大于第二过孔在垂直于衬底的方向上的深度。连接结构25的材料可以为透明导电材料，例如氧化铟锡(ITO)等。应当指出，第二导电部所在层在本文中指的是与第二导电部或第二信号线属于同一次成膜工艺所形成的图案，并且术语“贯穿”在本文指的是在垂直于衬底上的方向上的通过。
可选地，第一过孔26和第二过孔27的数量均为多个，从而增大连接结构25与第一导电部23以及第二导电部24的接触面积。为了便于形成多个第一过孔26和多个第二过孔27，可以使第一导电部23的宽度大于第一信号线21的宽度，第二导电部24的宽度大于第二信号线22的宽度。这种情况下，第一过孔26与第二过孔27可以一一对应。
本公开的技术方案尤其可应用于阵列基板的显示区周边的转接。具体地，衬底20包括显示区和环绕所述显示区的非显示区，并且第一信号线21、第一导电部23、第二信号线22和第二导电部24均布置在所述非显示区。第一信号线21可以与显示区中的栅线相连，以及第二信号线22可以与驱动电路相连，从而为栅线提供扫描信号。当然，第一信号线21和第二信号线22也可以用于其他信号的传输。下面结合 图3至图9对第一导电部23和第二导电部24的几种具体连接方式进行介绍。
在图3至图6中，第一导电部23在衬底20上的正投影与第二导电部24在衬底20上的正投影至少部分重叠。即，第一导电部23和第二导电部24的导电本体是至少部分重叠的，从而防止出现尖端相对的现象，并且因此防止尖端放电，进而防止因尖端放电而导致的连接结构断开的现象发生。
第一导电部23和第二导电部24的第一种连接方式如图3和图4所示。第一导电部23在衬底20上的正投影的一部分(大约一半)位于第二导电部24在衬底20上的正投影范围内，另一部分位于第二导电部24在衬底20上的正投影之外。每个第二过孔27在衬底20上的正投影位于第二导电部24在衬底20上的正投影范围内，每个第一过孔26在衬底20上的正投影位于第二导电部24在衬底20上的正投影范围外，且每个第一过孔26在衬底20上的正投影与对应的第二过孔27在衬底20上的正投影不重叠且相互邻接。也就是说，每个第二过孔27位于第二导电部24的边缘的远离衬底的一侧，每个第一过孔26位于第一导电部23远离衬底的一侧且靠近第二导电部24的边缘的位置，从而使得每个第一过孔26和对应的第二过孔27相连通以形成一个大过孔。连接结构25可以通过这样的大过孔同时将第一导电部23和第二导电部24电连接。因此，与发明人所知的技术相比，第一导电部23和第二导电部24的这样的连接方式使得在相同的面积内的有效导电面积增大，从而保证了导电效果。
第一导电部23和第二导电部24的第二种连接方式如图5和图6所示。第一导电部23在衬底20上的正投影的大部分或全部位于第二导电部24在衬底20上的正投影范围内。第二导电部24上形成有至少一个贯穿第二导电部24的狭缝241。第一过孔26中的至少一个在衬底20上的正投影位于至少一个狭缝241在衬底20上的正投影范围内，与所述第一过孔中的至少一个对应的第二过孔27在衬底上的投影位于至少一个狭缝241在衬底20上的正投影范围外，且每个第一过孔26在衬底20上的正投影与对应的第二过孔27在衬底20上的正投影不重叠且相互邻接。和图4中的方式相类似，图6中的每个第一过孔26和对应的第二过孔27也是相连通的，从而增大了有效导电面积。在第二导 电部24上形成狭缝241后，可以便利于第一过孔26的形成，并且，狭缝241还可以减少第一导电部23和第二导电部24之间的交叠电容。
可以理解的是，在第一导电部23和第二导电部24的连接方式中，也可以存在一个第一过孔26对应两个第二过孔27的实例，如图7所示。与上述图6的中所示类似地，第一过孔26中的至少一个在衬底20上的正投影位于至少一个狭缝241在衬底20上的正投影范围内，与所述第一过孔中的至少一个对应的两个第二过孔27在衬底上的投影位于至少一个狭缝241在衬底20上的正投影范围外，且每个第一过孔26在衬底20上的正投影与对应的两个第二过孔27在衬底20上的正投影不重叠且相互邻接。每个第一过孔26和对应的两个第二过孔27都是相连通的，从而进一步增大了有效导电面积。
