WO2016031441A1 - Board internal layer chip component and embedded circuit board - Google Patents

Board internal layer chip component and embedded circuit board Download PDF

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Publication number
WO2016031441A1
WO2016031441A1 PCT/JP2015/070870 JP2015070870W WO2016031441A1 WO 2016031441 A1 WO2016031441 A1 WO 2016031441A1 JP 2015070870 W JP2015070870 W JP 2015070870W WO 2016031441 A1 WO2016031441 A1 WO 2016031441A1
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Prior art keywords
connection portion
substrate
surface connection
chip component
chip
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PCT/JP2015/070870
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French (fr)
Japanese (ja)
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松本 健太郎
秀和 唐澤
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Koa株式会社
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Publication of WO2016031441A1 publication Critical patent/WO2016031441A1/en

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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits

Definitions

  • the present invention relates to a chip component for a substrate inner layer used by being embedded in a laminated circuit board or the like, and a component built-in circuit substrate in which such a chip component is embedded in an insulating resin layer.
  • chip components such as chip resistors are mounted not only on the surface of the circuit board but also on the inner layer to increase the component mounting density. Molded circuit boards are in practical use.
  • a chip component is usually embedded in a base substrate made of an insulating resin layer, and then a laser beam is irradiated to the resin layer to form a via hole, and a copper hole is formed in the via hole.
  • a connection via made of a plating process or the like, the connection via is connected to the electrode of the chip component formed in the inner layer.
  • FIG. 10 is a cross-sectional view of the chip resistor (chip component for substrate inner layer) disclosed in Patent Document 1, and as shown in FIG. 10, this chip resistor 100 includes a rectangular parallelepiped insulating substrate 101, A pair of first internal electrodes 102 formed at both ends in the longitudinal direction on the surface of the insulating substrate 101, a resistance film 103 formed so as to straddle the first internal electrodes 102, and a part of the first internal electrodes 102 And a protective film 104 formed so as to cover the entire resistance film 103, a second internal electrode 105 formed so as to cover the exposed portion of the first internal electrode 102 and the end of the protective film 104, An end surface of the insulating substrate 101 so that the pair of third internal electrodes 106 formed at both ends in the longitudinal direction on the back surface of the insulating substrate 101 and the first to third internal electrodes 102, 105, 106 communicate with each other.
  • a pair of end faces conductive layer 107 formed, is constituted by a U-shaped cross-section
  • the first internal electrode 102 is made of an Ag—Pd-based conductor, and the resistance film 103 is made of a thick film resistor whose main component is RuO 2 or the like.
  • the protective film 104 is an insulating layer such as glass or resin. Since the protective film 104 is formed so as to cover the resistance film 103 with a part of the first internal electrode 102 exposed, the first internal electrode There is a step between the exposed portion of 102 and the end face of the protective film 104.
  • the second internal electrode 105 is made of an Ag-based conductor, and the first internal electrode 102 and the second internal electrode 105 form a surface-side internal electrode having a two-layer structure.
  • the third internal electrode 106 is made of an Ag-based conductor, and the third internal electrode 106 is formed in the same size at a position corresponding to the second internal electrode 105.
  • the end face conductive layer 107 is made of a Ni—Cr thin film formed by sputtering, and the external electrode 108 is made of a single layer of Cu plating layer or a stacked Ni plating layer and Cu plating layer.
  • FIG. 11 is a cross-sectional view of a component-embedded circuit board having the chip resistor 100 configured as described above as an inner layer.
  • the chip resistor 100 includes first to third internal electrodes 102, 105, 106 inside the external electrode 108. Etc. are schematically drawn with omission of etc.
  • the chip resistor 100 is embedded in an insulating layer 200 of a base substrate such as a laminated circuit board, and wiring patterns 201 and 202 are formed on the upper and lower surfaces of the insulating layer 200, respectively. Is provided. Of the pair of external electrodes 108 formed on the chip resistor 100, the surface of the external electrode 108 on the left side in the drawing and the wiring pattern 201 on the upper surface side are electrically connected via the connection via 203. The wiring pattern 202 on the back surface and the bottom surface is electrically connected through the connection via 204. These connection vias 203 and 204 are formed by irradiating the insulating layer 200 with laser light to form via holes, and then performing copper plating or the like in the via holes.
  • electrodes that are electrically connected to the connection vias 203 and 204 are formed on both front and back surfaces of the chip resistor 100, and the wiring of the insulating layer 200 is formed from these electrodes. Since direct connection to the patterns 201 and 202 is possible, high-density mounting can be realized as compared with the case where the upper and lower wiring patterns 201 and 202 are made conductive by connection vias penetrating the insulating layer 200.
  • the pair of external electrodes 108 provided in the chip resistor 100 are formed as wide electrodes having the same size on both the front and back surfaces, when forming the via hole by irradiating the insulating layer 200 with laser light, Even if the formation position is slightly deviated from the normal position, the electrode of the chip resistor 100 and the via hole can be reliably connected.
  • the chip resistor (chip component for substrate inner layer) 100 disclosed in Patent Document 1 includes the external electrodes 108 connected to the connection vias 203 and 204 on both the front surface and the back surface.
  • the external electrode 108 needs to be a flat surface having a large area.
  • the surface-side internal electrode has a two-layer structure of the first internal electrode 102 and the second internal electrode 105 to form a flat external electrode 108 that is wide and has no step, but the structure is complicated. As a result, there was a problem that the manufacturing cost also increased.
  • connection via 203 connected to the wiring pattern 201 on the upper surface side of the insulating layer 200 and the wiring pattern 202 on the lower surface side are provided.
  • the connection via 204 to be connected is connected to the separate external electrodes 108 of the chip resistor 100 and arranged in parallel. As shown in FIG. 11B, either of these connection vias 203 and 204 is selected. It is also conceivable to connect to one external electrode 108 and arrange it on a straight line. In that case, the other external electrode 108 becomes an unnecessary region that is not involved in the connection of the via hole. However, since the entire chip resistor 100 including the region is embedded in the insulating layer 200, the mounting region is greatly reduced. Will be hindered.
  • the present invention has been made in view of the situation of the prior art as described above, and a first object thereof is to provide an inexpensive and simple structure chip component for an inner layer of a substrate, and a second object is to provide a chip. It is an object of the present invention to provide a component-embedded circuit board suitable for high-density mounting, in which via holes can be reliably brought into contact with component electrodes.
  • a chip component for an inner layer of a substrate according to the present invention is provided on a base body having upper and lower flat surfaces, an upper surface connecting portion provided on the upper surface of the base body, and a lower surface of the base body.
  • the lower surface connecting portion, and the upper surface connecting portion and a conductive portion that conducts the lower surface connecting portion, and the upper surface connecting portion is formed as one continuous plane that occupies 80% or more of the upper surface of the base body, and
  • the lower surface connecting portion is formed as one continuous plane that occupies 80% or more of the lower surface of the base.
  • the chip component for the inner layer of the substrate thus configured, one continuous plane in which the upper surface connecting portion existing on the upper surface of the substrate and the lower surface connecting portion existing on the lower surface occupy 80% or more of the plane (upper surface or lower surface) of the substrate. Therefore, when a via hole is formed by embedding the chip component in a resin layer such as a laminated circuit board, the via hole is easily and reliably formed in the wide and flat upper surface connection portion and lower surface connection portion. Can be contacted.
  • the substrate inner layer chip component has a simple structure in which the upper surface connection portion and the lower surface connection portion provided on both surfaces of the base body are electrically connected by the conductive portion, the manufacturing process is simplified and the chip for the substrate inner layer is inexpensive. Parts can be realized.
  • a conductive plate such as copper or nichrome
  • a ceramic substrate is used as the base, an upper surface connection portion, a lower surface connection portion, etc. Can be formed at once, and a chip component for an inner layer of a substrate excellent in mass productivity can be realized.
  • the upper surface connecting portion, the lower surface connecting portion, and the conducting portion are formed by printing and baking a conductive paste, and the conducting portion is filled in a through-hole or notch formed in the ceramic substrate. Since all of the connecting portion, the lower surface connecting portion, and the conducting portion can be formed in a thick film, it is not necessary to form the conducting portion by sputtering, and the manufacturing process can be simplified.
  • the component-embedded circuit board includes a component-embedded circuit board in which a chip component is embedded in an inner layer of a base substrate made of an insulating resin layer.
