WO2016006412A1 - Substrate housing container and retainer - Google Patents

Substrate housing container and retainer Download PDF

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Publication number
WO2016006412A1
WO2016006412A1 PCT/JP2015/067738 JP2015067738W WO2016006412A1 WO 2016006412 A1 WO2016006412 A1 WO 2016006412A1 JP 2015067738 W JP2015067738 W JP 2015067738W WO 2016006412 A1 WO2016006412 A1 WO 2016006412A1
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Prior art keywords
substrate
retainer
container
lid
body opening
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PCT/JP2015/067738
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French (fr)
Japanese (ja)
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忠利 井上
和也 井上
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ミライアル株式会社
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Publication of WO2016006412A1 publication Critical patent/WO2016006412A1/en

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders

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  • the present invention provides a container main body having a container main body opening formed therein and capable of accommodating a plurality of substrates, the container main body opening having one end communicating with the substrate storage space, and a lid capable of closing the container main body opening. And a portion of the lid that is disposed on a portion corresponding to the substrate storage space when the container body opening is closed by the lid, and supports the ends of the plurality of substrates
  • the substrate storage container comprising: a retainer that is possible, and a pair of substrate support plate-like portions that are disposed on the inner surface of the substrate storage space so as to be paired with the retainer and that position and hold the outer edge portions of the plurality of substrates.
  • the angle in the normal direction of the retainer substrate contact surface with respect to the horizontal rearward direction of the substrate is a retainer inclination angle, and the rotation angle downward from the reference is a positive value, It is preferable that the retainer inclination angle in a state where the container main body opening is closed by the lid body is larger than the retainer inclination angle in a state where the main body opening is not closed.
  • the substrate receiving portion since a substrate receiving portion having a plane that supports the substrate of the retainer or the back side substrate supporting portion is sufficiently higher than the thickness of the substrate, the substrate receiving portion is not limited to a substrate having a specific thickness. It is possible to support a substrate having a thickness equal to or less than the height, and it is possible to store substrates having different thicknesses in one substrate storage container.
  • FIG. 1 is an exploded perspective view showing a state in which a substrate W is stored in a substrate storage container 1 according to the first embodiment of the present invention.
  • FIG. 2 is an upper perspective view in which the second side wall 26 and the upper wall 23 are omitted in the container body 2 according to the first embodiment of the present invention.
  • FIG. 3 is an enlarged view of a portion of the substrate support plate-like portion 5 in the container body 2 according to the first embodiment of the present invention.
  • FIG. 4 is a side perspective view of the lid body 3 according to the first embodiment of the present invention as seen from the substrate storage space 27 side.
  • FIG. 5 is an enlarged side perspective view of a part of the retainer 35 according to the first embodiment of the present invention.
  • the substrate support plate-like portion 5 is provided on the wall portion 20 so as to make a pair with the retainer 35 in the substrate storage space 27.
  • the substrate support plate-like portion 5 includes a substrate placement portion 501 for placing a substrate and a rear side (back side) on the upper side of the substrate support plate when the container body opening 21 is not closed by the lid 3.
  • a plurality of substrates W can be supported in a state where adjacent substrates W are spaced apart from each other and arranged in parallel by a back side substrate support portion 504 that contacts the edge of the substrate W formed in the above.
  • the back side substrate support portion 504 can support the rear portions of the edges of the plurality of substrates W by contacting the edges of the plurality of substrates W when the container body opening 21 is closed by the lid 3. It is.
  • a rib 28 is provided integrally with the upper wall 23.
  • the rib 28 is provided to increase the rigidity of the container body.
  • Each substrate placement unit 501 has a front placement projection 502 and a back placement unit 503 for placing the substrate W thereon.
  • a rear side substrate support portion 504 that is a plane for supporting the end portion of the substrate W is formed on the rear side of the rear side placement portion 503.
  • the height of the plane supporting the substrate W of the back side substrate support portion 504 needs to be higher than the thickness of the substrate W placed on the front side placement protrusion 502 and the back side placement portion 503.
  • the height of this plane is 5 mm.
  • the height of the plane is required to be higher than the thickness of the substrate that can be accommodated in the container 1, and when a bonded wafer or the like is accommodated, 2.5 mm or more is required.
  • the substrate placement pitch is 10 mm
  • the height of the plane for supporting the substrate W of the back substrate support portion 504 is set in consideration of the thickness of the substrate placement portion 501.
  • the maximum is 9 mm.
  • the bonded wafer that can be stored in the present embodiment can be stored by stacking a plurality of thin substrates TW on the base substrate BW.
  • a normal silicon wafer can be accommodated as the substrate W in addition to the bonded wafer.
  • the retainer inclination angle is about plus one degree. That is, the retainer inclination angle when the container body opening 21 is completely closed by the lid 3 is larger than the retainer inclination angle when the container body opening 21 is not completely closed by the lid 3. Become.
  • FIG. 10A is a diagram corresponding to FIG. 8A of the first embodiment, and shows a state in which the substrate W and the retainer portion 301B are in contact with each other in the substrate storage container 1 according to the third embodiment of the present invention.
  • FIG. 10B is a view corresponding to FIG. 8B of the first embodiment, and in the substrate storage container 1 according to the third embodiment of the present invention, the substrate W and the retainer portion 301B abut, and the container body opening of the container body 2 is opened. It is a figure showing the state which block
  • the lid 3 is completely attached to the container main body 2 and the operation unit 34 of the lid 3 is operated to fix the lid 3 to the container main body 2 in a detachable manner.
  • the main body opening 21 is closed.
  • the retainer substrate receiving portion 303 ⁇ / b> B pushes the substrate W along the substrate horizontal plane 801 in the rearward horizontal direction 803, which is the rear direction, by the elastic force of the arm portion 302.
  • the substrate W is supported by the retainer substrate contact surface 306 ⁇ / b> A of the retainer substrate receiving portion 303 ⁇ / b> B and the flat surface of the rear substrate support portion 504.
  • the same effect as that of the first embodiment can be obtained.

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Packaging Frangible Articles (AREA)

Abstract

Provided is a substrate housing container that improves the supporting force of a substrate in a substrate housing container for housing and supporting a substrate such as a bonded wafer, that safely supports a substrate even when the container is subjected to an impact or vibration, and that is for use within a semiconductor factory or the like. The semiconductor housing container comprises a container main body and a lid that are capable of supporting a substrate. The lid comprises a retainer for supporting the edge section of a substrate. The semiconductor housing container is configured so that when the lid blocks a container main body opening of the container main body and supports a substrate, the normal direction of a flat surface (306) of the retainer that is in contact with the substrate is inclined downward at a predetermined angle when a substrate horizontal/rear direction that passes through the center of the substrate in the thickness direction thereof, that is perpendicular to the thickness direction of the substrate, and that is toward the rear of the substrate housing container is used as a reference.

Description

基板収納容器及びリテーナSubstrate storage container and retainer
　本発明は、半導体ウェーハ等からなる基板を収納、保管、搬送、輸送等する際に使用される基板収納容器、及び当該基板収納容器に用いられるリテーナに関する。 The present invention relates to a substrate storage container used for storing, storing, transporting, transporting, etc., a substrate made of a semiconductor wafer or the like, and a retainer used for the substrate storage container.
　半導体ウェーハからなる基板を収納して、工場内の工程において搬送するための基板収納容器としては、容器本体と蓋体とを備える構成のものが、従来より知られている。 2. Description of the Related Art Conventionally, as a substrate storage container for storing a substrate made of a semiconductor wafer and transporting it in a process in a factory, a structure including a container main body and a lid is known.
　容器本体は、一端部に容器本体開口部が形成され、他端部が閉塞された筒状の壁部を有する。容器本体内には基板収納空間が形成されている。基板収納空間は、壁部により取り囲まれて形成されており、複数の基板を収納可能である。蓋体は、容器本体開口部に対して着脱可能であり、容器本体開口部を閉塞可能である。 The container body has a cylindrical wall part in which an opening part of the container body is formed at one end and the other end is closed. A substrate storage space is formed in the container body. The substrate storage space is formed by being surrounded by a wall portion, and can store a plurality of substrates. The lid can be attached to and detached from the container body opening, and the container body opening can be closed.
　蓋体の部分であって容器本体開口部を閉塞しているときに基板収納空間に対向する部分には、フロントリテーナが設けられている。フロントリテーナは、蓋体によって容器本体開口部が閉塞されているときに、複数の基板の縁部を支持可能である。また、フロントリテーナと対をなすようにして、基板を載置するための基板載置部が設けられた基板支持板状部が壁部に設けられている。この基板支持板状部の奥には、奥側基板支持部が設けられている。この奥側基板支持部は、基板支持板状部と一体的に形成されているものだけでなく、別体として形成されていてもよい。奥側基板支持部は、複数の基板の縁部を支持可能である。 A front retainer is provided in a portion of the lid that faces the substrate storage space when the container main body opening is closed. The front retainer can support the edges of the plurality of substrates when the container main body opening is closed by the lid. In addition, a substrate support plate-like portion provided with a substrate placement portion for placing a substrate is provided on the wall portion so as to form a pair with the front retainer. A back side substrate support part is provided at the back of the substrate support plate-like part. This back side substrate support part is not limited to being formed integrally with the substrate support plate-like part, but may be formed as a separate body. The back side substrate support part can support the edges of a plurality of substrates.
　容器本体の容器本体開口部を閉塞する為に容器本体開口部に蓋体が取り付けられると、基板支持板状部の基板載置部に載置された複数の基板は、基板載置部から上方向に離間された状態で、フロントリテーナと奥側基板支持部とにより支持される。その際、基板を支持するフロントリテーナの部分と、奥側基板支持部とにはＶ溝形状が形成されており、このＶ溝形状で基板の縁部を支持する。通常このような容器は、基板の出荷容器として用いられる。（特許文献１参照） When a lid is attached to the container body opening to close the container body opening of the container body, the plurality of substrates placed on the substrate placement portion of the substrate support plate-like portion It is supported by the front retainer and the back side substrate support part while being separated in the direction. At this time, a V-groove shape is formed in the front retainer portion that supports the substrate and the back-side substrate support portion, and the edge portion of the substrate is supported by this V-groove shape. Usually, such a container is used as a shipping container for a substrate. (See Patent Document 1)
　また、容器本体の容器本体開口部を閉塞する為に容器本体開口部に蓋体が取り付けられる際に、基板載置部から基板が離間せず、フロントリテーナと奥側基板支持部により複数の基板を支持する容器もある。このような容器は、半導体工場等の工程内で使用する容器として用いられている。その場合、基板の前部を押え、容器本体内で基板の移動を抑制し、容器や基板の製造上のばらつきや厚さの異なる基板への対応のために、基板を受けるフロントリテーナの平面を、基板の厚さの２倍程度の高さを有する垂直平面とした容器も検討されている。（特許文献２参照） In addition, when the lid is attached to the container main body opening to close the container main body opening of the container main body, the substrate is not separated from the substrate mounting portion, and a plurality of substrates are supported by the front retainer and the back substrate support portion. Some containers also support Such a container is used as a container used in a process of a semiconductor factory or the like. In that case, hold down the front part of the substrate, suppress the movement of the substrate within the container body, and adjust the front retainer plane that receives the substrate in order to cope with variations in the manufacturing of containers and substrates and substrates with different thicknesses. Also, a vertical plane container having a height about twice the thickness of the substrate has been studied. (See Patent Document 2)
特許第４１４６７１８号公報Japanese Patent No. 4146718 特許第４１５３８７４号公報Japanese Patent No. 4153874
　前述のように、前者のＶ溝形状を用いて基板を支持する容器は、基板を強固に支持することが可能であるが、基板の縁部の上下面に当接する。すると、ベース基板の上に薄いウェーハが固定されて構成された基板であって、ボンデッドウェーハと呼ばれるベース基板とデバイスが形成された薄いウェーハからなる基板を支持する場合、ベース基板上の薄いウェーハとＶ溝形状とが接触する可能性がある。さらに、ベース基板上の薄いウェーハを固定している接着層にＶ溝形状が接触し、薄いウェーハの縁部がダメージを受ける場合がある。 As described above, the container that supports the substrate using the former V-groove shape can firmly support the substrate, but contacts the upper and lower surfaces of the edge of the substrate. Then, when a substrate composed of a thin wafer fixed on a base substrate and composed of a base substrate called a bonded wafer and a thin wafer on which devices are formed is supported, the thin wafer on the base substrate And the V-groove shape may come into contact with each other. Further, the V-groove shape may come into contact with the adhesive layer fixing the thin wafer on the base substrate, and the edge of the thin wafer may be damaged.
　そこで、現在では、後者の基板の縁部を平面で受け、基板載置部から基板を離間させない状態で保持する容器が用いられている。しかし、フロントリテーナと奥側基板支持部の垂直平面とで基板の縁部を支持しているため、基板は上方向に全く支持されていない。そのため、上下方向への衝撃や振動により基板が動き、基板やベース基板上面の薄いウェーハの破損を招くという課題があった。さらに、フロントリテーナや奥側基板支持部と、基板との摺動により発生するパーティクルにより、不良品の発生や不良率の増加を招くという課題があった。 Therefore, at present, a container that receives the edge of the latter substrate in a plane and holds the substrate in a state in which the substrate is not separated from the substrate mounting portion is used. However, since the edge of the substrate is supported by the front retainer and the vertical plane of the back substrate support portion, the substrate is not supported in the upward direction at all. For this reason, there has been a problem that the substrate is moved by an impact or vibration in the vertical direction, and the thin wafer on the upper surface of the substrate or the base substrate is damaged. Further, there is a problem that defective particles are generated and a defective rate is increased due to particles generated by sliding between the front retainer and the back substrate support portion and the substrate.
