WO2016144038A1

WO2016144038A1 - Film touch sensor

Info

Publication number: WO2016144038A1
Application number: PCT/KR2016/002104
Authority: WO
Inventors: 조성훈; 김상국
Original assignee: 동우화인켐 주식회사
Priority date: 2015-03-11
Filing date: 2016-03-03
Publication date: 2016-09-15
Also published as: KR20160109526A

Abstract

The present invention relates to a film touch sensor, and more specifically, to a film touch sensor comprising: a separation layer; a first protection layer positioned on the separation layer; and an electrode pattern layer positioned on the first protection layer, wherein the first protection layer comprises a polymer comprising a specific repeat unit, and thus the dimensional stability, flexibility and durability of the film touch sensor is markedly improved, and when the film touch sensor is manufactured by being peeled from a carrier substrate, the occurrence of cracks is markedly reduced and transmissivity is excellent.

Description

Film touch sensor

The present invention relates to a film touch sensor capable of suppressing crack generation.

The touch screen panel is an input device for inputting a user's command by selecting instructions displayed on a screen such as an image display device with a human hand or an object.

To this end, the touch screen panel is provided on the front face of the image display device to convert a contact position in direct contact with a human hand or an object into an electrical signal. Accordingly, the instruction content selected at the contact position is received as an input signal.

Since the touch screen panel can replace a separate input device connected to an image display device such as a keyboard and a mouse, its use range is gradually being expanded.

As a method of implementing a touch screen panel, a resistive film method, a light sensing method, and a capacitive method are known. In the dual capacitive touch screen panel, a conductive sensing pattern is applied when a human hand or an object is touched. By detecting a change in capacitance formed in another sensing pattern or ground electrode, the contact position is converted into an electrical signal.

Such a touch screen panel is generally attached to the outer surface of a flat panel display such as a liquid crystal display and an organic light emitting display, and commercialized. Therefore, the touch screen panel requires high transparency and thin thickness.

In addition, in recent years, a flexible flat panel display device has been developed. In this case, a touch screen panel attached to the flexible flat panel display device also requires a flexible characteristic.

On the other hand, the capacitive touch screen panel requires a thin film deposition, a pattern forming process, etc. in order to form a sensing pattern for implementing a touch sensor, and thus requires characteristics such as high heat resistance and chemical resistance. Thereby, a transparent electrode is formed on the board | substrate formed by hardening resin, such as polyimide excellent in heat resistance.

On the other hand, the flexible touch screen panel should use a thin and flexible substrate, there is a problem that it is difficult to form a transparent electrode on such a flexible substrate. As an alternative to this, a method of coating a resin on a support to form a transparent electrode on the resin coating layer and peeling the resin coating layer from the support has been proposed, but there is a problem in that peeling of the cured resin is not easy.

Korean Patent Publication No. 2012-133848 discloses a flexible touch screen panel, but has not suggested an alternative to the problem.

[Preceding technical literature]

[Patent Documents]

Korean Patent Publication No. 2012-133848

An object of this invention is to provide the film touch sensor which can suppress a crack generation.

In addition, an object of the present invention is to provide a film touch sensor with improved transmittance.

1. Separation layer;

A first protective layer on the separation layer; And

An electrode pattern layer disposed on the first protective layer;

The first protective layer comprises a polymer film comprising a repeating unit represented by the following formula (1):

[Formula 1]

Where X is

,

,

,

or

Is,

R1 to R10 are each independently hydrogen, a halogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, or an aralkyl group having 7 to 17 carbon atoms,

R9 and R10 may form a carbon ring or a hetero ring,

R11 to R16, R18 to R19 and R21 to R22 are each independently hydrogen, a halogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, or an aralkyl group having 7 to 17 carbon atoms Is,

R17 and R20 are each independently an alkylene group having 1 to 9 carbon atoms,

a is an integer from 0 to 20,

b is an integer from 1 to 500).

2. In the above 1, the weight average molecular weight of the polymer is 20,000 to 150,000, the film touch sensor.

3. In the above 1, the glass transition temperature (Tg) of the polymer is 120 ℃ or more, the film touch sensor.

4. In the above 1, the elastic modulus of the first protective layer is 2.8 to 3.2GPa, the touch sensor film.

5. In the above 1, wherein the transmittance of the first protective layer is 90% or more, the film touch sensor.

6. In the above 1, the thickness of the first protective layer is 0.1 to 50㎛, the touch sensor film.

7. In the above 1, wherein the first protective layer is formed by a solution casting method using a composition for forming a first protective layer comprising a polymer comprising a repeating unit represented by the formula (1), film touch sensor .

8. according to the above 1, further comprising a second protective layer located on the first protective layer formed with the electrode pattern layer, the film touch sensor.

9. In the above 8, further comprising a base film attached to the second protective layer, the film touch sensor.

10. In the above 9, wherein the base film is attached via the adhesive layer, the film touch sensor.

11. In the above 1, wherein the electrode pattern layer is indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium zinc oxide (IZTO), cadmium tin oxide (CTO), poly (3.4) A film touch sensor comprising a conductive pattern formed of at least one selected from the group consisting of ethylenedioxythiophene (PEDOT), carbon nanotubes (CNT), metal wires and metal meshes.