在本公开的实施例中，狭缝241的形状并不被具体限定，其作为示例可以采用图5中的形状。每个狭缝241在衬底20上的正投影可以为矩形。多个狭缝241在衬底20上的正投影可以覆盖多个第一过孔26在衬底20上的正投影。
另外，在实际应用中，在非显示区走线密集、空间紧张的情况下，可以采用图3中描述的方式，并将第一过孔26和第二过孔27形成的较大。当非显示区空间布局允许的情况下，可以采用图5中描述的方式，使得第一导电部23和第二导电部24形成大面积的交叠，以便于形成多行和/或多列第一过孔26和第二过孔27。
第一导电部23和第二导电部24的第三种连接方式如图8和图9所示。为了清楚地图示出第一导电部23和第二导电部24的结构以及二者的连接关系，在图8中将连接结构25以透明膜层表示，未进行图案填充。第一导电部23包括第一梳柄部23a和与该第一梳柄部23a相连的多个间隔布置的第一梳齿部23b。第一导电部23所在区域为第一梳柄部23a、多个第一梳齿部23b以及多个第一梳齿部23b之间的间隔所在区域的总和。第二导电部24包括第二梳柄部24a和与该第二梳柄部24a相连的多个间隔布置的第二梳齿部24b。第二导电部24所在区域为第二梳柄部24a、多个第二梳齿部24b以及多个第二梳齿部24b之间的间隔所在区域的总和。多个第一梳齿部23b在衬底20上的正投影与多个第二梳齿部24b在衬底20上的正投影交替分布，第一过孔26在衬底20上的正投影位于多个第一梳齿部23b在衬底20上的正投影 内，第二过孔27在所述衬底20上的正投影位于多个第二梳齿部24b在衬底20上的正投影内。
可选地，多个第一梳齿部23b和多个第二梳齿部24b在衬底20上的正投影可以部分重，这可以减少因尖端放电对连接结构25造成的损伤。当然，多个第一梳齿部23b和多个第二梳齿部24b在衬底20上的正投影也可以不重叠，在这种情况下，即使连接结构25位于一个第一梳齿部23b和对应一个第二梳齿部24b之间的部分因尖端放电而断开，其他第一梳齿部23b和第二梳齿部24b之间还是被电连接的，并使得第一导电部23和第二导电部24通过第一梳柄部23a和第二梳柄部24a被电连接，从而减少第一导电部23和第二导电部24完全断开的情况发生的可能性，同时还可以避免双层叠加而形成较厚的孤岛。
通常，衬底20的显示区布置有异层布置的栅线和数据线(未示出)。在第一信号线21、第二信号线22、第一导电部23和第二导电部24布置在非显示区的条件下，可以将第一信号线21、第一导电部23与所述栅线同层布置，且三者可以采用相同材料(均采用诸如铜等金属)；并且可以将第二信号线22、第二导电部24与所述数据线同层布置，且三者可以采用相同材料(均采用诸如铜等金属)。这使得第一信号线21、第一导电部23与栅线可以采用同一次构图工艺制作，第二信号线22、第二导电部24和数据线可以采用同一次构图工艺制作，以简化工艺过程。
在衬底的显示区中还可以形成有电极层，所述电极层形成在所述数据线所在层远离衬底的一侧。连接结构25可以与所述电极层同层布置且采用相同材料，从而使得电极层与连接结构25可以同步制作，以简化工艺过程。具体地，显示区可以包括多个像素单元，每个像素单元中布置有薄膜晶体管，电极层包括与所述多个像素单元一一对应的像素电极。形成电极层和连接结构25的过程包括：在形成数据线、第二导电部24和第二信号线22后，形成覆盖显示区和非显示区的钝化层29；通过光刻构图工艺同时形成对应于薄膜晶体管的漏极的像素电极过孔、对应于第一导电部23的至少一个第一过孔26、对应于第二导电部24的至少一个第二过孔27；然后，形成透明导电材料层，并对该透明导电材料层进行光刻构图工艺，以形成包括像素电极和连接结构25的图形。
本公开的实施例还提供了一种显示装置，包括上述阵列基板。所述显示装置可以为电子纸、有机电致显示面板、手机、平板电脑、电视机、显示器、笔记本电脑、数码相框、导航仪等任何具有显示功能的产品或部件。
由于所述阵列基板可以减少因尖端放电导致的连接结构断开的现象，因此采用所述阵列基板的显示装置的信号传输效果更好，显示质量更高。
可以理解的是，以上实施方式仅仅是为了说明本公开的原理而采用的示例性实施方式，然而本公开并不局限于此。对于本领域内的普通技术人员而言，在不脱离本公开的精神和实质的情况下，可以做出各种变型和改进，这些变型和改进也视为落入本公开的保护范围内。

