WO2016192468A1 - 触摸显示面板及其制造方法和显示装置 - Google Patents

触摸显示面板及其制造方法和显示装置 Download PDF

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Publication number
WO2016192468A1
WO2016192468A1 PCT/CN2016/079246 CN2016079246W WO2016192468A1 WO 2016192468 A1 WO2016192468 A1 WO 2016192468A1 CN 2016079246 W CN2016079246 W CN 2016079246W WO 2016192468 A1 WO2016192468 A1 WO 2016192468A1
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Prior art keywords
conductive layer
transparent conductive
refractive index
transparent
transparent insulating
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English (en)
French (fr)
Inventor
刘晓伟
刘耀
李梁梁
丁向前
白金超
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BOE Technology Group Co Ltd
Beijing BOE Display Technology Co Ltd
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BOE Technology Group Co Ltd
Beijing BOE Display Technology Co Ltd
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Priority to US15/511,497 priority Critical patent/US20170285807A1/en
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    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04107—Shielding in digitiser, i.e. guard or shielding arrangements, mostly for capacitive touchscreens, e.g. driven shields, driven grounds
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04111—Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04112—Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material

Definitions

  • Embodiments of the present invention relate to a touch display panel, a method of fabricating the same, and a display device.
  • Touch screens have many advantages such as ruggedness, fast response, space saving, and easy communication.
  • touch screen technology is developing very rapidly.
  • the current touch screen technologies are mainly OGS (One glass solution) and Oncell (external touch).
  • OGS technology integrates the touch screen with the protective glass.
  • OnCell refers to embedding a touch screen between a color filter substrate and a polarizer of a display screen.
  • FIG. 1 shows the current common OnCell product profile.
  • the touch electrode 40 is formed by directly depositing ITO (Indium Tin Oxides) on the color filter substrate 30 of the display panel and etching and molding.
  • ITO Indium Tin Oxides
  • the antistatic layer cannot be deposited on the back surface of the color filter substrate as in the normal array substrate process, so that it is easy to be produced in the color film substrate process. Static electricity affects product yield and affects box detection.
  • Embodiments of the present invention disclose a touch display panel, a method of fabricating the same, and a display device.
  • a transparent conductive layer and a transparent insulating layer between the display substrate and the touch electrode, static electricity accumulation in the process of the display substrate can be reduced, and electromagnetic interference during box detection can be prevented.
  • a touch display panel comprising:
  • a display substrate a transparent conductive layer formed on the display substrate, formed on the transparent guide a transparent insulating layer on the electrical layer, and a touch electrode formed on the transparent insulating layer.
  • the transparent conductive layer and/or the transparent insulating layer is an anti-reflection anti-reflection film.
  • the transparent conductive layer has a refractive index greater than a refractive index of the display substrate and less than a refractive index of the transparent insulating layer.
  • the refractive index of the transparent conductive layer conforms to the following formula:
  • n 1 is a refractive index of the transparent conductive layer
  • n 2 is a refractive index of the transparent insulating layer
  • n 0 is a refractive index of the display substrate.
  • the optical thickness of the transparent conductive layer is an odd multiple of a quarter of the wavelength of light incident on the transparent conductive layer.
  • the transparent insulating layer is composed of a plurality of transparent insulating films having different refractive indices, and the thickness of the transparent conductive layer and the thickness of the transparent insulating film per layer are calculated by an interference matrix.
  • the refractive index of each of the transparent insulating films of the transparent insulating layer is gradually decreased in a direction close to the transparent conductive layer.
  • a method of manufacturing a touch display panel comprising:
  • a touch electrode is formed on the transparent conductive layer.
  • the transparent conductive layer has a refractive index greater than a refractive index of the display substrate and less than a refractive index of the transparent insulating layer.
  • the refractive index of the transparent conductive layer conforms to the following formula:
  • n 1 is a refractive index of the transparent conductive layer
  • n 2 is a refractive index of the transparent insulating layer
  • n 0 is a refractive index of the display substrate.
  • the optical thickness of the transparent conductive layer is incident to the transparent An odd multiple of a quarter of the wavelength of the light of the conductive layer.
  • At least one transparent insulating layer is formed on the transparent conductive layer, and specifically includes:
  • a plurality of superposed transparent insulating films having different refractive indices are formed on the transparent conductive layer.
