WO2017177666A1 - 一种石墨锅具及其制作方法 - Google Patents

一种石墨锅具及其制作方法 Download PDF

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Publication number
WO2017177666A1
WO2017177666A1 PCT/CN2016/104783 CN2016104783W WO2017177666A1 WO 2017177666 A1 WO2017177666 A1 WO 2017177666A1 CN 2016104783 W CN2016104783 W CN 2016104783W WO 2017177666 A1 WO2017177666 A1 WO 2017177666A1
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WO
WIPO (PCT)
Prior art keywords
graphite
pot body
pot
coating
flow rate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2016/104783
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English (en)
French (fr)
Inventor
曹达华
肖北阳
杨玲
李洪伟
李宁
李康
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Midea Group Co Ltd
Foshan Shunde Midea Electrical Heating Appliances Manufacturing Co Ltd
Original Assignee
Midea Group Co Ltd
Foshan Shunde Midea Electrical Heating Appliances Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CN201610239894.9A external-priority patent/CN107296509A/zh
Priority claimed from CN201610239018.6A external-priority patent/CN107296508B/zh
Application filed by Midea Group Co Ltd, Foshan Shunde Midea Electrical Heating Appliances Manufacturing Co Ltd filed Critical Midea Group Co Ltd
Priority to RU2018130484A priority Critical patent/RU2715544C1/ru
Priority to JP2018546899A priority patent/JP2019507651A/ja
Priority to KR1020187026024A priority patent/KR102125787B1/ko
Publication of WO2017177666A1 publication Critical patent/WO2017177666A1/zh
Priority to US16/155,676 priority patent/US20190038070A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47J—KITCHEN EQUIPMENT; COFFEE MILLS; SPICE MILLS; APPARATUS FOR MAKING BEVERAGES
    • A47J36/00—Parts, details or accessories of cooking-vessels
    • A47J36/02—Selection of specific materials, e.g. heavy bottoms with copper inlay or with insulating inlay
    • A47J36/025—Vessels with non-stick features, e.g. coatings
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47J—KITCHEN EQUIPMENT; COFFEE MILLS; SPICE MILLS; APPARATUS FOR MAKING BEVERAGES
    • A47J27/00—Cooking-vessels
    • A47J27/002—Construction of cooking-vessels; Methods or processes of manufacturing specially adapted for cooking-vessels
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47J—KITCHEN EQUIPMENT; COFFEE MILLS; SPICE MILLS; APPARATUS FOR MAKING BEVERAGES
    • A47J36/00—Parts, details or accessories of cooking-vessels
    • A47J36/02—Selection of specific materials, e.g. heavy bottoms with copper inlay or with insulating inlay
    • A47J36/04—Selection of specific materials, e.g. heavy bottoms with copper inlay or with insulating inlay the materials being non-metallic
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605—Carbon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0635—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S220/00—Receptacles
    • Y10S220/912—Cookware, i.e. pots and pans

Definitions

  • the invention relates to the technical field of cooking appliances, in particular to a graphite pot and a manufacturing method thereof.
  • Graphite is composed of carbon atoms, and the basic unit amino acids and nucleotides of life are also derived from the skeleton of carbon. It can be said that there is no life without carbon. Therefore, although graphite looks dark, it is the purest material in the life world, and it has a good improvement and health care effect on the human body.
  • Graphite products can release far infrared rays after heating.
  • Far-infrared rays can enhance the body's functions, make the human body full of vitality and vitality, and effectively prevent various diseases.
  • diseases such as: the activation of water molecules, improve the body's oxygen content, make people's minds flexible, energetic; enhance metabolism, adjust the nerve fluid body.
  • the void structure of carbon makes carbon have good adsorption, so carbon is often used as an adsorbent material for adsorbing moisture, odor, toxic substances and the like.
  • the graphite baking tray used in the barbecue a few days ago looks very clean, but when it is heated on the induction cooker, it will see that the grease and harmful substances absorbed during the last barbecue will slowly ooze out, but don't worry. Wipe clean with a clean meal and use it.
  • the baking tray made of graphite, the pot and the like are heated quickly, and the cooked food is evenly heated, cooked from the inside to the outside, and the heating time is short, not only the taste is pure, but also the original nutrients of the food can be locked.
  • Graphite has good chemical stability at room temperature and is not attacked by any strong acid, strong alkali or organic solvent. Therefore, graphite products have little loss even in long-term use, as long as they are wiped clean as new. Graphite products are environmentally friendly, non-radioactive and resistant to high temperatures.
  • the graphite pot has the above advantages, but since the graphite is soft and not wear-resistant, the toner is easily lost during use.
  • the current solution is to protect the surface by applying a layer of PTFE-containing resin film. However, the compactness of the coating is too good, which reduces the far-infrared characteristics and adsorption characteristics of the graphite pot.
  • the invention provides a graphite pot and a manufacturing method thereof, which solve the technical problem that the coating compactness of the graphite pot is too good, and the far infrared characteristic and the adsorption characteristic of the graphite pot are reduced.
  • an embodiment of the first aspect of the present invention provides a graphite pot comprising a pot body made of graphite, the pot body having an inner wall and an outer wall, at least the inner wall is attached with a hard Carbon film.
  • the invention has the beneficial effects that the hardness of the hard carbon film is higher than the hardness of the existing PTFE resin film layer due to the adhesion of the hard carbon film on the surface of the inner wall of the pot body, thereby ensuring the wear resistance of the graphite pot.
  • the carbon film itself has good gas permeability, ensuring good thermal conductivity of the graphite pot body, fast heat transfer, and uniform heat characteristics; in the process of use, the far infrared characteristics and adsorption characteristics of the graphite pot body It is well represented, very environmentally friendly and healthy.
  • a non-stick coating is adhered to the surface of the hard carbon film.
  • the beneficial effects of using the above further solution are: reattaching the non-stick coating on the surface of the hard carbon film, improving the non-adhesive property of the graphite pot, and at the same time, since the hard carbon film is the bottom layer of the non-stick coating, The entire coating of the graphite pot is relatively thin and does not affect the performance of the graphite pot.
  • a non-stick coating or a hard carbon film is attached to the outer wall.
  • a non-stick coating is adhered on the surface of the outer wall to improve the wear resistance of the outer wall of the graphite cooker; a hard carbon film is adhered on the surface of the outer wall without affecting the performance of the graphite cookware. Under the conditions, ensure the wear resistance of the graphite pot itself.
  • the thickness of the carbon film is between 1.0 ⁇ m and 50 ⁇ m.
  • the carbon film having a thickness of between 1.0 ⁇ m and 50 ⁇ m ensures the good performance of the graphite pot body on the basis of ensuring the wear resistance of the graphite pot.
  • the thickness of the carbon film is between 10 ⁇ m and 30 ⁇ m.
  • the advantageous effect of using the above further solution is that the carbon film having a thickness of between 10 ⁇ m and 30 ⁇ m has the best performance of the graphite pot.
  • An embodiment of the second aspect of the present invention provides a graphite pot comprising a pot body made of graphite, the pot body having an inner wall and an outer wall to which a covalent carbide film is attached.
