WO2018105446A1 - Élément optique, élément de formation d'image intermédiaire de type réflexion et son procédé de fabrication - Google Patents

Élément optique, élément de formation d'image intermédiaire de type réflexion et son procédé de fabrication Download PDF

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Publication number
WO2018105446A1
WO2018105446A1 PCT/JP2017/042610 JP2017042610W WO2018105446A1 WO 2018105446 A1 WO2018105446 A1 WO 2018105446A1 JP 2017042610 W JP2017042610 W JP 2017042610W WO 2018105446 A1 WO2018105446 A1 WO 2018105446A1
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Prior art keywords
optical element
reflective
coating film
thickness direction
adhesive
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PCT/JP2017/042610
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English (en)
Japanese (ja)
Inventor
藤井　雄一
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コニカミノルタ株式会社
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Publication of WO2018105446A1 publication Critical patent/WO2018105446A1/fr

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors

Definitions

  • the present invention relates to a reflective aerial imaging element that forms a real image of an object to be projected in the air, an optical element used for the reflective aerial imaging element, and a method of manufacturing the same.
  • a conventional reflective aerial imaging element is disclosed in Patent Document 1.
  • This reflective aerial imaging element has two flat optical elements.
  • a plurality of substrates such as transparent glass having a reflecting surface parallel to the thickness direction are juxtaposed via an adhesive in a direction perpendicular to the reflecting surface.
  • the reflective surface is formed on the substrate by vapor deposition of aluminum, silver, or the like.
  • a reflection type aerial imaging element is formed by stacking and bonding two optical elements so that the reflecting surfaces are perpendicular to each other.
  • a projection object is disposed below the reflective aerial imaging element having the above-described configuration, and light is irradiated toward the projection object.
  • a part of the light reflected by the projection enters the lower optical element from the lower surface, and is reflected by the reflecting surface and then enters the upper optical element.
  • the light reflected by the reflective surface of the upper optical element is emitted from the upper surface of the reflective aerial imaging element, and the real image of the projected object is obtained in the air at a position symmetrical to the projection object with respect to the reflective aerial imaging element.
  • Imaged Thereby, the image of the projection object is displayed in a state of floating in the air. That is, an aerial image of the projection object is displayed.
  • JP 2012-155345 A (6th page, 7th page, FIGS. 4 and 5)
  • the adhesive between the lower and upper surfaces of the reflective aerial imaging element is exposed, so that environmental changes such as temperature change and humidity change are exposed. And the adhesive deteriorates due to cleaning and washing.
  • the adhesive deteriorates, deterioration such as corrosion of the reflecting surface occurs due to water or the like entering between the adhesive and the reflecting surface. For this reason, the image quality of the aerial video may be degraded.
  • the adhesive between adjacent substrates deteriorates, the reflective aerial imaging element may be damaged. Therefore, there is a problem that the reliability of the reflective aerial imaging element is lowered.
  • An object of the present invention is to provide an optical element capable of improving reliability and a reflective aerial imaging element using the same. Another object of the present invention is to provide a method for manufacturing an optical element and a reflective aerial imaging element that can improve reliability.
  • the present invention provides a flat plate-like structure in which a plurality of transparent base materials each having a reflective surface parallel to the thickness direction are juxtaposed via a first adhesive in a direction perpendicular to the reflective surface.
  • the reflective aerial imaging element in which the first optical element and the second optical element are stacked in the thickness direction, and the reflective surface of the first optical element and the reflective surface of the second optical element are orthogonal to each other.
  • a transparent coating film is provided on the exposed surfaces of the first optical element and the second optical element.
  • the present invention provides a planar optical element in which a plurality of transparent base materials having a reflective surface parallel to the thickness direction are juxtaposed via an adhesive in a direction perpendicular to the reflective surface.
  • a transparent coating film is provided on at least one surface in the thickness direction.
  • the present invention also relates to a method for manufacturing a flat optical element in which a plurality of transparent base materials having a reflective surface parallel to the thickness direction are juxtaposed in a direction perpendicular to the reflective surface via a first adhesive.
  • a lamination fixing step of forming a fixing block by stacking a plurality of transparent substrates having the reflection surface on one surface via the first adhesive;
  • a cutting step of forming a thin plate-like material in which the base materials obtained by dividing the substrate by cutting the fixing block at a predetermined period in a direction perpendicular to the reflecting surface are arranged;
  • the present invention also provides a flat plate-like first optical element in which a plurality of transparent base materials having a reflecting surface parallel to the thickness direction are juxtaposed via a first adhesive in a direction perpendicular to the reflecting surface, and
  • a lamination fixing step of forming a fixing block by stacking a plurality of transparent substrates having the reflection surface on one surface via the first adhesive;
  • the transparent coating film is provided on the exposed surfaces of the first optical element and the second optical element. For this reason, deterioration of the adhesive between adjacent substrates can be prevented. Thereby, damage to the reflective aerial imaging element can be prevented. Further, deterioration such as corrosion of the reflecting surface can be prevented, and deterioration of the image quality of the aerial image can be prevented. Therefore, the reliability of the reflective aerial imaging element can be improved.
