WO2016052239A1 - Système de dépôt de film - Google Patents

Système de dépôt de film Download PDF

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Publication number
WO2016052239A1
WO2016052239A1 PCT/JP2015/076557 JP2015076557W WO2016052239A1 WO 2016052239 A1 WO2016052239 A1 WO 2016052239A1 JP 2015076557 W JP2015076557 W JP 2015076557W WO 2016052239 A1 WO2016052239 A1 WO 2016052239A1
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WO
WIPO (PCT)
Prior art keywords
revolving
jig
jigs
self
film forming
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Application number
PCT/JP2015/076557
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English (en)
Japanese (ja)
Inventor
浩治 永谷
優治 本田
Original Assignee
株式会社アルバック
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Publication of WO2016052239A1 publication Critical patent/WO2016052239A1/fr

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/285—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping

Definitions

  • the present invention relates to the technical field of a film forming apparatus for forming a thin film in a vacuum atmosphere, and more particularly to the technical field of a film forming apparatus using a self-revolving jig.
  • a single-wafer type film forming apparatus that forms a film on a substrate one by one and a batch type film forming apparatus that forms a plurality of substrates at a time.
  • a film forming apparatus there is known a film forming apparatus that mounts a plurality of substrates on a self-revolving jig and forms a thin film while rotating the self-revolving jig.
  • Reference numeral 102 in FIG. 10 is a vacuum film forming apparatus according to the prior art. Inside the vacuum chamber 111, a circular rail 116 fixed to the vacuum chamber 111 and a plurality of (here, three) self-revolving jigs 121. 1 to 121 3 and a film forming source 115 are arranged.
  • the self-revolving jigs 121 1 to 121 3 have a flat disk shape or a dome shape curved like a part of a sphere, and as shown in FIG. 11, formed on one side (a concave surface if curved).
  • a plurality of substrates 126 as film targets are attached.
  • a rotating shaft is disposed on the opposite surface (convex surface when curved) of each of the revolving jigs 121 1 to 121 3 , and one end of the rotating shaft 127 is fixed to the center of the surface.
  • a traveling wheel 122 is provided at the other end.
  • the traveling wheel 122 is disposed on the circular rail 116, and a force in a direction along the curve of the circular rail 116 is applied to the rotating shaft 127 around the center point of the circular rail 116 by a moving device (not shown). Then, the traveling wheel 122 rolls on the circular rail 116 and travels while rotating.
  • the self-revolving jigs 121 1 to 121 3 turn around the center point of travel of the traveling wheel 122.
  • the film forming source 115 is disposed below the revolving jigs 121 1 to 121 3 and includes a container 115a and a film forming material 115b disposed inside the container 115a.
  • a vacuum exhaust device 117 is connected to the vacuum chamber 111. After the vacuum exhaust device 117 is evacuated to a vacuum atmosphere, the film forming material 115b is heated by a heating device (not shown). When the vapor of the film forming material 115b is generated, the vapor is released from the film forming source 115 into the vacuum chamber 111.
  • a plurality of substrates 126 are arranged toward the film forming source 115 in each of the self-revolving jigs 121 1 to 121 3 .
  • the rotation / revolution jigs 121 1 to 121 3 are arranged at a predetermined distance from each other, and the substrate 126 is formed on the surface of the substrate 126 while rotating and turning together with the rotation / revolution jigs 121 1 to 121 3.
  • the vapor released from the film source 115 reaches and a uniform thin film grows.
  • the self-revolving jigs 121 1 to 121 3 are flat disks or curved disks. Even if the outer peripheries of adjacent self-revolving jigs 121 1 to 121 3 are brought into contact with each other as shown in FIG. A gap is formed between the outer periphery of the revolving jigs 121 1 to 121 3 and the outer periphery of the adjacent self-revolving jigs 121 1 to 121 3 .
  • the film forming apparatus using the self-revolving jig is described in, for example, Japanese Patent Application Laid-Open No. 57-70274 and Japanese Patent Application Laid-Open No. 2002-164303.
