WO2017000426A1 - 阵列基板、显示面板、显示装置和制备阵列基板的方法 - Google Patents

阵列基板、显示面板、显示装置和制备阵列基板的方法 Download PDF

Info

Publication number
WO2017000426A1
WO2017000426A1 PCT/CN2015/092076 CN2015092076W WO2017000426A1 WO 2017000426 A1 WO2017000426 A1 WO 2017000426A1 CN 2015092076 W CN2015092076 W CN 2015092076W WO 2017000426 A1 WO2017000426 A1 WO 2017000426A1
Authority
WO
WIPO (PCT)
Prior art keywords
protective layer
transparent substrate
array substrate
thickness
photoelastic coefficient
Prior art date
Application number
PCT/CN2015/092076
Other languages
English (en)
French (fr)
Inventor
祝明
铃木照晃
Original Assignee
京东方科技集团股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 京东方科技集团股份有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US15/126,704 priority Critical patent/US10133096B2/en
Priority to EP15884174.2A priority patent/EP3321728B1/en
Publication of WO2017000426A1 publication Critical patent/WO2017000426A1/zh

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/0128—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on electro-mechanical, magneto-mechanical, elasto-optic effects
    • G02F1/0131—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on electro-mechanical, magneto-mechanical, elasto-optic effects based on photo-elastic effects, e.g. mechanically induced birefringence
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133528—Polarisers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133528—Polarisers
    • G02F1/133533—Colour selective polarisers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/13363—Birefringent elements, e.g. for optical compensation

