WO2021022602A1 - 灰阶光罩及显示基板的制作方法 - Google Patents

灰阶光罩及显示基板的制作方法 Download PDF

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Publication number
WO2021022602A1
WO2021022602A1 PCT/CN2019/104229 CN2019104229W WO2021022602A1 WO 2021022602 A1 WO2021022602 A1 WO 2021022602A1 CN 2019104229 W CN2019104229 W CN 2019104229W WO 2021022602 A1 WO2021022602 A1 WO 2021022602A1
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Prior art keywords
light
transmitting
slits
width
transmitting area
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Application number
PCT/CN2019/104229
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English (en)
French (fr)
Inventor
曹武
Original Assignee
深圳市华星光电半导体显示技术有限公司
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Publication of WO2021022602A1 publication Critical patent/WO2021022602A1/zh

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof

Definitions

  • the present invention relates to the field of display technology, and in particular to a manufacturing method of a grayscale photomask and a display substrate.
  • main spacer Main PS
  • auxiliary spacer Sub PS
  • Black Photo Spacer (BPS) material is a new type of material. It not only has the characteristics of traditional spacer materials, such as better elastic recovery and lower pollution to liquid crystals, but also has The characteristics of black matrix materials, such as higher optical density (optical density, OD) value, can play a role in shading, therefore, it can be used to combine the two processes of BM and PS into one, reducing a yellow light process, reducing material costs and production time (tact time), thereby reducing the overall production cost.
  • OD optical density
  • the black matrix, main The spacers, auxiliary spacers, and color filter films are all designed on the side of the array substrate, which not only avoids errors in the alignment accuracy during the alignment process, or the translation caused by the bending of the panel in the curved display technology Luguang, more importantly, save a piece of material and manufacturing process, shorten production time and reduce product cost.
  • the so-called gray-scale mask is to form two kinds of light-transmitting areas, which are completely light-transmissive and partially light-transmitting, in a light-shield.
  • the partially light-transmitting light-transmitting area is formed by alternately arranging light-shielding bars and light-transmitting slits.
  • the width of all light-shielding bars and light-transmitting slits in the partially transparent light-transmitting area of the gray-scale mask is equal, but in actual exposure, the exposure of the light-transmitting slits at both ends of the first and last ends is often higher than that of the middle.
  • the exposure of the light-transmitting slit is small, which in turn causes the thickness of the edge of the second film liner 202 to be different from the thickness in the middle of the second film liner 202, and even causes peeling of the edge of the second film liner 202. , Which seriously affects product quality.
  • the purpose of the present invention is to provide a gray-scale photomask, which can effectively prevent the film liner from peeling, improve the process yield, and ensure product quality.
  • the purpose of the present invention is also to provide a method for manufacturing a display substrate, which can effectively prevent the film liner from peeling off, improve the process yield, and ensure product quality.
  • the present invention provides a gray-scale photomask, which is characterized in that it includes a light-transmitting area and a light-shielding area surrounding the light-transmitting area, and the light-transmitting area includes sequentially arranged for forming the first thin film.
  • the thickness of the first film liner is greater than the thickness of the second film liner, and the second light-transmitting area is subjected to an anti-peel treatment, so that the four corners of the second film liner formed by the second light-transmitting area
  • the thickness is at least 60% of the thickness at its center.
  • the second light-transmitting area includes a plurality of light-transmitting slits arranged in parallel in sequence, and a light-shielding strip is arranged between two adjacent light-transmitting slits;
  • the anti-stripping treatment is: setting the width of the two light-transmitting slits at both ends of the head and tail to the first width, and the width of the other light-transmitting slits except the two light-transmitting slits at the ends of the head and tail to the second width, so The first width is greater than the second width, and the widths of all the shading bars are equal.
  • the second light-transmitting area includes a plurality of light-transmitting slits arranged in parallel in sequence, and a light-shielding strip is arranged between two adjacent light-transmitting slits;
  • the anti-stripping treatment is: setting the width of the two light-shielding strips at both ends of the head and tail to the third width, and the width of the other light-shielding strips except the two light-shielding strips at the ends of the head and the tail is the fourth width, and the third width is smaller than the first width.
  • Four widths, all light-transmitting slits have the same width.
  • the second light-transmitting area includes a plurality of light-transmitting slits arranged in parallel in sequence, and a light-shielding strip is arranged between two adjacent light-transmitting slits;
  • the second light-transmitting area includes a plurality of light-transmitting slits arranged in parallel in sequence, and a light-shielding strip is arranged between two adjacent light-transmitting slits;
  • the anti-stripping treatment includes: arranging two auxiliary light-transmitting slits on opposite sides of the second light-transmitting area, the auxiliary light-transmitting slits being perpendicular to the light-transmitting slits, and each light-transmitting slit Both ends of the slit are respectively connected to the two auxiliary light-transmitting slits.
  • Step S2 Provide a gray-scale photomask, including a light-transmitting area and a light-shielding area surrounding the light-transmitting area, the light-transmitting area includes a first light-transmitting area and a second light-transmitting area arranged in sequence, the The first light-transmitting area is completely light-transmitting, the second light-transmitting area is partially light-transmitting, and the second light-transmitting area is subjected to anti-stripping treatment;
  • Step S3. Pattern the color resist film through the gray-scale mask, so that the portion of the color resist film corresponding to the first light-transmitting area forms a first film liner, and the portion corresponding to the second light-transmitting area forms a second film.
  • the thickness of the first film liner is greater than that of the second film liner, and the thickness of the four corners of the second film liner is at least 60% of the thickness of the center thereof;
  • Step S4 forming a light-shielding film on the substrate, the second film liner, and the second film liner, and patterning the light-shielding film to form a black matrix, and a main spacer on the black matrix on the first film liner And the auxiliary spacer on the black matrix on the second film liner.
  • the second light-transmitting area includes a plurality of light-transmitting slits arranged in parallel in sequence, and a light-shielding strip is arranged between two adjacent light-transmitting slits;
  • the anti-stripping treatment is: setting the width of the two light-transmitting slits at both ends of the head and tail to the first width, and the width of the other light-transmitting slits except the two light-transmitting slits at the ends of the head and tail to the second width, so The first width is greater than the second width, and the widths of all the shading bars are equal.
  • the second light-transmitting area includes a plurality of light-transmitting slits arranged in parallel in sequence, and a light-shielding strip is arranged between two adjacent light-transmitting slits;
  • the anti-stripping treatment is: setting the width of the two light-shielding strips at both ends of the head and tail to the third width, and the width of the other light-shielding strips except the two light-shielding strips at the ends of the head and the tail is the fourth width, and the third width is smaller than the first width.
