WO2018170957A1 - 阵列基板及显示装置 - Google Patents

阵列基板及显示装置 Download PDF

Info

Publication number
WO2018170957A1
WO2018170957A1 PCT/CN2017/079894 CN2017079894W WO2018170957A1 WO 2018170957 A1 WO2018170957 A1 WO 2018170957A1 CN 2017079894 W CN2017079894 W CN 2017079894W WO 2018170957 A1 WO2018170957 A1 WO 2018170957A1
Authority
WO
WIPO (PCT)
Prior art keywords
array substrate
alignment film
contact hole
resist layer
contact holes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2017/079894
Other languages
English (en)
French (fr)
Inventor
柴立
王茂林
雷兴
董成才
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TCL China Star Optoelectronics Technology Co Ltd
Original Assignee
Shenzhen China Star Optoelectronics Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shenzhen China Star Optoelectronics Technology Co Ltd filed Critical Shenzhen China Star Optoelectronics Technology Co Ltd
Priority to US15/533,887 priority Critical patent/US10444581B2/en
Publication of WO2018170957A1 publication Critical patent/WO2018170957A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136227—Through-hole connection of the pixel electrode to the active element through an insulation layer
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
    • G02F1/133723—Polyimide, polyamide-imide
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136222—Colour filters incorporated in the active matrix substrate
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/40—Arrangements for improving the aperture ratio
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/441—Interconnections, e.g. scanning lines
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices

