WO2018023838A1 - 一种避免光掩模长雾状颗粒的新型保护膜 - Google Patents

一种避免光掩模长雾状颗粒的新型保护膜 Download PDF

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Publication number
WO2018023838A1
WO2018023838A1 PCT/CN2016/095948 CN2016095948W WO2018023838A1 WO 2018023838 A1 WO2018023838 A1 WO 2018023838A1 CN 2016095948 W CN2016095948 W CN 2016095948W WO 2018023838 A1 WO2018023838 A1 WO 2018023838A1
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Prior art keywords
frame
photomask
protective film
air
air inlet
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PCT/CN2016/095948
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English (en)
French (fr)
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徐飞
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常州瑞择微电子科技有限公司
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Publication of WO2018023838A1 publication Critical patent/WO2018023838A1/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting

Definitions

  • the utility model relates to the technical field of structural design of a protective film for a photomask, and more particularly to a novel protective film for avoiding long misty particles of a photomask.
  • Haze is a major factor in the decline in the yield of lithography in the semiconductor field. Especially after entering the 193nm lithography node, Haze becomes more and more serious.
  • the cause of Haze is mainly due to the deep ultraviolet light photons used in the photolithography process to excite the chemical components in the photomask and the protective film to form various volatile small molecular substances, which in turn will be in the photomask and protection.
  • the inner surface of the space formed by the film is aggregated to form particles, and such Haze on the surface of the photomask pattern causes a decrease in the yield of the photolithography process and directly causes an increase in production cost.
  • the above-mentioned small molecules which are volatilized may be generated from a photomask or may be generated from a protective film.
  • those skilled in the art have been striving to reduce the production of these small molecular substances by the following methods: First, the cleaning process of the photomask is improved to minimize the residual material after cleaning; second, the material or production process used for the protective film is improved; and third, the leakage of volatile small molecular substances by the protective film is reduced.
  • the photomask cleaning process and the protective film production process have been greatly improved, but due to various relative limitations, Haze will still produce and seriously affect the lithography process yield.
  • the development of a novel protective film that avoids long haze-like particles of a photomask is a technical problem to be solved by those skilled in the art.
  • the technical problem to be solved by the present invention is that in order to overcome the technical problems mentioned in the above background art, a novel protective film for avoiding long misty particles of a photomask is provided.
  • the technical solution adopted by the utility model to solve the technical problem thereof is: a novel protective film for avoiding long mist-like particles of a photomask, the protective film comprising: a frame, a protective film connected to the end of the frame, and the frame is arranged There is a gas passage.
  • the gas passage includes: an air inlet and an air outlet, and a particulate filter membrane is disposed in the air inlet and the air outlet.
  • the air inlet and the air outlet are respectively disposed on different sides or the same side of the frame.
  • the number of the air inlets is one, two or more, and the number of the air outlets is one, two or more; the diameter of the air inlet is a uniform size. Or for the size of the uniform, the diameter of the air outlet is uniform or not uniform.
  • the frame is a frame made of a metal material; the upper and lower ends of the frame are respectively bonded to the protective film and the photomask by an adhesive.
  • the gas passage is an air outlet.
  • the protective film of the present invention is designed to make a gas passage on the metal frame of the protective film, so that a clean gas such as nitrogen, helium or argon can be applied to the photomask and the protective film. Purging the enclosed space so that small molecules excited by deep ultraviolet photons in the space are swept out of the space by these gases; Prepare (vacuum pump, etc.) to suck out small molecules from the gas channel, so as to avoid the accumulation of these small molecules on the surface of the photomask to form Haze, which can effectively improve the service life of the photomask, reasonable structure design, convenient and practical, suitable for further Promote the application.
  • a clean gas such as nitrogen, helium or argon
  • Embodiment 1 is a schematic structural view of Embodiment 1;
  • Figure 2 is a schematic structural view of the frame 2 of the second embodiment
  • Figure 3 is a schematic structural view of the frame 2 of the third embodiment
  • Figure 4 is a schematic structural view of the frame 2 of the fourth embodiment
  • Figure 5 is a schematic structural view of the frame 2 of the fifth embodiment
  • Figure 6 is a schematic structural view of the frame 2 of the sixth embodiment
  • a novel protective film for preventing long haze-like particles of a photomask as shown in FIG. 1, comprising: a frame 2 attached to the photomask 1, and a protective film attached to the end of the frame 2
  • the membrane 3 is provided with a gas passage including an air inlet 21 and an air outlet 22, and the frame 2 is a quadrilateral frame made of a metal material.
