WO2015174791A1 - Novel compound and organic light-emitting element comprising same - Google Patents
Novel compound and organic light-emitting element comprising same Download PDFInfo
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- WO2015174791A1 WO2015174791A1 PCT/KR2015/004916 KR2015004916W WO2015174791A1 WO 2015174791 A1 WO2015174791 A1 WO 2015174791A1 KR 2015004916 W KR2015004916 W KR 2015004916W WO 2015174791 A1 WO2015174791 A1 WO 2015174791A1
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- 150000001875 compounds Chemical class 0.000 title claims abstract description 51
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- 239000007924 injection Substances 0.000 claims abstract description 49
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- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 claims description 33
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- 229910052736 halogen Inorganic materials 0.000 claims description 30
- 150000002367 halogens Chemical class 0.000 claims description 30
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 30
- 238000000034 method Methods 0.000 claims description 23
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- 239000012044 organic layer Substances 0.000 claims description 12
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- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 10
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- 125000000923 (C1-C30) alkyl group Chemical group 0.000 claims description 5
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- UCCUXODGPMAHRL-UHFFFAOYSA-N 1-bromo-4-iodobenzene Chemical compound BrC1=CC=C(I)C=C1 UCCUXODGPMAHRL-UHFFFAOYSA-N 0.000 description 1
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- YMRHXVOHLPIMNN-UHFFFAOYSA-N 1-n-(3-methylphenyl)-2-n,2-n-diphenylbenzene-1,2-diamine Chemical compound CC1=CC=CC(NC=2C(=CC=CC=2)N(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 YMRHXVOHLPIMNN-UHFFFAOYSA-N 0.000 description 1
- PTTHBZMGHRDZCV-UHFFFAOYSA-N 1h-indol-3-ylboronic acid Chemical compound C1=CC=C2C(B(O)O)=CNC2=C1 PTTHBZMGHRDZCV-UHFFFAOYSA-N 0.000 description 1
- RKVIAZWOECXCCM-UHFFFAOYSA-N 2-carbazol-9-yl-n,n-diphenylaniline Chemical compound C1=CC=CC=C1N(C=1C(=CC=CC=1)N1C2=CC=CC=C2C2=CC=CC=C21)C1=CC=CC=C1 RKVIAZWOECXCCM-UHFFFAOYSA-N 0.000 description 1
- NSMJMUQZRGZMQC-UHFFFAOYSA-N 2-naphthalen-1-yl-1H-imidazo[4,5-f][1,10]phenanthroline Chemical compound C12=CC=CN=C2C2=NC=CC=C2C2=C1NC(C=1C3=CC=CC=C3C=CC=1)=N2 NSMJMUQZRGZMQC-UHFFFAOYSA-N 0.000 description 1
- BAWBDJOGCJAZML-UHFFFAOYSA-N 3-N-[4-(aminomethyl)-6-(trifluoromethyl)pyridin-2-yl]-1-N-phenylbenzene-1,3-dicarboxamide Chemical compound NCC1=CC(=NC(=C1)C(F)(F)F)NC(C1=CC(C(=O)NC2=CC=CC=C2)=CC=C1)=O BAWBDJOGCJAZML-UHFFFAOYSA-N 0.000 description 1
- WDBQJSCPCGTAFG-QHCPKHFHSA-N 4,4-difluoro-N-[(1S)-3-[4-(3-methyl-5-propan-2-yl-1,2,4-triazol-4-yl)piperidin-1-yl]-1-pyridin-3-ylpropyl]cyclohexane-1-carboxamide Chemical compound FC1(CCC(CC1)C(=O)N[C@@H](CCN1CCC(CC1)N1C(=NN=C1C)C(C)C)C=1C=NC=CC=1)F WDBQJSCPCGTAFG-QHCPKHFHSA-N 0.000 description 1
- BWGRDBSNKQABCB-UHFFFAOYSA-N 4,4-difluoro-N-[3-[3-(3-methyl-5-propan-2-yl-1,2,4-triazol-4-yl)-8-azabicyclo[3.2.1]octan-8-yl]-1-thiophen-2-ylpropyl]cyclohexane-1-carboxamide Chemical compound CC(C)C1=NN=C(C)N1C1CC2CCC(C1)N2CCC(NC(=O)C1CCC(F)(F)CC1)C1=CC=CS1 BWGRDBSNKQABCB-UHFFFAOYSA-N 0.000 description 1
- YOZHUJDVYMRYDM-UHFFFAOYSA-N 4-(4-anilinophenyl)-3-naphthalen-1-yl-n-phenylaniline Chemical compound C=1C=C(C=2C(=CC(NC=3C=CC=CC=3)=CC=2)C=2C3=CC=CC=C3C=CC=2)C=CC=1NC1=CC=CC=C1 YOZHUJDVYMRYDM-UHFFFAOYSA-N 0.000 description 1
- RWHRJJMRDNZTHU-UHFFFAOYSA-N 4-N-naphthalen-1-yl-4-N-[4-[4-[1-(naphthalen-1-ylamino)-4-(N-phenylanilino)cyclohexa-2,4-dien-1-yl]phenyl]phenyl]-1-N,1-N-diphenylbenzene-1,4-diamine Chemical compound C1(=CC=C(C=C1)C1(CC=C(C=C1)N(C1=CC=CC=C1)C1=CC=CC=C1)NC1=CC=CC2=CC=CC=C12)C1=CC=C(C=C1)N(C1=CC=C(C=C1)N(C1=CC=CC=C1)C1=CC=CC=C1)C1=CC=CC2=CC=CC=C12 RWHRJJMRDNZTHU-UHFFFAOYSA-N 0.000 description 1
- MBPCKEZNJVJYTC-UHFFFAOYSA-N 4-[4-(n-phenylanilino)phenyl]aniline Chemical compound C1=CC(N)=CC=C1C1=CC=C(N(C=2C=CC=CC=2)C=2C=CC=CC=2)C=C1 MBPCKEZNJVJYTC-UHFFFAOYSA-N 0.000 description 1
- AWXGSYPUMWKTBR-UHFFFAOYSA-N 4-carbazol-9-yl-n,n-bis(4-carbazol-9-ylphenyl)aniline Chemical compound C12=CC=CC=C2C2=CC=CC=C2N1C1=CC=C(N(C=2C=CC(=CC=2)N2C3=CC=CC=C3C3=CC=CC=C32)C=2C=CC(=CC=2)N2C3=CC=CC=C3C3=CC=CC=C32)C=C1 AWXGSYPUMWKTBR-UHFFFAOYSA-N 0.000 description 1
- CNPURSDMOWDNOQ-UHFFFAOYSA-N 4-methoxy-7h-pyrrolo[2,3-d]pyrimidin-2-amine Chemical compound COC1=NC(N)=NC2=C1C=CN2 CNPURSDMOWDNOQ-UHFFFAOYSA-N 0.000 description 1
- DIVZFUBWFAOMCW-UHFFFAOYSA-N 4-n-(3-methylphenyl)-1-n,1-n-bis[4-(n-(3-methylphenyl)anilino)phenyl]-4-n-phenylbenzene-1,4-diamine Chemical compound CC1=CC=CC(N(C=2C=CC=CC=2)C=2C=CC(=CC=2)N(C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C=C(C)C=CC=2)C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C=C(C)C=CC=2)=C1 DIVZFUBWFAOMCW-UHFFFAOYSA-N 0.000 description 1
- RTOYKOQOXPAKPD-UHFFFAOYSA-N 5-chloro-1-phenylindole Chemical compound C1=CC2=CC(Cl)=CC=C2N1C1=CC=CC=C1 RTOYKOQOXPAKPD-UHFFFAOYSA-N 0.000 description 1
- XHJVLQGSRABRCN-UHFFFAOYSA-N 7-bromo-9,9-dimethyl-1-(4-phenylphenyl)fluorene Chemical compound C1(=CC=C(C=C1)C1=CC=CC=2C3=CC=C(C=C3C(C1=2)(C)C)Br)C1=CC=CC=C1 XHJVLQGSRABRCN-UHFFFAOYSA-N 0.000 description 1
- VIJYEGDOKCKUOL-UHFFFAOYSA-N 9-phenylcarbazole Chemical compound C1=CC=CC=C1N1C2=CC=CC=C2C2=CC=CC=C21 VIJYEGDOKCKUOL-UHFFFAOYSA-N 0.000 description 1
- 229910001148 Al-Li alloy Inorganic materials 0.000 description 1
- HIUKJPDHVDUPSM-UHFFFAOYSA-N C(c1ccccc1)C1=CCCC=C1 Chemical compound C(c1ccccc1)C1=CCCC=C1 HIUKJPDHVDUPSM-UHFFFAOYSA-N 0.000 description 1
- VITBBWFPVYFLFL-UHFFFAOYSA-N CCc(cc1)ccc1C1=CCCC=C1 Chemical compound CCc(cc1)ccc1C1=CCCC=C1 VITBBWFPVYFLFL-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 241000284156 Clerodendrum quadriloculare Species 0.000 description 1
- 101000837344 Homo sapiens T-cell leukemia translocation-altered gene protein Proteins 0.000 description 1
- 229910018068 Li 2 O Inorganic materials 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- AWFDUOVDQHJMKG-UHFFFAOYSA-N N-(3-methylphenyl)-2-phenoxyaniline Chemical compound CC=1C=C(C=CC=1)NC1=C(C=CC=C1)OC1=CC=CC=C1 AWFDUOVDQHJMKG-UHFFFAOYSA-N 0.000 description 1
- NUGPIZCTELGDOS-QHCPKHFHSA-N N-[(1S)-3-[4-(3-methyl-5-propan-2-yl-1,2,4-triazol-4-yl)piperidin-1-yl]-1-pyridin-3-ylpropyl]cyclopentanecarboxamide Chemical compound C(C)(C)C1=NN=C(N1C1CCN(CC1)CC[C@@H](C=1C=NC=CC=1)NC(=O)C1CCCC1)C NUGPIZCTELGDOS-QHCPKHFHSA-N 0.000 description 1
- LFZAGIJXANFPFN-UHFFFAOYSA-N N-[3-[4-(3-methyl-5-propan-2-yl-1,2,4-triazol-4-yl)piperidin-1-yl]-1-thiophen-2-ylpropyl]acetamide Chemical compound C(C)(C)C1=NN=C(N1C1CCN(CC1)CCC(C=1SC=CC=1)NC(C)=O)C LFZAGIJXANFPFN-UHFFFAOYSA-N 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 102100028692 T-cell leukemia translocation-altered gene protein Human genes 0.000 description 1
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 1
- JHYLKGDXMUDNEO-UHFFFAOYSA-N [Mg].[In] Chemical compound [Mg].[In] JHYLKGDXMUDNEO-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229940027991 antiseptic and disinfectant quinoline derivative Drugs 0.000 description 1
- 125000005264 aryl amine group Chemical group 0.000 description 1
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Inorganic materials [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 1
- 125000000319 biphenyl-4-yl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C1=C([H])C([H])=C([*])C([H])=C1[H] 0.000 description 1
- IPWKHHSGDUIRAH-UHFFFAOYSA-N bis(pinacolato)diboron Chemical compound O1C(C)(C)C(C)(C)OB1B1OC(C)(C)C(C)(C)O1 IPWKHHSGDUIRAH-UHFFFAOYSA-N 0.000 description 1
- XJHCXCQVJFPJIK-UHFFFAOYSA-M caesium fluoride Inorganic materials [F-].[Cs+] XJHCXCQVJFPJIK-UHFFFAOYSA-M 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 150000001716 carbazoles Chemical class 0.000 description 1
- 125000000609 carbazolyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 description 1
- 229940125773 compound 10 Drugs 0.000 description 1
- 229940125782 compound 2 Drugs 0.000 description 1
- 229940125898 compound 5 Drugs 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- RBTKNAXYKSUFRK-UHFFFAOYSA-N heliogen blue Chemical compound [Cu].[N-]1C2=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=NC([N-]1)=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=N2 RBTKNAXYKSUFRK-UHFFFAOYSA-N 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- ZLVXBBHTMQJRSX-VMGNSXQWSA-N jdtic Chemical compound C1([C@]2(C)CCN(C[C@@H]2C)C[C@H](C(C)C)NC(=O)[C@@H]2NCC3=CC(O)=CC=C3C2)=CC=CC(O)=C1 ZLVXBBHTMQJRSX-VMGNSXQWSA-N 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Inorganic materials [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 1
- 125000000040 m-tolyl group Chemical group [H]C1=C([H])C(*)=C([H])C(=C1[H])C([H])([H])[H] 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- SJCKRGFTWFGHGZ-UHFFFAOYSA-N magnesium silver Chemical compound [Mg].[Ag] SJCKRGFTWFGHGZ-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- CJRHLSZJEFJDLA-UHFFFAOYSA-N methyl 5-bromo-2-iodobenzoate Chemical compound COC(=O)C1=CC(Br)=CC=C1I CJRHLSZJEFJDLA-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 150000004866 oxadiazoles Chemical class 0.000 description 1
- 150000005041 phenanthrolines Chemical class 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- SIOXPEMLGUPBBT-UHFFFAOYSA-M picolinate Chemical compound [O-]C(=O)C1=CC=CC=N1 SIOXPEMLGUPBBT-UHFFFAOYSA-M 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 1
- SCVFZCLFOSHCOH-UHFFFAOYSA-M potassium acetate Chemical compound [K+].CC([O-])=O SCVFZCLFOSHCOH-UHFFFAOYSA-M 0.000 description 1
- 150000003248 quinolines Chemical class 0.000 description 1
- 230000027756 respiratory electron transport chain Effects 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/56—Ring systems containing three or more rings
- C07D209/58—[b]- or [c]-condensed
- C07D209/70—[b]- or [c]-condensed containing carbocyclic rings other than six-membered
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/56—Ring systems containing three or more rings
- C07D209/80—[b, c]- or [b, d]-condensed
- C07D209/82—Carbazoles; Hydrogenated carbazoles
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/56—Ring systems containing three or more rings
- C07D209/80—[b, c]- or [b, d]-condensed
- C07D209/94—[b, c]- or [b, d]-condensed containing carbocyclic rings other than six-membered
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/06—Luminescent, e.g. electroluminescent, chemiluminescent materials containing organic luminescent materials
Definitions
- the present invention relates to a novel compound and an organic light emitting device including the same, and more particularly to a compound useful as a hole injection material, a hole transport material, or a hole transport auxiliary material.
- an organic light emitting device capable of low voltage driving with a self-luminous type has a superior viewing angle, contrast ratio, and the like, and is lighter and thinner than a liquid crystal display (LCD), which is the mainstream of flat panel display devices.
