WO2017150090A1 - Epoxy resin curing accelerator - Google Patents

Epoxy resin curing accelerator Download PDF

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Publication number
WO2017150090A1
WO2017150090A1 PCT/JP2017/004336 JP2017004336W WO2017150090A1 WO 2017150090 A1 WO2017150090 A1 WO 2017150090A1 JP 2017004336 W JP2017004336 W JP 2017004336W WO 2017150090 A1 WO2017150090 A1 WO 2017150090A1
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group
epoxy resin
general formula
curing accelerator
carbon atoms
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PCT/JP2017/004336
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French (fr)
Japanese (ja)
Inventor
礼翼 陳
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サンアプロ株式会社
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used

Definitions

  • the present invention relates to an epoxy resin curing accelerator. More specifically, the present invention relates to an epoxy resin curing accelerator made of a quaternary phosphonium salt, which is suitable for manufacturing an epoxy resin-based sealing material for electronic parts such as semiconductors.
  • an epoxy resin is excellent in moldability and electrical properties of a cured product, and is used, for example, as a sealing material for electronic parts such as a semiconductor sealing material.
  • a sealing material resin an epoxy resin in which a phenol novolac is used as a curing agent and a large amount of filler is blended is widely used.
  • a curing accelerator which is a component of a sealing material, is also increasing.
  • TPP-K tetraphenylborate salt of tetraphenylphosphonium
  • TPP-K has low catalytic activity as it is, curing does not proceed sufficiently if it is simply blended with an epoxy resin and a curing agent, but it is blended with phenol resin in advance and heated to convert tetraphenylborate salt to phenol resin salt. There is a problem that a small amount of toxic benzene is produced at this time.
  • a salt of TPP with an alkyl quaternized phosphonium phenol resin see Patent Documents 1 and 2 has been proposed.
  • a sealing material composition containing a high concentration of inorganic filler when a phenol resin salt of alkyl quaternized phosphonium of TPP is used as a curing accelerator, a mixture of an epoxy resin, a curing agent and a curing accelerator is heated. Since the viscosity of the melted liquid mixture increases, the so-called poor liquid flow property, in which the wiring of the semiconductor chip is swept away during mold filling, or the viscosity increases before the compound reaches every corner, resulting in unfilled parts. Cause.
  • an object of the present invention is to provide an epoxy resin curing accelerator that is excellent in fluidity at the time of mold filling and has high catalytic activity and excellent curability.
  • the present invention relates to a phosphonium salt (S) comprising a quaternary phosphonium (A) represented by the general formula (1) and an anion of the organic phenol compound (B) represented by the general formula (2), the general formula ( An epoxy resin curing accelerator (Q) comprising the organic phenol compound (B) represented by 2) and the organic phenol compound (C) represented by the general formula (3).
  • R 1 to R 3 represent an aryl group having 6 to 12 carbon atoms
  • R 4 represents an alkyl group having 1 to 8 carbon atoms or an aryl group having 6 to 12 carbon atoms.
  • R 5 to R 8 are the same or different and each represents hydrogen, an alkyl group having 1 to 4 carbon atoms, or a hydroxyl group, and R 9 represents an alkyl group having 1 to 18 carbon atoms, It represents a 6-18 aryl group, a hydroxyalkyl group having 1-18 carbon atoms, a benzyl group, or an allyl group.
  • R 10 represents hydrogen, an alkyl group having 1 to 18 carbon atoms or an aryl group having 6 to 18 carbon atoms
  • R 11 represents a functional group having 6 to 50 carbon atoms containing a phenol group.
  • this invention has quaternary phosphonium (A), hardening of reaction of an epoxy resin and a hardening
  • the anion of the organic phenol compound (B), the organic phenol compound (B), and the organic phenol compound (C) each have a hydrogen-bondable hydroxyl group
  • the interaction between the molecules of the organic phenol compound (C) is strong, the distance between the molecules becomes short, and the anion of the organic phenol compound (B) becomes the organic phenol compound (B) and the organic phenol compound (C ).
  • the nucleophilicity of the anion of the organic phenol compound (B) was suppressed.
  • the phosphonium salt (S) becomes less active, so that the curing reaction can be suppressed, and the ester structure has flexibility and is mold-filled. Excellent fluidity.
  • the hydrogen bond between the anion of the organic phenol compound (B), the organic phenol compound (B) and the organic phenol compound (C) is weakened, and the phosphonium salt (S) is activated, so that the curability is improved. Excellent.
  • the epoxy resin curing accelerator (Q) of the present invention is excellent in fluidity at the time of mold filling, and has high catalytic activity and excellent curability, so it is suitable for production of epoxy resin-based sealing materials for electronic parts such as semiconductors. It is.
  • the epoxy resin curing accelerator (Q) of the present invention is a phosphonium salt comprising a quaternary phosphonium (A) represented by the general formula (1) and an anion of the organic phenol compound (B) represented by the general formula (2).
  • the cation of the quaternary phosphonium (A) is an essential component for promoting the reaction between the epoxy resin and the curing agent, and is represented by the following general formula (1).
  • R 1 to R 3 represent an aryl group having 6 to 12 carbon atoms
  • R 4 represents an alkyl group having 1 to 8 carbon atoms or an aryl group having 6 to 12 carbon atoms.
  • Examples of the aryl group having 6 to 12 carbon atoms constituting R 1 to R 4 in the general formula (1) include, for example, phenyl group, naphthyl group, biphenyl group, methylphenyl group, ethylphenyl group, propylphenyl group, butyl A phenyl group, a methyl naphthyl group, an ethyl naphthyl group, etc. are mentioned.
  • Examples of the alkyl group having 1 to 8 carbon atoms constituting R 4 include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group, n-pentyl group, isopentyl group, neopentyl group, t-pentyl group, n-hexyl group, 1-methylpentyl group, 4-methyl-2-pentyl group, 3,3-dimethylbutyl group, 2-ethylbutyl group, n -Heptyl group, 1-methylhexyl group, n-octyl group, tert-octyl group, 1-methylheptyl group, 2-ethylhexyl group, 2-propylpentyl group and the like.
  • R 1 to R 3 are preferably a phenyl group, a methylphenyl group, and a naphthyl group, and more preferably a phenyl group, from the viewpoint of fluidity after melt-kneading and availability of raw materials.
  • R 4 is preferably an alkyl group having 1 to 4 carbon atoms and an aryl group having 6 to 12 carbon atoms, more preferably a methyl group, an ethyl group and phenyl group from the viewpoints of curability and ease of synthesis. Group, particularly preferably a methyl group or an ethyl group.
  • the organic phenol compound (B) of the present invention is an essential component for improving fluidity after melt-kneading and curing at the curing temperature after mold filling, and is represented by the following general formula (2).
  • R 5 to R 8 are the same or different and each represents hydrogen, an alkyl group having 1 to 4 carbon atoms, or a hydroxyl group, and R 9 represents an alkyl group having 1 to 18 carbon atoms, An aryl group having 6 to 18 carbon atoms, a hydroxyalkyl group having 1 to 18 carbon atoms, a benzyl group, or an allyl group is represented.
  • R 5 to R 8 are the same or different and each represents hydrogen, an alkyl group having 1 to 4 carbon atoms, or a hydroxyl group
  • R 9 represents an alkyl group having 1 to 18 carbon atoms
  • An aryl group having 6 to 18 carbon atoms, a hydroxyalkyl group having 1 to 18 carbon atoms, a benzyl group, or an allyl group is represented.
  • Examples of the alkyl group having 1 to 4 carbon atoms constituting R 5 to R 8 in the general formula (2) include, for example, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl. Group, tert-butyl group and the like.
  • Examples of the alkyl group having 1 to 18 carbon atoms constituting R 9 in the general formula (2) include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a sec-butyl group, and a tert group.
  • Examples of the aryl group having 6 to 18 carbon atoms constituting R 9 in the general formula (2) include a phenyl group, a naphthyl group, a biphenyl group, a methylphenyl group, an ethylphenyl group, a propylphenyl group, a butylphenyl group, A methyl naphthyl group, an ethyl naphthyl group, etc. are mentioned.
  • Examples of the hydroxyalkyl group having 1 to 18 carbon atoms constituting R 9 in the general formula (2) include a hydroxymethyl group, a hydroxyethyl group, a hydroxypropyl group, and a hydroxybutyl group.
  • the method for synthesizing the phosphonium salt (S) is not particularly limited.
  • the alkyl carbonate (A1) of the quaternary phosphonium (A) can be obtained, for example, by reacting a corresponding tertiary phosphine with a carbonic acid diester.
  • the production conditions are 10 to 200 hours in an autoclave at a temperature of 50 to 150 ° C., and a reaction solvent is preferably used in order to complete the reaction quickly and with a good yield.
  • a reaction solvent Methanol, ethanol, etc. are preferable.
  • the amount of the solvent is not particularly limited.
  • Examples of the corresponding tertiary phosphine include triphenylphosphine, tris (4-methylphenyl) phosphine, 2- (diphenylphosphino) biphenyl, and the like.
  • the carbonic acid diester is not particularly limited as long as it is a known one, and specifically, diethyl carbonate, dimethyl carbonate, dibutyl carbonate, diphenyl carbonate and the like are used.
  • the quaternary phosphonium (A) hydroxide (A2) is obtained by, for example, reacting a corresponding tertiary phosphine with a halogenated (bromine or chlorine) alkyl or halogenated (bromine or chlorine) aryl. Later, it is obtained by salt exchange with an inorganic alkali.
  • the production conditions are a temperature of 20 to 150 ° C. and a time of 1 to 20 hours, and a reaction solvent is preferably used in order to complete the reaction quickly and with a good yield. Although it does not specifically limit as a reaction solvent, Methanol, ethanol, etc. are preferable.
  • the amount of the solvent is not particularly limited.
  • Examples of the corresponding tertiary phosphine include those described above.
  • Examples of the halogenated alkyl include ethyl bromide, butyl chloride, 2-ethylhexyl bromide, 2-butylethanol, 2-chloropropanol and the like, and examples of the halogenated aryl include bromobenzene, bromonaphthalene and bromobiphenyl.
  • Examples of the inorganic alkali include sodium hydroxide, potassium hydroxide, calcium hydroxide, barium hydroxide, and aluminum hydroxide.
  • the production conditions are as follows. While reacting for 20 hours, by-produced alcohol, water, carbon dioxide gas, and reaction solvent are removed if necessary.
  • the anion comprising the organic phenol compound (B) has an intramolecular hydrogen bond (formula (6))
  • the nucleophilicity is suppressed, thereby heating the mixture of epoxy resin, curing agent and curing accelerator.
  • the phosphonium salt (S) becomes less active so that the curing reaction is suppressed and the fluidity at the time of mold filling is excellent.
