WO2018025562A1 - 銅粉の製造方法 - Google Patents
銅粉の製造方法 Download PDFInfo
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- WO2018025562A1 WO2018025562A1 PCT/JP2017/024661 JP2017024661W WO2018025562A1 WO 2018025562 A1 WO2018025562 A1 WO 2018025562A1 JP 2017024661 W JP2017024661 W JP 2017024661W WO 2018025562 A1 WO2018025562 A1 WO 2018025562A1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/16—Making metallic powder or suspensions thereof using chemical processes
- B22F9/18—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds
- B22F9/24—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds starting from liquid metal compounds, e.g. solutions
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/16—Making metallic powder or suspensions thereof using chemical processes
- B22F9/18—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds
- B22F9/20—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds starting from solid metal compounds
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/16—Making metallic powder or suspensions thereof using chemical processes
- B22F9/30—Making metallic powder or suspensions thereof using chemical processes with decomposition of metal compounds, e.g. by pyrolysis
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/02—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
- H01B1/026—Alloys based on copper
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2301/00—Metallic composition of the powder or its coating
- B22F2301/10—Copper
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2304/00—Physical aspects of the powder
- B22F2304/05—Submicron size particles
- B22F2304/058—Particle size above 300 nm up to 1 micrometer
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2304/00—Physical aspects of the powder
- B22F2304/10—Micron size particles, i.e. above 1 micrometer up to 500 micrometer
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/02—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
Definitions
- the present invention relates to a method for producing copper powder. Specifically, the present invention relates to a method for producing copper powder that can be used as a conductive material for various uses such as a conductive filler blended in a conductive paste used when forming an external electrode of an electric circuit, a ceramic capacitor, or the like. About.
- Copper powder is widely used as a conductive material of a conductive paste that forms a conductive portion (for example, an electrode or a circuit) of an electronic component.
- a wet reduction method is generally known as a method for producing this copper powder.
- hydrazine or a hydrazine compound is used as a reducing agent when reducing copper hydroxide in a liquid to metallic copper particles using a reducing agent, and the reduction reaction is performed by the presence of an antifoaming agent.
- a method for obtaining copper powder having a minor axis and a major axis of less than 100 nm by adding a surface treatment agent before, after or during the reduction reaction is disclosed.
- a reducing agent is added to a copper hydroxide slurry obtained by reacting a copper ion-containing aqueous solution with an alkali solution to perform a first reduction treatment to obtain a cuprous oxide slurry. Allow to stand to precipitate cuprous oxide particles, remove the supernatant and add water to wash the cuprous oxide particles into a washed cuprous oxide slurry, and add a reducing agent to the washed cuprous oxide slurry.
- the first reduction treatment uses a hydrazine as a reducing agent and an aqueous ammonia solution as a pH adjusting agent in combination with a copper hydroxide slurry.
- the present invention has been made in order to solve the above-described problems, and a copper powder capable of forming a conductive part having a low volume resistivity even when the average particle diameter D 50 is 0.5 ⁇ m to 10 ⁇ m.
- An object is to provide a manufacturing method.
- the present invention includes (A) cuprous oxide, (B) at least one selected from the group consisting of boric acid and salts thereof, (C) at least one selected from the group consisting of ammonia and ammonium ion supply sources, And (D) at least one selected from the group consisting of monosaccharides, disaccharides and polysaccharides as a raw material.
- the present invention it is possible to provide a method for producing copper powder capable of forming a conductive part having a low volume resistivity even when the average particle diameter D 50 is 0.5 ⁇ m to 10 ⁇ m.
- the copper powder production method of the present invention is characterized in that the components (A) to (D) are used as raw materials.
- the component (A) is cuprous oxide. Cuprous oxide is synonymous with copper (I) oxide.
- commercially available cuprous oxide may be used, or cuprous oxide produced by reducing a copper salt of an inorganic acid such as copper sulfate may be used.
- component is at least 1 sort (s) chosen from the group which consists of boric acid and its salt.
- the borate is not particularly limited, and examples thereof include lead borate, barium borate, zinc borate, aluminum borate, sodium tetraborate, and hydrates thereof.
- boric acid when boric acid is used as the component (B), it is preferable because copper powder capable of forming a conductive part having a low volume resistivity is easily obtained.