  • the refractive index of each of the transparent insulating films is gradually decreased in a direction close to the transparent conductive layer.
  • a display device including the touch display panel described above is provided.
  • the touch display panel, the manufacturing method thereof and the display device of the embodiment of the invention can improve the process of the existing display panel by adding a transparent conductive layer and a transparent insulating layer having an anti-reflection effect between the display substrate and the touch electrode.
  • the problem of static electricity accumulation reduces crosstalk between the touch signal and the TFT signal, increases the stability of the touch display panel, and at the same time, improves the transmittance of the product under strong light by using a film structure with anti-reflection effect. And contrast.
  • the transparent insulating layer as a structure of a multilayer film, the effect of multi-layer anti-reflection and anti-reflection can be achieved, thereby achieving the purpose of reducing the anti-reflection of the broad spectrum.
  • FIG. 1 is a schematic structural view of a conventional touch display panel.
  • FIG. 2 is a block diagram showing the structure of a touch display panel of an embodiment of the present invention.
  • Fig. 3 is a schematic view showing the principle of anti-reflection and anti-reflection of the transparent conductive layer of the embodiment of the present invention.
  • Fig. 4 is a view showing an emission spectrum of a single-layer anti-reflection coating of an embodiment of the present invention.
  • Fig. 5 is a view showing an emission spectrum of a double-layer anti-reflection coating film of an embodiment of the present invention.
  • Fig. 6 is a view showing an emission spectrum of a multilayer anti-reflection antireflection film of an embodiment of the present invention.
  • FIG. 7 is a block diagram showing the structure of a touch display panel according to another embodiment of the present invention.
  • FIG. 8 shows a manufacturing flow chart of a touch display panel of an embodiment of the present invention.
  • a touch display panel is provided.
  • FIG. 2 is a block diagram showing the structure of a touch display panel according to an embodiment of the present invention.
  • the touch display panel of this embodiment includes:
  • Display substrate 50 can be any suitable existing or future display substrate.
  • the embodiment of the present invention provides a transparent conductive layer 60 and a transparent insulating layer 70 between the display substrate 50 and the touch electrode 40, wherein the transparent conductive layer 60 can function as an electrostatic shield, and the transparent insulating layer 70 has a transparent conductive layer and The isolation of the touch electrode 40 can reduce the signal crosstalk between the touch signal and the thin film transistor, and improve the stability of the touch display panel.
  • the transparent conductive layer 60 and/or the transparent insulating layer 70 is an anti-reflection film, so that the transmittance of light can be improved.
  • the refractive index n 1 of the transparent conductive layer 60 in this embodiment is larger than the refractive index n 0 of the display substrate 50 and smaller than the refractive index n 2 of the transparent insulating layer 70.
  • the refractive index n 0 of the substrate 50 is generally shown here as the refractive index of the layer of the display substrate 50 adjacent to the transparent conductive layer 60.
  • the optical thickness n 1 d of the transparent conductive layer 60 is four of the wavelengths of light incident on the transparent conductive layer 60. At an odd multiple of one, r 1 and dest 2 interfere destructively, so that the transmittance of the transparent conductive layer 60 to light increases, and the reflectance to light decreases.
  • the interference effect is the best, that is, the anti-reflection effect is best.
  • the arrangement of the transparent insulating layer 70 is also based on the above principle, so that transparency can be achieved.
  • the anti-reflection effect of the edge layer 70 is to achieve the effect of reducing the anti-reflection effect of the two-layer film of the transparent conductive layer 60 and the transparent insulating layer 70.
  • the transparent insulating layer 70 is composed of a plurality of transparent insulating films having different refractive indices, and the thickness of each of the transparent insulating films can be calculated by the above-described anti-reflection principle.
  • the thickness calculation of the transparent conductive layer and the transparent insulating layer can also be calculated by establishing an interference matrix, so that the transparent conductive layer 60 and each transparent insulating film can achieve the effect of thin film interference.
  • the transparent insulating layer 70 is provided as a multilayer transparent insulating film. In the direction close to the transparent conductive layer 60, the refractive index of each transparent insulating film of the transparent insulating layer is gradually reduced, thereby achieving multilayer reduction. Anti-enhancement effect.
