WO2015180079A1 - Plaque d'atomisation à micropores et appareil d'atomisation à micropores - Google Patents

Plaque d'atomisation à micropores et appareil d'atomisation à micropores Download PDF

Info

Publication number
WO2015180079A1
WO2015180079A1 PCT/CN2014/078700 CN2014078700W WO2015180079A1 WO 2015180079 A1 WO2015180079 A1 WO 2015180079A1 CN 2014078700 W CN2014078700 W CN 2014078700W WO 2015180079 A1 WO2015180079 A1 WO 2015180079A1
Authority
WO
WIPO (PCT)
Prior art keywords
film
microporous
sheet
atomization
atomizing
Prior art date
Application number
PCT/CN2014/078700
Other languages
English (en)
Chinese (zh)
Inventor
王长津
Original Assignee
王长津
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 王长津 filed Critical 王长津
Priority to PCT/CN2014/078700 priority Critical patent/WO2015180079A1/fr
Publication of WO2015180079A1 publication Critical patent/WO2015180079A1/fr

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B17/00—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups
    • B05B17/04—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods
    • B05B17/06—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations
    • B05B17/0607—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations generated by electrical means, e.g. piezoelectric transducers
    • B05B17/0638—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations generated by electrical means, e.g. piezoelectric transducers spray being produced by discharging the liquid or other fluent material through a plate comprising a plurality of orifices
    • B05B17/0646—Vibrating plates, i.e. plates being directly subjected to the vibrations, e.g. having a piezoelectric transducer attached thereto
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61M—DEVICES FOR INTRODUCING MEDIA INTO, OR ONTO, THE BODY; DEVICES FOR TRANSDUCING BODY MEDIA OR FOR TAKING MEDIA FROM THE BODY; DEVICES FOR PRODUCING OR ENDING SLEEP OR STUPOR
    • A61M11/00—Sprayers or atomisers specially adapted for therapeutic purposes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B17/00—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups
    • B05B17/04—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods

Definitions

  • Microporous atomizing sheet and micropore atomizing device Microporous atomizing sheet and micropore atomizing device
  • the utility model relates to atomization technology, in particular to a micropore atomization sheet and a micropore atomization device. Background technique
  • the atomized sheet is widely used in air humidifiers, incense burners, beauty machines, lung drug delivery devices, sterilizers, bathtub fog machines and the like.
  • the main atomizing sheets are metal atomizing sheets, ceramic atomizing sheets, organic material atomizing sheets, etc., among which metal atomizing sheets such as stainless steel atomizing sheets, nickel-plated atomizing sheets, titanium-plated atomizing sheets, etc. It has certain advantages of fatigue resistance, easy cleaning, and not easy to break. It is widely used in aerosol generators for different purposes, and its share has an absolute market advantage. However, the long-term use of the metal atomized sheet inevitably leads to the precipitation of harmful metal ions, thereby affecting the liquid component, and if it is applied to the aerosol generator of the drug delivery device, it may even be harmful to human health.
  • Ceramic atomized sheets or organic material atomized sheets also have a certain market share, but due to the nature of the materials themselves, the atomized sheets are easily broken and require very careful cleaning. On the other hand, the energy required for atomization essentially acts on the atomizing sheet, and the life of the atomized sheet of the organic material is greatly reduced as the temperature rises.
  • the microporous pore size of the atomized sheet reported in the literature and patents is as small as 3 micrometers, and the aerosol particles of 1-5 micrometers are about 50%, but the atomized sheet is extremely easy to block. The finer the pore size of the atomizing sheet, the more easily the atomized sheet is blocked.
  • the embodiment of the present invention provides a microporous atomization sheet. And microporous atomization device.
  • the embodiment of the present invention provides a microporous atomization sheet, wherein the microporous atomization sheet is provided with a micropore region, and a plurality of micropores are distributed in the micropore region; The inner wall of the pore channel and the surface thereof are coated with a film; the pore diameter of the micropores is 0.05 ⁇ -20 ⁇ .
  • the number of micropores in the microporous region is 100-1000000.
  • the microporous atomized sheet has a diameter of from 1 to 50 mm.
  • the outer diameter of the microporous region is l-50 mm.
  • the microporous atomizing sheet is any one of a metal atomizing sheet, a ceramic atomizing sheet, and an organic material atomizing sheet.
  • the inner wall of the microporous channel of the microporous atomization sheet and the coating material of the surface thereof are one or more layers of uniform thickness;
  • the coating material is any one of the following films; when the coating material is a plurality of layers, the coating material is overlapped by any one of the following films a multilayer film formed, or a multilayer film formed by alternately overlapping any of the following, or a composite film of a multilayer film formed by overlapping one of the following and a multilayer film of any of the following alternately stacked layers;
  • the film comprises: an aluminum oxide (A1 2 0 3 ) film, a silicon dioxide (SiO 2 ) film, a titanium dioxide (Ti0 2 ) film, a zinc oxide (ZnO) film, a hafnium oxide (Hf0 2 ) film, and magnesium oxide ( MgO) film, zirconium dioxide (Zr0 2 ) film, nickel oxide (NiO) film, cobalt oxide (CoO) film, iron oxide film (FeO x ) film, copper oxide film (CuO x Thin film, boron oxide (B 2 0 3 ) film, indium oxide (In 2 0 3 ) film, tin oxide (Sn0 2 ) film, gallium oxide (Ga 2 0 3 ) film, tantalum pentoxide (Nb 2 0 5 Film, antimony trioxide (Gd 2 0 3 ) film, tantalum pentoxide (Ta 2 0 5 ) film, boron nitride (BN)
  • the shape of the microporous channel in the microporous atomization sheet is any one of a circular shape, a triangular shape, an elliptical shape, a square shape and a horn shape.
  • the cross-sectional shape of the microporous channel in the microporous atomization sheet is any one of a parabolic shape, a horn shape, a square shape and a trapezoidal shape.
  • the embodiment of the present invention further provides a micropore atomization device, the micropore atomization device comprising: an atomizer tank, an aerosol generator connected to the atomizer tank, and atomization
  • the electronic circuit controller is connected to the device; wherein the gas mist generator comprises a microporous atomizing sheet, and the microporous atomizing sheet is any of the microporous atomizing sheets described above.
  • the microporous atomized sheet prepared by using the embodiment of the present invention has a micropore size which can be accurately controlled between several nanometers and several tens of micrometers, that is, the micropore diameter of the microporous atomized sheet can be accurately controlled. Therefore, the ultra-fine aerosol particles can be realized; in addition, since the atomization sheet selected in the embodiment of the present invention is an atomization sheet commonly used in the market, the atomization sheet can be atomized by the embodiment of the present invention. The aperture of the zone is reduced. Therefore, the embodiment of the present invention can lay a foundation for realizing the general use of the atomization sheet in the aerosol generator in various fields.
  • FIG. 1 is a schematic flow chart of an implementation process of a method for preparing a microporous atomized sheet according to an embodiment of the present invention
  • FIG. 2 is a schematic flow chart 2 of a method for preparing a microporous atomized sheet according to an embodiment of the present invention
  • a schematic structural view of a microporous atomized sheet of the embodiment
  • FIG. 4 is a cross-sectional view of a microporous orifice in a microporous atomization sheet according to an embodiment of the present invention
  • FIG. 5 is a schematic structural view of an atomizer housing according to an embodiment of the present invention
  • Figure 6 is a schematic structural view 1 of an aerosol generator according to an embodiment of the present invention
  • Figure 7 is a second schematic structural view of an aerosol generator according to an embodiment of the present invention
  • FIG. 8 is a schematic structural diagram of an electronic circuit controller according to an embodiment of the present invention.
  • FIG. 1 is a schematic flow chart of the implementation of a method for preparing a microporous atomized sheet according to an embodiment of the present invention, and the atomized sheet is used as a base material; as shown in FIG. 1, the method includes:
  • Step 101 depositing a film on the inner wall of the microporous channel of the base material and the surface thereof; wherein the atomizing sheet is any one of a metal atomizing sheet, a ceramic atomizing sheet and an organic material atomizing sheet.
  • the substrate material is placed in the reaction chamber, and each precursor is alternately introduced into the reaction chamber in a pulsed gas manner, and a film is deposited on the inner wall of the microporous channel of the base material and the surface thereof;
  • the purge gas such as an inert gas or the like is purged in the gap before the introduction of the precursor and before the passage into the next precursor.
  • the reaction chamber is subjected to a vacuum treatment to isolate the two precursors before and after, so that the two precursors do not simultaneously appear in the reaction chamber.
  • the inner wall of the microporous channel of the base material and the surface thereof are thinly deposited Membrane, including:
  • Step 1 placing the substrate material in the reaction chamber
  • Step two introducing a first precursor, reacting the first precursor with a material of the inner wall of the microporous channel of the base material and a surface thereof;
  • Step 3 After the reaction is completed, the reaction chamber is purged with a cleaning gas, or the reaction chamber is evacuated, and the free first precursor is discharged from the reaction chamber, and then Second precursor
