WO2018087029A1 - Device and method for securing a mask in a flat position - Google Patents

Device and method for securing a mask in a flat position Download PDF

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Publication number
WO2018087029A1
WO2018087029A1 PCT/EP2017/078299 EP2017078299W WO2018087029A1 WO 2018087029 A1 WO2018087029 A1 WO 2018087029A1 EP 2017078299 W EP2017078299 W EP 2017078299W WO 2018087029 A1 WO2018087029 A1 WO 2018087029A1
Authority
WO
WIPO (PCT)
Prior art keywords
mask
substrate
electromagnets
coating
magnets
Prior art date
Application number
PCT/EP2017/078299
Other languages
German (de)
French (fr)
Inventor
Markus Gersdorff
Vladimirs Leontjevs
Original Assignee
Aixtron Se
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Aixtron Se filed Critical Aixtron Se
Publication of WO2018087029A1 publication Critical patent/WO2018087029A1/en

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Definitions

  • the invention relates to a method and a device for coating at least one substrate by feeding a starting material into a process space, having a substrate holder for receiving the at least one substrate and a mask, which is transferred from a mask transport system before being coated into a contacting system can be brought to the surface of the substrate and after the coating of the surface of the substrate is removable, wherein the mask is at least partially magnetically or magnetically activated.
  • a shield element can be brought between a gas inlet element, from which organic starting materials brought into the gaseous form are brought into a process space by means of a carrier gas, and a cooled substrate holder on which the substrate rests.
  • the screen element With the screen element, the substrate and / or a mask can be brought into the process space.
  • the mask is placed on the substrate lying flat on the substrate holder.
  • the mask has windows framed by webs, so that deposition of the starting material can take place only in the areas released from the windows on the surface of the substrate. The deposition is essentially due to a condensation of the gaseous starting materials on the surface of the substrate to form a solid.
  • the mask On the webs framing the webs also takes place a coating.
  • the mask When releasing the mask from the substrate, the mask is only at its Edge captured by a mask transport means, and displaced in a vertical direction. Due to the force of gravity acting on the mask, the surface portion of the mask lying between the edges bulges downward. This deformation of the mask has the consequence that the deposited on the webs of the mask coating peels off. Particles form which fall down by gravity or which are transported to places where they interfere due to gas flow within the process space.
  • a magnetic mask is held by permanent magnets on a carrier.
  • a mask transport system includes electromagnets that are controllable such that the magnetic force generated by them is greater than the magnetic force generated by the permanent magnets, so that the mask can be removed from the surface of the substrate by means of the mask transport system.
  • the invention has for its object to improve a genus in modern device or a generic method use advantageous, in particular to provide measures to prevent particles from detaching from the mask after dissolving the mask from the substrate.
  • the problem is solved by the invention specified in the claims.
  • the dependent claims represent not only advantageous developments, but also independent solutions to the problem.
  • a device for depositing a layer by means of a one or more gas outlet openings of a gas inlet member in a between the gas outlet openings and a gas outlet openings arranged substrate holder process chamber fed process gas on a voltage applied to a gas outlet openings facing the substrate has substrate for positioning a mask on the substrate or for removing the mask from the substrate, wherein the mask rests on the directed to the gas outlet openings plan broad side of the substrate during the deposition of the layer.
  • the mask has magnetic zones or magnetically activated zones.
  • the mask can interact with an external magnetic field in such a way that it is attracted by a magnet that generates the magnetic field or - if the mask itself is magnetic - can be repelled.
  • a mask stabilization device which has mask stabilization means in order to stabilize the mask after its removal from the surface of the substrate in a predetermined surface enhancement position.
  • the predetermined areal extent corresponds to the areal extent that the mask occupies when it rests on the substrate. If the substrate is a flat, plane object, for example a glass plate, then the surface extension layer is a flat layer. It is provided that the mask removed from the substrate is held in the predetermined surface extension position by means of a magnet force generated by magnets controlled by a control device. The magnetic forces interact with the magnetic or magnetizable zones of the mask.
  • the surface center portion of the mask attracted or repelled by an electromagnet has the same distance to the substrate as an edge portion of the mask.
  • the center of area cut is thereby held by the magnetic field of a spatially associated electromagnet contactless in the balance.
  • the invention furthermore relates to a method in which the mask removed from the substrate is held in a flat position by means of a controlled magnetic force interacting with magnetic or magnetizable zones of the mask, the mask removed from the substrate.
  • the magnetization device may comprise electromagnets or permanent magnets.
  • To control magnetic field strength sensors and / or distance sensors may be provided. In particular, it is provided to use Hall sensors, distance sensors, capacitive or inductive proximity switches to control the magnetic force.
  • the mask stabilization means can be brought between the gas outlet openings of a gas inlet member and the substrate holder.
  • the mask stabilizing means can associate with a screen plate of a screen element which is moved from a storage chamber into the process space in order to prevent heat transfer between substrate holder and gas inlet element in a screen position.
  • the mask holding device engage only at the edge of the preferably rectangular mask.
  • the mask stabilization means can also be arranged in the substrate holder.
  • mask stabilization means in the form of magnets, in particular permanent magnets and / or electromagnets and sensors for determining the magnetic field strength or a vertical position of the mask are assigned to the substrate holder and / or can be brought from outside into the process space , With the sensor elements, the vertical position of the mask with respect to the position of the sensor or the position of the substrate holder and / or the shield plate is determined in particular at locations which are spaced from the edge of the mask.
  • the magnetic fields preferably engage in a surface center portion of the mask, that is, in a surface area of the mask, which is spaced from the edge of the mask to keep this area center portion in a sense in limbo.
  • the magnetic fields generated by electromagnets are controlled such that the mask is held in suspension or that the distance measured by the sensors occupies a desired value.
  • a plurality of sensors distributed over the entire areal extent of the mask are preferably provided, wherein the sensors are assigned to the substrate holder and / or the screen element.
  • the electromagnets, which are controlled by the control device according to the specifications of the sensors, are assigned to the substrate holder and / or the shielding element.
  • the control device is capable of holding the mask in a predetermined vertical position at each of the plurality of measuring points on each of which a sensor is arranged. It is also envisaged to use only one sensor and to position it approximately in the middle of the mask surface, or a plurality of sensors only in the surface center section of FIG.
  • the invention relates both to coating devices in which the substrate holder is arranged vertically above the gas inlet device and also to those devices in which the substrate holder is arranged vertically below the gas inlet element.
  • the gas inlet member preferably extends over the entire surface of the mask and has a plurality of arranged in a gas outlet surface gas outlet openings, which are arranged like a shower head and is brought by a vaporous starting material by means of a carrier gas into the process chamber.
  • the mask is preferably made of INVAR, a material which in a variant of the invention has no permanent magnetic properties, but is attracted in a magnetic field generated by a magnet in the direction of the magnet.
  • both above and below the mask arranged magnets are used, each exerting an attractive force on the mask.
  • the magma generated by the opposing magnets Controlled net fields such that the mask is held in suspension, so the magnetically opposite forces acting on the mask compensate for the force acting on the mask gravity.
  • there are pairs of magnets facing one another one magnet being associated with the screen element and the other magnet with the substrate holder.
  • the pair of magnets may be spatially associated with a magnetic field sensor or a distance sensor, respectively. But it is also envisaged that a sensor is arranged between a pair of magnets and a plurality of magnets are associated control technology a sensor.
  • the method according to the invention is exercised when a coating process in which, in particular, an OLED layer has been applied to a substrate is completed.
  • solid or liquid particles are fed into a carrier gas.
  • the aerosol thus formed is supplied to an evaporator by means of an aerosol transport line.
  • the evaporator has surfaces heated at an evaporation temperature, which heat the carrier gas and the aerosol particles in such a way that the aerosol particles evaporate.
  • the steam thus generated is fed through the gas inlet member into the process space. This is done by a heated gas inlet member.
  • the organic vapor condenses on the substrate which rests on a cooled substrate holder.
  • the substrate can abut against the downwardly facing substrate contact surface of a substrate holder or on an upwardly pointing contact surface of a substrate holder.
  • the mask is raised or lowered by means of mask transport means or a mask holder.
  • the mask transport means or the mask holder only engage at the edge of the mask.
  • the mask made of magnetizable material is pressed against the surface of the substrate during the coating process with magnetic force, wherein the magnets are arranged within the substrate holder and in particular can generate a regulated magnetic field.
  • This slide is preferably a screen element which is intended to interrupt heat radiation from the heated gas inlet element to the substrate holder.
  • This slider may also have magnets that build a magnetic field together with the magnet of the substrate holder. The magnetic field is regulated in such a way that its surface extension position does not change during the vertical displacement of the mask. If, for example, the mask lies in a flat position on the substrate, the magnets hold the mask in a vertical position during its vertical displacement, without the mask bending.
  • either only the substrate holder or only the slider, which may be a screen element has the magnet for the controlled position stabilization of the mask.