- LCD liquid crystal display
- the material used as the organic material layer in the organic light emitting device may be largely classified into light emitting materials, hole injection materials, hole transport materials, hole transport auxiliary materials, electron transport materials, electron injection materials and the like according to functions.
- the present invention has a HOMO energy level easy hole injection, has a high LUMO energy level that can block electrons, excellent hole transport characteristics, hole injection layer of the organic light emitting device, It is an object of the present invention to provide a novel compound capable of having excellent low voltage, high efficiency, high Tg stability and long life when applied to a hole transport layer or a hole transport auxiliary layer.
- L each independently , , Hydrogen, deuterium, halogen, amino group, nitrile group, nitro group or C 1-30 alkyl group,
- Ar each independently represents a C 6-50 aryl group which is optionally substituted with deuterium, halogen, amino group, nitrile group, nitro group; Or a C 2-50 heteroaryl group unsubstituted or substituted with deuterium, a halogen, an amino group, a nitrile group, a nitro group,
- R 1 and R 2 are each independently hydrogen; heavy hydrogen; C 1-30 alkyl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; C 2-30 alkenyl groups unsubstituted or substituted with deuterium, halogen, amino, nitrile, and nitro groups; C 2-30 alkynyl group which is unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; A C 1-30 alkoxy group unsubstituted or substituted with deuterium, halogen, amino, nitrile or nitro group; C 6-30 aryloxy group which is unsubstituted or substituted with deuterium, halogen, amino, nitrile or nitro group; C 6-50 aryl group which is optionally substituted with deuterium, halogen, amino group, nitrile group, nitro group; Or a C 2-50 heteroaryl group unsub
- l, m, n are each independently an integer of 0 to 3, at least one of l, m, n is not 0, preferably at least one of m, n is not 0,
- o, p, q are each independently an integer of 0-4.
- the present invention provides an organic light emitting device comprising the compound represented by the formula (1).
- the compound of the present invention has a HOMO energy level that is easy to inject holes, has a high LUMO energy level that can block electrons, excellent hole transport characteristics, hole injection layer, hole transport layer or hole transport auxiliary layer of the organic light emitting device It can have stability and long life due to excellent low voltage, high efficiency and high Tg.
- FIG. 1 schematically illustrates a cross section of an OLED according to an embodiment of the invention.
- the compound of the present invention is characterized by represented by the following formula (1).
- L each independently , , Hydrogen, deuterium, halogen, amino group, nitrile group, nitro group or C 1-30 alkyl group,
- Ar each independently represents a C 6-50 aryl group which is optionally substituted with deuterium, halogen, amino group, nitrile group, nitro group; Or a C 2-50 heteroaryl group unsubstituted or substituted with deuterium, a halogen, an amino group, a nitrile group, a nitro group,
- R 1 and R 2 are each independently hydrogen; heavy hydrogen; C 1-30 alkyl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; C 2-30 alkenyl groups unsubstituted or substituted with deuterium, halogen, amino, nitrile, and nitro groups; C 2-30 alkynyl group which is unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; A C 1-30 alkoxy group unsubstituted or substituted with deuterium, halogen, amino, nitrile or nitro group; C 6-30 aryloxy group which is unsubstituted or substituted with deuterium, halogen, amino, nitrile or nitro group; C 6-50 aryl group which is optionally substituted with deuterium, halogen, amino group, nitrile group, nitro group; Or a C 2-50 heteroaryl group unsub
- l, m, n are each independently an integer of 0 to 3, at least one of l, m, n is not 0, preferably at least one of m, n is not 0,
- o, p, q are each independently an integer of 0-4.
- the compound represented by Chemical Formula 1 may be one of the compounds represented by the following Chemical Formulas 1-1 to 1-3.
- Ar, R 1 , R 2 , o, p and q in the above formula are as defined in formula (1).
- o is an integer of 1 to 3.
- Compound of Formula 1 according to the present invention has a HOMO energy level easy hole injection, has a high LUMO energy level that can block electrons, excellent hole transport characteristics, hole injection layer, hole transport layer, Alternatively, when applied to the hole transport auxiliary layer, it can have stability and long life due to excellent low voltage, high efficiency, and high Tg.
- the compound of the present invention can be prepared through the following process.
- the target compound in Scheme 1 is a compound represented by Formula 1, Ar, L, l, R 1 , R 2 , o, p, q are as defined in Formula 1.
- the present invention also provides an organic light emitting device comprising the compound represented by Chemical Formula 1 in an organic material layer.
- the compound of the present invention is preferably used alone as a hole injection material, a hole transport material, or a hole transport auxiliary material, or may be used together with a known hole injection, hole transport material, or hole transport auxiliary material.
- the organic light emitting device of the present invention includes one or more organic material layers including the compound represented by Chemical Formula 1, and as an example, a method of manufacturing the organic light emitting device will be described below.
- the organic light emitting device includes an organic material layer such as a hole injection layer (HIL), a hole transport layer (HTL), an emission layer (EML), an electron transport layer (ETL), an electron injection layer (EIL) between an anode and a cathode. It may contain one or more. In addition, it may further include a hole transport auxiliary layer between the hole transport layer and the light emitting layer.
- HIL hole injection layer
- HTL hole transport layer
- EML emission layer
- ETL electron transport layer
- EIL electron injection layer
- an anode is formed by depositing a material for an anode electrode having a high work function on the substrate.
- the substrate may be a substrate used in a conventional organic light emitting device, it is particularly preferable to use a glass substrate or a transparent plastic substrate excellent in mechanical strength, thermal stability, transparency, surface smoothness, ease of handling, and waterproof.
- the anode electrode material transparent and excellent indium tin oxide (ITO), indium zinc oxide (IZO), tin oxide (SnO 2 ), zinc oxide (ZnO), and the like may be used.
- the anode electrode material may be deposited by a conventional anode forming method, and specifically, may be deposited by a deposition method or a sputtering method.
- the hole injection layer material may be formed on the anode by vacuum deposition, spin coating, casting, Langmuir-Blodgett (LB), etc., but it is easy to obtain a uniform film quality and also pinholes. It is preferable to form by the vacuum evaporation method in that it is hard to generate
- the deposition conditions vary depending on the compound used as the material of the hole injection layer, the structure and thermal properties of the desired hole injection layer, and generally, a deposition temperature of 50-500 ° C., It is preferable to select appropriately from a vacuum degree of 10 -8 to 10 -3 torr, a deposition rate of 0.01 to 100 kPa / sec, and a layer thickness of 10 kPa to 5 mu m.
- the compound represented by Formula 1 of the present invention may be used alone or a known hole injection layer material may be used.
- a phthalocyanine compound or starburst such as copper phthalocyanine disclosed in US Pat. No. 4,356,429.
- TCTA 4,4 ', 4 "-tri (N-carbazolyl) triphenylamine
- m-MTDATA (4,4', 4" -tris (3-methylphenylamino) triphenylamine)
- m-MTDAPB 4,4 ', 4 "-tris (3-methylphenylamino) phenoxybenzene
- HI-406 N 1 , N 1 '-(biphenyl-4,4'-diyl) bis (N 1-(naphthalen- 1 -yl) -N 4 , N 4 -diphenylbenzene-1,4-diamine) and the like can be used as the hole injection layer material.
- the hole transport layer material may be formed on the hole injection layer by a method such as vacuum deposition, spin coating, cast, LB, etc., but it is easy to obtain a uniform film quality and is difficult to generate pin holes. It is preferable to form by a vapor deposition method.
- the deposition conditions vary depending on the compound used, but in general, the hole transport layer is preferably selected in the same condition range as the formation of the hole injection layer.
- the hole transport layer material may be a compound represented by the formula (1) of the present invention may be used alone or a mixture of known hole transport layer materials.
- the known hole transport layer material includes carbazole derivatives such as N-phenylcarbazole and polyvinylcarbazole, N, N'-bis (3-methylphenyl) -N, N'-diphenyl- [1, Usually having an aromatic condensed ring such as 1-biphenyl] -4,4'-diamine (TPD), N.N'-di (naphthalen-1-yl) -N, N'-diphenyl benzidine (-NPD) Amine derivatives and the like can be used.
- carbazole derivatives such as N-phenylcarbazole and polyvinylcarbazole, N, N'-bis (3-methylphenyl) -N, N'-diphenyl- [1, Usually having an aromatic condensed ring such as 1-biphenyl] -4,4'
- the light emitting layer material may be formed on the hole transport layer by a method such as vacuum deposition, spin coating, casting, LB, etc., but the vacuum deposition method is easy to obtain a uniform film quality and hard to generate pin holes. It is preferable to form by.
- the deposition conditions vary depending on the compound used, but in general, it is preferable to select within the same condition range as the formation of the hole injection layer.
- the light emitting layer material may be used as a known host or dopant.
- a fluorescent dopant may be IDE102 or IDE105 available from Idemitsu, or BD142 (N 6 , N 12 -bis (3,4-dimethylphenyl) -N 6 , N 12 -dimethycrylicene- 6,12-diamine) can be used as green phosphorescent dopant Ir (ppy) 3 (tris (2-phenylpyridine) iridium), blue phosphorescent dopant F2Irpic (iridium (III) bis [4,6- Difluorophenyl) -pyridinato-N, C2 '] picolinate), a red phosphorescent dopant RD61 from UDC, and the like can be co-vacuum deposited (doped).
- the doping concentration of the dopant is not particularly limited, but the dopant is preferably doped at 0.01 to 15 parts by weight based on 100 parts by weight of the host.
- the hole suppression material HBL
- HBL hole suppression material
- the hole-suppressing material that can be used at this time is not particularly limited, but any one of the well-known ones used as the hole-inhibiting material can be selected and used.
- an oxadiazole derivative, a triazole derivative, a phenanthroline derivative, or the hole-inhibiting material described in Japanese Patent Laid-Open No. 11-329734 (A1) can be cited.
- Oxy-2-methylquinolinolato) -aluminum biphenoxide), a phenanthrolines-based compound e.g., BCP (vasocuproin) from UDC
- BCP vasocuproin
- An electron transport layer is formed on the light emitting layer formed as above, wherein the electron transport layer is formed by a vacuum deposition method, a spin coating method, a casting method, or the like, and is preferably formed by a vacuum deposition method.
- the electron transport layer material functions to stably transport electrons injected from the electron injection electrode, and the type thereof is not particularly limited, and examples thereof include quinoline derivatives, especially tris (8-quinolinolato) aluminum (Alq 3). ), Or ET4 (6,6 '-(3,4-dimethyl-1,1-dimethyl-1H-silol-2,5-diyl) di-2,2'-bipyridine).
- an electron injection layer (EIL) which is a material having a function of facilitating injection of electrons from the cathode, may be stacked on the electron transport layer, and the electron injection layer material may be LiF, NaCl, CsF, Li 2 O, BaO, or the like. The substance of can be used.
- the deposition conditions of the electron transport layer are different depending on the compound used, it is generally preferable to select within the same condition range as the formation of the hole injection layer.
- an electron injection layer material may be formed on the electron transport layer, wherein the electron transport layer is formed of a conventional electron injection layer material by a vacuum deposition method, a spin coating method, a casting method, and the like. It is preferable to form by.
- a cathode forming metal is formed on the electron injection layer by a method such as vacuum deposition or sputtering and used as a cathode.
- the cathode forming metal may be a metal having low work function, an alloy, an electrically conductive compound, and a mixture thereof. Specific examples include lithium (Li), magnesium (Mg), aluminum (Al), aluminum-lithium (Al-Li), calcium (Ca), magnesium-indium (Mg-In), magnesium-silver (Mg-Ag), and the like. There is this.
- a transmissive cathode using ITO or IZO may be used to obtain the front light emitting device.
- the organic light emitting device of the present invention may further include a hole transport auxiliary layer between the hole transport layer and the light emitting layer.
- the hole transport auxiliary layer may be formed through a known method as described in Korean Unexamined Patent Publication No. 10-2010-0015029, and preferably, using the compound 1 of the present invention as a hole transport auxiliary material, a hole transport auxiliary layer Can be formed.
- the organic light emitting device of the present invention is not only an anode, a hole injection layer, a hole transport layer, a light emitting layer, an electron transport layer, an electron injection layer, an organic light emitting device of the cathode structure, but also the structure of an organic light emitting device of various structures, 1 It is also possible to form a layer or two intermediate layers.
- the organic light emitting device of the present invention further includes a hole transport auxiliary layer.
- each organic material layer formed according to the present invention as described above can be adjusted according to the required degree, preferably 10 to 1,000nm, more preferably 20 to 150nm.
- the present invention has an advantage that the organic material layer including the compound represented by Formula 1 has a uniform surface and excellent shape stability because the thickness of the organic material layer can be adjusted in molecular units.
- the organic light emitting device of the present invention has improved hole injection and hole transport characteristics, and at the same time has electron blocking characteristics, and excellent device characteristics such as excellent low voltage, high efficiency, stability due to high Tg, and long life.
- PhMgBr was used instead of CH 3 MgBr in the same manner as the synthesis of Intermediate 1 to synthesize 39.2 g (yield 79%) and 31.7 g (80% yield) of intermediate 2.
- An organic light emitting device was manufactured according to the structure of FIG. 1.
- the organic light emitting element is stacked in the order of the hole injection electrode 11 / hole injection layer 12 / hole transport layer 13 / light emitting layer 14 / electron transfer layer 15 / electron injection electrode 16 from below.
- the hole injection layer 12, the hole transport layer 13, the light emitting layer 14, and the electron transport layer 15 of Examples and Comparative Examples used the following materials.
- ITO indium tin oxide
- a solvent such as isopropyl alcohol, acetone, methanol, etc.
- the light emitting layer was doped with 5% of BH01: BD01 to form 300 ⁇ .
- Alq3: Liq (1: 1) 300 ⁇ was formed into an electron transport layer, followed by Liq 10 ⁇ and aluminum (Al) 1000 ⁇ .
- a glass substrate coated with an indium tin oxide (ITO) 1500 ⁇ thick thin film was washed by distilled water ultrasonically. After washing the distilled water, ultrasonic cleaning with a solvent such as isopropyl alcohol, acetone, methanol, etc., dried and transferred to a plasma cleaner, and then cleaned the substrate using oxygen plasma for 5 minutes and then a thermal vacuum evaporator (thermal A hole injection layer HT01 600 ⁇ , Compound 1 240 ⁇ for the first hole transport layer and Compound 25 10 ⁇ for the second hole transport layer were formed using an evaporator. Next, the light emitting layer was doped with 5% of BH01: BD01 to form 300 ⁇ . Next, Alq3: Liq (1: 1) 300 ⁇ was formed into an electron transport layer, followed by Liq 10 ⁇ and aluminum (Al) 1000 ⁇ . The organic light emitting device was fabricated by encapsulating the device in a glove box.