  • Japanese Patent Application Laid-Open No. 2012-224878 describes a technique for improving a device using a self-revolving jig, for example, Japanese Patent No. 2762948. There is no film forming device.
  • the present invention was created in order to solve the disadvantages of the prior art described above, and an object of the present invention is to provide a film forming apparatus that can reduce gap portions and effectively use film forming materials.
  • the present invention provides a vacuum chamber, a circular rail disposed in the vacuum chamber, a film forming source for discharging film forming material particles into the vacuum chamber, and a plurality of substrates.
  • a plurality of auto-revolving jigs arranged, a plurality of traveling wheels arranged on the circular rail, a jig attaching device holding the plurality of auto-revolving jigs, and the jig attaching device,
  • a motor that rotates about a main axis of rotation, and a plurality of the revolving jigs are arranged inside the circular rail, one by one along the circular rail,
  • the self-revolving jig is connected to each of the different traveling wheels, and when the jig attaching device is rotated by the motor, the self-revolving jig is rotated by the jig attaching device to rotate the main rotation axis.
  • the traveling wheel travels on the circular rail while rotating about a wheel rotation axis, and the rotation / revolution jig rotates the rotation / revolution jig about the jig rotation axis to rotate the rotation / revolution.
  • the substrate placed in a jig is a film forming apparatus in which the film forming material particles adhere to the surface and a thin film is formed while rotating and swiveling together with the self-revolving jig,
  • Each of the self-revolving jigs is disposed so as to overlap the other adjacent self-revolving jigs on the head side and the tail side in the direction of the turning movement, and each of the self-revolving jigs is Either one of the overlapping part on the leading side and the overlapping part on the trailing side is located closer to the main rotation axis than the other overlapping self-revolving jigs, and the other side is the other overlapping part.
  • the main rotation axis rather than the self-revolving jig A film forming apparatus adapted to be located in the far al. Further, the present invention is a film forming apparatus in which the wheel rotation axis and the jig rotation axis are made non-parallel.
  • a wheel shaft that rotates about the wheel rotation axis is fixed to the traveling wheel by rotation of the traveling wheel, and the self-revolving jig rotates about the jig rotation axis.
  • a jig shaft is fixed, and an active gear provided on the wheel shaft and a passive gear provided on the jig shaft mesh with each other, and rotation of the active gear is transmitted to the passive gear.
  • the present invention is a film forming apparatus in which five or more of the self-revolving jigs are provided.
  • the use efficiency of the film forming material is improved. Even without increasing the size of the apparatus, the number of substrates on which a thin film can be formed in one film formation process can be increased.
  • the film-forming material particles can reach the bottom surfaces of deep holes and grooves formed on the substrate surface.
  • Example film forming apparatus of the present invention Perspective view of jig mounting device (a), (b): Illustrations for explaining the inside of the housing (a): In the case of a disk rotation jig, (b): In the case of a dome-shaped rotation jig The figure for demonstrating the position of the board
  • tool A diagram for explaining the arrangement of six self-revolving jigs (a), (b): Diagrams for explaining a state in which a 4-inch substrate is arranged on a self-revolving jig (a): plan view, (b): perspective view (a), (b): diagrams for explaining a state in which a 5-inch substrate is placed on a self-revolving jig (a): plan view, (b): perspective view (a), (b): Diagrams for explaining a state in which a 6-inch substrate is arranged on a self-revolving jig (a)
  • FIG. 1 shows a film forming apparatus 2 of the present invention.
  • the film forming apparatus 2 includes a vacuum chamber 11, and a circular rail 16 is disposed inside the vacuum chamber 11 and is fixed to the vacuum chamber 11.
  • a plurality (five in FIG. 1) of five or more revolving jigs 21 1 to 21 5 and a jig mounting device for holding each of the revolving jigs 21 1 to 21 5. 20 are arranged.
  • the jig mounting device 20 includes a main rotating shaft 34 that is airtightly inserted into the ceiling of the vacuum chamber 11, a top plate 30 that is disposed inside the vacuum chamber 11 and is attached to the lower end of the main rotating shaft 34, and an upper portion thereof. It has an arm 31 provided on the top plate 30 and a casing 32 provided on the lower part of the arm 31.