  • the chip component has an upper surface connection portion and a lower surface connection portion that occupy 80% or more of the planar shape of the base, a via hole reaching the upper surface connection portion from a wiring pattern on the upper surface side, and a lower surface side Via holes reaching the lower surface connection portion from the wiring pattern are formed, and connection vias are filled in the via holes.
  • the chip component embedded in the resin layer of the base substrate has an upper surface connection portion and a lower surface connection portion that occupy 80% or more of the planar shape of the base body.
  • the via hole can be easily formed on the wide and flat upper surface connection portion and lower surface connection portion. And it can contact reliably.
  • the chip components that are the inner layer have electrodes (upper surface connection portion and lower surface connection portion) on almost the entire upper surface and lower surface of the substrate, there is almost no unnecessary area that is not involved in via hole connection, and the mounting area Can be greatly reduced.
  • a chip component for an inner layer of a substrate having a simple structure can be provided at low cost, and a via hole can be reliably brought into contact with an electrode of the chip component and is suitable for high-density mounting.
  • a substrate can be provided.
  • FIG. 2 is a cross-sectional view taken along the line II-II in FIG. It is explanatory drawing which shows the manufacturing process of this chip component. It is sectional drawing of the component built-in type circuit board by which this chip component was layered. It is a top view of the chip component for board inner layers concerning the example of a 2nd embodiment of the present invention.
  • FIG. 6 is a cross-sectional view taken along line VI-VI in FIG. 5. It is a top view of the chip component for board inner layers concerning the example of a 3rd embodiment of the present invention.
  • FIG. 8 is a cross-sectional view taken along line VIII-VIII in FIG.
  • FIG. 8 is a sectional view taken along line IX-IX in FIG. 7. It is sectional drawing of the chip component for board
  • a chip component for an inner substrate (hereinafter referred to as a chip component) 1 according to a first embodiment of the present invention includes a rectangular parallelepiped base 2 having a flat top and bottom, and a base 2, an upper surface connection portion 3 provided on the upper surface of the substrate 2, a lower surface connection portion 4 provided on the lower surface of the base 2, a conduction portion 5 that bridges the upper surface connection portion 3 and the lower surface connection portion 4, and these upper surface connection portions 3. And an external electrode 6 that covers the lower surface connection portion 4 and the conduction portion 5.
  • the substrate 2 is made of a ceramic substrate, and the substrate (ceramic substrate) 2 is obtained by dividing a large-size substrate, which will be described later, along a primary dividing groove and a secondary dividing groove extending vertically and horizontally.
  • Each of the upper surface connection portion 3 and the lower surface connection portion 4 is obtained by screen-printing an Ag-based paste, and drying and firing.
  • the upper surface connection portion 3 is one piece that occupies almost the entire area (80% or more) of the upper surface of the base 2. It is formed as a continuous plane.
  • the lower surface connecting portion 4 is formed as one continuous plane that occupies almost the entire area (80% or more) of the lower surface of the base 2, and the upper surface connecting portion 3 and the lower surface connecting portion 4 are opposed to each other with the base 2 interposed therebetween.
  • the conducting portion 5 is formed by sputtering Ni / Cr or the like on both end surfaces along the longitudinal direction of the base 2, and the upper surface connecting portion 3 and the lower surface connecting portion 4 are electrically connected by the conducting portion 5.
  • the external electrode 6 is formed by applying Cu plating, Au plating or the like on the surfaces of the upper surface connection portion 3, the lower surface connection portion 4, and the conduction portion 5, and most of the outer surface of the chip component 1 is formed by the external electrode 6. Covered.
  • FIG. 3A to 3D are plan views in the respective steps, and the right portion is a cross-sectional view corresponding thereto.
  • a large substrate 1A having a primary division groove and a secondary division groove extending in a lattice shape is prepared.
  • the front and back surfaces of the large-sized substrate 1A are partitioned into a large number of chip formation regions by these primary division grooves and secondary division grooves, and each chip formation region becomes a substrate (ceramic substrate) 2 for one piece.
  • FIG. 3 representatively shows one chip formation region, but actually, such chip formation regions are arranged in a lattice pattern.
  • both the left and right short sides of the large substrate (chip forming region) 1A are located on the primary divided groove, and the upper and lower long sides are located on the secondary divided groove.
  • a rectangular upper surface connection portion 3 is formed on the upper surface of the large-sized substrate 1A by screen-printing Ag paste on the upper and lower surfaces of the large-sized substrate 1A, and drying and firing the paste.
  • a rectangular lower surface connection portion 4 is formed on the lower surface of the large substrate 1A.
  • the upper surface connection portion 3 and the lower surface connection portion 4 extend to the primary division grooves (the left and right short sides) of the large-sized substrate 1A in order to ensure connection with the conduction portion 5 described later. In order to facilitate the dividing operation, the secondary dividing groove (upper and lower long sides) is not reached.
  • the lower surface connecting portion 4 may be formed as one continuous plane that occupies 80% or more of the planar shape of the base 2.
  • the large substrate 1A is primarily divided into strips along the primary dividing grooves to obtain a strip-shaped substrate having a width dimension between the left and right short sides of the chip formation region.
  • Ni / Cr or the like is sputtered onto the divided surface of the strip-shaped substrate 2B, thereby connecting the upper surface connection portion 3 and the lower surface connection portion 4 as shown in FIG. 3C. Part 5 is formed.
  • the strip-shaped substrate 2B is secondarily divided along the second divided grooves to obtain individual pieces (chips) having the same size as the chip component 1.
  • each chip formation region of the large-sized substrate 1 ⁇ / b> A becomes one substrate 2.
  • Cu plating, Au plating, or the like to the upper surface connection portion 3, the lower surface connection portion 4, and the conduction portion 5 of each chip alone, as shown in FIG.
  • the chip component 1 having the external electrode 6 on the end face is completed.
  • the upper surface connection portion 3 and the lower surface connection portion 4 are formed as one continuous plane that occupies 80% or more of the planar shape of the base 2, the external electrode 6 is formed on the upper surface and the lower surface of the chip component 1. Each of them has a size that occupies 80% or more.
  • FIG. 4 is a cross-sectional view of a component-embedded circuit board in which the chip component 1 configured as described above is formed as an inner layer.
  • the chip component 1 omits the upper surface connection portion 3 and the lower surface connection portion 4 inside the external electrode 6. It is drawn schematically.
  • the chip component 1 is embedded in an insulating layer 10 of a base substrate such as a laminated circuit board, and wiring patterns 11 and 12 are provided on the upper surface and the lower surface of the insulating layer 10, respectively. Yes.
  • the wiring pattern 11 on the upper surface side is electrically connected to the upper external electrode 6 that covers the upper surface connection portion 3 via the connection via 13, and the lower wiring pattern 12 covers the lower surface connection portion 4 via the connection via 14.
  • the external electrode 6 is electrically connected.
  • connection vias 13 and 14 are formed by irradiating the insulating layer 10 with laser light to form via holes and then performing copper plating or the like in the via holes.
  • the chip component 1 embedded in the resin layer 10 of the base substrate has the external electrode 6 having a size that occupies 80% or more of the upper surface and the lower surface. Even when the via hole is formed by irradiating the resin layer 10 with laser light, even if the formation position of the via hole is slightly deviated from the regular position, the wide and flat external formed on the upper surface and the lower surface of the chip part 1 The via hole can be easily and reliably brought into contact with the electrode 6. In addition, since the inner layer of the chip component 1 has the outer electrode 6 in almost the entire upper and lower surfaces, there is almost no unnecessary region not involved in the connection of the via hole, and the mounting region is greatly reduced. be able to.
  • the upper surface connecting portion 3 existing on the upper surface of the base body 2 and the lower surface connecting portion 4 existing on the lower surface of the base body 2 respectively. Since it is formed as one continuous plane that occupies 80% or more of the plane (upper surface or lower surface), when the chip component 1 is embedded in the resin layer 10 such as a laminated circuit board to form a via hole, the upper surface connection The via hole can be easily and reliably brought into contact with the wide and flat external electrode 6 covering the portion 3 and the lower surface connecting portion 4.
  • the chip component 1 has a simple structure in which the upper surface connection portion 3 and the lower surface connection portion 4 provided on the upper and lower surfaces of the base 2 are bridged by the conductive portion 5, the manufacturing process is simplified and the cost is low.
  • the chip component 1 can be realized.
