WO2015177511A1 - Procédé de préparation d'une structure métallo-organique - Google Patents
Procédé de préparation d'une structure métallo-organique Download PDFInfo
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- WO2015177511A1 WO2015177511A1 PCT/GB2015/051383 GB2015051383W WO2015177511A1 WO 2015177511 A1 WO2015177511 A1 WO 2015177511A1 GB 2015051383 W GB2015051383 W GB 2015051383W WO 2015177511 A1 WO2015177511 A1 WO 2015177511A1
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- WO
- WIPO (PCT)
- Prior art keywords
- metal ions
- acid
- metal
- carboxylic acid
- iii
- Prior art date
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- 238000000034 method Methods 0.000 title claims abstract description 65
- 239000012621 metal-organic framework Substances 0.000 title claims abstract description 45
- 229910021645 metal ion Inorganic materials 0.000 claims abstract description 73
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 25
- 229910001868 water Inorganic materials 0.000 claims abstract description 25
- 239000002904 solvent Substances 0.000 claims abstract description 24
- 239000003446 ligand Substances 0.000 claims abstract description 21
- 150000007942 carboxylates Chemical class 0.000 claims abstract description 15
- 150000001735 carboxylic acids Chemical class 0.000 claims abstract description 15
- 239000003960 organic solvent Substances 0.000 claims abstract description 15
- 239000002243 precursor Substances 0.000 claims abstract description 8
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Natural products CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 46
- 239000000203 mixture Substances 0.000 claims description 21
- 229910052751 metal Inorganic materials 0.000 claims description 17
- 239000002184 metal Substances 0.000 claims description 17
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 15
- 238000006243 chemical reaction Methods 0.000 claims description 15
- 229910052742 iron Inorganic materials 0.000 claims description 12
- 150000003839 salts Chemical class 0.000 claims description 10
- 229910052782 aluminium Inorganic materials 0.000 claims description 8
- 229910052726 zirconium Inorganic materials 0.000 claims description 8
- 229910000608 Fe(NO3)3.9H2O Inorganic materials 0.000 claims description 7
- WAEMQWOKJMHJLA-UHFFFAOYSA-N Manganese(2+) Chemical compound [Mn+2] WAEMQWOKJMHJLA-UHFFFAOYSA-N 0.000 claims description 6
- PTFCDOFLOPIGGS-UHFFFAOYSA-N Zinc dication Chemical compound [Zn+2] PTFCDOFLOPIGGS-UHFFFAOYSA-N 0.000 claims description 6
- 229910052804 chromium Inorganic materials 0.000 claims description 6
- XLJKHNWPARRRJB-UHFFFAOYSA-N cobalt(2+) Chemical compound [Co+2] XLJKHNWPARRRJB-UHFFFAOYSA-N 0.000 claims description 6
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 claims description 6
- 229910052738 indium Inorganic materials 0.000 claims description 6
- 229910052720 vanadium Inorganic materials 0.000 claims description 6
- VTLYFUHAOXGGBS-UHFFFAOYSA-N Fe3+ Chemical compound [Fe+3] VTLYFUHAOXGGBS-UHFFFAOYSA-N 0.000 claims description 5
- 150000001768 cations Chemical class 0.000 claims description 5
- 229910052706 scandium Inorganic materials 0.000 claims description 5
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 claims description 4
- 150000004696 coordination complex Chemical class 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 claims description 3
- 229910007932 ZrCl4 Inorganic materials 0.000 claims description 3
- BFGKITSFLPAWGI-UHFFFAOYSA-N chromium(3+) Chemical compound [Cr+3] BFGKITSFLPAWGI-UHFFFAOYSA-N 0.000 claims description 3
- 235000019260 propionic acid Nutrition 0.000 claims description 3
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 claims description 3
- 150000000000 tetracarboxylic acids Chemical class 0.000 claims description 3
- 150000003628 tricarboxylic acids Chemical class 0.000 claims description 3
- DUNKXUFBGCUVQW-UHFFFAOYSA-J zirconium tetrachloride Chemical compound Cl[Zr](Cl)(Cl)Cl DUNKXUFBGCUVQW-UHFFFAOYSA-J 0.000 claims description 3
- 229910021578 Iron(III) chloride Inorganic materials 0.000 claims description 2
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical group Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 claims description 2
- 229910052748 manganese Inorganic materials 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- 230000000737 periodic effect Effects 0.000 claims description 2
- 229910052723 transition metal Inorganic materials 0.000 claims description 2
- 229910001428 transition metal ion Inorganic materials 0.000 claims description 2
- 150000003624 transition metals Chemical class 0.000 claims description 2
- 229910052725 zinc Inorganic materials 0.000 claims description 2
- 125000000218 acetic acid group Chemical group C(C)(=O)* 0.000 claims 2
- 125000001142 dicarboxylic acid group Chemical group 0.000 claims 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 40
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 30
- 239000013078 crystal Substances 0.000 description 22
- 238000000634 powder X-ray diffraction Methods 0.000 description 16
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 15
- -1 Fe3+ ions Chemical class 0.000 description 14
- 235000011054 acetic acid Nutrition 0.000 description 14
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 13
- 239000007787 solid Substances 0.000 description 13
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- 239000007789 gas Substances 0.000 description 12
- 238000001914 filtration Methods 0.000 description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 10
- 239000002253 acid Substances 0.000 description 10
- 238000001816 cooling Methods 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 7
- 239000001257 hydrogen Substances 0.000 description 7
