WO2019010910A1 - Wavelength conversion device and light source - Google Patents

Wavelength conversion device and light source Download PDF

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Publication number
WO2019010910A1
WO2019010910A1 PCT/CN2017/114713 CN2017114713W WO2019010910A1 WO 2019010910 A1 WO2019010910 A1 WO 2019010910A1 CN 2017114713 W CN2017114713 W CN 2017114713W WO 2019010910 A1 WO2019010910 A1 WO 2019010910A1
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Prior art keywords
layer
silver
conversion device
wavelength conversion
glass
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PCT/CN2017/114713
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French (fr)
Chinese (zh)
Inventor
田梓峰
许颜正
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深圳市光峰光电技术有限公司
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Publication of WO2019010910A1 publication Critical patent/WO2019010910A1/en

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    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21LIGHTING
    • F21VFUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V7/00Reflectors for light sources
    • F21V7/22Reflectors for light sources characterised by materials, surface treatments or coatings, e.g. dichroic reflectors
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21LIGHTING
    • F21VFUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V9/00Elements for modifying spectral properties, polarisation or intensity of the light emitted, e.g. filters
    • F21V9/40Elements for modifying spectral properties, polarisation or intensity of the light emitted, e.g. filters with provision for controlling spectral properties, e.g. colour, or intensity

Definitions

  • the present application relates to the field of illumination and display, and in particular to a wavelength conversion device, a method for fabricating the same, and a light source.
  • the laser fluorescence conversion type light source has developed rapidly and has been widely used in the fields of illumination and projection display.
  • the laser power is also increased, whereby the wavelength conversion device generates more heat during the illumination process, and when the temperature reaches a certain temperature, the conversion efficiency of the wavelength conversion material increases with the temperature. High and low, resulting in thermal quenching. Therefore, for high-power laser sources, efficient heat dissipation from the wavelength conversion device is necessary.
  • a conventional wavelength conversion device adopts a light-emitting layer, a reflective layer and a substrate which are sequentially stacked.
  • the reflective layer of the wavelength conversion device is a diffuse reflection layer formed by mixing and sintering white scattering particles and glass frit.
  • the diffuse reflection layer is composed entirely of inorganic materials, the heat resistance is high, but the thermal conductivity of the scattering particles and the glass powder in the sintered material is low; and the sintered structure is generally a porous structure in order to ensure a high reflectance.
  • the thermal resistance is high; thus, it is not conducive to heat dissipation of the wavelength conversion device under high power laser excitation, which is disadvantageous to the improvement of the luminance and stability of the wavelength conversion device. Therefore, the diffuse reflection layer of the wavelength conversion device of the solution becomes a bottleneck for further increasing the brightness of the laser fluorescent display source.
  • Another solution of the existing wavelength conversion device is to replace the diffuse reflection layer with a silver reflective layer on the basis of the above scheme.
  • the advantage of this scheme is that the reflectivity and thermal conductivity of the silver reflective layer are higher than that of the diffuse reflection layer, which is beneficial to improve the light extraction efficiency, brightness and thermal stability of the wavelength conversion device.
  • the above solution cannot obtain a silver reflective layer reflecting surface with a high surface flatness, thereby further limiting the reflectance. Therefore, its luminous efficiency efficiency needs to be further improved.
  • the present application aims to provide a wavelength conversion device having high reflectance, low thermal resistance, and high reliability, particularly a wavelength conversion device suitable for a high power laser light source.
  • a wavelength conversion device comprising a light-emitting layer, a glass bonding layer, a silver reflective layer, and a bearing layer which are sequentially stacked Burning a substrate, a silver bonding layer, a soldering layer, and a thermally conductive substrate;
  • the luminescent layer is an inorganic luminescent layer capable of absorbing light of a certain wavelength range and emitting light of different wavelength ranges.
  • the light emitting layer is any one of a light emitting ceramic, a light emitting ceramic single crystal, a light emitting ceramic eutectic or a luminescent glass.
  • the luminescent ceramic single crystal is a garnet-structured (Lu, Y, Gd, Tb) 3 (Ga, Al) 5 O 12 : Ce 3 + luminescent ceramic single crystal.
  • the luminescent ceramic eutectic is a composite ceramic eutectic of Al 2 O 3 -(Lu,Y,Gd,Tb) 3 (Ga,Al) 5 O 12 :Ce 3+ .
  • the luminescent glass is a luminescent glass of a first glass-encapsulated phosphor.
  • the glass bonding layer is a second glass that is transparent.
  • the glass bonding layer is formed by sintering a second glass frit and an organic carrier to form a glass paste.
  • the second glass in the glass bonding layer is glass which does not undergo a color change reaction with the Ag element.
  • the second glass is a silicate or borosilicate lead-free glass; further preferably, it does not contain any of Cu, Sn and Sb.
  • the second glass has a refractive index of less than 1.6.
  • the second glass has a refractive index of less than 1.5.
  • the glass bonding layer has a thickness of 0.1 to 100 ⁇ m; preferably, the thickness is 0.2 to 30 ⁇ m, and even more preferably, the thickness is 0.5 to 10 ⁇ m.
  • the silver reflective layer and/or the silver bonding layer is a pure silver layer or a composite silver layer containing silver and a third glass.
  • the silver reflective layer and/or the silver bonding layer has a thickness of 1 to 100 ⁇ m.
  • the silver powder has a particle size ranging from 0.01 to 20 ⁇ m; the silver powder is preferably spherical or flake-shaped.
  • the glass bonding layer completely covers the reflective surface and the side surface of the silver reflective layer.
  • the sapphire substrate is preferably any one of an alumina ceramic substrate, a sapphire substrate, a boron nitride substrate, a metal tungsten substrate, or a metal molybdenum substrate.
  • the thickness of the under-fired substrate is 0.1 to 5 mm, and more preferably 0.2 to 1 mm.
  • the solder layer is a solder layer or a sintered silver layer. Further preferably, the solder layer is formed by at least one or a combination of gold tin, silver tin, antimony tin or lead solder, or reflow soldering of the preformed soldering piece.
  • the solder layer has a thickness of 0.005 to 0.5 mm.
  • the thermally conductive substrate is a metal substrate or a ceramic substrate.
  • the thermally conductive substrate is any one of copper, aluminum, aluminum nitride, silicon carbide, silicon nitride or alumina ceramic substrates.
  • the thermally conductive substrate has a thickness of 0.1 to 5 mm.
  • the periphery of the side of the wavelength conversion device is at least partially covered with a sealing layer.
  • the sealing layer completely surrounds the side of the coated silver reflective layer.
  • the sealing layer is any one or a combination of epoxy resin, silicone resin or silica gel.
  • the encapsulating layer has an oxygen permeability of less than 500 cc/m 2 .day; further preferably, the oxygen permeability is less than 300 cc/m 2 .day; particularly preferably, the oxygen permeability is less than 100 cc/m 2 .day .
  • the surface of the copper substrate or the aluminum substrate is plated with a nickel-gold protective layer.
  • the surface of the alumina ceramic and ceramic substrate is coated with a titanium transition layer, and then a nickel-gold protective layer is plated.
  • the thermally conductive substrate is of a flat type or a fin type.
  • the first surface of the light emitting layer is provided with an antireflection film or a surface roughening.
  • the invention also provides a preparation method of the above wavelength conversion device, which comprises the following steps:
  • Step A coating silver paste on one side of the substrate to be baked, and then drying; then, coating the silver paste on the other side of the substrate to be dried, and then sintering at a high temperature to form a silver reflective layer on one side of the substrate. On the other side, a silver bonding layer is formed.
  • the silver paste is a mixed slurry of silver powder and an organic carrier or a mixed slurry of silver powder, a third glass and an organic vehicle.
  • the drying temperature is 60 to 150 °C.
  • the high temperature sintering temperature is 500 to 1000 °C.
  • Step B coating a second glass paste on the silver reflective layer; the luminescent layer is placed on the second glass paste, and then dried and sintered at a high temperature to obtain a stacked luminescent layer, a glass bonding layer, a silver reflective layer, The substrate is sintered and the silver bonding layer.
  • the second glass paste is a mixed slurry of the second glass frit and the organic vehicle.
  • Step C Coating a solder on the silver bonding layer and then soldering it onto the thermally conductive substrate to prepare a wavelength conversion device.
  • the welding method is preferably reflow soldering.
  • step D is further included: applying a sealant paste around the side of the wavelength conversion device to cure to form a seal layer.
  • the invention also provides a light source comprising the above wavelength conversion device, the light source further comprising an excitation light source, the excitation light source being a laser source, a laser diode source, a light emitting diode or a laser At least one or a combination of a light tube array and a light source diode array.
  • the reflective layer of the above-mentioned wavelength conversion device is a silver reflective layer, and the silver reflective layer is obtained by high-temperature sintering of an alumina substrate or the like as a high-temperature setter, the reflective surface of the silver reflective layer is in a free sintered state during sintering, that is, the reflection In the process of surface sintering, there is no other substrate directly in contact with it.
  • the silver paste is not limited in the sintering process, which is beneficial to the flow of the silver paste during the sintering process to form a dense silver layer; at the same time, the reflective surface is not affected.
  • the wavelength conversion device of the present invention can form a silver reflective layer having a high density and a very high surface flatness during the preparation process.
  • the compactness and surface flatness of the silver reflective layer are high.
  • the dense and flat silver reflective layer can have a very high reflectivity, which can improve the light-emitting efficiency of the wavelength conversion device; on the other hand, the dense silver reflective layer has a very high
  • the thermal conductivity reduces the thermal resistance of the wavelength conversion device.
  • the solder layer also has a high thermal conductivity, and the thermal conductive substrate welded with it improves the thermal conductivity of the entire wavelength conversion device. Increased reliability in high power laser applications. Further, by optimizing the specific parameters, the bonding strength between the layers is improved, and the reliability in the application of the high-speed color wheel is improved.
  • FIG. 1 is a schematic structural view of a wavelength conversion device prepared in Embodiment 1;
  • FIG. 2 is a schematic structural view of a wavelength conversion device prepared in Embodiment 2;
  • FIG. 3 is a schematic structural view of a wavelength conversion device prepared in the third embodiment
  • FIG. 4 is a schematic structural view of a wavelength conversion device prepared in Embodiment 4.
  • FIG. 5 is a schematic structural view of a wavelength conversion device prepared in the fifth embodiment.
  • the wavelength conversion device 100 includes a light-emitting layer 101, a glass bonding layer 102, a silver reflective layer 103, a substrate 140, a silver bonding layer 105, a solder layer 106, and a heat-conducting substrate 107 which are sequentially stacked.
  • the luminescent layer is an inorganic luminescent layer capable of absorbing light of a certain wavelength range and emitting light of different wavelength ranges.
  • the luminescent layer 101 is a luminescent ceramic, a luminescent ceramic single crystal, and a luminescent ceramic. Any of eutectic or luminescent glass.
  • the light-emitting layer 101 is a garnet-structured (Lu, Y, Gd, Tb) 3 (Ga, Al) 5 O 12 : Ce 3 + luminescent ceramic, (Lu, Y, Gd, Tb) 3 ( Ga,Al) 5 O 12 :Ce 3+ luminescent ceramic single crystal, Al 2 O 3 -(Lu,Y,Gd,Tb) 3 (Ga,Al) 5 O 12 :Ce 3+ composite ceramic or Al 2 O 3 - (Lu, Y, Gd, Tb) 3 (Ga, Al) 5 O 12 : Any of the Ce 3 + eutectic.
  • the light-emitting layer 101 may be a light-emitting glass of a first glass-encapsulated phosphor.
  • YAG:Ce 3+ luminescent ceramic or YAG:Ce 3+ single crystal, YAG:Ce 3+ is a garnet structure of Y 3 Al 5 O 12 :Ce 3+ .
  • the conventional light-emitting layer such as a silica gel-encapsulated phosphor, an organic gel-encapsulated phosphor, or the like, has a low-temperature resistance performance and is generally not considered for use in the application of the present invention.
  • luminescent ceramics and luminescent glass have good mechanical properties and high temperature stability, especially excellent mechanical properties, which can further perform mechanical processing such as grinding and polishing, and can ensure the implementation of subsequent process steps.
  • the thickness of the light-emitting layer 101 is 0.005 to 1 mm. In some other embodiments, the luminescent layer 101 has a thickness of 0.05 to 0.5 mm.
  • the glass bonding layer 102 is a transparent second glass.
  • the glass bonding layer 102 is formed by mixing a second glass frit and an organic carrier to form a glass paste.
  • the second glass in the glass bonding layer 102 is glass which does not undergo a color change reaction with the Ag element.
  • the second glass is a silicate or borosilicate lead-free glass; further preferably, it does not contain any of Cu, Sn, and Sb.
  • the second glass has a refractive index lower than 1.6. Further, the second glass has a refractive index of less than 1.5.
  • the refractive index of the matrix in the luminescent ceramic is relatively high, such as the common YAG:Ce 3+ up to 1.84; we found that the refractive index of the encapsulation material in the YAG luminescent ceramic is closer to YAG, under the high-power excitation light source. The better the saturation of the light. The reason is that the closer the refractive index of the encapsulating material is to YAG, the less the reflection loss of light between the encapsulating material and the YAG interface; at present, most of the glass which does not contain elements such as Cu, Co, Sn and Sb which can react with silver.
  • the refractive index is relatively low; therefore, the advantage of using the low refractive index glass bonding layer 102 is that on the one hand, the higher luminous efficiency of the luminescent layer can be ensured, and the luminescent layer 101 is prevented from directly contacting the reflective silver layer 103 to cause discoloration.
  • the phenomenon ensures optical reliability during long-term use; on the other hand, the glass bonding layer 102 can bond the silver reflective layer 103 and the light-emitting layer with high strength to ensure the mechanical reliability of the wavelength conversion device.
  • the thickness of the glass bonding layer should not be too thick; too thick will reduce the thermal conductivity of the wavelength conversion device.
  • the glass bonding layer has a thickness of 0.1 to 100 ⁇ m; preferably, the thickness is 0.2 to 30 ⁇ m, and even more preferably, the thickness is 0.5 to 10 ⁇ m.
  • the luminescent layer 101 when the luminescent layer 101 is the first glass-encapsulated phosphor In the case of illuminating glass, at this time, the glass bonding layer 102 may be omitted, that is, the luminescent layer 101 is directly in contact with the silver reflecting layer 103.
  • the first glass should also be similar to the choice of the second glass. For the specific selection method, please refer to the second glass.
  • the silver reflective layer 103 and/or the silver bonding layer 105 is a pure silver layer or a composite silver layer containing silver and a third glass.
  • the silver reflective layer and/or the silver bonding layer are formed by sintering silver powder and an organic carrier to form a silver paste, or sintering the silver powder, the third glass powder and the organic carrier into a silver paste.