  • a transparent coating film is provided on at least one surface in the thickness direction.
  • a coating film can be arranged on the exposed surface of the reflective aerial imaging element formed by overlapping two optical elements. Therefore, the reliability of the reflective aerial imaging element can be improved.
  • the optical element and the reflective aerial imaging element of the present invention it is provided with a coating process for coating a transparent coating film. Thereby, it is possible to easily form a reflective aerial imaging element and an optical element that can improve reliability.
  • the perspective view which expanded the principal part of FIG. 1 is an exploded perspective view of a reflective aerial imaging element according to a first embodiment of the present invention.
  • the top view which shows the reflection type aerial imaging element of 1st Embodiment of this invention 1 is a side view showing a reflective aerial imaging element according to a first embodiment of the present invention. Side surface sectional drawing to which the adhesion part between the base materials of the optical element of the reflection type aerial imaging element of 1st Embodiment of this invention was expanded.
  • the enlarged top view which expanded the reflective type aerial imaging element of 1st Embodiment of this invention The enlarged side view which expanded the optical element of the reflection type aerial image formation element of 1st Embodiment of this invention
  • the side view which shows the spacer formation process of the reflection type air imaging element of 1st Embodiment of this invention The perspective view which shows the board
  • FIG. 1 is a perspective view of an aerial image display apparatus provided with the reflective aerial imaging element of the first embodiment.
  • FIG. 2 shows an enlarged perspective view of the main part of FIG. 3 to 5 show an exploded perspective view, a plan view, and a side view of the reflective aerial imaging element, respectively.
  • the X direction, the Y direction, and the Z direction indicate the width direction, the depth direction, and the thickness direction of the reflective aerial imaging element 10, respectively.
  • illustration of the reinforcing plate 5 and the coating film 30 is omitted.
  • an arrow Q indicates an optical path.
  • the aerial image display device 100 includes a light source 20 and a reflective aerial imaging element 10.
  • the reflective aerial imaging element 10 includes a flat optical element 1 (first optical element), a flat optical element 2 (second optical element), and a flat reinforcing plate 5.
  • the planar shape of the optical elements 1 and 2 is formed in a substantially square shape having a side length of, for example, about 100 mm.
  • the optical elements 1 and 2 are formed of a transparent resin such as acrylic resin or a light-transmitting material such as glass, and the reflecting surface 4 parallel to the thickness direction (Z direction) is parallel with a predetermined period Dr (for example, 0.5 mm). Arranged.
  • the optical elements 1 and 2 are formed by adhering a plurality of transparent base materials 25 having reflective surfaces 4 on both opposing surfaces by an adhesive 3 (see FIG. 6) disposed on the reflective surface 4. That is, in the optical elements 1 and 2, a plurality of transparent base materials 25 having a reflective surface 4 parallel to the thickness direction (Z direction) are juxtaposed via the adhesive 3 in a direction perpendicular to the reflective surface 4. .
  • the base material 25 is formed of a transparent resin such as an acrylic resin or glass.
  • the adhesive 3 is made of a two-component mixed adhesive in which a main agent made of, for example, an epoxy resin or an acrylic resin and a curing agent made of, for example, a polyamide resin are mixed.
  • the reflecting surface 4 is formed on the base material 25 by performing sputtering or vapor deposition of, for example, aluminum or silver.
  • FIG. 6 shows an enlarged side cross-sectional view of a bonding portion between adjacent base materials 25.
  • a plurality of dot-like spacers 15 are arranged in a matrix on the reflecting surface 4 in plan view.
  • the spacer 15 is made of, for example, an ultraviolet curable resin, and has a height H (projection amount in a direction perpendicular to the reflecting surface 4) within a range of, for example, 20 ⁇ m ⁇ 1 ⁇ m, and a predetermined pitch E (this embodiment) in two orthogonal directions. 1 mm) in the form.
  • the upper surface 1a, the lower surface 1b and the side end surface 1c of the lower optical element 1 are covered with a transparent coating film 30 (see FIG. 3).
  • the upper surface 2 a (outgoing surface 19), the lower surface 2 b and the side end surface 2 c of the upper optical element 2 are covered with a transparent coating film 30.
  • the material of the coating film 30 is not particularly limited, but for example, an ultraviolet curable resin can be used. Thereby, the coating film 30 can be formed easily. Further, as the material of the coating film 30, any of melamine resin, urethane resin, acrylic resin, silane compound, metal oxide, and the like can be used. The material of the coating film 30 is preferably a material that is less susceptible to environmental changes and cleaning / cleaning than the adhesive 3.
  • the thickness of the coating film 30 is smaller than 100 nm, it is difficult to sufficiently protect the adhesive 3 and the reflecting surface 4. If the thickness of the coating film 30 is larger than 100 ⁇ m, it is difficult to stably form the coating film 30. For this reason, the thickness of the coating film 30 is desirably 100 nm or more and 100 ⁇ m or less.
  • the hardness of the coating film 30 is F or more in pencil hardness because damage to the coating film 30 can be prevented.
  • the reflectance of the surface of the coating film 30 is lower than the reflectance of the surface of the substrate 25.
