WO2016158853A1 - 分光フィルタおよび分光測定装置 - Google Patents
分光フィルタおよび分光測定装置 Download PDFInfo
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- WO2016158853A1 WO2016158853A1 PCT/JP2016/059902 JP2016059902W WO2016158853A1 WO 2016158853 A1 WO2016158853 A1 WO 2016158853A1 JP 2016059902 W JP2016059902 W JP 2016059902W WO 2016158853 A1 WO2016158853 A1 WO 2016158853A1
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- wavelength
- refractive index
- film thickness
- pass filter
- index material
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- 230000003595 spectral effect Effects 0.000 title claims abstract description 130
- 238000004611 spectroscopical analysis Methods 0.000 title 1
- 238000002834 transmittance Methods 0.000 claims abstract description 52
- 239000000463 material Substances 0.000 claims description 116
- 230000005540 biological transmission Effects 0.000 claims description 49
- 230000014509 gene expression Effects 0.000 claims description 36
- 239000000758 substrate Substances 0.000 claims description 13
- 238000005259 measurement Methods 0.000 claims description 8
- 230000000052 comparative effect Effects 0.000 description 27
- 239000006185 dispersion Substances 0.000 description 27
- 230000007423 decrease Effects 0.000 description 4
- 230000007704 transition Effects 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 239000008186 active pharmaceutical agent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000012417 linear regression Methods 0.000 description 1
- 229910000484 niobium oxide Inorganic materials 0.000 description 1
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/12—Generating the spectrum; Monochromators
- G01J3/26—Generating the spectrum; Monochromators using multiple reflection, e.g. Fabry-Perot interferometer, variable interference filters
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/2803—Investigating the spectrum using photoelectric array detector
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/30—Measuring the intensity of spectral lines directly on the spectrum itself
- G01J3/36—Investigating two or more bands of a spectrum by separate detectors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/12—Generating the spectrum; Monochromators
- G01J2003/1226—Interference filters
- G01J2003/1234—Continuously variable IF [CVIF]; Wedge type
Definitions
- the present invention relates to a spectral filter whose transmission wavelength continuously changes in one direction, and a spectroscopic measurement device including the spectral filter.
- Patent Document 1 An example of a conventional spectral filter is disclosed in Patent Document 1, for example.
- the spectral filter of Patent Document 1 is configured using a first interference filter and a second interference filter.
- the first interference filter monotonously increases the cutoff wavelength WL along one direction, and transmits light in a wavelength region longer than the cutoff wavelength WL.
- the second interference filter monotonously increases the cutoff wavelength WS along one direction, and transmits light in a wavelength range shorter than the cutoff wavelength WS.
- the interference filter whose cutoff wavelength monotonously changes along one direction can be formed of a so-called wedge-shaped interference filter whose film thickness continuously increases along one direction.
- the first and second interference filters have the same film thickness gradient.
- the first interference filter and the second interference filter are configured such that the monotonically increasing direction of the cutoff wavelength WL matches the monotonically increasing direction of the cutoff wavelength WS, and the cutoff wavelength WL of the first interference filter is the second
- the interference filters are overlapped so as to be shorter than the cutoff wavelength WS at the corresponding position.
- the cutoff characteristic on the short wavelength side and the cutoff characteristic on the long wavelength side with respect to the peak wavelength of the spectral transmittance at each position in the one direction can be set by separate interference filters. Thereby, it is possible to easily obtain a spectral characteristic superior to that obtained with a single interference filter.
- Japanese Patent Laid-Open No. 2-132405 (refer to claims, actions, examples, FIGS. 1 to 3 etc.)
- the material of the film constituting the interference filter always has so-called wavelength dispersion in which the refractive index changes depending on the wavelength. That is, the refractive index of the film material increases as the wavelength decreases, and conversely decreases as the wavelength increases.
- the high refractive index material has a large chromatic dispersion in the visible light wavelength range (a large change in refractive index with respect to a change in wavelength).
- the wavelength region on the short wavelength side of visible light is affected by the wavelength dispersion of the film material. Then, the cutoff wavelength WL of the first interference filter is shifted to the long wavelength side, and the cutoff wavelength WS of the second interference filter is shifted to the short wavelength side. In the wavelength region on the long wavelength side of visible light, the cutoff wavelength WL of the first interference filter is shifted to the short wavelength side, and the cutoff wavelength WS of the second interference filter is shifted to the long wavelength side.
- the half width of the transmittance (full width at half maximum wavelength) is narrowed in the wavelength region on the short wavelength side of visible light, and conversely, the half width of the transmittance is widened in the wavelength region on the long wavelength side of visible light. .
- the half-value width is greatly different between the short wavelength side and the long wavelength side of visible light
- the short wavelength side and the long wavelength side of incident light are used when performing spectroscopic measurement in combination with a light receiving element. This is not desirable because the resolution differs greatly.
- the present invention has been made to solve the above-described problems, and its purpose is to transmit the entire visible wavelength range in a spectral filter in which the transmission wavelength range changes monotonously in one direction in which the film thickness changes.
- An object of the present invention is to provide a spectral filter capable of obtaining spectral characteristics with a substantially uniform half-value width, and a spectroscopic measurement device including the spectral filter.
- the spectral filter according to one aspect of the present invention has a film thickness gradient GL in which the film thickness monotonously increases in one direction, and transmits light in a wavelength region longer than the cutoff wavelength WL. It has a long-pass filter in which the cutoff wavelength WL monotonously increases as it increases, and a film thickness gradient GS in which the thickness monotonously increases in one direction, and transmits light in a wavelength region shorter than the cutoff wavelength WS.
- a short-pass filter in which the cut-off wavelength WS monotonously increases as the film thickness increases, and the long-pass filter and the short-pass filter have the same direction in which the film thickness monotonously increases. And at each position in the one direction, the peak of transmittance is formed by the cutoff wavelength WL being shorter than the cutoff wavelength WS.