  • Figure 4 shows the anti-reflection spectrum of a single layer film.
  • the light of the antireflection film is reduced by the single layer, and the reflectance of the light having a wavelength of about 550 nm is the smallest. Therefore, the single layer film is very dense for a certain wavelength or a certain segment. A small range of light has a good anti-reflection effect.
  • Figure 5 shows the emission spectrum of a double-layer anti-reflection coating.
  • a double-layer anti-reflection coating is used, and the light in the visible light and the near-infrared range has the smallest reflectance at the 450 nm and 700 nm wavelength bands. Therefore, the use of the two-layer film can achieve a narrow-band anti-reflection effect.
  • Figure 6 shows the emission spectrum of the multilayer anti-reflection coating.
  • the use of a multi-layer anti-reflection coating can achieve anti-reflection of light over a wide spectral range.
  • the transparent conductive layer and the transparent insulating layer as the anti-reflection film and the transparent insulating layer as a multilayer film, the anti-reflection and anti-reflection of the multilayer film can be achieved, and thus In the range of visible light, the effect of light anti-reflection and anti-reflection is achieved, so that the transmittance of light can be improved.
  • the transparent conductive layer 60 may use an ITO film
  • the transparent insulating layer 70 may use a SiNx film.
  • the ITO film is a semiconductor film.
  • the complex refractive index of the semiconductor has a high K (dielectric constant) value at the infrared wave. This high K value makes the semiconductor have a high reflectance at the infrared wave, and the free current is present. The reflection of the sub-beam shields the electromagnetic waves, thereby achieving the purpose of electromagnetic shielding.
  • both of the above films can be fabricated in existing display panel manufacturing lines, thereby avoiding the expense of adding additional equipment.
  • the material of 70 is not limited to the above materials, and other materials having the same function can be made into the transparent conductive layer and the transparent insulating layer of the present invention.
  • the display substrate in the present invention may be one of a plurality of existing display panels or one of the constituent substrates of the display panel, or may be a substrate constituting the substrate, such as a substrate which may be a liquid crystal display panel or a color filter substrate. Other types of display substrates are also possible.
  • the touch display panel may be:
  • the transparent conductive layer 60 and the transparent insulating layer 70 having the antireflection and antireflection are disposed on the color filter substrate 30, so that the static electricity accumulation during the manufacturing process of the color filter substrate 30 can be avoided, and the electromagnetics during the detection of the package can be prevented.
  • Interference can also improve the transmittance of the touch display panel, reduce its reflectivity to ambient light, thereby improving the transmittance and contrast of the touch display panel under strong light, and also reducing the relationship between the touch signal and the display substrate signal.
  • Signal crosstalk improves the stability of the touch signal.
  • a method of fabricating a touch display panel includes:
  • the display substrate can be an OLED panel or a liquid crystal panel that has been attached to a cassette, or a substrate of a color filter substrate.
  • a filter layer is formed on the other side of the display substrate.
  • the step S2 and S3 further includes: performing a box process on the display substrate.
  • step S3 specifically includes:
  • a touch electrode is formed by depositing a transparent conductive material and forming a pattern and a lead.
  • the refractive index of the material forming the transparent conductive layer is greater than the refractive index of the display substrate and less than the refractive index of the material forming the transparent insulating layer.
  • the refractive index of the material forming the transparent conductive layer conforms to the following formula:
  • n 1 is a refractive index of the transparent conductive layer
  • the n 2 is a refractive index of the transparent insulating layer
  • n 0 is a refractive index of the display substrate, where the refractive index of the substrate is displayed.
  • n 0 is generally considered to be the refractive index of a layer of the display substrate adjacent to the transparent conductive layer.
  • the thickness of the transparent conductive layer formed is an odd multiple of a quarter of the wavelength of light incident on the transparent conductive layer.
  • At least one transparent insulating layer is formed on the transparent conductive layer, and a plurality of transparent insulating films having different refractive indexes are formed on the transparent conductive layer, and in a direction close to the transparent conductive layer.
  • the refractive index of each transparent insulating film is gradually reduced, and the structure of the multilayer film can realize the anti-reflection and anti-reflection of the multilayer film, thereby realizing the anti-reflection effect of broad spectrum.
  • a display device comprising the touch display panel described above.