  • Four widths, all light-transmitting slits have the same width.
  • the second light-transmitting area includes a plurality of light-transmitting slits arranged in parallel in sequence, and a light-shielding strip is arranged between two adjacent light-transmitting slits;
  • the second light-transmitting area includes a plurality of light-transmitting slits arranged in parallel in sequence, and a light-shielding strip is arranged between two adjacent light-transmitting slits;
  • the anti-stripping treatment includes: arranging two auxiliary light-transmitting slits on opposite sides of the second light-transmitting area, the auxiliary light-transmitting slits being perpendicular to the light-transmitting slits, and each light-transmitting slit Both ends of the slit are respectively connected to the two auxiliary light-transmitting slits.
  • the present invention provides a gray-scale photomask, which includes a light-transmitting area and a light-shielding area surrounding the light-transmitting area, and the light-transmitting area includes sequential arrays for forming a first film liner.
  • a first light-transmitting area and a second light-transmitting area for forming a second film liner the first light-transmitting area is completely light-transmitting, and the second light-transmitting area is partially light-transmitting; the first film liner
  • the thickness of the second film liner is greater than that of the second film liner, and the second light-transmitting area is subjected to an anti-peel treatment, so that the thickness of the four corners of the second film liner formed by the second light-transmitting area is at least the thickness of the center 60% of the second light-transmitting zone is treated to prevent peeling, which can effectively improve the film forming stability of the second film liner and prevent the second film liner from peeling off.
  • the present invention also provides a method for manufacturing a display substrate, which can effectively improve the film forming stability of the second film liner and prevent the second film liner from peeling off.
  • Figure 1 is a schematic diagram of an existing BPS substrate
  • FIG. 2 is a schematic diagram of the first embodiment of the gray-scale mask of the present invention.
  • Fig. 3 is a schematic diagram of a second embodiment of the gray-scale mask of the present invention.
  • FIG. 4 is a schematic diagram of a third embodiment of the gray-scale mask of the present invention.
  • FIG. 5 is a schematic diagram of a fourth embodiment of the gray-scale mask of the present invention.
  • FIG. 7 is a schematic diagram of a display substrate manufactured by the manufacturing method of the display substrate of the present invention.
  • the present invention provides a gray-scale photomask, including a light-transmitting area 31 and a light-shielding area 32 surrounding the light-transmitting area 31, the light-transmitting area 31 includes sequentially arranged for forming the first A first light-transmitting area 311 of a film liner 41 and a second light-transmitting area 312 for forming a second film liner 42.
  • the first light-transmitting area 311 completely transmits light
  • the second light-transmitting area 312 Partially transparent
  • the thickness of the first film liner 41 is greater than that of the second film liner 42, and the second light-transmitting area 312 is subjected to an anti-peeling treatment, which can make the second film liner formed by the second light-transmitting area 312
  • the thickness of the four corners of the pad 42 is at least 60% of the thickness of the center thereof.
  • the second light-transmitting area 312 includes a plurality of light-transmitting slits 51a arranged in parallel in sequence, and two adjacent light-transmitting slits 51a There is a shading strip 52a in between;
  • the anti-stripping treatment is as follows: the width of the two light-transmitting slits 51a at both ends of the head and tail is set to the first width, and the width of the other light-transmitting slits 51a except the two light-transmitting slits 51a at the head and tail ends is the second width.
  • the width, the first width is greater than the second width, and the widths of all the shading bars 52a are equal.
  • the width of the two light-transmitting slits 51a at the end and the end of the invention is increased, and the light-receiving area at the edge of the second light-transmitting region 312 is increased during exposure. Therefore, the edge thickness of the second film liner 42 is increased.
  • the thickness of the four corners of the second film liner 42 formed by the second light-transmitting area 312 can be at least 60% of the thickness of the center thereof, corresponding to In the first embodiment, not only the thickness of the four corners of the second film liner 42 is increased, but also the thicknesses of the left and right sides of the second film liner 42 are increased. That is, in the first embodiment The thickness of the two side edges of the second film liner 42 is at least 60% of the thickness of the center thereof, which can effectively improve the film forming strength of the second film liner 42 and prevent the second film liner 42 from peeling off.
  • the second light-transmitting area 312 includes a plurality of light-transmitting slits 51b arranged in parallel in sequence, and two adjacent light-transmitting slits 51b There is a shading strip 52b in between;
  • the anti-stripping treatment is: the width of the two light-shielding strips 52b at both ends of the head and tail is set to the third width, and the width of the other light-shielding strips 52b except the two light-shielding bars 52b at the head and tail ends is the fourth width.
  • the width is smaller than the fourth width, and the widths of all light-transmitting slits 51b are equal.
  • the width of the two light-shielding strips 52b at the end and the end is reduced.
  • the light-transmitting slits 51b on both sides of the two light-shielding strips 52b overlap
  • the generated light intensity increases, so that the edge thickness of the second film liner 42 increases.
  • the thickness of the four corners of the second film liner 42 formed by the second light transmitting region 312 can be at least the thickness of the center.
  • the thickness of the four corners of the second film liner 42 is increased, and the thickness of the left and right sides of the second film liner 42 are increased, that is, In the first embodiment, the thickness of the two side edges of the second film liner 42 is at least 60% of the thickness of its center, which can effectively improve the film forming strength of the second film liner 42 and prevent the second film liner 42 Flaking.
  • the second light-transmitting area 312 includes a plurality of light-transmitting slits 51c arranged in parallel in sequence, and two adjacent light-transmitting slits 51c There is a shading strip 52c in between;
  • the anti-stripping treatment is as follows: two auxiliary light-transmitting slits 53c are respectively provided on two opposite sides of the second light-transmitting region 312, and the auxiliary light-transmitting slits 53c and the light-transmitting slits 51c are vertically spaced, and One end of the auxiliary light-transmitting slit 53c is flush with or exceeds the outer side of the light-transmitting slit 51c at the head end, and the other end is flush with or exceeds the outer side of the light-transmitting slit 51c at the tail end.
  • the third embodiment of the present invention is provided with auxiliary light-transmitting slits 53c perpendicular to the light-transmitting slit 51c at the upper and lower ends of the light-transmitting slit 51c.