- a solvent such as isopropyl alcohol, acetone,
- Example 28 In the same manner as in Example 28, an organic light emitting diode obtained by forming a compound 26 into a second hole transport layer was fabricated.
- Example 28 In the same manner as in Example 28, an organic light emitting diode obtained by forming a compound 27 into a second hole transport layer was manufactured.
- a device was manufactured in the same manner as in Example 1, except that the hole transport layer of Example 1 was used as an NPB.
- a device was manufactured in the same manner as in Example 1, except that the hole transport layer of Ref. 1 was used.
- a device was manufactured in the same manner as in Example 1, except that the hole transport layer of Ref. 2 was used.
- a device was manufactured in the same manner as in Example 1, except that the hole transport layer of Ref. 3 was used.
- a device was manufactured in the same manner as in Example 1, except that the hole transport layer of Ref. 4 was used.
- Example 1 4.05 10 6.49 5.02 0.141 0.112 44
- Example 2 4.03 10 6.45 5.00 0.141 0.112 45
- Example 3 3.91 10 6.65 5.25 0.142 0.111 55
- Example 4 3.90 10 6.82 5.30 0.139 0.111 60
- Example 5 3.92 10 6.63 5.95 0.138 0.110 48
- Example 6 3.92 10 6.60
- Example 7 3.90 10 6.70 5.90 0.140 0.110 52
- Example 8 3.90 10 6.70 5.27 0.140 0.110 47
- Example 9 3.93 10 6.73 5.40 0.138 0.112 45
- Example 10 3.87 10 6.89 5.29 0.141 0.111 53
- Example 11 3.93 10 6.75 5.35 0.142 0.111 46
- Example 12 3.90 10 6.90 5.35 0.141 0.111 58
- Example 13 3.92 10 6.80 5.90 0.140 0.111 50
- Example 14 4.05 10 6.51 5.42 0.140 0.110 43
- Example 15 4.02 10 6.49 5.85 0.140 0.110 45
- Example 16 3.92
- Examples 1 to 30 of the present invention can be confirmed that the physical properties are excellent in all aspects compared to Comparative Examples 1 to 5.
- the compound represented by Chemical Formula 1 of the present invention has a high LUMO to effectively block electrons in the light emitting layer, and the hole injection is smoothly formed by arylamine group substitution, and the hole mobility is greatly improved due to excellent hole mobility.
- the tetracyclic structure of the compound represented by the formula (1) of the present invention can be seen that the hole injection can be formed smoothly HOMO, hole mobility is also excellent, it is seen that the driving voltage is significantly low and high efficiency have.
- the compound of the present invention has a HOMO energy level that is easy to inject holes, has a high LUMO energy level that can block electrons, excellent hole transport characteristics, hole injection layer, hole transport layer or hole transport auxiliary layer of the organic light emitting device It can have stability and long life due to excellent low voltage, high efficiency and high Tg.
Abstract
The novel compound according to the present invention has an HOMO energy level that facilitates hole injection, has a high LUMO energy level that enables the blocking of electrons, has excellent hole transportation properties, and, when applied to the hole injection layer, hole transportation layer or hole transportation auxiliary layer of an organic light-emitting element, can impart stability and extended lifespan due to having excellent low voltage, high efficiency and high Tg.
Description
본 발명은 신규한 화합물 및 이를 포함하는 유기발광소자에 관한 것으로, 특히 정공주입물질, 정공수송물질, 또는 정공수송보조물질로 유용한 화합물에 관한 것이다.The present invention relates to a novel compound and an organic light emitting device including the same, and more particularly to a compound useful as a hole injection material, a hole transport material, or a hole transport auxiliary material.
최근, 자체 발광형으로 저전압 구동이 가능한 유기발광소자는, 평판 표시소자의 주류인 액정디스플레이(LCD, liquid crystal display)에 비해, 시야각, 대조비 등이 우수하고 백라이트가 불필요하여 경량 및 박형이 가능하며 소비전력 측면에서도 유리하고 색 재현 범위가 넓어, 차세대 표시소자로서 주목을 받고 있다.Recently, an organic light emitting device capable of low voltage driving with a self-luminous type has a superior viewing angle, contrast ratio, and the like, and is lighter and thinner than a liquid crystal display (LCD), which is the mainstream of flat panel display devices. In terms of power consumption and wide color reproduction range, it is attracting attention as a next-generation display device.
유기발광소자에서 유기물 층으로 사용되는 재료는 크게 기능에 따라, 발광 재료, 정공주입 재료, 정공수송 재료, 정공수송보조재료, 전자수송 재료, 전자주입 재료 등으로 분류될 수 있다. The material used as the organic material layer in the organic light emitting device may be largely classified into light emitting materials, hole injection materials, hole transport materials, hole transport auxiliary materials, electron transport materials, electron injection materials and the like according to functions.
현재까지 이러한 유기발광소자에 사용되는 정공주입정공수송 재료에는 카바졸 골격을 가지는 아민 유도체가 많이 연구되었으나 보다 높은 구동전압, 낮은 효율 및 짧은 수명으로 인해 실용화하는 데에 많은 어려움이 있었다. 따라서 우수한 특성을 갖는 물질을 이용하여 저전압 구동, 고휘도 및 장수명을 갖는 유기발광소자를 개발하려는 노력이 지속되어 왔다. Until now, a lot of amine derivatives having a carbazole skeleton have been studied for the hole injection hole transport material used in the organic light emitting device, but there are many difficulties in practical use due to the higher driving voltage, lower efficiency, and shorter lifetime. Therefore, efforts have been made to develop organic light emitting diodes having low voltage driving, high brightness and long life using materials having excellent characteristics.
상기와 같은 문제점을 해결하기 위해, 본 발명은 정공주입이 용이한 HOMO 에너지 레벨을 가지며, 전자를 차단할 수 있는 높은 LUMO 에너지 레벨을 가지며, 정공수송 특성이 우수하고, 유기발광소자의 정공주입층, 정공수송층 또는 정공수송보조층에 적용시 우수한 저전압, 고효율, 높은 Tg로 인한 안정성 및 장수명을 가지게 할 수 있는 신규한 화합물을 제공하는 것을 목적으로 한다.In order to solve the above problems, the present invention has a HOMO energy level easy hole injection, has a high LUMO energy level that can block electrons, excellent hole transport characteristics, hole injection layer of the organic light emitting device, It is an object of the present invention to provide a novel compound capable of having excellent low voltage, high efficiency, high Tg stability and long life when applied to a hole transport layer or a hole transport auxiliary layer.
본 발명은 또한 상기 화합물을 포함하여 정공주입 및 정공수송 특성이 향상되고, 동시에 전자차단 특성을 가지며, 우수한 저전압, 고효율, 높은 Tg로 인한 안정성 및 장수명을 가지는 유기발광소자를 제공하는 것을 목적으로 한다.It is another object of the present invention to provide an organic light emitting device including the compound, which has improved hole injection and hole transport characteristics, and at the same time has electron blocking characteristics, and has excellent low voltage, high efficiency, stability due to high Tg, and long life. .
상기 목적을 달성하기 위해 본 발명은 하기 화학식 1로 표시되는 화합물을 제공한다:In order to achieve the above object, the present invention provides a compound represented by the following Chemical Formula 1:
[화학식 1][Formula 1]
상기 화학식 1에서,In Chemical Formula 1,
L은 각각 독립적으로 , , 수소, 중수소, 할로겐, 아미노기, 니트릴기, 니트로기 또는 C1-30의 알킬기이며, L each independently , , Hydrogen, deuterium, halogen, amino group, nitrile group, nitro group or C 1-30 alkyl group,
Ar은 각각 독립적으로 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C6-50의 아릴기; 또는 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-50의 헤테로아릴기이고,Ar each independently represents a C 6-50 aryl group which is optionally substituted with deuterium, halogen, amino group, nitrile group, nitro group; Or a C 2-50 heteroaryl group unsubstituted or substituted with deuterium, a halogen, an amino group, a nitrile group, a nitro group,
R1 및 R2는 각각 독립적으로 수소; 중수소; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C1-30의 알킬기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-30의 알케닐기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-30의 알키닐기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C1-30의 알콕시기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C6-30의 아릴옥시기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C6-50의 아릴기; 또는 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-50의 헤테로아릴기이며, R1 및 R2는 서로 고리를 형성할 수 있으며, R 1 and R 2 are each independently hydrogen; heavy hydrogen; C 1-30 alkyl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; C 2-30 alkenyl groups unsubstituted or substituted with deuterium, halogen, amino, nitrile, and nitro groups; C 2-30 alkynyl group which is unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; A C 1-30 alkoxy group unsubstituted or substituted with deuterium, halogen, amino, nitrile or nitro group; C 6-30 aryloxy group which is unsubstituted or substituted with deuterium, halogen, amino, nitrile or nitro group; C 6-50 aryl group which is optionally substituted with deuterium, halogen, amino group, nitrile group, nitro group; Or a C 2-50 heteroaryl group unsubstituted or substituted with deuterium, a halogen, an amino group, a nitrile group, a nitro group, R 1 and R 2 may form a ring with each other,
l, m, n은 각각 독립적으로 0 내지 3의 정수이며, l, m, n 중 적어도 하나는 0이 아니며, 바람직하기로 m, n 중 적어도 하나는 0이 아니며,l, m, n are each independently an integer of 0 to 3, at least one of l, m, n is not 0, preferably at least one of m, n is not 0,
o, p, q는 각각 독립적으로 0 내지 4의 정수이다.o, p, q are each independently an integer of 0-4.
또한, 본 발명은 상기 화학식 1로 표시되는 화합물을 포함하는 유기발광소자를 제공한다.In addition, the present invention provides an organic light emitting device comprising the compound represented by the formula (1).
본 발명의 화합물은 정공주입이 용이한 HOMO 에너지 레벨을 가지며, 전자를 차단할 수 있는 높은 LUMO 에너지 레벨을 가지며, 정공수송 특성이 우수하고, 유기발광소자의 정공주입층, 정공수송층 또는 정공수송보조층에 적용시 우수한 저전압, 고효율, 높은 Tg로 인한 안정성 및 장수명을 가지게 할 수 있다.The compound of the present invention has a HOMO energy level that is easy to inject holes, has a high LUMO energy level that can block electrons, excellent hole transport characteristics, hole injection layer, hole transport layer or hole transport auxiliary layer of the organic light emitting device It can have stability and long life due to excellent low voltage, high efficiency and high Tg.
도 1은 본 발명의 일 실시예에 따른 OLED의 단면을 개략적으로 도시한 것이다.1 schematically illustrates a cross section of an OLED according to an embodiment of the invention.
도면의 부호Sign of drawing
10 : 기판10: substrate
11 : 양극11: anode
12 : 정공주입층12: hole injection layer
13 : 정공수송층13: hole transport layer
14 : 발광층14: light emitting layer
15 : 전자전달층15: electron transport layer
16: 음극16: cathode
본 발명의 화합물은 하기 화학식 1로 표시되는 것을 특징으로 한다.The compound of the present invention is characterized by represented by the following formula (1).
[화학식 1][Formula 1]
상기 화학식 1에서,In Chemical Formula 1,
L은 각각 독립적으로,, 수소, 중수소, 할로겐, 아미노기, 니트릴기, 니트로기 또는 C1-30의 알킬기이며, L each independently , , Hydrogen, deuterium, halogen, amino group, nitrile group, nitro group or C 1-30 alkyl group,
Ar은 각각 독립적으로 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C6-50의 아릴기; 또는 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-50의 헤테로아릴기이고,Ar each independently represents a C 6-50 aryl group which is optionally substituted with deuterium, halogen, amino group, nitrile group, nitro group; Or a C 2-50 heteroaryl group unsubstituted or substituted with deuterium, a halogen, an amino group, a nitrile group, a nitro group,
R1 및 R2는 각각 독립적으로 수소; 중수소; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C1-30의 알킬기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-30의 알케닐기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-30의 알키닐기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C1-30의 알콕시기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C6-30의 아릴옥시기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C6-50의 아릴기; 또는 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-50의 헤테로아릴기이며, R1 및 R2는 서로 고리를 형성할 수 있으며, R 1 and R 2 are each independently hydrogen; heavy hydrogen; C 1-30 alkyl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; C 2-30 alkenyl groups unsubstituted or substituted with deuterium, halogen, amino, nitrile, and nitro groups; C 2-30 alkynyl group which is unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; A C 1-30 alkoxy group unsubstituted or substituted with deuterium, halogen, amino, nitrile or nitro group; C 6-30 aryloxy group which is unsubstituted or substituted with deuterium, halogen, amino, nitrile or nitro group; C 6-50 aryl group which is optionally substituted with deuterium, halogen, amino group, nitrile group, nitro group; Or a C 2-50 heteroaryl group unsubstituted or substituted with deuterium, a halogen, an amino group, a nitrile group, a nitro group, R 1 and R 2 may form a ring with each other,
l, m, n은 각각 독립적으로 0 내지 3의 정수이며, l, m, n 중 적어도 하나는 0이 아니며, 바람직하기로 m, n 중 적어도 하나는 0이 아니며,l, m, n are each independently an integer of 0 to 3, at least one of l, m, n is not 0, preferably at least one of m, n is not 0,
o, p, q는 각각 독립적으로 0 내지 4의 정수이다.o, p, q are each independently an integer of 0-4.
바람직하기로 상기 화학식 1로 표시되는 화합물은 하기 화학식 1-1 내지 1-3으로 표시되는 화합물 중 하나인 좋다.Preferably, the compound represented by Chemical Formula 1 may be one of the compounds represented by the following Chemical Formulas 1-1 to 1-3.
[화학식 1-1][Formula 1-1]
[화학식 1-2][Formula 1-2]
[화학식 1-3][Formula 1-3]
상기 화학식들에서 Ar, R1, R2, o, p 및 q는 화학식 1에서 정의한 바와 같다. 바람직하기로 화학식 1-3에서 o는 1 내지 3의 정수인 것이 좋다.Ar, R 1 , R 2 , o, p and q in the above formula are as defined in formula (1). Preferably in the formula 1-3 o is an integer of 1 to 3.
본 발명에 있어서, 상기 화학식 1로 표시되는 화합물의 바람직한 예는 다음과 같다:In the present invention, preferred examples of the compound represented by Formula 1 are as follows:
본 발명에 따른 화학식 1의 화합물은 정공주입이 용이한 HOMO 에너지 레벨을 가지며, 전자를 차단할 수 있는 높은 LUMO 에너지 레벨을 가지며, 정공수송 특성이 우수하고, 유기발광소자의 정공주입층, 정공수송층, 또는 정공수송보조층에 적용시 우수한 저전압, 고효율, 높은 Tg로 인한 안정성 및 장수명을 가지게 할 수 있다.Compound of Formula 1 according to the present invention has a HOMO energy level easy hole injection, has a high LUMO energy level that can block electrons, excellent hole transport characteristics, hole injection layer, hole transport layer, Alternatively, when applied to the hole transport auxiliary layer, it can have stability and long life due to excellent low voltage, high efficiency, and high Tg.
