WO2016169367A1 - 触摸基板及其制造方法、显示装置 - Google Patents

触摸基板及其制造方法、显示装置 Download PDF

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Publication number
WO2016169367A1
WO2016169367A1 PCT/CN2016/076508 CN2016076508W WO2016169367A1 WO 2016169367 A1 WO2016169367 A1 WO 2016169367A1 CN 2016076508 W CN2016076508 W CN 2016076508W WO 2016169367 A1 WO2016169367 A1 WO 2016169367A1
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Prior art keywords
metal electrode
electrode layer
layer
touch substrate
region
Prior art date
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Ceased
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PCT/CN2016/076508
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English (en)
French (fr)
Inventor
王文龙
罗鸿强
马涛
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BOE Technology Group Co Ltd
Hefei Xinsheng Optoelectronics Technology Co Ltd
Original Assignee
BOE Technology Group Co Ltd
Hefei Xinsheng Optoelectronics Technology Co Ltd
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Priority to US15/325,362 priority Critical patent/US10203822B2/en
Publication of WO2016169367A1 publication Critical patent/WO2016169367A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0445—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136209—Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136286—Wiring, e.g. gate line, drain line
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/047—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means using sets of wires, e.g. crossed wires
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133357—Planarisation layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133388—Constructional arrangements; Manufacturing methods with constructional differences between the display region and the peripheral region
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04107—Shielding in digitiser, i.e. guard or shielding arrangements, mostly for capacitive touchscreens, e.g. driven shields, driven grounds
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04112—Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material

Definitions

  • the present invention relates to the field of touch substrate preparation technology, and in particular, to a touch substrate, a method of manufacturing the same, and a display device.
  • the conventional capacitive touch screen adopts a glass-glass (GG) structure, which is a structure in which a cover glass is bonded to a touch glass.
  • GG glass-glass
  • Touch structures such as glass-film (GF), glass-film-film (GFF), and monolithic glass solutions (OGS) are gradually being used.
  • the OGS structure on the market has encountered difficulties in appearance compared to the touch screens of GG, GF, and GFF structures.
  • Conventional GG, GF, GFF structures use black ink or white ink as the frame material of the cover of the touch screen, and can produce a black border touch screen and a white border touch screen.
  • OGS structures typically use photoresist materials as the bezel material.
  • the current white photoresist material technology on the market is still not mature.
  • the glass cover plate using white photoresist material should achieve the same optical effect as the cover plate using white ink material, and the thickness of the white photoresist material must be at least Up to 15um and above, and a layer of material with a higher absorption coefficient needs to be additionally disposed above the white photoresist material to ensure the required optical density (OD value).
  • OD value optical density
  • Embodiments of the present invention provide a touch substrate, a manufacturing method, and a display device.
  • the height difference caused by the white photoresist is flattened by the first flat layer, and the traces in the electrode layer are prevented from being broken at the climbing position in the frame region. Line problem.
  • a touch substrate comprising: a substrate; and a white photoresist, a first planar layer, a first metal electrode layer, a second planar layer, and a second layer sequentially formed on the substrate Metal electrode layer.
  • the white photoresist is formed on the frame area of the touch substrate.
  • the first planar layer is configured to cover the white photoresist and the substrate to provide a flat surface to form the first metal electrode layer.
  • the first metal electrode layer includes a plurality of first metal electrode lines
  • the second metal electrode layer includes a plurality of second metal electrode lines, a plurality of first metal electrode lines, and a plurality of second metal electrodes Line cross setting.
  • the first metal electrode layer includes a first wiring region perpendicular to an extending direction of the first metal electrode line in the bezel region, and the first metal electrode wire is connected to the first wiring region.
  • the second metal electrode layer includes a second wiring region perpendicular to an extending direction of the second metal electrode line in the bezel region, and the second metal electrode wire is connected to the second wiring region.
  • the first metal electrode layer includes a first light shielding region in a frame region that is parallel to a direction in which the first metal electrode line extends.
  • the second metal electrode layer includes a second light-shielding region parallel to the extending direction of the second metal electrode line in the bezel region.
  • the first metal electrode layer is black.
  • the second metal electrode layer is black.
  • the first planar layer and the second planar layer are each formed of a transparent insulating material.
  • a method of manufacturing a touch substrate comprising: forming a substrate; and sequentially forming a white photoresist, a first planar layer, a first metal electrode layer, and a second on the substrate a flat layer and a second metal electrode layer.
