WO2016045141A1 - 液晶显示面板及其制造方法 - Google Patents

液晶显示面板及其制造方法 Download PDF

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Publication number
WO2016045141A1
WO2016045141A1 PCT/CN2014/087932 CN2014087932W WO2016045141A1 WO 2016045141 A1 WO2016045141 A1 WO 2016045141A1 CN 2014087932 W CN2014087932 W CN 2014087932W WO 2016045141 A1 WO2016045141 A1 WO 2016045141A1
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Prior art keywords
liquid crystal
crystal display
light
display panel
manufacturing
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PCT/CN2014/087932
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English (en)
French (fr)
Inventor
郑华
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TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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Priority to US14/404,685 priority Critical patent/US9482893B2/en
Publication of WO2016045141A1 publication Critical patent/WO2016045141A1/zh
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133351—Manufacturing of individual cells out of a plurality of cells, e.g. by dicing
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces

Definitions

  • the present invention relates to the field of liquid crystal display technology, and in particular, to a liquid crystal display panel and a method of fabricating the same.
  • TFT-LCD Thin Film Transistor-Liquid Crystal Display
  • the principle of the "whitening on both sides” phenomenon is as follows: as shown in FIG. 1, the driving voltage of the scanning Gate line 11 is input by the scanning drive electrodes (Gate COF) 12 located on the left and right sides of the liquid crystal display panel 10, due to scanning.
  • the resistance and capacitance of the line 11 are delayed by RC Delay, so that the scan driving voltage of the normal input on both sides is distorted when transmitted to the intermediate area A, that is, the Gate waveform is distorted, and the distorted scan driving voltage reduces the charging rate of the intermediate area A, thereby lowering the middle.
  • the display brightness of the area A at which time the display brightness of the two side areas B1, B2 becomes higher, that is, the phenomenon of "whitening on both sides” occurs.
  • the phenomenon of "whitening on both sides" during viewing is particularly obvious.
  • the technical problem to be solved by the embodiments of the present invention is to provide a liquid crystal display panel and a manufacturing method thereof, which can make the display brightness of the liquid crystal display panel uniform, and slow or eliminate the phenomenon of “whitening on both sides”.
  • a technical solution adopted by the present invention is to provide a method for manufacturing a liquid crystal display panel, comprising: coating a photoresist layer on a substrate; using a first photomask and a second photomask to resist The layer is exposed to form a black matrix having different widths on the substrate, wherein the width of the black matrix is gradually increased along the middle region of the liquid crystal display panel toward the two side regions, and the first exposure energy is exposed during exposure, the first exposure The energy is less than the second exposure energy, and the second exposure energy is an exposure energy when a black matrix having an equal width formed by exposing the photoresist layer by the first mask; removing the unexposed photoresist layer; wherein, a reticle with a liquid crystal display panel a plurality of first light-transmissive regions corresponding to a boundary region between adjacent two pixel electrodes, the second mask having a plurality of second light-transmitting regions corresponding to the first light-transmitting regions, and facing along the intermediate region
  • the plurality of first light transmitting regions have the same width, and the plurality of second light transmitting regions have the same width.
  • the first photomask is disposed between the second photomask and the photoresist layer, and the area of the second photomask is greater than or equal to the area of the liquid crystal display panel.
  • the material of the photoresist layer is made of a negative photoresist material.
  • the photoresist layer which is not exposed is removed by a developing technique.
  • the substrate corresponds to a color filter substrate for forming a liquid crystal display panel.
  • another technical solution adopted by the present invention is to provide a method for manufacturing a liquid crystal display panel, comprising: coating a photoresist layer on a substrate; and using a first mask and a second mask to align light
  • the resist layer is exposed to form a black matrix having different widths on the substrate, wherein a width of the black matrix is gradually increased along a direction of the intermediate portion of the liquid crystal display panel toward the both side regions; removing the unexposed photoresist layer;
  • the first photomask has a plurality of first light transmissive regions corresponding to a boundary region between two adjacent pixel electrodes of the liquid crystal display panel, and the second photomask has a plurality of corresponding to the first light transmissive region.
  • the second light transmitting region, and the light transmittance of the plurality of second light transmitting regions gradually increases along the direction in which the intermediate portions face the both side regions.
