WO2017148065A1 - 显示基板、液晶面板、显示装置及显示基板的制作方法 - Google Patents

显示基板、液晶面板、显示装置及显示基板的制作方法 Download PDF

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WO2017148065A1
WO2017148065A1 PCT/CN2016/089603 CN2016089603W WO2017148065A1 WO 2017148065 A1 WO2017148065 A1 WO 2017148065A1 CN 2016089603 W CN2016089603 W CN 2016089603W WO 2017148065 A1 WO2017148065 A1 WO 2017148065A1
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Prior art keywords
layer
display substrate
color filter
substrate
display
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PCT/CN2016/089603
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English (en)
French (fr)
Inventor
熊兴
毕瑞琳
熊强
孙红雨
黎敏
吴洪江
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京东方科技集团股份有限公司
重庆京东方光电科技有限公司
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Priority to US15/521,070 priority Critical patent/US10203561B2/en
Publication of WO2017148065A1 publication Critical patent/WO2017148065A1/zh

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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133512Light shielding layers, e.g. black matrix
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1339Gaskets; Spacers; Sealing of cells
    • G02F1/13394Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • G02F1/133516Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136209Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1339Gaskets; Spacers; Sealing of cells
    • G02F1/13398Spacer materials; Spacer properties

Definitions

  • the present invention relates to the field of display technologies, and in particular, to a display substrate, a liquid crystal panel, a display device, and a method of fabricating the display substrate.
  • TFT-LCD Thin Film Transistor Liquid Crystal Display
  • the main structure of the liquid crystal panel of the TFT-LCD includes: an array substrate and a color filter substrate provided to the cartridge, and a liquid crystal layer filled between the array substrate and the color filter substrate, and further, in order to ensure the uniformity of the thickness of the liquid crystal layer, the color film
  • the substrate is further provided with a spacer on a side close to the liquid crystal layer.
  • An object of the embodiments of the present invention is to provide a display substrate, a liquid crystal panel, a display device, and a method for manufacturing the display substrate, so as to improve the image sticking phenomenon of the display device, improve the connection strength of the spacer, and improve the display quality of the display device. .
  • Embodiments of the present invention provide a display substrate including a plurality of pixel regions having a trench between adjacent pixel regions, the display substrate further comprising a spacer layer, the spacer layer including the filling layer a filling portion in the groove and a support portion protruding from the filling portion.
  • the filling portion is filled in the trench between the adjacent pixel regions, so that the surface of the display substrate is flat, the image sticking phenomenon of the display device can be effectively improved, and the display device is improved.
  • the support portion can have the same supporting function as the existing spacer, and since it is integrally formed with the filling portion, the connection strength is high, so that the support portion is not easily peeled off in the subsequent rubbing process, and the alignment liquid is not contaminated. It provides a guarantee for the manufacturing quality of the display device.
  • the filling portion is a mesh filling portion, and the supporting portion is integrally formed with the filling portion.
  • the display substrate is a color filter substrate, and includes a base substrate and a black matrix layer, a color filter layer and the spacer layer disposed on the base substrate, wherein the black matrix layer comprises a plurality of a black matrix unit, a gap corresponding to a position of a pixel region is formed between adjacent black matrix units, and the color filter layer includes color filter units disposed corresponding to each of the gaps, the grooves being adjacent to each other Between color filter units.
  • the display substrate further includes a transparent electrode layer disposed at a position of the pixel region above the color filter layer, and the transparent electrode layer is disposed on the black matrix layer at a position of the trench Between the spacer layers.
  • the support portion has a structure of continuously supporting the connecting retaining wall on the filling portion.
  • the support portion is disposed in a peripheral non-display area of the display substrate.
  • the embodiment of the invention further provides a liquid crystal panel comprising the display substrate according to any of the preceding technical solutions.
  • the liquid crystal panel is applied to a display device. Compared with the prior art, the image sticking phenomenon of the display screen is improved, and the display quality is high. In addition, the thickness uniformity of the liquid crystal layer in the liquid crystal panel is good, and the display quality is further ensured.
  • the embodiment of the present invention further provides a display device comprising the liquid crystal panel according to the foregoing technical solution. Compared with the prior art, the image sticking phenomenon of the display screen is improved, and the display quality is high.
