WO2017077970A1 - Système de détermination de pompe à vide et pompe à vide - Google Patents

Système de détermination de pompe à vide et pompe à vide Download PDF

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Publication number
WO2017077970A1
WO2017077970A1 PCT/JP2016/082228 JP2016082228W WO2017077970A1 WO 2017077970 A1 WO2017077970 A1 WO 2017077970A1 JP 2016082228 W JP2016082228 W JP 2016082228W WO 2017077970 A1 WO2017077970 A1 WO 2017077970A1
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WO
WIPO (PCT)
Prior art keywords
vacuum pump
gas
determination system
parameter
determination
Prior art date
Application number
PCT/JP2016/082228
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English (en)
Japanese (ja)
Inventor
高橋　克典
Original Assignee
エドワーズ株式会社
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Filing date
Publication date
Application filed by エドワーズ株式会社 filed Critical エドワーズ株式会社
Publication of WO2017077970A1 publication Critical patent/WO2017077970A1/fr

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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
    • F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
    • F04B37/16—Means for nullifying unswept space
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B51/00—Testing machines, pumps, or pumping installations

Definitions

  • the present invention relates to a determination system for a vacuum pump and a vacuum pump including the determination system for the vacuum pump. Specifically, a vacuum pump determination system that can determine in advance the abnormal state that is predicted to occur from various parameters related to the vacuum pump, measures were taken against the abnormal state, and the abnormal state was canceled by the measures taken The present invention relates to a determination system for a vacuum pump capable of determining this, and a vacuum pump including the determination system for the vacuum pump.
  • a vacuum for generating a Si film A process gas such as silane gas (SiH 4 ) is used in the chamber.
  • the exhaust gas discharged after use is exhausted to the outside from a reactor of a vacuum pump connected to a vacuum chamber which is an apparatus for a semiconductor manufacturing process.
  • Such exhaust gas may cause deposits / products to accumulate inside the vacuum pump over time. In order to remove this deposit, it is necessary to periodically maintain the vacuum pump. Generally, this maintenance is performed once every three months with the vacuum pump removed. It took time and effort to remove the vacuum pump in this way.
  • FIG. 5 is a diagram showing an example in which parameter analysis (data analysis) related to the occurrence of an abnormality in the vacuum pump is performed by a system using a computer and presented.
  • parameter analysis data analysis
  • FIG. 5 shows an example of a screen for monitoring the value of time on the horizontal axis and the value of the parameter on the vertical axis, and monitoring what numerical value the parameter targeted in advance shows over time.
  • the time value can be set in minutes, hours, weeks, months, etc. since the vacuum pump was first operated.
  • Parameters include the current value and pressure of the vacuum pump in operation. Value, temperature value, vibration value, etc. can be set.
  • FIG. 5 as an example, the monitoring of the vacuum pump is started at the point A, it is determined that the maintenance (overhaul) of the vacuum pump is necessary according to the parameter value at the point B, and At point C, it is shown that the value of the parameter encouraged the prohibition of operating the vacuum pump in a new process.
  • Patent Document 1 a detection current value detected at a predetermined position in the vacuum pump is set in advance for the purpose of preventing back flow to the vacuum chamber (chamber) due to the stop of the vacuum pump and facilitating recovery. Further, it describes a technique for closing a valve when a current set value that is smaller than an abnormal current value serving as a guideline for emergency stop of the vacuum pump and larger than a normal current value of the vacuum pump is exceeded. .
  • Patent Document 1 the technique described in Patent Document 1 is based on the premise that the vacuum pump is brought to an emergency stop when an abnormal state occurs in the vacuum pump. Therefore, abnormal conditions related to the vacuum pump that are predicted to occur are determined in advance from parameters (for example, current, voltage, temperature, etc.), and some measures are taken or taken against the abnormal conditions. Therefore, there is a problem that it cannot be determined that the abnormal state has been canceled. Further, since the occurrence of an emergency stop of the vacuum pump is confirmed, there is a problem that it is impossible to perform on-site maintenance (that is, maintenance without removing the vacuum pump from the process apparatus).