  • the touch display panel provided by the present invention, the manufacturing method thereof and the display device can improve the process of the existing display panel by adding a transparent conductive layer and a transparent insulating layer having an anti-reflection effect between the display substrate and the touch electrode.
  • the problem of static electricity accumulation reduces the crosstalk between the touch signal and the TFT signal, and increases the stability of the touch display panel.
  • the film structure with the anti-reflection effect can improve the transmittance of the product under strong light and Contrast.
  • the transparent insulating layer as a structure of a multilayer film, the effect of multi-layer anti-reflection and anti-reflection can be achieved, thereby achieving the purpose of reducing the anti-reflection of the broad spectrum.

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Abstract

一种触摸显示面板及其制造方法和显示装置，所述触摸显示面板包括：显示基板（50），形成在所述显示基板（50）上的透明导电层（60），形成在所述透明导电层（60）上的透明绝缘层（70），以及形成在所述透明绝缘层（70）上的触摸电极（40）。通过在显示基板（50）与触摸电极（40）之间增加透明导电层（60）和透明绝缘层（70），可以减少在显示基板的制程中的静电积累，并能够防止成盒检测时的电磁干扰。

Description

触摸显示面板及其制造方法和显示装置 技术领域
本发明的实施例涉及一种触摸显示面板及其制造方法和显示装置。
背景技术
随着多媒体信息查询的与日俱增和显示技术的广泛应用，人们越来越多的接触到具有触摸屏的产品。触摸屏具有坚固耐用、反应速度快、节省空间、易于交流等许多优点，并随着智能手机、平板电脑等产品的普及，触摸屏技术发展非常迅速。目前的触摸屏技术主要为OGS(One glass solution，即一体化触控)和Oncell(外嵌式触控)。OGS技术就是把触控屏与保护玻璃集成在一起。OnCell是指将触摸屏嵌入到显示屏的彩色滤光片基板和偏光片之间。
如图1所示为目前常见的OnCell产品剖面图。通过在显示面板的彩膜基板30上直接沉积ITO(Indium Tin Oxides,氧化铟锡)，并刻蚀成形，来形成触摸电极40。但是因为触摸电极是在彩膜基板工艺完成后再进行，因此为了防止短路，无法像正常的阵列基板制程一样，提前在彩膜基板的背面沉积防静电层，因此在彩膜基板制程中容易产生静电，影响产品良率，且影响成盒检测。
发明内容
本发明的实施例公开了一种触摸显示面板及其制造方法和显示装置。通过在显示基板与触摸电极之间增加透明导电层和透明绝缘层，可以减少在显示基板的制程中的静电积累，防止成盒检测时的电磁干扰。
根据本发明的第一方面，提供了一种触摸显示面板，所述触摸显示面板包括：
显示基板，形成在所述显示基板上的透明导电层，形成在所述透明导 电层上的透明绝缘层，以及形成在所述透明绝缘层上的触摸电极。
根据本发明的实施例，所述透明导电层和/或所述透明绝缘层为减反增透膜。