  • the same number of arms 31 as the self-revolving jigs 21 1 to 21 5 are fixed to the top plate 30.
  • the top plate 30 has a bridge plate 33 extending from the disc-shaped portion to the center of the disc, and the lower end of the main rotating shaft 34 is fixed to the bridge plate 33 at the center position of the disc.
  • the jig mounting device 20 is suspended inside the vacuum chamber 11 by the main rotating shaft 34.
  • the self-revolving jigs 21 1 to 21 5 are located below the top plate 30 and have a disk shape as shown in the cross-sectional view of FIG. As shown in the sectional view, it is a part of a sphere and has a dome shape with a curved central portion.
  • the own revolving jig 21 1-21 5, the center position of the revolving tool 21 1 through 21 5, is provided at one end of the rod-shaped jig shaft 38.
  • the jig rotation axis 29 that is the center axis of the jig shaft 38 passes through the center positions of the self-revolving jigs 21 1 to 21 5 , and the jig shaft 38 rotates around the jig rotation axis 29.
  • the self-revolving jigs 21 1 to 21 5 also rotate around the jig rotation axis 29.
  • the jig shaft 38 is such that the jig rotation axis 29 is perpendicular to the portion of the self-revolving jigs 21 1 to 21 5 where the jig shaft 38 is provided. Any position on the jigs 21 1 to 21 5 rotates in a plane perpendicular to the jig rotation axis 29.
  • the other end of the jig shaft 38 is inserted into the housing 32, and the weight of each of the revolving jigs 21 1 to 21 5 is determined by the jig mounting device via the jig shaft 38 and the housing 32. 20 is supported.
  • a traveling wheel 22 having one end attached to a wheel shaft 27 is disposed on the circular rail 16.
  • the other end of the wheel shaft 27 is inserted into the housing 32, and the traveling wheel 22 is pressed onto the circular rail 16 by the jig mounting device 20 via the wheel shaft 27 and the housing 32.
  • the jig shaft 38 and the wheel shaft 27 are rotatable with respect to the casing 32, and the wheel shaft 27 can rotate when the traveling wheel 22 travels while rolling on the circular rail 16.
  • a motor 13 is disposed outside the vacuum chamber 11.
  • the motor 13 is attached to the upper part of the main rotation shaft 34 and rotates the main rotation shaft 34 around the main rotation axis 12 that is the center axis of the main rotation shaft 34.
  • the circular rail 16 is laid in a circular shape, and the main rotation axis 12 passes through the center point of the circular rail 16 perpendicularly to the plane on which the circular rail 16 is located.
  • the wheel shaft 27 and the traveling wheel 22 rotate around a wheel rotation axis 28 that is the same and common central axis, and the wheel rotation axis 28 crosses the main rotation axis 12. Yes.
  • each of the self-revolving jigs 21 1 to 21 5 pivots around the main rotation axis 12.
  • each traveling wheel 22 turns around the main rotation axis 12 along the circular rail 16 while rotating around the wheel rotation axis 28.
  • the traveling wheel 22 is arranged perpendicular to the circular rail 16 as long as the traveling wheel 22 can turn around the main rotation axis 12 and rotate around the wheel rotation axis 28 of the wheel shaft 27. It may be arranged in an inclined manner.
  • An active gear 36 is provided at a portion of the wheel shaft 27 located inside the housing 32, and a passive gear 37 is provided at a portion of the jig shaft 38 located inside the housing 32.
  • the active gear 36 rotates around the wheel rotation axis 28 of the traveling wheel 22 and the wheel shaft 27, and the passive gear 37 rotates around the jig rotation axis 29 of the jig shaft 38. Has been.
  • the active gear 36 and the passive gear 37 are meshed, and when one rotates, the rotational force is transmitted to the other, and the other rotates.
  • the jig mounting device 20 causes the plurality of self-revolving jigs 21 1 to 21 5 to rotate in the same direction, either clockwise (clockwise) or counterclockwise (counterclockwise), with the main rotation axis 12 as the center.