  • the coating film 30 is formed of, for example, an amorphous fluororesin (Cytop (registered trademark) manufactured by Asahi Glass Co., Ltd.)
  • the reflectance of the surface of the coating film 30 may be made lower than the reflectance of the surface of the substrate 25. it can.
  • the planar shape of the reinforcing plate 5 is formed in a substantially square shape having a side length of, for example, about 110 mm.
  • the reinforcing plate 5 is made of a transparent resin such as an acrylic resin or a light transmissive material such as glass.
  • the optical element 1 is bonded to the reinforcing plate 5 via an adhesive 6 (see FIG. 3).
  • an adhesive 6 see FIG. 3
  • a silicone adhesive can be used as the adhesive 6.
  • the optical element 2 is bonded onto the optical element 1 via an adhesive 7 (see FIG. 3).
  • the optical elements 1 and 2 are bonded so that the reflecting surface 4 of the optical element 1 and the reflecting surface 4 of the optical element 2 are orthogonal to each other.
  • the optical elements 1 and 2 are arranged in parallel in the thickness direction (Z direction) and are disposed on the reinforcing plate 5, and the reinforcing plate 5 covers the optical elements 1 and 2.
  • the optical elements 1 and 2 can be reinforced by the reinforcing plate 5.
  • a silicone adhesive can be used as the adhesive 7.
  • the adhesives 6 and 7 are not limited to silicone adhesives, and may be two-component curable adhesives such as epoxy resins or acrylic resins.
  • the adhesives 6 and 7 may be adhesives made of different materials. Further, it is desirable that the exposed surfaces of the adhesives 6 and 7 are covered with the coating film 30 because deterioration of the adhesives 6 and 7 can be prevented.
  • the lower surface of the reinforcing plate 5 forms an incident surface 18 on which light enters (see FIGS. 1 and 3), and the upper surface 2a of the optical element 2 forms an exit surface 19 on which light exits (see FIGS. 1 and 3). .
  • the thickness T2 (see FIG. 5) of the reinforcing plate 5 is larger than the thickness T1 of the optical elements 1 and 2. Thereby, the reinforcement effect with respect to the optical elements 1 and 2 can be improved more. It is desirable that the thickness T2 of the reinforcing plate 5 is at least twice the thickness T1 of the optical elements 1 and 2. Thereby, the reinforcement effect by the reinforcement board 5 can be improved further. In this embodiment, the thickness T2 of the reinforcing plate 5 is 2.8 mm, and the thickness T1 of the optical elements 1 and 2 is 1.34 mm.
  • the surface of the reinforcing plate 5 is provided with an antireflection part (not shown) subjected to antireflection treatment.
  • antireflection treatment include coating of magnesium fluoride or the like (optical thin film treatment), arrangement of a micro concavo-convex structure in which an average period of concavo-convex is not more than a visible light wavelength, and the like.
  • the light source 20 is disposed on the lower optical element 1 side (below the reinforcing plate 5 in FIG. 1).
  • the light source 20 is made of an LED, for example, and emits white illumination light L.
  • the light source 20 emits the illumination light L to the projection object OB so that the reflected light of the projection object OB enters the incident surface 18 of the reinforcing plate 5 at an incident angle of about 45 °.
  • the light source 20 may be formed by CCFL (Cold Cathode Fluorescent Lamp).
  • a projection object OB (see FIGS. 1 and 2) of a two-dimensional image is disposed on the optical element 1 side (below the reinforcing plate 5 in FIG. 1), and a light source 20 is provided.
  • the illumination light L emitted from the light source 20 is reflected by the projection object OB.
  • a part of the reflected light of the projection object OB enters the inside of the reinforcing plate 5 from the incident surface 18 of the reinforcing plate 5.
  • the light incident on the reinforcing plate 5 from the incident surface 18 passes through the inside of the reinforcing plate 5 and then enters the optical element 1 from the lower surface 1b of the optical element 1 as indicated by an arrow Q (see FIG. 2). After being reflected by the reflecting surface 4, the light enters the optical element 2 from the lower surface 2b (see FIG. 3).
  • the light reflected by the reflecting surface 4 of the optical element 2 is emitted upward from the upper surface 2a of the optical element 2 (emission surface 19, see FIG. 2).
  • a real image (aerial image FI) of the projection object OB is formed on the reflective aerial imaging element 10 in the air at a position symmetrical to the projection object OB. That is, the aerial image FI of the projection object OB is displayed in a state of floating in the air.
  • the reflecting surface 4 of the optical element 1 is projected 45 onto the surface parallel to the lower surface 1 b of the optical element 1 with respect to the line-of-sight direction EL of the user's eye EY (see FIG. 1).
  • the visibility of the aerial image FI can be optimized.
  • a transparent coating film 30 is provided on the exposed side end face 1c of the optical element 1 and the exposed upper face 2a and side end face 2c of the optical element 2.
  • the adhesive 3 on the exposed surface is covered with the coating film 30, and deterioration of the adhesive 3 due to temperature / humidity changes and cleaning / cleaning can be prevented.
  • damage to the reflective aerial imaging element 10 can be prevented.
  • deterioration of the reflecting surface 4 such as corrosion can be prevented, and deterioration of the image quality of the aerial image FI can be prevented.
