WO2018231065A1 - Procédé d'analyse chimique de mesure de tétrafluorométhane, cf4, à sélectivité améliorée - Google Patents
Procédé d'analyse chimique de mesure de tétrafluorométhane, cf4, à sélectivité améliorée Download PDFInfo
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- WO2018231065A1 WO2018231065A1 PCT/NO2018/050153 NO2018050153W WO2018231065A1 WO 2018231065 A1 WO2018231065 A1 WO 2018231065A1 NO 2018050153 W NO2018050153 W NO 2018050153W WO 2018231065 A1 WO2018231065 A1 WO 2018231065A1
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- Prior art keywords
- concentration
- gas
- measurement
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- gases
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- 238000005259 measurement Methods 0.000 title claims abstract description 91
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 title description 127
- 238000009614 chemical analysis method Methods 0.000 title description 3
- 239000007789 gas Substances 0.000 claims abstract description 217
- 238000000034 method Methods 0.000 claims abstract description 105
- 238000010521 absorption reaction Methods 0.000 claims abstract description 42
- 230000003595 spectral effect Effects 0.000 claims abstract description 24
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 claims description 62
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 60
- 229910001868 water Inorganic materials 0.000 claims description 46
- 238000001228 spectrum Methods 0.000 claims description 39
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 26
- 238000012937 correction Methods 0.000 claims description 22
- 239000001272 nitrous oxide Substances 0.000 claims description 20
- 238000000862 absorption spectrum Methods 0.000 claims description 17
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 claims description 13
- 238000004611 spectroscopical analysis Methods 0.000 claims description 11
- 238000004847 absorption spectroscopy Methods 0.000 claims description 7
- 238000000491 multivariate analysis Methods 0.000 claims description 6
- 238000001745 non-dispersive infrared spectroscopy Methods 0.000 claims description 4
- 230000035945 sensitivity Effects 0.000 abstract description 6
- 230000002452 interceptive effect Effects 0.000 description 82
- 238000004458 analytical method Methods 0.000 description 12
- 238000001307 laser spectroscopy Methods 0.000 description 12
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 11
- 229910052782 aluminium Inorganic materials 0.000 description 11
- 238000001514 detection method Methods 0.000 description 11
- 230000003287 optical effect Effects 0.000 description 11
- 238000004422 calculation algorithm Methods 0.000 description 9
- 238000005516 engineering process Methods 0.000 description 8
- 238000012545 processing Methods 0.000 description 8
- 238000005070 sampling Methods 0.000 description 8
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 7
- 235000011089 carbon dioxide Nutrition 0.000 description 7
- 238000012625 in-situ measurement Methods 0.000 description 7
- 239000004411 aluminium Substances 0.000 description 6
- 230000005540 biological transmission Effects 0.000 description 6
- 238000011065 in-situ storage Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 238000012544 monitoring process Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 4
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 4
- 238000013459 approach Methods 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 238000004364 calculation method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- WMIYKQLTONQJES-UHFFFAOYSA-N hexafluoroethane Chemical compound FC(F)(F)C(F)(F)F WMIYKQLTONQJES-UHFFFAOYSA-N 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 229910002091 carbon monoxide Inorganic materials 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 238000001285 laser absorption spectroscopy Methods 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 239000002594 sorbent Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 238000009626 Hall-Héroult process Methods 0.000 description 1
- 238000003723 Smelting Methods 0.000 description 1
- 230000004308 accommodation Effects 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 239000010791 domestic waste Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000002290 gas chromatography-mass spectrometry Methods 0.000 description 1
- 239000005431 greenhouse gas Substances 0.000 description 1
- 230000003116 impacting effect Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000004476 mid-IR spectroscopy Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000005201 scrubbing Methods 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 230000001052 transient effect Effects 0.000 description 1
- 238000000411 transmission spectrum Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/39—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using tunable lasers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
- G01N21/3504—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing gases, e.g. multi-gas analysis
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/42—Absorption spectrometry; Double beam spectrometry; Flicker spectrometry; Reflection spectrometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/42—Absorption spectrometry; Double beam spectrometry; Flicker spectrometry; Reflection spectrometry
- G01J3/433—Modulation spectrometry; Derivative spectrometry
- G01J3/4338—Frequency modulated spectrometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/27—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands using photo-electric detection ; circuits for computing concentration
- G01N21/274—Calibration, base line adjustment, drift correction
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/314—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry with comparison of measurements at specific and non-specific wavelengths
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/0004—Gaseous mixtures, e.g. polluted air
- G01N33/0009—General constructional details of gas analysers, e.g. portable test equipment
- G01N33/0027—General constructional details of gas analysers, e.g. portable test equipment concerning the detector
- G01N33/0036—General constructional details of gas analysers, e.g. portable test equipment concerning the detector specially adapted to detect a particular component
- G01N33/0047—Organic compounds
- G01N33/0049—Halogenated organic compounds
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/314—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry with comparison of measurements at specific and non-specific wavelengths
- G01N2021/3148—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry with comparison of measurements at specific and non-specific wavelengths using three or more wavelengths
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/39—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using tunable lasers
- G01N2021/396—Type of laser source
- G01N2021/399—Diode laser
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/12—Circuits of general importance; Signal processing
- G01N2201/127—Calibration; base line adjustment; drift compensation
- G01N2201/12746—Calibration values determination
- G01N2201/12753—Calibration values determination and storage
Definitions
- TDLS Spectroscopy
- CF4 does not absorb in the near-infrared but displays a strong
- instruments can be used on a gas cell evacuated and filled with process gas.