  • the organic phenol compound (B) has the following advantages from the viewpoint of curability. Those are preferred.
  • R 5 is a hydroxyl group
  • R 6 and R 7 are hydrogen
  • R 8 is a hydroxyl group
  • C A compound in which R 6 is a hydroxyl group, and R 5 , R 7 , and R 8 are the same or different and each is hydrogen or a hydroxyl group.
  • D A compound in which R 6 is a hydroxyl group, and R 5 , R 7 , and R 8 are hydrogen.
  • the organic phenol compound (C) is an essential component for interacting with the anion of the organic phenol compound (B) in the phosphonium salt (S), suppressing the activity during melt kneading and improving fluidity, It is an essential component for improving the curability at the time of sealing, and is represented by the following general formula (3).
  • R 10 represents hydrogen, an alkyl group having 1 to 18 carbon atoms or an aryl group having 6 to 18 carbon atoms
  • R 11 represents a functional group having 6 to 50 carbon atoms containing a phenol group.
  • the compound R 11 is represented by the general formula (5) may be preferably mentioned.
  • R 12 and R 13 represent hydrogen, an alkyl group having 1 to 38 carbon atoms, and an aryl group having 1 to 38 carbon atoms.
  • the molar ratio of the phosphonium salt (S) and the organic phenol compound (B) is usually 10/90 to 99.9 / 0.1 from the viewpoint of easy interaction with the anion of the phenol (B), preferably Is 20/80 to 80/20, particularly preferably 30/70 to 70/30.
  • the molar ratio of the phosphonium salt (S) and the organic phenol compound (C) is usually 10/90 to 99.9 / 0.1 from the viewpoint of easy interaction with the anion of the phenol (C), preferably Is 20/80 to 80/20, particularly preferably 30/70 to 70/30.
  • the epoxy resin curing accelerator (Q) is usually obtained by uniformly mixing a phosphonium salt (S), an organic phenol compound (B), and an organic phenol compound (C) at a temperature of 50 to 200 ° C. for 1 to 20 hours. Can be obtained.
  • a solvent may be used in order to complete the mixing quickly. After uniform mixing, the solvent and the like are removed at a temperature of 50 to 200 ° C. under reduced pressure to normal pressure.
  • the solvent is not particularly limited, but methanol, ethanol and the like are preferable.
  • the mixing ratio of the phosphonium salt (S) and the organic phenol compound (B) is appropriately determined from the molar ratio of the phosphonium salt (S) and the organic phenol compound (B).
  • the blending ratio of the phosphonium salt (S) and the organic phenol compound (C) is appropriately determined from the molar ratio of the phosphonium salt (S) and the organic phenol compound (C).
  • the epoxy resin curing accelerator (Q) includes a method of lowering the softening point by making a masterbatch with a low viscosity phenol resin, a method of pulverizing and powdering, etc. You can go.
  • the low viscosity phenol resin include bisphenol A, bisphenol F, phenol novolac resin, cresol novolac resin, and phenol aralkyl resin.
  • a known method can be used as a master batch method.
  • the softening point of the epoxy resin curing accelerator (Q) is usually 70 to 150 ° C, preferably 80 to 120 ° C, more preferably 90 to 100 ° C.
  • the temperature is lower than 70 ° C., it is not preferable because fusion during pulverization or block formation during storage of the powdered accelerator is likely to occur, and if it exceeds 150 ° C., the curing accelerator is melted with the epoxy resin. This is because they cannot be mixed and become non-uniform, which tends to cause curing failure.
  • a powdery curing accelerator can be obtained by pulverization with an impact pulverizer or the like.
  • the particle size of the powdery curing accelerator is preferably 100% or more (measured by an air jet sieve method or the like) 95% or more. This is because if it is less than 95%, uniform dissolution in the epoxy resin composition tends to be hindered, which causes poor curing.
  • the epoxy resin curing accelerator (Q) of the present invention is used by being added to a mixture in which other additives such as an epoxy resin, a curing agent and a filler are blended as required, and finally a cured epoxy resin is obtained.
  • the compounding amount of the epoxy resin curing accelerator (Q) is adjusted according to the reactivity of the epoxy resin and the curing agent, but is usually 1 to 25 parts by mass, preferably 2 to 20 parts by mass with respect to 100 parts by mass of the epoxy resin. It is. What is necessary is just to set the optimal compounding quantity according to the hardening characteristic etc. which are requested
  • ⁇ Production Example 1> ⁇ Method for producing quaternary phosphonium base (A-Be1)>
  • 180 parts of dimethyl carbonate (manufactured by Tokyo Chemical Industry Co., Ltd.) and 224 parts of methanol as a solvent are charged, and 262 parts of triphenylphosphine (manufactured by Tokyo Chemical Industry Co., Ltd.) are charged therein, and the reaction temperature is increased. The reaction was performed at 125 ° C. for 80 hours. Next, 120 parts of methanol was removed under reduced pressure, and 1200 parts of toluene was added to precipitate crystals. This crystal was isolated and dissolved again in methanol to obtain a solution (solid content concentration 50%) of triphenylmethylphosphonium monomethyl carbonate as a quaternary phosphonium base (A-Be1).
  • ⁇ Production Example 2> ⁇ Method for producing quaternary phosphonium base (A-Be2)> Instead of 262 parts of triphenylphosphine in Production Example 1, 304 parts of tris (4-methylphenyl) phosphine (manufactured by Tokyo Chemical Industry Co., Ltd.) and diethyl carbonate (manufactured by Tokyo Chemical Industry Co., Ltd.) instead of dimethyl carbonate
  • the quaternary phosphonium base (A-Be2) was used as a quaternary phosphonium base (A-Be2) except that the reaction temperature was 130 ° C. and the reaction time was 150 hours. A solution (solid concentration 50%) was obtained.
  • ⁇ Production Example 3> ⁇ Method for producing quaternary phosphonium base (A-Be3)> A glass round bottom three-necked flask equipped with a dropping funnel and a reflux tube was charged with 419 parts of tetraphenylphosphonium bromide (manufactured by Tokyo Chemical Industry Co., Ltd.) and 1000 parts of methanol, and dissolved uniformly, and then 40 parts of sodium hydroxide. was slowly added and reacted at room temperature for 5 hours, and the precipitated salt was removed to obtain a tetraphenylphosphonium hydroxide solution (solid content concentration 25%) as a quaternary phosphonium base (A-Be3).
  • tetraphenylphosphonium bromide manufactured by Tokyo Chemical Industry Co., Ltd.
  • ⁇ Comparative Production Example 1> ⁇ Method for producing quaternary phosphonium base (A-Be'1)> In a stirring autoclave, 180 parts of dimethyl carbonate and 224 parts of methanol as a solvent were added, and 202 parts of tributylphosphine was added dropwise thereto, and reacted at a reaction temperature of 125 ° C. for 20 hours to give a quaternary phosphonium base ( A solution of tributylmethylphosphonium monomethyl carbonate (solid content concentration 50%) was obtained as A-Be′1).
  • Example 1 Into a glass round bottom three-necked flask equipped with a dropping funnel and a reflux tube, 704 parts of the quaternary phosphonium base (A-Be1) produced in Production Example 1 was placed, and 4-hydroxybenzoic acid was adjusted while controlling the temperature at 50 ° C. 400 parts of butyl acid (manufactured by Tokyo Chemical Industry Co., Ltd.) was dividedly added, and 305 parts of 1,1,1-tris (4-hydroxyphenyl) ethane (manufactured by Tokyo Chemical Industry Co., Ltd.) were dividedly charged. The temperature was raised to 175 ° C.
  • the molar ratio of the phosphonium salt (S), the organic phenol compound (B), and the organic phenol compound (C) in (Q-1) was 1.00 / 1.06 / 1.00.
  • Example 2 Instead of 400 parts of butyl 4-hydroxybenzoate in Example 1, 400 parts of phenyl 4-hydroxybenzoate (manufactured by Tokyo Chemical Industry Co., Ltd.), 305 parts of 1,1,1-tris (4-hydroxyphenyl) ethane Instead, an epoxy resin curing accelerator (Q-2) was used in the same manner as in Example 1 except that 305 parts of 4,4 ′, 4 ′′ -trihydroxytriphenylmethane (Tokyo Chemical Industry Co., Ltd.) was changed. Got. The molar ratio of the phosphonium salt (S), the organic phenol compound (B), and the organic phenol compound (C) in (Q-2) was 1.00 / 0.87 / 1.05.
  • Example 3 Instead of the quaternary phosphonium base (A-Be1) in Example 1, the quaternary phosphonium base (A-Be2) prepared in Preparation Example 2 was used instead of butyl 4-hydroxybenzoate, and 3,4-dihydroxybenzoate was used.
  • An epoxy resin curing accelerator (Q-3) was obtained in the same manner as in Example 1 except for changing to 400 parts of methyl acid (Tokyo Chemical Industry Co., Ltd.).
  • the molar ratio of the phosphonium salt (S), the organic phenol compound (B), and the organic phenol compound (C) in (Q-3) was 1.00 / 1.38 / 1.00.
  • Example 4 Instead of 704 parts of the quaternary phosphonium base (A-Be1) in Example 1, 1200 parts of the quaternary phosphonium base (A-Be3) prepared in Preparation Example 3, 2,4 instead of butyl 4-hydroxybenzoate -400 parts of methyl dihydroxybenzoate (manufactured by Tokyo Chemical Industry Co., Ltd.), ⁇ , ⁇ , ⁇ '-tris (4-hydroxyphenyl) instead of 305 parts of 1,1,1-tris (4-hydroxyphenyl) ethane ) Epoxy resin curing accelerator (Q-4) was obtained in the same manner as in Example 1, except that the amount was changed to 305 parts of 1-ethyl-4-isopropylbenzene (manufactured by Tokyo Chemical Industry Co., Ltd.). The molar ratio of the phosphonium salt (S), the organic phenol compound (B), and the organic phenol compound (C) in (Q-4) was 1.00 / 1.38 / 0.71.
  • Example 5 In the same manner as in Example 1, except that 400 parts of methyl 3,4-dihydroxy-2-methylbenzoate (Tokyo Chemical Industry Co., Ltd.) was used instead of butyl 4-hydroxybenzoate in Example 1, An epoxy resin curing accelerator (Q-5) was obtained.
  • the molar ratio of the phosphonium salt (S), the organic phenol compound (B), and the organic phenol compound (C) in (Q-5) was 1.00 / 1.20 / 1.00.
  • Example 6 An epoxy resin curing accelerator (Q-6) was used in the same manner as in Example 1 except that 400 parts of ethyl gallate (manufactured by Tokyo Chemical Industry Co., Ltd.) was used instead of butyl 4-hydroxybenzoate in Example 1. ) The molar ratio of the phosphonium salt (S), the organic phenol compound (B), and the organic phenol compound (C) in (Q-6) was 1.00 / 1.02 / 1.00.
