WO2018176604A1 - 显示面板、线栅偏光片及其制造方法 - Google Patents

显示面板、线栅偏光片及其制造方法 Download PDF

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Publication number
WO2018176604A1
WO2018176604A1 PCT/CN2017/084689 CN2017084689W WO2018176604A1 WO 2018176604 A1 WO2018176604 A1 WO 2018176604A1 CN 2017084689 W CN2017084689 W CN 2017084689W WO 2018176604 A1 WO2018176604 A1 WO 2018176604A1
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Prior art keywords
wire grid
substrate
grid structure
quantum dot
manufacturing
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PCT/CN2017/084689
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English (en)
French (fr)
Inventor
李明辉
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TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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Priority to US15/533,020 priority Critical patent/US10509257B2/en
Publication of WO2018176604A1 publication Critical patent/WO2018176604A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3058—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133528—Polarisers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133528—Polarisers
    • G02F1/133548—Wire-grid polarisers

Definitions

  • the present invention relates to the field of display technologies, and in particular, to a display panel, a wire grid polarizer, and a method of fabricating the same.
  • the nanowire gate polarizer can transmit the incident light perpendicular to the wire grid direction by the direction of the electric field, and reflect the light of the electric field direction parallel to the wire grid direction, by adding an anti-reflection film.
  • the ability of the nanowire grid polarizer to transmit incident light is much larger than that of the conventional polarizer, and the transmittance is over 90%, and the contrast ratio is also 10,000:1, thereby greatly improving the light transmittance of the LCD.
  • contrast which greatly meets the market demand for today's high transmittance and high contrast LCD.
  • the wire grid polarizer since the sub-wavelength line-gate polarizer can achieve excellent durability in a high-temperature or high-humidity environment, the wire grid polarizer has an incomparable advantage in areas such as outdoor where reliability is critical.
  • the nano-imprint technology is generally used to fabricate the wire grid structure.
  • the manufacturing process of the nano imprint is complicated, and the photoresist needs to be embossed, demolded, etched, and removed.
  • Photoresist, etching, etc. due to the nano-scale line width and height of the wire grid structure, the etching process is difficult, the fabricated wire grid is prone to collapse, the photoresist is liable to remain, and the etching is uneven, which seriously affects the polarization of the wire grid. Performance, etc., long production cycle, complicated process and low efficiency.
  • the technical problem to be solved by the present invention is to provide a display panel, a wire grid polarizer and a manufacturing method thereof, which can simplify the process of the wire grid polarizer, improve the fabrication yield, and improve the color gamut, brightness and optical taste of the display panel.
  • the present invention adopts a technical solution to provide a display panel.
  • the display panel includes at least a first substrate and a second substrate disposed opposite to each other, and a liquid crystal sandwiched between the first substrate and the second substrate.
  • the wire grid polarizer comprises a carrier substrate, a quantum dot adhesive layer and a wire grid structure, and the wire grid structure passes through the quantum dot adhesive layer and the carrier
  • the wire grid structure comprises a plurality of spaced-apart wire grids
  • the quantum dot adhesive layer comprises a quantum dot material and an adhesive
  • the wire grid structure has a wire grid period of 100 to 300 nm
  • the wire grid width is 50 to 200 nm.
  • the thickness of the wire grid is 50 ⁇ 500nm
  • the material of the wire grid structure is aluminum, chromium, gold, silver or nickel.
  • another technical solution adopted by the present invention is to provide a method for manufacturing a wire grid polarizer, the manufacturing method comprising: forming a wire grid structure on a mold substrate, wherein the wire grid structure includes a plurality of intervals a wire grid is provided; the wire grid structure is bonded to the carrier substrate using a quantum dot adhesive, wherein the quantum dot adhesive comprises a quantum dot material and a binder; and the wire grid structure is detached from the mold substrate.