Definitions

  • the present invention relates to the field of display devices, and in particular, to an array substrate, a display panel including the array substrate, a display device including the display panel, and a method of preparing an array substrate.
  • Birefringence is a phenomenon in which a light beam is incident on an anisotropic crystal and is decomposed into two beams refracted in different directions.
  • the two beams after decomposition are linearly polarized light whose directions of vibration are perpendicular to each other.
  • the birefringence of an optical polymer mainly includes two types of oriented birefringence and photoelastic birefringence.
  • photoelastic birefringence is birefringence caused by elastic deformation of a polymer.
  • the optical component if the temperature of the optical component changes, the volume of the optical component shrinks, thereby causing elastic deformation in the material, and elastic deformation of the material causes photoelastic birefringence.
  • the liquid crystal display panel During the manufacture and use of the liquid crystal display panel, stress is applied to cause the liquid crystal display panel to be elastically deformed. Therefore, the photoelastic birefringence of the liquid crystal display panel changes, which may cause light leakage.
  • the birefringence of the optical resin is generally lowered by changing the main chain orientation of the resin material forming the polarizer or the protective layer of the liquid crystal display panel or removing the elastic deformation, but this greatly reduces the production efficiency.
  • An object of the present invention is to provide an array substrate, a display panel including the array substrate, a display device including the display panel, and a method of preparing an array substrate, the array substrate having no optical double Refractive.
  • an array substrate comprising a transparent substrate and a polarizer attached to the transparent substrate,
  • the polarizer includes a first protective layer in contact with the transparent substrate, wherein the following relationship is satisfied between the first protective layer and the transparent substrate:
  • C is the comprehensive photoelastic coefficient, defined by the following formula (1):
  • C 100 is a photoelastic coefficient of the transparent substrate, wherein C 100 may have a first predetermined value
  • ⁇ 100 is the density of the transparent substrate, wherein ⁇ 100 may have a second predetermined value
  • d 100 is the thickness of the transparent substrate, wherein d 100 may have a third predetermined value
  • C 200 is a photoelastic coefficient of the first protective layer
  • ⁇ 200 is the density of the first protective layer
  • d 200 is the thickness of the first protective layer.
  • C 0.
  • the first protective layer may have a thickness not exceeding a fourth predetermined value, and the material of the first protective layer is a mixture of the base material and the additive such that the photoelastic coefficient of the first protective layer satisfies Relationship.
  • the base material is cellulose triacetate or a cyclic olefin copolymer
  • the additive is methyl methacrylate, trifluoroethyl methacrylate, trichloroethyl methacrylate or benzyl methacrylate Any one of trimethylcyclohexyl methacrylate and pentafluorophenyl methacrylate.
  • the transparent substrate has a photoelastic coefficient of (0.5 to 3) ⁇ 10 -12 Pa -1 .
  • the polarizer further comprises a second protective layer and a polarizing layer sandwiched between the first protective layer and the second protective layer, the material of the polarizing layer being polystyrene modified triacetate Cellulose or cyclic olefin copolymer.
  • the transparent substrate has a thickness of 100 to 300 ⁇ m
  • the first protective layer has a thickness of 65 to 85 ⁇ m.
  • a display panel comprising the above array substrate provided by the present invention.
  • the array substrate comprises a pixel circuit, and the pixel circuit is disposed on a surface of the transparent substrate where the first protective layer is not disposed.
  • the array substrate comprises a color film layer, and the color film layer is disposed on a surface of the transparent substrate where the first protective layer is not disposed.
  • a display device including the above display panel provided by the present invention is provided.
  • a method for preparing an array substrate comprising:
  • the polarizer comprising a first protective layer in contact with the transparent substrate, wherein a photoelastic coefficient C 200 , a density ⁇ 200 and a thickness d 200 of the first protective layer are set, Let the relationship 0 ⁇
  • the photoelastic coefficient C 200 and the density ⁇ 200 of the first protective layer are predetermined, and the thickness d 200 thereof is determined by the predetermined photoelastic coefficient C 200 and the density ⁇ 200 according to the relationship. .
  • the thickness d 200 of the first protective layer is predetermined, and its photoelastic coefficient C 200 and density ⁇ 200 are determined by the predetermined thickness d 200 according to the relationship.
  • the material from which the first protective layer is made is a mixture of a matrix material and an additive, and by adjusting the composition of the mixture, the first having the determined photoelastic coefficient C 200 and density ⁇ 200 is obtained .
  • the protective layer is a mixture of a matrix material and an additive, and by adjusting the composition of the mixture, the first having the determined photoelastic coefficient C 200 and density ⁇ 200 is obtained .
  • the matrix material is a cellulose triacetate or a cyclic olefin copolymer
  • the additive is methyl methacrylate, trifluoroethyl methacrylate, trichloroethyl methacrylate, benzene methacrylate Methyl ester, trimethylcyclohexyl methacrylate and methacrylic acid Any of fluorophenyl esters.
  • the thickness of the first protective layer or the material of the first protective layer needs to be adjusted to ensure that the finally formed array substrate is under stress.
  • the lower photoelastic birefringence changes to zero (or close to zero), so that the light leakage caused by the photoelastic birefringence of the finally formed display panel can be eliminated or reduced.
  • FIG. 1 is a schematic cross-sectional view of an array substrate provided by the present invention.
  • the array substrate includes a transparent substrate 100 and a first protective layer 200 attached to the transparent substrate 100, wherein the first protective layer 200 and The transparent substrate 100 satisfies the relationship of 0 ⁇
  • C 100 is a photoelastic coefficient of the transparent substrate, and C 100 may have a first predetermined value
  • ⁇ 100 is the density of the transparent substrate, and ⁇ 100 may have a second predetermined value
  • d 100 is the thickness of the transparent substrate, d 100 may have a third predetermined value
  • C 200 is a photoelastic coefficient of the first protective layer
  • ⁇ 200 is the density of the first protective layer
  • d 200 is the thickness of the first protective layer.
  • C 0.
  • the photoelastic birefringence change rate of an array substrate is usually calculated by the following formula (2):
  • ⁇ n ph is the birefringence change rate of the material
  • C is the photoelastic coefficient of the array substrate
  • ⁇ is the stress of the array substrate.
  • the photoelastic birefringence of the array substrate is zero regardless of the presence or absence of stress inside the array substrate, thereby solving problems such as light leakage.
  • C is not zero, as long as
  • the transparent substrate 100 is preselected by the designer. Therefore, the photoelastic coefficient C 100 of the transparent substrate, the density ⁇ 100 of the transparent substrate 100 , and the thickness d 100 of the transparent substrate are known.