  • the black matrix has the same height and correspondingly located in the second light transmitting region, and the width of each of the second light transmitting regions is greater than the width of the corresponding first light transmitting region.
  • the plurality of first light transmitting regions have the same width, and the plurality of second light transmitting regions have the same width.
  • the first photomask is disposed between the second photomask and the photoresist layer, and the area of the second photomask is greater than or equal to the area of the liquid crystal display panel.
  • the exposure has a first exposure energy, the first exposure energy is less than the second exposure energy, and the second exposure energy is an exposure energy when the black matrix having the same width is formed when the photoresist layer is exposed by the first mask.
  • the material of the photoresist layer is made of a negative photoresist material.
  • the photoresist layer which is not exposed is removed by a developing technique.
  • the substrate corresponds to a color filter substrate for forming a liquid crystal display panel.
  • the crystal display panel includes a substrate and a black matrix having different widths disposed on the substrate, wherein the width of the black matrix gradually increases along a direction in which the intermediate portion of the liquid crystal display panel faces the both side regions of the liquid crystal display panel.
  • the substrate is a color filter substrate of a liquid crystal display panel.
  • the height of the black matrix is the same.
  • the beneficial effects of the embodiment of the present invention are: the embodiment of the present invention exposes the photoresist layer coated on the substrate by using the first mask and the second mask to utilize the second mask. a plurality of second light-transmissive regions having a light transmittance gradually increasing along a middle portion of the liquid crystal display panel toward a side region of the liquid crystal display panel, and having a direction along the intermediate portion of the liquid crystal display panel toward the both side regions on the substrate Black matrix of different widths, thereby reducing the pixel aperture ratio of the two sides, reducing the light transmittance of the pixel units on both sides, thereby reducing the display brightness of the two sides, and the display brightness and the middle area of the two sides at this time
  • the display brightness difference becomes smaller or eliminated, and the display brightness of the entire liquid crystal display panel is uniform, which slows or eliminates the phenomenon of "whitening on both sides”.
  • FIG. 1 is a top plan view showing a structure of a liquid crystal display panel in the prior art
  • FIG. 2 is a flow chart showing a method of manufacturing a liquid crystal display panel according to a preferred embodiment of the present invention
  • FIG. 3 is a schematic diagram of a scene for performing exposure according to a preferred embodiment of the present invention.
  • Figure 4 is a cross-sectional view of a color filter substrate produced by the manufacturing method shown in Figure 1;
  • Figure 5 is a cross-sectional view of a liquid crystal display panel having the color filter substrate shown in Figure 4 .
  • FIG. 2 is a flow chart showing a method of fabricating a liquid crystal display panel in accordance with a preferred embodiment of the present invention. As shown in FIG. 2, the manufacturing method of the liquid crystal display panel of this embodiment includes the following steps:
  • Step S21 coating a photoresist layer on the substrate.
  • the substrate 10 corresponds to a color filter substrate for forming a liquid crystal display panel, which may be a glass substrate, a plastic substrate or a flexible substrate.
  • the photoresist layer 11 is uniformly applied to the substrate 10, and it is preferable that the photoresist layer 11 is made of a negative photoresist material.
  • Step S22 exposing the photoresist layer with the first mask and the second mask to form black matrices having different widths on the substrate.
  • the first photomask 12 has a plurality of first light transmissive regions 121 corresponding to a boundary region between two adjacent pixel electrodes of the array substrate of the liquid crystal display panel, wherein the plurality of first light transmissive regions The light transmittance of the region 121 is completely the same.
  • the number of the first light-transmitting regions 121 shown in the figure is seven.
  • it is preferable that the plurality of first light-transmitting regions 121 have the same width and the distance between the adjacent two is the same.
  • the first mask 12 is equivalent to the pattern mask of the black matrix (BM) on the color filter substrate in the prior art, and the manufacturing process may be: first, the black matrix of the liquid crystal display panel. The area, or the area corresponding to the boundary area between two adjacent pixel electrodes of the array substrate, is marked. Then, a plurality of first light-transmissive regions 121 are defined on the reticle substrate according to the mark, wherein preferably the reticle substrate is a light-transmissive hard material such as glass or quartz, and the surface is coated with an opaque metal layer. For example, an alloy film layer of chromium Cr, aluminum Al, copper Cu, molybdenum Mo, or the like, or a combination thereof.