  • FIG. 1 shows in cross-section a first exemplary embodiment of a coating device in which a gas inlet element is arranged above a substrate holder and the substrate holder and a shielding element 17 in particular have pairs of opposing magnets between which magnets a mask is held in suspension;
  • FIG. 2 shows a representation according to FIG. 1, but with a magnet arrangement only in the screen element
  • Fig. 3 is a view similar to Figure 1 of a third embodiment, wherein the gas inlet member below a Substrate holder are arranged, wherein in particular paired magnets are assigned to the substrate holder and the screen element and the mask is held by the magnetic force generated by magnets in a suspension, a representation according to Figure 3 of a fourth embodiment, wherein the holding the mask in a floating magnets are only arranged in the substrate holder,
  • FIG. 5 schematically and schematically shows a mask arranged between a substrate holder and a screen element which is held in suspension with magnetic fields generated by a control device in which spacings between mask and substrate holder or mask and screen element are kept constant over time, schematically 5 with magnetic field strengths to a mask without changing its surface extensional position from a contact position on the substrate 6 in a position remote from the substrate vertical to publishers.
  • the devices shown in Figures 1, 2, 3, 4 and 5 have a reactor housing 1, which encapsulates a process chamber 2 gas-tight to the outside. At an opening 4 which can be closed, a storage chamber 3 adjoins the cavity of the reactor housing 1, in which the process space 2 is located.
  • a substrate holder 5 which is cooled to a condensation temperature.
  • the substrate holder 5 has a substrate contact surface on which a substrate 6 rests in contact surface area. The substrate 6 can be held on the Substratstrom- surface of the substrate holder 5 via electrostatic forces.
  • a mask holder 8 which is part of a mask transport device, is capable of a mask 7 from a contact position, in which the mask is touching on the side facing the process space 2 side of the substrate 6 to move in the vertical direction in a distance position. In this case, the mask holder 8 engages only on the edge T of the mask 7.
  • the storage chamber 3 stores a magnetic carrier, which is formed in the embodiments of a shield member 17.
  • the shield element 17 has a shield plate which has a heat-insulating effect and which can be moved by means of a guide 18 or displacement means from the storage chamber 3 into the process space 2, where the shield element 17 thermally separates the substrate holder 5 from a gas inlet element 9 in a screen position. which has gas outlet openings 10 at a gas outlet area facing the process space 2, through which process gas can flow into the process space 2.
  • the process gas contains a vaporous organic starting material which is kept in vapor form by heating the gas inlet member 9 and which condenses in a coating step in the regions of windows between webs of the mask 7 on the substrate 6.
  • a carrier gas which may be hydrogen, nitrogen or a noble gas
  • the carrier gas line 5 discharges into an aerosol Grower 13, where by means of a metering solid or liquid particles which are stored in a reservoir 14, are fed into the carrier gas flow, so that an aerosol is formed, which is fed by means of an aerosol 16 to an evaporator 12 having heated walls, the Carrying carrier gas and the aerosol particles in such a way that the aerosol particles evaporate to be brought as a vapor through a gas feed line 11 in the gas inlet member 9.
  • one or more magnets 20, which are electromagnets, are provided in the substrate holder 5.
  • distance sensors 22, in particular distributed uniformly over the substrate contact surface, are arranged, with which the distance of the mask 7 from the substrate holder 5 can be determined.
  • the screen element 17 also has one or more magnets 19, which are electromagnets and distance sensors 21 to determine the distance between the screen element 17 and mask 7.
  • One of the two magnets 19, 20 may also be a permanent magnet.
  • the magnetic fields B 1 generated by the magnets 20 and the magnetic fields B 2 generated by the magnets 19 are controlled such that the distances a between substrate holder 5 and mask 7 by means of the distance sensor ren 22 and / or the distances b of the mask 7 from the shield member 17, which are determined by the distance sensors 21, have a predetermined value.
  • the target value of the distance a is increased in the course of time until the mask 7 has reached a predetermined end distance.
  • the target value of the distance b can be reduced in time until the mask 7 has reached the predetermined end distance.
  • the mask 7 may consist of INVAR or another material which is not itself magnetically but polarizable in a magnetic field, that is magnetically attracted or repelled by a magnet.
  • the magnetic fields Bi, B 2 generated by the magnets 19, 20 thus each have an attractive and possibly also a repelling effect on the mask 7.
  • An upwardly directed magnetic field Bi and a downwardly directed magnetic field B 2 force are balanced so that they compensate for the force exerted on the mask 7 gravity, thus keeping the mask 7 in the balance.
  • the magnets 19, 20 are preferably distributed uniformly over the substantially rectangular contact surface of the substrate holder 5 or the rectangular extension surface of the shield element 17. Between individual magnets 19, 20, the distance sensors 21, 22 may be provided.
  • the number of distance sensors 21, 22 is preferably less than the number of magnets 19, 20, so that a plurality of magnets 19, 20 respectively of the substrate holder 5 or of the screen element 17 belong to a control circuit comprising a distance sensor 21, 22.
  • the magnetic carrier 17 is formed by a screen element. But it is also possible to form the magnetic carrier otherwise.
  • either only the substrate holder 5 has one or more magnets 20 and one or more distance sensors 22 or only the screen element 17 one or more magnets 19 and one or more distance sensors 21
  • These are electromagnets 19, 20 whose magnetic force can be controlled such that their attraction force exerted on the mask 7 compensates for the force acting on the mask 7 gravity.
  • the control device is set up in such a way that it is able to displace the mask 7 extending in a flat position without changing its flatness by changing the magnetic fields Bi, B 2 vertically.
  • the mask 7 is engaged only at its edge T of the mask holder 8.
  • the regulated magnetic fields Bi, B 2 are generated, which preferably exert a force on the mask 7 only in the surface center section of the mask 7 surrounded by the edge T of the mask 7.
  • the magnetic fields are controlled in such a way that the surface extension position, in particular the flatness of the mask, does not change during its vertical displacement.
  • Figure 6 shows the time course of the magnetic field strengths Bi, B 2 , which are generated by the magnets 19, 20 to change the vertical position x of the mask 7.
  • a device which is characterized by magnetically acting mask stabilizing means 19, 20, 21, 22, 23 in order to stabilize the mask 7 after its removal from the surface of the substrate 6 in a predetermined surface extension position, in particular a flatness ;
  • a device which is characterized in that the mask stabilization means comprise one or more magnets 19, 20, in particular permanent magnets and / or electromagnets, which are assigned to the substrate holder 5 or can be brought from outside into the process space 2 ;
  • a device which is characterized in that the magnets 19 are arranged on a screen element 17 which can be brought between the mask 7 and a gas inlet member 9;
  • a device which is characterized by a control device 23 with which the magnetic fields Bi, B 2 generated by electromagnets 19, 20 of the mask stabilization means are controllable in such a way that at least one surface center section extends below or above with respect to one the gravitational predetermined direction of the magnets 19, 20 lying mask 7 is held in suspension;
  • the mask stabilization means comprise at least one distance sensor 21, 22 for determining a distance a, b between the distance sensor 21, 22 and the mask 7 and / or between the substrate holder 5 and the mask 7;
  • a device characterized in that the mask 7 is disposed in a direction predetermined by gravity either above or below the substrate holder 5;
  • a device which is characterized in that the screen element 17 can be displaced out of the storage chamber 3 and into the process space 2 and back again along a guide 18 and / or by means of displacement means;
  • a method that is characterized in that when removing the mask 7 from the substrate 6, the mask 7 is stabilized by means of magnetic force in a predetermined surface extension position.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention relates to a device for coating at least one substrate by feeding a starting material into a process chamber (2), comprising a substrate holder (5) for receiving the at least one substrate (6) and a mask (7), which can be brought up to the surface of the substrate (6) before the coating and can be removed from the surface of the substrate (6) after the coating by a mask transporting system (8), wherein the mask (7) is at least partially magnetic or magnetically activatable. To avoid particles becoming detached from the mask during the changing of the substrate or mask, magnetically acting mask stabilizing means (19, 20, 21, 22, 23) are provided in order to stabilize the mask (7) after its removal from the surface of the substrate (6) in a predetermined position of a two-dimensional extent, in particular a flat position, wherein the magnets (19) are arranged on a shielding element (17), which can be brought between the mask (7) and a gas inlet element (9).

Description

Beschreibung  description
Vorrichtung und Verfahren zur Halterung einer Maske in einer Planlage Gebiet der Technik Apparatus and method for mounting a mask in a flat surface. Field of the art
[0001] Die Erfindung betrifft ein Verfahren und eine Vorrichtung zum Beschichten zumindest eines Substrates durch Einspeisen eines Ausgangsstoffs in einen Prozessraum, mit einem Substrathalter zur Aufnahme des zumindest ei- nen Substrates und einer Maske, die von einem Maskentransportsystem vor dem Beschichten in eine berührende Anlage an die Oberfläche des Substrates bringbar und nach dem Beschichten von der Oberfläche des Substrates entfernbar ist, wobei die Maske zumindest teilweise magnetisch oder magnetisch aktivierbar ist. [0001] The invention relates to a method and a device for coating at least one substrate by feeding a starting material into a process space, having a substrate holder for receiving the at least one substrate and a mask, which is transferred from a mask transport system before being coated into a contacting system can be brought to the surface of the substrate and after the coating of the surface of the substrate is removable, wherein the mask is at least partially magnetically or magnetically activated.