- 229910052739 hydrogen Inorganic materials 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- 229910002092 carbon dioxide Inorganic materials 0.000 description 6
- 150000002431 hydrogen Chemical class 0.000 description 6
- 239000011777 magnesium Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 238000003786 synthesis reaction Methods 0.000 description 6
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 5
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- QMKYBPDZANOJGF-UHFFFAOYSA-N benzene-1,3,5-tricarboxylic acid Chemical compound OC(=O)C1=CC(C(O)=O)=CC(C(O)=O)=C1 QMKYBPDZANOJGF-UHFFFAOYSA-N 0.000 description 5
- 239000001569 carbon dioxide Substances 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 4
- 229920002266 Pluriol® Polymers 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 4
- 239000012153 distilled water Substances 0.000 description 4
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 4
- 238000000879 optical micrograph Methods 0.000 description 4
- 239000005297 pyrex Substances 0.000 description 4
- GJAWHXHKYYXBSV-UHFFFAOYSA-N quinolinic acid Chemical compound OC(=O)C1=CC=CN=C1C(O)=O GJAWHXHKYYXBSV-UHFFFAOYSA-N 0.000 description 4
- 238000001179 sorption measurement Methods 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- KQTIIICEAUMSDG-UHFFFAOYSA-N carboxymethylsuccinic acid Natural products OC(=O)CC(C(O)=O)CC(O)=O KQTIIICEAUMSDG-UHFFFAOYSA-N 0.000 description 3
- WJJMNDUMQPNECX-UHFFFAOYSA-N dipicolinic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=N1 WJJMNDUMQPNECX-UHFFFAOYSA-N 0.000 description 3
- 239000000706 filtrate Substances 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- ZEVWQFWTGHFIDH-UHFFFAOYSA-N 1h-imidazole-4,5-dicarboxylic acid Chemical compound OC(=O)C=1N=CNC=1C(O)=O ZEVWQFWTGHFIDH-UHFFFAOYSA-N 0.000 description 2
- SVAJWMFPXLZPHL-UHFFFAOYSA-N 2-[3,5-bis(2-carboxyphenyl)phenyl]benzoic acid Chemical compound OC(=O)C1=CC=CC=C1C1=CC(C=2C(=CC=CC=2)C(O)=O)=CC(C=2C(=CC=CC=2)C(O)=O)=C1 SVAJWMFPXLZPHL-UHFFFAOYSA-N 0.000 description 2
- UITKHKNFVCYWNG-UHFFFAOYSA-N 4-(3,4-dicarboxybenzoyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 UITKHKNFVCYWNG-UHFFFAOYSA-N 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 2
- MSFXUHUYNSYIDR-UHFFFAOYSA-N 4-[4,6-bis(4-carboxyphenyl)-1,3,5-triazin-2-yl]benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1C1=NC(C=2C=CC(=CC=2)C(O)=O)=NC(C=2C=CC(=CC=2)C(O)=O)=N1 MSFXUHUYNSYIDR-UHFFFAOYSA-N 0.000 description 2
- NBDAHKQJXVLAID-UHFFFAOYSA-N 5-nitroisophthalic acid Chemical compound OC(=O)C1=CC(C(O)=O)=CC([N+]([O-])=O)=C1 NBDAHKQJXVLAID-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- 150000001335 aliphatic alkanes Chemical class 0.000 description 2
- 150000001336 alkenes Chemical class 0.000 description 2
- 150000001345 alkine derivatives Chemical class 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 150000001924 cycloalkanes Chemical class 0.000 description 2
- KZTYYGOKRVBIMI-UHFFFAOYSA-N diphenyl sulfone Chemical compound C=1C=CC=CC=1S(=O)(=O)C1=CC=CC=C1 KZTYYGOKRVBIMI-UHFFFAOYSA-N 0.000 description 2
- 235000019253 formic acid Nutrition 0.000 description 2
- CHTHALBTIRVDBM-UHFFFAOYSA-N furan-2,5-dicarboxylic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)O1 CHTHALBTIRVDBM-UHFFFAOYSA-N 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- QQHJDPROMQRDLA-UHFFFAOYSA-N hexadecanedioic acid Chemical compound OC(=O)CCCCCCCCCCCCCCC(O)=O QQHJDPROMQRDLA-UHFFFAOYSA-N 0.000 description 2
- 150000004677 hydrates Chemical class 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- FEIOASZZURHTHB-UHFFFAOYSA-N methyl 4-formylbenzoate Chemical compound COC(=O)C1=CC=C(C=O)C=C1 FEIOASZZURHTHB-UHFFFAOYSA-N 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- ZUCRGHABDDWQPY-UHFFFAOYSA-N pyrazine-2,3-dicarboxylic acid Chemical compound OC(=O)C1=NC=CN=C1C(O)=O ZUCRGHABDDWQPY-UHFFFAOYSA-N 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- TYFQFVWCELRYAO-UHFFFAOYSA-N suberic acid Chemical compound OC(=O)CCCCCCC(O)=O TYFQFVWCELRYAO-UHFFFAOYSA-N 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 238000000967 suction filtration Methods 0.000 description 2
- DRHRIEKNAHSNPY-UHFFFAOYSA-N tetrakis(4-methylphenyl)silane Chemical compound C1=CC(C)=CC=C1[Si](C=1C=CC(C)=CC=1)(C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 DRHRIEKNAHSNPY-UHFFFAOYSA-N 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- OJJRABFYHOHGGU-UHFFFAOYSA-N 1,2,4-trinitrobenzene Chemical compound [O-][N+](=O)C1=CC=C([N+]([O-])=O)C([N+]([O-])=O)=C1 OJJRABFYHOHGGU-UHFFFAOYSA-N 0.000 description 1
- IZUKQUVSCNEFMJ-UHFFFAOYSA-N 1,2-dinitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1[N+]([O-])=O IZUKQUVSCNEFMJ-UHFFFAOYSA-N 0.000 description 1
- WDCYWAQPCXBPJA-UHFFFAOYSA-N 1,3-dinitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC([N+]([O-])=O)=C1 WDCYWAQPCXBPJA-UHFFFAOYSA-N 0.000 description 1
- PXGZQGDTEZPERC-UHFFFAOYSA-N 1,4-cyclohexanedicarboxylic acid Chemical compound OC(=O)C1CCC(C(O)=O)CC1 PXGZQGDTEZPERC-UHFFFAOYSA-N 0.000 description 1
- FYFDQJRXFWGIBS-UHFFFAOYSA-N 1,4-dinitrobenzene Chemical compound [O-][N+](=O)C1=CC=C([N+]([O-])=O)C=C1 FYFDQJRXFWGIBS-UHFFFAOYSA-N 0.000 description 1
- ZBTMRBYMKUEVEU-UHFFFAOYSA-N 1-bromo-4-methylbenzene Chemical compound CC1=CC=C(Br)C=C1 ZBTMRBYMKUEVEU-UHFFFAOYSA-N 0.000 description 1
- XJDOBMJUQFBURS-UHFFFAOYSA-N 1-methylnonane-1,3,5,7-tetracarboxylic acid Chemical compound CCC(C(O)=O)CC(C(O)=O)CC(C(O)=O)CC(C)C(O)=O XJDOBMJUQFBURS-UHFFFAOYSA-N 0.000 description 1
- ZUUNZDIGHGJBAR-UHFFFAOYSA-N 1h-imidazole-2,5-dicarboxylic acid Chemical compound OC(=O)C1=CNC(C(O)=O)=N1 ZUUNZDIGHGJBAR-UHFFFAOYSA-N 0.000 description 1
- YDMVPJZBYSWOOP-UHFFFAOYSA-N 1h-pyrazole-3,5-dicarboxylic acid Chemical compound OC(=O)C=1C=C(C(O)=O)NN=1 YDMVPJZBYSWOOP-UHFFFAOYSA-N 0.000 description 1
