WO2016105276A8 - Corrosion and moisture resistant copper based bonding wire comprising nickel - Google Patents
Corrosion and moisture resistant copper based bonding wire comprising nickel Download PDFInfo
- Publication number
- WO2016105276A8 WO2016105276A8 PCT/SG2015/000142 SG2015000142W WO2016105276A8 WO 2016105276 A8 WO2016105276 A8 WO 2016105276A8 SG 2015000142 W SG2015000142 W SG 2015000142W WO 2016105276 A8 WO2016105276 A8 WO 2016105276A8
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- nickel
- range
- corrosion
- bonding wire
- moisture resistant
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
- B32B15/018—Layered products comprising a layer of metal all layers being exclusively metallic one layer being formed of a noble metal or a noble metal alloy
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/02—Making non-ferrous alloys by melting
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/02—Making non-ferrous alloys by melting
- C22C1/03—Making non-ferrous alloys by melting using master alloys
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
- C22C9/06—Alloys based on copper with nickel or cobalt as the next major constituent
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
- C22F1/08—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
- C23C18/1651—Two or more layers only obtained by electroless plating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
- C23C18/1653—Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
- C23C28/023—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material only coatings of metal elements only
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0607—Wires
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Abstract
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017532118A JP2018503743A (en) | 2014-12-22 | 2015-11-26 | Corrosion- and moisture-resistant copper-based bonding wires containing nickel |
EP15818103.2A EP3237645A1 (en) | 2014-12-22 | 2015-11-26 | Corrosion and moisture resistant copper based bonding wire comprising nickel |
CN201580062949.7A CN107109532A (en) | 2014-12-22 | 2015-11-26 | Corrosion-resistant and moisture-proof the nickeliferous closing line based on copper |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SG10201408586XA SG10201408586XA (en) | 2014-12-22 | 2014-12-22 | Corrosion and moisture resistant bonding wire |
SG10201408586X | 2014-12-22 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2016105276A1 WO2016105276A1 (en) | 2016-06-30 |
WO2016105276A8 true WO2016105276A8 (en) | 2017-06-29 |
Family
ID=55066730
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/SG2015/000142 WO2016105276A1 (en) | 2014-12-22 | 2015-11-26 | Corrosion and moisture resistant copper based bonding wire comprising nickel |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP3237645A1 (en) |
JP (1) | JP2018503743A (en) |
CN (1) | CN107109532A (en) |
SG (1) | SG10201408586XA (en) |
TW (1) | TWI587317B (en) |
WO (1) | WO2016105276A1 (en) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SG10201509913XA (en) * | 2015-12-02 | 2017-07-28 | Heraeus Materials Singapore Pte Ltd | Silver alloyed copper wire |
EP4071256A4 (en) | 2019-12-02 | 2023-11-29 | Nippon Micrometal Corporation | Semiconductor device copper bonding wire and semiconductor device |
KR20220143664A (en) | 2020-02-21 | 2022-10-25 | 닛데쓰마이크로메탈가부시키가이샤 | copper bonding wire |
KR20240026929A (en) | 2021-06-25 | 2024-02-29 | 닛데쓰마이크로메탈가부시키가이샤 | Bonding wire for semiconductor devices |
JPWO2022270049A1 (en) | 2021-06-25 | 2022-12-29 | ||
WO2022270050A1 (en) | 2021-06-25 | 2022-12-29 | 日鉄マイクロメタル株式会社 | Bonding wire for semiconductor devices |
US11721660B2 (en) | 2021-06-25 | 2023-08-08 | Nippon Micrometal Corporation | Bonding wire for semiconductor devices |
JP7157280B1 (en) | 2021-06-25 | 2022-10-19 | 日鉄マイクロメタル株式会社 | Bonding wire for semiconductor equipment |
CN117546279A (en) | 2021-06-25 | 2024-02-09 | 日铁新材料股份有限公司 | Bonding wire for semiconductor device |
WO2023248491A1 (en) | 2022-06-24 | 2023-12-28 | 日鉄ケミカル&マテリアル株式会社 | Bonding wire for semiconductor device |
CN117836918A (en) | 2022-06-24 | 2024-04-05 | 日铁化学材料株式会社 | Bonding wire for semiconductor device |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6199645A (en) * | 1984-10-20 | 1986-05-17 | Tanaka Denshi Kogyo Kk | Copper alloy for bonding of semiconductor device |
US5106701A (en) * | 1990-02-01 | 1992-04-21 | Fujikura Ltd. | Copper alloy wire, and insulated electric wires and multiple core parallel bonded wires made of the same |
JP2004193552A (en) * | 2002-10-17 | 2004-07-08 | Mitsubishi Materials Corp | Copper alloy sputtering target for forming semiconductor device interconnect line seed layer |
JP2006307277A (en) * | 2005-04-27 | 2006-11-09 | Fujikura Ltd | Method for manufacturing plated extra-fine wire |
JP5306591B2 (en) * | 2005-12-07 | 2013-10-02 | 古河電気工業株式会社 | Wire conductor for wiring, wire for wiring, and manufacturing method thereof |
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JP6462665B2 (en) * | 2013-05-03 | 2019-01-30 | ヘレウス マテリアルズ シンガポール ピーティーイー. リミテッド | Copper bonding wire and manufacturing method thereof |
CN103325435B (en) * | 2013-05-31 | 2016-05-04 | 重庆材料研究院有限公司 | For alloy material and the preparation method of compensation lead of thermocouple |
-
2014
- 2014-12-22 SG SG10201408586XA patent/SG10201408586XA/en unknown
-
2015
- 2015-11-26 EP EP15818103.2A patent/EP3237645A1/en not_active Withdrawn
- 2015-11-26 CN CN201580062949.7A patent/CN107109532A/en active Pending
- 2015-11-26 WO PCT/SG2015/000142 patent/WO2016105276A1/en active Application Filing
- 2015-11-26 JP JP2017532118A patent/JP2018503743A/en active Pending
- 2015-12-17 TW TW104142565A patent/TWI587317B/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
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SG10201408586XA (en) | 2016-07-28 |
TWI587317B (en) | 2017-06-11 |
CN107109532A (en) | 2017-08-29 |
WO2016105276A1 (en) | 2016-06-30 |
TW201631602A (en) | 2016-09-01 |
EP3237645A1 (en) | 2017-11-01 |
JP2018503743A (en) | 2018-02-08 |
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