- the process mass spectrometer provides a near real time measurement of both CF4 and C2F6, as well as several other gas sample components if desired. " The further description follows:
- TDLAS is an infrared absorption technique that uses a diode laser to achieve a very narrow emission source bandwidth. As a result, the specificity of the technique is very good. The sensitivity is also excellent and the instrument is capable of direct measurement of both PFC gas components in electrolytic cell exhaust ducts. It has not been applied to fugitive gas measurements. Consequently, if fugitives are to be measured, laboratory analysis of collected time average samples, or open path methodology using FTIR techniques would provide a viable strategy.
- the TDLAS unit as used for previous PFC measurements is relatively large. A mobile laboratory or trailer is needed to transport the instrument and ancillary sampling equipment from site to site. The equipment as used for past PFC measurements, is not broadly commercially available, is relatively expensive, is specialized and requires
- the main objective with the current invention is to improve selectivity of a gas measurement method for the measurement of CF4 based on tuneable laser spectroscopy in presence of potential interfering gases like CH4, N20 and H20. It is an additional objective with the invention to be able to reduce the interference from these other gases also when the method is operated under normal ambient pressure as well as in-situ.
- the at least one gas causing interference for the measurement of CF4 can be one of or any combination of methane (CH4), water vapour (H2O) and nitrous oxide (N2O).
- the correction of the CF4 concentration can be based on subtraction of at least one absorption spectrum, the at least one absorption spectrum representing the spectrum of at least one gas causing interference for the measurement of CF4, subtracting this at least one other absorption spectrum after the detector signal has been acquired when the laser has been tuned across the spectral feature of CF4, the acquired detector signal representing an absorption spectrum of the target gas possibly comprising CF4 and other gases, subtracting the at least one absorption spectrum from the absorption spectrum of the target gas and finally determining the gas concentration of CF4 from the result of the subtraction of the spectra.
- Figure 6 is similar to figure 5 but for wavelength modulation spectroscopy and second harmonic detection.
- a sine wave is added to the laser current whenever the laser is on.
- the laser current is shown.
- the figure shows a current ramp (1000), an optional dark reference time slot (1 100) and short time slot (1 150) where the laser current is on and where the laser current is constant to allow the laser to stabilise after the dark reference.
- Figure 6 is not to scale and is made to illustrate techniques. Description of reference signs
- a preparatory step for determining the concentration levels of the interfering gases could be based on measurement of the levels of the concentration of the interfering gases as well as on their variations. The conclusion from such measurements could be that one or more interfering gases vary very little in concentration level and could be treated as constant possibly the year round or could be treated as constants within one season of the year where the ambient temperature and/or humidity is stable. Another conclusion could be that the concentration varies so much that the concentration of the interfering gases must be measured continuously to achieve sufficient correction of the measured CF4 concentration. The concentration of one or more of the interfering gases can be measured by the tuneable laser, the tuneable laser that scans across the CF4 spectroscopic feature (4100).
- concentration information can be used either (1 ) to subtract predefined values proportional to the concentrations of the interfering gases (using a table as listed above), or (2) to prepare a background spectrum that is subtracted from the CF4 spectrum, or (3) is used as boundary conditions for advanced signal processing algorithms like Multivariate Analysis or similar methods.
- the above procedure is applicable to DAS and WMS.
- a look-up table must be generated and implemented into the signal- processing implementation prior to the actual CF4 measurements. This table includes information on the influence of the respective interference gas(es) on the CF4 concentration. These values are typically normalized to interference per 1 % or 1 ppm of the gas. Tables for different temperatures and pressures must be stored.