  • the density ⁇ 200 of the first protective layer 200 and the photoelastic coefficient C 200 of the first protective layer are both determined by the material of the first protective layer 200. That is, as long as it is determined that the material of the first protective layer 200 is determined, the density ⁇ 200 of the first protective layer 200 and the photoelastic coefficient C 200 of the first protective layer can be determined.
  • the array substrate can be designed as follows:
  • the polarizer should have the function of a polarizer in a liquid crystal display device. Therefore, the polarizer should include a polarizing layer 300, and the polarizing layer 300 is disposed on the first protective layer 200.
  • the first protective layer 200 has two main functions, one is to cooperate with the transparent substrate 100 to prevent light leakage, and the other The function is to protect the polarizing layer 300 from water.
  • the first protective layer 200 and the polarizing layer 300 are both made of an organic material, and the first protective layer 200 is disposed on the transparent substrate 100 to increase the degree of adhesion of the polarizing layer 300.
  • the array substrate when designing the array substrate provided by the present invention, it is not necessary to consider the improvement of the materials of other film layers in the polarizer (for example, the polarizing layer 300 and the second protective layer 400 which will be mentioned later), and only need to adjust the first
  • the thickness d 200 of a protective layer 200 or the material of the first protective layer can ensure that the finally formed array substrate has a photoelastic birefringence change of zero (or close to zero) under stress, thereby eliminating or reducing The light leakage phenomenon of the finally formed liquid crystal display panel due to photoelastic birefringence.
  • the specific material of the transparent substrate 100 is not limited.
  • the transparent substrate 100 may be a glass substrate or a substrate made of other transparent materials.
  • first predetermined value "second predetermined value” and “third predetermined value” described above are all predetermined by the designer in the process of designing the array substrate. These values depend on the application of the array substrate, the material supplier's condition, etc., that is, for the designer, the above predetermined values are known. of.
  • the thickness range of the first protective layer 200 can be set, that is, in the present invention, the thickness of the first protective layer 200 does not exceed the fourth predetermined value.
  • the steps S1 to S3 described above are performed, that is, the material of the first protective layer 200 can be made by adjustment, thereby obtaining the first protective layer 200 having a thickness not exceeding the fourth predetermined value.
  • the material from which the first protective layer is made is a mixture of a matrix material and an additive. The designer can select a base material and an additive having a known photoelastic coefficient, and a material having a photoelastic coefficient C 200 and a density ⁇ 200 can be obtained by mixing the two in a predetermined ratio.
  • cellulose triacetate may be selected as the matrix material, and accordingly, the additive may be selected from methyl methacrylate, trifluoroethyl methacrylate, trichloroethyl methacrylate, benzene methacrylate. Any one of a methyl ester, trimethylcyclohexyl methacrylate, and pentafluorophenyl methacrylate.
  • the monomers using the negative photoelastic coefficient are preferably used in the production process of the polarizing plate as the monomers listed in Table 1, but are not limited to this table, and any negative photoelastic coefficient can be used for the modification of the polarizing plate substrate.
  • a chemical or physical addition means to modify a polymer which can be used for a polarizing plate film such as TAC, 0-TAC, COP or 0-COP. (This proposal is not limited to TAC and COP Polymer, any film that can be used for polarizing plates is suitable)
  • the photoelastic birefringence of the opposite sign is added to cancel one of the birefringences of any of the matrix polymers.
  • the thickness of the transparent substrate 100 may be 100 to 300 ⁇ m, the thickness of the polarizer is 15 to 25 ⁇ m, and the thickness of the first protective layer 200 is 65 to 85 ⁇ m.
  • the photoelastic coefficient of the transparent substrate may be (0.5 to 3) ⁇ 10 -12 Pa -1 .
  • the transparent substrate has a photoelastic coefficient C 100 of 3.0 ⁇ 10 -12 Pa -1 .
  • the material of the polarizer may be a polystyrene-modified TAC material or a COP material having a photoelastic coefficient of -9.1 ⁇ 10 -12 Pa ⁇ 1 .
  • the thickness of the transparent substrate 100 may be 200 ⁇ m, the thickness of the polarizer is 15 to 25 ⁇ m, and the thickness of the protective layer is 70.0 ⁇ m.
  • the polarizer in order to ensure the normal function of the polarizer, includes a polarizing layer 300.
  • the polarizer may further include a second protection.
  • the layer 400 and the polarizing layer 300 are sandwiched between the first protective layer 200 and the second protective layer 400.
  • the specific material of the polarizing layer 300 is not particularly limited.
  • the material of the polarizing layer 300 may be polystyrene-modified triacetate or a cyclic olefin copolymer.
  • the material of the second protective layer 400 is also not particularly limited.
  • the material of the second protective layer 400 may be the same as the material of the first protective layer 200.
  • the material of the second protective layer 400 may be a TAC material.
  • a display panel comprising an array substrate, and the array substrate is the above array substrate provided by the present invention.
  • the display panel is a liquid crystal display panel.
  • the integrated photoelastic coefficient C of the array substrate is zero or almost zero, even if the display panel is subjected to stress, the photoelastic birefringence change is still close to zero, thereby greatly reducing the The light leakage of the display panel is described.
  • the array substrate of the display panel as described above may include a pixel circuit provided on a surface of the transparent substrate where the first protective layer is not provided.
  • the first protective layer and the pixel circuit are respectively disposed on both sides of the transparent substrate.
  • the pixel circuit described herein refers to the power on the array substrate for realizing the display function. road.
  • the pixel circuit includes a gate line, a data line, a thin film transistor, a common electrode line, a common electrode, and a pixel electrode.
  • the manner in which the pixel circuits are arranged is well known in the art and will not be described again here.
  • the array substrate may further include a color film layer disposed on a surface of the transparent substrate where the first protective layer is not disposed.
  • the color film layer and the first protective layer are respectively disposed on both sides of the transparent substrate.
  • the color film layer comprises color blocks of three colors of red, green and blue, or the color film layer may further comprise a color block of a fourth color other than red, green and blue, and the fourth color may be It is yellow, cyan, etc. How to set the color film layer is well known in the art and will not be described here.
  • a display device comprising a display panel, wherein the display panel is the above display panel provided by the present invention.
  • the integrated photoelastic coefficient of the array substrate is zero or almost zero, the probability of light leakage of the display device is greatly reduced.
  • the display device may be an electronic device such as a mobile phone, a desktop computer, a notebook computer, a tablet computer, a navigator, or the like.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Polarising Elements (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