  • the traveling wheel 22 pivots around the main rotation axis 12 together with the self-revolving jigs 21 1 to 21 5
  • the traveling wheel 22 rotates around the wheel rotation axis 28
  • the wheel shaft 27 and the active gear 36 are rotated by the rotational force.
  • the active gear 36, the passive gear 37, the jig shaft 38, and the self-revolving jigs 21 1 to 21 5 are moved to the jig rotation axis 29. Is rotated around.
  • a film forming source 15 is disposed in the vacuum chamber 11 at a position below the self-revolving jigs 21 1 to 21 5 .
  • Each of the self-revolving jigs 21 1 to 21 5 has one side directed obliquely downward and faces the film forming source 15, and the opposite side is directed obliquely upward.
  • the jig shaft 38 is attached to a surface facing obliquely upward, and a plurality of substrate holding portions 25 are provided on the surface facing obliquely downward as shown in FIG.
  • the substrate holding unit 25 is provided on the curved and concave side, and is inclined so as to face the film forming source 15. .
  • FIG. 4 shows the surfaces of the self-revolving jigs 21 1 to 21 5 that face the film forming source 15, and reference numeral 25 denotes a substrate holding unit that holds the substrate 26.
  • Substrate 26 held by the substrate holder 25 does not fall off the revolving jig 21 1-21 5, so as to rotate and swivel together with the revolving jig 21 1-21 5.
  • the center positions where the jig shafts 38 of the respective revolving jigs 21 1 to 21 5 are attached are located on the same circumference, and the self-revolving jigs 21 1 to 21 5 and the jig shaft 38 are
  • the jig rotation axis 29 is directed in a direction not intersecting with the main rotation axis 12, and as a result, the respective self-revolving jigs 21 1 to 21 5 pivot together around the main rotation axis 12.
  • the distance between the leading side of each of the self-revolving jigs 21 1 to 21 5 and the main rotation axis 12 is different from the distance between the rear side and the main rotation axis 12.
  • the self-revolving jigs 21 1 to 21 5 when the self-revolving jigs 21 1 to 21 5 are arranged in a circle, the leading and trailing parts of the self-revolving jigs 21 1 to 21 5 are adjacent to each other.
  • the revolving jigs 21 1 to 21 5 can be arranged so as to overlap the rear side part and the front side part, and according to this arrangement, the respective revolving jigs 21 1 to 21 5 do not collide with each other.
  • the distance between the center positions of the adjacent self-revolving jigs 21 1 to 21 5 is made shorter than the diameter of the self-revolving jigs 21 1 to 21 5 .
  • each of the self-revolving jigs 21 1 to 21 5 is arranged such that one of the leading side and the trailing side is closer to the main rotation axis 12 than the other side.
  • All the self-revolving jigs 21 1 to 21 5 arranged along the circular rail 16 are configured such that the same side of the leading and trailing sides is close to the main rotation axis 12.
  • the leading side of each of the self-revolving jigs 21 1 to 21 5 is When it is farther from the main rotation axis 12 than the rear side and rotates counterclockwise, the leading side is closer to the main rotation axis 12 than the rear side.
  • the film forming source 15 is disposed at a position intersecting with the main rotation axis 12, and therefore, in the overlapping portion of each of the self-revolving jigs 21 1 to 21 5 , one of the leading side and the trailing side is The adjacent revolving jigs 21 1 to 21 5 are closer to the film forming source 15 and the other side is arranged farther from the film forming source 15 than the adjacent self revolving jigs 21 1 to 21 5.
  • the film forming source 15 is behind the overlapping portion of the adjacent auto-revolution jigs 21 1 to 21 5 .
  • the film-forming material particles emitted from the film-forming source 15 reach a portion other than the shaded portion and do not reach the shaded portion.
  • one of the self-revolving jigs 21 1 to 21 5 is configured such that one of the head portion and the tail portion is shaded and the other portion is not shaded. .