  • Step 4 The steps 2 and 3 are performed cyclically until a film of a predetermined thickness is deposited on the inner wall of the microporous channel of the base material and the surface thereof.
  • the entire experimental process is carried out under vacuum, but before the first pulse precursor, the pressure of the reaction chamber is in the range of OPa to l (T 2 Pa;
  • the method of introducing a precursor into the reaction chamber, each pulse precursor 0. 015S -50S, after the pulse is completed once, a flow rate of 0sccm-120sccm of argon Ar or nitrogen is introduced into the reaction chamber.
  • each precursor may enter the reaction chamber through a carrier gas, the carrier may be nitrogen N 2 or argon Ar; Since argon gas Ar or nitrogen gas N 2 is introduced into the reaction chamber in the gap between the two precursors of the pulse, excess precursor and reaction by-products in the reaction chamber can be discharged.
  • the flow rate of the argon gas Ar or the nitrogen gas N 2 introduced into the reaction chamber is Osccm, it means that no gas is introduced into the reaction chamber, and at this time, since the reaction chamber still maintains a vacuum. State, therefore, a free portion or reaction by-product in the precursor of the last pulse can be discharged by a vacuuming process.
  • the first-passed precursor may be chemically adsorbed with the material of the inner wall of the microporous channel of the base material and the surface thereof to form a first film, and then the first film and the second-pass precursor are formed. The reaction takes place to form a second film, and so on, until a film of a predetermined thickness is formed; wherein each precursor can be arbitrarily selected according to the chemical composition of the film.
  • the film is one or more layers of thickness-hooked film; when the film is a layer, the film is any one of the following films;
  • the film is a multilayer film formed by overlapping any one of the following films, or a multilayer film formed by alternately overlapping any of the following, or a multilayer film formed by overlapping one of the following And a combined multilayer film of a plurality of layers formed by alternately overlapping with any of the following:
  • the film comprises: A1 2 0 3 film, SiO 2 film, Ti0 2 film, ZnO film, Hf0 2 film, MgO film, Zr0 2 film , NiO film, CoO film, FeO x film, 01 ( 3 ⁇ 4 film, B 2 0 3 film, In 2 0 3 film, Sn0 2 film, Ga 2 0 3 film, Nb 2 0 5 film, Gd 2 0 3 film, Ta 2 0 5 film, BN film, A1N film, TiN film, SiC film, ZnS film, ZrS film, HA film, W film, Pt film, Ru film, Pd film, PMDA-DAH film,
  • Step 102 Curing the base material on which the film is deposited.
  • the base material on which the thin film is deposited is subjected to plasma curing
  • the energy of the plasma of the inert gas reaches the surface of the base material is mild, and the film of the inner wall of the microporous channel of the base material and the film of the surface thereof are not chemically oxidized.
  • the reaction, and the plasma of the inert gas can provide energy for the film of the inner wall of the microporous channel of the base material and the film of the surface thereof, and the substrate material, thereby being plasma-cured with an inert gas as compared with the conventional annealing curing.
  • the film of the inner wall of the microporous channel of the base material and the film on the surface thereof are not resistant to high temperature, causing damage to the material of the film, and on the other hand, the film on the inner wall of the microporous channel of the base material. Under the condition that the base material is not etched, the film of the inner wall of the microporous channel of the base material and the bonding property with the base material can be improved.
  • the step of curing comprises: placing a substrate material deposited with a film into a plasma generator to cure ls-200s; wherein the power of the plasma generator is 50W-500W, and the curing gas is ⁇ He, ⁇ Ne One or more of inert gases such as argon Ar, krypton Kr and ⁇ Xe Combination, gas flow rate is 10sccm-200sccm;
  • an inert gas or the like is introduced into the ion generator with a certain gas flow, and the inert gas is converted into a plasma corresponding to the inert gas by the ion generator, and the substrate material deposited with the film is in a plasma atmosphere of an inert gas. Cured.
  • the method before the step 101, the method further includes:
  • the substrate material is washed.
  • the substrate material is ultrasonically cleaned.
  • the method before the step 101, the method further includes:
  • the substrate material is activated.
  • the method before the step 101, the method further includes:
  • the cleaned substrate material is activated.
  • FIG. 2 is a schematic diagram 2 of a flow chart of a method for preparing a microporous atomization sheet according to an embodiment of the present invention. As shown in FIG. 2, the method includes:
  • Step 201 cleaning the base material by using the atomized sheet as a base material; wherein the atomized sheet is any one of a metal atomized sheet, a ceramic atomized sheet, and an organic material atomized sheet.
  • Step 202 activating the cleaned substrate material
  • the activation includes: chemical solution impregnation activation and ultraviolet activation;
  • step of impregnating and activating the chemical solution comprises:
  • Step A immersing the base material in an acidic solution for ultrasonic cleaning for 5-30 min, then washing the base material with distilled water, and washing until the pH of the surface liquid attached to the base material is neutral;
  • Step B immersing the base material in an alkaline solution for ultrasonic cleaning for 5-30 min, then washing the base material with distilled water, and washing to the pH of the liquid attached to the surface of the base material. The value is neutral.
  • the acidic solution is a weakly acidic solution in which one or several acids are diluted; and the acidic solution is one or a mixture of the following solutions; the solution includes: a concentration of 0.01- 5g / L phosphoric acid solution, concentration of 0.1-7g / L oxalic acid solution, concentration of l-10 g / L acetic acid solution, concentration of 0.01-lg / L hydrochloric acid solution, concentration of 0.1-2g / L hydrofluoric acid solution, concentration It is a 5-20 g/L ammonium hydrogen fluoride solution;
  • the acidic solution is one or a mixture of the following solutions; the solution comprises: a concentration of lg/L phosphoric acid solution, a concentration of 15 g/L hydrogen fluoride ammonia solution, a concentration of 0.1 g /L hydrofluoric acid solution.
  • the acidic solution is one or a mixture of the following solutions; the solution comprises: a concentration of 5 g / L oxalic acid solution, a concentration of 10 g / L hydrogen fluoride ammonia solution;
  • the acidic solution is one or a mixture of the following solutions; the solution is included; the concentration is 6.5 g / L acetic acid solution, the concentration is 0.05 g / L hydrochloric acid solution, the concentration is 10 g / L hydrogen fluoride ammonia solution.
  • the alkaline solution is aqueous ammonia having a mass percentage of 1 to 20%; in one embodiment, the alkaline solution is aqueous ammonia having a mass percentage of 5-15%.
  • the step of ultraviolet activation comprises: activating the substrate material under an ultraviolet lamp or in a plasma atmosphere capable of generating ultraviolet gas by irradiating ls-120s.
  • Step 203 depositing a film on the inner wall of the microporous channel of the base material after activation and a surface thereof;
  • the activated substrate material is placed in the reaction chamber, and each precursor is alternately introduced into the reaction chamber in a pulsed gas manner, in the microporous channel of the base material.
  • the purge gas such as an inert gas or the like is purged in the gap before the introduction of the precursor and before the passage into the next precursor.
  • the reaction chamber is subjected to a vacuum treatment to isolate the two precursors before and after, so that the two precursors do not simultaneously appear in the reaction chamber.
  • the depositing a film on the inner wall of the microporous channel of the substrate material and the surface thereof comprises:
  • Step 1 placing the substrate material in the reaction chamber