根据本发明的实施例，所述透明导电层的折射率大于所述显示基板的折射率，并且小于所述透明绝缘层的折射率。
根据本发明的实施例，所述透明导电层的折射率符合以下公式：
Figure PCTCN2016079246-appb-000001
其中，n1为所述透明导电层的折射率，n2为所述透明绝缘层的折射率，n0为所述显示基板的折射率。
根据本发明的实施例，所述透明导电层的光学厚度为入射到所述透明导电层的光的波长的四分之一的奇数倍。
根据本发明的实施例，所述透明绝缘层由多层折射率不同的透明绝缘膜组成，所述透明导电层的厚度和每层所述透明绝缘膜的厚度通过干涉矩阵计算得到。
根据本发明的实施例，在靠近所述透明导电层的方向，所述透明绝缘层的每层透明绝缘膜的折射率逐渐减小。
根据本发明的另一个方面，公开了一种触摸显示面板的制造方法，所述方法包括：
在显示基板上形成透明导电层；
在所述透明导电层上形成至少一层透明绝缘层；
在所述透明导电层上形成触摸电极。
根据本发明的实施例，所述透明导电层的折射率大于所述显示基板的折射率，并且小于所述透明绝缘层的折射率。
根据本发明的实施例，所述透明导电层的折射率符合以下公式：
Figure PCTCN2016079246-appb-000002
其中，n1为所述透明导电层的折射率，n2为所述透明绝缘层的折射率，n0为所述显示基板的折射率。
根据本发明的实施例，所述透明导电层的光学厚度为入射到所述透明 导电层的光的波长的四分之一的奇数倍。
根据本发明的实施例，在所述透明导电层的上形成至少一层透明绝缘层，具体包括：
在所述透明导电层上形成叠加的多个折射率不同的透明绝缘膜。
根据本发明的实施例，在靠近所述透明导电层的方向，每层透明绝缘膜的折射率逐渐减小。
根据本发明的又一个方面，提供一种显示装置，其包括上述的触摸显示面板。
本发明实施例的触摸显示面板及其制造方法和显示装置，通过在显示基板与触摸电极之间增加具有减反增透效果的透明导电层和透明绝缘层，可以改善现有的显示面板的制程中静电积累的问题，减少触摸信号与TFT信号之间的串扰，增加了触摸显示面板的稳定性，同时，使用具有减反增透效果的膜结构，可以提高产品在强光下的透过率和对比度。此外，将透明绝缘层设置成多层膜的结构，可以实现多层减反增透的效果，从而达到对宽光谱的减反增透的目的。
附图说明
图1示出了现有的一种触摸显示面板的结构示意图。
图2示出了本发明的实施例的触摸显示面板的结构示意图。
图3示出了本发明的实施例的透明导电层的减反增透的原理示意图。
图4示出了本发明的实施例的单层减反增透膜的发射光谱图。
图5示出了本发明的实施例的双层减反增透膜的发射光谱图。
图6示出了本发明的实施例的多层减反增透膜的发射光谱图。
图7示出了本发明的另一个实施例的触摸显示面板的结构示意图。
图8示出了本发明的实施例的触摸显示面板的制造流程图。
具体实施方式
下面结合附图和实施例，对本发明的具体实施方式作进一步描述。以 下实施例仅用于更加清楚地说明本发明的技术方案，而不能以此来限制本发明的保护范围。
在本发明的一个实施例中，提供了一种触摸显示面板。
图2示出了本发明的一个实施例的触摸显示面板的结构示意图。
参照图2，本实施例的触摸显示面板包括：
显示基板50，形成在显示基板50上的透明导电层60，形成在透明导电层60上的透明绝缘层70，以及形成在透明绝缘层70上的触摸电极40。显示基板50可以是任何合适的现有的或将来的显示基板。
本发明的实施例通过在显示基板50和触摸电极40之间设置了透明导电层60和透明绝缘层70，其中透明导电层60能够起到静电防护的作用，透明绝缘层70将透明导电层与触摸电极40隔离，可以减少触摸信号与薄膜晶体管之间的信号串扰，提高了触摸显示面板的稳定性。
在上述实施例中，透明导电层60和/或透明绝缘层70为减反增透膜，从而可以提高光的透过率。
另外，为了达到减反增透的效果，本实施例中透明导电层60的折射率n1大于显示基板50的折射率n0，并且小于透明绝缘层70的折射率n2。此处显示基板50的折射率n0，一般可以认为是显示基板50的与透明导电层60相邻的层的折射率。