  • the embodiment of the invention further provides a method for manufacturing a display substrate, comprising the following steps:
  • a spacer layer is formed by a patterning process, the spacer layer including a filling portion filled in a trench between adjacent pixel regions and a support portion protruding from the filling portion.
  • the display substrate prepared by the method of the embodiment of the invention fills the filling portion in the trench between the adjacent pixel regions, so that the surface of the display substrate is flat, which can effectively improve the image sticking phenomenon of the display device and improve the display.
  • the support portion can have the same supporting function as the existing spacer, and since it is integrally formed with the filling portion, the connection strength is high, so that the support portion is not easily peeled off in the subsequent rubbing process, and the alignment liquid is not contaminated. It provides a guarantee for the manufacturing quality of the display device.
  • the display substrate is a color film substrate
  • the manufacturing method specifically includes the following steps:
  • the black matrix layer including a plurality of black matrix cells, and a gap corresponding to a position of the pre-formed pixel region is formed between adjacent black matrix cells;
  • the color filter layer Forming a color filter layer on the substrate of the display substrate by a patterning process, the color filter layer comprising color filter units disposed corresponding to each of the spaces, the grooves being located in adjacent color filter units between;
  • a spacer layer is formed in the trench by a patterning process, the spacer layer including a filling portion filled in the trench and a support portion protruding from the filling portion.
  • the step of forming the spacer layer by the patterning process comprises: forming a spacer layer by a single slit mask patterning process, wherein the mask used in the single slit mask patterning process corresponds to the trench
  • the region has a light transmissive slit and has a light transmitting portion in a region corresponding to the support portion.
  • the formed mesh filling portion can have a fine line width dimension, thereby further improving the manufacturing quality of the display substrate.
  • the transparent slit has a width of 1 to 3 ⁇ m.
  • the step of forming the spacer layer by the patterning process comprises: forming a spacer layer by a halftone mask patterning process, the mask used in the halftone mask patterning process having a region corresponding to the trench
  • the semi-transmissive portion has a full light transmitting portion in a region corresponding to the support portion.
  • the manufacturing method further includes the steps of: forming a transparent electrode layer over the color filter layer at a position where the pixel region is pre-formed, And a transparent electrode layer is formed over the black matrix layer at the position of the trench.
  • FIG. 1 is a partial plan view of a display substrate in accordance with an embodiment of the present invention.
  • Figure 2 is a cross-sectional view taken along line A-A of Figure 1;
  • Figure 3 is a cross-sectional view taken along line C-C of Figure 1;
  • FIG. 4 is a flow chart showing a method of fabricating a display substrate according to an embodiment of the invention.
  • embodiments of the present invention provide a display substrate, a liquid crystal panel, a display device, and a display substrate.
  • the present invention will be further described in detail below.
  • a display substrate includes a plurality of pixel regions 10 with trenches 11 between adjacent pixel regions 10.
  • the display substrate further includes a spacer layer 12 including a filling portion 121 filled in the groove 11 and a supporting portion 122 protruding from the mesh filling portion 121.
  • the filling portion 121 is substantially flush with the surface of the adjacent pixel region.
  • the filling portion 121 may be a mesh filling portion, and the support portion 122 is integrally formed with the filling portion 121 or the mesh filling portion 121.
  • the mesh filling portion 121 is filled in the trench between the adjacent pixel regions 10, so that the surface of the display substrate is flat, which can effectively improve the image sticking phenomenon of the display device and improve the display.
  • the support portion 122 can perform the same supporting function as the existing spacer, and since it is integrally formed with the mesh-shaped filling portion 121, the connection strength is high, so the support portion 122 is not easily peeled off in the subsequent rubbing process, It will contaminate the alignment liquid, which provides a guarantee for the manufacturing quality of the display device.
  • the specific type of the display substrate is not limited, and may be, for example, a twisted nematic (TN) mode color film substrate, or a vertical alignment (VA) mode color film substrate or the like without a flat layer.
  • TN twisted nematic
  • VA vertical alignment
  • the display substrate is a TN mode color film substrate, and the display substrate includes a base substrate 13 and a black matrix layer 14 and a color filter layer 15 disposed on the substrate 13 .