  • Step two introducing a first precursor, reacting the first precursor with a material of the inner wall of the microporous channel of the base material and a surface thereof;
  • Step 3 After the reaction is completed, the reaction chamber is purged with a cleaning gas, or the reaction chamber is evacuated, and the free first precursor is discharged from the reaction chamber, and then Second precursor
  • Step 4 The steps 2 and 3 are performed cyclically until a film of a predetermined thickness is deposited on the inner wall of the microporous channel of the base material and the surface thereof.
  • the entire experimental process is carried out under vacuum, but before the first pulse precursor, the pressure of the reaction chamber is in the range of OPa to l (T 2 Pa;
  • the method of introducing a precursor into the reaction chamber, each pulse precursor 0. 015S -50S, after the pulse is completed once, a flow rate of 0sccm-120sccm of argon Ar or nitrogen is introduced into the reaction chamber.
  • each precursor may enter the reaction chamber through a carrier gas, the carrier may be nitrogen N 2 or argon Ar; Since argon gas Ar or nitrogen gas N 2 is introduced into the reaction chamber in the gap between the two precursors of the pulse, excess precursor and reaction by-products in the reaction chamber can be discharged.
  • the flow rate of the argon gas Ar or the nitrogen gas N 2 introduced into the reaction chamber is Osccm, it means that no gas is introduced into the reaction chamber, and at this time, the vacuum is still maintained in the reaction chamber. The state, therefore, the free portion or reaction by-products of the precursor of the last pulse can be discharged by a vacuuming process.
  • the first-passed precursor may be chemically adsorbed with the material of the inner wall of the microporous channel of the base material and the surface thereof to form a first film, and then the first film and the second-pass precursor are formed. The reaction takes place to form a second film, and so on, until a film of a predetermined thickness is formed; wherein each precursor can be arbitrarily selected according to the chemical composition of the film.
  • the film is one or more layers of thickness-hooked film
  • the film is any one of the following films;
  • the film is a multilayer film formed by overlapping any one of the following films, or a multilayer film formed by alternately overlapping any of the following, or a multilayer film formed by overlapping one of the following And a combined multilayer film of a plurality of layers formed by alternately overlapping with any of the following:
  • the film comprises: A1 2 0 3 film, SiO 2 film, Ti0 2 film, ZnO film, Hf0 2 film, MgO film, Zr0 2 film , NiO film, CoO film, FeO x film, 01 ( 3 ⁇ 4 film, B 2 0 3 film, In 2 0 3 film, Sn0 2 film, Ga 2 0 3 film, Nb 2 0 5 film, Gd 2 0 3 film, Ta 2 0 5 film, BN film, A1N film, TiN film, SiC film, ZnS film, ZrS film, HA film, W film, Pt film, Ru film, Pd film, PMDA-DAH film,
  • Step 204 Curing the substrate material on which the film is deposited.
  • the substrate material on which the thin film is deposited is subjected to plasma curing, and the step of plasma curing comprises: placing a substrate material deposited with a thin film into a plasma generator to cure ls-200s; wherein the plasma
  • the power of the body generator is 50W-500W
  • the curing gas is a combination of one or more of He, Ne, Ar, Kr, Xe, and the gas flow rate is 10 sccm-200 sccm.
  • the pore size of the microporous atomized sheet prepared by using the embodiment of the present invention can be precisely controlled between several nanometers and several tens of micrometers, that is, the size of the micropore diameter of the microporous atomized sheet can be precisely controlled, and therefore, Realizing ultra-fine aerosol particles; and, due to the microporous orifice of the microporous atomizing sheet
  • the film is deposited on the wall and its surface, and the film can be selected from various materials, and the chemical properties of the film of different materials are different. Therefore, the film formed by a single material or a plurality of materials are alternately overlapped to form a thickness-hooked layer.
  • the combined film can realize different chemical properties of the microporous atomized sheet, and expand the kind of the atomized liquid; for example, the microporous atomized sheet is biocompatible by the chemical formation of the film, and the harmful ion precipitation is blocked. Self-cleaning, acid/alkali corrosion resistance, excellent ultrafine atomization effect, anti-aerosol condensation, hydrophobicity, easy cleaning, etc.
  • the film on the inner wall of the microporous channel of the microporous atomized sheet prepared by the embodiment of the present invention and the film on the surface thereof are deposited layer by layer, and the film is on the inner wall of the microporous channel of the microporous atomized sheet
  • the surface of the present invention is fully coated.
  • the embodiment of the present invention can repair the atomized sheet by laminating the crack or fracture which is difficult to be observed by the naked eye in the conventional atomized sheet.
  • the breaking strength of the microporous atomized sheet prepared by the embodiment of the present invention moreover, the film is firmly bonded to the base material, and the film glass is not peeled off or peeled off due to vibration.
  • the atomizing sheet selected in the embodiment of the present invention is an atomizing sheet commonly used in the market, and the atomizing sheet can reduce the aperture of the atomizing area by the embodiment of the present invention, the embodiment of the present invention It can lay the foundation for the realization of the universal use of atomized sheets in the aerosol generators in various fields.
  • FIG. 3 is a schematic structural view of a microporous atomization sheet according to an embodiment of the present invention
  • ⁇ a microporous atomization sheet as shown in FIG. 3 is prepared by using the above microporous atomization sheet preparation method, as shown in FIG. 3,
  • the microporous atomizing sheet is provided with a microporous region 301, wherein the microporous region 301 is distributed with a plurality of micropores 302; the inner wall of the microporous orifice of the microporous atomizing sheet and the surface thereof are coated with a film;
  • the pore size of the pore is 0.05 ⁇ -20 ⁇ ⁇
  • the number of the micro holes 302 in the micropore region 301 is 100-1000000.
  • the hole atomizing sheet has a diameter of 1 to 50 mm.
  • the outer diameter R 2 of the micropore region is 1 to 50 mm.
  • the microporous atomized sheet is any one of a metal atomizing sheet, a ceramic atomizing sheet, and an organic material atomizing sheet.
  • the inner wall of the microporous channel of the microporous atomization sheet and the coating material of the surface thereof are one or more layers of uniform thickness;
  • the coating material is any one of the following films; when the coating material is a plurality of layers, the coating material is overlapped by any one of the following films a multilayer film formed, or a multilayer film formed by alternately overlapping any of the following, or a composite film of a multilayer film formed by overlapping one of the following and a multilayer film of any of the following alternately stacked layers;
  • the film comprises: A1 2 0 3 film, SiO 2 film, Ti 2 film, ZnO film, Hf0 2 film, MgO film, Zr0 2 film, NiO film, CoO film, FeO x film, 01 (3 ⁇ 4 film, B 2 0 3 film, In 2 0 3 film, Sn0 2 film, Ga 2 0 3 film, Nb 2 0 5 film, Gd 2 0 3 film, Ta 2 5 film, BN film, A1N film, TiN film, SiC film, ZnS film, ZrS film, HA film, W film, Pt film, Ru film, Pd film, PMDA-DAH film, PMDA-ODA film, PMDA-EDA film, PMDA-PDA film.
  • the shape of the microporous channel in the microporous atomization sheet is any one of a circle, a triangle, an ellipse and a square.
  • the shape of the cross section of the microporous channel in the microporous atomization sheet is: any one of a parabola shape, a bar shape, a square shape, and a trapezoid shape; here, the shape of the cross section of the microporous channel is further Can be any symmetrical shape.