  • the thickness of the silver reflective layer 103 and/or the silver bonding layer 105 is from 1 to 100 ⁇ m. It should be noted that, when the thickness of the silver reflective layer is less than 1 ⁇ m, the silver paste process is not easy to control; when the thickness of the silver reflective layer is greater than 100 ⁇ m, it is disadvantageous for sintering to obtain a dense and flat sintered silver surface.
  • the raw material silver powder has a particle diameter ranging from 0.01 to 20 ⁇ m.
  • the silver powder with a particle size of less than 0.01 ⁇ m is not easily dispersed, and the surface flatness of the silver paste prepared by the silver powder having a particle diameter of more than 20 ⁇ m is not easily controlled, and the silver powder having a larger particle diameter is less likely to be sintered densely on the alumina substrate, and the adhesion is deteriorated.
  • the raw material silver powder is preferably spherical or flake-shaped, and the two shape particles are favorable for forming a close-packed structure, and the sintered silver reflective layer is more dense.
  • the under-fired substrate 104 is any one of an alumina substrate, a boron nitride substrate, a metal tungsten substrate, or a metal molybdenum substrate.
  • the thickness of the set substrate 104 is 0.1 to 5 mm, and more preferably 0.2 to 1 mm. Since the substrate for bearing is mainly used for carrying silver paste for sintering the surface of the silver reflective layer, it is necessary to consider its influence on the thermal conductivity of the wavelength conversion device; therefore, the thickness thereof needs to be as small as possible; at the same time, it needs to be guaranteed.
  • the bonding strength with the silver reflective layer so it is preferably a substrate material having a crystal structure similar to silver, and the substrate to be burned is preferably any one of an alumina substrate, a boron nitride substrate, a metal tungsten substrate or a metal molybdenum substrate. in.
  • the silver reflective layer 103 and the silver bonding layer 105 may be either a pure silver layer or a composite silver layer, and the two may be the same or different; however, the roles of the two are not the same.
  • the silver reflective layer 103 is mainly intended to reflect excitation light or receive laser light, and needs to have the highest possible reflectivity while ensuring good thermal conductivity; therefore, the silver reflective layer 103 is preferably a pure silver layer.
  • the silver bonding layer 105 mainly functions as a transition between the bearing substrate 104 and the solder layer 106, and can bond the bearing substrate 104 and the solder layer 10 with higher strength; ensuring the wavelength conversion device. Overall mechanical reliability.
  • the action mechanism of the silver bonding layer 105 is slightly different from that of the solder layer and the substrate.
  • the reason why the sintered substrate 104 and the silver bonding layer 105 have a high bonding strength is that the silver in the sintered silver reflective layer is generally in a hexagonal structure, and has the same lattice structure as alumina (sapphire), so that the bonding strength is good.
  • the substrate for the substrate can be selected from any hexagonal ceramic or metal, such as hexagonal boron nitride ceramics, high temperature resistant tungsten, molybdenum metal, and alumina ceramics.
  • the higher bonding strength between the solder layer 106 and the silver bonding layer 105 is that silver can form a reliable weld seam with the metal soldering layer during the soldering process; the basic principle of soldering It can be seen that the weld bead is composed of an intermetallic compound. Obviously, in this embodiment, the high-purity silver layer can easily form an intermetallic compound with the metal in the solder paste or the preformed solder, thereby forming a reliable weld. Therefore, the silver bonding layer is also preferably a pure silver layer.
  • the metal component in the solder paste or the preformed soldering piece includes gold tin, silver tin, antimony tin or lead solder.
  • the silver reflective layer and/or the silver bonding layer are formed by sintering silver powder and an organic carrier to form a silver paste, or a silver powder, a third glass frit and an organic carrier are mixed to form a silver paste.
  • the particle size of the silver powder raw material is in the range of 0.01 to 20 ⁇ m; the raw material silver powder is preferably spherical or flake-shaped.
  • the solder layer 106 is a solder layer or a sintered silver layer. Further, the solder layer 106 is at least one or a combination of gold tin, silver tin, antimony tin or lead solder. It can be understood that when the solder layer 106 is selected to be a sintered silver layer, that is, the same as the silver bonding layer, the two layers may be a single layer. That is, in this embodiment, the underfired substrate is directly bonded to the thermally conductive substrate through the silver bonding layer, and the remaining layers are unchanged. In other embodiments, the silver bonding layer can also be replaced with a thermally conductive adhesive, with the remaining layers unchanged.
  • the heat conductive substrate 107 is a metal substrate or a ceramic substrate.
  • the heat conductive substrate 107 has a thickness of 0.1 to 5 mm.
  • the thermally conductive substrate 107 is any one of copper, aluminum, aluminum nitride, silicon carbide, silicon nitride, or alumina ceramic substrates.
  • the surface of the copper substrate or the aluminum substrate is plated with a nickel-gold protective layer.
  • the surface of the alumina ceramic and ceramic substrate is plated with a titanium transition layer, and then a nickel-gold protective layer is plated.
  • the thermally conductive substrate is of a flat type or a fin type.
  • the glass bonding layer 202 completely covers the reflective surface and the side surface of the silver reflective layer 203.
  • the silver reflective layer 203 is completely surrounded by the glass bonding layer 202 and the substrate, completely isolated from the air. It can be understood that the glass bonding layer 202 completely covers the reflecting surface and the side surface of the silver reflective layer 203 to maximize the isolation of the sealed silver reflective layer 203, on the one hand, preventing contact with the luminescent layer, and on the other hand, preventing it from coming into contact with air. Vulcanization blackening phenomenon.
  • the reflecting surface of the silver reflective layer is a side close to the light emitting layer.
  • the side of the wavelength conversion device is at least partially covered with the sealing layer 308.
  • the sealing layer 308 completely covers at least the side of the silver reflective layer.
  • the heat conductive substrate area needs to be not less than the remaining layers, preferably slightly larger than the remaining layer areas, and a slightly larger portion is used to carry the sealing layer 308.
  • each functional layer in the present invention is small, the area of each functional layer is the area of one of the planes, for example, the area of the heat conductive substrate is the contact between the heat conductive substrate and the solder layer or the bonding layer. Face product.
  • the oxygen permeability of the encapsulation layer is less than 500 cc/m 2 .day; further, the oxygen permeability is less than 300 cc/m 2 .day; further, the oxygen permeability is less than 100 cc/m 2 .day .
  • the sealing layer 208 is any one or a combination of epoxy resin, silicone resin, or silica gel.
  • the first surface of the light-emitting layer is provided with an anti-reflection film or roughened.
  • the first surface of the light-emitting layer is one surface of the light-emitting layer away from the heat-dissipating substrate; at the same time, the first surface of the light-emitting layer is also the incident and exit surface of the light of the wavelength conversion device. Providing an anti-reflection film or roughening the surface can improve the light efficiency of the wavelength conversion device.
  • the invention also provides a preparation method of the above wavelength conversion device, which comprises the following steps:
  • Step A coating silver paste on one side of the substrate for baking, drying; then, applying silver paste on the other side of the substrate to be baked, drying; then, sintering at a high temperature; forming a silver reflective layer on one side of the alumina substrate On the other side, a silver bonding layer is formed.
  • the silver paste is a mixed slurry of silver powder and an organic carrier or a mixed slurry of silver powder, a third glass and an organic vehicle.
  • the drying temperature is 60 to 150 °C.
  • the high temperature sintering temperature is 500 to 1000 °C.
  • Step B coating a second glass paste on the silver reflective layer; the luminescent layer is placed on the second glass paste, and then dried and sintered at a high temperature to obtain a stacked luminescent layer, a glass bonding layer, a silver reflective layer, The substrate is sintered and the silver bonding layer.
  • the second glass paste is a mixed slurry of the second glass frit and the organic vehicle.
  • Step C Coating a solder on the silver bonding layer and then soldering it onto the thermally conductive substrate to prepare a wavelength conversion device.
  • the welding method is preferably reflow soldering.
  • the reflow temperature is 280 to 320 °C.
  • step D is further included: applying a sealant paste around the side of the wavelength conversion device to cure to form a seal layer.
  • the curing method differs depending on the sealing layer, and is preferably ultraviolet or high temperature curing. Further, the sealing layer glue is completely coated on the side of the wavelength conversion device to improve the sealing effect.
  • Step A is an important step in the preparation method of the present invention.
  • the silver reflective layer is prepared by first coating a silver paste on the light-emitting layer, and sintering the light-emitting layer as a carrier to obtain a silver reflective layer. Therefore, the reflecting surface of the silver reflective layer and the luminescent layer are in close contact with each other during the preparation process, and the reflecting surface of the silver reflecting layer is sintered under the limited state of the luminescent layer, and the surface flatness of the silver reflecting layer is formed. Depending on the luminescent layer Surface flatness; even if the surface of the luminescent layer is polished, the surface will also have a certain roughness and pores. Therefore, the solution described in the prior art cannot obtain a silver reflective layer reflecting surface with a high surface flatness, thereby further limiting the reflectance.
  • the reflective layer of the wavelength conversion device of the present invention is a silver reflective layer, and the silver reflective layer is obtained by high-temperature sintering of an aluminum substrate or the like as a high-temperature setter, and the reflective surface of the silver reflective layer is in a free sintered state during sintering, that is, There is no other substrate in direct contact with the reflective surface during the sintering process.
  • the sintering process is carried out under a protective atmosphere or in a vacuum.
  • the silver paste is not limited in the sintering process, which is beneficial to the sintering process of the silver paste.
  • the wavelength conversion device of the present invention can be formed during the preparation process.
  • Silver reflective layer with high density and extremely flat surface.
  • the compactness and surface flatness of the silver reflective layer are high.
  • the dense and flat silver reflective layer can have a very high reflectivity, which can improve the light-emitting efficiency of the wavelength conversion device; on the other hand, the dense silver reflective layer has a very high
  • the thermal conductivity reduces the thermal resistance of the wavelength conversion device. Tests have found that the reflective surface reflectance of the silver reflective layer on the substrate is 10% higher than that of the lower surface layer in the free sintered state without any external pressurization.
  • the solder paste is at least one or a combination of solder pastes of gold tin, silver tin, antimony tin, and lead tin.
  • the silver powder particle size in the silver reflective layer ranges from 0.01 to 20 ⁇ m. Further, the raw material silver powder is spherical or flake-shaped.
  • step B further comprises plating the first side of the light-emitting layer with an anti-reflection film or roughening the surface.
  • step A may be replaced by step A1: coating silver paste on one side of the substrate to be fired, drying, and sintering at a high temperature; forming a silver reflective layer on one side of the alumina substrate and vacant on the other side.
  • the silver paste is a mixed slurry of silver powder and an organic carrier or a mixed slurry of silver powder, a third glass and an organic vehicle.
  • the drying temperature is 60 to 150 °C.
  • the high temperature sintering temperature is 500 to 1000 °C.
  • step B may be replaced with step B1: coating a mixed slurry of the second glass and phosphor on the silver reflective layer; then sintering at a high temperature.
  • the mixed slurry of the second glass and the phosphor also includes an organic vehicle.
  • the high temperature sintering temperature is 500 to 1000 °C.
  • step C may be replaced by step C1: coating a thermal conductive adhesive on the silver bonding layer or the substrate, and then bonding to the thermally conductive substrate to prepare a wavelength conversion device.
  • YAG:Ce 3+ ceramic is used as the raw material of the light-emitting layer
  • silicate lead-free glass is used as the second glass raw material
  • silver paste of pure silver powder and organic carrier is used as the raw material of the silver reflective layer
  • the alumina substrate is used as the base.
  • the silver paste of the substrate, the pure silver powder and the organic carrier is used as the raw material of the silver bonding layer
  • the solder of the soldering layer is gold tin or silver tin
  • the heat conductive substrate is selected to be a nickel-plated gold-copper substrate.
  • a wavelength conversion device constructed as in Fig. 1 was prepared.
  • Step A coating silver paste on one side of the substrate to be fired, drying at 60 to 150 ° C; then, applying silver paste on the other side of the substrate to be baked, drying; then, sintering at a high temperature of 500 to 1000 ° C; A silver reflective layer is formed on one surface of the aluminum substrate, and a silver adhesion layer is formed on the other surface.
  • the under-fired substrate selected in this example was an alumina substrate (sapphire substrate) and had a thickness of 1 mm.
  • the silver paste is a mixed slurry of silver powder and an organic carrier. Further, this example was allowed to stand for a while after coating the silver paste.
  • Step B coating a second glass paste on the silver reflective layer; the luminescent layer is placed on the second glass paste, and then dried and sintered at a high temperature to obtain a stacked luminescent layer, a glass bonding layer, a silver reflective layer, The substrate is sintered and the silver bonding layer.
  • the drying temperature is 60 to 150 °C.
  • the high temperature sintering temperature is 500 to 1000 °C.
  • the second glass paste is a mixed slurry of the second glass frit and the organic vehicle, and the silicate lead-free glass is used as the second glass raw material as the second glass raw material.
  • Step C Coating a solder on the silver bonding layer and then soldering it onto the thermally conductive substrate to prepare a wavelength conversion device.
  • the soldering method is preferably reflow soldering.
  • the reflow temperature is 280 to 320 °C.
  • the solder of the solder layer is gold tin or silver tin; the heat conductive substrate is selected from a nickel-plated gold-copper substrate with a thickness of 5 mm.
  • the particle size of the silver powder raw material in the silver reflective layer ranges from 0.01 to 20 ⁇ m; the silver powder raw material is spherical or flake-shaped.
  • the silver powder with a particle size of less than 0.01 ⁇ m is not easily dispersed, and the surface flatness of the silver paste prepared by the silver powder having a particle diameter of more than 20 ⁇ m is not easily controlled, and the silver powder having a larger particle diameter is less likely to be sintered densely on the alumina substrate, and the adhesion is deteriorated.
  • the raw material silver powder is preferably spherical or flake-shaped, and the two shape particles are favorable for forming a close-packed structure, and the sintered silver reflective layer is more dense.
  • the silver powder may also contain platinum powder and/or palladium powder to improve the high temperature migration characteristics of the silver; wherein the palladium and/or platinum powder content does not exceed 30%, otherwise the reflectance may be affected.
  • the organic vehicle consists of a binder and an organic solvent.
  • the binder is ethyl cellulose;
  • the solvent is at least one selected from the group consisting of terpineol, butyl carbitol, butyl carbitol, tributyl citrate and acetyl tributyl citrate.
  • terpineol butyl carbitol
  • butyl carbitol butyl carbitol
  • tributyl citrate acetyl tributyl citrate.
  • acetyl tributyl citrate acetyl tributyl citrate
  • the thickness of the metal solder layer is controlled to be between 0.005 and 0.5 mm; the thickness of the glass bonding layer is controlled to be 0.1 to 100 ⁇ m; and the thickness of the silver reflective layer is controlled to be between 1 and 100 ⁇ m.
  • a wavelength conversion device of a similar structure is prepared as in the first embodiment.
  • the glass bonding layer 202 in this example completely covers the reflecting surface and the side surface of the silver reflecting layer 203.