12. The touch screen panel including the film touch sensor of any one of the above 1 to 11.

13. An image display device including the above touch screen panel.

The film touch sensor of the present invention includes a protective layer excellent in dimensional stability, flexibility, and durability, so that the occurrence of cracks is reduced when the film touch sensor is peeled off from the carrier substrate, thereby providing excellent durability.

In addition, the film touch sensor of the present invention can implement an excellent transmittance.

1 schematically illustrates a cross section of a film touch sensor according to an embodiment of the invention.

2 is a schematic cross-sectional view of a film touch sensor according to another embodiment of the present invention.

3 schematically illustrates a method of manufacturing a film touch sensor according to an embodiment of the present invention.

4 schematically illustrates a method of manufacturing a film touch sensor according to an embodiment of the present invention.

The present invention relates to a film touch sensor, and more particularly, a separation layer; A first protective layer on the separation layer; And an electrode pattern layer disposed on the first protective layer, wherein the first protective layer includes a polymer including a specific repeating unit, thereby significantly improving the dimensional stability, flexibility, and durability of the film touch sensor, thereby providing a carrier The present invention relates to a film touch sensor that is excellent in transmittance and significantly reduces the occurrence of cracks when peeling from a substrate to produce a film touch sensor.

Hereinafter, the present invention will be described in detail with reference to the accompanying drawings. However, the following drawings attached to the present specification are intended to illustrate preferred embodiments of the present invention, and together with the contents of the present invention to serve to further understand the technical spirit of the present invention, the present invention described in such drawings It should not be construed as limited to matters.

Flexible displays are used to be folded, bent, or rolled, so they must be light, thin, impact resistant and free to bend. However, when the flexible substrate used for the flexible display is subjected to excessive external bending stress, there is a problem that cracks occur in the bent portion.

In particular, in the case of the film touch sensor having the laminated structure as in the present invention, cracks are mainly generated in the first protective layer portion.

On the other hand, when the polymer material is used as the protective layer-forming composition, the coefficient of thermal expansion of the polymer material is much larger than the coefficient of thermal expansion of the ceramic material and the metal material, which are inorganic particles. Therefore, when the inorganic film is coated on the polymer film, shrinkage of the polymer film occurs during the curing process or product defects such as bending or cracking of the substrate and peeling of the polymer film due to the significant difference in coefficient of thermal expansion between components when temperature changes. Occurs. As such, there is a problem in that workability and dimensional stability of the flexible display substrate are deteriorated due to the dimensional change of the polymer material.

However, the first protective layer 20 according to the present invention includes a polymer including a repeating unit represented by the following Chemical Formula 1, thereby improving the dimensional stability by forming a protective layer without a curing process, Significantly improve the flexibility to suppress the occurrence of cracks.

Specifically, when the film touch sensor is peeled from the carrier substrate to produce a film touch sensor, stress is concentrated on the first passivation layer so that a large amount of cracks occur in the first passivation layer, thereby degrading durability of the entire film touch sensor. However, the first protective layer according to the present invention is excellent in dimensional stability by forming the first protective layer forming composition including a specific repeating unit on the separation layer only by the coating and drying process, showing excellent flexibility to the film touch sensor It is judged to have the effect of alleviating the stress applied to not only prevent cracking of the first protective layer but also to suppress cracking of the entire film touch sensor, but the present invention is not limited thereto.

1 and 2 schematically illustrate cross-sectional views of

film touch sensors

100 and 110 according to an embodiment of the present invention.

Film touch sensor 100 of the present invention is a separation layer (10); A first protective layer 20 disposed on the separation layer 10; And an electrode pattern layer 30 disposed on the first protective layer 20.

Separation layer (10)

The separation layer 10 according to the present invention is a layer formed for separation from the carrier substrate 70.

The separation layer 10 may be a polymer organic membrane, for example, a polyimide polymer, a polyvinyl alcohol polymer, a polyamic acid polymer, a polyamide polymer , Polyethylene polymer, polystylene polymer, polynorbornene polymer, phenylmaleimide copolymer polymer, polyazobenzene polymer, polyphenylene phthalamide (polyphenylenephthalamide) polymer, polyester polymer, polymethyl methacrylate polymer, cinnamate polymer, coumarin polymer, phthalimidine polymer, It may be made of a polymer such as a chalcone (chalcone) polymer, an aromatic acetylene polymer, but is not limited thereto. These can be used individually or in mixture of 2 or more types.

The thickness of the separation layer 10 according to the present invention is preferably 0.05 to 1 μm, but is not limited thereto.

First protective layer 20

The first protective layer 20 according to the present invention serves as a substrate on which the electrode pattern layer 30 is formed, and the first protective layer is formed only by applying and drying the first protective layer-forming composition on the separation layer. This exhibits excellent dimensional stability and flexibility to prevent cracking of the film touch sensor upon separation from the carrier substrate 70 and by the use of folding and bending.

In addition, it is disposed on the separation layer 10 to serve as a passivation layer for the electrode pattern layer 30 and to prevent contamination of the electrode pattern layer 30, as well as to insulate the conductive patterns.

The first protective layer 20 according to the present invention preferably includes a polymer including a repeating unit represented by the following formula (1).