  • the white photoresist is formed on the frame area of the touch substrate.
  • the first planar layer is configured to cover the white photoresist and the substrate to provide a flat surface to form the first metal electrode layer.
  • the method further includes: forming a plurality of first metal electrode lines in the first metal electrode layer, and forming a plurality of second metal electrode lines in the second metal electrode layer, the plurality of first metal electrode lines And a plurality of second metal electrode lines are arranged to cross each other.
  • the method further includes: forming, in the first metal electrode layer, a first wiring region perpendicular to an extending direction of the first metal electrode line in the frame region, and connecting the first metal electrode wire to The first line area.
  • the method further includes: in the second metal electrode layer, forming a second wiring region perpendicular to an extending direction of the second metal electrode line in the frame region, and connecting the second metal electrode wire to The second wiring area.
  • the method further includes: forming, in the first metal electrode layer, a first light-shielding region parallel to a direction in which the first metal electrode line extends in the frame region.
  • the method further includes forming a second light-shielding region parallel to the extending direction of the second metal electrode line in the frame region in the second metal electrode layer.
  • the first metal electrode layer is black.
  • the second metal electrode layer is black.
  • the first planar layer and the second planar layer are formed using a transparent insulating material.
  • a display device including the above-described touch substrate and a display panel that is bonded to the touch substrate is provided.
  • the present invention provides a touch substrate, a manufacturing method thereof, and a display device.
  • the height difference caused by the white photoresist is flattened by providing a first flat layer between the white photoresist and the first metal electrode layer, thereby avoiding The problem that the traces in the electrode layer are broken at the climb in the bezel area.
  • FIG. 1 is a schematic diagram of a layer structure of a touch substrate in accordance with some or at least one embodiment of the present invention
  • FIG. 2 is a schematic view of a first metal electrode layer of the touch substrate shown in FIG. 1;
  • FIG. 3 is a schematic view of a second metal electrode layer of the touch substrate shown in FIG. 1;
  • FIG. 4 is a schematic view showing a metal mesh structure composed of a first metal electrode layer and a second metal electrode layer of the touch substrate shown in FIG. 1;
  • FIG. 5 is a flow diagram of a method for fabricating the touch substrate of FIG. 1 in accordance with some or at least one embodiment of the present invention
  • FIG. 6 is a schematic view showing a structure of a touch substrate shown in FIG. 1 after a white photoresist is formed on a substrate;
  • FIG. 7 is a schematic view showing a structure of the touch substrate shown in FIG. 1 after forming a first flat layer
  • FIG. 8 is a schematic view showing a structure of a touch substrate shown in FIG. 1 after forming a first metal electrode layer
  • FIG. 9 is a schematic view showing a structure of the touch substrate shown in FIG. 1 after forming a second flat layer.
  • 1 to 8 list of components: 1-substrate; 2-white photoresist; 3-first flat layer; 4-first metal electrode layer; 5-second flat layer; 6-second metal electrode layer; a first wiring area; 402 - a first light blocking area; 601 - a second light blocking area; 602 - a second wiring area.
  • a touch substrate in accordance with some or at least one embodiment of the present invention.
  • a touch substrate is provided.
  • the touch substrate includes: a substrate 1; and a white photoresist 2 sequentially formed on the substrate 1 Flat layer 3, first metal electrode layer 4, second flat layer 5, and second gold It belongs to electrode layer 6.
  • the white photoresist 2 is formed on a frame region of the touch substrate, and the first planar layer 3 is configured to cover the white photoresist and the substrate to provide a flat surface to form the first metal electrode layer.
  • the first flat layer 3 may fill a space other than the white photoresist 2 between the first metal electrode layer 4 and the substrate 1.
  • the height difference caused by the white photoresist 2 is flattened by the first flat layer 3, and the problem that the electrode layer is broken when climbing the slope in the frame area is avoided.
  • FIG. 2 is a schematic view of a first metal electrode layer of the touch substrate shown in FIG. 1.
  • 3 is a schematic view of a second metal electrode layer of the touch substrate shown in FIG. 1.
  • 4 is a schematic view showing a metal mesh structure composed of a first metal electrode layer and a second metal electrode layer of the touch substrate shown in FIG. 1.
  • the first metal electrode layer 4 includes a plurality of first metal electrode lines.
  • the second metal electrode layer 6 includes a plurality of second metal electrode lines, and the plurality of first metal electrode lines and the plurality of second metal electrode lines are disposed to intersect each other.
