WO2017041471A1 - Système de récupération et de réutilisation de solution résiduaire de gravure à l'acide assurant des économies de ressources - Google Patents

Système de récupération et de réutilisation de solution résiduaire de gravure à l'acide assurant des économies de ressources Download PDF

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Publication number
WO2017041471A1
WO2017041471A1 PCT/CN2016/077065 CN2016077065W WO2017041471A1 WO 2017041471 A1 WO2017041471 A1 WO 2017041471A1 CN 2016077065 W CN2016077065 W CN 2016077065W WO 2017041471 A1 WO2017041471 A1 WO 2017041471A1
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WO
WIPO (PCT)
Prior art keywords
etching
liquid
storage tank
tank
resource
Prior art date
Application number
PCT/CN2016/077065
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English (en)
Chinese (zh)
Inventor
韦建敏
吴梅
赵兴文
张晓蓓
张小波
Original Assignee
成都虹华环保科技股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CN201520694170.4U external-priority patent/CN204898084U/zh
Priority claimed from CN201510569177.8A external-priority patent/CN105002501A/zh
Application filed by 成都虹华环保科技股份有限公司 filed Critical 成都虹华环保科技股份有限公司
Publication of WO2017041471A1 publication Critical patent/WO2017041471A1/fr

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/46—Regeneration of etching compositions