  • Epoxy resin curing accelerators (Q-1) to (Q-6) of the present invention prepared in Examples 1 to 6 and comparative epoxy resin curing accelerators (Q'-) prepared in Comparative Examples 1 to 5 The fluidity and curability of 1) to (Q′-5) were evaluated by the following methods.
  • the flow value (unit: cm) of the spiral flow at 175 ° C. (70 kg / cm 2) was measured according to the method of EMMI 1-66 and used as an index of fluidity.
  • Curing meter V-type manufactured by Nichigo Shoji Co., Ltd., trade name
  • Curing meter V-type is used to set the curing torque for each of the above sealants under the conditions of a temperature of 175 ° C., a resin die P-200 and an amplitude angle of ⁇ 1 °.
  • the point at which the curing torque rises is the gel time (unit: seconds), and the value of the curing torque (unit: kgf ⁇ cm) 90 seconds after the start of measurement is used as an index of curability (strength and hardness at demolding). did.
  • Table 1 shows the evaluation results of the epoxy resin curing accelerator (Q) obtained in Examples 1 to 6 and Comparative Examples 1 to 5.
  • the epoxy resin curing accelerators (Q) of Examples 1 to 6 of the present invention have a high flow value of the sealant after melt-kneading and excellent fluidity, and also have a curing torque. It can be seen that it is high and excellent in curability.
  • Comparative Example 1 comprising a tetraalkylphosphonium cation
  • the flow value of the sealant after the melt mixing is very low because the stability of the phosphonium cation is low, and the moldability is poor.
  • Comparative Examples 2, 4, and 5 that do not contain an ester group having a flexible structure since the structure is rigid, it can be seen that the flow of the blend is poor and the flow value is low.
  • the epoxy resin curing accelerator (Q) of the present invention is useful for producing an epoxy resin-based encapsulant for electronic parts such as semiconductors because it has excellent fluidity and curability after melt-kneading.

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
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  • Compositions Of Macromolecular Compounds (AREA)

Abstract

Provided is an epoxy resin curing accelerator having exceptional fluidity during mold filling as well as high catalytic activity and exceptional curability. The present invention is an epoxy resin curing accelerator (Q) characterized by including a phosphonium salt (S) that comprises a quaternary phosphonium (A) represented by general formula (1) and an anion of an organic phenol compound (B) represented by general formula (2), the organic phenol compound (B) represented by general formula (2), and an organic phenol compound (C) represented by general formula (3). [In formula (1), R1-R3 represent C6-12 aryl groups, and R4 represents a C1-8 alkyl group or the like. In formula (2), R5-R8 are the same or different and each represent hydrogen, a C1-4 alkyl group, or the like, and R9 represents a C1-18 alkyl group or the like. In formula (3), R10 represents hydrogen, a C1-18 alkyl group, or the like, and R11 represents a C6-50 functional group containing a phenol group.]

Description

エポキシ樹脂硬化促進剤Epoxy resin curing accelerator
 本発明は、エポキシ樹脂硬化促進剤に関する。さらに詳しくは、半導体などの電子部品用のエポキシ樹脂系封止材の製造に適した、第4級ホスホニウム塩からなるエポキシ樹脂硬化促進剤に関する。 The present invention relates to an epoxy resin curing accelerator. More specifically, the present invention relates to an epoxy resin curing accelerator made of a quaternary phosphonium salt, which is suitable for manufacturing an epoxy resin-based sealing material for electronic parts such as semiconductors.
 従来より、エポキシ樹脂は成形性および硬化物の電気特性などに優れるため、例えば、半導体封止材などの電子部品の封止材用途に使用される。封止材樹脂としては、硬化剤としてフェノールノボラック類を用い多量のフィラーなどを配合したエポキシ樹脂が広く使用されている。近年、半導体の高集積化、薄型化または実装方式の改良などに伴い、封止材の成形性、および封止された半導体の信頼性の向上などが強く要望されている。この要望に対して封止材の一成分である硬化促進剤の役割も大きくなっている。
これらエポキシ樹脂の硬化促進剤として、テトラフェニルホスホニウムのテトラフェニルボレート塩(以下、TPP-Kと略する)が一般的に使用されている。
Conventionally, an epoxy resin is excellent in moldability and electrical properties of a cured product, and is used, for example, as a sealing material for electronic parts such as a semiconductor sealing material. As a sealing material resin, an epoxy resin in which a phenol novolac is used as a curing agent and a large amount of filler is blended is widely used. In recent years, there has been a strong demand for improving the moldability of a sealing material and the reliability of a sealed semiconductor, as the semiconductor is highly integrated, thinned, or improved in mounting method. In response to this demand, the role of a curing accelerator, which is a component of a sealing material, is also increasing.
As a curing accelerator for these epoxy resins, tetraphenylborate salt of tetraphenylphosphonium (hereinafter abbreviated as TPP-K) is generally used.
しかし、TPP-Kはそのままでは触媒活性が低いため、エポキシ樹脂および硬化剤に単に配合しただけでは硬化が十分に進まず、予めフェノール樹脂に配合して加熱してテトラフェニルボレート塩をフェノール樹脂塩に変換しておく必要があり、このときに毒性のあるベンゼンが微量だが生成するという問題がある。
この問題の改良として、TPPのアルキル第4級化ホスホニウムのフェノール樹脂との塩(特許文献1および2参照)が提案されている。
However, since TPP-K has low catalytic activity as it is, curing does not proceed sufficiently if it is simply blended with an epoxy resin and a curing agent, but it is blended with phenol resin in advance and heated to convert tetraphenylborate salt to phenol resin salt. There is a problem that a small amount of toxic benzene is produced at this time.
As an improvement of this problem, a salt of TPP with an alkyl quaternized phosphonium phenol resin (see Patent Documents 1 and 2) has been proposed.
しかしながら、無機充填材を高濃度に配合する封止材組成では、TPPのアルキル第4級化ホスホニウムのフェノール樹脂塩を硬化促進剤として用いる場合、エポキシ樹脂、硬化剤および硬化促進剤の混合物を加熱溶融させた配合液の粘度が高くなるため、モールド充填時に半導体チップの配線を押し流したり、配合物が隅々まで行き渡る前に粘度が上昇し、未充填部分ができたりする、いわゆる液流れ性不良の原因となる。 However, in a sealing material composition containing a high concentration of inorganic filler, when a phenol resin salt of alkyl quaternized phosphonium of TPP is used as a curing accelerator, a mixture of an epoxy resin, a curing agent and a curing accelerator is heated. Since the viscosity of the melted liquid mixture increases, the so-called poor liquid flow property, in which the wiring of the semiconductor chip is swept away during mold filling, or the viscosity increases before the compound reaches every corner, resulting in unfilled parts. Cause.
特開2004-256643号公報JP 2004-256663 A 特開2005-162944号公報JP 2005-162944 A
 そこで、モールド充填時に流動性に優れ、かつ触媒活性が高く硬化性に優れるエポキシ樹脂硬化促進剤を提供することを目的とする。 Therefore, an object of the present invention is to provide an epoxy resin curing accelerator that is excellent in fluidity at the time of mold filling and has high catalytic activity and excellent curability.
 本発明者らは、上記の目的を達成するべく検討を行った結果、本発明に到達した。
 すなわち、本発明は、一般式(1)で示される第4級ホスホニウム(A)と一般式(2)で示される有機フェノール化合物(B)のアニオンとからなるホスホニウム塩(S)、一般式(2)で示される有機フェノール化合物(B)および一般式(3)で示される有機フェノール化合物(C)を含むことを特徴とするエポキシ樹脂硬化促進剤(Q)である。
The inventors of the present invention have reached the present invention as a result of studies to achieve the above object.
That is, the present invention relates to a phosphonium salt (S) comprising a quaternary phosphonium (A) represented by the general formula (1) and an anion of the organic phenol compound (B) represented by the general formula (2), the general formula ( An epoxy resin curing accelerator (Q) comprising the organic phenol compound (B) represented by 2) and the organic phenol compound (C) represented by the general formula (3).
Figure JPOXMLDOC01-appb-C000006
Figure JPOXMLDOC01-appb-C000006
[式(1)中、R~Rは、炭素数6~12のアリール基、Rは炭素数1~8のアルキル基または炭素数6~12のアリール基を表す。] [In the formula (1), R 1 to R 3 represent an aryl group having 6 to 12 carbon atoms, and R 4 represents an alkyl group having 1 to 8 carbon atoms or an aryl group having 6 to 12 carbon atoms. ]
Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000007
[式(2)中、R~Rは、同一または異なって、それぞれ水素、炭素数1~4のアルキル基または水酸基を表し、Rは、炭素数1~18のアルキル基、炭素数6~18アリール基、炭素数1~18のヒドロキシアルキル基、ベンジル基、またはアリル基を表す。] [In Formula (2), R 5 to R 8 are the same or different and each represents hydrogen, an alkyl group having 1 to 4 carbon atoms, or a hydroxyl group, and R 9 represents an alkyl group having 1 to 18 carbon atoms, It represents a 6-18 aryl group, a hydroxyalkyl group having 1-18 carbon atoms, a benzyl group, or an allyl group. ]
Figure JPOXMLDOC01-appb-C000008
Figure JPOXMLDOC01-appb-C000008
[式(3)は、R10は水素、炭素数1~18のアルキル基または炭素数6~18のアリール基、R11は、フェノール基を含有する炭素数6~50の官能基を表す。] [In the formula (3), R 10 represents hydrogen, an alkyl group having 1 to 18 carbon atoms or an aryl group having 6 to 18 carbon atoms, and R 11 represents a functional group having 6 to 50 carbon atoms containing a phenol group. ]
 本発明は第4級ホスホニウム(A)を有するため、エポキシ樹脂と硬化剤との反応を硬化促進することができる。
また有機フェノール化合物(B)のアニオンは、電子吸引性のエステル基を有するため、有機フェノール化合物(B)のアニオンの酸強度が見かけ上強くなる。更に、有機フェノール化合物(B)のアニオンと有機フェノール化合物(B)および有機フェノール化合物(C)はそれぞれ水素結合可能な水酸基を有するため、有機フェノール化合物(B)のアニオンと有機フェノール化合物(B)および有機フェノール化合物(C)の分子間の相互作用が強力であり、また、分子間の距離が短くになり、有機フェノール化合物(B)のアニオンが有機フェノール化合物(B)および有機フェノール化合物(C)に包囲される。これより有機フェノール化合物(B)のアニオンの求核性が押さえられた。これによりエポキシ樹脂、硬化剤および硬化促進剤の混合物を加熱溶融する温度では、ホスホニウム塩(S)が活性低くなるため硬化反応を抑制でき、また、エステル構造は、柔軟性を持ち、モールド充填時の流動性が優れる。
一方、モールド充填後の硬化温度では、有機フェノール化合物(B)のアニオンと有機フェノール化合物(B)および有機フェノール化合物(C)の水素結合が弱まり、ホスホニウム塩(S)が活発するため硬化性に優れる。
Since this invention has quaternary phosphonium (A), hardening of reaction of an epoxy resin and a hardening | curing agent can be accelerated | stimulated.
