WO2015199201A1 - Procédé de formation de motif fonctionnel en forme de réseau maillé, motif fonctionnel en forme de réseau maillé et substrat fonctionnel - Google Patents

Procédé de formation de motif fonctionnel en forme de réseau maillé, motif fonctionnel en forme de réseau maillé et substrat fonctionnel Download PDF

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Publication number
WO2015199201A1
WO2015199201A1 PCT/JP2015/068414 JP2015068414W WO2015199201A1 WO 2015199201 A1 WO2015199201 A1 WO 2015199201A1 JP 2015068414 W JP2015068414 W JP 2015068414W WO 2015199201 A1 WO2015199201 A1 WO 2015199201A1
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Prior art keywords
pattern
parallel line
line pattern
functional
mesh
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PCT/JP2015/068414
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English (en)
Japanese (ja)
Inventor
正好 山内
直人 新妻
大屋　秀信
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コニカミノルタ株式会社
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Priority to JP2016529665A priority Critical patent/JP6515928B2/ja
Publication of WO2015199201A1 publication Critical patent/WO2015199201A1/fr

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/36—Successively applying liquids or other fluent materials, e.g. without intermediate treatment
    • B05D1/38—Successively applying liquids or other fluent materials, e.g. without intermediate treatment with intermediate treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports

Definitions

  • the present invention relates to a method for forming a mesh-like functional pattern, a mesh-like functional pattern formed by the method, and a functional substrate provided with the mesh-like functional pattern.
  • the width of the fine line cannot be made equal to or less than the diameter of the ejected droplet, and a fine line pattern having a line width of several ⁇ m cannot be formed.
  • a method in which a functional material, which is a solid content in a droplet, is deposited on the periphery of the droplet using convection inside the droplet to form a pattern having a finer width than the droplet.
  • Patent Document 1 a method in which a functional material, which is a solid content in a droplet, is deposited on the periphery of the droplet using convection inside the droplet to form a pattern having a finer width than the droplet.
  • Patent Document 2 describes that a transparent conductive film is formed by forming a ring having a fine width of conductive fine particles and connecting a plurality of these rings using this method.
  • the present applicant forms a parallel line pattern by separating the conductive material in the liquid applied in a line shape into edges by the movement of the liquid, and further, a transparent made of the parallel line pattern. Forming a conductive film was invented and reported so far (Patent Document 3).
  • Patent Document 3 describes that when forming a parallel line pattern intersecting in a grid pattern, one-pass printing is used to double the amount of ink applied at the intersection, in this case, the intersection Becomes a ring shape that is thicker than the parallel line portion, and the ring-shaped portion may be periodically visually recognized, and there is room for further improvement in terms of low visibility (that is, a property that is difficult to visually recognize).
  • the interval between the line segments constituting the second parallel line pattern differs between the inside and outside of the first parallel line pattern forming region, thereby causing the line segments to swell and narrow, resulting in low visibility.
  • a new problem was found that would reduce it.
  • the length of the conductive path is increased in the direction along the first parallel line pattern due to the swelling and narrowing generated in the second parallel line pattern.
  • a new problem has also been found that it differs in the direction along the parallel line pattern and causes variations in resistance.
  • an object of the present invention is to provide a method for forming a mesh-like functional pattern, a mesh-like functional pattern, and a functional base material that can improve low visibility and suppress variation in resistance.
  • the functional material is selectively deposited on the edge in the process of applying the first line-shaped liquid containing the functional material on the substrate and drying the first line-shaped liquid.
  • Forming a first parallel line pattern composed of two line segments including: Next, in the process of applying a second line-shaped liquid containing a functional material on the substrate so as to intersect the formation region of the first parallel line pattern, and drying the second line-shaped liquid.
  • the difference between the surface energy in the formation region of the first parallel line pattern and the surface energy outside the formation region of the first parallel line pattern is 5 mN / m. 2.
  • Schematic explanatory diagram conceptually illustrating an example of a method of forming a parallel line pattern Explanatory drawing explaining an example (reference example) of the formation method of a mesh-like functional pattern Explanatory drawing explaining the other example (reference example) of the formation method of a mesh-like functional pattern Explanatory drawing explaining the further another example of the formation method of a mesh-shaped functional pattern
  • the principal part enlarged view which shows the example of formation of the crossing part X
  • interval B Partial enlarged plan view showing an example of a parallel line pattern formed on a substrate Explanatory drawing explaining the (viii)-(viii) line cross section in FIG.
  • Optical micrograph of functional mesh pattern (Example)
  • a phenomenon in which the functional material contained in the liquid is selectively deposited on the edge of the liquid is used. can do.
  • This phenomenon may be referred to as a coffee ring phenomenon or a coffee stain phenomenon. Since the present invention is not limited to a ring-shaped pattern, in the following description, this phenomenon may be referred to as a coffee stain phenomenon.
  • FIG. 1 is a schematic explanatory view for conceptually explaining an example of a method for forming a parallel line pattern using such a basic principle.
  • 1 is a substrate
  • 2 is a line-shaped liquid containing a functional material
  • 3 is formed by selectively depositing a functional material on the edge of the line-shaped liquid 2.
  • It is a coating film (hereinafter also referred to as a parallel line pattern).
  • Reference numeral 7 denotes an applying means for applying a liquid onto the substrate 1, and here it is constituted by a droplet discharge device.
  • the droplet discharge device 7 can be constituted by, for example, an ink jet head provided in the ink jet recording apparatus.
  • a liquid containing a functional material is discharged from the droplet discharge device 7 while relatively scanning the droplet discharge device 7 and the substrate 1, and a plurality of liquid droplets sequentially discharged are discharged.
  • the liquid droplets coalesce on the substrate to form a line-like liquid 2 containing a functional material.
  • the coffee stain phenomenon can be caused by setting conditions for drying the line-shaped liquid 2.
  • the drying of the line-shaped liquid 2 arranged on the substrate 1 is faster at the edge compared to the central portion, and the solid content reaches a saturated concentration as the drying proceeds, and the solid content locally reaches the edge of the line-shaped liquid 2.
  • Precipitation occurs.
  • the edge of the line-shaped liquid 2 is fixed by the deposited solid content, and shrinkage in the width direction of the line-shaped liquid 2 due to subsequent drying is suppressed.
