WO2018157423A1 - Coa阵列基板以及液晶显示面板 - Google Patents

Coa阵列基板以及液晶显示面板 Download PDF

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Publication number
WO2018157423A1
WO2018157423A1 PCT/CN2017/077466 CN2017077466W WO2018157423A1 WO 2018157423 A1 WO2018157423 A1 WO 2018157423A1 CN 2017077466 W CN2017077466 W CN 2017077466W WO 2018157423 A1 WO2018157423 A1 WO 2018157423A1
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filter layer
color filter
pixel
array substrate
liquid crystal
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PCT/CN2017/077466
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English (en)
French (fr)
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孙涛
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武汉华星光电技术有限公司
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Priority to US15/520,412 priority Critical patent/US10288923B2/en
Publication of WO2018157423A1 publication Critical patent/WO2018157423A1/zh

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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/133345Insulating layers
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136227Through-hole connection of the pixel electrode to the active element through an insulation layer
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/1368Active matrix addressed cells in which the switching element is a three-electrode device
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136222Colour filters incorporated in the active matrix substrate
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/50Protective arrangements
    • G02F2201/503Arrangements improving the resistance to shock

Definitions

  • the present invention relates to the field of display technologies, and in particular, to a COA array substrate and a liquid crystal display panel including the COA array substrate.
  • LCD Liquid crystal display
  • PDA personal digital assistant
  • digital camera computer screen or laptop screen.
  • the liquid crystal display device generally includes a housing, a liquid crystal display panel disposed in the housing, and a backlight module disposed in the housing.
  • the liquid crystal display panel is mainly composed of a thin film transistor array (TFT Array) substrate, a color filter (CF) substrate, and a liquid crystal layer disposed between the two substrates (Liquid Crystal). Layer) is constructed by controlling the rotation of the liquid crystal molecules of the liquid crystal layer by applying a driving voltage on the two glass substrates, and refracting the light of the backlight module to produce a picture.
  • TFT Array thin film transistor array
  • CF color filter
  • Layer is constructed by controlling the rotation of the liquid crystal molecules of the liquid crystal layer by applying a driving voltage on the two glass substrates, and refracting the light of the backlight module to produce a picture.
  • COA Color-filter on Array
  • BM black matrix
  • PS PhotoSpacer, PS
  • the color filter layer is directly formed on the array substrate, which increases the process difficulty, especially the problem that the residual gas in the color filter layer penetrates into the liquid crystal layer to form a bubble.
  • the main material of the color filter layer is organic.
  • gas is inevitably left inside, and at the same time, due to the characteristics of the organic substance, under certain conditions, for example.
  • the small color carbon oxide gas such as CO, CO 2 , etc.
  • the molecular gas After the molecular gas is generated, it will penetrate the thin film layer (such as the passivation layer, the alignment film layer, etc.) on the surface of the color filter layer, enter the liquid crystal layer, and form bubbles locally, which will affect the display effect and reduce the product yield. Therefore, for the COA technology, how to prevent the gas in the color filter layer from infiltrating into the liquid crystal layer to form bubbles is an urgent problem to be solved in the industry.
  • the thin film layer such as the passivation layer, the alignment film layer, etc.
  • the present invention provides a COA array substrate which can effectively reduce the penetration of residual gas in the color filter layer into the liquid crystal layer to form bubble defects.
  • a COA array substrate comprising a substrate substrate and a plurality of pixel structures arranged on the substrate substrate, wherein the pixel structure is provided with a color filter layer, the color filter layer comprising a first portion and The second part, the first part of the color filter layer corresponding to the display area of the pixel structure, the second part of the color filter layer corresponding to the non-display area of the pixel structure; the second part of the color filter layer is provided Vented holes.
  • the vent hole penetrates the second partial color filter layer in a thickness direction of the second partial color filter layer.
  • the number of the vent holes is plural, and the plurality of vent holes are equally spaced from each other.
  • the shape of the vent hole is circular or square.
  • the vent hole has a circular shape and a cross section having a diameter of 3 to 6 ⁇ m.
  • the shape of the vent hole is a square shape, and the side length of the cross section is 3 to 6 ⁇ m.
