WO2016144038A1 - Capteur tactile à film - Google Patents

Capteur tactile à film Download PDF

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Publication number
WO2016144038A1
WO2016144038A1 PCT/KR2016/002104 KR2016002104W WO2016144038A1 WO 2016144038 A1 WO2016144038 A1 WO 2016144038A1 KR 2016002104 W KR2016002104 W KR 2016002104W WO 2016144038 A1 WO2016144038 A1 WO 2016144038A1
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Prior art keywords
touch sensor
protective layer
film
layer
carbon atoms
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PCT/KR2016/002104
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English (en)
Korean (ko)
Inventor
조성훈
김상국
Original Assignee
동우화인켐 주식회사
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Publication of WO2016144038A1 publication Critical patent/WO2016144038A1/fr

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/02—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
    • C08G61/10—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aromatic carbon atoms, e.g. polyphenylenes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04102—Flexible digitiser, i.e. constructional details for allowing the whole digitising part of a device to be flexed or rolled like a sheet of paper
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

Definitions

  • the present invention relates to a film touch sensor capable of suppressing crack generation.
  • the touch screen panel is an input device for inputting a user's command by selecting instructions displayed on a screen such as an image display device with a human hand or an object.
  • the touch screen panel is provided on the front face of the image display device to convert a contact position in direct contact with a human hand or an object into an electrical signal. Accordingly, the instruction content selected at the contact position is received as an input signal.
  • the touch screen panel can replace a separate input device connected to an image display device such as a keyboard and a mouse, its use range is gradually being expanded.
  • a resistive film method As a method of implementing a touch screen panel, a resistive film method, a light sensing method, and a capacitive method are known.
  • a conductive sensing pattern is applied when a human hand or an object is touched.
  • the contact position is converted into an electrical signal.
  • Such a touch screen panel is generally attached to the outer surface of a flat panel display such as a liquid crystal display and an organic light emitting display, and commercialized. Therefore, the touch screen panel requires high transparency and thin thickness.
  • a flexible flat panel display device has been developed.
  • a touch screen panel attached to the flexible flat panel display device also requires a flexible characteristic.
  • the capacitive touch screen panel requires a thin film deposition, a pattern forming process, etc. in order to form a sensing pattern for implementing a touch sensor, and thus requires characteristics such as high heat resistance and chemical resistance.
  • a transparent electrode is formed on the board
  • the flexible touch screen panel should use a thin and flexible substrate, there is a problem that it is difficult to form a transparent electrode on such a flexible substrate.
  • a method of coating a resin on a support to form a transparent electrode on the resin coating layer and peeling the resin coating layer from the support has been proposed, but there is a problem in that peeling of the cured resin is not easy.
  • Korean Patent Publication No. 2012-133848 discloses a flexible touch screen panel, but has not suggested an alternative to the problem.
  • An object of this invention is to provide the film touch sensor which can suppress a crack generation.
  • an object of the present invention is to provide a film touch sensor with improved transmittance.
  • a first protective layer on the separation layer
  • An electrode pattern layer disposed on the first protective layer
  • the first protective layer comprises a polymer film comprising a repeating unit represented by the following formula (1):
  • R1 to R10 are each independently hydrogen, a halogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, or an aralkyl group having 7 to 17 carbon atoms,
  • R9 and R10 may form a carbon ring or a hetero ring
  • R11 to R16, R18 to R19 and R21 to R22 are each independently hydrogen, a halogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, or an aralkyl group having 7 to 17 carbon atoms Is,
  • R17 and R20 are each independently an alkylene group having 1 to 9 carbon atoms
  • a is an integer from 0 to 20
  • b is an integer from 1 to 500).
  • the weight average molecular weight of the polymer is 20,000 to 150,000, the film touch sensor.
  • the glass transition temperature (Tg) of the polymer is 120 °C or more, the film touch sensor.
  • the elastic modulus of the first protective layer is 2.8 to 3.2GPa, the touch sensor film.
  • the film touch sensor In the above 1, wherein the transmittance of the first protective layer is 90% or more, the film touch sensor.
  • the thickness of the first protective layer is 0.1 to 50 ⁇ m, the touch sensor film.