- the film thickness gradient GL is greater than the thickness gradient GS.
- a spectroscopic measurement device includes a spectroscopic filter having the above-described configuration and a light receiving element that receives light transmitted through the spectroscopic filter, and the light receiving element includes the long-pass filter and the spectral filter.
- the short-pass filters are arranged side by side along the one direction in which the film thickness monotonously increases.
- the cutoff wavelength WL of the long pass filter can be shifted to the short wavelength side, and the cutoff wavelength WS of the short pass filter can be shifted to the long wavelength side.
- the cutoff wavelength WL can be shifted to the long wavelength side, and the cutoff wavelength WS of the short pass filter can be shifted to the short wavelength side.
- the short pass filter it is a graph showing a change in spectral characteristics accompanying a change in the refractive index of a high refractive index material. It is a graph which shows the relationship between the wavelength and refractive index in niobium oxide. It is a graph which shows the relationship between the wavelength and refractive index in a silicon oxide. It is a graph which shows transition of the total film thickness in a long pass filter and a short pass filter with the same film thickness gradient. It is a graph which shows an example of the spectral characteristic of the band pass filter comprised by superimposing the said long pass filter and the said short pass filter. It is a graph which shows the other example of the spectral characteristic of the said band pass filter.
- DELTA half value width ratio
- 3 is a graph showing spectral characteristics of the spectral filter of Example 1.
- 6 is a graph showing the spectral characteristics of the spectral filter of Example 2.
- 6 is a graph showing spectral characteristics of the spectral filter of Example 3.
- 10 is a graph showing spectral characteristics of the spectral filter of Example 4.
- 10 is a graph showing the spectral characteristics of the spectral filter of Example 5.
- 14 is a graph showing spectral characteristics of the spectral filter of Example 6.
- 10 is a graph showing the spectral characteristics of the spectral filter of Example 7.
- FIG. 6 is a graph showing spectral characteristics of a spectral filter of Comparative Example 1.
- 10 is a graph showing spectral characteristics of a spectral filter of Comparative Example 2.
- 10 is a graph showing spectral characteristics of a spectral filter of Comparative Example 3. It is explanatory drawing which plotted each point which shows the spectral filter of a some Example on the coordinate plane.
- FIG. 27 is an explanatory diagram showing a regression equation for defining a region including Examples 1 to 7 in FIG.
- FIG. 28 is an explanatory diagram in which points indicating the spectral filters of Comparative Examples 1 to 3 are further plotted on the coordinate plane of FIG.
- the numerical value range includes the values of the lower limit a and the upper limit b.
- the present invention is not limited to the following contents.
- the half width refers to the full width at half maximum (full width at half maximum).
- FIG. 1 is a cross-sectional view illustrating a schematic configuration of a spectrometer 1 according to the present embodiment.
- the spectrometer 1 includes a spectral filter 10 and a light receiving unit 20.
- the spectral filter 10 is a band-pass filter (LVF; linear variable filter) whose transmission wavelength continuously changes in one direction, and includes a substrate 11, a long-pass filter 12, and a short-pass filter 13.
- the substrate 11 is a transparent substrate and is made of, for example, glass.
- the long pass filter 12 has a film thickness gradient GL in which the film thickness monotonously increases in one direction.
- the film thickness gradient GL corresponds to
- the long pass filter 12 includes a layer made of a first refractive index material (low refractive index material) and a layer made of at least one second refractive index material (high refractive index material) having a higher refractive index than the first refractive index material. And transmits light in a wavelength region longer than the cutoff wavelength WL.
- the cut-off wavelength WL is a wavelength (cutoff wavelength) when the transmittance is 50%, and monotonically increases (shifts to the longer wavelength side) as the film thickness increases in the one direction.
- the short pass filter 13 has a film thickness gradient GS in which the film thickness monotonously increases in one direction.
- the film thickness gradient GS corresponds to
- the short pass filter 13 includes a layer made of a first refractive index material (low refractive index material) and at least one second refractive index material (high refractive index material) having a refractive index higher than that of the first refractive index material. It is composed of a multilayer film in which layers are laminated, and transmits light in a wavelength range shorter than the cutoff wavelength WS.
- the short-pass filter 13 and the long-pass filter 12 have different multilayer structures (for example, the number of layers and the thickness of each layer).
- the cut-off wavelength WS is a wavelength (cutoff wavelength) when the transmittance is 50%, and monotonously increases (shifts to the longer wavelength side) as the film thickness increases.
- the long pass filter 12 and the short pass filter 13 are overlapped so that the one direction in which the film thickness monotonously increases coincides with each other.
- the transmittance peak is formed by the cutoff wavelength WL being shorter than the cutoff wavelength WS (see FIG. 3 and the like). That is, at each position in the above direction, there is a transmittance peak at a wavelength longer than the cutoff wavelength WL and shorter than the cutoff wavelength WS.
- the cutoff wavelength WL / WS shifts to the longer wavelength side as the film thickness increases, so the wavelength at which the transmittance reaches a peak (peak wavelength) also shifts to the longer wavelength side as the film thickness increases. To do. This means that the wavelength (transmission wavelength region) of the light transmitted through the spectral filter 10 continuously changes in the one direction in which the film thickness increases.
- the light receiving unit 20 includes a plurality of light receiving elements 21 and a support substrate 22 that supports each light receiving element 21.
- Each light receiving element 21 is a sensor that receives light transmitted through the spectral filter 10, and supports the support substrate 22 along the one direction in which the film thickness monotonously increases in the long pass filter 12 and the short pass filter 13 of the spectral filter 10. They are arranged side by side.
- the spectral filter 10 since the transmission wavelength continuously changes in the one direction, the light receiving element 21 among the plurality of light receiving elements 21 arranged along the one direction is detected. Thus, the wavelength (wavelength range) of the light incident on the spectral filter 10 can be detected.