Stand der Technik [0002] Eine Vorrichtung zum Beschichten von insbesondere Substraten aus Glas mit einem organischen Ausgangsstoff wird in der DE 10 2010 000 447 AI beschrieben. Zwischen einem Gaseinlassorgan, aus dem in die Gasform gebrachte organische Ausgangsstoffe mittels eines Trägergases in einen Prozessraum gebracht werden und einem gekühlten Substrathalter, auf dem das Sub- strat aufliegt, kann ein Schirmelement gebracht werden. Mit dem Schirmelement kann das Substrat und/ oder eine Maske in den Prozessraum gebracht werden. Die Maske wird auf das sich in Planlage auf dem Substrathalter aufliegende Substrat aufgelegt. Die Maske besitzt von Stegen eingerahmte Fenster, sodass eine Deposition des Ausgangsstoffs nur in den von den Fenstern freige- lassenen Bereichen auf der Oberfläche des Substrates stattfinden kann. Die Ab- scheidung erfolgt im Wesentlichen aufgrund einer Kondensation der gasförmigen Ausgangsstoffe auf der Oberfläche des Substrates zu einem Festkörper. Auf den die Fenster umrahmenden Stegen findet ebenfalls eine Beschichtung statt. Beim Lösen der Maske von dem Substrat wird die Maske lediglich an ihrem Rand von einem Maskentransportmittel gefasst, und in einer Vertikalrichtung verlagert. Aufgrund der auf die Maske einwirkenden Schwerkraft beult sich der zwischen den Rändern liegende Flächenabschnitt der Maske nach unten hin durch. Diese Verformung der Maske hat zur Folge, dass die auf den Stegen der Maske abgeschiedene Beschichtung abblättert. Es bilden sich Partikel, die durch die Schwerkraft nach unten fallen oder die aufgrund einer Gasströmung innerhalb des Prozessraumes an Stellen transportiert werden, wo sie stören. PRIOR ART An apparatus for coating, in particular, glass substrates with an organic starting material is described in DE 10 2010 000 447 A1. A shield element can be brought between a gas inlet element, from which organic starting materials brought into the gaseous form are brought into a process space by means of a carrier gas, and a cooled substrate holder on which the substrate rests. With the screen element, the substrate and / or a mask can be brought into the process space. The mask is placed on the substrate lying flat on the substrate holder. The mask has windows framed by webs, so that deposition of the starting material can take place only in the areas released from the windows on the surface of the substrate. The deposition is essentially due to a condensation of the gaseous starting materials on the surface of the substrate to form a solid. On the webs framing the webs also takes place a coating. When releasing the mask from the substrate, the mask is only at its Edge captured by a mask transport means, and displaced in a vertical direction. Due to the force of gravity acting on the mask, the surface portion of the mask lying between the edges bulges downward. This deformation of the mask has the consequence that the deposited on the webs of the mask coating peels off. Particles form which fall down by gravity or which are transported to places where they interfere due to gas flow within the process space.
[0003] Aus der US 2016/0248049 AI ist es bekannt, Magnete zu verwenden, um eine Maske zu fixieren. [0004] Darüber hinaus werden in der Literatur geregelte Magnetfelder beschrieben, mit denen ein magnetischer oder magnetisch aktivierbarer Gegenstand in einer Schwebe gehalten wird, bspw. in IEEE Transactions on Semi- conductor Manufacturing, Vol. 3, NO. 3. August 1990„Applications of Magnet- ic Levitation-Based Micro- Automation in Semiconductor Manufacturing". [0005] Eine gattungsbildende Vorrichtung beschreibt die DE 101 58 031 AI.From US 2016/0248049 Al it is known to use magnets to fix a mask. In addition, regulated magnetic fields are described in the literature with which a magnetic or magnetically activatable object is held in suspension, for example in IEEE Transactions on Semiconductor Manufacturing, Vol. 3, NO. August 3, 1990. "Applications of Magnetic Levitation-Based Micro-Automation in Semiconductor Manufacturing." [0005] A generic device is described in DE 101 58 031 A1.
Eine magnetische Maske wird von Permanentmagneten an einem Träger gehalten. Ein Maskentransportsystem enthält Elektromagnete, die derart regelbar sind, dass die von ihnen erzeugte Magnetkraft größer ist als die von den Permanentmagneten erzeugte Magnetkraft, so dass die Maske mit Hilfe des Mas- kentransportsystems von der Oberfläche des Substrates entfernbar ist. A magnetic mask is held by permanent magnets on a carrier. A mask transport system includes electromagnets that are controllable such that the magnetic force generated by them is greater than the magnetic force generated by the permanent magnets, so that the mask can be removed from the surface of the substrate by means of the mask transport system.
Zusammenfassung der Erfindung Summary of the invention
[0006] Der Erfindung liegt die Aufgabe zugrunde, eine gattungs gemäße Vorrichtung bzw. ein gattungsgemäßes Verfahren gebrauchsvorteilhaft zu verbessern, insbesondere Maßnahmen anzugeben, mit denen verhindert wird, dass sich nach dem Lösen der Maske vom Substrat Partikel von der Maske ablösen. [0007] Gelöst wird die Aufgabe durch die in den Ansprüchen angegebene Erfindung. Die Unteransprüche stellen nicht nur vorteilhafte Weiterbildungen dar, sondern auch eigenständige Lösungen der Aufgabe. The invention has for its object to improve a genus in modern device or a generic method use advantageous, in particular to provide measures to prevent particles from detaching from the mask after dissolving the mask from the substrate. The problem is solved by the invention specified in the claims. The dependent claims represent not only advantageous developments, but also independent solutions to the problem.
[0008] Eine Vorrichtung zum Abscheiden einer Schicht mittels eines durch ein oder mehrere Gasaustrittsöffnungen eines Gaseinlassorganes in eine zwischen den Gasaustrittsöffnungen und einem den Gasaustrittsöffnungen gegenüberliegenden Substrathalter angeordneten Prozesskammer eingespeistes Prozessgas auf einem an einer zu den Gasaustrittsöffnungen weisenden Anlagefläche des Substrates anliegenden Substrat besitzt Mittel zum Positionieren einer Mas- ke auf dem Substrat oder zum Entfernen der Maske vom Substrat, wobei die Maske auf der zu den Gasaustrittsöffnungen gerichteten planen Breitseite des Substrates beim Abscheiden der Schicht aufliegt. Die Maske besitzt magnetische Zonen oder magnetisch aktivierbare Zonen. Die Maske kann mit einem äußeren Magnetfeld derart wechselwirken, dass sie von einem das Magnetfeld erzeu- genden Magneten angezogen oder - falls die Maske selbst magnetisch ist - abgestoßen werden kann. Wesentlich ist eine Masken-Stabilisierungseinrichtung, die Masken-Stabilisierungsmittel aufweist, um die Maske nach ihrer Entfernung von der Oberfläche des Substrates in einer vorgegebenen Flächenerstre- ckungslage zu stabilisieren. Die vorgegebene Flächenerstreckungslage ent- spricht dabei der Flächenerstreckungslage, die die Maske einnimmt, wenn sie auf dem Substrat aufliegt. Handelt es sich bei dem Substrat um einen flachen, planen Gegenstand, bspw. um eine Glasplatte, so ist die Flächenerstreckungslage eine Planlage. Es ist vorgesehen, dass mittels einer von einer Regeleinrichtung geregelten von Magneten erzeugten Magnetkraft die vom Substrat ent- fernte Maske in der vorgegebenen Flächenerstreckungslage gehalten wird. Dabei wirken die Magnetkräfte mit den magnetischen oder magnetisierbaren Zonen der Maske zusammen. Der von einem Elektromagneten angezogene oder abgestoßene Flächenmittenabschnitt der Maske besitzt dabei dieselbe Entferntstellung zum Substrat wie ein Randabschnitt der Maske. Der Flächenmittenab- schnitt wird dabei von dem Magnetfeld eines örtlich zugeordneten Elektromagneten berührungslos in der Schwebe gehalten. Die Erfindung betrifft darüber hinaus ein Verfahren, bei dem die vom Substrat entfernte Maske mittels einer mit magnetischen oder magnetisierbaren Zonen der Maske zusammenwirken- den geregelten Magnetkraft die vom Substrat entfernte Maske in einer Planlage gehalten wird. Die Magnetisierungseinrichtung kann Elektromagnete oder Permanentmagnete aufweisen. Zur Regelung können Magnetfeldstärkesensoren und/ oder Abstandssensoren vorgesehen sein. Es ist insbesondere vorgesehen, zur Regelung der Magnetkraft Hall-Sensoren, Abstandssensoren, kapazi- tiv- oder induktiv wirkende Näherungsschalter zu verwenden. Die Masken- Stabilisierungsmittel können zwischen die Gasaustrittsöffnungen eines Gasein- lassorganes und dem Substrathalter gebracht werden. Es ist insbesondere vorgesehen, die Masken-Stabilisierungsmittel einer Schirmplatte eines Schirmelementes zuzuordnen, welches von einer Verwahrkammer in den Prozessraum gefahren wird, um in einer Schirmposition eine Wärmeübertragung zwischen Substrathalter und Gaseinlassorgan zu verhindern. Es ist insbesondere vorgesehen, dass die Masken-Halteeinrichtung nur am Rand der bevorzugt rechteckigen Maske angreifen. Die Masken-Stabilisierungsmittel können aber auch im Substrathalter angeordnet sein. Es ist somit vorgesehen, dass Masken-Stabi- lisierungsmittel in Form von Magneten, insbesondere Permanent- und/ oder Elektromagnete sowie Sensoren zur Ermittlung der magnetischen Feldstärke oder einer vertikalen Position der Maske dem Substrathalter zugeordnet sind und/ oder von außerhalb in den Prozessraum bringbar sind. Mit den Sensorelementen wird insbesondere an Stellen, die vom Rand der Maske beabstandet sind die Vertikalposition der Maske in Bezug auf die Lage des Sensors bzw. der Lage des Substrathalters