  • the first protective layer is formed by a solution casting method using a composition for forming a first protective layer comprising a polymer comprising a repeating unit represented by the formula (1), film touch sensor .
  • the electrode pattern layer is indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium zinc oxide (IZTO), cadmium tin oxide (CTO), poly (3.4)
  • a film touch sensor comprising a conductive pattern formed of at least one selected from the group consisting of ethylenedioxythiophene (PEDOT), carbon nanotubes (CNT), metal wires and metal meshes.
  • the touch screen panel including the film touch sensor of any one of the above 1 to 11.
  • An image display device including the above touch screen panel.
  • the film touch sensor of the present invention includes a protective layer excellent in dimensional stability, flexibility, and durability, so that the occurrence of cracks is reduced when the film touch sensor is peeled off from the carrier substrate, thereby providing excellent durability.
  • the film touch sensor of the present invention can implement an excellent transmittance.
  • FIG. 1 schematically illustrates a cross section of a film touch sensor according to an embodiment of the invention.
  • FIG. 2 is a schematic cross-sectional view of a film touch sensor according to another embodiment of the present invention.
  • FIG. 3 schematically illustrates a method of manufacturing a film touch sensor according to an embodiment of the present invention.
  • FIG. 4 schematically illustrates a method of manufacturing a film touch sensor according to an embodiment of the present invention.
  • the present invention relates to a film touch sensor, and more particularly, a separation layer; A first protective layer on the separation layer; And an electrode pattern layer disposed on the first protective layer, wherein the first protective layer includes a polymer including a specific repeating unit, thereby significantly improving the dimensional stability, flexibility, and durability of the film touch sensor, thereby providing a carrier
  • the present invention relates to a film touch sensor that is excellent in transmittance and significantly reduces the occurrence of cracks when peeling from a substrate to produce a film touch sensor.
  • Flexible displays are used to be folded, bent, or rolled, so they must be light, thin, impact resistant and free to bend.
  • the flexible substrate used for the flexible display is subjected to excessive external bending stress, there is a problem that cracks occur in the bent portion.
  • cracks are mainly generated in the first protective layer portion.
  • the coefficient of thermal expansion of the polymer material is much larger than the coefficient of thermal expansion of the ceramic material and the metal material, which are inorganic particles. Therefore, when the inorganic film is coated on the polymer film, shrinkage of the polymer film occurs during the curing process or product defects such as bending or cracking of the substrate and peeling of the polymer film due to the significant difference in coefficient of thermal expansion between components when temperature changes. Occurs. As such, there is a problem in that workability and dimensional stability of the flexible display substrate are deteriorated due to the dimensional change of the polymer material.
  • the first protective layer 20 includes a polymer including a repeating unit represented by the following Chemical Formula 1, thereby improving the dimensional stability by forming a protective layer without a curing process, Significantly improve the flexibility to suppress the occurrence of cracks.
  • the first protective layer according to the present invention is excellent in dimensional stability by forming the first protective layer forming composition including a specific repeating unit on the separation layer only by the coating and drying process, showing excellent flexibility to the film touch sensor It is judged to have the effect of alleviating the stress applied to not only prevent cracking of the first protective layer but also to suppress cracking of the entire film touch sensor, but the present invention is not limited thereto.
  • FIG. 1 and 2 schematically illustrate cross-sectional views of film touch sensors 100 and 110 according to an embodiment of the present invention.
  • Film touch sensor 100 of the present invention is a separation layer (10); A first protective layer 20 disposed on the separation layer 10; And an electrode pattern layer 30 disposed on the first protective layer 20.
  • the separation layer 10 according to the present invention is a layer formed for separation from the carrier substrate 70.
  • the separation layer 10 may be a polymer organic membrane, for example, a polyimide polymer, a polyvinyl alcohol polymer, a polyamic acid polymer, a polyamide polymer , Polyethylene polymer, polystylene polymer, polynorbornene polymer, phenylmaleimide copolymer polymer, polyazobenzene polymer, polyphenylene phthalamide (polyphenylenephthalamide) polymer, polyester polymer, polymethyl methacrylate polymer, cinnamate polymer, coumarin polymer, phthalimidine polymer, It may be made of a polymer such as a chalcone (chalcone) polymer, an aromatic acetylene polymer, but is not limited thereto. These can be used individually or in mixture of 2 or more types.