  • the liquid of the line-shaped liquid 2 forms a convection from the central portion toward the edge so as to compensate for the liquid lost by evaporation at the edge.
  • a parallel line pattern 3 made of fine lines containing a functional material is formed on the substrate 1.
  • the parallel line pattern 3 formed from one line-shaped liquid 2 is composed of a set of two thin lines 31 and 32.
  • a mesh-like functional pattern formed by intersecting a plurality of parallel line patterns can be formed.
  • Such a mesh-like functional pattern is advantageous in realizing distribution of the functional material on the base material while maintaining low visibility.
  • the line segment constituting the parallel line pattern formed as described above can realize a line width of several ⁇ m
  • the mesh-like functional pattern is formed by the functional material itself due to its fine line width. Even if it is not transparent, it is not recognized by the human eye and looks as if it is transparent.
  • the shape of the thin line pattern of the functional material can be set by the device that uses the functional material.
  • a touch sensor used for a touch panel uses a transparent surface electrode to detect a position by a finger or the like.
  • a conductive material is used as a functional material in a mesh-like functional pattern, it can be preferably applied to a transparent surface electrode for a touch panel or the like. From the viewpoint of configuring a surface electrode or the like, it is very effective to increase the number of conductive paths to be meshed with a plurality of parallel line patterns having different formation directions.
  • FIG. 2 is an explanatory diagram for explaining an example (reference example) of a method for forming a mesh-like functional pattern.
  • a line-like liquid 2 is applied in a mesh form on a substrate 1. That is, the line-shaped liquid 2 is applied so as to intersect at the intersection X.
  • the line segments 31 and 32 are cut off at the intersection X where the parallel lines having different directions intersect.
  • FIG. 3 is an explanatory diagram for explaining another example (reference example) of a method for forming a mesh-like functional pattern.
  • the amount of ink at the intersection formed by the line-shaped liquid 2 is set larger than that in the other parts.
  • intersection X becomes a ring shape having a diameter larger than the interval between the line segments 31 and 32 as shown in FIG.
  • Such a ring-shaped part is advantageous in terms of preventing disconnection of the line segments 31 and 32 and facilitating, for example, ensuring conductivity, but such a ring-shaped part is periodically visible. It has been found that there is a limit in terms of further improving the low visibility.
  • FIG. 4 is an explanatory diagram for explaining still another example of a method for forming a mesh-like functional pattern.
  • the line-shaped liquid 2 is applied in a first direction (left and right direction in the figure).
  • a functional material is selectively deposited on the edge to form a first parallel line pattern 3 as shown in FIG.
  • the second direction is different from the first direction (in this example, the direction is perpendicular to the first direction and is the vertical direction in the figure). 2 of the line-shaped liquid 4 is applied. That is, the second line-shaped liquid 4 is applied so as to intersect the formation region of the first parallel line pattern 3.
  • a functional material is selectively deposited on the edge to form a second parallel line pattern 5 as shown in FIG.
  • Reference numerals 51 and 52 denote line segments constituting the second parallel line pattern 5.
  • a mesh-like functional pattern is formed by the first parallel line pattern 3 and the second parallel line pattern 5 having different formation directions.
  • the line segments 31, 32 and the line segments 51, 52 can be prevented from being interrupted at the intersection X where the parallel lines having different directions intersect.
  • FIG. 5 is an enlarged view of a main part showing an example of forming the intersection X.
  • 5A and 5B are reference examples
  • FIG. 5C is a diagram for explaining the present invention.
  • the length of the conductive path extends along the first parallel line pattern 3 (first direction) and the second parallel line. It was found that there was room for further improvement from the viewpoint of preventing variation in resistance due to differences in the direction along the pattern 5 (second direction).
  • the interval between the two line segments 51 and 52 constituting the second parallel line pattern 5 is as follows.
  • the average interval A within the formation region of the first parallel line pattern 3 and the average interval B outside the formation region of the first parallel line pattern 3 are adjusted so as to satisfy the following formula (1).
  • the functional material is a conductive material
  • the length of the conductive path is reduced.
  • the first direction and the second direction can be made the same with high accuracy, and the effect that the variation in resistance can be suitably suppressed is obtained.
  • the formation region of the first parallel line pattern 3 can be said to be a region from one line segment 31 to the other line segment 32 constituting the first parallel line pattern. It can also be said to be an application region of the first line-shaped liquid 2 applied to form the line pattern 3.
  • the interval B can be an average value of the intervals measured at a plurality of locations.
  • a plurality of (n) measurement points set to measure the average interval A may be arranged at equal intervals along the second direction in the formation region of the first parallel line pattern 3. preferable.
  • a plurality (m places) of measurement points set to measure the average interval B are arranged at equal intervals along the second direction outside the region where the first parallel line pattern 3 is formed. Is preferred.
  • the average interval A and the average interval B are preferably measured as follows.
  • FIG. 6 is a diagram for explaining an example of a method for measuring the average interval A and the average interval B.
  • the average interval A is along the line segments 31 and 32 constituting the first parallel line pattern with respect to the interval between the line segments 51 and 52 constituting the second parallel line pattern 5. It can be obtained as the average of the distances measured at a total of 7 points A 1 to A 7 of 2 points A 1 and A 2 and 5 points A 3 to A 7 inside the line segments 31 and 32. At this time, these seven measurement points A 1 to A 7 are positioned at equal intervals along the formation direction (second direction) of the second parallel line pattern.
  • the average interval B is a total of seven measurement points A 1 to A related to the average interval A described above with respect to the interval between the line segments 51 and 52 constituting the second parallel line pattern 5. It can be obtained as an average of intervals measured at a total of five measurement points B 1 to B 5 adjacent to A 7 .
  • these five measurement points B 1 to B 5 are a total of seven measurement points A related to the average interval A described above along the second parallel line pattern forming direction (second direction). it can be positioned in the same regular intervals as the 1 ⁇ a 7.
  • a total of seven measurement points A 1 to A 7 related to the measurement of the average interval A and a total of five measurement points B 1 to B 5 related to the measurement of the average interval B are equidistant from each other along the second direction. Can be positioned.
  • the measurement points B 1 to B 5 of the average interval B are set adjacent to the lower side in the figure with respect to the measurement points A 1 to A 7 of the average interval A. It can also be set adjacent to the upper side in the figure. At this time, measurement points B 1 to B 5 of the average interval B are set on either the upper side (one side) or the lower side (the other side) so that the difference between the average interval A and the average interval B becomes larger. It is preferable to do.
