Classifications

• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
  • C23C14/14—Metallic material, boron or silicon
  • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
  • C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
  • C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
  • C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
  • C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
  • C03C17/09—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals by deposition from the vapour phase
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
  • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
  • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
  • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
  • C03C17/3642—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating containing a metal layer
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
  • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
  • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
  • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
  • C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
  • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
  • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
  • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
  • C03C17/3684—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating being used for decoration purposes
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
  • C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
  • C03C23/0025—Other surface treatment of glass not in the form of fibres or filaments by irradiation by a laser beam
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/02—Pretreatment of the material to be coated
  • C23C14/021—Cleaning or etching treatments
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/02—Pretreatment of the material to be coated
  • C23C14/021—Cleaning or etching treatments
  • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/04—Coating on selected surface areas, e.g. using masks
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
  • C23C14/34—Sputtering
  • C23C14/3435—Applying energy to the substrate during sputtering
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
  • C23C14/34—Sputtering
  • C23C14/3464—Sputtering using more than one target
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/58—After-treatment
  • C23C14/5806—Thermal treatment
• • G—PHYSICS
  • G02—OPTICS
  • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
  • G02B5/00—Optical elements other than lenses
  • G02B5/008—Surface plasmon devices
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2217/00—Coatings on glass
  • C03C2217/20—Materials for coating a single layer on glass
  • C03C2217/25—Metals
  • C03C2217/251—Al, Cu, Mg or noble metals
  • C03C2217/254—Noble metals
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2217/00—Coatings on glass
  • C03C2217/40—Coatings comprising at least one inhomogeneous layer
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2217/00—Coatings on glass
  • C03C2217/70—Properties of coatings
  • C03C2217/72—Decorative coatings
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2218/00—Methods for coating glass
  • C03C2218/10—Deposition methods
  • C03C2218/15—Deposition methods from the vapour phase
  • C03C2218/154—Deposition methods from the vapour phase by sputtering
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2218/00—Methods for coating glass
  • C03C2218/30—Aspects of methods for coating glass not covered above
  • C03C2218/31—Pre-treatment

Definitions

• Certain example embodiments of this invention relate to coated articles including metal island layer(s), and/or methods of making the same. More particularly, certain example embodiments of this invention relate to techniques for improving the uniformity of, and/or conformance to a desired pattern for, metal island layer(s) formed on a substrate (e.g., a glass or other transparent substrate), and/or associated products.
• a substrate e.g., a glass or other transparent substrate
• MILs generally involve a discontinuous, or continuous and interrupted, layer of a so-called inert or noble metal disposed on a transparent substrate (such as, for example, a glass substrate).
• a transparent substrate such as, for example, a glass substrate.
• Gold oftentimes is used as the conductive noble metal, although silver, copper, and/or other metals may be used in place of gold in different cases.
• Inert or noble metals oftentimes are preferred for durability reasons, and because high conductivity is believed to generate stronger plasmons.
• Fig. 1 is a schematic view of a metal island layer 104 on a substrate 102. The metal islands 106a-106e are spaced apart, and the extensions therefrom represent the surface plasmons.
• MILs at least in theory can allow for novel optical properties to be achieved, while circumventing classical absorption approaches. That is, by creating a large dielectric/metal area via formation of MILs, unique optical effects at least in theory can be achieved with highly tunable optical characteristics related to, for example, the geometry of islands, the optical and conductive nature of the island material, and the optical nature of surrounding dielectric materials. Coloration, for instance, typically depends on the length, width, height, and density of the metal islands, as well as the conductivity of the material. The coloration of such coated articles tends to be less angularly dependent than coated articles formed using bulk materials.
• absorptive-like effects at least in theory could be implemented via sputter deposition in an economical way.
• early stage thin film growth from a continuous deposition flux is known to proceed from initial island formation until a percolation limit is reached. Islands connect at the percolation limit, forming an interconnected but sub-continuous layer, until a continuous layer ultimately is formed. MILs thus in theory could be formed faster than continuous layers using sputtering techniques.
• MILs typically form non-uniformly, or differently from desired patterns, especially when attempts are made to scale beyond laboratory-scale dimensions. For instance, scaling becomes difficult beyond even 4 square inch laboratory experiments.
• a method of making a coated article comprising a metal island layer supported by a substrate.
• the substrate has a surface to be coated. Local surface
• the metal island layer is formed, directly or indirectly, on the surface of the substrate in a desired pattern defined, at least in part, as a result of the selective modifying.
• a method of making a coated article comprising a substrate having a surface to be coated.
• a layer comprising a plurality of islands is formed on the surface to be coated in making the coated article.
• First and second targets that are different from one another are co-sputtered.
• the sputtering of material is selectively adjusted, using a laser, to adjust chemical interactions taking place at the surface to be coated in forming the layer comprising islands on the substrate.