- boric acid is used as the component (B)
- this effect is obtained. It is more preferable because it is particularly high.
- the amount of component (B) used is not particularly limited as long as it is appropriately set according to the type of component (B) to be used, but is preferably 0.05 to 2 mol per 1 mol of component (A).
- the amount is 0.0 mol, more preferably 0.1 to 1.0 mol. (B) If the usage-amount of a component exists in said range, the copper powder which can form the electroconductive part with a low volume resistivity will be easy to be obtained.
- the component (C) is at least one selected from the group consisting of ammonia and ammonium ion supply sources.
- the ammonium ion source is not particularly limited as long as it is a compound capable of supplying ammonium ions.
- ammonium chloride, ammonium bromide, ammonium formate, ammonium sulfate, ammonium nitrate, ammonium carbonate, ammonium acetate, ammonium maleate Examples include ammonium citrate, ammonium tartrate, and ammonium malate.
- the component (C) only one component may be used, or two or more components may be used in combination.
- the component (C) when at least one selected from the group consisting of ammonia, ammonium chloride, ammonium bromide, ammonium formate and ammonium acetate is used, a flat copper powder with good filling properties can be obtained, This is preferable because it is easy to form a conductive portion having a low volume resistivity.
- the amount of component (C) used is not particularly limited as long as it is appropriately set according to the type of component (C) to be used, but is preferably 0.05 mol to 5 mol per 1 mol of component (A).
- the amount is 0.0 mol, more preferably 0.1 mol to 3.0 mol.
- copper powder capable of forming a conductive part having a low volume resistivity is easily obtained.
- the ratio of the component (B) to the component (C) may be appropriately set according to the type of each component to be used, but is preferably in a molar ratio of 1: 0.1 to 1:10. .
- the ratio of the component (B) and the component (C) is within the above range, a copper powder capable of forming a conductive part having a low volume resistivity is easily obtained.
- the component (D) is at least one selected from the group consisting of monosaccharides, disaccharides and polysaccharides. Although it does not specifically limit as monosaccharide, For example, aldoses, such as glyceraldehyde, erythrose, threose, ribose, lyxose, xylose, arabinose, allose, talose, growth, glucose, altrose, mannose, galactose, idose; dihydroxyacetone Ketoses such as erythrulose, xylulose, ribulose, psicose, fructose, solobose and tagatose.
- aldoses such as glyceraldehyde, erythrose, threose, ribose, lyxose, xylose, arabinose, allose, talose, growth, glucose, altrose, mannose, galactose, i
- the disaccharide is not particularly limited, and examples thereof include sucrose, lactulose, lactose, maltose, trehalose, cellobiose and the like.
- the polysaccharide is not particularly limited, and examples thereof include glycogen, cellulose, chitin, agarose, carrageenan, heparin, hyaluronic acid, pectin, xyloglucan, and arabinogalactan.
- D body or L body may be sufficient.
- the component (D) only one type of component may be used, or two or more types of components may be used in combination.
- the component (D) when at least one selected from the group consisting of glucose, fructose, galactose, mannose and arabinogalactan is used, a copper powder capable of forming a conductive part having a low volume resistivity is easily obtained. In view of this, it is preferable to use at least one selected from the group consisting of glucose, fructose, galactose and mannose as the component (D) because this effect is particularly high.
- the amount of component (D) used is not particularly limited as long as it is appropriately set according to the type of component (D) to be used, but is preferably 0.05 mol to 5 mol per 1 mol of component (A).
- the amount is 0.0 mol, more preferably 0.1 mol to 3.0 mol.
- D It is easy to obtain the copper powder which can form the electroconductive part with a low volume resistivity as the usage-amount of a component exists in said range.
- the above components (A) to (D) are used as essential raw materials, but known raw materials (additives) may be further added as long as the effects of the present invention are not impaired.
- the additive include, but are not particularly limited to, an antifoaming agent, a pH adjusting agent, a specific gravity adjusting agent, a viscosity adjusting agent, a wettability improving agent, a chelating agent, an oxidizing agent, a reducing agent, and a surfactant.
- the amount of the additive used is not particularly limited, but is generally 0.0001 to 50 parts by mass with respect to 100 parts by mass of component (A).