  • the structure thereof is as shown in FIG. 2, and the wavelength conversion device includes a light-emitting layer 201, a glass bonding layer 202, a silver reflective layer 203, a substrate 140, a silver bonding layer 205, a solder layer 206, and a heat-conducting substrate which are sequentially stacked. 207; wherein the glass bonding layer 202 completely covers the reflecting surface and the side surface of the silver reflecting layer 203; and the side surface of the silver reflecting layer 203 is also covered by the glass bonding layer 202.
  • Step A coating silver paste on one side of the substrate to be baked, drying at 60 to 150 ° C; then, applying silver paste on the other side of the alumina substrate, drying; then, sintering at a high temperature of 500 to 1000 ° C; A silver reflective layer is formed on one surface of the aluminum substrate, and a silver adhesion layer is formed on the other surface.
  • the under-fired substrate selected in this example was an alumina substrate (sapphire substrate) and had a thickness of 0.2 mm.
  • the silver paste is a mixed slurry of silver powder and an organic carrier.
  • Step B coating a second glass paste on the silver reflective layer, the second glass paste completely covering the reflective surface and the side surface of the silver reflective layer; the luminescent layer is placed on the second glass paste, and then dried and sintered at a high temperature A laminated light-emitting layer, a glass bonding layer, a silver reflective layer, a setter substrate, and a silver bonding layer are obtained.
  • the drying temperature is 60 to 150 °C.
  • the high temperature sintering temperature is 500 to 1000 °C.
  • the second glass paste is a mixed slurry of the second glass frit and the organic vehicle, and the silicate lead-free glass is used as the second glass raw material as the second glass raw material.
  • Step C Coating a solder on the silver bonding layer and then soldering it onto the thermally conductive substrate to prepare a wavelength conversion device.
  • the soldering method is preferably reflow soldering.
  • the reflow temperature is 280 to 320 °C.
  • the solder of the solder layer is gold tin or silver tin; the heat conductive substrate is selected from a nickel-plated gold-copper substrate with a thickness of 5 mm.
  • the edge portion of the silver reflecting layer is completely isolated from the air, thereby ensuring blackening of the silver reflecting layer during long-term use, thereby ensuring Long-term optical reliability.
  • a wavelength conversion device of a similar structure is prepared as in the first embodiment.
  • the difference from the first embodiment is that, in addition to the wavelength conversion device produced in the first embodiment, the sealing layer is coated around the side surface thereof.
  • the specific structure is shown in Figure 3.
  • the wavelength conversion device includes a light emitting layer 301, a glass bonding layer 302, a silver reflecting layer 303, a bearing substrate 304, a silver bonding layer 305, a solder layer 306, and a heat conductive substrate 307 which are sequentially stacked; the sealing layer 308 is coated on at least A silver reflective layer 303 is included around the inner side.
  • the heat conductive substrate 307 has an area not less than the remaining layers for carrying the sealing layer 308.
  • step A for step A, step B and step C, please refer to the first embodiment.
  • the area of the heat conductive substrate in step C needs to be not less than the area of the remaining layers. Used to carry a sealing layer.
  • Step D Apply the sealant paste around the side of the wavelength conversion device to cure to form a sealing layer.
  • epoxy resin is used as the sealing layer material and cured by ultraviolet curing. It should be noted that the sealing layer needs to completely cover the silver reflective layer as much as possible to ensure that the silver reflective layer does not come into contact with air during long-term use.
  • the oxygen permeability of the epoxy resin varies depending on the actual type. In this case, it is less than 500 cc/m 2 .day.
  • the silver reflective layer can be blocked from the air as much as possible, thereby ensuring that the silver reflective layer is black during long-term use. The phenomenon ensures long-term optical reliability.
  • a wavelength conversion device as shown in FIG. 4 including a light-emitting layer 401, a glass bonding layer 402, a silver reflective layer 403, a substrate 404, a silver bonding layer 405, a solder layer 406, and heat conduction which are sequentially stacked.
  • the substrate 407 further includes a sealing layer 408 wrapped around the side surface; wherein the light emitting layer also adopts YAG:Ce 3+ ceramic; the glass bonding layer 402 completely covers the reflecting surface and the side surface of the silver reflective layer 403, and the silver reflective layer 403 is ensured.
  • the sides are also covered by a glass bonding layer; at the same time, the thermally conductive substrate 407 has an area not less than the remaining layers for carrying the sealing layer 408. Please refer to other embodiments for the remaining unexpressed parts.
  • Step A please refer to the first embodiment
  • Step B coating a second glass paste on the silver reflective layer, the second glass paste completely covering the reflective surface and the side surface of the silver reflective layer; the luminescent layer is placed on the second glass paste, and then dried and sintered at a high temperature A laminated light-emitting layer, a glass bonding layer, a silver reflective layer, a setter substrate, and a silver bonding layer are obtained.
  • the drying temperature is 60 to 150 °C.
  • the high temperature sintering temperature is 500 to 1000 °C.
  • the second glass paste is a mixed slurry of the second glass frit and the organic vehicle, and the silicate lead-free glass is used as the second glass raw material as the second glass raw material.
  • step C see the first embodiment
  • the area of the heat conductive substrate in step C needs to be not less than the area of the remaining layers. Used to carry a sealing layer.
  • Step D Apply the sealant paste around the side of the wavelength conversion device to cure to form a sealing layer.
  • epoxy resin is used as the sealing layer material and cured by ultraviolet curing. Need note It is intended that the sealing layer needs to completely cover the silver reflective layer as much as possible to ensure that the silver reflective layer does not come into contact with air during prolonged use.
  • the oxygen permeability of the epoxy resin varies depending on the actual type.
  • the wavelength conversion device produced in this example can effectively isolate the different functional layers of the wavelength conversion device, especially the silver reflective layer, from the air to ensure long-term reliability.
  • the luminescent layer and the glass bonding layer are integrally replaced with a luminescent glass layer, and the silver bonding layer and the soldering layer are entirely replaced with a thermal conductive adhesive.
  • the specific structure is as shown in FIG. 5, and includes a light-emitting glass layer 501, a silver reflective layer 503, a heat-insulating substrate 504, a thermal conductive paste 505, and a heat-conductive substrate 507 which are sequentially stacked.
  • the glass in the luminescent glass layer is made of silicate lead-free glass; the thermal conductive adhesive needs to select a high temperature resistant thermal conductive adhesive, wherein the thermally conductive filler is preferably silver powder.
  • Step A coating silver paste on one side of the substrate to be fired, drying at 60 to 150 ° C; then sintering at 500 to 1000 ° C; forming a silver reflective layer on one side of the alumina substrate and vacant on the other side.
  • the setter substrate selected in this example is a sapphire substrate with a thickness of 1 mm.
  • the silver paste is a mixed slurry of silver powder and an organic carrier. Further, this example was allowed to stand for a while after coating the silver paste.
  • Step B coating a mixed slurry of the second glass and the phosphor on the silver reflective layer; then sintering at a high temperature.
  • the organic slurry is further included in the mixed slurry of the second glass and the phosphor.
  • the high temperature sintering temperature is 500 to 1000 °C. It should be noted that the sintering temperature of the luminescent glass layer needs to be controlled so as not to cause the silver reflective layer to be broken; specifically, the sintering temperature is controlled according to the composition of the second glass. In this case, lead-free silicate glass was selected.
  • Step C coating a thermal conductive adhesive on the other side of the substrate, and then bonding the thermal conductive substrate to the thermally conductive substrate to obtain a wavelength conversion device.
  • the heat-conductive substrate is selected from a copper substrate, and the surface thereof is plated with a nickel-gold protective layer.
  • the wavelength conversion device produced in this example employs a light-emitting glass as a light-emitting layer, and incorporates some of the functional layers as compared with the first embodiment.
  • the first surface of the light-emitting layer of the wavelength conversion device obtained in the first embodiment is provided with an anti-reflection film or surface roughening on the first surface of the light-emitting layer.
  • the first surface of the light-emitting layer is one surface of the light-emitting layer away from the heat-dissipating substrate; at the same time, the first surface of the light-emitting layer is also the incident and exit surface of the light of the wavelength conversion device.
  • Providing an anti-reflection film or roughening the surface can improve the light efficiency of the wavelength conversion device.
  • step B The specific implementation process is based on the first embodiment, and the selection of the light-emitting layer in step B may also be:
  • One side of the light-emitting layer is subjected to surface roughening treatment, and the other surface which is not roughened is in contact with the second glass paste and is bonded to the silver reflective layer.
  • the surface roughening of the surface of the light-emitting layer in this example can improve the light efficiency of the wavelength conversion device.
  • a diffuse reflection slurry formed by mixing diffuse reflection particles, glass powder and organic carrier is coated on one side of the aluminum nitride substrate, and then YAG:Ce 3+ ceramic is placed on the diffuse reflection slurry layer and baked at 60 to 150 ° C. Dry; then, 500-1000 ° C high-temperature sintering to form a diffuse reflection layer bonding YAG: Ce 3 + ceramic and aluminum nitride substrate wavelength conversion device. That is, the wavelength conversion device includes a light-emitting layer, a diffuse reflection layer, and an aluminum nitride substrate which are sequentially stacked.
  • the light flux of the wavelength conversion device of Example 1 and Comparative Example 1 shown in Table 1 above is a curve of the light power of the blue laser light.
  • the blue light power is 7 W
  • the luminous flux of the wavelength conversion device of the two is close, as the power of the blue laser power is Increasing to 11.6W
  • the luminous flux of the comparative-wavelength conversion device reaches 4744.0lm, reaching the maximum value
  • the wavelength conversion device cannot withstand the laser excitation of the power, and the luminous flux is decreased
  • the wavelength conversion device of the first wavelength conversion device has a linear increase trend under the excitation of 18.6W laser; it shows that the wavelength conversion device of the metal reflective layer of the invention is more efficient under the high power laser excitation than the current diffuse reflection wavelength conversion device. , the brightness is higher.
  • the other embodiments have similar illuminating characteristics as those of the first embodiment, and the performance thereof is similar to that of the wavelength conversion device in the first embodiment, and details are not described herein again.

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Abstract

Disclosed are a wavelength conversion device (100) and a preparation method therefor, and a light source. The wavelength conversion device (100) comprises a light-emitting layer (101), a glass bonding layer (102), a silver reflective layer (103), a setter substrate (104), a silver bonding layer (105), a welding layer (106) and a heat conducting substrate (107) being successively superposed, wherein the light-emitting layer (101) is an inorganic light-emitting layer capable of absorbing light within a certain wavelength range and emitting light within a different wavelength range. The wavelength conversion device (100) has the characteristics of high reflectivity, low thermal resistance and high long-term reliability.

Description

一种波长转换装置及光源Wavelength conversion device and light source 技术领域Technical field
本申请涉及照明及显示领域,特别涉及一种波长转换装置及其制备方法、光源。The present application relates to the field of illumination and display, and in particular to a wavelength conversion device, a method for fabricating the same, and a light source.
背景技术Background technique
目前激光荧光转换型光源发展较快,已经开始广泛运用于照明及投影显示领域。随着对光源亮度要求的不断提高,激光功率也随之提高,由此波长转换装置发光过程中产生更多的热量,当其温度达到一定温度后,波长转换材料的转换效率随着温度的升高而降低,产生热淬灭(thermal quenching)现象。因此,对于大功率激光光源而言,波长转换装置的高效散热十分必要。At present, the laser fluorescence conversion type light source has developed rapidly and has been widely used in the fields of illumination and projection display. As the brightness requirement of the light source is continuously increased, the laser power is also increased, whereby the wavelength conversion device generates more heat during the illumination process, and when the temperature reaches a certain temperature, the conversion efficiency of the wavelength conversion material increases with the temperature. High and low, resulting in thermal quenching. Therefore, for high-power laser sources, efficient heat dissipation from the wavelength conversion device is necessary.
现有的一种波长转换装置的方案为采用依次叠置的发光层、反射层和基板;其中,波长转换装置的反射层为采用白色散射粒子和玻璃粉混合烧结形成的漫反射层。此方案虽然漫反射层全部由无机材料组成,耐热性较高,但是烧结材料中的散射粒子和玻璃粉的热导率较低;且烧结结构为了保证较高的反射率,一般是多孔结构,热阻较高;因而不利于波长转换装置在高功率激光激发下的散热,也就不利于波长转换装置的发光亮度和稳定性的提高。因而该方案的波长转换装置的漫反射层成为进一步提升激光荧光显示光源亮度的瓶颈。A conventional wavelength conversion device adopts a light-emitting layer, a reflective layer and a substrate which are sequentially stacked. The reflective layer of the wavelength conversion device is a diffuse reflection layer formed by mixing and sintering white scattering particles and glass frit. Although the diffuse reflection layer is composed entirely of inorganic materials, the heat resistance is high, but the thermal conductivity of the scattering particles and the glass powder in the sintered material is low; and the sintered structure is generally a porous structure in order to ensure a high reflectance. The thermal resistance is high; thus, it is not conducive to heat dissipation of the wavelength conversion device under high power laser excitation, which is disadvantageous to the improvement of the luminance and stability of the wavelength conversion device. Therefore, the diffuse reflection layer of the wavelength conversion device of the solution becomes a bottleneck for further increasing the brightness of the laser fluorescent display source.
现有的另一种波长转换装置的方案在以上方案的基础上,采用银反射层替代漫反射层。此方案的好处在于,银反射层的反射率及热导率均高于漫反射层,有利于提高波长转换装置的出光效率、亮度及热稳定性。但是,目前上述方案无法获得表面平整度高的银反射层反射面,进而限制了反射率的进一步提高。因此其发光效率效率还有待进一步提高。Another solution of the existing wavelength conversion device is to replace the diffuse reflection layer with a silver reflective layer on the basis of the above scheme. The advantage of this scheme is that the reflectivity and thermal conductivity of the silver reflective layer are higher than that of the diffuse reflection layer, which is beneficial to improve the light extraction efficiency, brightness and thermal stability of the wavelength conversion device. However, at present, the above solution cannot obtain a silver reflective layer reflecting surface with a high surface flatness, thereby further limiting the reflectance. Therefore, its luminous efficiency efficiency needs to be further improved.
因此,有需要开发一种反射率高、热阻低且可靠性好的波长转换装置。Therefore, there is a need to develop a wavelength conversion device having high reflectance, low thermal resistance, and high reliability.
发明内容Summary of the invention
基于以上问题,本申请旨在提供一种反射率高、热阻低且可靠性高的波长转换装置,特别是适用于大功率激光光源的波长转换装置。Based on the above problems, the present application aims to provide a wavelength conversion device having high reflectance, low thermal resistance, and high reliability, particularly a wavelength conversion device suitable for a high power laser light source.
此外,还提供上述波长转换装置的制备方法及应用上述波长转换装置的光源。Further, a method of preparing the above-described wavelength conversion device and a light source to which the above-described wavelength conversion device is applied are also provided.