Moreover, since the anion of the organic phenol compound (B) has an electron-withdrawing ester group, the acid strength of the anion of the organic phenol compound (B) is apparently strong. Further, since the anion of the organic phenol compound (B), the organic phenol compound (B), and the organic phenol compound (C) each have a hydrogen-bondable hydroxyl group, the anion of the organic phenol compound (B) and the organic phenol compound (B) And the interaction between the molecules of the organic phenol compound (C) is strong, the distance between the molecules becomes short, and the anion of the organic phenol compound (B) becomes the organic phenol compound (B) and the organic phenol compound (C ). Thereby, the nucleophilicity of the anion of the organic phenol compound (B) was suppressed. As a result, at the temperature at which the mixture of the epoxy resin, the curing agent and the curing accelerator is heated and melted, the phosphonium salt (S) becomes less active, so that the curing reaction can be suppressed, and the ester structure has flexibility and is mold-filled. Excellent fluidity.
On the other hand, at the curing temperature after mold filling, the hydrogen bond between the anion of the organic phenol compound (B), the organic phenol compound (B) and the organic phenol compound (C) is weakened, and the phosphonium salt (S) is activated, so that the curability is improved. Excellent.
 このため本発明のエポキシ樹脂硬化促進剤(Q)はモールド充填時に流動性に優れ、かつ触媒活性が高く硬化性に優れるため、半導体などの電子部品用のエポキシ樹脂系封止材の製造に好適である。 For this reason, the epoxy resin curing accelerator (Q) of the present invention is excellent in fluidity at the time of mold filling, and has high catalytic activity and excellent curability, so it is suitable for production of epoxy resin-based sealing materials for electronic parts such as semiconductors. It is.
本発明のエポキシ樹脂硬化促進剤(Q)は、一般式(1)で示される第4級ホスホニウム(A)と一般式(2)で示される有機フェノール化合物(B)のアニオンとからなるホスホニウム塩(S)、一般式(2)で示される有機フェノール化合物(B)および一般式(3)で示される有機フェノール化合物(C)を含むことを特徴とする The epoxy resin curing accelerator (Q) of the present invention is a phosphonium salt comprising a quaternary phosphonium (A) represented by the general formula (1) and an anion of the organic phenol compound (B) represented by the general formula (2). (S), comprising an organic phenol compound (B) represented by the general formula (2) and an organic phenol compound (C) represented by the general formula (3)
第4級ホスホニウム(A)のカチオンは、エポキシ樹脂と硬化剤との反応を促進するための必須成分であり下記一般式(1)で表される。 The cation of the quaternary phosphonium (A) is an essential component for promoting the reaction between the epoxy resin and the curing agent, and is represented by the following general formula (1).
Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000009
[式(1)中、R~Rは、炭素数6~12のアリール基、Rは炭素数1~8のアルキル基または炭素数6~12のアリール基を表す。] [In the formula (1), R 1 to R 3 represent an aryl group having 6 to 12 carbon atoms, and R 4 represents an alkyl group having 1 to 8 carbon atoms or an aryl group having 6 to 12 carbon atoms. ]
一般式(1)中のR~Rを構成する炭素数6~12のアリール基としては、例えば、フェニル基、ナフチル基、ビフェニル基、メチルフェニル基、エチルフェニル基、プロピルフェニル基、ブチルフェニル基、メチルナフチル基、エチルナフチル基等が挙げられる。 Examples of the aryl group having 6 to 12 carbon atoms constituting R 1 to R 4 in the general formula (1) include, for example, phenyl group, naphthyl group, biphenyl group, methylphenyl group, ethylphenyl group, propylphenyl group, butyl A phenyl group, a methyl naphthyl group, an ethyl naphthyl group, etc. are mentioned.
を構成する炭素数1~8のアルキル基としては、例えば、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、イソブチル基、sec-ブチル基、tert-ブチル基、n-ペンチル基、イソペンチル基、ネオペンチル基、t-ペンチル基、n-ヘキシル基、1-メチルペンチル基、4-メチル-2-ペンチル基、3,3-ジメチルブチル基、2-エチルブチル基、n-ヘプチル基、1-メチルヘキシル基、n-オクチル基、tert-オクチル基、1-メチルヘプチル基、2-エチルヘキシル基、および2-プロピルペンチル基等が挙げられる。 Examples of the alkyl group having 1 to 8 carbon atoms constituting R 4 include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group, n-pentyl group, isopentyl group, neopentyl group, t-pentyl group, n-hexyl group, 1-methylpentyl group, 4-methyl-2-pentyl group, 3,3-dimethylbutyl group, 2-ethylbutyl group, n -Heptyl group, 1-methylhexyl group, n-octyl group, tert-octyl group, 1-methylheptyl group, 2-ethylhexyl group, 2-propylpentyl group and the like.
 R~Rとして、溶融混練後の流動性の観点、および原料の入手のしやすさの観点から、好ましくはフェニル基、メチルフェニル基およびナフチル基、さらに好ましくはフェニル基である。
 Rとしては、硬化性の観点、および合成の容易さの観点から、好ましくは、炭素数1~4のアルキル基および炭素数6~12のアリール基、さらに好ましくはメチル基、エチル基およびフェニル基、特に好ましくはメチル基、エチル基である。
R 1 to R 3 are preferably a phenyl group, a methylphenyl group, and a naphthyl group, and more preferably a phenyl group, from the viewpoint of fluidity after melt-kneading and availability of raw materials.
R 4 is preferably an alkyl group having 1 to 4 carbon atoms and an aryl group having 6 to 12 carbon atoms, more preferably a methyl group, an ethyl group and phenyl group from the viewpoints of curability and ease of synthesis. Group, particularly preferably a methyl group or an ethyl group.
本発明の有機フェノール化合物(B)は、溶融混練後の流動性を向上させ、モールド充填後の硬化温度で硬化させるための必須成分であり、下記一般式(2)で表される。 The organic phenol compound (B) of the present invention is an essential component for improving fluidity after melt-kneading and curing at the curing temperature after mold filling, and is represented by the following general formula (2).
Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000010
[式(2)中、R~Rは、同一または異なって、それぞれ水素、炭素数1~4のアルキル基または水酸基を表し、Rは、炭素数1~18のアルキル基、炭素数6~18のアリール基、炭素数1~18のヒドロキシアルキル基、ベンジル基、またはアリル基を表す。] [In Formula (2), R 5 to R 8 are the same or different and each represents hydrogen, an alkyl group having 1 to 4 carbon atoms, or a hydroxyl group, and R 9 represents an alkyl group having 1 to 18 carbon atoms, An aryl group having 6 to 18 carbon atoms, a hydroxyalkyl group having 1 to 18 carbon atoms, a benzyl group, or an allyl group is represented. ]
一般式(2)中のR~Rを構成する炭素数1~4のアルキル基としては、例えば、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、sec-ブチル基、tert-ブチル基等が挙げられる。 Examples of the alkyl group having 1 to 4 carbon atoms constituting R 5 to R 8 in the general formula (2) include, for example, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl. Group, tert-butyl group and the like.
一般式(2)中のRを構成する炭素数1~18のアルキル基としては、例えば、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、sec-ブチル基、tert-ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、デシル基、ウンデシル基、ドデシル基、トリデシル基、テトラデシル基、ペンタデシル基、ヘキサデシル基、ヘプタデシル基等が挙げられる。 Examples of the alkyl group having 1 to 18 carbon atoms constituting R 9 in the general formula (2) include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a sec-butyl group, and a tert group. -Butyl group, pentyl group, hexyl group, heptyl group, octyl group, nonyl group, decyl group, undecyl group, dodecyl group, tridecyl group, tetradecyl group, pentadecyl group, hexadecyl group, heptadecyl group and the like.
一般式(2)中のRを構成する炭素数6~18のアリール基としては、例えば、フェニル基、ナフチル基、ビフェニル基、メチルフェニル基、エチルフェニル基、プロピルフェニル基、ブチルフェニル基、メチルナフチル基、エチルナフチル基等が挙げられる。 Examples of the aryl group having 6 to 18 carbon atoms constituting R 9 in the general formula (2) include a phenyl group, a naphthyl group, a biphenyl group, a methylphenyl group, an ethylphenyl group, a propylphenyl group, a butylphenyl group, A methyl naphthyl group, an ethyl naphthyl group, etc. are mentioned.
一般式(2)中のRを構成する炭素数1~18のヒドロキシアルキル基としては、例えば、ヒドロキシメチル基、ヒドロキシエチル基、ヒドロキシプロピル基、ヒドロキシブチル基等が挙げられる。 Examples of the hydroxyalkyl group having 1 to 18 carbon atoms constituting R 9 in the general formula (2) include a hydroxymethyl group, a hydroxyethyl group, a hydroxypropyl group, and a hydroxybutyl group.
ホスホニウム塩(S)の合成方法は、特に限定されないが、例えば、第4級ホスホニウム(A)のアルキル炭酸塩(A1)と有機フェノール化合物(B)との塩交換反応、および第4級ホスホニウム(A)の水酸化物(A2)と有機フェノール化合物(B)との塩交換反応等により得られる。 The method for synthesizing the phosphonium salt (S) is not particularly limited. For example, a salt exchange reaction between the alkyl carbonate (A1) of the quaternary phosphonium (A) and the organic phenol compound (B), and a quaternary phosphonium (S It is obtained by a salt exchange reaction between the hydroxide (A2) of A) and the organic phenol compound (B).
第4級ホスホニウム(A)のアルキル炭酸塩(A1)は、例えば、対応する第3級ホスフィンと炭酸ジエステル類とを反応させることで得られる。製造条件としては温度50~150℃にてオートクレーブ中10~200時間であり、反応を速やかに収率良く完結するために、反応溶媒を使用することが好ましい。反応溶媒としては特に限定されるものではないが、メタノール、エタノール等が好ましい。溶媒の量は特に限定されるものではない。 The alkyl carbonate (A1) of the quaternary phosphonium (A) can be obtained, for example, by reacting a corresponding tertiary phosphine with a carbonic acid diester. The production conditions are 10 to 200 hours in an autoclave at a temperature of 50 to 150 ° C., and a reaction solvent is preferably used in order to complete the reaction quickly and with a good yield. Although it does not specifically limit as a reaction solvent, Methanol, ethanol, etc. are preferable. The amount of the solvent is not particularly limited.
