WO2018170949A1 - Panneau d'affichage à cristaux liquides et procédé de fabrication associé, et substrat de matrice - Google Patents

Panneau d'affichage à cristaux liquides et procédé de fabrication associé, et substrat de matrice Download PDF

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Publication number
WO2018170949A1
WO2018170949A1 PCT/CN2017/079407 CN2017079407W WO2018170949A1 WO 2018170949 A1 WO2018170949 A1 WO 2018170949A1 CN 2017079407 W CN2017079407 W CN 2017079407W WO 2018170949 A1 WO2018170949 A1 WO 2018170949A1
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WO
WIPO (PCT)
Prior art keywords
substrate
layer
thin film
film transistor
pixel electrode
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Application number
PCT/CN2017/079407
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English (en)
Chinese (zh)
Inventor
李安石
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武汉华星光电技术有限公司
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Publication of WO2018170949A1 publication Critical patent/WO2018170949A1/fr

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/134309—Electrodes characterised by their geometrical arrangement
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136227—Through-hole connection of the pixel electrode to the active element through an insulation layer

Definitions

  • the present invention relates to the field of liquid crystal display technology, and in particular to a liquid crystal display panel, a method of manufacturing the same, and an array substrate.
  • LTPS Low Temperature Poly-silicon liquid crystal display panel
  • a PS (Photo Space) 121 is disposed on a side of the color filter substrate 12 facing the array substrate 11 , and the array substrate 11 includes a substrate substrate.
  • 111 and each layer structure on the substrate substrate 111 such as a thin film transistor 112, a planarization layer (PLN) 113, a pixel electrode 114, a passivation layer (abbreviation layer) 115, and a common electrode 116.
  • PPN planarization layer
  • pixel electrode 114 a passivation layer
  • abbreviation layer abbreviation layer
  • the present invention provides a liquid crystal display panel, a method of fabricating the same, and an array substrate, which can simplify the process of the liquid crystal display panel, improve the light transmittance thereof, and reduce the influence of the electric field between adjacent pixel electrodes.
  • a liquid crystal display panel includes a relatively spaced color filter substrate and an array substrate.
  • the color filter substrate includes a common electrode
  • the array substrate includes a thin film transistor, a flat layer covering the thin film transistor, and a pixel electrode, wherein the flat layer is opened.
  • a contact hole exposing a drain of the thin film transistor, the pixel electrode being formed in the contact hole and electrically connected to the drain of the thin film transistor through the contact hole, and the pixel electrode is a columnar structure and a top surface thereof is higher than a top surface of the flat layer,
  • the pixel electrode is spaced apart from the common electrode in a direction parallel to the array substrate.
  • a method of manufacturing a liquid crystal display panel includes: providing a first substrate substrate; sequentially forming a color filter, a protective layer, and a common electrode on the first substrate; and providing a second substrate a thin film transistor and a thin film transistor are sequentially formed on the second substrate a flat layer having a contact hole exposing a drain of the thin film transistor; a pixel electrode being formed in the contact hole such that the pixel electrode is electrically connected to a drain of the thin film transistor through the contact hole, and the pixel electrode is a columnar structure and The top surface is higher than the top surface of the flat layer, and the pixel electrode is spaced apart from the common electrode in a direction parallel to the second substrate substrate; the first substrate substrate and the second substrate substrate are subjected to a card forming process.
  • An array substrate includes a thin film transistor, a flat layer covering the thin film transistor, and a pixel electrode, the flat layer is provided with a first contact hole exposing a drain of the thin film transistor, and the pixel electrode is formed in the first contact hole The first contact hole is electrically connected to the drain of the thin film transistor, and the pixel electrode has a columnar structure and a top surface thereof is higher than a top surface of the flat layer.
  • the common electrode is disposed on one side of the color film substrate, the pixel electrode is designed as a columnar structure, and the PS electrode is used instead of the PS, and the PS process can be omitted, and the passivation layer can be omitted after forming the flat layer.
  • the process can simplify the process of the liquid crystal display panel and improve the light transmittance thereof, and the columnar structure of the pixel electrode can increase the distance between adjacent pixel electrodes, thereby reducing the influence of the electric field between adjacent pixel electrodes. .
  • FIG. 1 is a cross-sectional view showing the structure of an embodiment of a liquid crystal display panel of the prior art
  • FIG. 2 is a cross-sectional view showing the structure of a liquid crystal display panel according to a first embodiment of the present invention