　本発明は、ボンデッドウェーハ等の基板を収納し支持する基板収納容器において、基板を基板載置部に載置した状態でフロントリテーナの平面と奥側基板支持部の平面で保持しつつも、基板の支持力を向上させ、容器に衝撃や振動が加わった際にも容器内部の基板をきちんと支持する基板収納容器及びフロントリテーナを提供することを目的とする。 The present invention, in a substrate storage container for storing and supporting a substrate such as a bonded wafer, while holding the substrate on the substrate mounting portion in the plane of the front retainer and the plane of the back substrate support portion, It is an object of the present invention to provide a substrate storage container and a front retainer that improve the supporting force of the substrate and properly support the substrate inside the container even when an impact or vibration is applied to the container.
　本発明は、複数の基板を収納可能な基板収納空間が内部に形成され、一端部に前記基板収納空間に連通する容器本体開口部を有する容器本体と、前記容器本体開口部を閉塞可能な蓋体と、前記蓋体の部分であって前記蓋体によって前記容器本体開口部が閉塞されているときに前記基板収納空間に対応する側の部分に配置され、前記複数の基板の端部を支持可能なリテーナと、前記基板収納空間の内面に前記リテーナと対をなすように配置され、前記複数の基板の外縁部を位置決め保持する一対の基板支持板状部とを有する基板収納容器において、前記基板支持板状部は、前記基板を載置する基板載置部と、前記基板の端部に当接し保持する奥側基板支持部と、を有し、前記リテーナは、前記基板が当接するリテーナ基板当接面を有するリテーナ基板受け部と、前記リテーナ基板受け部に接続されたアーム部と、を有し、前記蓋体が容器本体開口部を閉塞した状態のときに、前記基板の厚さ方向の中心を通り厚さ方向に垂直で前記基板収納容器の後方向である基板水平後方向を基準として、前記リテーナ基板当接面の法線方向が下側に所定の角度傾斜していることを特徴とする。 The present invention provides a container main body having a container main body opening formed therein and capable of accommodating a plurality of substrates, the container main body opening having one end communicating with the substrate storage space, and a lid capable of closing the container main body opening. And a portion of the lid that is disposed on a portion corresponding to the substrate storage space when the container body opening is closed by the lid, and supports the ends of the plurality of substrates In the substrate storage container, comprising: a retainer that is possible, and a pair of substrate support plate-like portions that are disposed on the inner surface of the substrate storage space so as to be paired with the retainer and that position and hold the outer edge portions of the plurality of substrates. The substrate support plate-like portion has a substrate placement portion for placing the substrate and a back side substrate support portion that abuts and holds the end portion of the substrate, and the retainer is a retainer with which the substrate abuts Rete with substrate contact surface A substrate substrate receiving portion and an arm portion connected to the retainer substrate receiving portion, and when the lid body is in a state of closing the container body opening, the thickness passes through the center in the thickness direction of the substrate. The normal direction of the retainer substrate contact surface is inclined downward by a predetermined angle with respect to the substrate horizontal rear direction that is perpendicular to the vertical direction and that is the rear direction of the substrate storage container.
　また、前記基板水平後方向を基準として前記リテーナ基板当接面の法線方向の角度をリテーナ傾斜角とし、前記基準から下方向への回転角度を正の値とすると、前記蓋体により前記容器本体開口部が閉塞されていない状態における前記リテーナ傾斜角よりも、前記蓋体により前記容器本体開口部が閉塞された状態における前記リテーナ傾斜角が大きくすることが好ましい。 Further, if the angle in the normal direction of the retainer substrate contact surface with respect to the horizontal rearward direction of the substrate is a retainer inclination angle, and the rotation angle downward from the reference is a positive value, It is preferable that the retainer inclination angle in a state where the container main body opening is closed by the lid body is larger than the retainer inclination angle in a state where the main body opening is not closed.
　さらに、前記リテーナ基板当接面において前記基板が当接する基板当接位置が、前記リテーナ基板受け部と前記アーム部とが接続されたアーム部固定位置の中心よりも下方向に位置することが好ましい。 Furthermore, it is preferable that the substrate contact position where the substrate contacts with the retainer substrate contact surface is located below the center of the arm portion fixing position where the retainer substrate receiving portion and the arm portion are connected. .
　また、前記リテーナ基板当接面において前記基板が当接する基板当接位置が、前記リテーナ基板受け部と前記アーム部とが接続されたアーム部固定位置の中心と同じ高さ又は上方向に位置し、且つ、前記蓋体が前記容器本体開口部を閉塞していない状態のときに、前記基板水平後方向を基準として前記リテーナ基板当接面の法線方向が下側に所定の角度傾斜していることが好ましい。 In addition, the substrate contact position where the substrate contacts the retainer substrate contact surface is positioned at the same height or upward as the center of the arm portion fixing position where the retainer substrate receiving portion and the arm portion are connected. When the lid does not close the opening of the container body, the normal direction of the retainer substrate contact surface is inclined downward by a predetermined angle with respect to the horizontal rear direction of the substrate. Preferably it is.
　また、本発明は、複数の基板を収納可能な基板収納空間が内部に形成され、一端部に前記基板収納空間に連通する容器本体開口部を有する容器本体と、前記容器本体開口部を閉塞可能な蓋体と、を有する基板収納容器に用いられるリテーナであって、前記蓋体の部分であって前記蓋体によって前記容器本体開口部が閉塞されているときに前記基板収納空間に対応する側の部分に配置され、前記複数の基板の端部を支持可能なリテーナにおいて、前記リテーナは、前記基板が当接するリテーナ基板当接面を有するリテーナ基板受け部と、前記リテーナ基板受け部に接続されたアーム部と、を有し、前記リテーナ基板当接面における前記基板が当接する基板当接位置が、前記リテーナ基板受け部と前記アーム部とが接続されたアーム部固定位置中心より下方向に位置することを特徴とする。 In addition, the present invention provides a container main body having a container main body opening formed therein and capable of storing a plurality of substrates, the container main body opening having one end communicating with the substrate storage space, and the container main body opening being occluded. A retainer used in a substrate storage container having a lid, the side corresponding to the substrate storage space when the container main body opening is closed by the lid, which is a part of the lid The retainer is disposed at a portion of the retainer and can support end portions of the plurality of substrates. The retainer is connected to a retainer substrate receiving portion having a retainer substrate abutting surface with which the substrate abuts, and the retainer substrate receiving portion. A board contact position where the board comes into contact with the retainer board contact surface is an arm part fixing position where the retainer board receiving part and the arm part are connected to each other. Characterized in that positioned in the downward direction from the heart.
　また、本発明は、複数の基板を収納可能な基板収納空間が内部に形成され、一端部に前記基板収納空間に連通する容器本体開口部を有する容器本体と、前記容器本体開口部を閉塞可能な蓋体と、を有する基板収納容器に用いられるリテーナであって、前記蓋体の部分であって前記蓋体によって前記容器本体開口部が閉塞されているときに前記基板収納空間に対応する側の部分に配置され、前記複数の基板の端部を支持可能なリテーナにおいて、前記リテーナ基板当接面において前記基板が当接する基板当接位置が、前記リテーナ基板受け部と前記アーム部とが接続されたアーム部固定位置の中心と同じ高さ又は上方向に位置し、且つ、前記蓋体が前記容器本体開口部を閉塞していない状態のときに、前記基板の厚さ方向の中心を通り厚さ方向に垂直で前記基板収納容器の後方向である基板水平後方向を基準として、前記リテーナ基板当接面の法線方向が下側に所定の角度傾斜していることを特徴とする。 In addition, the present invention provides a container main body having a container main body opening formed therein and capable of storing a plurality of substrates, the container main body opening having one end communicating with the substrate storage space, and the container main body opening being occluded. A retainer used in a substrate storage container having a lid, the side corresponding to the substrate storage space when the container main body opening is closed by the lid, which is a part of the lid The retainer substrate receiving portion and the arm portion are connected to each other at a substrate contact position where the substrate contacts the retainer substrate contact surface. When the lid is positioned at the same height or upward as the center of the fixed position of the arm and the lid does not close the opening of the container body, it passes through the center of the substrate in the thickness direction. Thickness In reference to the direction after the substrate horizontally in the direction after the substrate container in the vertical, characterized in that the normal direction of the retainer substrate abutting surface is inclined at a prescribed angle on the lower side.
　本発明によれば、ボンデッドウェーハにおけるベース基板の上に貼り合わされた薄いウェーハの上面に、リテーナや奥側基板支持部が接触することなく、基板を支持可能であるので、ボンデッドウェーハのデバイスが形成された薄いウェーハを破損させない工程内容器を提供できる。 According to the present invention, the substrate can be supported without the retainer or the back side substrate support portion coming into contact with the upper surface of the thin wafer bonded onto the base substrate in the bonded wafer. It is possible to provide an in-process container that does not damage a thin wafer on which is formed.
　また、リテーナや奥側基板支持部の基板を支持する平面の高さを基板の厚さよりも十分高い基板受け部が設けられているので、特定の厚さを持つ基板に限らず、基板受け部の高さ以下の厚みをもつ基板を支持可能であり、さらに厚さの異なる基板を１つの基板収納容器で収納可能である。 In addition, since a substrate receiving portion having a plane that supports the substrate of the retainer or the back side substrate supporting portion is sufficiently higher than the thickness of the substrate, the substrate receiving portion is not limited to a substrate having a specific thickness. It is possible to support a substrate having a thickness equal to or less than the height, and it is possible to store substrates having different thicknesses in one substrate storage container.
　さらに、基板とリテーナや奥側基板支持部との接触部分から発生するパーティクルを極限まで低減でき、基板上に作製されるデバイスの歩留まりを向上させることができる。その上、基板の縁部をリテーナと奥側基板支持部の平面で受けて保持する為、基板の上面の外周近傍までデバイスを形成でき、デバイスを形成可能な有効面積や、一枚の基板から取れるデバイスの和を増やすことができ、デバイスのコストダウンに寄与する。 Furthermore, particles generated from the contact portion between the substrate and the retainer or the back substrate support portion can be reduced to the utmost, and the yield of devices fabricated on the substrate can be improved. In addition, since the edge of the substrate is received and held by the plane of the retainer and the back substrate support part, the device can be formed to the vicinity of the outer periphery of the upper surface of the substrate, and the effective area where the device can be formed or from one substrate The sum of devices that can be taken can be increased, contributing to cost reduction of the device.
本発明の第１実施形態に係る基板収納容器１に基板Ｗが収納された様子を示す分解斜視図である。It is a disassembled perspective view which shows a mode that the board | substrate W was accommodated in the substrate storage container 1 which concerns on 1st Embodiment of this invention. 本発明の第１実施形態に係る容器本体２において、第二側壁２６と上壁２３とが省略された上方斜視図である。In the container main body 2 which concerns on 1st Embodiment of this invention, it is the upper perspective view by which the 2nd side wall 26 and the upper wall 23 were abbreviate | omitted. 本発明の第１実施形態に係る容器本体２における、基板支持板状部５の部分の拡大図である。It is an enlarged view of the part of the board | substrate support plate-shaped part 5 in the container main body 2 which concerns on 1st Embodiment of this invention. 本発明の第１実施形態に係る蓋体３における、基板収納空間２７側からみた側方斜視図である。It is a side perspective view seen from the substrate storage space 27 side in the lid 3 according to the first embodiment of the present invention. 本発明の第１実施形態に係るリテーナ３５の一部を拡大した側方斜視図である。It is the side perspective view which expanded a part of retainer 35 concerning a 1st embodiment of the present invention. 本発明の第１実施形態に係る基板収納容器１において、基板Ｗとリテーナ部３０１と基板支持板状部５との位置関係を説明する図である。In the substrate storage container 1 which concerns on 1st Embodiment of this invention, it is a figure explaining the positional relationship of the board | substrate W, the retainer part 301, and the board | substrate support plate-shaped part 5. FIG. 本発明の第１実施形態に係る基板収納容器１において、基板Ｗとリテーナ部３０１と基板支持板状部５との位置関係を説明する図で、リテーナ部３０１と基板Ｗが当接した状態を表す図である。In the substrate storage container 1 which concerns on 1st Embodiment of this invention, it is a figure explaining the positional relationship of the board | substrate W, the retainer part 301, and the board | substrate support plate-shaped part 5, The state which the retainer part 301 and the board | substrate W contact | abutted is shown. FIG. 本発明の第１実施形態に係る基板収納容器１において、基板Ｗとリテーナ部３０１と基板支持板状部５との位置関係を説明する図で、容器本体２の容器本体開口部２１を蓋体３で閉塞した状態を表す図である。In the substrate storage container 1 which concerns on 1st Embodiment of this invention, it is a figure explaining the positional relationship of the board | substrate W, the retainer part 301, and the board | substrate support plate-shaped part 5, and the container main body opening part 21 of the container main body 2 is a cover body. FIG. 図７Ａにおける、リテーナ部３０１近傍の拡大図である。FIG. 7B is an enlarged view of the vicinity of the retainer section 301 in FIG. 7A. 図７Ｂにおける、リテーナ部３０１近傍の拡大図である。FIG. 7B is an enlarged view of the vicinity of the retainer section 301 in FIG. 7B. 本発明の第２実施形態に係る基板収納容器１において、基板Ｗとリテーナ部３０１Ａとが当接した状態を示す図である。In the substrate storage container 1 which concerns on 2nd Embodiment of this invention, it is a figure which shows the state which the board | substrate W and the retainer part 301A contact | abutted. 本発明の第３実施形態に係る基板収納容器１において、基板Ｗとリテーナ部３０１Ｂとが当接した状態を示す図である。In the substrate storage container 1 which concerns on 3rd Embodiment of this invention, it is a figure which shows the state which the board | substrate W and the retainer part 301B contact | abutted. 本発明の第３実施形態に係る基板収納容器１において、基板Ｗとリテーナ部３０１Ｂとが当接し、容器本体２の容器本体開口部２１を蓋体３で閉塞した状態を表す図である。In the substrate storage container 1 which concerns on 3rd Embodiment of this invention, the board | substrate W and the retainer part 301B contact | abut, It is a figure showing the state which obstruct | occluded the container main body opening part 21 of the container main body 2 with the cover body 3. FIG.