  • a transparent electrode layer 16 and a spacer layer 12 wherein the black matrix layer 14 includes a plurality of black matrix units 141, and gaps 18 corresponding to the positions of the pixel regions 10 are formed between adjacent black matrix units 141, and color filters are formed.
  • the film layer 15 includes color filter units 151 disposed corresponding to each of the gaps, and a groove 11 is formed between the adjacent color filter units 151.
  • the transparent electrode layer 16 is disposed above the color filter film layer 15 at the position of the pixel region, and the transparent electrode layer 16 is disposed between the black matrix layer 14 and the spacer layer 12 at the position of the groove.
  • the spacer layer 12 may also be formed directly on the black matrix layer in the trench without the need to provide the transparent electrode layer 16.
  • the support portion 122 of the spacer layer 12 may be located between adjacent pixel regions 10 in the row direction or between adjacent pixel regions 10 in the column direction.
  • the supporting portion 122 has a structure of continuously supporting the connecting wall on the mesh filling portion 121 to achieve better substrate support; and the supporting portion 122 can be disposed on the peripheral non-display area of the display substrate, so that the formation is performed.
  • the upper and lower substrates of the display substrate prevent the liquid crystal from rapidly diffusing on the substrate and are contaminated by the sealant.
  • the embodiment of the invention further provides a liquid crystal panel comprising the display substrate provided by the foregoing embodiments.
  • the liquid crystal panel is applied to a display device. Compared with the prior art, the image sticking phenomenon of the display screen is improved, and the display quality is high. In addition, the thickness uniformity of the liquid crystal layer in the liquid crystal panel is good, and the display quality is further ensured.
  • the embodiment of the invention further provides a display device, which comprises the liquid crystal panel provided by the foregoing embodiment.
  • a display device which comprises the liquid crystal panel provided by the foregoing embodiment.
  • the specific type of display device is not limited, and may be, for example, a liquid crystal display, a liquid crystal television, a tablet computer, a mobile phone, or the like.
  • the embodiment of the invention further provides a method for manufacturing a display substrate, the method comprising the following steps:
  • the spacer layer is formed by a patterning process, and the spacer layer includes a mesh filling portion filled in a groove between adjacent pixel regions and a support portion protruding from the mesh filling portion.
  • the manufacturing method specifically includes the following steps:
  • Step 101 Form a black matrix layer on the base substrate of the display substrate by a patterning process, the black matrix layer includes a plurality of black matrix units, and adjacent black matrix units are formed to correspond to positions of the pre-formed pixel regions. The gap.
  • Step 102 Form a color filter layer on the base substrate of the display substrate by a patterning process, the color filter layer includes a color filter unit disposed corresponding to each of the gaps, and the groove is located adjacent to the color Between the filter units.
  • each of the substrates may be formed on the substrate by using a mask matching the pattern of the substrate red filter unit. a pattern of red filter cells, and then a pattern of each green filter unit is formed on the substrate using a mask matching the substrate green filter unit pattern, and then a mask matching the pattern of the substrate blue filter unit is used A pattern of each of the blue filter units is formed on the substrate.
  • the order of the steps of forming the color filter unit described above can also be interchanged.
  • Step 103 forming a transparent electrode layer over the color filter layer at a position where the pixel region is pre-formed, and forming a transparent electrode layer over the black matrix layer at the position of the trench.
  • the transparent electrode layer can be specifically formed by a sputtering process.
  • Step 104 forming a spacer layer in the trench by a patterning process, the spacer layer including a filling portion filled in the trench and a supporting portion protruding from the filling portion.
  • step 103 is optional.
  • the step 104 is implemented in the following manner: the spacer layer is formed by a single slit mask patterning process, and the mask used in the single slit mask patterning process has a light-transmissive slit in the corresponding groove region, corresponding to The area of the support has a light transmitting portion.
  • the width of the light-transmitting slit is 1 to 3 ⁇ m.
  • the mask plate used in the single slit mask patterning process has a light-transmissive slit in a region corresponding to the groove, and has a light-transmitting portion in a region corresponding to the support portion, and is diffracted by the slit of the light when the substrate is subjected to exposure processing.