  • the reflectance of the surface of the coating film 30 is lower than the reflectance of the surface of the base material 25, the reflection of the external light on the emission surface 19 can be reduced. Therefore, it is possible to prevent the visibility of the aerial image FI from being deteriorated due to external light reflection. In addition, light loss can be suppressed and the aerial image FI can be displayed brightly.
  • the projection object OB is information relating to, for example, a product
  • a touch panel of a device used at a medical site or a construction site may be displayed as an aerial image FI. Thereby, contamination of an apparatus etc. can be prevented.
  • the reflective aerial imaging element 10 may be mounted on a game machine or the like.
  • the projection object OB is not limited to a two-dimensional image, and may be a three-dimensional object.
  • the projection object OB may be an image displayed on a display device such as a liquid crystal panel.
  • the light source incorporated in the display device can be used without the light source 20.
  • FIG. 7 shows an enlarged top view in which the reflective aerial imaging element 10 is enlarged.
  • FIG. 8 shows an enlarged side view in which the optical element 1 is enlarged.
  • illustration of the reinforcement board 5 is abbreviate
  • the refraction angle ⁇ 2 is calculated as 27.8 ° from the equation (1).
  • the pitch Pr is calculated as 0.78 mm from the equation (2).
  • the thickness Dr of the optical element 1 is 1.5 mm and the period Dr is 0.56 mm, the total light flux of the light beam Qp incident on the lower surface 1b of the optical element 1 at the incident angle of 45 ° is reflected on the reflecting surface 4. After being reflected once, it can be emitted from the upper surface 1a. Thereby, the image quality of the aerial image FI imaged by the reflective aerial imaging element 10 can be improved.
  • the pitch Pr becomes 0.707 mm. Since the refraction angle ⁇ 2 is 27.8 °, the thickness T1 of the optical element 1 is 1.34 mm from the equation (2). Therefore, when the optical elements 1 and 2 are formed using the substrate 21 having a plate thickness of 0.5 mm as will be described later, when the thickness T1 of the optical elements 1 and 2 is 1.34 mm by the polishing process, The total light beam Qp incident on the lower surface 1b at the incident angle can be emitted from the upper surface 1a after being reflected once by the reflecting surface 4. Thereby, the image quality of the aerial image FI imaged by the reflective aerial imaging element 10 can be improved. Moreover, the thickness T1 of the optical element 1 can be made smaller than when the period Dr is 0.56 mm. Therefore, more material 1 ′ can be obtained from the fixing block 12 (see FIG. 14) described later.
  • the total light flux of the light beam Qp incident on the lower surface 1b at an incident angle of 45 ° is reflected once by the reflecting surface 4. After that, the light can be emitted from the upper surface 1a. That is, light incident on the incident surface 18 at an incident angle of 45 ° can be efficiently emitted from the output surface 19. Therefore, the image quality of the aerial video FI can be improved.
  • FIG. 9 is a diagram showing a manufacturing process of the reflective aerial imaging element 10.
  • the manufacturing process of the reflective aerial imaging element 10 includes a reflecting surface forming process, a spacer forming process, a stacking and fixing process, a cutting process, a polishing process, a coating process, an assembling process, and a reinforcing plate attaching process.
  • the reflective surfaces 4 are formed on both surfaces of the substrate 21 having a substantially square shape by sputtering or vapor deposition of aluminum or silver.
  • the substrate 21 is made of a thin glass plate.
  • the material of the glass plate is not particularly limited, for example, borosilicate glass can be used.
  • the reflecting surface 4 is formed of aluminum having a thickness (film thickness) of 100 nm. Note that the reflective surface 4 may be formed only on one surface of the substrate 21. Further, the substrate 21 may be formed of a thin transparent resin plate such as an acrylic resin.
  • the substrate 21 of this embodiment is a square of 100 mm ⁇ 100 mm and has a thickness of about 0.5 mm.
  • the thickness of the substrate 21 is preferably 0.6 mm or less. Thereby, a good aerial image FI can be obtained.
  • a fusion method can be used.
  • molten glass molten glass
  • a heart-shaped bottle whose upper surface is opened and the cross-sectional shape is squeezed at the bottom, and the glass overflowing from the upper surface of the bottle flows downward and is integrated under the bottle. Is the method. Thereby, since a glass surface is formed only by surface tension without contact other than air, a smooth surface can be obtained.
  • FIG. 11 is a side view showing the spacer forming step.
  • the spacer forming step is performed by a spacer forming unit 70 that moves in two directions (one indicated by an arrow F) substantially parallel to the reflecting surface 4 of the substrate 21.
  • the spacer forming unit 70 includes an inkjet head 71, an ultraviolet light source 72, and a distance measuring sensor 73.
  • the distance measuring sensor 73 measures the distance to the reflecting surface 4.
  • the ink jet head 71 ejects ink 71 a made of an ultraviolet curable resin toward the substrate 21.
  • the distance to the reflecting surface 4 is measured by the distance measurement sensor 73 at the measurement start position (for example, the end of the substrate 21), and this distance is set as a reference distance.