  • the auxiliary light-transmitting slit 53c is exposed to form a lateral sealing design, and at the same time, the light-receiving intensity of the four corners of the second light-transmitting area 312 is enhanced, so that the thickness of the four corners of the second film liner 42 formed by the second light-transmitting area 312 At least 60% of the thickness of the center, and the transverse sealing design is used to form a lock structure, which can effectively improve the film forming strength of the second film liner 42 and prevent the second film liner 42 from peeling off.
  • the second light-transmitting area 312 includes a plurality of light-transmitting slits 51d arranged in parallel in sequence, and two adjacent light-transmitting slits 51d There is a light-shielding strip 52d in between; the anti-stripping treatment is: two auxiliary light-transmitting slits 53d are respectively provided on two opposite sides of the second light-transmitting area 312, and the auxiliary light-transmitting slits 53d and the light-transmitting The slits 51d are vertical, and both ends of each light-transmitting slit 51d are respectively connected to two auxiliary light-transmitting slits 53d.
  • the functional principle of the fourth embodiment and the third embodiment of the present invention is the same as that of the third embodiment, and the area is only that the auxiliary light-transmitting slit 53d and the light-transmitting slit 51d are changed from space to connection.
  • the present invention can effectively pass the edge strength of the thin film liner formed by the partial light-transmitting area (Slit Mask) of the gray-scale mask through the anti-peel treatment described in the first to fourth embodiments above, and prevent the film The edge of the liner peels off to ensure the process yield.
  • the present invention also provides a method for manufacturing a display substrate using the above-mentioned gray-scale mask for a patterning process.
  • the method specifically includes the following steps:
  • Step S1 a substrate 10 is provided, and a color resist film 20 is formed on the substrate 10.
  • the display substrate is a COA substrate
  • the substrate 10 includes a base substrate 11 and a TFT layer 91 provided on the base substrate 11.
  • the structure of the TFT layer 91 can be designed as required.
  • the 91 structure may include a first metal layer, a first insulating layer, an active layer, a second insulating layer, a second metal layer, a protective layer, etc., which are stacked.
  • Step S2 Provide a gray-scale photomask, including a light-transmitting area 31 and a light-shielding area 32 surrounding the light-transmitting area 31.
  • the light-transmitting area 31 includes a first light-transmitting area 311 and a second light-transmitting area 311 arranged in sequence.
  • Light area 312, the first light-transmitting area 311 is completely light-transmissive, the second light-transmitting area 312 is partially light-transmitting, and the second light-transmitting area 312 has undergone anti-stripping treatment;
  • the second light-transmitting area 312 includes a plurality of light-transmitting slits 51a arranged in parallel in sequence, and two adjacent light-transmitting slits 51a There is a shading strip 52a in between;
  • the anti-stripping treatment is as follows: the width of the two light-transmitting slits 51a at both ends of the head and tail is set to the first width, and the width of the other light-transmitting slits 51a except the two light-transmitting slits 51a at the head and tail ends is the second width.
  • the width, the first width is greater than the second width, and the widths of all the shading bars 52a are equal.
  • the width of the two light-transmitting slits 51a at the end and the end of the invention is increased, and the light-receiving area at the edge of the second light-transmitting region 312 is increased during exposure. Therefore, the edge thickness of the second film liner 42 is increased.
  • the thickness of the four corners of the second film liner 42 formed by the second light-transmitting area 312 can be at least 60% of the thickness of the center thereof, corresponding to In the first embodiment, not only the thickness of the four corners of the second film liner 42 is increased, but also the thicknesses of the left and right sides of the second film liner 42 are increased. That is, in the first embodiment The thickness of the two side edges of the second film liner 42 is at least 60% of the thickness of the center thereof, which can effectively improve the film forming strength of the second film liner 42 and prevent the second film liner 42 from peeling off.
  • the second light-transmitting area 312 includes a plurality of light-transmitting slits 51b arranged in parallel in sequence, and two adjacent light-transmitting slits 51b There is a shading strip 52b in between;
  • the anti-stripping treatment is: the width of the two light-shielding strips 52b at both ends of the head and tail is set to the third width, and the width of the other light-shielding strips 52b except the two light-shielding bars 52b at the head and tail ends is the fourth width.
  • the width is smaller than the fourth width, and the widths of all light-transmitting slits 51b are equal.
  • the width of the two light-shielding strips 52b at the end and the end is reduced.
  • the light-transmitting slits 51b on both sides of the two light-shielding strips 52b overlap
  • the generated light intensity increases, so that the edge thickness of the second film liner 42 increases.
  • the thickness of the four corners of the second film liner 42 formed by the second light transmitting region 312 can be at least the thickness of the center.
  • the thickness of the four corners of the second film liner 42 is increased, and the thickness of the left and right sides of the second film liner 42 are increased, that is, In the first embodiment, the thickness of the two side edges of the second film liner 42 is at least 60% of the thickness of its center, which can effectively improve the film forming strength of the second film liner 42 and prevent the second film liner 42 Flaking.
  • the second light-transmitting area 312 includes a plurality of light-transmitting slits 51c arranged in parallel in sequence, and two adjacent light-transmitting slits 51c There is a shading strip 52c in between;
  • the third embodiment of the present invention is provided with auxiliary light-transmitting slits 53c perpendicular to the light-transmitting slit 51c at the upper and lower ends of the light-transmitting slit 51c.
  • the auxiliary light-transmitting slit 53c is exposed to form a lateral sealing design, and at the same time, the light-receiving intensity of the four corners of the second light-transmitting area 312 is enhanced, so that the thickness of the four corners of the second film liner 42 formed by the second light-transmitting area 312 At least 60% of the thickness of the center, and the transverse sealing design is used to form a lock structure, which can effectively improve the film forming strength of the second film liner 42 and prevent the second film liner 42 from peeling off.
  • the second light-transmitting area 312 includes a plurality of light-transmitting slits 51d arranged in parallel in sequence, and two adjacent light-transmitting slits 51d There is a light-shielding strip 52d in between; the anti-stripping treatment is: two auxiliary light-transmitting slits 53d are respectively provided on two opposite sides of the second light-transmitting area 312, and the auxiliary light-transmitting slits 53d and the light-transmitting The slits 51d are vertical, and both ends of each light-transmitting slit 51 are respectively connected to two auxiliary light-transmitting slits 53d.
  • the functional principle of the fourth embodiment and the third embodiment of the present invention is the same as that of the third embodiment, and the only area is that the auxiliary light-transmitting slit and the light-transmitting slit are changed from space to connection.