und/ oder der Schirmplatte ermittelt. Die Magnetfelder greifen bevorzugt in einem Flächenmittenabschnitt der Maske an, also in einem Flächenbereich der Maske, der vom Rand der Maske beabstandet ist, um diesen Flächenmittenabschnitt gewissermaßen in der Schwebe zu halten. Hierdurch wird verhindert, dass sich die Flächenerstreckungslage der Maske durch eine Schwerkraft bedingte Verformung ändert, wenn die lediglich am Rand unter- griffene Maske vom Substrat in einer Vertikalrichtung entfernt wird. Mittels einer Regeleinrichtung werden die von Elektromagneten erzeugten Magnetfelder derart geregelt, dass die Maske in der Schwebe gehalten wird bzw. dass der von den Sensoren gemessene Abstand einen Sollwert einnimmt. Es sind bevorzugt eine Vielzahl an verschiedenen Positionen über die gesamte Flächenerstreckung der Maske verteilt angeordnete Sensoren vorgesehen, wobei die Sensoren dem Substrathalter und/ oder dem Schirmelement zugeordnet sind. Die Elektromagneten, die von der Regeleinrichtung nach den Vorgaben der Senso- ren geregelt werden, sind dem Substrathalter und/ oder dem Schirmelement zugeordnet. Die Regeleinrichtung ist in der Lage, die Maske an jeden der Vielzahl von Messpunkten, an denen jeweils ein Sensor angeordnet ist, in einer vorgegebenen Vertikallage zu halten. Es ist auch vorgesehen, lediglich einen Sensor zu verwenden und diesen etwa in der Maskenflächenmitte zu positio- nieren oder eine Mehrzahl von Sensoren nur im Flächenmittenabschnitt derA device for depositing a layer by means of a one or more gas outlet openings of a gas inlet member in a between the gas outlet openings and a gas outlet openings arranged substrate holder process chamber fed process gas on a voltage applied to a gas outlet openings facing the substrate has substrate for positioning a mask on the substrate or for removing the mask from the substrate, wherein the mask rests on the directed to the gas outlet openings plan broad side of the substrate during the deposition of the layer. The mask has magnetic zones or magnetically activated zones. The mask can interact with an external magnetic field in such a way that it is attracted by a magnet that generates the magnetic field or - if the mask itself is magnetic - can be repelled. What is essential is a mask stabilization device which has mask stabilization means in order to stabilize the mask after its removal from the surface of the substrate in a predetermined surface enhancement position. The predetermined areal extent corresponds to the areal extent that the mask occupies when it rests on the substrate. If the substrate is a flat, plane object, for example a glass plate, then the surface extension layer is a flat layer. It is provided that the mask removed from the substrate is held in the predetermined surface extension position by means of a magnet force generated by magnets controlled by a control device. The magnetic forces interact with the magnetic or magnetizable zones of the mask. The surface center portion of the mask attracted or repelled by an electromagnet has the same distance to the substrate as an edge portion of the mask. The center of area cut is thereby held by the magnetic field of a spatially associated electromagnet contactless in the balance. The invention furthermore relates to a method in which the mask removed from the substrate is held in a flat position by means of a controlled magnetic force interacting with magnetic or magnetizable zones of the mask, the mask removed from the substrate. The magnetization device may comprise electromagnets or permanent magnets. To control magnetic field strength sensors and / or distance sensors may be provided. In particular, it is provided to use Hall sensors, distance sensors, capacitive or inductive proximity switches to control the magnetic force. The mask stabilization means can be brought between the gas outlet openings of a gas inlet member and the substrate holder. It is provided, in particular, to associate the mask stabilizing means with a screen plate of a screen element which is moved from a storage chamber into the process space in order to prevent heat transfer between substrate holder and gas inlet element in a screen position. In particular, it is provided that the mask holding device engage only at the edge of the preferably rectangular mask. However, the mask stabilization means can also be arranged in the substrate holder. It is thus provided that mask stabilization means in the form of magnets, in particular permanent magnets and / or electromagnets and sensors for determining the magnetic field strength or a vertical position of the mask are assigned to the substrate holder and / or can be brought from outside into the process space , With the sensor elements, the vertical position of the mask with respect to the position of the sensor or the position of the substrate holder and / or the shield plate is determined in particular at locations which are spaced from the edge of the mask. The magnetic fields preferably engage in a surface center portion of the mask, that is, in a surface area of the mask, which is spaced from the edge of the mask to keep this area center portion in a sense in limbo. This prevents the surface extension position of the mask is prevented by a Gravity-induced deformation changes when the mask, which is only grasped at the edge, is removed from the substrate in a vertical direction. By means of a control device, the magnetic fields generated by electromagnets are controlled such that the mask is held in suspension or that the distance measured by the sensors occupies a desired value. A plurality of sensors distributed over the entire areal extent of the mask are preferably provided, wherein the sensors are assigned to the substrate holder and / or the screen element. The electromagnets, which are controlled by the control device according to the specifications of the sensors, are assigned to the substrate holder and / or the shielding element. The control device is capable of holding the mask in a predetermined vertical position at each of the plurality of measuring points on each of which a sensor is arranged. It is also envisaged to use only one sensor and to position it approximately in the middle of the mask surface, or a plurality of sensors only in the surface center section of FIG
Maske anzuordnen. Die Erfindung betrifft sowohl Beschichtungsvorrichtungen, bei denen der Substrathalter in Vertikalrichtung oberhalb des Gaseinlassorga- nes angeordnet ist als auch solche Vorrichtungen, bei denen der Substrathalter in Vertikalrichtung unterhalb des Gaseinlassorganes angeordnet ist. Das Gas- einlassorgan erstreckt sich bevorzugt über die gesamte Fläche der Maske und besitzt eine Vielzahl in einer Gasaustrittsfläche angeordnete Gasaustrittsöffnungen, die duschkopfartig angeordnet sind und durch die ein dampfförmiger Ausgangsstoff mittels eines Trägergases in den Prozessraum gebracht wird. Die Maske besteht bevorzugt aus INVAR, einem Werkstoff, der in einer Variante der Erfindung keine permanentmagnetischen Eigenschaften aufweist, aber in einem von einem Magneten erzeugten Magnetfeld in Richtung des Magneten angezogen wird. Bei der Verwendung einer derartigen Maske werden sowohl oberhalb als auch unterhalb der Maske angeordnete Magnete verwendet, die jeweils auf die Maske eine anziehende Kraft ausüben. Mittels der Regeleinrich- tung werden die von den sich gegenüberliegenden Magneten erzeugten Mag- netfelder derart geregelt, dass die Maske in der Schwebe gehalten wird, also die magnetisch entgegengesetzt an der Maske angreifenden Kräfte die an der Maske angreifende Schwerkraft kompensieren. Es liegen sich bevorzugt paarweise Magnete gegenüber, wobei ein Magnet dem Schirmelement und der andere Magnet dem Substrathalter zugeordnet ist. Dem Paar von Magneten kann jeweils ein Magnetfeldsensor oder ein Abstandssensor räumlich zugeordnet sein. Es ist aber auch vorgesehen, dass ein Sensor zwischen einem Magnetpaar angeordnet ist und mehrere Magneten regeltechnisch einem Sensor zugeordnet sind. Arrange mask. The invention relates both to coating devices in which the substrate holder is arranged vertically above the gas inlet device and also to those devices in which the substrate holder is arranged vertically below the gas inlet element. The gas inlet member preferably extends over the entire surface of the mask and has a plurality of arranged in a gas outlet surface gas outlet openings, which are arranged like a shower head and is brought by a vaporous starting material by means of a carrier gas into the process chamber. The mask is preferably made of INVAR, a material which in a variant of the invention has no permanent magnetic properties, but is attracted in a magnetic field generated by a magnet in the direction of the magnet. When using such a mask, both above and below the mask arranged magnets are used, each exerting an attractive force on the mask. By means of the control device, the magma generated by the opposing magnets Controlled net fields such that the mask is held in suspension, so the magnetically opposite forces acting on the mask compensate for the force acting on the mask gravity. Preferably, there are pairs of magnets facing one another, one magnet being associated with the screen element and the other magnet with the substrate holder. The pair of magnets may be spatially associated with a magnetic field sensor or a distance sensor, respectively. But it is also envisaged that a sensor is arranged between a pair of magnets and a plurality of magnets are associated control technology a sensor.