  • on-site maintenance that is, maintenance without removing the vacuum pump from the process apparatus.
  • a vacuum pump determination system that can determine in advance an abnormal state that is predicted to occur from parameters related to the vacuum pump, measures are taken against the abnormal state, and the abnormal state is canceled by the measures taken It is an object of the present invention to provide a determination system for a vacuum pump that can determine this, and a vacuum pump including the determination system for the vacuum pump.
  • the invention of claim 1 is a vacuum pump determination system that determines in advance, based on various parameters relating to the vacuum pump, an abnormality that is predicted to occur in the vacuum pump, wherein the vacuum pump is disposed. Due to the judgment gas inflow means for flowing a judgment gas in an amount more than the quantity that flows through the apparatus during operation of the apparatus and the judgment gas that is caused to flow by the judgment gas inflow means during operation of the apparatus And a parameter acquisition means for acquiring the parameter.
  • a vacuum pump determination system is provided.
  • the invention of claim 2 further includes parameter change acquisition means for acquiring the acquired change of the parameter, the change of the parameter acquired by the parameter change acquisition means, and the change of the predetermined parameter stored in advance. 2.
  • the vacuum pump determination system further comprising determination means for determining whether there is an abnormality occurring in the vacuum pump by comparing the reference values.
  • a vacuum pump determination system according to the first or second aspect, further comprising display means for displaying the parameter or a change in the parameter.
  • the determination gas is a gas other than a process gas that is flowed to the apparatus during operation of the apparatus.
  • the determination system of the vacuum pump described in 1. is provided.
  • the invention of claim 5 provides the vacuum pump judgment system according to claim 4, wherein the judgment gas is nitrogen or argon.
  • the invention according to claim 6, wherein the determination gas is a process gas that is flowed to the apparatus during operation of the apparatus.
  • a determination system for a vacuum pump is provided.
  • the present invention according to claim 7 is a vacuum pump determination system that determines in advance, based on various parameters relating to the vacuum pump, an abnormality that is predicted to occur in the vacuum pump, wherein the vacuum pump is disposed.
  • a determination system for a vacuum pump is provided.
  • the invention of claim 8 provides a vacuum pump determination system according to claim 7, further comprising display means for displaying the parameter acquired by the parameter acquisition means.
  • a vacuum pump comprising the vacuum pump determination system according to any one of the first to eighth aspects.
  • an abnormal state that is predicted to occur can be determined in advance from parameters related to the vacuum pump. Further, a measure can be taken against the abnormal state, and it can be determined that the abnormal state has been canceled by the taken measure.
  • a vacuum pump (dry pump) provided with a vacuum pump determination system according to Embodiment 1 of the present invention is not subjected to a process from the process apparatus provided in the vacuum pump.
  • a specific gas other than the process gas defined in the process apparatus hereinafter referred to as an abnormality measurement gas (judgment gas)
  • judgment gas an abnormality measurement gas
  • the vacuum pump (dry pump) is overloaded. In this way, each parameter that reacts more sensitively from each sensor is acquired. Thus, by making it react sensitively, the change of each parameter can be caught more correctly.
  • the vacuum pump (dry pump) including the vacuum pump determination system according to the second embodiment of the present invention performs cleaning in the vacuum pump (dry pump) by flowing a cleaning gas for the vacuum chamber, It is configured to monitor (monitor) the process in which the parameters relating to the vacuum pump return from the increased (amplified) numerical value to the original numerical value.
  • FIG. 1 shows a schematic configuration example for explaining a vacuum pump determination system 20 (and a vacuum pump determination system 21 described later) according to Embodiment 1 (and Embodiment 2 described later) of the present invention.