  • a wire grid polarizer comprising a carrier substrate, a quantum dot adhesive layer, and a wire grid structure, and the wire grid structure passes through the quantum dots.
  • the adhesive layer is bonded to the carrier substrate, the wire grid structure comprises a plurality of spaced-apart wire grids, and the quantum dot adhesive layer comprises a quantum dot material and a binder.
  • the display panel includes at least a first substrate and a second substrate disposed opposite to each other and sandwiched between the first substrate and the second substrate.
  • the liquid crystal layer is disposed on the first substrate or the second substrate, and the wire grid polarizer is the above-described wire grid polarizer.
  • the invention has the beneficial effects that the present invention forms a wire grid structure on a mold substrate, wherein the wire grid structure comprises a plurality of spaced-apart wire grids; and the wire grid structure and the carrier substrate are bonded by a quantum dot adhesive,
  • the quantum dot adhesive includes a quantum dot material and a binder; the wire grid structure is detached from the mold substrate, and the wire grid structure is bonded to the carrier substrate, which simplifies the process of fabricating the wire grid polarizer, and the adhesive contains
  • the binder of the quantum dot material has high color purity and high brightness due to the excitation of the quantum dot material, which can effectively improve the color gamut and brightness of the display panel, thereby improving the optical taste and the excellent polarization performance of the wire grid structure.
  • a display panel with high color gamut, high penetration and high contrast can be obtained.
  • FIG. 1 is a schematic flow chart showing a method of manufacturing a wire grid polarizer according to an embodiment of the present invention
  • step S11 in FIG. 1 is a schematic flow chart of step S11 in FIG. 1;
  • FIG. 3 is a schematic diagram of a process corresponding to the flow in FIG. 2;
  • FIG. 4 is a schematic diagram of a process corresponding to step S12 and step S13 in FIG. 1;
  • FIG. 5 is a schematic structural view of a wire grid polarizer according to an embodiment of the present invention.
  • FIG. 6 is a schematic structural view of a display panel according to an embodiment of the present invention.
  • FIG. 1 is a schematic flow chart of a method for manufacturing a wire grid polarizer according to an embodiment of the present invention.
  • the method of manufacturing the wire grid polarizer includes the following steps:
  • Step S11 forming a wire grid structure on the mold substrate, wherein the wire grid structure includes a plurality of spaced-apart wire grids.
  • step S11 the plurality of wire grids may be parallel to each other.
  • step S11 please refer to FIG. 2 and FIG. 3, FIG. 2 is a schematic flowchart of step S11 in FIG. 1, and FIG. 3 is a schematic diagram of a process corresponding to the flow in FIG.
  • Forming the wire grid structure 13 on the mold substrate 11 may include the following steps:
  • Step S111 providing a mold substrate.
  • the mold substrate 11 is provided.
  • the mold substrate 11 may be a thermoplastic substrate.
  • the thermoplastic substrate may be a thermoplastic resin.
  • Step S112 imprinting the mold substrate.
  • step S112 for example, nano-imprinting may be performed on the mold substrate 11, specifically, the imprint mold 12 may be heated, and the mold substrate 11 may be imprinted by the imprint mold 12 to form a plurality of on the mold substrate 11.
  • the recess A may specifically be a plurality of spaced and parallel grooves A, and then the imprinting mold 12 is cooled to detach the imprinting mold 12 from the mold substrate 11.
  • Step S113 forming a wire grid in a recess after the die substrate is embossed.
  • the wire grid 131 is formed by, for example, depositing a wire grid material in the recess A of the mold substrate 11 after embossing, and the wire grid 131 of the plurality of grooves A constitutes the wire grid structure 13.
  • the material of the wire grid structure 13 may be a metal material such as aluminum, chromium, gold, silver or nickel. In other embodiments, the material of the wire grid structure 13 may also be other metal materials.
  • Step S12 bonding the wire grid structure and the carrier substrate with a quantum dot adhesive, wherein the quantum dot adhesive comprises a quantum dot material and a binder.