[0009] Das erfindungsgemäße Verfahren wird ausgeübt, wenn ein Beschich- tungsprozess beendet ist, bei dem insbesondere eine OLED-Schicht auf einem Substrat aufgebracht worden ist. Bei der Durchführung des Beschichtungsver- fahrens werden feste oder flüssige Partikel in ein Trägergas eingespeist. Das derartig gebildete Aerosol wird mittels einer Aerosoltransportleitung einem Verdampfer zugeführt. Der Verdampfer besitzt auf einer Verdampfungstempe- ratur aufgeheizte Flächen, die das Trägergas und die Aerosolpartikel derart aufheizen, dass die Aerosolpartikel verdampfen. Der so erzeugte Dampf wird durch das Gaseinlassorgan in den Prozessraum eingespeist. Dies erfolgt durch ein beheiztes Gaseinlassorgan. Der organische Dampf kondensiert auf dem Substrat, das auf einem gekühlten Substrathalter aufliegt. Dabei kann das Sub- strat an der nach unten weisenden Substratanlagefläche eines Substrathalters oder an einer nach oben weisenden Anlagefläche eines Substrathalters anliegen. Nach Beendigung des Beschichtungsverfahrens wird die Maske mittels Maskentransportmittel oder einem Maskenhalter angehoben bzw. abgesenkt. Beim Lösen der Maske vom Substrat greifen die Maskentransportmittel bzw. der Maskenhalter nur am Rand der Maske an. Die aus magnetisierbarem Material bestehende Maske wird während des Beschichtungsverfahrens mit Magnetkraft gegen die Oberfläche des Substrates gedrückt, wobei die Magnete innerhalb des Substrathalters angeordnet sind und insbesondere ein geregeltes Magnetfeld erzeugen können. Vor dem Entfernen der Maske vom Substrat in Vertikalrich- tung wird ein Schieber in den Prozessraum hineingefahren. Bevorzugt handelt es sich bei diesem Schieber um ein Schirmelement, welches an eine Wärmestrahlung vom beheizten Gaseinlassorgan zum Substrathalter unterbrechen soll. Dieser Schieber kann ebenfalls Magnete besitzen, die zusammen mit dem Magneten des Substrathalters ein Magnetfeld aufbauen. Das Magnetfeld wird derart geregelt, dass sich bei der Vertikalverlagerung der Maske ihre Flächener- streckungslage nicht ändert. Liegt bspw. die Maske in einer Planlage auf dem Substrat, so halten die Magnete die Maske während ihrer Vertikalverlagerung in einer Schwebe, ohne dass sich die Maske verbiegt. In einer Variante der Er- findung besitzen entweder nur der Substrathalter oder nur der Schieber, bei dem es sich um ein Schirmelement handeln kann, die Magnet zur geregelten Lagestabilisierung der Maske. The method according to the invention is exercised when a coating process in which, in particular, an OLED layer has been applied to a substrate is completed. When carrying out the coating process, solid or liquid particles are fed into a carrier gas. The aerosol thus formed is supplied to an evaporator by means of an aerosol transport line. The evaporator has surfaces heated at an evaporation temperature, which heat the carrier gas and the aerosol particles in such a way that the aerosol particles evaporate. The steam thus generated is fed through the gas inlet member into the process space. This is done by a heated gas inlet member. The organic vapor condenses on the substrate which rests on a cooled substrate holder. In this case, the substrate can abut against the downwardly facing substrate contact surface of a substrate holder or on an upwardly pointing contact surface of a substrate holder. After completion of the coating process, the mask is raised or lowered by means of mask transport means or a mask holder. When the mask is detached from the substrate, the mask transport means or the mask holder only engage at the edge of the mask. The mask made of magnetizable material is pressed against the surface of the substrate during the coating process with magnetic force, wherein the magnets are arranged within the substrate holder and in particular can generate a regulated magnetic field. Before removing the mask from the substrate in vertical direction A slide is moved into the process space. This slide is preferably a screen element which is intended to interrupt heat radiation from the heated gas inlet element to the substrate holder. This slider may also have magnets that build a magnetic field together with the magnet of the substrate holder. The magnetic field is regulated in such a way that its surface extension position does not change during the vertical displacement of the mask. If, for example, the mask lies in a flat position on the substrate, the magnets hold the mask in a vertical position during its vertical displacement, without the mask bending. In one variant of the invention, either only the substrate holder or only the slider, which may be a screen element, has the magnet for the controlled position stabilization of the mask.
Kurze Beschreibung der Zeichnungen Brief description of the drawings
[0010] Ausführungsbeispiele der Erfindung werden nachfolgend anhand beigefügter Zeichnungen erläutert. Es zeigen: Fig. 1 Im Querschnitt ein erstes Ausführungsbeispiel einer Beschich- tungsvorrichtung, bei der ein Gaseinlassorgan oberhalb eines Substrathalters angeordnet ist und der Substrathalter und ein Schirmelement 17 insbesondere paarweise sich gegenüberliegende Magnete aufweisen, zwischen welchen Magneten eine Maske in der Schwebe gehalten wird, Embodiments of the invention will be explained below with reference to the accompanying drawings. 1 shows in cross-section a first exemplary embodiment of a coating device in which a gas inlet element is arranged above a substrate holder and the substrate holder and a shielding element 17 in particular have pairs of opposing magnets between which magnets a mask is held in suspension;
Fig. 2 eine Darstellung gemäß Figur 1, jedoch mit einer Magnetanordnung lediglich im Schirmelement, 2 shows a representation according to FIG. 1, but with a magnet arrangement only in the screen element, FIG.
Fig. 3 eine Darstellung ähnlich gemäß Figur 1 eines dritten Ausführungsbeispiels, bei dem das Gaseinlassorgan unterhalb eines Substrathalters angeordnet sind, wobei insbesondere paarweise angeordnete Magnete dem Substrathalter und dem Schirmelement zugeordnet sind und die Maske durch die von Magneten erzeugte Magnetkraft in einer Schwebe gehalten wird, eine Darstellung gemäß Figur 3 eines vierten Ausführungsbeispiels, bei dem die die Maske in einer Schwebe haltenden Magnete nur im Substrathalter angeordnet sind, Fig. 3 is a view similar to Figure 1 of a third embodiment, wherein the gas inlet member below a Substrate holder are arranged, wherein in particular paired magnets are assigned to the substrate holder and the screen element and the mask is held by the magnetic force generated by magnets in a suspension, a representation according to Figure 3 of a fourth embodiment, wherein the holding the mask in a floating magnets are only arranged in the substrate holder,
Fig. 5 vergrößert und schematisch eine zwischen einem Substrathalter und einem Schirmelement angeordnet Maske, die mit von einer Regeleinrichtung geregelten Magneten erzeugten Magnetfeldern in einer Schwebe gehalten wird, in der sich Abstände zwischen Maske und Substrathalter bzw. Maske und Schirmelement zeitlich konstant gehalten werden, schematisch den zeitlichen Verlauf der in Figur 5 mit magnetischen Feldstärken, um eine Maske ohne Veränderung ihrer Flä- chenerstreckungslage von einer Anlagestellung am Substrat 6 in einer Entferntlage zum Substrat vertikal zu Verlagen. 5 schematically and schematically shows a mask arranged between a substrate holder and a screen element which is held in suspension with magnetic fields generated by a control device in which spacings between mask and substrate holder or mask and screen element are kept constant over time, schematically 5 with magnetic field strengths to a mask without changing its surface extensional position from a contact position on the substrate 6 in a position remote from the substrate vertical to publishers.
Beschreibung der Ausführungsformen Description of the embodiments
[0011] Die in den Figuren 1, 2, 3, 4 und 5 dargestellten Vorrichtungen besitzen ein Reaktorgehäuse 1, welches einen Prozessraum 2 gasdicht nach außen kapselt. An einer Öffnung 4, die verschließbar ist, grenzt eine Verwahrkammer 3 an die Höhlung des Reaktorgehäuses 1, in welcher sich der Prozessraum 2 befindet. [0012] Innerhalb des Reaktorgehäuses 1 befindet sich ein Substrathalter 5, welcher auf eine Kondensationstemperatur kühlbar ist. Der Substrathalter 5 besitzt eine Substratanlagefläche, an der ein Substrat 6 in berührender Flächenanlage anliegt. Das Substrat 6 kann über elektrostatische Kräfte an der Substratanlage- fläche des Substrathalters 5 gehalten werden. The devices shown in Figures 1, 2, 3, 4 and 5 have a reactor housing 1, which encapsulates a process chamber 2 gas-tight to the outside. At an opening 4 which can be closed, a storage chamber 3 adjoins the cavity of the reactor housing 1, in which the process space 2 is located. Within the reactor housing 1 is a substrate holder 5, which is cooled to a condensation temperature. The substrate holder 5 has a substrate contact surface on which a substrate 6 rests in contact surface area. The substrate 6 can be held on the Substratanlage- surface of the substrate holder 5 via electrostatic forces.
[0013] Ein Maskenhalter 8, der Teil einer Maskentransporteinrichtung ist, ist in der Lage, eine Maske 7 von einer Anlagestellung, in der die Maske berührend auf der zum Prozessraum 2 weisenden Seite des Substrates 6 anliegt in Vertikalrichtung in eine Abstandslage zu verlagern. Dabei greift der Maskenhalter 8 nur am Rand T der Maske 7 an. A mask holder 8, which is part of a mask transport device, is capable of a mask 7 from a contact position, in which the mask is touching on the side facing the process space 2 side of the substrate 6 to move in the vertical direction in a distance position. In this case, the mask holder 8 engages only on the edge T of the mask 7.