  • FIG. 3 is a schematic flow chart of an embodiment of a method for manufacturing a liquid crystal display panel shown in FIG. 2;
  • FIG. 4 is a cross-sectional view showing the structure of a liquid crystal display panel according to a second embodiment of the present invention.
  • Fig. 5 is a cross-sectional view showing the structure of a liquid crystal display panel according to a third embodiment of the present invention.
  • the liquid crystal display panel 20 includes a film substrate (Thin Film Transistor Substrate, which is also referred to as a thin film transistor substrate or an Array substrate) 21 and a color filter substrate (Color Filter Substrate, also referred to as a color filter). Sheet substrate 22) and liquid crystal filled between the two substrates (liquid Crystal molecule) 23.
  • the liquid crystal 23 is located in a liquid crystal cell in which the array substrate 21 and the color filter substrate 22 are stacked and sealed.
  • the color filter substrate 22 includes a first substrate substrate 221 and color filters (also referred to as color resists) 222, a protective layer 223, and a common electrode 224 which are sequentially formed on the first substrate substrate 221.
  • the color filter 222 may include a red color resist, a green color resist, and a blue color resist.
  • the array substrate 21 includes a second substrate substrate 210 and a light shielding layer 211, a buffer layer 215, a thin film transistor 212, a flat layer 213, and a pixel electrode 214 which are sequentially formed on the second substrate substrate 210.
  • the material of the light shielding layer 211 includes, but is not limited to, a light shielding metal material such as copper or molybdenum.
  • the thin film transistor 212 includes a polycrystalline silicon (P-Si) 216, a Gate Insulation Layer (GI, also referred to as a gate insulating layer) 217, a gate G 1 , and a dielectric isolation formed on the buffer layer 215 in this order.
  • P-Si polycrystalline silicon
  • GI Gate Insulation Layer
  • ILD interlayer dielectric isolation
  • the dielectric isolation layer may include silicon sequentially formed on the gate G 1 Oxide layer 218 and silicon nitride layer 219.
  • Planarization layer 213 defines the drain D 212 exposing the thin film transistor 1 of the contact hole 220, the pixel electrode 214 formed in the contact hole 220, the pixel electrode 214 may be electrically connected through a contact hole 220 and the drain D 212 of the thin film transistor 1.
  • the pixel electrode 214 has a columnar structure, for example, a trapezoidal or rectangular columnar structure.
  • the cross section of the pixel electrode 214 is a trapezoidal columnar structure, the length of the trapezoid upper side may be smaller than the length of the bottom side.
  • the top surface of the pixel electrode 214 is higher than the top surface of the flat layer 213, and the pixel electrode 214 is spaced apart from the common electrode 224 in a direction parallel to the array substrate 21.
  • the color film substrate 22 and the array substrate 21 further include other structures, such as a polarizer, a black matrix, etc., wherein the black matrix may be disposed between the first substrate substrate 221 and the color filter 222, and the color filter 222 is formed on a side of the black matrix facing the array substrate 21, and a protective layer 223 is formed on a side of the color filter 222 facing the array substrate 21.
  • the other structures can be referred to the prior art, and the present embodiment is not shown in the drawings.
  • the common electrode 224 is disposed on the side of the color filter substrate 22 and the pixel electrode 214 .
  • the columnar pixel electrode 214 can abut against the protective layer 223 of the color filter substrate 21 for controlling the thickness and uniformity of the liquid crystal cell, thereby passing through the pixel electrode 214, in place of the PS 121 shown in FIG. 1, the PS process can be omitted, and the process of the passivation (PV) layer 115 can be omitted after the formation of the planar layer 213.
  • the layer structure of the array substrate 21 is reduced in this embodiment, Therefore, the light transmittance can be improved and the process of the liquid crystal display panel 20 can be simplified.
  • designing the pixel electrode 214 as a columnar structure can increase the distance between adjacent two pixel electrodes 214, thereby reducing the influence of an electric field between adjacent two pixel electrodes 214.
  • the pixel electrode 214 can cover the region where the thin film transistor 212 is located, that is, the orthographic projection of the pixel electrode 214 on the array substrate 21 overlaps with the orthographic projection of the thin film transistor 212 on the array substrate 21, and the pixel electrode 214 is made of a light shielding material.
  • the pixel electrode 214 can prevent light leakage in the region where the thin film transistor 212 is covered, and thus the liquid crystal display panel 20 does not need to separately form a black matrix.
  • the light shielding material includes, but is not limited to, carbon, titanium oxide, and an organic material that absorbs light.
  • FIG. 3 is a flow chart showing a method of manufacturing the liquid crystal display panel 20 according to an embodiment of the present invention. This method can be used to manufacture the LTPS liquid crystal display panel 20 shown in FIG. 2. As shown in FIG. 3, the manufacturing method may include steps S31 to S36.