  • the shape of the microporous channel in the microporous atomization sheet given by the embodiment of the present invention is only used to further explain the structure of the microporous atomization sheet, and is not used to limit the utility model, in practical application.
  • the shape of the microporous channel in the microporous atomization sheet may also be any other shape, which will not be described herein.
  • FIG. 4 is a cross-sectional view of a microporous orifice in a microporous atomization sheet according to an embodiment of the present invention. As shown in FIG. 4, the microporous orifice has a parabolic shape.
  • the embodiment of the present invention further provides a micropore atomization device, comprising: an atomizer case, an aerosol generator connected to the atomizer case, and an electronic circuit connected to the atomizer case
  • the controller includes a microporous atomization sheet, and the microporous atomization sheet is any one of the microporous atomization sheets described above.
  • Figure 5 is a schematic view showing the structure of the atomizer case of the embodiment of the present invention
  • Figure 5 (a) is a front view of the atomizer case of the embodiment of the present invention
  • Figure 5 (b) is atomized according to an embodiment of the present invention
  • Figure 5 (c) is a cross-sectional view taken along line AA of Figure 5 (b) of the embodiment of the present invention
  • the atomizer housing 10 includes: an upper housing 11, a lower casing 21 and an aerosol attachment 31; wherein the upper casing 11 is connected to the lower casing 21 via an aerosol attachment 31;
  • Figure 6 is a schematic structural view of an aerosol generator according to an embodiment of the present invention
  • Figure 6 (a) is a side view of an aerosol generator according to an embodiment of the present invention
  • Figure 6 (b) is an embodiment of the present invention
  • FIG. 6(c) is a cross-sectional view taken along line BB of FIG. 6(a) according to an embodiment of the present invention
  • the aerosol generator 40 includes: a microporous atomizer 41, annular piezoelectric ceramic sheet 42, sealing member 43 and circuit lead line 44;
  • Figure 7 is a schematic structural view of an aerosol generator according to an embodiment of the present invention
  • Figure 7 (a) is a side view of an aerosol generator according to an embodiment of the present invention
  • Figure 7 (b) is an embodiment of the present invention
  • Figure 7 (c) is a cross-sectional view taken along line CC of Figure 7 (a) of the embodiment of the present invention
  • the aerosol generator 40 comprises: a micro-atomized piece 41, a ring-shaped piezoelectric ceramic piece 42, a sealing member 43, a circuit lead wire 44 and a ring spacer 45;
  • FIG. 8 is a schematic structural view of an electronic circuit controller according to an embodiment of the present invention
  • FIG. 8(a) is a front view of an electronic circuit controller according to an embodiment of the present invention
  • FIG. 8(b) is an implementation of the present invention
  • FIG. 8( c ) is a cross-sectional view taken along line DD of FIG. 8 ( b ) of the embodiment of the present invention
  • the electronic circuit controller 50 includes: a circuit board 51.
  • the upper casing 11 includes: an upper cover 12, a liquid tank 13, an aerosol generator fixing device 14, and a line outlet 15; wherein the upper cover 12 is provided with a card slot
  • the upper outer surface of the liquid tank 13 is provided with a threaded slot structure, and the upper cover 12 can be rotatably fixed to the liquid tank by a slot structure of the inner portion thereof and a threaded slot structure of the upper outer surface of the liquid tank 13
  • the upper portion of 13 in this way, prevents the atomization tank from tipping over and causing the liquid to flow out;
  • the aerosol generator fixing device 14 fixes the aerosol generator 40 shown in Fig. 6 or Fig.
  • the lower casing 21 includes: an arc-shaped aerosol discharge passage 22, gas a sol discharge port 23; wherein, an upper outer surface of the lower outer casing 21 is provided with a groove structure, and a lower inner surface of the upper outer casing 11 is provided with a convex groove structure, such that the lower outer casing 21 and the upper outer casing 11 are connected to each other by occlusion ; Electronic circuit of the controller 40 shown in FIG aerosol generator 850 through the line interface 15 is connected.
  • the aerosol attachment 31 can be applied to different devices; for example, the aerosol attachment 31 of the embodiment of the present invention can act as a gas in any one of a mouth suction cover, a nasal suction cover, a face mask, and a diffusion cover. Fog attachment. After the aerosol attachment 31 is opened, the aerosol generated by the aerosol generator 40 is passed through the arc-shaped aerosol discharge passage 22 and the aerosol discharge port 23 to the atmosphere.
  • the central region of the microporous atomization sheet 41 has micropores uniformly distributed, and the region where the micropores distributed by the hooks are located is called a microporous region, and the annular piezoelectric ceramic sheet is An inner diameter of 42 is opposite to the microporous region of the microporous atomizing sheet 41 and surrounds the microporous region, and the annular piezoelectric ceramic sheet 42 is fixed to the microporous atomization by welding or gluing techniques.
  • the annular piezoelectric ceramic sheet 42 may be fixed to the upper surface of the microporous atomizing sheet 41, or may be fixed to the same.
  • the atomizing sheet 41 and the annular piezoelectric ceramic sheet 42 are corroded by contact with the atomized liquid for a long time; the circuit lead wires 44 are connected to any two points of the upper and lower surfaces of the annular piezoelectric ceramic sheet 42; The portion of the circuit lead wire 44 connected to the annular piezoceramic piece 42 is sealed by the sealing member 43; the circuit lead wire 44 passes through the upper casing 11 and the line outlet 15 shown in FIG.
  • the electronic circuit controller 50 shown in FIG. 8 is connected.
  • the central region of the microporous atomization sheet 41 has micropores distributed uniformly, and the region where the micropores distributed by the hooks are located is called a micropore region, and the microporous mist
  • the edge region of the chemical sheet 41 except the microporous region is fixed to the annular gasket 45 by welding or gluing technology, and at the same time, the inner diameter of the annular gasket 45 surrounds the microporous region, but does not block a micropore in the microporous region;
  • a center of the microporous atomizing sheet 41 coincides with a center of the annular spacer 45;
  • the annular piezoelectric ceramic sheet 42 is fixed to the annular pad by soldering or gluing techniques On the sheet 45, and the center of the annular piezoelectric ceramic piece 42 coincides with the center of the annular spacer 45, that is, the inner diameter of the annular piezoelectric ceramic piece 42 and the micro-atomized atomizing sheet 41
  • microporous region in the microporous atomization sheet 41 Only the microporous region in the microporous atomization sheet 41 is left, where the microporous region is also referred to as an atomization region, so that a portion other than the atomization region can be isolated from the atomized liquid. Further preventing the microporous atomizing sheet 41, the annular piezoelectric ceramic sheet 42 and the annular spacer 45 from being corroded by contact with the atomized liquid for a long time; The annular piezoelectric ceramic piece 42 is in communication with the annular spacer 45, and the annular piezoelectric ceramic piece 42 and the unconnected upper and lower surfaces of the annular spacer 45 are connected to the circuit lead wire 44 at two points.
  • circuit lead wire 44 connected to the annular piezoceramic piece 42 is uniformly wrapped and sealed by the sealing member 43; the circuit lead wire 44 passes through the upper casing 11 and the line outlet shown in FIG. 15 is connected to the electronic circuit controller 50 shown in FIG.
  • a method for preparing a microporous atomized sheet comprising:
  • Step 1 using a metal atomized sheet as a substrate material, the substrate material is ultrasonically cleaned; wherein the metal atomized sheet has a micropore diameter of 21 ⁇ m;
