CN206133184U - 一种用于极紫外光刻机的动态气体隔离装置 - Google Patents
一种用于极紫外光刻机的动态气体隔离装置 Download PDFInfo
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
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CN112255886A (zh) * | 2020-09-07 | 2021-01-22 | 中国科学院微电子研究所 | 极紫外光学元件的微环境控制系统 |
CN113281463A (zh) * | 2021-04-02 | 2021-08-20 | 中国科学院微电子研究所 | 动态气体锁的测试装置及应用其测试的方法 |
CN114280893A (zh) * | 2021-11-25 | 2022-04-05 | 中国科学院微电子研究所 | 光刻机的污染控制系统、方法和光刻机 |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112255886A (zh) * | 2020-09-07 | 2021-01-22 | 中国科学院微电子研究所 | 极紫外光学元件的微环境控制系统 |
CN112255886B (zh) * | 2020-09-07 | 2023-08-18 | 中国科学院微电子研究所 | 极紫外光学元件的微环境控制系统 |
CN113281463A (zh) * | 2021-04-02 | 2021-08-20 | 中国科学院微电子研究所 | 动态气体锁的测试装置及应用其测试的方法 |
CN114280893A (zh) * | 2021-11-25 | 2022-04-05 | 中国科学院微电子研究所 | 光刻机的污染控制系统、方法和光刻机 |
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Effective date of registration: 20200902 Address after: 100190, No. 19 West Fourth Ring Road, Beijing, Haidian District Patentee after: Research Institute of aerospace information innovation, Chinese Academy of Sciences Address before: 9 Dengzhuang South Road, Haidian District, Beijing 100094 Patentee before: Academy of Opto-Electronics, Chinese Academy of Sciences Effective date of registration: 20200902 Address after: 100029 Beijing city Chaoyang District Beitucheng West Road No. 3 Patentee after: Institute of Microelectronics, Chinese Academy of Sciences Address before: 100190, No. 19 West Fourth Ring Road, Beijing, Haidian District Patentee before: Research Institute of aerospace information innovation, Chinese Academy of Sciences |