- antifoaming agents examples include 2-propanol, polydimethyl silicone, dimethyl silicone oil, trifluoropropyl methyl silicone, colloidal silica, polyalkyl acrylate, polyalkyl methacrylate, alcohol ethoxylate, alcohol propoxylate, fatty acid ethoxylate, fatty acid Examples include propoxylate and sorbitan partial fatty acid ester.
- 2-propanol is preferred because it takes a short time to defoam and improves the productivity of copper powder.
- a water-soluble basic compound and a water-soluble acidic compound can be mentioned, for example.
- water-soluble basic compounds include alkali metal hydroxides such as lithium hydroxide, sodium hydroxide and potassium hydroxide; alkaline earth metal hydroxides such as calcium hydroxide, strontium hydroxide and barium hydroxide; Alkali metal carbonates such as ammonium carbonate, lithium carbonate, sodium carbonate and potassium carbonate; quaternary ammonium hydroxides such as tetramethylammonium hydroxide and choline; organic amines such as ethylamine, diethylamine, triethylamine and hydroxyethylamine It is done.
- alkali metal hydroxides as a pH adjuster because copper powder capable of forming a conductive part having a low volume resistivity is easily obtained.
- sodium hydroxide is used as a pH adjuster, It is more preferable because the effect is particularly high.
- the reducing agent include hydrazine and hydrazine compounds.
- the manufacturing method of the copper powder of this invention can be performed according to a well-known method in the said technical field except using (A) component, (B) component, (C) component, and (D) component as a raw material.
- the method for producing a copper powder of the present invention is not particularly limited as long as it has a step (raw material charging step) of blending components (A) to (D), which are essential raw materials, with a solvent. It is preferable to apply to a wet reduction method.
- the reduction reaction may be carried out by blending the components (A) to (D) in a solvent.
- the solvent is not particularly limited, but water such as pure water is optimal.
- the temperature of the solvent is preferably controlled to 10 ° C. to 90 ° C., more preferably 40 ° C. to 70 ° C. By making the temperature of the solvent within the above range, the productivity of the copper powder can be improved. When the temperature of the solvent is lower than 10 ° C., each raw material may be difficult to dissolve in the solvent.
- the pH of the solvent in which each raw material is blended may be appropriately adjusted according to the desired shape, particle diameter, etc. of the copper powder, but when producing copper powder having an average particle diameter D 50 of 0.5 ⁇ m to 10 ⁇ m, It is preferable to control the pH to 8 to 14.
- the reduction reaction proceeds by heating and holding a solvent containing each raw material at a temperature of 50 ° C. to 90 ° C.
- the heating and holding time is not particularly limited, but is generally 5 minutes to 120 minutes.
- the copper powder produced as described above can form a conductive part having a low volume resistivity even when the average particle diameter D 50 is 0.5 ⁇ m to 10 ⁇ m.
- Electrode, circuit, etc. can be used as a conductive material of a conductive paste.
- the conductive paste can be produced by blending and kneading copper powder with various additives such as a resin such as an acrylic resin and an epoxy resin and a curing agent thereof.
- Example 1 42.0 g of cuprous oxide, 21.6 g of boric acid and 74.0 g of glucose were added to 74.0 g of pure water and heated to 50 ° C. Next, 31.45 g of ammonia water having an ammonia concentration of 28% by mass and 3.52 g of 2-propanol as an antifoaming agent were further added, and the temperature was raised to 60 ° C. Next, after further adding 70.4 g of an aqueous sodium hydroxide solution having a sodium hydroxide concentration of 50% by mass, the mixture was stirred for 1 hour in a temperature range of 75 ⁇ 5 ° C. to carry out a reduction reaction. The copper powder produced by the reduction reaction was washed with pure water, surface-treated with stearic acid, and then dried. When the obtained copper powder was observed with an FE-SEM, it had a flat shape.