  • the pixel structure further includes a thin film transistor and a pixel electrode disposed on the substrate, the thin film transistor is covered with a first passivation layer, and the color filter layer is disposed on the first blunt On the layer, the color filter layer is covered with a second passivation layer, and the pixel electrode is disposed on the second passivation layer; wherein the pixel electrode is disposed on the first passivation layer
  • the vias in the layer, the color filter layer, and the second passivation layer are electrically connected to the thin film transistor.
  • the pixel structure is set as a red sub-pixel, a green sub-pixel or a blue sub-pixel
  • the color filter layer of the red sub-pixel is a red filter layer
  • the color filter layer of the green sub-pixel is green a filter layer
  • the color filter layer of the blue sub-pixel is a blue filter layer.
  • the material of the first passivation layer and the second passivation layer is silicon nitride, silicon oxide or a combination of silicon nitride and silicon oxide; the material of the pixel electrode is selected from the group consisting of indium tin oxide and indium.
  • liquid crystal display panel including an array substrate disposed opposite to each other and For the cassette substrate, liquid crystal molecules are disposed between the array substrate and the pair of cassette substrates, wherein the array substrate uses the COA array substrate as described above.
  • the COA array substrate provided by the embodiment of the present invention is provided with a vent hole through a portion corresponding to the non-display area corresponding to the color filter layer.
  • the color filter is used.
  • the gas inside the light layer can be smoothly discharged through the vent holes, reducing the residual amount of gas inside the color filter layer;
  • the package is formed into a complete liquid crystal display panel, if the liquid crystal display panel is subjected to high temperature impact, high voltage impact or external force vibration In the case of impact, there is a slight fluid passage between the liquid crystal layer and the color filter layer.
  • the vapor phase equilibrium point is composed of the interface of the liquid crystal layer.
  • the material is transferred into the vent hole, and the small molecular gas released inside the color filter layer is difficult to penetrate into the liquid crystal layer, thereby avoiding the formation of bubble defects.
  • FIG. 1 is a schematic structural diagram of a COA array substrate according to an embodiment of the present invention.
  • FIG. 2 is a schematic structural diagram of a pixel structure in an embodiment of the present invention.
  • FIG. 3 is a schematic structural view of a vent hole in an embodiment of the present invention.
  • FIG. 4 is a schematic structural view of a vent hole in another embodiment of the present invention.
  • FIG. 5 is a schematic structural diagram of a liquid crystal display panel according to an embodiment of the present invention.
  • the COA array substrate includes a substrate substrate 1 and a plurality of pixel structures 2 disposed on the substrate substrate 1 (in the drawing) Only one of them is shown by way of example.
  • the pixel structure 2 includes a scan line S, a data line D, a thin film transistor 21, and a pixel. Electrode 22.
  • the scan line S and the data line D cross each other to define a pixel region, the thin film transistor 21 and the pixel electrode 22 are disposed in the pixel region, and the thin film transistor 21 linearly connects the pixel electrode 22 to the The scan line S and the data line D.
  • the color filter layer 23 is disposed in the pixel structure 2, thereby forming a COA array substrate.
  • the thin film transistor 21 is disposed on a base substrate 1 , and the thin film transistor 21 is covered with a first passivation layer 24 , and the color filter layer 23 is disposed on the first On the passivation layer 24, the color filter layer 23 is covered with a second passivation layer 25, and the pixel electrode 22 is disposed on the second passivation layer 25; wherein the pixel electrode 22 passes The via holes provided in the first passivation layer 24, the color filter layer 23, and the second passivation layer 25 are electrically connected to the thin film transistor 21.
  • the pixel structure 2 can be set as a red sub-pixel, a green sub-pixel or a blue sub-pixel.
  • the color filter layer 23 of the red sub-pixel is a red filter layer
  • the color filter layer 23 of the green sub-pixel is a green filter layer
  • the color filter layer 23 of the blue sub-pixel is Blue filter layer.
  • the material of the first passivation layer 24 and the second passivation layer 25 may be selected from silicon nitride, silicon oxide or a combination of silicon nitride and silicon oxide
  • the material of the pixel electrode 22 may be selected from One or more of indium tin oxide, indium zinc oxide, aluminum tin oxide, aluminum zinc oxide, and indium antimony zinc oxide.
  • the thin film transistor 21 includes a gate electrode 211, a gate insulating layer 212, an active layer 213, a source electrode 214, and a drain electrode 215.