• Each of the islands comprises metal, the islands collectively creating a surface plasmon effect the causes the coated article to have a desired optical appearance.
• FIGURE 1 is a schematic view of a metal island layer on a substrate
• FIGURE 2 is a graph showing how intrinsic non-uniformities can be compensated for in order to obtain desired island formation, in accordance with certain example embodiments;
• FIGURE 3 helps demonstrate how a laser or other energy source can be used to print a thermal pattern on a substrate and therefore affect island formation, in accordance with certain example embodiments;
• FIGURE 4 helps demonstrate how a laser or other energy source or magnetic field can be used to control surface stoichiometry and therefore affect island formation, in accordance with certain example embodiments;
• FIGURE 5 helps demonstrate how a laser or other energy source or magnetic field can be used to control material stoichiometry by rastering over or otherwise affecting one or more targets and therefore affect island formation, in accordance with certain example embodiments;
• FIGURE 6 is a flowchart illustrating a process for forming a metal island layer on a substrate in accordance with certain example embodiments.
• Certain example embodiments relate to techniques for improving the uniformity of, and/or conformance to a desired pattern for, metal island layers (MILs) formed on a substrate (e.g., a glass or other transparent substrate), and/or associated products.
• MILs metal island layers
• Certain example embodiments form MILs using a laser or other energy source or magnetic field assisted technique, e.g., to compensate for non-uniformities that otherwise likely would result in the MIL diverging from its desired configuration.
• a laser or other energy source may be used to introduce heat onto a substrate, enable pulsed laser deposition, raster a target that includes the MIL metal to be deposited, raster a substrate where the MIL is to be formed, and/or the like.
• magnetic fields can be used to create localized effects that influence, in part, MIL formation on a substrate.
• tunable sputtering magnet bars and magnetic bars or other means of controlling magnetic fields may be used to control substrate uniformity to create a desired MIL pattern.
• Fig. 2 is a graph showing how intrinsic non-uniformities can be compensated for in order to obtain desired island formation, in accordance with certain example embodiments.
• the solid line in Fig. 2 represents desired island formation.
• the dashed line in Fig. 2 represents how intrinsic non-uniformities would affect the island size as a function of position on the substrate.
• the dotted line in Fig. 2 is the inverse of the dashed line.
• the MIL formation process may be controlled to in essence create the profile represented by the dotted line.
• the dashed line shows the impact of surface condition, chemical interaction, energy flux, and/or other non-uniformities, on island formation.
• the MIL growth can be affected by the kinetic energy of the adatoms forming the islands, the substrate temperature, chemical interactions with respect to the material(s) being deposited and the substrate and/or targets used, and surface roughness.
• the inventors have realized that the kinetic energy and roughness factors typically are controlled or controllable via the MIL formation apparatus (e.g., the sputtering apparatus and/or process parameters used therewith).
• the MIL formation apparatus e.g., the sputtering apparatus and/or process parameters used therewith.
• certain example embodiments focus on improving uniformity and/or conformance to a desired pattern by primarily targeting one or more of the above-described and/or other factors. It will be appreciated, however, that certain example embodiments may also seek to influence MIL formation via kinetic energy and/or surface roughness adjustments in addition to, or in place of, these primary sources of non-uniformities.
• certain example embodiments reference the creation of uniform MIL layers, it will be appreciated that non-uniformities in different areas of the substrate may be desired in some instances.
• certain example embodiments may be used to simulate tinted glass, and/or other color control applications. In such cases, high uniformity of MIL formation across the entire viewing area may be desired.
• the example techniques disclosed herein may be used to create patterns for applications such as, for example, polarizing effects; signage; conductive pathways for photovoltaic, electrochromic or other electronics applications; bird friendly glass; logos; and/or the like. In such cases, strong delineation between areas of MIL formation and non-formation may be desired, and the techniques disclosed herein may be used to facilitate such the creation of the relevant pattern(s).
• the techniques disclosed herein may be used to help control how the coating interacts with light as a function of angle of incidence relative to the substrate.
• the techniques disclosed herein may be used to reduce angular dependency (e.g., to help provide the same or substantially the same color at all angles), whereas the techniques disclosed herein may be used to enhance angular dependency (e.g., to help block light at certain angles such as from the sun high in the sky) in other cases.
• the effect may depend on the specific MIL configuration including length, width, height, density, and orientation, and MIL formation may be customized using the techniques described herein to realize
• Fig. 3 helps demonstrate how a laser or other energy source can be used to print a thermal pattern on a substrate and therefore affect island formation, in accordance with certain example embodiments. That is, Fig. 3 shows how laser or other energy source intensity can be varied over the position of the substrate (and/or with respect to time). This allows for selective location temperature control by controlling the laser intensity as a function of laser spot position.