Definitions

  • the present invention relates to the field of liquid crystal display technology, and in particular to an array substrate and a display device of the COA technology.
  • Thin film transistor liquid crystal display has attracted much attention due to its small size, low power consumption, and no radiation. It has occupied a dominant position in the field of flat panel display and is widely used in various industries.
  • the liquid crystal display is usually formed by pairing a color film substrate and an array substrate.
  • the color resistance for color development is usually set on the color film substrate, so that the deviation of the box generated during the process of the box may cause light leakage.
  • COA technology Color Filter on Array
  • the array substrate produced by this technology can effectively reduce the light leakage caused by the deviation of the box, thereby effectively increasing the pixel aperture ratio. .
  • the ITO electrically contact with the metal layer in the array substrate it is necessary to provide a contact hole on the color resist layer to expose the metal layer, so that the metal layer is contacted when the ITO layer is formed.
  • the holes are in electrical contact with the ITO.
  • the arrangement of contact holes is increasing.
  • the PI droplet generated in the existing device is at least 75 ng.
  • the PI droplet When the PI droplet is in the contact hole, the PI liquid will be in the contact hole. Air bubbles are formed.
  • FIG. 1a is a schematic cross-sectional view of a prior art alignment film droplet drips directly above a contact hole in a B color resistive layer
  • FIG. 1b is a view showing a contact hole and a column spacer along a normal direction of the array substrate in the prior art.
  • R, G, and B color resists are sequentially arranged from left to right, and contact holes 35 are respectively disposed in the three color resists, and the sub-spacers generally do not interfere with the array substrate, so the sub-isolator is in R.
  • G The projection on the color resist layer is the projection 15, and the column spacer 63 is in contact with the B color resist layer 33.
  • the present invention provides an array substrate and a display device of the COA technology, which can improve the brightness difference caused by the accumulation of the PI alignment film without modifying and upgrading the existing PI alignment film device. Improve product quality.
  • the array substrate of the present invention is provided with a base layer, a metal layer and a color resist layer in this order from bottom to top, and the array substrate is further provided with a contact hole passing through the color resist layer and contacting the metal layer.
  • the contact hole is disposed such that when the alignment film droplet drips directly above the contact hole, the alignment film droplet can be dispersed.
  • the alignment film droplets drip directly above the contact holes, the alignment film droplets can be dispersed, so that air bubbles as in the prior art do not occur.
  • the dispersed alignment film droplets are uniformly distributed in the contact hole and the periphery thereof, thereby avoiding the gap generated by the accumulation of the alignment film, thereby avoiding the difference in display brightness and improving the product quality.
  • the contact hole has an oblong shape when viewed in the normal direction of the array substrate.
  • the shape of the contact hole here is different from the circular or square shape in the prior art.
  • the oblong contact hole has two mutually perpendicular axes, a major axis and a minor axis.
  • the shape of the contact hole can also be set to a rectangular shape.
  • the rectangular contact hole can have the same technical effect as the oblong contact hole.
  • adjacent contact holes are connected to each other as viewed in the normal direction of the array substrate.
  • Such contact holes can still use square or circular shapes in the prior art, except that adjacent contact holes are connected together.
  • the alignment film droplets are dropped directly above the contact hole, since they are connected to the other contact holes, the alignment film droplets are dispersed toward the adjacent contact holes, so that the alignment film is uniformly distributed in the contact holes and Around it.
  • the contact holes are circular in shape along the normal square line of the array substrate, and the adjacent contact holes are connected by grooves.
  • the contact holes have a square shape, and the adjacent contact holes are connected by a groove.
  • Adjacent contact holes are connected by grooves, and the alignment film droplets dropped at the contact holes are dispersed in the direction of the grooves, and are evenly distributed around the contact holes and the grooves.
  • the array substrate further includes an alignment film disposed on the color resist layer. After the droplets of the alignment film at the contact holes are dispersed and uniformly distributed, the entire alignment film can be uniformly distributed on the color resist layer, thereby avoiding the difference in the cell gap due to the accumulation of the alignment film and the resulting difference in display brightness.
  • the component of the alignment film contains a polyimide resin.
  • Polyimide resin is a commonly used alignment film material, which is convenient and easy to obtain.
  • the present invention also provides a display device including a first substrate and a second substrate disposed opposite to each other, and the first substrate is the array substrate described above.
  • the array substrate is provided with a base layer, a metal layer and a color resist layer in this order from bottom to top, and the array substrate is further provided with a contact hole passing through the color resist layer and contacting the metal layer, the contact
  • the pores are arranged such that when the alignment film droplets drips directly above the contact holes, the alignment film droplets can be dispersed. Thereby, the difference in the cell gap due to the accumulation of the alignment film is avoided, and the brightness uniformity of the display device is improved.
  • the array substrate provided by the present invention can improve the structure of the contact hole without modifying and upgrading the existing alignment film device, so that the droplets of the alignment film dripping directly above the contact hole can be dispersed and evenly distributed. Distributed in the contact hole and its surroundings, the difference in cell gap due to the accumulation of the alignment film is avoided, and the brightness uniformity of the display device using the array substrate is improved.
  • 1a is a schematic cross-sectional view of a prior art alignment film droplet dropping over a contact hole in a B color resist layer;
  • 1b is a schematic view showing the position of the contact hole and the spacer along the normal direction of the array substrate in the prior art
  • FIG. 2 is a schematic view showing that the alignment liquid is accumulated around the contact hole after the air bubble is blasted;