[Formula 1]

Where X is

,

,

,

or

Is,

R9 and R10 may form a carbon ring or a hetero ring,

a is an integer from 0 to 20,

b is an integer from 1 to 500).

The polymer including the repeating unit represented by Formula 1 according to the present invention may further include a repeating unit formed of other monomers known in the art, in addition to the repeating unit of Formula 1, and may be formed only of the repeating unit of Formula 1. have.

In the present invention, the hetero ring means a ring including at least one hetero atom, for example, N, O, S, or the like.

The weight average molecular weight of the polymer according to the present invention is not particularly limited, and may be, for example, 20,000 to 150,000, and may exhibit the best applicability and flexibility in the above range.

Glass transition temperature (Tg) of the polymer according to the present invention is not particularly limited, for example, it may be 120 ℃ or more, the thermal strain of the polymer in the above range can be improved in dimensional stability.

The elastic modulus of the first protective layer 20 according to the present invention is not particularly limited, and may be, for example, 2.8 to 3.2 GPa, and may exhibit excellent durability against deformation due to external force bending or bending in the above range. .

The transmittance of the first protective layer 20 according to the present invention is not particularly limited. For example, the transmittance of the first protective layer 20 may be 90% or more, and excellent transmittance may be realized in the above range.

The thickness of the first protective layer 20 according to the present invention is not particularly limited, and may be, for example, 0.1 to 50 μm, and preferably 0.5 to 10 μm. When the thickness of the first protective layer 20 is less than 0.1 μm, impact is accumulated during deposition of ITO, and the peeling force increases from the carrier substrate, thereby causing the film touch sensor to be torn during peeling. This may fall.

The first protective layer 20 may form a composition for forming a first protective layer including a polymer having a specific repeating unit on the separation layer 10 by a solution casting method.

The polymer may be included in 1 to 30% by weight of the total weight of the composition for forming the first protective layer, preferably from 3 to 10% by weight. When the content of the polymer is less than 1%, the effect of suppressing the occurrence of cracks during peeling may be insignificant, and when the content of the polymer is greater than 30%, the applicability may be deteriorated due to the increase in the viscosity.

The composition for forming the first protective layer according to the present invention may further include a solvent for dissolving the components used, to dissolve the polymer in consideration of compatibility with the solid component and to obtain an excellent coating property and a transparent thin film Any suitable one used in the art can be adopted.

Examples of the solvent include alcohols such as methanol, ethanol, methyl ethyl carbitol and diethylene glycol; Ethers such as tetrahydrofuran; Glycol ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, and ethylene glycol dimethyl ether; Ethylene glycol acetates such as ethylene glycol diacetate: ethylene glycol alkyl ether acetates such as methyl cellosolve acetate and ethyl cellosolve acetate; Propylene glycol alkyl ether acetates such as propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate, propylene glycol propyl ether acetate, and propylene glycol butyl ether acetate; Propylene glycol dialkyl acetates such as propylene glycol methyl ethyl acetate; Propylene glycol alkyl ether propionates such as propylene glycol methyl ether propionate, propylene glycol ethyl ether propionate, propylene glycol propyl ether propionate and propylene glycol butyl ether propionate; Aromatic hydrocarbons such as toluene and xylene; Ketones such as methyl ethyl ketone, cyclohexanone, 4-hydroxy 4-methyl 2-pentanone, and N-methyl-pyrrolidone; Or methyl acetate, ethyl acetate, propyl acetate, butyl acetate, 2-hydroxy propionate, methyl 2-hydroxy 2-methylpropionate, ethyl 2-hydroxy 2-methylpropionate, methyl hydroxyacetate, ethyl hydroxyacetate, Butyl hydroxy acetate, methyl lactate, ethyl lactate, propyl lactate, butyl lactate, methyl 3-hydroxypropionate, ethyl 3-hydroxypropionate, propyl 3-hydroxypropionate, butyl hydroxypropionate, 2-hydroxy 3 Methyl methyl butyrate, methyl methoxy acetate, ethyl methoxy acetate, methoxy propyl acetate, methoxy butyl acetate, ethoxy acetate, ethyl ethoxy acetate, ethoxy propyl acetate, butyl ethoxy acetate, methyl propoxy acetate , Ethyl propoxy acetate, propyl propoxy acetate, butyl propoxy acetate, methyl butoxy acetate, ethyl butoxy acetate, propyl butoxy acetate, butyl butoxy acetate, methyl 2-methoxypropionate, ethyl 2-methoxypropionate, 2-methoxy Propyl propionate, butyl 2-methoxy propionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate, propyl 2-ethoxypropionate, butyl 2-ethoxypropionate, methyl 2-butoxypropionate, 2-part Ethyl oxypropionate, propyl 2-butoxypropionate, butyl 2-butoxypropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, propyl 3-methoxypropionate, methyl 3-ethoxypropionate, 3-E Ethoxy Propionate, 3-Ethoxy Propionate, 3-Ethoxy Propionate, 3-Propoxy Propionate, 3-Propoxy Propionate, 3-Propoxy Propionate, 3-Propyl Propionate, 3-Butoxy Esters such as methyl propionate, ethyl 3-butoxypropionate, propyl 3-butoxypropionate, and butyl 3-butoxypropionate, and these may be used alone or in combination of two or more thereof. .