  • the gate electrode 211 is formed on the base substrate 1
  • the gate insulating layer 212 is disposed on the gate electrode 211
  • the active layer 213 is formed on the gate insulating layer 212 and located opposite to each other.
  • a source electrode 214 and a drain electrode 215 are formed on the gate insulating layer 212.
  • the source electrode 214 and the drain electrode 215 are spaced apart from each other and have a portion overlapping the active layer 213, and the pixel electrode 22 is electrically connected to the drain electrode 215.
  • the color filter layer 23 is provided with a vent hole 231.
  • the color filter layer 23 includes a first portion and a second portion.
  • the first portion of the color filter layer 23a corresponds to the display region of the pixel structure 2
  • the second portion of the color filter layer 23b corresponds to The non-display area of the pixel structure 2 is covered.
  • the venting holes 231 are disposed in the second partial color filter layer 23b, that is, corresponding to the non-display area of the pixel structure 2.
  • the scan line S, the data line D, and the thin film transistor 21 are located opposite to the color filter layer 23, and the color filter layer 23 is located in the color filter layer 23 for better illustration.
  • the upper pixel electrode 22 is not shown in FIG.
  • the COA array substrate provided in the above embodiment is provided with a vent hole through a portion corresponding to the non-display area in the color filter layer.
  • venting holes are disposed in the non-display area of the pixel structure, and the contour of the venting holes does not affect the normal display of the pixels.
  • the vent hole 231 penetrates the second partial color filter layer 23b in the thickness direction of the second partial color filter layer 23b.
  • the number of the vent holes 231 is plural, and the plurality of vent holes 231 are spaced apart from each other and equally spaced, as shown in FIG. 2, only a plurality of vent holes 231 are exemplarily shown, and in still other embodiments A plurality of the vent holes 231 may also be unequal pitch distribution.