対応する第3級ホスフィンとしては、例えば、トリフェニルホスフィン、トリス(4-メチルフェニル)ホスフィン、2-(ジフェニルホスフィノ)ビフェニル等が挙げられる。炭酸ジエステルとしては公知のものであればよく、特に限定するものではないが、具体的にはジエチルカーボネート、ジメチルカーボネート、ジブチルカーボネート、ジフェニルカーボネート等が用いられる。 Examples of the corresponding tertiary phosphine include triphenylphosphine, tris (4-methylphenyl) phosphine, 2- (diphenylphosphino) biphenyl, and the like. The carbonic acid diester is not particularly limited as long as it is a known one, and specifically, diethyl carbonate, dimethyl carbonate, dibutyl carbonate, diphenyl carbonate and the like are used.
 第4級ホスホニウム(A)の水酸化物(A2)は、例えば、対応する第3級ホスフィンとハロゲン化(臭素、または塩素)アルキル、またはハロゲン化(臭素、または塩素)アリールとを反応させた後に、無機アルカリにより塩交換することで得られる。製造条件としては温度20~150℃にて1~20時間であり、反応を速やかに収率良く完結するために、反応溶媒を使用することが好ましい。反応溶媒としては特に限定されるものではないが、メタノール、エタノール等が好ましい。溶媒の量は特に限定されるものではない。 The quaternary phosphonium (A) hydroxide (A2) is obtained by, for example, reacting a corresponding tertiary phosphine with a halogenated (bromine or chlorine) alkyl or halogenated (bromine or chlorine) aryl. Later, it is obtained by salt exchange with an inorganic alkali. The production conditions are a temperature of 20 to 150 ° C. and a time of 1 to 20 hours, and a reaction solvent is preferably used in order to complete the reaction quickly and with a good yield. Although it does not specifically limit as a reaction solvent, Methanol, ethanol, etc. are preferable. The amount of the solvent is not particularly limited.
 対応する第3級ホスフィンとしては上記と同様のものが挙げられる。ハロゲン化アルキルとしては、臭化エチル、塩化ブチル、2-エチルヘキシルブロマイド、2-ブチルエタノール、2-クロロプロパノール等が、ハロゲン化アリールとしては、ブロモベンゼン、ブロモナフタレン、ブロモビフェニル等が挙げられる。
 無機アルカリとしては、水酸化ナトリウム、水酸化カリウム、水酸化カルシウム、水酸化バリウム、および水酸化アルミニウム等が挙げられる。
Examples of the corresponding tertiary phosphine include those described above. Examples of the halogenated alkyl include ethyl bromide, butyl chloride, 2-ethylhexyl bromide, 2-butylethanol, 2-chloropropanol and the like, and examples of the halogenated aryl include bromobenzene, bromonaphthalene and bromobiphenyl.
Examples of the inorganic alkali include sodium hydroxide, potassium hydroxide, calcium hydroxide, barium hydroxide, and aluminum hydroxide.
 第4級ホスホニウム(A)のアルキル炭酸塩(A1)、または水酸化物(A2)と、有機フェノール化合物(B)を塩交換反応する際、製造条件としては温度30~170℃にて1~20時間反応させながら、副生成するアルコール、水、炭酸ガス、および必要に応じて反応溶媒等を除去する。 When the salt exchange reaction between the quaternary phosphonium (A) alkyl carbonate (A1) or hydroxide (A2) and the organic phenol compound (B) is carried out, the production conditions are as follows. While reacting for 20 hours, by-produced alcohol, water, carbon dioxide gas, and reaction solvent are removed if necessary.
 ホスホニウム塩(S)の合成方法として、電気信頼性を悪化させるイオン性不純物の混入防止の観点から、第4級ホスホニウム(A)のアルキル炭酸塩(A1)と有機フェノール化合物(B)との塩交換反応が好ましい。 As a method for synthesizing a phosphonium salt (S), a salt of an alkyl carbonate (A1) of a quaternary phosphonium (A) and an organic phenol compound (B) from the viewpoint of preventing mixing of ionic impurities that deteriorate electrical reliability. Exchange reactions are preferred.
更に、有機フェノール化合物(B)からなるアニオンには、分子内水素結合があると(式(6))、求核性が押さえられ、これによりエポキシ樹脂、硬化剤および硬化促進剤の混合物を加熱溶融する温度では、ホスホニウム塩(S)が活性低くなるため硬化反応を抑制し、モールド充填時の流動性が優れる、また、有機フェノール化合物(B)は、硬化性に有利の観点から、以下のものが好ましい。
イ:Rが水酸基、R、R、Rが同一または異なって、それぞれ水素または水酸基である化合物。
ロ:Rが水酸基、R及びRが水素、Rが水酸基である化合物。
ハ:Rが水酸基、R、R、Rが同一または異なって、それぞれ水素または水酸基である化合物。
ニ:Rが水酸基、R、R、Rが水素である化合物。
Furthermore, when the anion comprising the organic phenol compound (B) has an intramolecular hydrogen bond (formula (6)), the nucleophilicity is suppressed, thereby heating the mixture of epoxy resin, curing agent and curing accelerator. At the melting temperature, the phosphonium salt (S) becomes less active so that the curing reaction is suppressed and the fluidity at the time of mold filling is excellent. The organic phenol compound (B) has the following advantages from the viewpoint of curability. Those are preferred.
A: A compound in which R 5 is a hydroxyl group, and R 6 , R 7 , and R 8 are the same or different and each is hydrogen or a hydroxyl group.
B: A compound in which R 5 is a hydroxyl group, R 6 and R 7 are hydrogen, and R 8 is a hydroxyl group.
C: A compound in which R 6 is a hydroxyl group, and R 5 , R 7 , and R 8 are the same or different and each is hydrogen or a hydroxyl group.
D: A compound in which R 6 is a hydroxyl group, and R 5 , R 7 , and R 8 are hydrogen.
Figure JPOXMLDOC01-appb-C000011
Figure JPOXMLDOC01-appb-C000011
 有機フェノール化合物(C)は、ホスホニウム塩(S)中の有機フェノール化合物(B)のアニオンと相互作用し、溶融混練時の活性を抑制し流動性を向上させるための必須成分であり、また、封止時の硬化性を向上させるための必須成分であり、下記一般式(3)で表される。 The organic phenol compound (C) is an essential component for interacting with the anion of the organic phenol compound (B) in the phosphonium salt (S), suppressing the activity during melt kneading and improving fluidity, It is an essential component for improving the curability at the time of sealing, and is represented by the following general formula (3).
Figure JPOXMLDOC01-appb-C000012
Figure JPOXMLDOC01-appb-C000012
[式(3)は、R10は水素、炭素数1~18のアルキル基または炭素数6~18のアリール基、R11は、フェノール基を含有する炭素数6~50の官能基を表す。] [In the formula (3), R 10 represents hydrogen, an alkyl group having 1 to 18 carbon atoms or an aryl group having 6 to 18 carbon atoms, and R 11 represents a functional group having 6 to 50 carbon atoms containing a phenol group. ]
その中、一般式(3)において、R11が一般式(4)で示される化合物が好ましく挙げられる。 Among these, in general formula (3), a compound in which R 11 is represented by general formula (4) is preferably exemplified.
Figure JPOXMLDOC01-appb-C000013
Figure JPOXMLDOC01-appb-C000013
また、一般式(3)において、R11が一般式(5)で示される化合物が好ましく挙げられる。 In the general formula (3), the compound R 11 is represented by the general formula (5) may be preferably mentioned.
Figure JPOXMLDOC01-appb-C000014
Figure JPOXMLDOC01-appb-C000014
[式(5)は、R12、R13が水素、炭素数1~38のアルキル基、炭素数1~38アリール基を表す。] [In the formula (5), R 12 and R 13 represent hydrogen, an alkyl group having 1 to 38 carbon atoms, and an aryl group having 1 to 38 carbon atoms. ]
 ホスホニウム塩(S)と有機フェノール化合物(B)モル比は、フェノール(B)のアニオンとの相互作用のしやすさの観点から、通常10/90~99.9/0.1であり、好ましくは20/80~80/20、特に好ましくは30/70~70/30である。 The molar ratio of the phosphonium salt (S) and the organic phenol compound (B) is usually 10/90 to 99.9 / 0.1 from the viewpoint of easy interaction with the anion of the phenol (B), preferably Is 20/80 to 80/20, particularly preferably 30/70 to 70/30.
 ホスホニウム塩(S)と有機フェノール化合物(C)モル比は、フェノール(C)のアニオンとの相互作用のしやすさの観点から、通常10/90~99.9/0.1であり、好ましくは20/80~80/20、特に好ましくは30/70~70/30である。 The molar ratio of the phosphonium salt (S) and the organic phenol compound (C) is usually 10/90 to 99.9 / 0.1 from the viewpoint of easy interaction with the anion of the phenol (C), preferably Is 20/80 to 80/20, particularly preferably 30/70 to 70/30.
エポキシ樹脂硬化促進剤(Q)は、通常、ホスホニウム塩(S)と有機フェノール化合物(B)と有機フェノール化合物(C)を、通常、温度50~200℃にて1~20時間で均一混合させることで得られる。混合を速やかに完結するために溶媒を使用しても良く、均一混合後に、温度50~200℃で減圧~常圧条件で溶媒等を除去する。溶媒としては特に限定されるものではないが、メタノ-ル、エタノ-ル等が好ましい。
 ホスホニウム塩(S)と有機フェノール化合物(B)の配合比率は、上記ホスホニウム塩(S)と有機フェノール化合物(B)のモル比から適宜決定する。
ホスホニウム塩(S)と有機フェノール化合物(C)の配合比率は、上記ホスホニウム塩(S)と有機フェノール化合物(C)のモル比から適宜決定する。
The epoxy resin curing accelerator (Q) is usually obtained by uniformly mixing a phosphonium salt (S), an organic phenol compound (B), and an organic phenol compound (C) at a temperature of 50 to 200 ° C. for 1 to 20 hours. Can be obtained. A solvent may be used in order to complete the mixing quickly. After uniform mixing, the solvent and the like are removed at a temperature of 50 to 200 ° C. under reduced pressure to normal pressure. The solvent is not particularly limited, but methanol, ethanol and the like are preferable.
The mixing ratio of the phosphonium salt (S) and the organic phenol compound (B) is appropriately determined from the molar ratio of the phosphonium salt (S) and the organic phenol compound (B).