  • Step 2 The substrate material is placed in the reaction chamber, and a vacuum is applied to reduce the pressure in the reaction chamber to 10 Pa. Subsequently, after first pulsing trimethylaluminum (TMA) for 50 s, a flow rate of 100 sec is introduced. 2 gas purging the reaction chamber 120s; secondly, after pulse water vapor H 2 0 30s, the reaction chamber 120s is purged with N 2 gas having a flow rate of 120 sccm, so that the pulses TMA and 3 ⁇ 40 are alternated until The inner wall of the microporous channel of the base material and the surface thereof are deposited with 4200 layers of A1 2 0 3 film; wherein, the thickness of the A1 2 0 3 film is about 500 nm;
  • Step 3 The substrate material deposited with the film is placed in a plasma generator and cured for 200 s; wherein the plasma generator has a power of 50 W, the curing gas is a He plasma, and the gas flow is 200 sccm.
  • the A1 2 0 3 film is tightly coated on the inner wall of the microporous channel of the metal atomizing sheet and the surface thereof, so that the pore diameter of the micropores in the metal atomizing sheet is reduced to 20 ⁇ m to obtain a micropore mist.
  • the chemical sheet has good corrosion resistance and can effectively block the precipitation of harmful ions.
  • the microporous atomization sheet has a diameter of 1 mm; the micropore region of the microporous atomization sheet has an outer diameter of 1 mm; and the micropores in the microporous region have a total of 100;
  • the shape of the microporous channel in the hole atomizing sheet is circular; the shape of the cross section of the microporous channel of the microporous atomizing sheet is a bell shape.
  • a method for preparing a microporous atomized sheet comprising:
  • Step 1 using a ceramic atomized sheet as a base material, the base material is ultrasonically cleaned; wherein the ceramic atomized sheet has a micropore diameter of ⁇ ;
  • Step 2 The substrate material is placed in the reaction chamber, and a vacuum is applied to reduce the pressure in the reaction chamber to 10 ⁇ Pa; subsequently, after the trimethylaluminum (TMA) is pulsed for 10 seconds, the flow rate is 50 sccm.
  • TMA trimethylaluminum
  • the Ar gas is purged into the reaction chamber 80s; after the water vapor is pulsed for 3 ⁇ 40 5s, the reaction chamber is purged with an Ar gas having a flow rate of 50 sccm, so that the pulses TMA and 3 ⁇ 40 are alternately pulsed until the base material is
  • the inner wall of the microporous channel and the surface thereof are deposited with 1000 layers of A1 2 0 3 film, wherein the thickness of the A1 2 0 3 film is about 120 nm; finally, after the pulsed tetramethylamino titanium (TDMAT) Is, the flow rate is 30sccm Ar gas purging the reaction chamber 80s, after ozone pulse 0.02s 03, is introduced at a flow of 30 sccm Ar purge the reaction chamber is, thus alternately month permanent red TDMAT and 03, in Depositing 500 layers of Ti0 2 film on the surface of the A1 2 0 3 film, the Ti0 2 film having a thickness of about 30 nm;
  • Step 3 The substrate material deposited with the film is placed in a plasma generator and cured for 90 s; wherein the plasma generator has a power of 100 W, the curing gas is a He and Ne mixed plasma, and the gas He gas flow. At 100 sccm, the gas flow of the gas Ne was 40 sccm.
  • the A1 2 0 3 film and the Ti 2 2 film are tightly coated on the inner wall of the microporous channel of the ceramic atomizing sheet and the surface thereof, so that the pore diameter of the micropores in the ceramic atomizing sheet is reduced to 9.7.
  • the microporous atomized sheet obtained in the embodiment of the present invention has biocompatibility and self-cleaning property.
  • the diameter of the microporous atomization sheet is 30 mm
  • the outer diameter of the micropore region of the microporous atomization sheet is 25 mm
  • the number of micropores in the micropore region is 5000
  • the shape of the microporous channel in the microporous atomization sheet is elliptical; the cross section of the microporous channel has a parabolic shape.
  • a method for preparing a microporous atomized sheet comprising:
  • Step 1 using an organic material atomized sheet as a base material, and ultrasonically cleaning the base material;
  • microporous pore diameter of the organic material atomized sheet is 5 ⁇ ;
  • Step 2 The substrate material is placed in the reaction chamber, and a vacuum is applied to reduce the pressure in the reaction chamber to 1 (T 2 Pa; then, after the pulse of diethyl zinc (DEZ) is 0.015 s, vacuum is applied. Purging the reaction chamber for 50 s; after pulsing the oxygen plasma for 0.5 s, vacuuming the reaction chamber for 30 s, thus alternately pulse DEZ and oxygen plasma until the inner wall of the microporous channel of the base material and A ZnO thin film is deposited on the surface thereof, wherein the ZnO thin film has a thickness of about 100 nm; then, after pulsed pyromellitic dianhydride (PMDA) for 8 s, the reaction chamber is purged with N 2 gas having a flow rate of 30 sccm.
  • PMDA pulsed pyromellitic dianhydride
  • the reaction chamber was purged with N 2 gas with a flow rate of 30sccm for 15s, so that PMDA and ODA were alternately pulsed, and 1250 layers of PMDA-ODA film were deposited on the surface of the ZnO film.
  • the PMDA-ODA film has a thickness of about 1075 nm.
  • the reaction chamber is purged with an Ar gas having a flow rate of 20 sccm for 5 s, pulse water vapor H 2 0
  • the reaction chamber 3 was purged with Ar gas having a flow rate of 20 sccm.
  • Step 3 placing the substrate material deposited with the film into a plasma generator, curing Is:
  • the power of the plasma generator is 500 W
  • the curing gas is a plasma in which Ar and Xe are mixed
  • the gas flow of the gas Ar is 10 sccm
  • the gas flow of the gas Xe is 50 sccm.
  • the ZnO film, the PMDA-ODA film, and the Hf0 2 film are tightly coated on the inner wall of the microporous channel of the organic material atomizing sheet and the surface thereof, so that the microporous material in the organic material atomizing sheet is The pore diameter is reduced to 0.05 ⁇ m to obtain a microporous atomized sheet; since the inner wall and surface of the microporous orifice of the microporous atomized sheet are tightly coated with a ZnO thin film, a PMDA-ODA thin film and an HfO 2 thin film, it is possible to avoid turbulence The problem of causing the film to fall off; and the microporous atomized sheet obtained by the embodiment of the present invention is resistant to the chemical and physical properties of the ZnO film, the PMDA-ODA film and the Hf0 2 film in the microporous atomized sheet. Abrasive, acid and alkali corrosion resistant and effective barrier to harmful ion precipitation.
  • the microporous atomization sheet has a diameter of 50 mm
  • the micropore region of the microporous atomization sheet has an outer diameter of 50 mm
  • the micropores in the micropore region have a total of 1,000,000
  • the shape of the microporous channel in the microporous atomization sheet is a triangle; the shape of the cross section of the microporous channel is trapezoidal.
  • a method for preparing a microporous atomized sheet comprising:
  • Step 1 using a metal atomizing sheet as a substrate material, the substrate material is cleaned; wherein the metal atomized sheet has a micropore diameter of 5 ⁇ m;
  • Step two activating the cleaned substrate material
  • the step of activating includes:
  • the base material is immersed in a phosphoric acid solution having a concentration of lg/L for ultrasonic cleaning for 5 min, and then the base material is washed with distilled water, and the pH of the surface liquid adhered to the base material is neutral. So far
  • the substrate material is immersed in a 15% by mass aqueous ammonia solution for ultrasonic cleaning for 15 minutes, and then the substrate material is washed with distilled water and washed until the pH of the liquid attached to the surface of the substrate material is neutral. ; Finally, the substrate material is activated by irradiating Is under an ultraviolet lamp.
  • Step 3 placing the activated substrate material in the reaction chamber, evacuating to reduce the pressure in the reaction chamber to 1 (T 2 Pa; subsequently, first pulse 3-aminopropyltriethoxysilane After 30 s (AMEO), the reaction chamber was purged with N 2 gas with a flow rate of 20 sccm for 50 s, and after the water vapor H 2 0 0.015 s was pulsed, the reaction chamber ls was evacuated, and finally, the ozone O 3 was pulsed.