本发明采用了以下技术方案:The invention adopts the following technical solutions:
一种波长转换装置,包括依次叠置的发光层、玻璃粘接层、银反射层、承 烧基板、银粘接层、焊接层和导热基板;A wavelength conversion device comprising a light-emitting layer, a glass bonding layer, a silver reflective layer, and a bearing layer which are sequentially stacked Burning a substrate, a silver bonding layer, a soldering layer, and a thermally conductive substrate;
其中,所述发光层为无机发光层,能够吸收一定波长范围的光,并发出不同波长范围的光。优选地,所述发光层为发光陶瓷、发光陶瓷单晶、发光陶瓷共晶或者发光玻璃中的任一种。Wherein, the luminescent layer is an inorganic luminescent layer capable of absorbing light of a certain wavelength range and emitting light of different wavelength ranges. Preferably, the light emitting layer is any one of a light emitting ceramic, a light emitting ceramic single crystal, a light emitting ceramic eutectic or a luminescent glass.
优选地,所述发光陶瓷为石榴石结构的(Lu,Y,Gd,Tb)3(Ga,Al)5O12:Ce3+发光陶瓷,或Al2O3-(Lu,Y,Gd,Tb)3(Ga,Al)5O12:Ce3+的复合陶瓷。Preferably, the luminescent ceramic is a garnet-structured (Lu, Y, Gd, Tb) 3 (Ga, Al) 5 O 12 : Ce 3 + luminescent ceramic, or Al 2 O 3 - (Lu, Y, Gd, Tb) 3 (Ga, Al) 5 O 12 :Ce 3+ composite ceramic.
优选地,所述发光陶瓷单晶为石榴石结构的(Lu,Y,Gd,Tb)3(Ga,Al)5O12:Ce3+发光陶瓷单晶。Preferably, the luminescent ceramic single crystal is a garnet-structured (Lu, Y, Gd, Tb) 3 (Ga, Al) 5 O 12 : Ce 3 + luminescent ceramic single crystal.
优选地,所述发光陶瓷共晶是Al2O3-(Lu,Y,Gd,Tb)3(Ga,Al)5O12:Ce3+的复合陶瓷共晶。Preferably, the luminescent ceramic eutectic is a composite ceramic eutectic of Al 2 O 3 -(Lu,Y,Gd,Tb) 3 (Ga,Al) 5 O 12 :Ce 3+ .
优选地,所述发光玻璃为第一玻璃封装荧光粉的发光玻璃。Preferably, the luminescent glass is a luminescent glass of a first glass-encapsulated phosphor.
优选地,所述玻璃粘接层为是透明的第二玻璃。Preferably, the glass bonding layer is a second glass that is transparent.
优选地,所述玻璃粘接层为第二玻璃粉和有机载体混合成玻璃浆料烧结形成。Preferably, the glass bonding layer is formed by sintering a second glass frit and an organic carrier to form a glass paste.
优选地,所述玻璃粘接层中的第二玻璃为不与Ag元素发生变色反应的玻璃。Preferably, the second glass in the glass bonding layer is glass which does not undergo a color change reaction with the Ag element.
优选地,所述第二玻璃为硅酸盐或硼硅酸盐无铅玻璃;进一步优选为不含Cu、Sn和Sb中的任一元素。Preferably, the second glass is a silicate or borosilicate lead-free glass; further preferably, it does not contain any of Cu, Sn and Sb.
进一步优选地,所述第二玻璃折射率低于1.6。Further preferably, the second glass has a refractive index of less than 1.6.
更进一步优选地,所述第二玻璃折射率低于1.5。Still more preferably, the second glass has a refractive index of less than 1.5.
其中,所述玻璃粘接层厚度为0.1~100μm;优选地,厚度为0.2~30μm,更进一步优选地,厚度为0.5~10μm。The glass bonding layer has a thickness of 0.1 to 100 μm; preferably, the thickness is 0.2 to 30 μm, and even more preferably, the thickness is 0.5 to 10 μm.
其中,所述银反射层和/或所述银粘接层为纯银层或含有银和第三玻璃的复合银层。Wherein, the silver reflective layer and/or the silver bonding layer is a pure silver layer or a composite silver layer containing silver and a third glass.
优选地,银反射层和/或银粘接层是银粉和有机载体混合成银浆烧结形成,或,银粉、第三玻璃粉和有机载体混合成银浆烧结形成。Preferably, the silver reflective layer and/or the silver bonding layer are formed by sintering silver powder and an organic carrier to form a silver paste, or sintering the silver powder, the third glass powder and the organic carrier into a silver paste.
优选地,所述银反射层和/或所述银粘接层的厚度为1~100μm。Preferably, the silver reflective layer and/or the silver bonding layer has a thickness of 1 to 100 μm.
优选地,所述银粉的粒径范围是0.01~20μm;所述银粉优选球形或者片状。Preferably, the silver powder has a particle size ranging from 0.01 to 20 μm; the silver powder is preferably spherical or flake-shaped.
优选地,所述玻璃粘接层完全覆盖所述银反射层的反射面和侧面。Preferably, the glass bonding layer completely covers the reflective surface and the side surface of the silver reflective layer.
其中,所述承烧基板为氧化铝陶瓷基板、蓝宝石基板、氮化硼基板、金属钨基板或金属钼基板中的任一中,优选蓝宝石基板。The sapphire substrate is preferably any one of an alumina ceramic substrate, a sapphire substrate, a boron nitride substrate, a metal tungsten substrate, or a metal molybdenum substrate.
优选地,所述承烧基板的厚度0.1~5mm,进一步优选为0.2~1mm。Preferably, the thickness of the under-fired substrate is 0.1 to 5 mm, and more preferably 0.2 to 1 mm.
其中,所述焊接层为焊锡层或烧结银层。进一步优选地,所述焊锡层为金锡、银锡、铋锡或铅焊锡中的至少一种或组合,或者预成型焊片回流焊接形成。 Wherein, the solder layer is a solder layer or a sintered silver layer. Further preferably, the solder layer is formed by at least one or a combination of gold tin, silver tin, antimony tin or lead solder, or reflow soldering of the preformed soldering piece.
优选地,所述焊接层厚度为0.005~0.5mm。Preferably, the solder layer has a thickness of 0.005 to 0.5 mm.
优选地,所述导热基板为金属基板或陶瓷基板。优选地,所述导热基板为铜、铝、氮化铝、碳化硅、氮化硅或氧化铝陶瓷基板中的任一种。Preferably, the thermally conductive substrate is a metal substrate or a ceramic substrate. Preferably, the thermally conductive substrate is any one of copper, aluminum, aluminum nitride, silicon carbide, silicon nitride or alumina ceramic substrates.
优选地,所述导热基板的厚度为0.1~5mm。Preferably, the thermally conductive substrate has a thickness of 0.1 to 5 mm.
优选地,所述波长转换装置侧面周围至少部分包覆有密封层。Preferably, the periphery of the side of the wavelength conversion device is at least partially covered with a sealing layer.
进一步优选地,所述密封层完全环绕包覆银反射层侧面。Further preferably, the sealing layer completely surrounds the side of the coated silver reflective layer.
优选地,所述密封层为环氧树脂、硅树脂或者硅胶中的任一种或组合。Preferably, the sealing layer is any one or a combination of epoxy resin, silicone resin or silica gel.
优选地,所述封装层透氧率低于500cc/m2.day;进一步优选地,透氧率低于300cc/m2.day;特别优选地,透氧率低于100cc/m2.day。Preferably, the encapsulating layer has an oxygen permeability of less than 500 cc/m 2 .day; further preferably, the oxygen permeability is less than 300 cc/m 2 .day; particularly preferably, the oxygen permeability is less than 100 cc/m 2 .day .
优选地,铜基板或铝基板别表面镀镍金保护层。Preferably, the surface of the copper substrate or the aluminum substrate is plated with a nickel-gold protective layer.
优选地,所述氧化铝陶瓷、陶瓷基板表面镀钛过渡层,然后镀镍金保护层。Preferably, the surface of the alumina ceramic and ceramic substrate is coated with a titanium transition layer, and then a nickel-gold protective layer is plated.
优选地,所述导热基板为平板型式或带鳍片式。Preferably, the thermally conductive substrate is of a flat type or a fin type.
优选地,所述发光层第一面设置有增透膜或者表面粗化。Preferably, the first surface of the light emitting layer is provided with an antireflection film or a surface roughening.
本发明还提供了上述波长转换装置的制备方法,具体包括如下步骤:The invention also provides a preparation method of the above wavelength conversion device, which comprises the following steps:
步骤A:在承烧基板的一面上涂覆银浆,烘干;然后,在承烧基板的另一面涂覆银浆,烘干;接着,高温烧结,在承烧基板的一面形成银反射层,另一面形成银粘接层。Step A: coating silver paste on one side of the substrate to be baked, and then drying; then, coating the silver paste on the other side of the substrate to be dried, and then sintering at a high temperature to form a silver reflective layer on one side of the substrate. On the other side, a silver bonding layer is formed.
其中,银浆为银粉和有机载体的混合浆料或银粉、第三玻璃和有机载体的混合浆料。烘干温度为60~150℃。高温烧结温度为500~1000℃。Among them, the silver paste is a mixed slurry of silver powder and an organic carrier or a mixed slurry of silver powder, a third glass and an organic vehicle. The drying temperature is 60 to 150 °C. The high temperature sintering temperature is 500 to 1000 °C.
步骤B:在银反射层上涂覆第二玻璃浆料;发光层置于第二玻璃浆料上,然后烘干、高温烧结,获得叠置的发光层、玻璃粘接层、银反射层、承烧基板和银粘接层。Step B: coating a second glass paste on the silver reflective layer; the luminescent layer is placed on the second glass paste, and then dried and sintered at a high temperature to obtain a stacked luminescent layer, a glass bonding layer, a silver reflective layer, The substrate is sintered and the silver bonding layer.
其中,第二玻璃浆料为第二玻璃粉、有机载体的混合浆料。The second glass paste is a mixed slurry of the second glass frit and the organic vehicle.
步骤C:在银粘接层上涂覆焊料,然后焊接到导热基板上,制得波长转换装置。Step C: Coating a solder on the silver bonding layer and then soldering it onto the thermally conductive substrate to prepare a wavelength conversion device.
其中,焊接方式优选为回流焊。Among them, the welding method is preferably reflow soldering.
作为优选地实施方案,As a preferred embodiment,
在步骤C之后还包括步骤D:将密封浆胶涂覆于波长转换装置侧面周围,固化形成密封层。Further after step C, step D is further included: applying a sealant paste around the side of the wavelength conversion device to cure to form a seal layer.
其中,优选为紫外或者高温固化。Among them, curing at ultraviolet or high temperature is preferred.
本发明还提供了包括上述波长转换装置的光源,所述光源还包括激发光光源,所述激发光光源为激光器光源、激光二极管光源、发光二极管或由激光二 极管阵列、发光二级管阵列组成的光源中的至少一种或组合。The invention also provides a light source comprising the above wavelength conversion device, the light source further comprising an excitation light source, the excitation light source being a laser source, a laser diode source, a light emitting diode or a laser At least one or a combination of a light tube array and a light source diode array.
本发明的有益效果在于:The beneficial effects of the invention are:
由于上述的波长转换装置的反射层为银反射层,且银反射层是由氧化铝基板等作为高温承烧板高温烧结得到,银反射层反射面在烧结过程中处于自由烧结状态,即该反射面烧结过程中没有与之直接接触的其它基板,银浆在烧结成型过程中不受到限制,有利于银浆在烧结过程中的流动,以形成致密性高的银层;同时,反射面不受到其它基板表面粗糙度或气孔的影响,其表面平整度也极大的提高;因而,本发明波长转换装置在制备过程中能形成致密性及表面平整度极高的银反射层。银反射层的致密性及表面平整度高,一方面致密且平整银反射层能具有极高的反射率,能提高波长转换装置的出光效率;另一方面,致密的银反射层具有极高的导热率,能减小波长转换装置的热阻。同时焊接层同样具有较高的热导率,配合与之焊接在一起的导热基板,提高了整个波长转换装置的导热率。提高了在大功率激光应用上的可靠性。进一步地,通过对具体参数的优化,提高了各层间的粘结强度,提高了在高速色轮应用下的可靠性。Since the reflective layer of the above-mentioned wavelength conversion device is a silver reflective layer, and the silver reflective layer is obtained by high-temperature sintering of an alumina substrate or the like as a high-temperature setter, the reflective surface of the silver reflective layer is in a free sintered state during sintering, that is, the reflection In the process of surface sintering, there is no other substrate directly in contact with it. The silver paste is not limited in the sintering process, which is beneficial to the flow of the silver paste during the sintering process to form a dense silver layer; at the same time, the reflective surface is not affected. The surface flatness of the other substrate is also greatly improved by the surface roughness or the influence of the pores; therefore, the wavelength conversion device of the present invention can form a silver reflective layer having a high density and a very high surface flatness during the preparation process. The compactness and surface flatness of the silver reflective layer are high. On the one hand, the dense and flat silver reflective layer can have a very high reflectivity, which can improve the light-emitting efficiency of the wavelength conversion device; on the other hand, the dense silver reflective layer has a very high The thermal conductivity reduces the thermal resistance of the wavelength conversion device. At the same time, the solder layer also has a high thermal conductivity, and the thermal conductive substrate welded with it improves the thermal conductivity of the entire wavelength conversion device. Increased reliability in high power laser applications. Further, by optimizing the specific parameters, the bonding strength between the layers is improved, and the reliability in the application of the high-speed color wheel is improved.
附图说明DRAWINGS
图1为实施例一所制备的波长转换装置的结构示意图;1 is a schematic structural view of a wavelength conversion device prepared in Embodiment 1;
图2为实施例二所制备的波长转换装置的结构示意图;2 is a schematic structural view of a wavelength conversion device prepared in Embodiment 2;
图3为实施例三所制备的波长转换装置的结构示意图;3 is a schematic structural view of a wavelength conversion device prepared in the third embodiment;
图4为实施例四所制备的波长转换装置的结构示意图;4 is a schematic structural view of a wavelength conversion device prepared in Embodiment 4;
图5为实施例五所制备的波长转换装置的结构示意图。FIG. 5 is a schematic structural view of a wavelength conversion device prepared in the fifth embodiment.
具体实施方式Detailed ways
为了便于理解本发明,下面结合具体实施方式及附图对本发明进行详细的描述。本发明可以有许多种不同的具体实施方式,并不限于本文所描述的实施方式。本文中所述“第一”、“第二”和“第三”等仅为了表述及理解方便进行的定义,并不对本发明构成限定。各部分内容侧重点不同,省略部分参见其他部分即可。In order to facilitate the understanding of the present invention, the present invention will be described in detail below with reference to the specific embodiments and drawings. The invention is capable of a variety of different embodiments and is not limited to the embodiments described herein. The terms "first," "second," and "third," and the like, are used in the context of the description and understanding, and are not intended to limit the invention. The content of each part is different, and the omitted part can be referred to other parts.
