WO2018051642A1 - Dispositif d'éclairage, dispositif d'exposition et procédé de fabrication d'article - Google Patents

Dispositif d'éclairage, dispositif d'exposition et procédé de fabrication d'article Download PDF

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Publication number
WO2018051642A1
WO2018051642A1 PCT/JP2017/027008 JP2017027008W WO2018051642A1 WO 2018051642 A1 WO2018051642 A1 WO 2018051642A1 JP 2017027008 W JP2017027008 W JP 2017027008W WO 2018051642 A1 WO2018051642 A1 WO 2018051642A1
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Prior art keywords
fly
light
eye lens
microlenses
integrator
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PCT/JP2017/027008
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English (en)
Japanese (ja)
Inventor
孝昭 寺師
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キヤノン株式会社
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Application filed by キヤノン株式会社 filed Critical キヤノン株式会社
Priority to CN201780055492.6A priority Critical patent/CN109964176A/zh
Priority to KR1020197009186A priority patent/KR20190046920A/ko
Publication of WO2018051642A1 publication Critical patent/WO2018051642A1/fr

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Definitions

  • the present invention relates to an illumination device, an exposure device, and an article manufacturing method.
  • An exposure apparatus is used as an apparatus for manufacturing a TFT (Thin Film Transistor) panel of a flat panel display device such as a liquid crystal display device or a plasma display device (see Patent Document 1).
  • a mask pattern is transferred to a substrate on a stage via a projection optical system.
  • the projection optical system includes, for example, a convex mirror and a concave mirror, and includes a reflection optical system that forms a good image area in an off-axis arc area.
  • the panel of a flat panel display device has been increased in size.
  • the exposure area per shot varies depending on the number of exposures. For example, when the substrate is divided into two vertically and divided into two horizontally and exposed in four shots, the exposure area per shot is 1100 mm long ⁇ 1200 mm wide. Further, when the substrate is divided into 2 parts vertically and 3 parts horizontally and exposed in 6 shots, the exposure area per shot is 1100 mm vertically and 800 mm horizontally.
  • the exposure apparatus is required to increase the throughput as well as to expand the exposure area.
  • the energy per unit time given to the entire exposure area is the same, the illuminance decreases and the throughput decreases. Therefore, there is a demand for exposure without reducing illuminance (that is, without reducing throughput) by increasing the output of the light source, increasing the number of lamps, and improving the illumination efficiency.
  • JP-A-8-306618 Japanese Patent Laid-Open No. 3-165023
  • Patent Document 2 discloses a specific method for suppressing a decrease in illumination efficiency when the exposure area changes with respect to an arc-shaped exposure area as disclosed in Patent Document 1. It has not been.
  • the present invention provides an illuminating device that is advantageous for illuminating an arc-shaped region on a surface to be illuminated.
  • an illumination device is an illumination device that illuminates a surface to be illuminated with light from a light source, and is provided on a surface optically conjugate with the surface to be illuminated.
  • An optical system that forms a rectangular illumination region having a longitudinal direction along one direction and a short direction along a second direction orthogonal to the first direction; and optically conjugate with the surface to be illuminated
  • a light-shielding plate disposed on a flat surface and provided with an arc-shaped opening, and the optical system is disposed so as to be exchangeable in the optical path of the light, and covers the illumination area covering the arc-shaped opening.
  • first integrator including a first integrator and a second integrator to be formed;
  • the second integrator is shorter than the first length in the first direction.
  • a second illumination area having a length of 3 and having a fourth length shorter than the second length in the second direction, the arcuate shape of the sides of the first illumination area along the first direction.
  • the convex side of the aperture and the convex side of the arc-shaped aperture among the sides along the first direction of the second illumination region are formed to be coincident with each other.
  • an illuminating device that is advantageous for illuminating an arc-shaped region on a surface to be illuminated.
  • FIG. 1 is a schematic diagram showing a configuration of an exposure apparatus 100 as one aspect of the present invention.
  • the exposure apparatus 100 is a lithography apparatus that forms a pattern by exposing the substrate 15 using light from the light source unit LU.