  • the substrate is pre-formed in a region where the mesh-shaped filling portion is exposed, and after development, a pattern of the mesh-shaped filling portion is formed.
  • the shape of the light transmitting portion of the mask is matched with the shape of the support portion, and may be a circle, a square, or the like.
  • the step 104 may also be implemented by forming a spacer layer by a halftone mask patterning process, and the mask used in the halftone mask patterning process has a semi-transmissive portion in a region corresponding to the trench, There is a full light transmitting portion in a region corresponding to the support portion.
  • the mesh filling portion is filled in the trench between the adjacent pixel regions, so that the surface of the display substrate is flat, and the residual phenomenon of the display device can be effectively improved.
  • the display quality of the display device is improved.
  • the support portion can play the same supporting function as the existing spacer, and since it is integrally formed with the mesh filling portion, the connection strength is high, so that the support portion is not easily peeled off in the subsequent rubbing process, and the alignment liquid is not contaminated.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
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Abstract

一种显示基板、液晶面板、显示装置及显示基板的制作方法。显示基板包括多个像素区(10),相邻的像素区(10)之间具有沟槽(11),所述显示基板还包括隔垫物层(12),所述隔垫物层(12)包括填充于所述沟槽(11)内的填充部(121)以及凸出于所述填充部(121)的支撑部(122)。填充部(121)填充于相邻像素区(10)之间的沟槽(11)内,从而提升显示基板表面平坦性,有效改善显示装置的残影不良现象,提高显示装置的显示品质。支撑部(122)用于支撑上、下基板,该支撑部(122)与填充部(121)一体形成,连接强度高;在摩擦取向工序中柱状支撑部(122)不易脱落,不会污染取向液,因此显示装置的制造品质提高。

Description

显示基板、液晶面板、显示装置及显示基板的制作方法
本申请要求于2016年3月2日递交中国专利局的、申请号为201610118365.3的中国专利申请的权益,该申请的全部公开内容以引用方式并入本文。
技术领域
本发明涉及显示技术领域,特别是涉及一种显示基板、液晶面板、显示装置及显示基板的制作方法。
背景技术