  • two measurement points for the average interval A include two points A 1 and A 2 along the line segments 31 and 32 constituting the first parallel line pattern. , 32 may be included along one of them. Further, the portions along the line segments 31 and 32 may not be included.
  • the measurement points for the average interval A include five points A 3 to A 7 inside the line segments 31 and 32 constituting the first parallel line pattern. There is no need to be five places, and two or more places are preferable.
  • the measurement points for the average interval B include five points B 1 to B 5 outside the line segments 31 and 32 constituting the first parallel line pattern. There is no need to be five places, and two or more places are preferable.
  • the interval between the line segments 51 and 52 constituting the second parallel line pattern 5 measured at each measurement point in order to obtain the average interval A and the average interval B can be defined as follows.
  • FIG. 7 is a partially enlarged plan view showing an example of a parallel line pattern formed on a substrate.
  • FIG. 8 is an explanatory diagram for explaining a cross section taken along line (viii)-(viii) in FIG. 7, and is a cross section obtained by cutting a set of two thin lines included in the pattern in a direction orthogonal to the line segment direction Surface).
  • the interval I between the line segments 51 and 52 constituting the second parallel line pattern 5 can be defined as the distance between the maximum protrusions of the line segments 51 and 52 as shown in FIG. Therefore, the average interval A and the average interval B can be obtained by measuring the interval I at each of the measurement points described above.
  • the adjustment to satisfy the above-described formula (1) is to adjust one or more factors that can affect the ratio B / A of the average interval A and the average interval B.
  • factors are not particularly limited and can be appropriately selected.
  • the surface energy in the formation region of the first parallel line pattern 3 and the surface energy outside the formation region of the first parallel line pattern 3 are The difference is set to 5 mN / m or less.
  • the surface energy in the formation region of the first parallel line pattern 3 can be the surface energy measured in the central region between the line segments 31 and 32 constituting the first parallel line pattern.
  • the surface energy in the formation region of the first parallel line pattern 3 is prepared by separately preparing a base material similar to the base material 1 and the first linear liquid 2 on the base material. The surface energy measured in the central region of the dried film can be obtained after 20 ⁇ L of the same liquid is dropped and dried under the same conditions as when the first linear liquid 2 is dried.
  • the surface energy outside the region where the first parallel line pattern 3 is formed is the surface energy of the substrate 1 in the region where the first linear liquid 2 for forming the first parallel line pattern 3 is not applied. It can be.
  • the surface energy can be calculated from the Young-Fowkes equation.
  • the means for adjusting the surface energy difference between the inside and outside of the formation region of the first parallel line pattern 3 is not particularly limited, for example, a method of performing a surface treatment on the region including the outside of the formation region of the first parallel line pattern 3; A method of changing the liquid composition of the first line-like liquid 2 is preferable.
  • the surface treatment for changing the surface energy with respect to the substrate 1 is performed before forming the first parallel line pattern 3.
  • the method of giving can be mentioned.
  • the surface treatment may be performed only on a region outside the formation region of the first parallel line pattern 3, or may be performed on a region including the outside of the formation region and the inside of the formation region. It is also preferable to perform a surface treatment on the entire surface of the substrate 1.
  • the liquid composition of the first line-shaped liquid 2 it can be performed by selecting a blending component (functional material, additive, solvent, etc.), adjusting a blending amount of each component, or the like.
  • a blending component functional material, additive, solvent, etc.
  • adjusting a blending amount of each component or the like.
  • the surface energy of the solid surface coated with the functional material contained in the first linear liquid 2 and dried, and the first parallel lines is set to 5 mN / m or less.
  • the “solid surface” is the surface of a solid film obtained by applying and drying the functional material contained in the first linear liquid 2 on an arbitrary substrate, and the surface energy of the substrate itself and It refers to the surface of the solid film coated with the substrate so that the contact angle does not affect the surface energy and the contact angle on the surface of the solid film.
  • coating of a functional material can be performed by apply
  • a liquid having the same composition as that of the first line-like liquid 2 may be used as the coating liquid for forming the solid surface.
  • the region between the line segments 31 and 32 is in the first line-shaped liquid 2 that has not been transported to the position of the line segments 31 and 32 due to the coffee stain phenomenon. Some components may remain slightly. Such residual components may cause the spacing between the line segments 51 and 52 constituting the second parallel line pattern 5 to be non-uniform.
  • the surface energy of the solid surface obtained by applying and drying the functional material contained in the first line-shaped liquid 2 is an index for realizing more reliable adjustment to satisfy the above-described formula (1). obtain. That is, even if a large amount of residual components are present in the region between the line segments 31 and 32, it is unlikely to affect the interval between the line segments 51 and 52 beyond the effect of the solid surface. Therefore, the reliability can be further improved by adjusting based on the difference between the surface energy of the solid surface and the surface energy outside the formation region of the first parallel line pattern 3.
  • the means for adjusting the difference between the surface energy of the solid surface and the surface energy difference outside the formation region of the first parallel line pattern 3 is not particularly limited, and the means described for the first aspect can be preferably used.
  • the contact angle of the second linear liquid 4 in the formation region of the first parallel line pattern 3 and the first parallel line pattern 3 is set to 10 ° or less.
  • the contact angle in the formation region of the first parallel line pattern 3 can be a contact angle measured in the central region between the line segments 31 and 32 constituting the first parallel line pattern.
  • the contact angle in the formation region of the first parallel line pattern 3 is prepared by separately preparing a base material similar to the base material 1, and the first linear liquid 2 and the base material 1 on the base material. A contact angle measured in the central region of the dried film may be obtained after 20 ⁇ L of the same liquid is dropped and dried under the same conditions as those for drying the first linear liquid 2.
  • the contact angle outside the formation region of the first parallel line pattern 3 is such that the first line-shaped liquid 2 for forming the first parallel line pattern 3 is not applied on the base material 1 in the region. It can be a contact angle.
  • the contact angle can be measured using a contact angle measuring device DM-501 manufactured by Kyowa Interface Chemical Co., Ltd.
  • the contact angle is set to a value 5 seconds after the liquid having the same composition as the second linear liquid 4 is dropped.
  • the change in wettability with respect to the second linear liquid 4 can be reduced inside and outside the formation region of the first parallel line pattern 3.