Claims (14)

  1. 一种阵列基板，包括在衬底上以绝缘且间隔的不同层布置的第一信号线和第二信号线，其中所述第一信号线的一端包括第一导电部，所述第二信号线的一端包括第二导电部，所述第一导电部和第二导电部通过连接结构电连接，并且其中所述第一导电部所在区域与所述第二导电部所在区域在所述衬底上的正投影至少部分重叠。
  2. 根据权利要求1所述的阵列基板，其中，所述第二导电部位于所述第一导电部远离所述衬底的一侧，所述第一导电部所在层与所述第二导电部所在层之间布置有绝缘层，并且所述第二导电部远离所述衬底的一侧布置有钝化层；以及
    其中，所述连接结构通过同时贯穿所述钝化层和所述绝缘层的至少一个第一过孔与所述第一导电部相连，并通过贯穿钝化层的至少一个第二过孔与所述第二导电部相连。
  3. 根据权利要求2所述的阵列基板，其中，所述第一过孔和所述第二过孔的数量均为多个，且所述多个第一过孔与所述多个第二过孔一一对应。
  4. 根据权利要求3所述的阵列基板，其中，所述第一导电部在所述衬底上的正投影与所述第二导电部在所述衬底上的正投影至少部分重叠。
  5. 根据权利要求4所述的阵列基板，其中，所述多个第二过孔中每一个在所述衬底上的正投影位于所述第二导电部在所述衬底上的正投影范围内，所述多个第一过孔中每一个在所述衬底上的正投影位于所述第二导电部在所述衬底上的正投影范围外，且每个第一过孔的正投影与对应的第二过孔的正投影不重叠且相互邻接。
  6. 根据权利要求4所述的阵列基板，其中，所述第二导电部包括至少一个贯穿所述第二导电部的狭缝，所述第一过孔中的至少一个在所述衬底上的正投影位于所述至少一个狭缝在所述衬底上的正投影范围内，与所述第一过孔中的至少一个对应的所述第二过孔在所述衬底上的投影位于所述至少一个狭缝在所述衬底上的正投影范围外，且每个第一过孔的正投影与对应的第二过孔的正投影不重叠且相互邻接。
  7. 根据权利要求6所述的阵列基板，其中，所述至少一个狭缝中 的每一个在所述衬底上的正投影为矩形。
  8. 根据权利要求6所述的阵列基板，其中所述第二导电部包括多个贯穿所述第二导电部的狭缝，所述多个狭缝在所述衬底上的正投影覆盖多个第一过孔在所述衬底上的正投影。
  9. 根据权利要求2所述的阵列基板，其中，所述第一导电部包括第一梳柄部和与该第一梳柄部相连的多个间隔布置的第一梳齿部，所述第一导电部所在区域为所述第一梳柄部、多个第一梳齿部以及所述多个第一梳齿部之间的间隔所在区域总和；以及
    所述第二导电部包括第二梳柄部和与该第二梳柄部相连的多个间隔布置的第二梳齿部，所述第二导电部所在区域为所述第二梳柄部、多个第二梳齿部以及所述多个第二梳齿部之间的间隔所在区域的总和；
    其中，所述多个第一梳齿部在所述衬底上的正投影与所述多个第二梳齿部在所述衬底上的正投影交替分布，所述至少一个第一过孔在所述衬底上的正投影位于所述多个第一梳齿部在所述衬底上的正投影内，并且所述至少一个第二过孔在所述衬底上的正投影位于所述多个第二梳齿部在所述衬底上的正投影内。
  10. 根据权利要求1至9中任意一项所述的阵列基板，其中，所述衬底包括显示区和环绕所述显示区的非显示区，并且所述第一信号线、所述第一导电部、所述第二信号线和所述第二导电部均布置在所述非显示区。
  11. 根据权利要求10所述的阵列基板，其中，所述显示区还布置有异层布置的栅线和数据线，并且其中所述第一信号线、所述第一导电部与所述栅线被同层布置且采用相同的材料，以及所述第二信号线、所述第二导电部与所述数据线被同层布置且采用相同的材料。
  12. 根据权利要求11所述的阵列基板，其中，所述衬底的显示区还布置有电极层，所述电极层布置在所述数据线远离所述衬底的一侧，并且所述连接结构与所述电极层被同层布置且采用相同的材料。
  13. 根据权利要求1至12中任意一项所述的阵列基板，其中，所述连接结构的材料为透明导电材料。
  14. 一种显示装置，包括权利要求1至13中任意一项所述的阵列基板。
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