또한 본 발명의 화합물은 다음과 같은 과정을 거쳐 제조될 수 있다. In addition, the compound of the present invention can be prepared through the following process.
[반응식 1]Scheme 1
상기 반응식 1에서 목적화합물은 화학식 1로 표시되는 화합물이며, Ar, L, l, R1, R2, o, p, q는 화학식 1에서 정의한 바와 같다.The target compound in Scheme 1 is a compound represented by Formula 1, Ar, L, l, R 1 , R 2 , o, p, q are as defined in Formula 1.
또한, 본 발명은 상기 화학식 1로 표시되는 화합물을 유기물층에 포함하는 유기발광소자를 제공한다. 이때, 본 발명의 화합물은 바람직하기로는 정공주입물질, 정공수송물질, 또는 정공수송보조물질로 단독으로 사용되거나 또는 공지의 정공주입, 정공수송물질, 또는 정공수송보조물질과 함께 사용될 수 있다.The present invention also provides an organic light emitting device comprising the compound represented by Chemical Formula 1 in an organic material layer. In this case, the compound of the present invention is preferably used alone as a hole injection material, a hole transport material, or a hole transport auxiliary material, or may be used together with a known hole injection, hole transport material, or hole transport auxiliary material.
또한 본 발명의 유기발광소자는 상기 화학식 1로 표시되는 화합물을 포함하는 1층 이상의 유기물층을 포함하는 바, 일예로 상기 유기발광소자의 제조방법을 설명하면 다음과 같다.In addition, the organic light emitting device of the present invention includes one or more organic material layers including the compound represented by Chemical Formula 1, and as an example, a method of manufacturing the organic light emitting device will be described below.
상기 유기발광소자는 애노드(anode)와 캐소드(cathod) 사이에 정공주입층(HIL), 정공수송층(HTL), 발광층(EML), 전자수송층(ETL), 전자주입층(EIL) 등의 유기물층을 1 개 이상 포함할 수 있다. 또한 상기 정공수송층과 발광층 사이에 정공수송보조층을 더욱 포함할 수 있다.The organic light emitting device includes an organic material layer such as a hole injection layer (HIL), a hole transport layer (HTL), an emission layer (EML), an electron transport layer (ETL), an electron injection layer (EIL) between an anode and a cathode. It may contain one or more. In addition, it may further include a hole transport auxiliary layer between the hole transport layer and the light emitting layer.
먼저, 기판 상부에 높은 일함수를 갖는 애노드 전극용 물질을 증착시켜 애노드를 형성한다. 이때, 상기 기판은 통상의 유기발광소자에서 사용되는 기판을 사용할 수 있으며, 특히 기계적 강도, 열적 안정성, 투명성, 표면평활성, 취급용이성, 및 방수성이 우수한 유리 기판 또는 투명 플라스틱 기판을 사용하는 것이 좋다. 또한, 애노드 전극용 물질로는 투명하고 전도성이 우수한 산화인듐주석(ITO), 산화인듐아연(IZO), 산화주석(SnO2), 산화아연(ZnO) 등을 사용할 수 있다. 상기 애노드 전극용 물질은 통상의 애노드 형성방법에 의해 증착할 수 있으며, 구체적으로 증착법 또는 스퍼터링법에 의해 증착할 수 있다.First, an anode is formed by depositing a material for an anode electrode having a high work function on the substrate. In this case, the substrate may be a substrate used in a conventional organic light emitting device, it is particularly preferable to use a glass substrate or a transparent plastic substrate excellent in mechanical strength, thermal stability, transparency, surface smoothness, ease of handling, and waterproof. In addition, as the anode electrode material, transparent and excellent indium tin oxide (ITO), indium zinc oxide (IZO), tin oxide (SnO 2 ), zinc oxide (ZnO), and the like may be used. The anode electrode material may be deposited by a conventional anode forming method, and specifically, may be deposited by a deposition method or a sputtering method.
그 다음, 상기 애노드 전극 상부에 정공주입층 물질을 진공증착법, 스핀코팅법, 캐스트법, LB(Langmuir-Blodgett)법 등과 같은 방법에 의해 형성할 수 있지만, 균일한 막질을 얻기 쉽고, 또한 핀정공이 발생하기 어렵다는 등의 점에서 진공증착법에 의해 형성하는 것이 바람직하다. 상기 진공증착법에 의해 정공주입층을 형성하는 경우 그 증착조건은 정공주입층의 재료로서 사용하는 화합물, 목적하는 정공주입층의 구조 및 열적특성 등에 따라 다르지만, 일반적으로 50-500℃ 의 증착온도, 10-8 내지 10-3 torr의 진공도, 0.01 내지 100 Å/sec의 증착속도, 10 Å 내지 5㎛ 의 층 두께 범위에서 적절히 선택하는 것이 바람직하다.Subsequently, the hole injection layer material may be formed on the anode by vacuum deposition, spin coating, casting, Langmuir-Blodgett (LB), etc., but it is easy to obtain a uniform film quality and also pinholes. It is preferable to form by the vacuum evaporation method in that it is hard to generate | occur | produce. When the hole injection layer is formed by the vacuum deposition method, the deposition conditions vary depending on the compound used as the material of the hole injection layer, the structure and thermal properties of the desired hole injection layer, and generally, a deposition temperature of 50-500 ° C., It is preferable to select appropriately from a vacuum degree of 10 -8 to 10 -3 torr, a deposition rate of 0.01 to 100 kPa / sec, and a layer thickness of 10 kPa to 5 mu m.
상기 정공주입층 물질은 본 발명의 화학식 1로 표시되는 화합물이 단독으로 사용되거나 또는 공지의 정공주입층 물질이 사용될 수 있으며, 일예로 미국특허 제4,356,429호에 개시된 구리 프탈로시아닌 등의 프탈로시아닌 화합물 또는 스타버스트형 아민 유도체류인 TCTA(4,4',4"-트리(N-카바졸릴)트리페닐아민), m-MTDATA(4,4',4"-트리스(3-메틸페닐아미노)트리페닐아민), m-MTDAPB(4,4',4"-트리스(3-메틸페닐아미노)페녹시벤젠), HI-406(N1,N1'-(비페닐-4,4'-디일)비스(N1-(나프탈렌-1-일)-N4,N4-디페닐벤젠-1,4-디아민) 등을 정공주입층 물질로 사용할 수 있다.As the hole injection layer material, the compound represented by Formula 1 of the present invention may be used alone or a known hole injection layer material may be used. For example, a phthalocyanine compound or starburst such as copper phthalocyanine disclosed in US Pat. No. 4,356,429. TCTA (4,4 ', 4 "-tri (N-carbazolyl) triphenylamine) and m-MTDATA (4,4', 4" -tris (3-methylphenylamino) triphenylamine) , m-MTDAPB (4,4 ', 4 "-tris (3-methylphenylamino) phenoxybenzene), HI-406 (N 1 , N 1 '-(biphenyl-4,4'-diyl) bis (N 1-(naphthalen- 1 -yl) -N 4 , N 4 -diphenylbenzene-1,4-diamine) and the like can be used as the hole injection layer material.
다음으로 상기 정공주입층 상부에 정공수송층 물질을 진공증착법, 스핀코팅법, 캐스트법, LB법 등과 같은 방법에 의해 형성할 수 있지만, 균일한 막질을 얻기 쉽고, 핀정공이 발생하기 어렵다는 점에서 진공증착법에 의해 형성하는 것이 바람직하다. 상기 진공증착법에 의해 정공수송층을 형성하는 경우 그 증착조건은 사용하는 화합물에 따라 다르지만 일반적으로 정공주입층의 형성과 거의 동일한 조건 범위에서 선택하는 것이 좋다.Next, the hole transport layer material may be formed on the hole injection layer by a method such as vacuum deposition, spin coating, cast, LB, etc., but it is easy to obtain a uniform film quality and is difficult to generate pin holes. It is preferable to form by a vapor deposition method. In the case of forming the hole transport layer by the vacuum deposition method, the deposition conditions vary depending on the compound used, but in general, the hole transport layer is preferably selected in the same condition range as the formation of the hole injection layer.
또한, 상기 정공수송층 물질은 본 발명의 화학식 1로 표시되는 화합물이 단독으로 사용되거나 또는 공지의 정공수송층 물질이 혼합되어 사용될 수 있다. 구체적으로, 상기 공지의 정공수송층 물질로는 N-페닐카바졸, 폴리비닐카바졸 등의 카바졸 유도체, N,N'-비스(3-메틸페닐)-N,N'-디페닐-[1,1-비페닐]-4,4'-디아민(TPD), N.N'-디(나프탈렌-1-일)-N,N'-디페닐 벤지딘(-NPD) 등의 방향족 축합환을 가지는 통상의 아민 유도체 등이 사용될 수 있다.In addition, the hole transport layer material may be a compound represented by the formula (1) of the present invention may be used alone or a mixture of known hole transport layer materials. Specifically, the known hole transport layer material includes carbazole derivatives such as N-phenylcarbazole and polyvinylcarbazole, N, N'-bis (3-methylphenyl) -N, N'-diphenyl- [1, Usually having an aromatic condensed ring such as 1-biphenyl] -4,4'-diamine (TPD), N.N'-di (naphthalen-1-yl) -N, N'-diphenyl benzidine (-NPD) Amine derivatives and the like can be used.
그 후, 상기 정공수송층 상부에 발광층 물질을 진공증착법, 스핀코팅법, 캐스트법, LB법 등과 같은 방법에 의해 형성할 수 있지만, 균일한 막질을 얻기 쉽고, 핀정공이 발생하기 어렵다는 점에서 진공증착법에 의해 형성하는 것이 바람직하다. 상기 진공증착법에 의해 발광층을 형성하는 경우 그 증착조건은 사용하는 화합물에 따라 다르지만 일반적으로 정공주입층의 형성과 거의 동일한 조건 범위에서 선택하는 것이 좋다. 또한, 상기 발광층 재료는 공지의 호스트 또는 도펀트로 사용할 수 있다. 일예로 형광 도펀트로는 이데미츠사(Idemitsu사)에서 구입 가능한 IDE102 또는 IDE105, 또는 BD142(N6,N12-비스(3,4-디메틸페닐)-N6,N12-디메시틸크리센-6,12-디아민)를 사용할 수 있으며, 인광 도펀트로는 녹색 인광 도펀트 Ir(ppy)3(트리스(2-페닐피리딘) 이리듐), 청색 인광 도펀트인 F2Irpic(이리듐(Ⅲ) 비스[4,6-다이플루오로페닐)-피리디나토-N,C2'] 피콜린산염), UDC사의 적색 인광 도펀트 RD61 등이 공동 진공증착(도핑)될 수 있다. 도펀트의 도핑농도는 특별히 제한되지 않으나, 호스트 100 중량부 대비 도펀트가 0.01 내지 15 중량부로 도핑되는 것이 바람직하다.Thereafter, the light emitting layer material may be formed on the hole transport layer by a method such as vacuum deposition, spin coating, casting, LB, etc., but the vacuum deposition method is easy to obtain a uniform film quality and hard to generate pin holes. It is preferable to form by. In the case of forming the light emitting layer by the vacuum deposition method, the deposition conditions vary depending on the compound used, but in general, it is preferable to select within the same condition range as the formation of the hole injection layer. In addition, the light emitting layer material may be used as a known host or dopant. For example, a fluorescent dopant may be IDE102 or IDE105 available from Idemitsu, or BD142 (N 6 , N 12 -bis (3,4-dimethylphenyl) -N 6 , N 12 -dimethycrylicene- 6,12-diamine) can be used as green phosphorescent dopant Ir (ppy) 3 (tris (2-phenylpyridine) iridium), blue phosphorescent dopant F2Irpic (iridium (III) bis [4,6- Difluorophenyl) -pyridinato-N, C2 '] picolinate), a red phosphorescent dopant RD61 from UDC, and the like can be co-vacuum deposited (doped). The doping concentration of the dopant is not particularly limited, but the dopant is preferably doped at 0.01 to 15 parts by weight based on 100 parts by weight of the host.
또한, 발광층에 인광 도펀트와 함께 사용할 경우에는 삼중항 여기자 또는 정공이 전자수송층으로 확산되는 현상을 방지하기 위하여 정공억제재료(HBL)를 추가로 진공증착법 또는 스핀코팅법에 의해 적층시키는 것이 바람직하다. 이때 사용할 수 있는 정공억제물질은 특별히 제한되지는 않으나, 정공억제재료로 사용되고 있는 공지의 것에서 임의의 것을 선택해서 이용할 수 있다. 예를 들면, 옥사디아졸 유도체나 트리아졸 유도체, 페난트롤린 유도체, 또는 일본특개평 11-329734(A1)에 기재되어 있는 정공억제재료 등을 들 수 있으며, 대표적으로 Balq(비스(8-하이드록시-2-메틸퀴놀리놀나토)-알루미늄 비페녹사이드), 페난트롤린(phenanthrolines)계 화합물(예: UDC사 BCP(바쏘쿠프로인)) 등을 사용할 수 있다.In addition, when using the phosphorescent dopant in the light emitting layer, it is preferable to further laminate the hole suppression material (HBL) by vacuum deposition or spin coating to prevent the triplet excitons or holes from diffusing into the electron transport layer. The hole-suppressing material that can be used at this time is not particularly limited, but any one of the well-known ones used as the hole-inhibiting material can be selected and used. For example, an oxadiazole derivative, a triazole derivative, a phenanthroline derivative, or the hole-inhibiting material described in Japanese Patent Laid-Open No. 11-329734 (A1) can be cited. Oxy-2-methylquinolinolato) -aluminum biphenoxide), a phenanthrolines-based compound (e.g., BCP (vasocuproin) from UDC) can be used.
상기와 같이 형성된 발광층 상부에는 전자수송층이 형성되는데, 이때 상기 전자수송층은 진공증착법, 스핀코팅법, 캐스트법 등의 방법으로 형성되며, 특히 진공증착법에 의해 형성하는 것이 바람직하다.An electron transport layer is formed on the light emitting layer formed as above, wherein the electron transport layer is formed by a vacuum deposition method, a spin coating method, a casting method, or the like, and is preferably formed by a vacuum deposition method.