  • a ceramic substrate is used as the base 2, and after the upper surface connection portion 3 and the lower surface connection portion 4 are collectively formed on the large substrate 1A made of a ceramic substrate, Since the conductive portion 5 is formed on the dividing surface of the strip-shaped substrate 2B obtained by first dividing the large-sized substrate 1A, and then a large number of strip-shaped substrates 2B can be obtained by secondary division, mass production. It is possible to realize a chip component 1 having excellent performance.
  • FIG. 5 is a plan view of a chip component (chip component for a substrate inner layer) 20 according to a second embodiment of the present invention
  • FIG. 6 is a cross-sectional view of the chip component 20, in a portion corresponding to FIGS. 1 and 2.
  • FIGS. 1 and 2 are given the same reference numerals.
  • the second embodiment is different from the first embodiment described above in that a through hole 2a in which a conducting portion 5 that bridges the upper surface connecting portion 3 and the lower surface connecting portion 4 is formed in the central portion of the base 2 is provided.
  • the rest of the configuration is basically the same. That is, a through hole 2a is formed in the central portion of the substrate 2 made of a ceramic substrate, and when the upper surface connection portion 3 and the lower surface connection portion 4 are formed by screen printing Ag-based paste on the upper and lower surfaces of the substrate 2. Then, by filling the inside of the through hole 2 a with the Ag-based paste to form the conduction part 5, the upper surface connection part 3 and the lower surface connection part 4 are made conductive by the conduction part 5.
  • the Ag-based paste that forms the conductive portion 5 does not necessarily fill the entire inside of the through-hole 2a.
  • the Ag-based paste is applied to the inner side surface of the through-hole 2a. It is also possible to form the conductive portion 5 by adhering.
  • all of the upper surface connection portion 3, the lower surface connection portion 4, and the conduction portion 5 are thick in addition to the operational effects of the first embodiment described above. Since it can be formed, there is no need to form the conductive portion 5 by sputtering, and the manufacturing process can be further simplified.
  • FIG. 7 is a plan view of a chip component (chip component for a substrate inner layer) 30 according to a third embodiment of the present invention
  • FIGS. 8 and 9 are cross-sectional views of the chip component 30, corresponding to FIGS.
  • the same reference numerals are given to the parts to be performed.
  • This third embodiment is different from the first embodiment described above in that a notch 2b in which a conducting portion 5 that bridges the upper surface connecting portion 3 and the lower surface connecting portion 4 is provided in the vicinity of the end surface of the base 2 is provided.
  • the other components are basically the same except that they are formed inside. That is, semicircular cutouts 2b are provided at both longitudinal ends of the substrate 2 made of a ceramic substrate, and Ag-based paste is screen-printed on both the upper and lower surfaces of the substrate 2 to connect the upper surface connection portion 3 and the lower surface connection portion. 4, the Ag-based paste is attached to the inner side surface of the notch 2 b to form the conductive portion 5, whereby the upper surface connecting portion 3 and the lower surface connecting portion 4 are made conductive by the conductive portion 5. ing.
  • the chip component 30 in addition to the operation and effect of the second embodiment described above, when the chip component is sucked (pickup) when the component is mounted, the through hole is formed in the suction portion. Since it becomes easy to form a continuous plane, the chip component can be picked up reliably. Further, since the notch 2b is formed at a position straddling the primary dividing groove of the large substrate 1A, the breaking stress when the large substrate 1A is divided along the primary dividing groove is reduced, and the primary dividing operation is easily performed. There is an additional effect of being able to.
  • the substrate 2 is made of Nichrome with a copper plate or Cu plating. It is also possible to use a conductive plate material such as a plate.
  • the upper and lower surfaces of the base body are the upper surface connection portion and the lower surface connection portion, and the base body itself functions as a conduction portion. Therefore, each of the upper surface connection portion and the lower surface connection portion is one continuous plane that occupies 100% of the base surface. Will be formed.

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  • Microelectronics & Electronic Packaging (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
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Abstract

Provided are an inexpensive board internal layer chip component having a simple structure and an embedded circuit board allowing a via hole to reliably make contact with an electrode of the chip component and suitable for a high-density mounting. In the embedded circuit board of the present invention, a chip component (1) buried in the resin layer (10) of a base board is equipped with: an upper surface connection portion (3) formed as one continuous plane accounting for 80 % or more of the upper surface of a substrate (2); a lower surface connection portion (4) formed as one continuous plane accounting for 80 % or more of the lower surface of the substrate (2); and a conduction portion (5) for conducting the upper surface connection portion (3) and the lower surface connection portion (4). A wiring pattern (11) provided on the upper surface of the resin layer (10) is conducted through a connection via (13) to an upper external electrode (6) covering the upper surface connection portion (3), and a wiring pattern (12) provided on the lower surface of the resin layer (10) is conducted through a connection via (14) to a lower external electrode (6) covering the lower surface connection portion (4).

Description

基板内層用チップ部品および部品内蔵型回路基板Chip component for inner layer of substrate and circuit board with built-in component
 本発明は、積層回路基板等に内蔵されて使用される基板内層用チップ部品と、そのようなチップ部品が絶縁性の樹脂層に埋め込まれている部品内蔵型回路基板に関するものである。 The present invention relates to a chip component for a substrate inner layer used by being embedded in a laminated circuit board or the like, and a component built-in circuit substrate in which such a chip component is embedded in an insulating resin layer.
 近年、電子機器の小型・軽量化や回路構成の複雑化に伴って、チップ抵抗器等のチップ部品を回路基板の表面だけでなく内層にも実装して部品実装密度を高めるようにした部品内蔵型回路基板が実用に供されている。 In recent years, as electronic devices have become smaller and lighter and the circuit configuration has become more complex, chip components such as chip resistors are mounted not only on the surface of the circuit board but also on the inner layer to increase the component mounting density. Molded circuit boards are in practical use.
 この種の部品内蔵型回路基板では、通常、絶縁性の樹脂層からなるベース基板にチップ部品を埋め込んだ後、この樹脂層にレーザ光を照射してビアホールを形成すると共に、そのビアホール内に銅メッキ処理等からなる接続ビアを形成することにより、この接続ビアと内層されたチップ部品の電極とを接続するようにしている。 In this type of component-embedded circuit board, a chip component is usually embedded in a base substrate made of an insulating resin layer, and then a laser beam is irradiated to the resin layer to form a via hole, and a copper hole is formed in the via hole. By forming a connection via made of a plating process or the like, the connection via is connected to the electrode of the chip component formed in the inner layer.
 従来より、基板内層用チップ部品であるチップ抵抗器の表面と裏面に広い面積を有する外部電極を形成し、これら表面側と裏面側の外部電極に向けてビアホールを形成することにより、内層されたチップ部品を介してベース基板の上下の配線パターン間を導通させるようにした部品内蔵型回路基板が提案されている(例えば、特許文献1参照)。 Conventionally, external electrodes having a large area are formed on the front and back surfaces of a chip resistor that is a chip component for an inner layer of a substrate, and via holes are formed toward the external electrodes on the front and back surfaces to form an inner layer. A component-embedded circuit board has been proposed in which electrical connection is made between upper and lower wiring patterns of a base substrate via a chip component (see, for example, Patent Document 1).
 図10は上記特許文献1に開示されたチップ抵抗器(基板内層用チップ部品)の断面図であり、同図に示すように、このチップ抵抗器100は、直方体形状の絶縁性基板101と、絶縁性基板101の表面における長手方向両端部に形成された一対の第1内部電極102と、これら第1内部電極102に跨るように形成された抵抗膜103と、第1内部電極102の一部を露出させると共に抵抗膜103の全体を覆うように形成された保護膜104と、第1内部電極102の露出部分と保護膜104の端部を覆うように形成された第2内部電極105と、絶縁性基板101の裏面における長手方向両端部に形成された一対の第3内部電極106と、第1ないし第3内部電極102,105,106を連通するように絶縁性基板101の端面に形成された一対の端面導電層107と、第2内部電極105と端面導電層107および第3内部電極106を連続的に被覆する断面コ字状の外部電極108とによって構成されている。 FIG. 10 is a cross-sectional view of the chip resistor (chip component for substrate inner layer) disclosed in Patent Document 1, and as shown in FIG. 10, this chip resistor 100 includes a rectangular parallelepiped insulating substrate 101, A pair of first internal electrodes 102 formed at both ends in the longitudinal direction on the surface of the insulating substrate 101, a resistance film 103 formed so as to straddle the first internal electrodes 102, and a part of the first internal electrodes 102 And a protective film 104 formed so as to cover the entire resistance film 103, a second internal electrode 105 formed so as to cover the exposed portion of the first internal electrode 102 and the end of the protective film 104, An end surface of the insulating substrate 101 so that the pair of third internal electrodes 106 formed at both ends in the longitudinal direction on the back surface of the insulating substrate 101 and the first to third internal electrodes 102, 105, 106 communicate with each other. A pair of end faces conductive layer 107 formed, is constituted by a U-shaped cross-section of the external electrodes 108 to continuously cover the second internal electrode 105 and the end surface conductive layer 107 and the third internal electrode 106.