The blending ratio of the phosphonium salt (S) and the organic phenol compound (C) is appropriately determined from the molar ratio of the phosphonium salt (S) and the organic phenol compound (C).
エポキシ樹脂硬化促進剤(Q)は、エポキシ樹脂組成物との混合をしやすくするために、低粘度のフェノール樹脂でマスターバッチ化して軟化点を下げる方法、粉砕して粉末状にする方法等を行っても良い。
低粘度のフェノール樹脂としては、例えば、ビスフェノールA、ビスフェノールF、フェノールノボラック樹脂、クレゾールノボラック樹脂、フェノールアラルキル樹脂等が挙げられる。マスターバッチ化の方法としては、公知の方法が利用できる。
エポキシ樹脂硬化促進剤(Q)の軟化点は、通常70~150℃、好ましくは80~120℃、より好ましくは90~100℃である。これは、70℃よりも低いと、粉砕時の融着や粉末状にした促進剤の貯蔵中のブロック化が起こり易く好ましくなく、また、150℃を超えると、硬化促進剤がエポキシ樹脂と溶融混合できずに不均一になり、硬化不良の原因となり易いからである。
In order to facilitate mixing with the epoxy resin composition, the epoxy resin curing accelerator (Q) includes a method of lowering the softening point by making a masterbatch with a low viscosity phenol resin, a method of pulverizing and powdering, etc. You can go.
Examples of the low viscosity phenol resin include bisphenol A, bisphenol F, phenol novolac resin, cresol novolac resin, and phenol aralkyl resin. A known method can be used as a master batch method.
The softening point of the epoxy resin curing accelerator (Q) is usually 70 to 150 ° C, preferably 80 to 120 ° C, more preferably 90 to 100 ° C. If the temperature is lower than 70 ° C., it is not preferable because fusion during pulverization or block formation during storage of the powdered accelerator is likely to occur, and if it exceeds 150 ° C., the curing accelerator is melted with the epoxy resin. This is because they cannot be mixed and become non-uniform, which tends to cause curing failure.
粉砕して粉末状にする方法としては、例えば衝撃式粉砕機等で粉砕して粉末状の硬化促進剤を得ることができる。使用に際しては、この粉末状の硬化促進剤の粒径は、100メッシュパス(エアージェットシーブ法などにより測定)95%以上であることが好ましい。これは、95%未満のものではエポキシ樹脂組成物への均一溶解が妨げられ易くなり、硬化不良の原因となるからである。 As a method of pulverizing into a powder, for example, a powdery curing accelerator can be obtained by pulverization with an impact pulverizer or the like. In use, the particle size of the powdery curing accelerator is preferably 100% or more (measured by an air jet sieve method or the like) 95% or more. This is because if it is less than 95%, uniform dissolution in the epoxy resin composition tends to be hindered, which causes poor curing.
本発明のエポキシ樹脂硬化促進剤(Q)は、エポキシ樹脂、硬化剤および充填剤など必要により他の添加剤が配合された混合物中に添加して用いられ、最終的に硬化エポキシ樹脂が得られる。エポキシ樹脂硬化促進剤(Q)の配合量はエポキシ樹脂や硬化剤の反応性に応じて調整されるが、エポキシ樹脂100質量部に対して通常1~25質量部、好ましくは2~20質量部である。最適な配合量は、要求される硬化特性などに合わせて設定すればよい。 The epoxy resin curing accelerator (Q) of the present invention is used by being added to a mixture in which other additives such as an epoxy resin, a curing agent and a filler are blended as required, and finally a cured epoxy resin is obtained. . The compounding amount of the epoxy resin curing accelerator (Q) is adjusted according to the reactivity of the epoxy resin and the curing agent, but is usually 1 to 25 parts by mass, preferably 2 to 20 parts by mass with respect to 100 parts by mass of the epoxy resin. It is. What is necessary is just to set the optimal compounding quantity according to the hardening characteristic etc. which are requested | required.
 以下、実施例及び比較例により本発明をさらに説明するが、本発明はこれらに限定されるものではない。以下、特に定めない限り、%は重量%、部は重量部を示す。 Hereinafter, the present invention will be further described with reference to Examples and Comparative Examples, but the present invention is not limited thereto. Hereinafter, unless otherwise specified, “%” represents “% by weight” and “parts” represents “parts by weight”.
<製造例1>
<第4級ホスホニウムベース(A-Be1)の製造方法>
攪拌式のオートクレーブに、炭酸ジメチル(東京化成工業株式会社社製)180部および溶媒のメタノール224部を仕込み、この中にトリフェニルホスフィン(東京化成工業株式会社社製)262部を仕込み、反応温度125℃にて80時間反応させた。ついでメタノール120部を減圧除去した後、トルエン1200部投入し結晶を析出させた。この結晶を単離し、再度メタノールに溶解させることで、第4級ホスホニウムベース(A-Be1)としてトリフェニルメチルホスホニウムモノメチル炭酸塩の溶液(固形分濃度 50%)を得た。
<Production Example 1>
<Method for producing quaternary phosphonium base (A-Be1)>
In a stirring autoclave, 180 parts of dimethyl carbonate (manufactured by Tokyo Chemical Industry Co., Ltd.) and 224 parts of methanol as a solvent are charged, and 262 parts of triphenylphosphine (manufactured by Tokyo Chemical Industry Co., Ltd.) are charged therein, and the reaction temperature is increased. The reaction was performed at 125 ° C. for 80 hours. Next, 120 parts of methanol was removed under reduced pressure, and 1200 parts of toluene was added to precipitate crystals. This crystal was isolated and dissolved again in methanol to obtain a solution (solid content concentration 50%) of triphenylmethylphosphonium monomethyl carbonate as a quaternary phosphonium base (A-Be1).
<製造例2>
<第4級ホスホニウムベース(A-Be2)の製造方法>
製造例1におけるトリフェニルホスフィン262部の代わりにトリス(4-メチルフェニル)ホスフィン(東京化成工業株式会社社製)304部に、炭酸ジメチルの代わりに炭酸ジエチル(東京化成工業株式会社社製)を使用し、反応温度130℃、反応時間150時間とした以外は、製造例1と同様にして、第4級ホスホニウムベース(A-Be2)としてトリ(4-メチルフェニル)エチルホスホニウムモノエチル炭酸塩の溶液(固形分濃度 50%)を得た。
<Production Example 2>
<Method for producing quaternary phosphonium base (A-Be2)>
Instead of 262 parts of triphenylphosphine in Production Example 1, 304 parts of tris (4-methylphenyl) phosphine (manufactured by Tokyo Chemical Industry Co., Ltd.) and diethyl carbonate (manufactured by Tokyo Chemical Industry Co., Ltd.) instead of dimethyl carbonate The quaternary phosphonium base (A-Be2) was used as a quaternary phosphonium base (A-Be2) except that the reaction temperature was 130 ° C. and the reaction time was 150 hours. A solution (solid concentration 50%) was obtained.
<製造例3>
<第4級ホスホニウムベース(A-Be3)の製造方法>
 滴下ロート、および還流管を備え付けたガラス製丸底3つ口フラスコにテトラフェニルホスホニウムブロマイド(東京化成工業株式会社社製)419部、メタノール1000部仕込み、均一溶解させた後に、水酸化ナトリウム40部をゆっくり投入し室温で5時間反応させ、析出した塩を除去することで第4級ホスホニウムベース(A-Be3)として水酸化テトラフェニルホスホニウム溶液(固形分濃度 25%)を得た。
<Production Example 3>
<Method for producing quaternary phosphonium base (A-Be3)>
A glass round bottom three-necked flask equipped with a dropping funnel and a reflux tube was charged with 419 parts of tetraphenylphosphonium bromide (manufactured by Tokyo Chemical Industry Co., Ltd.) and 1000 parts of methanol, and dissolved uniformly, and then 40 parts of sodium hydroxide. Was slowly added and reacted at room temperature for 5 hours, and the precipitated salt was removed to obtain a tetraphenylphosphonium hydroxide solution (solid content concentration 25%) as a quaternary phosphonium base (A-Be3).
<比較製造例1>
<第4級ホスホニウムベース(A-Be’1)の製造方法>
攪拌式のオートクレーブに、炭酸ジメチル180部および溶媒のメタノール224部を仕込み、この中にトリブチルホスフィン202部を滴下して仕込み、反応温度125℃にて20時間反応させて、第4級ホスホニウムベース(A-Be’1)としてトリブチルメチルホスホニウムモノメチル炭酸塩の溶液(固形分濃度 50%)を得た。
<Comparative Production Example 1>
<Method for producing quaternary phosphonium base (A-Be'1)>
In a stirring autoclave, 180 parts of dimethyl carbonate and 224 parts of methanol as a solvent were added, and 202 parts of tributylphosphine was added dropwise thereto, and reacted at a reaction temperature of 125 ° C. for 20 hours to give a quaternary phosphonium base ( A solution of tributylmethylphosphonium monomethyl carbonate (solid content concentration 50%) was obtained as A-Be′1).
<実施例1>
滴下ロート、および還流管を備え付けたガラス製丸底3つ口フラスコに製造例1で製造の第4級ホスホニウムベース(A-Be1)704部を入れ、50℃で温調しながら4-ヒドロキシ安息香酸ブチル(東京化成工業株式会社社製)400部を分割投入後、1,1,1-トリス(4-ヒドロキシフェニル)エタン(東京化成工業株式会社社製)305部を分割投入した。溶剤(メタノール)を留去しながら175℃まで昇温後、残った溶剤を減圧除去することで、エポキシ樹脂硬化促進剤(Q-1)を得た。
(Q-1)中のホスホニウム塩(S)と有機フェノール化合物(B)と有機フェノール化合物(C)のモル比は、1.00/1.06/1.00であった。
<Example 1>
Into a glass round bottom three-necked flask equipped with a dropping funnel and a reflux tube, 704 parts of the quaternary phosphonium base (A-Be1) produced in Production Example 1 was placed, and 4-hydroxybenzoic acid was adjusted while controlling the temperature at 50 ° C. 400 parts of butyl acid (manufactured by Tokyo Chemical Industry Co., Ltd.) was dividedly added, and 305 parts of 1,1,1-tris (4-hydroxyphenyl) ethane (manufactured by Tokyo Chemical Industry Co., Ltd.) were dividedly charged. The temperature was raised to 175 ° C. while distilling off the solvent (methanol), and the remaining solvent was removed under reduced pressure to obtain an epoxy resin curing accelerator (Q-1).
The molar ratio of the phosphonium salt (S), the organic phenol compound (B), and the organic phenol compound (C) in (Q-1) was 1.00 / 1.06 / 1.00.