The content of the solvent according to the present invention is not particularly limited, and for example, may be included in 70 to 99% by weight of the total weight of the composition for forming the first protective layer, when the content of the solvent is in the range of 70 to 99% by weight, the coating Sex may be good.

If necessary, the composition for forming the first protective layer of the present invention may further include an additive. Examples of the additive include, but are not limited to, adhesion promoters and surfactants.

Examples of adhesion promoters include 4,4 ', 4 "-methylidritrisphenol, 4,4', 4" -ethylidine trisphenol, and 4- [bis (4-hydroxyphenyl) methyl] -2-methoxyphenol , 4- [bis (4-hydroxyphenyl) methyl] -2-ethoxyphenol, 4,4 '-[(2-hydroxyphenyl) methylene] bis [2-methylphenol], 4,4'-[ (4-hydroxyphenyl) methylene] bis [2-methylphenol], 4,4 '-[(3-hydroxyphenyl) methylene] bis [2,6-dimethylphenol], 3-glycidoxypropyl trimeth A oxy silane etc. can be used individually or in mixture of 2 or more types, respectively.

Adhesion promoters are preferably included in 0.2 to 3 parts by weight based on 100 parts by weight of the total composition.

Although it does not specifically limit as surfactant, A silicone type surfactant can be used, For example, (3-glycidoxy propyl) trimethoxysilane, (3-glycidoxy propyl) triethoxysilane , (3-glycidoxypropyl) methyldimethoxysilane, (3-glycidoxypropyl) dimethylethoxysilane, (3-glycidoxypropyl) dimethylethoxysilane, 3,4-epoxybutyltrimethoxysilane , 3,4-epoxybutyltriethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltriethoxysilane, aminopropyl Trimethoxysilane etc. can be used individually or in mixture of 2 or more types, respectively.

The silicone surfactant is preferably included in an amount of 0.2 to 3 parts by weight based on 100 parts by weight of the total composition.

Electrode pattern layer 30

The electrode pattern layer 30 according to the present invention is formed on the first protective layer 20.

When the electrode pattern layer 30 is applied to an electronic device, the electrode pattern layer 30 may include a conductive pattern for performing an electrode role, and the conductive pattern may be formed in an appropriate shape according to the requirements of the applied electronic device. For example, when applied to a touch screen panel, two types of electrode patterns may be formed, that is, an electrode pattern for detecting x coordinates and an electrode pattern for detecting y coordinates.

The electrode pattern layer 30 may be used without limitation as long as it is a conductive material. For example, indium tin oxide (ITO), indium zinc oxide (IZO), indium zinc tin oxide (IZTO), aluminum zinc oxide (AZO), Gallium Zinc Oxide (GZO), Florin Tin Oxide (FTO), Indium Tin Oxide-Silver-Indium Tin Oxide (ITO-Ag-ITO), Indium Zinc Oxide-Silver-Indium Zinc Oxide (IZO-Ag-IZO), Indium Zinc Metal oxides selected from the group consisting of tin oxide-silver-indium zinc tin oxide (IZTO-Ag-IZTO) and aluminum zinc oxide-silver-aluminum zinc oxide (AZO-Ag-AZO); Metals selected from the group consisting of gold (Au), silver (Ag), copper (Cu), molybdenum (Mo), and APC; Nanowires of metals selected from the group consisting of gold, silver, copper and lead; Carbon-based materials selected from the group consisting of carbon nanotubes (CNT) and graphene; And conductive polymer materials selected from the group consisting of poly (3,4-ethylenedioxythiophene) (PEDOT) and polyaniline (PANI). These can be used individually or in mixture of 2 or more types.

The unit patterns of the electrode pattern layer 30 may be, for example, a polygonal pattern of three, four, five, six, or seven or more triangles independently of each other.

In addition, the electrode pattern layer 30 may include a regular pattern. A regular pattern means that the pattern form has regularity. For example, the unit patterns may include, independently of each other, a mesh shape such as a rectangle or a square, or a pattern like a hexagon.

In addition, the electrode pattern layer 30 may include an irregular pattern. Irregular pattern means that the shape of the pattern does not have regularity.

When the electrode pattern layer 30 is formed of a material such as metal nanowires, carbon-based materials, polymer materials, or the like, the electrode pattern layer 30 may have a network structure.

In the case of having a network structure, since signals are sequentially transmitted to adjacent patterns in contact with each other, a pattern having high sensitivity can be realized.

The electrode pattern layer 30 may be formed by a method commonly performed in the art, and for example, may be performed by coating a conductive compound on the first protective layer 20 described above. have. The film forming step may be formed by various thin film deposition techniques, such as physical vapor deposition (PVD), chemical vapor deposition (Chemical VaporDeposition, CVD). For example, it may be formed by reactive sputtering, which is one example of a physical vapor deposition method, but is not limited thereto.

Thereafter, in order to form a desired pattern, a step of forming a photoresist layer on an upper surface of the conductive compound film may be performed.

The photosensitive resin composition for forming the photoresist layer is not particularly limited, and a photosensitive resin composition commonly used in the art may be used.