  • a polymer organic membrane for example, a polyimide polymer, a polyvinyl alcohol polymer, a polyamic acid polymer, a polyamide polymer , Polyethylene polymer,
  • the thickness of the separation layer 10 according to the present invention is preferably 0.05 to 1 ⁇ m, but is not limited thereto.
  • the first protective layer 20 serves as a substrate on which the electrode pattern layer 30 is formed, and the first protective layer is formed only by applying and drying the first protective layer-forming composition on the separation layer. This exhibits excellent dimensional stability and flexibility to prevent cracking of the film touch sensor upon separation from the carrier substrate 70 and by the use of folding and bending.
  • the separation layer 10 is disposed on the separation layer 10 to serve as a passivation layer for the electrode pattern layer 30 and to prevent contamination of the electrode pattern layer 30, as well as to insulate the conductive patterns.
  • the first protective layer 20 preferably includes a polymer including a repeating unit represented by the following formula (1).
  • R1 to R10 are each independently hydrogen, a halogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, or an aralkyl group having 7 to 17 carbon atoms,
  • R9 and R10 may form a carbon ring or a hetero ring
  • R11 to R16, R18 to R19 and R21 to R22 are each independently hydrogen, a halogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, or an aralkyl group having 7 to 17 carbon atoms Is,
  • R17 and R20 are each independently an alkylene group having 1 to 9 carbon atoms
  • a is an integer from 0 to 20
  • b is an integer from 1 to 500).
  • the polymer including the repeating unit represented by Formula 1 according to the present invention may further include a repeating unit formed of other monomers known in the art, in addition to the repeating unit of Formula 1, and may be formed only of the repeating unit of Formula 1. have.
  • the hetero ring means a ring including at least one hetero atom, for example, N, O, S, or the like.
  • the weight average molecular weight of the polymer according to the present invention is not particularly limited, and may be, for example, 20,000 to 150,000, and may exhibit the best applicability and flexibility in the above range.
  • Glass transition temperature (Tg) of the polymer according to the present invention is not particularly limited, for example, it may be 120 °C or more, the thermal strain of the polymer in the above range can be improved in dimensional stability.
  • the elastic modulus of the first protective layer 20 according to the present invention is not particularly limited, and may be, for example, 2.8 to 3.2 GPa, and may exhibit excellent durability against deformation due to external force bending or bending in the above range. .
  • the transmittance of the first protective layer 20 according to the present invention is not particularly limited.
  • the transmittance of the first protective layer 20 may be 90% or more, and excellent transmittance may be realized in the above range.
  • the thickness of the first protective layer 20 according to the present invention is not particularly limited, and may be, for example, 0.1 to 50 ⁇ m, and preferably 0.5 to 10 ⁇ m.
  • the thickness of the first protective layer 20 is less than 0.1 ⁇ m, impact is accumulated during deposition of ITO, and the peeling force increases from the carrier substrate, thereby causing the film touch sensor to be torn during peeling. This may fall.
  • the first protective layer 20 may form a composition for forming a first protective layer including a polymer having a specific repeating unit on the separation layer 10 by a solution casting method.
  • the polymer may be included in 1 to 30% by weight of the total weight of the composition for forming the first protective layer, preferably from 3 to 10% by weight.
  • the content of the polymer is less than 1%, the effect of suppressing the occurrence of cracks during peeling may be insignificant, and when the content of the polymer is greater than 30%, the applicability may be deteriorated due to the increase in the viscosity.
  • composition for forming the first protective layer according to the present invention may further include a solvent for dissolving the components used, to dissolve the polymer in consideration of compatibility with the solid component and to obtain an excellent coating property and a transparent thin film Any suitable one used in the art can be adopted.
  • the solvent examples include alcohols such as methanol, ethanol, methyl ethyl carbitol and diethylene glycol; Ethers such as tetrahydrofuran; Glycol ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, and ethylene glycol dimethyl ether; Ethylene glycol acetates such as ethylene glycol diacetate: ethylene glycol alkyl ether acetates such as methyl cellosolve acetate and ethyl cellosolve acetate; Propylene glycol alkyl ether acetates such as propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate, propylene glycol propyl ether acetate, and propylene glycol butyl ether acetate; Propylene glycol dialkyl acetates such as propylene glycol methyl ethyl acetate; Propylene glycol alky