  • the interval between the line segments 51 and 52 can be set to satisfy the above-described expression (1).
  • the contact angle in the formation region of the first parallel line pattern is smaller than the contact angle outside the formation region, if the contact angle difference exceeds 10 °, the contact angle in the formation region of the first parallel line pattern 3 In FIG. 5, the interval between the line segments 51 and 52 of the second parallel line pattern 5 becomes smaller than outside the formation region, resulting in a narrow shape.
  • the means for adjusting the difference in contact angle is not particularly limited, and the means described as means for adjusting the surface energy difference in the first embodiment can be preferably used. Furthermore, as a means for adjusting the difference in contact angle, the liquid composition of the second linear liquid 4 can be changed. When changing the liquid composition of the 2nd line-shaped liquid 4, it can carry out by selection of a compounding component (functional material, an additive, a solvent, etc.), adjustment of the compounding quantity of each component, etc. It is also preferable to make the liquid of the second line-shaped liquid 4 different from the liquid of the first line-shaped liquid 2.
  • the contact of the second linear liquid 4 on the solid surface coated with the functional material contained in the first linear liquid 2 and dried is set to 10 ° or less.
  • the description in the second aspect is incorporated.
  • the change in wettability with respect to the second linear liquid 4 can be reduced inside and outside the formation region of the first parallel line pattern 3.
  • the interval between the line segments 51 and 52 can be set to satisfy the above-described expression (1).
  • the reliability can be further improved by adjusting the contact angle on the solid surface as an index.
  • the means for adjusting the difference between the contact angle on the solid surface and the contact angle outside the formation region of the first parallel line pattern 3 is not particularly limited, and the means described for the third aspect can be preferably used.
  • the contact angle of the solvent having the highest boiling point among the solvents in the second linear liquid 4 outside the formation region of the first parallel line pattern 3. Is 6 ° or less.
  • the contact angle outside the formation region of the first parallel line pattern 3 is on the base material 1 in the region where the first linear liquid 2 for forming the first parallel line pattern 3 is not applied.
  • the contact angle can be as follows.
  • the contact angle can be measured using a contact angle measuring device DM-501 manufactured by Kyowa Interface Chemical Co., Ltd.
  • the contact angle is set to a value 5 seconds after the solvent having the highest boiling point among the solvents in the second linear liquid 4 is dropped.
  • the contact angle By setting the contact angle to 6 ° or less, the change in wettability with respect to the second linear liquid 4 can be reduced inside and outside the formation region of the first parallel line pattern 3, and the second parallel lines In the pattern 5, the interval between the line segments 51 and 52 can satisfy the above-described expression (1).
  • the means for adjusting the contact angle is not particularly limited, and the means described as means for adjusting the surface energy difference in the first aspect can be preferably used.
  • the liquid application amount per length of the second linear liquid 4 in the formation region of the first parallel line pattern 3 and the first The liquid application amount per length of the second linear liquid 4 outside the formation area of the parallel line pattern 3 is made different.
  • the length per second length of the second linear liquid 4 in the formation region is relatively small with respect to the outside of the formation region.
  • the length of the second linear liquid 4 in the formation region is relatively increased with respect to the outside of the formation region.
  • the difference in the liquid application amount inside and outside the formation region of the first parallel line pattern 3 can be adjusted as appropriate so as to satisfy the expression (1).
  • the inkjet method is used to form the second line-shaped liquid 4
  • the number of droplets ejected per unit length of the second line-shaped liquid 4 and the droplet volume per droplet are set to the first
  • the difference in the amount of applied liquid can be set by making the difference between the inside and outside of the region where the parallel line pattern 3 is formed.
  • the first parallel line pattern 3 is formed after the first parallel line pattern 3 is formed and before the second linear liquid 4 is applied.
  • the region including the inside of the formation region is cleaned.
  • the region between the line segments 31 and 32 is the first line shape that has not been transported to the position of the line segments 31 and 32 due to the coffee stain phenomenon.
  • Some components in the liquid 2 may remain slightly. Such residual components may cause the spacing between the line segments 51 and 52 constituting the second parallel line pattern 5 to be non-uniform.
  • cleaning is removal of such residual components.
  • how much residual components are removed is affected by the cleaning conditions, for example, the setting of the type and intensity of cleaning.
  • the cleaning is performed by removing residual components so that at least the distance between the line segments 51 and 52 constituting the second parallel line pattern 5 can satisfy the above-described formula (1). possible. In this sense, the cleaning can be positioned as an example of adjustment for satisfying the above-described formula (1).
  • the cleaning may be performed only on the first parallel line pattern forming region, or may be performed on the region including the first parallel line pattern forming region and the outside of the forming region. It is also preferable to wash the entire surface of the substrate 1.
  • cleaning is performed only in the formation region of the first parallel line pattern, for example, irradiation with electromagnetic waves or the like is performed in a state where the outside of the formation region is masked, or the cleaning solvent is selectively selected using an inkjet method. It becomes possible by giving it in the formation region.
  • the cleaning method is not particularly limited, and for example, a cleaning method usually used in industrial products can be used.
  • a cleaning method usually used in industrial products can be used.
  • the cleaning method by heating includes a continuous heating method using an infrared heater, an oven, a hot plate, etc., and an instantaneous heating method using a xenon flash lamp.
  • the heating conditions (temperature, time) and the like are appropriately set within a range in which the interval between the line segments 51 and 52 constituting the parallel line pattern 5 satisfies the above-described formula (1).
  • the substrate 1 is a film or the like, it is preferable to set within a range where the substrate 1 is not deformed. From this point of view, a method using a xenon flash lamp that heats instantaneously and particularly causes little damage to a substrate such as a film is preferable.
  • a method of irradiating an electron beam, a gamma ray, an ultraviolet ray or the like can be used.
  • the electromagnetic wave irradiation conditions are appropriately set in a range in which the interval between the line segments 51 and 52 constituting the parallel line pattern 5 satisfies the above-described formula (1).
  • the solvent used for cleaning with the solvent is not limited as long as it can satisfy the above-described formula (1), but a solvent that has little influence on the parallel line pattern formed by depositing the functional material may be selected. preferable.
  • a solvent suitable for cleaning can be appropriately selected according to the type of functional material. For example, in the case of water-dispersed silver nanoparticles, an alcohol-based solvent is suitable.
