WO2016044986A1 - Etching equipment, developing equipment, cleaning equipment and film removing equipment, spray processing equipment and method - Google Patents

Abstract

Disclosed are an etching equipment, developing equipment, cleaning equipment and film removing equipment, and spray processing equipment and method. The spray processing equipment comprises a support device and a spray device. The support device is used for supporting a base material to be processed, and a support plane of the support device is obliquely arranged relative to the horizontal plane so that the base material is inclined relative to the horizontal plane by a pre-set angle; and the spray device is used for spraying a processing liquid onto the base material arranged obliquely. By the above-mentioned method, the present invention can improve the uniformity for processing the base material through the processing liquid.

Description

Etching, developing, cleaning, and film removing equipment, spray processing equipment and method

[Technical Field]

The invention relates to the field of spray treatment technology, in particular to an etching, developing, cleaning and film removing device, a shower processing device and a method.

 【Background technique】

The existing spray treatment equipment usually chemically reacts or cleans the horizontally moving material by spraying the treatment liquid downward, and the treatment liquid forms a water film on the horizontally moving substrate due to gravity, hindering the new treatment liquid and The contact of the material causes a "pool effect" on the upper surface, so that the sprayed liquid cannot be directly sprayed onto the horizontally moving substrate, causing chemical reaction or uneven cleaning.

Therefore, there is a need to provide an etching, developing, cleaning, and fading apparatus, a shower processing apparatus, and a method to solve the above problems.

 [Summary of the Invention]

The technical problem to be solved by the present invention is to provide an etching, developing, cleaning, and film-removing device, a shower processing device and a method, which can prevent the treatment liquid reacted with the substrate from blocking the reaction between the new treatment liquid and the substrate, and can improve The treatment liquid treats the uniformity of the substrate.

In order to solve the above technical problem, a technical solution adopted by the present invention is to provide a spray processing apparatus including a supporting device and a spraying device, the supporting device for supporting a substrate to be processed, and a supporting device The support plane is disposed obliquely with respect to the horizontal plane such that the substrate is inclined at a predetermined angle from the horizontal plane; the shower device is used to spray the treatment liquid onto the inclined substrate.

Among them, the supporting device is provided with a conveying mechanism for conveying the substrate.

Wherein, the conveying mechanism comprises a plurality of rollers rotating by power driving.

There is a gap between the rollers, and the treatment liquid sprayed by the shower device is sprayed onto the substrate through the gap.

Wherein, the supporting device has an integral supporting plane supporting substrate.

Wherein, the spraying device is disposed on both sides of the supporting device.

Wherein, the supporting device further comprises an angle adjusting device for adjusting the tilting angle of the supporting plane.

The angle between the support plane and the horizontal plane is 2 to 70 degrees.

The angle between the support plane and the horizontal plane is 3 to 10 degrees.

Wherein, the spraying device is arranged in parallel with the supporting device, and the direction in which the spraying device sprays the processing liquid is perpendicular to the surface of the substrate supported by the supporting device.

Among them, the sprinkler is horizontally set.

Wherein the support device is rotatable about a normal direction of the support plane.

Wherein, the supporting device comprises at least two sub-supporting devices, the sprinkling device comprises at least two sub-spraying devices, and each of the sub-supporting devices is correspondingly provided with at least one sub-spraying device.

Wherein the supporting plane of at least one of the sub-supporting devices is inclined with respect to the horizontal plane.

Wherein the two support planes of the at least two sub-support devices intersect.

Wherein the two support planes of the at least two sub-support devices are symmetrically arranged with respect to the same vertical plane.

Wherein, the two supporting planes of the at least two sub-supporting devices are arranged in parallel or coplanar.

Wherein, at least one of the sub-supporting devices is provided with a sub-spraying device on both sides thereof.

Wherein, each of the sub-supporting devices is provided with an angle adjusting device for adjusting the inclination angle of the supporting plane of the sub-supporting device.

Wherein, the spray processing device includes an angle adjusting device that simultaneously adjusts the tilt angle of each of the sub-support devices.

Wherein, at least one of the sub-supporting devices has an angle of support between the support plane and the horizontal plane of 2° to 70°.

Wherein, at least one of the sub-supporting devices has an angle of support between the support plane and the horizontal plane of 3° to 10°.

Wherein at least one sub-spray device is disposed in parallel with the at least one sub-support device, and the sub-sprinkler device ejects the treatment liquid in a direction perpendicular to the surface of the substrate on the sub-support plane.

Among them, at least one sub-sprinkler is horizontally disposed.

In order to solve the above technical problem, another technical solution adopted by the present invention is to provide an etching apparatus including a supporting device and a spraying device for supporting a substrate to be processed, and the supporting device supporting plane is opposite The horizontal plane is slanted so that the substrate is inclined at a predetermined angle to the horizontal plane; the shower device is used to spray the etchant onto the obliquely disposed substrate.