在平板显示装置中,薄膜晶体管液晶显示器(Thin Film Transistor Liquid Crystal Display,简称TFT-LCD)具有体积小、功耗低、制造成本相对较低和无辐射等特点,在当前的平板显示器市场占据了主导地位。
TFT-LCD的液晶面板的主要结构包括:对盒设置的阵列基板和彩膜基板,以及填充于阵列基板和彩膜基板之间的液晶层,此外,为保证液晶层厚度的均一性,彩膜基板在靠近液晶层的一侧还设置有隔垫物。
在不添加平坦层的情况下,彩膜基板的相邻像素区之间会有比较明显的沟槽,彩色滤光单元四周的角段差更加大了沟槽的深度,从而导致显示装置的显示画面出现残影不良,显示品质欠佳。另外,彩膜基板的隔垫物在后续摩擦工序中可能会脱落,不仅污染了取向液,也会影响液晶层厚度均一性,进而降低显示装置的图像显示品质。
发明内容
本发明实施例的目的是提供一种显示基板、液晶面板、显示装置及显示基板的制作方法,以改善显示装置的残影不良现象,提高隔垫物的连接强度,从而提高显示装置的显示品质。
本发明实施例提供了一种显示基板,包括多个像素区,相邻的像素区之间具有沟槽,所述显示基板还包括隔垫物层,所述隔垫物层包括填充于所述沟槽内的填充部以及凸出于所述填充部的支撑部。
在本发明实施例技术方案中,填充部填充于相邻像素区之间的沟槽内,从而使得显示基板表面平坦性较好,可以有效改善显示装置的残影不良现象,提高了显示装置的显示品质。支撑部能够起到与现有隔垫物相同的支撑作用,并且由于其与填充部一体形成,连接强度较高,因此在后续的摩擦工序中支撑部不易脱落,不会污染到取向液,这些为显示装置的制造品质提供了保障。
其中,所述填充部为网状填充部,并且所述支撑部与所述填充部一体形成。
优选的,所述显示基板为彩膜基板,包括衬底基板以及设置在衬底基板上的黑矩阵层、彩色滤光膜层和所述隔垫物层,其中,所述黑矩阵层包括多个黑矩阵单元,相邻的黑矩阵单元之间形成与像素区的位置相对应的空隙,所述彩色滤光膜层包括对应每个空隙设置的彩色滤光单元,所述沟槽位于相邻彩色滤光单元之间。
具体的,所述显示基板还包括透明电极层,在像素区的位置处该透明电极层设置在彩色滤光膜层上方,在沟槽的位置处该透明电极层设置在所述黑矩阵层和所述隔垫物层之间。
优选的,所述支撑部在填充部上呈连续的支撑连接挡墙的结构。
优选的,所述支撑部设置在显示基板的周边非显示区域中。
本发明实施例还提供了一种液晶面板,包括前述任一技术方案所述的显示基板。该液晶面板应用于显示装置,相比现有技术,显示画面的残影不良现象得以改善,显示品质较高,此外,液晶面板中液晶层的厚度均一性较好,也进一步保障了显示品质。
本发明实施例还提供了一种显示装置,包括前述技术方案所述的液晶面板,相比现有技术,显示画面的残影不良现象得以改善,显示品质较高。
本发明实施例还提供了一种显示基板的制作方法,包括如下步骤:
通过构图工艺形成隔垫物层,所述隔垫物层包括填充于相邻像素区之间的沟槽内的填充部以及凸出于所述填充部的支撑部。
采用本发明实施例方法制作的显示基板,填充部填充于相邻像素区之间的沟槽内,从而使得显示基板表面平坦性较好,可以有效改善显示装置的残影不良现象,提高了显示装置的显示品质。支撑部能够起到与现有隔垫物相同的支撑作用,并且由于其与填充部一体形成,连接强度较高,因此在后续的摩擦工序中支撑部不易脱落,不会污染到取向液,这些为显示装置的制造品质提供了保障。
在一个实施例中,所述显示基板为彩膜基板,所述制作方法具体包括如下步骤:
通过构图工艺在显示基板的衬底基板之上形成黑矩阵层,所述黑矩阵层包括多个黑矩阵单元,相邻的黑矩阵单元之间形成与预形成像素区的位置相对应的空隙;
通过构图工艺在显示基板的衬底基板之上形成彩色滤光膜层,所述彩色滤光膜层包括对应每个空隙设置的彩色滤光单元,所述沟槽位于相邻的彩色滤光单元之间;
通过构图工艺在所述沟槽内形成隔垫物层,所述隔垫物层包括填充于所述沟槽内的填充部以及凸出于所述填充部的支撑部。
优选的,通过构图工艺形成隔垫物层的步骤包括:通过单狭缝掩模构图工艺形成隔垫物层,所述单狭缝掩模构图工艺中使用的掩模板在对应所述沟槽的区域具有透光狭缝,在对应所述支撑部的区域具有透光部。
采用单狭缝掩模构图工艺,可以使形成的网状填充部具有精细化的线宽尺寸,从而进一步提升显示基板的制造品质。
较佳的,所述透光狭缝的宽度为1~3μm。
优选的,通过构图工艺形成隔垫物层的步骤包括:通过半色调掩模构图工艺形成隔垫物层,所述半色调掩模构图工艺中使用的掩模板在对应所述沟槽的区域具有半透光部,在对应所述支撑部的区域具有全透光部。