  • BM black matrix
  • the embodiment further preferably has a mask substrate, that is, the area of the first mask 12 is greater than or equal to the area of the liquid crystal display panel.
  • the second mask 22 has a plurality of second light transmitting regions a, b, c, d, e, f, g corresponding to the plurality of first light transmitting regions 121, and a plurality of second The widths of the light transmitting regions a, b, c, d, e, f, and g are the same, wherein the width of each of the second light transmitting regions is greater than the width of the corresponding first light transmitting region 121.
  • the number of the second light-transmissive areas shown in the figure is seven.
  • the second mask 22 is preferably an HTM-modulated mask (Half-Tone Mask) which is different from the prior art pattern mask.
  • the plurality of second light transmitting regions a, b, c, d, e, f The light transmittance of the second light-transmitting region a is greater than the light transmittance of the second light-transmitting region b, and the light transmittance of the second light-transmitting region c is greater than the second light-transmitting region d.
  • the transmittance of the second transparent region e is greater than the transmittance of the second transparent region d, and the transmittance of the second transparent region f is greater than that of the second transparent region e
  • the light transmittance, the light transmittance of the second light transmitting region g is greater than the light transmittance of the second light transmitting region f.
  • the difference in transmittance between the adjacent two second light-transmitting regions is equal, that is, the difference in light transmittance between the second light-transmitting region a and the second light-transmitting region b, and the second light-transmitting region b and The difference between the light transmittance of the two light transmitting regions c, the difference between the light transmittance of the second light transmitting region c and the second light transmitting region d, and the light transmittance of the second light transmitting region d and the second light transmitting region e
  • the difference between the difference, the transmittance of the second light-transmitting region e and the second light-transmitting region f, and the difference between the light transmittance of the second light-transmitting region f and the second light-transmitting region g are equal.
  • the manufacturing process of the second photomask 22 is substantially the same as the above manufacturing process of the first photomask 12:
  • the area where the black matrix of the liquid crystal display panel is located is marked.
  • a plurality of second light-transmissive regions a, b, c, d, e, f, and g are defined on the mask substrate according to the mark, wherein the mask substrate and the first mask 12 may be made of the same material.
  • a light-transmissive hard material such as glass or quartz
  • the surface is coated with an opaque metal layer such as chromium Cr, aluminum Al, copper Cu, molybdenum Mo, or the like, and a combination alloy film layer thereof.
  • the opaque film layers of the second light-transmitting regions a, b, c, d, e, f, and g are etched away, and subsequent processing such as cleaning is performed to obtain the second mask 22.
  • the reticle substrate that is, the area of the second reticle 22 is greater than or equal to the area of the liquid crystal display panel.
  • the substrate 10 coated with the photoresist layer 11 is placed in the exposure machine, and the second mask 22 is disposed between the light source 13 and the first mask 12, that is, the first mask 12
  • the first photomask 12 is disposed above the photoresist layer 11 and is positioned such that the plurality of first light transmissive regions 121 on the first photomask 12 and the first photomask 12 are disposed between the second photomask 22 and the photoresist layer 11 .
  • the regions of the substrate 10 corresponding to the black matrix are aligned, and the plurality of first light transmitting regions 121 are aligned with the plurality of second light transmitting regions a, b, c, d, e, f, g.
  • the light source 13 is turned on for exposure.
  • the light source 13 is a UV (Ultraviolet) light source, and the light (indicated by the arrow) has a first exposure energy E1 during exposure.
  • the corresponding exposure energy is different, so that the light is sequentially transmitted through the light.
  • the degree of exposure to the photoresist layer 11 is different.
  • the light transmittance X 0 of the second light transmitting region a and the second light transmitting region g 100%
  • the photoresist layer 11 made of a negative photoresist material
  • the plurality of black matrices P1 are formed to have the same height and each of the black matrices P1 is located within a range defined by the corresponding second light-transmitting regions in a direction perpendicular to the substrate 10.
  • the first exposure energy E1 of the light when forming the plurality of black matrices P1 is greater than the second exposure energy E2 when the conventional process forms the black matrix, that is, E1>E2.