[0014] Die Verwahrkammer 3 verwahrt einen Magnetträger, der in den Ausführungsbeispielen von einem Schirmelement 17 ausgebildet ist. Das Schirmelement 17 besitzt eine Schirmplatte, die eine wärmeisolierende Wirkung besitzt und die mittels einer Führung 18 bzw. mittels Verlagerungsmitteln von der Verwahrkammer 3 in den Prozessraum 2 fahrbar ist, wo das Schirmelement 17 in einer Schirmstellung den Substrathalter 5 thermisch von einem Gaseinlassorgan 9 trennt, welches an einer zum Prozessraum 2 weisenden Gasaustrittsfläche Gasaustrittsöffnungen 10 aufweist, durch welches ein Prozessgas in den Prozessraum 2 einströmen kann. Das Prozessgas enthält einen dampfförmigen or- ganischen Ausgangsstoff, der durch Beheizen des Gaseinlassorganes 9 in der Dampfform gehalten wird und welcher in einem Beschichtungsschritt in den Bereichen von Fenstern zwischen Stegen der Maske 7 auf dem Substrat 6 kondensiert. The storage chamber 3 stores a magnetic carrier, which is formed in the embodiments of a shield member 17. The shield element 17 has a shield plate which has a heat-insulating effect and which can be moved by means of a guide 18 or displacement means from the storage chamber 3 into the process space 2, where the shield element 17 thermally separates the substrate holder 5 from a gas inlet element 9 in a screen position. which has gas outlet openings 10 at a gas outlet area facing the process space 2, through which process gas can flow into the process space 2. The process gas contains a vaporous organic starting material which is kept in vapor form by heating the gas inlet member 9 and which condenses in a coating step in the regions of windows between webs of the mask 7 on the substrate 6.
[0015] Zur Erzeugung des organischen Dampfes wird ein Trägergas, bei dem es sich um Wasserstoff, Stickstoff oder ein Edelgas handeln kann, in eine Trägergasleitung 5 eingespeist. Die Trägergasleitung 5 mündet in einen Aerosoler- zeuger 13, wo mittels eines Dosierers feste oder flüssige Partikel, die in einem Vorratsbehälter 14 bevorratet werden, in den Trägergasstrom eingespeist werden, sodass sich ein Aerosol bildet, welches mittels einer Aerosolleitung 16 einem Verdampfer 12 zugeleitet wird, der beheizte Wände besitzt, die das Trä- gergas und die Aerosolpartikel derart aufheizen, dass die Aerosolpartikel verdampfen, um als Dampf durch eine Gaszuleitung 11 in das Gaseinlassorgan 9 gebracht zu werden. To generate the organic vapor, a carrier gas, which may be hydrogen, nitrogen or a noble gas, is fed into a carrier gas line 5. The carrier gas line 5 discharges into an aerosol Grower 13, where by means of a metering solid or liquid particles which are stored in a reservoir 14, are fed into the carrier gas flow, so that an aerosol is formed, which is fed by means of an aerosol 16 to an evaporator 12 having heated walls, the Carrying carrier gas and the aerosol particles in such a way that the aerosol particles evaporate to be brought as a vapor through a gas feed line 11 in the gas inlet member 9.
[0016] Bei dem in der Figur 1 dargestellten Ausführungsbeispiel sind im Substrathalter 5 ein oder mehrere Magnete 20, bei denen es sich um Elektromagne- te handelt, vorgesehen. An mehreren Stellen sind insbesondere gleichmäßig über die Substratanlagefläche verteilt Abstandssensoren 22 angeordnet, mit denen der Abstand der Maske 7 zum Substrathalter 5 bestimmbar ist. In the exemplary embodiment illustrated in FIG. 1, one or more magnets 20, which are electromagnets, are provided in the substrate holder 5. At a plurality of locations, distance sensors 22, in particular distributed uniformly over the substrate contact surface, are arranged, with which the distance of the mask 7 from the substrate holder 5 can be determined.
[0017] Das Schirmelement 17 besitzt ebenfalls ein oder mehrere Magnete 19, bei denen es sich um Elektromagnete handelt und Abstandssensoren 21, um den Abstand zwischen Schirmelement 17 und Maske 7 zu bestimmen. The screen element 17 also has one or more magnets 19, which are electromagnets and distance sensors 21 to determine the distance between the screen element 17 and mask 7.
[0018] Es ist insbesondere vorgesehen, dass sich die ein oder mehreren Magnete 19 des Schirmelementes 17 und die ein oder mehreren Magnete 20 des Substrathalters 5 paarweise gegenüberliegen und zu jedem Magnetpaar 19, 20 zumindest ein Magnetsensor 21 gehört, sodass die jeweils beiden Magneten 19, 20 zusammen mit dem Abstandssensor 21, 22 einen Regelkreis ausbilden. Einer der jeweils beiden Magneten 19, 20 kann auch ein Permanentmagnet sein. It is particularly provided that the one or more magnets 19 of the screen member 17 and the one or more magnets 20 of the substrate holder 5 in pairs opposite each other and each magnet pair 19, 20 at least one magnetic sensor 21 is one, so that the two magnets 19 , 20 together with the distance sensor 21, 22 form a control loop. One of the two magnets 19, 20 may also be a permanent magnet.
[0019] Mit einer in der Figur 5 dargestellten Regeleinrichtung 23 werden die Magnetfelder Bl, die von den Magneten 20 erzeugt werden und die Magnetfelder B2, die von den Magneten 19 erzeugt werden derart geregelt, dass die Ab- stände a zwischen Substrathalter 5 und Maske 7 mittels der Abstandssenso- ren 22 und/ oder die Abstände b der Maske 7 vom Schirmelement 17, die mit den Abstandssensoren 21 bestimmt werden, einen vorbestimmten Wert besitzen. With a control device 23 shown in FIG. 5, the magnetic fields B 1 generated by the magnets 20 and the magnetic fields B 2 generated by the magnets 19 are controlled such that the distances a between substrate holder 5 and mask 7 by means of the distance sensor ren 22 and / or the distances b of the mask 7 from the shield member 17, which are determined by the distance sensors 21, have a predetermined value.
[0020] Um die Maske vom Substrathalter 5 zu entfernen, wird der Sollwert des Abstandes a im zeitlichen Verlauf vergrößert, bis die Maske 7 einen vorbestimmten Endabstand erreicht hat. Alternativ dazu kann der Sollwert des Abstandes b zeitlich verkleinert werden, bis die Maske 7 den vorgegebenen Endabstand erreicht hat. In order to remove the mask from the substrate holder 5, the target value of the distance a is increased in the course of time until the mask 7 has reached a predetermined end distance. Alternatively, the target value of the distance b can be reduced in time until the mask 7 has reached the predetermined end distance.
[0021] Die Maske 7 kann aus INVAR bestehen oder einem anderen Werkstoff, der selbst nicht magnetisch aber in einem Magnetfeld polarisierbar ist, also von einem Magneten magnetisch angezogen oder abgestoßen wird. Die von den Magneten 19, 20 erzeugten Magnetfelder Bi, B2 haben somit jeweils eine anziehende ggf. auch eine abstoßende Wirkung auf die Maske 7. Eine dadurch nach oben gerichtete vom Magnetfeld Bi erzeugte Kraft und eine nach unten gerich- tete, vom Magnetfeld B2 erzeugte Kraft werden so ausbalanciert, dass sie die auf die Maske 7 ausgeübte Schwerkraft kompensieren, um somit die Maske 7 in der Schwebe zu halten. The mask 7 may consist of INVAR or another material which is not itself magnetically but polarizable in a magnetic field, that is magnetically attracted or repelled by a magnet. The magnetic fields Bi, B 2 generated by the magnets 19, 20 thus each have an attractive and possibly also a repelling effect on the mask 7. An upwardly directed magnetic field Bi and a downwardly directed magnetic field B 2 force are balanced so that they compensate for the force exerted on the mask 7 gravity, thus keeping the mask 7 in the balance.
[0022] Bei den Ausführungsbeispielen sind die Magnete 19, 20 bevorzugt gleichmäßig über die im Wesentlichen rechteckige Anlagefläche des Substrat- halters 5 bzw. die rechteckige Erstreckungsfläche des Schirmelementes 17 verteilt angeordnet. Zwischen einzelnen Magneten 19, 20 können die Abstandssensoren 21, 22 vorgesehen sein. Die Anzahl der Abstandssensoren 21, 22 ist bevorzugt geringer als die Anzahl der Magneten 19, 20, sodass zu einem ein Abstandssensor 21, 22 aufweisenden Regelkreis eine Vielzahl von Magneten 19, 20 jeweils des Substrathalters 5 oder des Schirmelementes 17 gehören. [0023] In den Ausführungsbeispielen wird der Magnetträger 17 von einem Schirmelement ausgebildet. Es ist aber auch möglich, den Magnetträger anderweitig auszubilden. In the exemplary embodiments, the magnets 19, 20 are preferably distributed uniformly over the substantially rectangular contact surface of the substrate holder 5 or the rectangular extension surface of the shield element 17. Between individual magnets 19, 20, the distance sensors 21, 22 may be provided. The number of distance sensors 21, 22 is preferably less than the number of magnets 19, 20, so that a plurality of magnets 19, 20 respectively of the substrate holder 5 or of the screen element 17 belong to a control circuit comprising a distance sensor 21, 22. In the embodiments, the magnetic carrier 17 is formed by a screen element. But it is also possible to form the magnetic carrier otherwise.