可选的,在形成彩色滤光膜层之后且在形成隔垫物层之前,所述制作方法还包括如下步骤:在预形成像素区的位置处在彩色滤光膜层上方形成透明电极层,并且在沟槽的位置处在黑矩阵层上方形成透明电极层。
附图说明
图1为根据本发明一实施例的显示基板的局部俯视图;
图2为图1的A-A向截面视图;
图3为图1的C-C向截面视图;
图4为根据本发明一实施例的显示基板的制作方法的流程示意图。
附图标记:
10-像素区
11-沟槽
12-隔垫物层
121-填充部或网状填充部
122-支撑部
13-衬底基板
14-黑矩阵层
141-黑矩阵单元
15-彩色滤光膜层
151-彩色滤光单元
16-透明电极层
18-空隙
具体实施方式
为改善显示装置的残影不良现象,提高隔垫物的连接强度,以提高显示装置的显示品质,本发明实施例提供了一种显示基板、液晶面板、显示装置及显示基板的制作方法。为使本发明的目的、技术方案和优点更加清楚,以下举实施例对本发明作进一步详细说明。
如图1至图3所示,本发明一实施例提供的显示基板包括多个像素区10,相邻的像素区10之间具有沟槽11。显示基板还包括隔垫物层12,隔垫物层12包括填充于沟槽11内的填充部121以及凸出于网状填充部121的支撑部122。优选地,填充部121与相邻的像素区的表面大致平齐。填充部121可以为网状填充部,并且支撑部122与填充部121或网状填充部121一体形成。
该实施例提供的显示基板的结构中无需设置平坦层。采用该实施例的结构,网状填充部121填充于相邻像素区10之间的沟槽内,从而使得显示基板表面平坦性较好,可以有效改善显示装置的残影不良现象,提高了显示装置的显示品质。此外,支撑部122能够起到与现有隔垫物相同的支撑作用,并且由于其与网状填充部121一体形成,连接强度较高,因此在后续的摩擦工序中支撑部122不易脱落,不会污染到取向液,这些为显示装置的制造品质提供了保障。
显示基板的具体类型不限,例如可以为扭曲向列(Twisted Nematic,简称TN)模式彩膜基板,或者未设置平坦层的垂直取向(vertical alignment,简称VA)模式彩膜基板等等。
如图2和图3所示,以显示基板为TN模式彩膜基板为例,该显示基板包括衬底基板13以及设置在衬底基板13之上的黑矩阵层14、彩色滤光膜层15、透明电极层16和隔垫物层12,其中,黑矩阵层14包括多个黑矩阵单元141,相邻的黑矩阵单元141之间形成与像素区10位置相对应的空隙18,彩色滤光膜层15包括对应每个空隙设置的彩色滤光单元151,相邻彩色滤光单元151之间形成沟槽11。在像素区的位置处透明电极层16设置在彩色滤光膜层15上方,在沟槽的位置处透明电极层16设置在黑矩阵层14和隔垫物层12之间。
对于其它模式的彩膜基板,隔垫物层12也可以直接形成在沟槽内的黑矩阵层之上,而不需要设置透明电极层16。
此外,值得注意是,隔垫物层12的支撑部122可以位于行向的相邻像素区10之间,也可以位于列向的相邻像素区10之间。
另外,该支撑部122在网状填充部121上呈连续的支撑连接挡墙的结构,以实现更好的基板支撑;且该支撑部122可设置在显示基板的周边非显示区域,使得在形成显示基板的上下基板对盒工艺时防止液晶在基板上快速扩散而被封框胶污染。
本发明实施例还提供了一种液晶面板,包括前述实施例提供的显示基板。该液晶面板应用于显示装置,相比现有技术,显示画面的残影不良现象得以改善,显示品质较高,此外,液晶面板中液晶层的厚度均一性较好,也进一步保障了显示品质。
本发明实施例还提供了一种显示装置,包括前述实施例提供的液晶面板,相比现有技术,显示画面的残影不良现象得以改善,显示品质较高。显示装置的具体类型不限,例如可以为液晶显示器、液晶电视、平板电脑、手机等等。
本发明实施例还提供了一种显示基板的制作方法,该方法包括以下步骤:
通过构图工艺形成隔垫物层,隔垫物层包括填充于相邻像素区之间的沟槽内的网状填充部以及凸出于网状填充部的支撑部。
具体的,如图4所示,以显示基板为彩膜基板为例,该制作方法具体包括以下步骤:
步骤101、通过构图工艺在显示基板的衬底基板之上形成黑矩阵层,所述黑矩阵层包括多个黑矩阵单元,相邻的黑矩阵单元之间形成与预形成像素区的位置相对应的空隙。
步骤102、通过构图工艺在显示基板的衬底基板之上形成彩色滤光膜层,所述彩色滤光膜层包括对应每个空隙设置的彩色滤光单元,所述沟槽位于相邻的彩色滤光单元之间。