  • the beneficial effects of the present invention are: since the covalent carbide film adheres to the surface of the pot body, the hardness of the covalent carbide film is much higher than the hardness of the existing PTFE resin film layer, after tens of thousands of times of use The film layer will wear through, which ensures the wear resistance of the graphite pot and improves the service life of the graphite pot. Moreover, the covalent carbide film itself has good gas permeability and ensures the graphite pot. With the good thermal conductivity of the body, the heat transfer is fast, and the characteristics of uniform heat are well reflected.
  • a non-stick coating is adhered to the surface of the covalent carbide film.
  • the beneficial effects of using the above further solution are: reattaching the non-stick coating on the surface of the covalent carbide film, improving the non-adhesive property of the graphite cookware, and at the same time, since the covalent carbide film is non-stick coating
  • the bottom layer of the layer makes the entire coating of the graphite pot thinner and does not affect the performance of the graphite pot.
  • a non-stick coating or a covalent carbide film is attached to the outer wall.
  • the beneficial effect of adopting the above further solution is that a non-stick coating is adhered on the surface of the outer wall to improve the wear resistance of the outer wall of the graphite cooker; a covalent carbide film is adhered on the surface of the outer wall, without affecting the graphite pot Under the condition of performance, the wear resistance of the graphite pot itself is ensured.
  • the thickness of the covalent carbide film is between 1.0 ⁇ m and 5.0 ⁇ m.
  • the covalent carbide film having a thickness of between 1.0 ⁇ m and 5.0 ⁇ m ensures the good performance of the graphite pot body on the basis of ensuring the wear resistance of the graphite pot.
  • the thickness of the covalent carbide film is between 2.5 ⁇ m and 3.5 ⁇ m.
  • the beneficial effect of using the above further solution is that the SiC film has a thickness of between 2.5 ⁇ m and 3.5 ⁇ m, and the graphite pot has the best wear resistance and performance.
  • the covalent carbide film is a silicon carbide film, a boron carbide film or a titanium carbide film.
  • the covalent carbide film such as a silicon carbide film, a boron carbide film or a titanium carbide film has high hardness, corrosion resistance and good thermal stability, and its chemical stability is also high.
  • An embodiment of the third aspect of the present invention provides a method for fabricating a graphite cookware, comprising the steps of: forming the graphite into a pot body; and forming the pot body by chemical vapor deposition coating or physical vapor deposition A coating process is performed to form a hard carbon film on the surface of the pot body.
  • the beneficial effects of the manufacturing method of the present invention are: forming a hard carbon film by chemical vapor deposition coating treatment or physical vapor deposition coating treatment, thereby ensuring good adhesion of the hard carbon film on the pot body.
  • the specific operation of the chemical vapor deposition coating treatment is: placing the baked pot body into the coating chamber, closing the coating chamber and evacuating; controlling the air pressure P1 in the coating chamber, and recovering the pressure P2.
  • the power P3 of the light bar, the argon gas flow rate Q1, the hydrogen gas flow rate Q2, the methane flow rate Q3, the substrate temperature T1 of the pot body, and the deposition time t1 are performed by chemical vapor deposition coating of the pot body.
  • the beneficial effects of using the above further solution are: by controlling the pressure P 1 in the coating chamber, the recovery pressure P 2 , the P 3 of the glow rod, the Ar gas Ar flow Q 1 , the hydrogen H 2 flow rate Q 2 , the methane CH 4 flow rate Q 3
  • the substrate temperature T 1 and the deposition time t 1 of the pot body ensure that the quality and thickness of the carbon film on the surface of the graphite pot body meet the set requirements.
  • the air pressure P1, the recovery pressure P2, the power P3 of the glow bar, the argon flow rate Q1, the hydrogen flow rate Q2, the methane flow rate Q3, the substrate temperature T1 of the pot body, and the deposition time t1 satisfy the following relationship: the P1 range is 0.5kpa to 7kpa, P2 range from 50kpa to 150kpa, P3 range from 2kw to 20kw, Q1 range from 1SLM to 10SLM, Q2 range from 0.5SLM to 4.5SLM, Q3 range from 0.02SLM to 0.6SLM, and T1 range from 850°C to 930 ° C and t1 range from 1 hour to 12 hours.
  • the advantageous effect of using the above further solution is that the coating thickness of the carbon film on the graphite pot body can be controlled to be between 10 ⁇ m and 50 ⁇ m by the above parameter control.
  • the specific operation of the physical vapor deposition coating treatment is: placing the baked pot body into the coating chamber, closing the coating chamber and evacuating; controlling the background pressure P 4 and the film forming pressure P in the coating chamber. 5 , sputtering power P 6 , bias voltage Vbias, argon flow rate Q 4 , methane or acetylene flow rate Q 5 , substrate temperature T 2 of the pot body and deposition time t 2 , performing physical vapor deposition coating of the pot body deal with.
  • the advantageous effect of using the above further solution is to control the background pressure P 4 , the film forming pressure P 5 , the sputtering power P 6 , the bias voltage Vbias, the argon Ar flow rate Q 4 , the methane CH 4 or the acetylene C 2 in the coating chamber.
  • the H 2 flow rate Q 5 , the substrate temperature T 2 of the pot body and the deposition time t 2 ensure that the quality and thickness of the carbon film on the surface of the graphite pot body reach the set requirements.
  • the background pressure P 4 ranges from 0.5 x 10 -2 Pa to 0.5 x 10 -3 Pa
  • P 5 ranges from 2.0 x 1.0 -1 Pa to 8.0 x 1.0 -1 Pa
  • P 6 ranges from 10 kw to 20 kw
  • Vbias range of 100V to 300V
  • 5 0.10SLM range of Q to 2.0SLM
  • T 2 200 °C 130 °C and t 2 of the range 3-5 hours.
  • the advantageous effect of using the above further solution is that the coating thickness of the carbon film on the graphite pot body can be controlled to be between 1.0 ⁇ m and 10 ⁇ m by the above parameter control.
  • An embodiment of the fourth aspect of the present invention provides a method for fabricating a graphite pot, comprising the steps of: forming the graphite into a pot body; and coating the body of the pot into a film by physical vapor deposition. A covalent carbide film is formed on the surface of the pot body.
  • the beneficial effects of the preparation method of the invention are: forming a covalent carbide film on the body of the pot by plating a covalent carbide film, thereby ensuring good adhesion of the covalent carbide film on the pot body, and simultaneously
  • the valence type carbide film also has a high hardness.
  • the physical vapor deposition coating treatment is a sputtering coating method.
  • the covalent carbide film after the sputter coating process has the advantages of strong adhesion, good throwing ability, and wide compatibility of the plated substrate material and the plating material.
  • the specific operation of the sputter coating method is: placing the baked pot body into the coating chamber, closing the coating chamber and evacuating; controlling the deposition pressure in the coating chamber P1, sputtering target material, sputtering The power P2, the argon flow rate Q1, the acetylene flow rate Q2, the substrate temperature T1, and the deposition time t1 perform sputter coating of the pot body.