  • FIG. 4 is a schematic diagram of a process corresponding to step S12 and step S13 in FIG.
  • the wire grid structure 13 and the carrier substrate 14 are bonded by the quantum dot adhesive 15.
  • the binder can be glue.
  • the quantum dot binder 15 can be a glue doped with a quantum dot material.
  • Step S13 detaching the wire grid structure from the mold substrate.
  • step S13 for example, the mold substrate 11 is cooled to detach the wire grid structure 13 from the mold substrate 11. Due to the shrinkage effect of the mold substrate 11, in particular, the shrinkage effect of the thermoplastic material is conspicuous, so that a gap is formed between the wire grid structure 13 and the mold substrate 11 after cooling, and can be separated from each other.
  • the wire grid period d1 of the wire grid structure 13 may be 100 to 300 nm
  • the wire grid width d2 may be 50 to 200 nm
  • the wire grid thickness d3 may be 50 to 500 nm.
  • the carrier substrate 14 may be a rigid substrate or a flexible substrate.
  • the rigid substrate may be a glass substrate.
  • the wire grid period d1 of the wire grid structure 13 refers to a distance d1 in which the adjacent two wire grids 131 are staggered, that is, a distance d1 between the side faces of the adjacent two wire grids 131 on the same side, for example, the left side of the adjacent two wire grids 131 The spacing d1 between the side and the left side or the spacing between the right side and the right side.
  • FIG. 5 is a schematic structural diagram of a wire grid polarizer according to an embodiment of the present invention.
  • the wire grid polarizer includes a carrier substrate 21, a quantum dot adhesive layer 22, and a wire grid structure 23, and the wire grid structure 23 is bonded to the carrier substrate 21 through the quantum dot adhesive layer 22, and the wire grid structure 23 includes a plurality of spaced-apart wire grids 231 that include quantum dot material and a binder.
  • the binder can be glue.
  • the material of the wire grid structure 23 may be aluminum, chromium, gold, silver or nickel. In other embodiments, the material of the wire grid structure 23 may also be other metal materials.
  • the wire grid structure 23 has a wire grid period of 100 to 300 nm, a wire grid width of 50 to 200 nm, and a wire grid thickness of 50 to 500 nm.
  • the carrier substrate 21 may be a rigid substrate or a flexible substrate.
  • the rigid substrate may be a glass substrate.
  • FIG. 6 is a schematic structural diagram of a display panel according to an embodiment of the present invention.
  • the display panel may include at least a first substrate 31 and a second substrate 32 disposed opposite to each other, a liquid crystal layer 33 sandwiched between the first substrate 31 and the second substrate 32, disposed on the first substrate 31 or
  • the wire grid polarizer 34 on the second substrate 32, and the wire grid polarizer 34 is the wire grid polarizer in any of the above embodiments.
  • a wire grid polarizer 34 may be disposed on a surface of the first substrate 31 adjacent to the second substrate 32.
  • the wired gate polarizer 34 may be disposed on the surface of the second substrate 32 adjacent to the first substrate 31.
  • the first substrate 31 may be a color filter substrate or a thin film transistor array substrate.
  • the second substrate 32 may also be a color filter substrate or a thin film transistor array substrate.
  • the present invention forms a wire grid structure on a mold substrate, wherein the wire grid structure includes a plurality of spaced-apart wire grids; bonding the wire grid structure and the carrier substrate with a quantum dot adhesive, wherein the quantum dot adhesive includes Quantum dot material and adhesive; detaching the wire grid structure from the mold substrate and bonding the wire grid structure to the carrier substrate can simplify the process of fabricating the wire grid polarizer, and the adhesive uses an adhesive containing a quantum dot material Since the quantum dot material is excited and has high color purity and high brightness, the color gamut, brightness and optical taste of the display panel can be effectively improved, and the excellent polarization performance of the wire grid structure can be obtained, and a high color gamut and high wear can be obtained. Transparent and high contrast display panel.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Polarising Elements (AREA)