  • the upper and lower ends of the frame 2 are adhered to the protective film 3 and the photomask 1 respectively. Bonding;
  • the air inlet 21 and the air outlet 22 are symmetrically disposed on two sides of the frame 2, respectively, and the number of the air inlet 21 and the air outlet 22 are one, and the air inlet 21 and the air outlet 22 have the same diameter, and the air inlet 21 is on the air inlet 21
  • An air inlet duct interface is connected, and an air outlet duct interface is connected to the air outlet port 22.
  • the air inlet port 21 and the air outlet port 22 are provided with a particle filter membrane 4 to ensure that small particles such as nanometer-scale dust do not enter the protective film 3 and light.
  • the inlet 21 is a single one that does not absorb deep ultraviolet light (wavelength greater than 190 nm).
  • the components are inert high-purity nitrogen, and the air inlet pipe and the air outlet pipe interface are provided with a barometer 5 and a flow meter 6.
  • a novel protective film for avoiding long misty particles of a photomask comprising: a frame 2 attached to the photomask, a protective film 3 connected to an end of the frame 2, and the frame 2 is provided with an air inlet 21 and the gas passage of the air outlet 22, the frame 2 is a quadrilateral frame made of a metal material, and the upper and lower ends of the frame 2 are respectively bonded to the protective film 3 and the photomask 1 by an adhesive; as shown in FIG.
  • the air inlet 21 and the air outlet 22 are disposed on the same side of the frame 2, the number of the air inlets 21 is one, the number of the air outlets 22 is two, and the air inlets 21 are disposed at the air outlets 22.
  • the diameter of the air inlet 21 is the sum of the diameters of the air outlets 22, and the two air outlets 22 are equal in height and the same diameter, the air inlet The height setting of the 21 is higher than that of the air outlet 22, and the air inlet port is connected to the air inlet port.
  • the air outlet port 22 is connected with an air outlet pipe.
  • the air inlet 21 and the air outlet 22 are provided with a particle filter membrane 4, and the air inlet port is provided.
  • Intake is a mixture of two-component inert argon gas and high-purity nitrogen gas which do not absorb deep ultraviolet light (wavelength greater than 190 nm) in a volume ratio of 1:1, and the air inlet pipe interface and the air outlet pipe interface are provided with a barometer 5 and Flow meter 6.
  • a novel protective film for avoiding long haze-like particles of a photomask comprising: a frame 2 attached to the photomask 1, a protective film 3 connected to an end of the frame 2, and a frame 2 provided with an air intake
  • the gas passage of the mouth 21 and the air outlet 22, the frame 2 is a rectangular frame made of a metal material, and the upper and lower ends of the frame 2 are respectively bonded to the protective film 3 and the photomask 1 by an adhesive; as shown in FIG.
  • the top view of the frame 2 includes the front side, the left side, the rear side and the right side.
  • the two air inlets 21 are respectively disposed at the front center of the frame 2, the center of the left side, and two air outlets 22 They are respectively disposed at the center of the rear side of the frame 2 and the center of the right side.
  • the diameters of the two air inlets 21 are the same, the diameters of the two air outlets 22 are the same, and the diameter of the single air outlet 22 is 1.2 times the diameter of the single air inlet 21;
  • the air inlet 21 is connected with
  • the air inlet pipe interface is connected with an air outlet pipe interface, and the air inlet port 21 and the air outlet port 22 are respectively provided with a particle filter membrane 4, and the air inlet port 21 is a double air that does not absorb deep ultraviolet light (wavelength greater than 190 nm).
  • a mixture of inert argon and helium at a volume ratio of 1:1, the intake pipe Interface port and the outlet tube 5 is provided with a pressure gauge and a flow meter 6.
  • a novel protective film for avoiding long haze particles of a photomask comprising: a frame 2 attached to the photomask 1 and a protective film 3 connected to the end of the frame 2.