  • FIG. A vacuum pump determination system 20 according to Embodiment 1 of the present invention includes a vacuum chamber 11, a vacuum pump 12, a vacuum pipe 4, a vacuum pump 2, an exhaust pipe 5 through which exhaust gas discharged from the vacuum pump 2 flows, and an exhaust pipe 5 It comprises a detoxifying device 3 for detoxifying exhaust gas exhausted from the air, a server 6 and the like.
  • the vacuum chamber 11 is a process apparatus (process chamber) such as a wafer film forming apparatus, and is installed in a clean room.
  • the vacuum pump 12 is a vacuum pump for evacuating the process apparatus, for example, a turbo molecular pump.
  • the vacuum pipe 4 is a flow path through which the exhaust gas discharged from the vacuum pump 12 flows.
  • the vacuum pump 2 is a dry pump that serves as an auxiliary pump for the vacuum pump 12, and is connected to the vacuum pump 12 via the vacuum pipe 4.
  • the exhaust pipe 5 is a flow path through which the exhaust gas discharged from the vacuum pump 2 flows.
  • the abatement device 3 is a combustion type, plasma type or gasoline engine type abatement device connected to the vacuum pump 2 via the exhaust pipe 5.
  • Exhaust gas discharged from the process apparatus 1 including the vacuum chamber 11 and the vacuum pump 12 passes through the vacuum pipe 4, passes through the vacuum pump 2, passes through the exhaust pipe 5, and is removed to the abatement apparatus 3. It is discharged as harmless gas by being oxidized in the harming device 3.
  • the server 6 includes a CPU (Central Processing Unit) 61, a ROM (Read Only Memory) 62, a RAM (Random Access Memory) 63, a display device 64, a communication unit 65, a storage unit 66, a bus line 67, and the like.
  • the CPU 61 is a central processing unit of the server 6, and performs various numerical calculations, information processing, and device control in the RAM 63 according to programs such as an application for the determination system 20 of the vacuum pump of the first embodiment stored in the ROM 62 and the like. And so on. In the first embodiment, various calculations related to the control of the determination system 20 of the vacuum pump are performed.
  • the display device 64 is a display unit for displaying information. In the first embodiment, the display device 64 displays increase / decrease of parameters related to the determination system 20 of the vacuum pump.
  • the display device 64 may include an input unit that can accept an input operation.
  • the communication unit 65 is configured to allow the server 6 to communicate with other devices (such as the vacuum pump 2) in the vacuum pump determination system 20, and can be designed with either wireless communication or wired communication. .
  • the storage unit 66 is a large-scale storage device configured with a hard disk or the like, and stores, for example, reference parameters used for various determinations. Each configuration described above is connected by a bus line 67 which is a common path in order to exchange each data within the server 6.
  • This server 6 may be provided for each vacuum pump 2 or may be connected to a plurality of vacuum pumps 2 in a factory for processing by one server 6. In addition, a large number of vacuum pumps 2 installed in a plurality of factories may be processed by one server 6 by connecting via the Internet or the like.
  • the vacuum pipe 4 on the process apparatus 1 side disposed in the vacuum pump 2 is caused to flow to the normal process apparatus 1.
  • a configuration is adopted in which an abnormality measurement gas, which is a specific gas other than the process gas defined in the process apparatus 1, is flowed to the vacuum pump 2 in an amount equal to or greater than the amount.
  • parameter increase / decrease (determination screen) caused by flowing the abnormality measurement gas is displayed on the display device 64.
  • the display device 64 may display the acquired parameter itself, or display the change by comparing the acquired parameter with a predetermined reference value.
  • FIG. 2 is a diagram for explaining a determination (monitoring) screen in the vacuum pump determination system 20 according to the present invention.
  • the vacuum pump determination system 20 when an abnormal measurement gas of a specified amount or more flows through the vacuum pump 2 as described above, as shown in FIG. 2, various parameters monitored for the vacuum pump 2 (for example, A state in which variable factors such as a current value, a voltage value, a temperature value, a vibration value, or a combination of these values are increased is displayed on the display device 64.