  • FIG. 3 is a schematic view showing the structure of a column-shaped spacer paired to an alignment liquid in the prior art
  • FIG. 4 is a schematic cross-sectional structural view of a contact hole of an array substrate of the present invention.
  • FIG. 5 is a schematic view showing the shape of the contact hole in the first embodiment as viewed along the normal direction of the array substrate;
  • FIG. 6 is a schematic view showing the shape of the contact hole in the second embodiment as viewed along the normal direction of the array substrate;
  • FIG. 7 is a schematic view showing the shape of the contact hole in the third embodiment as viewed along the normal direction of the array substrate;
  • FIG. 8 is a schematic view showing the shape of the contact hole in the fourth embodiment as viewed along the normal direction of the array substrate;
  • FIG. 9 is a schematic cross-sectional structural view of an array substrate of the present invention.
  • Figure 10 is a schematic cross-sectional view showing the display device of the present invention.
  • FIG. 4 is a schematic view of an array substrate of the present invention, which is provided with a base layer 55, a metal layer 54, and a color resist layer 53 in this order from bottom to top.
  • a contact hole 52 that passes through the color resist layer 53 and is in contact with the metal layer 54 is further disposed on the array substrate.
  • the contact hole 52 on the array substrate of the present invention is structured such that when the alignment film droplets drip in the contact hole 52 Above the alignment film droplets can be dispersed, as shown in Fig. 4, the dispersed alignment film droplets cause the alignment film 51 to be evenly distributed around the contact holes 52 and its surroundings, avoiding the alignment film accumulation.
  • the contact hole 52 in the B color resist layer will be described below. It should be noted here that the contact hole 52 is not only disposed in the B color resist layer but also in other color resist layers. In addition, in the following embodiments, in order to describe the contents of the present invention in detail, only a schematic diagram of the distribution of the contact holes 52 is given. The specific distribution of the contact holes 52 needs to be determined according to actual needs.
  • Embodiment 1 is a diagrammatic representation of Embodiment 1:
  • FIG. 5 is a view showing the contact hole in the B color resist layer 33 of the present embodiment as viewed along the normal direction of the array substrate. Schematic diagram of the shape of 521.
  • the contact hole 521 has an oblong shape, and the contact hole 521 has a long axis 5211 and a short axis 5212.
  • the alignment film droplets are dropped directly above the contact hole 521, since the short axis 5212 is short, the alignment film droplet cannot be diffused in the direction of the short axis 5212, but it can be diffused in the direction of the long axis 5211.
  • the alignment film droplets are diffused in the direction of the long axis 5211, air bubbles are prevented from occurring inside the alignment film droplets, and the diffused alignment film droplets are uniformly distributed in the contact holes and the periphery thereof. Thus, the alignment film accumulation does not occur, and the resulting cell gap increase and display brightness difference are avoided.
  • Embodiment 2 is a diagrammatic representation of Embodiment 1:
  • FIG. 6 is a schematic view showing the shape of the contact hole 522 in the B color resist layer in the present embodiment as viewed along the normal direction of the array substrate.
  • the shape of the contact hole 522 is a rectangle. Similar to the first embodiment, the contact hole 522 also has a long axis 5221 and a short axis 5222.
  • the alignment film droplets can be diffused in the direction of the long axis 5221, achieving the same effect as in the first embodiment.
  • the corners of the contact hole 522 may be rounded as needed.
  • Embodiment 3 is a diagrammatic representation of Embodiment 3
  • FIG. 7 is a schematic structural view of the contact hole 523 of the embodiment.
  • the contact holes 523 are the same as those of the prior art, except that the adjacent contact holes 523 are connected to each other.
  • the contact hole 523 and the adjacent contact hole 523' are connected by a groove 524.
  • the alignment film droplets are dropped directly above the contact hole 523, although the alignment film droplets cannot be diffused in the circumferential direction of the contact hole 523, the alignment film droplets are oriented toward the groove along the groove 524 due to the arrangement of the grooves 524.
  • the holes 523' are diffused in such a manner that the alignment film droplets are dispersed and uniformly distributed around the contact holes 523 and the grooves 524.
  • the contact hole here may be circular or square, and may be other specific shapes.
  • Embodiment 4 is a diagrammatic representation of Embodiment 4:
  • FIG. 8 is a schematic structural view of the contact hole 525 in the embodiment.
  • the contact hole 525 has a circular shape, and the contact hole 525 is connected to the adjacent other contact hole 525'. Thereby, the length of the contact holes in the intersecting direction is increased, so that the alignment film droplets dropped on the contact holes 525 can be diffused into the contact holes 525' so as to be evenly distributed around the contact holes 525 and the contact holes 525'.
  • intersecting contact holes may also be of other similar shapes, such as hexagons.
  • Embodiment 5 is a diagrammatic representation of Embodiment 5:
  • the contact hole adopts any one of the first embodiment, the second embodiment, the third embodiment or the fourth embodiment. Therefore, when the alignment film droplets drip over the contact hole, the alignment The film droplets can diffuse and evenly distribute around the contact holes.
  • the array substrate in this embodiment is on the color resist layer
  • An alignment film 56 is also provided, as shown in FIG.
  • the alignment film covers the entire array substrate. Since the contact hole 52 and the alignment film 51 therearound are uniformly distributed, the integral alignment film 56 is also uniformly distributed in thickness.
  • the component of the alignment film comprises a polyimide resin.
  • FIG. 10 is a schematic structural view of a display device according to the present invention.
  • the display device includes a first substrate 100 and a second substrate 70 disposed opposite to each other, and a column spacer 63 is disposed between the first substrate 100 and the second substrate 70.
  • the first substrate 100 is the array substrate proposed by the present invention.
  • the first substrate 100 is provided with a base layer 55, a metal layer 54, and a color resist layer 53 in this order from the bottom to the top, and an alignment film 56 is further disposed above the color resist layer 53.
  • the cell gap M around the contact hole 52 is equal to the cell gap M' of the normal display region, thereby avoiding the The difference in brightness caused by the difference in the gap improves the brightness uniformity of the display device.