[0024] Bei dem in den Figuren 2 und 4 dargestellten Ausführungsbeispiel be- sitzt entweder nur der Substrathalter 5 ein oder mehrere Magnete 20 und ein oder mehrere Abstandssensoren 22 oder nur das Schirmelement 17 ein oder mehrere Magnete 19 und ein oder mehrere Abstandssensoren 21. Es handelt sich dabei um Elektromagnete 19, 20, deren Magnetkraft derart geregelt werden kann, dass ihre auf die Maske 7 ausgeübte Anziehungskraft die auf die Maske 7 wirkende Schwerkraft kompensiert. In the exemplary embodiment illustrated in FIGS. 2 and 4, either only the substrate holder 5 has one or more magnets 20 and one or more distance sensors 22 or only the screen element 17 one or more magnets 19 and one or more distance sensors 21 These are electromagnets 19, 20 whose magnetic force can be controlled such that their attraction force exerted on the mask 7 compensates for the force acting on the mask 7 gravity.
[0025] Die Regeleinrichtung ist derart eingerichtet, dass sie in der Lage ist, die sich in einer Planlage erstreckende Maske 7 ohne Veränderung ihrer Planlage durch Änderung der Magnetfelder Bi, B2 vertikal zu verlagern. Die Maske 7 wird dabei lediglich an ihrem Rand T von dem Maskenhalter 8 untergriffen. Um zu vermeiden, dass die Maske in ihrem Flächenmittenabschnitt nach unten hin durchhängt werden die geregelten Magnetfelder Bi, B2 erzeugt, die bevorzugt nur in dem von dem Rand T der Maske 7 umgebenen Flächenmittenabschnitt der Maske 7 eine Kraft auf die Maske 7 ausüben. Die Magnetfelder werden derart geregelt, dass sich die Flächenerstreckungslage, insbesondere die Planlage der Maske während ihrer Vertikalverlagerung nicht ändert. The control device is set up in such a way that it is able to displace the mask 7 extending in a flat position without changing its flatness by changing the magnetic fields Bi, B 2 vertically. The mask 7 is engaged only at its edge T of the mask holder 8. In order to prevent the mask from sagging downwards in its surface center section, the regulated magnetic fields Bi, B 2 are generated, which preferably exert a force on the mask 7 only in the surface center section of the mask 7 surrounded by the edge T of the mask 7. The magnetic fields are controlled in such a way that the surface extension position, in particular the flatness of the mask, does not change during its vertical displacement.
[0026] Die Figur 6 zeigt hierzu den zeitlichen Verlauf der magnetischen Feldstärken Bi, B2, die von den Magneten 19, 20 erzeugt werden, um die Vertikallage x der Maske 7 zu verändern. For this purpose, Figure 6 shows the time course of the magnetic field strengths Bi, B 2 , which are generated by the magnets 19, 20 to change the vertical position x of the mask 7.
[0027] Die vorstehenden Ausführungen dienen der Erläuterung der von der Anmeldung insgesamt erfassten Erfindungen, die den Stand der Technik zu- mindest durch die folgenden Merkmalskombinationen jeweils auch eigenständig weiterbilden, nämlich: [0027] The above explanations serve to explain the inventions as a whole covered by the application, which belong to the state of the art. At least through the following combinations of features, each self-training, namely:
[0028] Eine Vorrichtung, die dadurch gekennzeichnet ist, durch magnetisch wirkende Masken-Stabilisierungsmittel 19, 20, 21, 22, 23, um die Maske 7 nach ihrer Entfernung von der Oberfläche des Substrates 6 in einer vorgegebenen Flächenerstreckungslage, insbesondere einer Planlage zu stabilisieren; A device which is characterized by magnetically acting mask stabilizing means 19, 20, 21, 22, 23 in order to stabilize the mask 7 after its removal from the surface of the substrate 6 in a predetermined surface extension position, in particular a flatness ;
[0029] Eine Vorrichtung, die dadurch gekennzeichnet ist, dass die Masken- Stabilisierungsmittel ein oder mehrere Magnete 19, 20, insbesondere Permanent- und/ oder Elektromagnete aufweisen, die dem Substrathalter 5 zugeord- net sind oder von außerhalb in den Prozessraum 2 bringbar sind; A device, which is characterized in that the mask stabilization means comprise one or more magnets 19, 20, in particular permanent magnets and / or electromagnets, which are assigned to the substrate holder 5 or can be brought from outside into the process space 2 ;
[0030] Eine Vorrichtung, die dadurch gekennzeichnet ist, dass die Magnete 19 an einem Schirmelement 17 angeordnet sind, welches zwischen die Maske 7 und einem Gaseinlassorgan 9 bringbar ist; A device which is characterized in that the magnets 19 are arranged on a screen element 17 which can be brought between the mask 7 and a gas inlet member 9;
[0031] Eine Vorrichtung, die gekennzeichnet ist durch eine Regeleinrich- tung 23, mit der die von Elektromagneten 19, 20 der Masken-Stabilisierungsmittel erzeugten Magnetfelder Bi, B2 derart regelbar sind, dass zumindest ein Flächenmittenabschnitt der unterhalb oder oberhalb bezogen auf eine durch die Schwerkraft vorgegebene Richtung der Magnete 19, 20 liegende Maske 7 in der Schwebe gehalten wird; [0032] Eine Vorrichtung, die dadurch gekennzeichnet ist, dass die Masken- Stabilisierungsmittel mindestens einen Abstandssensor 21, 22 aufweisen zur Ermittlung eines Abstands a, b zwischen dem Abstandssensor 21, 22 und der Maske 7 und/ oder zwischen dem Substrathalter 5 und der Maske 7; [0033] Eine Vorrichtung, die dadurch gekennzeichnet ist, dass die Maske 7 in einer durch die Schwerkraft vorgegebenen Richtung entweder oberhalb oder unterhalb des Substrathalters 5 angeordnet ist; A device, which is characterized by a control device 23 with which the magnetic fields Bi, B 2 generated by electromagnets 19, 20 of the mask stabilization means are controllable in such a way that at least one surface center section extends below or above with respect to one the gravitational predetermined direction of the magnets 19, 20 lying mask 7 is held in suspension; A device, characterized in that the mask stabilization means comprise at least one distance sensor 21, 22 for determining a distance a, b between the distance sensor 21, 22 and the mask 7 and / or between the substrate holder 5 and the mask 7; A device characterized in that the mask 7 is disposed in a direction predetermined by gravity either above or below the substrate holder 5;
[0034] Eine Vorrichtung, die dadurch gekennzeichnet ist, dass das Schirmele- ment 17 entlang einer Führung 18 und/ oder mittels Verlagerungsmittel aus der Verwahrkammer 3 heraus und in den Prozessraum 2 hinein und wieder zurück verlagerbar ist; A device which is characterized in that the screen element 17 can be displaced out of the storage chamber 3 and into the process space 2 and back again along a guide 18 and / or by means of displacement means;
[0035] Eine Vorrichtung, die dadurch gekennzeichnet, dass die Maske 7 aus INVAR besteht; [0036] Eine Vorrichtung, die dadurch gekennzeichnet ist, dass die Maske 2 nur an ihrem Rand von einem dem Maskentransportsystem zugeordneten Maskenhalter 8 gehalten ist und die Maskenstabilisierungsmittel nur an vom Rand entfernten Abschnitten der Maske 7 angreifen; A device characterized in that the mask 7 is INVAR; A device which is characterized in that the mask 2 is held only at its edge by a mask holder 8 associated with the mask transport system and which engage the mask stabilization means only at portions of the mask 7 remote from the edge;
[0037] Ein Verfahren, dass dadurch gekennzeichnet ist, dass beim Entfernen der Maske 7 vom Substrat 6 die Maske 7 mittels Magnetkraft in einer vorgegebenen Flächenerstreckungslage stabilisiert wird. A method that is characterized in that when removing the mask 7 from the substrate 6, the mask 7 is stabilized by means of magnetic force in a predetermined surface extension position.
[0038] Alle offenbarten Merkmale sind (für sich, aber auch in Kombination untereinander) erfindungswesentlich. In die Offenbarung der Anmeldung wird hiermit auch der Offenbarungsinhalt der zugehörigen/beigefügten Prioritäts- unterlagen (Abschrift der Voranmeldung) vollinhaltlich mit einbezogen, auch zu dem Zweck, Merkmale dieser Unterlagen in Ansprüche vorliegender Anmeldung mit aufzunehmen. Die Unteransprüche charakterisieren mit ihren Merkmalen eigenständige erfinderische Weiterbildungen des Standes der Technik, insbesondere um auf Basis dieser Ansprüche Teilanmeldungen vorzunehmen. All disclosed features are essential to the invention (individually, but also in combination with one another). The disclosure content of the associated / attached priority documents (copy of the prior application) is hereby also incorporated in full in the disclosure of the application, also for the purpose of including features of these documents in claims of the present application. The subclaims characterize with their features independent inventive developments of the prior Technology, in particular to make divisional applications based on these claims.