상기 전자수송층 재료는 전자주입전극으로부터 주입된 전자를 안정하게 수송하는 기능을 하는 것으로서 그 종류가 특별히 제한되지는 않으며, 예를 들어 퀴놀린 유도체, 특히 트리스(8-퀴놀리놀라토)알루미늄(Alq3), 또는 ET4(6,6'-(3,4-디메시틸-1,1-디메틸-1H-실올-2,5-디일)디-2,2'-비피리딘)을 사용할 수 있다. 또한, 전자수송층 상부에 캐소드로부터 전자의 주입을 용이하게 하는 기능을 가지는 물질인 전자주입층(EIL)이 적층될 수 있으며, 전자주입층 물질로는 LiF, NaCl, CsF, Li2O, BaO 등의 물질을 이용할 수 있다.The electron transport layer material functions to stably transport electrons injected from the electron injection electrode, and the type thereof is not particularly limited, and examples thereof include quinoline derivatives, especially tris (8-quinolinolato) aluminum (Alq 3). ), Or ET4 (6,6 '-(3,4-dimethyl-1,1-dimethyl-1H-silol-2,5-diyl) di-2,2'-bipyridine). In addition, an electron injection layer (EIL), which is a material having a function of facilitating injection of electrons from the cathode, may be stacked on the electron transport layer, and the electron injection layer material may be LiF, NaCl, CsF, Li 2 O, BaO, or the like. The substance of can be used.
또한, 상기 전자수송층의 증착조건은 사용하는 화합물에 따라 다르지만, 일반적으로 정공주입층의 형성과 거의 동일한 조건 범위에서 선택하는 것이 좋다.In addition, although the deposition conditions of the electron transport layer are different depending on the compound used, it is generally preferable to select within the same condition range as the formation of the hole injection layer.
그 뒤, 상기 전자수송층 상부에 전자주입층 물질을 형성할 수 있으며, 이때 상기 전자수송층은 통상의 전자주입층 물질을 진공증착법, 스핀코팅법, 캐스트법 등의 방법으로 형성되며, 특히 진공증착법에 의해 형성하는 것이 바람직하다.Subsequently, an electron injection layer material may be formed on the electron transport layer, wherein the electron transport layer is formed of a conventional electron injection layer material by a vacuum deposition method, a spin coating method, a casting method, and the like. It is preferable to form by.
마지막으로 전자주입층 상부에 캐소드 형성용 금속을 진공증착법이나 스퍼터링법 등의 방법에 의해 형성하고 캐소드로 사용한다. 여기서 캐소드 형성용 금속으로는 낮은 일함수를 가지는 금속, 합금, 전기전도성 화합물, 및 이들의 혼합물을 사용할 수 있다. 구체적인 예로는 리튬(Li), 마그네슘(Mg), 알루미늄(Al), 알루미늄-리튬(Al-Li), 칼슘(Ca), 마그네슘-인듐(Mg-In), 마그네슘-은(Mg-Ag) 등이 있다. 또한, 전면 발광소자를 얻기 위하여 ITO, IZO를 사용한 투과형 캐소드를 사용할 수도 있다.Finally, a cathode forming metal is formed on the electron injection layer by a method such as vacuum deposition or sputtering and used as a cathode. The cathode forming metal may be a metal having low work function, an alloy, an electrically conductive compound, and a mixture thereof. Specific examples include lithium (Li), magnesium (Mg), aluminum (Al), aluminum-lithium (Al-Li), calcium (Ca), magnesium-indium (Mg-In), magnesium-silver (Mg-Ag), and the like. There is this. In addition, a transmissive cathode using ITO or IZO may be used to obtain the front light emitting device.
또한 본 발명의 유기발광소자는 상기 정공수송층과 발광층 사이에 정공수송보조층을 더욱 포함할 수 있다. 상기 정공수송보조층은 대한민국공허공개 제10-2010-0015029호에 기재된 것과 같은 공지의 방법을 통하여 형성될 수 있으며, 바람직하게는 본 발명의 화합물 1을 정공수송보조물질로 사용하여 정공수송보조층을 형성할 수 있다.In addition, the organic light emitting device of the present invention may further include a hole transport auxiliary layer between the hole transport layer and the light emitting layer. The hole transport auxiliary layer may be formed through a known method as described in Korean Unexamined Patent Publication No. 10-2010-0015029, and preferably, using the compound 1 of the present invention as a hole transport auxiliary material, a hole transport auxiliary layer Can be formed.
본 발명의 유기발광소자는 애노드, 정공주입층, 정공수송층, 발광층, 전자수송층, 전자주입층, 캐소드 구조의 유기발광소자 뿐만 아니라, 다양한 구조의 유기발광소자의 구조가 가능하며, 필요에 따라 1층 또는 2층의 중간층을 더 형성하는 것도 가능하다. 바람직하기로 본 발명의 유기발광소자는 정공수송보조층을 더욱 포함한다.The organic light emitting device of the present invention is not only an anode, a hole injection layer, a hole transport layer, a light emitting layer, an electron transport layer, an electron injection layer, an organic light emitting device of the cathode structure, but also the structure of an organic light emitting device of various structures, 1 It is also possible to form a layer or two intermediate layers. Preferably, the organic light emitting device of the present invention further includes a hole transport auxiliary layer.
상기와 같이 본 발명에 따라 형성되는 각 유기물층의 두께는 요구되는 정도에 따라 조절할 수 있으며, 바람직하게는 10 내지 1,000㎚ 이며, 더욱 바람직하게는 20 내지 150㎚ 인 것이 좋다.The thickness of each organic material layer formed according to the present invention as described above can be adjusted according to the required degree, preferably 10 to 1,000nm, more preferably 20 to 150nm.
또한 본 발명은 상기 화학식 1로 표시되는 화합물을 포함하는 유기물층은 유기물층의 두께를 분자 단위로 조절할 수 있기 때문에 표면이 균일하며, 형태안정성이 뛰어난 장점이 있다.In addition, the present invention has an advantage that the organic material layer including the compound represented by Formula 1 has a uniform surface and excellent shape stability because the thickness of the organic material layer can be adjusted in molecular units.
본 발명의 유기발광소자는 정공주입 및 정공수송 특성이 향상되고, 동시에 전자차단 특성을 가지며, 우수한 저전압, 고효율, 높은 Tg로 인한 안정성 및 장수명 등의 우수한 소자 특성을 가진다.The organic light emitting device of the present invention has improved hole injection and hole transport characteristics, and at the same time has electron blocking characteristics, and excellent device characteristics such as excellent low voltage, high efficiency, stability due to high Tg, and long life.
이하, 본 발명의 이해를 돕기 위하여 바람직한 실시예를 제시하나, 하기 실시예는 본 발명을 예시하는 것일 뿐 본 발명의 범위가 하기 실시예에 한정되는 것은 아니다.Hereinafter, preferred examples are provided to help understanding of the present invention, but the following examples are merely to illustrate the present invention, and the scope of the present invention is not limited to the following examples.
중간체 1의 합성 Synthesis of Intermediate 1
[1-1`의 합성][1-1` synthesis]
둥근바닥플라스크에 (1-phenyl-1H-indol-3-yl)boronic acid 83.70 g, methyl 4-bromo-2-iodobenzoate 100 g을 1,4-Dioxane 1200 ml에 녹이고 K2CO3(2M) 450 ml와 Pd(PPh3)4 10.2 g을 넣은 후 환류 교반하였다. TLC로 반응을 확인하고 물을 첨가 후 반응을 종결시켰다. 유기층을 EA로 추출하고 감압여과한 후 컬럼정제하여 중간체 1-1` 93.2 g (수율 78%)를 얻었다.In a round bottom flask, 83.70 g of (1-phenyl-1H-indol-3-yl) boronic acid and 100 g of methyl 4-bromo-2-iodobenzoate are dissolved in 1200 ml of 1,4-Dioxane and K 2 CO 3 (2M) 450 10.2 g of ml and Pd (PPh 3 ) 4 were added thereto, followed by stirring under reflux. The reaction was confirmed by TLC and the reaction was terminated after the addition of water. The organic layer was extracted with EA, filtered under reduced pressure and purified by column to obtain 93.2 g (yield 78%) of intermediate 1-1`.
[1-2`의 합성][1-2` Synthesis]
상기 1-1` 50 g을 THF 1300 ml에 녹인 후 CH3MgBr 48.4 g을 0℃ 에서 천천히 적가하고 온도를 서서히 올린 후 5시간 동안 환류 교반하였다. 유기층을 MC로 추출하고 감압여과하여 중간체 1-2` 35.8 g (수율 65%)를 얻었다.After dissolving 50 g of 1-1 ′ in 1300 ml of THF, 48.4 g of CH 3 MgBr was slowly added dropwise at 0 ° C., and gradually heated to reflux for 5 hours. The organic layer was extracted with MC and filtered under reduced pressure to obtain 35.8 g (yield 65%) of intermediate 1-2 ′.
[중간체1의 합성][Synthesis of Intermediate 1]
상기 1-2` 35 g을 아세트산 350 ml에 녹인 후 염산 1.5 ml를 가한 후 3시간 동안 환류 교반하였다. 반응이 종결된 후 물과 MC로 유기층을 추출하였다. MgSO4로 수분을 제거하고 감압여과한 후 컬럼정제하여 중간체1 27.8 g (수율 83%)을 얻었다.After dissolving 35 g of 1-2 ′ in 350 ml of acetic acid, 1.5 ml of hydrochloric acid was added thereto, and the mixture was stirred under reflux for 3 hours. After the reaction was completed, the organic layer was extracted with water and MC. Water was removed with MgSO 4 , filtered under reduced pressure, and the mixture was purified by column to obtain 27.8 g of intermediate 1 (yield 83%).
중간체 2의 합성 Synthesis of Intermediate 2
상기 중간체 1의 합성과 동일한 방법으로 CH3MgBr 대신 PhMgBr을 사용하여 2-2` 39.2 g (수율 79%), 중간체2 31.7 g (수율 80%)을 합성하였다.PhMgBr was used instead of CH 3 MgBr in the same manner as the synthesis of Intermediate 1 to synthesize 39.2 g (yield 79%) and 31.7 g (80% yield) of intermediate 2.
중간체 3의 합성Synthesis of Intermediate 3
상기 중간체 1의 합성과 동일한 방법으로 methyl 4-bromo-2-iodobenzoate 대신 methyl 5-bromo-2-iodobenzoate을 사용하여 3-1` 90.9 g (수율 76%), 3-2` 33.0 g (수율 66%), 중간체3 24.9 g (수율 79%)을 합성하였다.By using methyl 5-bromo-2-iodobenzoate instead of methyl 4-bromo-2-iodobenzoate in the same manner as the synthesis of the intermediate 1, 3-1` 90.9 g (yield 76%), 3-2` 33.0 g (yield 66 %), 24.9 g of intermediate 3 (yield 79%).
중간체 4의 합성Synthesis of Intermediate 4
상기 중간체 3의 합성과 동일한 방법으로 CH3MgBr 대신 PhMgBr을 사용하여 4-2` 39.2 g (수율 75%), 중간체4 30.9 g (수율 82%)을 합성하였다.In the same manner as in the synthesis of the intermediate 3, 4-2` 39.2 g (yield 75%), intermediate 4 30.9 g (yield 82%) was synthesized using PhMgBr instead of CH 3 MgBr.
중간체 5의 합성 Synthesis of Intermediate 5
[5-1`의 합성][Synthesis of 5-1`]
둥근바닥플라스크에 5-chloro-1-phenyl-1H-indole 90 g을 DMF 1300 ml에 녹인 후 0℃ 로 온도를 낮추고 600 ml에 NBS 77.3 g을 녹인 용액을 천천히 적가 하였다. 온도를 상온으로 천천히 올린 후 3시간 교반하였다. TLC로 반응을 확인하고 DMF를 감압여과한 후 MC와 물로 유기층을 추출하였다. 컬럼정제하여 중간체 5-1` 88.4 g (수율 73%)를 얻었다.90 g of 5-chloro-1-phenyl-1H-indole was dissolved in 1300 ml of DMF in a round bottom flask, and the temperature was lowered to 0 ° C. and a solution of 77.3 g of NBS in 600 ml was slowly added dropwise. After slowly raising the temperature to room temperature, the mixture was stirred for 3 hours. The reaction was confirmed by TLC, DMF was filtered under reduced pressure, and the organic layer was extracted with MC and water. Purified by column to give an intermediate 5-1` 88.4 g (73% yield).
[5-2`의 합성][5-2` Synthesis]
상기 5-1` 88 g, (2-(methoxycarbonyl)phenyl)boronic acid 51.7 g을 1,4-Dioxane 1000 ml에 녹이고 K2CO3(2M) 430 ml와 Pd(PPh3)4 9.96 g을 넣은 후 환류 교반하였다. TLC로 반응을 확인하고 물을 첨가 후 반응을 종결시켰다. 유기층을 EA로 추출하고 감압여과한 후 컬럼정제하여 중간체 5-2` 71.7 g (수율 69%)를 얻었다.5-1` 88 g and 51.7 g of (2- (methoxycarbonyl) phenyl) boronic acid were dissolved in 1000 ml of 1,4-Dioxane, and 430 ml of K 2 CO 3 (2M) and 9.96 g of Pd (PPh 3 ) 4 were added thereto. After stirring under reflux. The reaction was confirmed by TLC and the reaction was terminated after the addition of water. The organic layer was extracted with EA, filtered under reduced pressure and purified by column to obtain 71.7 g of intermediate 5-2` (yield 69%).
[5-3`의 합성][Synthesis of 5-3`]
상기 5-2` 43 g을 THF 950 ml에 녹인 후 CH3MgBr 39.5 g을 0 ℃에서 천천히 적가하고 온도를 서서히 올린 후 5시간 동안 환류 교반하였다. 유기층을 MC로 추출하고 감압여과하여 중간체 5-3` 26.4 g (수율 66%)를 얻었다.After dissolving 43 g of 5-2 ′ in 950 ml of THF, 39.5 g of CH 3 MgBr was slowly added dropwise at 0 ° C., and gradually heated to reflux for 5 hours. The organic layer was extracted with MC and filtered under reduced pressure to obtain 26.4 g of intermediate 5-3` (yield 66%).
[중간체 5의 합성][Synthesis of Intermediate 5]
상기 5-3` 26 g을 아세트산 260 ml에 녹인 후 염산 1.1 ml를 가한 후 3시간 동안 환류 교반하였다. 반응이 종결된 후 물과 MC로 유기층을 추출하였다. MgSO4로 수분을 제거하고 감압여과한 후 컬럼정제하여 중간체5 19.0 g (수율 77%)을 얻었다.The 5-3` 26 g was dissolved in 260 ml of acetic acid, 1.1 ml of hydrochloric acid was added thereto, and the mixture was stirred under reflux for 3 hours. After the reaction was completed, the organic layer was extracted with water and MC. Water was removed with MgSO 4 , filtered under reduced pressure, and column purified to obtain 19.0 g (77% yield) of intermediate 5.