  • the second exposure energy E2 is an exposure energy when only the black matrix having the same width formed when the photoresist layer 11 is exposed by the first mask 12 is used.
  • Step S23 removing the photoresist layer that is not exposed.
  • the unexposed photoresist layer 11 is removed using a development technique.
  • the transmittance of the pixel unit aperture ratio * liquid crystal efficiency
  • the embodiment of the present invention can reduce the aperture ratio of the two sides of the liquid crystal display panel, thereby The display brightness of the two sides is reduced, and the difference between the display brightness of the two sides and the display brightness of the middle area becomes small or even eliminated, and the display brightness of the entire liquid crystal display panel tends to be uniform, thereby slowing or eliminating "whitening on both sides". phenomenon.
  • the embodiment of the present invention further provides a color filter substrate 40 as shown in FIG. 4 and a liquid crystal display panel 50 having the color filter substrate 40 shown in FIG. 5, which have the same technology. effect.
  • the embodiment of the present invention exposes the photoresist layer coated on the substrate by using the first mask and the second mask, so as to use the second mask to face the liquid crystal display along the middle region of the liquid crystal display panel.
  • a plurality of second light-transmissive regions in which the light transmittance of the two sides of the panel is gradually increased, and a black matrix having different widths along the intermediate portion of the liquid crystal display panel toward the two side regions is formed on the substrate, thereby reducing two Pixel aperture ratio of the side region, reducing the pixel unit of the side regions