- Example 2 34.0 g of cuprous oxide, 17.5 g of boric acid, 59.9 g of glucose and 25.42 g of ammonium chloride were added to 59.9 g of pure water and heated to 50 ° C. Next, 2.9 g of 2-propanol as an antifoaming agent was further added and the temperature was raised to 60 ° C. Next, after further adding 114.0 g of an aqueous sodium hydroxide solution having a sodium hydroxide concentration of 50 mass%, the mixture was stirred for 1 hour at a temperature range of 75 ⁇ 5 ° C. to carry out a reduction reaction. The copper powder produced by the reduction reaction was washed with pure water, surface-treated with stearic acid, and then dried. When the obtained copper powder was observed with an FE-SEM, it had a flat shape.
- Example 3 40.0 g of cuprous oxide, 20.6 g of boric acid, 70.5 g of glucose and 53.1 g of ammonium bromide were added to 70.5 g of pure water and heated to 50 ° C. Next, 3.4 g of 2-propanol as an antifoaming agent was further added and the temperature was raised to 60 ° C. Next, 134.2 g of a sodium hydroxide aqueous solution having a sodium hydroxide concentration of 50% by mass was further added, and the mixture was stirred for 1 hour at a temperature range of 75 ⁇ 5 ° C. to carry out a reduction reaction. The copper powder produced by the reduction reaction was washed with pure water, surface-treated with stearic acid, and then dried. When the obtained copper powder was observed with an FE-SEM, it had a flat shape.
- Example 4 Cuprous oxide 45.0 g, boric acid 23.2 g, glucose 79.3 g and ammonium formate 39.7 g were added to pure water 79.3 g and heated to 50 ° C. Next, 3.8 g of 2-propanol as an antifoaming agent was further added and the temperature was raised to 60 ° C. Next, after further adding 100.6 g of an aqueous sodium hydroxide solution having a sodium hydroxide concentration of 50% by mass, the mixture was stirred at a temperature range of 75 ⁇ 5 ° C. for 1 hour to carry out a reduction reaction. The copper powder produced by the reduction reaction was washed with pure water, surface-treated with stearic acid, and then dried. When the obtained copper powder was observed with an FE-SEM, it had a flat shape.
- Example 5 45.0 g of cuprous oxide, 23.2 g of boric acid, 79.3 g of glucose and 48.5 g of ammonium acetate were added to 79.3 g of pure water and heated to 50 ° C. Next, 3.8 g of 2-propanol as an antifoaming agent was further added and the temperature was raised to 60 ° C. Next, after further adding 100.6 g of an aqueous sodium hydroxide solution having a sodium hydroxide concentration of 50% by mass, the mixture was stirred at a temperature range of 75 ⁇ 5 ° C. for 1 hour to carry out a reduction reaction. The copper powder produced by the reduction reaction was washed with pure water, surface-treated with stearic acid, and then dried. When the obtained copper powder was observed with an FE-SEM, it had a flat shape.
- Example 6 Cuprous oxide 50.0 g, boric acid 25.7 g and fructose 88.1 g were added to pure water 88.1 g and heated to 50 ° C. Next, 37.4 g of ammonia water having an ammonia concentration of 28% by mass and 4.2 g of 2-propanol as an antifoaming agent were further added, and the temperature was raised to 60 ° C. Next, 83.8 g of an aqueous sodium hydroxide solution having a sodium hydroxide concentration of 50% by mass was further added, followed by stirring for 1 hour at a temperature range of 75 ⁇ 5 ° C. to carry out a reduction reaction. The copper powder produced by the reduction reaction was washed with pure water, surface-treated with stearic acid, and then dried. When the obtained copper powder was observed with an FE-SEM, it had a flat shape.
- Example 7 42.0 g of cuprous oxide, 21.6 g of boric acid and 74.0 g of galactose were added to 74.0 g of pure water and heated to 50 ° C. Next, 31.5 g of ammonia water having an ammonia concentration of 28% by mass and 3.5 g of 2-propanol as an antifoaming agent were further added, and the temperature was raised to 60 ° C. Next, after further adding 70.4 g of an aqueous sodium hydroxide solution having a sodium hydroxide concentration of 50% by mass, the mixture was stirred for 1 hour in a temperature range of 75 ⁇ 5 ° C. to perform a reduction reaction. The copper powder produced by the reduction reaction was washed with pure water, surface-treated with stearic acid, and then dried. When the obtained copper powder was observed with an FE-SEM, it had a flat shape.