  • the content of the solvent according to the present invention is not particularly limited, and for example, may be included in 70 to 99% by weight of the total weight of the composition for forming the first protective layer, when the content of the solvent is in the range of 70 to 99% by weight, the coating Sex may be good.
  • composition for forming the first protective layer of the present invention may further include an additive.
  • additive include, but are not limited to, adhesion promoters and surfactants.
  • adhesion promoters examples include 4,4 ', 4 "-methylidritrisphenol, 4,4', 4" -ethylidine trisphenol, and 4- [bis (4-hydroxyphenyl) methyl] -2-methoxyphenol , 4- [bis (4-hydroxyphenyl) methyl] -2-ethoxyphenol, 4,4 '-[(2-hydroxyphenyl) methylene] bis [2-methylphenol], 4,4'-[ (4-hydroxyphenyl) methylene] bis [2-methylphenol], 4,4 '-[(3-hydroxyphenyl) methylene] bis [2,6-dimethylphenol], 3-glycidoxypropyl trimeth A oxy silane etc. can be used individually or in mixture of 2 or more types, respectively.
  • Adhesion promoters are preferably included in 0.2 to 3 parts by weight based on 100 parts by weight of the total composition.
  • a silicone type surfactant can be used, for example, (3-glycidoxy propyl) trimethoxysilane, (3-glycidoxy propyl) triethoxysilane , (3-glycidoxypropyl) methyldimethoxysilane, (3-glycidoxypropyl) dimethylethoxysilane, (3-glycidoxypropyl) dimethylethoxysilane, 3,4-epoxybutyltrimethoxysilane , 3,4-epoxybutyltriethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltriethoxysilane, aminopropyl Trimethoxysilane etc. can be used individually or in mixture of 2 or more types, respectively.
  • the silicone surfactant is preferably included in an amount of 0.2 to 3 parts by weight based on 100 parts by weight of the total composition.
  • the electrode pattern layer 30 according to the present invention is formed on the first protective layer 20.
  • the electrode pattern layer 30 When the electrode pattern layer 30 is applied to an electronic device, the electrode pattern layer 30 may include a conductive pattern for performing an electrode role, and the conductive pattern may be formed in an appropriate shape according to the requirements of the applied electronic device. For example, when applied to a touch screen panel, two types of electrode patterns may be formed, that is, an electrode pattern for detecting x coordinates and an electrode pattern for detecting y coordinates.
  • the electrode pattern layer 30 may be used without limitation as long as it is a conductive material.
  • the unit patterns of the electrode pattern layer 30 may be, for example, a polygonal pattern of three, four, five, six, or seven or more triangles independently of each other.
  • the electrode pattern layer 30 may include a regular pattern.
  • a regular pattern means that the pattern form has regularity.
  • the unit patterns may include, independently of each other, a mesh shape such as a rectangle or a square, or a pattern like a hexagon.
  • the electrode pattern layer 30 may include an irregular pattern. Irregular pattern means that the shape of the pattern does not have regularity.
  • the electrode pattern layer 30 When the electrode pattern layer 30 is formed of a material such as metal nanowires, carbon-based materials, polymer materials, or the like, the electrode pattern layer 30 may have a network structure.
  • the electrode pattern layer 30 may be formed by a method commonly performed in the art, and for example, may be performed by coating a conductive compound on the first protective layer 20 described above. have.
  • the film forming step may be formed by various thin film deposition techniques, such as physical vapor deposition (PVD), chemical vapor deposition (Chemical VaporDeposition, CVD). For example, it may be formed by reactive sputtering, which is one example of a physical vapor deposition method, but is not limited thereto.
  • a step of forming a photoresist layer on an upper surface of the conductive compound film may be performed.
  • the photosensitive resin composition for forming the photoresist layer is not particularly limited, and a photosensitive resin composition commonly used in the art may be used.
  • Ultraviolet rays are irradiated (exposure) through a mask for forming a target pattern on the photoresist layer thus obtained.
  • apparatuses such as a mask aligner and a stepper, so that the parallel light beam may be irradiated uniformly to the whole exposure part, and the exact alignment of a mask and a board
  • ultraviolet light is irradiated, the site to which ultraviolet light is irradiated is hardened.
  • G-rays (wavelength: 436 nm), h-rays, i-rays (wavelength: 365 nm) and the like can be used as the ultraviolet rays.
  • the irradiation amount of ultraviolet rays may be appropriately selected as necessary, and the present invention does not limit this.
  • the desired pattern can be obtained when the photoresist layer after hardening is contacted with a developing solution to melt and develop a non-exposed part.
  • the developing method may be any of a liquid addition method, a dipping method, a spray method and the like.
  • the substrate may be tilted at an arbitrary angle.
  • the developer is usually an aqueous solution containing an alkaline compound and a surfactant, and may be used without particular limitation as long as it is commonly used in the art.