  • Light transmittance thereby reducing the display brightness of the two sides, at which time the difference between the display brightness of the two sides and the display brightness of the middle area becomes smaller or eliminated, and the display brightness of the entire liquid crystal display panel is uniform, slowing or eliminating "both sides White phenomenon.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optical Filters (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Liquid Crystal (AREA)

Abstract

提供了一种液晶显示面板（50）及其制造方法。该液晶显示面板（50）的制造方法包括：在基体（10）上涂布一光阻层（11）；采用第一光罩（12）和第二光罩（22）对光阻层（11）进行曝光，以在基体（10）上形成具有不同宽度的黑矩阵（P1），其中沿液晶显示面板（50）的中间区域朝向两侧区域的方向，第一光罩（12）具有的与液晶显示面板（50）的相邻两个像素电极之间的边界区域相对应的多个第二透光区（a，b，c，d，e，f，g）的透光率逐渐增大，以此使得形成的黑矩阵（P1）的宽度逐渐增大。该方法能够使得液晶显示面板（50）的显示亮度均匀，减缓或消除液晶显示面板（50）在显示时的"两侧发白"现象。

Description

液晶显示面板及其制造方法 【技术领域】
本发明涉及液晶显示技术领域，特别是涉及一种液晶显示面板及其制造方法。
【背景技术】
TFT-LCD(Thin Film Transistor-Liquid Crystal Display，薄膜场效应液晶显示)面板在低灰阶显示时，极易出现两侧区域亮度高、中间区域亮度低的显示不良现象，通常称为“两侧发白”现象。
产生“两侧发白”现象的原理在于：如图1所示，扫描Gate线11的驱动电压是由位于液晶显示面板10的左右两侧的扫描驱动电极(Gate COF)12输入的，由于扫描线11的电阻电容延迟RC Delay，使得两侧正常输入的扫描驱动电压在传递至中间区域A时发生失真，即Gate波形失真，失真的扫描驱动电压会降低中间区域A的充电率，从而降低中间区域A的显示亮度，此时两侧区域B1、B2的显示亮度相比之下变高，即产生“两侧发白”现象。在低灰阶显示时，由于人眼敏感，因此观看时“两侧发白”现象尤为明显。
【发明内容】
有鉴于此，本发明实施例所要解决的技术问题是提供一种液晶显示面板及其制造方法，能够使得液晶显示面板的显示亮度均匀，减缓或消除“两侧发白”现象。
为解决上述技术问题，本发明采用的一个技术方案是：提供一种液晶显示面板的制造方法，包括：在基体上涂布一光阻层；采用第一光罩和第二光罩对光阻层进行曝光，以在基体上形成具有不同宽度的黑矩阵，其中沿液晶显示面板的中间区域朝向两侧区域的方向，黑矩阵的宽度逐渐增大，曝光时具有第一曝光能量，第一曝光能量小于第二曝光能量，第二曝光能量为采用第一光罩对光阻层进行曝光时形成的具有宽度相等的黑矩阵时的曝光能量；移除未被曝光的光阻层；其中，第一光罩具有与液晶显示面板 的相邻两个像素电极之间的边界区域相对应的多个第一透光区，第二光罩具有与第一透光区相对应的多个第二透光区，且沿中间区域朝向两侧区域的方向，多个第二透光区的透光率逐渐增大，黑矩阵的高度相同且对应位于第二透光区内，每一第二透光区的宽度大于对应的第一透光区的宽度。
其中，多个第一透光区的宽度相同，多个第二透光区的宽度相同。
其中，第一光罩设置于第二光罩和光阻层之间，第二光罩的面积大于或等于液晶显示面板的面积。
其中，光阻层的制造材质包括负性光阻材料。
其中，采用显影技术移除未被曝光的光阻层。
其中，基体对应用于形成液晶显示面板的彩色滤光片基板。
为解决上述技术问题，本发明采用的另一个技术方案是：提供一种液晶显示面板的制造方法，包括：在基体上涂布一光阻层；采用第一光罩和第二光罩对光阻层进行曝光，以在基体上形成具有不同宽度的黑矩阵，其中沿液晶显示面板的中间区域朝向两侧区域的方向，黑矩阵的宽度逐渐增大；移除未被曝光的光阻层；其中，第一光罩具有与液晶显示面板的相邻两个像素电极之间的边界区域相对应的多个第一透光区，第二光罩具有与第一透光区相对应的多个第二透光区，且沿中间区域朝向两侧区域的方向，多个第二透光区的透光率逐渐增大。