　［第１実施形態］
　以下、本発明の第１実施形態による基板収納容器１及びリテーナ３５について、図面を参照しながら説明する。図１は、本発明の第１実施形態に係る基板収納容器１に基板Ｗが収納された様子を示す分解斜視図である。図２は、本発明の第１実施形態に係る容器本体２において、第二側壁２６と上壁２３とが省略された上方斜視図である。図３は、本発明の第１実施形態に係る容器本体２における、基板支持板状部５の部分の拡大図である。図４は、本発明の第１実施形態に係る蓋体３における、基板収納空間２７側からみた側方斜視図である。図５は、本発明の第１実施形態に係るリテーナ３５の一部を拡大した側方斜視図である。 [First Embodiment]
Hereinafter, the substrate storage container 1 and the retainer 35 according to the first embodiment of the present invention will be described with reference to the drawings. FIG. 1 is an exploded perspective view showing a state in which a substrate W is stored in a substrate storage container 1 according to the first embodiment of the present invention. FIG. 2 is an upper perspective view in which the second side wall 26 and the upper wall 23 are omitted in the container body 2 according to the first embodiment of the present invention. FIG. 3 is an enlarged view of a portion of the substrate support plate-like portion 5 in the container body 2 according to the first embodiment of the present invention. FIG. 4 is a side perspective view of the lid body 3 according to the first embodiment of the present invention as seen from the substrate storage space 27 side. FIG. 5 is an enlarged side perspective view of a part of the retainer 35 according to the first embodiment of the present invention.
　ここで、説明の便宜上、後述の容器本体２から蓋体３へ向かう方向（図１における右上から左下へ向かう方向）を前方向と定義し、その反対の方向を後方向と定義し、これらをあわせて前後方向と定義する。また、後述の下壁２４から上壁２３へと向かう方向（図１における上方向）を上方向と定義し、その反対の方向を下方向と定義し、これらをあわせて上下方向と定義する。また、後述する第２側壁２６から第１側壁２５へと向かう方向（図１における右下から左上へ向かう方向）を左方向と定義し、その反対の方向を右方向と定義し、これらをあわせて左右方向と定義する。 Here, for convenience of explanation, a direction from the container body 2 described later to the lid 3 (direction from the upper right to the lower left in FIG. 1) is defined as the front direction, and the opposite direction is defined as the rear direction. Also defined as the front-rear direction. Further, a direction (upward direction in FIG. 1) from the lower wall 24 described later to the upper wall 23 is defined as an upward direction, the opposite direction is defined as a downward direction, and these are collectively defined as an up-down direction. In addition, a direction from the second side wall 26 to the first side wall 25 to be described later (a direction from the lower right to the upper left in FIG. 1) is defined as the left direction, and the opposite direction is defined as the right direction. Left and right direction.
　また、基板収納容器１に収納される基板Ｗ（図１参照）は、ボンデッドウェーハであり、ベース基板ＢＷの上面に薄いウェーハＴＷを固定したものである（図６等参照）。ベース基板ＢＷは、円盤状のシリコンウェーハ、ガラスウェーハ等を利用可能である。本実施形態におけるベース基板ＢＷは、直径３００ｍｍ～４５０ｍｍのガラスウェーハである。薄いウェーハＴＷは、リシコーンウェーハの表面にデバイスが形成され、その後裏面が研磨され所定の厚さとされたものである。 Further, the substrate W (see FIG. 1) stored in the substrate storage container 1 is a bonded wafer, and a thin wafer TW is fixed to the upper surface of the base substrate BW (see FIG. 6 and the like). As the base substrate BW, a disk-shaped silicon wafer, glass wafer, or the like can be used. The base substrate BW in this embodiment is a glass wafer having a diameter of 300 mm to 450 mm. The thin wafer TW is a device in which a device is formed on the surface of a ricicon wafer, and then the back surface is polished to a predetermined thickness.
　図１に示すように、基板収納容器１は、上述のような基板Ｗを収納して、工場内の工程において搬送する工程内容器として用いられたり、陸運手段・空運手段・海運手段等の輸送手段により基板を輸送するための出荷容器として用いられるものであり、容器本体２と、蓋体３と、側方基板支持部としての基板支持板状部５と、基板支持板状部５の奥部に一体的に形成された後述する奥側基板支持部５０４（図３等）と、蓋体側基板支持部としての後述するリテーナ３５（図４等）とを有している。 As shown in FIG. 1, the substrate storage container 1 is used as an in-process container for storing the substrate W as described above and transporting it in a process in a factory, or transportation such as land transportation means, air transportation means, and sea transportation means. It is used as a shipping container for transporting a substrate by means, and includes a container body 2, a lid 3, a substrate support plate-like portion 5 as a side substrate support portion, and the back of the substrate support plate-like portion 5. A back side substrate support portion 504 (FIG. 3 and the like), which will be described later, formed integrally with the part, and a retainer 35 (FIG. 4 and the like), which will be described later, as a lid side substrate support portion.
　容器本体２は、一端部に容器本体開口部２１が形成されると共に他端部が閉塞された筒状の壁部２０を有する。容器本体２内には基板収納空間２７が形成されている。基板収納空間２７は、壁部２０により取り囲まれて形成されている。壁部２０の部分であって基板収納空間２７を形成している部分には、基板支持板状部５が配置されている。基板収納空間２７には、図１に示すように、複数の基板Ｗを収納可能である。 The container body 2 has a cylindrical wall part 20 in which a container body opening 21 is formed at one end and the other end is closed. A substrate storage space 27 is formed in the container body 2. The substrate storage space 27 is formed so as to be surrounded by the wall portion 20. The substrate support plate-shaped portion 5 is disposed in a portion of the wall portion 20 that forms the substrate storage space 27. As shown in FIG. 1, a plurality of substrates W can be stored in the substrate storage space 27.
　図２や図３に示すように、基板支持板状部５は、基板収納空間２７内にリテーナ３５と対をなすように壁部２０に設けられている。基板支持板状部５は、蓋体３によって容器本体開口部２１が閉塞されていないときに、基板を載置するための基板載置部５０１と、基板支持板上部の後側（奥側）に形成された基板Ｗの縁部に当接する奥側基板支持部５０４とにより、隣接する基板Ｗ同士を所定の間隔で離間させて並列させた状態で、複数の基板Ｗを支持可能である。基板載置部５０１には、基板載置部５０１の上面の前側に形成された前側載置突起５０２と、基板載置部５０１の上面の後側（奥側）で奥側基板支持部５０４の前側に近接する位置に形成された奥側載置部５０３が設けられている。基板Ｗは、前側載置突起５０２と奥側載置部に載置される。 As shown in FIGS. 2 and 3, the substrate support plate-like portion 5 is provided on the wall portion 20 so as to make a pair with the retainer 35 in the substrate storage space 27. The substrate support plate-like portion 5 includes a substrate placement portion 501 for placing a substrate and a rear side (back side) on the upper side of the substrate support plate when the container body opening 21 is not closed by the lid 3. A plurality of substrates W can be supported in a state where adjacent substrates W are spaced apart from each other and arranged in parallel by a back side substrate support portion 504 that contacts the edge of the substrate W formed in the above. The substrate platform 501 includes a front placement projection 502 formed on the front side of the top surface of the substrate platform 501 and a rear substrate support unit 504 on the rear side (back side) of the top surface of the substrate platform 501. A back side mounting portion 503 formed at a position close to the front side is provided. The substrate W is placed on the front placement protrusion 502 and the back placement portion.
　奥側基板支持部５０４は、蓋体３によって容器本体開口部２１が閉塞されているときに、複数の基板Ｗの縁部に当接することにより、複数の基板Ｗの縁部の後部を支持可能である。 The back side substrate support portion 504 can support the rear portions of the edges of the plurality of substrates W by contacting the edges of the plurality of substrates W when the container body opening 21 is closed by the lid 3. It is.
　蓋体３は、容器本体開口部２１を形成する開口周縁部３１（図１等）に対して着脱可能であり、容器本体開口部２１を閉塞可能である。図４に示すように、リテーナ３５は、蓋体３の部分であって蓋体３によって容器本体開口部２１が閉塞されているときに基板収納空間２７に対向する部分に設けられている。リテーナ３５は、基板収納空間２７の内部において基板支持板状部５と対をなすように配置されている。 The lid 3 can be attached to and detached from the opening peripheral edge portion 31 (FIG. 1 and the like) forming the container body opening 21 and can close the container body opening 21. As shown in FIG. 4, the retainer 35 is provided in a portion of the lid 3 that faces the substrate storage space 27 when the container main body opening 21 is closed by the lid 3. The retainer 35 is disposed so as to be paired with the substrate support plate-like portion 5 inside the substrate storage space 27.
　リテーナ３５は、蓋体３によって容器本体開口部２１が閉塞されているときに、複数の基板Ｗの縁部に当接することにより複数の基板Ｗの縁部の前部を支持可能である。リテーナ３５は、蓋体３によって容器本体開口部２１が閉塞されているときに、基板支持板状部５と協働して複数の基板Ｗを支持することにより、隣接する基板Ｗ同士を所定の間隔で離間させて並列させた状態で、複数の基板Ｗを保持する。 The retainer 35 can support the front portions of the edges of the plurality of substrates W by contacting the edges of the plurality of substrates W when the container body opening 21 is closed by the lid 3. The retainer 35 supports the plurality of substrates W in cooperation with the substrate support plate-like portion 5 when the container main body opening 21 is closed by the lid 3, so that the adjacent substrates W are fixed to each other. A plurality of substrates W are held in a state where they are spaced apart and arranged in parallel.
　基板収納容器１は、プラスチック材等の樹脂で構成されており、特に説明が無い場合には、その材料の樹脂としては、たとえば、ポリカーボネート、シクロオレフィンポリマー、ポリエーテルイミド、ポリエーテルケトン、ポリブチレンテレフタレート、ポリエーテルエーテルケトン、液晶ポリマーといった熱可塑性樹脂やこれらのアロイ等が上げられる。これらの成形材料の樹脂には、導電性を付与する場合には、カーボン繊維、カーボンパウダー、カーボンナノチューブ、導電性ポリマー等の導電性物質が選択的に添加される。また、剛性を上げるためにガラス繊維や炭素繊維等を添加することも可能である。特に、リテーナ３５は、基板Ｗを保持する際にある程度の弾性が必要であるので、リテーナ３５の材料の樹脂として、ポリブチレンテレフタレート、ポリエステルエラストマーやポリエーテルエーテルケトンなどを用いることができる。 The substrate storage container 1 is made of a resin such as a plastic material. Unless otherwise specified, examples of the resin of the material include polycarbonate, cycloolefin polymer, polyetherimide, polyetherketone, and polybutylene. Examples thereof include thermoplastic resins such as terephthalate, polyether ether ketone, and liquid crystal polymer, and alloys thereof. When imparting electrical conductivity to these molding material resins, conductive substances such as carbon fibers, carbon powder, carbon nanotubes, and conductive polymers are selectively added. It is also possible to add glass fiber, carbon fiber or the like in order to increase the rigidity. In particular, since the retainer 35 needs a certain degree of elasticity when holding the substrate W, polybutylene terephthalate, polyester elastomer, polyetheretherketone, or the like can be used as the resin of the material of the retainer 35.
　以下、各部について、詳細に説明する。
　図１等に示すように、容器本体２の壁部２０は、奥壁２２と上壁２３と下壁２４と第１側壁２５と第２側壁２６とを有する。奥壁２２、上壁２３、下壁２４、第１側壁２５、及び第２側壁２６は、上述した材料により構成されており、一体成形されて構成されている。 Hereinafter, each part will be described in detail.
As shown in FIG. 1 and the like, the wall portion 20 of the container body 2 includes a back wall 22, an upper wall 23, a lower wall 24, a first side wall 25, and a second side wall 26. The back wall 22, the upper wall 23, the lower wall 24, the first side wall 25, and the second side wall 26 are made of the above-described materials and are integrally formed.