- IKTPUTARUKSCDG-UHFFFAOYSA-N 1h-pyrazole-4,5-dicarboxylic acid Chemical compound OC(=O)C=1C=NNC=1C(O)=O IKTPUTARUKSCDG-UHFFFAOYSA-N 0.000 description 1
- LTMRRSWNXVJMBA-UHFFFAOYSA-N 2,2-diethylpropanedioic acid Chemical compound CCC(CC)(C(O)=O)C(O)=O LTMRRSWNXVJMBA-UHFFFAOYSA-N 0.000 description 1
- KFZMASHKIDYKFD-UHFFFAOYSA-N 2-(2-ethoxyethoxymethyl)propanedioic acid Chemical compound CCOCCOCC(C(O)=O)C(O)=O KFZMASHKIDYKFD-UHFFFAOYSA-N 0.000 description 1
- ZHGGHNZZJCJQSL-UHFFFAOYSA-N 2-[2-(2-ethoxyethoxy)ethoxymethyl]propanedioic acid Chemical compound CCOCCOCCOCC(C(O)=O)C(O)=O ZHGGHNZZJCJQSL-UHFFFAOYSA-N 0.000 description 1
- CABMTIJINOIHOD-UHFFFAOYSA-N 2-[4-methyl-5-oxo-4-(propan-2-yl)-4,5-dihydro-1H-imidazol-2-yl]quinoline-3-carboxylic acid Chemical compound N1C(=O)C(C(C)C)(C)N=C1C1=NC2=CC=CC=C2C=C1C(O)=O CABMTIJINOIHOD-UHFFFAOYSA-N 0.000 description 1
- IIQLVLWFQUUZII-UHFFFAOYSA-N 2-amino-5-(4-amino-3-carboxyphenyl)benzoic acid Chemical compound C1=C(C(O)=O)C(N)=CC=C1C1=CC=C(N)C(C(O)=O)=C1 IIQLVLWFQUUZII-UHFFFAOYSA-N 0.000 description 1
- MVDKKZZVTWHVMC-UHFFFAOYSA-N 2-hexadecylpropanedioic acid Chemical compound CCCCCCCCCCCCCCCCC(C(O)=O)C(O)=O MVDKKZZVTWHVMC-UHFFFAOYSA-N 0.000 description 1
- HSBSUGYTMJWPAX-UHFFFAOYSA-N 2-hexenedioic acid Chemical compound OC(=O)CCC=CC(O)=O HSBSUGYTMJWPAX-UHFFFAOYSA-N 0.000 description 1
- RLHGFJMGWQXPBW-UHFFFAOYSA-N 2-hydroxy-3-(1h-imidazol-5-ylmethyl)benzamide Chemical compound NC(=O)C1=CC=CC(CC=2NC=NC=2)=C1O RLHGFJMGWQXPBW-UHFFFAOYSA-N 0.000 description 1
- DCYCQZSHGUXYGP-UHFFFAOYSA-N 2-methyl-1h-imidazole-4,5-dicarboxylic acid Chemical compound CC1=NC(C(O)=O)=C(C(O)=O)N1 DCYCQZSHGUXYGP-UHFFFAOYSA-N 0.000 description 1
- BQGFRFCKVQNHEC-UHFFFAOYSA-N 2-methylquinoline-3,4-dicarboxylic acid Chemical compound C1=CC=C2C(C(O)=O)=C(C(O)=O)C(C)=NC2=C1 BQGFRFCKVQNHEC-UHFFFAOYSA-N 0.000 description 1
- WDHJMKYIJWJQLY-UHFFFAOYSA-N 2-nonyldecanedioic acid Chemical compound CCCCCCCCCC(C(O)=O)CCCCCCCC(O)=O WDHJMKYIJWJQLY-UHFFFAOYSA-N 0.000 description 1
- IGMCTDOFLKWLPJ-UHFFFAOYSA-N 2-octylundecanedioic acid Chemical compound CCCCCCCCC(C(O)=O)CCCCCCCCC(O)=O IGMCTDOFLKWLPJ-UHFFFAOYSA-N 0.000 description 1
- WBKVUCPCJPPVAW-UHFFFAOYSA-N 2-pentatriacontylpropanedioic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCC(C(O)=O)C(O)=O WBKVUCPCJPPVAW-UHFFFAOYSA-N 0.000 description 1
- XFEGRFIENDJTCK-UHFFFAOYSA-N 2-phenyl-2,3-dihydroindene-1,1-dicarboxylic acid Chemical compound C1C2=CC=CC=C2C(C(=O)O)(C(O)=O)C1C1=CC=CC=C1 XFEGRFIENDJTCK-UHFFFAOYSA-N 0.000 description 1
- SZHQPBJEOCHCKM-UHFFFAOYSA-N 2-phosphonobutane-1,2,4-tricarboxylic acid Chemical compound OC(=O)CCC(P(O)(O)=O)(C(O)=O)CC(O)=O SZHQPBJEOCHCKM-UHFFFAOYSA-N 0.000 description 1
- YCSKGHLYJDXIQO-UHFFFAOYSA-N 2-propan-2-yl-1h-imidazole-4,5-dicarboxylic acid Chemical compound CC(C)C1=NC(C(O)=O)=C(C(O)=O)N1 YCSKGHLYJDXIQO-UHFFFAOYSA-N 0.000 description 1
- VXEMRLSIYMCFQA-UHFFFAOYSA-N 4-[4-(4-carboxyphenyl)-2,3-diphenylphenyl]benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1C(C(=C1C=2C=CC=CC=2)C=2C=CC=CC=2)=CC=C1C1=CC=C(C(O)=O)C=C1 VXEMRLSIYMCFQA-UHFFFAOYSA-N 0.000 description 1
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- CEHPKLRUCVRKFF-UHFFFAOYSA-N 5,6-dimethylpyrazine-2,3-dicarboxylic acid Chemical compound CC1=NC(C(O)=O)=C(C(O)=O)N=C1C CEHPKLRUCVRKFF-UHFFFAOYSA-N 0.000 description 1
- JWQFKVGACKJIAV-UHFFFAOYSA-N 5-[(3-carboxy-4-hydroxyphenyl)methyl]-2-hydroxybenzoic acid Chemical compound C1=C(O)C(C(=O)O)=CC(CC=2C=C(C(O)=CC=2)C(O)=O)=C1 JWQFKVGACKJIAV-UHFFFAOYSA-N 0.000 description 1
- MTAVBTGOXNGCJR-UHFFFAOYSA-N 5-ethylpyridine-2,3-dicarboxylic acid Chemical compound CCC1=CN=C(C(O)=O)C(C(O)=O)=C1 MTAVBTGOXNGCJR-UHFFFAOYSA-N 0.000 description 1
- LSNWNWQKFBPREQ-UHFFFAOYSA-N 5-methoxynaphthalene-2,3-dicarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=C2C(OC)=CC=CC2=C1 LSNWNWQKFBPREQ-UHFFFAOYSA-N 0.000 description 1
- QXJQKTWAFPCULS-UHFFFAOYSA-N 5-nitronaphthalene-2,3-dicarboxylic acid Chemical compound C1=CC([N+]([O-])=O)=C2C=C(C(O)=O)C(C(=O)O)=CC2=C1 QXJQKTWAFPCULS-UHFFFAOYSA-N 0.000 description 1
- DBLUSQLVRKGZCD-UHFFFAOYSA-N 5-sulfonaphthalene-2,3-dicarboxylic acid Chemical compound C1=CC(S(O)(=O)=O)=C2C=C(C(O)=O)C(C(=O)O)=CC2=C1 DBLUSQLVRKGZCD-UHFFFAOYSA-N 0.000 description 1
- ROKAHPRWXCFCEM-UHFFFAOYSA-N 6-chloroquinoxaline-2,3-dicarboxylic acid Chemical compound C1=C(Cl)C=C2N=C(C(O)=O)C(C(=O)O)=NC2=C1 ROKAHPRWXCFCEM-UHFFFAOYSA-N 0.000 description 1
- IWBFSTPKXBJTJO-UHFFFAOYSA-N 7-chloro-3-methylquinoline-6,8-dicarboxylic acid Chemical compound OC(=O)C1=C(Cl)C(C(O)=O)=CC2=CC(C)=CN=C21 IWBFSTPKXBJTJO-UHFFFAOYSA-N 0.000 description 1
- FAIDDFBNWSBWQR-UHFFFAOYSA-N 7-chloro-4-oxo-1h-quinoline-2,8-dicarboxylic acid Chemical compound C1=CC(Cl)=C(C(O)=O)C2=NC(C(=O)O)=CC(O)=C21 FAIDDFBNWSBWQR-UHFFFAOYSA-N 0.000 description 1
- YXOVOXUMRLKDKF-UHFFFAOYSA-N 7-chloro-8-methylquinoline-2,3-dicarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)N=C2C(C)=C(Cl)C=CC2=C1 YXOVOXUMRLKDKF-UHFFFAOYSA-N 0.000 description 1
- BQMIGZNZWWXSHF-UHFFFAOYSA-N 7-chloroquinoline-2,3,8-tricarboxylic acid Chemical compound C1=C(Cl)C(C(O)=O)=C2N=C(C(O)=O)C(C(=O)O)=CC2=C1 BQMIGZNZWWXSHF-UHFFFAOYSA-N 0.000 description 1
- ZYIDIAPHYHJMCU-UHFFFAOYSA-N 7-chloroquinoline-3,8-dicarboxylic acid Chemical compound OC(=O)C1=C(Cl)C=CC2=CC(C(=O)O)=CN=C21 ZYIDIAPHYHJMCU-UHFFFAOYSA-N 0.000 description 1
- PBAYDYUZOSNJGU-UHFFFAOYSA-N Chelidonic acid Chemical compound OC(=O)C1=CC(=O)C=C(C(O)=O)O1 PBAYDYUZOSNJGU-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- WQZGKKKJIJFFOK-GASJEMHNSA-N Glucose Natural products OC[C@H]1OC(O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-GASJEMHNSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- UATJOMSPNYCXIX-UHFFFAOYSA-N Trinitrobenzene Chemical compound [O-][N+](=O)C1=CC([N+]([O-])=O)=CC([N+]([O-])=O)=C1 UATJOMSPNYCXIX-UHFFFAOYSA-N 0.000 description 1