  • the conditions for cleaning with plasma can be appropriately set so that the interval between the line segments 51 and 52 constituting the parallel line pattern 5 satisfies the above-described formula (1).
  • the second parallel line pattern 5 will be mainly described, but the first parallel line pattern 3 can be similarly described.
  • the interval I between the line segments 51 and 52 constituting the parallel line pattern 5 can be defined as the distance between the maximum protrusions of the line segments 51 and 52 as described above, and preferably 10 ⁇ m or more and 300 ⁇ m or less. It is preferable that the range is adjusted.
  • the set of two thin lines (line segments) 51 and 52 of the parallel line pattern 5 do not necessarily have an island shape completely independent of each other. As shown in the figure, the two line segments 51 and 52 are connected by the thin film portion 50 formed between the line segments 51 and 52 at a height lower than the height of the line segments 51 and 52. It is also preferable that it is formed as a continuous body.
  • the line widths W1 and W2 of the line segments 51 and 52 of the parallel line pattern 5 are each preferably 10 ⁇ m or less. If it is 10 micrometers or less, since it will be a level which cannot be visually recognized normally, it is more preferable from a viewpoint of improving transparency. Considering the stability of the line segments 51 and 52, the line widths W1 and W2 of the line segments 51 and 52 are preferably in the range of 2 ⁇ m or more and 10 ⁇ m or less, respectively.
  • the widths W1 and W2 of the line segments 51 and 52 are defined as Z being the height of the thinnest portion where the thickness of the functional material is the thinnest between the line segments 51 and 52, and line segments from the Z.
  • the protruding heights 51 and 52 are defined as Y1 and Y2, they are defined as the widths of the line segments 51 and 52 at half the height of Y1 and Y2.
  • the height of the thinnest portion in the thin film portion 50 can be set to Z.
  • the line widths W1 and W2 of the line segments 51 and 52 are the line segments 51 and 52 from the surface of the base material 1, respectively. Are defined as the widths of the line segments 51 and 52 at half the heights h1 and h2.
  • the line widths W1 and W2 of the line segments 51 and 52 constituting the parallel line pattern 5 can be very thin, the line segments from the surface of the substrate 1 are ensured from the viewpoint of securing a cross-sectional area and reducing resistance.
  • the heights h1 and h2 of 51 and 52 are preferably higher. Specifically, the heights h1 and h2 of the line segments 51 and 52 are preferably in the range of 50 nm to 5 ⁇ m.
  • the h1 / W1 ratio and the h2 / W2 ratio are preferably in the range of 0.01 or more and 1 or less, respectively.
  • the height Z of the thin part is preferably in the range of 10 nm or less.
  • the thin film portion 50 is provided in the range of 0 ⁇ Z ⁇ 10 nm in order to achieve a balance between transparency and stability.
  • the h1 / Z ratio and the h2 / Z ratio are each preferably 5 or more, more preferably 10 or more, and 20 or more. Is particularly preferred.
  • the same shape similar cross-sectional area
  • the heights h1 and h2 of the line segment 51 and the line segment 52 are substantially equal.
  • the line widths W1 and W2 of the line segment 51 and the line segment 52 are preferably set to substantially the same value.
  • the line segments 51 and 52 do not necessarily have to be parallel, and it is sufficient that the line segments 51 and 52 are not coupled over at least a certain length L in the line segment direction. Preferably, the line segments 51 and 52 are substantially parallel over at least a certain length L in the line segment direction.
  • the length L of the line segments 51 and 52 in the line segment direction is preferably 5 times or more of the interval I between the line segments 51 and 52, and more preferably 10 times or more.
  • the length L and the interval I can be set corresponding to the formation length and formation width of the line-shaped liquid 4 for forming the parallel line pattern lines 5.
  • the line segments 51 and 52 are connected and formed as a continuous body at the formation start point and end point of the line-shaped liquid 4 (start point and end point over a certain length L in the line segment direction).
  • the line segments 51 and 52 have substantially the same line widths W1 and W2, and the line widths W1 and W2 are sufficiently narrower than the distance between the two lines (interval I).
  • the line segment 51 and the line segment 52 constituting the parallel line pattern 5 generated from one line-shaped liquid are formed simultaneously.
  • each of the line segments 51 and 52 satisfies all the following conditions (a) to (d).
  • the base material on which the mesh-like functional pattern is formed is not particularly limited.
  • glass plastic (polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polybutylene terephthalate, polyethylene, polypropylene, acrylic , Polyester, polyamide, etc.), metals (copper, nickel, aluminum, iron, etc., or alloys), ceramics, and the like. These may be used alone or in a bonded state. .
  • plastic is preferable, and polyethylene terephthalate, polyolefin such as polyethylene and polypropylene, and the like are preferable.
  • PET, PEN and the like that are easily bonded are preferably used.
  • the easy adhesion process is a process for improving the adhesion by modifying the surface of the substrate, and it is also preferable to apply this as a surface treatment for changing the surface energy and the contact angle described above.
  • the functional material contained in the line liquid is not particularly limited as long as it is a material for imparting a specific function to the base material. Giving a specific function means, for example, that a conductive material is used as a functional material when imparting conductivity to a base material, and when an insulating property is imparted, the insulating material is functional. Use as a material.
  • Preferred examples of the functional material include conductive materials such as conductive fine particles and conductive polymers, insulating materials, semiconductor materials, optical filter materials, dielectric materials, and the like.
  • conductive materials such as conductive fine particles and conductive polymers or conductive material precursors can be preferably exemplified.
  • An electroconductive material precursor refers to what can be changed into an electroconductive material by performing an appropriate process.
  • the conductive fine particles are not particularly limited, but Au, Pt, Ag, Cu, Ni, Cr, Rh, Pd, Zn, Co, Mo, Ru, W, Os, Ir, Fe, Mn, Ge, Sn, Ga.
  • fine particles such as In can be exemplified, and among them, use of fine metal particles such as Au, Ag, and Cu is more preferable because a circuit pattern having low electrical resistance and strong corrosion can be formed.
  • metal fine particles containing Ag are most preferable.
  • the average particle diameter of these metal fine particles is preferably in the range of 1 to 100 nm, more preferably in the range of 3 to 50 nm.
  • carbon fine particles are used as the conductive fine particles.
  • the carbon fine particles include graphite fine particles, carbon nanotubes, fullerenes and the like.