  • an etching process may be performed to form a conductive pattern according to the photoresist pattern.
  • the etchant composition used in the etching process is not particularly limited, an etchant composition commonly used in the art may be used, and preferably a hydrogen peroxide-based etchant composition may be used.
  • the electrode pattern layer 30 including the conductive pattern of the desired pattern may be formed.
  • the thickness of the electrode pattern layer 30 which concerns on this invention is not specifically limited, It is good that it is 0.01-5 micrometers, Preferably it is 0.05-0.5 micrometer.
  • the film touch sensor of the present invention may further include a second protective layer 40 positioned on the first protective layer 20 on which the electrode pattern layer 30 is formed. 2 schematically shows a cross section in such a case.
  • the second protective layer 40 according to the present invention may itself serve as a substrate and a passivation layer.
  • the corrosion of the electrode pattern layer 30 may be prevented, and the surface may be planarized to prevent generation of micro bubbles during adhesion to the base film 60.
  • it may serve as an adhesive layer.
  • the base film 60 may be simultaneously protected from above and below to further improve the crack suppression effect.
  • silicone-based polymers such as polydimethylsiloxane (PDMS), polyorganosiloxane (POS); Polyimide-based polymers; It may be made of a polyurethane-based polymer, but is not limited thereto. These can be used individually or in mixture of 2 or more types.
  • thermosetting or photocurable pressure-sensitive adhesive or adhesive known in the art may be used without limitation.
  • thermosetting or photocurable adhesives or adhesives such as polyester type, polyether type, urethane type, epoxy type, silicone type, and acryl type, can be used.
  • the same composition as the first protective layer forming composition can be used as the second protective layer 40.
  • the thickness of the second protective layer 40 may be the same as the thickness of the first protective layer 20 described above.
  • the second passivation layer 40 may be formed on the first passivation layer 20 on which the electrode pattern layer 30 is formed in the same manner as the first passivation layer 20 according to the present invention.
  • the film touch sensor of the present invention may further include a base film 60 attached to the second protective layer 40.
  • the base film 60 is on the second protective layer 40, otherwise, as shown in FIG. 2, the adhesive layer 50 on the second protective layer 40. Can be attached via.
  • a transparent film made of a material widely used in the art may be used without limitation, and for example, a cellulose ester (eg, cellulose triacetate, cellulose propionate, cellulose butyrate, cellulose acetate Propionate, and nitrocellulose), polyimide, polycarbonate, polyester (e.g. polyethylene terephthalate, polyethylene naphthalate, poly-1,4-cyclohexanedimethylene terephthalate, polyethylene 1,2-diphenoxyethane -4,4'-dicarboxylate and polybutylene terephthalate, polystyrene (e.g. syndiotactic polystyrene), polyolefins (e.g.
  • the transparent film may be an isotropic film or a retardation film.
  • Rth, Rth [(nx + ny) / 2-nz] xd, nz is a refractive index in the film thickness direction
  • Retardation film is a film produced by the method of uniaxial stretching, biaxial stretching, polymer coating, liquid crystal coating of a polymer film, and is generally used for improving and adjusting optical properties such as viewing angle compensation, color reduction, light leakage improvement, and color control of a display. do.
  • a polarizing plate can also be used for the base film 60.
  • the polarizing plate may be a polarizer protective film is attached to one side or both sides of the polyvinyl alcohol polarizer.
  • a protective film can also be used as the base film 60.
  • the protective film may be a film including an adhesive layer on at least one surface of a film made of a polymer, or a film having a self-adhesive property such as polypropylene, and may be used for protecting the touch sensor surface and improving the process.
  • the light transmittance of the base film 60 is preferably 85% or more, more preferably 90% or more. Moreover, it is preferable that the total haze value measured according to JISK7136 is 10% or less, and, as for the said base film 70, it is more preferable that it is 7% or less.
  • the thickness of the said base film 60 is not restrict
  • the base film 60 according to the present invention may be attached using an aqueous adhesive, an adhesive, or a photocurable or thermosetting adhesive or adhesive known in the art.
  • the film touch sensor of the present invention as described above may be used as the film touch sensor after peeling from the carrier substrate 70.
  • the present invention provides a touch screen panel including the film touch sensor, and an image display device including the same.
  • the touch screen panel of the present invention can be applied to various image display devices such as electroluminescent display devices, plasma display devices, field emission display devices, as well as ordinary liquid crystal display devices.