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

一种COA技术的阵列基板及显示装置。该阵列基板，自下而上依次设置有基底层(55)、金属层(54)和色阻层(53)，还设置有穿过色阻层(53)并与金属层(54)接触的接触孔(52)，接触孔(52)设置为当配向膜液滴滴落在其正上方时，配向膜液滴能够分散开。避免了空气泡和配向膜堆积产生的液晶盒间隙变大的问题。从而在不改造升级现有设备的情况下，避免了由此产生的显示亮度差异，提升了产品品质。显示装置由于采用了该阵列基板，其亮度均一性得到提高。

Description

阵列基板及显示装置
相关申请的交叉引用
本申请要求享有于2017年3月20日提交的名称为“阵列基板、显示装置”的中国专利申请CN201710166671.9的优先权，该申请的全部内容通过引用并入本文中。
技术领域
本发明涉及液晶显示技术领域，具体涉及一种COA技术的阵列基板及显示装置。
背景技术
薄膜晶体管液晶显示器(TFT-LCD)由于具有体积小、功耗低、无辐射等特点而备受关注，在平板显示领域中占据了主导地位，被广泛地应用到各行各业中。液晶显示器通常由彩膜基板和阵列基板对盒而成，现有技术中，用于显色的色阻通常设置于彩膜基板上，因此在对盒过程中产生的对盒偏差会导致漏光问题。COA技术(Color Filter on Array)是一种将彩色光阻制作在阵列基板上的技术，这种技术产生的阵列基板可以有效地减少由于对盒偏差产生的漏光问题，从而有效地提高像素开口率。
在COA技术的阵列基板上，为了使得ITO与阵列基板中的金属层电接触，就需要在色阻层上设置接触孔，以使得金属层暴露，从而在制作ITO层时，使得金属层通过接触孔与ITO电接触。随着产品设计的多样化，接触孔的布置越来越多。在PI配向膜的制作过程中，由于现有PI配向膜设备的局限性，即现有设备中产生的PI液滴最小为75ng，当PI液滴正中接触孔时，PI液会在接触孔内形成空气泡。如图1a为现有技术中配向膜液滴滴落在B色阻层内接触孔正上方时的截面示意图，图1b为现有技术中沿阵列基板法线方向看，接触孔与柱状隔离子的位置示意图。在图1b中，自左至右依次为R、G、B色阻，在三个色阻中分别设置有接触孔35，副隔离子一般不会与阵列基板向抵触，因此副隔离子在R、G 色阻层上的投影为投影15，柱状隔离子63与B色阻层33相抵触。结合图1a和1b，当PI液滴31滴落在B色阻层33与金属层34形成的接触孔35的正上方时，由于接触孔35比较小，PI液滴31无法在接触孔35处分散开，从而在PI液滴31内部形成了空气泡32。在PI预烘烤制程中，随着温度的升高，空气泡32会膨胀爆破，从而导致PI堆积在接触孔35的周围，这样就导致PI堆积处的PI层过厚，如图2所示。在后续制作柱状隔离子过程中，当柱状隔离子对顶到PI层过厚处时，势必会造成此处的液晶盒间隙偏大。如图3所示，柱状隔离子63对顶到PI层堆积处64，导致此处的间隙H比正常显示区H’偏大，从而出现亮度差异，引起亮度斜纹。
发明内容
针对上述现有技术中存在的问题，本发明提出了一种COA技术的阵列基板及显示装置，在不改造升级现有PI配向膜设备的情况下，改善由于PI配向膜堆积导致的亮度差异，提升产品品质。
本发明提出的阵列基板，自下而上依次设置有基底层、金属层和色阻层，所述阵列基板上还设置有穿过所述色阻层并与所述金属层接触的接触孔，所述接触孔设置为当配向膜液滴滴落在所述接触孔的正上方时，所述配向膜液滴能够分散开。
由于配向膜液滴滴落在接触孔的正上方时，配向膜液滴能够分散开，这样就不会出现如现有技术中的空气泡。分散开的配向膜液滴均匀分布在接触孔及其周围，避免了由于配向膜堆积产生的间隙变大，从而避免了由此产生的显示亮度差异，提升了产品品质。