一种阵列基板、显示面板、显示装置和制备阵列基板的方法，所述阵列基板包括透明基板（100）和贴在所述透明基板（100）上的偏光片，所述偏光片包括与所述透明基板（100）接触的第一保护层（200），所述第一保护层（200）和所述透明基板（100）之间满足关系式0≤丨C丨≤1.0×10 -13Pa -1，其中C由公式定义。在设计阵列基板时，无需考虑对偏光片的材料进行改进，只需要调节第一保护层（200）的厚度或者第一保护层（200）的材料即可确保最终形成的阵列基板在受到应力的情况下光弹性双折射率变化为零，或者接近于零，从而可以消除或降低最终形成的液晶显示面板因光弹性双折射而产生的漏光现象。

Description

阵列基板、显示面板、显示装置和制备阵列基板的方法 技术领域
本发明涉及显示装置领域，具体地，涉及一种阵列基板、一种包括所述阵列基板的显示面板、一种包括所述显示面板的显示装置和一种制备阵列基板的方法。
背景技术
双折射是光束入射到各向异性的晶体后分解为两束沿不同方向折射的光的现象，分解后的两束光为振动方向互相垂直的线偏振光。光学聚合物的双折射主要包括取向双折射和光弹性双折射两种。其中，光弹性双折射是由聚合物的弹性变形而引起的双折射。在光学部件的使用过程中，如果光学部件的温度发生变化，那么光学部件的体积会发生收缩，从而在材料中产生弹性变形，材料的弹性变形会引起光弹性双折射。
在液晶显示面板的制造和使用的过程中会受到应力的作用，使液晶显示面板产生弹性变形，因此，液晶显示面板的光弹性双折射率会发生改变，从而会导致漏光现象的产生。
在现有技术中，通常通过改变形成液晶显示面板的偏光片或保护层的树脂材料的主链取向或者去除弹性变形来降低光学树脂的双折射性，但是这样会大大降低生产效率。
因此，如何通过简单的方法消除光学双折射性成为本领域亟待解决的技术问题。
发明内容
本发明的目的在于提供一种阵列基板、一种包括所述阵列基板的显示面板、一种包括所述显示面板的显示装置、和一种制备阵列基板的方法，所述阵列基板不具有光学双折射性。
为了实现上述目的，作为本发明的一个方面，提供一种阵列基板，所述阵列基板包括透明基板和贴在所述透明基板上的偏光片， 所述偏光片包括与所述透明基板接触的第一保护层，其中，所述第一保护层和所述透明基板之间满足以下关系式：
0≤|C|≤1.0×10-13
其中C为综合光弹性系数，由如下公式(1)定义：
Figure PCTCN2015092076-appb-000001
其中，
C100为所述透明基板的光弹性系数，其中C100可以具有第一预定值；
ρ100为所述透明基板的密度，其中ρ100可以具有第二预定值；
d100为所述透明基板的厚度，其中d100可以具有第三预定值；
C200为所述第一保护层的光弹性系数；
ρ200为所述第一保护层的密度；
d200为所述第一保护层的厚度。
优选地，C＝0。
优选地，所述第一保护层厚度可以不超过第四预定值，制成所述第一保护层的材料为基体材料和添加剂的混合物，以使得所述第一保护层的光弹性系数满足所述关系式。
优选地，所述基体材料为三醋酸纤维素或环烯烃共聚物，所述添加剂为甲基丙烯酸甲酯、甲基丙烯酸三氟乙酯、甲基丙烯酸三氯乙酯、甲基丙烯酸苯甲酯、甲基丙烯酸三甲基环己酯和甲基丙烯酸五氟苯酯中的任意一种。
优选地，所述透明基板的光弹性系数为(0.5～3)×10-12Pa-1。
优选地，所述偏光片还包括第二保护层和夹在所述第一保护层与所述第二保护层之间的偏光层，所述偏光层的材料为聚苯乙烯改性的三醋酸纤维素或者环烯烃共聚物。
优选地，所述透明基板的厚度为100～300μm，所述第一保护层的厚度为65～85μm。
作为本发明的另一个方面，提供一种显示面板，所述显示面板包括本发明所提供的上述阵列基板。
优选地，所述阵列基板包括像素电路，所述像素电路设在所述透明基板上未设所述第一保护层的表面上。
优选地，所述阵列基板包括彩膜层，所述彩膜层设置在所述透明基板上未设所述第一保护层的表面上。
作为本发明的还一个方面，提供一种显示装置，所述显示装置包括本发明所提供的上述显示面板。
作为本发明的还一个方面，提供一种制备阵列基板的方法，所述阵列基板包括透明基板和贴在所述透明基板上的偏光片，所述方法包括：
提供透明基板，所述透明基板的光弹性系数为C100，密度为ρ100，厚度为d100，
在所述透明基板上设置偏光片，所述偏光片包括与所述透明基板接触的第一保护层，其中设置所述第一保护层的光弹性系数C200、密度ρ200和厚度d200，使得满足关系式0≤|C|≤1.0×10-13，其中C为综合光弹性系数，由如下公式(1)定义：
Figure PCTCN2015092076-appb-000002
优选地，设置所述第一保护层的光弹性系数C200、密度ρ200和厚度d200，使得C＝0。
优选地，所述第一保护层的光弹性系数C200和密度ρ200是预定的，而其厚度d200是根据所述关系式由所述预定的光弹性系数C200和密度ρ200确定的。