- the light receiving unit 20 is disposed so as to receive the light that has passed through the long pass filter 12 and the short pass filter 13 in this order, but is transmitted through the short pass filter 13 and the long pass filter 12 in this order. It may be arranged to receive the received light.
- the film thickness gradient GL of the long pass filter 12 is set to be larger than the film thickness gradient GS of the short pass filter 13 (that is,
- the full width at half maximum of the transmittance is made substantially uniform over the entire wavelength range of light.
- FIG. 2 is a graph showing spectral characteristics of a general long pass filter (LP) and a short pass filter (SP) having a constant film thickness.
- a band-pass filter (BP) that transmits light in a predetermined wavelength region overlaps LP and SP so that the cutoff wavelength WL of LP and the cutoff wavelength WS of SP are shifted (so that WL ⁇ WS). Consists of. If LP and SP are formed so that the film thickness changes in one direction (for example, increases), and these are overlapped, as shown in FIG. It is possible to produce a BP whose transmission wavelength varies for each position having a different thickness.
- FIG. 4 shows a general reflective film composed of a multilayer film of a high refractive index material and a low refractive index material.
- the refractive index nH of the high refractive index material is 2.30, 2.38, 2.46.
- the change of the spectral characteristic when changing is shown. As shown in the figure, it is known that the reflection wavelength region A of the reflective film becomes wider when the refractive index nH of the high refractive index material becomes higher and becomes narrower when the refractive index nH becomes lower.
- the spectral characteristics of the reflection film on the long wavelength side of the reflection wavelength region A are the spectral properties of the LP (especially the transmittance from 0% rapidly).
- the spectral characteristic on the short wavelength side of the reflected wavelength range A (especially the spectral characteristic in the wavelength range where the transmittance sharply drops to 0%) corresponds to the spectral characteristic of the SP.
- FIG. 7 shows the relationship between the wavelength and refractive index of niobium oxide (Nb 2 O 5 ) which is a kind of high refractive index material
- FIG. 8 shows silicon oxide (SiO 2) which is a kind of low refractive index material.
- the material constituting the film always has chromatic dispersion, and the refractive index increases as the wavelength becomes shorter. It can be seen that such a tendency appears more remarkably in the high refractive index material than in the low refractive index material. That is, the wavelength dispersion of the low refractive index material is negligibly small compared to the wavelength dispersion of the high refractive index material.
- FIG. 9 shows the transition of the total film thickness in LP and SP having a film thickness gradient.
- the total film thickness at the position where the transmittance peak exists at the wavelength of 600 nm is used as the reference (total film thickness 1), and the total of other positions with respect to the total film thickness.
- the ratio of film thickness is shown.
- LP and SP having the same film thickness gradient that is, LP and SP in which the total film thickness is changed in the same ratio in one direction are overlapped to form a BP, as shown in FIG.
- the LP cutoff wavelength WL is long due to the influence of wavelength dispersion of the high refractive index material described above (by increasing the refractive index nH).
- the wavelength shifts to the wavelength side, and the SP cutoff wavelength WS shifts to the short wavelength side.
- the full width at half maximum of the transmittance near the wavelength of 380 nm is narrowed.
- the LP cutoff wavelength WL is reduced due to the influence of wavelength dispersion of the high refractive index material (by decreasing the refractive index nH).
- the SP shifts to the short wavelength side, and the SP cutoff wavelength WS shifts to the long wavelength side.
- the full width at half maximum of the transmittance near the wavelength of 780 nm is widened.
- FIG. 12 shows the transition of the total film thickness in LP and SP when the film thickness gradient of LP is larger than the film thickness gradient of SP.
- both LP and SP are based on the total film thickness at the position where the transmittance peak exists at the wavelength of 600 nm as the reference (total film thickness 1), and other positions relative to the total film thickness. The ratio of the total film thickness is shown.
- a BP when a BP is configured by superposing an LP having a relatively large film thickness gradient and an SP having a relatively small film thickness gradient, a wavelength region on a shorter wavelength side than a certain reference (wavelength 600 nm).
- the degree of decrease in the total film thickness with respect to the reference film thickness is larger in LP than in SP.
- the cutoff wavelength WL is shifted in the direction in which the total film thickness decreases, and for SP, the total film thickness
- the cutoff wavelength WS can be shifted in the direction in which the value increases. That is, as shown in FIG. 13, near the wavelength of 380 nm, the cutoff wavelength WL is shifted to the shorter wavelength side than the position shown in FIG. 10, and the cutoff wavelength WS is shifted to the longer wavelength side than the position shown in FIG. Can be made.
- the degree of increase in the total film thickness with respect to the reference film thickness is higher than SP.
- LP is larger. Therefore, in the vicinity of the wavelength of 780 nm, the cutoff wavelength WL is shifted in the direction in which the total film thickness increases for LP, while being influenced by the wavelength dispersion of the high refractive index material described above, and the total film thickness for SP
- the cut-off wavelength WS can be shifted in the direction of decreasing. That is, as shown in FIG.
- the cutoff wavelength WL is shifted to the longer wavelength side than the position shown in FIG. 10
- the cutoff wavelength WS is shifted to the shorter wavelength side than the position shown in FIG. Can be made.
- the full width at half maximum can be made substantially uniform over the entire wavelength range of visible light.
- the value of ⁇ is surely close to 1, and it can be said that the difference in half width between the short wavelength side and the long wavelength side of the visible light wavelength region is surely reduced. It is considered that the spectral filter 10 having a more uniform half width over the entire wavelength range of visible light can be obtained.
- the long-pass filter 12 and the short-pass filter 13 of the spectral filter 10 are composed of a layer made of the first refractive index material and at least one second refractive index material having a refractive index higher than that of the first refractive index material. It is comprised with the multilayer film which laminated
- a material in which at least one of the number of layers and the total film thickness is maximum is defined as a main refractive index material.