Abstract

一种线栅偏光片的制造方法，该制造方法包括：在模具基板（11）上形成线栅结构（13）；将线栅结构（13）与载体基板（14）利用量子点粘合剂（15）进行粘合，其中量子点粘合剂（15）包括量子点材料和粘合剂；将线栅结构（13）从模具基板（11）脱离。该制造方法能够简化线栅偏光片的制程，提高制作良率，并且可以提高显示面板的色域和亮度。

Description

显示面板、线栅偏光片及其制造方法
【技术领域】
本发明涉及显示技术领域，特别是涉及一种显示面板、线栅偏光片及其制造方法。
【背景技术】
与传统的吸收型高分子薄膜偏光板相比，纳米线栅偏光片能够透过电场方向垂直于线栅方向的入射光，而将电场方向平行于线栅方向的光反射，通过增加防反射膜等，纳米线栅偏光片透过入射光的能力远远大于传统的偏光片，透过率可达90%以上，而对比度也有10000：1之高，从而能够大幅度提高LCD的光透过率和对比度，极大了满足如今高透过率和高对比度LCD的市场需求。另外，由于亚波长线栅偏振片可在高温或高湿度环境中实现卓越的耐久性，所以线栅偏光片在户外等信赖性要求严苛的领域具有不可比拟的优势。
目前，一般采用纳米压印技术制作线栅结构，在利用纳米压印技术制作线栅结构的工艺流程中，纳米压印的制作步骤复杂，需要经过压印出光阻、脱模、蚀刻金属、去除光阻、刻蚀等，由于线栅结构纳米级的线宽和高度，刻蚀工艺困难，制作出来的线栅容易出现塌陷，光阻容易残留，刻蚀不均等问题，严重影响线栅的偏光性能等，制作周期长，工艺复杂，效率较低。
【发明内容】
本发明主要解决的技术问题是提供一种显示面板、线栅偏光片及其制造方法，能够简化线栅偏光片的制程，提高制作良率，提高显示面板的色域、亮度和光学品味。
为解决上述技术问题，本发明采用的一个技术方案是：提供一种显示面板，显示面板至少包括相对设置的第一基板和第二基板、夹持在第一基板和第二基板之间的液晶层设置在第一基板或第二基板上的线栅偏光片，其中，线栅偏光片包括载体基板、量子点粘合剂层以及线栅结构，线栅结构通过量子点粘合剂层与载体基板粘接，线栅结构包括多条间隔设置的线栅，量子点粘合剂层包括量子点材料和粘合剂，线栅结构的线栅周期为100~300nm，线栅宽度为50~200nm，线栅厚度为50~500nm，线栅结构的材料为铝、铬、金、银或镍。
为解决上述技术问题，本发明采用的另一个技术方案是：提供一种线栅偏光片的制造方法，该制造方法包括：在模具基板上形成线栅结构，其中，线栅结构包括多条间隔设置的线栅；将线栅结构与载体基板利用量子点粘合剂进行粘合，其中量子点粘合剂包括量子点材料和粘合剂；将线栅结构从模具基板脱离。
为解决上述技术问题，本发明采用的另一个技术方案是：提供一种线栅偏光片，该线栅偏光片包括载体基板、量子点粘合剂层以及线栅结构，线栅结构通过量子点粘合剂层与载体基板粘接，线栅结构包括多条间隔设置的线栅，量子点粘合剂层包括量子点材料和粘合剂。
为解决上述技术问题，本发明采用的又一个技术方案是：提供一种显示面板，该显示面板至少包括相对设置的第一基板和第二基板、夹持在第一基板和第二基板之间的液晶层设置在第一基板或第二基板上的线栅偏光片，线栅偏光片为上述的线栅偏光片。
本发明的有益效果是：本发明通过在模具基板上形成线栅结构，其中，线栅结构包括多条间隔设置的线栅；将线栅结构与载体基板利用量子点粘合剂进行粘合，其中量子点粘合剂包括量子点材料和粘合剂；将线栅结构从模具基板脱离，将线栅结构粘合在载体基板上，能够简化制作线栅偏光片的制程，粘合剂采用含有量子点材料的粘合剂，由于量子点材料受激发后发光的色纯度高，亮度高，可以有效的提高显示面板的色域和亮度，进而提高光学品味，搭配线栅结构优异的偏光性能，可以得到具有高色域，高穿透和高对比度的显示面板。
【附图说明】
图1是本发明实施例中线栅偏光片的制造方法的流程示意图；
图2是图1中步骤S11的流程示意图；
图3是是图2中流程对应的制程示意图；
图4是图1中步骤S12和步骤S13对应的制程示意图；
图5是本发明实施例的线栅偏光片的结构示意图；
图6是本发明实施例的显示面板的结构示意图。
【具体实施方式】
请参阅图1，图1是本发明实施例中线栅偏光片的制造方法的流程示意图。在本实施例中，线栅偏光片的制造方法包括以下步骤：