  • a larger amount of gas is allowed to flow than a normal amount of gas. In this way, it is possible to react more sensitively with the abnormality measuring gas to be detected, and it is possible to increase the accuracy of each acquired parameter.
  • “SURGE” is a point that shows a numerical value that is abnormally higher than the reference value when a normal amount of gas is flowing.
  • “DIP” is a point that shows a numerical value that is abnormally lower than the reference value when a normal amount of gas is flowing.
  • the abnormality measurement gas is preferably a gas that does not generate deposits such as nitrogen (N 2 ) and argon (Ar), or silane (SiH 4 , monosilane). Further, the abnormality measurement gas may be configured to flow periodically or may be configured to flow irregularly. It should be noted that “more than the normal flow rate” corresponds to a situation such as several times, several hundred times, and several thousand times the amount of the process gas being normally flowed. Furthermore, in the above-described configuration, the abnormality measurement gas is allowed to flow from the vacuum pipe 4 provided in the vacuum pump 2, but the configuration is not limited thereto. For example, the abnormality measurement gas may be flowed through the process device 1 disposed upstream of the vacuum pump 2.
  • FIG. 3 is a flowchart for explaining the operation of the vacuum pump determination system 20 according to the first embodiment of the present invention.
  • the server 6 CPU 61
  • the server 6 supplies a large amount of abnormality measurement gas to the vacuum pump 2 (that is, more than the amount of gas flowing to the process apparatus 1 during the process).
  • Step 20 The inflow of the abnormality measurement gas is automatically caused to flow from an inlet (not shown) provided in the vacuum pipe 4 under the control of the server 6. Further, the administrator may cause the abnormality measurement gas to flow in based on the signal from the server 6. Further, it may be caused to flow from an inlet (not shown) provided in the process apparatus 1 under the control of the server 6.
  • the server 6 displays on the display device 64 an analysis screen (FIG. 2) showing the parameters of the vacuum pump 2 increased by flowing the abnormality measurement gas (step 30).
  • the increased parameter that is, an abnormal value is indicated
  • the server 6 is configured to include an audio device. This warning is performed separately from an urgent warning and the previous stage. This determination is made based on the reference values of the “SURGE” level and “DIP” level for each parameter stored in the storage unit 66. This reference value is updated sequentially in the course of many processes.
  • the update of the reference value is performed by the CPU 61 changing the value of the reference value stored in the storage unit 66 by an input from the administrator.
  • This reference value may be set finely and in detail according to the conditions of the place where the vacuum pump 2 is installed, the type of gas used, the years of use of the vacuum pump, the total usage time, and the like.
  • the warning to the administrator may be configured such that the administrator of the server 6 visually recognizes the display device 64 to determine a sign that an abnormality has occurred in the vacuum pump 2.
  • the server 6 determines whether or not to continue the operation of flowing the abnormality measurement gas (step 40).
  • This determination of continuation is configured such that the inflow continuation time when counting starts after the abnormality measurement gas has started flowing, the time when a parameter specified in advance reaches a preset threshold value, etc.
  • a configuration may be adopted in which an operation stop input by the administrator of the server 6 is received.
  • the server 6 continues to flow the abnormality measurement gas (step 20).
  • the server 6 ends the series of operations. (End).
  • various parameters monitored for the vacuum pump 2 by flowing an abnormal measurement gas in an amount more than a specified amount increase the variable factors (for example, the current value, voltage value, temperature value, vibration value, combined value, etc.), and from the parameter fluctuation values ( Figure 2) obtained in advance,
  • the variable factors for example, the current value, voltage value, temperature value, vibration value, combined value, etc.
  • Figure 2 obtained in advance
  • the occurrence of an abnormality in the vacuum pump 2 can be detected at an early stage, the detection probability can be improved, or the reliability of failure diagnosis can be improved.