  • the size, topography, and density of the vent holes 231 are not particularly limited. However, it has been verified that the venting hole 231 is designed to be square or circular, and the venting effect is better. Referring to FIGS. 2 and 3, in the present embodiment, the shape of the vent hole 231 is square, and an optimum venting effect is obtained when the side lengths D1, D2 of the cross section thereof are in the range of 3 to 6 ⁇ m. Further, in other embodiments, when the shape of the vent hole 231 is circular, the diameter R of the cross section preferably ranges from 3 to 6 ⁇ m.
  • the present embodiment further provides a liquid crystal display panel.
  • the liquid crystal display panel includes an array substrate 100 and a counter substrate 200 disposed opposite to each other, the array substrate 100 and the pair of cassette substrates. Liquid crystal molecules 300 are disposed between 200.
  • the array substrate 100 adopts the COA array substrate provided in the above embodiments.
  • a black matrix (BM) is disposed in the pair of card substrates 200, and the black matrix corresponds to a non-display area of the pixel structure.

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  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
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  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

一种COA阵列基板,包括衬底基板(1)以及阵列设置在衬底基板(1)上的多个像素结构(2),像素结构(2)中设置有彩色滤光层(23),彩色滤光层(23)包括第一部分彩色滤光层(23a)和第二部分彩色滤光层(23b),第一部分彩色滤光层(23a)对应覆盖像素结构(2)的显示区域,第二部分彩色滤光层(23b)对应覆盖像素结构(2)的非显示区域;第二部分彩色滤光层(23b)中设置有透气孔(231)。还公开了一种液晶显示面板,包括相对设置的阵列基板(100)和对盒基板(200),阵列基板(100)和对盒基板(200)之间设置有液晶分子(300),阵列基板(100)采用COA阵列基板。

Description

COA阵列基板以及液晶显示面板 技术领域
本发明涉及显示器技术领域,尤其涉及一种COA阵列基板以及包含该COA阵列基板的液晶显示面板。
背景技术
液晶显示装置(Liquid Crystal Display,LCD)具有机身薄、省电、无辐射等众多优点,得到了广泛的应用。如:液晶电视、移动电话、个人数字助理(PDA)、数字相机、计算机屏幕或笔记本电脑屏幕等。
液晶显示装置通常包括壳体、设于壳体内的液晶显示面板及设于壳体内的背光模组(Backlight module)。其中,液晶显示面板的结构主要是由一薄膜晶体管阵列(Thin Film Transistor Array,TFT Array)基板、一彩色滤光片(Color Filter,CF)基板、以及配置于两基板间的液晶层(Liquid Crystal Layer)所构成,其工作原理是通过在两片玻璃基板上施加驱动电压来控制液晶层的液晶分子的旋转,将背光模组的光线折射出来产生画面。