  • the distance between the planned dropping position of the ink 71 a on the reflecting surface 4 and the distance measuring sensor 73 is compared with the reference distance, and the ejection amount of the ink 71 a of the inkjet head 71 is varied. Thereby, the height of the spacer 15 can be made uniform.
  • the ultraviolet light source 72 irradiates the ultraviolet rays UV toward the ink 71a dropped on the reflecting surface 4 to cure the ink 71a.
  • the dot-shaped spacers 15 having a predetermined height (20 ⁇ m in this embodiment) are formed on the reflecting surface 4 of the substrate 21 in a matrix form having a pitch E (1 mm in this embodiment). It is formed by adhering to. Since the spacer 15 is formed in a dot shape by ink jet printing, the spacer 15 can be easily arranged on the reflecting surface 4.
  • FIG. 13 is a perspective view showing a lamination fixing process.
  • a plurality (200 in this embodiment) of the substrates 21 on which the spacers 15 are formed are stacked in a direction perpendicular to the reflecting surface 4 (the thickness direction of the substrate 21) and sandwiched by a sandwiching member (not shown). .
  • the stacked body 11 having the gap G between the adjacent substrates 21 is formed.
  • the laminated body 11 is immersed in the liquid adhesive 3 in a storage tank (not shown) in the state which continued the pressurization to the laminated body 11.
  • FIG. As a result, the adhesive 3 enters and fills the gap G.
  • the laminate 11 is pulled up from the storage tank and the adhesive 3 is cured. Thereby, the laminated body 11 is fixed and the fixing block 12 shown in FIG. 14 is formed.
  • the length of the fixing block 12 in the direction perpendicular to the reflecting surface 4 (the length in the stacking direction LM) is about 100 mm.
  • the spacer 15 that secures the gap G between the adjacent substrates 21 since the spacer 15 that secures the gap G between the adjacent substrates 21 is arranged, the thickness of the adhesive 3 between the substrates 21 can be made uniform, and the parallelism of the reflecting surfaces 4 can be easily maintained.
  • the gap G increases, the film thickness of the adhesive 3 of the optical element 1 increases, so that the aerial image FI becomes rough. For this reason, it is desirable that the gap G be 50 ⁇ m or less.
  • the gap G is reduced, the aerial image FI can be favorably imaged, but filling of the liquid adhesive 3 becomes difficult. For this reason, it is desirable that the gap G be 10 ⁇ m or more.
  • the spacer formation process is omitted from the manufacturing process of the reflective aerial imaging element 10, the adhesive 3 is applied to the reflective surfaces 4 of the plurality of substrates 21 on which the reflective surfaces 4 are formed, and the adhesive 3 is applied to the reflective surfaces 4.
  • the laminated body 11 may be formed by stacking a plurality of substrates 21 coated with the slab in a direction perpendicular to the reflecting surface 4. In this case, the adhesive 3 is cured in a state in which the pressurization to the laminate 11 is continued without immersing the laminate 11 in the storage tank.
  • the fixing block 12 is cut in a direction perpendicular to the reflecting surface 4 at a predetermined period (for example, 1.8 mm) in a direction parallel to the reflecting surface 4.
  • a predetermined period for example, 1.8 mm
  • a plurality of materials 1 ′ of the optical element 1 in which the base material 25 composed of the divided substrate 21 is arranged in parallel are formed.
  • the configuration of the optical element 2 is the same as the configuration of the optical element 1, and the optical element 2 is also formed from the material 1 ′.
  • a wire saw is preferably used for cutting the fixing block 12, but a slicer may be used.
  • both surfaces in the thickness direction of the material 1 ′ of the optical element 1 are polished to a predetermined thickness (for example, 1.5 mm) by a lapping device. Thereafter, both surfaces of the material 1 ′ of the optical element 1 are mirror-finished by a polishing apparatus. At this time, the thickness of the material 1 ′ is 1.34 mm.
  • the coating film 30 is coated on the surface of the material 1 ′ by dipping.
  • the material 1 ′ is immersed in the coating solution 31 in the storage tank 40.
  • the coating solution 31 for example, a liquid ultraviolet curable resin can be used.
  • the material 1 ′ is pulled up from the storage tank 40, and the material 1 ′ is irradiated with ultraviolet rays. Harden.
  • the coating film 30 is formed on substantially the entire surface of the material 1 ′, and the optical elements 1 and 2 shown in FIG. 3 are obtained.
  • the dipping method the variation in the concentration of the coating liquid 31 is reduced, and the coating film 30 can be formed stably.
  • FIG. 16 is a side sectional view showing a modification of the coating process.
  • the coating film 30 is applied to the surface of the material 1 ′ by spray coating.
  • the material 1 ′ is placed on the mounting table 45 with one end face in the thickness direction facing down, and the coating liquid 31 is sprayed from the spray device 48 provided above toward the material 1 ′. Thereafter, ultraviolet rays are irradiated toward the material 1 '. Thereby, the coating film 30 is formed on the upper surface of the material 1 ′ in FIG. Thereafter, the material 1 ′ is turned upside down and the coating liquid 31 is sprayed from the spraying device 48. Thereby, the coating film 30 is formed on the lower surface of the material 1 ′ in FIG. In addition, you may spray the coating liquid 31 toward raw material 1 'in the state which suspended raw material 1'. In the painting process, the coating film 30 may be applied to the surface of the material 1 ′ by a method other than the dipping method and the spray coating method.