  • the beneficial effects of using the above further solution are: by controlling the deposition pressure P 1 in the coating chamber, the material of the sputtering target, the sputtering power P 2 , the argon flow rate Q 1 , the acetylene flow rate Q 2 , the substrate temperature T 1 and the deposition time t 1 , to ensure that the quality and thickness of the covalent carbide film on the surface of the graphite pot body meet the set requirements.
  • the deposition pressure P 1 , the material of the sputtering target, the sputtering power P 2 , the argon flow rate Q 1 , the acetylene flow rate Q 2 , the substrate temperature T 1 , and the deposition time t 1 satisfy the following relationship:
  • the range of P 1 is 0.5x10 -1 Pa to 5.0x10 -1 Pa
  • the material of the sputtering target is silicon, boron or titanium
  • the P 2 is 5kw to 20kw
  • the Q 1 is 0.05SLM to 3.0SLM
  • the Q 2 is 0.04SLM.
  • T 1 is 110 ° C to 130 ° C
  • t 2 is 1.5 to 4 hours.
  • the advantageous effect of the above further embodiment is that the coating thickness of the covalent carbide film on the graphite pot body can be controlled to be between 1.0 ⁇ m and 5.0 ⁇ m by the above parameter control.
  • Figure 1 is a structural view of a first embodiment of a graphite pot according to the present invention
  • Figure 2 is a structural view of a second embodiment of the graphite pot of the present invention.
  • Figure 3 is a structural view of a third embodiment of the graphite pot of the present invention.
  • Figure 4 is a structural view of a fourth embodiment of the graphite pot of the present invention.
  • Figure 5 is a structural view of a fifth embodiment of the graphite pot of the present invention.
  • Figure 6 is a structural view of a sixth embodiment of the graphite pot of the present invention.
  • Figure 7 is a flow chart of a method for fabricating a graphite pot according to the present invention.
  • Figure 8 is another flow chart of the method of fabricating the graphite pot of the present invention.
  • 01 pot body 011 inner wall, 012 outer wall, 02 hard carbon film, 03 non-stick coating, 04 covalent carbide film.
  • a structural diagram of a first embodiment of a graphite cookware according to the present invention includes a pot body 01 made of graphite.
  • the pot body 01 includes an inner wall 011 and an outer wall 012.
  • the surface of the inner wall 011 is adhered with a hard carbon film 02 and an outer wall.
  • a hard carbon film 02 is also adhered to the surface of 012; the thickness of the hard carbon film 02 is 20 ⁇ m.
  • the hard carbon film Since the hard carbon film is attached to the surface of the inner wall of the pot body, the hardness of the hard carbon film is higher than that of the present
  • the hardness of the PTFE resin film layer ensures the wear resistance of the graphite pot.
  • the carbon film itself has good gas permeability, ensuring the good thermal conductivity of the graphite pot body, fast heat transfer, and uniform heat characteristics. In the process of use, the far infrared characteristics and adsorption characteristics of the graphite pot body are well reflected, very environmentally friendly and healthy; the carbon film with a thickness of 20 ⁇ m, the best performance of the graphite pot.
  • the thickness of the carbon film may be set to any other value between 1.0 and 50 ⁇ m.
  • a structural view of the second embodiment of the graphite cookware of the present invention is different from that of the first embodiment in that a non-stick coating 03 is adhered to the surface of the hard carbon film 02.
  • a structural view of the third embodiment of the graphite cookware of the present invention is different from the first embodiment in that a non-stick coating 03 is adhered to the surface of the outer wall 012.
  • a non-stick coating is adhered to the surface of the outer wall to improve the wear resistance of the outer wall of the graphite cookware.
  • the structure diagram of the fourth embodiment of the graphite cookware of the present invention includes a pot body 01 made of graphite.
  • the pot body 01 includes an inner wall 011 and an outer wall 012.
  • the surface of the inner wall 011 is adhered with a covalent carbide film 04.
  • the covalent carbide film 04 is also adhered to the surface of the outer wall 012.
  • the covalent carbide film 04 is a silicon carbide film, and the thickness of the silicon carbide film is 3.0 ⁇ m.
  • the covalent carbide film ie, the silicon carbide film
  • the hardness of the silicon carbide film is much higher than that of the existing PTFE resin film layer, and the film layer appears after tens of thousands of times of use.
  • the wear-through phenomenon ensures the wear resistance of the graphite cookware and improves the service life of the graphite cookware.
  • the silicon carbide film itself has good gas permeability, ensuring good thermal conductivity of the graphite cookware body and fast heat transfer. The characteristics of uniform heat are well reflected; the silicon carbide film with a thickness of 3.0 ⁇ m has the best performance of the graphite pot.
  • a covalent carbide film is adhered to the surface of the outer wall to ensure the wear resistance of the graphite pot itself without affecting the performance of the graphite pot.
  • a structural view of the fifth embodiment of the graphite cookware of the present invention is different from that of the fourth embodiment in that a non-stick coating 03 is adhered to the surface of the covalent carbide film 04.
  • the structural diagram of the sixth embodiment of the graphite cookware of the present invention is shown in FIG. 6, and the difference is compared with the fourth embodiment.
  • the non-stick coating layer 03 is attached to the surface of the outer wall 012.
  • a non-stick coating is adhered to the surface of the outer wall to improve the wear resistance of the outer wall of the graphite cookware.
  • the thickness of the covalent carbide film may be set to any other value between 1.0 and 5.0 ⁇ m.
  • the covalent carbide film 04 is a silicon carbide film, a boron carbide film or a titanium carbide film, and other covalent carbide films.
  • FIG. 7 A flow chart of a method for fabricating a graphite pot according to the present invention is shown in FIG. 7, and includes the following steps:
  • Step 702 forming graphite into a pot body
  • step 702 The specific operation of step 702 is:
  • the pot body is placed in an ultrasonic cleaning container for ultrasonic cleaning; wherein the ultrasonic cleaning conditions are:
  • the cleaning temperature is 50 ° C to 60 ° C
  • the cleaning time is 5 min to 10 min
  • the power of the ultrasonic cleaning equipment is selected according to the actual product condition
  • the output power density of the ultrasonic cleaning machine is mostly selected to be about 0.3 to 0.6 watt / square centimeter;
  • the cleaned pot body is placed in an oven for baking; wherein the baking conditions are:
  • Baking temperature is 110 ° C to 120 ° C, baking time is 15 min to 30 min;
  • the body of the pot is formed by a chemical vapor deposition coating process or a physical vapor deposition coating method to form a hard carbon film on the surface of the pot body.
  • the hard carbon film is formed by chemical vapor deposition coating treatment or physical vapor deposition coating to ensure good adhesion of the hard carbon film on the pot body.
  • the step of cleaning the pot body after the carbon plating film is processed may be further included; and the pot body after the carbon plating film is cleaned to ensure the surface of the graphite pot Cleanliness can be used directly.