  • the present invention can effectively pass the edge strength of the thin film liner formed by the partial light-transmitting area (Slit Mask) of the gray-scale mask through the anti-peel treatment described in the first to fourth embodiments above, and prevent the film The edge of the liner peels off to ensure the process yield.
  • Step S4 forming a light-shielding film 60 on the substrate 10, the second film liner 41 and the second film liner 42, and pattern the light-shielding film 60 to form a black matrix 61 and a black color on the first film liner 41
  • step S3 a step of forming an organic insulating layer 92 on the substrate 10
  • the second film liner 41 and the second film liner 42 is further included, and the light-shielding film 60 is laminated on On the organic insulating layer 92.
  • the light-shielding film is exposed to the light-shielding film by using a full-tone design mask to obtain the black matrix 61, the main spacer 62 and the auxiliary spacer 63. Therefore, the The thickness of the main spacer 62 and the thickness of the auxiliary spacer 63 are the same, so that the thickness difference between the second film spacer 41 and the second film spacer 42 constitutes the main spacer 62 and the auxiliary spacer The height difference between 63.
  • the material of the light-shielding film is BPS material.
  • the present invention improves the reliability of the film pattern corresponding to the partial light-transmitting area in the gray-scale mask by adjusting the design of the gray-scale mask, effectively prevents the film from peeling, improves the process yield, and ensures the product quality.
  • the present invention provides a gray-scale photomask, which includes a light-transmitting area and a light-shielding area surrounding the light-transmitting area, and the light-transmitting area includes a first film liner arranged in sequence.
  • a light-transmitting area and a second light-transmitting area for forming a second film liner the first light-transmitting area is completely light-transmitting, and the second light-transmitting area is partially light-transmitting;
  • the thickness of the second film liner is greater than that of the second film liner, and the second light-transmitting area undergoes anti-peeling treatment, so that the thickness of the four corners of the second film liner formed by the second light-transmitting area is at least the thickness of the center 60%, by performing anti-peeling treatment on the second light-transmitting area, the film forming stability of the second film liner can be effectively improved, and the second film liner can be prevented from peeling off.