- Example 8 42.0 g of cuprous oxide, 21.6 g of boric acid and 74.0 g of mannose were added to 74.0 g of pure water and heated to 50 ° C. Next, 31.5 g of ammonia water having an ammonia concentration of 28% by mass and 3.5 g of 2-propanol as an antifoaming agent were further added, and the temperature was raised to 60 ° C. Next, after further adding 70.4 g of an aqueous sodium hydroxide solution having a sodium hydroxide concentration of 50% by mass, the mixture was stirred for 1 hour in a temperature range of 75 ⁇ 5 ° C. to perform a reduction reaction. The copper powder produced by the reduction reaction was washed with pure water, surface-treated with stearic acid, and then dried. When the obtained copper powder was observed with an FE-SEM, it had a flat shape.
- the copper powders of Examples 1 to 8 have an average particle diameter D 50 in the range of 0.5 ⁇ m to 10 ⁇ m, and have a low volume resistivity when used in a copper paste. An adhesive coating film could be formed.
- the copper powder of Comparative Example 1 had an average particle diameter D 50 in the range of 0.5 ⁇ m to 10 ⁇ m, a conductive coating film having a large volume resistivity was formed when used in a copper paste. It was.
- a method for producing copper powder capable of forming a conductive portion having a low volume resistivity even when the average particle diameter D 50 is 0.5 ⁇ m to 10 ⁇ m. Can do.
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Abstract
Description
例えば、特許文献1には、還元剤を用いて液中の水酸化銅を金属銅粒子に還元する際に、還元剤としてヒドラジン又はヒドラジン化合物を使用すると共に、その還元反応を消泡剤の存在下で行い、還元反応の前、後又は途中に表面処理剤を添加することにより、短径と長径とがいずれも100nm未満の銅粉を得る方法が開示されている。
また、特許文献2には、銅イオン含有水溶液とアルカリ溶液とを反応させた水酸化銅スラリーに還元剤を添加して第1還元処理を行って亜酸化銅スラリーとし、当該亜酸化銅スラリーを静置して亜酸化銅粒子を沈殿させ、上澄液を除去して水を添加することによって亜酸化銅粒子を洗浄して洗浄亜酸化銅スラリーとし、当該洗浄亜酸化銅スラリーに還元剤を添加して第2還元処理を行って銅粉を得る銅粉の製造方法において、第1還元処理は、水酸化銅スラリーに、還元剤であるヒドラジン類とpH調整剤であるアンモニア水溶液とを併用して添加することにより、微粒で均一な粒子の銅粉を得る方法が開示されている。
本発明は、上記のような問題を解決するためになされたものであり、平均粒子径D50が0.5μm~10μmであっても、体積抵抗率が低い導電部を形成可能な銅粉の製造方法を提供することを目的とする。
すなわち、本発明は、(A)亜酸化銅、(B)ホウ酸及びその塩からなる群から選ばれる少なくとも1種、(C)アンモニア及びアンモニウムイオン供給源からなる群から選ばれる少なくとも1種、並びに(D)単糖類、二糖類及び多糖類からなる群から選ばれる少なくとも1種を原料として用いることを特徴とする銅粉の製造方法である。