- the second refractive index material becomes the main refractive index material.
- any second refractive index material can be used as the main refractive index material. .
- the refractive index at a wavelength of 380 nm and the refractive index at a wavelength of 780 nm of the main refractive index material are nL 380 and nL 780 , respectively, and the film thickness of the transmission part having a transmittance peak at a wavelength of 780 nm is dL 780. (Nm), and the film thickness of the transmission part having a transmittance peak at a wavelength of 380 nm is dL 380 (nm).
- the refractive index at a wavelength of 380 nm and the refractive index at a wavelength of 780 nm of the main refractive index material are nS 380 and nS 780 , respectively, and the film thickness of the transmission part having a transmittance peak at a wavelength of 780 nm.
- the film thickness of the transmission part having a transmittance peak at a wavelength of 380 nm is dS 380 (nm).
- the spectral filter 10 satisfies the following conditional expression (1). That is, 0.99 ⁇ ⁇ (dL 780 / dL 380 ) / (dS 780 / dS 380 ) ⁇ ⁇ [ ⁇ (nL 780 / nL 380 ) + (nS 780 / nS 380 ) ⁇ ⁇ 1/2] 0.4 ⁇ 1.065 ... (1) It is.
- the spectral filter 10 it is more desirable for the spectral filter 10 to satisfy the following conditional expression (2). That is, 0.995 ⁇ ⁇ (dL 780 / dL 380 ) / (dS 780 / dS 380 ) ⁇ ⁇ [ ⁇ (nL 780 / nL 380 ) + (nS 780 / nS 380 ) ⁇ ⁇ 1/2] 0.4 ⁇ 1.03 ... (2) It is.
- Conditional expression (2) can be simplified as conditional expression (2 ′) below, following conditional expression (1 ′). 0.995 ⁇ F ⁇ 1.03 (2 ′)
- E represents the ratio between the film thickness gradient GL of the long pass filter 12 and the film thickness gradient GS of the short pass filter 13.
- the value of E increases as dL 780 / dL 380 becomes larger than dS 780 / dS 380 , that is, as the film thickness gradient GL becomes larger than the film thickness gradient GS.
- the above M represents the average of the dispersion of the main refractive index material applied to the long pass filter 12 and the dispersion of the main refractive index material applied to the short pass filter 13.
- the denominator (nL 380 , nS 380 ) is larger than the numerator (nL 780 , nS 780 ) in the formula of M, so the value of M is smaller.
- the average of the variance is raised to the power of 0.4 because E is associated with the variable Y in the XY orthogonal coordinate system, and M is associated with the variable X, which will be described later.
- the shift amount of the cutoff wavelengths WL and WS near the wavelength of 380 nm and the wavelength of 780 nm is affected by the influence of wavelength dispersion. Will increase. Therefore, in order to make the full width at half maximum over the entire wavelength range of visible light, the larger the dispersion of the main refractive index material used, the larger the ratio of the film thickness gradient GL to the film thickness gradient GS, and the wavelength 380 nm. It is necessary to further increase the shift amount in the reverse direction of the cutoff wavelength WL ⁇ WS in the vicinity and near the wavelength of 780 nm. That is, in terms of the relationship between M and E described above, it can be said that the smaller the value of M (the greater the dispersion of the main refractive index material), the larger the value of E needs to be.
- the dispersion of the main refractive index material is small, the influence of dispersion (change in refractive index due to wavelength) is small, and therefore the amount of shift of the cutoff wavelengths WL and WS near the wavelength of 380 nm and the wavelength of 780 nm is large. There is no need to increase it as much as possible. For this reason, the ratio of the film thickness gradient GL to the film thickness gradient GS does not need to be increased as the dispersion increases. That is, it can be said that the greater the value of M (the smaller the dispersion of the main refractive index material), the smaller the value of E.
- FIG. 15 is a graph showing the relationship between the value of F and the half-value width ratio ⁇ of conditional expression (A) in examples and comparative examples described later. As shown in the figure, when the value of F is 0.99 or more and 1.065 or less, ⁇ is 0.3 or more and 4 or less, which satisfies the above-described conditional expression (A).
- conditional expression (1) or (1 ′) it is possible to satisfy conditional expression (A), thereby realizing a substantially uniform half-value width over the entire wavelength range of visible light.
- FIG. 16 is a graph showing the relationship between the value of F and the half-value width ratio ⁇ of conditional expression (B) in examples and comparative examples described later.
- ⁇ is 0.4 or more and 2 or less, which satisfies the above-described conditional expression (B). That is, by satisfying conditional expression (2) or (2 ′), it is possible to satisfy conditional expression (B), and thereby, it can be said that a more uniform half-value width can be realized over the entire wavelength range of visible light. .
- Example 2 the results of examining the characteristics of each spectral filter by designing a plurality of spectral filters by specifically setting the film thickness gradients of the long pass filter and the short pass filter will be described.
- Representative examples of the plurality of designed spectral filters are referred to as Examples 1 to 7 and Comparative Examples 1 to 3.
- a high refractive index material H1 made of Nb 2 O 5 and high refractive index materials H2 to H4 in which dispersion of the high refractive index material H1 is changed are considered as the high refractive index materials.
- a low refractive index material L1 made of SiO 2 is considered as a low refractive index material.
- Table 1 shows dispersion data (refractive index for each wavelength) of the high refractive index materials H1 to H4, and Table 2 shows dispersion data of the low refractive index material L1.
- any one of LP1 to LP5 is considered as a long pass filter, and any one of SP1 to SP5 is considered as a short pass filter.
- LP1 to LP5 are configured by laminating one or more layers selected from high refractive index materials H1 to H4 and a layer made of low refractive index material L1.