　第１側壁２５と第２側壁２６とは対向しており、上壁２３と下壁２４とは対向している。上壁２３の後端、下壁２４の後端、第１側壁２５の後端、及び第２側壁２６の後端は、全て奥壁２２に接続されている。上壁２３の前端、下壁２４の前端、第１側壁２５の前端、及び第２側壁２６の前端は、奥壁２２に対向する位置関係を有し、略長方形状をした容器本体開口部２１を形成する開口周縁部３１を構成する。 The first side wall 25 and the second side wall 26 face each other, and the upper wall 23 and the lower wall 24 face each other. The rear end of the upper wall 23, the rear end of the lower wall 24, the rear end of the first side wall 25, and the rear end of the second side wall 26 are all connected to the back wall 22. The front end of the upper wall 23, the front end of the lower wall 24, the front end of the first side wall 25, and the front end of the second side wall 26 have a positional relationship facing the back wall 22 and have a substantially rectangular shape. The opening peripheral part 31 which forms is comprised.
　開口周縁部３１は、容器本体２の一端部に設けられており、奥壁２２は、容器本体２の他端部に位置している。壁部２０の外面により形成される容器本体２の外形は箱状である。壁部２０の内面、即ち、奥壁２２の内面、上壁２３の内面、下壁２４の内面、第１側壁２５の内面、及び第２側壁２６の内面は、これらによって取り囲まれた基板収納空間２７を形成している。開口周縁部３１に形成された容器本体開口部２１は、壁部２０により取り囲まれて容器本体２の内部に形成された基板収納空間２７に連通している。基板収納空間２７には、最大で２６枚の基板Ｗを収納可能である。 The opening periphery 31 is provided at one end of the container body 2, and the back wall 22 is located at the other end of the container body 2. The outer shape of the container body 2 formed by the outer surface of the wall portion 20 is box-shaped. The inner surface of the wall portion 20, that is, the inner surface of the back wall 22, the inner surface of the upper wall 23, the inner surface of the lower wall 24, the inner surface of the first side wall 25, and the inner surface of the second side wall 26 are surrounded by these. 27 is formed. The container main body opening 21 formed in the opening peripheral edge portion 31 is surrounded by the wall portion 20 and communicates with the substrate storage space 27 formed in the container main body 2. A maximum of 26 substrates W can be stored in the substrate storage space 27.
　図１に示すように、上壁２３及び下壁２４の部分であって、開口周縁部３１の近傍の部分には、基板収納空間２７の外方へ向かって窪んだ上側ラッチ係合凹部４０Ａ、４０Ｂと下側ラッチ係合凹部４１Ａ、４１Ｂが形成されている。上側ラッチ係合凹部４０Ａ、４０Ｂ、下側ラッチ係合凹部４１Ａ、４１Ｂは、上壁２３及び下壁２４の左右両端部近傍に１つずつ、計４つ形成されている。 As shown in FIG. 1, upper latch engagement recesses 40 </ b> A that are recessed toward the outside of the substrate storage space 27 are formed on the upper wall 23 and the lower wall 24 in the vicinity of the opening peripheral edge 31. 40B and lower latch engaging recesses 41A and 41B are formed. A total of four upper latch engagement recesses 40A and 40B and lower latch engagement recesses 41A and 41B are formed near the left and right ends of the upper wall 23 and the lower wall 24, one in total.
　図１に示すように、上壁２３の外面においては、リブ２８が、上壁２３と一体成形されて設けられている。このリブ２８は、容器本体の剛性を高めるために設けられている。 As shown in FIG. 1, on the outer surface of the upper wall 23, a rib 28 is provided integrally with the upper wall 23. The rib 28 is provided to increase the rigidity of the container body.
　また、上壁２３の中央部には、トップフランジ２９が固定される。トップフランジ２９は、ＡＭＨＳ（自動ウェーハ搬送システム）、ＰＧＶ（ウェーハ基板搬送台車）等において基板収納容器１を吊り下げる際に、基板収納容器１において掛けられて吊り下げられる部分となる部材である。 Further, a top flange 29 is fixed to the central portion of the upper wall 23. The top flange 29 is a member that is a portion that is hung and suspended in the substrate storage container 1 when the substrate storage container 1 is suspended in an AMHS (automatic wafer conveyance system), PGV (wafer substrate conveyance carriage), or the like.
　図１から図２に示すように、容器本体２の基板収納空間２７の第１側壁２５と第２側壁２６の内面には、基板支持板状部５が形成されている。図３に示すように、本実施形態においては、基板支持板状部５は、第１側壁２５に対して取り外し可能に第１側壁２５に固定されている。第１側壁２５には基板支持板状部５を固定するために、第１側壁２５の前側に円柱状の前側被係合部２５０が形成され、後側に後側中央被係合部２５１と後側被係合部２５２と後側被係合固定部２５３が形成されている。基板支持板状部５には、前側被係合部２５０と係合する孔形状の前側係合部５００と、後側中央被係合部２５１と係合する後側中央係合部５０５と、後側被係合部２５２と係合する後側係合部５０６と、後側被係合固定部２５３と係合し基板支持板状部５を固定する後側係合固定部５０７と、が形成されている。 As shown in FIGS. 1 to 2, a substrate support plate-like portion 5 is formed on the inner surfaces of the first side wall 25 and the second side wall 26 of the substrate storage space 27 of the container body 2. As shown in FIG. 3, in the present embodiment, the substrate support plate-like portion 5 is fixed to the first side wall 25 so as to be removable from the first side wall 25. In order to fix the substrate supporting plate-like portion 5 to the first side wall 25, a columnar front engaged portion 250 is formed on the front side of the first side wall 25, and a rear center engaged portion 251 is formed on the rear side. A rear engaged portion 252 and a rear engaged fixed portion 253 are formed. The substrate support plate-like portion 5 includes a hole-shaped front engaging portion 500 that engages with the front engaged portion 250, a rear central engaging portion 505 that engages with the rear central engaged portion 251, A rear engagement portion 506 that engages with the rear engaged portion 252, and a rear engagement fixing portion 507 that engages with the rear engaged fixed portion 253 and fixes the substrate support plate-like portion 5. Is formed.
　基板支持板状部５には、略板状の基板載置部５０１が複数形成され、それらが上下方向に連結されている。本実施形態では、２６個の基板載置部５０１が形成されている。基板載置部５０１は、本実施形態においては１０ｍｍごとに設けられている。この値は載置する基板Ｗの上下方向に収納される際のピッチ高さに対応しているので、適宜変更可能である。 A plurality of substantially plate-like substrate placement portions 501 are formed on the substrate support plate-like portion 5 and are connected in the vertical direction. In the present embodiment, 26 substrate platforms 501 are formed. The substrate platform 501 is provided every 10 mm in this embodiment. Since this value corresponds to the pitch height when the substrate W to be placed is accommodated in the vertical direction, it can be appropriately changed.
　それぞれの基板載置部５０１は、基板Ｗを載置するための前側載置突起５０２と奥側載置部５０３を有している。また、奥側載置部５０３の後側には、基板Ｗの端部を支持するための平面である奥側基板支持部５０４が形成されている。この奥側基板支持部５０４の基板Ｗを支持する平面の高さとしては、前側載置突起５０２、奥側載置部５０３に載置される基板Ｗの厚さ以上の高さが必要とされる。本実施形態においては、この平面の高さを５ｍｍとした。この平面の高さとしては、容器１に収納する可能性のある基板の厚さ以上の高さが必要とされ、ボンデッドウェーハ等が収容される場合には、２．５ｍｍ以上は必要とされる。また、本実施形態においては、基板の載置ピッチが１０ｍｍであるので、基板載置部５０１の厚さを考慮すると、奥側基板支持部５０４の基板Ｗを支持するための平面の高さは、最大でも９ｍｍとなる。 Each substrate placement unit 501 has a front placement projection 502 and a back placement unit 503 for placing the substrate W thereon. In addition, a rear side substrate support portion 504 that is a plane for supporting the end portion of the substrate W is formed on the rear side of the rear side placement portion 503. The height of the plane supporting the substrate W of the back side substrate support portion 504 needs to be higher than the thickness of the substrate W placed on the front side placement protrusion 502 and the back side placement portion 503. The In the present embodiment, the height of this plane is 5 mm. The height of the plane is required to be higher than the thickness of the substrate that can be accommodated in the container 1, and when a bonded wafer or the like is accommodated, 2.5 mm or more is required. The Further, in the present embodiment, since the substrate placement pitch is 10 mm, the height of the plane for supporting the substrate W of the back substrate support portion 504 is set in consideration of the thickness of the substrate placement portion 501. The maximum is 9 mm.
　第１側壁２５への基板支持板状部５の固定は次のように行う。基板支持板状部５を容器本体開口部２１側から第１側壁２５に沿って後方向に移動させて、基板支持板状部５の係合部である前側係合部５００を第１側壁２５の対応する被係合部である前側被係合部２５０にスライドさせるように係合させ、基板支持板状部５の係合部である後側中央係合部５０５を第１側壁２５の対応する被係合部である後側中央被係合部２５１にスライドさせるように係合させ、基板支持板状部５の係合部である後側係合部５０６を第１側壁２５の対応する被係合部である後側被係合部２５２にスライドさせるように係合させる。その後、基板支持板状部５の後側係合固定部５０７を第１側壁２５の後側被係合固定部２５３に固定する。 The substrate support plate-like portion 5 is fixed to the first side wall 25 as follows. The substrate support plate-like portion 5 is moved rearward along the first side wall 25 from the container body opening 21 side, and the front side engagement portion 500 that is the engagement portion of the substrate support plate-like portion 5 is moved to the first side wall 25. The rear side center engaging portion 505 that is the engaging portion of the substrate support plate-like portion 5 is made to slide on the front side engaged portion 250 that is the corresponding engaged portion of the first side wall 25. The rear side engaged portion 251 that is the engaged portion to be engaged is slidably engaged with the rear side engaged portion 251, and the rear side engaging portion 506 that is the engaging portion of the substrate support plate-like portion 5 is corresponding to the first side wall 25. It engages so that it may slide to the rear side engaged part 252 which is an engaged part. Thereafter, the rear engagement fixing portion 507 of the substrate support plate-like portion 5 is fixed to the rear engaged fixing portion 253 of the first side wall 25.
　逆に、第１側壁２５から基板支持板状部５を外す場合には、後側係合固定部５０７と後側被係合固定部２５３との係合を解除し、基板支持板状部５を前方向にスライドさせるように移動させ、他の係合部と被係合部との係合を解除する。 Conversely, when the substrate support plate-like portion 5 is removed from the first side wall 25, the engagement between the rear engagement fixing portion 507 and the rear engaged fixation portion 253 is released, and the substrate support plate-like portion 5 is released. Is moved so as to slide forward, and the engagement between the other engaging portion and the engaged portion is released.
　第２側壁２６に形成される基板支持板状部５についても、同様に第２側壁２６に対する係合固定と取り外しとが可能である。 Similarly, the substrate support plate-like portion 5 formed on the second side wall 26 can be engaged and fixed with respect to the second side wall 26 and removed.
　図１等に示すように、蓋体３は、容器本体２の開口周縁部３１の形状と略一致する略長方形状を有している。蓋体３は容器本体２の開口周縁部３１に対して着脱可能である。開口周縁部３１に蓋体３が装着されることにより、蓋体３は、容器本体開口部２１を閉塞可能である。図４に示すように蓋体３の内面であって、蓋体３が容器本体開口部２１を閉塞しているときの開口周縁部３１のすぐ後方向の位置に形成された段差の部分の面（シール面３０）に対向する蓋体３の内面には、環状のシール部材４が取り付けられている。シール部材４は、弾性変形可能なポリエステル系、ポリオレフィン系など各種熱可塑性エラストマー、フッ素ゴム製、シリコンゴム製等により構成されている。シール部材４は、蓋体３の外周縁部を一周するように配置されている。 As shown in FIG. 1 and the like, the lid 3 has a substantially rectangular shape that substantially matches the shape of the opening peripheral edge 31 of the container body 2. The lid 3 can be attached to and detached from the opening peripheral edge 31 of the container body 2. By attaching the lid 3 to the opening peripheral edge 31, the lid 3 can close the container body opening 21. As shown in FIG. 4, the inner surface of the lid 3, the surface of the stepped portion formed at a position immediately behind the opening peripheral edge 31 when the lid 3 closes the container body opening 21. An annular seal member 4 is attached to the inner surface of the lid 3 facing the (seal surface 30). The seal member 4 is made of various types of thermoplastic elastomers such as polyester and polyolefin that can be elastically deformed, fluorine rubber, and silicon rubber. The seal member 4 is arranged so as to go around the outer peripheral edge of the lid 3.
　蓋体３が開口周縁部３１に装着されたときに、シール部材４は、シール面３０と蓋体３の内面とにより挟まれて弾性変形し、蓋体３は、容器本体開口部２１を密閉した状態で閉塞する。開口周縁部３１から蓋体３が取り外されることにより、容器本体２内の基板収納空間２７に対して、基板Ｗを出し入れ可能となる。 When the lid 3 is attached to the opening peripheral edge 31, the seal member 4 is sandwiched between the seal surface 30 and the inner surface of the lid 3, and is elastically deformed. The lid 3 seals the container body opening 21. Shuts down in a closed state. By removing the lid 3 from the opening peripheral edge 31, the substrate W can be taken in and out of the substrate storage space 27 in the container body 2.