  • the conductive polymer is not particularly limited, but a ⁇ -conjugated conductive polymer can be preferably exemplified.
  • the ⁇ -conjugated conductive polymer is not particularly limited, and polythiophenes, polypyrroles, polyindoles, polycarbazoles, polyanilines, polyacetylenes, polyfurans, polyparaphenylenes, polyparaphenylene vinylenes, poly Chain conductive polymers such as paraphenylene sulfides, polyazulenes, polyisothianaphthenes, and polythiazyl can be used.
  • polythiophenes and polyanilines are preferable in that high conductivity can be obtained. Most preferred is polyethylene dioxythiophene.
  • the conductive polymer more preferably comprises the above-described ⁇ -conjugated conductive polymer and polyanion.
  • a conductive polymer can be easily produced by chemical oxidative polymerization of a precursor monomer that forms a ⁇ -conjugated conductive polymer in the presence of an appropriate oxidizing agent, an oxidation catalyst, and a polyanion.
  • the polyanion is a substituted or unsubstituted polyalkylene, a substituted or unsubstituted polyalkenylene, a substituted or unsubstituted polyimide, a substituted or unsubstituted polyamide, a substituted or unsubstituted polyester, and a copolymer thereof. It consists of a structural unit having a group and a structural unit having no anionic group.
  • This polyanion is a solubilized polymer that solubilizes a ⁇ -conjugated conductive polymer in a solvent.
  • the anion group of the polyanion functions as a dopant for the ⁇ -conjugated conductive polymer, and improves the conductivity and heat resistance of the ⁇ -conjugated conductive polymer.
  • the anion group of the polyanion may be a functional group capable of undergoing chemical oxidation doping to the ⁇ -conjugated conductive polymer.
  • a monosubstituted sulfate group A monosubstituted phosphate group, a phosphate group, a carboxy group, a sulfo group and the like are preferable.
  • a sulfo group, a monosubstituted sulfate group, and a carboxy group are more preferable.
  • polyanions include polyvinyl sulfonic acid, polystyrene sulfonic acid, polyallyl sulfonic acid, polyacrylic acid ethyl sulfonic acid, polyacrylic acid butyl sulfonic acid, poly-2-acrylamido-2-methylpropane sulfonic acid, polyisoprene sulfone. Acid, polyvinyl carboxylic acid, polystyrene carboxylic acid, polyallyl carboxylic acid, polyacryl carboxylic acid, polymethacryl carboxylic acid, poly-2-acrylamido-2-methylpropane carboxylic acid, polyisoprene carboxylic acid, polyacrylic acid and the like. . These homopolymers may be sufficient and 2 or more types of copolymers may be sufficient.
  • it may be a polyanion having F (fluorine atom) in the compound.
  • F fluorine atom
  • Specific examples include “Nafion” containing a perfluorosulfonic acid group (manufactured by Dupont), “Flemion” (manufactured by Asahi Glass Co., Ltd.) made of perfluoro vinyl ether containing a carboxylic acid group.
  • a compound having a sulfonic acid is more preferable because the liquid ejection stability is particularly good when the ink jet printing method is used and high conductivity is obtained.
  • polystyrene sulfonic acid polyisoprene sulfonic acid
  • polyacrylic acid ethyl sulfonic acid and polybutyl acrylate sulfonic acid are preferable.
  • These polyanions have the effect of being excellent in conductivity.
  • the polymerization degree of the polyanion is preferably in the range of 10 to 100,000 monomer units, and more preferably in the range of 50 to 10,000 from the viewpoint of solvent solubility and conductivity.
  • a commercially available material can be preferably used as the conductive polymer.
  • a conductive polymer (abbreviated as PEDOT / PSS) made of poly (3,4-ethylenedioxythiophene) and polystyrene sulfonic acid is used in H.264. C. It is commercially available from Starck as the “CLEVIOS” series, from Aldrich as “PEDOT-PASS 483095, 560598” and from Nagase Chemtex as the “Denatron” series. Polyaniline is also commercially available from Nissan Chemical Company as the “ORMECON” series.
  • a conductive material precursor can also be preferably used as a functional material particularly in the use of a transparent conductive film, and examples thereof include organic metal complexes, inorganic metal salts, and electroless plating catalysts.
  • liquid containing the functional material water, an organic solvent, or the like can be used alone or in combination.
  • the organic solvent is not particularly limited.
  • examples include alcohols such as butanediol and propylene glycol, ethers such as diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, triethylene glycol monomethyl ether, dipropylene glycol monomethyl ether, and dipropylene glycol monoethyl ether.
  • the drying of the liquid proceeds in the order of the boiling points of the solvents, so the solvent with the highest boiling point remains at the end. For this reason, the wettability with respect to the base material of the solvent having the highest boiling point is related to the expression of the coffee stain phenomenon.
  • liquid containing the functional material may contain various additives such as a surfactant as long as the effects of the present invention are not impaired.
  • the surfactant is not particularly limited, but a silicon surfactant or the like can be used. Silicone surfactants are those in which the side chain or terminal of dimethylpolysiloxy acid is polyether-modified, such as “KF-351A” and “KF-642” manufactured by Shin-Etsu Chemical Co., Ltd. and “BYK347” manufactured by Big Chemie. “BYK348” and the like are commercially available.
  • the addition amount of the surfactant is preferably 1% by weight or less with respect to the total amount of the liquid containing the functional material.
  • the method for applying the line liquid on the substrate is not particularly limited as long as the liquid can be applied in a state having fluidity sufficient to cause the coffee stain phenomenon.
  • Particularly preferred methods include, for example, a dispenser method and an ink jet method.
  • the mesh-like functional pattern of the present invention may be a mesh-like functional pattern obtained as described above and further subjected to post-processing. Functionality can be further enhanced by post-processing.
  • the post-processing is not particularly limited, and examples thereof include plating.
  • the reflectance is preferably reduced by plating.
  • the functional substrate of the present invention has the mesh-like functional pattern described above.
  • the functional material is preferably a substrate with a transparent conductive film formed by imparting conductivity to a coating film composed of a mesh-like functional pattern.
  • the imparting of conductivity to the coating film is performed, for example, by using a conductive material as a functional material, or a post-treatment is performed on a coating film formed using a conductive material precursor as a functional material. It can carry out by providing electroconductivity by giving.