<実施例2>
実施例1における4-ヒドロキシ安息香酸ブチル400部の代わりに4-ヒドロキシ安息香酸フェニル(東京化成工業株式会社社製)400部、1,1,1-トリス(4-ヒドロキシフェニル)エタン305部の代わりに4,4’,4”-トリヒドロキシトリフェニルメタン(東京化成工業株式会社社製)305部の変更した以外は、実施例1と同様にして、エポキシ樹脂硬化促進剤(Q-2)を得た。
(Q-2)中のホスホニウム塩(S)と有機フェノール化合物(B)と有機フェノール化合物(C)のモル比は、1.00/0.87/1.05であった。
<Example 2>
Instead of 400 parts of butyl 4-hydroxybenzoate in Example 1, 400 parts of phenyl 4-hydroxybenzoate (manufactured by Tokyo Chemical Industry Co., Ltd.), 305 parts of 1,1,1-tris (4-hydroxyphenyl) ethane Instead, an epoxy resin curing accelerator (Q-2) was used in the same manner as in Example 1 except that 305 parts of 4,4 ′, 4 ″ -trihydroxytriphenylmethane (Tokyo Chemical Industry Co., Ltd.) was changed. Got.
The molar ratio of the phosphonium salt (S), the organic phenol compound (B), and the organic phenol compound (C) in (Q-2) was 1.00 / 0.87 / 1.05.
<実施例3>
実施例1における第4級ホスホニウムベース(A-Be1)の代わりに製造例2で製造の第4級ホスホニウムベース(A-Be2)を、4-ヒドロキシ安息香酸ブチルの代わりに3,4-ジヒドロキシ安息香酸メチル(東京化成工業株式会社社製)400部に変更した以外は、実施例1と同様にして、エポキシ樹脂硬化促進剤(Q-3)を得た。
(Q-3)中のホスホニウム塩(S)と有機フェノール化合物(B)と有機フェノール化合物(C)のモル比は、1.00/1.38/1.00であった。
<Example 3>
Instead of the quaternary phosphonium base (A-Be1) in Example 1, the quaternary phosphonium base (A-Be2) prepared in Preparation Example 2 was used instead of butyl 4-hydroxybenzoate, and 3,4-dihydroxybenzoate was used. An epoxy resin curing accelerator (Q-3) was obtained in the same manner as in Example 1 except for changing to 400 parts of methyl acid (Tokyo Chemical Industry Co., Ltd.).
The molar ratio of the phosphonium salt (S), the organic phenol compound (B), and the organic phenol compound (C) in (Q-3) was 1.00 / 1.38 / 1.00.
<実施例4>
実施例1における第4級ホスホニウムベース(A-Be1)704部の代わりに製造例3で製造の第4級ホスホニウムベース(A-Be3)1200部、4-ヒドロキシ安息香酸ブチルの代わりに2,4-ジヒドロキシ安息香酸メチル(東京化成工業株式会社社製)400部、1,1,1-トリス(4-ヒドロキシフェニル)エタン305部の代わりにα,α,α’--トリス(4-ヒドロキシフェニル)-1-エチル-4-イソプロピルベンゼン(東京化成工業株式会社社製)305部に変更した以外は、実施例1と同様にして、エポキシ樹脂硬化促進剤(Q-4)を得た。
(Q-4)中のホスホニウム塩(S)と有機フェノール化合物(B)と有機フェノール化合物(C)のモル比は、1.00/1.38/0.71であった。
<Example 4>
Instead of 704 parts of the quaternary phosphonium base (A-Be1) in Example 1, 1200 parts of the quaternary phosphonium base (A-Be3) prepared in Preparation Example 3, 2,4 instead of butyl 4-hydroxybenzoate -400 parts of methyl dihydroxybenzoate (manufactured by Tokyo Chemical Industry Co., Ltd.), α, α, α'-tris (4-hydroxyphenyl) instead of 305 parts of 1,1,1-tris (4-hydroxyphenyl) ethane ) Epoxy resin curing accelerator (Q-4) was obtained in the same manner as in Example 1, except that the amount was changed to 305 parts of 1-ethyl-4-isopropylbenzene (manufactured by Tokyo Chemical Industry Co., Ltd.).
The molar ratio of the phosphonium salt (S), the organic phenol compound (B), and the organic phenol compound (C) in (Q-4) was 1.00 / 1.38 / 0.71.
<実施例5>
実施例1における4-ヒドロキシ安息香酸ブチルの代わりに3,4-ジヒドロキシ-2-メチル安息香酸メチル(東京化成工業株式会社社製)400部に変更した以外は、実施例1と同様にして、エポキシ樹脂硬化促進剤(Q-5)を得た。
(Q-5)中のホスホニウム塩(S)と有機フェノール化合物(B)と有機フェノール化合物(C)のモル比は、1.00/1.20/1.00であった。
<Example 5>
In the same manner as in Example 1, except that 400 parts of methyl 3,4-dihydroxy-2-methylbenzoate (Tokyo Chemical Industry Co., Ltd.) was used instead of butyl 4-hydroxybenzoate in Example 1, An epoxy resin curing accelerator (Q-5) was obtained.
The molar ratio of the phosphonium salt (S), the organic phenol compound (B), and the organic phenol compound (C) in (Q-5) was 1.00 / 1.20 / 1.00.
<実施例6>
実施例1における4-ヒドロキシ安息香酸ブチルの代わりに没食子酸エチル(東京化成工業株式会社社製)400部に変更した以外は、実施例1と同様にして、エポキシ樹脂硬化促進剤(Q-6)を得た。
(Q-6)中のホスホニウム塩(S)と有機フェノール化合物(B)と有機フェノール化合物(C)のモル比は、1.00/1.02/1.00であった。
<Example 6>
An epoxy resin curing accelerator (Q-6) was used in the same manner as in Example 1 except that 400 parts of ethyl gallate (manufactured by Tokyo Chemical Industry Co., Ltd.) was used instead of butyl 4-hydroxybenzoate in Example 1. )
The molar ratio of the phosphonium salt (S), the organic phenol compound (B), and the organic phenol compound (C) in (Q-6) was 1.00 / 1.02 / 1.00.
<比較例1>
実施例1における第4級ホスホニウムベース(A-Be1)の代わりに比較製造例1で製造の第4級ホスホニウムベース(A-Be’1)に変更した以外は、実施例1と同様にして、エポキシ樹脂硬化促進剤(Q’-1)を得た。
<Comparative Example 1>
In the same manner as in Example 1, except that the quaternary phosphonium base (A-Be′1) produced in Comparative Production Example 1 was used instead of the quaternary phosphonium base (A-Be1) in Example 1, An epoxy resin curing accelerator (Q′-1) was obtained.
<比較例2>
実施例1における4-ヒドロキシ安息香酸ブチルの代わりに4,4’-ジヒドロキシベンゾフェノン(東京化成工業株式会社社製)400部に変更した以外は、実施例1と同様にして、エポキシ樹脂硬化促進剤(Q’-2)を得た。
<Comparative example 2>
Epoxy resin curing accelerator in the same manner as in Example 1, except that 400 parts of 4,4′-dihydroxybenzophenone (manufactured by Tokyo Chemical Industry Co., Ltd.) was used instead of butyl 4-hydroxybenzoate in Example 1. (Q′-2) was obtained.
<比較例3>
実施例1における4-ヒドロキシ安息香酸ブチルの代わりにサリチル酸メチル(東京化成工業株式会社社製)に変更した以外は、実施例1と同様にして、エポキシ樹脂硬化促進剤(Q’-3)を得た。
<Comparative Example 3>
An epoxy resin curing accelerator (Q′-3) was used in the same manner as in Example 1 except that methyl salicylate (manufactured by Tokyo Chemical Industry Co., Ltd.) was used instead of butyl 4-hydroxybenzoate in Example 1. Obtained.
<比較例4>
実施例1における4-ヒドロキシ安息香酸ブチルの代わりにカテコール(東京化成工業株式会社社製)に変更した以外は、実施例1と同様にして、エポキシ樹脂硬化促進剤(Q’-4)を得た。
<Comparative example 4>
An epoxy resin curing accelerator (Q′-4) was obtained in the same manner as in Example 1, except that catechol (manufactured by Tokyo Chemical Industry Co., Ltd.) was used instead of butyl 4-hydroxybenzoate in Example 1. It was.
<比較例5>
滴下ロート、および還流管を備え付けたガラス製丸底3つ口フラスコに製造例1で製造の第4級ホスホニウムベース(A-Be1)704部を入れ、50℃で温調しながらフェノールノボラック樹脂700部を分割投入した。溶剤(メタノール)を留去しながら175℃まで昇温後、残った溶剤を減圧除去することで、エポキシ樹脂硬化促進剤(Q’-5)を得た。
<Comparative Example 5>
Into a glass round bottom three-necked flask equipped with a dropping funnel and a reflux tube, 704 parts of the quaternary phosphonium base (A-Be1) produced in Production Example 1 was placed, and the phenol novolac resin 700 was adjusted while controlling the temperature at 50 ° C. Divided parts. The temperature was raised to 175 ° C. while distilling off the solvent (methanol), and then the remaining solvent was removed under reduced pressure to obtain an epoxy resin curing accelerator (Q′-5).
<性能評価>
実施例1~6で作成した本発明のエポキシ樹脂硬化促進剤(Q-1)~(Q-6)、及び比較例1~5で作成した比較のためのエポキシ樹脂硬化促進剤(Q’-1)~(Q’-5)の流動性、および硬化性について以下の方法で評価した。
<Performance evaluation>
Epoxy resin curing accelerators (Q-1) to (Q-6) of the present invention prepared in Examples 1 to 6 and comparative epoxy resin curing accelerators (Q'-) prepared in Comparative Examples 1 to 5 The fluidity and curability of 1) to (Q′-5) were evaluated by the following methods.
<流動性(フロー値)>
ビフェニル型エポキシ樹脂(軟化点105℃、エポキシ当量 192)100部、p-キシリレンフェノール樹脂(軟化点80℃、水酸基当量174)78重量部、1重量%のシランカップリング剤で処理した溶融シリカ粉末1000部、カルナバワックス1.5部、三酸化アンチモン4部およびカーボンブラック1部に、各例で得られたエポキシ樹脂硬化促進剤(Q)12部を均一に粉砕混合後、 110℃の熱ロールを用いて5分間溶融混練し、冷却後粉砕して封止材を得た。この封止材について、EMMI 1-66 の方法に準じて175℃(70kg/cm2)でのスパイラルフローのフロー値(単位はcm)を測定し、流動性の指標とした。
<Flowability (flow value)>
100 parts of biphenyl type epoxy resin (softening point 105 ° C., epoxy equivalent 192), 78 parts by weight of p-xylylene phenol resin (softening point 80 ° C., hydroxyl equivalent 174), fused silica treated with 1% by weight of silane coupling agent To 1000 parts of powder, 1.5 parts of carnauba wax, 4 parts of antimony trioxide and 1 part of carbon black, 12 parts of the epoxy resin curing accelerator (Q) obtained in each example was uniformly ground and mixed, and then heated at 110 ° C. The mixture was melt-kneaded for 5 minutes using a roll, cooled and pulverized to obtain a sealing material. With respect to this sealing material, the flow value (unit: cm) of the spiral flow at 175 ° C. (70 kg / cm 2) was measured according to the method of EMMI 1-66 and used as an index of fluidity.