　蓋体３においては、ラッチ機構が設けられている。ラッチ機構は、蓋体３の左右両端部近傍に設けられており、図４に示すように、蓋体３の上辺から上方向へ突出可能な２つの上側ラッチ部３２Ａ、３２Ｂと、蓋体３の下辺から下方向へ突出可能な２つの下側ラッチ部３３Ａ、３３Ｂと、を備えている。２つの上側ラッチ部３２Ａ、３２Ｂは、蓋体３の上辺の左右両端近傍に配置されており、２つの下側ラッチ部３３Ａ、３３Ｂは、蓋体３の下辺の左右両端近傍に配置されている。 The lid 3 is provided with a latch mechanism. The latch mechanism is provided in the vicinity of both left and right ends of the lid 3, and as shown in FIG. 4, two upper latch portions 32 </ b> A and 32 </ b> B that can project upward from the upper side of the lid 3, and the lid 3. Two lower latch portions 33A and 33B that can protrude downward from the lower side of the lower side. The two upper latch portions 32A and 32B are disposed near the left and right ends of the upper side of the lid 3, and the two lower latch portions 33A and 33B are disposed near the left and right ends of the lower side of the lid 3. .
　図１に示すように蓋体３の外面においては操作部３４が設けられている。操作部３４を蓋体３の前側から操作することにより、上側ラッチ部３２Ａ、３２Ｂ、下側ラッチ部３３Ａ，３３Ｂを蓋体３の上辺、下辺から突出させることができ、また、上辺、下辺から突出させない状態とすることができる。上側ラッチ部３２Ａ、３２Ｂが蓋体３の上辺から上方向へ突出して、容器本体２の上側ラッチ係合凹部４０Ａ、４０Ｂに係合し、且つ、下側ラッチ部３３Ａ、３３Ｂが蓋体３の下辺から下方向へ突出して、容器本体２の下側ラッチ係合凹部４１Ａ、４１Ｂに係合することにより、蓋体３は、容器本体２の開口周縁部３１に固定される。 As shown in FIG. 1, an operation unit 34 is provided on the outer surface of the lid 3. By operating the operating portion 34 from the front side of the lid 3, the upper latch portions 32A and 32B and the lower latch portions 33A and 33B can be projected from the upper and lower sides of the lid 3, and from the upper and lower sides. It can be made the state which does not project. The upper latch portions 32A and 32B protrude upward from the upper side of the lid 3 and engage with the upper latch engaging recesses 40A and 40B of the container body 2, and the lower latch portions 33A and 33B The lid 3 is fixed to the opening peripheral edge 31 of the container body 2 by protruding downward from the lower side and engaging with the lower latch engagement recesses 41 </ b> A and 41 </ b> B of the container body 2.
　図４に示すように、蓋体３の内側においては、基板収納空間２７の外方へ窪んだ凹部３７が形成されている。凹部３７の部分には、リテーナ３５のリテーナ係合凸部３６に係合するリテーナ被係合部（図示せず）が設けられており、蓋体３の凹部３７にリテーナ３５が取り外し可能に固定されている。 As shown in FIG. 4, a recess 37 that is recessed outward from the substrate storage space 27 is formed inside the lid 3. The recessed portion 37 is provided with a retainer engaged portion (not shown) that engages with the retainer engaging convex portion 36 of the retainer 35, and the retainer 35 is detachably fixed to the recessed portion 37 of the lid 3. Has been.
　図５に示すように、リテーナ３５は、複数のリテーナ部３０１が所定の間隔で左右対をなすように上下方向に配置されている。このリテーナ部３０１は、長方形状のリテーナフレーム３００の内側に固定されている。リテーナ部３０１は、基板Ｗの前側端を支持するためのリテーナ基板受け部３０３と、リテーナ基板受け部３０３をリテーナフレーム３００と接続する弾性を有するアーム部３０２からなる。さらに、リテーナ基板受け部３０３は、基板Ｗの縁部の端縁と当接し支持するための平面であるリテーナ基板当接面３０６と、その上下に隣接して形成されている上側フランジ３０４と下側フランジ３０５を有している。このようなリテーナ基板受け部３０３は、左右方向に所定の間隔で離間して対をなすようにして配置されている。このように対をなすようにして配置されたリテーナ基板受け部３０３は、上下方向に２６対並列した状態で設けられている。基板収納空間２７内に基板Ｗが収納され、蓋体３が閉じられることにより、リテーナ基板受け部３０３は、基板Ｗの縁部の端縁を挟持して支持する。 As shown in FIG. 5, the retainer 35 is arranged in the vertical direction so that the plurality of retainer portions 301 form a left-right pair at a predetermined interval. The retainer portion 301 is fixed inside the rectangular retainer frame 300. The retainer portion 301 includes a retainer substrate receiving portion 303 for supporting the front side end of the substrate W and an elastic arm portion 302 that connects the retainer substrate receiving portion 303 to the retainer frame 300. Further, the retainer substrate receiving portion 303 has a retainer substrate contact surface 306 which is a flat surface for contacting and supporting the edge of the edge of the substrate W, an upper flange 304 formed adjacent to the upper and lower sides thereof, and a lower surface. A side flange 305 is provided. Such retainer substrate receiving portions 303 are disposed so as to form a pair spaced apart at a predetermined interval in the left-right direction. The retainer substrate receiving portions 303 arranged in such a pair are provided in a state where 26 pairs are arranged in parallel in the vertical direction. When the substrate W is stored in the substrate storage space 27 and the lid 3 is closed, the retainer substrate receiving portion 303 supports the edge of the edge portion of the substrate W by sandwiching it.
　上述のような基板収納容器１において、基板Ｗの支持は、以下のとおりに行われる。
　工場内の工程において基板収納容器１が工程内容器として用いられているときには、容器本体２において下壁２４は下部に位置し上壁２３は上部に位置している。この基板収納容器１への基板Ｗの収納・保持をする場合には、まず、蓋体３を容器本体２から外した状態とする。 In the substrate storage container 1 as described above, the substrate W is supported as follows.
When the substrate storage container 1 is used as an in-process container in a process in the factory, the lower wall 24 is located at the lower part and the upper wall 23 is located at the upper part in the container body 2. In order to store and hold the substrate W in the substrate storage container 1, the lid 3 is first removed from the container body 2.
　次に、基板Ｗを水平に維持した状態で、容器本体開口部２１から基板収納空間２７に挿入し、基板支持板状部５に基板Ｗを載置する。図６に示すように、本実施形態で用いる基板Ｗは、ベース基板ＢＷの上面に薄基板ＴＷを固定したものを用いる。薄基板ＴＷはシリコンウェーハ基板の上面にデバイスを形成した後に、裏面が研磨され極薄化されたものである。薄基板ＴＷの直径は、ベース基板ＢＷの直径よりも１～２ｍｍ程度小さいため、ベース基板ＢＷの外形から薄基板ＴＷは、はみださない。このような基板Ｗはボンデッドウェーハと呼ばれている。また、本実施形態で収納可能なボンデッドウェーハとしては、ベース基板ＢＷに複数の薄基板ＴＷが積層されたもの収納可能である。もちろん、基板Ｗとして、ボンデッドウェーハ以外にも、通常のシリコンウェーハを収納することもできる。　 Next, in a state where the substrate W is kept horizontal, the substrate W is inserted into the substrate storage space 27 from the container body opening 21, and the substrate W is placed on the substrate support plate-like portion 5. As shown in FIG. 6, the substrate W used in the present embodiment is a substrate in which a thin substrate TW is fixed to the upper surface of a base substrate BW. The thin substrate TW is obtained by forming a device on the upper surface of a silicon wafer substrate and then polishing the back surface to make it extremely thin. Since the diameter of the thin substrate TW is about 1 to 2 mm smaller than the diameter of the base substrate BW, the thin substrate TW does not protrude from the outer shape of the base substrate BW. Such a substrate W is called a bonded wafer. In addition, the bonded wafer that can be stored in the present embodiment can be stored by stacking a plurality of thin substrates TW on the base substrate BW. Of course, a normal silicon wafer can be accommodated as the substrate W in addition to the bonded wafer. *
　図６に示すように、容器本体開口部２１から収納されベース基板ＢＷに薄基板ＴＷが固定された基板Ｗは、基板支持板状部５の所望の基板載置部５０１に載置される。その際、基板Ｗ（厳密にはベース基板ＢＷ）の下面の前部は前側載置突起５０２に載置され、当該下面の後部は奥側載置部５０３の上部に載置されるとともに、基板Ｗ（厳密にはベース基板ＢＷ）の後側（奥側）の縁部の端縁は、奥側基板支持部５０４に当接する。この際、基板Ｗ（厳密にはベース基板ＢＷ）の縁部の端縁が、奥側基板支持部５０４と当接しない場合もある。その場合には、次に説明する蓋体３で容器本体２の容器本体開口部２１を閉塞する際に、リテーナ部３０１で基板Ｗ（厳密にはベース基板ＢＷ）の縁部の端縁の前側を押すことで、基板Ｗ（厳密にはベース基板ＢＷ）の縁部の端縁が、奥側基板支持部５０４と当接することになる。 As shown in FIG. 6, the substrate W accommodated from the container body opening 21 and having the thin substrate TW fixed to the base substrate BW is placed on a desired substrate placement portion 501 of the substrate support plate-like portion 5. At that time, the front portion of the lower surface of the substrate W (strictly, the base substrate BW) is placed on the front placement protrusion 502, and the rear portion of the lower surface is placed on the upper portion of the rear placement portion 503, and the substrate The edge of the rear edge (back side) of W (strictly speaking, the base substrate BW) is in contact with the back side substrate support 504. At this time, the edge of the edge portion of the substrate W (strictly, the base substrate BW) may not come into contact with the back substrate support portion 504. In that case, when the container main body opening 21 of the container main body 2 is closed with the lid 3 to be described next, the retainer portion 301 fronts the edge of the edge of the substrate W (strictly, the base substrate BW). By pushing, the edge of the edge of the substrate W (strictly, the base substrate BW) comes into contact with the back substrate support 504.
　次に、蓋体３で容器本体２の容器本体開口部２１を閉塞する際の基板Ｗの支持状況を説明する。
　基板Ｗが基板載置部５０１に載置された状態で、蓋体３が容器本体２に取り付けられ、容器本体開口部２１が閉塞されようとする状態を図７Ａと図８Ａに示す。蓋体３が容器本体２の容器本体開口部２１を完全に閉塞する前に、リテーナ基板当接面３０６が基板Ｗの縁部の端縁の前側に当接する。図７Ａと図８Ａの状態では、基板Ｗとリテーナ基板当接面３０６とが当接したのみで、アーム部３０２の弾性で基板Ｗを後方向に押してはいない。この時、リテーナ基板当接面３０６と基板Ｗの前側の縁部の端縁とが当接した場所を基板当接位置３０７とし、リテーナ基板受け部３０３と接続されているアーム部３０２の中心をアーム部固定位置の中心３０８と定義する。そして、基板当接位置３０７を通り、基板Ｗに水平な面を基板水平面８０１とし、アーム部固定位置の中心３０８を通り、基板Ｗに水平な面をアーム部水平面８０２と定義する。基板水平面８０１とアーム部水平面８０２とは互いに平行で、その方向は、基板Ｗの中心軸方向に垂直となる。 Next, the support state of the substrate W when the container body opening 21 of the container body 2 is closed with the lid 3 will be described.
7A and 8A show a state in which the lid 3 is attached to the container main body 2 and the container main body opening 21 is about to be closed while the substrate W is placed on the substrate platform 501. Before the lid 3 completely closes the container body opening 21 of the container body 2, the retainer substrate contact surface 306 contacts the front side of the edge of the edge of the substrate W. 7A and 8A, the substrate W and the retainer substrate contact surface 306 are in contact with each other, and the substrate W is not pushed backward by the elasticity of the arm portion 302. At this time, the place where the retainer substrate contact surface 306 contacts the edge of the front edge of the substrate W is defined as a substrate contact position 307, and the center of the arm portion 302 connected to the retainer substrate receiving portion 303 is the center. It is defined as the center 308 of the arm portion fixing position. A plane that passes through the substrate contact position 307 and is horizontal to the substrate W is defined as a substrate horizontal plane 801, and a plane that passes through the center 308 of the arm unit fixing position and is horizontal to the substrate W is defined as an arm unit horizontal plane 802. The substrate horizontal plane 801 and the arm portion horizontal plane 802 are parallel to each other, and the direction thereof is perpendicular to the central axis direction of the substrate W.
　本実施形態においては、アーム部水平面８０２は、基板水平面８０１よりも高さｈ１だけ上方に位置している。言い換えると、基板当接位置３０７は、アーム部固定位置の中心３０８よりも高さｈ１だけ下方向に位置している。 In the present embodiment, the arm part horizontal surface 802 is positioned above the substrate horizontal surface 801 by a height h1. In other words, the substrate contact position 307 is positioned lower than the center 308 of the arm portion fixing position by the height h1.
　次に、蓋体３を容器本体２に完全に取り付け、蓋体３の操作部３４を操作することで、蓋体３は容器本体２に着脱可能に固定され、基板収納容器１の容器本体開口部２１は閉塞される。すると、図７Ｂと図８Ｂに示すように、リテーナ部３０１は、アーム部３０２の弾性力により基板Ｗを基板水平面８０１に沿って後方向である基板水平後方向８０３に押す。すると、基板Ｗは、リテーナ部３０１のリテーナ基板当接面３０６と奥側基板支持部５０４の平面により支持される。この支持力は、アーム部３０２の材質や形状により適宜調整可能である。 Next, the lid 3 is completely attached to the container body 2 and the operation unit 34 of the lid 3 is operated, so that the lid 3 is detachably fixed to the container body 2 and the container body opening of the substrate storage container 1 is opened. The part 21 is closed. Then, as shown in FIG. 7B and FIG. 8B, the retainer unit 301 pushes the substrate W along the substrate horizontal plane 801 in the substrate horizontal rearward direction 803 by the elastic force of the arm unit 302. Then, the substrate W is supported by the retainer substrate contact surface 306 of the retainer unit 301 and the plane of the back substrate support unit 504. This supporting force can be appropriately adjusted depending on the material and shape of the arm portion 302.