步骤S11：在模具基板上形成线栅结构，其中，线栅结构包括多条间隔设置的线栅。
在步骤S11中，多条线栅可以相互平行。
在步骤S11中，请参阅图2和图3，图2是图1中步骤S11的流程示意图，图3是是图2中流程对应的制程示意图。在模具基板11上形成线栅结构13可以包括以下步骤：
步骤S111：提供模具基板。
在步骤S111中，例如提供模具基板11。模具基板11可以为热塑性基板。热塑性基板可以为热塑性树脂。
步骤S112：对模具基板进行压印。
在步骤S112中，例如，可对模具基板11进行纳米压印，具体可为：对压印模具12进行加热，用压印模具12对模具基板11进行压印以在模具基板11上形成多个凹处A，具体可为多条间隔设置且平行的凹槽A，然后冷却压印模具12将压印模具12与模具基板11脱离。
步骤S113：在模具基板经过压印后的凹处形成线栅。
在步骤S113中，例如在模具基板11经过压印后的凹处A沉积线栅材料形成线栅131，多个凹槽A中的线栅131构成线栅结构13。线栅结构13的材料可为铝、铬、金、银或镍等金属材料。在其他实施例中，线栅结构13的材料还可以为其他金属材料。
步骤S12：将线栅结构与载体基板利用量子点粘合剂进行粘合，其中量子点粘合剂包括量子点材料和粘合剂。
在步骤S12中，请参阅图4，图4是图1中步骤S12和步骤S13对应的制程示意图。例如，将线栅结构13与载体基板14利用量子点粘合剂15进行粘合。粘合剂可以为胶水。量子点粘合剂15可以为掺杂有量子点材料的胶水。
步骤S13：将线栅结构从模具基板脱离。
在步骤S13中，例如，对模具基板11进行降温以使线栅结构13从模具基板11脱离。由于模具基板11的冷缩效应，尤其是热塑性材料的冷缩效应较为明显，使得冷却后线栅结构13与模具基板11之间产生间隙，彼此能够分离。线栅结构13的线栅周期d1可为100~300nm，线栅宽度d2可为50~200nm，线栅厚度d3可为50~500nm。载体基板14可为硬性基板或者柔性基板。硬性基板可以为玻璃基板。线栅结构13的线栅周期d1是指相邻两线栅131错开的距离d1，也就是相邻两线栅131位于同一侧的侧面之间的间距d1，例如相邻两线栅131的左侧面和左侧面之间的间距d1或者右侧面与右侧面之间的间距。
请参阅图5，图5是本发明实施例的线栅偏光片的结构示意图。在本实施例中，线栅偏光片包括载体基板21、量子点粘合剂层22以及线栅结构23，线栅结构23通过量子点粘合剂层22与载体基板21粘接，线栅结构23包括多条间隔设置的线栅231，量子点粘合剂层22包括量子点材料和粘合剂。
粘合剂可以为胶水。
线栅结构23的材料可为铝、铬、金、银或镍。在其他实施例中，线栅结构23的材料还可以为其他金属材料。
线栅结构23的线栅周期可为100~300nm，线栅宽度为50~200nm，线栅厚度为50~500nm。
载体基板21可为硬性基板或者柔性基板。硬性基板可以为玻璃基板。
请参阅图6，图6是本发明实施例的显示面板的结构示意图。在本实施例中，显示面板至少可包括相对设置的第一基板31和第二基板32、夹持在第一基板31和第二基板32之间的液晶层33、设置在第一基板31或第二基板32上的线栅偏光片34，线栅偏光片34为上述任意一实施例中的线栅偏光片。
例如，第一基板31靠近第二基板32的表面上可以设置有线栅偏光片34。
例如，第二基板32靠近第一基板31的表面上也可以设置有线栅偏光片34。
第一基板31可以为彩色滤光片基板或者薄膜晶体管阵列基板。
第二基板32也可以为彩色滤光片基板或者薄膜晶体管阵列基板。
本发明通过在模具基板上形成线栅结构，其中，线栅结构包括多条间隔设置的线栅；将线栅结构与载体基板利用量子点粘合剂进行粘合，其中量子点粘合剂包括量子点材料和粘合剂；将线栅结构从模具基板脱离，将线栅结构粘合在载体基板上，能够简化制作线栅偏光片的制程，粘合剂采用含有量子点材料的粘合剂，由于量子点材料受激发后发光的色纯度高，亮度高，可以有效的提高显示面板的色域、亮度和光学品味，搭配线栅结构优异的偏光性能，可以得到具有高色域，高穿透和高对比度的显示面板。
以上所述仅为本发明的实施方式，并非因此限制本发明的专利范围，凡是利用本发明说明书及附图内容所作的等效结构或等效流程变换，或直接或间接运用在其他相关的技术领域，均同理包括在本发明的专利保护范围内。