In order to solve the above technical problem, another technical solution adopted by the present invention is to provide a developing device including a supporting device and a spraying device for supporting a substrate to be processed, and a supporting plane of the supporting device is opposite The horizontal plane is inclined such that the substrate is inclined at a predetermined angle to the horizontal plane; the shower device is used to spray the developer onto the inclined substrate.

In order to solve the above technical problem, another technical solution adopted by the present invention is to provide a cleaning device including a supporting device and a spraying device, the supporting device for supporting the substrate to be processed, and the supporting plane of the supporting device The substrate is inclined with respect to the horizontal plane so that the substrate is inclined at a predetermined angle from the horizontal plane; the shower device is used to spray the cleaning liquid onto the inclined substrate.

In order to solve the above technical problem, another technical solution adopted by the present invention is to provide a film removing device including a supporting device and a spraying device, the supporting device for supporting the substrate to be processed, and the supporting device The support plane is disposed obliquely with respect to the horizontal plane such that the substrate is inclined at a predetermined angle to the horizontal plane; the shower device is configured to spray the fading liquid onto the inclined substrate.

In order to solve the above technical problem, another technical solution adopted by the present invention is to provide a spray processing method, which comprises: placing a substrate to be treated on a support device inclined on a support plane to make a base The material is inclined at a predetermined angle from the horizontal plane; the treatment liquid is sprayed onto the inclined substrate by means of a shower device.

Wherein, the method further comprises: when the spraying device sprays the processing liquid onto the substrate, the substrate is transported by the conveying mechanism of the supporting device to drive the substrate to be transferred from the inlet of the shower room to the outlet of the shower room.

Wherein, spraying the treatment liquid onto the inclined substrate by the shower device comprises: spraying the treatment liquid from the both sides of the substrate to the inclined substrate by the shower device.

Wherein, the supporting plane of the supporting device supporting the substrate is inclined by 2° to 70° with respect to the horizontal plane.

Wherein, the supporting plane of the supporting device supporting the substrate is inclined by 3° to 10° with respect to the horizontal plane.

Wherein, spraying the treatment liquid onto the inclined substrate by using the shower device comprises: spraying the treatment liquid onto the substrate disposed obliquely at an angle perpendicular to the substrate by using a shower device.

Wherein, spraying the treatment liquid onto the inclined substrate by using the shower device comprises: spraying the treatment liquid onto the inclined substrate by using a shower device at an angle perpendicular to a horizontal plane.

Wherein the substrate to be treated is placed on the supporting device disposed obliquely on the supporting plane, the substrate to be treated is placed on the sub-supporting device at least two supporting planes of the support device; the tilting device is set to the tilting device by using the spraying device The substrate spray treatment liquid comprises: spraying the treatment liquid onto the inclined substrate by using at least two sub-spraying devices.

Wherein the placing the substrate to be treated on the at least two sub-supporting devices comprises: placing the substrate to be treated on the sub-supporting device at least one supporting plane inclined with respect to the horizontal plane. Placing the substrate to be treated on at least two sub-support devices includes placing the substrate to be treated on a sub-support device in which at least two support planes intersect.

Wherein the placing the substrate to be treated on the sub-supporting device at least two supporting planes intersecting comprises: placing the substrate to be treated on the sub-supporting device symmetrically disposed on the at least two supporting planes with respect to the same vertical plane.

Wherein, spraying the treatment liquid onto the inclined substrate by using the sub-spraying device comprises: spraying the treatment liquid onto the inclined substrate by using at least two sub-spraying devices at an angle perpendicular to the substrate or at an angle perpendicular to the horizontal plane.

Wherein, the spraying the liquid to the inclined substrate by using the sub-spraying device comprises: spraying the processing liquid to the two sides of the at least one inclined sub-supporting device by using at least two sub-spraying devices.

The invention has the beneficial effects that the invention is different from the prior art, and the invention provides a support device with a supporting plane inclination, so that the treatment liquid on the substrate can quickly flow away to avoid the “pool effect”, and the fresh treatment liquid can be kept fast and fast. The surface reaction of the material does not produce a dead angle where the treatment liquid cannot reach, thereby improving the uniformity of the treatment liquid treatment substrate.

 [Description of the Drawings]

1 is a schematic structural view of a first embodiment of a shower processing apparatus of the present invention;

Figure 1a is a schematic view of another situation in which the support device and the shower device are tilted;

Figure 2 is a schematic structural view of a second embodiment of the shower processing apparatus of the present invention;

Figure 3 is a schematic structural view of a third embodiment of the shower processing apparatus of the present invention;

Figure 4 is a schematic structural view of a fourth embodiment of the shower processing apparatus of the present invention;

Figure 5 is a schematic structural view of a fifth embodiment of the shower processing apparatus of the present invention;

Figure 6 is a flow chart of a preferred embodiment of the spray processing method of the present invention.

 【detailed description】

The invention will now be described with reference to the drawings and embodiments.