중간체 6의 합성 Synthesis of Intermediate 6
상기 중간체 5의 합성과 동일한 방법으로 CH3MgBr 대신 PhMgBr을 사용하여 6-3` 32.9 g (수율 79%), 중간체6 24.7 g (수율 80%)을 합성하였다.In the same manner as the synthesis of Intermediate 5, 62.9` 32.9 g (yield 79%) and Intermediate 6 24.7 g (yield 80%) were synthesized using PhMgBr instead of CH 3 MgBr.
중간체 7의 합성Synthesis of Intermediate 7
상기 중간체 1의 합성과 동일한 방법으로 (1-phenyl-1H-indol-3-yl)boronic acid 대신 (1H-indol-3-yl)boronic acid를 사용하고 methyl 4-bromo-2-iodobenzoate 대신 methyl 2-bromobenzoate을 사용하여 7-1` 70.1 g (수율 75%), 3-2` 22.0 g (수율 70%), 중간체7 17.5 g (수율 75%)를 합성하였다.(1H-indol-3-yl) boronic acid instead of (1-phenyl-1H-indol-3-yl) boronic acid and methyl 2 instead of methyl 4-bromo-2-iodobenzoate 7-1` 70.1 g (yield 75%), 3-2` 22.0 g (yield 70%) and intermediate 7 17.5 g (yield 75%) were synthesized using -bromobenzoate.
OP의 합성OP synthesis
목적 화합물 합성을 위해 OP의 준비는 상기 단계를 거쳐 합성하였다.Preparation of OP for synthesis of the desired compound was carried out via the above steps.
하기 OP1의 합성법은 다음과 같다.Synthesis of OP1 below is as follows.
둥근바닥플라스크에 N-phenylnaphthalen-1-amine 10g, 1-bromo-4-iodobenzene 18.0 g, t-BuONa 6.5 g, Pd2(dba)3 1.7 g, (t-Bu)3P 2.6 ml를 톨루엔 100 ml에 녹인 후 50℃ 로 교반하였다. TLC로 반응을 확인하고 물을 첨가 후 반응을 종결하였다. 유기층을 EA로 추출하고 감압여과한 후 컬럼정제하여 중간체 OP1 7.6 g (수율 45%)를 얻었다.In a round bottom flask, 10 g of N-phenylnaphthalen-1-amine, 18.0 g of 1-bromo-4-iodobenzene, 6.5 g of t-BuONa, 1.7 g of Pd 2 (dba) 3 , 2.6 ml of (t-Bu) 3 P toluene 100 It was dissolved in ml and stirred at 50 ° C. The reaction was confirmed by TLC and the reaction was terminated after the addition of water. The organic layer was extracted with EA, filtered under reduced pressure and purified by column to obtain 7.6 g (yield 45%) of intermediate OP1.
상기 OP1 7.5 g bis(pinacolato)diboron 6.62 g, Pd(dppf)Cl2 0.07 g, KOAc 5.9 g을 톨루엔 80 ml에 녹인 후 환류 교반하였다. TLC로 반응을 확인하고 물을 첨가 후 반응을 종결하였다. 유기층을 EA로 추출하고 감압여과한 후 컬럼정제하여 중간체 OP2 6.8g (수율 81%)을 얻었다.6.62 g of OP1 7.5 g bis (pinacolato) diboron, 0.07 g of Pd (dppf) Cl 2 , and 5.9 g of KOAc were dissolved in 80 ml of toluene, followed by stirring under reflux. The reaction was confirmed by TLC and the reaction was terminated after the addition of water. The organic layer was extracted with EA, filtered under reduced pressure and purified by column to obtain 6.8 g of intermediate OP2 (yield 81%).
상기 OP1과 대등과 방법으로 하기 OP2 내지 OP10을 합성하였다.The following OP2 to OP10 were synthesized by the same method as the OP1.
화합물 1의 합성 Synthesis of Compound 1
둥근바닥플라스크에 중간체1 3.0 g, di([1,1'-biphenyl]-4-yl)amine 2.73 g, t-BuONa 1.11 g, Pd2(dba)3 0.28 g, (t-Bu)3P 0.34 ml를 Toluene 50 ml에 녹인 후 환류 교반하였다. TLC로 반응을 확인하고 물을 첨가 후 반응을 종결하였다. 유기층을 EA로 추출하고 감압여과한 후 컬럼정제하여 화합물1 3.06 g (수율 63%)를 얻었다.In a round bottom flask, Intermediate 1 3.0 g, di ([1,1'-biphenyl] -4-yl) amine 2.73 g, t-BuONa 1.11 g, Pd 2 (dba) 3 0.28 g, (t-Bu) 3 P 0.34 ml was dissolved in 50 ml of Toluene and stirred under reflux. The reaction was confirmed by TLC and the reaction was terminated after the addition of water. The organic layer was extracted with EA, filtered under reduced pressure and purified by column to obtain 3.06 g (yield 63%) of compound 1.
m/z: 628.29 (100.0%), 629.29 (51.2%), 630.29 (13.0%), 631.30 (2.1%)m / z: 628.29 (100.0%), 629.29 (51.2%), 630.29 (13.0%), 631.30 (2.1%)
화합물 2의 합성Synthesis of Compound 2
di([1,1'-biphenyl]-4-yl)amine을 N-([1,1'-biphenyl]-4-yl)-9,9-dimethyl-9H-fluoren-2-amine으로 반응한 것을 제외하고는 화합물1과 동일한 방법으로 화합물 2를 합성하였다. (수율 66%)Reaction of di ([1,1'-biphenyl] -4-yl) amine with N-([1,1'-biphenyl] -4-yl) -9,9-dimethyl-9H-fluoren-2-amine Except that Compound 2 was synthesized in the same manner as Compound 1. (66% yield)
m/z: 668.32 (100.0%), 669.32 (54.8%), 670.33 (14.6%), 671.33 (2.5%)m / z: 668.32 (100.0%), 669.32 (54.8%), 670.33 (14.6%), 671.33 (2.5%)
화합물 3의 합성Synthesis of Compound 3
둥근바닥플라스크에 중간체1 3.0 g, OP2 4.85 g 1,4-dioxan 60 ml에 녹이고 K2CO3(2M) 12 ml와 Pd(PPh3)4 0.27 g을 넣은 후 환류 교반하였다. TLC로 반응을 확인하고 물을 첨가 후 반응을 종결시켰다. 유기층을 MC로 추출하고 감압여과한 후 컬럼정제하여 화합물3 3.87 g (수율 71%)를 얻었다.In a round bottom flask, intermediate 1 3.0 g, OP2 4.85 g 1,4-dioxan was dissolved in 60 ml, 12 ml of K 2 CO 3 (2M) and 0.27 g of Pd (PPh 3 ) 4 were added thereto, and the mixture was stirred under reflux. The reaction was confirmed by TLC and the reaction was terminated after the addition of water. The organic layer was extracted with MC, filtered under reduced pressure and purified by column to obtain 3.87 g (yield 71%) of compound 3.
m/z: 704.32 (100.0%), 705.32 (58.1%), 706.33 (16.4%), 707.33 (3.0%)m / z: 704.32 (100.0%), 705.32 (58.1%), 706.33 (16.4%), 707.33 (3.0%)
화합물 4의 합성Synthesis of Compound 4
OP2를 OP3으로 반응한 것을 제외하고는 화합물 3과 동일한 방법으로 화합물 4를 합성하였다. (수율 67%)Compound 4 was synthesized in the same manner as Compound 3, except that OP2 was reacted with OP3. (Yield 67%)
m/z: 744.35 (100.0%), 745.35 (61.3%), 746.36 (18.3%), 747.36 (3.6%)m / z: 744.35 (100.0%), 745.35 (61.3%), 746.36 (18.3%), 747.36 (3.6%)
화합물 5의 합성Synthesis of Compound 5
OP2를 OP1로 반응한 것을 제외하고는 화합물 3과 동일한 방법으로 화합물 5를 합성하였다. (수율 70%)Compound 5 was synthesized in the same manner as Compound 3, except that OP2 was reacted with OP1. (Yield 70%)
m/z: 602.27 (100.0%), 603.28 (49.1%), 604.28 (11.8%), 605.28 (1.9%)m / z: 602.27 (100.0%), 603.28 (49.1%), 604.28 (11.8%), 605.28 (1.9%)
화합물 6의 합성Synthesis of Compound 6
OP2를 OP4로 반응한 것을 제외하고는 화합물3과 동일한 방법으로 화합물6을 합성하였다. (수율 73%)Compound 6 was synthesized in the same manner as in compound 3, except that OP2 was reacted with OP4. (73% yield)
m/z: 704.32 (100.0%), 705.32 (58.1%), 706.33 (16.4%), 707.33 (3.0%)m / z: 704.32 (100.0%), 705.32 (58.1%), 706.33 (16.4%), 707.33 (3.0%)
화합물 7의 합성Synthesis of Compound 7
OP2를 OP5로 반응한 것을 제외하고는 화합물 3과 동일한 방법으로 화합물 7을 합성하였다. (수율 63%)Compound 7 was synthesized in the same manner as in compound 3, except that OP2 was reacted with OP5. (63% yield)
m/z: 704.32 (100.0%), 705.32 (58.1%), 706.33 (16.4%), 707.33 (3.0%)m / z: 704.32 (100.0%), 705.32 (58.1%), 706.33 (16.4%), 707.33 (3.0%)
화합물 8의 합성Synthesis of Compound 8
OP2를 OP6로 반응한 것을 제외하고는 화합물 3과 동일한 방법으로 화합물 8을 합성하였다. (수율 67%)Compound 8 was synthesized in the same manner as in compound 3, except that OP2 was reacted with OP6. (Yield 67%)
m/z: 704.32 (100.0%), 705.32 (58.1%), 706.33 (16.4%), 707.33 (3.0%)m / z: 704.32 (100.0%), 705.32 (58.1%), 706.33 (16.4%), 707.33 (3.0%)
화합물 9의 합성Synthesis of Compound 9
중간체1을 중간체2로 반응한 것을 제외하고는 화합물 3과 동일한 방법으로 화합물 9를 합성하였다. (수율 75%)Compound 9 was synthesized in the same manner as in compound 3, except that intermediate 1 was reacted with intermediate 2. (75% yield)
m/z: 828.35 (100.0%), 829.35 (68.9%), 830.36 (23.2%), 831.36 (5.1%)m / z: 828.35 (100.0%), 829.35 (68.9%), 830.36 (23.2%), 831.36 (5.1%)
화합물 10의 합성Synthesis of Compound 10
OP2를 OP3으로 반응한 것을 제외하고는 화합물 9와 동일한 방법으로 화합물 10을 합성하였다. (수율 69%) Compound 10 was synthesized in the same manner as Compound 9, except that OP2 was reacted with OP3. (Yield 69%)
m/z: 868.38 (100.0%), 869.39 (71.9%), 870.39 (25.5%), 871.39 (6.1%), 872.40 (1.0%)m / z: 868.38 (100.0%), 869.39 (71.9%), 870.39 (25.5%), 871.39 (6.1%), 872.40 (1.0%)
화합물 11의 합성Synthesis of Compound 11
중간체1을 중간체3로 반응하고 OP2를 OP6으로 반응한 것을 제외하고는 화합물 3과 동일한 방법으로 화합물 11을 합성하였다. (수율 61%)Compound 11 was synthesized in the same manner as in compound 3, except that intermediate 1 was reacted with intermediate 3, and OP2 was reacted with OP6. (Yield 61%)
m/z: 704.32 (100.0%), 705.32 (58.1%), 706.33 (16.4%), 707.33 (3.0%)m / z: 704.32 (100.0%), 705.32 (58.1%), 706.33 (16.4%), 707.33 (3.0%)
화합물 12의 합성Synthesis of Compound 12
OP6를 OP7으로 반응한 것을 제외하고는 화합물 11과 동일한 방법으로 화합물 12를 합성하였다. (수율 64%)Compound 12 was synthesized in the same manner as Compound 11, except that OP6 was reacted with OP7. (64% yield)
m/z: 744.35 (100.0%), 745.35 (61.3%), 746.36 (18.3%), 747.36 (3.6%)m / z: 744.35 (100.0%), 745.35 (61.3%), 746.36 (18.3%), 747.36 (3.6%)
화합물 13의 합성Synthesis of Compound 13
OP6를 OP10으로 반응한 것을 제외하고는 화합물 11과 동일한 방법으로 화합물 13을 합성하였다. (수율 69%)Compound 13 was synthesized in the same manner as Compound 11, except that OP6 was reacted with OP10. (Yield 69%)
m/z: 668.32 (100.0%), 669.32 (54.8%), 670.33 (14.6%), 671.33 (2.5%)m / z: 668.32 (100.0%), 669.32 (54.8%), 670.33 (14.6%), 671.33 (2.5%)
화합물 14의 합성Synthesis of Compound 14
중간체1을 중간체5로 반응한 것을 제외하고는 화합물 1과 동일한 방법으로 화합물 14를 합성하였다. (수율 70%) Compound 14 was synthesized in the same manner as in compound 1, except that intermediate 1 was reacted with intermediate 5. (Yield 70%)
m/z: 628.29 (100.0%), 629.29 (51.2%), 630.29 (13.0%), 631.30 (2.1%)m / z: 628.29 (100.0%), 629.29 (51.2%), 630.29 (13.0%), 631.30 (2.1%)
화합물 15의 합성Synthesis of Compound 15
di([1,1'-biphenyl]-4-yl)amine을 N-([1,1'-biphenyl]-4-yl)-9,9-dimethyl-9H-fluoren-2-amine으로 반응한 것을 제외하고는 화합물 14와 동일한 방법으로 화합물 15를 합성하였다. (수율 63%)Reaction of di ([1,1'-biphenyl] -4-yl) amine with N-([1,1'-biphenyl] -4-yl) -9,9-dimethyl-9H-fluoren-2-amine Except that Compound 15 was synthesized in the same manner as Compound 14. (63% yield)
m/z: 668.32 (100.0%), 669.32 (54.8%), 670.33 (14.6%), 671.33 (2.5%)m / z: 668.32 (100.0%), 669.32 (54.8%), 670.33 (14.6%), 671.33 (2.5%)
화합물 16의 합성Synthesis of Compound 16
중간체1을 중간체5로 반응한 것을 제외하고는 화합물 3과 동일한 방법으로 화합물 16을 합성하였다. (수율 66%) Compound 16 was synthesized in the same manner as in compound 3, except that intermediate 1 was reacted with intermediate 5. (66% yield)
m/z: 704.32 (100.0%), 705.32 (58.1%), 706.33 (16.4%), 707.33 (3.0%)m / z: 704.32 (100.0%), 705.32 (58.1%), 706.33 (16.4%), 707.33 (3.0%)
화합물 17의 합성Synthesis of Compound 17