其中，黑矩阵的高度相同且对应位于第二透光区内，每一第二透光区的宽度大于对应的第一透光区的宽度。
其中，多个第一透光区的宽度相同，多个第二透光区的宽度相同。
其中，第一光罩设置于第二光罩和光阻层之间，第二光罩的面积大于或等于液晶显示面板的面积。
其中，曝光时具有第一曝光能量，第一曝光能量小于第二曝光能量，第二曝光能量为采用第一光罩对光阻层进行曝光时形成的具有宽度相等的黑矩阵时的曝光能量。
其中，光阻层的制造材质包括负性光阻材料。
其中，采用显影技术移除未被曝光的光阻层。
其中，基体对应用于形成液晶显示面板的彩色滤光片基板。
为解决上述技术问题，本发明采用的又一个技术方案是：提供一种液 晶显示面板，包括一基体以及设置于基体上的具有不同宽度的黑矩阵，其中，沿液晶显示面板的中间区域朝向液晶显示面板的两侧区域的方向，黑矩阵的宽度逐渐增大。
其中，基体为液晶显示面板的彩色滤光片基板。
其中，黑矩阵的高度相同。
通过上述技术方案，本发明实施例产生的有益效果是：本发明实施例通过采用第一光罩和第二光罩对基体上涂布的光阻层进行曝光，以利用第二光罩具有的沿液晶显示面板的中间区域朝向液晶显示面板的两侧区域的方向透光率逐渐增大的多个第二透光区，在基体上形成沿液晶显示面板的中间区域朝向两侧区域的方向具有不同宽度的黑矩阵，以此降低两侧区域的像素开口率，降低两侧区域的像素单元的光穿透率，从而降低两侧区域的显示亮度，此时两侧区域的显示亮度与中间区域的显示亮度差距变小或消除，整个液晶显示面板的显示亮度均匀，减缓或消除“两侧发白”现象。
【附图说明】
图1是现有技术中液晶显示面板的结构俯视图；
图2是本发明优选实施例的液晶显示面板的制造方法的流程图；
图3是本发明优选实施例的进行曝光的场景示意图；
图4是采用图1所示制造方法制得的彩色滤光片基板的剖视图；
图5是具有图4所示彩色滤光片基板的液晶显示面板的剖视图。
【具体实施方式】
下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整地描述，显然，本发明以下所描述的实施例仅仅是本发明的一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其它实施例，都属于本发明保护的范围。
图2是本发明优选实施例的液晶显示面板的制造方法的流程图。如图2所示，本实施例的液晶显示面板的制造方法包括如下步骤：
步骤S21：在基体上涂布一光阻层。
结合图3所示，基体10对应用于形成液晶显示面板的彩色滤光片基板，其可为玻璃基体、塑料基体或可挠式基体。光阻层11均匀涂布于基体10上，且优选光阻层11的制造材质为负性光阻材料。
步骤S22：采用第一光罩和第二光罩对光阻层进行曝光，以在基体上形成具有不同宽度的黑矩阵。
如图3所示，第一光罩12具有与液晶显示面板的阵列基板的相邻两个像素电极之间的边界区域相对应的多个第一透光区121，其中多个第一透光区121的透光率完全相同。图中所示第一透光区121的数量为七个仅供说明，本实施例优选多个第一透光区121的宽度均相同且相邻两个之间的距离均相同。
本实施例优选第一光罩12相当于现有技术中制造彩色滤光片基板上的黑矩阵(Black Matrix，BM)的图形光罩，其制造过程可以为：首先对液晶显示面板的黑矩阵所在区域，或与阵列基板的相邻两个像素电极之间的边界区域相对应的区域，进行标记。然后根据标记在光罩基材上定义出多个第一透光区121，其中优选光罩基材为玻璃或石英等透光的硬质材料，且表面涂布有不透光的金属层，例如铬Cr、铝Al、铜Cu、钼Mo等及其或组合的合金膜层。最后刻蚀掉对应于多个第一透光区121的不透光膜层，再进行清洗等后续处理即可得到第一光罩12。为保证曝光时的曝光区域，本实施例进一步优选光罩基材，即第一光罩12的面积大于或等于液晶显示面板的面积。
如图3所示，第二光罩22具有与多个第一透光区121相对应的多个第二透光区a、b、c、d、e、f、g，且多个第二透光区a、b、c、d、e、f、g的宽度相同，其中每一第二透光区的宽度大于对应的第一透光区121的宽度。图中所示第二透光区的数量为七个仅供说明，本实施例优选第二光罩22是区别于现有技术中图形光罩的HTM调制光罩(Half-Tone Mask，半色调掩模)，并且沿液晶显示面板的中间区域朝向液晶显示面板的两侧区域的方向，即沿图3所示箭头方向，多个第二透光区a、b、c、d、e、f、g的透光率逐渐增大，其中第二透光区a的透光率大于第二透光区b的透光率，第二透光区c的透光率大于第二透光区d的透光率，第二透光区e的透光率大于第二透光区d的透光率，第二透光区f的透光率大于第二透光区e的透 光率，第二透光区g的透光率大于第二透光区f的透光率。