  • the present invention can be particularly usefully applied to an image display device having flexible characteristics.
  • FIG. 3 and 4 is a schematic process diagram of a manufacturing method of a film touch sensor according to an embodiment of the present invention, with reference to the drawings will be described in detail the present invention.
  • a separation layer 10 is formed on a carrier substrate 70.
  • the carrier substrate 70 may be used without particular limitation as long as it provides a suitable strength so that it can be fixed without being easily bent or twisted during the process and has little effect on heat or chemical treatment.
  • glass, quartz, silicon wafers, sus etc. may be used, preferably glass may be used.
  • the separation layer 10 may be formed of the aforementioned polymer material.
  • the method of forming the separation layer 10 is not particularly limited, and the polymer composition may be slit coated, knife coated, spin coated, cast, micro gravure coated, gravure coated, bar coated, roll coated, Wire bar coating method, dip coating method, spray coating method, screen printing method, gravure printing method, flexographic printing method, offset printing method, inkjet coating method, dispenser printing method, nozzle coating method, capillary coating method, etc. It may be formed by coating by a known method.
  • the separation layer 10 may be further subjected to an additional curing process after the application.
  • the separation layer 10 is formed by the above-described method, it may be further subjected to an additional curing process.
  • the hardening method is not specifically limited, Photocuring or thermosetting, or both methods can be used.
  • the order in which both photocuring and thermosetting are performed is not specifically limited.
  • a first protective layer 20 is formed on the separation layer 10.
  • the first protective layer 20 may form the first protective layer-forming composition including the polymer having the above-described specific repeating unit on the separation layer 10 by a solution casting method.
  • the coating method in the solution casting method is not particularly limited, and may be the same as the coating method of the composition for forming the separation layer 10.
  • the drying method of the solution casting method is not particularly limited as long as it is a method of removing a solvent used in the art, and may be dried at 150 to 230 ° C. for 30 to 60 minutes, for example.
  • an electrode pattern layer 30 is formed on the first protective layer 20.
  • the electrode pattern layer 30 may be formed of the above-described metal oxides, metals, metal nanowires, carbon-based materials, conductive polymer materials, or the like.
  • the method of forming the electrode pattern layer 30 is not particularly limited, and physical vapor deposition, chemical vapor deposition, plasma deposition, plasma polymerization, thermal deposition, thermal oxidation, anodic oxidation, cluster ion beam deposition, screen printing, gravure printing, and pla It may be by a method known in the art, such as a flexographic printing method, an offset printing method, an inkjet coating method, a dispenser printing method.
  • the method of manufacturing the film touch sensor of the present invention further includes attaching the base film 60 on the first protective layer 20 on which the electrode pattern layer 30 is formed.
  • 3 (d) is a process diagram when the second protective layer 40 is first formed before the attachment of the base film 60, but is not limited thereto.
  • the second protective layer 40 may not be formed. .
  • the base film 60 may be attached to the adhesive layer 50 using an aqueous adhesive, an adhesive, or a photocurable or thermosetting adhesive or adhesive known in the art, as shown in FIG. 4E.
  • the base film 60 may be a film made of the aforementioned material, or a polarizing plate, a retardation film, or a protective film.
  • the second protective layer 40 is formed on the first protective layer 20 on which the electrode pattern layer 30 is formed before the base film 60 is attached. It may further comprise the step.
  • the crack prevention effect can be further improved.
  • the second protective layer 40 may be formed of the same composition as the above-described organic or inorganic insulating material and the composition for forming the first protective layer.
  • the formation method of the 2nd protective layer 40 is not specifically limited, either, For example, it can form by the same method as the 1st protective layer 20.
  • FIG. 1st protective layer 20 The formation method of the 2nd protective layer 40 is not specifically limited, either, For example, it can form by the same method as the 1st protective layer 20.
  • the film touch sensor may be manufactured by separating the separation layer 10 from the carrier substrate, and the separation timing is not particularly limited, for example, after the formation of the electrode pattern 30 and after the formation of the second protective layer 40. Alternatively, it may be separated after the attachment of the base film 60 as shown in FIG.
  • a protective layer-forming composition by mixing a protective layer-forming composition having the components and contents shown in Table 1, and then diluting with a solvent so that the solid content of the protective layer-forming composition is 5% by weight.