COA(Color-filter on Array)技术是一种将彩色滤光层直接制作在阵列基板上的一种集成技术,而彩膜基板上只设有黑色矩阵(Black Matrix,BM)以及柱状隔垫物(PhotoSpacer,PS)层。COA技术能够有效解决液晶显示装置对盒工艺中因对位偏差造成的漏光等问题,并能显著提升显示开口率。
COA技术中,将彩色滤光层直接制作在阵列基板上,增加了工艺难度,尤其是彩色滤光层中残留的气体渗入到液晶层中形成气泡(Bubble)的问题。具体地,彩色滤光层的主体材料为有机物,现有技术在进行彩色滤光层的制作时,不可避免地会在其内部残存有气体,同时由于有机物的特性,在某些条件下,例如长期处于高温环境,或高压环境,或受到外力冲击,或显示器处于震动的工作状态下时,彩色滤光层内部会缓慢释放出小分子的碳氧化物气体,如CO、CO2等,这些小分子气体产生后会穿透彩色滤光层表面的较薄膜层(例如钝化层、配向膜层等),进入到液晶层当中,在局部形成气泡,会影响显示效果,降低产品良率。因此,对于COA技术,如何避免彩色滤光层中的气体渗入到液晶层中 形成气泡是业内亟待解决的问题。
发明内容
鉴于现有技术存在的不足,本发明提供了一种COA阵列基板,可以有效地减少彩色滤光层中残留的气体渗入到液晶层中形成气泡缺陷。
为了达到上述的目的,本发明采用了如下的技术方案:
一种COA阵列基板,包括衬底基板以及阵列设置在所述衬底基板上的多个像素结构,其中,所述像素结构中设置有彩色滤光层,所述彩色滤光层包括第一部分和第二部分,第一部分彩色滤光层对应覆盖所述像素结构的显示区域,第二部分彩色滤光层对应覆盖所述像素结构的非显示区域;所述第二部分彩色滤光层中设置有透气孔。
其中,所述透气孔在所述第二部分彩色滤光层的厚度方向上贯穿所述第二部分彩色滤光层。
其中,所述透气孔的数量为多个,多个所述透气孔相互间隔其等间距分布。
其中,所述透气孔的形状为圆形或方形。
其中,所述透气孔的形状为圆形,其截面的直径为3~6μm。
其中,所述透气孔的形状为方形,其截面的边长为3~6μm。
其中,所述像素结构还包括设置于所述衬底基板上的薄膜晶体管和像素电极,所述薄膜晶体管上覆设有第一钝化层,所述彩色滤光层设置于所述第一钝化层上,所述彩色滤光层上覆设有第二钝化层,所述像素电极设置于所述第二钝化层上;其中,所述像素电极通过设置在所述第一钝化层、彩色滤光层以及第二钝化层中的过孔电性连接到所述薄膜晶体管。
其中,所述像素结构被设置为红色子像素、绿色子像素或蓝色子像素,所述红色子像素的彩色滤光层为红色滤光层,所述绿色子像素的彩色滤光层为绿色滤光层,所述蓝色子像素的彩色滤光层为蓝色滤光层。
其中,所述第一钝化层和第二钝化层的材料为氮化硅、氧化硅或者是氮化硅与氧化硅的组合物;所述像素电极的材料选自铟锡氧化物、铟锌氧化物、铝锡氧化物、铝锌氧化物和铟锗锌氧化物中的一种或多种。
本发明的另一方面是提供一种液晶显示面板,包括相对设置的阵列基板和 对盒基板,所述阵列基板和所述对盒基板之间设置有液晶分子,其中,所述阵列基板采用如上所述的COA阵列基板。
相比于现有技术,本发明实施例提供的COA阵列基板,通过在彩色滤光层对应覆盖非显示区域的部分设置有透气孔,首先,在制备彩色滤光层的工艺过程中,彩色滤光层内部的气体可以通过该些透气孔顺畅排出,减少彩色滤光层内部气体的残留量;其次,在封装形成完整的液晶显示面板后,若是液晶显示面板在高温冲击、高压冲击或外力震动冲击的情况下导致液晶层与彩色滤光层之间具有微小的流体通道,此时由于相对孔径较大(相对于前述微小的流体通道)的透气孔的存在,气相平衡点由液晶层的界面处转移到透气孔中,彩色滤光层内部释放出小分子气体难以渗入到液晶层中,避免了气泡缺陷的形成。
附图说明
图1是本发明实施例提供的COA阵列基板的结构示意图;
图2是本发明实施例中的像素结构的结构示意图;
图3是本发明实施例中的透气孔的结构示意图;
图4是本发明另外实施例中的透气孔的结构示意图;
图5是本发明实施例提供的液晶显示面板的结构示意图。
具体实施方式
为使本发明的目的、技术方案和优点更加清楚,下面结合附图对本发明的具体实施方式进行详细说明。这些优选实施方式的示例在附图中进行了例示。附图中所示和根据附图描述的本发明的实施方式仅仅是示例性的,并且本发明并不限于这些实施方式。
在此,还需要说明的是,为了避免因不必要的细节而模糊了本发明,在附图中仅仅示出了与根据本发明的方案密切相关的结构和/或处理步骤,而省略了与本发明关系不大的其他细节。
本实施例首先提供了一种COA阵列基板,参阅图1和图2,所述COA阵列基板包括衬底基板1以及阵列设置在所述衬底基板1上的多个像素结构2(附图中仅示例性示出了其中的一个)。
其中,所述像素结构2包括扫描线S、数据线D、薄膜晶体管21以及像素 电极22。所述扫描线S和所述数据线D相互交叉限定像素区域,所述薄膜晶体管21以及像素电极22设置在所述像素区域中,所述薄膜晶体管21将所述像素电极22线性连接到所述扫描线S和所述数据线D。