同时，基于减反增透的原理，当透明导电层60作为减反增透膜时，如图3所示，当入射光从显示基板50入射到透明导电层60，并穿过透明导电层60入射到透明绝缘层70时，在显示基板50与透明导电层60之间的界面M1处产生反射光r1，透明导电层60与透明绝缘层70之间的界面M2处产生反射光r2，当2n1d＝(k+1/2)λ，并且k＝0,1,2……时，即透明导电层60的光学厚度n1d为入射到透明导电层60的光的波长的四分之一的奇数倍，r1与r2发生相消干涉，从而使得透明导电层60对光的透过率增加，对光的反射率减小。
另外，基于上述干涉公式，当
Figure PCTCN2016079246-appb-000003
时，干涉效果最好，即减反增透效果最好。
此外，透明绝缘层70的设置也基于上述的原理，从而可以实现透明绝 缘层70的减反增透效果，以实现透明导电层60和透明绝缘层70的双层膜减反增透的效果。
在另一个实施例中，透明绝缘层70由多层折射率不同的透明绝缘膜组成，每层透明绝缘膜的厚度可以通过上述的减反增透原理计算得到。另外，也可以通过建立干涉矩阵并一一计算得到透明导电层与透明绝缘层的厚度计算，从而使得透明导电层60以及每层透明绝缘膜都可以实现薄膜干涉的效果。
基于上述实施例的将透明绝缘层70设置为多层透明绝缘膜的结构，在靠近透明导电层60的方向，透明绝缘层的每层透明绝缘膜的折射率逐渐减小，从而实现多层减反增透的效果。
图4示出了单层膜的减反增透光谱图。如图4所示，自然光通过单层膜后，通过单层减反增透膜的光，其波长在550nm左右的光的反射率最小，因此，单层膜对于某一个波长或者是某一段很小范围的波段的光具有较好的减反效果。
图5示出了为双层减反增透膜的发射光谱。如图5所示，使用双层减反增透膜，其可见光及近红外范围内的光在450nm和700nm波段处的反射率最小，因此，使用双层膜可以实现窄波段的减反效果。
图6示出了多层减反增透膜的发射光谱，从图6中可以看出，使用多层减反增透膜，可以实现在较宽的光谱范围内的光的减反增透的效果，本发明的实施例中通过将透明导电层以及透明绝缘层设置成减反增透膜，并将透明绝缘层设置成多层膜，可以实现多层膜的减反增透，因此可以在可见光的范围内实现光的减反增透的效果，从而可以提高光的透过率。
在上述的实施例中，透明导电层60可以使用ITO薄膜，透明绝缘层70可以使用SiNx薄膜。ITO膜是一种半导体膜，半导体的复折射率在红外波处有较高的K(介电常数)值，这种高K值使半导体在红外波处有高的反射率，而自由载流子的反射对电磁波形成屏蔽，从而实现电磁屏蔽的目的。另外，上述两种薄膜均可以在现有的显示面板制造产线中进行制造，从而避免增加额外的设备造成的费用增加。此外，透明导电层60的材料和透明绝缘层 70的材料不限制于上述的材料，具有相同作用的其他材料均可以制成本发明的透明导电层和透明绝缘层。
另外，本发明中显示基板可以是现有的多种显示面板之一或显示面板的其中一个组成基板，也可以为组成基板的衬底，如可以是液晶显示面板或彩膜基板的衬底，也可以是其他类型的显示基板。
在本发明的另一个实施例中，具体地，如图7所示，触摸显示面板可以为：
阵列基板10，液晶层20、彩膜基板30，以及设置在彩膜基板30上的远离滤光层的透明导电层60和透明绝缘层70，以及设置在透明绝缘层70上的触摸电极40。
本实施例中，在彩膜基板30上设置具有减反增透的透明导电层60和透明绝缘层70，不仅可以避免彩膜基板30的制造过程中的静电积累，防止成盒检测时的电磁干扰，还可以提高触摸显示面板的透过率，减少其对环境光的反射率，从而提高触摸显示面板在强光下的透过率和对比度，同时也可以减少触摸信号与显示基板信号之间的信号串扰，提高触摸信号的稳定性。
在本发明的另一个实施例中，提供一种触摸显示面板的制造方法。如图8所示，该方法包括：
S1、在显示基板上形成透明导电层；
S2、在所述透明导电层上形成至少一层透明绝缘层；
S3、在所述透明导电层上形成触摸电极。
如本领域所熟知的，显示基板可以为OLED面板或已经对盒的液晶面板，也可以为彩膜基板的衬底。当为彩膜基板的衬底时，在步骤S1和S2之间例如还包括：在显示基板的另一个侧面形成滤光层。在步骤S2和S3之间还包括：对显示基板进行对盒工艺。
此外，上述步骤S3具体包括：
在显示基板的透明绝缘层上方，通过沉积透明导电材料并形成图案和引线，从而形成触摸电极。
在进一步的实施例中，形成透明导电层的材料的折射率大于显示基板的折射率，并且小于形成透明绝缘层的材料的折射率。