  • the frame 2 is provided with a gas passage including an air inlet 21 and an air outlet 22, and the frame 2 is a regular quadrilateral made of a metal material.
  • the frame body, the upper and lower ends of the frame 2 are respectively bonded to the protective film 3 and the photomask 1 by an adhesive; as shown in FIG. 4, the frame 2 includes the front side, the left side, the rear side and the right side.
  • the number of the air inlets 21 is one, the number of the air outlets 22 is three, the air inlets 21 are disposed at the center of the front side of the frame 2, and the three air outlets 22 are respectively disposed at the center of the left side of the frame 2, the center of the rear side, and the right side.
  • the diameter of the air inlet 21 is 1.5 times the diameter of the air outlet, and the three air outlets 22 have the same diameter;
  • the air inlet port 21 is connected with an air inlet pipe interface, and the air outlet port 22 is connected with an air outlet pipe port, the air inlet port 21 and the air outlet port 21
  • the gas ports 22 are each provided with a particle filter membrane 4, and the gas inlet port 21 is a mixture of two-component inert nitrogen gas and a helium gas volume ratio of 1:1.2 which do not absorb deep ultraviolet light (wavelength greater than 190 nm), and the inlet pipe interface
  • the air pressure meter 5 and the flow meter 6 are provided with the air outlet pipe interface.
  • a novel protective film for avoiding long haze-like particles of a photomask comprising: a frame 2 attached to the photomask 1 and connected to the end of the frame 2
  • the protective film 3 is provided with a gas passage on the frame 2, the gas passage is an air outlet 22 and a vacuum pump assembly 7 disposed on the outlet of the outlet duct;
  • the frame 2 is a regular quadrilateral frame made of a metal material, and the upper and lower ends of the frame 2
  • the protective film 3 and the photomask 1 are bonded to each other by an adhesive.
  • a novel protective film for avoiding long haze particles of a photomask comprising: a frame 2 attached to the photomask 1 and a protective film 3 connected to the end of the frame 2.
  • the frame 2 is provided with a gas passage including an air inlet 21 and an air outlet 22, and the frame 2 is a regular quadrilateral made of a metal material.
  • the frame body, the upper and lower ends of the frame 2 are respectively bonded to the protective film 3 and the photomask 1 by an adhesive; as shown in FIG.
  • the frame 2 includes a front side, a left side, a rear side, and On the right side, the number of the air inlets 21 is one, the number of the air outlets 22 is three, the air inlets 21 are disposed at the center of the front side of the frame 2, and the three air outlets 22 are respectively disposed at the center of the left side of the frame 2, the center of the rear side, and In the right center, the diameter of the air inlet 21 is 1.5 times the diameter of the air outlet 22, and the three air outlets 22 have the same diameter; the air inlet port 21 is connected with an air inlet pipe interface, and the air outlet port 22 is connected with an air outlet pipe interface, and the air inlet port 21 and the gas outlet 22 are each provided with a particulate filter membrane 4, and the inlet 21 is a mixture of two components of inert nitrogen and helium at a volume ratio of 1:1.2, which does not absorb deep ultraviolet light (wavelength greater than 190 nm).
  • the air pipe interface is provided with a barometer 5, a gas flow meter 6, a
  • the technical solutions of the above six embodiments grasp the key conditions for the formation of Haze, that is, the formation of Haze requires a small concentration of small molecules to be concentrated on the surface of the photomask, thereby reducing the concentration of small molecules in the space, thereby avoiding the generation of Haze.
  • the continuous purging of the clean gas can continuously purge the small molecular substances generated in the photolithography process out of the space or extract the small molecular substances out of the space through the vacuum component, so that the small molecule concentration in the space is always lower than the Haze generation.
  • the concentration thus avoids the production of Haze.
  • this method can avoid the generation of Haze and reduce the production due to the decrease in the yield of the photolithography process.