After apply | coating the said photosensitive resin composition on the film | membrane of the said conductive compound, it heat-drys, removes volatile components, such as a solvent, and obtains a smooth photoresist layer.

Ultraviolet rays are irradiated (exposure) through a mask for forming a target pattern on the photoresist layer thus obtained. At this time, it is preferable to use apparatuses, such as a mask aligner and a stepper, so that the parallel light beam may be irradiated uniformly to the whole exposure part, and the exact alignment of a mask and a board | substrate is performed. When ultraviolet light is irradiated, the site to which ultraviolet light is irradiated is hardened.

G-rays (wavelength: 436 nm), h-rays, i-rays (wavelength: 365 nm) and the like can be used as the ultraviolet rays. The irradiation amount of ultraviolet rays may be appropriately selected as necessary, and the present invention does not limit this.

The desired pattern can be obtained when the photoresist layer after hardening is contacted with a developing solution to melt and develop a non-exposed part.

The developing method may be any of a liquid addition method, a dipping method, a spray method and the like. In addition, during development, the substrate may be tilted at an arbitrary angle.

The developer is usually an aqueous solution containing an alkaline compound and a surfactant, and may be used without particular limitation as long as it is commonly used in the art.

Thereafter, an etching process may be performed to form a conductive pattern according to the photoresist pattern.

The etchant composition used in the etching process is not particularly limited, an etchant composition commonly used in the art may be used, and preferably a hydrogen peroxide-based etchant composition may be used.

Through the etching process, the electrode pattern layer 30 including the conductive pattern of the desired pattern may be formed.

Although the thickness of the electrode pattern layer 30 which concerns on this invention is not specifically limited, It is good that it is 0.01-5 micrometers, Preferably it is 0.05-0.5 micrometer.

Second protective layer (40)

If necessary, the film touch sensor of the present invention may further include a second protective layer 40 positioned on the first protective layer 20 on which the electrode pattern layer 30 is formed. 2 schematically shows a cross section in such a case.

The second protective layer 40 according to the present invention may itself serve as a substrate and a passivation layer. In addition, the corrosion of the electrode pattern layer 30 may be prevented, and the surface may be planarized to prevent generation of micro bubbles during adhesion to the base film 60. In addition, it may serve as an adhesive layer.

In the case where the second protective layer 40 is further included, the base film 60 may be simultaneously protected from above and below to further improve the crack suppression effect.

When the second protective layer 40 serves as a substrate or passivation layer, silicone-based polymers such as polydimethylsiloxane (PDMS), polyorganosiloxane (POS); Polyimide-based polymers; It may be made of a polyurethane-based polymer, but is not limited thereto. These can be used individually or in mixture of 2 or more types.

When the second protective layer 40 serves as an adhesive layer, a thermosetting or photocurable pressure-sensitive adhesive or adhesive known in the art may be used without limitation. For example, thermosetting or photocurable adhesives or adhesives, such as polyester type, polyether type, urethane type, epoxy type, silicone type, and acryl type, can be used.

In addition, as the second protective layer 40, the same composition as the first protective layer forming composition can be used.

The thickness of the second protective layer 40 may be the same as the thickness of the first protective layer 20 described above.

The second passivation layer 40 may be formed on the first passivation layer 20 on which the electrode pattern layer 30 is formed in the same manner as the first passivation layer 20 according to the present invention.

Base film (60)

As shown in FIG. 2, the film touch sensor of the present invention may further include a base film 60 attached to the second protective layer 40.

If the second protective layer 40 is an adhesive layer, the base film 60 is on the second protective layer 40, otherwise, as shown in FIG. 2, the adhesive layer 50 on the second protective layer 40. Can be attached via.

As the base film 60, a transparent film made of a material widely used in the art may be used without limitation, and for example, a cellulose ester (eg, cellulose triacetate, cellulose propionate, cellulose butyrate, cellulose acetate Propionate, and nitrocellulose), polyimide, polycarbonate, polyester (e.g. polyethylene terephthalate, polyethylene naphthalate, poly-1,4-cyclohexanedimethylene terephthalate, polyethylene 1,2-diphenoxyethane -4,4'-dicarboxylate and polybutylene terephthalate, polystyrene (e.g. syndiotactic polystyrene), polyolefins (e.g. polypropylene, polyethylene and polymethylpentene), polysulfones, polyether sulfones , Polyarylate, polyether-imide, polymethylmethacrylate, polyether ketone, It may be a film made of a single or a mixture thereof selected from the group consisting of polyvinyl alcohol and polyvinyl chloride.

In addition, the transparent film may be an isotropic film or a retardation film.

In the case of an isotropic film, in-plane retardation (Ro, Ro = [(nx-ny) xd], nx, ny are principal refractive indices in the film plane, and d is film thickness) is 40 nm or less, preferably 15 nm or less, and thickness direction retardation. (Rth, Rth = [(nx + ny) / 2-nz] xd, nz is a refractive index in the film thickness direction) is -90 nm to +75 nm, preferably -80 nm to +60 nm, especially -70 nm to +45 nm Is preferred.

Retardation film is a film produced by the method of uniaxial stretching, biaxial stretching, polymer coating, liquid crystal coating of a polymer film, and is generally used for improving and adjusting optical properties such as viewing angle compensation, color reduction, light leakage improvement, and color control of a display. do.