  • the functional base material has a pattern shape in which the reflected light of the fine line portion constituting the coating film is widely distributed, the glare is reduced, and it is difficult to visually recognize even in a bright environment, that is, low visibility can be improved.
  • the use of the functional base material is not particularly limited, and can be used for various devices included in various electronic devices.
  • the functional base material is excellent in low visibility of the fine lines constituting the coating film, a remarkable effect is exhibited in applications in which a user views an image through the base material.
  • the preferred application of the substrate with a transparent conductive film is, for example, a liquid crystal, plasma, organic electroluminescence, field emission, etc., as a transparent electrode for various types of displays, or a touch panel or the like, from the viewpoint of significantly achieving the effects of the present invention. It can be suitably used as a transparent electrode used in a mobile phone, electronic paper, various solar cells, various electroluminescence light control elements, and the like.
  • the substrate with a transparent conductive film is suitably used as a transparent electrode of the device.
  • a transparent electrode of the device For example, a touch panel sensor etc. can be illustrated preferably.
  • an electronic device provided with these devices For example, a smart phone, a tablet terminal, etc. can be illustrated preferably.
  • Example 1 Preparation of ink Ink 1 having the following composition was prepared. -Silver nanoparticle aqueous dispersion 1 (silver nanoparticles: 40 wt%): 1.75 wt% ⁇ Silicon-based surfactant ("BYK-348" manufactured by Big Chemie): 0.01% by weight ⁇ Pure water: balance
  • the base material 1 which consists of a PET base material which made the surface energy E of the base material 52 mN / m by easy-adhesion processing (surface treatment) was used as a base material.
  • the substrate is rotated by 90 °, and a plurality of second linear liquids using ink 1 are applied in the same direction as described above in a direction orthogonal to the first parallel line pattern, dried, and dried. Two parallel line patterns were formed.
  • the overall size of the mesh-like functional pattern is 50 mm ⁇ 50 mm.
  • Example 2 Preparation of ink Ink 2 having the following composition was prepared. -Silver nanoparticle aqueous dispersion 2 (silver nanoparticles: 40 wt%): 1.75 wt% ⁇ Silicon-based surfactant (BYK-348 manufactured by Big Chemie): 0.01% ⁇ Pure water: balance
  • the silver nanoparticle aqueous dispersion 2 is different from the silver nanoparticle aqueous dispersion 1 used in Example 1 in the dispersant.
  • Example 3 Ink preparation Ink 1 was used as the ink.
  • the base material 2 made of a PET base material having a surface energy of 48 mN / m by easy adhesion processing (surface treatment) was used.
  • Example 3 Measurement of surface energy and contact angle
  • the substrate 1 of Example 1 was replaced with the substrate 2 and measured in the same manner as in Example 1.
  • the surface energy C in the formation region of the first parallel line pattern was 56 mN / m.
  • the contact angle F of the second linear liquid in the first parallel line pattern formation region is 17 °, and the contact angle of the second linear liquid outside the first parallel line pattern formation region. G was 28 °.
  • the substrate on which the first parallel line pattern was formed was placed on a hot plate at 120 ° C. and washed by heating for 1 hour.
  • the substrate After cleaning by heating, the substrate is rotated by 90 °, and a plurality of second line-shaped liquids with ink 1 are applied in a direction orthogonal to the first parallel line pattern by the same method as described above, and dried. Thus, a second parallel line pattern was formed.
  • the overall size of the mesh-like functional pattern is 50 mm ⁇ 50 mm.
  • Example 4 In Example 3, a mesh pattern was formed in the same manner as in Example 3 except that the cleaning by heating was changed to the cleaning by the following electromagnetic wave.
  • Example 5 (Example 5) In Example 3, a mesh pattern was formed in the same manner as in Example 3 except that the cleaning by heating was changed to cleaning with the following solvent.
  • Example 6 Ink preparation Ink 1 was used as the ink.
  • Example 3 Measurement of surface energy and contact angle
  • the substrate 1 of Example 1 was replaced with the substrate 2 and measured in the same manner as in Example 1.
  • the surface energy C in the formation region of the first parallel line pattern was 56 mN / m.
  • the contact angle F of the second linear liquid in the first parallel line pattern formation region is 17 °, and the contact angle of the second linear liquid outside the first parallel line pattern formation region. G was 28 °.
  • Pattern formation Using an XY robot (“SHOTMASTER300” manufactured by Musashi Engineering) equipped with an inkjet head “512LHX” manufactured by Konica Minolta (standard droplet volume 42 pL) and an inkjet control system (“IJCS-1” manufactured by Konica Minolta) Ink 1 is sequentially discharged onto the substrate 2 as droplets so that the pitch between the nozzle rows is 282 ⁇ m and the pitch between the scanning directions is 45 ⁇ m, and the droplets continuously applied in the scanning direction are combined on the substrate. As a result, a plurality of line-shaped liquids were formed. In addition, in the process of heating the stage on which the substrate is placed while printing at 70 ° C. and drying these line-shaped liquids, the solid content is deposited on the periphery, so that one set of two lines from one line-shaped liquid. The parallel line fine line pattern was formed.
  • the substrate is rotated by 90 °, a plurality of second line-shaped liquids with ink 1 are applied in a direction orthogonal to the first parallel line pattern, and dried to form the second parallel line pattern. Formed.
  • the liquid application amount per length of the second line-shaped liquid in the first parallel line pattern formation region is set to the liquid application amount outside the first parallel line pattern formation region.
  • the coating was adjusted to 70%.
  • the overall size of the mesh-like functional pattern is 50 mm ⁇ 50 mm.
  • Example 7 Ink preparation Ink 1 was used as the ink.
  • the base material 3 made of a PET base material having a surface energy E of 56 mN / m by easy adhesion processing (surface treatment) was used.
  • aqueous dispersion 1 of silver nanoparticles (silver nanoparticles: 40% by weight) is applied to the substrate 3 with a wire bar # 7 and dried to obtain a functional material (silver).
  • a solid surface of (nanoparticles) was prepared. The surface energy of this solid surface was measured and found to be 61 mN / m. This value was defined as the surface energy D of the solid surface obtained by applying and drying a liquid having the same composition as the first linear liquid.
  • Example 1 was replaced with the base material 3, and as a result of measuring similarly to Example 1, the surface energy C in the formation area of the first parallel line pattern was 56 mN / m.