Definitions

  • the invention relates to an acid etching waste liquid recycling system capable of saving resources
  • the present invention relates to a waste liquid processing system, and more particularly to an acid etching waste liquid recycling system that can save resources.
  • the acidic etching solution is an etching liquid for fine circuit fabrication of a printed circuit board and fabrication of an inner layer of a multilayer board.
  • the regeneration of acid etching old liquid is mainly converted into an acidic solution of suitable specific gravity, transparency and high oxidation-reduction potential by chemical and electrochemical methods to maintain stable and rapid etching of the printed circuit board.
  • Chemical regeneration is the main method for the regeneration of acidic copper chloride etching solution. The principle is to discharge a certain proportion of the old liquid (high specific gravity), add a certain amount of liquid (low specific gravity), or add a certain amount of water. , to adjust the specific gravity of the etching solution.
  • the oxidizing agent in the same sputum liquid oxidizes the monovalent copper ion to the divalent copper ion, or the oxidizing agent is separately added to increase the oxidation-reduction potential of the etching liquid, thereby restoring the original performance of the etching liquid.
  • Common oxidants are air, oxygen, chlorine, ozone, sodium hypochlorite, sodium chlorate, hydrogen peroxide, and the like.
  • electrochemical regeneration method is an online regeneration method.
  • Metallic copper with commercial value can be produced by electrolysis, but chlorine gas is generated at the same time to form a polluted exhaust gas, which not only pollutes the environment but also causes waste.
  • Chinese Patent Application No. 2010205671550 discloses a copper ion acid etching solution regeneration system, which is used for online processing of an acidic etching solution, which is limited by the etching line production time, and can only be etched with Simultaneous production, and the exhaust gas treatment device inside the system consumes the chlorine inside the system. Although it is environmentally friendly, it causes waste of resources, causing the loss of chlorine inside the system, and additional acid solution is needed to ensure the efficiency of the etching solution. technical problem
  • a resource-saving acidic etching waste liquid recycling system including an etching liquid processing system, a chlorine gas recovery system and a regenerating liquid circulation system, and an etching liquid processing system including an etching production line a mother liquor storage tank, an electrolysis tank and a dissolution absorption system
  • the electrolysis tank comprises a cathode tank, a membrane and an anode tank
  • the mother liquor storage tank, the cathode tank, the anode tank, the dissolution absorption system are sequentially connected
  • the etching production line is respectively connected with the mother liquid storage tank and the dissolution absorption system Connected, the dissolution absorption system is in communication with the etching line
  • the dissolution absorption system is in communication with the etching line
  • the chlorine gas recovery system includes a scrubbing system and an exhaust gas treatment system, and the anode tank, the scrubbing system, and the exhaust gas treatment system are sequentially connected;
  • the regeneration liquid circulation system includes a regeneration liquid storage tank and a regeneration liquid treatment system, and the anode tank, the regeneration liquid storage tank, the reconditioning liquid treatment system, and the etching production line are sequentially connected.
  • the membrane is a membrane, a cationic membrane or an anionic membrane.
  • the cathode tank obtains electrolytic copper by electrolysis.
  • An ion concentration detecting device is disposed in the electrolytic cell.
  • the regenerative liquid processing system is provided with an acidity detecting device.
  • the apparatus and piping in the system are made of an acid-resistant, alkali-resistant, corrosion-resistant material.
  • the present invention has the following advantages:
  • the system is used for processing acid etching waste liquid, and the etching liquid can be recycled and recycled in the same manner as the metal copper is extracted, so that the etching liquid processing can be performed offline, the processing efficiency is improved, and the reasonable distribution is facilitated.
  • Resources enable dynamic balancing of etching and etching solutions, avoiding waste of resources and achieving sustainable production
  • the electrolytic chlorine gas can be recovered, and the chlorine gas is dissolved in the production line to react with the cuprous ions to form divalent copper ions, and the regenerated etching liquid is directly returned to the production line for recycling, if not and etching.
  • the electrolyzed chlorine gas can be washed and further processed to produce valuable products containing chlorine, so as to avoid polluting the environment, wasting resources, recycling chlorine and water in the system, and reducing the addition of additives or oxidants. Reduced production costs and saved resources.
  • FIG. 1 is a schematic structural view of a resource-saving acid etching waste liquid recycling system
  • a resource-saving acidic etching waste liquid recycling system includes an etching liquid processing system, a chlorine gas recovery system, and a regenerating liquid circulation system, and the etching liquid processing system includes an etching production line and a mother liquid storage tank.
  • Electrolyzer and dissolution absorption system 6 the electrolytic cell comprises a cathode tank 3, a membrane 4 and an anode tank 5, the mother liquor storage tank 2, the cathode tank 3, the anode tank 5, the dissolution absorption system 6 are sequentially connected, and the etching production line 1 and the mother liquid are respectively
  • the storage tank 2 is in communication with the dissolution absorption system 6, and the dissolution absorption system 6 is in communication with the etching line 1;
  • the chlorine gas recovery system includes a scrubbing system 7 and an exhaust gas treatment system 8, and the anode tank 5, the scrubbing system 7 and the exhaust gas treatment system 8 are sequentially connected;
  • the regenerating liquid circulation system includes a regenerant liquid storage tank 10 and a regenerating liquid processing system 11, and the anode tank 5, the regenerant liquid storage tank 10, the regenerating liquid processing system 11, and the etching production line 1 are sequentially connected.
  • the membrane 4 is a membrane, a cation membrane or an anion membrane, and which specific filtration membrane can be selected according to specific production conditions.
  • the cathode tank 3 obtains electrolytic copper 9 by electrolysis, thereby balancing the copper ions in the liquid, ensuring the benefit of the etching liquid, and avoiding the environmental pollution caused by the loss of copper in the ion form. Copper metal can be used as a commodity of commercial value.
  • an ion concentration detecting device is disposed in the electrolytic cell, and the ion concentration in the liquid is detected by the ion concentration detecting device, and the resource is appropriately allocated according to the detected information, and the flow rate is regulated, so that the etching is performed. It can achieve dynamic balance with etchant treatment, which is conducive to the realization of continuous production.
  • the regeneration liquid processing system 11 is provided with an acidity detecting device.
  • the regenerating liquid processing system 11 separates the high acidity liquid and the low acidity liquid by concentration, and can be detected by the acidity detecting device.
  • the specific value to the acidity can be used as an etchant to be utilized when the acidity reaches the desired level.
  • the device and the pipeline in the system are made of acid-proof, alkali-resistant and corrosion-resistant materials, thereby increasing the service life of the system and reducing the difficulty of maintenance.
  • the working process of the present invention is as follows:
  • the etching liquid flowing out on the etching line 1 is partially stored in the dissolution absorption system 6 for storage, and the other portion is stored in the mother liquid storage tank 2, and the flow rate is controlled by the mother liquid storage tank 2 to make the mother liquid storage tank 2
  • the etching solution enters the cathode tank 3.
  • cuprous ions are reduced to divalent copper ions, and the divalent copper ions are reduced to electrolytic copper.
  • the remaining unreduced copper ions and other ions enter the anode tank 5 through the membrane 4.
  • the working process of the present invention is as follows:
  • the etchant portion flowing out of the etching line 1 enters the dissolution absorbing system 6 for storage, and the other portion enters the mother liquid storage tank 2 for storage, and the flow rate is controlled by the mother liquid storage tank 2 to make the mother liquid storage tank 2
  • the etching solution enters the cathode tank 3.
  • the cuprous ions are reduced to divalent copper ions, and the divalent copper ions are reduced to electrolytic copper, and the electrolytic copper is washed and washed by the copper washing device 9 .
  • the remaining unreduced copper ions and other ions enter the anode tank 5 through the membrane 4.
  • Chloride ions are oxidized to form chlorine gas under the action of electrolysis in the anode tank 5.
  • chlorine gas enters the solvent absorption system 6, and undergoes redox reaction with cuprous ions to obtain copper ions and an acidic liquid.
  • the liquid can be used as an etchant to enter the etching line 1 to complete the production; when the etching line 1 is not produced, the chlorine gas enters the scrubbing system 7 to obtain pure chlorine gas after being removed, and the pure chlorine gas enters the exhaust gas treatment system 8 and is reacted to form a valuable content. Chlorine products.
  • the liquid remaining after the electrolysis contains ions such as copper ions, chloride ions, and hydrogen ions as the regenerating liquid, and the regenerating liquid has weak acidity, and the regenerating liquid enters the regenerating liquid storage tank 10 to be stored, and is regenerated.
  • the storage tank 10 controls the flow rate to be delivered to the regenerating liquid processing system 11, and the regenerating liquid is concentrated in the regenerating liquid processing system 11 to separate the high acidity liquid and the low acidity liquid, and the high acidity liquid is stored as the etching liquid and the low acidity liquid separately.
  • the high acidity liquid can be sent to the etching line 1 for production, and the low acidity liquid can be formulated into a new liquid together with the oxidant, the additive, etc., and slowly added back to the etching line to control the etching liquid.
  • ORP value which can achieve water recycling
  • Dynamic balancing can be achieved by controlling the degree of electrolysis and the flow of liquid, facilitating automated production and off-line processing of acid etching waste.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)