  • step 704 The specific operation of the chemical vapor deposition coating process in step 704 is:
  • the control parameters of each parameter are as follows:
  • the air pressure P 1 in the coating chamber the recovery pressure P 2 , the power P 3 of the glow rod, the argon flow rate Q 1 , the hydrogen flow rate Q 2 , the methane flow rate Q 3 , and the substrate temperature of the pot body T 1 and the deposition time t 1 and the coating thickness of the carbon film are shown in Table 2 below:
  • the deposition film forming apparatus of the chemical vapor deposition method is relatively simple, and it is relatively easy to control the density of the film layer and the purity of the film layer to ensure the quality of the carbon film; at the same time, the thickness of the carbon film can be controlled between 10 ⁇ m and 50 ⁇ m.
  • the specific operation of the physical vapor deposition coating treatment is as follows: the baked pot body is placed in the coating chamber, the coating chamber is closed and vacuumed; the background pressure P 4 in the coating chamber, the film forming pressure P 5 , sputtering
  • the power P 6 , the bias voltage Vbias, the argon flow rate Q 4 , the methane or acetylene flow rate Q 5 , the substrate temperature T 2 of the pot body, and the deposition time t 2 are performed by physical vapor deposition coating treatment of the pot body.
  • the control range of each parameter is as follows:
  • Table 3 Physical vapor deposition method coating parameter control table
  • the background pressure P 4 the film formation pressure P 5 , the sputtering power P 6 , the bias voltage Vbias, the argon Ar flow rate Q 4 , the methane or C 2 H 2 flow rate Q 5 , the substrate temperature T 2
  • the coating thickness of the carbon film at deposition time t 2 is shown in Table 4 below:
  • the physical vapor deposition method has no pollution, less consumables, uniform film formation and strong adhesion to the substrate, and improves the self-lubricity of the carbon film surface. Meanwhile, the thickness of the carbon film can be controlled between 1.0 ⁇ m and 10 ⁇ m.
  • FIG. 8 Another flow chart of the method for fabricating the graphite pot of the present invention is shown in FIG. 8 and includes the following steps:
  • Step 802 forming graphite into a pot body
  • step 802 The specific operation of step 802 is:
  • the pot body is placed in an ultrasonic cleaning container for ultrasonic cleaning; wherein the ultrasonic cleaning conditions are:
  • the cleaning temperature is 50 ° C to 60 ° C
  • the cleaning time is 5 min to 10 min
  • the power of the ultrasonic cleaning equipment is selected according to the actual product condition
  • the output power density of the ultrasonic cleaning machine is mostly selected to be about 0.3 to 0.6 watt / square centimeter;
  • the cleaned pot body is placed in an oven for baking; wherein the baking conditions are:
  • Baking temperature is 110 ° C to 120 ° C, baking time is 15 min to 30 min;
  • step 804 the body of the pot is processed by physical vapor deposition to form a covalent carbide film on the surface of the pot body.
  • Covalent carbide film is formed on the body of the pot by plating a covalent carbide film to ensure good adhesion of the covalent carbide film on the pot body, and the covalent carbide film is also high. Hardness.