Please refer to FIG. 1. FIG. 1 is a schematic structural view of a first embodiment of a shower processing apparatus of the present invention. In the present embodiment, in the present embodiment, the shower processing apparatus includes the supporting device 10 and the shower device 11.

The support device 10 is for supporting the substrate 12 to be treated, and the support plane of the support device 10 is disposed obliquely with respect to the horizontal plane such that the substrate 12 is inclined at a predetermined angle from the horizontal plane.

The shower device 11 is for spraying the treatment liquid onto the substrate 12 which is disposed obliquely. The shower device 11 is further disposed obliquely with respect to the horizontal plane. Preferably, the shower device 11 is disposed in parallel with the support device 10, and the direction in which the shower device 11 ejects the treatment liquid is perpendicular to the surface of the substrate 12 supported by the support device 10. Of course, in other embodiments, the shower device 11 can also be horizontally disposed.

The shower device 11 includes a mounting plate 111 for fixing the shower head 112 and a shower head 112 for spraying the processing liquid. Preferably, the mounting plate 111 is disposed in parallel with the supporting plane of the supporting device 10. In other embodiments of the present invention, the mounting plate 111 and the supporting plane of the supporting device 10 may also be disposed at an angle, such as the mounting plate 111 being horizontally disposed.

Preferably, the spray treatment apparatus also includes angle adjustment means for adjusting the angle of inclination of the shower device.

Preferably, the spray treatment apparatus is provided with an adjustment device (not shown) for adjusting the rotation angle of the spray device 11, and the spray treatment device is further provided with an adjustment device for adjusting the rotation angle of the support device 10.

Preferably, the support device 10 is provided with a transport mechanism for transporting the substrate 12, i.e. the support device 10 is also used to transport the substrate 12. The conveying mechanism includes a plurality of roller shafts 101 that are rotated by power driving, and the base material 12 is supported on a support plane formed by the plurality of roller shafts 101, and is rotated by the roller shaft 101 to convey the substrate 12.

Preferably, there is a gap between the roller shafts 101, and the treatment liquid sprayed from the shower device 11 is sprayed onto the substrate 12 through the gap.

Preferably, the support device 10 has an integral support plane support substrate 12.

Preferably, the shower device 11 is provided on both sides of the support device 10.

Preferably, the support device 10 further comprises an angle adjustment device for adjusting the angle of inclination of the support plane.

Preferably, the support device 10 supports an angle between the plane and the horizontal plane of 2 to 70 degrees.

More preferably, the support device 10 supports an angle between the plane and the horizontal plane of 3 to 10 degrees.

Since the substrate 12 is supported on the support plane, the angle between the substrate 12 and the horizontal plane and the angle between the support plane of the support device 10 and the horizontal plane are equal.

Preferably, the treatment liquid is one or a combination of a developer, an etchant, a cleaning solution, and a fading liquid. For example, when the treatment liquid is a developer, the spray treatment apparatus of the present invention may be a development apparatus. When the treatment liquid is an etchant, the spray treatment apparatus of the present invention may be an etching apparatus, and when the treatment liquid is a cleaning liquid In the meantime, the shower processing apparatus of the present invention may be a cleaning apparatus. When the treatment liquid is a fading liquid, the spray treatment equipment of the present invention may be a fading equipment, of course, when there are a plurality of sub-spray devices and sub-support devices and different treatment liquids are sprayed on different sub-spray devices. The spray processing device of the present invention may also be a pipeline processing device. For example, the pipeline processing device sprays at least two of the developing solution, the etching solution, the cleaning solution, and the fading liquid in a certain order by using different sub-spraying devices. So as to achieve a pipeline process.

Preferably, the etching solution is one or more of hydrochloric acid, sodium chlorate solution, ferric chloride solution, or ammonium chloride solution. Preferably, the substrate is made of copper or stainless steel. The developer is one or more of a sodium carbonate solution or a potassium carbonate solution. In other embodiments, the substrate can also be fabricated using a photosensitive ink or dry film.

Preferably, the support device 10 is rotatable about the normal direction of the support plane.

In the present embodiment, the shower processing apparatus includes an operation surface and a non-operation surface. When the device is normally operated, the plane facing the operator is the operation surface, and the non-operation surface is a plane perpendicular to the operation surface. As shown in FIG. 1, the plane parallel to the paper surface is the operation surface, and the plane perpendicular to the paper surface is the non-operation surface. In the present embodiment, the support device 10 and the shower device 11 are preferably rotated in the plane of the operation surface. And it produces a tilt. Of course, in other embodiments, the inclination of the other case may also be referred to. Please refer to FIG. 1a further. FIG. 1a is another schematic diagram of the inclination of the supporting device and the spraying device. As shown in FIG. 1a, the plane perpendicular to the paper surface is the operation surface, and the plane parallel to the paper surface is the non-operation surface. In another case, the support device 10a and the shower device 11a are preferably rotated on the non-operation surface. Produces a tilt.

Please refer to FIG. 2. FIG. 2 is a schematic structural view of a second embodiment of the shower processing apparatus of the present invention. In the present embodiment, the shower treatment apparatus includes a support device 20 and a shower device 21.