 第1内部電極102はAg-Pd系導電体からなり、抵抗膜103はRuO等を主成分とする厚膜抵抗体からなる。保護膜104はガラスや樹脂等の絶縁層であり、この保護膜104は第1内部電極102の一部を露出させた状態で抵抗膜103を覆うように形成されているため、第1内部電極102の露出部分と保護膜104端面との間には段差が生じている。第2内部電極105はAg系導電体からなり、第1内部電極102と第2内部電極105によって2層構造の表面側内部電極が形成されている。この第2内部電極105が第1内部電極102の露出部分と保護膜104の端部を覆っているため、第2内部電極105の表面は広い平坦面となっている。第3内部電極106はAg系導電体からなり、この第3内部電極106は第2内部電極105と対応する位置に同じ大きさに形成されている。端面導電層107はスパッタリングによるNi-Cr薄膜からなり、外部電極108は単層のCuメッキ層または積層のNiメッキ層とCuメッキ層からなる。 The first internal electrode 102 is made of an Ag—Pd-based conductor, and the resistance film 103 is made of a thick film resistor whose main component is RuO 2 or the like. The protective film 104 is an insulating layer such as glass or resin. Since the protective film 104 is formed so as to cover the resistance film 103 with a part of the first internal electrode 102 exposed, the first internal electrode There is a step between the exposed portion of 102 and the end face of the protective film 104. The second internal electrode 105 is made of an Ag-based conductor, and the first internal electrode 102 and the second internal electrode 105 form a surface-side internal electrode having a two-layer structure. Since the second internal electrode 105 covers the exposed portion of the first internal electrode 102 and the end portion of the protective film 104, the surface of the second internal electrode 105 is a wide flat surface. The third internal electrode 106 is made of an Ag-based conductor, and the third internal electrode 106 is formed in the same size at a position corresponding to the second internal electrode 105. The end face conductive layer 107 is made of a Ni—Cr thin film formed by sputtering, and the external electrode 108 is made of a single layer of Cu plating layer or a stacked Ni plating layer and Cu plating layer.
 図11は上記のごとく構成されたチップ抵抗器100を内層した部品内蔵型回路基板の断面図であり、チップ抵抗器100は外部電極108の内部の第1ないし第3内部電極102,105,106等を省略して模式的に描かれている。 FIG. 11 is a cross-sectional view of a component-embedded circuit board having the chip resistor 100 configured as described above as an inner layer. The chip resistor 100 includes first to third internal electrodes 102, 105, 106 inside the external electrode 108. Etc. are schematically drawn with omission of etc.
 図11(a)に示すように、チップ抵抗器100は積層回路基板等のベース基板の絶縁層200の内部に埋め込まれており、この絶縁層200の上面と下面にはそれぞれ配線パターン201,202が設けられている。チップ抵抗器100に形成された一対の外部電極108のうち、図示左側の外部電極108の表面と上面側の配線パターン201は接続ビア203を介して導通されており、図示右側の外部電極108の裏面と下面側の配線パターン202は接続ビア204を介して導通されている。これら接続ビア203,204は、絶縁層200にレーザ光を照射してビアホールを形成した後、そのビアホール内に銅メッキ等を施すことによって形成されている。 As shown in FIG. 11A, the chip resistor 100 is embedded in an insulating layer 200 of a base substrate such as a laminated circuit board, and wiring patterns 201 and 202 are formed on the upper and lower surfaces of the insulating layer 200, respectively. Is provided. Of the pair of external electrodes 108 formed on the chip resistor 100, the surface of the external electrode 108 on the left side in the drawing and the wiring pattern 201 on the upper surface side are electrically connected via the connection via 203. The wiring pattern 202 on the back surface and the bottom surface is electrically connected through the connection via 204. These connection vias 203 and 204 are formed by irradiating the insulating layer 200 with laser light to form via holes, and then performing copper plating or the like in the via holes.
 このように構成された部品内蔵型回路基板では、接続ビア203,204と導通される電極(外部電極108)がチップ抵抗器100の表裏両面に形成されており、これら電極から絶縁層200の配線パターン201,202への直接接続が可能となるため、絶縁層200を貫通する接続ビアによって上下の配線パターン201,202を導通させる場合に比べて高密度実装を実現できる。また、チップ抵抗器100に備えられる一対の外部電極108が表裏両面で同じ大きさの広い電極として形成されているため、絶縁層200にレーザ光を照射してビアホールを形成する際に、ビアホールの形成位置が正規の位置に対して多少ずれたとしても、チップ抵抗器100の電極とビアホールとを確実に接続することができる。 In the component-embedded circuit board configured as described above, electrodes (external electrodes 108) that are electrically connected to the connection vias 203 and 204 are formed on both front and back surfaces of the chip resistor 100, and the wiring of the insulating layer 200 is formed from these electrodes. Since direct connection to the patterns 201 and 202 is possible, high-density mounting can be realized as compared with the case where the upper and lower wiring patterns 201 and 202 are made conductive by connection vias penetrating the insulating layer 200. In addition, since the pair of external electrodes 108 provided in the chip resistor 100 are formed as wide electrodes having the same size on both the front and back surfaces, when forming the via hole by irradiating the insulating layer 200 with laser light, Even if the formation position is slightly deviated from the normal position, the electrode of the chip resistor 100 and the via hole can be reliably connected.
国際公開第2013/137338号International Publication No. 2013/137338
 前述したように、特許文献1に開示されたチップ抵抗器(基板内層用チップ部品)100は、表面と裏面の両方に接続ビア203,204と導通される外部電極108を備えているが、これら外部電極108に対してビアホールを確実に接触させるためには、外部電極108が広い面積を有する平坦面である必要がある。そのため、表面側の内部電極を第1内部電極102と第2内部電極105の2層構造にすることにより、広くて段差のない平坦な外部電極108を形成するようにしているが、構造が複雑になって製造コストも上昇してしまうという問題があった。 As described above, the chip resistor (chip component for substrate inner layer) 100 disclosed in Patent Document 1 includes the external electrodes 108 connected to the connection vias 203 and 204 on both the front surface and the back surface. In order to ensure that the via hole is in contact with the external electrode 108, the external electrode 108 needs to be a flat surface having a large area. For this reason, the surface-side internal electrode has a two-layer structure of the first internal electrode 102 and the second internal electrode 105 to form a flat external electrode 108 that is wide and has no step, but the structure is complicated. As a result, there was a problem that the manufacturing cost also increased.
 また、特許文献1に開示された部品内蔵型回路基板では、図11(a)に示すように、絶縁層200の上面側の配線パターン201に接続する接続ビア203と下面側の配線パターン202に接続する接続ビア204とが、チップ抵抗器100の別々の外部電極108に接続されて平行配置となっているが、図11(b)に示すように、これら両接続ビア203,204をいずれか一方の外部電極108に接続して一直線上に配置することも考えられる。その場合、他方の外部電極108はビアホールの接続に関与しない不要な領域となるが、当該領域を含めたチップ抵抗器100の全体が絶縁層200の内部に埋め込まれるため、実装領域の大幅な低減化が妨げられてしまうことになる。 In the component built-in circuit board disclosed in Patent Document 1, as shown in FIG. 11A, the connection via 203 connected to the wiring pattern 201 on the upper surface side of the insulating layer 200 and the wiring pattern 202 on the lower surface side are provided. The connection via 204 to be connected is connected to the separate external electrodes 108 of the chip resistor 100 and arranged in parallel. As shown in FIG. 11B, either of these connection vias 203 and 204 is selected. It is also conceivable to connect to one external electrode 108 and arrange it on a straight line. In that case, the other external electrode 108 becomes an unnecessary region that is not involved in the connection of the via hole. However, since the entire chip resistor 100 including the region is embedded in the insulating layer 200, the mounting region is greatly reduced. Will be hindered.