  • step 804 a cleaning step is further included, and the pot body after the covalent-type carbide film treatment is subjected to a cleaning treatment.
  • the pot body after plating the covalent carbide film is cleaned to ensure the cleanness of the surface of the graphite pot and can be used directly.
  • the physical vapor deposition coating process is a sputter coating process.
  • the deposition pressure P 1 , the sputtering target, the sputtering power P 2 , the argon Ar flow Q 1 , the acetylene C 2 H 2 flow Q 2 , the substrate temperature T 1 , and the deposition time t 1 The coating thickness and SiC film wear resistance are shown in Table 6 below:
  • the SiC film treated by the sputter coating method has the advantages of strong adhesion, good throwing ability, and wide compatibility of the substrate material and the plating material. Meanwhile, the thickness of the SiC film can be controlled between 1.0 ⁇ m and 5.0 ⁇ m.
  • the terms “installation”, “connected”, “connected”, “fixed” and the like shall be understood broadly, and may be either a fixed connection or a detachable connection, unless explicitly stated and defined otherwise. Or integrated; can be directly connected, or indirectly connected through an intermediate medium, which can be the internal communication of two elements or the interaction of two elements.
  • an intermediate medium which can be the internal communication of two elements or the interaction of two elements.
  • the first feature "on” or “under” the second feature may include direct contact of the first and second features, and may also include first and second features, unless otherwise specifically defined and defined. It is not in direct contact but through additional features between them.
  • the first feature "above”, “above” and “above” the second feature includes the first feature directly above and above the second feature, or merely indicating that the first feature level is higher than the second feature.
  • the first feature “below”, “below” and “below” the second feature includes the first feature directly below and below the second feature, or merely the first feature level being less than the second feature.

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Abstract

一种石墨锅具及其制作方法，石墨锅具包括由石墨制成的锅具本体(01)，锅具本体包括内壁(011)和外壁(012)，内壁的表面附着有硬质碳膜(02)或共价型碳化物膜(04)。由于在锅具本体的内壁的表面附着有硬质碳膜或共价型碳化物膜，硬质碳膜和共价型碳化物膜的硬度均高于现有的PTFE树脂膜层的硬度，确保了石墨锅具的耐磨性，同时硬质碳膜和共价型碳化物膜本身具有良好的透气性能，确保石墨锅具本体的良好导热性，传热快，受热均匀的特点得到很好的体现；在使用过程中，石墨锅具本体的远红外特性和吸附特性得到了很好的体现，非常环保和健康。此外，共价型碳化物膜在使用上万次后，其膜层才会出现磨穿的现象，确保了石墨锅具的耐磨性，提高了石墨锅具的使用寿命。

Description

一种石墨锅具及其制作方法 技术领域
本发明涉及烹饪器具技术领域，特别是一种石墨锅具及其制作方法。
背景技术
石墨是由碳原子组成的，而生命的基本单元氨基酸、核苷酸也是以碳元素做骨架变化而来的，可以说，没有碳就没有生命。因此，石墨虽然看上去黑黑的，却是生命世界里最纯净的材料，对人体具有很好的改善和保健作用。
1.石墨制品经过加热后能释放远红外线。
远红外线能够增强机体功能，使人体充满生机和活力，并有效预防各种疾病。如：令水分子活化，提高身体含氧量，使人头脑灵活，精神振奋；增强新陈代谢，调整神经液机体。有效预防糖尿病、高血脂、肥胖症、痛风等由于新陈代谢紊乱引起的疾病；改善血液循环，特别是微循环系统。可有效预防因微循环系统紊乱引起的高血压、心血管疾病、肿瘤、关节炎、四肢冰冷麻痹等疾病；美白养颜，消炎、消肿功能；提高人体免疫功能，调节血液的酸碱平衡、淡化烟酒，强化肝脏功能等功效。
2.石墨制品具有很好的吸附性。
炭的空隙结构使炭具有很好的吸附性，故炭常被用作吸附材料，用于吸附水分、气味、有毒物质等。我们做过实验，前几天烤肉用过的石墨烤盘看上去非常干净，但放到电磁炉上加热，会看到上次烤肉时吸附的油脂和有害物质会慢慢渗出，不过不用担心，用干净的餐纸擦拭干净即可使用了。
3.石墨制品具有很好的导热性，传热快，受热均匀，节约燃料。
用石墨制成的烤盘，锅等加热快，而且烧制的食物受热均匀，从里往外熟，加热时间短，不仅味道纯正，而且能锁住食物本来的养分。我们做过实验，用石墨烤盘烤肉时，刚开始电磁炉打到大火，仅20-30秒就能预热，开始烤制食物时只要打在小火上即可，有利用节约能源。
4.石墨制品具有化学稳定性和抗侵蚀能力。
石墨在常温下具有很好的化学稳定性，不受任何强酸，强碱及有机溶剂的侵蚀。因此，石墨制品即使长期使用损耗也很少，只要擦拭干净还如新的一样。石墨制品环保健康，无放射性污染，耐高温。