  • the dipping method or spray coating method may be performed a plurality of times for each material 1 ′. Further, in the coating process, the material 1 ′ coated with the coating liquid 31 may be dried by warm air or heating. If the coating liquid 31 is a transparent liquid thermosetting resin, the coating liquid 31 applied to the surface of the material 1 ′ is thermoset.
  • the optical elements 1 and 2 are stacked in the thickness direction (Z direction) so that the reflective surface 4 of the optical element 1 and the reflective surface 4 of the optical element 2 are orthogonal to each other, and the adhesive 7 (FIG. 3).
  • the optical elements 1 and 2 are bonded via the reference. As a result, the optical elements 1 and 2 are assembled in the thickness direction (Z direction).
  • the reinforcing plate 5 is bonded to the lower surface 1b of the optical element 1 via the adhesive 6 (see FIG. 3). That is, the reinforcing plate 5 is bonded with the adhesive 6 to one side (the lower surface 1 b) of the optical elements 1 and 2 in the juxtaposed direction (Z direction).
  • the reflective aerial imaging element 10 shown in FIG. 1 is formed.
  • the illumination light L of the light source 20 that has entered the adhesive 3 between the base materials 25 of the optical element 1 at an incident angle of, for example, 45 ° is reflected from the reflecting surface 4 and then emitted from the adhesive 3.
  • the light incident on the adhesive 3 is greatly attenuated and emitted, it hardly contributes to the image formation of the aerial image FI. Therefore, even if the spacer 15 is arranged in the adhesive 3 between the base materials 25 of the optical element 1, there is no big trouble in the display of the aerial image FI.
  • the transparent coating film 30 is provided on the exposed surfaces (side end surfaces 1c, 2c, upper surface 2a) of the optical elements 1 and 2 of the reflective aerial imaging element 10.
  • the adhesive 3 on the exposed surface is covered with the coating film 30, and deterioration of the adhesive 3 due to temperature / humidity changes and cleaning / cleaning can be prevented.
  • damage to the reflective aerial imaging element 10 can be prevented.
  • deterioration of the reflecting surface 4 such as corrosion can be prevented, and deterioration of the image quality of the aerial image FI can be prevented. Therefore, the reliability of the reflective aerial imaging element 10 can be improved.
  • the coating film 30 can prevent the surface of the substrate 25 from being scratched or chipped, and the substrate 25 can be prevented from cracking.
  • the coating film 30 is made of an ultraviolet curable resin, the coating film 30 can be easily formed.
  • the coating film 30 when the thickness of the coating film 30 is 100 nm or more and 100 ⁇ m or less, the coating film 30 can be stably formed and the adhesive 3 and the reflecting surface 4 can be sufficiently protected.
  • the coating film 30 when the hardness of the coating film 30 is F or more in pencil hardness, the coating film 30 can be easily prevented from being damaged.
  • the reflectance of the surface of the coating film 30 is lower than the reflectance of the surface of the substrate 25, the light loss can be suppressed and the aerial image FI can be displayed brightly. Further, reflection of the external light on the emission surface 19 can be reduced. Therefore, it is possible to prevent the visibility of the aerial image FI from being lowered.
  • the coating film 30 when the coating film 30 is formed by the dipping method in the coating process, the variation in the concentration of the coating liquid 31 is reduced, and the coating film 30 can be formed stably. Further, when the coating film 30 is formed by the spray coating method in the coating process, the amount of the coating liquid 31 can be reduced as compared with the dipping method, and the coating film 30 can be easily formed only at a necessary portion. .
  • an application process may be performed between the assembly process and the reinforcing plate attachment process, or an application process may be performed after the reinforcement plate attachment process.
  • the coating film 30 can be formed on the exposed surfaces (side end surfaces 1c, 2c, upper surface 2a) of the optical elements 1 and 2.
  • coating process is performed after a reinforcement board attachment process, the coating film 30 can be formed also on the exposed surface of the reinforcement board 5, and damage etc. of the reinforcement board 5 can be prevented.
  • the coating film 30 may be formed on one surface and the side end surfaces 1c and 2c in the thickness direction of the optical elements 1 and 2, and the formation surface of the coating film 30 of the optical element 2 may be disposed on the upper surface 2a.
  • the coating film 30 since the coating film 30 is formed on both surfaces of the optical elements 1 and 2 in the thickness direction, it is not necessary to distinguish between the front and back of the optical elements 1 and 2 in the assembly process. Therefore, the number of manufacturing steps for the reflective aerial imaging element 10 can be reduced.
  • the reinforcing plates 5 may be provided on both sides of the reflective aerial imaging element 10 or the reinforcing plates 5 may be omitted.
  • the coating film 30 is formed on the side end surfaces 1c and 2c that are exposed surfaces.
  • the coating film 30 is formed on the side end surfaces 1c and 2c, the upper surface 2a, and the lower surface 1b that are exposed surfaces.
  • FIG. 17 shows a diagram of the manufacturing process of the reflective aerial imaging element 10 of the second embodiment.