  • the present invention also provides a method for manufacturing a display substrate, which can effectively improve the film forming stability of the second film liner and prevent the second film liner from peeling off.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

一种灰阶光罩及显示基板的制作方法。所述灰阶光罩包括透光区(31)及包围所述透光区(31)的遮光区(32)，所述透光区(31)包括依次排列的用于形成第一薄膜衬垫(41)的第一透光区(311)与用于形成第二薄膜衬垫(42)的第二透光区(312)，所述第一透光区(311)完全透光，所述第二透光区(312)部分透光；所述第一薄膜衬垫(41)的厚度大于所述第二薄膜衬垫(42)，且所述第二透光区(312)经过防剥离处理，能够使得通过该第二透光区(312)形成的第二薄膜衬垫(42)的四角的厚度至少为其中心的厚度的60％，通过对第二透光区(312)进行防剥离处理，能够有效提升第二薄膜衬垫(42)的成膜稳定性，防止第二薄膜衬垫(42)剥离。

Description

灰阶光罩及显示基板的制作方法 技术领域
本发明涉及显示技术领域，尤其涉及一种灰阶光罩及显示基板的制作方法。
 背景技术
液晶显示器(Liquid Crystal Display，LCD)是目前市场上应用最为广泛的显示产品，其生产工艺技术十分成熟，产品良率高，生产成本相对较低，市场接受度高。现有市场上的液晶显示器大部分为背光型液晶显示装置，其包括液晶显示面板及背光模组。通常液晶显示面板由彩膜(Color Filter，CF)基板、阵列(Array)基板、夹于彩膜基板与阵列基板之间的液晶及密封框胶(Sealant)组成，其中，CF基板主要包括用于通过色阻单元(R/G/B) 形成有色光的彩色滤光层、用于防止像素边缘漏光的黑色矩阵(Black Matrix，BM)、以及用于维持盒厚的隔垫物(Photo Spacer，PS)，在大尺寸液晶显示面板中，通常会使用两种类型以上的隔垫物，如在CF基板上设置主隔垫物(Main PS)、及辅助隔垫物(Sub PS)，起到多级缓冲的作用，以防止各种Mura或者不良的发生。
黑色隔垫物(Black Photo Spacer，BPS)材料是一种新型材料，它既具有传统技术中隔垫物材料的特性，如较优秀的弹性回复力及对液晶较低的污染等，而且还具有黑色矩阵材料的特性，如较高的光学密度(optical density，OD)值，可以起到遮光作用，因此，能够用于将BM与PS两种工艺制程合二为一，减少一道黄光制程，减少材料成本及生产时间 (tact time)，从而降低整个生产成本。
 COA(Color Filter on Array)技术是将彩色滤光层制备在阵列基板上的技术。由于COA结构的显示面板不存在彩膜基板与阵列基板的对位问题，因此可以降低显示面板制备过程中对盒制程的难度，避免了对盒时的误差，因此黑色矩阵可以设计为窄线宽，提高了开口率。一种新型的BM-Less技术是基于COA技术上将BM与PS集合于同一BPS材料且同一制程完成并设计在Array基板上的一种技术，与传统的液晶显示技术比较，将黑色矩阵、主隔垫物、辅助隔垫物、及彩色滤光膜全部设计在阵列基板侧，这样不仅可以避免对组制程中由 于对组精度的误差，或者曲面显示技术中由于面板弯曲造成的平移带来的露光，更重要的 是节省一道材料及制程，缩短生产时间，降低了产品成本。
现有BPS型产品结构中，如图1所示，主隔垫物101和辅助隔垫物102下方使用第一薄膜衬垫201和第二薄膜衬垫202作为衬垫载台，主隔垫物101和辅助隔垫物102之间的高度差由第一薄膜衬垫201和第二薄膜衬垫202的厚度差所构成，主隔垫物101和辅助隔垫物102自身的高度则是相同的，现有技术形成第一薄膜衬垫201和第二薄膜衬垫202的一般通过灰阶光罩（Gray Tone Mask ，GTM）技术形成所述第一薄膜衬垫201和第二薄膜衬垫202的高度差，所谓灰阶光罩即为在一个光罩形成完全透光和部分透光的两种透光区，其中部分透光的透光区利用遮光条与透光狭缝交替排列形成，现有技术中灰阶光罩中的部分透光的透光区中所有遮光条及透光狭缝的宽度均相等，但在实际曝光时，由于首尾两端的透光狭缝的曝光量往往比中间的透光狭缝的曝光量小，进而导致第二薄膜衬垫202的边缘的厚度与第二薄膜衬垫202中间的厚度产生差异，甚至导致第二薄膜衬垫202的边缘出现剥离（Peeling），严重影响产品品质。
 技术问题
本发明的目的在于提供一种灰阶光罩，能够有效防止薄膜衬垫剥离，提升制程良率，保证产品质量。
本发明的目的还在于提供一种显示基板的制作方法，能够有效防止薄膜衬垫剥离，提升制程良率，保证产品质量。
 技术解决方案
为实现上述目的，本发明提供了一种灰阶光罩，其特征在于，包括透光区及包围所述透光区的遮光区，所述透光区包括依次排列的用于形成第一薄膜衬垫的第一透光区与用于形成第二薄膜衬垫的第二透光区，所述第一透光区完全透光，所述第二透光区部分透光；
所述第一薄膜衬垫的厚度大于所述第二薄膜衬垫，且所述第二透光区经过防剥离处理，能够使得通过该第二透光区形成的第二薄膜衬垫的四角的厚度至少为其中心的厚度的60%。
所述第二透光区包括依次平行排列的多个透光狭缝，相邻的两个透光狭缝之间具有遮光条；
所述防剥离处理为：设置位于首尾两端的两个透光狭缝的宽度为第一宽度，除首尾两端的两个透光狭缝以外的其他透光狭缝的宽度为第二宽度，所述第一宽度大于第二宽度，所有遮光条的宽度均相等。
所述第二透光区包括依次平行排列的多个透光狭缝，相邻的两个透光狭缝之间具有遮光条；
所述防剥离处理为：设置位于首尾两端的两个遮光条的宽度为第三宽度，除首尾两端的两个遮光条以外的其他遮光条的宽度为第四宽度，所述第三宽度小于第四宽度，所有透光狭缝的宽度均相等。
所述第二透光区包括依次平行排列的多个透光狭缝，相邻的两个透光狭缝之间具有遮光条；
所述防剥离处理为：在所述第二透光区相对的两侧分别设置两辅助透光狭缝，所述辅助透光狭缝与所述透光狭缝垂直间隔，且所述辅助透光狭缝的一端与位于首端的透光狭缝的外侧边平齐或超出，另一端与位于尾端的透光狭缝的外侧边平齐或超出。
所述第二透光区包括依次平行排列的多个透光狭缝，相邻的两个透光狭缝之间具有遮光条；
所述防剥离处理为：在所述第二透光区相对的两侧分别设置两辅助透光狭缝，所述辅助透光狭缝与所述透光狭缝垂直，且每一条透光狭缝的两端均分别对应连接至两辅助透光狭缝。