优选地，所述第一保护层的厚度d200是预定的，而其光弹性系数C200和密度ρ200是根据所述关系式由所述预定的厚度d200确定的。
更优选地，制成所述第一保护层的材料为基体材料和添加剂的混合物，通过调节所述混合物的组成，获得具有所述确定的光弹性系数C200和密度ρ200的所述第一保护层。
还更优选地，所述基体材料为三醋酸纤维素或环烯烃共聚物，所述添加剂为甲基丙烯酸甲酯、甲基丙烯酸三氟乙酯、甲基丙烯酸三氯乙酯、甲基丙烯酸苯甲酯、甲基丙烯酸三甲基环己酯和甲基丙烯酸五 氟苯酯中的任意一种。
在设计本发明所提供的阵列基板时，无需考虑对偏光片的材料进行改进，只需要调节第一保护层的厚度或者第一保护层的材料即可确保最终形成的阵列基板在受到应力的情况下光弹性双折射率变化为零(或者接近于零)，从而可以消除或降低最终形成的显示面板因光弹性双折射而产生的漏光现象。
附图说明
附图是用来提供对本发明的进一步理解，并且构成说明书的一部分，与下面的具体实施方式一起用于解释本发明，但并不构成对本发明的限制。在附图中：
图1是本发明所提供的阵列基板的剖视示意图。
附图标记说明
100：透明基板    200：第一保护层
300：偏光层      400：第二保护层
具体实施方式
以下结合附图对本发明的具体实施方式进行详细说明。应当理解的是，此处所描述的具体实施方式仅用于说明和解释本发明，并不用于限制本发明。
作为本发明的一个方面，提供一种阵列基板，如图1所示，所述阵列基板包括透明基板100和贴在该透明基板100上的第一保护层200，其中，第一保护层200和透明基板100之间满足关系式0≤|C|≤1.0×10-13，其中C为综合光弹性系数，由如下公式(1)定义：
Figure PCTCN2015092076-appb-000003
其中，C100为透明基板的光弹性系数，C100可以具有第一预定值；
ρ100为透明基板的密度，ρ100可以具有第二预定值；
d100为所述透明基板的厚度，d100可以具有第三预定值；
C200为所述第一保护层的光弹性系数；
ρ200为所述第一保护层的密度；
d200为所述第一保护层的厚度。
优选地，C＝0。
需要指出的是，此处的C＝0是最理想的情况，但在工业生产中有可能达不到该理想情况。因此，在工业生产中，只要使得|C|≤1.0×10-13即可基本上满足实际要求。
在本领域中，通常利用以下公式(2)来计算阵列基板的光弹性双折射变化率：
Δnph＝C×σ          (2)
其中，Δnph为材料的双折射变化率；
C为阵列基板的光弹性系数；
σ为阵列基板的应力。
当如公式(1)中所示的阵列基板的综合光弹性系数C为零时，无论阵列基板内部是否存在应力，阵列基板的光弹性双折射都是零，从而解决了如漏光等问题。当C不为零时，只要|C|≤1.0×10-13，虽然在应力下有双折射出现，但在阵列基板通常所处的应力条件下，引起的双折射接近于零，并不导致会引起问题的漏光现象的产生，从而也可以解决漏光问题。当然，使得C为零是优选的方案。
在设计阵列基板时，透明基板100是由设计人员预先选定的，因此，透明基板的光弹性系数C100、透明基板100的密度ρ100、透明基板的厚度d100是已知的。
第一保护层200的密度ρ200和该第一保护层的光弹性系数C200都是由第一保护层200的材料所确定的。也就是说，只要确定了第一保护层200的材料是确定的，那么就可以确定第一保护层200的密度ρ200和该第一保护层的光弹性系数C200。
通过上述关系式可以获得第一保护层200的厚度d200、第一保护层200的密度ρ200与其光弹性系数C200之间的关系。得知了上述三者的关系之后，可以按照如下方式设计所述阵列基板：
S1、利用现有的用于制作第一保护层200的材料的光弹性系数和密度计算该材料制成的第一保护层的厚度；
S2、判断上述厚度是否超过预定值，如果超过预定值则表明第一保护层过厚，如果上述厚度未过厚的话，则利用上述材料制作具有上述厚度的第一保护层；如果上述厚度过厚，则需要通过提高第一保护层的光弹性系数来降低厚度，此时需要对现有的用于制作第一保护层的材料进行改性，得到改性后的材料；
S3、利用改性后的材料的的光弹性系数和密度计算该改性后的材料制成的第一保护层的厚度。
重复上述三个步骤，直至得到厚度未超过预定值的第一保护层为止，从而确定了制作偏光片中第一保护层的材料。
容易理解的是，在本发明中，所述偏光片应当具有液晶显示装置中偏光片的功能。因此，所述偏光片应当包括偏光层300，偏光层300设置在第一保护层200上，第一保护层200的主要作用有两个，一个是与透明基板100配合防止漏光的产生，另一个作用则是对偏光层300进行防水保护。并且，第一保护层200和偏光层300都是由有机材料制成，在透明基板100上先设置第一保护层200还可以增加偏光层300贴附的牢固程度。
总之，在设计本发明所提供的阵列基板时，无需考虑对偏光片中其他膜层(例如，偏光层300以及下文中将提到的第二保护层400)的材料进行改进，只需要调节第一保护层200的厚度d200或者选择第一保护层的材料即可确保最终形成的阵列基板在受到应力的情况下光弹性双折射率变化为零(或者接近于零)，从而可以消除或降低最终形成的液晶显示面板因光弹性双折射而产生的漏光现象。