  • the first substrate substrate 221 may be a light transmissive substrate such as a glass substrate, a plastic substrate, or a flexible substrate.
  • a color filter having a predetermined pattern can be formed on the first substrate substrate 221 by a process such as coating photoresist, vacuum drying, removing edge photoresist, prebaking and cooling, exposure developing, and re-baking. 222. Then, a protective layer 223 and a common electrode 224 are sequentially formed on the color filter 222. Based on this, the color film substrate 22 having the common electrode 224 can be formed in this embodiment.
  • the second substrate substrate 210 may be a light transmissive substrate such as a glass substrate, a plastic substrate or a flexible substrate.
  • S34 sequentially forming a thin film transistor and a flat layer covering the thin film transistor on the second substrate, and the flat layer is provided with a contact hole exposing a drain of the thin film transistor.
  • the thin film transistor 212 and the flat layer 213 formed on the second substrate substrate 210 may be the same as the prior art, and the manufacturing method thereof can be referred to the prior art, and details are not described herein again.
  • S35 forming a pixel electrode in the contact hole, so that the pixel electrode is electrically connected to the drain of the thin film transistor through the contact hole, the pixel electrode has a columnar structure and a top surface thereof is higher than a top surface of the flat layer, and the edge is parallel to the second substrate The pixel electrode is spaced apart from the common electrode in the direction of the substrate.
  • the columnar pixel electrode 214 can be formed in the contact hole 220 by etching or deposition.
  • the pixel electrode 214 can also be made of a conductive material such as ITO (Indium Tin Oxide).
  • FIG. 4 is a liquid crystal display panel according to a second embodiment of the present invention.
  • the array substrate 41 of the present embodiment is not provided with a light shielding layer 211 and a buffer layer 215, and the thin film transistor 412 is sequentially formed on the second substrate substrate 410.
  • the array substrate 41 of the present embodiment can be considered to have a bottom gate type pixel design. That is to say, the present invention is also applicable to a bottom gate type pixel design.
  • the liquid crystal display panel of this embodiment can also be fabricated by the method shown in FIG. 3, except that the manufacturing methods of the thin film transistors of the two embodiments are different. in particular:
  • the method further requires sequentially forming the light shielding layer 211 and the buffer layer 215 on the second substrate substrate 210, and then sequentially forming a polysilicon semiconductor layer 216, the insulating layer 217, a gate G 1, the dielectric spacer layer on the buffer layer 215 and the source and drain electrode layer.
  • the gate G 2 , the insulating layer 417 , the polysilicon semiconductor layer 416 , the dielectric isolation layer, and the source/drain electrode layer may be sequentially formed on the second substrate substrate 410 .
  • the present invention also provides a liquid crystal display panel 50 as shown in FIG.
  • the array substrate 51 of the liquid crystal display panel 50 includes a thin film transistor 512 , a flat layer 513 , and a pixel electrode 514 .
  • Planarization layer 513 is exposed to a thin film transistor is defined in the drain D 512 of the first contact hole 3 520a.
  • the pixel electrode 514 is formed in the first contact hole 520a and electrically connected to the drain D 3 of the thin film transistor 512 through the first contact hole 520a, and the pixel electrode 514 has a columnar structure and its top surface is higher than the top surface of the flat layer 513. .
  • the common electrode of the liquid crystal display panel 50 is not disposed on the side of the color filter substrate 52 but on the array substrate 51.
  • the array substrate 51 further includes a common electrode 524 and a passivation layer 525 which are sequentially formed on the flat layer 513.
  • the passivation layer 525 is provided with a second contact hole 520b that is electrically connected to the first contact hole 520a.
  • the pixel electrode 514 is further formed in the second contact hole 520b and has a top surface higher than a surface of the passivation layer 525. Also, the pixel electrode 514 is spaced apart from the common electrode 524 in a direction parallel to the array substrate 51.
  • this embodiment replaces the PS 121 shown in FIG. 1 by the pixel electrode 514, and the PS process can be omitted, thereby simplifying the process of the liquid crystal display panel 50. Also, designing the pixel electrode 514 as a columnar structure can increase the distance between adjacent two pixel electrodes 514, thereby reducing the influence of an electric field between adjacent two pixel electrodes 514.
  • the common electrode may be disposed on the side of the array substrate 41.
  • the pixel electrode of the array substrate is the same as the structure of the embodiment, and the embodiment can also be implemented. Beneficial effect.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Geometry (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)