其中,所述像素结构2中设置有彩色滤光层23,由此形成COA阵列基板。具体地,如图1所示,所述薄膜晶体管21设置在衬底基板1上,所述薄膜晶体管21上覆设有第一钝化层24,所述彩色滤光层23设置于所述第一钝化层24上,所述彩色滤光层23上覆设有第二钝化层25,所述像素电极22设置于所述第二钝化层25上;其中,所述像素电极22通过设置在所述第一钝化层24、彩色滤光层23以及第二钝化层25中的过孔电性连接到所述薄膜晶体管21。
其中,所述像素结构2可以被设置为红色子像素、绿色子像素或蓝色子像素。对应地,所述红色子像素的彩色滤光层23为红色滤光层,所述绿色子像素的彩色滤光层23为绿色滤光层,所述蓝色子像素的彩色滤光层23为蓝色滤光层。其中,所述第一钝化层24和第二钝化层25的材料可以选择为氮化硅、氧化硅或者是氮化硅与氧化硅的组合物;所述像素电极22的材料可以选自铟锡氧化物、铟锌氧化物、铝锡氧化物、铝锌氧化物和铟锗锌氧化物中的一种或多种。
其中,参阅图1,所述薄膜晶体管21包括栅电极211、栅极绝缘层212、有源层213、源电极214和漏电极215。具体地,所述栅电极211形成于所述衬底基板1上,栅极绝缘层212覆设于所述栅电极211上,有源层213形成于所述栅极绝缘层212上并且相对位于栅电极211上方,源电极214和漏电极215形成于所述栅极绝缘层212上。所述源电极214和漏电极215之间相互间隔并且分别具有部分搭接在所述有源层213上,所述像素电极22电性连接到所述漏电极215。
本实施例中,所述彩色滤光层23中设置有透气孔231。具体地,参阅图1和图2,所述彩色滤光层23包括第一部分和第二部分,第一部分彩色滤光层23a对应覆盖像素结构2的显示区域,第二部分彩色滤光层23b对应覆盖像素结构2的非显示区域。其中,所述透气孔231设置在所述第二部分彩色滤光层23b中,即对应于像素结构2的非显示区域。需要说明的是,如图2中,扫描线S、数据线D和薄膜晶体管21是相对位于彩色滤光层23的下方,为了更好地示出彩色滤光层23,位于彩色滤光层23上的像素电极22在图2中未示出。
如上实施例所提供的COA阵列基板,通过在彩色滤光层对应覆盖非显示区域的部分设置有透气孔,首先,在制备彩色滤光层的工艺过程中,彩色滤光层 内部的气体可以通过该些透气孔顺畅排出,减少彩色滤光层内部气体的残留量;其次,在封装形成完整的液晶显示面板后,若是液晶显示面板在高温冲击、高压冲击或外力震动冲击的情况下导致液晶层与彩色滤光层之间具有微小的流体通道,此时由于相对孔径较大(相对于前述微小的流体通道)的透气孔的存在,气相平衡点由液晶层的界面处转移到透气孔中,彩色滤光层内部释放出小分子气体难以渗入到液晶层中,避免了气泡缺陷的形成。进一步地,透气孔设置在像素结构的非显示区域中,透气孔的轮廓不会影响像素的正常显示。
本实施例中,参阅图1和图2,所述透气孔231在所述第二部分彩色滤光层23b的厚度方向上贯穿所述第二部分彩色滤光层23b。其中,所述透气孔231的数量为多个,多个所述透气孔231相互间隔且等间距分布,如图2中仅示例性示出了若干透气孔231,并且,在另外的一些实施例中,多个所述透气孔231也可以是不等间距分布。
其中,所述透气孔231的大小、形貌和密度并不没有特别的限制。但是经过验证证明,所述透气孔231设计为方形或圆形时,其排气效果更佳。参阅图2和图3,本实施例中,所述透气孔231的形状为方形,并且,当其截面的边长D1、D2的为3~6μm范围内时,获得最优的排气效果。进一步地,在另外的一些实施例中,当透气孔231的形状为圆形,其截面的直径R的最佳取值范围是3~6μm。
进一步地,本实施例还提供了一种液晶显示面板,如图5所示,所述液晶显示面板包括相对设置的阵列基板100和对盒基板200,所述阵列基板100和所述对盒基板200之间设置有液晶分子300。其中,所述阵列基板100采用如上实施例所提供的COA阵列基板。需要说明的是,所述对盒基板200中设置有黑色矩阵(Black Matrix,BM),黑色矩阵对应于像素结构的的非显示区域。
需要说明的是,在本文中,诸如第一和第二等之类的关系术语仅仅用来将一个实体或者操作与另一个实体或操作区分开来,而不一定要求或者暗示这些实体或操作之间存在任何这种实际的关系或者顺序。而且,术语“包括”、“包含”或者其任何其他变体意在涵盖非排他性的包含,从而使得包括一系列要素的过程、方法、物品或者设备不仅包括那些要素,而且还包括没有明确列出的其他要素,或者是还包括为这种过程、方法、物品或者设备所固有的要素。在没有更多限制的情况下,由语句“包括一个……”限定的要素,并不排除在包括所述要素的过程、方法、物品或者设备中还存在另外的相同要素。
以上所述仅是本申请的具体实施方式,应当指出,对于本技术领域的普通技术人员来说,在不脱离本申请原理的前提下,还可以做出若干改进和润饰,这些改进和润饰也应视为本申请的保护范围。

Claims (18)

  1. 一种COA阵列基板,包括衬底基板以及阵列设置在所述衬底基板上的多个像素结构,其中,所述像素结构中设置有彩色滤光层,所述彩色滤光层包括第一部分和第二部分,第一部分彩色滤光层对应覆盖所述像素结构的显示区域,第二部分彩色滤光层对应覆盖所述像素结构的非显示区域;所述第二部分彩色滤光层中设置有透气孔。