在本发明中，对透明基板100的具体材料并没有限定，例如，透明基板100可以为玻璃基板，也可以为其他透明材料制成的基板。本领域技术人员应当理解的是，上文中所述的“第一预定值”、“第二预定值”和“第三预定值”均是设计人员在设计阵列基板的过程中预先确定的。这些值取决于阵列基板所应用的场合、材料供应商的情况等等，也就是说，对于设计人员而言，上述预定值均是已知 的。
如上文中所述，在设计阵列基板时，可以设定第一保护层200的厚度范围，即，在本发明中，第一保护层200的厚度不超过第四预定值。设定的第四预定值之后，执行上文中所述的步骤S1至步骤S3，即可通过调节制作第一保护层200的材料，从而获得厚度不超过第四预定值的第一保护层200。制成所述第一保护层的材料为基体材料和添加剂的混合物。设计人员可以选择光弹性系数已知的基体材料和添加剂，通过将二者按照预定的比例混合可以获得具有光弹性系数C200和密度ρ200的材料。
在本发明中，可以选用三醋酸纤维素作为基体材料，相应地，所述添加剂可以选自甲基丙烯酸甲酯、甲基丙烯酸三氟乙酯、甲基丙烯酸三氯乙酯、甲基丙烯酸苯甲酯、甲基丙烯酸三甲基环己酯和甲基丙烯酸五氟苯酯中的任意一种。
表1中给出了上述各种玻璃基板、偏光板膜层材料及添加剂的光弹性系数。
表1
Figure PCTCN2015092076-appb-000004
在偏光板的制作过程中优选的使用负光弹性系数的单体如表1中列出的单体，但不限于此表，任何负性光弹性系数的可用于偏光板基材改性的通过化学或物理添加的方式来改性TAC、0-TAC、COP或者0-COP等可用于偏光板膜材的聚合物。(本提案不仅限于TAC及COP 聚合物，任意可用于偏光板的膜材均适用)
添加相反符号的光弹性双折射来抵消任一种基体聚合物的双折射中的一种。
在本发明中，透明基板100的厚度可以为100～300μm，偏光片的厚度为15-25μm，第一保护层200的厚度为65-85μm。所述透明基板的光弹性系数可以为(0.5～3)×10-12Pa-1。作为本发明的一种优选实施方式，所述透明基板的光弹性系数C100为3.0×10-12Pa-1。相应地，所述偏光片的材料通常可以为聚苯乙烯改性的TAC材料或者COP材料，其光弹性系数为-9.1×10-12Pa-1。在这种情况中，透明基板100的厚度可以为200μm，偏光片的厚度为15-25μm，保护层的厚度为70.0μm。
如上文中所述，为了保证偏光片的正常功能，该偏光片包括偏光层300，为了保护偏光层300不被磨损并且防止水分进入偏光层300，优选地，所述偏光片还可以包括第二保护层400，偏光层300夹在第一保护层200与第二保护层400之间。在本发明中，对偏光层300的具体材料并没有特殊的限制，例如，偏光层300的材料可以为聚苯乙烯改性的三醋酸纤维素或者环烯烃共聚物。
在本发明中，对第二保护层400的材料也没有特殊的限制，例如，第二保护层400的材料可以与第一保护层200的材料相同。或者，第二保护层400的材料可以为TAC材料。
作为本发明的另一个方面，提供一种显示面板，所述显示面板包括阵列基板，所述阵列基板为本发明所提供的上述阵列基板。
容易理解的是，所述显示面板为液晶显示面板。
由于所述阵列基板的综合光弹性系数C为零或几乎为零，因此，即使在所述显示面板受到应力的作用的情况下，光弹性双折射率变化仍然接近于零，从而可以大幅降低所述显示面板的漏光。
如上文中所述显示面板的阵列基板可以包括像素电路，所述像素电路设在所述透明基板上未设所述第一保护层的表面上。换言之，所述第一保护层和所述像素电路分别设置在所述透明基板的两侧。
此处所述的像素电路是指阵列基板上的用于实现显示功能的电 路。像素电路包括栅线、数据线、薄膜晶体管、公共电极线、公共电极和像素电极。像素电路的设置方式是本领域中所公知的，这里不再赘述。
如上文中所述，所述阵列基板还可以包括彩膜层，所述彩膜层设置在所述透明基板上未设所述第一保护层的表面上。换言之，所述彩膜层和所述第一保护层分别设置在所述透明基板的两侧。所述彩膜层包括红、绿、蓝三种颜色的色阻块，或者，彩膜层还可以包括除红、绿、蓝之外的第四种颜色的色阻块，第四种颜色可以为黄色、青色等。如何设置彩膜层是本领域所公知的，这里不再赘述。
作为本发明的再一个方面，提供一种显示装置，所述显示装置包括显示面板，其中所述显示面板为本发明所提供的上述显示面板。
由于阵列基板的综合光弹性系数为零或几乎为零，因此，所述显示装置漏光几率被大大降低。
在本发明中，所述显示装置可以是手机、台式电脑、笔记本电脑、平板电脑、导航仪等电子设备。
可以理解的是，以上实施方式仅仅是为了说明本发明的原理而采用的示例性实施方式，然而本发明并不局限于此。对于本领域内的普通技术人员而言，在不脱离本发明的精神和实质的情况下，可以做出各种变型和改进，这些变型和改进也视为本发明的保护范围。