 本発明は、このような従来技術の実情に鑑みてなされたもので、その第1の目的は、安価で単純構造の基板内層用チップ部品を提供することにあり、第2の目的は、チップ部品の電極にビアホールを確実に接触させることが可能で高密度実装に好適な部品内蔵型回路基板を提供することにある。 The present invention has been made in view of the situation of the prior art as described above, and a first object thereof is to provide an inexpensive and simple structure chip component for an inner layer of a substrate, and a second object is to provide a chip. It is an object of the present invention to provide a component-embedded circuit board suitable for high-density mounting, in which via holes can be reliably brought into contact with component electrodes.
 上記第1の目的を達成するために、本発明の基板内層用チップ部品は、上下を平坦面とした基体と、この基体の上面に設けられた上面接続部と、前記基体の下面に設けられた下面接続部と、前記上面接続部と前記下面接続部を導通する導通部とを備え、前記上面接続部が前記基体の上面の80%以上を占める1つの連続平面として形成されると共に、前記下面接続部が前記基体の下面の80%以上を占める1つの連続平面として形成されているという構成にした。 In order to achieve the first object, a chip component for an inner layer of a substrate according to the present invention is provided on a base body having upper and lower flat surfaces, an upper surface connecting portion provided on the upper surface of the base body, and a lower surface of the base body. The lower surface connecting portion, and the upper surface connecting portion and a conductive portion that conducts the lower surface connecting portion, and the upper surface connecting portion is formed as one continuous plane that occupies 80% or more of the upper surface of the base body, and The lower surface connecting portion is formed as one continuous plane that occupies 80% or more of the lower surface of the base.
 このように構成された基板内層用チップ部品は、基体の上面に存する上面接続部と下面に存する下面接続部とが、それぞれ基体の平面(上面または下面)の80%以上を占める1つの連続平面として形成されているため、該チップ部品を積層回路基板等の樹脂層の内部に埋め込んでビアホールを形成する際に、広くて平坦な上面接続部と下面接続部に対してビアホールを簡単かつ確実に接触させることができる。また、この基板内層用チップ部品は、基体の両面に設けられた上面接続部と下面接続部とを導通部によって導通するという単純構造であるため、製造工程を簡略化して安価な基板内層用チップ部品を実現することができる。 In the chip component for the inner layer of the substrate thus configured, one continuous plane in which the upper surface connecting portion existing on the upper surface of the substrate and the lower surface connecting portion existing on the lower surface occupy 80% or more of the plane (upper surface or lower surface) of the substrate. Therefore, when a via hole is formed by embedding the chip component in a resin layer such as a laminated circuit board, the via hole is easily and reliably formed in the wide and flat upper surface connection portion and lower surface connection portion. Can be contacted. In addition, since the substrate inner layer chip component has a simple structure in which the upper surface connection portion and the lower surface connection portion provided on both surfaces of the base body are electrically connected by the conductive portion, the manufacturing process is simplified and the chip for the substrate inner layer is inexpensive. Parts can be realized.
 上記の構成において、基体として銅やニクロム等の導電性板材を用いることも可能であるが、基体としてセラミックス基板を用いると、多数個取り用の大判基板に対して上面接続部や下面接続部等を一括形成することが可能となり、量産性に優れた基板内層用チップ部品を実現することができる。 In the above configuration, it is possible to use a conductive plate such as copper or nichrome as the base. However, if a ceramic substrate is used as the base, an upper surface connection portion, a lower surface connection portion, etc. Can be formed at once, and a chip component for an inner layer of a substrate excellent in mass productivity can be realized.
 この場合において、上面接続部と下面接続部および導通部が導電性ペーストを印刷・焼成したものからなり、導通部がセラミックス基板に形成された貫通孔または切欠き内に充填されていると、上面接続部と下面接続部および導通部の全てを厚膜形成することができるため、導通部をスパッタによって形成する必要がなくなって製造工程を簡略化することができる。 In this case, the upper surface connecting portion, the lower surface connecting portion, and the conducting portion are formed by printing and baking a conductive paste, and the conducting portion is filled in a through-hole or notch formed in the ceramic substrate. Since all of the connecting portion, the lower surface connecting portion, and the conducting portion can be formed in a thick film, it is not necessary to form the conducting portion by sputtering, and the manufacturing process can be simplified.
 また、上記第2の目的を達成するために、本発明の部品内蔵型回路基板は、絶縁性の樹脂層からなるベース基板の内層にチップ部品が埋め込まれている部品内蔵型回路基板において、前記チップ部品が基体の平面形状の80%以上を占める上面接続部と下面接続部とを有しており、前記ベース基板に、その上面側の配線パターンから前記上面接続部に達するビアホールと、下面側の配線パターンから前記下面接続部に達するビアホールとが穿設されていると共に、これらビアホールの内部に接続ビアが充填されているという構成にした。 In order to achieve the second object, the component-embedded circuit board according to the present invention includes a component-embedded circuit board in which a chip component is embedded in an inner layer of a base substrate made of an insulating resin layer. The chip component has an upper surface connection portion and a lower surface connection portion that occupy 80% or more of the planar shape of the base, a via hole reaching the upper surface connection portion from a wiring pattern on the upper surface side, and a lower surface side Via holes reaching the lower surface connection portion from the wiring pattern are formed, and connection vias are filled in the via holes.
 このように構成された部品内蔵型回路基板では、ベース基板の樹脂層に埋め込まれたチップ部品が基体の平面形状の80%以上を占める上面接続部と下面接続部とを有しているため、樹脂層にレーザ光を照射してビアホールを形成する際に、ビアホールの形成位置が正規の位置に対して多少ずれたとしても、広くて平坦な上面接続部と下面接続部に対してビアホールを簡単かつ確実に接触させることができる。また、内層されるチップ部品は基体の上面と下面のほぼ全域が電極(上面接続部と下面接続部)となっているため、ビアホールの接続に関与しない不要な領域はほとんど存在せず、実装領域の大幅な低減化を図ることができる。 In the component-embedded circuit board configured in this way, the chip component embedded in the resin layer of the base substrate has an upper surface connection portion and a lower surface connection portion that occupy 80% or more of the planar shape of the base body. When forming a via hole by irradiating the resin layer with laser light, even if the via hole formation position slightly deviates from the normal position, the via hole can be easily formed on the wide and flat upper surface connection portion and lower surface connection portion. And it can contact reliably. In addition, since the chip components that are the inner layer have electrodes (upper surface connection portion and lower surface connection portion) on almost the entire upper surface and lower surface of the substrate, there is almost no unnecessary area that is not involved in via hole connection, and the mounting area Can be greatly reduced.
 本発明によれば、安価で単純構造の基板内層用チップ部品を提供することができ、また、チップ部品の電極にビアホールを確実に接触させることが可能で高密度実装に好適な部品内蔵型回路基板を提供することができる。 According to the present invention, a chip component for an inner layer of a substrate having a simple structure can be provided at low cost, and a via hole can be reliably brought into contact with an electrode of the chip component and is suitable for high-density mounting. A substrate can be provided.
本発明の第1実施形態例に係る基板内層用チップ部品の平面図である。It is a top view of the chip | tip component for board | substrate inner layers which concerns on the example of 1st Embodiment of this invention. 図1のII-II線に沿う断面図である。FIG. 2 is a cross-sectional view taken along the line II-II in FIG. 該チップ部品の製造工程を示す説明図である。It is explanatory drawing which shows the manufacturing process of this chip component. 該チップ部品が内層された部品内蔵型回路基板の断面図である。It is sectional drawing of the component built-in type circuit board by which this chip component was layered. 本発明の第2実施形態例に係る基板内層用チップ部品の平面図である。It is a top view of the chip component for board inner layers concerning the example of a 2nd embodiment of the present invention. 図5のVI-VI線に沿う断面図である。FIG. 6 is a cross-sectional view taken along line VI-VI in FIG. 5. 本発明の第3実施形態例に係る基板内層用チップ部品の平面図である。It is a top view of the chip component for board inner layers concerning the example of a 3rd embodiment of the present invention. 図7のVIII-VIII線に沿う断面図である。FIG. 8 is a cross-sectional view taken along line VIII-VIII in FIG. 図7のIX-IX線に沿う断面図である。FIG. 8 is a sectional view taken along line IX-IX in FIG. 7. 従来例に係る基板内層用チップ部品の断面図である。It is sectional drawing of the chip component for board | substrate inner layers which concerns on a prior art example. 該チップ部品が内層された部品内蔵型回路基板の断面図である。It is sectional drawing of the component built-in type circuit board by which this chip component was layered.