  2. 根据权利要求1所述的COA阵列基板,其中,所述透气孔在所述第二部分彩色滤光层的厚度方向上贯穿所述第二部分彩色滤光层。
  3. 根据权利要求2所述的COA阵列基板,其中,所述透气孔的数量为多个,多个所述透气孔相互间隔其等间距分布。
  4. 根据权利要求2所述的COA阵列基板,其中,所述透气孔的形状为圆形或方形。
  5. 根据权利要求4所述的COA阵列基板,其中,所述透气孔的形状为圆形,其截面的直径为3~6μm。
  6. 根据权利要求4所述的COA阵列基板,其中,所述透气孔的形状为方形,其截面的边长为3~6μm。
  7. 根据权利要求1所述的COA阵列基板,其中,所述像素结构还包括设置于所述衬底基板上的薄膜晶体管和像素电极,所述薄膜晶体管上覆设有第一钝化层,所述彩色滤光层设置于所述第一钝化层上,所述彩色滤光层上覆设有第二钝化层,所述像素电极设置于所述第二钝化层上;其中,所述像素电极通过设置在所述第一钝化层、彩色滤光层以及第二钝化层中的过孔电性连接到所述薄膜晶体管。
  8. 根据权利要求7所述的COA阵列基板,其中,所述像素结构被设置为红色子像素、绿色子像素或蓝色子像素,所述红色子像素的彩色滤光层为红色滤光层,所述绿色子像素的彩色滤光层为绿色滤光层,所述蓝色子像素的彩色滤光层为蓝色滤光层。
  9. 根据权利要求7所述的COA阵列基板,其中,所述第一钝化层和第二钝化层的材料为氮化硅、氧化硅或者是氮化硅与氧化硅的组合物;所述像素电 极的材料选自铟锡氧化物、铟锌氧化物、铝锡氧化物、铝锌氧化物和铟锗锌氧化物中的一种或多种。
  10. 一种液晶显示面板,包括相对设置的阵列基板和对盒基板,所述阵列基板和所述对盒基板之间设置有液晶分子,其中,所述阵列基板为COA阵列基板,所述COA阵列基板包括衬底基板以及阵列设置在所述衬底基板上的多个像素结构,其中,所述像素结构中设置有彩色滤光层,所述彩色滤光层包括第一部分和第二部分,第一部分彩色滤光层对应覆盖所述像素结构的显示区域,第二部分彩色滤光层对应覆盖所述像素结构的非显示区域;所述第二部分彩色滤光层中设置有透气孔。
  11. 根据权利要求10所述的液晶显示面板,其中,所述透气孔在所述第二部分彩色滤光层的厚度方向上贯穿所述第二部分彩色滤光层。
  12. 根据权利要求11所述的液晶显示面板,其中,所述透气孔的数量为多个,多个所述透气孔相互间隔其等间距分布。
  13. 根据权利要求11所述的液晶显示面板,其中,所述透气孔的形状为圆形或方形。
  14. 根据权利要求13所述的液晶显示面板,其中,所述透气孔的形状为圆形,其截面的直径为3~6μm。
  15. 根据权利要求13所述的液晶显示面板,其中,所述透气孔的形状为方形,其截面的边长为3~6μm。
  16. 根据权利要求10所述的液晶显示面板,其中,所述像素结构还包括设置于所述衬底基板上的薄膜晶体管和像素电极,所述薄膜晶体管上覆设有第一钝化层,所述彩色滤光层设置于所述第一钝化层上,所述彩色滤光层上覆设有第二钝化层,所述像素电极设置于所述第二钝化层上;其中,所述像素电极通过设置在所述第一钝化层、彩色滤光层以及第二钝化层中的过孔电性连接到所述薄膜晶体管。
  17. 根据权利要求16所述的液晶显示面板,其中,所述像素结构被设置为红色子像素、绿色子像素或蓝色子像素,所述红色子像素的彩色滤光层为红色滤光层,所述绿色子像素的彩色滤光层为绿色滤光层,所述蓝色子像素的彩色滤光层为蓝色滤光层。
  18. 根据权利要求16所述的液晶显示面板,其中,所述第一钝化层和第二 钝化层的材料为氮化硅、氧化硅或者是氮化硅与氧化硅的组合物;所述像素电极的材料选自铟锡氧化物、铟锌氧化物、铝锡氧化物、铝锌氧化物和铟锗锌氧化物中的一种或多种。
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KR20140098402A (ko) * 2013-01-31 2014-08-08 엘지디스플레이 주식회사 컬러필터를 가지는 박막트랜지스터 기판 및 그 제조 방법
CN104375344A (zh) * 2014-11-21 2015-02-25 深圳市华星光电技术有限公司 液晶显示面板及其彩膜阵列基板
CN104965366A (zh) * 2015-07-15 2015-10-07 深圳市华星光电技术有限公司 阵列彩膜集成式液晶显示面板的制作方法及其结构
CN105353571A (zh) * 2015-11-27 2016-02-24 深圳市华星光电技术有限公司 Coa基板、液晶显示面板及液晶显示装置
CN105700258A (zh) * 2016-04-08 2016-06-22 深圳市华星光电技术有限公司 液晶显示面板及其制作方法
CN106324933A (zh) * 2016-10-12 2017-01-11 深圳市华星光电技术有限公司 薄膜晶体管阵列基板及其制备方法及液晶显示面板

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