  • the increase can also reduce the photomask cleaning process requirements and the protective film production process requirements, thereby reducing the manufacturing cost of the photomask, which is convenient and practical, and is suitable for further application.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

一种避免光掩模长雾状颗粒的新型保护膜，包括：连接在光掩模（1）上的框架（2）、与框架（2）端部连接的保护薄膜（3），框架（2）上设置有气体通道。保护膜的设计是在保护膜的金属框架上制作气体通道，让洁净的气体对光掩模和保护膜所围成的空间进行吹扫，使得该空间中的被深紫外光子激发的小分子物质被这些气体吹扫出该空间，或通过辅助设备(真空泵等)将小分子物质从气体通道中抽吸出去，从而避免这些小分子物质在光掩模表面集聚形成Haze，可有效提高光掩模使用寿命，结构设计合理，方便实用。

Description

一种避免光掩模长雾状颗粒的新型保护膜 技术领域
本实用新型涉及光掩模用保护膜的结构设计技术领域，更具体地说，涉及一种避免光掩模长雾状颗粒的新型保护膜。
背景技术
雾状颗粒(Haze)是造成半导体领域光刻工艺成品率下降的一个主要因素，特别是进入193nm光刻技术节点后，Haze越发严重。Haze的成因主要是由于光刻工艺中所用的深紫外光的光子会激发光掩模和保护膜中的化学成分形成各种挥发性小分子物质，这些小分子物质继而会在光掩模和保护膜形成的空间内表面集聚形成颗粒，这种在光掩模图形表面的Haze会造成光刻工艺成品率下降，并直接造成生产成本的增加。上述挥发出的小分子可能是从光掩模中产生，也可能从保护膜中产生，近年来，本领域技术人员一直在努力降低这些小分子物质的产生，采用的方法有以下几种：第一，提升光掩模的清洗工艺使得清洗后的残留物质最少化；第二，改进保护膜所用的材料或生产工艺；第三，减少保护膜泄漏挥发性小分子物质。通过上述方法的实施并逐步改进，光掩模的清洗工艺以及保护膜的生产工艺得到了较大的提升，但由于各种相对限制的原因，Haze还是会产生并严重影响光刻工艺成品率。针对这一问题，开发一种避免光掩模长雾状颗粒的新型保护膜是本领域技术人员亟待解决的技术问题。
实用新型内容
本实用新型所要解决的技术问题是：为克服上述背景技术中提到的技术问题，现提供一种避免光掩模长雾状颗粒的新型保护膜。
本实用新型解决其技术问题所采用的技术方案是：一种避免光掩模长雾状颗粒的新型保护膜，该保护膜包括：框架、与框架端部连接的保护薄膜，所述框架上设置有气体通道。
进一步，本实用新型的技术方案中所述气体通道包括：进气口和出气口，进气口和出气口内均设置有颗粒过滤膜。
进一步优选，本实用新型的上述技术方案中所述进气口和出气口分别设置在框架不同侧或同侧。
进一步优选，本实用新型的上述技术方案中所述进气口的数量为一个、两个或多个，出气口的数量为一个、两个或多个；所述进气口的口径为统一大小或为不统一大小，出气口的口径为统一大小或为不统一大小。
进一步，本实用新型的技术方案中所述框架为金属材料制成的架体；框架的上下端分别和保护薄膜、光掩模通过粘结剂粘接。
进一步，本实用新型的技术方案中所述气体通道为出气口。
有益效果：与现有技术相比，本实用新型的保护膜的设计是在保护膜的金属框架上制作气体通道，让氮气、氦气、氩气等洁净的气体可以对光掩模和保护膜所围成的空间进行吹扫，使得该空间中的被深紫外光子激发的小分子物质被这些气体吹扫出该空间；或通过辅助设 备(真空泵等)将小分子物质从气体通道中抽吸出去，从而避免这些小分子物质在光掩模表面集聚形成Haze，可有效提高光掩模使用寿命，结构设计合理，方便实用，适宜进一步推广应用。