具体的,当基板的彩色滤光单元的颜色包含红色(R)、绿色(G)和蓝色(B)时,可以首先使用与基板红色滤光单元图案相匹配的掩模板在基板上形成各个红色滤光单元的图案,然后使用与基板绿色滤光单元图案相匹配的掩模板在基板上形成各个绿色滤光单元的图案,之后再使用与基板蓝色滤光单元图案相匹配的掩模板在基板上形成各个蓝色滤光单元的图案。上述形成彩色滤光单元的步骤顺序也可以互换。
步骤103、在预形成像素区的位置处在彩色滤光膜层上方形成透明电极层,并且在沟槽的位置处在黑矩阵层上方形成透明电极层。透明电极层具体可以采用溅射工艺形成。
步骤104、通过构图工艺在所述沟槽内形成隔垫物层,所述隔垫物层包括填充于所述沟槽内的填充部以及凸出于所述填充部的支撑部。
其中,所述步骤103是可选的。
优选的,步骤104采用以下方式实施:通过单狭缝掩模构图工艺形成隔垫物层,单狭缝掩模构图工艺中使用的掩模板在对应沟槽的区域具有透光狭缝,在对应支撑部的区域具有透光部。
较佳的,透光狭缝的宽度为1~3μm。单狭缝掩模构图工艺中使用的掩模板在对应沟槽的区域具有透光狭缝,在对应支撑部的区域具有透光部,在对基板进行曝光处理时,通过光的狭缝衍射使基板预形成网状填充部的区域曝光,显影后形成网状填充部的图案。掩模板透光部的形状与支撑部的形状相匹配,可以为圆形、方形等。采用单狭缝掩模构图工艺,可以使形成的网状填充部具有精细化的线宽尺寸,从而进一步提升显示基板的制造品质。
作为可选方案,步骤104也可以采用以下方式实施:通过半色调掩模构图工艺形成隔垫物层,半色调掩模构图工艺中使用的掩模板在对应沟槽的区域具有半透光部,在对应支撑部的区域具有全透光部。
采用本发明实施例方法制作的显示基板,网状填充部填充于相邻像素区之间的沟槽内,从而使得显示基板表面平坦性较好,可以有效改善显示装置的残影不良现象, 提高了显示装置的显示品质。支撑部能够起到与现有隔垫物相同的支撑作用,并且由于其与网状填充部一体形成,连接强度较高,因此在后续的摩擦工序中支撑部不易脱落,不会污染到取向液,这些为显示装置的制造品质提供了保障。
显然,本领域的技术人员可以对本发明进行各种改动和变型而不脱离本发明的精神和范围。这样,倘若本发明的这些修改和变型属于本发明权利要求及其等同技术的范围之内,则本发明也意图包含这些改动和变型在内。

Claims (15)

  1. 一种显示基板,包括多个像素区,相邻的像素区之间具有沟槽,其特征在于,所述显示基板还包括:
    隔垫物层,所述隔垫物层包括填充于所述沟槽内的填充部以及凸出于所述填充部的支撑部。
  2. 如权利要求1所述的显示基板,其中所述填充部为网状填充部,并且所述支撑部与所述填充部一体形成。
  3. 如权利要求1或2所述的显示基板,其特征在于,所述显示基板为彩膜基板,包括衬底基板以及设置在衬底基板上的黑矩阵层、彩色滤光膜层和所述隔垫物层,其中,所述黑矩阵层包括多个黑矩阵单元,相邻的黑矩阵单元之间形成与像素区的位置相对应的空隙,所述彩色滤光膜层包括对应每个空隙设置的彩色滤光单元,所述沟槽位于相邻彩色滤光单元之间。
  4. 如权利要求3所述的显示基板,其特征在于,所述显示基板还包括透明电极层,在像素区的位置处该透明电极层设置在彩色滤光膜层上方,在沟槽的位置处该透明电极层设置在所述黑矩阵层和所述隔垫物层之间。
  5. 如权利要求1-4中任一项所述的显示基板,其特征在于,所述支撑部在填充部上呈连续的支撑连接挡墙的结构。
  6. 如权利要求1-5中任一项所述的显示基板,其特征在于,所述支撑部设置在显示基板的周边非显示区域中。
  7. 一种液晶面板,其特征在于,包括如权利要求1~6任一项所述的显示基板。
  8. 一种显示装置,其特征在于,包括如权利要求7所述的液晶面板。
  9. 一种显示基板的制作方法,其特征在于,包括如下步骤:
    通过构图工艺形成隔垫物层,所述隔垫物层包括填充于相邻像素区之间的沟槽内的填充部以及凸出于所述填充部的支撑部。
  10. 如权利要求9所述的制作方法,其中一体地形成所述支撑部与所述填充部。
  11. 如权利要求9或10所述的制作方法,其特征在于,所述显示基板为彩膜基板,所述制作方法具体包括如下步骤:
    通过构图工艺在显示基板的衬底基板之上形成黑矩阵层,所述黑矩阵层包括多个黑矩阵单元,相邻的黑矩阵单元之间形成与预形成像素区的位置相对应的空隙;