<硬化性(硬化トルク)>
 キュラストメータV型(日合商事社製、商品名)を使用して、温度175℃、樹脂用ダイスP-200および振幅角度±1°の条件で、それぞれの上記封止剤について硬化トルクを測定し、硬化トルクの立ち上がる点をゲルタイム(単位は秒)として、測定開始から90秒後の硬化トルクの値(単位はkgf・cm)を硬化性(脱型時の強度および硬度)の指標とした。
<Curing property (curing torque)>
Curing meter V-type (manufactured by Nichigo Shoji Co., Ltd., trade name) is used to set the curing torque for each of the above sealants under the conditions of a temperature of 175 ° C., a resin die P-200 and an amplitude angle of ± 1 °. The point at which the curing torque rises is the gel time (unit: seconds), and the value of the curing torque (unit: kgf · cm) 90 seconds after the start of measurement is used as an index of curability (strength and hardness at demolding). did.
 実施例1~6および比較例1~5で得たエポキシ樹脂硬化促進剤(Q)の評価結果を表1に示す。 Table 1 shows the evaluation results of the epoxy resin curing accelerator (Q) obtained in Examples 1 to 6 and Comparative Examples 1 to 5.
Figure JPOXMLDOC01-appb-T000015
Figure JPOXMLDOC01-appb-T000015
表1から明らかなように、本発明の実施例1~6のエポキシ樹脂硬化促進剤(Q)は、溶融混練後の封止剤のフロー値が高く流動性に優れており、また硬化トルクも高く硬化性に優れていることが分かる。
一方、テトラアルキルホスホニウムカチオンからなる比較例1では、ホスホニウムカチオンの安定性が低いため溶融混連後の封止剤のフロー値が非常に低くなり、成形性に劣ることがわかる。
また柔軟構造のエステル基を含有しない比較例2、4、5では、剛直な構造であるため、配合物の流れが悪く、フロー値が低くなることがわかる。
エステル基を2位で含有する比較例3では、フロー値が低くなることが分かる。エステル基の隣に水酸基があるため、エステルの柔軟性が影響を受け、フロー値が低くなること、また、硬化性もより低くなることがわかる。
As is apparent from Table 1, the epoxy resin curing accelerators (Q) of Examples 1 to 6 of the present invention have a high flow value of the sealant after melt-kneading and excellent fluidity, and also have a curing torque. It can be seen that it is high and excellent in curability.
On the other hand, in Comparative Example 1 comprising a tetraalkylphosphonium cation, it can be seen that the flow value of the sealant after the melt mixing is very low because the stability of the phosphonium cation is low, and the moldability is poor.
In Comparative Examples 2, 4, and 5 that do not contain an ester group having a flexible structure, since the structure is rigid, it can be seen that the flow of the blend is poor and the flow value is low.
It can be seen that in Comparative Example 3 containing an ester group at the 2-position, the flow value is low. It can be seen that since there is a hydroxyl group next to the ester group, the flexibility of the ester is affected, the flow value is lowered, and the curability is also lowered.
 本発明のエポキシ樹脂硬化促進剤(Q)は、溶融紺練後の流動性、および硬化性が優れているため半導体などの電子部品用のエポキシ樹脂系封止材の製造に有用である。
 
The epoxy resin curing accelerator (Q) of the present invention is useful for producing an epoxy resin-based encapsulant for electronic parts such as semiconductors because it has excellent fluidity and curability after melt-kneading.

Claims (11)

  1.  一般式(1)で示される第4級ホスホニウム(A)と一般式(2)で示される有機フェノール化合物(B)のアニオンとからなるホスホニウム塩(S)、一般式(2)で示される有機フェノール化合物(B)および一般式(3)で示される有機フェノール化合物(C)を含むことを特徴とするエポキシ樹脂硬化促進剤(Q)。
    Figure JPOXMLDOC01-appb-C000001
    [式(1)中、R~Rは炭素数6~12のアリール基、Rは炭素数1~8のアルキル基または炭素数6~12のアリール基を表す。]
    Figure JPOXMLDOC01-appb-C000002
    [式(2)中、R~Rは、同一または異なって、それぞれ水素、炭素数1~4のアルキル基または水酸基を表し、Rは、炭素数1~18のアルキル基、炭素数6~18のアリール基、炭素数1~18のヒドロキシアルキル基、ベンジル基、またはアリル基を表す。]
    Figure JPOXMLDOC01-appb-C000003
    [式(3)は、R10は水素、炭素数1~18のアルキル基または炭素数6~18のアリール基、R11は、フェノール基を含有する炭素数6~50の官能基を表す。]
    A phosphonium salt (S) comprising a quaternary phosphonium (A) represented by the general formula (1) and an anion of the organic phenol compound (B) represented by the general formula (2), an organic represented by the general formula (2) An epoxy resin curing accelerator (Q) comprising a phenol compound (B) and an organic phenol compound (C) represented by the general formula (3).
    Figure JPOXMLDOC01-appb-C000001
    [In the formula (1), R 1 to R 3 represent an aryl group having 6 to 12 carbon atoms, and R 4 represents an alkyl group having 1 to 8 carbon atoms or an aryl group having 6 to 12 carbon atoms. ]
    Figure JPOXMLDOC01-appb-C000002
    [In Formula (2), R 5 to R 8 are the same or different and each represents hydrogen, an alkyl group having 1 to 4 carbon atoms, or a hydroxyl group, and R 9 represents an alkyl group having 1 to 18 carbon atoms, An aryl group having 6 to 18 carbon atoms, a hydroxyalkyl group having 1 to 18 carbon atoms, a benzyl group, or an allyl group is represented. ]
    Figure JPOXMLDOC01-appb-C000003
    [In the formula (3), R 10 represents hydrogen, an alkyl group having 1 to 18 carbon atoms or an aryl group having 6 to 18 carbon atoms, and R 11 represents a functional group having 6 to 50 carbon atoms containing a phenol group. ]
  2. 一般式(2)において、Rが水酸基、R、R、Rが同一または異なって、それぞれ水素または水酸基である請求項1に記載のエポキシ樹脂硬化促進剤(Q)。 2. The epoxy resin curing accelerator (Q) according to claim 1, wherein in general formula (2), R 5 is a hydroxyl group, and R 6 , R 7 , and R 8 are the same or different and each is hydrogen or a hydroxyl group.
  3. 一般式(2)において、Rが水酸基、R及びRが水素、Rが水酸基である請求項1に記載のエポキシ樹脂硬化促進剤(Q)。 The epoxy resin curing accelerator (Q) according to claim 1, wherein, in the general formula (2), R 5 is a hydroxyl group, R 6 and R 7 are hydrogen, and R 8 is a hydroxyl group.
  4. 一般式(2)において、Rが水酸基、R、R、Rが同一または異なって、それぞれ水素または水酸基である請求項1に記載のエポキシ樹脂硬化促進剤(Q)。 2. The epoxy resin curing accelerator (Q) according to claim 1, wherein in general formula (2), R 6 is a hydroxyl group, and R 5 , R 7 , and R 8 are the same or different and each is hydrogen or a hydroxyl group.
  5. 一般式(2)において、Rが水酸基、R、R、Rが水素である請求項1に記載のエポキシ樹脂硬化促進剤(Q)。 The epoxy resin curing accelerator (Q) according to claim 1, wherein, in the general formula (2), R 6 is a hydroxyl group, and R 5 , R 7 , and R 8 are hydrogen.
  6. 一般式(2)において、Rがメチル基、エチル基、プロピル基またはブチル基である請求項1~5のいずれかに記載のエポキシ樹脂硬化促進剤(Q)。 The epoxy resin curing accelerator (Q) according to any one of claims 1 to 5, wherein in the general formula (2), R 9 is a methyl group, an ethyl group, a propyl group or a butyl group.
  7. 一般式(3)において、R11が一般式(4)で示される官能基である請求項1~6のいずれかに記載のエポキシ樹脂硬化促進剤(Q)。
    Figure JPOXMLDOC01-appb-C000004
    The epoxy resin curing accelerator (Q) according to any one of claims 1 to 6, wherein in the general formula (3), R 11 is a functional group represented by the general formula (4).
    Figure JPOXMLDOC01-appb-C000004
  8. 一般式(3)において、R11が一般式(5)で示される官能基である請求項1~6のいずれかに記載のエポキシ樹脂硬化促進剤(Q)。
    Figure JPOXMLDOC01-appb-C000005
    [式(5)は、R12、R13は、それぞれ水素、炭素数1~38のアルキル基または炭素数1~38のアリール基を表す。]
    The epoxy resin curing accelerator (Q) according to any one of claims 1 to 6, wherein in the general formula (3), R 11 is a functional group represented by the general formula (5).
    Figure JPOXMLDOC01-appb-C000005
    [In Formula (5), R 12 and R 13 each represent hydrogen, an alkyl group having 1 to 38 carbon atoms, or an aryl group having 1 to 38 carbon atoms. ]
  9. ホスホニウム塩(S)と有機フェノール化合物(B)のモル比が、99/1~1/99である請求項1~8のいずれかに記載のエポキシ樹脂硬化促進剤(Q)。 The epoxy resin curing accelerator (Q) according to any one of claims 1 to 8, wherein the molar ratio of the phosphonium salt (S) and the organic phenol compound (B) is 99/1 to 1/99.
  10. ホスホニウム塩(S)と有機フェノール化合物(C)のモル比が、99/1~1/99である請求項1~9のいずれかに記載のエポキシ樹脂硬化促進剤(Q)。 The epoxy resin curing accelerator (Q) according to any one of claims 1 to 9, wherein the molar ratio of the phosphonium salt (S) to the organic phenol compound (C) is 99/1 to 1/99.
  11. 第4級ホスホニウム(A)のアルキル炭酸塩と有機フェノール化合物(B)の塩交換反応によりホスホニウム塩(S)を合成する請求項1~10のいずれかに記載のエポキシ樹脂硬化促進剤(Q)。
     
    The epoxy resin curing accelerator (Q) according to any one of claims 1 to 10, wherein the phosphonium salt (S) is synthesized by a salt exchange reaction between an alkyl carbonate of the quaternary phosphonium (A) and the organic phenol compound (B). .
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