作为对本发明的进一步改进，当沿所述阵列基板的法线方向观测时，接触孔的形状为长圆形。这里的接触孔的形状不同于现有技术中的圆形或方形。长圆形的接触孔有两条相互垂直的轴线，长轴和短轴。当配向膜液滴滴落在接触孔正上方时，虽然配向膜液滴不能沿短轴方向分散，但能够沿长轴方向分散开，均匀分布在接触孔及其周围，避免了配向膜堆积导致的液晶盒间隙变大和由此产生的显示亮度差异。
作为对接触孔的进一步改进，接触孔的形状还可以设置为长方形。长方形的接触孔可以与长圆形的接触孔起到同样的技术效果。
作为对本发明的进一步改进，沿所述阵列基板的法线方向观测，相邻的所述接触孔之间彼此相连。
这样的接触孔仍可以使用现有技术中的方形或圆形，不同的是，相邻的接触孔连接在一起。当配向膜液滴滴落在接触孔的正上方时，由于其与另外的接触孔相连，配向膜液滴会随之向相邻的接触孔方向分散，从而使得配向膜均匀分布在接触孔及其周围。
作为对本发明的进一步改进，沿所述阵列基板的法线方线观测，所述接触孔的形状为圆形，相邻的所述接触孔之间通过沟槽相连。或者，所述接触孔的形状为方形，相邻的所述接触孔之间通过沟槽相连。
相邻的接触孔之间通过沟槽相连，滴落在接触孔处的配向膜液滴沿着沟槽方向分散开，均匀分布在接触孔及沟槽周围。
作为对本发明的阵列基板的进一步改进，该阵列基板还包括设置在所述色阻层上的配向膜。接触孔处的配向膜液滴分散开并均匀分布后，能够使得整个配向膜均匀分布在色阻层上，避免了由于配向膜堆积产生的液晶盒间隙差异和由此产生的显示亮度差异。
进一步，配向膜的成分包含聚酰亚胺树脂。聚酰亚胺树脂是常用的配向膜材料，方便易得。
本发明同时提出了一种显示装置，该显示装置包括相对设置的第一基板和第二基板，第一基板为上述所述的阵列基板。该阵列基板，自下而上依次设置有基底层、金属层和色阻层，所述阵列基板上还设置有穿过所述色阻层并与所述金属层接触的接触孔，所述接触孔设置为当配向膜液滴滴落在所述接触孔的正上方时，所述配向膜液滴能够分散开。从而避免了由于配向膜堆积产生的液晶盒间隙差异，提高了显示装置的亮度均一性。
总之，本发明提出的阵列基板，在不改造升级现有配向膜设备的情况下，通过对接触孔的结构的改进，使得滴落在接触孔的正上方的配向膜液滴能够分散开，均匀分布在接触孔及其周围，避免了由于配向膜堆积产生的液晶盒间隙差异，提高了使用该阵列基板的显示装置的亮度均一性。
附图说明
在下文中将基于实施例并参考附图来对本发明进行更详细的描述。其中：
图1a为现有技术中配向膜液滴滴落在B色阻层内的接触孔上方的截面示意图；
图1b为现有技术中沿阵列基板法线方向看，接触孔与隔离子的位置示意图；
图2为空气泡爆破后导致配向液堆积在接触孔周围的示意图；
图3为现有技术中，柱状隔离子对顶到配向液堆积处的结构示意图；
图4为本发明的阵列基板的接触孔处的剖面结构示意图；
图5为沿阵列基板法线方向观测，实施例一中的接触孔的形状示意图；
图6为沿阵列基板法线方向观测，实施例二中的接触孔的形状示意图；
图7为沿阵列基板法线方向观测，实施例三中的接触孔的形状示意图；
图8为沿阵列基板法线方向观测，实施例四中的接触孔的形状示意图；
图9为本发明的阵列基板的剖面结构示意图；
图10为本发明的显示装置的剖面结构示意图。
在附图中，相同的部件使用相同的附图标记。附图并未按照实际的比例。
具体实施方式
以下将结合附图对本发明的内容作出详细的说明，下文中的“上”“下”“左”“右”均为相对于图示方向，不应理解为对本发明的限制。
图4为本发明的阵列基板的示意图，该阵列基板自下而上依次设置有基底层55、金属层54和色阻层53。为了能够使得ITO层与金属层54电连接，该阵列基板上还设置有穿过色阻层53并与金属层54接触的接触孔52。为了防止滴落在接触孔52的正上方的配向膜液滴由于无法分散而产生气泡，本发明的阵列基板上的接触孔52的结构设置为当配向膜液滴滴落在接触孔52的正上方时，配向膜液滴能够分散开，如图4所示，分散开的配向膜液滴使得配向膜51均匀分布在接触孔52及其周围，避免了配向膜堆积。