  • the plurality of metal electrode lines of the first metal electrode layer 4 and the plurality of metal electrode lines of the second metal layer 6 form a metal mesh structure, and the metal mesh structure design not only reduces the operation The process also increases the mechanical properties of the touch substrate and is more suitable for large size touch screens.
  • the size of each metal mesh may be equal to the size of each pixel unit, or each The size of the metal grid can be an integer multiple of the size of each pixel unit. As such, the metal mesh structure can effectively eliminate moiré.
  • the first metal electrode layer 4 includes a first wiring region 401 perpendicular to the extending direction of the first metal electrode line in the frame region, and the first metal electrode wire is connected to the first A line area 401.
  • the second metal electrode layer 6 includes a second wiring region 602 perpendicular to the extending direction of the second metal electrode line in the frame region, and the second metal electrode line is connected to the second wiring region 602.
  • first metal electrode lines are collected in the first wiring area 401, and are connected to an external circuit through the first wiring area 401.
  • a plurality of second metal electrode lines are all collected in the second wiring region 602, and are connected to an external circuit through the second wiring region 602.
  • the first metal electrode layer 4 includes a first light shielding region 402 in a frame region parallel to a direction in which the first metal electrode line extends.
  • the second The metal electrode layer 6 includes a second light-shielding region 601 parallel to the extending direction of the second metal electrode line in the frame region.
  • the first metal electrode layer 4 is black.
  • the second metal electrode layer 6 is black. That is, a black first metal electrode layer 4 and/or a black second metal electrode layer 6 are disposed above the white photoresist 2.
  • the black metal electrode layer has a higher absorption coefficient, thereby ensuring the optical density of the white photoresist 2.
  • the metal electrode line may not be disposed in the display region of the touch substrate or the metal electrode line may be sufficiently thin, so that even if the black metal electrode line is used, the metal electrode layer may be The display area has good light transmission.
  • a sufficiently thick black metal electrode line or other structure may be provided in the frame region of the touch substrate to ensure the optical density of the white photoresist 2.
  • both the first planar layer 3 and the second planar layer 5 are formed of a transparent insulating material.
  • the second flat layer 5 is located between the first metal electrode layer 4 and the second metal electrode layer 6 for insulating the first metal electrode layer 4 and the second metal electrode layer 6.
  • the second flat layer 5 may also provide a flat surface to form the second metal electrode layer 6.
  • a method for fabricating a touch substrate comprising: forming a substrate; and sequentially forming a white photoresist, a first planar layer, and a first metal electrode layer on the substrate a second flat layer and a second metal electrode layer.
  • the white photoresist is formed on the frame region of the touch substrate, and the first planar layer is configured to cover the white photoresist and the substrate to provide a flat surface to form the first metal electrode layer.
  • the first planar layer may fill a space between the first metal electrode layer and the substrate other than the white photoresist.
  • the height difference caused by the white photoresist is flattened by the first flat layer, and the problem that the electrode layer is broken when climbing the slope in the frame area is avoided.
  • the method further includes: providing a plurality of first metal electrode lines on the first metal electrode layer, and providing a plurality of second metal electrode lines on the second metal electrode layer, the plurality of first metal The electrode line and the plurality of second metal electrode lines are disposed to cross each other.
  • the plurality of first metal electrode lines and the plurality of second metal electrode lines disposed crosswise form a metal grid structure, and the metal grid structure design not only reduces the working process but also increases the mechanical properties of the touch substrate, and is more suitable for large size The production of touch screens.
  • the size of each metal mesh may be equal to the size of each pixel unit, or each The size of the metal grid can be an integer multiple of the size of each pixel unit. As such, the metal mesh structure can effectively eliminate moiré.
  • the method further includes: forming, in the first metal electrode layer, a first wiring region perpendicular to an extending direction of the first metal electrode line in the frame region, and connecting the first metal electrode wire to The first line area.
  • the method further includes: in the second metal electrode layer, forming a second wiring region perpendicular to an extending direction of the second metal electrode line in the frame region, and connecting the second metal electrode wire to The second wiring area.
  • the method further includes: forming, in the first metal electrode layer, a first light-shielding region parallel to a direction in which the first metal electrode line extends in the frame region.
  • the method further includes forming a second light-shielding region parallel to the extending direction of the second metal electrode line in the frame region in the second metal electrode layer.
  • the first metal electrode layer is black.
  • the second metal electrode layer is black.