- 238000005411 Van der Waals force Methods 0.000 description 1
- 159000000021 acetate salts Chemical class 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- PAVQGHWQOQZQEH-UHFFFAOYSA-N adamantane-1,3-dicarboxylic acid Chemical compound C1C(C2)CC3CC1(C(=O)O)CC2(C(O)=O)C3 PAVQGHWQOQZQEH-UHFFFAOYSA-N 0.000 description 1
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 1
- 229960000250 adipic acid Drugs 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- GQKVCZAPFYNZHX-UHFFFAOYSA-N anthracene-2,3-dicarboxylic acid Chemical compound C1=CC=C2C=C(C=C(C(C(=O)O)=C3)C(O)=O)C3=CC2=C1 GQKVCZAPFYNZHX-UHFFFAOYSA-N 0.000 description 1
- 239000012736 aqueous medium Substances 0.000 description 1
- GIXWDMTZECRIJT-UHFFFAOYSA-N aurintricarboxylic acid Chemical compound C1=CC(=O)C(C(=O)O)=CC1=C(C=1C=C(C(O)=CC=1)C(O)=O)C1=CC=C(O)C(C(O)=O)=C1 GIXWDMTZECRIJT-UHFFFAOYSA-N 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- AFYNADDZULBEJA-UHFFFAOYSA-N bicinchoninic acid Chemical compound C1=CC=CC2=NC(C=3C=C(C4=CC=CC=C4N=3)C(=O)O)=CC(C(O)=O)=C21 AFYNADDZULBEJA-UHFFFAOYSA-N 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229940045348 brown mixture Drugs 0.000 description 1
- NAJAZZSIKSSBGH-UHFFFAOYSA-N butane-1,1,1,2-tetracarboxylic acid Chemical class CCC(C(O)=O)C(C(O)=O)(C(O)=O)C(O)=O NAJAZZSIKSSBGH-UHFFFAOYSA-N 0.000 description 1
- LOGBRYZYTBQBTB-UHFFFAOYSA-N butane-1,2,4-tricarboxylic acid Chemical compound OC(=O)CCC(C(O)=O)CC(O)=O LOGBRYZYTBQBTB-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- YTIVTFGABIZHHX-UHFFFAOYSA-N butynedioic acid Chemical compound OC(=O)C#CC(O)=O YTIVTFGABIZHHX-UHFFFAOYSA-N 0.000 description 1
- 125000002843 carboxylic acid group Chemical group 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- DJKGDNKYTKCJKD-UHFFFAOYSA-N chlorendic acid Chemical compound ClC1=C(Cl)C2(Cl)C(C(=O)O)C(C(O)=O)C1(Cl)C2(Cl)Cl DJKGDNKYTKCJKD-UHFFFAOYSA-N 0.000 description 1
- 150000003841 chloride salts Chemical class 0.000 description 1
- MUYSADWCWFFZKR-UHFFFAOYSA-N cinchomeronic acid Chemical compound OC(=O)C1=CC=NC=C1C(O)=O MUYSADWCWFFZKR-UHFFFAOYSA-N 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- CCQPAEQGAVNNIA-UHFFFAOYSA-N cyclobutane-1,1-dicarboxylic acid Chemical compound OC(=O)C1(C(O)=O)CCC1 CCQPAEQGAVNNIA-UHFFFAOYSA-N 0.000 description 1
- QDKOFCUUXIAICD-UHFFFAOYSA-N cyclohex-2-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCC=C1C(O)=O QDKOFCUUXIAICD-UHFFFAOYSA-N 0.000 description 1
- STZIXLPVKZUAMV-UHFFFAOYSA-N cyclopentane-1,1,2,2-tetracarboxylic acid Chemical class OC(=O)C1(C(O)=O)CCCC1(C(O)=O)C(O)=O STZIXLPVKZUAMV-UHFFFAOYSA-N 0.000 description 1
- LUEPYSLOLQVVCZ-UHFFFAOYSA-N decane-1,2,9,10-tetracarboxylic acid Chemical compound OC(=O)CC(C(O)=O)CCCCCCC(C(O)=O)CC(O)=O LUEPYSLOLQVVCZ-UHFFFAOYSA-N 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Natural products C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 1
- HQZAZPULUDJUDP-UHFFFAOYSA-N dodecane-1,2,11,12-tetracarboxylic acid Chemical compound OC(=O)CC(C(O)=O)CCCCCCCCC(C(O)=O)CC(O)=O HQZAZPULUDJUDP-UHFFFAOYSA-N 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 150000002395 hexacarboxylic acids Chemical class 0.000 description 1
- MNWFXJYAOYHMED-UHFFFAOYSA-N hexane carboxylic acid Natural products CCCCCCC(O)=O MNWFXJYAOYHMED-UHFFFAOYSA-N 0.000 description 1
- FYHFEMFNYGEMRB-UHFFFAOYSA-N hexane-1,2,5,6-tetracarboxylic acid Chemical compound OC(=O)CC(C(O)=O)CCC(C(O)=O)CC(O)=O FYHFEMFNYGEMRB-UHFFFAOYSA-N 0.000 description 1
- 239000012456 homogeneous solution Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 150000002505 iron Chemical class 0.000 description 1
- MVFCKEFYUDZOCX-UHFFFAOYSA-N iron(2+);dinitrate Chemical compound [Fe+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O MVFCKEFYUDZOCX-UHFFFAOYSA-N 0.000 description 1
- PVFSDGKDKFSOTB-UHFFFAOYSA-K iron(3+);triacetate Chemical compound [Fe+3].CC([O-])=O.CC([O-])=O.CC([O-])=O PVFSDGKDKFSOTB-UHFFFAOYSA-K 0.000 description 1
- LVPMIMZXDYBCDF-UHFFFAOYSA-N isocinchomeronic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)N=C1 LVPMIMZXDYBCDF-UHFFFAOYSA-N 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 238000003760 magnetic stirring Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- NVCZKUSRWBBGAH-UHFFFAOYSA-N methyl 4-[10,15,20-tris(4-methoxycarbonylphenyl)-21,23-dihydroporphyrin-5-yl]benzoate Chemical compound COC(=O)c1ccc(cc1)-c1c2ccc(n2)c(-c2ccc(cc2)C(=O)OC)c2ccc([nH]2)c(-c2ccc(cc2)C(=O)OC)c2ccc(n2)c(-c2ccc(cc2)C(=O)OC)c2ccc1[nH]2 NVCZKUSRWBBGAH-UHFFFAOYSA-N 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- OLAPPGSPBNVTRF-UHFFFAOYSA-N naphthalene-1,4,5,8-tetracarboxylic acid Chemical compound C1=CC(C(O)=O)=C2C(C(=O)O)=CC=C(C(O)=O)C2=C1C(O)=O OLAPPGSPBNVTRF-UHFFFAOYSA-N 0.000 description 1
- ABMFBCRYHDZLRD-UHFFFAOYSA-N naphthalene-1,4-dicarboxylic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=C(C(O)=O)C2=C1 ABMFBCRYHDZLRD-UHFFFAOYSA-N 0.000 description 1
- HRRDCWDFRIJIQZ-UHFFFAOYSA-N naphthalene-1,8-dicarboxylic acid Chemical compound C1=CC(C(O)=O)=C2C(C(=O)O)=CC=CC2=C1 HRRDCWDFRIJIQZ-UHFFFAOYSA-N 0.000 description 1
- KHARCSTZAGNHOT-UHFFFAOYSA-N naphthalene-2,3-dicarboxylic acid Chemical compound C1=CC=C2C=C(C(O)=O)C(C(=O)O)=CC2=C1 KHARCSTZAGNHOT-UHFFFAOYSA-N 0.000 description 1
- RXOHFPCZGPKIRD-UHFFFAOYSA-N naphthalene-2,6-dicarboxylic acid Chemical compound C1=C(C(O)=O)C=CC2=CC(C(=O)O)=CC=C21 RXOHFPCZGPKIRD-UHFFFAOYSA-N 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 1