  • the exposure apparatus 100 employs a step-and-scan method, and transfers the pattern of the mask 12 to the substrate 15 while scanning the mask 12 and the substrate 15.
  • a coordinate system is defined in which the direction perpendicular to the scanning direction (direction perpendicular to the paper surface) is the x-axis, the scanning direction is the y-axis, and the direction orthogonal thereto is the z-axis.
  • the exposure apparatus 100 includes a condenser lens 5, a plurality of optical integrators 6, an aperture stop 7, a condenser lens 8, a slit (light shielding plate) 9, a masking blade 10, and a condenser lens 11.
  • the exposure apparatus 100 further includes a mask stage 13, a projection optical system 14, and a substrate stage 16.
  • the condenser lens 5, the plurality of optical integrators 6, the aperture stop 7, the condenser lens 8, the slit 9, the masking blade 10, and the condenser lens 11 illuminate the surface to be illuminated (mask 12 or substrate 15) with light from the light source 1.
  • the apparatus IL is configured.
  • the light source unit LU includes, for example, a light source 1 that emits ultraviolet light (light) such as a halogen lamp, and a condenser mirror 2.
  • the condensing mirror 2 has an elliptical shape.
  • a light emitting unit of the light source 1 is disposed in the vicinity of the first focal point 3 of the condenser mirror 2 (ellipse), and light from the light source 1 is condensed (imaged) on the second focal point 4 of the condenser mirror 2.
  • the condenser lens 5 condenses the light collected at the second focal point 4 on an optical integrator (incident surface) disposed in the optical path of the light from the light source 1 among the plurality of optical integrators 6.
  • the plurality of optical integrators 6 are arranged so as to be exchangeable in the optical path of the light from the light source 1, and in this embodiment, a structure (turret) capable of selecting the optical integrator to be arranged in the optical path according to the variation of the exposure area per shot. Etc.).
  • the plurality of optical integrators 6 form illumination areas having different areas.
  • the plurality of optical integrators 6 include a first integrator 6a and a second integrator 6b. Detailed configurations of the first integrator 6a and the second integrator 6b will be described later.
  • the aperture stop 7 is disposed in the vicinity of the exit surface of the first integrator 6a or the second integrator 6b disposed in the optical path of the light from the light source 1.
  • the light that has passed through the first integrator 6a or the second integrator 6b passes through the aperture stop 7 and the condenser lens 8, and the slit 9 that defines the shape of the light incident on the projection optical system 14 and the masking blade 10 that defines the exposure area.
  • the slit 9 and the masking blade 10 may be disposed in the vicinity of a surface optically conjugate with the surface to be illuminated (mask 12 or substrate 15), and is not limited to being disposed at the position shown in FIG.
  • the light that has passed through the slit 9 and the masking blade 10 illuminates the mask 12 disposed on the object plane of the projection optical system 14 via the condenser lens 11.
  • the projection optical system 14 is an optical system that projects the pattern of the mask 12 onto the substrate 15 disposed on the image plane of the projection optical system 14, and includes a reflection optical system or a catadioptric optical system.
  • the mask 12 and the substrate 15 are arranged in an optically conjugate relationship with respect to the projection optical system 14.
  • the mask stage 13 is a stage that moves while holding the mask 12, and realizes a function of moving (scanning) the mask 12 in the scanning direction, for example.
  • the substrate stage 16 is a stage that holds and moves the substrate 15 and realizes, for example, a function of moving (scanning) the substrate 15 in the scanning direction. While scanning the mask 12 and the substrate 15 with the mask stage 13 and the substrate stage 16, the substrate 15 is exposed with slit-shaped light.
  • the projection optical system 14 is embodied as a reflection optical system, and forms an arcuate exposure region as shown in FIG. 2A. As shown in FIG. 2B, such an arc-shaped exposure area cuts out rectangular light (illumination area) 30 that is Koehler-illuminated by the optical integrator 6 and the condenser lens 8 by a slit 9 having an arc-shaped opening. Is formed.
  • a shot size to be exposed that is, an exposure area per shot
  • a device for example, a screen size
  • region per shot in the exposure apparatus 100 is demonstrated.