　この時、アーム部固定位置の中心３０８と基板当接位置３０７の上下方向の高さがずれていることから、リテーナ基板受け部３０３には回転モーメントが働き、わずかにリテーナ基板受け部３０３が回転する。つまり、本実施形態においては、基板水平後方向８０３を基準としてリテーナ基板当接面の法線方向８０４が下方向に所定の角度傾斜することになる。厳密にはこの傾斜は、リテーナ基板当接面３０６と基板Ｗの当接する位置により、上下方向以外にも傾斜するが、本発明に有用となる基板Ｗを押える力の方向における傾斜成分のみを考慮すればよい。よって、リテーナ基板受け部３０３の回転による傾斜としては、上下方向の成分のみを考慮し、上記傾斜角度は上下方向の傾斜成分のみを意味するものとする。 At this time, since the vertical height of the center 308 of the arm portion fixing position and the substrate contact position 307 is deviated, a rotational moment acts on the retainer substrate receiving portion 303, and the retainer substrate receiving portion 303 slightly rotates. To do. That is, in this embodiment, the normal direction 804 of the retainer substrate contact surface is inclined downward by a predetermined angle with respect to the substrate horizontal rearward direction 803. Strictly speaking, this inclination is inclined in directions other than the vertical direction depending on the position where the retainer substrate contact surface 306 and the substrate W are in contact, but only the inclination component in the direction of the force for pressing the substrate W useful for the present invention is considered. do it. Therefore, as the inclination due to the rotation of the retainer substrate receiving portion 303, only the vertical component is taken into account, and the inclination angle means only the vertical inclination component.
　リテーナ基板当接面の法線方向８０４と基板水平後方向８０３とのなす角をリテーナ傾斜角θとする。リテーナ傾斜角θについては、図８Ｂ等の基板当接位置３０７を中心として、基板水平後方向８０３を基準に時計まわり（下方向）をプラス（正）の値、その逆をマイナス（負）の値と定義する。本実施形態の場合、蓋体３により容器本体開口部２１が完全に閉塞されていない状態である図７Ａや図８Ａに示す状態の場合には、リテーナ傾斜角は０（ゼロ）度である。また、蓋体３により容器本体開口部２１が完全に閉塞された状態である図７Ｂや図８Ｂに示す状態の場合には、リテーナ傾斜角はプラス１度程度である。つまり、蓋体３により容器本体開口部２１が完全に閉塞されていない状態におけるリテーナ傾斜角よりも、蓋体３により容器本体開口部２１が完全に閉塞された状態におけるリテーナ傾斜角の方が大きくなる。 The angle formed by the normal direction 804 of the retainer substrate contact surface and the substrate horizontal rearward direction 803 is defined as a retainer inclination angle θ. With respect to the retainer inclination angle θ, with the substrate abutting position 307 in FIG. 8B as the center, the horizontal (downward) direction of the substrate horizontal 803 is a positive (positive) value, and the opposite is a negative (negative) value. Define as value. In the case of the present embodiment, in the state shown in FIGS. 7A and 8A in which the container body opening 21 is not completely closed by the lid 3, the retainer inclination angle is 0 (zero) degree. In the state shown in FIGS. 7B and 8B in which the container body opening 21 is completely closed by the lid 3, the retainer inclination angle is about plus one degree. That is, the retainer inclination angle when the container body opening 21 is completely closed by the lid 3 is larger than the retainer inclination angle when the container body opening 21 is not completely closed by the lid 3. Become.
　図８Ｂにおいては、リテーナ基板受け部３０３の回転（傾斜）を分かりやすくするために、リテーナ基板受け部３０３の回転（傾斜量）が強調されて表示されている（以下、図１０Ｂも同様）。 8B, the rotation (inclination amount) of the retainer substrate receiving portion 303 is emphasized and displayed in order to make it easy to understand the rotation (inclination) of the retainer substrate receiving portion 303 (hereinafter, the same applies to FIG. 10B).
　上述したように、蓋体３により容器本体開口部２１が完全に閉塞することで、リテーナ基板受け部３０３に軽微な回転が発生する。蓋体３で容器本体２の容器本体開口部２１を閉塞する際に、リテーナ部３０１に働く、基板Ｗを基板水平後方向８０３に押す力の一部は、このリテーナ基板受け部３０３の軽微な回転により、基板Ｗの縁部の端縁を下方向に押す力に変わる。このため、基板Ｗを基板載置部５０１に押しつける力の成分が基板Ｗに対して働く。これにより、リテーナ部３０１の基板当接位置３０７と基板支持板状部５の奥側基板支持部５０４とにより基板Ｗが支持される。 As described above, the container body opening 21 is completely closed by the lid 3, thereby causing a slight rotation in the retainer substrate receiving portion 303. When closing the container main body opening 21 of the container main body 2 with the lid 3, a part of the force that acts on the retainer unit 301 and pushes the substrate W in the horizontal rearward direction 803 of the retainer substrate receiving unit 303 is slight. By the rotation, the force changes to a force pushing the edge of the edge of the substrate W downward. For this reason, the component of the force that presses the substrate W against the substrate platform 501 acts on the substrate W. As a result, the substrate W is supported by the substrate contact position 307 of the retainer unit 301 and the back side substrate support unit 504 of the substrate support plate-shaped unit 5.
　上記構成の第１実施形態に係る基板収納容器１によれば、以下のような効果を得ることができる。 According to the substrate storage container 1 according to the first embodiment having the above configuration, the following effects can be obtained.
　本発明によれば、リテーナ部のリテーナ基板当接面の平面と、奥側基板支部の平面とで基板を支持することを基本とし、リテーナ基板当接面の平面が所定の角度でわずかに下方向に回転することで、基板を基板載置部に押しつける力が働く。よって、ベース基板の上に薄いウェーハが張り合わされたボンデッドウェーハのような基板を支持する際に、その基板の上面にリテーナや奥側基板支持部が接触することなく基板を保持可能である。 According to the present invention, the substrate is supported by the plane of the retainer substrate contact surface of the retainer portion and the plane of the back substrate support portion, and the plane of the retainer substrate contact surface is slightly lowered at a predetermined angle. By rotating in the direction, a force that presses the substrate against the substrate mounting portion works. Therefore, when a substrate such as a bonded wafer in which a thin wafer is bonded to the base substrate is supported, the substrate can be held without the retainer or the back substrate support portion coming into contact with the upper surface of the substrate.
　また、基板の基板載置部に基板を押しつける力が働くため、基板収納容器が上下方向に振動したり衝撃を受けた場合であっても、基板が基板載置部から浮き上がることを防ぐことができ、基板とリテーナや奥側基板支持部との接触部が擦れ合うことを防止でき、これらの接触部が擦れ合うことで発生するパーティクルを極限まで低減できる。パーティクルの低減により、基板上に作成されるデバイスの歩留まりや不良率を改善することができる。 In addition, since the force that presses the substrate against the substrate placement portion of the substrate acts, even when the substrate storage container vibrates in the vertical direction or receives an impact, it is possible to prevent the substrate from floating from the substrate placement portion. It is possible to prevent the contact portion between the substrate and the retainer or the back substrate support portion from rubbing, and the particles generated by rubbing these contact portions can be reduced to the limit. By reducing the particles, it is possible to improve the yield and defect rate of devices formed on the substrate.
　さらに、基板の縁部をリテーナ部と奥側基板支持部の平面で受けて保持する為、これらの基板の支持部が基板の上面に接触することが無く、基板の上面の外周のぎりぎり近傍までデバイスを形成でき、デバイスを形成可能な有効面積や、一枚の基板から取れるデバイスの和を増やすことができ、デバイスのコストダウンに寄与する。 Furthermore, since the edges of the substrate are received and held by the planes of the retainer portion and the back substrate support portion, the support portions of these substrates do not come into contact with the upper surface of the substrate, and are close to the edge of the outer periphery of the upper surface of the substrate A device can be formed, and the effective area where the device can be formed and the sum of devices that can be taken from a single substrate can be increased, which contributes to cost reduction of the device.
　さらに、リテーナ部のリテーナ基板当接面や奥側基板支持部の平面を基板の厚さよりも高くすることで、特定の厚さを持つ基板に限らず、リテーナ基板当接面の高さ或いは奥側基板支持部の平面の高さ以下の厚みをもつ基板を支持可能であり、さらに厚さの異なる基板をも１つの基板収納容器で収納可能である。 Furthermore, by making the retainer substrate contact surface of the retainer part and the plane of the back substrate support part higher than the thickness of the substrate, the height or depth of the retainer substrate contact surface is not limited to a specific thickness. A substrate having a thickness equal to or lower than the plane height of the side substrate support portion can be supported, and substrates having different thicknesses can be stored in one substrate storage container.
　ここで、本実施形態のリテーナ基板当接面３０６は、基板水平後方向８０３に対して垂直に位置している（リテーナ基板当接面３０６の法線に対しては水平な面としている）が、これに限られず、リテーナ基板当接面３０６は、基板水平後方向に対して、上方向あるいは下方向に若干傾斜していてもよい。本実施形態においては、蓋体３が容器本体２の容器本体開口部２１を閉塞した状態で、リテーナ基板当接面３０６の法線が、基板水平後方向に対して下方向に傾斜していればよく、蓋体３が容器本体２の容器本体開口部２１を閉塞していない状態では、リテーナ基板当接面３０６の法線方向は本実施形態に限定されない。 Here, the retainer substrate contact surface 306 of the present embodiment is positioned perpendicular to the substrate horizontal rearward direction 803 (the surface is normal to the normal line of the retainer substrate contact surface 306). However, the present invention is not limited to this, and the retainer substrate contact surface 306 may be slightly inclined upward or downward with respect to the substrate horizontal rearward direction. In the present embodiment, the normal line of the retainer substrate contact surface 306 is inclined downward with respect to the substrate horizontal rearward direction with the lid 3 closing the container body opening 21 of the container body 2. The normal direction of the retainer substrate contact surface 306 is not limited to this embodiment in a state where the lid 3 does not close the container body opening 21 of the container body 2.
　［第２実施形態］
　次に、本発明の第２実施形態による基板収納容器１について図９を参照しながら説明する。図９は、本発明の第２実施形態に係る基板収納容器１において、基板Ｗとリテーナ部３０１Ａとが当接した状態を示す図である。本発明の第２実施形態に係る基板収納容器１のリテーナにおいては、アーム部３０２とリテーナ基板受け部３０３Ａの取り付け位置と、リテーナ基板受け部３０３Ａの形状とが、第１実施形態のリテーナと異なる。これ以外の構成については、第１実施形態による基板収納容器１の構成と同様であるため、第１実施形態における各構成と同様の構成については、同様の符号を付して説明を省略する。 [Second Embodiment]
Next, a substrate storage container 1 according to a second embodiment of the present invention will be described with reference to FIG. FIG. 9 is a view showing a state in which the substrate W and the retainer portion 301A are in contact with each other in the substrate storage container 1 according to the second embodiment of the present invention. In the retainer of the substrate storage container 1 according to the second embodiment of the present invention, the mounting position of the arm portion 302 and the retainer substrate receiving portion 303A and the shape of the retainer substrate receiving portion 303A are different from the retainer of the first embodiment. . Since the configuration other than this is the same as the configuration of the substrate storage container 1 according to the first embodiment, the same configuration as each configuration in the first embodiment is denoted by the same reference numeral and description thereof is omitted.
　図９に示すように、本実施形態のリテーナ部３０１Ａにおいては、アーム部３０２のアーム部固定位置の中心３０８と、基板Ｗがリテーナ基板受け部３０３Ａのリテーナ基板当接面３０６Ａと基板Ｗの縁部の端縁が当接する基板当接位置３０７とが、上下方向において同じ高さになっている。つまり、本実施形態は、基板水平面８０１とアーム部水平面８０２とが同一平面となる実施形態である。さらに、蓋体３により容器本体２の容器本体開口部２１が閉塞されていない状態において、リテーナ基板当接面３０６Ａの法線は、基板水平後方向８０３ではなく、基板水平後方向８０３に対して、下方向に傾斜している。この傾斜の傾斜角は、非常に軽微であり、本実施形態においては下方向に１度とした。この値は適宜設計変更可能である。 As shown in FIG. 9, in the retainer portion 301A of the present embodiment, the center 308 of the arm portion fixing position of the arm portion 302 and the substrate W are the edges of the retainer substrate contact surface 306A of the retainer substrate receiving portion 303A and the substrate W. The substrate contact position 307 with which the edge of the part contacts is the same height in the vertical direction. That is, this embodiment is an embodiment in which the substrate horizontal plane 801 and the arm horizontal plane 802 are the same plane. Further, in a state where the container body opening 21 of the container body 2 is not closed by the lid 3, the normal line of the retainer substrate contact surface 306 </ b> A is not the substrate horizontal rear direction 803 but the substrate horizontal rear direction 803. Inclined downward. The inclination angle of this inclination is very slight, and is set to 1 degree downward in the present embodiment. This value can be appropriately changed in design.