本发明提供一种显示基板的制作方法，包括如下步骤：
步骤S1、提供一基板，在所述基板上形成色阻薄膜；
步骤S2、提供一灰阶光罩，包括透光区及包围所述透光区的遮光区，所述透光区包括依次排列的的第一透光区与的第二透光区，所述第一透光区完全透光，所述第二透光区部分透光，且所述第二透光区经过防剥离处理；
步骤S3、通过所述灰阶光罩图案化所述色阻薄膜，使得所述色阻薄膜对应第一透光区的部分形成第一薄膜衬垫，对应第二透光区的部分形成第二薄膜衬垫；
其中，所述第一薄膜衬垫的厚度大于所述第二薄膜衬垫，所述第二薄膜衬垫的四角的厚度至少为其中心的厚度的60%；
步骤S4、在所述基板、第二薄膜衬垫及第二薄膜衬垫上形成遮光薄膜，图案化所述遮光薄膜形成黑色矩阵、位于第一薄膜衬垫上的黑色矩阵上的主隔垫物及位于第二薄膜衬垫上的黑色矩阵上的辅助隔垫物。
所述步骤S2中，所述第二透光区包括依次平行排列的多个透光狭缝，相邻的两个透光狭缝之间具有遮光条；
所述防剥离处理为：设置位于首尾两端的两个透光狭缝的宽度为第一宽度，除首尾两端的两个透光狭缝以外的其他透光狭缝的宽度为第二宽度，所述第一宽度大于第二宽度，所有遮光条的宽度均相等。
所述步骤S2中，所述第二透光区包括依次平行排列的多个透光狭缝，相邻的两个透光狭缝之间具有遮光条；
所述防剥离处理为：设置位于首尾两端的两个遮光条的宽度为第三宽度，除首尾两端的两个遮光条以外的其他遮光条的宽度为第四宽度，所述第三宽度小于第四宽度，所有透光狭缝的宽度均相等。
所述步骤S2中，所述第二透光区包括依次平行排列的多个透光狭缝，相邻的两个透光狭缝之间具有遮光条；
所述防剥离处理为：在所述第二透光区相对的两侧分别设置两辅助透光狭缝，所述辅助透光狭缝与所述透光狭缝垂直间隔，且所述辅助透光狭缝的一端与位于首端的透光狭缝的外侧边平齐或超出，另一端与位于尾端的透光狭缝的外侧边平齐或超出。
所述步骤S2中，所述第二透光区包括依次平行排列的多个透光狭缝，相邻的两个透光狭缝之间具有遮光条；
所述防剥离处理为：在所述第二透光区相对的两侧分别设置两辅助透光狭缝，所述辅助透光狭缝与所述透光狭缝垂直，且每一条透光狭缝的两端均分别对应连接至两辅助透光狭缝。
 有益效果
本发明的有益效果：本发明提供了一种灰阶光罩，包括透光区及包围所述透光区的遮光区，所述透光区包括依次排列的用于形成第一薄膜衬垫的第一透光区与用于形成第二薄膜衬垫的第二透光区，所述第一透光区完全透光，所述第二透光区部分透光；所述第一薄膜衬垫的厚度大于所述第二薄膜衬垫，且所述第二透光区经过防剥离处理，能够使得通过该第二透光区形成的第二薄膜衬垫的四角的厚度至少为其中心的厚度的60%，通过对第二透光区进行防剥离处理，能够有效提升第二薄膜衬垫的成膜稳定性，防止第二薄膜衬垫剥离。本发明还提供一种显示基板的制作方法，能够有效提升第二薄膜衬垫的成膜稳定性，防止第二薄膜衬垫剥离。
 附图说明
为了能更进一步了解本发明的特征以及技术内容，请参阅以下有关本发明的详细说明与附图，然而附图仅提供参考与说明用，并非用来对本发明加以限制。
附图中，
图1为现有的BPS基板的示意图；
图2为本发明的灰阶光罩的第一实施例的示意图；
图3为本发明的灰阶光罩的第二实施例的示意图；
图4为本发明的灰阶光罩的第三实施例的示意图；
图5为本发明的灰阶光罩的第四实施例的示意图；
图6为本发明的显示基板的制作方法的流程图；
图7为本发明的显示基板的制作方法制得的显示基板的示意图。
 本发明的实施方式
为更进一步阐述本发明所采取的技术手段及其效果，以下结合本发明的优选实施例及其附图进行详细描述。
请参阅图2至图5、本发明提供一种灰阶光罩，包括透光区31及包围所述透光区31的遮光区32，所述透光区31包括依次排列的用于形成第一薄膜衬垫41的第一透光区311与用于形成第二薄膜衬垫42的第二透光区312，所述第一透光区311完全透光，所述第二透光区312部分透光；
所述第一薄膜衬垫41的厚度大于所述第二薄膜衬垫42，且所述第二透光区312经过防剥离处理，能够使得通过该第二透光区312形成的第二薄膜衬垫42的四角的厚度至少为其中心的厚度的60%。
具体地，如图2所示，在本发明的第一实施例中，所述第二透光区312包括依次平行排列的多个透光狭缝51a，相邻的两个透光狭缝51a之间具有遮光条52a；
所述防剥离处理为：设置位于首尾两端的两个透光狭缝51a的宽度为第一宽度，除首尾两端的两个透光狭缝51a以外的其他透光狭缝51a的宽度为第二宽度，所述第一宽度大于第二宽度，所有遮光条52a的宽度均相等。
需要说明的是，本发明的第一实施例相比于现有技术，首尾两端的两个透光狭缝51a的宽度增大，在曝光时，第二透光区312边缘的受光面积增大，从而第二薄膜衬垫42的边缘厚度增加，通过该设置能够使得通过该第二透光区312形成的第二薄膜衬垫42的四角的厚度至少为其中心的厚度的60%，对应到该第一实施例中，所述第二薄膜衬垫42不仅四角的厚度得到增加，而且第二薄膜衬垫42的左右两侧边缘的厚度均得到了增加，也即在该第一实施例中，第二薄膜衬垫42的两侧边缘的厚度至少为其中心的厚度的60%，能够有效提升第二薄膜衬垫42的成膜强度，防止第二薄膜衬垫42剥落。
具体地，如图3所示，在本发明的第二实施例中，所述第二透光区312包括依次平行排列的多个透光狭缝51b，相邻的两个透光狭缝51b之间具有遮光条52b；
所述防剥离处理为：设置位于首尾两端的两个遮光条52b的宽度为第三宽度，除首尾两端的两个遮光条52b以外的其他遮光条52b的宽度为第四宽度，所述第三宽度小于第四宽度，所有透光狭缝51b的宽度均相等。
需要说明的是，本发明的第二实施例相比于现有技术，首尾两端的两个遮光条52b的宽度减少，在曝光时，该两个遮光条52b两侧的透光狭缝51b叠加产生的受光强度增大，从而第二薄膜衬垫42的边缘厚度增加，通过该设置能够使得通过该第二透光区312形成的第二薄膜衬垫42的四角的厚度至少为其中心的厚度的60%，对应到该第二实施例中，所述第二薄膜衬垫42不仅四角的厚度得到增加，而且第二薄膜衬垫42的左右两侧边缘的厚度均得到了增加，也即在该第一实施例中，第二薄膜衬垫42的两侧边缘的厚度至少为其中心的厚度的60%，能够有效提升第二薄膜衬垫42的成膜强度，防止第二薄膜衬垫42剥落。
具体地，如图4所示，在本发明的第三实施例中，所述第二透光区312包括依次平行排列的多个透光狭缝51c，相邻的两个透光狭缝51c之间具有遮光条52c；
所述防剥离处理为：在所述第二透光区312相对的两侧分别设置两辅助透光狭缝53c，所述辅助透光狭缝53c与所述透光狭缝51c垂直间隔，且所述辅助透光狭缝53c的一端与位于首端的透光狭缝51c的外侧边平齐或超出，另一端与位于尾端的透光狭缝51c的外侧边平齐或超出。