下面将对处于B色阻层内的接触孔52的具体结构进行描述，在这里需要说明的是，接触孔52不仅设置在B色阻层内，还可以设置在其他颜色色阻层内。另外，在以下的实施例中，为了详细介绍本发明的内容，只给出了接触孔52的分布示意图，接触孔52的具体分布情况，需要根据实际需要确定。
实施例一：
图5为沿阵列基板法线方向观测，本实施例的位于B色阻层33内的接触孔 521的形状示意图。在本实施例中，接触孔521的形状为长圆形，接触孔521具有长轴5211和短轴5212。当配向膜液滴滴落在接触孔521的正上方时，由于短轴5212较短，配向膜液滴无法沿短轴5212方向扩散，但其能够沿长轴5211方向扩散。由于配向膜液滴沿长轴5211方向扩散，从而避免了配向膜液滴内部出现空气泡，同时扩散开的配向膜液滴均匀分布在接触孔及其周围。这样就不会出现配向膜堆积，并避免了由此产生的液晶盒间隙变大和显示亮度差异。
实施例二：
图6为沿阵列基板法线方向观测，本实施例中的位于B色阻层内的接触孔522的形状示意图。在本实施例中，接触孔522的形状为长方形。与实施例一相似的是，接触孔522同样具有长轴5221和短轴5222。配向膜液滴能够沿长轴5221方向扩散，达到与实施例一相同的效果。当然，为了便于接触孔522的制作形成，接触孔522的边角处可以根据需要设置圆角。
实施例三：
图7为本实施例的接触孔523结构示意图。在本实施例中，接触孔523与现有技术中的接触孔相同，不同的是，相邻的接触孔523之间彼此相连。如图7所示，接触孔523与相邻的接触孔523’之间通过沟槽524相连。当配向膜液滴滴落在接触孔523的正上方时，虽然配向膜液滴无法沿接触孔523的周向扩散，但由于沟槽524的设置，使得配向膜液滴沿沟槽524朝向接触孔523’方向扩散，从而使得配向膜液滴分散开，均匀分布在接触孔523及沟槽524周围。
这里的接触孔可以为圆形，也可以为方形，还可以为其它的具体的形状。
实施例四：
图8为本实施例中的接触孔525的结构示意图。在本实施例中，接触孔525的形状为圆形，接触孔525与相邻的另一个接触孔525’相交连接。从而增大了接触孔在相交方向的长度，使得滴落在接触孔525上的配向膜液滴能够扩散至接触孔525’中，从而均匀分布在接触孔525及接触孔525’周围。
当然，相交连接的接触孔还可以为其它类似形状，如六边形等。
实施例五：
本实施例中的阵列基板，接触孔采用如实施例一、实施例二、实施例三或实施例四中的任意一种结构，所以，当配向膜液滴滴落在接触孔上方时，配向膜液滴能够扩散并均匀分布在接触孔的周围。本实施例中的阵列基板，在色阻层的上 方还设置有配向膜56，如图9所示。配向膜覆盖整个阵列基板。由于接触孔52及其周围的配向膜51均匀分布，所以整体的配向膜56也是厚度均匀分布的。优选地，配向膜的成分包含聚酰亚胺树脂。
实施例六：
如图10所示，为本发明提出的显示装置的结构示意图。该显示装置包括相对设置的第一基板100和第二基板70，在第一基板100和第二基板70之间设置有柱状隔离子63。其中，第一基板100为本发明提出的阵列基板。第一基板100自下而上依次设置有基底层55、金属层54和色阻层53，同时，在色阻层53上方还设置有配向膜56。由于第一基板100的接触孔52处及周围的配向膜是均匀分布的，所以接触孔52周边的液晶盒间隙M与正常显示区的液晶盒间隙M’是相等的，从而避免了由于液晶盒间隙差异引起的亮度差异，提高了显示装置的亮度均一性。
最后说明的是，以上实施例仅用于说明本发明的技术方案而非限制，尽管参照较佳实施例对本发明进行了详细说明，本领域的普通技术人员应当理解，可以对本发明的技术方案进行修改或者等同替换，而不脱离本发明技术方案的宗旨和范围，其均应涵盖在本发明的权利要求范围当中。