  • the same reference numerals are given to the same parts as those in the first embodiment shown in FIGS.
  • This embodiment is different from the first embodiment in that it includes a tiling process. Other parts are the same as those in the first embodiment.
  • FIG. 18 is a plan view of the optical element 1 at the completion of the coating process after the tiling process.
  • the reflecting surfaces 4 of a plurality of mirror-finished materials (four in this embodiment) of the material 1 ′ are parallel to each other, and the reflecting surfaces 4 are continuous at the side end surface 1′c of the material 1 ′.
  • a plurality of materials 1 ′ are bonded to each other with an adhesive 9 on the side end face 1 ′ c in a direction perpendicular to the thickness direction.
  • the large optical element 1 can be easily formed by tiling a plurality of materials 1 ′.
  • the large optical element 2 can be easily formed by tiling a plurality of materials 1 ′ in the same manner as the large optical element 1.
  • the coating process is performed after the tiling process. For this reason, in the coating process, when forming the coating film 30 on at least one surface in the thickness direction (Z direction) of the large optical elements 1 and 2 tiled with a plurality of materials 1 ′, between adjacent materials 1 ′ The adhesive 9 is covered with the coating film 30. Thereby, deterioration of the adhesives 3 and 9 of the large optical elements 1 and 2 can be prevented.
  • the material of the adhesive 9 may be the same as or different from the material of the adhesive 3.
  • the reflective surface 4 of the large optical element 1 and the reflective surface 4 of the large optical element 2 are laminated in the thickness direction (Z direction) so as to be orthogonal to each other, and are bonded via the adhesive 7. Thereafter, the reinforcing plate 5 having a size covering the large optical elements 1 and 2 is bonded to the lower surface 1 b of the large optical element 1 through the adhesive 6. Thereby, a large reflective aerial imaging element 10 is formed.
  • the same effect as in the first embodiment can be obtained. Further, since the manufacturing process of the reflective aerial imaging element 10 includes a tiling process, the large reflective aerial imaging element 10 can be easily formed. Further, an application process is performed after the tiling process, and the adhesive 9 is covered with the coating film 30 in the application process. Thereby, deterioration of the adhesives 3 and 9 of the reflective aerial imaging element 10 can be prevented.
  • the application process is performed after the tiling process.
  • the tiling process may be performed after the application process.
  • the tiling process is performed after the coating film 30 is formed on at least one surface of the plurality of materials 1 ′ in the thickness direction.
  • the coating process may be performed after the large optical elements 1 and 2 tiling a plurality of materials 1 'are bonded in the thickness direction so that the reflecting surfaces 4 are perpendicular to each other in the assembly process.
  • the present invention provides a flat plate-like first optical element and a second optical element in which a plurality of transparent base materials having a reflecting surface parallel to the thickness direction are juxtaposed via a first adhesive in a direction perpendicular to the reflecting surface.
  • a reflective aerial imaging element in which optical elements are stacked in the thickness direction, and the reflective surface of the first optical element and the reflective surface of the second optical element are orthogonal to each other, A transparent coating film is provided on the exposed surfaces of the first optical element and the second optical element.
  • the coating film is provided on both end surfaces in the thickness direction.
  • the coating film is provided on both end faces in the thickness direction of the first optical element and on both end faces in the thickness direction of the second optical element.
  • the reflective plate includes a reinforcing plate bonded to one end surface in the thickness direction with a second adhesive, and the coating film is provided on the other end surface in the thickness direction.
  • the present invention preferably includes a pair of reinforcing plates adhered to both end faces in the thickness direction by a second adhesive.
  • the coating film is made of an ultraviolet curable resin.
  • the thickness of the coating film is preferably 100 nm or more and 100 ⁇ m or less.
  • the present invention preferably has a hardness of the coating film of F or more in pencil hardness.
  • the reflectance of the surface of the coating film is lower than the reflectance of the surface of the substrate.
  • the present invention provides a planar optical element in which a plurality of transparent base materials having a reflective surface parallel to the thickness direction are juxtaposed via an adhesive in a direction perpendicular to the reflective surface.
  • a transparent coating film is provided on at least one surface in the thickness direction.
  • the present invention also relates to a method for manufacturing a flat optical element in which a plurality of transparent base materials having a reflective surface parallel to the thickness direction are juxtaposed in a direction perpendicular to the reflective surface via a first adhesive.
  • a lamination fixing step of forming a fixing block by stacking a plurality of transparent substrates having the reflection surface on one surface via the first adhesive;
  • a cutting step of forming a thin plate-like material in which the base materials obtained by dividing the substrate by cutting the fixing block at a predetermined period in a direction perpendicular to the reflecting surface are arranged;
  • the coating film is formed by a dipping method or a spray coating method in the coating step.
  • the present invention preferably includes a polishing step for polishing the material in the method for manufacturing an optical element having the above-described configuration, and the coating step is performed after the polishing step.
  • the present invention further includes a tiling step of bonding a plurality of the materials with a second adhesive at a side end surface in a direction orthogonal to the thickness direction in the method for manufacturing an optical element having the above-described configuration, and after the tiling step, It is preferable to perform a coating process and cover the second adhesive with the coating film in the coating process.