如图1所示,波长转换装置100,包括依次叠置的发光层101、玻璃粘接层102、银反射层103、承烧基板104、银粘接层105、焊接层106和导热基板107。As shown in FIG. 1, the wavelength conversion device 100 includes a light-emitting layer 101, a glass bonding layer 102, a silver reflective layer 103, a substrate 140, a silver bonding layer 105, a solder layer 106, and a heat-conducting substrate 107 which are sequentially stacked.
其中,所述发光层为无机发光层,能够吸收一定波长范围的光,并发出不同波长范围的光。Wherein, the luminescent layer is an inorganic luminescent layer capable of absorbing light of a certain wavelength range and emitting light of different wavelength ranges.
作为优选地实施方式,发光层101为发光陶瓷、发光陶瓷单晶、发光陶瓷 共晶或者发光玻璃中的任一种。As a preferred embodiment, the luminescent layer 101 is a luminescent ceramic, a luminescent ceramic single crystal, and a luminescent ceramic. Any of eutectic or luminescent glass.
作为优选地实施方式,发光层101为石榴石结构的(Lu,Y,Gd,Tb)3(Ga,Al)5O12:Ce3+发光陶瓷、(Lu,Y,Gd,Tb)3(Ga,Al)5O12:Ce3+发光陶瓷单晶、Al2O3-(Lu,Y,Gd,Tb)3(Ga,Al)5O12:Ce3+的复合陶瓷或Al2O3-(Lu,Y,Gd,Tb)3(Ga,Al)5O12:Ce3+共晶中任一中。As a preferred embodiment, the light-emitting layer 101 is a garnet-structured (Lu, Y, Gd, Tb) 3 (Ga, Al) 5 O 12 : Ce 3 + luminescent ceramic, (Lu, Y, Gd, Tb) 3 ( Ga,Al) 5 O 12 :Ce 3+ luminescent ceramic single crystal, Al 2 O 3 -(Lu,Y,Gd,Tb) 3 (Ga,Al) 5 O 12 :Ce 3+ composite ceramic or Al 2 O 3 - (Lu, Y, Gd, Tb) 3 (Ga, Al) 5 O 12 : Any of the Ce 3 + eutectic.
作为另一些优选地实施方式,发光层101可以为第一玻璃封装荧光粉的发光玻璃。As still another preferred embodiment, the light-emitting layer 101 may be a light-emitting glass of a first glass-encapsulated phosphor.
在一个具体的实施方式中,可以采用YAG:Ce3+发光陶瓷或者YAG:Ce3+单晶,YAG:Ce3+即为石榴石结构的Y3Al5O12:Ce3+。需要说明的是,常规的发光层,如硅胶封装荧光粉、有机胶封装荧光粉等所制备的发光层,其耐高温性能较差,一般不考虑用于本发明的应用当中。与之相对的,发光陶瓷和发光玻璃等具有很好的机械性能与高温稳定性,特别是极佳的机械性能能够进一步进行研磨抛光等机械加工,能够保证后续工艺步骤的实施。In a specific embodiment, YAG:Ce 3+ luminescent ceramic or YAG:Ce 3+ single crystal, YAG:Ce 3+ is a garnet structure of Y 3 Al 5 O 12 :Ce 3+ . It should be noted that the conventional light-emitting layer, such as a silica gel-encapsulated phosphor, an organic gel-encapsulated phosphor, or the like, has a low-temperature resistance performance and is generally not considered for use in the application of the present invention. In contrast, luminescent ceramics and luminescent glass have good mechanical properties and high temperature stability, especially excellent mechanical properties, which can further perform mechanical processing such as grinding and polishing, and can ensure the implementation of subsequent process steps.
进一步地,发光层101的厚度为0.005~1mm。在其他一些实施方式中,发光层101厚度为0.05~0.5mm。Further, the thickness of the light-emitting layer 101 is 0.005 to 1 mm. In some other embodiments, the luminescent layer 101 has a thickness of 0.05 to 0.5 mm.
其中,玻璃粘接层102为透明的第二玻璃。玻璃粘接层102为第二玻璃粉和有机载体混合成玻璃浆料烧结形成。进一步地,玻璃粘接层102中的第二玻璃为不与Ag元素发生变色反应的玻璃。具体地,第二玻璃为硅酸盐或硼硅酸盐无铅玻璃;进一步优选为不含Cu、Sn和Sb中的任一元素。The glass bonding layer 102 is a transparent second glass. The glass bonding layer 102 is formed by mixing a second glass frit and an organic carrier to form a glass paste. Further, the second glass in the glass bonding layer 102 is glass which does not undergo a color change reaction with the Ag element. Specifically, the second glass is a silicate or borosilicate lead-free glass; further preferably, it does not contain any of Cu, Sn, and Sb.
进一步地,第二玻璃折射率低于1.6。更进一步地,第二玻璃折射率低于1.5。Further, the second glass has a refractive index lower than 1.6. Further, the second glass has a refractive index of less than 1.5.
这里需要说明的是,发光陶瓷中基质折射率较高,如常见的YAG:Ce3+最高可达1.84;我们研究发现,YAG发光陶瓷中的封装材料折射率越接近YAG,高功率激发光源下的发光饱和情况越好。其原因在于,封装材料折射率越接近YAG能减小光在封装材料与YAG界面间的反射损失;而目前大部分不含Cu、Co、Sn和Sb等能与银发生变色反应的元素的玻璃的折射率相对较低;因此采用低折射率的玻璃粘接层102好处就在于:一方面可以保证发光层较高的发光效率的同时,避免发光层101与反射银层103直接接触而产生变色现象,保证了在长时间使用过程中的光学可靠性;另一方面,玻璃粘接层102能以较高的强度粘接银反射层103和发光层,保证波长转换装置的机械可靠性。It should be noted here that the refractive index of the matrix in the luminescent ceramic is relatively high, such as the common YAG:Ce 3+ up to 1.84; we found that the refractive index of the encapsulation material in the YAG luminescent ceramic is closer to YAG, under the high-power excitation light source. The better the saturation of the light. The reason is that the closer the refractive index of the encapsulating material is to YAG, the less the reflection loss of light between the encapsulating material and the YAG interface; at present, most of the glass which does not contain elements such as Cu, Co, Sn and Sb which can react with silver. The refractive index is relatively low; therefore, the advantage of using the low refractive index glass bonding layer 102 is that on the one hand, the higher luminous efficiency of the luminescent layer can be ensured, and the luminescent layer 101 is prevented from directly contacting the reflective silver layer 103 to cause discoloration. The phenomenon ensures optical reliability during long-term use; on the other hand, the glass bonding layer 102 can bond the silver reflective layer 103 and the light-emitting layer with high strength to ensure the mechanical reliability of the wavelength conversion device.
同时,为了保证波长转换装置的导热率,玻璃粘接层厚度不宜过厚;过厚将降低波长转换装置的热导率。其中,玻璃粘接层厚度为0.1~100μm;优选地,厚度为0.2~30μm,更进一步优选地,厚度为0.5~10μm。At the same time, in order to ensure the thermal conductivity of the wavelength conversion device, the thickness of the glass bonding layer should not be too thick; too thick will reduce the thermal conductivity of the wavelength conversion device. The glass bonding layer has a thickness of 0.1 to 100 μm; preferably, the thickness is 0.2 to 30 μm, and even more preferably, the thickness is 0.5 to 10 μm.
可以理解,作为另一些实施方式,当发光层101为第一玻璃封装荧光粉的 发光玻璃时;此时,可以省略玻璃粘接层102,即发光层101直接与银反射层103接触粘接。同时,第一玻璃也应当与第二玻璃的选择类似,具体选择方式请参照第二玻璃。It can be understood that, as other embodiments, when the luminescent layer 101 is the first glass-encapsulated phosphor In the case of illuminating glass, at this time, the glass bonding layer 102 may be omitted, that is, the luminescent layer 101 is directly in contact with the silver reflecting layer 103. At the same time, the first glass should also be similar to the choice of the second glass. For the specific selection method, please refer to the second glass.
其中,银反射层103和/或银粘接层105为纯银层或含有银和第三玻璃的复合银层。优选地,银反射层和/或银粘接层是银粉和有机载体混合成银浆烧结形成,或,银粉、第三玻璃粉和有机载体混合成银浆烧结形成。The silver reflective layer 103 and/or the silver bonding layer 105 is a pure silver layer or a composite silver layer containing silver and a third glass. Preferably, the silver reflective layer and/or the silver bonding layer are formed by sintering silver powder and an organic carrier to form a silver paste, or sintering the silver powder, the third glass powder and the organic carrier into a silver paste.
在一些实施方式中,银反射层103和/或银粘接层105的厚度为1~100μm。需要说明的是,银反射层厚度小于1μm情况下,银浆工艺不容易控制;银反射层厚度大于100μm情况下,不利于烧结得到致密平整的烧结银表面。In some embodiments, the thickness of the silver reflective layer 103 and/or the silver bonding layer 105 is from 1 to 100 μm. It should be noted that, when the thickness of the silver reflective layer is less than 1 μm, the silver paste process is not easy to control; when the thickness of the silver reflective layer is greater than 100 μm, it is disadvantageous for sintering to obtain a dense and flat sintered silver surface.
其中,原料银粉的粒径范围是0.01~20μm。粒径小于0.01μm的银粉不容易分散,粒径大于20μm的银粉制备的银浆表面平整度不容易控制,并且粒径较大的银粉越不容易在氧化铝基板上烧结致密,附着力变差;原料银粉优选球形或者片状,这两种形状颗粒有利于形成密堆积结构,烧结的银反射层更致密。Among them, the raw material silver powder has a particle diameter ranging from 0.01 to 20 μm. The silver powder with a particle size of less than 0.01 μm is not easily dispersed, and the surface flatness of the silver paste prepared by the silver powder having a particle diameter of more than 20 μm is not easily controlled, and the silver powder having a larger particle diameter is less likely to be sintered densely on the alumina substrate, and the adhesion is deteriorated. The raw material silver powder is preferably spherical or flake-shaped, and the two shape particles are favorable for forming a close-packed structure, and the sintered silver reflective layer is more dense.
其中,承烧基板104为氧化铝基板、氮化硼基板、金属钨基板或金属钼基板中的任一中。The under-fired substrate 104 is any one of an alumina substrate, a boron nitride substrate, a metal tungsten substrate, or a metal molybdenum substrate.
作为优选地实施方式,承烧基板104的厚度0.1~5mm,进一步优选为0.2~1mm。由于承烧基板主要用于承载银浆用于烧结出表面平整的银反射层,同时需要考虑到其对波长转换装置热导率的影响;因此需要其厚度需要尽量的小;同时,需要保证其与银反射层之间的粘接强度,因此其优选地为与银有相似晶体结构基板材料,承烧基板优选为氧化铝基板、氮化硼基板、金属钨基板或金属钼基板中的任一中。In a preferred embodiment, the thickness of the set substrate 104 is 0.1 to 5 mm, and more preferably 0.2 to 1 mm. Since the substrate for bearing is mainly used for carrying silver paste for sintering the surface of the silver reflective layer, it is necessary to consider its influence on the thermal conductivity of the wavelength conversion device; therefore, the thickness thereof needs to be as small as possible; at the same time, it needs to be guaranteed. The bonding strength with the silver reflective layer, so it is preferably a substrate material having a crystal structure similar to silver, and the substrate to be burned is preferably any one of an alumina substrate, a boron nitride substrate, a metal tungsten substrate or a metal molybdenum substrate. in.
需要说明的是,银反射层103和银粘接层105可以为纯银层或复合银层中的任一中,二者可以相同,也可以不同;但是,二者作用并不相同。其中,银反射层103主要目的为反射激发光或受激光,需要尽可能高的反射率同时保证良好的热导率;因此,银反射层103优选为纯银层。而银粘接层105主要在承烧基板104和焊接层106之间起到衔接过渡的作用,能将承烧基板104和焊接层10以较高强度的粘接在一起;保证波长转换装置的整体机械可靠性。但是银粘接层105同焊接层与承烧基板的作用机理略有差异。其中,承烧基板104与银粘接层105较高的粘接强度原因在于,烧结的银反射层中银一般处于六方结构,与氧化铝(蓝宝石)的晶格结构一样,因而粘接力好。因而承烧基板可以选择任何六方晶系的陶瓷或者金属,如六方氮化硼陶瓷、耐高温的钨、钼金属以及氧化铝陶瓷。焊接层106与银粘接层105较高的粘接强度原因在于,银与焊接层在焊接的过程中,银能够与金属焊接层形成可靠的焊缝;由锡焊的基本原理 可知,焊缝由金属间化合物构成。显然,该实施方式中,高纯度的银层能够容易的与焊锡膏或预成型焊片中的金属形成金属间化合物,进而形成可靠的焊缝。因此,银粘接层也优选为纯银层。其中,焊锡膏或预成型焊片中的金属成分包括金锡、银锡、铋锡或铅焊等。It should be noted that the silver reflective layer 103 and the silver bonding layer 105 may be either a pure silver layer or a composite silver layer, and the two may be the same or different; however, the roles of the two are not the same. Among them, the silver reflective layer 103 is mainly intended to reflect excitation light or receive laser light, and needs to have the highest possible reflectivity while ensuring good thermal conductivity; therefore, the silver reflective layer 103 is preferably a pure silver layer. The silver bonding layer 105 mainly functions as a transition between the bearing substrate 104 and the solder layer 106, and can bond the bearing substrate 104 and the solder layer 10 with higher strength; ensuring the wavelength conversion device. Overall mechanical reliability. However, the action mechanism of the silver bonding layer 105 is slightly different from that of the solder layer and the substrate. Among them, the reason why the sintered substrate 104 and the silver bonding layer 105 have a high bonding strength is that the silver in the sintered silver reflective layer is generally in a hexagonal structure, and has the same lattice structure as alumina (sapphire), so that the bonding strength is good. Thus, the substrate for the substrate can be selected from any hexagonal ceramic or metal, such as hexagonal boron nitride ceramics, high temperature resistant tungsten, molybdenum metal, and alumina ceramics. The higher bonding strength between the solder layer 106 and the silver bonding layer 105 is that silver can form a reliable weld seam with the metal soldering layer during the soldering process; the basic principle of soldering It can be seen that the weld bead is composed of an intermetallic compound. Obviously, in this embodiment, the high-purity silver layer can easily form an intermetallic compound with the metal in the solder paste or the preformed solder, thereby forming a reliable weld. Therefore, the silver bonding layer is also preferably a pure silver layer. Among them, the metal component in the solder paste or the preformed soldering piece includes gold tin, silver tin, antimony tin or lead solder.
在一些实施方式中,银反射层和/或银粘接层是银粉和有机载体混合成银浆烧结形成,或,银粉、第三玻璃粉和有机载体混合成银浆烧结形成。In some embodiments, the silver reflective layer and/or the silver bonding layer are formed by sintering silver powder and an organic carrier to form a silver paste, or a silver powder, a third glass frit and an organic carrier are mixed to form a silver paste.