附图说明
下面将对实施例描述中所需要使用的附图做简单地介绍。
图1是实施例一的结构示意图；
图2是实施例二的框架2结构示意图；
图3是实施例三的框架2结构示意图；
图4是实施例四的框架2结构示意图；
图5是实施例五的框架2结构示意图；
图6是实施例六的框架2结构示意图；
图中，1.光掩模，2.框架，21.进气口，22.出气口，3.保护薄膜，4.颗粒过滤膜，5.气压表，6.流量计，7.真空泵组件，8.温度控制器，9.超细过滤膜。
具体实施方式
下面结合实施例对本实用新型进一步说明，下面实施例所表示的构成的全部内容不限于作为权利要求所记载的实用新型的解决方案所必须的。
实施例一
如附图1所示的一种避免光掩模长雾状颗粒的新型保护膜，该保护膜包括：连接在光掩模1上的框架2、与框架2端部连接的保护薄 膜3，框架2上设置有包括进气口21和出气口22的气体通道，框架2为金属材料制成的四边形架体，框架2的上下端分别和保护薄膜3、光掩模1通过粘结剂粘接；
所述进气口21和出气口22分别对称设置在框架2两侧，进气口21和出气口22的数量均为一个，进气口21口径和出气口22口径相同，进气口21上连接有进气管道接口，出气口22上连接有出气管道接口，进气口21和出气口22均设置有颗粒过滤膜4，用以保证外界纳米级灰尘等小颗粒不会进入保护薄膜3和光掩模1之间，及保护薄膜3和光掩模1之间的二氧化碳、二氧化硫等较小尺寸级分子的吹滤出；进气口21进气为不吸收深紫外光(波长大于190nm)的单组份惰性高纯氮气，进气管道接口和出气管道接口均设置有气压表5和流量计6。
实施例二
一种避免光掩模长雾状颗粒的新型保护膜，该保护膜包括：连接在光掩模上的框架2、与框架2端部连接的保护薄膜3，框架2上设置有包括进气口21和出气口22的气体通道，框架2为金属材料制成的四边形架体，框架2的上下端分别和保护薄膜3、光掩模1通过粘结剂粘接；如附图2所示的框架2结构中，所述进气口21和出气口22设置在框架2同侧，进气口21的数量为一个，出气口22的数量为两个，进气口21设置在出气口22的中心位置，进气口21口径是出气口22口径之和，两出气口22等高且口径相同，进气口 21高度设置比出气口22高，进气口21上连接有进气管道接口，出气口22上连接有出气管道接口，进气口21和出气口22均设置有颗粒过滤膜4，进气口21进气为不吸收深紫外光(波长大于190nm)的双组份惰性氩气和高纯氮气按体积比1:1形成的混合物，进气管道接口和出气管道接口均设置有气压表5和流量计6。
实施例三
一种避免光掩模长雾状颗粒的新型保护膜，该保护膜包括：连接在光掩模1上的框架2、与框架2端部连接的保护薄膜3，框架2上设置有包括进气口21和出气口22的气体通道，框架2为金属材料制成的长方形架体，框架2的上下端分别和保护薄膜3、光掩模1通过粘结剂粘接；如附图3所示的框架2俯视图，所述框架2包括依次连接的：前侧、左侧、后侧和右侧，两个进气口21分别设置在框架2前侧中心、左侧中心，两个出气口22分别设置在框架2后侧中心和右侧中心，两进气口21口径相同，两出气口22口径相同，单个出气口22口径是单个进气口21口径1.2倍；进气口21上连接有进气管道接口，出气口22上连接有出气管道接口，进气口21和出气口22均设置有颗粒过滤膜4，进气口21进气为不吸收深紫外光(波长大于190nm)的双组份惰性氩气和氦气按体积比1:1形成的混合物，进气管道接口和出气管道接口均设置有气压表5和流量计6。
实施例四
一种避免光掩模长雾状颗粒的新型保护膜，该保护膜包括：连 接在光掩模1上的框架2、与框架2端部连接的保护薄膜3，框架2上设置有包括进气口21和出气口22的气体通道，框架2为金属材料制成的正四边形架体，框架2的上下端分别和保护薄膜3、光掩模1通过粘结剂粘接；如附图4所示，框架2包括依次连接的：前侧、左侧、后侧和右侧，进气口21数量为一个，出气口22数量为三个，进气口21设置在框架2前侧中心中心，三个出气口22分别设置在框架2左侧中心、后侧中心和右侧中心，进气口21口径是出气口口径1.5倍，三个出气口22口径相同；进气口21上连接有进气管道接口，出气口22上连接有出气管道接口，进气口21和出气口22均设置有颗粒过滤膜4，进气口21进气为不吸收深紫外光(波长大于190nm)的双组份惰性氮气和氦气按体积比1:1.2形成的混合物，进气管道接口和出气管道接口均设置有气压表5和流量计6。