  • the reaction chamber was purged with N 2 gas with a flow rate of 5 sccm for 10 s, so that AMEO, H 2 0 and 0 3 were alternately pulsed, and a layer of Si0 was deposited on the inner wall of the microporous channel of the base material and the surface thereof. 2 film, wherein the SiO 2 film has a thickness of about 0.1 nm.
  • Step 4 The substrate material deposited with the film is placed in a plasma generator to cure Is; wherein the plasma generator has a power of 500 W, and the curing gas is a plasma of He and Kr mixed, and the gas He The gas flow was 10 sccm, and the gas flow of the gas Kr was 30 sccm.
  • the SiO 2 film is tightly coated on the inner wall of the microporous channel of the metal atomizing sheet and the surface thereof, so that the inner wall of the microporous channel of the metal atomizing sheet and the surface thereof are coated with a layer of SiO 2 film.
  • microporous atomizing sheet although the pore diameter of the micropore in the microporous atomizing sheet hardly changes, but the inner wall of the microporous orifice of the microporous atomizing sheet and the surface thereof are coated with a layer of SiO 2 film, which is enhanced The rupture strength of the atomized sheet, and the SiO 2 film has acid/alkali corrosion resistance, so that the microporous atomized sheet has good resistance to alkali/alkali corrosion and can effectively block harmful ion precipitation.
  • the microporous atomization sheet has a diameter of 50 mm
  • the micropore region of the microporous atomization sheet has an outer diameter of 50 mm
  • the micropores in the micropore region have a total of 1,000,000
  • the shape of the microporous channels in the microporous atomization sheet is square; the shape of the cross section of the microporous channels is square.
  • a method for preparing a microporous atomized sheet comprising:
  • Step 1 The organic material atomized sheet is used as a base material, and the base material is washed; wherein, the microporous pore diameter of the organic material atomized sheet is 21 ⁇ ;
  • Step two activating the cleaned substrate material; Specifically, the step of activating includes:
  • the base material is immersed in a mixed solution of a concentration of 0.05 g/L hydrochloric acid and a concentration of 10 g / L of hydrogen fluoride ammonia solution for ultrasonic cleaning for 30 min, and then the base material is washed with distilled water, and washed until attached thereto.
  • the pH of the surface liquid of the base material is neutral;
  • the substrate material is immersed in ammonia water having a mass percentage of 1% for ultrasonic cleaning for 5 minutes, and then the substrate material is washed with distilled water, and the pH of the liquid attached to the surface of the substrate material is cleaned until the pH is neutral. ;
  • the substrate material is activated by irradiation in a plasma atmosphere capable of generating ultraviolet gas for 120 s.
  • Step 3 The activated substrate material is placed in the reaction chamber, and a vacuum is applied to reduce the pressure in the reaction chamber to 10 Pa. Subsequently, the tetramethylaminozirconium (TDMAZ) is pulsed for 0.1 s.
  • TDMAZ tetramethylaminozirconium
  • the reaction chamber was purged with an Ar gas having a flow rate of 30 sccm for 5 s; after a pulsed oxygen plasma for 0.8 s, the reaction chamber was purged with an Ar gas having a flow rate of 50 sccm for 100 s, thus alternately pulsed TDMAZ and oxygen plasma.
  • BBr 3 boron tribromide
  • the reaction chamber was purged with an Ar gas having a flow rate of 120 sccm, and after pulsed NH 3 for 0.02 s, the reaction chamber was purged with Ar gas having a flow rate of 8 sccm for 10 s, thus alternately pulsed BBr 3 and NH 3 .
  • the thickness of the BN film is about 3600 nm; finally, after pulsed pyromellitic dianhydride (PMDA) for 50 s, the reaction chamber is purged with Ar gas having a flow rate of 120 sccm. After 120s, pulsed diaminodiphenyl ether (DAH) for 8s, access 8sccm amount of Ar gas purging the reaction chamber 50s, and thus the DAH PMDA alternating pulses, layer 300 is deposited on PMDA-DAH thin film surface of the BN, wherein the PMDA-DAH film thickness of about 399.95nm.
  • PMDA pulsed pyromellitic dianhydride
  • Step 4 The substrate material deposited with the film is placed in a plasma generator and cured for 200 s; wherein the plasma generator has a power of 50 W and the curing gas is Ne plasma.
  • the gas flow of the gas Ne is 200 sccm.
  • the Zr0 2 film, the BN film, and the PMDA-DAH film are tightly coated on the inner wall of the microporous channel of the organic material atomizing sheet and the surface thereof, so that the microporous material in the organic material atomizing sheet is The pore size is reduced to 0.05 ⁇ m; since the inner wall and the surface of the microporous channel are tightly adhered to the Zr0 2 film, the BN film and the PMDA-DAH film, the ceramic atomized sheet of the embodiment has good barrier properties.
  • the diameter of the atomized sheet of the organic material is 45 mm; the outer diameter of the microporous region of the organic material atomized sheet is 40 mm; and the micropores in the microporous region are 5000;
  • the shape of the microporous channel in the atomizing sheet is circular; the shape of the cross section of the microporous channel is parabolic.
  • a method for preparing a microporous atomized sheet comprising:
  • Step 1 using a ceramic atomized sheet as a substrate material, the substrate material is cleaned; wherein the ceramic atomized sheet has a micropore diameter of 21 ⁇ m;
  • Step two activating the cleaned substrate material
  • the step of activating includes:
  • the base material is immersed in a mixed solution having a concentration of 6.5 g/L acetic acid solution, a concentration of 0.05 g/L hydrochloric acid solution, and a concentration of 10 g/L of hydrogen fluoride ammonia solution for 15 minutes, and then washed with distilled water.
  • the base material is cleaned until the pH of the surface liquid attached to the base material is neutral;
  • the substrate material is immersed in ammonia water having a mass percentage of 20% for ultrasonic cleaning for 30 minutes, and then the substrate material is washed with distilled water, and the pH of the liquid attached to the surface of the substrate material is cleaned until neutral. ;
  • the substrate material is activated by irradiation in a plasma atmosphere capable of generating ultraviolet gas for 90 s.
  • Step 3 placing the activated substrate material in the reaction chamber, evacuating the vacuum to make The pressure in the reaction chamber is reduced to 1 OPa; then, after the pyromellitic dianhydride (PMDA) is pulsed for 5 s, the reaction chamber is purged with N 2 gas at a flow rate of 20 sccm for 15 s, pulsed with p-phenylenediamine ( After PDA) Is, the reaction chamber is purged with N 2 gas having a flow rate of 20 sccm, so that PMDA and PDA are alternately pulsed, and 1250 layers of PMDA-PDA film are deposited on the surface of the base material, wherein the PMDA- The PDA film has a thickness of about 1000 nm.
  • PMDA pyromellitic dianhydride
  • Step 4 The substrate material deposited with the thin film is placed in a plasma generator and cured for 90 s; wherein the plasma generator has a power of 250 W, and the curing gas is a mixed plasma of Ar and Xe, and the gas is Ar The gas flow was 160 sccm, and the gas flow of the gas Xe was 40 sccm.
  • the PMDA-PDA film is tightly coated on the inner wall of the microporous channel of the ceramic atomizing sheet and the surface thereof, so that the pore diameter of the micropores in the ceramic atomizing sheet is reduced to 20 ⁇ m;
  • the inner wall and the surface are tightly adhered to the PMDA-PDA film, and therefore, the ceramic atomized sheet of the embodiment has extremely strong breaking strength and good barrier property.
  • the ceramic atomizing sheet has a diameter of 1 mm; the outer diameter of the microporous region of the organic material atomizing sheet is 1 mm; and the micropores in the microporous region have a total of 100;
  • the shape of the microporous channels in the tablet is square; the shape of the cross section of the micropores is square.
  • reaction chamber is evacuated before the pulse precursor, and the entire reaction process is performed under vacuum.