- Tables 3 to 7 show the reference layer configurations of LP1 to LP5 at the transmission position with a wavelength of 380 nm, respectively. The film thickness of each layer at the transmission position of each wavelength is set based on the above reference layer configuration so that a desired film thickness gradient GL is obtained.
- the total film thickness at the transmission position with a wavelength of 380 nm when the desired film thickness gradient GL of LP1 is obtained is 1942.5 nm
- the total film thickness of each layer shown in Table 3 is 1962.1 nm.
- the film thickness of each layer at the transmission position with a wavelength of 380 nm is set to a value obtained by multiplying each film thickness shown in Table 3 by a coefficient (1942.5 / 1962.1).
- the film thickness of each layer at the transmission position of other wavelengths is also set by the same method as described above.
- the SP1 to SP5 are configured by laminating one or more layers selected from the high refractive index materials H1 to H4 and a layer made of the low refractive index material L1.
- Tables 8 to 12 show reference layer configurations of SP1 to SP5 at the transmission position with a wavelength of 380 nm, respectively.
- the film thickness of each layer at the transmission position of each wavelength is set by the same method as in the case of LP1 to LP5 based on the above reference layer configuration so as to obtain a desired film thickness gradient GS.
- the layer number is the number of the layer when counted in order from the substrate side
- the film thickness indicates the physical film thickness
- the layer structure of LP5 shown in Table 7 is such that only the second layer of LP1 shown in Table 3 is replaced with the high refractive index material H1 with the high refractive index material H3.
- the layer structure of SP5 shown in Table 12 is such that the high refractive index material H1 is replaced with the high refractive index material H3 only in the first layer of SP1 shown in Table 8.
- wavelength 1 refers to wavelength 380 nm
- wavelength 2 refers to wavelength 480 nm
- wavelength 3 refers to wavelength 580 nm
- wavelength 4 refers to wavelength 680 nm
- wavelength 5 refers to wavelength 780 nm.
- the wavelengths 1 to 5 all indicate the wavelength (peak wavelength) at which the transmittance reaches a peak.
- Example 1 the film thickness of each layer of LP1 and SP1 is determined from the standard film thicknesses shown in Tables 3 and 8 so that the total film thickness at the transmission positions of wavelengths 1 to 5 becomes the value shown in Table 13.
- a spectral filter was designed by adjusting. The spectral characteristics of the spectral filter of Example 1 are shown in FIG. As the spectral characteristics, only the spectral characteristics in the wavelength region (transmission part) having the transmittance peak at wavelengths 1 to 5 are shown (the same applies to other drawings).
- Example 2 the film thickness of each layer of LP1 and SP1 is determined from the standard film thicknesses shown in Tables 3 and 8 so that the total film thickness at the transmission positions of wavelengths 1 to 5 becomes the value shown in Table 14.
- a spectral filter was designed by adjusting. The spectral characteristics of the spectral filter of Example 2 are shown in FIG.
- Example 3 the film thickness of each layer of LP1 and SP1 is determined from the standard film thicknesses shown in Tables 3 and 8 so that the total film thickness at the transmission positions of wavelengths 1 to 5 becomes the value shown in Table 15.
- a spectral filter was designed by adjusting. The spectral characteristics of the spectral filter of Example 3 are shown in FIG.
- Example 4 the film thickness of each layer of LP2 and SP2 is determined from the standard film thicknesses shown in Tables 4 and 9 so that the total film thickness at the transmission positions of wavelengths 1 to 5 becomes the value shown in Table 16.
- a spectral filter was designed by adjusting. The spectral characteristics of the spectral filter of Example 4 are shown in FIG.
- Example 5 the film thickness of each layer of LP4 and SP4 is determined from the standard film thicknesses shown in Tables 6 and 11 so that the total film thickness at the transmission positions of wavelengths 1 to 5 becomes the value shown in Table 17.
- a spectral filter was designed by adjusting. The spectral characteristics of the spectral filter of Example 5 are shown in FIG.
- Example 6 the film thickness of each layer of LP3 and SP3 is determined from the standard film thicknesses shown in Table 5 and Table 10 so that the total film thickness at the transmission positions of wavelengths 1 to 5 becomes the value shown in Table 18.
- a spectral filter was designed by adjusting. The spectral characteristics of the spectral filter of Example 6 are shown in FIG.
- Example 7 In Example 7, the film thickness of each layer of LP5 and SP5 was determined from the standard film thicknesses shown in Table 7 and Table 12 so that the total film thickness at the transmission positions of wavelengths 1 to 5 would be the value shown in Table 19.
- a spectral filter was designed by adjusting. The spectral characteristics of the spectral filter of Example 7 are shown in FIG.
- Comparative Example 1 the film thickness of each layer of LP1 and SP1 is determined from the standard film thicknesses shown in Tables 3 and 8 so that the total film thickness at the transmission positions of wavelengths 1 to 5 becomes the value shown in Table 20.
- a spectral filter was designed by adjusting. The spectral characteristics of the spectral filter of Comparative Example 1 are shown in FIG.
- Comparative Example 2 the film thickness of each layer of LP2 and SP2 is determined from the standard film thicknesses shown in Tables 4 and 9 so that the total film thickness at the transmission positions of wavelengths 1 to 5 becomes the value shown in Table 21.
- a spectral filter was designed by adjusting. The spectral characteristics of the spectral filter of Comparative Example 2 are shown in FIG.
- Comparative Example 3 the film thickness of each layer of LP4 and SP4 is determined from the standard film thicknesses shown in Tables 6 and 11 so that the total film thickness at the transmission positions of wavelengths 1 to 5 becomes the value shown in Table 22.
- a spectral filter was designed by adjusting. The spectral characteristics of the spectral filter of Comparative Example 3 are shown in FIG.