• the type of laser used to increase temperature may be based on, for example, how it interacts with the substrate (or layers on the substrate) of choice, e.g., in order to provide for good temperature control.
• the laser focus size and/or shape, as well as the wavelengths, may be selected on this basis.
• the thermal conductivity of the surface(s) being heated also may be taken into account. For instance, the more thermally conductive the surface(s) being heated, the more finely sized (smaller) the laser may be, to provide for fine adjustments. Where strong delineation between areas where MIL islands are formed and are not formed, lower thermal conductivity substrates and/or layers may be desirable.
• stoichiometry may be locally tuned to affect island geometry and optical properties.
• local surface stoichiometry may be achieved by modifying the substrate and/or one or more previously formed layers thereon, e.g., the substrate itself and/or one or more thin film layers on which the MIL is to be directly or indirectly formed. This may be accomplished using a laser, ion beam, adjusting a magnetic field (e.g., using tunable magnet bars and/or the like), or other technique.
• the layer to be modified may be, for example, a thin film layer such as, for example, a silicon- inclusive layer (e.g., of or including silicon oxide, silicon nitride, or silicon oxynitride) used for blocking sodium migration, optical purposes, and/or the like).
• a layer comprising zinc oxide and/or the like also may be used for these and/or other similar purposes.
• a thin film leveling layer may be formed on the substrate, e.g., to decrease surface roughness and/or other irregularities, etc.
• a laser, ion beam, or other technique may be used to locally control stoichiometry in connection with one or more sputtering targets during MIL formation.
• Spatially non-uniform stoichiometry may be achieved, for example, through laser-modified sputtering, ion beam assisted deposition, magnetic field control, and/or the like.
• Laser-modified sputtering may be used, for example, where two materials, X and Y, are co-sputtered and the exact composition at the substrate
• XY is tuned using laser enhancement of the sputtering of one or both of the two materials (X and/or Y).
• the materials X and Y can be chosen to enhance (or diminish) as desired the chemical interaction between the substrate (and/or layer(s) thereon) and the metal island layer and therefore modify the formation of metal islands. In certain example embodiments, this may be facilitated by using two different materials that have poor inter-diffusivity.
• Fig. 4 helps demonstrate how a laser or other energy source or magnetic field can be used to control surface stoichiometry and therefore affect island formation
• Fig. 5 helps demonstrate how a laser or other energy source or magnetic field can be used to control material stoichiometry by rastering over or otherwise affecting one or more targets and/or the substrate itself (and/or layers formed thereon) and therefore affect island formation, in accordance with certain example embodiments. It will be appreciated that rastering across a target with material to be modified will typically result in more of this material being deposited.
• PLD plasma deposition
• laser rastering and/or other similar techniques may be used in connection with the MIL metal target only, with another material, with the substrate itself, with layers on the substrate, etc.
• Magnetic field control also may be used to control MIL formation in a desired pattern, e.g., as magnetic fields may be controlled using tuning bars and/or the like.
• Fig. 6 is a flowchart illustrating a process for forming a metal island layer on a substrate in accordance with certain example embodiments.
• the substrate on which the MIL is to be formed is washed and/or otherwise cleaned in step S602. This may include rinsing with de-ionized water, plasma ashing, etc.
• the substrate may be pre-heated in step S604, e.g., to precondition the substrate and remove gross-level non-uniformities prior to MIL formation. This may be accomplished, for example, using equilibrium-type heating including, for example, a furnace or the like.
• the pre-heating temperature preferably is greater than room temperature. It also preferably is less than 300 degrees C, more preferably less than 250 degrees C.
• the exact temperature may be tuned, recognizing that a temperature that is too low will result in islands unsuitable (e.g., too small) for the effect, whereas a temperature that is too high may result in a continuous layer and, thus, not a metal island layer.
• the MIL may be formed using a laser or other energy source and/or a magnetic field adjusted technique in step S606. That is, certain example embodiments may use a laser or other energy source and/or controlled magnetic field in some cases to change the surface temperature, alter the stoichiometry of material(s) provided on the substrate and/or the substrate itself prior to MIL formation, alter the stoichiometry of the target including the MIL metal material and/or a material co-sputtered with the MIL metal material, the manner in which the material is removed from the substrate and/or formed on the substrate, and/or the like.
• the MIL itself may be formed by sputtering, e.g., up to the percolation limit or other desired level where islands are preferentially formed in a desired pattern.
• the size of the islands may vary based on the application. However, an average size distribution of 3-25 nm in major diameter or distance, more preferably 5-15 nm in major diameter or distance, and for example about 10 nm (+/- 10% or 15%) will be suitable for most applications. In other cases, an average size distribution of up to about 1,000 nm in major diameter or distance may be appropriate depending on the desired effect, with an average size distribution of 100-300 nm in major diameter or distance (+/- 10% or 15%) being another example range that may be used in a wide variety of different applications.