Claims (17)

  1. 一种阵列基板，所述阵列基板包括透明基板和贴在所述透明基板上的偏光片，所述偏光片包括与所述透明基板接触的第一保护层，其特征在于，所述第一保护层和所述透明基板之间满足以下关系式：
    0≤|C|≤1.0×10-13
    其中C为综合光弹性系数，由如下公式(1)定义：
    Figure PCTCN2015092076-appb-100001
    其中，C100为所述透明基板的光弹性系数；
    ρ100为所述透明基板的密度；
    d100为所述透明基板的厚度；
    C200为所述第一保护层的光弹性系数；
    ρ200为所述第一保护层的密度；
    d200为所述第一保护层的厚度。
  2. 根据权利要求1所述的阵列基板，其特征在于，C＝0。
  3. 根据权利要求1所述的阵列基板，其特征在于，制成所述第一保护层的材料为基体材料和添加剂的混合物，以使得所述第一保护层的光弹性系数满足所述关系式。
  4. 根据权利要求3所述的阵列基板，其特征在于，所述基体材料为三醋酸纤维素或环烯烃共聚物，所述添加剂为甲基丙烯酸甲酯、甲基丙烯酸三氟乙酯、甲基丙烯酸三氯乙酯、甲基丙烯酸苯甲酯、甲基丙烯酸三甲基环己酯和甲基丙烯酸五氟苯酯中的任意一种。
  5. 根据权利要求1至4中任意一项所述的阵列基板，其特征在于，所述透明基板的光弹性系数为(0.5～3)×10-12Pa-1。
  6. 根据权利要求5所述的阵列基板，其特征在于，所述偏光片还包括第二保护层和夹在所述第一保护层与所述第二保护层之间的偏光层，所述偏光层的材料为聚苯乙烯改性的三醋酸纤维素或者环烯烃共聚物。
  7. 根据权利要求1所述的阵列基板，其特征在于，所述透明基板的厚度为100～300μm，所述第一保护层的厚度为65～85μm。
  8. 一种显示面板，其特征在于，所述显示面板包括如权利要求1至7中任意一项所述的阵列基板。
  9. 根据权利要求8所述的显示面板，其特征在于，所述阵列基板包括像素电路，所述像素电路设在所述透明基板上未设所述第一保护层的表面上。
  10. 根据权利要求8所述的显示面板，其特征在于，所述阵列基板包括彩膜层，所述彩膜层设置在所述透明基板上未设所述第一保护层的表面上。
  11. 一种显示装置，其特征在于，所述显示装置包括如权利要求8至10中任意一项所述的显示面板。
  12. 一种制备阵列基板的方法，所述阵列基板包括透明基板和贴在所述透明基板上的偏光片，所述方法包括：
    提供透明基板，所述透明基板的光弹性系数为C100，密度为ρ100，厚度为d100，
    在所述透明基板上设置偏光片，所述偏光片包括与所述透明基板接触的第一保护层，其中设置所述第一保护层的光弹性系数C200、密度ρ200和厚度d200，使得满足关系式0≤|C|≤1.0×10-13，其中C为综合光弹性系数，由如下公式(1)定义：
    Figure PCTCN2015092076-appb-100002
  13. 根据权利要求12所述的方法，其特征在于，其中设置所述第一保护层的光弹性系数C200、密度ρ200和厚度d200，使得C＝0。
  14. 根据权利要求12所述的方法，其特征在于，所述第一保护层的光弹性系数C200和密度ρ200是预定的，而其厚度d200是根据所述关系式由所述预定的光弹性系数C200和密度ρ200确定的。
  15. 根据权利要求12所述的方法，其特征在于，所述第一保护层的厚度d200是预定的，而其光弹性系数C200和密度ρ200是根据所述关系式由所述预定的厚度d200确定的。
  16. 根据权利要求15所述的方法，其特征在于，制成所述第一保护层的材料为基体材料和添加剂的混合物，通过调节所述混合物的组成，获得具有所述确定的光弹性系数C200和密度ρ200的所述第一保护层。
  17. 根据权利要求16所述的方法，其特征在于，所述基体材料为三醋酸纤维素或环烯烃共聚物，所述添加剂为甲基丙烯酸甲酯、甲基丙烯酸三氟乙酯、甲基丙烯酸三氯乙酯、甲基丙烯酸苯甲酯、甲基丙烯酸三甲基环己酯和甲基丙烯酸五氟苯酯中的任意一种。
PCT/CN2015/092076 2015-06-30 2015-10-16 阵列基板、显示面板、显示装置和制备阵列基板的方法 WO2017000426A1 (zh)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US15/126,704 US10133096B2 (en) 2015-06-30 2015-10-16 Array substrate, display panel, display apparatus, and method for producing array substrate
EP15884174.2A EP3321728B1 (en) 2015-06-30 2015-10-16 Array substrate, display panel, display device and method for preparing array substrate

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201510372793.4A CN104880857B (zh) 2015-06-30 2015-06-30 阵列基板、显示面板和显示装置
CN201510372793.4 2015-06-30

Publications (1)

Publication Number Publication Date
WO2017000426A1 true WO2017000426A1 (zh) 2017-01-05

Family

ID=53948412

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2015/092076 WO2017000426A1 (zh) 2015-06-30 2015-10-16 阵列基板、显示面板、显示装置和制备阵列基板的方法

Country Status (4)

Country Link
US (1) US10133096B2 (zh)
EP (1) EP3321728B1 (zh)
CN (1) CN104880857B (zh)
WO (1) WO2017000426A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104880857B (zh) * 2015-06-30 2018-01-09 京东方科技集团股份有限公司 阵列基板、显示面板和显示装置