  • the first metal electrode layer and the second metal electrode layer have a higher light absorption coefficient, thereby ensuring the optical density of the white photoresist under the first metal electrode layer and the second metal electrode layer.
  • the first planar layer and the second planar layer are formed using a transparent insulating material.
  • Some embodiments or at least one embodiment of the present invention provide a display device including the above-described touch substrate and a display panel that is bonded to the touch substrate.
  • the display device can be, for example, any device having a display function such as a television, a display panel, a display, a tablet, a mobile phone, a navigator, a camera, or a video camera.
  • FIG. 5 is a flow diagram of a method for fabricating the touch substrate of FIG. 1 in accordance with some or at least one embodiment of the present invention.
  • 6 is a schematic view showing a structure of a touch substrate shown in FIG. 1 after a white photoresist is formed on a substrate.
  • FIG. 7 is a schematic view showing a structure of the touch substrate shown in FIG. 1 after forming a first flat layer.
  • FIG. 8 is a schematic view showing a structure of the touch substrate shown in FIG. 1 after the first metal electrode layer is formed.
  • FIG. 9 is a schematic view showing a structure of the touch substrate shown in FIG. 1 after forming a second flat layer.
  • the manufacturing method may specifically include the following steps: S1: A white photoresist 2 is formed on the frame region of the substrate 1, and the structure is as shown in FIG. 6.
  • the substrate 1 may be formed of a material such as tempered glass.
  • the material of the first flat layer 3 is a transparent insulating material.
  • S3: The first metal electrode layer 4 is formed on the first flat layer 3, and the structure is as shown in FIG.
  • the first metal electrode layer 4 can be formed of a black material having a high light absorption coefficient, thereby ensuring the optical density of the white photoresist 2.
  • S4 A second flat layer 5 is formed on the first metal electrode layer 4, and the structure is as shown in FIG.