Abstract

La présente invention concerne un panneau d'affichage à cristaux liquides (20) et un procédé de fabrication associé, ainsi qu'un substrat de matrice (21). Une électrode commune (224) se trouve sur un côté d'un substrat de filtre coloré (22). Une électrode de pixel (214) est formée dans un trou de contact d'une couche plate (213) du substrat de matrice (21), et elle est connectée électriquement à un drain (D1) d'un transistor à couches minces (212) au moyen du trou de contact (220). De plus, l'électrode de pixel (214) a une structure en colonne, et une surface supérieure de celle-ci est plus haute qu'une surface supérieure de la couche plate (213). Les électrodes de pixel (214) et les électrodes communes (224) sont disposées en alternance dans une direction parallèle audit substrat de matrice (21). Sur la base de ce procédé, le processus de fabrication du panneau d'affichage à cristaux liquides (20) peut être simplifié, la transmittance de lumière du panneau peut être améliorée, et l'influence de champs électriques sur des électrodes de pixel (214) adjacentes peut être réduite.
PCT/CN2017/079407 2017-03-20 2017-04-05 Panneau d'affichage à cristaux liquides et procédé de fabrication associé, et substrat de matrice WO2018170949A1 (fr)

Applications Claiming Priority (2)

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CN201710165523.5 2017-03-20
CN201710165523.5A CN106909001B (zh) 2017-03-20 2017-03-20 液晶显示面板及其制造方法、阵列基板

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WO2018170949A1 true WO2018170949A1 (fr) 2018-09-27

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Families Citing this family (7)

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Publication number Priority date Publication date Assignee Title
CN107765485A (zh) * 2017-09-18 2018-03-06 合肥惠科金扬科技有限公司 一种液晶显示面板
CN107608111A (zh) * 2017-09-18 2018-01-19 合肥惠科金扬科技有限公司 一种液晶显示面板的基板支撑组件的加工工艺
CN107765486A (zh) * 2017-09-18 2018-03-06 合肥惠科金扬科技有限公司 一种液晶显示面板的基板支撑组件
US10644040B2 (en) 2018-02-26 2020-05-05 Wuhan China Star Optoelectronics Technology Co., Ltd. Array substrate, manufacturing method thereof, and display panel
CN108333845A (zh) * 2018-02-26 2018-07-27 武汉华星光电技术有限公司 阵列基板、显示面板以及阵列基板的制作方法
CN108710242B (zh) * 2018-05-21 2021-01-08 惠科股份有限公司 一种显示面板和显示装置
CN113064304B (zh) * 2021-03-29 2022-09-20 京东方科技集团股份有限公司 液晶显示面板及其制作方法、液晶显示装置

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CN1716067A (zh) * 2004-06-29 2006-01-04 Lg.菲利浦Lcd株式会社 液晶显示器件及其制造方法
JP2006091055A (ja) * 2004-09-21 2006-04-06 Seiko Epson Corp 電気光学装置及び電子機器
TWI254179B (en) * 1999-06-17 2006-05-01 Nec Lcd Technologies Ltd Liquid-crystal display panel and method for manufacturing same
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US20140375937A1 (en) * 2013-06-25 2014-12-25 Samsung Display Co., Ltd. Display device and manufacturing method thereof

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Publication number Priority date Publication date Assignee Title
TWI254179B (en) * 1999-06-17 2006-05-01 Nec Lcd Technologies Ltd Liquid-crystal display panel and method for manufacturing same
CN1716067A (zh) * 2004-06-29 2006-01-04 Lg.菲利浦Lcd株式会社 液晶显示器件及其制造方法
JP2006091055A (ja) * 2004-09-21 2006-04-06 Seiko Epson Corp 電気光学装置及び電子機器
KR20080034545A (ko) * 2006-10-17 2008-04-22 삼성전자주식회사 액정 표시 장치 및 그 제조 방법
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US20140375937A1 (en) * 2013-06-25 2014-12-25 Samsung Display Co., Ltd. Display device and manufacturing method thereof

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CN106909001A (zh) 2017-06-30

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