  • the vacuum pump 2 can be maintained before the abnormal state occurs based on the prediction, the life of the vacuum pump 2 can be extended.
  • the exhaust gas discharged from the process apparatus 1 including the vacuum chamber 11 and the vacuum pump 12 such as a turbo molecular pump passes through the vacuum pipe 4 as in the first embodiment. Then, it is transported to the abatement device 3 through the exhaust pipe 5 via the vacuum pump 2 which is a dry pump.
  • the CPU 61 of the server 6 performs various calculations related to the control of the vacuum pump determination system 21 in the RAM 63 by a program such as an application for the vacuum pump determination system 21 stored in the ROM 62 or the like. Performs various numerical calculations, information processing, and device control.
  • the display device 64 displays the increase / decrease in parameters related to the determination system 21 of the vacuum pump.
  • the cleaning gas for the vacuum chamber 11 is caused to flow to the vacuum pump 2 from the vacuum pipe 4 on the process apparatus 1 side provided in the vacuum pump 2.
  • the vacuum pump 2 is increased in comparison with the normal values related to the vacuum pump 2.
  • the parameters that have been changed ie, the vacuum pump 2 was in an abnormal state
  • returned to the original value for example, in FIG. 2, the value that exceeded the “SURGE” level or dropped below the “DIP” level.
  • the display device 64 displays a state in which the stored value falls within the range of the “SURGE” level and the “DIP” level).
  • the cleaning gas used is desirably a gas that reduces deposits such as NF 3 (nitrogen trifluoride) and F 2 (fluorine). Furthermore, in the above-described configuration, the cleaning gas is allowed to flow from the vacuum pipe 4 on the process apparatus 1 side, but is not limited thereto.
  • the cleaning gas may be supplied to the vacuum pump 2 at the same timing as the cleaning gas for the vacuum chamber 11 is supplied to the process apparatus 1 (vacuum chamber 11).
  • FIG. 4 is a flowchart for explaining the operation of the vacuum pump determination system 21 according to the second embodiment of the present invention.
  • the server 6 first determines whether or not the process apparatus 1 disposed upstream of the vacuum pump 2 is in process (step 50). When it is determined that the process device 1 is in process (step 50: Y), the server 6 continues to monitor whether or not it is in process. Or you may make it the structure which complete
  • the server 6 displays on the display device 64 an analysis screen indicating the parameter that has been lowered (that is, returned to the normal value) by flowing the cleaning gas (step 70). At this time, it may be determined whether or not the lowered parameter is within the range of the “SURGE” level and the “DIP” level, and if it is not within the range, a warning sound or the like may be issued. This determination is made by comparing with a reference value stored in the storage unit 66. In this case, the server 6 is configured to include an audio device. The administrator of the server 6 may make a determination by visually checking the display device 64.
  • the server 6 of the vacuum pump determination system 21 determines whether or not to continue the operation of flowing the cleaning gas (step 80).
  • the determination of this continuation is configured such that the inflow continuation time when counting is started after the cleaning gas starts flowing, the time when a parameter specified in advance reaches a preset threshold value, and the like are set. Alternatively, a configuration may be adopted in which an operation stop input by the administrator of the server 6 is received.
  • the server 6 continues to flow the cleaning gas (step 60).
  • the server 6 ends the series of operations (end). ). By flowing the cleaning gas, it can be determined how much the state of the vacuum pump 2 is improved by the change in the parameters of the vacuum pump 2.
  • the vacuum pump 2 provided with the vacuum pump determination system 21 according to the second embodiment of the present invention can determine that the abnormal state has been canceled based on a change in the monitored parameter. As a result, maintenance can be performed without removing (without replacing) the vacuum pump 2. Moreover, since the maintenance is performed before the abnormal state occurs, the life of the vacuum pump 2 can be extended.