  • the mixture was forcibly stirred and added thereto, followed by polymerization for 3 hours at 20 ° C. Thereafter, acetic acid was added so that the reaction solution was slightly acidic, and the reaction was carried out to separate an aqueous phase and an organic phase. Water washing was repeated so that an organic phase was neutral, and A-3 which is an arylate resin was obtained using the reprecipitation method as a reprecipitation solvent in methanol after that.
  • the weight average molecular weight of A-3 resin obtained by GPC measurement was 17,000.
  • A-5 an arylate resin, was obtained by using 2,2-bis (3,5-dimethyl-4-hydroxyphenyl) propane (TMBPA) instead of BPA in the same manner as in Preparation Example 3.
  • TMBPA 2,2-bis (3,5-dimethyl-4-hydroxyphenyl) propane
  • the weight average molecular weight of A-5 resin obtained by GPC measurement was 47,000.
  • Polymerization of the polymer A-6 of Preparation Example 6 was carried out in the following manner.
  • the weight average molecular weight (Mw) of the polymer was measured under the following conditions using the GPC method.
  • HLC-8120GPC manufactured by Tosoh Corporation
  • a separation layer containing an aromatic liquid crystal was coated on a soda lime glass having a thickness of 700 ⁇ m to a thickness of 0.13 ⁇ m. Thereafter, the protective layer forming composition of Preparation Example 1 was applied on the separation layer, and dried at 230 ° C. for 30 minutes to form a first protective layer having a thickness of 2 ⁇ m.
  • an ITO layer was formed to a thickness of 0.05 ⁇ m on the first protective layer by vacuum deposition, and a photosensitive resist was applied on the ITO layer to form an electrode pattern layer.
  • the protective layer-forming composition of Preparation Example 1 was applied onto the first protective layer on which the electrode pattern layer was formed, and the second protective layer was formed in the same manner as the method for forming the first protective layer, and on the second protective layer.
  • An acrylic pressure-sensitive adhesive layer was formed thereon, and then a polycarbonate substrate having a thickness of 50 ⁇ m was attached to prepare a film touch sensor.
  • the glass substrate was peeled off from the separation layer and the upper laminate to prepare a film touch sensor.
  • the protective layer-forming compositions of Examples and Comparative Examples were applied onto a glass substrate and dried at 230 ° C. for 30 minutes to form a film to have a thickness of 2 ⁇ m.
  • the film was separated from the glass substrate and the elastic modulus was measured according to the method of KS M ISO 6721-4, and the results are shown in Table 2 below.
  • the protective layer-forming compositions of Examples and Comparative Examples were applied onto a glass substrate and dried at 230 ° C. for 30 minutes to form a film to have a thickness of 2 ⁇ m.
  • the film was separated from the glass substrate and the transmittance of light at a wavelength of 550 nm was measured using a spectrophotometer (manufactured by Hitachi Seisakusho, U3210), and the results are shown in Table 3 below.
  • the films of Examples and Comparative Examples in which the transmittance was evaluated were further heated at 230 ° C. for 20 minutes, and then the transmittance of light at a wavelength of 550 nm was measured using a spectrophotometer (manufactured by Hitachi Seisakusho, U3210). .
  • the transmittance after heating was compared with the transmittance before heating, and the change rate was evaluated according to the following criteria, and the results are shown in Table 2 below.
  • the protective layer-forming compositions of Examples and Comparative Examples were applied onto a glass substrate and dried at 230 ° C. for 30 minutes to form a film to have a thickness of 2 ⁇ m.
  • the film was separated from the glass substrate, immersed in propylene glycol monomethyl ether acetate, heated at 100 ° C. for 30 minutes, and then the film thickness was measured, and the durability was evaluated according to the following criteria. The results are shown in Table 3 below. .
  • the protective layer-forming compositions of Examples and Comparative Examples were applied onto a glass substrate and dried at 230 ° C. for 30 minutes to form a film to have a thickness of 2 ⁇ m.
  • an ITO layer was formed on the film by a vacuum deposition method to a thickness of 0.1 nm using a sputter, and then whether wrinkles were generated in the laminate was observed.
  • the durability of the ITO formation was evaluated according to the following criteria, and the results are shown in Table 2 below.
  • the film touch sensor of the Example and the comparative example was cut into 100 mm x 10 mm, and the film touch sensor was peeled off using 3M # 55 tape (25 mm / 10 cm in length).
  • the transmittance, thermal stability, and durability of the protective layer are inferior to those of the examples, and crack generation occurred on the entire surface when the film touch sensor was peeled off, and it was confirmed that the dimensional stability was not excellent.
  • separation layer 20 first protective layer
  • electrode pattern layer 40 second protective layer