The support device 20 is for supporting the substrate 22 to be treated, and the support device 20 supports the plane to be inclined with respect to the horizontal plane such that the substrate is inclined at a predetermined angle from the horizontal plane. The shower device 21 is for spraying the treatment liquid onto the substrate 22 which is disposed obliquely.

Preferably, the support device 20 is provided with a transport mechanism for transporting the substrate 22. The conveying mechanism comprises a plurality of rollers 201 rotated by power driving. The base material 22 is supported on a supporting plane formed by the plurality of roller shafts 201. The roller shaft 201 has two rows of upper and lower rows, and the upper and lower rows of roller shafts 201 are parallel and spaced apart. The material 22 passes between the two rows of roller shafts 201 and is rotated by the roller shaft 201 to convey the substrate 22. In the same row of roller shafts 201, two adjacent roller shafts 201 of the plurality of roller shafts 201 are spaced apart to form a plurality of gaps.

Preferably, the supporting device 20 comprises at least two sub-supporting devices 20a, 20b, the sprinkling device 21 comprises at least two sub-spraying devices 21a, 21b, and each of the sub-supporting devices 20a, 20b is correspondingly provided with at least one sub-spraying device 21a, 21b . The support planes of at least one of the sub-support devices 20a, 20b are inclined with respect to the horizontal plane.

Preferably, the support device 20 includes two sub-support devices 20a, 20b for sequentially supporting the substrate 22 when the shower device 21 sprays the same treatment liquid onto the substrate 22, and the two sub-support devices The support planes of 20a, 20b are all inclined with respect to the horizontal plane, and the inclination directions of the two are opposite to the same horizontal plane. For example, as shown in FIG. 2, the sub-supporting device 20a is inclined upward with respect to the horizontal plane, and the sub-supporting device 20b is inclined downward with respect to the horizontal plane. Of course, in other embodiments, it is also possible that the sub-supporting device 20a is inclined downward with respect to the horizontal plane, and the sub-supporting device 20b is inclined upward with respect to the horizontal plane.

Preferably, the two support planes of the at least two sub-support devices 20a, 20b intersect. In other embodiments, the two support planes of the at least two sub-support devices 20a and 20b may also be disjoint. Preferably, the two support planes of the at least two sub-support devices 20a, 20b are arranged symmetrically about the same vertical plane. Preferably, the supporting planes of the two sub-supporting devices 20a, 20b are equal to the same horizontal plane, and the angles of the supporting planes of the two sub-supporting devices are obtuse. For example, if the support planes of the two sub-support devices 20a, 20b intersect, the two intersect to form an intersection line, and there is a vertical plane through the intersection line, and the angle between the support planes of the two sub-support devices 20a, 20b and the same horizontal plane Equal, that is, the support planes of the two sub-support devices 20a, 20b are symmetrical about a vertical plane intersecting the intersection lines formed by the two; if the two sub-support devices 20a, 20b do not intersect, the extended faces of the two intersect to form an intersection line, and The intersection line also has a vertical plane, and the angles of the support planes of the two sub-support devices 20a, 20b are equal to the same horizontal plane, that is, the support planes of the two sub-support devices 20a, 20b with respect to the intersection line formed by the extended faces of the two. Vertical plane symmetry.

Preferably, in the present embodiment, the two sub-supporting devices 20a, 20b are arranged to intersect, as shown in Fig. 2, the two sub-supporting devices 20a, 20b are connected end to end.

Preferably, the angle between the supporting planes of the two sub-supporting devices 20a and 20b and the horizontal plane is determined according to the thickness of the substrate 22, and the larger the thickness of the substrate 22, the larger the angle between the adjusting supporting plane and the horizontal plane, and vice versa, the substrate 22 The smaller the thickness, the smaller the angle between the support plane and the horizontal plane. Preferably, the supporting plane of at least one of the sub-supporting devices 20a, 20b is at an angle of 2 to 70 degrees from the horizontal plane. More preferably, the angle between the support plane of at least one of the sub-supporting devices 20a, 20b and the horizontal plane is 3 to 10 degrees. In this embodiment, the angles of the support planes of the two sub-support devices 20a, 20b and the horizontal plane are both 2 to 70 degrees, and more preferably, the angles between the support planes of the two sub-support devices 20a, 20b and the horizontal plane are 3 ~10 degrees. Preferably, each of the sub-supporting devices 20a, 20b is provided with an angle adjusting device for adjusting the inclination angle of the support plane of the sub-supporting devices 20a, 20b. In other embodiments, the shower treatment apparatus may also include angle adjustment means that simultaneously adjust the angle of inclination of each of the sub-supporting devices 20a, 20b.