  • the individual revolving jig 21 1-21 5, the center position of the surface of the substrate 26 is disposed is stacked so as not to shade, therefore, the revolving jig 21 1-21 5 Since the self-revolving jigs 21 1 to 21 5 pass through a non-shading part at one position on the surface on which the substrate 26 is arranged while rotating around the jig rotation axis 29, the self-revolving jig
  • the film-forming material particles emitted from the film-forming source 5 can reach any position on the surface of the substrate 26 arranged at 21 1 to 21 5 .
  • the wheel rotation axis 28 intersects with the main rotation axis 12 and the jig rotation axis 29 does not intersect with the main rotation axis 12, the wheel rotation axis 28 and the jig rotation axis 29 are parallel (including coincidence). Don't be.
  • the revolving jigs 21 1 to 21 5 are configured to be detachable from the jig shaft 38.
  • the vacuum chamber 11 Open the door, remove the revolving jigs 21 1 to 21 5 from the jig mounting device 20, take them out of the vacuum chamber 11, attach the substrate 26 to the substrate holder 25, and then attach it to the jig mounting device 20. Close the door.
  • An evacuation device 17 is connected to the vacuum chamber 11, the evacuation device 17 is operated, the inside of the vacuum chamber 11 is evacuated to a vacuum atmosphere, the motor 13 is operated, and each revolving jig 21 1 is operated. ⁇ 21 5 is rotated around the main rotation axis 12 (this is called revolution), and is rotated around the jig rotation axis 29 (this is called rotation).
  • the film forming source 15 includes a container 15a and a film forming material 15b disposed in the container 15a.
  • the film forming material 15b is heated by heating the container 15a and the film forming material 15b with a heating device (not shown).
  • a heating device not shown.
  • the temperature is raised, evaporation of the film forming material 15b is started, and film forming material particles that are vapor of the film forming material 15b are released from the film forming source 15 into the vacuum chamber 11.
  • the film forming material 15b may be directly heated without heating the heating container 15a.
  • the respective revolving jigs 21 1 to 21 5 are arranged in the vacuum chamber 11 so that the top side and the rear side overlap each other, and each self-revolution jig is arranged. It is formed between the outer circumferences of two adjacent auto-revolution jigs 21 1 to 21 5 rather than the gap between the auto-revolution jigs of the film forming apparatus arranged apart from each other without overlapping the outer circumferences of the tools. The gap becomes smaller.
  • the inclination toward the lower side of each of the revolving jigs 21 1 to 21 5 is larger than the case of the film forming apparatus that is not overlapped without increasing the diameter of the circular rail 16.
  • the gap formed by the vicinity of the apex positions on the outer circumferences of the respective revolving jigs 21 1 to 21 5 is also smaller than that of the film forming apparatus that is not overlapped.
  • the gap When the gap is smaller than when the gap is large, the amount of film forming material particles passing through the gap is reduced, so that the use efficiency of the film forming material 15b disposed in the container 15a is improved.
  • the inside of the vacuum chamber 11 is brought to atmospheric pressure, the door is opened, and the revolving jigs 21 1 to 21 5 are taken out from the inside of the vacuum chamber 11. Then, the film-formed substrate 26 is replaced with the non-film-formed substrate 26 and is mounted in the vacuum chamber 11 to perform the film forming process.
  • Tables 1 and 2 below show the values when a thin film is formed by attaching a 4, 5, 6, or 8 inch disk-shaped substrate to a self-revolving jig provided in the film forming apparatus.
  • the number of substrates that can be deposited was determined.
  • Table 1 shows numerical values of a conventional film forming apparatus in which three rotation / revolution jigs are arranged so as not to overlap each other.
  • Table 2 shows numerical values of the film forming apparatus of the present invention in which five self-revolving jigs are arranged in an overlapping manner.
  • the size of the vacuum tank of this apparatus is the same as the vacuum tank of the film forming apparatus of Table 1. It is.
  • the numerical value of the item “number of processed sheets / hour” indicates the number of substrates that the film forming apparatus can process in one hour.
  • Total number of substrates is the total number of substrates when all the revolving jigs placed in the vacuum chamber are fully loaded, and the item “Total time” is described in the item “Total number of substrates”. This is the time required for processing a certain number of substrates.