OP2를 OP3으로 반응한 것을 제외하고는 화합물 16과 동일한 방법으로 화합물 17을 합성하였다. (수율 60%)Compound 17 was synthesized in the same manner as Compound 16, except that OP2 was reacted with OP3. (Yield 60%)
m/z: 744.35 (100.0%), 745.35 (61.3%), 746.36 (18.3%), 747.36 (3.6%)m / z: 744.35 (100.0%), 745.35 (61.3%), 746.36 (18.3%), 747.36 (3.6%)
화합물 18의 합성Synthesis of Compound 18
중간체1을 중간체6으로 반응한 것을 제외하고는 화합물 3과 동일한 방법으로 화합물 18을 합성하였다. (수율 65%)Compound 18 was synthesized in the same manner as Compound 3, except that Intermediate 1 was reacted with Intermediate 6. (Yield 65%)
m/z: 828.35 (100.0%), 829.35 (68.9%), 830.36 (23.2%), 831.36 (5.1%)m / z: 828.35 (100.0%), 829.35 (68.9%), 830.36 (23.2%), 831.36 (5.1%)
화합물 19의 합성Synthesis of Compound 19
OP2를 OP3으로 반응한 것을 제외하고는 화합물 18과 동일한 방법으로 화합물 19를 합성하였다. (수율 69%)Compound 19 was synthesized in the same manner as Compound 18, except that OP2 was reacted with OP3. (Yield 69%)
m/z: 868.38 (100.0%), 869.39 (71.9%), 870.39 (25.5%), 871.39 (6.1%), 872.40 (1.0%)m / z: 868.38 (100.0%), 869.39 (71.9%), 870.39 (25.5%), 871.39 (6.1%), 872.40 (1.0%)
화합물 20의 합성Synthesis of Compound 20
중간체1을 중간체3로 반응한 것을 제외하고는 화합물 3과 동일한 방법으로 화합물 20을 합성하였다. (수율 59%)Compound 20 was synthesized in the same manner as in compound 3, except that intermediate 1 was reacted with intermediate 3. (Yield 59%)
m/z: 704.32 (100.0%), 705.32 (58.1%), 706.33 (16.4%), 707.33 (3.0%)m / z: 704.32 (100.0%), 705.32 (58.1%), 706.33 (16.4%), 707.33 (3.0%)
화합물 21의 합성Synthesis of Compound 21
중간체1을 중간체3로 반응한 것을 제외하고는 화합물 4와 동일한 방법으로 화합물 21을 합성하였다. (수율 63%)Compound 21 was synthesized in the same manner as Compound 4, except that Intermediate 1 was reacted with Intermediate 3. (63% yield)
m/z: 744.35 (100.0%), 745.35 (61.3%), 746.36 (18.3%), 747.36 (3.6%)m / z: 744.35 (100.0%), 745.35 (61.3%), 746.36 (18.3%), 747.36 (3.6%)
화합물 22의 합성Synthesis of Compound 22
OP2를 OP11로 반응한 것을 제외하고는 화합물 3과 동일한 방법으로 화합물 22를 합성하였다. (수율 60%)Compound 22 was synthesized in the same manner as Compound 3, except that OP2 was reacted with OP11. (Yield 60%)
m/z: 780.35 (100.0%), 781.35 (64.6%), 782.36 (20.3%), 783.36 (4.2%)m / z: 780.35 (100.0%), 781.35 (64.6%), 782.36 (20.3%), 783.36 (4.2%)
화합물 23의 합성Synthesis of Compound 23
OP2를 OP12로 반응한 것을 제외하고는 화합물 3과 동일한 방법으로 화합물 23을 합성하였다. (수율 65%)Compound 23 was synthesized in the same manner as Compound 3, except that OP2 was reacted with OP12. (Yield 65%)
m/z: 820.38 (100.0%), 821.39 (67.6%), 822.39 (22.5%), 823.39 (5.1%)m / z: 820.38 (100.0%), 821.39 (67.6%), 822.39 (22.5%), 823.39 (5.1%)
화합물 24의 합성Synthesis of Compound 24
OP2를 OP13으로 반응한 것을 제외하고는 화합물 3과 동일한 방법으로 화합물 24를 합성하였다. (수율 58%)Compound 24 was synthesized in the same manner as in compound 3, except that OP2 was reacted with OP13. (Yield 58%)
m/z: 820.38 (100.0%), 821.39 (67.6%), 822.39 (22.5%), 823.39 (5.1%)m / z: 820.38 (100.0%), 821.39 (67.6%), 822.39 (22.5%), 823.39 (5.1%)
화합물 25의 합성Synthesis of Compound 25
중간체1을 중간체7로 di([1,1'-biphenyl]-4-yl)amine 대신 N,N-di([1,1'-biphenyl]-4-yl)-4'-bromo-[1,1'-biphenyl]-4-amine로 반응한 것을 제외하고는 화합물 1과 동일한 방법으로 화합물 25를 합성하였다. (수율 55%)Intermediate 1 as intermediate 7 N, N-di ([1,1'-biphenyl] -4-yl) -4'-bromo- [1 instead of di ([1,1'-biphenyl] -4-yl) amine Compound 25 was synthesized in the same manner as in compound 1 except for reacting with 1′-biphenyl] -4-amine. (Yield 55%)
m/z: 704.32 (100.0%), 705.32 (58.1%), 706.33 (16.4%), 707.33 (3.0%)m / z: 704.32 (100.0%), 705.32 (58.1%), 706.33 (16.4%), 707.33 (3.0%)
화합물 26의 합성Synthesis of Compound 26
di([1,1'-biphenyl]-4-yl)amine 대신 N-([1,1'-biphenyl]-4-yl)-N-(4'-bromo-[1,1'-biphenyl]-4-yl)-9,9-dimethyl-9H-fluoren-2-amine로 반응한 것을 제외하고는 화합물 25와 동일한 방법으로 화합물 26을 합성하였다. (수율 52%)N-([1,1'-biphenyl] -4-yl) -N- (4'-bromo- [1,1'-biphenyl] instead of di ([1,1'-biphenyl] -4-yl) amine Compound 26 was synthesized in the same manner as Compound 25 except for reacting with -4-yl) -9,9-dimethyl-9H-fluoren-2-amine. (Yield 52%)
m/z: 744.35 (100.0%), 745.35 (61.3%), 746.36 (18.3%), 747.36 (3.6%)m / z: 744.35 (100.0%), 745.35 (61.3%), 746.36 (18.3%), 747.36 (3.6%)
화합물 27의 합성Synthesis of Compound 27
di([1,1'-biphenyl]-4-yl)amine 대신 N,N-di([1,1'-biphenyl]-4-yl)-7-bromo-9,9-dimethyl-9H-fluoren-2-amine로 반응한 것을 제외하고는 화합물 25와 동일한 방법으로 화합물 27을 합성하였다. (수율 50%)N, N-di ([1,1'-biphenyl] -4-yl) -7-bromo-9,9-dimethyl-9H-fluoren instead of di ([1,1'-biphenyl] -4-yl) amine Except for reacting with 2-amine, Compound 27 was synthesized in the same manner as Compound 25. (50% yield)
m/z: 744.35 (100.0%), 745.35 (61.3%), 746.36 (18.3%), 747.36 (3.6%)m / z: 744.35 (100.0%), 745.35 (61.3%), 746.36 (18.3%), 747.36 (3.6%)
유기발광소자의 제조Fabrication of Organic Light Emitting Diode
도 1에 기재된 구조에 따라 유기발광소자를 제조하였다. 유기발광소자는 아래로부터 정공주입전극(11)/정공주입층(12)/정공수송층(13)/발광층(14)/전자전달층(15)/전자주입전극(16) 순으로 적층되어 있다.An organic light emitting device was manufactured according to the structure of FIG. 1. The organic light emitting element is stacked in the order of the hole injection electrode 11 / hole injection layer 12 / hole transport layer 13 / light emitting layer 14 / electron transfer layer 15 / electron injection electrode 16 from below.
실시예 및 비교예의 정공주입층(12), 정공전달층(13), 발광층(14), 전자전달층(15)는 아래과 같은 물질을 사용하였다.The hole injection layer 12, the hole transport layer 13, the light emitting layer 14, and the electron transport layer 15 of Examples and Comparative Examples used the following materials.
유기발광소자의 제조Fabrication of Organic Light Emitting Diode
실시예 1Example 1
인듐틴옥사이드(ITO)가 1500Å 두께가 박막 코팅된 유리 기판을 증류수 초음파로 세척하였다. 증류수 세척이 끝나면 이소프로필알코올, 아세톤, 메탄올 등의 용제로 초음파 세척을 하고 건조시킨 후 플라즈마 세정기로 이송 시킨 다음 산소 플라즈마를 이용하여 상기 기판을 5분간 세정 한 후 ITO 기판 상부에 열 진공 증착기(thermal evaporator)를 이용하여 정공주입층 HT01 600Å, 정공수송층으로 화합물1 250Å 를 제막하였다. 다음으로 상기 발광층으로 BH01:BD01 5%로 도핑하여 300 Å 제막하였다. 다음으로 전자전달층으로 Alq3:Liq(1:1) 300 Å 제막한 후 Liq 10 Å , 알루미늄(Al) 1000 Å 제막하고, 이 소자를 글로브 박스에서 밀봉(Encapsulation)함으로써 유기발광소자를 제작하였다.An indium tin oxide (ITO) 1500 Å thick thin glass substrate was washed with distilled water ultrasonic waves. After washing the distilled water, ultrasonic cleaning with a solvent such as isopropyl alcohol, acetone, methanol, etc., dried and transferred to a plasma cleaner, and then cleaned the substrate using oxygen plasma for 5 minutes and then a thermal vacuum evaporator Compound 1 250 Hz was formed into a hole injection layer HT01 600 Hz and a hole transport layer using the evaporator. Next, the light emitting layer was doped with 5% of BH01: BD01 to form 300 Å. Next, Alq3: Liq (1: 1) 300 Å was formed into an electron transport layer, followed by Liq 10 Å and aluminum (Al) 1000 막.
실시예 2 내지 실시예 27Examples 2 to 27
실시예 1과 같은 방법으로 정공주입층 및 정공전달층을 각각 화합물 2 내지 27을 사용하여 제막한 유기발광소자를 제작하였다.In the same manner as in Example 1, an organic light emitting diode was manufactured in which the hole injection layer and the hole transport layer were formed using the compounds 2 to 27, respectively.
실시예 28 Example 28
인듐틴옥사이드(ITO)가 1500 Å 두께가 박막 코팅된 유리 기판을 증류수 초음파로 세척하였다. 증류수 세척이 끝나면 이소프로필알코올, 아세톤, 메탄올 등의 용제로 초음파 세척을 하고 건조시킨 후 플라즈마 세정기로 이송시킨 다음 산소 플라즈마를 이용하여 상기 기판을 5분간 세정 한 후 ITO 기판 상부에 열 진공 증착기(thermal evaporator)를 이용하여 정공주입층 HT01 600 Å, 제1정공수송층으로 화합물1 240 Å 및 제2정공수송층으로 화합물25 10 Å 제막하였다. 다음으로 상기 발광층으로 BH01:BD01 5%로 도핑하여 300 Å 제막하였다. 다음으로 전자전달층으로 Alq3:Liq(1:1) 300 Å 제막한 후 Liq 10Å, 알루미늄(Al) 1000 Å 제막하고, 이 소자를 글로브박스에서 밀봉(Encapsulation)함으로써 유기발광소자를 제작하였다.A glass substrate coated with an indium tin oxide (ITO) 1500 Å thick thin film was washed by distilled water ultrasonically. After washing the distilled water, ultrasonic cleaning with a solvent such as isopropyl alcohol, acetone, methanol, etc., dried and transferred to a plasma cleaner, and then cleaned the substrate using oxygen plasma for 5 minutes and then a thermal vacuum evaporator (thermal A hole injection layer HT01 600 Å, Compound 1 240 Å for the first hole transport layer and Compound 25 10 으로 for the second hole transport layer were formed using an evaporator. Next, the light emitting layer was doped with 5% of BH01: BD01 to form 300 Å. Next, Alq3: Liq (1: 1) 300 Å was formed into an electron transport layer, followed by Liq 10 Å and aluminum (Al) 1000 막. The organic light emitting device was fabricated by encapsulating the device in a glove box.
실시예 29 Example 29
실시예 28과 같은 방법으로 제2정공수송층으로 화합물 26으로 제막한 유기발광소자를 제작하였다.In the same manner as in Example 28, an organic light emitting diode obtained by forming a compound 26 into a second hole transport layer was fabricated.
실시예 30Example 30
실시예 28과 같은 방법으로 제2정공수송층으로 화합물 27로 제막한 유기발광소자를 제작하였다. In the same manner as in Example 28, an organic light emitting diode obtained by forming a compound 27 into a second hole transport layer was manufactured.
비교예 1 Comparative Example 1
상기 실시예 1의 정공전달층을 NPB로 사용한 것을 제외하고는 동일한 방법으로 소자를 제작하였다.A device was manufactured in the same manner as in Example 1, except that the hole transport layer of Example 1 was used as an NPB.
비교예 2Comparative Example 2
상기 실시예 1의 정공전달층을 Ref.1로 사용한 것을 제외하고는 동일한 방법으로 소자를 제작하였다.A device was manufactured in the same manner as in Example 1, except that the hole transport layer of Ref. 1 was used.
비교예 3 Comparative Example 3
상기 실시예 1의 정공전달층을 Ref.2로 사용한 것을 제외하고는 동일한 방법으로 소자를 제작하였다.A device was manufactured in the same manner as in Example 1, except that the hole transport layer of Ref. 2 was used.
비교예 4Comparative Example 4
상기 실시예 1의 정공전달층을 Ref.3으로 사용한 것을 제외하고는 동일한 방법으로 소자를 제작하였다.A device was manufactured in the same manner as in Example 1, except that the hole transport layer of Ref. 3 was used.
비교예 5Comparative Example 5
상기 실시예 1의 정공전달층을 Ref.4로 사용한 것을 제외하고는 동일한 방법으로 소자를 제작하였다.A device was manufactured in the same manner as in Example 1, except that the hole transport layer of Ref. 4 was used.