需要说明的是，本发明的第三实施例相比于现有技术，在透光狭缝51c的上下两端分别设置垂直与所述透光狭缝51c的辅助透光狭缝53c，通过所述辅助透光狭缝53c曝光形成横向的封口设计，同时增强第二透光区312的四角的受光强度，能够使得通过该第二透光区312形成的第二薄膜衬垫42的四角的厚度至少为其中心的厚度的60%，并且利用横向的封口设计，形成一锁扣式结构，能够有效提升第二薄膜衬垫42的成膜强度，防止第二薄膜衬垫42剥落。
具体地，如图5所示，在本发明的第四实施例中，所述第二透光区312包括依次平行排列的多个透光狭缝51d，相邻的两个透光狭缝51d之间具有遮光条52d；所述防剥离处理为：在所述第二透光区312相对的两侧分别设置两辅助透光狭缝53d，所述辅助透光狭缝53d与所述透光狭缝51d垂直，且每一条透光狭缝51d的两端均分别对应连接至两辅助透光狭缝53d。
需要说明的是，本发明的第四实施例与第三实施例的作用原理与第三实施例相同，区域仅在于辅助透光狭缝53d与所述透光狭缝51d从间隔变为相连。
值得一提是，本发明通过上述第一至第四实施例所述的防剥离处理，能够有效经过灰阶光罩的部分透光区（Slit Mask）形成的薄膜衬垫的边缘强度，防止薄膜衬垫的边缘出现剥离，保证制程良率。
请参阅图6及图7，基于上述的灰阶光罩，本发明还提供采用上述灰阶光罩进行图案化制程的显示基板的制作方法，该方法具体包括如下步骤：
步骤S1、提供一基板10，在所述基板10上形成色阻薄膜20。
优选地，显示基板为COA基板，所述基板10包括衬底基板11、设于所述衬底基板11上的TFT层91，所述TFT层91的结构可以根据需要进行设计，典型的TFT层91结构可以包括层叠设置的第一金属层、第一绝缘层、有源层、第二绝缘层、第二金属层及保护层等。
步骤S2、提供一灰阶光罩，包括透光区31及包围所述透光区31的遮光区32，所述透光区31包括依次排列的的第一透光区311与的第二透光区312，所述第一透光区311完全透光，所述第二透光区312部分透光，且所述第二透光区312经过防剥离处理；
步骤S3、通过所述灰阶光罩图案化所述色阻薄膜20，使得所述色阻薄膜20对应第一透光区311的部分形成第一薄膜衬垫41，对应第二透光区312的部分形成第二薄膜衬垫42；其中，所述第一薄膜衬垫41的厚度大于所述第二薄膜衬垫42，所述第二薄膜衬垫42的四角的厚度至少为其中心的厚度的60%。
具体地，如图2所示，在本发明的第一实施例中，所述第二透光区312包括依次平行排列的多个透光狭缝51a，相邻的两个透光狭缝51a之间具有遮光条52a；
所述防剥离处理为：设置位于首尾两端的两个透光狭缝51a的宽度为第一宽度，除首尾两端的两个透光狭缝51a以外的其他透光狭缝51a的宽度为第二宽度，所述第一宽度大于第二宽度，所有遮光条52a的宽度均相等。
需要说明的是，本发明的第一实施例相比于现有技术，首尾两端的两个透光狭缝51a的宽度增大，在曝光时，第二透光区312边缘的受光面积增大，从而第二薄膜衬垫42的边缘厚度增加，通过该设置能够使得通过该第二透光区312形成的第二薄膜衬垫42的四角的厚度至少为其中心的厚度的60%，对应到该第一实施例中，所述第二薄膜衬垫42不仅四角的厚度得到增加，而且第二薄膜衬垫42的左右两侧边缘的厚度均得到了增加，也即在该第一实施例中，第二薄膜衬垫42的两侧边缘的厚度至少为其中心的厚度的60%，能够有效提升第二薄膜衬垫42的成膜强度，防止第二薄膜衬垫42剥落。
具体地，如图3所示，在本发明的第二实施例中，所述第二透光区312包括依次平行排列的多个透光狭缝51b，相邻的两个透光狭缝51b之间具有遮光条52b；
所述防剥离处理为：设置位于首尾两端的两个遮光条52b的宽度为第三宽度，除首尾两端的两个遮光条52b以外的其他遮光条52b的宽度为第四宽度，所述第三宽度小于第四宽度，所有透光狭缝51b的宽度均相等。
需要说明的是，本发明的第二实施例相比于现有技术，首尾两端的两个遮光条52b的宽度减少，在曝光时，该两个遮光条52b两侧的透光狭缝51b叠加产生的受光强度增大，从而第二薄膜衬垫42的边缘厚度增加，通过该设置能够使得通过该第二透光区312形成的第二薄膜衬垫42的四角的厚度至少为其中心的厚度的60%，对应到该第二实施例中，所述第二薄膜衬垫42不仅四角的厚度得到增加，而且第二薄膜衬垫42的左右两侧边缘的厚度均得到了增加，也即在该第一实施例中，第二薄膜衬垫42的两侧边缘的厚度至少为其中心的厚度的60%，能够有效提升第二薄膜衬垫42的成膜强度，防止第二薄膜衬垫42剥落。
具体地，如图4所示，在本发明的第三实施例中，所述第二透光区312包括依次平行排列的多个透光狭缝51c，相邻的两个透光狭缝51c之间具有遮光条52c；
所述防剥离处理为：在所述第二透光区312相对的两侧分别设置两辅助透光狭缝53c，所述辅助透光狭缝53c与所述透光狭缝51c垂直间隔，且所述辅助透光狭缝53c的一端与位于首端的透光狭缝51c的外侧边平齐或超出，另一端与位于尾端的透光狭缝51c的外侧边平齐或超出，优选所述辅助透光狭缝53c的一端与位于首端的透光狭缝51c的外侧边平齐，另一端与位于尾端的透光狭缝51c的外侧边平齐。
需要说明的是，本发明的第三实施例相比于现有技术，在透光狭缝51c的上下两端分别设置垂直与所述透光狭缝51c的辅助透光狭缝53c，通过所述辅助透光狭缝53c曝光形成横向的封口设计，同时增强第二透光区312的四角的受光强度，能够使得通过该第二透光区312形成的第二薄膜衬垫42的四角的厚度至少为其中心的厚度的60%，并且利用横向的封口设计，形成一锁扣式结构，能够有效提升第二薄膜衬垫42的成膜强度，防止第二薄膜衬垫42剥落。
具体地，如图5所示，在本发明的第四实施例中，所述第二透光区312包括依次平行排列的多个透光狭缝51d，相邻的两个透光狭缝51d之间具有遮光条52d；所述防剥离处理为：在所述第二透光区312相对的两侧分别设置两辅助透光狭缝53d，所述辅助透光狭缝53d与所述透光狭缝51d垂直，且每一条透光狭缝51的两端均分别对应连接至两辅助透光狭缝53d。
需要说明的是，本发明的第四实施例与第三实施例的作用原理与第三实施例相同，区域仅在于辅助透光狭缝与所述透光狭缝从间隔变为相连。
值得一提是，本发明通过上述第一至第四实施例所述的防剥离处理，能够有效经过灰阶光罩的部分透光区（Slit Mask）形成的薄膜衬垫的边缘强度，防止薄膜衬垫的边缘出现剥离，保证制程良率。