  • the present invention also provides a flat plate-like first optical element in which a plurality of transparent base materials having a reflecting surface parallel to the thickness direction are juxtaposed via a first adhesive in a direction perpendicular to the reflecting surface, and
  • a lamination fixing step of forming a fixing block by stacking a plurality of transparent substrates having the reflection surface on one surface via the first adhesive;
  • a reinforcing plate is attached with a second adhesive on one or both sides in the thickness direction between the assembly step and the coating step. It is preferable to provide an attaching step.
  • the coating film is formed by a dipping method or a spray coating method in the coating step.
  • the present invention can be used for a reflective aerial imaging element that forms a real image of a projection object in the air and an optical element used for the reflective aerial imaging element.
  • Optical element (first optical element) 2 Optical elements (second optical elements) DESCRIPTION OF SYMBOLS 3 Adhesive 4 Reflective surface 5 Reinforcement plate 6 Adhesive 7 Adhesive 9 Adhesive 10 Reflective aerial imaging element 11 Laminated body 12 Adhering block 15 Spacer 18 Incident surface 19 Outgoing surface 20 Light source 21 Substrate 25 Base material 30 Coating film 31 Coating liquid 40 Storage tank 100 Aerial video display device G Gap OB Projection object FI Aerial video L Illumination light LM Stacking direction

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

L'invention concerne un élément de formation d'image intermédiaire de type réflexion permettant d'améliorer la fiabilité. Un élément de formation d'image intermédiaire de type réflexion (10) dans lequel des éléments optiques en forme de plaque plate (1), (2) dans lesquels une pluralité de substrats transparents (25) ayant des surfaces réfléchissantes (4) parallèles à une direction d'épaisseur sont disposées en parallèle par l'intermédiaire d'un adhésif (3) dans la direction perpendiculaire aux surfaces réfléchissantes (4) sont superposés dans le sens de l'épaisseur, et les surfaces réfléchissantes (4) de l'élément optique (1) et les surfaces réfléchissantes (4) de l'élément optique (2) sont orthogonales, un film de revêtement transparent (30) étant disposé sur des surfaces exposées des éléments optiques (1), (2).
PCT/JP2017/042610 2016-12-06 2017-11-28 Élément optique, élément de formation d'image intermédiaire de type réflexion et son procédé de fabrication WO2018105446A1 (fr)

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JP2016-236928 2016-12-06

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Cited By (1)

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CN109523931A (zh) * 2019-01-22 2019-03-26 像航（上海）科技有限公司 显示器和智能设备

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JP2005290897A (ja) * 2004-04-02 2005-10-20 Sumikei-Nikkei Engineering Co Ltd パネルの目地構造
JP2013218246A (ja) * 2012-04-12 2013-10-24 Seiko Epson Corp 光学素子、撮像装置、電子機器及び光学素子の製造方法
WO2013179405A1 (fr) * 2012-05-30 2013-12-05 パイオニア株式会社 Procédé de fabrication d'un élément de formation d'images à plans symétriques réfléchissants, élément de formation d'images à plans symétriques réfléchissants et dispositif d'affichage d'images spatiales pourvu d'un élément de formation d'images à plans symétriques réfléchissants
JP2016109878A (ja) * 2014-12-05 2016-06-20 有限会社オプトセラミックス 空中結像用の光学パネルの製造方法
WO2016178424A1 (fr) * 2015-05-07 2016-11-10 コニカミノルタ株式会社 Procédé de fabrication d'élément optique de formation d'images, dispositif de fabrication d'élément optique de formation d'images, feuille de miroir, et élément optique de formation d'images
JP2016224110A (ja) * 2015-05-27 2016-12-28 シャープ株式会社 光学結合素子

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Publication number Priority date Publication date Assignee Title
JP2005290897A (ja) * 2004-04-02 2005-10-20 Sumikei-Nikkei Engineering Co Ltd パネルの目地構造
JP2013218246A (ja) * 2012-04-12 2013-10-24 Seiko Epson Corp 光学素子、撮像装置、電子機器及び光学素子の製造方法
WO2013179405A1 (fr) * 2012-05-30 2013-12-05 パイオニア株式会社 Procédé de fabrication d'un élément de formation d'images à plans symétriques réfléchissants, élément de formation d'images à plans symétriques réfléchissants et dispositif d'affichage d'images spatiales pourvu d'un élément de formation d'images à plans symétriques réfléchissants
JP2016109878A (ja) * 2014-12-05 2016-06-20 有限会社オプトセラミックス 空中結像用の光学パネルの製造方法
WO2016178424A1 (fr) * 2015-05-07 2016-11-10 コニカミノルタ株式会社 Procédé de fabrication d'élément optique de formation d'images, dispositif de fabrication d'élément optique de formation d'images, feuille de miroir, et élément optique de formation d'images
JP2016224110A (ja) * 2015-05-27 2016-12-28 シャープ株式会社 光学結合素子

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Publication number Priority date Publication date Assignee Title
CN109523931A (zh) * 2019-01-22 2019-03-26 像航（上海）科技有限公司 显示器和智能设备

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