并且，相邻两个第二透光区之间的透光率之差相等，即第二透光区a与第二透光区b的透光率之差、第二透光区b与第二透光区c的透光率之差、第二透光区c与第二透光区d的透光率之差、第二透光区d与第二透光区e的透光率之差、第二透光区e与第二透光区f的透光率之差、第二透光区f与第二透光区g的透光率之差，均相等。
第二光罩22的制造过程与第一光罩12的上述制造过程基本相同：
首先对液晶显示面板的黑矩阵所在区域，即与相邻两个像素电极之间的边界区域相对应的区域，进行标记。然后根据标记在光罩基材上定义出多个第二透光区a、b、c、d、e、f、g，其中光罩基材与第一光罩12的制造材质可以相同也可以不相同，即为玻璃或石英等透光的硬质材料，且表面涂布有不透光的金属层，例如铬Cr、铝Al、铜Cu、钼Mo等及其或组合的合金膜层，或有机膜层，例如聚氨酯、PET(polyethylene terephthalate，聚对苯二甲酸乙二醇酯)等高聚合物。最后刻蚀掉第二透光区a、b、c、d、e、f、g的不透光膜层，进行清洗等后续处理即可得到第二光罩22。为保证曝光时的曝光区域，优选光罩基材，即第二光罩22的面积大于或等于液晶显示面板的面积。
请再次参阅图3所示，将涂布有光阻层11的基体10放置于曝光机中，将第二光罩22设置于光源13与第一光罩12之间，即将第一光罩12设置于第二光罩22和光阻层11之间，此时第一光罩12设置于光阻层11的上方并对位，使得第一光罩12上的多个第一透光区121与基体10上对应黑矩阵的区域对准，并且使得多个第一透光区121与多个第二透光区a、b、c、d、e、f、g对位。然后，开启光源13进行曝光。其中，优选光源13为UV(Ultraviolet，紫外线)光源，且曝光时光线(箭头所示)具有第一曝光能量E1。
第一曝光能量E1的光线穿过具有不同透光率的多个第二透光区a、b、c、d、e、f、g之后，对应的曝光能量不相同，从而在光线依次透过第二光罩22和第一光罩12之后，对光阻层11的曝光程度各不相同。例如，第二透光区a与第二透光区g的透光率X0＝100％，第二透光区b与第二透光区f的透光率X1＝90％，第二透光区c与第二透光区e的透光率X2＝80％，第 二透光区d的透光率X3＝70％，由负性光阻材料制成的光阻层11接收到不同曝光能量的光照后，会形成不可溶物质，即在对应曝光处形成多个宽度不相同的黑矩阵P1，且沿液晶显示面板的中间区域朝向两侧区域的方向，黑矩阵P1的宽度逐渐增大，其中透光率越高的第二透光区对应形成的黑矩阵P1的宽度越大。在本实施例中，形成的多个黑矩阵P1的高度相同且每一黑矩阵P1位于其对应的第二透光区在垂直于基板10的方向上所限定的范围内。
需要说明的是，形成多个黑矩阵P1时光线具有的第一曝光能量E1，大于传统制程形成黑矩阵时具有的第二曝光能量E2，即E1＞E2。其中，第二曝光能量E2为仅采用第一光罩12对光阻层11进行曝光时形成的具有宽度相等的黑矩阵时的曝光能量。本实施例优选第二曝光能量E2为第一曝光能量E1的70％，即E2＝E1*70％。
步骤S23：移除未被曝光的光阻层。
完成上述步骤之后，采用显影技术移除未被曝光的光阻层11。
此时，由于沿液晶显示面板的中间区域朝向两侧区域的方向，黑矩阵P1的宽度逐渐增大，根据像素单元的穿透率＝开口率*液晶效率(即单位开口面积的穿透率)这一液晶显示领域的公知常识，可知增大黑矩阵P1的宽度能够降低黑矩阵P1对应区域的像素单元的开口率，因此本发明实施例可降低液晶显示面板的两侧区域的开口率，从而降低两侧区域的显示亮度，此时两侧区域的显示亮度与中间区域的显示亮度差距变小甚至可以消除，整个液晶显示面板的显示亮度趋向均匀，即可减缓或消除“两侧发白”现象。
本发明实施例还提供一种采用上述制造方法制得的如图4的彩色滤光片基板40，以及图5所示的具有彩色滤光片基板40的液晶显示面板50，因此具有相同的技术效果。
综上所述，本发明实施例通过采用第一光罩和第二光罩对基体上涂布的光阻层进行曝光，以利用第二光罩具有的沿液晶显示面板的中间区域朝向液晶显示面板的两侧区域的方向透光率逐渐增大的多个第二透光区，在基体上形成沿液晶显示面板的中间区域朝向两侧区域的方向具有不同宽度的黑矩阵，以此降低两侧区域的像素开口率，降低两侧区域的像素单元的 光穿透率，从而降低两侧区域的显示亮度，此时两侧区域的显示亮度与中间区域的显示亮度差距变小或消除，整个液晶显示面板的显示亮度均匀，减缓或消除“两侧发白”现象。