Landscapes

  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Anesthesiology (AREA)
  • Biomedical Technology (AREA)
  • Heart & Thoracic Surgery (AREA)
  • Hematology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Animal Behavior & Ethology (AREA)
  • General Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Veterinary Medicine (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

L'invention concerne une plaque d'atomisation à micropores et un appareil d'atomisation à micropores employant la plaque d'atomisation à micropores. La plaque d'atomisation à micropores est pourvue d'une zone de micropores. De multiples micropores sont répartis dans la zone de micropores. La paroi interne et la surface d'un canal de micropore de la plaque d'atomisation de micropores sont enveloppées par des films minces. Les ouvertures des micropores sont comprises dans la plage allant de 0,05 µm à 20 µm.
PCT/CN2014/078700 2014-05-28 2014-05-28 Plaque d'atomisation à micropores et appareil d'atomisation à micropores WO2015180079A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PCT/CN2014/078700 WO2015180079A1 (fr) 2014-05-28 2014-05-28 Plaque d'atomisation à micropores et appareil d'atomisation à micropores

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/CN2014/078700 WO2015180079A1 (fr) 2014-05-28 2014-05-28 Plaque d'atomisation à micropores et appareil d'atomisation à micropores

Publications (1)

Publication Number Publication Date
WO2015180079A1 true WO2015180079A1 (fr) 2015-12-03

Family

ID=54697861

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2014/078700 WO2015180079A1 (fr) 2014-05-28 2014-05-28 Plaque d'atomisation à micropores et appareil d'atomisation à micropores

Country Status (1)

Country Link
WO (1) WO2015180079A1 (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107597474A (zh) * 2017-08-22 2018-01-19 杭州西风半导体有限公司 一种硼扩散装置
CN108940331A (zh) * 2018-06-04 2018-12-07 广州大学 一种有序纳米片层团簇无金属催化剂及其合成与用途
CN115534493A (zh) * 2022-10-20 2022-12-30 深圳市尚进电子科技有限公司 基于fpc柔性线路板的微网雾化片及其制造工艺

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1236517A1 (fr) * 2001-02-23 2002-09-04 Microflow Engineering SA Procédé de fabrication d'un nébuliseur de goutelettes et un tel nébuliseur
US6802460B2 (en) * 2002-03-05 2004-10-12 Microflow Engineering Sa Method and system for ambient air scenting and disinfecting based on flexible, autonomous liquid atomizer cartridges and an intelligent networking thereof
US20100154790A1 (en) * 2008-12-23 2010-06-24 Stmicroelectronics S.R.L. Process for manufacturing an integrated membrane of nozzles in mems technology for a spray device and spray device using such membrane
CN101850308A (zh) * 2010-06-01 2010-10-06 华东理工大学 一种带有镍-碳化钨涂层的水煤浆喷嘴及其制备方法
CN201659059U (zh) * 2010-04-23 2010-12-01 昆山美微电子科技有限公司 金属雾化片
CN203899831U (zh) * 2014-05-28 2014-10-29 王长津 一种微孔雾化片及微孔雾化装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1236517A1 (fr) * 2001-02-23 2002-09-04 Microflow Engineering SA Procédé de fabrication d'un nébuliseur de goutelettes et un tel nébuliseur
US6802460B2 (en) * 2002-03-05 2004-10-12 Microflow Engineering Sa Method and system for ambient air scenting and disinfecting based on flexible, autonomous liquid atomizer cartridges and an intelligent networking thereof
US20100154790A1 (en) * 2008-12-23 2010-06-24 Stmicroelectronics S.R.L. Process for manufacturing an integrated membrane of nozzles in mems technology for a spray device and spray device using such membrane
CN201659059U (zh) * 2010-04-23 2010-12-01 昆山美微电子科技有限公司 金属雾化片
CN101850308A (zh) * 2010-06-01 2010-10-06 华东理工大学 一种带有镍-碳化钨涂层的水煤浆喷嘴及其制备方法
CN203899831U (zh) * 2014-05-28 2014-10-29 王长津 一种微孔雾化片及微孔雾化装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107597474A (zh) * 2017-08-22 2018-01-19 杭州西风半导体有限公司 一种硼扩散装置
CN108940331A (zh) * 2018-06-04 2018-12-07 广州大学 一种有序纳米片层团簇无金属催化剂及其合成与用途
CN108940331B (zh) * 2018-06-04 2021-03-12 广州大学 一种有序纳米片层团簇无金属催化剂及其合成与用途
CN115534493A (zh) * 2022-10-20 2022-12-30 深圳市尚进电子科技有限公司 基于fpc柔性线路板的微网雾化片及其制造工艺

Similar Documents

Publication Publication Date Title
CN203899831U (zh) 一种微孔雾化片及微孔雾化装置
WO2015180079A1 (fr) Plaque d'atomisation à micropores et appareil d'atomisation à micropores
JP6290544B2 (ja) 二酸化珪素フィルムを付着させる方法
CN111974661A (zh) 一种超声雾化片及超声雾化器
CN108026691B (zh) 光催化剂功能性无纺布及其制备方法
JP5996973B2 (ja) 金属繊維複合体及びその製造方法
JP2018110113A (ja) プラズマ処理装置及びプラズマ処理方法
CN111822216A (zh) 超声雾化器
TW201035345A (en) Substrate processing apparatus
WO2015180080A1 (fr) Procédé de préparation de feuille d'atomisation de micropore, feuille d'atomisation de micropore et appareil d'atomisation de micropore
CN105177530A (zh) 一种微孔雾化片的制备方法、微孔雾化片及微孔雾化装置
JP2009190008A (ja) 誘電積層体の製造方法及び得られた誘電積層体を用いた粒子状含炭素化合物除去装置
JP2018094523A (ja) 光触媒シート、空気清浄機及び光触媒シートの製造方法
TW201238750A (en) Method for manufacturing laminate having patterned metal layer and composition for forming plating layer
WO2017154737A1 (fr) Article moulé par insertion, connecteur de signal électrique, endoscope et procédé de moulage par insertion
JP2019048269A (ja) 多孔質触媒体膜及びそれを用いたガス処理装置
JP2007107100A (ja) プラズマ処理容器内複合膜被覆部材およびその製造方法
TWI741320B (zh) 電漿處理裝置用構件
WO2014170972A1 (fr) Procédé de formation d'un film
JP6561627B2 (ja) 触媒コーティング膜及びそれを用いたインジェクタ
JP3943701B2 (ja) オゾン発生装置
KR100531130B1 (ko) 금속염화물 처리에 의한 수소기체 분리용 팔라듐 복합막의제조방법
JP2001104751A (ja) 排ガス除害装置
JP2005162543A (ja) 金属酸化物薄膜の作製方法
JP2004241668A (ja) 静電チャック及びその製造方法

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 14893216

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

32PN Ep: public notification in the ep bulletin as address of the adressee cannot be established

Free format text: NOTING OF LOSS OF RIGHTS PURSUANT TO RULE 112(1) EPC, (EPO FORM 1205A DATED 14.03.2017)

122 Ep: pct application non-entry in european phase

Ref document number: 14893216

Country of ref document: EP

Kind code of ref document: A1