Claims (15)

  1. 一种显示面板，其中，所述显示面板至少包括相对设置的第一基板和第二基板、夹持在所述第一基板和第二基板之间的液晶层设置在第一基板或第二基板上的线栅偏光片，其中，所述线栅偏光片包括载体基板、量子点粘合剂层以及线栅结构，所述线栅结构通过所述量子点粘合剂层与所述载体基板粘接，所述线栅结构包括多条间隔设置的线栅，所述量子点粘合剂层包括量子点材料和粘合剂，所述线栅结构的线栅周期为100~300nm，线栅宽度为50~200nm，线栅厚度为50~500nm，所述线栅结构的材料为铝、铬、金、银或镍。
  2. 根据权利要求1所述的显示面板，其中，所述载体基板为硬性基板或者柔性基板。
  3. 一种线栅偏光片的制造方法，其中，所述制造方法包括：
    在模具基板上形成线栅结构，其中，所述线栅结构包括多条间隔设置的线栅；
    将所述线栅结构与载体基板利用量子点粘合剂进行粘合，其中所述量子点粘合剂包括量子点材料和粘合剂；
    将所述线栅结构从所述模具基板脱离。
  4. 根据权利要求3所述的制造方法，其中，所述在模具基板上形成线栅结构包括：
    提供模具基板；
    对所述模具基板进行压印；
    在所述模具基板经过压印后的凹处形成所述线栅。
  5. 根据权利要求3所述的制造方法，其中，所述将所述线栅结构从所述模具基板脱离包括：
    对所述模具基板进行降温以使所述线栅结构从所述模具基板脱离。
  6. 根据权利要求3所述的制造方法，其中，所述线栅结构的材料为铝、铬、金、银或镍。
  7. 根据权利要求4所述的制造方法，其中，所述线栅结构的材料为铝、铬、金、银或镍。
  8. 根据权利要求5所述的制造方法，其中，所述线栅结构的材料为铝、铬、金、银或镍。
  9. 根据权利要求3所述的制造方法，其中，所述线栅结构的线栅周期为100~300nm，线栅宽度为50~200nm，线栅厚度为50~500nm。
  10. 根据权利要求4所述的制造方法，其中，所述线栅结构的线栅周期为100~300nm，线栅宽度为50~200nm，线栅厚度为50~500nm。
  11. 根据权利要求5所述的制造方法，其中，所述线栅结构的线栅周期为100~300nm，线栅宽度为50~200nm，线栅厚度为50~500nm。
  12. 一种线栅偏光片，其中，所述线栅偏光片包括载体基板、量子点粘合剂层以及线栅结构，所述线栅结构通过所述量子点粘合剂层与所述载体基板粘接，所述线栅结构包括多条间隔设置的线栅，所述量子点粘合剂层包括量子点材料和粘合剂。
  13. 根据权利要求12所述的线栅偏光片，其中，所述线栅结构的材料为铝、铬、金、银或镍。
  14. 根据权利要求12所述的线栅偏光片，其中，所述线栅结构的线栅周期为100~300nm，线栅宽度为50~200nm，线栅厚度为50~500nm。
  15. 根据权利要求12所述的线栅偏光片，其中，所述载体基板为硬性基板或者柔性基板。
PCT/CN2017/084689 2017-03-29 2017-05-17 显示面板、线栅偏光片及其制造方法 Ceased WO2018176604A1 (zh)

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