5.碳要在2000-3300度高温的环境下经过至少十几个昼夜的石墨化过程才能成为石墨，因此石墨中的有毒有害物质早已释放殆尽，至少在2000度以内是稳定的。石墨锅具具有以上等优点，但由于石墨较软不耐磨，在使用的过程中容易掉碳粉。目前解决的办法都是在表面涂敷一层含PTFE的树脂膜层来保护。但这种涂层致密性太好，降低了石墨锅远红外特性及吸附特性。
发明内容
本发明提供一种石墨锅具及其制作方法，以解决上述石墨锅具的涂层致密性太好，降低了石墨锅具远红外特性及吸附特性的技术问题。
为了解决上述技术问题，本发明第一方面的实施例提供了一种石墨锅具，包括由石墨制成的锅具本体，所述锅具本体具有内壁和外壁，至少所述内壁上附着有硬质碳膜。
本发明的有益效果是：由于在锅具本体的内壁的表面附着有硬质碳膜，硬质碳膜的硬度高于现有的PTFE树脂膜层的硬度，确保了石墨锅具的耐磨性，碳膜本身具有良好的透气性能，确保石墨锅具本体的良好导热性，传热快，受热均匀的特点得到很好的体现；在使用过程中，石墨锅具本体的远红外特性和吸附特性得到了很好的体现，非常环保和健康。
进一步，所述硬质碳膜的表面附着有不粘涂层。
采用上述进一步方案的有益效果是：在硬质碳膜的表面上再附着不粘涂层，提高了石墨锅具的不粘接性能，同时，由于硬质碳膜为不粘涂层的底层，使得石墨锅具整个涂层比较薄，不会影响到石墨锅具的性能。
进一步，所述外壁上附着有不粘涂层或硬质碳膜。
采用上述进一步方案的有益效果是：在外壁的表面附着有不粘涂层，提高了石墨锅具外壁的耐磨性能；在外壁的表面附着有硬质碳膜，在不影响石墨锅具的性能的条件下，确保石墨锅具本身的耐磨性能。
进一步，所述碳膜的厚度位于1.0μm至50μm之间。
采用上述进一步方案的有益效果是：1.0μm至50μm之间厚度的碳膜在确保石墨锅具的耐磨性基础上，确保了石墨锅具本体的良好性能得到发挥。
进一步，所述碳膜的厚度位于10μm至30μm之间。
采用上述进一步方案的有益效果是：厚度为10μm至30μm之间的碳膜，石墨锅具的性能最好。
本发明第二方面的实施例提供了一种石墨锅具，包括由石墨制成的锅具本体，所述锅具本体具有内壁和外壁，所述内壁上附着有共价型碳化物膜。
本发明的有益效果是：由于在锅具本体的表面附着有共价型碳化物膜，共价型碳化物膜的硬度远高于现有的PTFE树脂膜层的硬度，在使用上万次后，其膜层才会出现磨穿的现象，确保了石墨锅具的耐磨性，达到提高了石墨锅具的使用寿命；并且，共价型碳化物膜本身具有良好的透气性能，确保石墨锅具本体的良好导热性，传热快，受热均匀的特点得到很好的体现。
进一步，所述共价型碳化物膜的表面附着有不粘涂层。
采用上述进一步方案的有益效果是：在共价型碳化物膜的表面上再附着不粘涂层，提高了石墨锅具的不粘接性能，同时，由于共价型碳化物膜为不粘涂层的底层，使得石墨锅具整个涂层比较薄，不会影响到石墨锅具的性能。
进一步，所述外壁上附着有不粘涂层或共价型碳化物膜。
采用上述进一步方案的有益效果是：在外壁的表面附着有不粘涂层，提高了石墨锅具外壁的耐磨性能；在外壁的表面附着有共价型碳化物膜，在不影响石墨锅具的性能的条件下，确保石墨锅具本身的耐磨性能。
进一步，所述共价型碳化物膜的厚度位于1.0μm至5.0μm之间。
采用上述进一步方案的有益效果是：1.0μm至5.0μm之间厚度的共价型碳化物膜在确保石墨锅具的耐磨性基础上，确保了石墨锅具本体的良好性能得到发挥。
进一步，述共价型碳化物膜的厚度位于2.5μm至3.5μm之间。
采用上述进一步方案的有益效果是：厚度为2.5μm至3.5μm之间的SiC膜，石墨锅具的耐磨性能和性能最好。
进一步，所述共价型碳化物膜为碳化硅膜、碳化硼膜或碳化钛膜。
采用上述进一步方案的有益效果是：碳化硅膜、碳化硼膜或碳化钛膜等共价型碳化物膜具有高硬度、耐腐蚀、热稳定性好的特点，其化学稳定性也很高。
本发明第三方面的实施例提供了一种石墨锅具的制作方法，包括以下步骤：将所述石墨成型成锅具本体；将型成锅具本体通过化学气相沉积法镀膜处理或物理气相沉积法镀膜处理，在所述锅具本体的表面上形成硬质碳膜。
本发明制作方法的有益效果是：通过化学气相沉积法镀膜处理或物理气相沉积法镀膜处理形成硬质碳膜，确保了硬质碳膜在锅具本体上良好的附着能力。
进一步，所述化学气相沉积法镀膜处理的具体操作为：将烘烤后的锅具本体放入镀膜室内，将镀膜室关闭并抽真空；控制所述镀膜室内的气压P1、回收压力P2、辉光棒的功率P3、氩气流量Q1、氢气流量Q2、甲烷流量Q3、锅具本体的基材温度T1和沉积时间t1，执行锅具本体的化学气相沉积法镀膜。
采用上述进一步方案的有益效果是：通过控制镀膜室内的压力P1、回收压力P2、辉光棒的P3、氩气Ar流量Q1、氢气H2流量Q2、甲烷CH4流量Q3、锅具本体的基材温度T1和沉积时间t1，确保石墨锅具本体表面碳膜的质量和厚度达到设定要求。
进一步，所述气压P1、回收压力P2、辉光棒的功率P3、氩气流量Q1、氢气流量Q2、甲烷流量Q3、锅具本体的基材温度T1和沉积时间t1满足如下关系：P1范围为0.5kpa至7kpa、P2范围为50kpa至150kpa、P3范围为2kw至20kw、Q1范围为1SLM至10SLM、Q2范围为0.5SLM至4.5SLM、Q3范围为0.02SLM至0.6SLM、T1范围为850℃至930℃和t1范围为1小时至12小时。
采用上述进一步方案的有益效果是：通过上述参数控制，可以使石墨锅具本体上的碳膜的镀膜厚度控制在10μm至50μm之间。
进一步，物理气相沉积法镀膜处理的具体操作为：将烘烤后的锅具本体放入镀膜室内，将镀膜室关闭并抽真空；控制所述镀膜室内的本底压力P4、成膜压力P5、溅射功率P6、偏压Vbias、氩气流量Q4、甲烷或者乙炔流量Q5、 锅具本体的基材温度T2和沉积时间t2，执行锅具本体的物理气相沉积法镀膜处理。
采用上述进一步方案的有益效果是：通过控制镀膜室内的本底压力P4、成膜压力P5、溅射功率P6、偏压Vbias、氩气Ar流量Q4、甲烷CH4或者乙炔C2H2流量Q5、锅具本体的基材温度T2和沉积时间t2，确保石墨锅具本体表面碳膜的质量和厚度达到设定要求。
进一步，所述本底压力P4、成膜压力P5、溅射功率P6、偏压Vbias、氩气流量Q4、甲烷或者乙炔流量Q5、锅具本体的基材温度T2和沉积时间t2满足如下关系：P4范围为0.5x10-2Pa至0.5x10-3Pa、P5范围为2.0x1.0-1Pa至8.0x1.0-1Pa、P6范围为10kw至20kw、Vbias范围为100V至300V、Q4范围为0.2SLM至0.7SLM、Q5范围为0.10SLM至2.0SLM、T2范围为130℃至200℃和t2范围为3小时至5小时。
采用上述进一步方案的有益效果是：通过上述参数控制，可以使石墨锅具本体上的碳膜的镀膜厚度控制在1.0μm至10μm之间。
本发明第四方面的实施例提供了一种石墨锅具的制作方法，包括以下步骤：将所述石墨成型成锅具本体；将型成锅具本体通过物理气相沉积法镀膜处理，在所述锅具本体的表面上形成共价型碳化物膜。
本发明制作方法的有益效果是：通过镀共价型碳化物膜处理在锅具本体形成共价型碳化物膜，确保了共价型碳化物膜在锅具本体上良好的附着能力，同时共价型碳化物膜也具有较高的硬度。
进一步，所述物理气相沉积法镀膜处理为溅射镀膜法。
采用上述进一步方案的有益效果是：溅射镀膜法处理后的共价型碳化物膜具有粘着力强、均镀能力好、被镀基体材料和镀层材料可以广泛搭配等优点。
进一步，所述溅射镀膜法的具体操作为：将烘烤后的锅具本体放入镀膜室内，将镀膜室关闭并抽真空；控制镀膜室内的沉积压力P1、溅射靶的材料、溅射功率P2、氩气流量Q1、乙炔流量Q2、基材温度T1和沉积时间t1，执行锅具本体的溅射镀膜。
采用上述进一步方案的有益效果是：通过控制镀膜室内的沉积压力P1、溅射靶的材料、溅射功率P2、氩气流量Q1、乙炔流量Q2、基材温度T1和沉 积时间t1，确保石墨锅具本体表面共价型碳化物膜的质量和厚度达到设定要求。
进一步，所述沉积压力P1、溅射靶的材料、溅射功率P2、氩气流量Q1、乙炔流量Q2、基材温度T1和沉积时间t1满足如下关系：