- WDAISVDZHKFVQP-UHFFFAOYSA-N octane-1,2,7,8-tetracarboxylic acid Chemical compound OC(=O)CC(C(O)=O)CCCCC(C(O)=O)CC(O)=O WDAISVDZHKFVQP-UHFFFAOYSA-N 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- LAHAPBJSVSVFGR-UHFFFAOYSA-N oxane-4,4-dicarboxylic acid Chemical compound OC(=O)C1(C(O)=O)CCOCC1 LAHAPBJSVSVFGR-UHFFFAOYSA-N 0.000 description 1
- UFOIOXZLTXNHQH-UHFFFAOYSA-N oxolane-2,3,4,5-tetracarboxylic acid Chemical compound OC(=O)C1OC(C(O)=O)C(C(O)=O)C1C(O)=O UFOIOXZLTXNHQH-UHFFFAOYSA-N 0.000 description 1
- WSRHMJYUEZHUCM-UHFFFAOYSA-N perylene-1,2,3,4-tetracarboxylic acid Chemical class C=12C3=CC=CC2=CC=CC=1C1=C(C(O)=O)C(C(O)=O)=C(C(O)=O)C2=C1C3=CC=C2C(=O)O WSRHMJYUEZHUCM-UHFFFAOYSA-N 0.000 description 1
- KIZSMODMWVZSNT-UHFFFAOYSA-N perylene-1,2-dicarboxylic acid Chemical compound C1=CC(C2=C(C(C(=O)O)=CC=3C2=C2C=CC=3)C(O)=O)=C3C2=CC=CC3=C1 KIZSMODMWVZSNT-UHFFFAOYSA-N 0.000 description 1
- SDPOODQJUWAHOW-UHFFFAOYSA-N perylene-3,9-dicarboxylic acid Chemical compound C=12C3=CC=CC2=C(C(O)=O)C=CC=1C1=CC=CC2=C1C3=CC=C2C(=O)O SDPOODQJUWAHOW-UHFFFAOYSA-N 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- ZLSOKZQPVJYNKB-UHFFFAOYSA-N piperazine-1,4-diium-2,3-dicarboxylate Chemical compound OC(=O)C1NCCNC1C(O)=O ZLSOKZQPVJYNKB-UHFFFAOYSA-N 0.000 description 1
- MMXZSJMASHPLLR-UHFFFAOYSA-N pyrroloquinoline quinone Chemical compound C12=C(C(O)=O)C=C(C(O)=O)N=C2C(=O)C(=O)C2=C1NC(C(=O)O)=C2 MMXZSJMASHPLLR-UHFFFAOYSA-N 0.000 description 1
- JPGZDTDZZDLVHW-UHFFFAOYSA-N quinoline-2,4-dicarboxylic acid Chemical compound C1=CC=CC2=NC(C(=O)O)=CC(C(O)=O)=C21 JPGZDTDZZDLVHW-UHFFFAOYSA-N 0.000 description 1
- SXXBQGWQCRMKHR-UHFFFAOYSA-N quinoline-3,4-dicarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CN=C21 SXXBQGWQCRMKHR-UHFFFAOYSA-N 0.000 description 1
- WCHKKUMRGPRZOG-UHFFFAOYSA-N quinoline-7,8-dicarboxylic acid Chemical compound C1=CC=NC2=C(C(O)=O)C(C(=O)O)=CC=C21 WCHKKUMRGPRZOG-UHFFFAOYSA-N 0.000 description 1
- CQZDWYYGOZOTHY-UHFFFAOYSA-N quinoxaline-2,3-dicarboxylic acid Chemical compound C1=CC=C2N=C(C(O)=O)C(C(=O)O)=NC2=C1 CQZDWYYGOZOTHY-UHFFFAOYSA-N 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 238000002390 rotary evaporation Methods 0.000 description 1
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- HQHCYKULIHKCEB-UHFFFAOYSA-N tetradecanedioic acid Chemical compound OC(=O)CCCCCCCCCCCCC(O)=O HQHCYKULIHKCEB-UHFFFAOYSA-N 0.000 description 1
- ZWWLLYJRPKYTDF-UHFFFAOYSA-N thiophene-3,4-dicarboxylic acid Chemical compound OC(=O)C1=CSC=C1C(O)=O ZWWLLYJRPKYTDF-UHFFFAOYSA-N 0.000 description 1
- 238000003828 vacuum filtration Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
- C07D487/22—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains four or more hetero rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F15/00—Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic Table
- C07F15/02—Iron compounds
- C07F15/025—Iron compounds without a metal-carbon linkage
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/003—Compounds containing elements of Groups 4 or 14 of the Periodic Table without C-Metal linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0803—Compounds with Si-C or Si-Si linkages
- C07F7/081—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te
Definitions
- the invention relates to methods of preparing metal organic frameworks, in particular to methods of preparing monocrystalline metal organic frameworks as well as metal organic frameworks obtained/obtainable from such methods.
- US 8,431,744 B2 describes a solvent-free process for preparing a magnesium-based porous metal organic framework starting from magnesium metal or magnesium oxide.
- US 8,524,932 B2 describes a process for preparing a porous metal organic framework in which the reaction is carried out in an alkaline aqueous medium. Nevertheless, there remains a need for alternative methods of preparing metal organic frameworks as well as methods that provide advantages over the prior art.
- the invention provides a method of preparing a metal organic framework comprising metal ions and carboxylate ligands
- the method comprises:
- the method of the invention is more economical, and allows recycling of the solvents employed and therefore reduces solvent waste.
- the method of the invention also provides a way of preparing metal organic frameworks in monocrystalline form.
- the method of the invention employs carboxylic acid solvents, such as acetic acid.
- the method of the invention employs one or more carboxylic acids in the absence of other organic solvents.
- Previous methods for preparing metal organic frameworks have employed organic solvents such as DMF.
- organic solvents that are not carboxylic acid solvents, such as DMF are not employed in the method of the present invention.
- the inventors have surprisingly found that in the absence of other organic solvents, the carboxylic acid solvents employed in the method of the invention can be recycled/re-used.
- carboxylic acid solvents such as acetic acid
- the use of carboxylic acid solvents, such as acetic acid provides a method delivering unexpected performance with regard to other aspects of the method, e.g. yield, purity, crystallinity.
- the method employs an organic solvent consisting of one or more carboxylic acid solvents, the organic solvent is essentially free of other organic solvents that are not carboxylic acid solvents.
- the carboxylic acid solvent may be any carboxylic acid solvent.
- the one or more carboxylic acid solvents may be selected from a substituted or unsubstituted Ci -4 carboxylic acid.
- suitable carboxylic acid solvents include, but are not limited to, acetic acid, formic acid, propionic acid, and trifluroacetic acid.
- Preferred carboxylic acids are formic acid and acetic acid. Particularly preferred is acetic acid.
- the reaction maybe carried out in the presence of water.