进一步地,银粉原料的粒径范围是0.01~20μm;原料银粉优选球形或者片状。Further, the particle size of the silver powder raw material is in the range of 0.01 to 20 μm; the raw material silver powder is preferably spherical or flake-shaped.
其中,焊接层106为焊锡层或烧结银层。进一步地,焊锡层106为金锡、银锡、铋锡或铅焊锡中的至少一种或组合。可以理解,当焊接层106选择为烧结银层,即与银粘接层同样为银层时,两层可以并为一层。即该实施方式中,承烧基板直接通过银粘接层与导热基板粘接,其余各层不变。在另一些实施方式,银粘接层也可以替换为导热胶,其余各层不变。The solder layer 106 is a solder layer or a sintered silver layer. Further, the solder layer 106 is at least one or a combination of gold tin, silver tin, antimony tin or lead solder. It can be understood that when the solder layer 106 is selected to be a sintered silver layer, that is, the same as the silver bonding layer, the two layers may be a single layer. That is, in this embodiment, the underfired substrate is directly bonded to the thermally conductive substrate through the silver bonding layer, and the remaining layers are unchanged. In other embodiments, the silver bonding layer can also be replaced with a thermally conductive adhesive, with the remaining layers unchanged.
其中,导热基板107为金属基板或陶瓷基板。The heat conductive substrate 107 is a metal substrate or a ceramic substrate.
优选地,导热基板107的厚度为0.1~5mm。Preferably, the heat conductive substrate 107 has a thickness of 0.1 to 5 mm.
在一些实施方式中,导热基板107为铜、铝、氮化铝、碳化硅、氮化硅或氧化铝陶瓷基板中的任一种。In some embodiments, the thermally conductive substrate 107 is any one of copper, aluminum, aluminum nitride, silicon carbide, silicon nitride, or alumina ceramic substrates.
优选地,铜基板或铝基板别表面镀镍金保护层。Preferably, the surface of the copper substrate or the aluminum substrate is plated with a nickel-gold protective layer.
优选地,氧化铝陶瓷、陶瓷基板表面镀钛过渡层,然后镀镍金保护层。Preferably, the surface of the alumina ceramic and ceramic substrate is plated with a titanium transition layer, and then a nickel-gold protective layer is plated.
优选地,导热基板为平板型式或带鳍片式。Preferably, the thermally conductive substrate is of a flat type or a fin type.
作为优选地实施方式,如图2中,玻璃粘接层202完全覆盖银反射层203的反射面和侧面。显然,银反射层203被玻璃粘接层202和承烧基板完全包围,与空气完全隔绝。可以理解,玻璃粘接层202完全覆盖银反射层203的反射面和侧面能够最大限度的隔绝密封银反射层203,一方面防止其与发光层接触,另一方面防止其与空气接触而产生的硫化发黑现象。银反射层的反射面为靠近发光层的一面。As a preferred embodiment, as shown in FIG. 2, the glass bonding layer 202 completely covers the reflective surface and the side surface of the silver reflective layer 203. Obviously, the silver reflective layer 203 is completely surrounded by the glass bonding layer 202 and the substrate, completely isolated from the air. It can be understood that the glass bonding layer 202 completely covers the reflecting surface and the side surface of the silver reflective layer 203 to maximize the isolation of the sealed silver reflective layer 203, on the one hand, preventing contact with the luminescent layer, and on the other hand, preventing it from coming into contact with air. Vulcanization blackening phenomenon. The reflecting surface of the silver reflective layer is a side close to the light emitting layer.
作为优选地实施方式,为进一步提高波长转换装置的使用寿命,防止银反射层的黑化;如图3所示,波长转换装置侧面周围至少部分包覆有密封层308。进一步地,密封层308至少完全包覆银反射层侧面。进一步,为了能提高密封层308在波长转换装置侧面的粘接性,导热基板面积需要不小于其余各层,优选为略大于其余各层面积,略大于的部分用于承载密封层308。需要说明的是,由于本发明中相关各个功能层的厚度较小,各个功能层的面积即为其中一个平面的面积,如导热基板的面积即为导热基板与焊接层或粘接层接触的所在面面 积。As a preferred embodiment, in order to further improve the service life of the wavelength conversion device, blackening of the silver reflective layer is prevented; as shown in FIG. 3, the side of the wavelength conversion device is at least partially covered with the sealing layer 308. Further, the sealing layer 308 completely covers at least the side of the silver reflective layer. Further, in order to improve the adhesion of the sealing layer 308 on the side of the wavelength conversion device, the heat conductive substrate area needs to be not less than the remaining layers, preferably slightly larger than the remaining layer areas, and a slightly larger portion is used to carry the sealing layer 308. It should be noted that, because the thickness of each functional layer in the present invention is small, the area of each functional layer is the area of one of the planes, for example, the area of the heat conductive substrate is the contact between the heat conductive substrate and the solder layer or the bonding layer. Face product.
在一些实施方式中,封装层透氧率低于500cc/m2.day;进一步地,透氧率低于300cc/m2.day;更进一步地,透氧率低于100cc/m2.day。具体地,密封层208为环氧树脂、硅树脂或者硅胶中的任一种或组合。In some embodiments, the oxygen permeability of the encapsulation layer is less than 500 cc/m 2 .day; further, the oxygen permeability is less than 300 cc/m 2 .day; further, the oxygen permeability is less than 100 cc/m 2 .day . Specifically, the sealing layer 208 is any one or a combination of epoxy resin, silicone resin, or silica gel.
作为优选地实施方式,发光层第一面设置有增透膜或者进行表面粗化。发光层第一面为发光层远离散热基板的一个面;同时,发光层第一面也是波长转换装置光的入射及出射面。设置有增透膜或者进行表面粗化能够提高波长转换装置的光效。As a preferred embodiment, the first surface of the light-emitting layer is provided with an anti-reflection film or roughened. The first surface of the light-emitting layer is one surface of the light-emitting layer away from the heat-dissipating substrate; at the same time, the first surface of the light-emitting layer is also the incident and exit surface of the light of the wavelength conversion device. Providing an anti-reflection film or roughening the surface can improve the light efficiency of the wavelength conversion device.
本发明还提供了上述波长转换装置的制备方法,具体包括如下步骤:The invention also provides a preparation method of the above wavelength conversion device, which comprises the following steps:
步骤A:在承烧基板的一面上涂覆银浆,烘干;然后,在承烧基板的另一面涂覆银浆,烘干;接着,高温烧结;在氧化铝基板的一面形成银反射层,另一面形成银粘接层。Step A: coating silver paste on one side of the substrate for baking, drying; then, applying silver paste on the other side of the substrate to be baked, drying; then, sintering at a high temperature; forming a silver reflective layer on one side of the alumina substrate On the other side, a silver bonding layer is formed.
其中,银浆为银粉和有机载体的混合浆料或银粉、第三玻璃和有机载体的混合浆料。烘干温度为60~150℃。高温烧结温度为500~1000℃。Among them, the silver paste is a mixed slurry of silver powder and an organic carrier or a mixed slurry of silver powder, a third glass and an organic vehicle. The drying temperature is 60 to 150 °C. The high temperature sintering temperature is 500 to 1000 °C.
其中,为了保证烧结的银反射层的平整度,还可以在涂覆银浆后适当静置一段时间。In order to ensure the flatness of the sintered silver reflective layer, it is also possible to appropriately stand for a certain period of time after the silver paste is applied.
步骤B:在银反射层上涂覆第二玻璃浆料;发光层置于第二玻璃浆料上,然后烘干、高温烧结,获得叠置的发光层、玻璃粘接层、银反射层、承烧基板和银粘接层。Step B: coating a second glass paste on the silver reflective layer; the luminescent layer is placed on the second glass paste, and then dried and sintered at a high temperature to obtain a stacked luminescent layer, a glass bonding layer, a silver reflective layer, The substrate is sintered and the silver bonding layer.
其中,第二玻璃浆料为第二玻璃粉、有机载体的混合浆料。The second glass paste is a mixed slurry of the second glass frit and the organic vehicle.
步骤C:在银粘接层上涂覆焊料,然后焊接到导热基板上,制得波长转换装置。Step C: Coating a solder on the silver bonding layer and then soldering it onto the thermally conductive substrate to prepare a wavelength conversion device.
其中,焊接方式优选为回流焊。回流焊温度为280~320℃。Among them, the welding method is preferably reflow soldering. The reflow temperature is 280 to 320 °C.
作为优选地实施方案,As a preferred embodiment,
在步骤C之后还包括步骤D:将密封浆胶涂覆于波长转换装置侧面周围,固化形成密封层。Further after step C, step D is further included: applying a sealant paste around the side of the wavelength conversion device to cure to form a seal layer.
其中,固化方式根据密封层的不同而不同,优选为紫外或者高温固化。进一步地,密封层胶水完全涂覆包裹波长转换装置侧面,以提高密封的效果。Among them, the curing method differs depending on the sealing layer, and is preferably ultraviolet or high temperature curing. Further, the sealing layer glue is completely coated on the side of the wavelength conversion device to improve the sealing effect.
需要说明的是,步骤A中是本发明制备方法中的重要一步。如背景技术中所述,背景技术中所述方案在制备过程中,银反射层的制备需要先将银浆涂覆在发光层上,以发光层为载体进行烧结以制得银反射层。因此,银反射层中起反射作用的面与发光层在制备过程中就严密接触,银反射层中起反射作用的面属于在发光层的限制状态下烧结而成,银反射层的表面平整度依赖于发光层的 表面平整度;即使将发光层表面进行抛光,其表面同样会有一定的粗糙度和气孔。因而,目前背景技术中所述方案无法获得表面平整度高的银反射层反射面,进而限制了反射率的进一步提高。It should be noted that Step A is an important step in the preparation method of the present invention. As described in the background art, in the preparation process of the prior art, the silver reflective layer is prepared by first coating a silver paste on the light-emitting layer, and sintering the light-emitting layer as a carrier to obtain a silver reflective layer. Therefore, the reflecting surface of the silver reflective layer and the luminescent layer are in close contact with each other during the preparation process, and the reflecting surface of the silver reflecting layer is sintered under the limited state of the luminescent layer, and the surface flatness of the silver reflecting layer is formed. Depending on the luminescent layer Surface flatness; even if the surface of the luminescent layer is polished, the surface will also have a certain roughness and pores. Therefore, the solution described in the prior art cannot obtain a silver reflective layer reflecting surface with a high surface flatness, thereby further limiting the reflectance.
而本发明中的波长转换装置的反射层为银反射层,且银反射层是由氧化铝基板等作为高温承烧板高温烧结得到,银反射层反射面在烧结过程中处于自由烧结状态,即该反射面烧结过程中没有与之直接接触的其它基板,一般情况下烧结过程会在保护气氛下或真空中进行,银浆在烧结成型过程中不受到限制,有利于银浆在烧结过程中的流动,以形成致密性高的银层;同时,反射面不受到其它基板表面粗糙度或气孔的影响,其表面平整度也极大的提高;因而,本发明波长转换装置在制备过程中能形成致密性及表面平整度极高的银反射层。银反射层的致密性及表面平整度高,一方面致密且平整银反射层能具有极高的反射率,能提高波长转换装置的出光效率;另一方面,致密的银反射层具有极高的导热率,能减小波长转换装置的热阻。试验测试发现,在无任何外界加压的自由烧结状态下,承烧基板上银反射层的反射面反射率比下表面层反射率高10%。The reflective layer of the wavelength conversion device of the present invention is a silver reflective layer, and the silver reflective layer is obtained by high-temperature sintering of an aluminum substrate or the like as a high-temperature setter, and the reflective surface of the silver reflective layer is in a free sintered state during sintering, that is, There is no other substrate in direct contact with the reflective surface during the sintering process. Generally, the sintering process is carried out under a protective atmosphere or in a vacuum. The silver paste is not limited in the sintering process, which is beneficial to the sintering process of the silver paste. Flowing to form a dense silver layer; at the same time, the reflective surface is not affected by the surface roughness or pores of other substrates, and the surface flatness is also greatly improved; thus, the wavelength conversion device of the present invention can be formed during the preparation process. Silver reflective layer with high density and extremely flat surface. The compactness and surface flatness of the silver reflective layer are high. On the one hand, the dense and flat silver reflective layer can have a very high reflectivity, which can improve the light-emitting efficiency of the wavelength conversion device; on the other hand, the dense silver reflective layer has a very high The thermal conductivity reduces the thermal resistance of the wavelength conversion device. Tests have found that the reflective surface reflectance of the silver reflective layer on the substrate is 10% higher than that of the lower surface layer in the free sintered state without any external pressurization.
其中,焊锡膏为金锡、银锡,铋锡,铅锡的焊膏中的至少一种或组合。The solder paste is at least one or a combination of solder pastes of gold tin, silver tin, antimony tin, and lead tin.
其中,银反射层中原料银粉粒径范围是0.01~20μm。进一步,原料银粉为球形或者片状。The silver powder particle size in the silver reflective layer ranges from 0.01 to 20 μm. Further, the raw material silver powder is spherical or flake-shaped.
进一步地,在一些实施方式中,步骤B还包括将发光层第一面镀增透膜或者表面粗化。Further, in some embodiments, step B further comprises plating the first side of the light-emitting layer with an anti-reflection film or roughening the surface.
作为另一些实施方式,步骤A可以替换为步骤A1:在承烧基板的一面上涂覆银浆,烘干,高温烧结;在氧化铝基板的一面形成银反射层,另一面空置。As another embodiment, step A may be replaced by step A1: coating silver paste on one side of the substrate to be fired, drying, and sintering at a high temperature; forming a silver reflective layer on one side of the alumina substrate and vacant on the other side.
其中,银浆为银粉和有机载体的混合浆料或银粉、第三玻璃和有机载体的混合浆料。烘干温度为60~150℃。高温烧结温度为500~1000℃。Among them, the silver paste is a mixed slurry of silver powder and an organic carrier or a mixed slurry of silver powder, a third glass and an organic vehicle. The drying temperature is 60 to 150 °C. The high temperature sintering temperature is 500 to 1000 °C.
作为另一些实施方式,步骤B可以替换为步骤B1:在银反射层上涂覆第二玻璃和荧光粉的混合浆料;然后高温烧结。As still other embodiments, step B may be replaced with step B1: coating a mixed slurry of the second glass and phosphor on the silver reflective layer; then sintering at a high temperature.
其中,第二玻璃和荧光粉的混合浆料混合浆料中还包括有机载体。高温烧结温度为500~1000℃。Wherein, the mixed slurry of the second glass and the phosphor also includes an organic vehicle. The high temperature sintering temperature is 500 to 1000 °C.
作为另一些实施方式,步骤C可以替换为步骤C1:在银粘接层或承烧基板上涂覆导热胶,然后粘接到导热基板上,制得波长转换装置。As still another embodiment, step C may be replaced by step C1: coating a thermal conductive adhesive on the silver bonding layer or the substrate, and then bonding to the thermally conductive substrate to prepare a wavelength conversion device.