Preferably, the shower device 21 comprises two sub-spray devices 21a, 21b arranged corresponding to the sub-support devices 20a, 20b. For example, the sub-spraying device 21a is disposed corresponding to the sub-supporting device 20a to spray the processing liquid through the sub-spraying device 21a to the substrate 22 supported by the sub-supporting device 20a; and the sub-spraying device 21b and the sub-supporting device 20b Correspondingly, the treatment liquid is sprayed by the sub-spraying device 21b onto the substrate 22 supported by the sub-supporting device 20b.

Preferably, at least one of the sub-spraying devices 21a, 21b is disposed in parallel with the at least one sub-supporting device 20a, 20b, and the sub-spraying devices 21a, 21b eject the direction of the processing liquid and the support of the corresponding sub-supporting devices 20a, 20b The surface of the substrate 22 on the plane is vertical.

Preferably, both of the sub-spray devices 21a, 21b are disposed obliquely with respect to the horizontal plane. In other embodiments, at least one of the two sub-spray devices 21a, 21b may be horizontally disposed.

Preferably, the sub-spraying devices 21a, 21b are disposed in parallel with the supporting sub-supporting devices 20a, 20b, and the sub-spraying devices 21a, 21b eject the direction of the processing liquid and the supporting planes of the corresponding sub-supporting devices 20a, 20b. The surface of the upper substrate 22 is vertical. For example, the sub-spraying device 21a is disposed in parallel with the supporting plane of the corresponding sub-supporting device 20a, and the sub-spraying device 21b is disposed in parallel with the supporting plane of the corresponding sub-supporting device 20b. Of course, in other embodiments, the sub-spraying devices 21a, 21b may also be disposed obliquely with the corresponding sub-supporting devices 20a, 20b without being parallel to each other.

Each of the sub-spraying devices 21a or 21b includes a mounting plate 211 for fixing the showerhead 212 and a showerhead 212 for spraying the treatment liquid. Preferably, the mounting plate 211 is disposed in parallel with the corresponding sub-support device 20a or 20b.

Preferably, at least one of the sub-support devices 20a, 20b is provided with sub-spray devices 21a, 21b on both sides. More preferably, in the present embodiment, the sub-sprinklers 21a are disposed on both sides of the sub-supporting device 20a, and the sub-spraying devices 21b are disposed on both sides of the sub-supporting device 20b.

Two sub-spraying devices 21a on both sides of the sub-supporting device 20a are spaced apart and the sub-supporting device 20a and the substrate 22 are disposed between the two sub-spraying devices 21a such that the two sub-spraying devices 21a are respectively opposed to the two substrates 22 Surface spray treatment solution. Similarly, the two sub-spraying devices 21b on both sides of the sub-supporting device 20b are spaced apart and the sub-supporting device 20b and the substrate 22 are disposed between the two sub-spraying devices 21b such that the two sub-spraying devices 21b respectively face the substrate 22. The two surfaces are sprayed with a treatment solution.

Preferably, the shower treatment apparatus further includes angle adjustment means provided corresponding to each of the sub-spray devices 21a, 21b and for adjusting the inclination angle of the sub-spray devices 21a, 21b.

Preferably, the gap between the two adjacent rollers 201 corresponds to the position of the head 212 so that the treatment liquid sprayed from the head 212 can be directly sprayed onto the substrate 22 through the gap.

Preferably, the treatment liquid is one or a combination of a developer, an etchant, a cleaning solution, and a fading liquid. For example, when the treatment liquid is a developer, the spray treatment apparatus of the present invention may be a development apparatus. When the treatment liquid is an etchant, the spray treatment apparatus of the present invention may be an etching apparatus, and when the treatment liquid is a cleaning liquid In the meantime, the shower processing apparatus of the present invention may be a cleaning apparatus. When the treatment liquid is a fading liquid, the spray treatment equipment of the present invention may be a fading equipment, of course, when there are a plurality of sub-spray devices and sub-support devices and different treatment liquids are sprayed on different sub-spray devices. The spray processing device of the present invention may also be a pipeline processing device. For example, the pipeline processing device sprays at least two of the developing solution, the etching solution, the cleaning solution, and the fading liquid in a certain order by using different sub-spraying devices. So as to achieve a pipeline process.

Preferably, the etching solution is one or more of hydrochloric acid, sodium chlorate solution, ferric chloride solution, or ammonium chloride solution. Preferably, the substrate is made of copper or stainless steel. The developer is one or more of a sodium carbonate solution or a potassium carbonate solution. In other embodiments, the substrate can also be fabricated using a photosensitive ink or dry film.

It should be noted that in the present embodiment, the shower device includes only two sub-support devices, and the sprinkler device includes only two sub-spray devices corresponding to the sub-support devices, but those skilled in the art can understand that In other embodiments, the supporting device may also include more than two sub-supporting devices, and the corresponding sprinkling device may also include a number of sub-spraying devices corresponding to the sub-supporting device, and the inclined manner adopts a wave-shaped tilt, that is, The inclination directions of the adjacent two sub-support devices are opposite.