    通过构图工艺在显示基板的衬底基板之上形成彩色滤光膜层,所述彩色滤光膜层包括对应每个空隙设置的彩色滤光单元,所述沟槽位于相邻的彩色滤光单元之间;
    通过构图工艺在所述沟槽内形成隔垫物层,所述隔垫物层包括填充于所述沟槽内的填充部以及凸出于所述填充部的支撑部。
  12. 如权利要求9或10所述的制作方法,其特征在于,通过构图工艺形成隔垫物层的步骤包括:通过单狭缝掩模构图工艺形成隔垫物层,所述单狭缝掩模构图工艺中使用的掩模板在对应所述沟槽的区域具有透光狭缝,在对应所述支撑部的区域具有透光部。
  13. 如权利要求12所述的制作方法,其特征在于,所述透光狭缝的宽度为1~3μm。
  14. 如权利要求9或10所述的制作方法,其特征在于,通过构图工艺形成隔垫物层的步骤包括:通过半色调掩模构图工艺形成隔垫物层,所述半色调掩模构图工艺中使用的掩模板在对应所述沟槽的区域具有半透光部,在对应所述支撑部的区域具有全透光部。
  15. 如权利要求11所述的制作方法,在形成彩色滤光膜层之后且在形成隔垫物层之前,所述制作方法还包括如下步骤:在预形成像素区的位置处在彩色滤光膜层上方形成透明电极层,并且在沟槽的位置处在黑矩阵层上方形成透明电极层。
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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007327985A (ja) * 2006-06-06 2007-12-20 Toppan Printing Co Ltd カラーフィルタの製造方法及びカラーフィルタ
CN101303522A (zh) * 2007-05-10 2008-11-12 比亚迪股份有限公司 一种带间隔物的彩色滤光片、液晶显示器及其制作方法
CN101770108A (zh) * 2008-12-26 2010-07-07 北京京东方光电科技有限公司 彩膜基板及制造方法和液晶显示面板
CN102628971A (zh) * 2011-05-03 2012-08-08 京东方科技集团股份有限公司 一种彩色滤光片及其制作方法、装置
CN105572960A (zh) * 2016-03-02 2016-05-11 京东方科技集团股份有限公司 显示基板、液晶面板、显示装置及显示基板的制作方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4105261B2 (ja) * 1997-08-20 2008-06-25 株式会社半導体エネルギー研究所 電子機器の作製方法
KR101299693B1 (ko) * 2006-06-29 2013-08-28 가부시키가이샤 아루박 액정 표시 장치용 컬러 필터 기판 및 그의 제조 방법
US7932972B2 (en) * 2006-10-02 2011-04-26 Lg Display Co., Ltd. Substrate for liquid crystal display device and method of fabricating the same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007327985A (ja) * 2006-06-06 2007-12-20 Toppan Printing Co Ltd カラーフィルタの製造方法及びカラーフィルタ
CN101303522A (zh) * 2007-05-10 2008-11-12 比亚迪股份有限公司 一种带间隔物的彩色滤光片、液晶显示器及其制作方法
CN101770108A (zh) * 2008-12-26 2010-07-07 北京京东方光电科技有限公司 彩膜基板及制造方法和液晶显示面板
CN102628971A (zh) * 2011-05-03 2012-08-08 京东方科技集团股份有限公司 一种彩色滤光片及其制作方法、装置
CN105572960A (zh) * 2016-03-02 2016-05-11 京东方科技集团股份有限公司 显示基板、液晶面板、显示装置及显示基板的制作方法

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