下面通过具体实施例对本申请作进一步详细说明。以下实施例仅对本申请进行进一步说明,不应理解为对本申请的限制。 The present application is further described in detail below by way of specific embodiments. The following examples are only intended to further illustrate the present application and are not to be construed as limiting the invention.
实施例一Embodiment 1
本例采用YAG:Ce3+陶瓷为发光层原料,硅酸盐无铅玻璃为第二玻璃原料,纯银粉和有机载体的银浆作为银反射层原料,氧化铝基板(蓝宝石基板)作为承烧基板,纯银粉和有机载体的银浆作为银粘接层原料,焊接层的焊料为金锡或银锡,导热基板选择镀镍金铜基板。制备如附图1结构的波长转换装置。In this example, YAG:Ce 3+ ceramic is used as the raw material of the light-emitting layer, silicate lead-free glass is used as the second glass raw material, silver paste of pure silver powder and organic carrier is used as the raw material of the silver reflective layer, and the alumina substrate (sapphire substrate) is used as the base. The silver paste of the substrate, the pure silver powder and the organic carrier is used as the raw material of the silver bonding layer, the solder of the soldering layer is gold tin or silver tin, and the heat conductive substrate is selected to be a nickel-plated gold-copper substrate. A wavelength conversion device constructed as in Fig. 1 was prepared.
具体过程如下:The specific process is as follows:
步骤A:在承烧基板的一面上涂覆银浆,60~150℃烘干;然后,在承烧基板的另一面涂覆银浆,烘干;接着,500~1000℃高温烧结;在氧化铝基板的一面形成银反射层,另一面形成银粘接层。本例中选择的承烧基板为氧化铝基板(蓝宝石基板),厚度为1mm。银浆为银粉和有机载体的混合浆料。进一步地,本例在涂覆银浆后静置了一段时间。Step A: coating silver paste on one side of the substrate to be fired, drying at 60 to 150 ° C; then, applying silver paste on the other side of the substrate to be baked, drying; then, sintering at a high temperature of 500 to 1000 ° C; A silver reflective layer is formed on one surface of the aluminum substrate, and a silver adhesion layer is formed on the other surface. The under-fired substrate selected in this example was an alumina substrate (sapphire substrate) and had a thickness of 1 mm. The silver paste is a mixed slurry of silver powder and an organic carrier. Further, this example was allowed to stand for a while after coating the silver paste.
步骤B:在银反射层上涂覆第二玻璃浆料;发光层置于第二玻璃浆料上,然后烘干、高温烧结,获得叠置的发光层、玻璃粘接层、银反射层、承烧基板和银粘接层。其中烘干温度为60~150℃。高温烧结温度为500~1000℃。本例中,第二玻璃浆料为第二玻璃粉、有机载体的混合浆料,且硅酸盐无铅玻璃作为第二玻璃原料为第二玻璃原料。Step B: coating a second glass paste on the silver reflective layer; the luminescent layer is placed on the second glass paste, and then dried and sintered at a high temperature to obtain a stacked luminescent layer, a glass bonding layer, a silver reflective layer, The substrate is sintered and the silver bonding layer. The drying temperature is 60 to 150 °C. The high temperature sintering temperature is 500 to 1000 °C. In this example, the second glass paste is a mixed slurry of the second glass frit and the organic vehicle, and the silicate lead-free glass is used as the second glass raw material as the second glass raw material.
步骤C:在银粘接层上涂覆焊料,然后焊接到导热基板上,制得波长转换装置。本例中,焊接方式优选为回流焊。回流焊温度为280~320℃。焊接层的焊料为金锡或银锡;导热基板选择镀镍金铜基板,厚度为5mm。Step C: Coating a solder on the silver bonding layer and then soldering it onto the thermally conductive substrate to prepare a wavelength conversion device. In this example, the soldering method is preferably reflow soldering. The reflow temperature is 280 to 320 °C. The solder of the solder layer is gold tin or silver tin; the heat conductive substrate is selected from a nickel-plated gold-copper substrate with a thickness of 5 mm.
其中,银反射层中银粉原料的粒径范围是0.01~20μm;银粉原料为球形或者片状。粒径小于0.01μm的银粉不容易分散,粒径大于20μm的银粉制备的银浆表面平整度不容易控制,并且粒径较大的银粉越不容易在氧化铝基板上烧结致密,附着力变差;原料银粉优选球形或者片状,这两种形状颗粒有利于形成密堆积结构,烧结的银反射层更致密。银粉中还可以包含有铂粉和/或钯粉以改善银的高温迁移特性;其中,钯和/或铂粉含量不超过30%,否则会影响反射率。Wherein, the particle size of the silver powder raw material in the silver reflective layer ranges from 0.01 to 20 μm; the silver powder raw material is spherical or flake-shaped. The silver powder with a particle size of less than 0.01 μm is not easily dispersed, and the surface flatness of the silver paste prepared by the silver powder having a particle diameter of more than 20 μm is not easily controlled, and the silver powder having a larger particle diameter is less likely to be sintered densely on the alumina substrate, and the adhesion is deteriorated. The raw material silver powder is preferably spherical or flake-shaped, and the two shape particles are favorable for forming a close-packed structure, and the sintered silver reflective layer is more dense. The silver powder may also contain platinum powder and/or palladium powder to improve the high temperature migration characteristics of the silver; wherein the palladium and/or platinum powder content does not exceed 30%, otherwise the reflectance may be affected.
有机载体由粘结剂和有机溶剂组成。其中,粘结剂为乙基纤维素;溶剂选自松油醇、丁基卡必醇、丁基卡必醇酯、柠檬酸三丁酯和乙酰柠檬酸三丁酯中的至少一种。本实施例中具体为乙基纤维素和松油醇的混合物。The organic vehicle consists of a binder and an organic solvent. Wherein the binder is ethyl cellulose; the solvent is at least one selected from the group consisting of terpineol, butyl carbitol, butyl carbitol, tributyl citrate and acetyl tributyl citrate. Specifically in this embodiment is a mixture of ethyl cellulose and terpineol.
其中,金属焊接层的厚度控制在0.005~0.5mm之间;玻璃粘接层厚度控制在0.1~100μm;银反射层的厚度控制在1~100μm。The thickness of the metal solder layer is controlled to be between 0.005 and 0.5 mm; the thickness of the glass bonding layer is controlled to be 0.1 to 100 μm; and the thickness of the silver reflective layer is controlled to be between 1 and 100 μm.
实施例二 Embodiment 2
本例同实施例一制备相似结构的波长转换装置。不同之处在于,本例中的玻璃粘接层202完全覆盖银反射层203的反射面和侧面。其结构如附图2所示,该波长转换装置包括依次叠置的发光层201、玻璃粘接层202、银反射层203、承烧基板204、银粘接层205、焊接层206和导热基板207;其中,玻璃粘接层202完全覆盖银反射层203的反射面和侧面;银反射层203的侧面也被玻璃粘接层202覆盖。In this example, a wavelength conversion device of a similar structure is prepared as in the first embodiment. The difference is that the glass bonding layer 202 in this example completely covers the reflecting surface and the side surface of the silver reflecting layer 203. The structure thereof is as shown in FIG. 2, and the wavelength conversion device includes a light-emitting layer 201, a glass bonding layer 202, a silver reflective layer 203, a substrate 140, a silver bonding layer 205, a solder layer 206, and a heat-conducting substrate which are sequentially stacked. 207; wherein the glass bonding layer 202 completely covers the reflecting surface and the side surface of the silver reflecting layer 203; and the side surface of the silver reflecting layer 203 is also covered by the glass bonding layer 202.
具体制备过程如下:The specific preparation process is as follows:
步骤A:在承烧基板的一面上涂覆银浆,60~150℃烘干;然后,在氧化铝基板的另一面涂覆银浆,烘干;接着,500~1000℃高温烧结;在氧化铝基板的一面形成银反射层,另一面形成银粘接层。本例中选择的承烧基板为氧化铝基板(蓝宝石基板),厚度为0.2mm。银浆为银粉和有机载体的混合浆料。Step A: coating silver paste on one side of the substrate to be baked, drying at 60 to 150 ° C; then, applying silver paste on the other side of the alumina substrate, drying; then, sintering at a high temperature of 500 to 1000 ° C; A silver reflective layer is formed on one surface of the aluminum substrate, and a silver adhesion layer is formed on the other surface. The under-fired substrate selected in this example was an alumina substrate (sapphire substrate) and had a thickness of 0.2 mm. The silver paste is a mixed slurry of silver powder and an organic carrier.
步骤B:在银反射层上涂覆第二玻璃浆料,第二玻璃浆料完全覆盖住银反射层的反射面和侧面;发光层置于第二玻璃浆料上,然后烘干、高温烧结,获得叠置的发光层、玻璃粘接层、银反射层、承烧基板和银粘接层。其中烘干温度为60~150℃。高温烧结温度为500~1000℃。本例中,第二玻璃浆料为第二玻璃粉、有机载体的混合浆料,且硅酸盐无铅玻璃作为第二玻璃原料为第二玻璃原料。Step B: coating a second glass paste on the silver reflective layer, the second glass paste completely covering the reflective surface and the side surface of the silver reflective layer; the luminescent layer is placed on the second glass paste, and then dried and sintered at a high temperature A laminated light-emitting layer, a glass bonding layer, a silver reflective layer, a setter substrate, and a silver bonding layer are obtained. The drying temperature is 60 to 150 °C. The high temperature sintering temperature is 500 to 1000 °C. In this example, the second glass paste is a mixed slurry of the second glass frit and the organic vehicle, and the silicate lead-free glass is used as the second glass raw material as the second glass raw material.
步骤C:在银粘接层上涂覆焊料,然后焊接到导热基板上,制得波长转换装置。本例中,焊接方式优选为回流焊。回流焊温度为280~320℃。焊接层的焊料为金锡或银锡;导热基板选择镀镍金铜基板,厚度为5mm。Step C: Coating a solder on the silver bonding layer and then soldering it onto the thermally conductive substrate to prepare a wavelength conversion device. In this example, the soldering method is preferably reflow soldering. The reflow temperature is 280 to 320 °C. The solder of the solder layer is gold tin or silver tin; the heat conductive substrate is selected from a nickel-plated gold-copper substrate with a thickness of 5 mm.
其它部分请参见实施例一。For other parts, please refer to the first embodiment.
本例中,由于玻璃粘接层完全覆盖了银反射层的反射面和侧面,使得银反射层边缘部分完全与空气隔绝,保证了银反射层在长时间使用过程中发生黑化现象,进而保证了长期的光学可靠性。In this example, since the glass bonding layer completely covers the reflecting surface and the side surface of the silver reflecting layer, the edge portion of the silver reflecting layer is completely isolated from the air, thereby ensuring blackening of the silver reflecting layer during long-term use, thereby ensuring Long-term optical reliability.
实施例三Embodiment 3
本例同实施例一制备相似结构的波长转换装置。与实施例一不同之处在于,在实施例一所制得的波长转换装置的基础上,在其侧面周围包覆密封层。具体结构如附图3所示。该波长转换装置包括依次叠置的发光层301、玻璃粘接层302、银反射层303、承烧基板304、银粘接层305、焊接层306和导热基板307;密封层308包覆在至少包括银反射层303在内侧面周围。同时,导热基板307面积不小于其余各层,用以承载密封层308。In this example, a wavelength conversion device of a similar structure is prepared as in the first embodiment. The difference from the first embodiment is that, in addition to the wavelength conversion device produced in the first embodiment, the sealing layer is coated around the side surface thereof. The specific structure is shown in Figure 3. The wavelength conversion device includes a light emitting layer 301, a glass bonding layer 302, a silver reflecting layer 303, a bearing substrate 304, a silver bonding layer 305, a solder layer 306, and a heat conductive substrate 307 which are sequentially stacked; the sealing layer 308 is coated on at least A silver reflective layer 303 is included around the inner side. At the same time, the heat conductive substrate 307 has an area not less than the remaining layers for carrying the sealing layer 308.
具体制备过程如下: The specific preparation process is as follows:
步骤A、步骤B和步骤C,请参见实施例一。For step A, step B and step C, please refer to the first embodiment.
其中,步骤C中导热基板的面积需要不小于其余各层的面积。用于承载密封层。Wherein, the area of the heat conductive substrate in step C needs to be not less than the area of the remaining layers. Used to carry a sealing layer.
步骤D:将密封浆胶涂覆于波长转换装置侧面周围,固化形成密封层。本例中,采用环氧树脂作为密封层材料,同时采用紫外固化的方式固化。需要注意的是,密封层需要尽量完全包覆银反射层,用以保证银反射层在长时间使用过程中不与空气接触。Step D: Apply the sealant paste around the side of the wavelength conversion device to cure to form a sealing layer. In this example, epoxy resin is used as the sealing layer material and cured by ultraviolet curing. It should be noted that the sealing layer needs to completely cover the silver reflective layer as much as possible to ensure that the silver reflective layer does not come into contact with air during long-term use.
其中,环氧树脂的透氧率以实际种类不同而不同。本例中,其低于500cc/m2.day。Among them, the oxygen permeability of the epoxy resin varies depending on the actual type. In this case, it is less than 500 cc/m 2 .day.
本例中制备的波长转换装置,由于在实施例一的基础上侧面周围包覆了一层密封层,能够尽量阻隔银反射层与空气接触,保证了银反射层在长时间使用过程中发生黑化现象,进而保证了长期的光学可靠性。In the wavelength conversion device prepared in this example, since a sealing layer is coated around the side on the basis of the first embodiment, the silver reflective layer can be blocked from the air as much as possible, thereby ensuring that the silver reflective layer is black during long-term use. The phenomenon ensures long-term optical reliability.
实施例四Embodiment 4
本例制备如附图4所示的波长转换装置,包括依次叠置的发光层401、玻璃粘接层402、银反射层403、承烧基板404、银粘接层405、焊接层406和导热基板407,还包括包覆在侧面周围的密封层408;其中,发光层同样采用YAG:Ce3+陶瓷;玻璃粘接层402完全覆盖银反射层403的反射面和侧面,保证银反射层403的侧面也被玻璃粘接层覆盖;同时,导热基板407面积不小于其余各层,用以承载密封层408。其余未说明部分请参见其它实施例。In this example, a wavelength conversion device as shown in FIG. 4 is prepared, including a light-emitting layer 401, a glass bonding layer 402, a silver reflective layer 403, a substrate 404, a silver bonding layer 405, a solder layer 406, and heat conduction which are sequentially stacked. The substrate 407 further includes a sealing layer 408 wrapped around the side surface; wherein the light emitting layer also adopts YAG:Ce 3+ ceramic; the glass bonding layer 402 completely covers the reflecting surface and the side surface of the silver reflective layer 403, and the silver reflective layer 403 is ensured. The sides are also covered by a glass bonding layer; at the same time, the thermally conductive substrate 407 has an area not less than the remaining layers for carrying the sealing layer 408. Please refer to other embodiments for the remaining unexpressed parts.