- the volume ratio of carboxylic acid solvent to water maybe greater than or equal to 1:5.
- the volume ratio of carboxylic acid solvent to water may range from about 99:1 to about 1:5, from about 50:1 to about 1:3, from about 20:1 to about 1:2, from about 10:1 to about 1:1, from about 5:1 to about 1:1, or from about 2:1 to about 1:1.
- the volume ratio of carboxylic acid solvent to water is about 1:1.
- the metal ions which are part of the metal organic framework are derived from the source of metal ions.
- the metal ions may comprise metal ions selected from the transition metals of the periodic table, such as selected from Fe, Al, Cr, V, Sc, Zr, Ti, Ga and In metal ions.
- the metal ions may be selected from Fe, Al, Zr, and Ti.
- the metal ions comprise Fe or Zr metal ions.
- the metal ions comprise only one metal.
- the metal ions may be Fe, Al, Zr, or Ti.
- the metal ions further comprise metal ions selected from Group 2 through Group 16 metal ions.
- the metal ions may comprise a metal cation mixture of M metal ions and X metal ions; wherein M is a transition metal ion, and X is selected from the group consisting of Group 2 through Group 16 metal ions.
- M may be selected from Fe, Al, Cr, V, Sc, Ti, Zr and In metal ions.
- X may be a metal ion selected from Al, Fe, Co, Ni, Mn, Zn, Mg, Cr, V, Sc, Ca, Ba, and In metal ions. More specifically, X may be selected from Al(III), Fe(II), Fe(III), Co(II), Ni(II), Mn(II), Zn(II), Mg(II), Cr(III), V(III), Sc(III), Ca(II), Ba(II) and In(III) metal ions, preferably X is a metal ion selected from Fe(II), Fe(III), Co(II), Ni(II), Mn(II), Zn(II), and Mg(II) metal ions.
- the metal ions comprise a metal cation mixture of formula M 2 X.
- the method provides a metal organic framework comprising Fe 3+ ions and carboxylate ligands.
- the metal organic framework may include only Fe 3+ ions or may include a metal cation mixture of Fe 3+ and X 2+ ions; wherein X is a metal ion selected from the group consisting of Group 2 through Group 16 metals.
- X may be a metal ion selected from Al(III), Fe(II,III), Co(II), Ni(II), Mn(II), Zn(II), Mg(II), Cr(III), V(III), Sc(III), Ca(II), Ba(II) or In(III), preferably X is a metal ion selected from Fe(II,III), Co(II), Ni(II), Mn(II), Zn(II), and Mg(II).
- the metal ions may comprise M 2+ metal ions, M 3+ metal ions, or M 4+ metal ions.
- the source of metal ions may be in the form of a metal salt, a metal ion coordination complex, or a hydrate thereof.
- Suitable metal salts include but are not limited to a salt selected from a halide salt (e.g. a chloride salt), a nitrate salt (e.g. N0 3 ), acetate salts, sulphate salts or hydrates of the same.
- the metal salt may be an iron salt such as an iron nitrate, an iron halide, or a hydrate thereof.
- metal salts include but are not limited to FeCl 3 , Fe(N0 3 ) 3 .9H 2 0, A1C1 3 , A1(N0 3 ) 3 , ZrCl 4 and VC1 3 .
- a preferred metal salt is Fe(N0 3 ) 3 .9H 2 0.
- Suitable metal ion coordination complexes include but are not limited to acetate complexes, and hydrates of the same.
- suitable metal ion coordination complexes include but are not limited to Fe 3 0(CH 3 COO)6 and Fe 2 CoO(CH 3 COO)6.
- metal ion coordination complexes include but are not limited to iron (III) acetate, i.e. [Fe 3 0(OAc)6(H 2 0) 3 ]OAc, and FeM 2 0(CH 3 COO) 6 , wherein each M is independently selected from Fe, Al, Cr, V, Sc, and In.
- the carboxylate ligands of the metal organic framework are derived from the carboxylic acid precursor (or salt thereof) employed in the method of the invention.
- the term "derived" means that the carboxylic acid compounds are present in partly deprotonated or fully deprotonated form.
- the carboxylic acid may be any carboxylic acid.
- the carboxylic acid may be any di-, tri-, tetra-, hexa-, or octa-carboxylic acid.
- the carboxylic acids may be substituted or unsubstituted.
- the carboxylic acids may be substituted by one or more substituents independently selected from -OH, -NH 2 , -OCH 3 , -NH(CH 3 ), -N(CH 3 ) 2 , - CN and halides (e.g. -CI, -F, -I).
- substituents independently selected from -OH, -NH 2 , -OCH 3 , -NH(CH 3 ), -N(CH 3 ) 2 , - CN and halides (e.g. -CI, -F, -I).
- halides e.g. -CI, -F, -I
- the carboxylic acid precursor is 3,5-dicarboxyl-(3,5- dicarboxylazophenyl)benzene (ABTC), ([5,io,i5,20-Tetrakis(4- methoxycarbonylphenyl)porphyrinato]-Co(II)), i.e. Co-TCPP, SiTD, or BTC.
- ABTC 3,5-dicarboxyl-(3,5- dicarboxylazophenyl)benzene
- ABTC 3,5-dicarboxyl-(3,5- dicarboxylazophenyl)benzene
- ABTC 3,5-dicarboxyl-(3,5- dicarboxylazophenyl)benzene
- ABTC 3,5-dicarboxyl-(3,5- dicarboxylazophenyl)benzene
- II 3,5-dicarboxyl-(3,5- dicarboxylazophenyl)benzene
- Co-TCPP 3,5-dica
- the reaction is carried out at an elevated temperature.
- the reaction is carried out under reflux conditions.
- the reaction may be carried out at a temperature of about 120°C or greater, preferably at a temperature of about 150°C or greater.
- the reaction may be carried out at about atmospheric pressure (101.325 kPa;
- the reaction is preferably carried out at a pressure of less than or equal to about 400 kPa (about 4 bar), more preferably less than or equal to about 200 kPa (about 2 bar).
- the reaction may be carried out at atmospheric pressure. In this case, however, slightly over pressures or under pressures may be employed due to the apparatus. Therefore, in the context of the present invention, the term "atmospheric pressure" is to be taken to mean a pressure range which results from the actual atmospheric pressure ⁇ 15 kPa (150 mbar).
- frameworks comprising metal ions and carboxylate ligands in monocrystalline or polycrystalline forms. Particularly useful is the fact that the method of the present invention provides a new way of preparing such metal organic frameworks in monocrystalline form.
- the method of the invention may be employed to prepare monocrystalline metal organic frameworks comprising metal ions and carboxylate ligands.
- a monocrystalline metal organic framework prepared by a method of the invention may have a crystal size of greater than about 0.05mm, 0.1mm, 0.2mm, 0.3mm, 0.4mm, 0.5mm, 0.6mm, 0.7mm, 0.8mm, or 0.9mm.
- the crystal size may range from about 0.1mm to about 5mm, preferably from about 0.3mm to about 4mm, more preferably from about 0.5mm to about 2mm, more preferably from about imm to about 3mm.
- the present invention provides a monocrystalline metal organic framework obtained/obtainable by the method of the present invention.
- the metal-organic frameworks according to the invention have a wide range of applications.
- the invention provides a method comprising uptaking at least one substance by a metal-organic framework of the present invention.
- the substance may be hydrogen, methane, carbon dioxide, oxygen or nitrogen.
- the invention provides a method of storing a gas in a metal- organic framework according to the present invention.
- the invention provides the use of a metal-organic framework according to any embodiment of the present invention for storing a gas. This may be achieved by binding the gas in a plurality of linker channel sites present in the metal-organic framework, for example using van der Waals forces.
- the use/method of storing gases in this way may optimise gas storage density and volumetric gas storage.