- Table 23 and Table 24 show values of parameters included in the conditional expressions (1), (2), (A), and (B) described above in the spectral filters of Examples 1 to 7 and Comparative Examples 1 to 3. It is shown collectively.
- the high refractive index material H1 having a large number of layers and a large total film thickness among the high refractive index materials H1 and H3 is the main refractive index. Become a material.
- the half width ratio ⁇ is 0.3. It can be seen that the variation in the half width in the wavelength range of visible light is small. Therefore, if E is larger than 1, it can be said that a spectral filter having a substantially uniform half width over the entire wavelength range of visible light can be realized.
- the half-value width ratio ⁇ is within the range of 0.4 to 2, and it can be said that the difference between the half-value width ⁇ 380 and the half-value width ⁇ 780 is surely small. It can be said that a spectral filter having a more uniform half width over the entire region can be realized (see FIGS. 17 to 23).
- the power part may be other than 0.4, but in this case, since the points corresponding to the plurality of spectral filters are arranged in a curved line, it is difficult to specify the regression equation. There is a possibility.
- conditional expression (1) means the above-mentioned conditional expression (1) without any change. That is, by satisfying conditional expression (1), it is possible to obtain a spectral filter having a substantially uniform half width over the entire wavelength range of visible light by keeping the half width ratio ⁇ within the range of 0.3 to 4. It can be said.
- FIG. 28 shows a case where a regression equation is set in FIG. 27 while paying particular attention to Examples 1 to 7 among a plurality of Examples.
- the above expression means the conditional expression (2) described above, by satisfying the conditional expression (2), the half-value width ratio ⁇ falls within the range of 0.4 to 2, and the wavelength range of visible light It can be said that a spectral filter having a more uniform half width can be obtained throughout.
- FIG. 29 further plots points (coordinates (M, E)) indicating the spectral filters of Comparative Examples 1 to 3 in addition to the points of the plurality of examples shown in FIG.
- the spectral filter and the spectroscopic measurement device of the present embodiment described above may be expressed as follows.
- the spectral filter of this embodiment has a film thickness gradient GL in which the film thickness monotonously increases in one direction, transmits light in a wavelength region longer than the cutoff wavelength WL, and increases as the film thickness increases.
- the film has a long-pass filter in which the cutoff wavelength WL is monotonously increased, a film thickness gradient GS in which the film thickness monotonously increases in one direction, and transmits light in a wavelength region shorter than the cutoff wavelength WS.
- a peak of transmittance is formed when the cutoff wavelength WL is shorter than the cutoff wavelength WS.
- the thickness gradient GL is greater than the thickness gradient GS.
- the full width at half maximum of the transmittance at a wavelength of 380 nm is ⁇ 380
- the full width at half maximum of the transmittance at a wavelength of 780 nm is ⁇ 780
- ⁇ 380 / ⁇ 780 is ⁇ , 0.3 ⁇ ⁇ ⁇ 4 It is desirable to satisfy
- the long pass filter and the short pass filter are multilayer films in which a layer made of a first refractive index material and at least one layer made of at least one second refractive index material having a refractive index higher than that of the first refractive index material are laminated.
- the main refractive index material is a material having at least one of the number of layers and the total film thickness among the at least one second refractive index material, in the long pass filter, the main refraction
- the refractive index at a wavelength of 380 nm and the refractive index at a wavelength of 780 nm of the refractive index material are nL 380 and nL 780 , respectively, and the thickness of the transmission part having a transmittance peak at a wavelength of 780 nm is dL 780, and the transmittance is 380 nm.
- the film thickness of the transmission part having the peak is dL 380, and in the short pass filter, the wavelength of the main refractive index material is 380 nm.
- the refractive index at 780 nm and the refractive index at a wavelength of 780 nm are nS 380 and nS 780 , respectively, the film thickness of the transmission part having a transmission peak at a wavelength of 780 nm is dS 780, and the transmission having a transmission peak at a wavelength of 380 nm.
- the film thickness of the part is dS 380 , it is desirable to satisfy the following conditional expression (1).
- the long pass filter and the short pass filter are multilayer films in which a layer made of a first refractive index material and at least one layer made of at least one second refractive index material having a refractive index higher than that of the first refractive index material are laminated.
- the main refractive index material is a material having at least one of the number of layers and the total film thickness among the at least one second refractive index material, in the long pass filter, the main refraction
- the refractive index at a wavelength of 380 nm and the refractive index at a wavelength of 780 nm of the refractive index material are nL 380 and nL 780 , respectively, and the thickness of the transmission part having a transmittance peak at a wavelength of 780 nm is dL 780, and the transmittance is 380 nm.
- the film thickness of the transmission part having the peak is dL 380, and in the short pass filter, the wavelength of the main refractive index material is 380 nm.
- the refractive index at 780 nm and the refractive index at a wavelength of 780 nm are nS 380 and nS 780 , respectively, the film thickness of the transmission part having a transmission peak at a wavelength of 780 nm is dS 780, and the transmission having a transmission peak at a wavelength of 380 nm.
- the film thickness of the part is dS 380 , it is desirable that the following conditional expression (2) is satisfied.
- the long pass filter may be formed on one surface of the substrate, and the short pass filter may be formed on the other surface of the substrate.
- the spectroscopic measurement apparatus includes the spectral filter having the above-described configuration and a light receiving element that receives light transmitted through the spectral filter.
- the light receiving element includes the long-pass filter and the short-pass filter of the spectral filter. Are arranged side by side along the one direction in which the film thickness monotonously increases.
- the present invention can be used for a BP (LVF) whose transmission wavelength continuously changes in one direction and a spectroscopic measurement apparatus including the BP.
- BP BP
- spectroscopic measurement apparatus including the BP.