P1范围为0.5x10-1Pa～5.0x10-1Pa、溅射靶的材料为硅、硼或钛、P2为5kw～20kw、Q1为0.05SLM～3.0SLM、Q2为0.04SLM～0.10SLM、T1为110℃～130℃，t2为1.5～4小时。
采用上述进一步方案的有益效果是：通过上述参数控制，可以使石墨锅具本体上的共价型碳化物膜的镀膜厚度控制在1.0μm至5.0μm之间。
附图说明
图1是本发明石墨锅具实施例一的结构图；
图2是本发明石墨锅具实施例二的结构图；
图3是本发明石墨锅具实施例三的结构图；
图4是本发明石墨锅具实施例四的结构图；
图5是本发明石墨锅具实施例五的结构图；
图6是本发明石墨锅具实施例六的结构图；
图7是本发明石墨锅具制作方法的一流程图；
图8是本发明石墨锅具制作方法的另一流程图。
其中，图1至图6中，附图标记与部件名称之间的对应关系为：
01锅具本体，011内壁，012外壁，02硬质碳膜，03不粘涂层，04共价型碳化物膜。
具体实施方式
下面结合附图和实施方式对本发明作进一步的说明。
本发明石墨锅具实施例一的结构图参见图1，包括由石墨制成的锅具本体01，锅具本体01包括内壁011和外壁012，内壁011的表面附着有硬质碳膜02，外壁012的表面也附着有硬质碳膜02；硬质碳膜02的厚度为20μm。
由于在锅具本体的内壁的表面附着有硬质碳膜，硬质碳膜的硬度高于现 有的PTFE树脂膜层的硬度，确保了石墨锅具的耐磨性，碳膜本身具有良好的透气性能，确保石墨锅具本体的良好导热性，传热快，受热均匀的特点得到很好的体现；在使用过程中，石墨锅具本体的远红外特性和吸附特性得到了很好的体现，非常环保和健康；厚度为20μm的碳膜，石墨锅具的性能最好。
在具体实施例中，碳膜的厚度可以设置为1.0至50μm之间的其他任意值。
本发明石墨锅具实施例二的结构图参见图2，与实施例一相比，其区别在于，硬质碳膜02的表面附着有不粘涂层03。
在硬质碳膜的表面上再附着不粘涂层，提高了石墨锅具的不粘接性能，同时，由于硬质碳膜为不粘涂层的底层，使得石墨锅具整个涂层比较薄，不会影响到石墨锅具的性能。
本发明石墨锅具实施例三的结构图参见图3，与实施例一相比，其区别在于，外壁012的表面附着有不粘涂层03。
在外壁的表面附着有不粘涂层，提高了石墨锅具外壁的耐磨性能。
本发明石墨锅具实施例四的结构图参见图4，包括由石墨制成的锅具本体01，锅具本体01包括内壁011和外壁012，内壁011的表面附着有共价型碳化物膜04，外壁012的表面也附着有共价型碳化物膜04，其中，共价型碳化物膜04为碳化硅膜，碳化硅膜的厚度为3.0μm。
由于在内壁的表面附着有共价型碳化物膜，即碳化硅膜，碳化硅膜的硬度远高于现有的PTFE树脂膜层的硬度，在使用上万次后，其膜层才会出现磨穿的现象，确保了石墨锅具的耐磨性，达到提高了石墨锅具的使用寿命；并且，碳化硅膜本身具有良好的透气性能，确保石墨锅具本体的良好导热性，传热快，受热均匀的特点得到很好的体现；厚度为3.0μm的碳化硅膜，石墨锅具的性能最好。在外壁的表面附着有共价型碳化物膜，在不影响石墨锅具的性能的条件下，确保石墨锅具本身的耐磨性能。
本发明石墨锅具实施例五的结构图参见图5，与实施例四相比，其区别在于，共价型碳化物膜04的表面附着有不粘涂层03。
在共价型碳化物膜的表面上再附着不粘涂层，提高了石墨锅具的不粘接性能，同时，由于共价型碳化物膜为不粘涂层的底层，使得石墨锅具整个涂层比较薄，不会影响到石墨锅具的性能。
本发明石墨锅具实施例六的结构图参见图6，与实施例四相比，其区别 在于，外壁012的表面附着有不粘涂层03。
在外壁的表面附着有不粘涂层，提高了石墨锅具外壁的耐磨性能。
在具体实施例中，共价型碳化物膜的厚度可以设置为1.0至5.0μm之间的其他任意值。
在具体实施例中，共价型碳化物膜04为碳化硅膜、碳化硼膜或碳化钛膜，以及其他的共价型碳化物膜。
本发明石墨锅具制作方法一流程图参见图7，包括以下步骤：
步骤702，将石墨成型成锅具本体；
其中步骤702的具体操作为：
石墨压制成型后采用CNC铣，制作成锅具本体；
将锅具本体放置在超声波清洗容器中进行超声波清洗；其中，超声波清洗条件为：
清洗温度为50℃至60℃，清洗时间为5min至10min，根据实际产品情况选择超声波清洗设备的功率，确保超声清洗机输出功率密度大多选在0.3～0.6瓦/平方厘米左右即可；
将清洗后的锅具本体放置到烤炉中进行烘烤；其中，烘烤条件为：
烘烤温度为110℃至120℃，烘烤时间为15min至30min；
步骤704，将型成锅具本体通过化学气相沉积法镀膜处理或物理气相沉积法镀膜处理，在锅具本体的表面上形成硬质碳膜。
通过化学气相沉积法镀膜处理或物理气相沉积法镀膜处理形成硬质碳膜，确保了硬质碳膜在锅具本体上良好的附着能力。
在具体实施例中，在步骤704之后还可以包括，将镀碳膜处理后的锅具本体进行清洗处理的步骤；将镀碳膜后的锅具本体进行清洗处理，确保了石墨锅具表面的清洁度，可以直接使用。
其中，步骤704中化学气相沉积法镀膜处理的具体操作为：
将烘烤后的锅具本体放入镀膜室内，将镀膜室关闭并抽真空；
控制镀膜室内的气压P1、回收压力P2、辉光棒的功率P3、氩气流量Q1、氢气流量Q2、甲烷流量Q3、锅具本体的基材温度T1和沉积时间t1，执行锅具本体的化学气相沉积法镀膜。其各个参数控制范围如下表1：
表1：化学气相沉积法镀膜的参数控制表
Figure PCTCN2016104783-appb-000001
在具体实施例中，镀膜室内的气压P1、回收压力P2、辉光棒的功率P3、氩气流量Q1、氢气流量Q2、甲烷流量Q3、锅具本体的基材温度T1和沉积时间t1与碳膜的镀膜厚度见下表2：
表2：化学气相沉积法镀膜的参数与镀膜厚度
Figure PCTCN2016104783-appb-000002
化学气相沉积法的沉积成膜装置较为简单，比较容易控制膜层的密度和膜层纯度，确保了碳膜的质量；同时，碳膜的厚度可以控制在10μm至50μm之间。
物理气相沉积法镀膜处理的具体操作为：将烘烤后的锅具本体放入镀膜室内，将镀膜室关闭并抽真空；控制镀膜室内的本底压力P4、成膜压力P5、溅射功率P6、偏压Vbias、氩气流量Q4、甲烷或者乙炔流量Q5、锅具本体的基材温度T2和沉积时间t2，执行锅具本体的物理气相沉积法镀膜处理。其各个参数控制范围如下表3：
表3：物理气相沉积法镀膜参数控制表
Figure PCTCN2016104783-appb-000003
在具体实施例中，本底压力P4、成膜压力P5、溅射功率P6、偏压Vbias、氩气Ar流量Q4、甲烷或者C2H2流量Q5、基材温度T2和沉积时间t2碳膜的镀膜厚度见下表4：
表4：物理气相沉积法镀膜的参数与镀膜厚度
Figure PCTCN2016104783-appb-000004
物理气相沉积法无污染，耗材少，成膜均匀致密，与基体的结合力强，提高了碳膜表面的自润滑性；同时，碳膜的厚度可以控制在1.0μm至10μm之间。
本发明石墨锅具制作方法另一流程图参见图8，包括以下步骤：
步骤802，将石墨成型成锅具本体；
其中，步骤802的具体操作为：
将石墨压制成型后采用CNC铣，制作成锅具本体；
将锅具本体放置在超声波清洗容器中进行超声波清洗；其中，超声波清洗条件为：
清洗温度为50℃至60℃，清洗时间为5min至10min，根据实际产品情况选择超声波清洗设备的功率，确保超声清洗机输出功率密度大多选在0.3～0.6瓦/平方厘米左右即可；
将清洗后的锅具本体放置到烤炉中进行烘烤；其中，烘烤条件为：
烘烤温度为110℃至120℃，烘烤时间为15min至30min；
步骤804，将型成锅具本体通过物理气相沉积法镀膜处理，在锅具本体的表面上形成共价型碳化物膜。
通过镀共价型碳化物膜处理在锅具本体形成共价型碳化物膜，确保了共价型碳化物膜在锅具本体上良好的附着能力，同时共价型碳化物膜也具有较高的硬度。
在具体实施例中，在步骤804，之后还包括清洗步骤，将镀共价型碳化物膜处理后的锅具本体进行清洗处理。将镀共价型碳化物膜后的锅具本体进行清洗处理，确保了石墨锅具表面的清洁度，可以直接使用。