In addition, a polarizing plate can also be used for the base film 60.

The polarizing plate may be a polarizer protective film is attached to one side or both sides of the polyvinyl alcohol polarizer.

In addition, a protective film can also be used as the base film 60.

The protective film may be a film including an adhesive layer on at least one surface of a film made of a polymer, or a film having a self-adhesive property such as polypropylene, and may be used for protecting the touch sensor surface and improving the process.

The light transmittance of the base film 60 is preferably 85% or more, more preferably 90% or more. Moreover, it is preferable that the total haze value measured according to JISK7136 is 10% or less, and, as for the said base film 70, it is more preferable that it is 7% or less.

Although the thickness of the said base film 60 is not restrict | limited, Preferably it is 30-150 micrometers, More preferably, it is 70-120 micrometers.

Adhesive Layer 50

The base film 60 according to the present invention may be attached using an aqueous adhesive, an adhesive, or a photocurable or thermosetting adhesive or adhesive known in the art.

The film touch sensor of the present invention as described above may be used as the film touch sensor after peeling from the carrier substrate 70.

In addition, the present invention provides a touch screen panel including the film touch sensor, and an image display device including the same.

The touch screen panel of the present invention can be applied to various image display devices such as electroluminescent display devices, plasma display devices, field emission display devices, as well as ordinary liquid crystal display devices. In addition, the present invention can be particularly usefully applied to an image display device having flexible characteristics.

Hereinafter, the manufacturing method of the film touch sensor of the present invention will be described, but is not limited thereto.

3 and 4 is a schematic process diagram of a manufacturing method of a film touch sensor according to an embodiment of the present invention, with reference to the drawings will be described in detail the present invention.

First, as shown in FIG. 3A, a separation layer 10 is formed on a carrier substrate 70.

The carrier substrate 70 may be used without particular limitation as long as it provides a suitable strength so that it can be fixed without being easily bent or twisted during the process and has little effect on heat or chemical treatment. For example, glass, quartz, silicon wafers, sus etc. may be used, preferably glass may be used.

The separation layer 10 may be formed of the aforementioned polymer material.

The method of forming the separation layer 10 is not particularly limited, and the polymer composition may be slit coated, knife coated, spin coated, cast, micro gravure coated, gravure coated, bar coated, roll coated, Wire bar coating method, dip coating method, spray coating method, screen printing method, gravure printing method, flexographic printing method, offset printing method, inkjet coating method, dispenser printing method, nozzle coating method, capillary coating method, etc. It may be formed by coating by a known method.

The separation layer 10 may be further subjected to an additional curing process after the application.

After the separation layer 10 is formed by the above-described method, it may be further subjected to an additional curing process.

The hardening method is not specifically limited, Photocuring or thermosetting, or both methods can be used. The order in which both photocuring and thermosetting are performed is not specifically limited.

Thereafter, as shown in FIG. 3B, a first protective layer 20 is formed on the separation layer 10.

As described above, the first protective layer 20 may form the first protective layer-forming composition including the polymer having the above-described specific repeating unit on the separation layer 10 by a solution casting method.

The coating method in the solution casting method is not particularly limited, and may be the same as the coating method of the composition for forming the separation layer 10.

The drying method of the solution casting method is not particularly limited as long as it is a method of removing a solvent used in the art, and may be dried at 150 to 230 ° C. for 30 to 60 minutes, for example.

Thereafter, as shown in FIG. 3C, an electrode pattern layer 30 is formed on the first protective layer 20.

The electrode pattern layer 30 may be formed of the above-described metal oxides, metals, metal nanowires, carbon-based materials, conductive polymer materials, or the like.

The method of forming the electrode pattern layer 30 is not particularly limited, and physical vapor deposition, chemical vapor deposition, plasma deposition, plasma polymerization, thermal deposition, thermal oxidation, anodic oxidation, cluster ion beam deposition, screen printing, gravure printing, and pla It may be by a method known in the art, such as a flexographic printing method, an offset printing method, an inkjet coating method, a dispenser printing method.

Next, the method of manufacturing the film touch sensor of the present invention further includes attaching the base film 60 on the first protective layer 20 on which the electrode pattern layer 30 is formed.

3 (d) is a process diagram when the second protective layer 40 is first formed before the attachment of the base film 60, but is not limited thereto. The second protective layer 40 may not be formed. .

The base film 60 may be attached to the adhesive layer 50 using an aqueous adhesive, an adhesive, or a photocurable or thermosetting adhesive or adhesive known in the art, as shown in FIG. 4E.

The base film 60 may be a film made of the aforementioned material, or a polarizing plate, a retardation film, or a protective film.

If necessary, in the method for manufacturing the film touch sensor of the present invention, the second protective layer 40 is formed on the first protective layer 20 on which the electrode pattern layer 30 is formed before the base film 60 is attached. It may further comprise the step.

When the second protective layer 40 is formed, the crack prevention effect can be further improved.

The second protective layer 40 may be formed of the same composition as the above-described organic or inorganic insulating material and the composition for forming the first protective layer.

The formation method of the 2nd protective layer 40 is not specifically limited, either, For example, it can form by the same method as the 1st protective layer 20. FIG.