  • the second flat layer 2 is a transparent insulating material to insulate the first metal electrode layer 4 and the second metal electrode layer 6.
  • S5 forming a second metal electrode layer 6 on the second flat layer 5, the structure is as shown in FIG.
  • a plurality of first metal electrode lines are formed on the first metal electrode layer 4, and a plurality of second metal electrode lines, a plurality of first metal electrode lines and a plurality of second metal electrodes are formed on the second metal electrode layer 6.
  • the plurality of first metal electrode lines and the plurality of second metal electrode lines disposed crosswise form a metal grid structure, which not only reduces the working process but also increases the mechanical properties of the touch substrate, and is more suitable for large-size touch. Screen production.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Mathematical Physics (AREA)
  • Human Computer Interaction (AREA)
  • Microelectronics & Electronic Packaging (AREA)
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Abstract

一种触摸基板及其制造方法、显示装置。触摸基板包括：衬底（1）；以及在衬底上依次形成的白色光阻（2）、第一平坦层（3）、第一金属电极层（4）、第二平坦层（5）及第二金属电极层（6）。其中，白色光阻（2）形成在触摸基板的边框区域，第一平坦层（3）被配置为覆盖白色光阻（2）和衬底（1），以提供平坦面来形成第一金属电极层（4）。显示装置包括上述触摸基板和与其贴合的显示面板。触摸基板通过第一平坦层（3）来平坦化白色光阻带来的高度差，避免了金属电极层中的走线在边框区域中的爬坡处出现断线的问题。

Description

触摸基板及其制造方法、显示装置
本申请要求2015年4月20日递交的中国专利申请第201510188540.1号的优先权，在此全文引用上述中国专利申请所公开的内容以作为本申请的一部分。
技术领域
本发明涉及触摸基板制备技术领域，尤其涉及触摸基板及其制造方法、显示装置。
背景技术
目前，电容式触摸屏广泛应用于手机、平板等领域。传统的电容式触摸屏采用玻璃-玻璃(GG)结构，即将一层盖板玻璃与一层触控玻璃贴合的结构。随着用户对于触控屏轻、薄及低成本化等要求越来越高，GG结构的电容式触摸屏已经不能满足用户需求。玻璃-薄膜(GF)、玻璃-薄膜-薄膜(GFF)、单片玻璃解决方案(OGS)等触控结构逐渐被使用。
目前市场上OGS结构相较于GG、GF、GFF结构的触摸屏在外观方面遇到了难题。常规的GG、GF、GFF结构使用黑色油墨或白色油墨作为触摸屏的盖板的边框材料，可以生产出黑色边框的触摸屏以及白色边框的触摸屏。OGS结构通常使用光阻材料作为边框材料，。但是目前市场上的白色光阻材料技术还不太成熟，使用了白色光阻材料的玻璃盖板要与使用了白色油墨材料的盖板达到相同的光学效果，则白色光阻材料的厚度至少要达到15um及以上，且白色光阻材料的上方还需要额外地设置一层吸光系数较高的材料，以保证所需要的光学密度(OD值)。如此使得用于形成电极层的表面不平坦并且表面的不同位置之间具有过大的高度差，导致在触摸屏的边框区域中，电极层(由ITO或者金属制成)中的走线在爬坡处出现断线，使得触控功能失效。
发明内容
本发明的实施例提供触摸基板及制造方法、显示装置，通过第一平坦层来平坦化白色光阻带来的高度差，避免了电极层中的走线在边框区域中的爬坡处出现断线的问题。
根据本发明的第一方面，提供了一种触摸基板，包括：衬底；以及在衬底上依次形成的白色光阻、第一平坦层、第一金属电极层、第二平坦层及第二金属电极层。其中，白色光阻形成在触摸基板的边框区域。第一平坦层被配置为覆盖白色光阻和衬底，以提供平坦面来形成第一金属电极层。