  • the length required for the exposure width in the non-scanning direction of the exposure region is a length Xa
  • a length Xb is a short length.
  • the illumination device IL has a rectangular illumination having a longitudinal direction along the first direction (x-axis direction) and a short direction along a second direction (y-axis direction) orthogonal to the first direction. Form a region.
  • the exposure region in the non-scanning direction When the length of the exposure region in the non-scanning direction is the length Xa, as shown in FIG. 3A, the exposure region has a length (first length) Xa and a length (first length) in the short direction.
  • An illumination area (first illumination area) 30a having (2 lengths) Ya is formed.
  • the length of the exposure region in the non-scanning direction is the length Xb, as shown in FIG. 3B
  • the length (the third length shorter than the first length) Xb in the longitudinal direction has a short length.
  • An illumination region (second illumination region) 30b having a length (fourth length shorter than the second length) Yb in the hand direction is formed.
  • the illumination areas 30a and 30b are formed so as to cover the arc-shaped opening of the slit 9, that is, the arc-shaped exposure area (arc area). Further, the left ends of the illumination region 30a and the illumination region 30b are aligned, that is, the side SXa on the convex side of the arc region of the sides along the x-axis direction of the illumination region 30a and the side along the x-axis direction of the illumination region 30b Of these, it is necessary to form so that the convex side SXb of the arc region coincides. Therefore, as shown in FIG.
  • the change of the illumination area and the shift of the center position of the illumination area are realized by the first integrator 6a and the second integrator 6b.
  • the first integrator 6a is used when the length of the exposure region in the non-scanning direction is long (arranged in the optical path of light from the light source 1) and has a length Xa in the longitudinal direction (x-axis direction).
  • the illumination region 30a (FIG. 3A) having a length Ya in the short direction (y-axis direction) is formed.
  • the second integrator 6b is used when the length of the exposure region in the non-scanning direction is short (arranged in the optical path of light from the light source 1) and has a length Xb in the longitudinal direction (x-axis direction).
  • the illumination region 30b (FIG. 3B) having a length Yb in the short direction (y-axis direction) is formed.
  • FIGS. 4A and 4B are diagrams showing the configuration of the first integrator 6a and the illumination region 30a formed by the first integrator 6a.
  • 4A shows a cross-sectional view in the xz direction
  • FIG. 4B shows a cross-sectional view in the yz direction.
  • the first integrator 6a includes a fly-eye lens 61a in which a plurality of microlenses are arranged on a light incident side surface and a plurality of microlenses on a light emission side surface in order along the light traveling direction. And a fly eye lens 62a.
  • 4A and 4B only a pair of microlenses among the plurality of microlenses is illustrated as the fly-eye lenses 61a and 62a.
  • fly-eye lenses 61a and 62a there are many fly-eye lenses 61a and 62a in the x-axis direction and the y-axis direction.
  • a micro lens is arranged.
  • the fly-eye lenses 61a and 62a have a cross-sectional shape that is substantially similar to the shape of the illumination region 30a formed on the illuminated surface.
  • the light that has passed through the microlenses of the fly-eye lenses 61a and 62a constituting the first integrator 6a forms a secondary light source.
  • the light emitted from the first integrator 6a illuminates the illuminated surface uniformly via the condenser lens 8.
  • FIG. 5A and 5B are diagrams showing the configuration of the second integrator 6b and the illumination region 30b formed by the second integrator 6b.
  • FIG. 5A shows a cross-sectional view in the xz direction
  • FIG. 5B shows a cross-sectional view in the yz direction.
  • the second integrator 6b includes, in order along the light traveling direction, a first fly-eye lens 61b in which a plurality of first microlenses are arranged on a light incident side surface, and a plurality of first eyelets on a light emission side surface. And a second fly-eye lens 62b in which two microlenses are arranged.
  • the illumination area 30b formed by the second integrator 6b is smaller in the x-axis direction and the y-axis direction than the illumination area 30a formed by the first integrator 6a. Accordingly, the size of each microlens of the first fly-eye lens 61b and the second fly-eye lens 62b is smaller than the size of each microlens of the fly-eye lenses 61a and 62b. 5A and 5B, only a pair of microlenses is illustrated as the first fly-eye lens 61b and the second fly-eye lens 62b, but in actuality, there are many in the x-axis direction and the y-axis direction. A micro lens is arranged.