The film touch sensor may be manufactured by separating the separation layer 10 from the carrier substrate, and the separation timing is not particularly limited, for example, after the formation of the electrode pattern 30 and after the formation of the second protective layer 40. Alternatively, it may be separated after the attachment of the base film 60 as shown in FIG.

Hereinafter, preferred examples are provided to aid the understanding of the present invention, but the following examples are merely for exemplifying the present invention, and it will be apparent to those skilled in the art that various changes and modifications can be made within the scope and spirit of the present invention. It is natural that such variations and modifications fall within the scope of the appended claims.

Preparation Examples 1 to 6. Preparation of a composition for forming a protective layer

To prepare a protective layer-forming composition by mixing a protective layer-forming composition having the components and contents shown in Table 1, and then diluting with a solvent so that the solid content of the protective layer-forming composition is 5% by weight.

Polymerization of Polymer A-3 of Preparation Example 3 was carried out in the following manner.

30 to 50 parts by weight of water, 1.7 mol percent of P-tert-butyl-phenol (2,2-bis (4-hydroxyphenyl) propane (bisphenol A, BPA) in a reaction vessel equipped with a stirring device ( PTBP), 210 to 400 mole percent sodium hydroxide, and 1 mole percent tri-n-butylbenzylammonium chloride as a polymerization catalyst to prepare an aqueous phase. Next, a mixture (MPC) of a molar chloride of terephthalic acid / isophthalic acid (1/1), such as a dihydric phenol monomer, is dissolved in 15 to 30 parts by weight of methylene chloride relative to MPC to prepare an organic phase, and firstly an aqueous phase. The mixture was forcibly stirred and added thereto, followed by polymerization for 3 hours at 20 ° C. Thereafter, acetic acid was added so that the reaction solution was slightly acidic, and the reaction was carried out to separate an aqueous phase and an organic phase. Water washing was repeated so that an organic phase was neutral, and A-3 which is an arylate resin was obtained using the reprecipitation method as a reprecipitation solvent in methanol after that. The weight average molecular weight of A-3 resin obtained by GPC measurement was 17,000.

Polymerization of Polymer A-3 of Preparation Example 4 was carried out in the following manner.

In the same manner as in Production Example 3, 2,2-bis (3-methyl-4-hydroxyphenyl) propane (bisphenol C or less BPC) was used to obtain an arylate resin, A-4. The weight average molecular weight of A-4 resin obtained by GPC measurement was 170,000.

Polymerization of Polymer A-5 of Preparation Example 5 was carried out in the following manner.

A-5, an arylate resin, was obtained by using 2,2-bis (3,5-dimethyl-4-hydroxyphenyl) propane (TMBPA) instead of BPA in the same manner as in Preparation Example 3. In addition, the weight average molecular weight of A-5 resin obtained by GPC measurement was 47,000.

Polymerization of the polymer A-6 of Preparation Example 6 was carried out in the following manner.

In the same manner as in Preparation Example 3, polymerization was carried out in the same manner as in Preparation Example 3 using 1,1-bis (4-hydroxyphenyl) cyclohexane (BPZ) instead of BPA to obtain an arylate resin A-6. In addition, the weight average molecular weight of A-6 resin obtained by GPC measurement was 47,000.

The weight average molecular weight (Mw) of the polymer was measured under the following conditions using the GPC method.

Equipment: HLC-8120GPC (manufactured by Tosoh Corporation)

Column: TSK-GELG4000HXL + TSK-GELG2000HXL (Serial Connection)

Column temperature: 40 ℃

Mobile phase solvent: tetrahydrofuran

Flow rate: 1.0 ml / min

Injection volume: 50 μl

Detector: RI

Sample concentration measured: 0.6 wt% (solvent = tetrahydrofuran)

Calibration standard: TSK STANDARD POLYSTYRENE F-40, F-4, F-1, A-2500, A-500 (manufactured by Tosoh Corporation)

Table 1

Examples and Comparative Examples

(1) Example 1

A separation layer containing an aromatic liquid crystal was coated on a soda lime glass having a thickness of 700 μm to a thickness of 0.13 μm. Thereafter, the protective layer forming composition of Preparation Example 1 was applied on the separation layer, and dried at 230 ° C. for 30 minutes to form a first protective layer having a thickness of 2 μm.

Thereafter, an ITO layer was formed to a thickness of 0.05 μm on the first protective layer by vacuum deposition, and a photosensitive resist was applied on the ITO layer to form an electrode pattern layer.

Thereafter, the protective layer-forming composition of Preparation Example 1 was applied onto the first protective layer on which the electrode pattern layer was formed, and the second protective layer was formed in the same manner as the method for forming the first protective layer, and on the second protective layer. An acrylic pressure-sensitive adhesive layer was formed thereon, and then a polycarbonate substrate having a thickness of 50 μm was attached to prepare a film touch sensor.

Thereafter, the glass substrate was peeled off from the separation layer and the upper laminate to prepare a film touch sensor.

(2) Examples 2 to 10 and Comparative Examples 1 to 4

Except as described in Table 2, a film touch sensor was manufactured in the same manner as in Example 1.