Please refer to FIG. 3. FIG. 3 is a schematic structural view of a third embodiment of the shower processing apparatus of the present invention. The third embodiment of the shower treatment apparatus of the present invention is different from the second embodiment in that, in the present embodiment, the support device 30 includes at least two sub-support devices 30a, 30b, and two sub-support devices 30a, 30b are used for The substrate 32 is sequentially supported while the shower device sprays the same treatment liquid onto the substrate. In this embodiment, the two support planes of the at least two sub-support devices 30a, 30b are arranged in parallel or coplanar. That is, the support planes of the two sub-supporting devices 30a, 30b are both inclined with respect to the horizontal plane, and the inclination directions of the two sub-surfaces are the same with respect to the same horizontal plane. For example, as shown in FIG. 3, both of the sub-supporting devices 30a, 30b are inclined upward, and of course, in other embodiments, the two sub-supporting devices 30a, 30b may also be inclined downward. Preferably, the two sub-supporting devices 30a, 30b are connected end to end, and the two supporting planes of the two sub-supporting devices 30a, 30b are coplanar, that is, the two supporting planes of the two sub-supporting devices 30a, 30b are located on the same plane. In this embodiment, the two sub-supporting devices 30a, 30b may not be connected end to end, and the two supporting planes of the two sub-supporting devices 30a, 30b are disposed in parallel with each other.

Please refer to FIG. 4. FIG. 4 is a schematic structural view of a fourth embodiment of the shower processing apparatus of the present invention. The fourth embodiment of the shower treatment apparatus of the present invention is different from the second embodiment in that, in the present embodiment, the shower device 41 includes two sub-spraying devices 41a, 41b. The two sub-spray devices 41a, 41b are horizontally disposed.

Please refer to FIG. 5. FIG. 5 is a schematic structural view of a fifth embodiment of the shower processing apparatus of the present invention. The fifth embodiment of the shower processing apparatus of the present invention is different from the second embodiment in that, in the present embodiment, the two sub-supporting devices 50a, 50b do not intersect, as shown in Fig. 5, the two sub-supporting devices 50a 50b is not connected at the beginning or the end.

Please refer to FIG. 6. FIG. 6 is a flow chart of a preferred embodiment of the spray processing method of the present invention. In this embodiment, the spray processing method includes:

Step S11: placing the substrate to be treated on a supporting device inclined on the supporting plane so that the substrate is inclined at a predetermined angle from the horizontal plane.

In step S11, the angle between the support plane of the supporting device and the horizontal plane is 2 to 70 degrees. Since the substrate is supported on the support plane, the angle between the substrate and the horizontal plane is also 2 to 70 degrees. More preferably, the angle between the supporting device supporting plane and the horizontal plane is 3 to 10 degrees. Specifically, the supporting device may be the supporting device in any of the above embodiments, and details are not described herein again.

Step S12: spraying the treatment liquid onto the inclined substrate by using a shower device.

In the step S12, the shower device may be the shower device in any of the above embodiments, and details are not described herein again.

Preferably, the spray processing method of the embodiment further comprises: when the shower device sprays the treatment liquid onto the substrate, the substrate is transported by the transport mechanism of the support device to drive the substrate from the inlet of the shower chamber to the spray. The exit of the room is transmitted.

Preferably, spraying the treatment liquid onto the inclined substrate by using the shower device comprises: spraying the treatment liquid onto the inclined substrate from both sides of the substrate by using a shower device.

Preferably, spraying the treatment liquid onto the inclined substrate by using the shower device comprises: spraying the treatment liquid onto the substrate disposed obliquely at an angle perpendicular to the substrate by using a shower device. In other embodiments, spraying the treatment liquid onto the inclined substrate by using the shower device may also include spraying the treatment liquid onto the substrate disposed obliquely at an angle perpendicular to the horizontal plane by the shower device.

Preferably, placing the substrate to be treated on the supporting device disposed obliquely on the supporting plane comprises: placing the substrate to be treated on the sub-supporting device inclined at least two supporting planes included in the supporting device; tilting with the spraying device The disposed substrate spray treatment liquid comprises: spraying the treatment liquid onto the inclined substrate by using at least two sub-spraying devices.

Preferably, placing the substrate to be treated on the at least two sub-support devices comprises: placing the substrate to be treated on the sub-support device at least one of the support planes inclined with respect to the horizontal plane. Placing the substrate to be treated on at least two sub-support devices includes placing the substrate to be treated on a sub-support device in which at least two support planes intersect. More preferably, placing the substrate to be treated on the sub-support device in which the at least two support planes are disposed includes: placing the substrate to be treated on the sub-support device symmetrically disposed on the at least two support planes with respect to the same vertical plane on.

Preferably, spraying the treatment liquid onto the inclined substrate by using the sub-spraying device comprises: spraying the treatment liquid to the inclined substrate by using at least two sub-spraying devices at an angle perpendicular to the substrate or at an angle perpendicular to the horizontal plane. .

Preferably, spraying the treatment liquid onto the inclined substrate by using the sub-spraying device comprises: spraying the treatment liquid onto the two sides of the at least one inclined sub-supporting device by using at least two sub-spraying devices.