• these techniques may be used separately, in combination, or in any combination of sub-combinations.
• these techniques may be used in-line, with modification of the substrate (via temperature and/or stoichiometry) first, etc.
• Post-processing of the substrate may take place in step S608.
• This may include, for example, protecting the formed MIL with an overcoat layer (e.g., a layer comprising silicon such as, for example, silicon oxide, silicon nitride, silicon oxynitride; a layer comprising zirconium oxide; and/or the like). It also may include cutting, seeming, shipping, heat treating (e.g., heat strengthening and/or thermal tempering), etc.
• an overcoat layer e.g., a layer comprising silicon such as, for example, silicon oxide, silicon nitride, silicon oxynitride; a layer comprising zirconium oxide; and/or the like.
• the MIL may be incorporated into a functional layer stack such as, for example, a low-emissivity coating, an anti- reflective coating, etc.
• the MILs of certain example embodiments may be formed to be of or include inert or noble metals such as, for example, ruthenium, rhodium, palladium, silver, osmium, iridium, platinum, mercury, rhenium, copper, and/or gold.
• inert or noble metals such as, for example, ruthenium, rhodium, palladium, silver, osmium, iridium, platinum, mercury, rhenium, copper, and/or gold.
• heat treatment and "heat treating” as used herein mean heating the article to a temperature sufficient to achieve thermal tempering and/or heat strengthening of the glass-inclusive article.
• This definition includes, for example, heating a coated article in an oven or furnace at a temperature of at least about 550 degrees C, more preferably at least about 580 degrees C, more preferably at least about 600 degrees C, more preferably at least about 620 degrees C, and most preferably at least about 650 degrees C for a sufficient period to allow tempering and/or heat strengthening. This may be for at least about two minutes, up to about 10 minutes, up to 15 minutes, etc., in certain example embodiments.
• a method of making a coated article comprising a metal island layer supported by a substrate.
• the substrate has a surface to be coated. Local surface
• the metal island layer is formed, directly or indirectly, on the surface of the substrate in a desired pattern defined, at least in part, as a result of the selective modifying.
• the desired pattern may be a substantially uniform pattern for the metal island layer.
• the coated article may simulate tinted glass.
• the selective modifying may delineate, at least in part, a first area where the metal island layer is to be formed and a second area where the metal island layer is not to be formed, e.g., with the first and second areas conforming to the desired pattern.
• the coated article may have an optically visible appearance, in conformance with the desired pattern, created by a surface plasmon effect of the metal island layer.
• the substrate prior to the exposing, may be pre-heated to a temperature greater than room temperature and less than 300 degrees C.
• islands of the metal island layer may have an average size distribution of 5-15 nm or 100-300 nm in diameter or major distance.
• the metal island layer may comprise a continuous but interrupted layer of islands formed from a noble or inert metal.
• the substrate may be a glass substrate.
• the selective modifying may be performed by scanning a laser across the surface to be coated.
• a sputtering target may be the source metal in the metal island layer.
• the forming of the metal island layer and the selective modifying may include co-sputtering from first and second targets that are different from one another, and using a laser to enhance sputtering of material from exactly one of the first and second targets.
• the use of the laser to enhance the sputtering may enhance chemical interaction between the surface to be coated and the metal island layer.
• the surface to be coated may be a major surface of the substrate.
• a thin film coating may be formed directly or indirectly on the substrate, and the surface to be coated may be a major surface of the thin film coating.
• a method of making a coated article comprising a substrate having a surface to be coated.
• a layer comprising a plurality of islands is formed on the surface to be coated in making the coated article.
• First and second targets that are different from one another are co-sputtered.
• the sputtering of material is selectively adjusted, using a laser, to adjust chemical interactions taking place at the surface to be coated in forming the layer comprising islands on the substrate.
• Each of the islands comprises metal, the islands collectively creating a surface plasmon effect the causes the coated article to have a desired optical appearance.
• the selective adjusting may include focusing the laser on exactly one of the first and second targets.
• the selective adjusting may enhance the sputtering of the material on which the laser is focused.

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• 2016
  • 2016-02-24 US US15/051,927 patent/US20170241009A1/en not_active Abandoned
• 2017
  • 2017-02-15 BR BR112018017287A patent/BR112018017287A2/pt not_active Application Discontinuation
  • 2017-02-15 RU RU2018133478A patent/RU2018133478A/ru not_active Application Discontinuation
  • 2017-02-15 KR KR1020187026873A patent/KR20180110145A/ko not_active Application Discontinuation
  • 2017-02-15 JP JP2018544858A patent/JP2019509244A/ja active Pending
  • 2017-02-15 CN CN201780025594.3A patent/CN109071327A/zh active Pending
  • 2017-02-15 WO PCT/US2017/017851 patent/WO2017146944A1/en active Application Filing
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