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Abstract
Description
図1は、本実施形態の分光測定装置1の概略の構成を示す断面図である。分光測定装置1は、分光フィルタ10と、受光部20とを有している。分光フィルタ10は、一方向において透過波長が連続的に変化するバンドパスフィルタ(LVF;リニアバリアブルフィルタ)であり、基板11と、ロングパスフィルタ12と、ショートパスフィルタ13とを有している。基板11は、透明基板であり、例えばガラスで構成されている。
本実施形態では、ロングパスフィルタ12の膜厚勾配GLは、ショートパスフィルタ13の膜厚勾配GSよりも大きくなるように設定されており(すなわち、|tanα|>|tanβ|)、これによって、可視光の波長域全体にわたって透過率の半値幅がほぼ均一となるようにしている。以下、このような効果が得られる理由について説明する。
上述した分光フィルタ10において、波長380nmにおける透過率の半値幅をΔλ380(nm)とし、波長780nmにおける透過率の半値幅をΔλ780(nm)とし、Δλ380/Δλ780をΔλとしたとき、
0.3≦Δλ≦4 ・・・(A)
を満足することが望ましく、
0.4≦Δλ≦2 ・・・(B)
を満足することがより望ましい。
次に、条件式(A)および(B)を満足するための具体的な条件について検討する。
0.99≦{(dL780/dL380)/(dS780/dS380)}×[{(nL780/nL380)+(nS780/nS380)}×1/2]0.4≦1.065 ・・・(1)
である。
(dL780/dL380)/(dS780/dS380)=E
[{(nL780/nL380)+(nS780/nS380)}×1/2]0.4=M
E×M=F
とすると、条件式(1)は、以下の条件式(1’)のように簡略化することもできる。
0.99≦F≦1.065 ・・・(1’)
0.995≦{(dL780/dL380)/(dS780/dS380)}×[{(nL780/nL380)+(nS780/nS380)}×1/2]0.4≦1.03 ・・・(2)
である。
0.995≦F≦1.03 ・・・(2’)
次に、ロングパスフィルタおよびショートパスフィルタの各膜厚勾配を具体的に設定して複数の分光フィルタを設計し、各分光フィルタの特性について調べた結果について説明する。なお、設計した複数の分光フィルタのうちで代表的なものを、実施例1~7および比較例1~3とする。
実施例1では、波長1~5の透過位置における総膜厚が表13に示す値となるように、LP1およびSP1の各層の膜厚を、表3および表8で示した基準の膜厚から調整して分光フィルタを設計した。実施例1の分光フィルタの分光特性を図17に示す。なお、分光特性としては、波長1~5に透過率のピークがある波長域(透過部)における分光特性のみを示す(他の図面でも同様とする)。
実施例2では、波長1~5の透過位置における総膜厚が表14に示す値となるように、LP1およびSP1の各層の膜厚を、表3および表8で示した基準の膜厚から調整して分光フィルタを設計した。実施例2の分光フィルタの分光特性を図18に示す。
実施例3では、波長1~5の透過位置における総膜厚が表15に示す値となるように、LP1およびSP1の各層の膜厚を、表3および表8で示した基準の膜厚から調整して分光フィルタを設計した。実施例3の分光フィルタの分光特性を図19に示す。
実施例4では、波長1~5の透過位置における総膜厚が表16に示す値となるように、LP2およびSP2の各層の膜厚を、表4および表9で示した基準の膜厚から調整して分光フィルタを設計した。実施例4の分光フィルタの分光特性を図20に示す。
実施例5では、波長1~5の透過位置における総膜厚が表17に示す値となるように、LP4およびSP4の各層の膜厚を、表6および表11で示した基準の膜厚から調整して分光フィルタを設計した。実施例5の分光フィルタの分光特性を図21に示す。
実施例6では、波長1~5の透過位置における総膜厚が表18に示す値となるように、LP3およびSP3の各層の膜厚を、表5および表10で示した基準の膜厚から調整して分光フィルタを設計した。実施例6の分光フィルタの分光特性を図22に示す。
実施例7では、波長1~5の透過位置における総膜厚が表19に示す値となるように、LP5およびSP5の各層の膜厚を、表7および表12で示した基準の膜厚から調整して分光フィルタを設計した。実施例7の分光フィルタの分光特性を図23に示す。
比較例1では、波長1~5の透過位置における総膜厚が表20に示す値となるように、LP1およびSP1の各層の膜厚を、表3および表8で示した基準の膜厚から調整して分光フィルタを設計した。比較例1の分光フィルタの分光特性を図24に示す。
比較例2では、波長1~5の透過位置における総膜厚が表21に示す値となるように、LP2およびSP2の各層の膜厚を、表4および表9で示した基準の膜厚から調整して分光フィルタを設計した。比較例2の分光フィルタの分光特性を図25に示す。
比較例3では、波長1~5の透過位置における総膜厚が表22に示す値となるように、LP4およびSP4の各層の膜厚を、表6および表11で示した基準の膜厚から調整して分光フィルタを設計した。比較例3の分光フィルタの分光特性を図26に示す。
0.99≦a≦1.065
の範囲にあればよいと言える。a=x×y=M×Eであるため、定数aに関する上記の条件式は、以下のように書き換えることができる。
0.99≦M×E≦1.065
0.995≦a≦1.03
の範囲にあればよい。a=M×Eであるため、上記の条件式は以下のように書き換えることができる。
0.995≦M×E≦1.03
0.3≦Δλ≦4
を満足することが望ましい。
0.99≦{(dL780/dL380)/(dS780/dS380)}×[{(nL780/nL380)+(nS780/nS380)}×1/2]0.4≦1.065 ・・・(1)
である。
0.4≦Δλ≦2
を満足することが望ましい。
0.995≦{(dL780/dL380)/(dS780/dS380)}×[{(nL780/nL380)+(nS780/nS380)}×1/2]0.4≦1.03 ・・・(2)
である。
10 分光フィルタ
11 基板
12 ロングパスフィルタ
13 ショートパスフィルタ
21 受光素子