- the gas may be hydrogen, methane, carbon dioxide, oxygen or nitrogen.
- the metal-organic framework may be configured to store methane or hydrogen, for example for fuelling vehicles.
- the present invention provides the use of any metal-organic framework according to the invention for adsorbing a guest molecule, for example a gas molecule such as hydrogen, methane, carbon dioxide, oxygen or nitrogen.
- a method of adsorbing a guest molecule for example a gas molecule such as hydrogen, methane, carbon dioxide, oxygen or nitrogen, comprising contacting a metal-organic framework of the invention with a guest molecule source.
- the invention also provides a metal-organic framework according to any embodiment of the present invention, further comprising one or more than one type of guest molecule.
- the guest molecule may be a gas molecule such as hydrogen, methane, carbon dioxide, oxygen or nitrogen.
- the substance, gas molecule, or gas maybe selected from: (a) H 2 , N 2 , Ar, 0 2 , C0 2 , NO, N0 2 or CO; or
- alkane may be selected from CH 4 , C 2 H 6 , C 3 Hs, C 4 H 10 , C 5 H 12 or ⁇ 14 ; or a cycloalkane (C3-6) selected from the group consisting of C 3 H6, C 4 H8, C 5 H 10 and ⁇ 14 ;
- alkene may be C 2 H 4 , C 3 H6, C 4 Hs, C 5 H 10 or 0 ⁇ 12 ; wherein the alkyne may be C 2 H 2 ;
- the alcohol may be methanol, ethanol, n-propanol, isopropanol, n-butanol or isobutanol; or
- arene may be a substituted arene (C6-8) such as is nitrobenzene, 1,2-dinitrobenzene, 1,3-dinitrobenzene, 1,4-dinitrobenzene,
- Figure 1 illustrates the differences between amorphous, polycrystalline, and
- Figure 2 shows an optical microscope image of PCN-250-Fe.
- Figure 3 shows the N 2 adsorption isotherms of PCN-250-Fe.
- Figure 4 shows the powder x-ray diffraction pattern (PXRD) of PCN-250-Fe.
- FIG. 5 shows the thermogravimetric (TG) analysis for PCN-250-Fe.
- Figure 6 shows an optical microscope image of PCN-224-Zr.
- Figure 7 shows the N 2 adsorption isotherms of PCN-224-Zr.
- Figure 8 shows the powder x-ray diffraction pattern (PXRD) of PCN-224-Zr.
- Figure 9 shows the thermogravimetric (TG) analysis for PCN-224-Zr.
- Figure 10 shows the powder x-ray diffraction pattern (PXRD) of PCN-651-Fe.
- Figure 11 shows the powder x-ray diffraction pattern (PXRD) of PCN-652-Fe.
- a monocrystalline MOF (or a single crystal MOF) consists of a MOF in which the crystal lattice of the entire solid is continuous, unbroken (with no grain boundaries) to its edges.
- Monocrystalline is opposed to amorphous material, in which the atomic order is limited to short range order only.
- Polycrystalline materials lie between these two extremes; they are made up of small crystals.
- a polycrystalline solid or polycrystal is comprised of many individual grains or crystallites. There is no relationship between the grains. Therefore, on a large enough length scale, there is no periodicity across a polycrystalline sample. They are different from monocrystalline materials. Large single crystals are very rare in nature and can be difficult to produce in the laboratory. It is desired that metal organic framework materials should be free from objectionable or incompatible impurities which detrimentally affect the crystal structure or the physical properties of the crystal. The material should be finely divided and uniform in size. Due to the absence of the defects associated with grain boundaries,
- monocrystalline metal organic frameworks have high surface areas and provide control over the crystallization process.
- the differences between amorphous, polycrystalline and (mono)crystalline are illustrated in Figure l.
- the monocrystalline metal organic frameworks comprise a low occurrence of twinning.
- the monocrystalline metal organic frameworks may comprise less than about 5% twinning crystals.
- the monocrystalline metal organic frameworks comprise no twinning crystals.
- a carboxylic acid precursor is employed in the method of the present invention.
- This carboxylic acid forms the carboxylate ligands.
- the carboxylic acid may be any suitable carboxylic acid including but not limited to carboxylic acids having two or more carboxylic acid groups.
- the carboxylic acid maybe a dicarboxylic acid, a tricarboxylic acid, a tetracarboxylic acid, a hexacarboxylic acid, or an octacarboxylic acid.
- the carboxylic acids may be substituted or unsubstituted.
- the carboxylic acids maybe substituted by one or more substituents independently selected from - OH, -NH 2 , -OCH 3 , -NH(CH 3 ), -N(CH 3 ) 2 , -CN and halides (e.g. -CI, -F, -I).
- the carboxylate ligands may be derived from any such carboxylic acids.
- the carboxylic acid may be a dicarboxylic acid, such as, for instance, oxalic acid, succinic acid, tartaric acid, 1,4-butanedicarboxylic acid, 1,4-butenedicarboxylic acid, 4-oxopyran-2,6-dicarboxylic acid, 1,6-hexanedicarboxylic acid,
- dicarboxylic acid such as, for instance, oxalic acid, succinic acid, tartaric acid, 1,4-butanedicarboxylic acid, 1,4-butenedicarboxylic acid, 4-oxopyran-2,6-dicarboxylic acid, 1,6-hexanedicarboxylic acid,
- decanedicarboxylic acid 1,8-heptadecanedicarboxylic acid, 1,9- heptadecanedicarboxylic acid, heptadecanedicarboxylic acid, acetylenedicarboxylic acid, 1,2-benzene-dicarboxylic acid, 1,3-benzenedicarboxylic acid, 2,3- pyridinedicarboxylic acid, pyridine-2,3-dicarboxylic acid, i,3-butadiene-i,4- dicarboxylic acid, 1,4-benzene-dicarboxylic acid, p-benzenedicarboxylic acid, imidazole-2,4-dicarboxylic acid, 2-methylquinoline-3,4-dicarboxylic acid, quinoline- 2,4-dicarboxylic acid, quinoxaline-2,3-dicarboxylic acid, 6-chloroquinoxaline-2,3- dicarboxylic acid, 4,4'-diaminoph
- octanedicarboxylic acid pentane-3,3-dicarboxylic acid, 4,4'-diamino-i,i'-diphenyl-3,3'- dicarboxylic acid, 4,4'-diaminodiphenyl-3,3'-dicarboxylic acid, benzidine-3,3'- dicarboxylic acid, i,4-bis(phenylamino)benzene-2,5-dicarboxylic acid, 1,1'- binaphthyidicarboxylic acid, 7-chloro-8-methylquinoline-2,3-dicarboxylic acid, 1 - anilinoanthraquinone-2,4'-dicarboxylic acid, poly-tetrahydrofuran-250-dicarboxylic acid, i,4-bis(carboxymethyl)piperazine-2,3-dicarboxylic acid, 7-chloroquinoline-3,8- dicarboxylic acid,
- the carboxylic acid may be a tricarboxylic acid, such as for instance 2- hydroxy-i,2,3-propanetricarboxylic acid, 7-chloro-2,3,8-quinolinetricarboxylic acid, 1,2,3-, 1,2,4-benzenetricarboxylic acid, 1,2,4-butanetricarboxylic acid, 2-phosphono- 1,2,4-butanetricarboxylic acid, 1,3,5-benzenetricarboxylic acid, l-hydroxy- 1,2,3- propanetricarboxylic acid, 4,5-dihydro-4,5-dioxo-iH-pyrrolo[2,3-F]quinoline-2,7,9- tricarboxylic acid, 5-acetyl-3-amino-6-methyl-benzene-i,2,4-tri carboxylic acid, 3- amino-5-benzoyl-6-methylbenzene-i ,2,4-tricarboxylic acid, 1,2,3-propanetricar
- the carboxylic acid may be a tetracarboxylic acid, such as, for instance, i,i-dioxidoperylo[i,i2-BCD]thiophene-3,4,9,io-tetracarboxylic acid, perylene- tetracarboxylic acids such as perylene-3,4,9,io-tetracarboxylic acid or perylene-1,12- sulfone-3,4,9,io-tetracarboxylic acid, butanetetracarboxylic acids such as 1,2,3,4- butanetetracarboxylic acid or meso-i,2,3,4-butanetetracarboxylic acid, decane-2,4,6,8- tetracarboxylic acid, i,4,7,io,i3,i6-hexaoxacyclooctadecane-2,3,n,i2-tetracarboxylic acid, 1,2,4,5-benzenetetrac acid,
- benzophenonetetracarboxylic acid 3,3',4,4'-benzophenonetetracarboxylic acid, tetrahydrofurantetracarboxylic acid or cyclopentanetetracarboxylic acids such as cyclopentane-i,2,3,4-tetracarboxylic acid.