在本发明的实施例中，第一金属电极层包括多条第一金属电极线，第二金属电极层包括多条第二金属电极线，多条第一金属电极线和多条第二金属电极线交叉设置。
在本发明的实施例中，第一金属电极层在边框区域包括与第一金属电极线的延伸方向垂直的第一走线区，第一金属电极线连接到第一走线区。
在本发明的实施例中，第二金属电极层在边框区域包括与第二金属电极线的延伸方向垂直的第二走线区，第二金属电极线连接到第二走线区。
在本发明的实施例中，第一金属电极层在边框区域包括与第一金属电极线延伸方向平行的第一遮光区。
在本发明的实施例中，第二金属电极层在边框区域包括与第二金属电极线的延伸方向平行的第二遮光区。
在本发明的实施例中，第一金属电极层呈黑色。
在本发明的实施例中，第二金属电极层呈黑色。
在本发明的实施例中，第一平坦层和第二平坦层均由透明绝缘材料形成。
根据本发明的第二方面，提供了一种触摸基板的制造方法，该方法包括：形成衬底；以及在衬底上依次形成白色光阻、第一平坦层、第一金属电极层、第二平坦层及第二金属电极层。其中，白色光阻形成在触摸基板的边框区域。第一平坦层被配置为覆盖白色光阻和衬底，以提供平坦面来形成第一金属电极层。
在本发明的实施例中，该方法还包括：在第一金属电极层形成多条第一金属电极线，在第二金属电极层形成多条第二金属电极线，多条第一金属电极线和多条第二金属电极线交叉设置。
在本发明的实施例中，该方法还包括：在第一金属电极层中，在边框区域形成与第一金属电极线的延伸方向垂直的第一走线区，将第一金属电极线连接到第一走线区。
在本发明的实施例中，该方法还包括：在第二金属电极层中，在边框区域形成与第二金属电极线的延伸方向垂直的第二走线区，将第二金属电极线连接到第二走线区。
在本发明的实施例中，该方法还包括：在第一金属电极层中，在边框区域形成与第一金属电极线延伸方向平行的第一遮光区。
在本发明的实施例中，该方法还包括：在第二金属电极层中，在边框区域形成与第二金属电极线的延伸方向平行的第二遮光区。
在本发明的实施例中，第一金属电极层呈黑色。
在本发明的实施例中，第二金属电极层呈黑色。
在本发明的实施例中，使用透明绝缘材料形成第一平坦层和第二平坦层。
根据本发明的第三方面，提供了一种显示装置，包括上述的触摸基板和与触摸基板贴合的显示面板。
由上述技术方案可知，本发明提供触摸基板及制造方法、显示装置，通过在白色光阻和第一金属电极层之间设置第一平坦层来平坦化白色光阻带来的高度差，避免了电极层中的走线在边框区域中的爬坡处出现断线的问题。
附图说明
为了更清楚地说明本发明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的一些实施例，对于本领域普通技术人员 来讲，在不付出创造性劳动的前提下，还可以根据这些图获得其他的附图。
图1是根据本发明的一些实施例或至少一个实施例中的触摸基板的层结构的示意图；
图2是图1所示的触摸基板的第一金属电极层的示意图；
图3是图1所示的触摸基板的第二金属电极层的示意图；
图4是图1所示的触摸基板的第一金属电极层和第二金属电极层构成的金属网格结构的示意图；
图5是根据本发明的一些实施例或至少一个实施例中的用于图1所示的触摸基板的制造方法的流程示意图；
图6是图1所示的触摸基板的在衬底上形成白色光阻后的结构的示意图；
图7是图1所示的触摸基板的形成第一平坦层后的结构的示意图；
图8是图1所示的触摸基板的形成第一金属电极层后的结构的示意图；
图9是图1所示的触摸基板的形成第二平坦层后的结构的示意图。
图1～8中元件列表：1-衬底；2-白色光阻；3-第一平坦层；4-第一金属电极层；5-第二平坦层；6-第二金属电极层；401-第一走线区；402-第一遮光区；601-第二遮光区；602-第二走线区。
具体实施方式
下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。
图1是根据本发明的一些实施例或至少一个实施例中的触摸基板的层结构的示意图。本发明的一些实施例或至少一个实施例中提供了一种触摸基板，如图1所示，该触摸基板包括：衬底1；以及在衬底1上依次形成的白色光阻2、第一平坦层3、第一金属电极层4、第二平坦层5及第二金 属电极层6。其中，白色光阻2形成在触摸基板的边框区域，第一平坦层3被配置为覆盖白色光阻和衬底，以提供平坦面来形成第一金属电极层。
如此，第一平坦层3可以填充第一金属电极层4和衬底1之间除白色光阻2之外的空间。通过第一平坦层3来平坦化白色光阻2带来的高度差，避免了电极层在边框区域爬坡时出现断线的问题。
图2是图1所示的触摸基板的第一金属电极层的示意图。图3是图1所示的触摸基板的第二金属电极层的示意图。图4是图1所示的触摸基板的第一金属电极层和第二金属电极层构成的金属网格结构的示意图。
在本发明的实施例中，如图2所示，第一金属电极层4包括多条第一金属电极线。如图3所示，第二金属电极层6包括多条第二金属电极线，且多条第一金属电极线和多条第二金属电极线交叉设置。如图4所示，第一金属电极层4的多条金属电极线和第二金属层6的多条金属电极线形成金属网格(metal mesh)结构，此金属网格结构设计不仅减少了作业工序还增加了触摸基板的机械性能，且更适用于大尺寸的触控屏。