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Theoretical Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Position Input By Displaying (AREA)
  • Laminated Bodies (AREA)

Abstract

La présente invention concerne un capteur tactile à film, et plus spécifiquement, un capteur tactile à film comprenant : une couche de séparation ; une première couche de protection positionnée sur la couche de séparation ; et une couche de motif d'électrode positionnée sur la première couche de protection, la première couche de protection comprenant un polymère qui comprend un motif de répétition spécifique, et par conséquent la stabilité dimensionnelle, la flexibilité et la durabilité du capteur tactile à film sont nettement améliorées, et lorsque le capteur tactile à film est fabriqué par décollement à partir d'un substrat de support, l'apparition de fissures est fortement réduite, et la transmissivité est excellente.
PCT/KR2016/002104 2015-03-11 2016-03-03 Capteur tactile à film WO2016144038A1 (fr)

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KR1020150034086A KR20160109526A (ko) 2015-03-11 2015-03-11 필름 터치 센서

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109891375A (zh) * 2016-11-01 2019-06-14 东丽株式会社 触摸面板、触摸面板的制造方法

Citations (5)

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Publication number Priority date Publication date Assignee Title
US20070224412A1 (en) * 2004-08-20 2007-09-27 Teijin Limited Transparent Conductive Laminated Body and Transparent Touch-Sensitive Panel
US20120146922A1 (en) * 2010-12-14 2012-06-14 Kang Sung-Ku Touch screen panel and fabrication method thereof
KR20140139281A (ko) * 2013-05-27 2014-12-05 동우 화인켐 주식회사 플렉서블 터치스크린 패널의 제조 방법
EP2835256A1 (fr) * 2012-04-02 2015-02-11 Nitto Denko Corporation Feuille transparente et son procédé de fabrication
WO2015023063A1 (fr) * 2013-08-12 2015-02-19 동우화인켐 주식회사 Procédé de fabrication d'un panneau d'écran tactile souple

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Publication number Priority date Publication date Assignee Title
KR20120133848A (ko) 2011-06-01 2012-12-11 삼성디스플레이 주식회사 플렉서블 터치 스크린 패널

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070224412A1 (en) * 2004-08-20 2007-09-27 Teijin Limited Transparent Conductive Laminated Body and Transparent Touch-Sensitive Panel
US20120146922A1 (en) * 2010-12-14 2012-06-14 Kang Sung-Ku Touch screen panel and fabrication method thereof
EP2835256A1 (fr) * 2012-04-02 2015-02-11 Nitto Denko Corporation Feuille transparente et son procédé de fabrication
KR20140139281A (ko) * 2013-05-27 2014-12-05 동우 화인켐 주식회사 플렉서블 터치스크린 패널의 제조 방법
WO2015023063A1 (fr) * 2013-08-12 2015-02-19 동우화인켐 주식회사 Procédé de fabrication d'un panneau d'écran tactile souple

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109891375A (zh) * 2016-11-01 2019-06-14 东丽株式会社 触摸面板、触摸面板的制造方法
CN109891375B (zh) * 2016-11-01 2022-04-12 东丽株式会社 触摸面板、触摸面板的制造方法

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