- the ligands may also be derived from a carboxylic acid selected from compounds of formula Li to L30 and combinations thereof:
- ligands include ligands derived from L31 and L32:
- the ligand may be derived from a carboxylic acid selected from the following compounds or combinations thereof:
- the carboxylate ligands maybe selected from but not limited t ⁇ tri-, and tetra-carboxylate ligands.
- the carboxylate ligands may b ⁇ derived from 2 ',3",5",6'-tetramethyl-[i,i':4',i":4",i'"-quaterphenyl] 3,3'",5,5"' - - ⁇ 5 - tetracarboxylic acid, 1,3,5-benzenetribenzoic acid, or 4,4',4"-s-triazine-2,4,6- triyltribenzoic acid.
- 1,3,5-benzenetribenzoic acid has the chemical structure:
- the carboxylic acid is L22 (also referred to as ABTC): 3,5- dicarboxyl-(3,5-dicarboxylazophenyl)benzene:
- a 100 ml round-bottomed flask was fitted with a Claisen adapter on which a condenser was attached.
- the flask was charged with 0.88 g (127 mmol) of Li, 20 ml of anhydrous diethyl ether and a magnetic stirring bar.
- the system was flushed with N2 and 10.34 m l (60.3 mmol) of 4-bromotoluene in 30 ml of anhydrous diethyl ether was added slowly with rapid stirring. An immediate exothermic reaction caused the ether to start boiling.
- the mixture was stirred for 30 min and 1.14 ml (10 mmol) of silicon tetrachloride was added dropwise.
- BTC 1,3,5-benzenetricarboxylic acid
- Figure 2 shows an optical microscope image of PCN-250-Fe.
- Figure 3 shows the N 2 adsorption isotherms of PCN-250-Fe.
- Figure 4 shows the powder x-ray diffraction pattern (PXRD) of PCN-250-Fe.
- FIG. 5 shows the thermogravimetric (TG) analysis for PCN-250-Fe.
- Figure 6 shows an optical microscope image of PCN-224-Zr.
- Figure 7 shows the N 2 adsorption isotherms of PCN-224-Zr.
- Figure 8 shows the powder x-ray diffraction pattern (PXRD) of PCN-224-Zr.
- Figure 9 shows the thermogravimetric (TG) analysis for PCN-224-Zr.
- Figure 10 shows the powder x-ray diffraction pattern (PXRD) of PCN-651-Fe.
- PXRD powder x-ray diffraction pattern
- Figure 11 shows the powder x-ray diffraction pattern (PXRD) of PCN-652-Fe.
- the use of a carboxylic acid solvent surprisingly provides a metal organic framework in comparable yield to the method described in the reference example.
- the solvents employed in the methods of the invention can also be recycled and reused in a subsequent method of preparing a metal organic framework.
- the solvents employed in the method of the reference example cannot be recycled and reused. This represents a significant advantage of the present invention compared to the methods that have been described earlier. Without wishing to be bound by theory, the applicants believe that organic solvents such as DMF undergo decomposition and hence cannot be recycled but carboxylic acid solvents are not being decomposed and therefore can be recycled and reused.
- the method of the invention provides metal organic frameworks exhibiting a high degree of crystallinity.
- the methods of the invention provide monocrystalline metal organic frameworks comprising metal ions and carboxylate ligands.
- the carboxylic acid acts as a modulator and competing controlling reagent, which helps grow single crystal products.
- the presence of the carboxylic acid e.g. acetic acid
- the carboxylic acid slows down the reaction of the carboxylic acid ligand precursor with the source of metal ions (e.g a metal salt or a metal ion coordination complex). This reduction in the reaction rate allows crystals to grow slower and larger.
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Abstract
La présente invention concerne un procédé de préparation d'une structure métallo-organique comprenant des ions métalliques et des ligands carboxylates. Le procédé consiste à : faire réagir (i) une source d'ions métalliques, avec (ii) un précurseur acide carboxylique des ligands carboxylates, dans un solvant organique constitué d'un ou de plusieurs solvants de type acide carboxylique, à une température d'environ 75 °C ou plus, éventuellement en présence d'eau. La présente invention concerne également le même procédé pour la préparation de structures monocristallines métallo-organiques ainsi que les structures métallo-organiques obtenues à partir de tels procédés.
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CN105999280A (zh) * | 2016-05-16 | 2016-10-12 | 浙江大学 | 装载有阴离子型药物的纳米级锆基阳离子金属有机框架材料的制备方法 |
CN109400890A (zh) * | 2017-08-18 | 2019-03-01 | 中国石化扬子石油化工有限公司 | 一种多级孔金属有机骨架材料的制备方法 |
WO2019157013A1 (fr) * | 2018-02-07 | 2019-08-15 | Rutgers, The State University Of New Jersey | Compositions et procédés pour la séparation sélective d'isomères d'hydrocarbures |
GB2573886A (en) * | 2018-04-25 | 2019-11-20 | Vapor Point Llc | Process of preparing metal-organic framework material |
CN110575818A (zh) * | 2019-08-06 | 2019-12-17 | 杭州电子科技大学 | 快速高效选择性吸附痕量污染物的羧基修饰的离子型金属有机框架材料及其制备方法和应用 |
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CN105999280A (zh) * | 2016-05-16 | 2016-10-12 | 浙江大学 | 装载有阴离子型药物的纳米级锆基阳离子金属有机框架材料的制备方法 |
CN109400890A (zh) * | 2017-08-18 | 2019-03-01 | 中国石化扬子石油化工有限公司 | 一种多级孔金属有机骨架材料的制备方法 |
WO2019157013A1 (fr) * | 2018-02-07 | 2019-08-15 | Rutgers, The State University Of New Jersey | Compositions et procédés pour la séparation sélective d'isomères d'hydrocarbures |
GB2573886A (en) * | 2018-04-25 | 2019-11-20 | Vapor Point Llc | Process of preparing metal-organic framework material |
CN112839733A (zh) * | 2018-07-26 | 2021-05-25 | 研究三角协会 | 涉及在微孔催化剂内的毛细凝结的反应工艺 |
WO2020060873A3 (fr) * | 2018-09-14 | 2020-04-23 | Rutgers, The State University Of New Jersey | Compositions de mof pour la séparation sélective d'hydrocarbures |
US11918951B2 (en) | 2018-09-14 | 2024-03-05 | Rutgers, The State University Of New Jersey | MOF compositions for selective separation of hydrocarbons |
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CN110743503B (zh) * | 2019-10-25 | 2023-04-18 | 哈尔滨工程大学 | Pcn金属有机骨架与氧化石墨烯复合吸附材料及制备方法 |
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