Claims (7)
- 一方向に向かうにつれて膜厚が単調に増加する膜厚勾配GLを有し、遮断波長WLよりも長い波長域の光を透過させるとともに、前記膜厚が増加するにつれて前記遮断波長WLが単調に長くなるロングパスフィルタと、
一方向に向かうにつれて膜厚が単調に増加する膜厚勾配GSを有し、遮断波長WSよりも短い波長域の光を透過させるとともに、前記膜厚が増加するにつれて前記遮断波長WSが単調に長くなるショートパスフィルタとを備え、
前記ロングパスフィルタと前記ショートパスフィルタとは、膜厚が単調に増加する前記一方向が互いに一致するように重ね合わされており、
前記一方向の各位置において、前記遮断波長WLが前記遮断波長WSよりも短いことによって透過率のピークが形成されており、
前記膜厚勾配GLは、前記膜厚勾配GSよりも大きい、分光フィルタ。 - 波長380nmにおける透過率の半値波長全幅をΔλ380とし、波長780nmにおける透過率の半値波長全幅をΔλ780とし、Δλ380/Δλ780をΔλとしたとき、
0.3≦Δλ≦4
を満足する、請求項1に記載の分光フィルタ。 - 前記ロングパスフィルタおよび前記ショートパスフィルタは、第1屈折率材料からなる層と、該第1屈折率材料よりも屈折率の高い少なくとも1つの第2屈折率材料からなる層とを積層した多層膜で構成されており、
前記少なくとも1つの第2屈折率材料の中で、層数および総膜厚の少なくともいずれかが最大となる材料を、主屈折率材料とすると、
前記ロングパスフィルタにおいて、
前記主屈折率材料の波長380nmにおける屈折率、および波長780nmにおける屈折率を、それぞれ、nL380およびnL780とし、
波長780nmに透過率のピークを有する透過部の膜厚をdL780とし、
波長380nmに透過率のピークを有する透過部の膜厚をdL380とし、
前記ショートパスフィルタにおいて、
前記主屈折率材料の波長380nmにおける屈折率、および波長780nmにおける屈折率を、それぞれ、nS380およびnS780とし、
波長780nmに透過率のピークを有する透過部の膜厚をdS780とし、
波長380nmに透過率のピークを有する透過部の膜厚をdS380としたとき、
以下の条件式(1)を満足する、請求項2に記載の分光フィルタ;
0.99≦{(dL780/dL380)/(dS780/dS380)}×[{(nL780/nL380)+(nS780/nS380)}×1/2]0.4≦1.065 ・・・(1)
である。 - 波長380nmにおける透過率の半値波長全幅をΔλ380とし、波長780nmにおける透過率の半値波長全幅をΔλ780とし、Δλ380/Δλ780をΔλとしたとき、
0.4≦Δλ≦2
を満足する、請求項1に記載の分光フィルタ。 - 前記ロングパスフィルタおよび前記ショートパスフィルタは、第1屈折率材料からなる層と、該第1屈折率材料よりも屈折率の高い少なくとも1つの第2屈折率材料からなる層とを積層した多層膜で構成されており、
前記少なくとも1つの第2屈折率材料の中で、層数および総膜厚の少なくともいずれかが最大となる材料を、主屈折率材料とすると、
前記ロングパスフィルタにおいて、
前記主屈折率材料の波長380nmにおける屈折率、および波長780nmにおける屈折率を、それぞれ、nL380およびnL780とし、
波長780nmに透過率のピークを有する透過部の膜厚をdL780とし、
波長380nmに透過率のピークを有する透過部の膜厚をdL380とし、
前記ショートパスフィルタにおいて、
前記主屈折率材料の波長380nmにおける屈折率、および波長780nmにおける屈折率を、それぞれ、nS380およびnS780とし、
波長780nmに透過率のピークを有する透過部の膜厚をdS780とし、
波長380nmに透過率のピークを有する透過部の膜厚をdS380としたとき、
以下の条件式(2)を満足する、請求項4に記載の分光フィルタ;
0.995≦{(dL780/dL380)/(dS780/dS380)}×[{(nL780/nL380)+(nS780/nS380)}×1/2]0.4≦1.03 ・・・(2)
である。 - 前記ロングパスフィルタは、基板の一方の面に成膜されており、
前記ショートパスフィルタは、前記基板の他方の面に成膜されている、請求項1から5のいずれかに記載の分光フィルタ。 - 請求項1から6のいずれかに記載の分光フィルタと、
前記分光フィルタを透過した光を受光する受光素子とを備え、
前記受光素子は、前記分光フィルタの前記ロングパスフィルタおよび前記ショートパスフィルタにおいて膜厚が単調に増加する前記一方向に沿って並べて配置されている、分光測定装置。
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2016218144A (ja) * | 2015-05-15 | 2016-12-22 | コニカミノルタ株式会社 | 分光フィルタおよび分光測定装置 |
JP2020506373A (ja) * | 2016-12-27 | 2020-02-27 | ウルグス ソシエダード アノニマ | 仮現運動における物体の動的ハイパースペクトルイメージング |
JP7045379B2 (ja) | 2016-12-27 | 2022-03-31 | ウルグス ソシエダード アノニマ | 仮現運動における物体の動的ハイパースペクトルイメージング |
JP2018155645A (ja) * | 2017-03-17 | 2018-10-04 | 倉敷紡績株式会社 | 分光フィルタユニットおよび分光測光装置 |
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JPWO2016158853A1 (ja) | 2018-02-01 |
US20180095207A1 (en) | 2018-04-05 |
EP3279710B1 (en) | 2021-04-21 |
EP3279710A1 (en) | 2018-02-07 |
JP6627865B2 (ja) | 2020-01-08 |
US10564334B2 (en) | 2020-02-18 |
EP3279710A4 (en) | 2018-03-21 |
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