 発明の実施の形態について図面を参照して説明する。図1と図2に示すように、本発明の第1実施形態例に係る基板内層用チップ部品(以下、チップ部品と称す)1は、上下を平坦面とした直方体形状の基体2と、基体2の上面に設けられた上面接続部3と、基体2の下面に設けられた下面接続部4と、上面接続部3と下面接続部4を橋絡する導通部5と、これら上面接続部3と下面接続部4および導通部5を覆う外部電極6とによって構成されている。 Embodiments of the invention will be described with reference to the drawings. As shown in FIGS. 1 and 2, a chip component for an inner substrate (hereinafter referred to as a chip component) 1 according to a first embodiment of the present invention includes a rectangular parallelepiped base 2 having a flat top and bottom, and a base 2, an upper surface connection portion 3 provided on the upper surface of the substrate 2, a lower surface connection portion 4 provided on the lower surface of the base 2, a conduction portion 5 that bridges the upper surface connection portion 3 and the lower surface connection portion 4, and these upper surface connection portions 3. And an external electrode 6 that covers the lower surface connection portion 4 and the conduction portion 5.
 基体2はセラミックス基板からなり、この基体(セラミックス基板)2は後述する大判基板を縦横に延びる一次分割溝と二次分割溝に沿って分割して多数個取りされたものである。 The substrate 2 is made of a ceramic substrate, and the substrate (ceramic substrate) 2 is obtained by dividing a large-size substrate, which will be described later, along a primary dividing groove and a secondary dividing groove extending vertically and horizontally.
 上面接続部3と下面接続部4はいずれもAg系ペーストをスクリーン印刷して乾燥・焼成させたものであり、上面接続部3は基体2の上面におけるほぼ全域(80%以上)を占める1つの連続平面として形成されている。下面接続部4は基体2の下面におけるほぼ全域(80%以上)を占める1つの連続平面として形成されており、これら上面接続部3と下面接続部4は基体2を挟んで対向している。 Each of the upper surface connection portion 3 and the lower surface connection portion 4 is obtained by screen-printing an Ag-based paste, and drying and firing. The upper surface connection portion 3 is one piece that occupies almost the entire area (80% or more) of the upper surface of the base 2. It is formed as a continuous plane. The lower surface connecting portion 4 is formed as one continuous plane that occupies almost the entire area (80% or more) of the lower surface of the base 2, and the upper surface connecting portion 3 and the lower surface connecting portion 4 are opposed to each other with the base 2 interposed therebetween.
 導通部5は基体2の長手方向に沿う両端面にNi/Cr等をスパッタリングして形成されたものであり、この導通部5によって上面接続部3と下面接続部4は導通されている。外部電極6は上面接続部3と下面接続部4および導通部5の表面にCuメッキやAuメッキ等を施して形成されたものであり、チップ部品1の外表面の大部分は外部電極6によって覆われている。 The conducting portion 5 is formed by sputtering Ni / Cr or the like on both end surfaces along the longitudinal direction of the base 2, and the upper surface connecting portion 3 and the lower surface connecting portion 4 are electrically connected by the conducting portion 5. The external electrode 6 is formed by applying Cu plating, Au plating or the like on the surfaces of the upper surface connection portion 3, the lower surface connection portion 4, and the conduction portion 5, and most of the outer surface of the chip component 1 is formed by the external electrode 6. Covered.
 次に、上述の如く構成されたチップ部品1の製造方法について、図3を参照しながら説明する。なお、図3(a)~(d)の左側部分は各工程における平面図、右側部分はそれに対応する断面図を示している。 Next, a manufacturing method of the chip part 1 configured as described above will be described with reference to FIG. 3A to 3D are plan views in the respective steps, and the right portion is a cross-sectional view corresponding thereto.
 まず、図3(a)に示すように、格子状に延びる一次分割溝と二次分割溝が形成された大判基板1Aを準備する。これら一次分割溝と二次分割溝によって大判基板1Aの表裏両面は多数のチップ形成領域に区画され、各チップ形成領域がそれぞれ1個分の基体(セラミックス基板)2となる。図3には1つのチップ形成領域が代表的に示されているが、実際には、このようなチップ形成領域が格子状に配列されている。なお、図3において、大判基板(チップ形成領域)1Aの左右の両短辺が一次分割溝上に位置し、上下の両長辺が二次分割溝上に位置している。 First, as shown in FIG. 3A, a large substrate 1A having a primary division groove and a secondary division groove extending in a lattice shape is prepared. The front and back surfaces of the large-sized substrate 1A are partitioned into a large number of chip formation regions by these primary division grooves and secondary division grooves, and each chip formation region becomes a substrate (ceramic substrate) 2 for one piece. FIG. 3 representatively shows one chip formation region, but actually, such chip formation regions are arranged in a lattice pattern. In FIG. 3, both the left and right short sides of the large substrate (chip forming region) 1A are located on the primary divided groove, and the upper and lower long sides are located on the secondary divided groove.
 次に、図3(b)に示すように、大判基板1Aの上面と下面にそれぞれAgペーストをスクリーン印刷して乾燥・焼成させることにより、大判基板1Aの上面に矩形状の上面接続部3を形成すると共に、大判基板1Aの下面に矩形状の下面接続部4を形成する。なお、これら上面接続部3と下面接続部4は、後述する導通部5と接続を確実にするために大判基板1Aの一次分割溝(左右の短辺)まで延びているが、後述する二次分割作業を容易にするために二次分割溝(上下の長辺)までは達していない。その結果、大判基板1Aの上下両面に上面接続部3や下面接続部4の形成されていない非接続領域が存在することになるが、このような非接続領域があっても、上面接続部3と下面接続部4がそれぞれ基体2の平面形状の80%以上を占める1つの連続平面として形成されていれば良い。 Next, as shown in FIG. 3B, a rectangular upper surface connection portion 3 is formed on the upper surface of the large-sized substrate 1A by screen-printing Ag paste on the upper and lower surfaces of the large-sized substrate 1A, and drying and firing the paste. At the same time, a rectangular lower surface connection portion 4 is formed on the lower surface of the large substrate 1A. The upper surface connection portion 3 and the lower surface connection portion 4 extend to the primary division grooves (the left and right short sides) of the large-sized substrate 1A in order to ensure connection with the conduction portion 5 described later. In order to facilitate the dividing operation, the secondary dividing groove (upper and lower long sides) is not reached. As a result, there are non-connected regions where the upper surface connection portion 3 and the lower surface connection portion 4 are not formed on both the upper and lower surfaces of the large-sized substrate 1A. And the lower surface connecting portion 4 may be formed as one continuous plane that occupies 80% or more of the planar shape of the base 2.
 しかる後、大判基板1Aを一次分割溝に沿って短冊状に一次分割することにより、チップ形成領域の左右の短辺間を幅寸法とする短冊状基板を得る。そして、次なる工程で、この短冊状基板2Bの分割面にNi/Cr等をスパッタリングすることにより、図3(c)に示すように、上面接続部3と下面接続部4を橋絡する導通部5を形成する。 Thereafter, the large substrate 1A is primarily divided into strips along the primary dividing grooves to obtain a strip-shaped substrate having a width dimension between the left and right short sides of the chip formation region. In the next step, Ni / Cr or the like is sputtered onto the divided surface of the strip-shaped substrate 2B, thereby connecting the upper surface connection portion 3 and the lower surface connection portion 4 as shown in FIG. 3C. Part 5 is formed.