实施例五
参照附图5所示的框架2的俯视图，一种避免光掩模长雾状颗粒的新型保护膜，该保护膜包括：连接在光掩模1上的框架2、与框架2端部连接的保护薄膜3，框架2上设置有气体通道，所述气体通道为出气口22和设置在出气管道接口上的真空泵组件7；框架2为金属材料制成的正四边形架体，框架2的上下端分别和保护薄膜3、光掩模1通过粘结剂粘接。
实施例六
一种避免光掩模长雾状颗粒的新型保护膜，该保护膜包括：连 接在光掩模1上的框架2、与框架2端部连接的保护薄膜3，框架2上设置有包括进气口21和出气口22的气体通道，框架2为金属材料制成的正四边形架体，框架2的上下端分别和保护薄膜3、光掩模1通过粘结剂粘接；如附图6所示，所述框架2包括依次连接的：前侧、左侧、后侧和右侧，进气口21数量为一个，出气口22数量为三个，进气口21设置在框架2前侧中心中心，三个出气口22分别设置在框架2左侧中心、后侧中心和右侧中心，进气口21口径是出气口22口径1.5倍，三个出气口22口径相同；进气口21上连接有进气管道接口，出气口22上连接有出气管道接口，进气口21和出气口22均设置有颗粒过滤膜4，进气口21进气为不吸收深紫外光(波长大于190nm)的双组份惰性氮气和氦气按体积比1:1.2形成的混合物，进气管道接口上设置有气压表5、气体流量计6、温度控制器8和气体洁净度控制器超细过滤膜9，出气管道接口上设置有真空度控制器真空泵组件7。
上述六个实施例的技术方案抓住了Haze形成的关键条件，也就是Haze的形成需要有足够浓度的小分子集聚在光掩模表面，通过降低空间的小分子物质浓度，从而避免Haze的产生；利用洁净气体的连续吹扫可以不断将光刻过程中产生的小分子物质吹扫出该空间或通过真空组件将小分子物质抽出该空间，使得在该空间的小分子浓度一直低于Haze生成的浓度，从而避免Haze的产生。这种方法一方面可以避免Haze的产生，减少由于光刻工艺成品率下降造成的生产成 本增加，同时也可以降低光掩模清洗工艺要求和保护膜生产工艺要求从而降低光掩模的制造成本，方便实用，适宜进一步推广应用。
对所公开的实施例的上述说明，使本领域专业技术人员能够实现或使用本实用新型。对这些实施例的多种修改对本领域的专业技术人员来说将是显而易见的，本文中所定义的一般原理可以在不脱离本实用新型的精神或范围的情况下，在其它实施例中实现。因此，本实用新型将不会被限制于本文所示的这些实施例，而是要符合与本文所公开的原理和新颖特点相一致的最宽的范围。

Claims (6)

  1. 一种避免光掩模长雾状颗粒的新型保护膜，其特征是：该保护膜包括：连接在光掩模上的框架、与框架端部连接的保护薄膜，所述框架上设置有气体通道。
  2. 根据权利要求1所述的一种避免光掩模长雾状颗粒的新型保护膜，其特征是：所述气体通道包括：进气口和出气口，进气口和出气口内均设置有颗粒过滤膜。
  3. 根据权利要求1所述的一种避免光掩模长雾状颗粒的新型保护膜，其特征是：所述气体通道为出气口。
  4. 根据权利要求2所述的一种避免光掩模长雾状颗粒的新型保护膜，其特征是：所述进气口和出气口设置在框架不同侧或框架同侧。
  5. 根据权利要求4所述的一种避免光掩模长雾状颗粒的新型保护膜，其特征是：所述进气口的数量为一个、两个或多个，出气口的数量为一个、两个或多个。
  6. 根据权利要求4所述的一种避免光掩模长雾状颗粒的新型保护膜，其特征是：所述进气口的口径为统一大小或为不统一大小，出气口的口径为统一大小或为不统一大小。
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