It should be noted that the spray processing method of the present invention can be performed by using the above-described spray processing apparatus, as described in detail above.

Preferably, the shower treatment apparatus includes an operation surface opposite to the operator and a non-operation surface perpendicular to the operation surface, the support plane being rotated and tilted within the operation surface. In other embodiments, the support plane can also be rotated and tilted within the non-operating surface.

Preferably, the treatment liquid is one or a combination of a developer, an etchant, a cleaning solution, and a fading liquid. Preferably, the etching solution is one or more of hydrochloric acid, sodium chlorate solution, ferric chloride solution, or ammonium chloride solution. Preferably, the substrate is made of copper or stainless steel. The developer is one or more of a sodium carbonate solution or a potassium carbonate solution. In other embodiments, the substrate can also be fabricated using a photosensitive ink or dry film. For details, please refer to the above description.

Different from the prior art, the invention provides a support device with a supporting plane tilting, so that the treatment liquid on the substrate can quickly flow away to avoid the “pool effect”, ensuring that the fresh treatment liquid continuously reacts with the surface of the substrate continuously, and does not generate. The treatment liquid can not reach the dead angle, thereby improving the uniformity of the treatment liquid treatment substrate.

The above is only the embodiment of the present invention, and is not intended to limit the scope of the invention, and the equivalent structure or equivalent process transformations made by the description of the invention and the drawings are directly or indirectly applied to other related technologies. The fields are all included in the scope of patent protection of the present invention.

Claims (41)

1.  A shower processing apparatus, characterized in that the shower processing apparatus comprises:

   a supporting device for supporting a substrate to be processed, and a supporting plane of the supporting device is inclined with respect to a horizontal plane such that the substrate is inclined at a predetermined angle from a horizontal plane;

   a spraying device for spraying the processing liquid onto the substrate disposed obliquely.
2. A shower processing apparatus according to claim 1, wherein said supporting means is provided with a conveying mechanism for conveying a substrate.
3. A shower treatment apparatus according to claim 2, wherein said conveying mechanism comprises a plurality of rollers that are rotated by power driving.
4. The shower apparatus according to claim 3, wherein a gap is formed between the roller shafts, and the treatment liquid sprayed from the shower device is sprayed onto the substrate through the gap.
5. A shower treatment apparatus according to any one of claims 1 to 4, wherein said support means has an integral support plane for supporting said substrate.
6. A shower processing apparatus according to claim 5, wherein said supporting means is provided with a shower means on both sides thereof.
7. A shower treatment apparatus according to claim 5, wherein said supporting means further comprises angle adjusting means for adjusting the inclination angle of said support plane.
8. The shower processing apparatus according to claim 5, wherein the angle between the support plane and the horizontal plane is 2 to 70 degrees.
9. The shower processing apparatus according to claim 8, wherein the angle between the support plane and the horizontal plane is 3 to 10 degrees.
10. The shower processing apparatus according to claim 5, wherein the shower device is disposed in parallel with the supporting device, and the direction in which the shower device ejects the processing liquid and the substrate supported by the supporting device The surface is vertical.
11. A shower treatment apparatus according to claim 5, wherein said shower means is horizontally disposed.
12. A shower processing apparatus according to claim 5, wherein said supporting means is rotatable about a normal direction of said support plane.
13. A shower processing apparatus according to any one of claims 1 to 4, wherein said supporting means comprises at least two sub-supporting means, said sprinkling means comprises at least two sub-spraying means, and each said The sub-supporting device is correspondingly provided with at least one sub-spraying device.
14. A shower treatment apparatus according to claim 13, wherein a supporting plane of at least one of said sub-supporting means is inclined with respect to a horizontal plane.
15.  A shower treatment apparatus according to claim 13 wherein the two support planes of at least two of said sub-support means intersect.
16. A shower treatment apparatus according to claim 15, wherein the two support planes of at least two of said sub-supporting means are symmetrically disposed about the same vertical plane.
17. A shower processing apparatus according to claim 13, wherein the two support planes of at least two of said sub-supporting devices are arranged in parallel or coplanar.
18. A shower treatment apparatus according to claim 13, wherein at least one of said sub-supporting devices is provided with a sub-spraying device on both sides thereof.
19. A shower treatment apparatus according to claim 13, wherein each of the sub-supporting means is provided with an angle adjusting means for adjusting the inclination angle of the support plane of the sub-supporting means.
20. A shower processing apparatus according to claim 13, wherein said shower processing apparatus includes angle adjusting means for simultaneously adjusting inclination angles of respective sub-supporting means.
21. The shower processing apparatus according to claim 13, wherein at least one of said sub-supporting means has an angle of support between the support plane and the horizontal plane of 2 to 70.
22. The shower processing apparatus according to claim 21, wherein at least one of said sub-supporting means has an angle of support between the support plane and the horizontal plane of from 3 to 10 degrees.
23. A shower treatment apparatus according to claim 13, wherein at least one of said sub-spraying means is disposed in parallel with at least one of said sub-supporting means, and said sub-sprinkler means ejects a treatment liquid in a direction and The surface of the substrate on the sub-support plane is perpendicular.
24. A shower treatment apparatus according to claim 13, wherein at least one of said sub-sprinklers is horizontally disposed.
25.  An etching apparatus, wherein the etching apparatus comprises:

    a supporting device for supporting a substrate to be processed, and the support device supporting plane is inclined with respect to a horizontal plane such that the substrate is inclined at a predetermined angle from a horizontal plane;

    a shower device for spraying an etchant onto the substrate disposed obliquely.
26. A developing device, characterized in that the developing device comprises:

    a supporting device for supporting a substrate to be processed, and a supporting plane of the supporting device is inclined with respect to a horizontal plane such that the substrate is inclined at a predetermined angle from a horizontal plane;

    a shower device for spraying a developer onto the substrate disposed obliquely.
27. A cleaning device, characterized in that the cleaning device comprises:

    a supporting device for supporting a substrate to be processed, and a supporting plane of the supporting device is inclined with respect to a horizontal plane such that the substrate is inclined at a predetermined angle from a horizontal plane;

    a spraying device for spraying a cleaning liquid onto the substrate disposed obliquely.
28. A film removing device, characterized in that the film removing device comprises:

    a supporting device for supporting a substrate to be processed, and a supporting plane of the supporting device is inclined with respect to a horizontal plane such that the substrate is inclined at a predetermined angle from a horizontal plane;

    a shower device for spraying a fading liquid onto the substrate disposed obliquely.
29.  A spray treatment method, characterized in that the spray treatment method comprises:

    Place the substrate to be treated on a supporting device inclined on the supporting plane so that the substrate is inclined at a predetermined angle from the horizontal plane;

    The treatment liquid is sprayed onto the substrate provided obliquely by a shower device.
30. The shower processing method according to claim 29, wherein the method further comprises:

    When the shower device sprays the treatment liquid onto the substrate, the substrate is transported by the transport mechanism of the support device to drive the substrate from the inlet of the shower chamber to the outlet of the shower chamber.
31. The shower processing method according to claim 29, wherein the spraying of the processing liquid onto the substrate disposed obliquely by the shower device comprises:

    The shower liquid is sprayed from the both sides of the substrate to the substrate disposed obliquely by the shower device.
32. The shower processing method according to any one of claims 29 to 31, characterized in that the support plane of the supporting means for supporting the substrate is inclined by 2 to 70 with respect to the horizontal plane.
33. The shower processing method according to any one of claims 29 to 31, characterized in that the support plane of the supporting means for supporting the substrate is inclined by 3 to 10 with respect to the horizontal plane.
34. A shower processing method according to any one of claims 29 to 31, characterized in that Spraying the treatment liquid onto the substrate disposed obliquely by using a shower device includes:

    The shower solution is sprayed onto the substrate disposed obliquely at an angle perpendicular to the substrate by the shower device.
35. The shower processing method according to any one of claims 29 to 31, wherein the spraying of the processing liquid onto the substrate disposed obliquely by the shower device comprises:

    The treatment liquid is sprayed onto the substrate disposed obliquely at an angle perpendicular to the horizontal plane by the shower device.
36. The spray processing method according to any one of claims 29 to 31, wherein the substrate to be treated is placed on the supporting device inclined on the supporting plane, and comprises:

    Place the substrate to be treated on the sub-supporting device disposed obliquely on at least two supporting planes included in the supporting device;

    Spraying the treatment liquid onto the substrate disposed obliquely by the shower device includes spraying the treatment liquid onto the inclined substrate by using at least two sub-spraying devices.
37. The spray processing method according to claim 36, wherein placing the substrate to be treated on at least two sub-support devices comprises:

    The substrate to be treated is placed on the sub-support device at least one of which is inclined relative to the horizontal plane.
38.  The spray processing method according to claim 36, wherein placing the substrate to be treated on at least two sub-support devices comprises:

    The substrate to be treated is placed on a sub-support device in which at least two support planes intersect.
39. The shower processing method according to claim 38, wherein placing the substrate to be processed on the sub-supporting device at least two supporting planes intersecting comprises:

    The substrate to be treated is placed on a sub-support device that is symmetrically disposed on at least two support planes with respect to the same vertical plane.
40. The shower processing method according to claim 36, wherein the step of treating the substrate with the sub-spraying device to the inclined substrate comprises:

    The treatment liquid is sprayed onto the substrate disposed obliquely at an angle perpendicular to the substrate or at an angle perpendicular to the horizontal plane using at least two sub-spraying devices.
41. The shower processing method according to claim 36, wherein the step of treating the substrate with the sub-spraying device to the inclined substrate comprises:

    The treatment liquid is sprayed onto at least one of the two sides of the sub-supporting device disposed obliquely by means of at least two sub-spraying devices.