在本发明的实施例中，在第一金属电极层4与第二金属电极层6构成的金属网格结构中，每个金属网格的尺寸与每个像素单元的尺寸可以相等，或者，每个金属网格的尺寸可以为每个像素单元的尺寸的整数倍。如此，该金属网格结构能够有效地消除摩尔纹。
在本发明的实施例中，如图2所示，第一金属电极层4在边框区域包括与第一金属电极线的延伸方向垂直的第一走线区401，第一金属电极线连接到第一走线区401。如图3所示，第二金属电极层6在边框区域包括与第二金属电极线的延伸方向垂直的第二走线区602，第二金属电极线连接到第二走线区602。
如此，多条第一金属电极线均汇集到第一走线区401，通过第一走线区401与外部电路连接。多条第二金属电极线均汇集到第二走线区602，通过第二走线区602与外部电路连接。
在本发明的实施例中，如图2所示，第一金属电极层4在边框区域包括与第一金属电极线延伸方向平行的第一遮光区402。如图3所示，第二 金属电极层6在边框区域包括与第二金属电极线的延伸方向平行的第二遮光区601。通过在在第一金属电极层和第二金属电极层上设置遮光区，加强了边框的遮光效果。
在本发明的实施例中，第一金属电极层4呈黑色。第二金属电极层6呈黑色。即在白色光阻2上方设置了黑色的第一金属电极层4和/或黑色的第二金属电极层6。黑色的金属电极层具有较高吸光系数，从而保证了白色光阻2的光学密度。应当理解的是，在金属电极层中，在触摸基板的显示区域可以不设置金属电极线或者是设置足够细的金属电极线，这样即使是使用黑色的金属电极线，也可以使得金属电极层在显示区域具有良好的透光性。此外，在金属电极层中，在触摸基板的边框区域可以设置足够粗的黑色金属电极线或者其它结构，以保证白色光阻2的光学密度。
在本发明的实施例中，第一平坦层3和第二平坦层5均由透明绝缘材料形成。其中，第二平坦层5位于第一金属电极层4和第二金属电极层6之间，用于绝缘第一金属电极层4和第二金属电极层6。第二平坦层5也可以提供平坦面来形成第二金属电极层6。
本发明一些实施例或至少一个实施例中提供了一种触摸基板的制造方法，该方法包括：形成衬底；以及在衬底上依次形成白色光阻、第一平坦层、第一金属电极层、第二平坦层及第二金属电极层。其中，白色光阻形成在触摸基板的边框区域，第一平坦层被配置为覆盖白色光阻和衬底，以提供平坦面来形成第一金属电极层。
如此，第一平坦层可以填充第一金属电极层和衬底之间除白色光阻之外的空间。通过第一平坦层来平坦化白色光阻带来的高度差，避免了电极层在边框区域爬坡时出现断线的问题。
在本发明的实施例中，该方法还包括：在第一金属电极层上设置多条第一金属电极线，在第二金属电极层上设置多条第二金属电极线，多条第一金属电极线和多条第二金属电极线交叉设置。交叉设置的多条第一金属电极线和多条第二金属电极线形成了金属网格结构，此金属网格结构设计不仅减少了作业工序还增加了触摸基板的机械性能，且更适用于大尺寸的 触控屏的生产。
在本发明的实施例中，第一金属电极层4与第二金属电极层6构成的金属网格图案中，每个金属网格的尺寸与每个像素单元的尺寸可以相等，或者，每个金属网格的尺寸可以为每个像素单元的尺寸的整数倍。如此，该金属网格结构能够有效地消除摩尔纹。
在本发明的实施例中，该方法还包括：在第一金属电极层中，在边框区域形成与第一金属电极线的延伸方向垂直的第一走线区，将第一金属电极线连接到第一走线区。
在本发明的实施例中，该方法还包括：在第二金属电极层中，在边框区域形成与第二金属电极线的延伸方向垂直的第二走线区，将第二金属电极线连接到第二走线区。
在本发明的实施例中，该方法还包括：在第一金属电极层中，在边框区域形成与第一金属电极线延伸方向平行的第一遮光区。
在本发明的实施例中，该方法还包括：在第二金属电极层中，在边框区域形成与第二金属电极线的延伸方向平行的第二遮光区。
在本发明的实施例中，第一金属电极层呈黑色。
在本发明的实施例中，第二金属电极层呈黑色。
第一金属电极层和第二金属电极层的吸光系数较高，从而保证了位于第一金属电极层和第二金属电极层下方的白色光阻的光学密度。
在本发明的实施例中，使用透明绝缘材料形成第一平坦层和第二平坦层。
本发明的一些实施例或至少一个实施例中提供了一种显示装置，包括上述的触摸基板和与触摸基板贴合的显示面板。该显示装置例如可以为电视机、显示面板、显示器、平板电脑、移动电话、导航仪、照相机或摄像机等任何具有显示功能的设备。
为了更清楚地说明本发明的技术方案，下面结合包括制造步骤的流程图以及在各制造步骤中形成的层结构的剖面示意图说明本发明的一些实施例或至少一个实施例。应该理解，这里示出的结构是例示性的，根据本发 明权利要求限定的范围和精神，还可以具有其他结构形式。
图5是根据本发明的一些实施例或至少一个实施例中的用于图1所示的触摸基板的制造方法的流程示意图。图6是图1所示的触摸基板的在衬底上形成白色光阻后的结构的示意图。图7是图1所示的触摸基板的形成第一平坦层后的结构的示意图。图8是图1所示的触摸基板的形成第一金属电极层后的结构的示意图。图9是图1所示的触摸基板的形成第二平坦层后的结构的示意图。