(A)成分は亜酸化銅である。なお、亜酸化銅は酸化銅(I)と同義である。(A)成分としては、市販の亜酸化銅を使用してもよいし、硫酸銅などの無機酸の銅塩を還元することによって製造した亜酸化銅を使用してもよい。
還元剤としては、ヒドラジン、ヒドラジン化合物が挙げられる。
溶媒としては、特に限定されないが、純水などの水が最適である。
各原料を溶媒に配合する際、溶媒の温度を10℃~90℃に制御することが好ましく、40℃~70℃に制御することがより好ましい。溶媒の温度を上記の範囲内とすることにより、銅粉の生産性を向上させることができる。溶媒の温度が10℃未満であると、各原料が溶媒に溶解し難くなることがある。
還元反応は、各原料を配合した溶媒を50℃~90℃の温度で加熱保持することによって進行する。加熱保持時間は、特に限定されないが、一般に5分~120分である。
また、還元反応の際、必要に応じてマイクロウェーブ処理などを行ってもよい。
亜酸化銅42.0g、ホウ酸21.6g及びグルコース74.0gを純水74.0gに加えて50℃に加温した。次に、アンモニア濃度が28質量%のアンモニア水31.45g、及び消泡剤としての2-プロパノール3.52gを更に加えて60℃に昇温した。次に、水酸化ナトリウム濃度が50質量%の水酸化ナトリウム水溶液70.4gを更に加えた後、75±5℃の温度範囲で1時間撹拌して還元反応を行った。還元反応によって生成した銅粉は純水で洗浄し、ステアリン酸で表面処理を行った後に乾燥させた。得られた銅粉をFE-SEMで観察したところ、扁平形状を有していた。
亜酸化銅34.0g、ホウ酸17.5g、グルコース59.9g及び塩化アンモニウム25.42gを純水59.9gに加えて50℃に加温した。次に、消泡剤としての2-プロパノール2.9gを更に加えて60℃に昇温した。次に、水酸化ナトリウム濃度が50質量%の水酸化ナトリウム水溶液114.0gを更に加えた後、75±5℃の温度範囲で1時間撹拌して還元反応を行った。還元反応によって生成した銅粉は純水で洗浄し、ステアリン酸で表面処理を行った後に乾燥させた。得られた銅粉をFE-SEMで観察したところ、扁平形状を有していた。
亜酸化銅40.0g、ホウ酸20.6g、グルコース70.5g及び臭化アンモニウム53.1gを純水70.5gに加えて50℃に加温した。次に、消泡剤としての2-プロパノール3.4gを更に加えて60℃に昇温した。次に、水酸化ナトリウム濃度が50質量%の水酸化ナトリウム水溶液134.2gを更に加えた後、75±5℃の温度範囲で1時間撹拌して還元反応を行った。還元反応によって生成した銅粉は純水で洗浄し、ステアリン酸で表面処理を行った後に乾燥させた。得られた銅粉をFE-SEMで観察したところ、扁平形状を有していた。
亜酸化銅45.0g、ホウ酸23.2g、グルコース79.3g及びギ酸アンモニウム39.7gを純水79.3gに加えて50℃に加温した。次に、消泡剤としての2-プロパノール3.8gを更に加えて60℃に昇温した。次に、水酸化ナトリウム濃度が50質量%の水酸化ナトリウム水溶液100.6gを更に加えた後、75±5℃の温度範囲で1時間撹拌して還元反応を行った。還元反応によって生成した銅粉は純水で洗浄し、ステアリン酸で表面処理を行った後に乾燥させた。得られた銅粉をFE-SEMで観察したところ、扁平形状を有していた。
亜酸化銅45.0g、ホウ酸23.2g、グルコース79.3g及び酢酸アンモニウム48.5gを純水79.3gに加えて50℃に加温した。次に、消泡剤としての2-プロパノール3.8gを更に加えて60℃に昇温した。次に、水酸化ナトリウム濃度が50質量%の水酸化ナトリウム水溶液100.6gを更に加えた後、75±5℃の温度範囲で1時間撹拌して還元反応を行った。還元反応によって生成した銅粉は純水で洗浄し、ステアリン酸で表面処理を行った後に乾燥させた。得られた銅粉をFE-SEMで観察したところ、扁平形状を有していた。
亜酸化銅50.0g、ホウ酸25.7g及びフルクトース88.1gを純水88.1gに加えて50℃に加温した。次に、アンモニア濃度が28質量%のアンモニア水37.4g、及び消泡剤としての2-プロパノール4.2gを更に加えて60℃に昇温した。次に、水酸化ナトリウム濃度が50質量%の水酸化ナトリウム水溶液83.8gを更に加えた後、75±5℃の温度範囲で1時間撹拌して還元反応を行った。還元反応によって生成した銅粉は純水で洗浄し、ステアリン酸で表面処理を行った後に乾燥させた。得られた銅粉をFE-SEMで観察したところ、扁平形状を有していた。
亜酸化銅42.0g、ホウ酸21.6g及びガラクトース74.0gを純水74.0gに加えて50℃に加温した。次に、アンモニア濃度が28質量%のアンモニア水31.5g、及び消泡剤としての2-プロパノール3.5gを更に加えて60℃に昇温した。次に、水酸化ナトリウム濃度が50質量%の水酸化ナトリウム水溶液70.4gを更に加えた後、75±5℃の温度範囲で1時間撹拌して還元反応を行った。還元反応によって生成した銅粉は純水で洗浄し、ステアリン酸で表面処理を行った後に乾燥させた。得られた銅粉をFE-SEMで観察したところ、扁平形状を有していた。