　リテーナ部３０１Ａを用いた本実施形態においては、蓋体３により容器本体２の容器本体開口部２１が閉塞されていない状態から、蓋体３により容器本体２の容器本体開口部２１が閉塞されアーム部３０２の弾性力により基板Ｗが基板水平後方向に押された状態となっても、リテーナ基板受け部３０３Ａが第１実施形態のように回転することはない。しかし、リテーナ部３０１Ａのリテーナ基板当接面３０６Ａが下方向に傾斜、即ち、垂直方向に対して傾斜しているので、第１実施形態と同様に、奥側基板支持部５０４の平面とリテーナ基板当接面３０６Ａとで基板Ｗを支持する際に、基板Ｗを基板載置部５０１に押しつける力の成分が働く。 In the present embodiment using the retainer portion 301A, the container body opening 21 of the container body 2 is closed by the lid 3 from the state where the container body opening 21 of the container body 2 is not closed by the lid 3 and the arm. Even when the substrate W is pushed backward in the horizontal direction by the elastic force of the portion 302, the retainer substrate receiving portion 303A does not rotate as in the first embodiment. However, since the retainer substrate contact surface 306A of the retainer portion 301A is inclined downward, that is, inclined with respect to the vertical direction, the plane of the back substrate support portion 504 and the retainer substrate are inclined as in the first embodiment. When the substrate W is supported by the contact surface 306 </ b> A, a component of force that presses the substrate W against the substrate platform 501 works.
　上記構成の第２実施形態に係る基板収納容器１によれば、第１実施形態と同様な効果をえることができる。 According to the substrate storage container 1 according to the second embodiment configured as described above, the same effects as those of the first embodiment can be obtained.
　［第３実施形態］
　次に、本発明の第３実施形態による基板収納容器１について図１０Ａと図１０Ｂを参照しながら説明する。図１０Ａは、第１実施形態の図８Ａに対応する図で、本発明の第３実施形態に係る基板収納容器１において、基板Ｗとリテーナ部３０１Ｂとが当接した状態を示す図である。図１０Ｂは、第１実施形態の図８Ｂに対応する図で、本発明の第３実施形態に係る基板収納容器１において、基板Ｗとリテーナ部３０１Ｂとが当接し、容器本体２の容器本体開口部２１を蓋体３で閉塞した状態を表す図である。 [Third Embodiment]
Next, a substrate storage container 1 according to a third embodiment of the present invention will be described with reference to FIGS. 10A and 10B. FIG. 10A is a diagram corresponding to FIG. 8A of the first embodiment, and shows a state in which the substrate W and the retainer portion 301B are in contact with each other in the substrate storage container 1 according to the third embodiment of the present invention. FIG. 10B is a view corresponding to FIG. 8B of the first embodiment, and in the substrate storage container 1 according to the third embodiment of the present invention, the substrate W and the retainer portion 301B abut, and the container body opening of the container body 2 is opened. It is a figure showing the state which block | closed the part 21 with the cover body 3. FIG.
　本発明の第３実施形態に係る基板収納容器１のリテーナは、アーム部３０２とリテーナ基板受け部３０３Ａの取り付け位置が、第２実施形態のリテーナとは異なる。これ以外の構成については、第２実施形態による基板収納容器１の構成と同様であるため、第１実施形態あるいは第２実施形態における各構成と同様の構成については、同様の符号を付して説明を省略する。 The retainer of the substrate storage container 1 according to the third embodiment of the present invention is different from the retainer of the second embodiment in the attachment position of the arm portion 302 and the retainer substrate receiving portion 303A. Since the configuration other than this is the same as the configuration of the substrate storage container 1 according to the second embodiment, the same configurations as those in the first embodiment or the second embodiment are denoted by the same reference numerals. Description is omitted.
　図１０Ａに示すように、本実施形態のリテーナ部３０１Ｂは、アーム部３０２のアーム部固定位置の中心３０８と、リテーナ基板受け部３０３Ｂのリテーナ基板当接面３０６Ａと基板Ｗの縁部の端縁とが当接する基板当接位置３０７とが、上下方向において、同じ高さになってない。第１実施形態の場合とは逆に、上下方向において、基板当接位置３０７がアーム部固定位置の中心３０８よりも上方向に位置している。つまり、本実施形態においては、アーム部水平面８０２は、基板水平面８０１よりも高さｈ２だけ下方に位置している。リテーナ基板受け部３０３Ｂの形状は第２実施形態と同じである。 As shown in FIG. 10A, the retainer portion 301B of the present embodiment includes an edge 308 of the arm portion fixing position of the arm portion 302, the retainer substrate contact surface 306A of the retainer substrate receiving portion 303B, and the edge of the substrate W. The substrate abutting position 307 where the abuts with each other does not have the same height in the vertical direction. Contrary to the case of the first embodiment, the substrate contact position 307 is positioned above the center 308 of the arm portion fixing position in the vertical direction. That is, in this embodiment, the arm part horizontal surface 802 is positioned below the substrate horizontal surface 801 by a height h2. The shape of the retainer substrate receiving portion 303B is the same as that of the second embodiment.
　次に、蓋体３で容器本体２の容器本体開口部２１を閉塞する際の基板Ｗの支持状況を説明する。 Next, the support state of the substrate W when the lid 3 closes the container body opening 21 of the container body 2 will be described.
　蓋体３が容器本体２の容器本体開口部２１を完全に閉塞する前に、リテーナ基板当接面３０６Ａが基板Ｗの縁部の端縁の前側に若干斜めに当接する。図１０Ａの状態では、基板Ｗとリテーナ基板当接面３０６Ａとが当接したのみで、アーム部３０２の弾性で基板Ｗを後方向に押してはいない。 Before the lid 3 completely closes the container body opening 21 of the container body 2, the retainer substrate contact surface 306 </ b> A contacts the front side of the edge of the edge of the substrate W slightly obliquely. In the state of FIG. 10A, the substrate W and the retainer substrate contact surface 306A are in contact with each other, and the substrate W is not pushed backward by the elasticity of the arm portion 302.
　この時、リテーナ基板当接面３０６Ａの法線方向をリテーナ基板当接面の法線方向８０５とし、基板水平後方向８０３との成す角をリテーナ初期傾斜角θ０とする。本実施形態においては、リテーナ初期傾斜角θ０はプラス２度とした。 At this time, the normal direction of the retainer substrate contact surface 306A is the normal direction 805 of the retainer substrate contact surface, and the angle formed with the substrate horizontal rearward direction 803 is the retainer initial inclination angle θ0. In the present embodiment, the retainer initial inclination angle θ0 is set to plus 2 degrees.
　次に、蓋体３を容器本体２に完全に取り付け、蓋体３の操作部３４を操作することで、蓋体３を容器本体２に着脱可能に固定し、これにより基板収納容器１の容器本体開口部２１は閉塞される。すると、図１０Ｂに示すように、リテーナ基板受け部３０３Ｂは、アーム部３０２の弾性力により基板Ｗを基板水平面８０１にそって後方向である基板水平後方向８０３に押す。すると、基板Ｗは、リテーナ基板受け部３０３Ｂのリテーナ基板当接面３０６Ａと奥側基板支持部５０４の平面により支持される。この時、アーム部固定位置の中心３０８と基板当接位置３０７の上下方向の高さがずれていることから、リテーナ基板受け部３０３Ｂには回転モーメントが働き、わずかにリテーナ基板受け部３０３Ｂが回転する。この回転方向は、実施形態１の場合とは逆の方向つまり、上方向（半時計回り方向）に回転する。その場合でも、本実施形態においては、基板水平後方向８０３を基準として回転した後のリテーナ基板当接面３０６Ａの法線方向８０４が下方向に所定の角度傾斜するように構成する。具体的には、当該所定の角度傾斜するように、リテーナ基板当接面の傾斜角であるリテーナ初期傾斜角と、アーム部固定位置の中心と基板当接位置の上下方向の差である高さｈ２とを設計する。 Next, the lid 3 is completely attached to the container main body 2 and the operation unit 34 of the lid 3 is operated to fix the lid 3 to the container main body 2 in a detachable manner. The main body opening 21 is closed. Then, as shown in FIG. 10B, the retainer substrate receiving portion 303 </ b> B pushes the substrate W along the substrate horizontal plane 801 in the rearward horizontal direction 803, which is the rear direction, by the elastic force of the arm portion 302. Then, the substrate W is supported by the retainer substrate contact surface 306 </ b> A of the retainer substrate receiving portion 303 </ b> B and the flat surface of the rear substrate support portion 504. At this time, since the vertical height of the center 308 of the arm portion fixing position and the substrate contact position 307 is shifted, a rotational moment acts on the retainer substrate receiving portion 303B, and the retainer substrate receiving portion 303B is slightly rotated. To do. This rotation direction rotates in the opposite direction to that in the first embodiment, that is, in the upward direction (counterclockwise direction). Even in such a case, in the present embodiment, the normal direction 804 of the retainer substrate contact surface 306A after rotating with respect to the substrate horizontal rear direction 803 is inclined downward by a predetermined angle. Specifically, the retainer initial contact angle, which is the inclination angle of the retainer substrate contact surface, and the height, which is the difference between the center of the arm portion fixing position and the substrate contact position in the vertical direction, so that the predetermined angle is inclined. h2 is designed.
　リテーナ回転後のリテーナ基板当接面の法線方向８０４と基板水平後方向８０３とのなす角であるリテーナ傾斜角θは、第１実施形態と同様に、リテーナ傾斜角θはプラス１度程度である。つまり、蓋体３で容器本体２の容器本体開口部２１を閉塞する前後に置いて、閉塞後のリテーナ傾斜角θは、閉塞前のリテーナ初期傾斜角θ０よりも小さくなる。 As in the first embodiment, the retainer inclination angle θ, which is an angle formed by the normal direction 804 of the retainer substrate contact surface after rotation of the retainer and the substrate horizontal rear direction 803, is about plus one degree. is there. That is, the retainer inclination angle θ after closing is set smaller than the initial inclination angle θ0 of the retainer before closing, before and after closing the container body opening 21 of the container body 2 with the lid 3.
　図１０Ａおよび図１０Ｂにおいては、リテーナ基板受け部３０３Ｂの回転（傾斜）を分かりやすくするために、リテーナ基板受け部３０３Ｂの傾斜量や回転量を強調して表示している。 10A and 10B, in order to make the rotation (inclination) of the retainer substrate receiving portion 303B easy to understand, the inclination amount and the rotation amount of the retainer substrate receiving portion 303B are highlighted.
　上述したように、蓋体３により容器本体開口部２１が完全に閉塞することで、リテーナ部３０１の軽微な回転が発生する。蓋体３で容器本体２の容器本体開口部２１を閉塞する際に、リテーナ部３０１に働く、基板Ｗを基板水平後方向８０３に押す力の一部は、第２実施形態における基板Ｗの縁部の端縁を下方向に押す力に比べ弱まるが、このリテーナ部３０１Ｂの軽微な回転により、基板Ｗを基板載置部５０１に押しつける力の成分が働くことになる。これにより、リテーナ部３０１Ｂのリテーナ基板当接面３０６Ａと基板支持板状部５の奥側基板支持部５０４とにより基板Ｗが支持される。 As described above, the container body opening 21 is completely closed by the lid 3, so that the retainer 301 is slightly rotated. When closing the container main body opening 21 of the container main body 2 with the lid 3, part of the force that acts on the retainer 301 and pushes the substrate W in the horizontal rearward direction 803 is the edge of the substrate W in the second embodiment. Although it is weaker than the force that pushes the edge of the portion downward, the component of the force that pushes the substrate W against the substrate mounting portion 501 acts by the slight rotation of the retainer portion 301B. Accordingly, the substrate W is supported by the retainer substrate contact surface 306A of the retainer portion 301B and the back side substrate support portion 504 of the substrate support plate-like portion 5.
　上記構成の第３実施形態に係る基板収納容器１によれば、第１実施形態の効果と同様な効果を得ることができる。 According to the substrate storage container 1 according to the third embodiment having the above-described configuration, the same effect as that of the first embodiment can be obtained.
　本発明は、上述した複数の実施形態に限定されることはなく、特許請求の範囲に記載された技術的範囲において変形が可能である。 The present invention is not limited to the above-described embodiments, and can be modified within the technical scope described in the claims.
　例えば、リテーナ部のアーム部やリテーナ基板受け部、基板支持板形状部の形状は、本実施形態の形状に限定されない。また、容器本体及び蓋体の形状、容器本体に収納可能な基板Ｗの枚数や寸法は、本実施形態における容器本体及び蓋体の形状、容器本体に収納可能な基板Ｗの枚数や寸法に限定されない。 For example, the shape of the arm portion of the retainer portion, the retainer substrate receiving portion, and the substrate support plate shape portion is not limited to the shape of the present embodiment. Further, the shape of the container main body and the lid, and the number and dimensions of the substrates W that can be stored in the container main body are limited to the shape of the container main body and the lid, and the number and dimensions of the substrates W that can be stored in the container main body in this embodiment. Not.