Abstract

Cette invention concerne un système de récupération et de réutilisation de solution résiduaire de gravure à l'acide assurant des économies de ressources, comprenant : un système de traitement de solution de gravure ; un système de recyclage de gaz de chlore ; et un système de réutilisation de solution récupérée. Ledit système de traitement de solution de gravure comprend une ligne de production de gravure (1) ; un réservoir de stockage de liqueur mère (2) ; une cellule électrolytique ; et un système d'absorption et de dissolution (6). Ladite cellule électrolytique comprend un compartiment de cathode (3) et un compartiment d'anode (5). Ledit réservoir de stockage de liqueur mère (2), le compartiment de cathode (3), le compartiment d'anode (5) et le système d'absorption et de dissolution (6) communiquent séquentiellement l'un avec l'autre. Ladite ligne de production de gravure (1) communique respectivement avec le réservoir de stockage de liqueur mère (2) et le système d'absorption et de dissolution (6). Ledit système de recyclage de gaz de chlore comprend un système d'épuration de gaz (7) et un système de traitement des gaz de queue (8). Ledit système de réutilisation de solution récupérée comprend un réservoir de stockage de solution récupérée (10) et un système de traitement de solution récupérée (11). Le compartiment d'anode (5), le système d'épuration de gaz (7) et le système de traitement des gaz de queue (8) communiquent séquentiellement l'un avec l'autre. Ledit système de récupération et de réutilisation de solution résiduaire de gravure à l'acide est configuré pour traiter une solution résiduaire de gravure acide, et il peut effectuer une opération de production hors ligne, économiser les coûts et les ressources, et éviter la pollution environnementale.
PCT/CN2016/077065 2015-09-09 2016-03-23 Système de récupération et de réutilisation de solution résiduaire de gravure à l'acide assurant des économies de ressources WO2017041471A1 (fr)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
CN201520694170.4U CN204898084U (zh) 2015-09-09 2015-09-09 一种可节约资源的酸性蚀刻废液循环再生系统
CN201520694170.4 2015-09-09
CN201510569177.8 2015-09-09
CN201510569177.8A CN105002501A (zh) 2015-09-09 2015-09-09 一种可节约资源的酸性蚀刻废液循环再生系统