Liste der Bezugszeichen List of reference numbers
1 Reaktorgehäuse 1 reactor housing
2 Prozessraum a Abstand 2 process space a distance
3 Verwahrkammer b Abstand3 storage chamber b distance
4 Öffnung 4 opening
5 Substrathalter x Vertikallage 5 substrate holder x vertical position
6 Substrat 6 substrate
7 Maske  7 mask
7 Rand  7 edge
8 Maskenhalter  8 mask holder
9 Gaseinlassorgan  9 gas inlet member
10 Gasaustrittsöffnung  10 gas outlet opening
11 Gaszuleitung  11 gas supply
12 Verdampfer  12 evaporators
13 Aerosolerzeuger  13 aerosol generators
14 Vorratsbehälter  14 storage tank
15 Träger gaszuleitung  15 carrier gas supply line
16 Aerosolleitung  16 aerosol line
17 Schirmelement  17 screen element
18 Führung  18 leadership
19 Magnet  19 magnet
20 Magnet  20 magnet
21 Abstandssensor  21 distance sensor
22 Abstandssensor  22 distance sensor
23 Regeleinrichtung  23 control device
Bi Magnetfeld Bi magnetic field
B2 Magnetfeld B 2 magnetic field

Claims

Ansprüche claims
1. Vorrichtung zum Beschichten zumindest eines Substrates durch Einspeisen eines Ausgangsstoffs in einen Prozessraum (2), mit einem Substrathalter (5) zur Aufnahme des zumindest einen Substrates (6) und einer Maske (7), die von einem Maskentransportsystem (8) vor dem Beschichten an die Oberfläche des Substrates (6) bringbar und nach dem Beschichten von der Oberfläche des Substrates (6) entfernbar ist, wobei die Maske (7) zumindest teilweise magnetisch oder magnetisch aktivierbar ist, wobei Masken-Stabilisierungsmittel (19, 20, 21, 22, 23) Elektromagnete (19, 20) aufweisen zur Erzeugung von Magnetfeldern (Bi, B2), mit denen die Mas- ke (7) in einer Entferntstellung von der Oberfläche des Substrates gehalten werden kann, dadurch gekennzeichnet, dass eine Regeleinrichtung (23) so eingerichtet ist, dass zumindest ein Flächenmittenabschnitt der unterhalb oder oberhalb bezogen auf eine durch die Schwerkraft vorgegebene Richtung der Elektromagnete (19, 20) liegenden Maske (7) in der Schwebe ge- halten wird. A device for coating at least one substrate by feeding a starting material into a process space (2), comprising a substrate holder (5) for receiving the at least one substrate (6) and a mask (7) provided by a mask transport system (8) Coating can be brought to the surface of the substrate (6) and can be removed after coating from the surface of the substrate (6), wherein the mask (7) is at least partially magnetically or magnetically activatable, wherein mask stabilization means (19, 20, 21, 22, 23) have electromagnets (19, 20) for generating magnetic fields (Bi, B 2 ) with which the mask (7) can be held in a remote position from the surface of the substrate, characterized in that a control device ( 23) is set up such that at least one surface center section of the mask (7) lying below or above, in a direction of the electromagnets (19, 20) predetermined by the gravitational force, in the Sch weave.
2. Vorrichtung nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass zumindest einige der Elektromagnete (19) aus einer Verwahrstellung in einer Verwahrkammer in den Prozessraum verfahrbar sind und insbesondere an einem Schirmelement (17) angeordnet sind, welches zwischen die Maske (7) und einem Gaseinlassorgan (9) bringbar ist. 2. Device according to one of the preceding claims, characterized in that at least some of the electromagnets (19) from a storage position in a storage chamber in the process space are movable and in particular on a screen element (17) are arranged, which between the mask (7) and a gas inlet member (9) can be brought.
3. Vorrichtung nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Masken-Stabilisierungsmittel mindestens einen Abstandssensor (21, 22) aufweisen zur Ermittlung eines Abstands (a, b) zwischen dem Abstandssensor (21, 22) und der Maske (7) und/ oder zwischen dem Substrathalter (5) und der Maske (7). 3. Device according to one of the preceding claims, characterized in that the mask stabilization means comprise at least one distance sensor (21, 22) for determining a distance (a, b) between the distance sensor (21, 22) and the mask (7) and / or between the substrate holder (5) and the mask (7).
4. Vorrichtung nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Maske (7) in einer durch die Schwerkraft vorgegebenen Richtung entweder oberhalb oder unterhalb des Substrathalters (5) angeordnet ist. 4. Device according to one of the preceding claims, characterized in that the mask (7) is arranged in a predetermined direction by gravity either above or below the substrate holder (5).
5. Vorrichtung nach einem der Ansprüche 2 bis 4, dadurch gekennzeichnet, dass die Elektromagnete (19) und insbesondere das Schirmelement (17) entlang einer Führung (18) und/ oder mittels Verlagerungsmittel aus der Verwahrkammer (3) heraus und in den Prozessraum (2) hinein und wieder zurück verlagerbar ist. 5. Device according to one of claims 2 to 4, characterized in that the electromagnets (19) and in particular the shielding element (17) along a guide (18) and / or by displacement means from the storage chamber (3) out and into the process space ( 2) into and back again is displaceable.
6. Vorrichtung nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Maske (7) aus INVAR besteht. 6. Device according to one of the preceding claims, characterized in that the mask (7) consists of INVAR.
7. Vorrichtung nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Maske (2) nur an ihrem Rand von einem dem Maskentransportsystem zugeordneten Maskenhalter (8) gehalten ist und die Maskenstabilisierungsmittel nur an vom Rand entfernten Abschnitten der Maske (7) angreifen. 7. Device according to one of the preceding claims, characterized in that the mask (2) is held only at its edge by a mask transport system associated mask holder (8) and the mask stabilization means only at the edge remote portions of the mask (7).
8. Vorrichtung nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass der in der Schwebe gehaltene Flächenmittenabschnitt der Maske (7) berührungslos unterhalb oder oberhalb des Elektromagneten (19, 20) schwebt. 8. Device according to one of the preceding claims, characterized in that the held in suspension surface center portion of the mask (7) non-contact below or above the electromagnet (19, 20) floats.
9. Verfahren zum Beschichten eines Substrates unter Verwendung einer Vorrichtung gemäß einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass beim Entfernen der Maske (7) vom Substrat (6) die Mas- ke (7) mittels Magnetkraft in einer vorgegebenen Flächenerstreckungslage stabilisiert wird. 9. A method for coating a substrate using a device according to one of the preceding claims, characterized in that when removing the mask (7) from the substrate (6) the Mas- Ke (7) is stabilized by magnetic force in a predetermined surface extension position.
10. Verfahren zum Aufsetzen einer Maske (7) auf die Oberfläche eines Substrates (6) oder zum Entfernen der Maske (7) von der Oberfläche des Substrates (6), wobei die Maske (7) zumindest teilweise magnetisch oder magnetisch aktivierbar ist, wobei die Maske (7) von Elektromagneten (19, 20) nach ihrer Entfernung von der Oberfläche des Substrates (6) in einer vorgegebenen Flächenerstreckungslage, insbesondere einer Planlage, gehalten wird, dadurch gekennzeichnet, dass die Elektromagnete (19, 20) von einer Regeleinrichtung (23) geregelte Magnetfelder (Bi, B2) erzeugen, die zumindest einen Flächenmittenabschnitt der unterhalb oder oberhalb bezogen auf eine durch die Schwerkraft vorgegebene Richtung der Magnete (19, 20) liegenden Maske (7) in der Schwebe halten. 10. A method for placing a mask (7) on the surface of a substrate (6) or for removing the mask (7) from the surface of the substrate (6), wherein the mask (7) is at least partially magnetically or magnetically activated, wherein the mask (7) is held by electromagnets (19, 20) after their removal from the surface of the substrate (6) in a predetermined surface extension position, in particular a flat position, characterized in that the electromagnets (19, 20) are controlled by a control device (19). 23) generate regulated magnetic fields (Bi, B 2 ), which hold at least one surface center section of the mask (7) lying below or above in relation to a direction of the magnets (19, 20) predetermined by the gravitational force.
11. Verfahren nach Anspruch 10, dadurch gekennzeichnet, dass der in der Schwebe gehaltene Flächenmittenabschnitt einen Abstand vom Elektromagneten (19, 20) aufweist 11. The method according to claim 10, characterized in that the levitated surface center portion at a distance from the electromagnet (19, 20)
12. Vorrichtung oder Verfahren, gekennzeichnet durch eines oder mehrere der kennzeichnenden Merkmale eines der vorhergehenden Ansprüche. 12. A device or method characterized by one or more of the characterizing features of one of the preceding claims.
PCT/EP2017/078299 2016-11-08 2017-11-06 Device and method for securing a mask in a flat position WO2018087029A1 (en)

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