Claims (18)

  1. 一种阵列基板，自下而上依次设置有基底层、金属层和色阻层，其中，所述阵列基板上还设置有穿过所述色阻层并与所述金属层接触的接触孔，所述接触孔设置为当配向膜液滴滴落在所述接触孔的正上方时，所述配向膜液滴能够分散开。
  2. 根据权利要求1所述的阵列基板，其中，沿所述阵列基板的法线方线观测，所述接触孔的形状为长圆形。
  3. 根据权利要求1所述的阵列基板，其中，沿所述阵列基板的法线方线观测，所述接触孔的形状为长方形。
  4. 根据权利要求1所述的阵列基板，其中，沿所述阵列基板的法线方向观测，相邻的所述接触孔之间彼此相连。
  5. 根据权利要求4所述的阵列基板，其中，沿所述阵列基板的法线方线观测，所述接触孔的形状为圆形，相邻的所述接触孔之间通过沟槽相连。
  6. 根据权利要求4所述的阵列基板，其中，沿所述阵列基板的法线方线观测，所述接触孔的形状为方形，相邻的所述接触孔之间通过沟槽相连。
  7. 根据权利要求1所述的阵列基板，其中，还包括设置在所述色阻层上的配向膜。
  8. 根据权利要求2所述的阵列基板，其中，还包括设置在所述色阻层上的配向膜。
  9. 根据权利要求3所述的阵列基板，其中，还包括设置在所述色阻层上的配向膜。
  10. 根据权利要求4所述的阵列基板，其中，还包括设置在所述色阻层上的配向膜。
  11. 根据权利要求7所述的阵列基板，其中，所述配向膜的成分包含聚酰亚胺树脂。
  12. 一种显示装置，其中，包括相对设置的第一基板和第二基板，所述第一基板为阵列基板，
    所述阵列基板，自下而上依次设置有基底层、金属层和色阻层，所述阵列基板上还设置有穿过所述色阻层并与所述金属层接触的接触孔，所述接触孔设置为 当配向膜液滴滴落在所述接触孔的正上方时，所述配向膜液滴能够分散开。
  13. 根据权利要求12所述的显示装置，其中，沿所述阵列基板的法线方线观测，所述接触孔的形状为长圆形。
  14. 根据权利要求12所述的显示装置，其中，沿所述阵列基板的法线方线观测，所述接触孔的形状为长方形。
  15. 根据权利要求12所述的显示装置，其中，沿所述阵列基板的法线方向观测，相邻的所述接触孔之间彼此相连。
  16. 根据权利要求15所述的显示装置，其中，沿所述阵列基板的法线方线观测，所述接触孔的形状为圆形，相邻的所述接触孔之间通过沟槽相连。
  17. 根据权利要求15所述的显示装置，其中，沿所述阵列基板的法线方线观测，所述接触孔的形状为方形，相邻的所述接触孔之间通过沟槽相连。
  18. 根据权利要求12所述的显示装置，其中，还包括设置在所述色阻层上的配向膜。
PCT/CN2017/079894 2017-03-20 2017-04-10 阵列基板及显示装置 Ceased WO2018170957A1 (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US15/533,887 US10444581B2 (en) 2017-03-20 2017-04-10 Array substrate based on color filter on array process and display device

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201710166671.9A CN106950769B (zh) 2017-03-20 2017-03-20 阵列基板、显示装置
CN201710166671.9 2017-03-20

Publications (1)

Publication Number Publication Date
WO2018170957A1 true WO2018170957A1 (zh) 2018-09-27

Family

ID=59473305

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2017/079894 Ceased WO2018170957A1 (zh) 2017-03-20 2017-04-10 阵列基板及显示装置

Country Status (3)

Country Link
US (1) US10444581B2 (zh)
CN (1) CN106950769B (zh)
WO (1) WO2018170957A1 (zh)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107300810B (zh) * 2017-07-25 2020-05-12 深圳市华星光电技术有限公司 一种阵列基板的制程及显示面板的制程
US10578784B2 (en) 2017-09-04 2020-03-03 Shenzhen China Star Optoelectronics Technology Co., Ltd Color-filter on array (COA) display panel, manufacturing method thereof and COA display device
CN107589582A (zh) * 2017-09-04 2018-01-16 深圳市华星光电技术有限公司 Coa显示面板及其制作方法、coa显示装置
CN107479292B (zh) * 2017-09-28 2020-08-04 武汉华星光电技术有限公司 阵列基板、阵列基板的制作方法及液晶显示面板
CN109188782B (zh) * 2018-09-17 2020-04-10 深圳市华星光电半导体显示技术有限公司 液晶显示面板
CN109976017B (zh) * 2019-04-10 2021-09-24 深圳市华星光电半导体显示技术有限公司 显示面板及其制作方法
CN110068961B (zh) * 2019-04-25 2020-12-04 武汉华星光电技术有限公司 基板的配向涂布结构及方法
CN110176463A (zh) * 2019-05-24 2019-08-27 深圳市华星光电技术有限公司 基板及制备方法
CN110783393B (zh) * 2019-11-15 2022-03-08 昆山国显光电有限公司 一种显示面板保护结构及显示组件
US11360359B2 (en) 2020-08-17 2022-06-14 Wuhan China Star Optoelectronics Technology Co., Ltd. Array substrate and liquid crystal display panel
CN111983836A (zh) * 2020-08-17 2020-11-24 武汉华星光电技术有限公司 阵列基板及液晶显示面板
KR20230156225A (ko) 2022-05-04 2023-11-14 삼성디스플레이 주식회사 표시 장치