Experimental Example

(1) elastic modulus evaluation

The protective layer-forming compositions of Examples and Comparative Examples were applied onto a glass substrate and dried at 230 ° C. for 30 minutes to form a film to have a thickness of 2 μm.

The film was separated from the glass substrate and the elastic modulus was measured according to the method of KS M ISO 6721-4, and the results are shown in Table 2 below.

(2) transmittance evaluation

The film was separated from the glass substrate and the transmittance of light at a wavelength of 550 nm was measured using a spectrophotometer (manufactured by Hitachi Seisakusho, U3210), and the results are shown in Table 3 below.

(3) thermal stability evaluation

The films of Examples and Comparative Examples in which the transmittance was evaluated were further heated at 230 ° C. for 20 minutes, and then the transmittance of light at a wavelength of 550 nm was measured using a spectrophotometer (manufactured by Hitachi Seisakusho, U3210). . The transmittance after heating was compared with the transmittance before heating, and the change rate was evaluated according to the following criteria, and the results are shown in Table 2 below.

○: 3% or less

Δ: more than 3% to 8% or less

X: greater than 9%

(4) durability evaluation

The film was separated from the glass substrate, immersed in propylene glycol monomethyl ether acetate, heated at 100 ° C. for 30 minutes, and then the film thickness was measured, and the durability was evaluated according to the following criteria. The results are shown in Table 3 below. .

In addition, after immersion in the etching solution MA-SCO2 (Dongwoo Finechem Co., Ltd.) was heated for 10 minutes at 60 ℃ and the film thickness was measured and the durability was evaluated according to the following criteria, the results are shown in Table 2 below.

○: 98% or more

Δ: 95% or more but less than 98%

X: less than 95%

(5) Evaluation of durability when forming ITO

Thereafter, an ITO layer was formed on the film by a vacuum deposition method to a thickness of 0.1 nm using a sputter, and then whether wrinkles were generated in the laminate was observed. The durability of the ITO formation was evaluated according to the following criteria, and the results are shown in Table 2 below.

○: no wrinkles

△: wrinkles slightly occur

X: wrinkles all over

(6) crack evaluation

The film touch sensor of the Example and the comparative example was cut into 100 mm x 10 mm, and the film touch sensor was peeled off using 3M # 55 tape (25 mm / 10 cm in length).

After peeling, the crack generation of the film touch sensor was visually evaluated. The results are shown in Table 2 below.

○: no crack

△: fine crack generation

X: crack front

TABLE 2

Referring to Table 3, in the case of the embodiment was excellent in the transmittance and thermal stability of the protective layer, excellent in durability and cracks significantly reduced when peeling the film touch sensor, it was confirmed that the dimensional stability is improved.

However, in the case of the comparative example, the transmittance, thermal stability, and durability of the protective layer are inferior to those of the examples, and crack generation occurred on the entire surface when the film touch sensor was peeled off, and it was confirmed that the dimensional stability was not excellent.

[Description of the code]

10: separation layer 20: first protective layer

30: electrode pattern layer 40: second protective layer

50: adhesive layer 60: base film

70: carrier substrate

Claims

Separation layer;

A first protective layer on the separation layer; And

An electrode pattern layer disposed on the first protective layer;

The first protective layer comprises a polymer film comprising a repeating unit represented by the following formula (1):

[Formula 1]

Where X is
,
,
,
,
,
,
,
,
or
Is,

R1 to R10 are each independently hydrogen, a halogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, or an aralkyl group having 7 to 17 carbon atoms,

R9 and R10 may form a carbon ring or a hetero ring,

R11 to R16, R18 to R19 and R21 to R22 are each independently hydrogen, a halogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, or an aralkyl group having 7 to 17 carbon atoms Is,

R17 and R20 are each independently an alkylene group having 1 to 9 carbon atoms,

a is an integer from 0 to 20,

b is an integer from 1 to 500).
The film touch sensor of claim 1, wherein the polymer has a weight average molecular weight of 20,000 to 150,000.
The film touch sensor of claim 1, wherein the polymer has a glass transition temperature (Tg) of 120 ° C. or more.
The film touch sensor of claim 1, wherein an elastic modulus of the first protective layer is 2.8 to 3.2 GPa.
The film touch sensor of claim 1, wherein the transmittance of the first protective layer is 90% or more.
The film touch sensor of claim 1, wherein the first protective layer has a thickness of 0.1 to 50 μm.
The film touch sensor according to claim 1, wherein the first protective layer is formed by a solution casting method using a composition for forming a first protective layer containing a polymer including a repeating unit represented by Chemical Formula 1.
The touch sensor of claim 1, further comprising a second passivation layer on the first passivation layer on which the electrode pattern layer is formed.
The film touch sensor of claim 8, further comprising a base film attached on the second protective layer.
The film touch sensor of claim 9, wherein the base film is attached via an adhesive layer.
The method of claim 1, wherein the electrode pattern layer is indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium zinc oxide (IZTO), cadmium tin oxide (CTO), poly (3.4-ethylene Deoxythiophene (PEDOT), carbon nanotubes (CNT), a metal touch sensor comprising a conductive pattern formed of at least one selected from the group consisting of a metal mesh.
A touch screen panel comprising the film touch sensor of claim 1.
An image display device comprising the touch screen panel of claim 12