步骤S4、在所述基板10、第二薄膜衬垫41及第二薄膜衬垫42上形成遮光薄膜60，图案化所述遮光薄膜60形成黑色矩阵61、位于第一薄膜衬垫41上的黑色矩阵61上的主隔垫物62及位于第二薄膜衬垫42上的黑色矩阵61上的辅助隔垫物63。
进一步地，在所述步骤S3和步骤S4之间还包括在所述基板10、第二薄膜衬垫41及第二薄膜衬垫42上形成有机绝缘层92的步骤，所述遮光薄膜60层叠于所述有机绝缘层92上。
具体地，所述步骤S4中，利用全透式（Full tone）设计的光罩对所述遮光薄膜进行曝光而得到黑色矩阵61、主隔垫物62与辅助隔垫物63，因此，所述主隔垫物62的厚度与辅助隔垫物63的厚度均相同，使所述第二薄膜衬垫41及第二薄膜衬垫42的厚度差构成所述主隔垫物62与辅助隔垫物63之间的高度差。
优选地，所述遮光薄膜的材料为BPS材料。
进而，本发明通过调整灰阶光罩的设计，改善灰阶光罩中由部分透光区域对应形成的薄膜图案的可靠性，有效防止薄膜剥离，提升制程良率，保证产品质量。
综上所述，本发明提供了一种灰阶光罩，包括透光区及包围所述透光区的遮光区，所述透光区包括依次排列的用于形成第一薄膜衬垫的第一透光区与用于形成第二薄膜衬垫的第二透光区，所述第一透光区完全透光，所述第二透光区部分透光；所述第一薄膜衬垫的厚度大于所述第二薄膜衬垫，且所述第二透光区经过防剥离处理，能够使得通过该第二透光区形成的第二薄膜衬垫的四角的厚度至少为其中心的厚度的60%，通过对第二透光区进行防剥离处理，能够有效提升第二薄膜衬垫的成膜稳定性，防止第二薄膜衬垫剥离。本发明还提供一种显示基板的制作方法，能够有效提升第二薄膜衬垫的成膜稳定性，防止第二薄膜衬垫剥离。
以上所述，对于本领域的普通技术人员来说，可以根据本发明的技术方案和技术构思作出其他各种相应的改变和变形，而所有这些改变和变形都应属于本发明权利要求的保护范围。

Claims (10)

  1. 一种灰阶光罩，包括透光区及包围所述透光区的遮光区，所述透光区包括依次排列的用于形成第一薄膜衬垫的第一透光区与用于形成第二薄膜衬垫的第二透光区，所述第一透光区完全透光，所述第二透光区部分透光；
    所述第一薄膜衬垫的厚度大于所述第二薄膜衬垫，且所述第二透光区经过防剥离处理，能够使得通过该第二透光区形成的第二薄膜衬垫的四角的厚度至少为其中心的厚度的60%。
  2. 如权利要求1所述的灰阶光罩，其中，所述第二透光区包括依次平行排列的多个透光狭缝，相邻的两个透光狭缝之间具有遮光条；
    所述防剥离处理为：设置位于首尾两端的两个透光狭缝的宽度为第一宽度，除首尾两端的两个透光狭缝以外的其他透光狭缝的宽度为第二宽度，所述第一宽度大于第二宽度，所有遮光条的宽度均相等。
  3. 如权利要求1所述的灰阶光罩，其中，所述第二透光区包括依次平行排列的多个透光狭缝，相邻的两个透光狭缝之间具有遮光条；
    所述防剥离处理为：设置位于首尾两端的两个遮光条的宽度为第三宽度，除首尾两端的两个遮光条以外的其他遮光条的宽度为第四宽度，所述第三宽度小于第四宽度，所有透光狭缝的宽度均相等。
  4. 如权利要求1所述的灰阶光罩，其中，所述第二透光区包括依次平行排列的多个透光狭缝，相邻的两个透光狭缝之间具有遮光条；
    所述防剥离处理为：在所述第二透光区相对的两侧分别设置两辅助透光狭缝，所述辅助透光狭缝与所述透光狭缝垂直间隔，且所述辅助透光狭缝的一端与位于首端的透光狭缝的外侧边平齐或超出，另一端与位于尾端的透光狭缝的外侧边平齐或超出。
  5. 如权利要求1所述的灰阶光罩，其中，所述第二透光区包括依次平行排列的多个透光狭缝，相邻的两个透光狭缝之间具有遮光条；
    所述防剥离处理为：在所述第二透光区相对的两侧分别设置两辅助透光狭缝，所述辅助透光狭缝与所述透光狭缝垂直，且每一条透光狭缝的两端均分别对应连接至两辅助透光狭缝。
  6. 一种显示基板的制作方法，包括如下步骤：
    步骤S1、提供一基板，在所述基板上形成色阻薄膜；
    步骤S2、提供一灰阶光罩，包括透光区及包围所述透光区的遮光区，所述透光区包括依次排列的的第一透光区与的第二透光区，所述第一透光区完全透光，所述第二透光区部分透光，且所述第二透光区经过防剥离处理；
    步骤S3、通过所述灰阶光罩图案化所述色阻薄膜，使得所述色阻薄膜对应第一透光区的部分形成第一薄膜衬垫，对应第二透光区的部分形成第二薄膜衬垫；
    其中，所述第一薄膜衬垫的厚度大于所述第二薄膜衬垫，所述第二薄膜衬垫的四角的厚度至少为其中心的厚度的60%；
    步骤S4、在所述基板、第二薄膜衬垫及第二薄膜衬垫上形成遮光薄膜，图案化所述遮光薄膜形成黑色矩阵、位于第一薄膜衬垫上的黑色矩阵上的主隔垫物及位于第二薄膜衬垫上的黑色矩阵上的辅助隔垫物。
  7. 如权利要求6所述的显示基板的制作方法，其中，所述步骤S2中，所述第二透光区包括依次平行排列的多个透光狭缝，相邻的两个透光狭缝之间具有遮光条；
    所述防剥离处理为：设置位于首尾两端的两个透光狭缝的宽度为第一宽度，除首尾两端的两个透光狭缝以外的其他透光狭缝的宽度为第二宽度，所述第一宽度大于第二宽度，所有遮光条的宽度均相等。
  8. 如权利要求6所述的显示基板的制作方法，其中，所述步骤S2中，所述第二透光区包括依次平行排列的多个透光狭缝，相邻的两个透光狭缝之间具有遮光条；
    所述防剥离处理为：设置位于首尾两端的两个遮光条的宽度为第三宽度，除首尾两端的两个遮光条以外的其他遮光条的宽度为第四宽度，所述第三宽度小于第四宽度，所有透光狭缝的宽度均相等。
  9. 如权利要求6所述的显示基板的制作方法，其中，所述步骤S2中，所述第二透光区包括依次平行排列的多个透光狭缝，相邻的两个透光狭缝之间具有遮光条；
    所述防剥离处理为：在所述第二透光区相对的两侧分别设置两辅助透光狭缝，所述辅助透光狭缝与所述透光狭缝垂直间隔，且所述辅助透光狭缝的一端与位于首端的透光狭缝的外侧边平齐或超出，另一端与位于尾端的透光狭缝的外侧边平齐或超出。
  10. 如权利要求6所述的显示基板的制作方法，其中，所述步骤S2中，所述第二透光区包括依次平行排列的多个透光狭缝，相邻的两个透光狭缝之间具有遮光条；
    所述防剥离处理为：在所述第二透光区相对的两侧分别设置两辅助透光狭缝，所述辅助透光狭缝与所述透光狭缝垂直，且每一条透光狭缝的两端均分别对应连接至两辅助透光狭缝。
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