  • total number ratio of substrates includes the numerical value described in the “total number of substrates” of the film forming apparatus of Table 2 and the “substrates of the film forming apparatus of Table 1 for the same size substrates. It can be seen that the number of film formation apparatuses in Table 2 is 11% or more greater than that in Table 1.
  • the item of “overlapping loss” in Table 2 is the ratio of the area of the auto-revolving jig to the total area of the shaded part, and is related to the numerical value of the item of “film formation time”.
  • a value obtained by multiplying the “film formation time” in Table 1 by the value obtained by adding “1” to the numerical value in the “overlap loss” item for the substrate of the size is described in the “film formation time” item in Table 2. Has been.
  • “Productivity ratio” in Table 2 is the ratio of the number of substrates that can be processed in the time of the film forming apparatus in Table 2 to the number of substrates that can be processed in one hour in the film forming apparatus in Table 1. 1 is the value of the “number of processed sheets / time” item, and the value of the “number of processed sheets / time” of the same size substrate in Table 2.
  • the value obtained by subtracting “1” from the “total number of substrates ratio” and the “productivity ratio” is the ratio of the number of mounted substrates that the film forming apparatus of the present invention in Table 2 increases compared to the film forming apparatus in Table 1 It can be seen from Table 2 that the productivity ratio increases as the substrate diameter increases.
  • Table 3 shows that the number of rotation / revolution jigs is 3 and the number of rotation / revolution jigs is 6 in a vacuum chamber of the same size as the conventional film forming apparatus having 10 substrates per sheet. This is a comparison with the film-forming apparatus of the present invention in which eight substrates are mounted per sheet, and the productivity is increased 1.5 times.
  • FIG. 6 is a diagram showing the relationship between the substrate 26 and the self-revolving jig 21, and FIGS. 6A to 9A are plan views of the surface opposite to the surface facing the film forming source 15. 6 (b) to 9 (b) are perspective views. Here, a curved and revolving jig 21 is used.
  • the present invention includes a film forming apparatus provided with one or more sheets. However, in order to improve the use efficiency of the film forming material 15b, 5 or more are desirable.
  • the film formation source 15 is a film formation source of a vacuum evaporation apparatus that generates film formation material particles composed of vapor of the film formation material 15b.
  • the present invention uses a sputtering source as a film formation source.
  • the sputtering target disposed on the electrode may be used as a film forming material, a voltage may be applied to the electrode to sputter the sputtering target in a vacuum atmosphere, and the sputtered particles released from the sputtering target may be used as the film forming material particle. .
  • the active gear and the passive gear are used. If it is rotated to the center, it is included in the present invention.

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Abstract

La présente invention concerne un système de dépôt de film qui a une productivité élevée. Une pluralité de gabarits de rotation et de révolution (211) à (215) sont fortement inclinés, et un côté avant et un côté arrière de chaque paire d'éléments adjacents de (211) à (215) se chevauchent. Lorsque les gabarits de rotation et de révolution (211) à (215) sont mis en rotation autour d'un axe de rotation principal (12) tandis que chacun des gabarits de rotation et de révolution (211) à (215) est mis en rotation autour d'un axe de rotation (29), des particules de matériau de dépôt de film éjectées d'une source de dépôt de film (15) atteignent des substrats (26) maintenus par les gabarits de rotation et de révolution (211) à (215) pour former des films minces. Étant donné que les espaces entre les gabarits de rotation et de révolution (211) à (215) sont petits, l'efficacité d'utilisation du matériau de dépôt de film (15b) est améliorée.
PCT/JP2015/076557 2014-09-29 2015-09-17 Système de dépôt de film WO2016052239A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201410511291.0 2014-09-29
CN201410511291.0A CN105525270A (zh) 2014-09-29 2014-09-29 成膜装置

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WO2016052239A1 true WO2016052239A1 (fr) 2016-04-07

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CN110643949B (zh) * 2019-10-29 2022-08-05 苏州华楷微电子有限公司 一种公转式半导体蒸发台的蒸发方法
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