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6031512A (en) * 1997-06-30 2000-02-29 Sony Corporation Color filter structure for color display device
JP2000155336A (ja) * 1998-11-24 2000-06-06 Matsushita Electric Ind Co Ltd 液晶表示装置およびその製造方法
CN1746756A (zh) * 2004-09-08 2006-03-15 三星电子株式会社 阵列基片及其制造方法和具有此阵列基片的液晶显示面板
CN101644869A (zh) * 2008-08-06 2010-02-10 精工爱普生株式会社 电路基板、电光装置及电子设备
CN105301847A (zh) * 2014-05-28 2016-02-03 乐金显示有限公司 显示装置及其制造方法
CN205248273U (zh) * 2015-12-24 2016-05-18 厦门天马微电子有限公司 一种用于液晶显示器的阵列基板

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014103922A1 (ja) * 2012-12-27 2014-07-03 シャープ株式会社 表示素子、表示装置、及び表示素子の製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6031512A (en) * 1997-06-30 2000-02-29 Sony Corporation Color filter structure for color display device
JP2000155336A (ja) * 1998-11-24 2000-06-06 Matsushita Electric Ind Co Ltd 液晶表示装置およびその製造方法
CN1746756A (zh) * 2004-09-08 2006-03-15 三星电子株式会社 阵列基片及其制造方法和具有此阵列基片的液晶显示面板
CN101644869A (zh) * 2008-08-06 2010-02-10 精工爱普生株式会社 电路基板、电光装置及电子设备
CN105301847A (zh) * 2014-05-28 2016-02-03 乐金显示有限公司 显示装置及其制造方法
CN205248273U (zh) * 2015-12-24 2016-05-18 厦门天马微电子有限公司 一种用于液晶显示器的阵列基板

Also Published As

Publication number Publication date
US20190086747A1 (en) 2019-03-21
CN106950769A (zh) 2017-07-14
US10444581B2 (en) 2019-10-15
CN106950769B (zh) 2020-05-05

Similar Documents

Publication Publication Date Title
WO2018170957A1 (zh) 阵列基板及显示装置
JP6347937B2 (ja) 液晶表示装置
TWI494668B (zh) 顯示面板
JP6208555B2 (ja) 液晶表示装置
JP2015114374A (ja) 液晶表示装置
US10054832B2 (en) Liquid crystal display device
JPWO2006013933A1 (ja) カラーフィルタ基板およびそれを備える液晶表示パネル
US11175442B2 (en) Color filter substrate and display panel
CN204331229U (zh) 液晶屏
WO2021227735A1 (zh) 显示用基板及其制备方法、显示装置
WO2019153910A1 (zh) 彩膜基板及其制作方法、显示面板及显示装置
US11567370B2 (en) Display substrate and manufacturing method thereof, and display device
US10082696B2 (en) Liquid crystal panel and liquid crystal display device
WO2017161894A1 (en) Display substrate, manufacturing method thereof, and display apparatus
CN106019723A (zh) 一种显示基板及其制作方法、显示装置
CN100403136C (zh) 滤色镜基板和液晶显示装置
US10634956B2 (en) Display panel and display device
CN109188782B (zh) 液晶显示面板
US20210041743A1 (en) Display panel, method for manufacturing same, and display device
CN101866080A (zh) 液晶显示面板
US10061163B2 (en) Color filter plate and fabrication method thereof, display panel
US9690142B2 (en) Display device
CN111830753B (zh) 液晶显示装置
JPWO2007111063A1 (ja) 液晶表示装置及びその製造方法
US10082708B2 (en) Liquid crystal panels and liquid crystal devices

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 17902194

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 17902194

Country of ref document: EP

Kind code of ref document: A1