　ここで、リテーナ３５は、蓋体３に着脱可能に固定され、基板支持板状部５は、容器本体２に着脱可能に固定されている。よって、リテーナと基板支持板状部は、基板収納容器の目的により適したものに取り換えが可能である。よって、用途に適したリテーナや基板支持板状部を取り付けた出荷容器により基板を搬送後、この出荷容器のリテーナと基板支持板状部を本発明のリテーナと基板支持板状部に交換することで、出荷容器を工程内容器に容易に変更可能である。この場合、出荷容器の容器本体と蓋体を再利用できるメリットがある。 Here, the retainer 35 is detachably fixed to the lid 3, and the substrate support plate-like portion 5 is detachably fixed to the container body 2. Therefore, the retainer and the substrate support plate-like portion can be replaced with ones more suitable for the purpose of the substrate storage container. Therefore, after the substrate is transported by a shipping container equipped with a retainer or substrate supporting plate-shaped part suitable for the application, the retainer and the substrate supporting plate-shaped part of this shipping container are replaced with the retainer and the substrate supporting plate-shaped part of the present invention. Thus, the shipping container can be easily changed to the in-process container. In this case, there is an advantage that the container body and the lid of the shipping container can be reused.
　また、上述した複数の実施形態において、基板支持板状部については、基板載置部と奥側基板支持部を一体で形成した場合について説明した。しかし、これに限定されず、基板載置部と奥側基板支持部を別部品として形成し、それぞれ第１側壁や第２側壁に固定しても良い。さらに、基板支持板状部は、第１側壁や第２側壁に対して着脱可能に構成されることに限定されず、第１側壁や第２側壁と一体的に形成されても良い。 Further, in the above-described plurality of embodiments, the substrate support plate-like portion has been described with respect to the case where the substrate placement portion and the back substrate support portion are integrally formed. However, the present invention is not limited to this, and the substrate mounting portion and the back substrate support portion may be formed as separate components and fixed to the first side wall and the second side wall, respectively. Further, the substrate support plate-like portion is not limited to be configured to be detachable from the first side wall and the second side wall, and may be formed integrally with the first side wall and the second side wall.
１　基板収納容器
２　容器本体
３　蓋体
４　シール部材
５　基板支持板状部（側方基板支持部）
２０　壁部
２１　容器本体開口部
２２　奥壁
２３　上壁
２４　下壁
２５　第１側壁
２６　第２側壁
２７　基板収納空間
２８　リブ
２９　トップフランジ
３０　シール面
３１　開口周縁部
３２Ａ、３２Ｂ　上側ラッチ部
３３Ａ、３３Ｂ　下側ラッチ部
３４　操作部
３５　リテーナ
３６　リテーナ係合凸部
３７　凹部
４０Ａ、４０Ｂ　上側ラッチ係合凹部
４１Ａ，４１Ｂ　下側ラッチ係合凹部
２５０　前側被係合部
２５１　後側中央被係合部
２５２　後側被係合部
２５３　後側被係合固定部
３００　リテーナフレーム
３０１、３０１Ａ、３０１Ｂ　リテーナ部
３０２　アーム部
３０３、３０３Ａ、３０３Ｂ　リテーナ基板受け部
３０４　上側フランジ
３０５　下側フランジ
３０６、３０６Ａ　リテーナ基板当接面
３０７　基板当接位置
３０８　アーム部固定位置の中心
５００　前側係合部
５０１　基板載置部
５０２　前側載置突起
５０３　奥側載置部
５０４　奥側基板支持部
５０５　後側中央係合部
５０６　後側係合部
５０７　後側係合固定部
８０１　基板水平面
８０２　アーム部固定位置の中心を通る水平面
８０３　基板水平後方向
８０４　リテーナ基板当接面の法線方向
８０５　リテーナ基板当接面の初期法線方向
ｈ１、ｈ２　アーム部固定位置の中心と基板当接位置の上下方向の差
θ　リテーナ傾斜角
θ０　リテーナ初期傾斜角
ＢＷ　ベース基板
ＴＷ　薄いウェーハ
Ｗ　　基板 DESCRIPTION OF SYMBOLS 1 Substrate storage container 2 Container body 3 Lid 4 Seal member 5 Substrate support plate-like part (side board support part)
20 Wall portion 21 Container body opening portion 22 Back wall 23 Upper wall 24 Lower wall 25 First side wall 26 Second side wall 27 Substrate storage space 28 Rib 29 Top flange 30 Sealing surface 31 Opening peripheral edge portions 32A, 32B Upper latch portions 33A, 33B Lower latch part 34 Operation part 35 Retainer 36 Retainer engaging convex part 37 Recessed part 40A, 40B Upper latch engaging concave part 41A, 41B Lower latch engaging recessed part 250 Front engaged part 251 Rear central engaged part 252 Rear Side engaged portion 253 Rear engaged fixed portion 300 Retainer frames 301, 301A, 301B Retainer portion 302 Arm portions 303, 303A, 303B Retainer substrate receiving portion 304 Upper flange 305 Lower flange 306, 306A Retainer substrate contact surface 307 Substrate contact position 308 Center of arm portion fixing position 500 Front engagement portion 501 Plate placement portion 502 Front placement projection 503 Back placement portion 504 Back substrate support portion 505 Rear center engagement portion 506 Rear engagement portion 507 Rear engagement fixation portion 801 Substrate horizontal surface 802 Arm portion fixation position Horizontal plane 803 passing through the center Horizontal direction 804 of the retainer substrate contact surface Normal direction 805 of the retainer substrate contact surface Initial normal direction h1 and h2 of the retainer substrate contact surface Vertical difference θ between the center of the arm fixing position and the substrate contact position θ Retainer tilt angle θ0 Retainer initial tilt angle BW Base substrate TW Thin wafer W substrate

Claims (6)

  1. 複数の基板を収納可能な基板収納空間が内部に形成され、一端部に前記基板収納空間に連通する容器本体開口部を有する容器本体と、
    前記容器本体開口部を閉塞可能な蓋体と、
    前記蓋体の部分であって前記蓋体によって前記容器本体開口部が閉塞されているときに前記基板収納空間に対応する側の部分に配置され、前記複数の基板の端部を支持可能なリテーナと、
    前記基板収納空間の内面に前記リテーナと対をなすように配置され、前記複数の基板の外縁部を位置決め保持する一対の基板支持板状部と、
    を有する基板収納容器において、
    　前記基板支持板状部は、前記基板を載置する基板載置部と、前記基板の端部に当接し保持する奥側基板支持部と、を有し、
    　前記リテーナは、前記基板が当接するリテーナ基板当接面を有するリテーナ基板受け部と、前記リテーナ基板受け部に接続されたアーム部と、を有し、
    　前記蓋体が容器本体開口部を閉塞した状態のときに、前記基板の厚さ方向の中心を通り厚さ方向に垂直で前記基板収納容器の後方向である基板水平後方向を基準として、前記リテーナ基板当接面の法線方向が下側に所定の角度傾斜していることを特徴とする基板収納容器。     A container main body having a container main body opening formed therein and capable of accommodating a plurality of substrates, the container main body opening at one end communicating with the substrate storage space;
    A lid capable of closing the container body opening,
    A retainer that is disposed on a portion corresponding to the substrate storage space when the container main body opening is closed by the lid, and is capable of supporting the ends of the plurality of substrates. When,
    A pair of substrate support plate-like portions that are disposed on the inner surface of the substrate storage space so as to form a pair with the retainer, and that position and hold the outer edge portions of the plurality of substrates;
    In a substrate storage container having
    The substrate support plate-like portion has a substrate placement portion for placing the substrate, and a back side substrate support portion that contacts and holds an end portion of the substrate,
    The retainer includes a retainer substrate receiving portion having a retainer substrate contact surface with which the substrate contacts, and an arm portion connected to the retainer substrate receiving portion,
    When the lid closes the container main body opening, the substrate horizontal rear direction that is perpendicular to the thickness direction and passes through the center in the thickness direction of the substrate and is the rear direction of the substrate storage container, is used as a reference. A substrate storage container, wherein a normal direction of a retainer substrate contact surface is inclined downward by a predetermined angle.
  2. 　前記基板水平後方向を基準として前記リテーナ基板当接面の法線方向の角度をリテーナ傾斜角とし、前記基準から下方向への回転角度を正の値とすると、前記蓋体により前記容器本体開口部が閉塞されていない状態における前記リテーナ傾斜角よりも、前記蓋体により前記容器本体開口部が閉塞された状態における前記リテーナ傾斜角が大きくなることを特徴とする請求項１に記載の基板収納容器。 If the angle in the normal direction of the retainer substrate contact surface with respect to the rearward horizontal direction of the substrate is a retainer inclination angle, and the rotation angle downward from the reference is a positive value, the lid opens the container body. 2. The substrate storage according to claim 1, wherein the retainer inclination angle in a state in which the container main body opening is closed by the lid is larger than the retainer inclination angle in a state in which the portion is not closed. container.
  3. 　前記リテーナ基板当接面において前記基板が当接する基板当接位置が、前記リテーナ基板受け部と前記アーム部とが接続されたアーム部固定位置の中心よりも下方向に位置することを特徴とする請求項１又は請求項２に記載の基板収納容器。 A board contact position where the board comes into contact with the retainer board contact surface is located below a center of an arm part fixing position where the retainer board receiving part and the arm part are connected. The substrate storage container according to claim 1 or 2.
  4. 　前記リテーナ基板当接面において前記基板が当接する基板当接位置が、前記リテーナ基板受け部と前記アーム部とが接続されたアーム部固定位置の中心と同じ高さ又は上方向に位置し、
    　且つ、前記蓋体が前記容器本体開口部を閉塞していない状態のときに、前記基板水平後方向を基準として前記リテーナ基板当接面の法線方向が下側に所定の角度傾斜していることを特徴とする請求項１に記載の基板収納容器。     The substrate contact position where the substrate contacts the retainer substrate contact surface is located at the same height or upward as the center of the arm portion fixing position where the retainer substrate receiving portion and the arm portion are connected,
    In addition, when the lid does not close the opening of the container main body, the normal direction of the retainer substrate contact surface is inclined downward by a predetermined angle with respect to the substrate horizontal rearward direction. The substrate storage container according to claim 1.
  5. 複数の基板を収納可能な基板収納空間が内部に形成され、一端部に前記基板収納空間に連通する容器本体開口部を有する容器本体と、前記容器本体開口部を閉塞可能な蓋体と、を有する基板収納容器に用いられるリテーナであって、
    前記蓋体の部分であって前記蓋体によって前記容器本体開口部が閉塞されているときに前記基板収納空間に対応する側の部分に配置され、前記複数の基板の端部を支持可能なリテーナにおいて、
    　前記リテーナは、前記基板が当接するリテーナ基板当接面を有するリテーナ基板受け部と、前記リテーナ基板受け部に接続されたアーム部と、を有し、
    　前記リテーナ基板当接面における前記基板が当接する基板当接位置が、前記リテーナ基板受け部と前記アーム部とが接続されたアーム部固定位置中心より下方向に位置することを特徴とするリテーナ。     A container housing space in which a plurality of substrates can be stored is formed inside, a container body having a container body opening communicating with the substrate housing space at one end, and a lid capable of closing the container body opening. A retainer used for a substrate storage container having:
    A retainer that is disposed on a portion corresponding to the substrate storage space when the container main body opening is closed by the lid, and is capable of supporting the ends of the plurality of substrates. In
    The retainer includes a retainer substrate receiving portion having a retainer substrate contact surface with which the substrate contacts, and an arm portion connected to the retainer substrate receiving portion,
    A retainer, wherein a substrate abutting position where the substrate abuts on the retainer substrate abutting surface is positioned below a center of an arm portion fixing position where the retainer substrate receiving portion and the arm portion are connected.
  6. 複数の基板を収納可能な基板収納空間が内部に形成され、一端部に前記基板収納空間に連通する容器本体開口部を有する容器本体と、前記容器本体開口部を閉塞可能な蓋体と、を有する基板収納容器に用いられるリテーナであって、
    前記蓋体の部分であって前記蓋体によって前記容器本体開口部が閉塞されているときに前記基板収納空間に対応する側の部分に配置され、前記複数の基板の端部を支持可能なリテーナにおいて、
    　リテーナ基板当接面において前記基板が当接する基板当接位置が、リテーナ基板受け部とアーム部とが接続されたアーム部固定位置の中心と同じ高さ又は上方向に位置し、
    　且つ、前記蓋体が前記容器本体開口部を閉塞していない状態のときに、前記基板の厚さ方向の中心を通り厚さ方向に垂直で前記基板収納容器の後方向である基板水平後方向を基準として、前記リテーナ基板当接面の法線方向が下側に所定の角度傾斜していることを特徴とするリテーナ。     A container housing space in which a plurality of substrates can be stored is formed inside, a container body having a container body opening communicating with the substrate housing space at one end, and a lid capable of closing the container body opening. A retainer used for a substrate storage container having:
    A retainer that is disposed on a portion corresponding to the substrate storage space when the container main body opening is closed by the lid, and is capable of supporting the ends of the plurality of substrates. In
    The substrate abutting position where the substrate abuts on the retainer substrate abutting surface is located at the same height or upward as the center of the arm portion fixing position where the retainer substrate receiving portion and the arm portion are connected,
    In addition, when the lid does not close the container main body opening, the substrate horizontal rearward direction that passes through the center of the thickness direction of the substrate and is perpendicular to the thickness direction and is the rearward direction of the substrate storage container The retainer is characterized in that the normal direction of the retainer substrate contact surface is inclined downward by a predetermined angle with reference to the above.
PCT/JP2015/067738 2014-07-10 2015-06-19 Substrate housing container and retainer WO2016006412A1 (en)

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