  • the specific gas in the present invention is other than the process gas specified in the process apparatus, the process gas may be used as long as the flow rate is higher than the amount that flows during the operation of the normal process apparatus.
  • the first and second embodiments of the present invention may be combined.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)

Abstract

[Problème] L'invention a pour objet de proposer un système de détermination de pompe à vide qui prédétermine une anomalie susceptible de survenir dans une pompe à vide, et une pompe à vide munie du système de détermination. [Solution] Une pompe à vide (pompe sèche) munie d'un système de détermination selon un mode de réalisation 1 de la présente invention est configurée pour fournir, dans les conditions où un processus n'est pas en cours d'exécution, un gaz servant à la mesure d'anormales, autre qu'un gaz de processus, défini pour un appareil de processus, en quantité supérieure ou égale à la quantité normale d'alimentation, à partir du côté appareil de processus disposé dans la pompe à vide. Une anomalie peut être déterminée à l'avance de manière plus exacte en augmentant (en amplifiant) puis en affichant divers paramètres.
PCT/JP2016/082228 2015-11-06 2016-10-31 Système de détermination de pompe à vide et pompe à vide WO2017077970A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015-218605 2015-11-06
JP2015218605A JP2017089462A (ja) 2015-11-06 2015-11-06 真空ポンプの判断システム、および真空ポンプ

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Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6942610B2 (ja) 2017-07-14 2021-09-29 エドワーズ株式会社 真空ポンプ、該真空ポンプに適用される温度調節用制御装置、検査用治具、及び温度調節機能部の診断方法
WO2019013118A1 (fr) * 2017-07-14 2019-01-17 エドワーズ株式会社 Pompe à vide, dispositif de commande de réglage de température appliqué à une pompe à vide, outil d'inspection et procédé de diagnostic pour unité de fonction de réglage de température
TWI654376B (zh) 2018-04-17 2019-03-21 太琦科技股份有限公司 幫浦控制系統及其操作方法
JP7374158B2 (ja) * 2021-10-15 2023-11-06 株式会社荏原製作所 生成物除去装置、処理システム及び生成物除去方法
JP2023143517A (ja) * 2022-03-25 2023-10-06 エドワーズ株式会社 真空排気システム、真空ポンプ及び真空ポンプのクリーニング方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003232292A (ja) * 2002-02-08 2003-08-22 Boc Edwards Technologies Ltd 真空ポンプ
JP2005534849A (ja) * 2002-07-29 2005-11-17 ザ ビーオーシー グループ ピーエルシー ポンプ及びポンプシステムの状態モニタ
JP2008524511A (ja) * 2004-12-22 2008-07-10 エーリコン ライボルト ヴァキューム ゲゼルシャフト ミット ベシュレンクテル ハフツング 真空スクリュポンプをクリーニングするための方法
JP2009534574A (ja) * 2006-04-18 2009-09-24 エドワーズ リミテッド 真空排気システム
WO2013161399A1 (fr) * 2012-04-24 2013-10-31 エドワーズ株式会社 Dispositif de détection de dépôt pour pompe d'échappement, et pompe d'échappement

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003232292A (ja) * 2002-02-08 2003-08-22 Boc Edwards Technologies Ltd 真空ポンプ
JP2005534849A (ja) * 2002-07-29 2005-11-17 ザ ビーオーシー グループ ピーエルシー ポンプ及びポンプシステムの状態モニタ
JP2008524511A (ja) * 2004-12-22 2008-07-10 エーリコン ライボルト ヴァキューム ゲゼルシャフト ミット ベシュレンクテル ハフツング 真空スクリュポンプをクリーニングするための方法
JP2009534574A (ja) * 2006-04-18 2009-09-24 エドワーズ リミテッド 真空排気システム
WO2013161399A1 (fr) * 2012-04-24 2013-10-31 エドワーズ株式会社 Dispositif de détection de dépôt pour pompe d'échappement, et pompe d'échappement

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