再次说明，以上所述仅为本发明的实施例，并非因此限制本发明的专利范围，凡是利用本发明说明书及附图内容所作的等效结构或等效流程变换，例如各实施例之间技术特征的相互结合，或直接或间接运用在其他相关的技术领域，均同理包括在本发明的专利保护范围内。

Claims (17)

  1. 一种液晶显示面板的制造方法，其中，所述制造方法包括：
    在基体上涂布一光阻层；
    采用第一光罩和第二光罩对所述光阻层进行曝光，以在所述基体上形成具有不同宽度的黑矩阵，其中沿所述液晶显示面板的中间区域朝向两侧区域的方向，所述黑矩阵的宽度逐渐增大，所述曝光时具有第一曝光能量，所述第一曝光能量小于所述第二曝光能量，所述第二曝光能量为采用所述第一光罩对所述光阻层进行曝光时形成的具有宽度相等的黑矩阵时的曝光能量；
    移除未被曝光的所述光阻层；
    其中，所述第一光罩具有与所述液晶显示面板的相邻两个像素电极之间的边界区域相对应的多个第一透光区，所述第二光罩具有与所述多个第一透光区相对应的多个第二透光区，且沿所述中间区域朝向所述两侧区域的方向，所述多个第二透光区的透光率逐渐增大，所述黑矩阵的高度相同且对应位于所述第二透光区内，每一所述第二透光区的宽度大于对应的所述第一透光区的宽度。
  2. 根据权利要求1所述的制造方法，其中，所述多个第一透光区的宽度相同，所述多个第二透光区的宽度相同。
  3. 根据权利要求1所述的制造方法，其中，所述第一光罩设置于所述第二光罩和所述光阻层之间，所述第二光罩的面积大于或等于所述液晶显示面板的面积。
  4. 根据权利要求1所述的制造方法，其中，所述光阻层的制造材质包括负性光阻材料。
  5. 根据权利要求4所述的制造方法，其中，采用显影技术移除所述未被曝光的光阻层。
  6. 根据权利要求1所述的制造方法，其中，所述基体对应用于形成所述液晶显示面板的彩色滤光片基板。
  7. 一种液晶显示面板的制造方法，其中，所述制造方法包括：
    在基体上涂布一光阻层；
    采用第一光罩和第二光罩对所述光阻层进行曝光，以在所述基体上形成具有不同宽度的黑矩阵，其中沿所述液晶显示面板的中间区域朝向两侧区域的方向，所述黑矩阵的宽度逐渐增大；
    移除未被曝光的所述光阻层；
    其中，所述第一光罩具有与所述液晶显示面板的相邻两个像素电极之间的边界区域相对应的多个第一透光区，所述第二光罩具有与所述多个第一透光区相对应的多个第二透光区，且沿所述中间区域朝向所述两侧区域的方向，所述多个第二透光区的透光率逐渐增大。
  8. 根据权利要求7所述的制造方法，其中，所述黑矩阵的高度相同且对应位于所述第二透光区内，每一所述第二透光区的宽度大于对应的所述第一透光区的宽度。
  9. 根据权利要求8所述的制造方法，其中，所述多个第一透光区的宽度相同，所述多个第二透光区的宽度相同。
  10. 根据权利要求8所述的制造方法，其中，所述第一光罩设置于所述第二光罩和所述光阻层之间，所述第二光罩的面积大于或等于所述液晶显示面板的面积。
  11. 根据权利要求7所述的制造方法，其中，所述曝光时具有第一曝光能量，所述第一曝光能量小于所述第二曝光能量，所述第二曝光能量为采用所述第一光罩对所述光阻层进行曝光时形成的具有宽度相等的黑矩阵时的曝光能量。
  12. 根据权利要求7所述的制造方法，其中，所述光阻层的制造材质包括负性光阻材料。
  13. 根据权利要求12所述的制造方法，其中，采用显影技术移除所述未被曝光的光阻层。
  14. 根据权利要求7所述的制造方法，其中，所述基体对应用于形成所述液晶显示面板的彩色滤光片基板。
  15. 一种液晶显示面板，其中，所述液晶显示面板包括一基体以及设置于所述基体上的具有不同宽度的黑矩阵，其中，沿所述液晶显示面板的中间区域朝向所述液晶显示面板的两侧区域的方向，所述黑矩阵的宽度逐渐增大。
  16. 根据权利要求15所述的液晶显示面板，其中，所述基体为所述液晶显示面板的彩色滤光片基板。
  17. 根据权利要求15所述的液晶显示面板，其中，所述黑矩阵的高度相同。
PCT/CN2014/087932 2014-09-24 2014-09-30 液晶显示面板及其制造方法 Ceased WO2016045141A1 (zh)

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