亜酸化銅42.0g、ホウ酸21.6g及びマンノース74.0gを純水74.0gに加えて50℃に加温した。次に、アンモニア濃度が28質量%のアンモニア水31.5g、及び消泡剤としての2-プロパノール3.5gを更に加えて60℃に昇温した。次に、水酸化ナトリウム濃度が50質量%の水酸化ナトリウム水溶液70.4gを更に加えた後、75±5℃の温度範囲で1時間撹拌して還元反応を行った。還元反応によって生成した銅粉は純水で洗浄し、ステアリン酸で表面処理を行った後に乾燥させた。得られた銅粉をFE-SEMで観察したところ、扁平形状を有していた。
硫酸銅五水和物(銅原料)200gを純水100gに加えて50℃に加温した。次に、アンモニア濃度が28質量%のアンモニア水(錯化剤)77.3g、水酸化ナトリウム濃度が50質量%の水酸化ナトリウム水溶液(pH調整剤)96.2g、2-プロパノール(消泡剤)9.6gを更に加えて70℃に昇温した。次に、グルコース57.7gを純水57.7gに溶解させたものを更に加えた後、ヒドラジン一水和物40.6gを更に加えた。このようにして得られた銅粉は純水で洗浄し、ステアリン酸で表面処理を行った後に乾燥させた。得られた銅粉をFE-SEMで観察したところ、球状を有していた。
(1)平均粒子径D50の測定
レーザー回折散乱式粒度分布測定装置(日機装株式会社製Micro Trac MT-3000II型)を用いて測定した。
銅粉とアクリル樹脂(三菱レイヨン製BR-113)とを4:1の質量比(銅粉の含有量80質量%)で配合し、溶媒としてトルエンをさらに加えて混練することによって銅ペーストを得た。得られた銅ペーストをPETフィルム上にウェット膜厚が10μmになるようにして塗布した後、大気中にて150℃で30分間加熱焼成を行うことにより、導電性塗膜を得た。得られた導電性塗膜の体積抵抗率を4端子法によって測定装置(三菱化学アナリテック社製ロレスタGP)で測定した。
上記の各評価結果を表1に示す。
これに対して比較例1の銅粉は、平均粒子径D50が0.5μm~10μmの範囲内であったものの、銅ペーストに用いた際に体積抵抗率が大きい導電性塗膜が形成された。
Claims (6)
- (A)亜酸化銅、(B)ホウ酸及びその塩からなる群から選ばれる少なくとも1種、(C)アンモニア及びアンモニウムイオン供給源からなる群から選ばれる少なくとも1種、並びに(D)単糖類、二糖類及び多糖類からなる群から選ばれる少なくとも1種を原料として用いることを特徴とする銅粉の製造方法。
- 前記(C)成分が、アンモニア、塩化アンモニウム、臭化アンモニウム、ギ酸アンモニウム及び酢酸アンモニウムからなる群から選ばれる少なくとも1種であることを特徴とする請求項1に記載の銅粉の製造方法。
- 前記(D)成分が、グルコース、フルクトース、ガラクトース、マンノース及びアラビノガラクタンからなる群から選ばれる少なくとも1種であることを特徴とする請求項1又は2に記載の銅粉の製造方法。
- 前記(B)成分が、ホウ酸であることを特徴とする請求項1~3のいずれか一項に記載の銅粉の製造方法。
- 前記銅粉の平均粒子径D50が0.5μm~10μmであることを特徴とする請求項1~4のいずれか一項に記載の銅粉の製造方法。
- 前記(A)成分1モルに対して、前記(B)成分を0.05モル~2.0モル、前記(C)成分を0.05モル~5.0モル、前記(D)成分を0.05モル~5.0モル用いることを特徴とする請求項1~5のいずれか一項に記載の銅粉の製造方法。
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CN201780044098.2A CN109475942B (zh) | 2016-08-03 | 2017-07-05 | 铜粉的制造方法 |
EP17836669.6A EP3495079A4 (en) | 2016-08-03 | 2017-07-05 | COPPER POWDER PRODUCTION PROCESS |
KR1020197003890A KR102282809B1 (ko) | 2016-08-03 | 2017-07-05 | 구리 분말의 제조 방법 |
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006022394A (ja) * | 2004-07-09 | 2006-01-26 | Harima Chem Inc | 金属銅微粒子の製造方法 |
JP2008050661A (ja) * | 2006-08-25 | 2008-03-06 | Shoei Chem Ind Co | 銅粉末の製造方法 |
JP2008050650A (ja) * | 2006-08-24 | 2008-03-06 | Shoei Chem Ind Co | 銅粉末の製造方法 |