在具体实施例中，物理气相沉积法镀膜处理为溅射镀膜法。
溅射镀膜法的具体操作为：
将烘烤后的锅具本体放入镀膜室内，将镀膜室关闭并抽真空；
控制镀膜室内的沉积压力P1、溅射靶的材料、溅射功率P2、氩气流量Q1、乙炔流量Q2、基材温度T1和沉积时间t1，执行锅具本体的溅射镀膜。溅射法的参数控制见下表5：
表5：溅射法的参数控制表
Figure PCTCN2016104783-appb-000005
在具体实施例中，沉积压力P1、溅射靶材、溅射功率P2、氩气Ar流量Q1、乙炔C2H2流量Q2、基材温度T1和沉积时间t1，与镀膜厚度和SiC膜耐磨性能见下表6：
表6：溅射法的参数控制与镀膜厚度和耐磨性能
Figure PCTCN2016104783-appb-000006
溅射镀膜法处理后的SiC膜具有粘着力强、均镀能力好、被镀基体材料和镀层材料可以广泛搭配等优点；同时，SiC膜的厚度可以控制在1.0μm至5.0μm之间。
在本发明的描述中，需要理解的是，术语“中心”、“长度”、“宽度”、“上”、“下”、“竖直”、“水平”、“顶”、“底”、“内”等指示的方位或位置关系为基于附 图所示的方位或位置关系，仅是为了便于描述本发明和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本发明的限制。
在本发明中，除非另有明确的规定和限定，术语“安装”、“相连”、“连接”、“固定”等术语应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或成一体；可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通或两个元件的相互作用关系。对于本领域的普通技术人员而言，可以根据具体情况理解上述术语在本发明中的具体含义。
在本发明中，除非另有明确的规定和限定，第一特征在第二特征之“上”或之“下”可以包括第一和第二特征直接接触，也可以包括第一和第二特征不是直接接触而是通过它们之间的另外的特征接触。而且，第一特征在第二特征“之上”、“上方”和“上面”包括第一特征在第二特征正上方和斜上方，或仅仅表示第一特征水平高度高于第二特征。第一特征在第二特征“之下”、“下方”和“下面”包括第一特征在第二特征正下方和斜下方，或仅仅表示第一特征水平高度小于第二特征。
以上对本发明的石墨锅具及其制作方法进行了详细介绍，本文中应用了具体个例对本发明的原理及实施方式进行了阐述。以上实施例的说明只是用于帮助理解本发明的核心思想；同时，对于本领域的一般技术人员，依据本发明的思想，在具体实施方式及应用范围上均会有改变之处，综上所述，本说明书内容不应理解为对本发明的限制。

Claims (20)

  1. 一种石墨锅具，包括由石墨制成的锅具本体，所述锅具本体具有内壁和外壁，其特征在于，至少所述内壁上附着有硬质碳膜。
  2. 根据权利要求1所述的石墨锅具，其特征在于，所述硬质碳膜的表面附着有不粘涂层。
  3. 根据权利要求1或2所述的石墨锅具，其特征在于，所述外壁上附着有不粘涂层或硬质碳膜。
  4. 根据权利要求1或2所述的石墨锅具，其特征在于，所述硬质碳膜的厚度位于1.0μm至50μm之间。
  5. 根据权利要求4所述的石墨锅具，其特征在于，所述硬质碳膜的厚度位于10μm至30μm之间。
  6. 一种石墨锅具，包括由石墨制成的锅具本体，所述锅具本体具有内壁和外壁，其特征在于，至少所述内壁上附着有共价型碳化物膜。
  7. 根据权利要求6所述的石墨锅具，其特征在于，所述共价型碳化物膜的表面附着有不粘涂层。
  8. 根据权利要求6或7所述的石墨锅具，其特征在于，所述外壁上附着有不粘涂层或共价型碳化物膜。
  9. 根据权利要求6或7所述的石墨锅具，其特征在于，所述共价型碳化物膜的厚度位于1.0μm至5.0μm之间。
  10. 根据权利要求9所述的石墨锅具，其特征在于，所述共价型碳化物膜的厚度位于2.5μm至3.5μm之间。
  11. 根据权利要求6或7所述的石墨锅具，其特征在于，所述共价型碳化物膜为碳化硅膜、碳化硼膜或碳化钛膜。
  12. 一种石墨锅具的制作方法，其特征在于，包括以下步骤：
    将石墨成型成锅具本体；
    将锅具本体通过化学气相沉积法镀膜处理或物理气相沉积法镀膜处理，在所述锅具本体的表面上形成硬质碳膜。
  13. 根据权利要求12所述的石墨锅具的制作方法，其特征在于，所述化 学气相沉积法镀膜处理的具体操作为：
    将烘烤后的锅具本体放入镀膜室内，将镀膜室关闭并抽真空；
    控制所述镀膜室内的气压P1、回收压力P2、辉光棒的功率P3、氩气流量Q1、氢气流量Q2、甲烷流量Q3、锅具本体的基材温度T1和沉积时间t1，执行锅具本体的化学气相沉积法镀膜。
  14. 根据权利要求13所述的石墨锅具的制作方法，其特征在于，所述气压P1、回收压力P2、辉光棒的功率P3、氩气流量Q1、氢气流量Q2、甲烷流量Q3、锅具本体的基材温度T1和沉积时间t1满足如下关系：
    P1范围为0.5kpa至7kpa、P2范围为50kpa至150kpa、P3范围为2kw至20kw、Q1范围为1SLM至10SLM、Q2范围为0.5SLM至4.5SLM、Q3范围为0.02SLM至0.6SLM、T1范围为850℃至930℃和t1范围为1小时至12小时。
  15. 根据权利要求12所述的石墨锅具的制作方法，其特征在于，物理气相沉积法镀膜处理的具体操作为：
    将烘烤后的锅具本体放入镀膜室内，将镀膜室关闭并抽真空；
    控制所述镀膜室内的本底压力P4、成膜压力P5、溅射功率P6、偏压Vbias、氩气流量Q4、甲烷或者乙炔流量Q5、锅具本体的基材温度T2和沉积时间t2，执行锅具本体的物理气相沉积法镀膜处理。
  16. 根据权利要求15所述的石墨锅具的制作方法，其特征在于，所述本底压力P4、成膜压力P5、溅射功率P6、偏压Vbias、氩气流量Q4、甲烷或者乙炔流量Q5、锅具本体的基材温度T2和沉积时间t2满足如下关系：
    P4范围为0.5x10-2Pa至0.5x10-3Pa、P5范围为2.0x1.0-1Pa至8.0x1.0-1Pa、P6范围为10kw至20kw、Vbias范围为100V至300V、Q4范围为0.2SLM至0.7SLM、Q5范围为0.10SLM至2.0SLM、T2范围为130℃至200℃和t2范围为3小时至5小时。
  17. 一种石墨锅具的制作方法，其特征在于，包括以下步骤：
    将所述石墨成型成锅具本体；
    将锅具本体通过物理气相沉积法镀膜处理，在所述锅具本体的表面上形成共价型碳化物膜。
  18. 根据权利要求17所述的石墨锅具的制作方法，其特征在于，所述物 理气相沉积法镀膜处理为溅射镀膜法。
  19. 根据权利要求18所述的石墨锅具的制作方法，其特征在于，所述溅射镀膜法的具体操作为：
    将烘烤后的锅具本体放入镀膜室内，将镀膜室关闭并抽真空；
    控制所述镀膜室内的沉积压力P1、溅射靶的材料、溅射功率P2、氩气流量Q1、乙炔流量Q2、基材温度T1和沉积时间t1，执行锅具本体的溅射镀膜。
  20. 根据权利要求19所述的石墨锅具的制作方法，其特征在于，所述沉积压力P1、溅射靶的材料、溅射功率P2、氩气流量Q1、乙炔流量Q2、基材温度T1和沉积时间t1满足如下关系：
    P1范围为0.5x10-1Pa～5.0x10-1Pa、溅射靶的材料为硅、硼或钛、P2为5kw～20kw、Q1为0.05SLM～3.0SLM、Q2为0.04SLM～0.10SLM、T1为110℃～130℃，t2为1.5～4小时。
PCT/CN2016/104783 2016-04-15 2016-11-04 一种石墨锅具及其制作方法 Ceased WO2017177666A1 (zh)

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