Publications (1)

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WO2017041471A1 true WO2017041471A1 (fr) 2017-03-16

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WO (1) WO2017041471A1 (fr)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008139021A1 (fr) * 2007-05-16 2008-11-20 Pp Recycling Ltd. Procédé de régénération de produit d'attaque chimique usagé à base de chlorure de cuivre (ii) acide
CN202492581U (zh) * 2012-02-03 2012-10-17 昆山市洁驰环保科技发展有限公司 一种用于印制线路板酸性蚀刻液循环再生装置
CN104152905A (zh) * 2014-06-24 2014-11-19 深圳市新锐思环保科技有限公司 酸性氯化铜蚀刻液电解再生循环及铜板回收装置及方法
CN104630825A (zh) * 2015-01-20 2015-05-20 昆山美源达环保科技有限公司 一种酸性蚀刻液电解提铜装置及其工艺
CN105002501A (zh) * 2015-09-09 2015-10-28 成都虹华环保科技股份有限公司 一种可节约资源的酸性蚀刻废液循环再生系统
CN204898084U (zh) * 2015-09-09 2015-12-23 成都虹华环保科技股份有限公司 一种可节约资源的酸性蚀刻废液循环再生系统
CN105177583A (zh) * 2015-09-09 2015-12-23 成都虹华环保科技股份有限公司 一种零排放酸性蚀刻废液循环再生方法及系统
CN204982052U (zh) * 2015-09-09 2016-01-20 成都虹华环保科技股份有限公司 一种零排放酸性蚀刻废液循环再生系统

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008139021A1 (fr) * 2007-05-16 2008-11-20 Pp Recycling Ltd. Procédé de régénération de produit d'attaque chimique usagé à base de chlorure de cuivre (ii) acide
CN202492581U (zh) * 2012-02-03 2012-10-17 昆山市洁驰环保科技发展有限公司 一种用于印制线路板酸性蚀刻液循环再生装置
CN104152905A (zh) * 2014-06-24 2014-11-19 深圳市新锐思环保科技有限公司 酸性氯化铜蚀刻液电解再生循环及铜板回收装置及方法
CN104630825A (zh) * 2015-01-20 2015-05-20 昆山美源达环保科技有限公司 一种酸性蚀刻液电解提铜装置及其工艺
CN105002501A (zh) * 2015-09-09 2015-10-28 成都虹华环保科技股份有限公司 一种可节约资源的酸性蚀刻废液循环再生系统
CN204898084U (zh) * 2015-09-09 2015-12-23 成都虹华环保科技股份有限公司 一种可节约资源的酸性蚀刻废液循环再生系统
CN105177583A (zh) * 2015-09-09 2015-12-23 成都虹华环保科技股份有限公司 一种零排放酸性蚀刻废液循环再生方法及系统
CN204982052U (zh) * 2015-09-09 2016-01-20 成都虹华环保科技股份有限公司 一种零排放酸性蚀刻废液循环再生系统

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