- the recorded spectra during the application will be corrected for the interference by performing a point-to-point subtraction with a scaled interference spectrum.
- the wavenumber range plotted in figure 1 is 1282-1284 cm-1 .
- the CO2 absorption is weak in this region and the curve for the CO2 absorption (4050) overlaps the upper x-axis. This applies for figures 1 , 2, 3 and 4.
- the figures 1 , 2, 3 and 4 covers part of the wavenumber region 1240 to1284 cm-1 .
- the region is free of C02 interference.
- Figure 4 shows the region where an interference free nitrous oxide (N20) line (4400) will be selected according to the first preferred embodiment. Wavenumber is shown on the X-axis and transmission is shown on the Y-axis. The wavenumber range for figure 4 is from 1273 to 1277 cm-1 . The preferred absorption line for measurement of N20 (4400) is indicated with an arrow.
- Figure 5 shows several laser scan cycles for a gas analyser working with direct absorption technology. The laser current is shown. A current ramp (1000) scans the wavelength of the laser across at least one spectral absorption feature for a target gas to be measured. An optional dark reference (1 100) time slot follows where the laser current is off. A short time slot (1 150) where the laser current is on and where the laser current is constant to allow the laser to stabilise after the dark reference follows. Then a new laser scan ramp is performed for the next cycle. Figure 5 is not to scale.
- the concentrations of interferents are determined applying typical DAS or WMS algorithms (including Multivariate Analysis).
- a first preferred embodiment scans across the CF4 feature (4100) and measures the CF4 concentration, scans also across absorption features (4200, 4300, 4400) for 3 interfering gases using the tuneable laser to correct for the interference these 3 gases, CH4, H2O and N2O, impose on the measured CF4 concentration.
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- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Pathology (AREA)
- General Health & Medical Sciences (AREA)
- Biochemistry (AREA)
- Immunology (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Food Science & Technology (AREA)
- Medicinal Chemistry (AREA)
- Optics & Photonics (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
L'invention concerne un procédé de mesure de la concentration de gaz CF4 à sensibilité réduite aux interférences provenant d'autres gaz. Le procédé consiste à pointer un laser réglable à travers un gaz cible, comprenant éventuellement du CF4 et d'autres gaz comprenant éventuellement au moins un gaz provoquant une interférence par rapport à la mesure de la concentration de gaz CF4, sur un détecteur sensible à la lumière, à acquérir et à numériser des signaux provenant du détecteur, le laser étant réglé sur une caractéristique d'absorption spectrale de CF4 (4100) autour de 1283 cm-1. Le procédé consiste en outre à corriger la concentration de gaz CF4 mesurée en fonction de données représentant une concentration desdits gaz provoquant une interférence pour la mesure de la concentration de CF4.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NO20170996A NO345903B1 (en) | 2017-06-16 | 2017-06-16 | Chemical analysis method for measurement of tetrafluoromethane, cf4, with improved selectivity |
NO20170996 | 2017-06-16 |
Publications (1)
Publication Number | Publication Date |
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WO2018231065A1 true WO2018231065A1 (fr) | 2018-12-20 |
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ID=62791794
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PCT/NO2018/050153 WO2018231065A1 (fr) | 2017-06-16 | 2018-06-13 | Procédé d'analyse chimique de mesure de tétrafluorométhane, cf4, à sélectivité améliorée |
Country Status (2)
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NO (1) | NO345903B1 (fr) |
WO (1) | WO2018231065A1 (fr) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112229818A (zh) * | 2019-07-15 | 2021-01-15 | 光谱传感器公司 | 具有宽扫描可调谐二极管激光器的光谱仪 |
EP3957979A4 (fr) * | 2019-05-15 | 2023-01-11 | HORIBA, Ltd. | Appareil d'analyse d'échantillon |
CN117368424A (zh) * | 2023-12-08 | 2024-01-09 | 广东立腾医疗科技有限公司 | 气体浓度检测补偿方法、装置、气体检测设备及存储介质 |
CN117740731A (zh) * | 2024-02-08 | 2024-03-22 | 清华大学合肥公共安全研究院 | 甲烷气体浓度检测方法、存储介质和电子设备 |
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US10113999B2 (en) * | 2014-03-07 | 2018-10-30 | City University Of Hong Kong | Method and a device for detecting a substance |
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2017
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2018
- 2018-06-13 WO PCT/NO2018/050153 patent/WO2018231065A1/fr active Application Filing
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