  • the center (center position) in the y-axis direction of the light incident side surface of each of the plurality of first microphone lenses of the first fly-eye lens 61b is 61Cb.
  • the center (center position) in the y-axis direction of the surface on the light emission side of each of the plurality of second microlenses of the second fly-eye lens 62b corresponding to each of the plurality of first microlenses is set to 62Cb.
  • the first fly-eye lens 61b and the second fly-eye are arranged such that the center 61Cb of each first microlens and the center 62Cb of each second microlens are relatively shifted (shifted) in the y-axis direction.
  • a lens 62b is disposed.
  • the angle of the principal ray emitted from the second fly-eye lens 62b is inclined, so that the center position of the illumination region 30b formed on the illuminated surface can be shifted.
  • the center 31b in the y-axis direction of the illumination region 30b formed by the second integrator 6b is shifted by ⁇ y in the y-axis direction with respect to the center 31a in the y-axis direction of the illumination region 30a formed by the first integrator 6a. (FIG. 3C).
  • the center position of the illumination area can be shifted by relatively shifting the first fly-eye lens 61b and the second fly-eye lens 62b in the y-axis direction. Therefore, the exposure apparatus 100 (illumination apparatus IL) can achieve efficient illumination when changing the exposure area.
  • the second integrator 6b is incorporated in, for example, a turret or the like with the first fly-eye lens 61b and the second fly-eye lens 62b relatively shifted in the y-axis direction.
  • a shift mechanism that relatively shifts the first fly-eye lens 61b and the second fly-eye lens 62b in the y-axis direction may be provided.
  • the light from the light source 1 is incident on the second integrator 6b as parallel light.
  • the light from the light source 1 is incident on the second integrator 6b as condensed light (that is, with an angle).
  • the incident angle of the light with respect to the 2nd integrator 6b changes with the design conditions of illuminating device IL.
  • a case where light spreads to the lens boundary in the y-axis direction on the exit surface of the second integrator 6b, that is, each of the second microlenses of the second fly-eye lens 62b will be described as an example.
  • FIG. 6A shows a case where in the second integrator 6b, the first fly-eye lens 61b and the second fly-eye lens 62b are not relatively shifted in the y-axis direction, that is, the center of the illumination region 30b is not shifted. ing.
  • the relationship between the lens boundary on the second microlens of the second fly-eye lens 62b and the spread of the light 60 is shown in FIG. 7A.
  • the light 60 incident as the condensed light on the second integrator 6b spreads to the lens boundary in the y-axis direction of the microlens of the second fly-eye lens 62b.
  • FIG. 6B shows a case where in the second integrator 6b, the first fly-eye lens 61b and the second fly-eye lens 62b are relatively shifted in the y-axis direction, that is, the center of the illumination region 30b is shifted.
  • FIG. 7B shows the relationship between the lens boundary on the second microlens of the second fly's eye lens 62b and the spread of the light 60 in the case shown in FIG. 6B.
  • the first fly-eye lens 61b and the second fly-eye lens 62b are relatively shifted in the y-axis direction, they enter the second integrator 6b at the lens boundary of the second microlens.
  • a part of the light 60 is garbled.
  • the light emitted at the lens boundary of the second microlens is incident on an adjacent second microlens (not shown) and becomes unnecessary light that is not used for illumination of the illuminated surface. This leads to a decrease in throughput.
  • a deflection member 75 is provided between the light source 1 and the first fly-eye lens 61b, that is, on the incident side of the first fly-eye lens 61b. Deploy.
  • the deflection member 75 is a wedge-shaped optical member, and deflects the light 60 incident as the condensed light on the second integrator 6b in the y-axis direction. Further, the deflection member 75 emits the light 60 so that the light emitted from the first fly-eye lens 61b and incident on the second fly-eye lens 62b is increased as compared with the case where the deflection member 75 is not disposed. It is configured to deflect in the y-axis direction.