如图5所示，制造方法可具体包括如下步骤：S1：在衬底1的边框区域形成白色光阻2，结构如图6所示。衬底1可由强化玻璃等材料形成。S2：在衬底1和白色光阻2上形成第一平坦层3，结构如图7所示。第一平坦层3的高度大于等于白色光阻2的高度，以平坦化白色光阻2和衬底1之间的高度差。第一平坦层3的材料为透明绝缘材料。S3：在第一平坦层3上形成第一金属电极层4，结构如图8所示。第一金属电极层4可由吸光系数较高的黑色材料形成，从而保证了白色光阻2的光学密度。S4：在第一金属电极层4上形成第二平坦层5，结构如图9所示。第二平坦层2为透明的绝缘材料，以绝缘第一金属电极层4和第二金属电极层6。S5：在第二平坦层5上形成第二金属电极层6，结构如图1所示。
在第一金属电极层4上形成了多条第一金属电极线，在第二金属电极层6上形成了多条第二金属电极线，多条第一金属电极线和多条第二金属电极线交叉设置。则交叉设置的多条第一金属电极线和多条第二金属电极线形成了金属网格结构，这不仅减少了作业工序还增加了触摸基板的机械性能，而且更适用于大尺寸的触控屏的生产。
以上实施例仅用以说明本发明的技术方案，而非对其限制；尽管参照前述实施例对本发明进行了详细的说明，本领域的普通技术人员应当理解；其依然可以对前述各实施例所记载的技术方案进行修改，或者对其中部分技术特征进行等同替换；而这些修改或者替换，并不使相应技术方案的本质脱离本发明各实施例技术方案的精神和范围。

Claims (19)

  1. 一种触摸基板，包括：衬底；以及在衬底上依次形成的白色光阻、第一平坦层、第一金属电极层、第二平坦层及第二金属电极层；
    其中，所述白色光阻形成在所述触摸基板的边框区域；
    所述第一平坦层被配置为覆盖所述白色光阻和所述衬底，以提供平坦面来形成所述第一金属电极层。
  2. 根据权利要求1所述的触摸基板，其中，所述第一金属电极层包括多条第一金属电极线，所述第二金属电极层包括多条第二金属电极线，所述多条第一金属电极线和所述多条第二金属电极线交叉设置。
  3. 根据权利要求2所述的触摸基板，其中，所述第一金属电极层在边框区域包括与所述第一金属电极线的延伸方向垂直的第一走线区，所述第一金属电极线连接到所述第一走线区。
  4. 根据权利要求2所述的触摸基板，其中，所述第二金属电极层在边框区域包括与所述第二金属电极线的延伸方向垂直的第二走线区，所述第二金属电极线连接到所述第二走线区。
  5. 根据权利要求2所述的触摸基板，其中，所述第一金属电极层在边框区域包括与所述第一金属电极线延伸方向平行的第一遮光区。
  6. 根据权利要求2所述的触摸基板，其中，所述第二金属电极层在边框区域包括与所述第二金属电极线的延伸方向平行的第二遮光区。
  7. 根据权利要求1所述的触摸基板，其中，所述第一金属电极层呈黑色。
  8. 根据权利要求1所述的触摸基板，其中，所述第二金属电极层呈黑色。
  9. 根据权利要求1所述的触摸基板，其中，所述第一平坦层和所述第二平坦层的材料均由透明绝缘材料形成。
  10. 一种触摸基板的制造方法，包括：形成衬底；以及在衬底上依次形成白色光阻、第一平坦层、第一金属电极层、第二平坦层及第二金属电极层；
    其中，所述白色光阻形成在所述触摸基板的边框区域；
    所述第一平坦层被配置为覆盖所述白色光阻和所述衬底，以提供平坦面来形成所述第一金属电极层。
  11. 根据权利要求10所述的方法，其中，该方法还包括：
    在所述第一金属电极层形成多条第一金属电极线，在所述第二金属电极层形成多条第二金属电极线，所述多条第一金属电极线和所述多条第二金属电极线交叉设置。
  12. 根据权利要求11所述的方法，其中，该方法还包括：
    在所述第一金属电极层中，在边框区域形成与所述第一金属电极线的延伸方向垂直的第一走线区，将所述第一金属电极线连接到所述第一走线区。
  13. 根据权利要求11所述的方法，其中，该方法还包括：
    在所述第二金属电极层中，在边框区域形成与所述第二金属电极线的延伸方向垂直的第二走线区，将所述第二金属电极线连接到所述第二走线区。
  14. 根据权利要求11所述的方法，其中，该方法还包括：
    在所述第一金属电极层中，在边框区域形成与所述第一金属电极线延伸方向平行的第一遮光区。
  15. 根据权利要求11所述的方法，其中，该方法还包括：
    在所述第二金属电极层中，在边框区域形成与所述第二金属电极线的延伸方向平行的第二遮光区。
  16. 根据权利要求10所述的方法，其中，所述第一金属电极层呈黑色。
  17. 根据权利要求10所述的方法，其中，所述第二金属电极层呈黑色。
  18. 根据权利要求10所述的方法，其中，使用透明绝缘材料形成所述第一平坦层和所述第二平坦层。
  19. 一种显示装置，包括权利要求1至9其中任一项所述的触摸基板和与所述触摸基板贴合的显示面板。
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