  • the contact angle F of the second linear liquid in the parallel line pattern formation region is 15 °
  • the contact angle G of the second linear liquid outside the formation region of the first parallel line pattern is 19 °. Met.
  • Example 8 Preparation of ink Ink 4 having the following composition was prepared. -Silver nanoparticle aqueous dispersion 1 (silver nanoparticles: 40 wt%): 1.75 wt% ⁇ Diethylene glycol monobutyl ether: 20% by weight ⁇ Pure water: balance
  • Example 3 Measurement of surface energy and contact angle
  • the substrate 1 of Example 1 was replaced with the substrate 2 and measured in the same manner as in Example 1.
  • the surface energy C in the formation region of the first parallel line pattern was 56 mN / m.
  • the contact angle F of the second linear liquid in the first parallel line pattern formation region is 17 °, and the contact angle of the second linear liquid outside the first parallel line pattern formation region. G was 28 °.
  • the aqueous dispersion 3 of silver nanoparticles is different from the aqueous dispersions 1 and 2 of silver nanoparticles.
  • a mesh-like functional pattern was formed in the same manner as in Example 1 except that the ink 1 was replaced with the ink 3 and the substrate 1 was replaced with the substrate 2 in Example 1.
  • the first parallel line pattern forming region is formed with respect to the interval between two line segments constituting the second parallel line pattern.
  • the average interval A was calculated as the average value of the intervals measured at the seven measurement points A 1 to A 7 described in FIG.
  • the average interval B outside the first parallel line pattern forming region is set to a total of five measurement points B 1 to B described in FIG. It was calculated as the mean value of the measured intervals in B 5. Further, from the values of the average interval A and the average interval B, the value of B / A in the above formula (1) was obtained.
  • the resistance ratio is 10% or less, and when the resistance ratio exceeds 10%, it can be evaluated that it is not practically preferable.
  • FIGS. 9 and 10 optical micrographs are shown in FIGS. 9 and 10 for the mesh-like functional pattern of Example 3 and the mesh-like functional pattern of Comparative Example 2, respectively.
  • the direction from the upper left to the lower right is the first direction (the direction of the first parallel line pattern), and the direction from the lower left to the upper right is the second direction (the direction of the second parallel line pattern). It is. From the comparison of these photographs, it can be seen that the present invention is excellent in low visibility. Further, it can be seen that there is no difference in the length of the conductive path between the first direction and the second direction, and thus it is possible to prevent unevenness of the resistance value.
  • Example 3 “After cleaning the first parallel line pattern and before applying the second line-shaped liquid, the region including the first parallel line pattern forming region is cleaned” adjustment
  • the average interval A and the average interval B were made to satisfy the formula (1) “0.9 ⁇ B / A ⁇ 1.1”.
  • cleaning by heating was used
  • Example 4 cleaning by electromagnetic waves
  • Example 5 cleaning by solvent was used.
  • Example 6 “the amount of liquid applied per length of the second line-shaped liquid in the first parallel line pattern formation region and the second line shape outside the first parallel line pattern formation region” By adjusting “different the amount of liquid applied per length of the liquid”, the average interval A and the average interval B were made to satisfy the formula (1) “0.9 ⁇ B / A ⁇ 1.1”.
  • Example 7 the difference (
  • the average interval A and the average interval B are expressed by the equation (1)“ 0.9 ⁇ B /A ⁇ 1.1 ”.
  • Example 8 by adjusting “the contact angle of the solvent having the highest boiling point out of the solvent in the second linear liquid outside the first parallel line pattern formation region is 6 ° or less”, the average interval A The average interval B satisfies the formula (1) “0.9 ⁇ B / A ⁇ 1.1”.
  • Substrate 2 First line-shaped liquid 3: First parallel line pattern 31, 32: Line segment 4: Second line-shaped liquid 5: Second parallel line pattern 51, 52: Line segment 6: Pattern 7: Droplet ejection device X: Intersection

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Non-Insulated Conductors (AREA)
  • Manufacturing Of Electric Cables (AREA)

Abstract

La présente invention a pour objet un procédé de formation d'un motif fonctionnel en forme de réseau maillé, une faible visibilité pouvant être améliorée et des variations de résistance pouvant être supprimées, un motif fonctionnel en forme de réseau maillé et un substrat fonctionnel. À cet effet l'invention consiste à former un motif fonctionnel en forme de réseau maillé dans lequel des motifs de lignes parallèles (3, 5) se croisent, par application de lignes de liquide comprenant une substance fonctionnelle sur un substrat et l'opération consistant à amener la substance fonctionnelle à s'accumuler sélectivement au niveau des parties de bord au cours d'un processus de séchage et formation d'un motif de lignes parallèles (3) formé à partir de deux segments de ligne (31, 32), puis application de lignes de liquide comprenant la substance fonctionnelle de sorte que les lignes de liquide croisent le motif de lignes parallèles (3) et l'opération consistant à amener la substance fonctionnelle à s'accumuler sélectivement au niveau des parties de bord dans un processus de séchage et formation d'un motif de lignes parallèles (5) formé à partir de deux segments de ligne (51, 52), un intervalle entre les deux segments de ligne (51, 52) constituant le motif de lignes parallèles étant réglé pendant la formation du motif fonctionnel en forme de réseau maillé de sorte que l'expression 0,9 ≤ B/A ≤ 1,1 est satisfaite, A représentant l'intervalle moyen dans une région de formation du motif de lignes parallèles (3) et B représentant l'intervalle moyen à l'extérieur de la région de formation.
PCT/JP2015/068414 2014-06-25 2015-06-25 Procédé de formation de motif fonctionnel en forme de réseau maillé, motif fonctionnel en forme de réseau maillé et substrat fonctionnel WO2015199201A1 (fr)

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JP2017162739A (ja) * 2016-03-10 2017-09-14 コニカミノルタ株式会社 透明面状デバイス及び透明面状デバイスの製造方法
CN111727669A (zh) * 2018-02-22 2020-09-29 柯尼卡美能达株式会社 图案形成方法

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JPWO2016178409A1 (ja) * 2015-05-01 2017-05-18 株式会社フジクラ 配線体、配線基板、及びタッチセンサ
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CN111727669A (zh) * 2018-02-22 2020-09-29 柯尼卡美能达株式会社 图案形成方法
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CN111727669B (zh) * 2018-02-22 2023-08-18 柯尼卡美能达株式会社 图案形成方法
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