具体制备过程如下:The specific preparation process is as follows:
步骤A请参照实施例一;Step A, please refer to the first embodiment;
步骤B:在银反射层上涂覆第二玻璃浆料,第二玻璃浆料完全覆盖住银反射层的反射面和侧面;发光层置于第二玻璃浆料上,然后烘干、高温烧结,获得叠置的发光层、玻璃粘接层、银反射层、承烧基板和银粘接层。其中烘干温度为60~150℃。高温烧结温度为500~1000℃。本例中,第二玻璃浆料为第二玻璃粉、有机载体的混合浆料,且硅酸盐无铅玻璃作为第二玻璃原料为第二玻璃原料。Step B: coating a second glass paste on the silver reflective layer, the second glass paste completely covering the reflective surface and the side surface of the silver reflective layer; the luminescent layer is placed on the second glass paste, and then dried and sintered at a high temperature A laminated light-emitting layer, a glass bonding layer, a silver reflective layer, a setter substrate, and a silver bonding layer are obtained. The drying temperature is 60 to 150 °C. The high temperature sintering temperature is 500 to 1000 °C. In this example, the second glass paste is a mixed slurry of the second glass frit and the organic vehicle, and the silicate lead-free glass is used as the second glass raw material as the second glass raw material.
步骤C请参见实施例一;For the step C, see the first embodiment;
其中,步骤C中导热基板的面积需要不小于其余各层的面积。用于承载密封层。Wherein, the area of the heat conductive substrate in step C needs to be not less than the area of the remaining layers. Used to carry a sealing layer.
步骤D:将密封浆胶涂覆于波长转换装置侧面周围,固化形成密封层。本例中,采用环氧树脂作为密封层材料,同时采用紫外固化的方式固化。需要注 意的是,密封层需要尽量完全包覆银反射层,用以保证银反射层在长时间使用过程中不与空气接触。Step D: Apply the sealant paste around the side of the wavelength conversion device to cure to form a sealing layer. In this example, epoxy resin is used as the sealing layer material and cured by ultraviolet curing. Need note It is intended that the sealing layer needs to completely cover the silver reflective layer as much as possible to ensure that the silver reflective layer does not come into contact with air during prolonged use.
其中,环氧树脂的透氧率以实际种类不同而不同。Among them, the oxygen permeability of the epoxy resin varies depending on the actual type.
本例中所制得的波长转换装置,能有效的将波长转换装置的各个不同功能层,特别是银反射层,与空气隔绝开,保证其长期可靠性。The wavelength conversion device produced in this example can effectively isolate the different functional layers of the wavelength conversion device, especially the silver reflective layer, from the air to ensure long-term reliability.
实施例五Embodiment 5
本例将发光层和玻璃粘接层整体替换为发光玻璃层,同时将银粘接层和焊接层整体替换为导热胶。具体结构如附图5所示,包括依次叠置的发光玻璃层501、银反射层503、承烧基板504、导热胶505和导热基板507。其中,发光玻璃层中的玻璃选用硅酸盐无铅玻璃;导热胶需要选择耐高温的导热胶,其中,导热填料优选为银粉。In this example, the luminescent layer and the glass bonding layer are integrally replaced with a luminescent glass layer, and the silver bonding layer and the soldering layer are entirely replaced with a thermal conductive adhesive. The specific structure is as shown in FIG. 5, and includes a light-emitting glass layer 501, a silver reflective layer 503, a heat-insulating substrate 504, a thermal conductive paste 505, and a heat-conductive substrate 507 which are sequentially stacked. Wherein, the glass in the luminescent glass layer is made of silicate lead-free glass; the thermal conductive adhesive needs to select a high temperature resistant thermal conductive adhesive, wherein the thermally conductive filler is preferably silver powder.
具体过程如下:The specific process is as follows:
步骤A:在承烧基板的一面上涂覆银浆,60~150℃烘干;接着,500~1000℃高温烧结;在氧化铝基板的一面形成银反射层,另一面空置。本例中选择的承烧基板为蓝宝石基板,厚度为1mm。银浆为银粉和有机载体的混合浆料。进一步地,本例在涂覆银浆后静置了一段时间。Step A: coating silver paste on one side of the substrate to be fired, drying at 60 to 150 ° C; then sintering at 500 to 1000 ° C; forming a silver reflective layer on one side of the alumina substrate and vacant on the other side. The setter substrate selected in this example is a sapphire substrate with a thickness of 1 mm. The silver paste is a mixed slurry of silver powder and an organic carrier. Further, this example was allowed to stand for a while after coating the silver paste.
步骤B:在银反射层上涂覆第二玻璃和荧光粉的混合浆料;然后高温烧结。Step B: coating a mixed slurry of the second glass and the phosphor on the silver reflective layer; then sintering at a high temperature.
其中,第二玻璃和荧光粉的混合浆料中还包括有机载体。高温烧结温度为500~1000℃。需要注意的是,发光玻璃层的烧结温度需要控制在不使得银反射层破坏为宜;具体地根据第二玻璃的成分控制其烧结温度。本例中选择无铅硅酸盐玻璃。Wherein, the organic slurry is further included in the mixed slurry of the second glass and the phosphor. The high temperature sintering temperature is 500 to 1000 °C. It should be noted that the sintering temperature of the luminescent glass layer needs to be controlled so as not to cause the silver reflective layer to be broken; specifically, the sintering temperature is controlled according to the composition of the second glass. In this case, lead-free silicate glass was selected.
步骤C:在承烧基板的另一面上涂覆导热胶,然后粘接到导热基板上,制得波长转换装置。本例中导热基板选择铜基板,且其表面镀镍金保护层。Step C: coating a thermal conductive adhesive on the other side of the substrate, and then bonding the thermal conductive substrate to the thermally conductive substrate to obtain a wavelength conversion device. In this example, the heat-conductive substrate is selected from a copper substrate, and the surface thereof is plated with a nickel-gold protective layer.
本例中所制得的波长转换装置采用了发光玻璃为发光层,并且与实施例一相比合并了其中的一些功能层。The wavelength conversion device produced in this example employs a light-emitting glass as a light-emitting layer, and incorporates some of the functional layers as compared with the first embodiment.
实施例六Embodiment 6
本例中将实施例一中所制得的波长转换装置的发光层的第一面,发光层第一面设置有增透膜或者进行表面粗化。发光层第一面为发光层远离散热基板的一个面;同时,发光层第一面也是波长转换装置光的入射及出射面。设置有增透膜或者进行表面粗化能够提高波长转换装置的光效。In this example, the first surface of the light-emitting layer of the wavelength conversion device obtained in the first embodiment is provided with an anti-reflection film or surface roughening on the first surface of the light-emitting layer. The first surface of the light-emitting layer is one surface of the light-emitting layer away from the heat-dissipating substrate; at the same time, the first surface of the light-emitting layer is also the incident and exit surface of the light of the wavelength conversion device. Providing an anti-reflection film or roughening the surface can improve the light efficiency of the wavelength conversion device.
具体实施过程在实施例一的基础上,步骤B中发光层的选择还可以为: The specific implementation process is based on the first embodiment, and the selection of the light-emitting layer in step B may also be:
发光层其中一面经过表面粗化处理,其中未粗化的另一面与第二玻璃浆料接触,并与银反射层贴合。One side of the light-emitting layer is subjected to surface roughening treatment, and the other surface which is not roughened is in contact with the second glass paste and is bonded to the silver reflective layer.
其余部分请参见实施例一。For the rest, please refer to the first embodiment.
本例中的发光层表面进行表面粗化能够提高波长转换装置的光效。The surface roughening of the surface of the light-emitting layer in this example can improve the light efficiency of the wavelength conversion device.
对比例一Comparative example one
在氮化铝基板的一面上涂覆由漫反射粒子,玻璃粉,有机载体混合形成的漫反射浆料,然后将YAG:Ce3+陶瓷置于漫反射浆料层上,60~150℃烘干;接着,500~1000℃高温烧结形成漫反射层粘接YAG:Ce3+陶瓷和氮化铝基板的波长转换装置。即波长转换装置包括依次叠置的发光层、漫反射层和氮化铝基板。A diffuse reflection slurry formed by mixing diffuse reflection particles, glass powder and organic carrier is coated on one side of the aluminum nitride substrate, and then YAG:Ce 3+ ceramic is placed on the diffuse reflection slurry layer and baked at 60 to 150 ° C. Dry; then, 500-1000 ° C high-temperature sintering to form a diffuse reflection layer bonding YAG: Ce 3 + ceramic and aluminum nitride substrate wavelength conversion device. That is, the wavelength conversion device includes a light-emitting layer, a diffuse reflection layer, and an aluminum nitride substrate which are sequentially stacked.
表1实施例一与对比例一在不同光功率蓝光激光激发条件下的光通量Table 1 Example 1 and Comparative Example 1 Luminous flux under different optical power blue laser excitation conditions
Figure PCTCN2017114713-appb-000001
Figure PCTCN2017114713-appb-000001
如上表1.所示的实施例一与对比例一的波长转换装置光通量随蓝光激光光功率变化曲线,在蓝光功率为7W时,两者的波长转换装置的光通量接近,随着蓝光激光功率的增加到11.6W,对比例一波长转换装置的光通量达到4744.0lm,达到最大值,蓝光激光功率进一步增加到14W时,此波长转换装置不能承受此功率激光激发,光通量有所下降,而本实施例一的波长转换装置在18.6W激光激发下,光通量一直呈现线性增加趋势;表明,本发明金属反射层的波长转换装置相比目前漫反射的波长转换装置,在大功率激光激发下的效率更高,亮度更高。The light flux of the wavelength conversion device of Example 1 and Comparative Example 1 shown in Table 1 above is a curve of the light power of the blue laser light. When the blue light power is 7 W, the luminous flux of the wavelength conversion device of the two is close, as the power of the blue laser power is Increasing to 11.6W, the luminous flux of the comparative-wavelength conversion device reaches 4744.0lm, reaching the maximum value, and when the blue laser power is further increased to 14W, the wavelength conversion device cannot withstand the laser excitation of the power, and the luminous flux is decreased, and this embodiment The wavelength conversion device of the first wavelength conversion device has a linear increase trend under the excitation of 18.6W laser; it shows that the wavelength conversion device of the metal reflective layer of the invention is more efficient under the high power laser excitation than the current diffuse reflection wavelength conversion device. , the brightness is higher.
其余各实施例与实施例一具有相类似的发光特性,其性能与实施例一中波长转换装置相似,这里不再赘述。The other embodiments have similar illuminating characteristics as those of the first embodiment, and the performance thereof is similar to that of the wavelength conversion device in the first embodiment, and details are not described herein again.
以上实施方式的各技术特征可以进行任意组合,为使得表述简洁,未对所有组合进行详细描述,然而,只要这些技术特征的组合没有矛盾,都应当认为是本说明书记载的范围。 The technical features of the above embodiments may be arbitrarily combined. In order to make the description concise, all the combinations are not described in detail. However, as long as there is no contradiction in the combination of these technical features, it should be considered as the scope of the present specification.
以上内容是结合具体的实施方式对本申请所作的进一步详细说明,不能认定本申请的具体实施只局限于这些说明。对于本申请所属技术领域的普通技术人员来说,在不脱离本申请构思的前提下,还可以做出若干简单推演或替换,都应当视为属于本申请的保护范围。 The above content is a further detailed description of the present application in conjunction with the specific embodiments, and the specific implementation of the present application is not limited to the description. It will be apparent to those skilled in the art that the present invention can be made in the form of the present invention without departing from the scope of the present invention.

Claims (10)

  1. 一种波长转换装置,其特征在于:包括依次叠置的发光层、玻璃粘接层、银反射层、承烧基板、银粘接层、焊接层和导热基板;A wavelength conversion device, comprising: a light emitting layer, a glass bonding layer, a silver reflecting layer, a bearing substrate, a silver bonding layer, a soldering layer and a heat conducting substrate;
    其中,所述发光层为无机发光层,能够吸收一定波长范围的光,并发出不同波长范围的光。Wherein, the luminescent layer is an inorganic luminescent layer capable of absorbing light of a certain wavelength range and emitting light of different wavelength ranges.
  2. 一种波长转换装置,其特征在于:包括依次叠置的发光层、银反射层、承烧基板、粘接层和导热基板;A wavelength conversion device, comprising: a light-emitting layer, a silver reflective layer, a substrate for burning, an adhesive layer and a heat-conducting substrate;
    其中,所述发光层为无机发光层,能够吸收一定波长范围的光,并发出不同波长范围的光;所述粘接层为银粘接层或导热胶。Wherein, the luminescent layer is an inorganic luminescent layer capable of absorbing light of a certain wavelength range and emitting light of different wavelength ranges; the bonding layer is a silver bonding layer or a thermal conductive adhesive.
  3. 根据权利要求1所述的波长转换装置,其特征在于:所述玻璃粘接层为透明的第二玻璃;所述第二玻璃为不与Ag元素产生变色反应的玻璃。The wavelength conversion device according to claim 1, wherein the glass bonding layer is a transparent second glass; and the second glass is glass which does not cause a color change reaction with the Ag element.
  4. 根据权利要求1或2所述的波长转换装置,其特征在于:所述银反射层和/或所述银粘接层为纯银层或含有银和第三玻璃的复合银层。The wavelength conversion device according to claim 1 or 2, wherein the silver reflective layer and/or the silver bonding layer is a pure silver layer or a composite silver layer containing silver and a third glass.
  5. 根据权利要求1所述的波长转换装置,其特征在于:所述玻璃粘接层完全覆盖所述银反射层的反射面和侧面。The wavelength conversion device according to claim 1, wherein said glass bonding layer completely covers a reflecting surface and a side surface of said silver reflecting layer.
  6. 根据权利要求1所述的波长转换装置,其特征在于:所述焊接层为焊锡层或烧结银层。The wavelength conversion device according to claim 1, wherein the solder layer is a solder layer or a sintered silver layer.
  7. 根据权利要求1或2所述的波长转换装置,其特征在于:所述波长转换装置侧面周围至少部分包覆有密封层。The wavelength conversion device according to claim 1 or 2, characterized in that the periphery of the side of the wavelength conversion device is at least partially covered with a sealing layer.
  8. 根据权利要求1所述的波长转换装置,其特征在于:所述导热基板为金属基板或陶瓷基板。The wavelength conversion device according to claim 1, wherein the heat conductive substrate is a metal substrate or a ceramic substrate.
  9. 根据权利要求1或2所述的波长转换装置,其特征在于:所述导热基板的面积不小于其余各层的面积。The wavelength conversion device according to claim 1 or 2, wherein the area of the heat conductive substrate is not smaller than the area of the remaining layers.
  10. 一种光源,包括激发光光源,其特征在于,还包括权利要求1-9中任一所述的波长转换装置。 A light source comprising an excitation light source, characterized by further comprising the wavelength conversion device of any of claims 1-9.
PCT/CN2017/114713 2017-07-13 2017-12-06 Wavelength conversion device and light source WO2019010910A1 (en)

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