  • the deflecting member 75 is incorporated in the turret together with the second integrator 6b, but a mechanism for inserting and removing the deflecting member 75 with respect to the optical path of light from the light source 1 is assumed. May be provided.
  • the first fly-eye lens 61b and the second fly-eye lens 62b are tilted (rotated) around the x-axis to thereby center the illumination area formed by the second integrator 6b. Can also be shifted.
  • each of the first microphone lens of the first fly-eye lens 61b and the second microlens of the second fly-eye lens 62b has a center of curvature on the outer shape center of each lens, and Are arranged coaxially without relatively shifting.
  • the first fly-eye lens 61b and the second fly-eye lens 62b are arranged so as to have an inclination around the x axis.
  • the first fly-eye lens 61b and the second fly-eye lens 62b are arranged so that the straight line L1 connecting the center 61Cb of the first microlens and the center 62Cb of the second microlens intersects the optical axis OA.
  • the optical axis OA is set to be parallel to the z-axis direction (third direction) orthogonal to the x-axis direction (first direction) and the y-axis direction (second direction).
  • the second integrator 6b is incorporated into, for example, a turret with the first fly-eye lens 61b and the second fly-eye lens 62b tilted around the x axis.
  • a rotation mechanism that rotates the first fly-eye lens 61b and the second fly-eye lens 62b around the x axis may be provided.
  • the second integrator 90 sequentially includes a first fly-eye lens 91 in which a plurality of first microlenses are arranged on a light incident side surface and a plurality of first eyelets on a light emission side surface along the light traveling direction. And a second fly-eye lens 92 in which two microlenses are arranged. As shown in FIG. 9, the center (center position) in the y-axis direction of the light incident side surface of each of the plurality of first microphone lenses of the first fly-eye lens 91 is 91C.
  • the center (center position) in the y-axis direction of the light exit side surface of each of the plurality of second microlenses of the second fly-eye lens 92 corresponding to each of the plurality of first microlenses is set to 92C.
  • the first fly-eye lens 91 and the second fly-eye are arranged so that the center 91C of each first microlens and the center 92C of each second microlens are on the same axis along the z-axis direction.
  • a lens 92 is disposed.
  • Each of the plurality of first microlenses of the first fly-eye lens 91 has a curved surface on the light incident side, and the apex 93 and the center 91C of the curved surface coincide with each other.
  • each of the plurality of second microlenses of the second fly-eye lens 92 has a curved surface on the light emission side, and has a vertex 94 of the curved surface shifted from the center 92C in the y-axis direction.
  • the apex 94 of the curved surface of the second microlens is shifted (eccentric) in the y-axis direction.
  • the inclination angle of the light emitted from the second fly-eye lens 92 is ⁇
  • the second micro of the second fly-eye lens 92 with respect to the apex 93 of the curved surface of the first micro-lens of the first fly-eye lens 91 Let dy be the shift amount of the apex 94 of the curved surface of the lens in the y-axis direction. Also, as shown in FIG. 10, the radius of curvature of the exit surface of the second microlens of the second fly's eye lens 92 is R, and its refractive index is n. In this case, the relationship between the shift amount dy and the inclination angle ⁇ is expressed by the following equation.
  • the second integrator 110 includes a first fly-eye lens 111 in which a plurality of first microlenses are arranged on a light incident side surface and a plurality of first eyelets on a light emission side surface in order along the light traveling direction. And a second fly-eye lens 112 in which two microlenses are arranged. As shown in FIG. 11, the center (center position) in the y-axis direction of the light incident side surface of each of the plurality of first microphone lenses of the first fly-eye lens 111 is 111C.
  • the center (center position) in the y-axis direction of the surface on the light exit side of each of the plurality of second microlenses of the second fly-eye lens 112 corresponding to each of the plurality of first microlenses is 112C.
  • the first fly-eye lens 111 and the second fly-eye are arranged so that the center 111C of each first microlens and the center 112C of each second microlens are on the same axis along the z-axis direction.
  • a lens 112 is disposed.
  • each of the plurality of first microlenses of the first fly-eye lens 111 has a curved surface on the light incident side, and the vertex of the curved surface coincides with the center 111C.