JP2008069457A (ja) * | 2007-10-09 | 2008-03-27 | Mitsui Mining & Smelting Co Ltd | ドロップ状銅粉、ドロップ状銅粉の製造方法および導電性ペースト |
WO2014104032A1 (ja) * | 2012-12-25 | 2014-07-03 | 戸田工業株式会社 | 銅粉末の製造方法及び銅粉末、銅ペースト |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3237432B2 (ja) * | 1995-01-23 | 2001-12-10 | 株式会社村田製作所 | 導電性ペースト |
KR100743844B1 (ko) * | 1999-12-01 | 2007-08-02 | 도와 마이닝 가부시끼가이샤 | 구리 분말 및 구리 분말의 제조 방법 |
US20050182161A1 (en) * | 2000-12-15 | 2005-08-18 | Rajesh Khattar | Irregular shaped copper particles and methods of use |
JP4204849B2 (ja) | 2002-11-12 | 2009-01-07 | Dowaエレクトロニクス株式会社 | 微粒子銅粉の製法 |
JP4490305B2 (ja) * | 2005-02-18 | 2010-06-23 | Dowaホールディングス株式会社 | 銅粉 |
CA2604726C (en) * | 2005-04-20 | 2012-01-24 | Phibro-Tech, Inc. | Production of fine particle copper powders |
JP5144022B2 (ja) | 2006-03-24 | 2013-02-13 | 三井金属鉱業株式会社 | 銅粉の製造方法及びその製造方法で得られた銅粉 |
JP5439057B2 (ja) * | 2009-06-29 | 2014-03-12 | 三井金属鉱業株式会社 | 複合銅粒子 |
JP5820202B2 (ja) * | 2010-09-30 | 2015-11-24 | Dowaエレクトロニクス株式会社 | 導電性ペースト用銅粉およびその製造方法 |
JP5926644B2 (ja) * | 2011-09-30 | 2016-05-25 | Dowaエレクトロニクス株式会社 | 亜酸化銅粉末およびその製造方法 |
WO2014080662A1 (ja) * | 2012-11-26 | 2014-05-30 | 三井金属鉱業株式会社 | 銅粉及びその製造方法 |
-
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Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006022394A (ja) * | 2004-07-09 | 2006-01-26 | Harima Chem Inc | 金属銅微粒子の製造方法 |
JP2008050650A (ja) * | 2006-08-24 | 2008-03-06 | Shoei Chem Ind Co | 銅粉末の製造方法 |
JP2008050661A (ja) * | 2006-08-25 | 2008-03-06 | Shoei Chem Ind Co | 銅粉末の製造方法 |
JP2008069457A (ja) * | 2007-10-09 | 2008-03-27 | Mitsui Mining & Smelting Co Ltd | ドロップ状銅粉、ドロップ状銅粉の製造方法および導電性ペースト |
WO2014104032A1 (ja) * | 2012-12-25 | 2014-07-03 | 戸田工業株式会社 | 銅粉末の製造方法及び銅粉末、銅ペースト |
Non-Patent Citations (1)
Title |
---|
See also references of EP3495079A4 * |
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EP3495079A4 (en) | 2020-01-22 |
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JPWO2018025562A1 (ja) | 2019-05-30 |
CN109475942A (zh) | 2019-03-15 |
TW201809295A (zh) | 2018-03-16 |
US20190168308A1 (en) | 2019-06-06 |
EP3495079A1 (en) | 2019-06-12 |
JP6868627B2 (ja) | 2021-05-12 |
KR20190037256A (ko) | 2019-04-05 |
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