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1512217A (zh) * 2002-12-24 2004-07-14 住友化学工业株式会社 光学补偿板及其投射型液晶显示装置
JP2004246338A (ja) * 2003-01-23 2004-09-02 Nitto Denko Corp 光学フィルム、その製造方法および画像表示装置
US20080095999A1 (en) * 2003-03-31 2008-04-24 Masanori Yoshihara Protective Film For Polarizing Plate, Method For Preparation Thereof, Polarizing Plate With Antireflection Function, And Optical Article
CN101460306A (zh) * 2006-03-31 2009-06-17 日本瑞翁株式会社 偏振片、液晶显示装置以及保护膜
CN102906130A (zh) * 2010-05-28 2013-01-30 旭化成化学株式会社 热塑性丙烯酸系树脂及其成型体
JP2014115538A (ja) * 2012-12-11 2014-06-26 Toagosei Co Ltd 光学フィルム又はシート形成用活性エネルギー線硬化型組成物及び光学フィルム又はシート及び偏光板
CN104880857A (zh) * 2015-06-30 2015-09-02 京东方科技集团股份有限公司 阵列基板、显示面板和显示装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5414960B2 (ja) * 2005-05-09 2014-02-12 エルジー ディスプレイ カンパニー リミテッド 液晶表示装置
JP2009237047A (ja) * 2008-03-26 2009-10-15 Fujifilm Corp 偏光板及び液晶表示装置
JP5150904B2 (ja) * 2010-05-10 2013-02-27 康博 小池 粘着剤の複屈折値定量的測定方法、粘着剤の設計方法及び製造方法、並びに、偏光板及び液晶表示装置の製造方法。
TWI435124B (zh) * 2010-10-20 2014-04-21 Nitto Denko Corp Adhesive type polarizing plate and image display device
JP2013254190A (ja) * 2012-05-11 2013-12-19 Fujifilm Corp 光学フィルム、偏光板、及び液晶表示装置
US9081230B2 (en) * 2013-05-06 2015-07-14 Apple Inc. Liquid crystal displays with reduced light leakage

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1512217A (zh) * 2002-12-24 2004-07-14 住友化学工业株式会社 光学补偿板及其投射型液晶显示装置
JP2004246338A (ja) * 2003-01-23 2004-09-02 Nitto Denko Corp 光学フィルム、その製造方法および画像表示装置
US20080095999A1 (en) * 2003-03-31 2008-04-24 Masanori Yoshihara Protective Film For Polarizing Plate, Method For Preparation Thereof, Polarizing Plate With Antireflection Function, And Optical Article
CN101460306A (zh) * 2006-03-31 2009-06-17 日本瑞翁株式会社 偏振片、液晶显示装置以及保护膜
CN102906130A (zh) * 2010-05-28 2013-01-30 旭化成化学株式会社 热塑性丙烯酸系树脂及其成型体
JP2014115538A (ja) * 2012-12-11 2014-06-26 Toagosei Co Ltd 光学フィルム又はシート形成用活性エネルギー線硬化型組成物及び光学フィルム又はシート及び偏光板
CN104880857A (zh) * 2015-06-30 2015-09-02 京东方科技集团股份有限公司 阵列基板、显示面板和显示装置

Also Published As

Publication number Publication date
US10133096B2 (en) 2018-11-20
EP3321728A4 (en) 2019-01-16
EP3321728B1 (en) 2019-12-04
CN104880857A (zh) 2015-09-02
CN104880857B (zh) 2018-01-09
EP3321728A1 (en) 2018-05-16
US20180031871A1 (en) 2018-02-01

Similar Documents

Publication Publication Date Title
CN101290419B (zh) 液晶显示面板及其制造方法
WO2013185373A1 (zh) 液晶显示面板及其制造方法
WO2018176629A1 (zh) 显示面板及其制造方法
WO2013028535A1 (en) Thermal color shift reduction in lcds
JP6266769B2 (ja) 液晶ディスプレイの光学補償方法
WO2018120646A1 (zh) 显示面板及其应用的液晶显示面板及液晶显示装置
KR102101794B1 (ko) 액정 표시 장치
CN104280811B (zh) 偏光片、液晶面板以及液晶显示器
US9753328B2 (en) TFT-LCD panel, method for preparing the same and TFT display device
JP2007256904A (ja) 光学補償構造、その製造方法およびその光学補償構造を備える液晶表示装置
WO2017000426A1 (zh) 阵列基板、显示面板、显示装置和制备阵列基板的方法
WO2021121351A1 (zh) 显示模组的制备方法、显示模组及电子设备
WO2016119404A1 (zh) 显示装置及其制造方法
CN106066731A (zh) 一种触控显示面板及其制作方法、触控显示装置
CN105629543A (zh) 一种柔性液晶显示面板及显示装置
KR20100024638A (ko) 액정 표시 장치와 그 제조 방법
WO2016101339A1 (zh) 液晶显示器
US20150293406A1 (en) Single-Layered Biaxial Compensation Structure For Liquid Crystal Panels And The Liquid Crystal Displays
WO2016015425A1 (zh) 显示基板及其制造方法、显示装置
KR102665341B1 (ko) 광학 필름 및 그 제조 방법과 표시 장치
CN105044987B (zh) 一种曲面显示面板、制作方法及显示装置
WO2016101338A1 (zh) 液晶显示器
KR101955991B1 (ko) 액정표시장치
JP2010054552A (ja) 液晶表示装置
CN105223735B (zh) 液晶显示面板及包含其的液晶显示设备

Legal Events

Date Code Title Description
REEP Request for entry into the european phase

Ref document number: 2015884174

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 15126704

Country of ref document: US

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 15884174

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

WWE Wipo information: entry into national phase

Ref document number: 2015884174

Country of ref document: EP