  • each of the plurality of second microlenses of the second fly's eye lens 112 has a curved surface on the light emission side, and the vertex of the curved surface coincides with the center 112C.
  • the surface 114 on the second fly-eye lens 112 side is a flat surface (first flat surface), and the flat surface is orthogonal to the z-axis direction orthogonal to the x-axis direction and the y-axis direction.
  • the surface 115 on the first fly-eye lens 111 side is a flat surface (second flat surface), and the flat surface is inclined with respect to the surface 114.
  • the surface 115 of the second fly-eye lens 112 has a wedge shape inclined about the x axis.
  • the second integrator 110 As light incident on the second integrator 110, parallel light is indicated by a solid line, and condensed light is indicated by a dotted line. Since the surface 115 of the second fly-eye lens 112 has a wedge shape inclined about the x-axis, the parallel light incident on the second integrator 110 is emitted from the second fly-eye lens 112 while being inclined. In addition, since the center 111C of the first microlens and the center 112C of the second microlens are arranged on the same axis, the condensed light incident on the second integrator 110 is blocked by the second fly-eye lens 112. There is no. Therefore, the second integrator 110 can realize the shift of the center position of the illumination area formed on the illuminated surface without causing a light amount loss.
  • the reduction of the illumination light rate is suppressed even when the exposure area changes with respect to the arc-shaped exposure area, and the substrate 15 is exposed with high throughput. be able to.
  • the article manufacturing method in the embodiment of the present invention is suitable for manufacturing articles such as devices (semiconductor elements, magnetic storage media, liquid crystal display elements, etc.), color filters, and the like.
  • a manufacturing method includes a step of exposing a substrate coated with a photosensitive agent using the exposure apparatus 100 and a step of developing the exposed substrate.
  • Such a manufacturing method may include other well-known steps (oxidation, film formation, vapor deposition, doping, planarization, etching, resist stripping, dicing, bonding, packaging, and the like).
  • the method for manufacturing an article in the present embodiment is advantageous in at least one of the performance, quality, productivity, and production cost of the article as compared with the conventional method.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)

Abstract

L'invention concerne un dispositif d'éclairage permettant d'éclairer une surface à éclairer à l'aide de la lumière provenant d'une source de lumière, le dispositif d'éclairage étant caractérisé en ce qu'il comprend : un système optique formant, sur une surface conjuguée optiquement à la surface à éclairer, une région d'éclairage rectangulaire qui a une direction longitudinale le long d'une première direction et a une direction transversale le long d'une seconde direction orthogonale à la première direction ; et une plaque de protection contre la lumière qui est disposée sur la surface conjuguée optiquement à la surface à éclairer et sur laquelle est disposée une ouverture arquée. Le dispositif d'éclairage est en outre caractérisé en ce que : le système optique comprend un premier intégrateur et un second intégrateur qui sont disposés de manière à pouvoir être remplacés sur un trajet optique de la lumière et à former la région d'éclairage qui recouvre l'ouverture arquée ; le premier intégrateur forme une première région d'éclairage qui a une première longueur dans la première direction et a une deuxième longueur dans la seconde direction ; et le second intégrateur forme une seconde région d'éclairage qui a une troisième longueur plus courte que la première longueur dans la première direction et une quatrième longueur plus courte que la deuxième longueur dans la seconde direction, de sorte qu'un bord côté convexe de l'ouverture arquée, du bord de la première région d'éclairage le long de la première direction, et un bord côté convexe de l'ouverture arquée, du bord de la seconde région d'éclairage le long de la première direction, coïncident.
PCT/JP2017/027008 2016-09-13 2017-07-26 Dispositif d'éclairage, dispositif d'exposition et procédé de fabrication d'article WO2018051642A1 (fr)

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CN201780055492.6A CN109964176A (zh) 2016-09-13 2017-07-26 照明装置、曝光装置以及物品的制造方法
KR1020197009186A KR20190046920A (ko) 2016-09-13 2017-07-26 조명 장치, 노광 장치 및 물품의 제조 방법

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JP2016179023A JP2018045060A (ja) 2016-09-13 2016-09-13 照明装置、露光装置及び物品の製造方法
JP2016-179023 2016-09-13

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