 次に、短冊状基板2Bを二次分割溝に沿って二次分割することにより、チップ部品1と同等の大きさの個片(チップ単体)を得る。前述したように、この時点で大判基板1Aの各チップ形成領域がそれぞれ1個分の基体2となる。最後に、各チップ単体の上面接続部3と下面接続部4および導通部5に対してCuメッキやAuメッキ等を施すことにより、図3(d)に示すように、基体2の上下両面と端面に外部電極6を備えたチップ部品1が完成する。前述したように、上面接続部3と下面接続部4は基体2の平面形状の80%以上を占める1つの連続平面として形成されているため、この外部電極6はチップ部品1の上面および下面のそれぞれ80%以上を占める大きさに形成されることとなる。 Next, the strip-shaped substrate 2B is secondarily divided along the second divided grooves to obtain individual pieces (chips) having the same size as the chip component 1. As described above, at this time, each chip formation region of the large-sized substrate 1 </ b> A becomes one substrate 2. Finally, by applying Cu plating, Au plating, or the like to the upper surface connection portion 3, the lower surface connection portion 4, and the conduction portion 5 of each chip alone, as shown in FIG. The chip component 1 having the external electrode 6 on the end face is completed. As described above, since the upper surface connection portion 3 and the lower surface connection portion 4 are formed as one continuous plane that occupies 80% or more of the planar shape of the base 2, the external electrode 6 is formed on the upper surface and the lower surface of the chip component 1. Each of them has a size that occupies 80% or more.
 図4は上記のごとく構成されたチップ部品1を内層した部品内蔵型回路基板の断面図であり、チップ部品1は外部電極6の内部の上面接続部3や下面接続部4等を省略して模式的に描かれている。 FIG. 4 is a cross-sectional view of a component-embedded circuit board in which the chip component 1 configured as described above is formed as an inner layer. The chip component 1 omits the upper surface connection portion 3 and the lower surface connection portion 4 inside the external electrode 6. It is drawn schematically.
 図4に示すように、チップ部品1は積層回路基板等のベース基板の絶縁層10の内部に埋め込まれており、この絶縁層10の上面と下面にはそれぞれ配線パターン11,12が設けられている。上面側の配線パターン11は接続ビア13を介して上面接続部3を覆う上方の外部電極6と導通されており、下面側の配線パターン12は接続ビア14を介して下面接続部4を覆う下方の外部電極6と導通されている。これら接続ビア13,14は、絶縁層10にレーザ光を照射してビアホールを形成した後、そのビアホール内に銅メッキ等を施すことによって形成されている。 As shown in FIG. 4, the chip component 1 is embedded in an insulating layer 10 of a base substrate such as a laminated circuit board, and wiring patterns 11 and 12 are provided on the upper surface and the lower surface of the insulating layer 10, respectively. Yes. The wiring pattern 11 on the upper surface side is electrically connected to the upper external electrode 6 that covers the upper surface connection portion 3 via the connection via 13, and the lower wiring pattern 12 covers the lower surface connection portion 4 via the connection via 14. The external electrode 6 is electrically connected. These connection vias 13 and 14 are formed by irradiating the insulating layer 10 with laser light to form via holes and then performing copper plating or the like in the via holes.
 このように構成された部品内蔵型回路基板では、ベース基板の樹脂層10に埋め込まれたチップ部品1がその上面と下面の80%以上を占める大きさの外部電極6を有しているため、樹脂層10にレーザ光を照射してビアホールを形成する際に、ビアホールの形成位置が正規の位置に対して多少ずれたとしても、チップ部品1の上面と下面に形成された広くて平坦な外部電極6に対してビアホールを簡単かつ確実に接触させることができる。また、内層されるチップ部品1はその上面と下面のほぼ全域が外部電極6となっているため、ビアホールの接続に関与しない不要な領域はほとんど存在せず、実装領域の大幅な低減化を図ることができる。 In the component-embedded circuit board configured as described above, the chip component 1 embedded in the resin layer 10 of the base substrate has the external electrode 6 having a size that occupies 80% or more of the upper surface and the lower surface. Even when the via hole is formed by irradiating the resin layer 10 with laser light, even if the formation position of the via hole is slightly deviated from the regular position, the wide and flat external formed on the upper surface and the lower surface of the chip part 1 The via hole can be easily and reliably brought into contact with the electrode 6. In addition, since the inner layer of the chip component 1 has the outer electrode 6 in almost the entire upper and lower surfaces, there is almost no unnecessary region not involved in the connection of the via hole, and the mounting region is greatly reduced. be able to.
 以上説明したように、第1実施形態例に係るチップ部品(基板内層用チップ部品)1は、基体2の上面に存する上面接続部3と下面に存する下面接続部4とが、それぞれ基体2の平面(上面または下面)の80%以上を占める1つの連続平面として形成されているため、該チップ部品1を積層回路基板等の樹脂層10の内部に埋め込んでビアホールを形成する際に、上面接続部3と下面接続部4を覆う広くて平坦な外部電極6に対してビアホールを簡単かつ確実に接触させることができる。また、このチップ部品1は、基体2の上下両面に設けられた上面接続部3と下面接続部4とを導通部5によって橋絡するという単純構造であるため、製造工程を簡略化して安価なチップ部品1を実現することができる。 As described above, in the chip component (chip component for substrate inner layer) 1 according to the first embodiment, the upper surface connecting portion 3 existing on the upper surface of the base body 2 and the lower surface connecting portion 4 existing on the lower surface of the base body 2 respectively. Since it is formed as one continuous plane that occupies 80% or more of the plane (upper surface or lower surface), when the chip component 1 is embedded in the resin layer 10 such as a laminated circuit board to form a via hole, the upper surface connection The via hole can be easily and reliably brought into contact with the wide and flat external electrode 6 covering the portion 3 and the lower surface connecting portion 4. In addition, since the chip component 1 has a simple structure in which the upper surface connection portion 3 and the lower surface connection portion 4 provided on the upper and lower surfaces of the base 2 are bridged by the conductive portion 5, the manufacturing process is simplified and the cost is low. The chip component 1 can be realized.
 また、第1実施形態例に係るチップ部品1では、基体2としてセラミックス基板を用いており、セラミックス基板からなる大判基板1Aに対して上面接続部3と下面接続部4を一括形成した後、この大判基板1Aを一次分割して得られる短冊状基板2Bの分割面に導通部5を形成し、しかる後、短冊状基板2Bを二次分割して多数個取りすることが可能であるため、量産性に優れたチップ部品1を実現することができる。 Further, in the chip component 1 according to the first embodiment, a ceramic substrate is used as the base 2, and after the upper surface connection portion 3 and the lower surface connection portion 4 are collectively formed on the large substrate 1A made of a ceramic substrate, Since the conductive portion 5 is formed on the dividing surface of the strip-shaped substrate 2B obtained by first dividing the large-sized substrate 1A, and then a large number of strip-shaped substrates 2B can be obtained by secondary division, mass production. It is possible to realize a chip component 1 having excellent performance.
 図5は本発明の第2実施形態例に係るチップ部品(基板内層用チップ部品)20の平面図、図6は該チップ部品20の断面図であり、図1と図2に対応する部分には同一符号を付してある。 FIG. 5 is a plan view of a chip component (chip component for a substrate inner layer) 20 according to a second embodiment of the present invention, and FIG. 6 is a cross-sectional view of the chip component 20, in a portion corresponding to FIGS. 1 and 2. Are given the same reference numerals.
 この第2実施形態例が前述した第1実施形態例と相違する点は、上面接続部3と下面接続部4を橋絡する導通部5が基体2の中央部に穿設された貫通孔2aの内部に形成されていることにあり、それ以外の構成は基本的に同じである。すなわち、セラミックス基板からなる基体2の中央部には貫通孔2aが穿設されており、基体2の上下両面にAg系ペーストをスクリーン印刷して上面接続部3と下面接続部4を形成するとき、そのAg系ペーストを貫通孔2aの内部に充填させて導通部5を形成することにより、上面接続部3と下面接続部4が導通部5によって導通されるようになっている。なお、導通部5を形成するAg系ペーストは必ずしも貫通孔2aの内部全体に充填されていなくても良く、Ag系ペーストの材料を削減するために、Ag系ペーストを貫通孔2aの内部側面に付着させて導通部5を形成するも可能である。 The second embodiment is different from the first embodiment described above in that a through hole 2a in which a conducting portion 5 that bridges the upper surface connecting portion 3 and the lower surface connecting portion 4 is formed in the central portion of the base 2 is provided. The rest of the configuration is basically the same. That is, a through hole 2a is formed in the central portion of the substrate 2 made of a ceramic substrate, and when the upper surface connection portion 3 and the lower surface connection portion 4 are formed by screen printing Ag-based paste on the upper and lower surfaces of the substrate 2. Then, by filling the inside of the through hole 2 a with the Ag-based paste to form the conduction part 5, the upper surface connection part 3 and the lower surface connection part 4 are made conductive by the conduction part 5. Note that the Ag-based paste that forms the conductive portion 5 does not necessarily fill the entire inside of the through-hole 2a. In order to reduce the material of the Ag-based paste, the Ag-based paste is applied to the inner side surface of the through-hole 2a. It is also possible to form the conductive portion 5 by adhering.