유기발광소자의 성능평가Performance Evaluation of Organic Light Emitting Diode
키슬리 2400 소스 메져먼트 유닛(Kiethley 2400 source measurement unit) 으로 전압을 인가하여 전자 및 정공을 주입하고 코니카 미놀타(Konica Minolta) 분광복사계(CS-2000)를 이용하여 빛이 방출될 때의 휘도를 측정함으로써, 실시예 및 비교예의 유기발광소자의 성능을 인가전압에 대한 전류 밀도 및 휘도를 대기압 조건하에 측정하여 평가하였으며, 그 결과를 표 1에 나타내었다.Inject electrons and holes by applying voltage to a Keithley 2400 source measurement unit and measure the luminance when light is emitted using the Konica Minolta Spectroradiometer (CS-2000) Thus, the performance of the organic light emitting diodes of Examples and Comparative Examples was evaluated by measuring the current density and luminance with respect to the applied voltage under atmospheric pressure conditions, and the results are shown in Table 1.
표 1
Table 1
Op. V | mA/cm2 | Cd/A | lm/w | CIEx | CIEy | LT95(hr) | |
실시예1 | 4.05 | 10 | 6.49 | 5.02 | 0.141 | 0.112 | 44 |
실시예2 | 4.03 | 10 | 6.45 | 5.00 | 0.141 | 0.112 | 45 |
실시예3 | 3.91 | 10 | 6.65 | 5.25 | 0.142 | 0.111 | 55 |
실시예4 | 3.90 | 10 | 6.82 | 5.30 | 0.139 | 0.111 | 60 |
실시예5 | 3.92 | 10 | 6.63 | 5.95 | 0.138 | 0.110 | 48 |
실시예6 | 3.92 | 10 | 6.60 | 5.40 | 0.140 | 0.111 | 50 |
실시예7 | 3.90 | 10 | 6.70 | 5.90 | 0.140 | 0.110 | 52 |
실시예8 | 3.90 | 10 | 6.70 | 5.27 | 0.140 | 0.110 | 47 |
실시예9 | 3.93 | 10 | 6.73 | 5.40 | 0.138 | 0.112 | 45 |
실시예10 | 3.87 | 10 | 6.89 | 5.29 | 0.141 | 0.111 | 53 |
실시예11 | 3.93 | 10 | 6.75 | 5.35 | 0.142 | 0.111 | 46 |
실시예12 | 3.90 | 10 | 6.90 | 5.35 | 0.141 | 0.111 | 58 |
실시예13 | 3.92 | 10 | 6.80 | 5.90 | 0.140 | 0.111 | 50 |
실시예14 | 4.05 | 10 | 6.51 | 5.42 | 0.140 | 0.110 | 43 |
실시예15 | 4.02 | 10 | 6.49 | 5.85 | 0.140 | 0.110 | 45 |
실시예16 | 3.92 | 10 | 6.69 | 5.29 | 0.141 | 0.111 | 50 |
실시예17 | 3.89 | 10 | 6.87 | 5.35 | 0.142 | 0.111 | 55 |
실시예18 | 3.90 | 10 | 6.80 | 5.35 | 0.141 | 0.111 | 49 |
실시예19 | 3.92 | 10 | 6.88 | 5.90 | 0.140 | 0.111 | 52 |
실시예20 | 3.92 | 10 | 6.71 | 5.42 | 0.140 | 0.110 | 55 |
실시예21 | 3.90 | 10 | 6.91 | 5.85 | 0.140 | 0.110 | 61 |
실시예22 | 3.94 | 10 | 6.69 | 5.29 | 0.141 | 0.111 | 50 |
실시예23 | 3.95 | 10 | 6.85 | 5.35 | 0.142 | 0.111 | 57 |
실시예24 | 3.93 | 10 | 6.83 | 5.35 | 0.141 | 0.111 | 55 |
실시예25 | 4.05 | 10 | 6.80 | 5.90 | 0.140 | 0.111 | 53 |
실시예26 | 4.02 | 10 | 6.72 | 5.42 | 0.140 | 0.110 | 49 |
실시예27 | 4.02 | 10 | 6.70 | 5.85 | 0.140 | 0.110 | 52 |
실시예28 | 3.83 | 10 | 7.11 | 6.12 | 0.140 | 0.109 | 65 |
실시예29 | 3.84 | 10 | 7.00 | 6.04 | 0.140 | 0.110 | 62 |
실시예30 | 3.85 | 10 | 7.05 | 6.10 | 0.140 | 0.110 | 62 |
비교예1 | 5.03 | 10 | 5.35 | 4.24 | 0.143 | 0.120 | 13 |
비교예2 | 5.12 | 10 | 5.18 | 4.11 | 0.145 | 0.121 | 8 |
비교예3 | 5.21 | 10 | 5.28 | 4.35 | 0.141 | 0.113 | 10 |
비교예4 | 5.50 | 10 | 5.04 | 4.02 | 0.141 | 0.115 | 19 |
비교예5 | 5.01 | 10 | 5.47 | 4.44 | 0.141 | 0.113 | 23 |
Op. V | mA / cm2 | Cd / A | lm / w | CIEx | CIEy | LT95 (hr) | |
Example 1 | 4.05 | 10 | 6.49 | 5.02 | 0.141 | 0.112 | 44 |
Example 2 | 4.03 | 10 | 6.45 | 5.00 | 0.141 | 0.112 | 45 |
Example 3 | 3.91 | 10 | 6.65 | 5.25 | 0.142 | 0.111 | 55 |
Example 4 | 3.90 | 10 | 6.82 | 5.30 | 0.139 | 0.111 | 60 |
Example 5 | 3.92 | 10 | 6.63 | 5.95 | 0.138 | 0.110 | 48 |
Example 6 | 3.92 | 10 | 6.60 | 5.40 | 0.140 | 0.111 | 50 |
Example 7 | 3.90 | 10 | 6.70 | 5.90 | 0.140 | 0.110 | 52 |
Example 8 | 3.90 | 10 | 6.70 | 5.27 | 0.140 | 0.110 | 47 |
Example 9 | 3.93 | 10 | 6.73 | 5.40 | 0.138 | 0.112 | 45 |
Example 10 | 3.87 | 10 | 6.89 | 5.29 | 0.141 | 0.111 | 53 |
Example 11 | 3.93 | 10 | 6.75 | 5.35 | 0.142 | 0.111 | 46 |
Example 12 | 3.90 | 10 | 6.90 | 5.35 | 0.141 | 0.111 | 58 |
Example 13 | 3.92 | 10 | 6.80 | 5.90 | 0.140 | 0.111 | 50 |
Example 14 | 4.05 | 10 | 6.51 | 5.42 | 0.140 | 0.110 | 43 |
Example 15 | 4.02 | 10 | 6.49 | 5.85 | 0.140 | 0.110 | 45 |
Example 16 | 3.92 | 10 | 6.69 | 5.29 | 0.141 | 0.111 | 50 |
Example 17 | 3.89 | 10 | 6.87 | 5.35 | 0.142 | 0.111 | 55 |
Example 18 | 3.90 | 10 | 6.80 | 5.35 | 0.141 | 0.111 | 49 |
Example 19 | 3.92 | 10 | 6.88 | 5.90 | 0.140 | 0.111 | 52 |
Example 20 | 3.92 | 10 | 6.71 | 5.42 | 0.140 | 0.110 | 55 |
Example 21 | 3.90 | 10 | 6.91 | 5.85 | 0.140 | 0.110 | 61 |
Example 22 | 3.94 | 10 | 6.69 | 5.29 | 0.141 | 0.111 | 50 |
Example 23 | 3.95 | 10 | 6.85 | 5.35 | 0.142 | 0.111 | 57 |
Example 24 | 3.93 | 10 | 6.83 | 5.35 | 0.141 | 0.111 | 55 |
Example 25 | 4.05 | 10 | 6.80 | 5.90 | 0.140 | 0.111 | 53 |
Example 26 | 4.02 | 10 | 6.72 | 5.42 | 0.140 | 0.110 | 49 |
Example 27 | 4.02 | 10 | 6.70 | 5.85 | 0.140 | 0.110 | 52 |
Example 28 | 3.83 | 10 | 7.11 | 6.12 | 0.140 | 0.109 | 65 |
Example 29 | 3.84 | 10 | 7.00 | 6.04 | 0.140 | 0.110 | 62 |
Example 30 | 3.85 | 10 | 7.05 | 6.10 | 0.140 | 0.110 | 62 |
Comparative Example 1 | 5.03 | 10 | 5.35 | 4.24 | 0.143 | 0.120 | 13 |
Comparative Example 2 | 5.12 | 10 | 5.18 | 4.11 | 0.145 | 0.121 | 8 |
Comparative Example 3 | 5.21 | 10 | 5.28 | 4.35 | 0.141 | 0.113 | 10 |
Comparative Example 4 | 5.50 | 10 | 5.04 | 4.02 | 0.141 | 0.115 | 19 |
Comparative Example 5 | 5.01 | 10 | 5.47 | 4.44 | 0.141 | 0.113 | 23 |
상기 표 1에 나타나는 바와 같이 본 발명의 실시예 1 내지 30은 비교예 1 내지 5에 비하여 모든 면에서 물성이 우수함을 확인할 수 있다. 이는 본 발명의 화학식 1로 표시되는 화합물이 발광층내 전자를 효과적으로 차단할 수 있도록 높은 LUMO를 가지며 및 아릴아민기 치환으로 정공주입이 원활한 HOMO를 형성하고, 또한 우수한 홀 모빌리티로 인해 효율 및 수명 향상에 큰 영향을 준 것을 알 수 있으며, 또한 본 발명의 화학식 1로 표시되는 화합물이 가지고 있는 4환구조가 정공 주입이 원활한 HOMO를 형성할 수 있고, 홀 모빌리티 또한 뛰어나 구동전압이 현저히 낮고 고효율인 것을 알 수 있다.As shown in Table 1, Examples 1 to 30 of the present invention can be confirmed that the physical properties are excellent in all aspects compared to Comparative Examples 1 to 5. The compound represented by Chemical Formula 1 of the present invention has a high LUMO to effectively block electrons in the light emitting layer, and the hole injection is smoothly formed by arylamine group substitution, and the hole mobility is greatly improved due to excellent hole mobility. In addition, the tetracyclic structure of the compound represented by the formula (1) of the present invention can be seen that the hole injection can be formed smoothly HOMO, hole mobility is also excellent, it is seen that the driving voltage is significantly low and high efficiency have.
본 발명의 화합물은 정공주입이 용이한 HOMO 에너지 레벨을 가지며, 전자를 차단할 수 있는 높은 LUMO 에너지 레벨을 가지며, 정공수송 특성이 우수하고, 유기발광소자의 정공주입층, 정공수송층 또는 정공수송보조층에 적용시 우수한 저전압, 고효율, 높은 Tg로 인한 안정성 및 장수명을 가지게 할 수 있다.The compound of the present invention has a HOMO energy level that is easy to inject holes, has a high LUMO energy level that can block electrons, excellent hole transport characteristics, hole injection layer, hole transport layer or hole transport auxiliary layer of the organic light emitting device It can have stability and long life due to excellent low voltage, high efficiency and high Tg.
Claims (7)
- 하기 화학식 1로 표시되는 화합물:Compound represented by the following formula (1):[화학식 1][Formula 1]상기 화학식 1에서,In Chemical Formula 1,수소, 중수소, 할로겐, 아미노기, 니트릴기, 니트로기 또는 C1-30의 알킬기이며, Hydrogen, deuterium, halogen, amino, nitrile, nitro or C 1-30 alkyl;Ar은 각각 독립적으로 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C6-50의 아릴기; 또는 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-50의 헤테로아릴기이고,Ar each independently represents a C 6-50 aryl group which is optionally substituted with deuterium, halogen, amino group, nitrile group, nitro group; Or a C 2-50 heteroaryl group unsubstituted or substituted with deuterium, a halogen, an amino group, a nitrile group, a nitro group,R1 및 R2는 각각 독립적으로 수소; 중수소; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C1-30의 알킬기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-30의 알케닐기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-30의 알키닐기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C1-30의 알콕시기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C6-30의 아릴옥시기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C6-50의 아릴기; 또는 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-50의 헤테로아릴기이며, R1 및 R2는 서로 고리를 형성할 수 있으며, R 1 and R 2 are each independently hydrogen; heavy hydrogen; C 1-30 alkyl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; C 2-30 alkenyl groups unsubstituted or substituted with deuterium, halogen, amino, nitrile, and nitro groups; C 2-30 alkynyl group which is unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; A C 1-30 alkoxy group unsubstituted or substituted with deuterium, halogen, amino, nitrile or nitro group; C 6-30 aryloxy group which is unsubstituted or substituted with deuterium, halogen, amino, nitrile or nitro group; C 6-50 aryl group which is optionally substituted with deuterium, halogen, amino group, nitrile group, nitro group; Or a C 2-50 heteroaryl group unsubstituted or substituted with deuterium, a halogen, an amino group, a nitrile group, a nitro group, R 1 and R 2 may form a ring with each other,l, m, n은 각각 독립적으로 0 내지 3의 정수이며, l, m, n 중 적어도 하나는 0이 아니며,l, m, n are each independently an integer of 0 to 3, at least one of l, m, n is not 0,o, p, q는 각각 독립적으로 0 내지 4의 정수이다.o, p, q are each independently an integer of 0-4.
- 제1항에 있어서,The method of claim 1,m, n 중 적어도 하나는 0이 아닌 것을 특징으로 하는 화합물:at least one of m and n is non-zero:
- 제1항에 있어서,The method of claim 1,하기 화학식 1-1 내지 1-3 중 어느 하나로 표시되는 것을 특징으로 하는 화합물:Compounds characterized in that represented by any one of the formula 1-1 to 1-3:[화학식 1-1][Formula 1-1][화학식 1-2][Formula 1-2][화학식 1-3][Formula 1-3]상기 화학식들에서 Ar, R1, R2, o, p 및 q는 화학식 1에서 정의한 바와 같다.Ar, R 1 , R 2 , o, p and q in the above formula are as defined in formula (1).
- 하기 반응식 1로 표시되는 화학식 1의 제조방법:The preparation method of Chemical Formula 1 represented by Scheme 1 below:[반응식 1]Scheme 1상기 반응식 1에서 목적화합물은 화학식 1로 표시되는 화합물이며, Ar, L, l, R1, R2, o, p, q는 화학식 1에서 정의한 바와 같다.The target compound in Scheme 1 is a compound represented by Formula 1, Ar, L, l, R 1 , R 2 , o, p, q are as defined in Formula 1.
- 애노드(anode), 캐소드(cathode) 및 두 전극 사이에 제1항 기재의 화합물을 함유하는 1층 이상의 유기물층을 포함하는 유기발광소자.An organic light emitting device comprising an anode, a cathode and at least one organic layer containing the compound of claim 1 between two electrodes.
- 제6항에 있어서,The method of claim 6,상기 유기물층이 정공주입층, 정공수송층 또는 정공수송보조층인 것을 특징으로 하는 유기발광소자.The organic light emitting device, characterized in that the organic material layer is a hole injection layer, a hole transport layer or a hole transport auxiliary layer.
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