在另一个实施例中，形成透明导电层的材料的折射率符合以下公式：
Figure PCTCN2016079246-appb-000004
上述公式中，n1为所述透明导电层的折射率，所述n2为所述透明绝缘层的折射率，所述n0为所述显示基板的折射率，此处显示基板的折射率n0，一般可以认为是显示基板的与透明导电层相邻的层的折射率。
在另一个实施例中，为了实现透明导电层的减反增透的作用，形成的透明导电层的厚度为入射到透明导电层的光的波长的四分之一的奇数倍。
在又一个实施例中，在透明导电层上形成至少一层透明绝缘层，还可以为：在透明导电层上形成叠加的多个折射率不同的透明绝缘膜，并且在靠近透明导电层的方向，每层透明绝缘膜的折射率逐渐减小，这种多层膜的结构，可以实现多层膜的减反增透，从而实现宽光谱的减反增透效果。
在本发明的又一个实施例中，提供了一种显示装置，该显示装置包括上述的触摸显示面板。
本发明提供的触摸显示面板及其制造方法和显示装置，通过在显示基板与触摸电极之间增加具有减反增透效果的透明导电层和透明绝缘层，可以改善现有的显示面板的制程中静电积累的问题，减少触摸信号与TFT信号之间的串扰，增加了触摸显示面板的稳定性，同时，使用具有减反增透效果的膜结构，可以提高产品在强光下的透过率和对比度。此外，将透明绝缘层设置成多层膜的结构，可以实现多层减反增透的效果，从而达到对宽光谱的减反增透的目的。
以上所述仅是本发明的一些实施方式，应当指出，对于本技术领域的普通技术人员来说，在不脱离本发明技术原理的前提下，还可以做出若干修改和变型，这些修改和变型也应视为本发明的保护范围。

Claims (14)

  1. 一种触摸显示面板，包括：
    显示基板，形成在所述显示基板上的透明导电层，形成在所述透明导电层上的透明绝缘层，以及形成在所述透明绝缘层上的触摸电极。
  2. 如权利要求1所述的触摸显示面板，其中，所述透明导电层和/或所述透明绝缘层为减反增透膜。
  3. 如权利要求1或2所述的触摸显示面板，其中，所述透明导电层的折射率大于所述显示基板的折射率，并且小于所述透明绝缘层的折射率。
  4. 如权利要求1-3任一所述的触摸显示面板，其中，所述透明导电层的折射率符合以下公式：
    Figure PCTCN2016079246-appb-100001
    其中，n1为所述透明导电层的折射率，n2为所述透明绝缘层的折射率，n0为所述显示基板的折射率。
  5. 如权利要求1-4任一所述的触摸显示面板，其中，所述透明导电层的光学厚度为入射到所述透明导电层的光的波长的四分之一的奇数倍。
  6. 如权利要求1-5任一所述的触摸显示面板，其中，所述透明绝缘层由多层折射率不同的透明绝缘膜组成，所述透明导电层的厚度和每层所述透明绝缘膜的厚度通过干涉矩阵计算得到。
  7. 如权利要求6所述的触摸显示面板，其中，在靠近所述透明导电层的方向，所述透明绝缘层的每层透明绝缘膜的折射率逐渐减小。
  8. 一种触摸显示面板的制造方法，包括：
    在显示基板上形成透明导电层；
    在所述透明导电层上形成至少一层透明绝缘层；
    在所述透明导电层上形成触摸电极。
  9. 如权利要求8所述的制造方法，其中，所述透明导电层的折射率大于所述显示基板的折射率，并且小于所述透明绝缘层的折射率。
  10. 如权利要求8或9所述的制造方法，其中，
    所述透明导电层的折射率符合以下公式：
    Figure PCTCN2016079246-appb-100002
    其中，n1为所述透明导电层的折射率，n2为所述透明绝缘层的折射率，n0为所述显示基板的折射率。
  11. 如权利要求8-10任一所述的制造方法，其中，所述透明导电层的光学厚度为入射到所述透明导电层的光的波长的四分之一的奇数倍。
  12. 如权利要求8-11任一所述的制造方法，其中，在所述透明导电层的上形成至少一层透明绝缘层，具体包括：
    在所述透明导电层上形成叠加的多个折射率不同的透明绝缘膜。
  13. 如权利要求8-12任一所述的制造方法，其中，在靠近所述透明导电层的方向，每层透明绝缘膜的折射率逐渐减小。
  14. 一种显示装置，包括权利要求1-7任一项所述的触摸显示面板。
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