 このように構成された第2実施形態例に係るチップ部品20では、前述した第1実施形態例の作用効果に加えて、上面接続部3と下面接続部4および導通部5の全てを厚膜形成することができるため、導通部5をスパッタによって形成する必要がなくなって製造工程をより簡略化できるという付加的な作用効果を奏する。 In the chip component 20 according to the second embodiment configured as described above, all of the upper surface connection portion 3, the lower surface connection portion 4, and the conduction portion 5 are thick in addition to the operational effects of the first embodiment described above. Since it can be formed, there is no need to form the conductive portion 5 by sputtering, and the manufacturing process can be further simplified.
 図7は本発明の第3実施形態例に係るチップ部品(基板内層用チップ部品)30の平面図、図8と図9は該チップ部品30の断面図であり、図1と図2に対応する部分には同一符号を付してある。 FIG. 7 is a plan view of a chip component (chip component for a substrate inner layer) 30 according to a third embodiment of the present invention, and FIGS. 8 and 9 are cross-sectional views of the chip component 30, corresponding to FIGS. The same reference numerals are given to the parts to be performed.
 この第3実施形態例が前述した第1実施形態例と相違する点は、上面接続部3と下面接続部4を橋絡する導通部5が基体2の端面近傍に設けられた切欠き2bの内部に形成されていることにあり、それ以外の構成は基本的に同じである。すなわち、セラミックス基板からなる基体2の長手方向両端部には半円形状の切欠き2bが設けられており、基体2の上下両面にAg系ペーストをスクリーン印刷して上面接続部3と下面接続部4を形成するとき、そのAg系ペーストを切欠き2bの内部側面に付着させて導通部5を形成することにより、上面接続部3と下面接続部4が導通部5によって導通されるようになっている。 This third embodiment is different from the first embodiment described above in that a notch 2b in which a conducting portion 5 that bridges the upper surface connecting portion 3 and the lower surface connecting portion 4 is provided in the vicinity of the end surface of the base 2 is provided. The other components are basically the same except that they are formed inside. That is, semicircular cutouts 2b are provided at both longitudinal ends of the substrate 2 made of a ceramic substrate, and Ag-based paste is screen-printed on both the upper and lower surfaces of the substrate 2 to connect the upper surface connection portion 3 and the lower surface connection portion. 4, the Ag-based paste is attached to the inner side surface of the notch 2 b to form the conductive portion 5, whereby the upper surface connecting portion 3 and the lower surface connecting portion 4 are made conductive by the conductive portion 5. ing.
 このように構成された第3実施形態例に係るチップ部品30では、前述した第2実施形態例の作用効果に加えて、部品搭載時にチップ部品を吸着(ピックアップ)する際、吸着箇所に貫通孔がなくなって連続平面を形成し易くなるため、チップ部品を確実にピックアップすることができるという作用効果を奏する。さらに、大判基板1Aの一次分割溝を跨ぐ位置に切欠き2bが形成されているため、大判基板1Aを一次分割溝に沿って分割する際の破断応力が低減され、一次分割作業を容易に行うことできるという付加的な作用効果を奏する。 In the chip component 30 according to the third embodiment configured as described above, in addition to the operation and effect of the second embodiment described above, when the chip component is sucked (pickup) when the component is mounted, the through hole is formed in the suction portion. Since it becomes easy to form a continuous plane, the chip component can be picked up reliably. Further, since the notch 2b is formed at a position straddling the primary dividing groove of the large substrate 1A, the breaking stress when the large substrate 1A is divided along the primary dividing groove is reduced, and the primary dividing operation is easily performed. There is an additional effect of being able to.
 なお、上記各実施形態例では、セラミックス基板からなる基体2の上下両面に上面接続部3と下面接続部4を厚膜形成した場合について説明したが、基体2として銅板あるいはCuメッキを施したニクロム板等の導電性板材を用いることも可能である。この場合、基体の上下両面が上面接続部と下面接続部になると共に、基体そのものが導通部として機能するため、上面接続部と下面接続部はそれぞれ基体平面の100%を占める1つの連続平面として形成されることになる。 In each of the above embodiments, the case where the upper surface connection portion 3 and the lower surface connection portion 4 are formed thick on the upper and lower surfaces of the substrate 2 made of a ceramic substrate has been described. However, the substrate 2 is made of Nichrome with a copper plate or Cu plating. It is also possible to use a conductive plate material such as a plate. In this case, the upper and lower surfaces of the base body are the upper surface connection portion and the lower surface connection portion, and the base body itself functions as a conduction portion. Therefore, each of the upper surface connection portion and the lower surface connection portion is one continuous plane that occupies 100% of the base surface. Will be formed.
 1,20,30 基板内層用チップ部品
 2 基体
 2a 貫通孔
 2b 切欠き
 2A 大判基板
 2B 短冊状基板
 3 上面接続部
 4 下面接続部
 5 導通部
 6 外部電極
 10 絶縁層
 11,12 配線パターン
 13,14 接続ビア
DESCRIPTION OF SYMBOLS 1,20,30 Chip component for board | substrate inner layer 2 Base | substrate 2a Through- hole 2b Notch 2A Large format board 2B Strip board 3 Upper surface connection part 4 Lower surface connection part 5 Conductive part 6 External electrode 10 Insulating layer 11, 12 Wiring pattern 13, 14 Connecting via

Claims (3)

  1.  上下を平坦面とした基体と、この基体の上面に設けられた上面接続部と、前記基体の下面に設けられた下面接続部と、前記上面接続部と前記下面接続部を導通する導通部とを備え、
     前記上面接続部が前記基体の上面の80%以上を占める1つの連続平面として形成されると共に、前記下面接続部が前記基体の下面の80%以上を占める1つの連続平面として形成されていることを特徴とする基板内層用チップ部品。
    A base body having a flat top and bottom, an upper surface connection portion provided on the upper surface of the base body, a lower surface connection portion provided on the lower surface of the base body, and a conduction portion that conducts the upper surface connection portion and the lower surface connection portion. With
    The upper surface connection portion is formed as one continuous plane that occupies 80% or more of the upper surface of the substrate, and the lower surface connection portion is formed as one continuous plane that occupies 80% or more of the lower surface of the substrate. A chip component for an inner layer of a substrate.
  2.  請求項1の記載において、前記基体がセラミックス基板からなると共に、前記上面接続部と前記下面接続部および前記導通部が導電性ペーストを印刷・焼成したものからなり、前記導通部が前記セラミックス基板に形成された貫通孔または切欠き内に充填されていることを特徴とする基板内層用チップ部品。 2. The method according to claim 1, wherein the base is made of a ceramic substrate, and the upper surface connection portion, the lower surface connection portion, and the conductive portion are formed by printing and baking a conductive paste, and the conductive portion is formed on the ceramic substrate. A chip component for an inner layer of a substrate, which is filled in a formed through hole or notch.
  3.  絶縁性の樹脂層からなるベース基板の内層にチップ部品が埋め込まれている部品内蔵型回路基板において、
     前記チップ部品が基体の平面形状の80%以上を占める上面接続部と下面接続部とを有しており、前記ベース基板に、その上面側の配線パターンから前記上面接続部に達するビアホールと、下面側の配線パターンから前記下面接続部に達するビアホールとが穿設されていると共に、これらビアホールの内部に接続ビアが充填されていることを特徴とする部品内蔵型回路基板。
    In a component-embedded circuit board in which chip components are embedded in the inner layer of a base substrate made of an insulating resin layer,
    The chip component has an upper surface connection portion and a lower surface connection portion that occupy 80% or more of the planar shape of the base, a via hole reaching the upper surface connection portion from a wiring pattern on the upper surface side, and a lower surface A circuit board with a built-in component, wherein via holes reaching the lower surface connection portion from the wiring pattern on the side are formed, and connection vias are filled in the via holes.
PCT/JP2015/070870 2014-08-26 2015-07-22 Board internal layer chip component and embedded circuit board WO2016031441A1 (en)

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JP5463195B2 (en) * 2010-04-22 2014-04-09 日本特殊陶業株式会社 Ceramic electronic components and wiring boards

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JP2014067788A (en) * 2012-09-25 2014-04-17 Panasonic Corp Manufacturing method of circuit-component built-in board

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