WO2015084047A1 - Novel compound and organic light-emitting element comprising same - Google Patents
Novel compound and organic light-emitting element comprising same Download PDFInfo
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- WO2015084047A1 WO2015084047A1 PCT/KR2014/011757 KR2014011757W WO2015084047A1 WO 2015084047 A1 WO2015084047 A1 WO 2015084047A1 KR 2014011757 W KR2014011757 W KR 2014011757W WO 2015084047 A1 WO2015084047 A1 WO 2015084047A1
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- 0 *C1(*)C(c2ccccc2*2)=C2c2ccccc12 Chemical compound *C1(*)C(c2ccccc2*2)=C2c2ccccc12 0.000 description 5
- ZEDYXHPVCSCKCT-UHFFFAOYSA-N CC(C)(c1c-2ccc(N(c(cc3)ccc3-c(cc3)cc(C4)c3N(c3ccccc3)c3c4ccc(-c4cc5cccc(N(c(cc6)ccc6-c(cc6)cc(C7)c6N(c6ccccc6)c6c7cccc6)c(cc6C7(C)C)ccc6-c6c7c7ccccc7[o]6)c5cc4)c3)c3cc(cccc4)c4cc3)c1)c1c-2[o]c2ccccc12 Chemical compound CC(C)(c1c-2ccc(N(c(cc3)ccc3-c(cc3)cc(C4)c3N(c3ccccc3)c3c4ccc(-c4cc5cccc(N(c(cc6)ccc6-c(cc6)cc(C7)c6N(c6ccccc6)c6c7cccc6)c(cc6C7(C)C)ccc6-c6c7c7ccccc7[o]6)c5cc4)c3)c3cc(cccc4)c4cc3)c1)c1c-2[o]c2ccccc12 ZEDYXHPVCSCKCT-UHFFFAOYSA-N 0.000 description 2
- NHGZPFUXVCLIIO-UHFFFAOYSA-N CC(C)(c1cc(N(c2ccccc2)c(cc2)ccc2-c(cc2)cc3c2N(c2ccccc2)c2ccccc2C3)ccc1-1)c2c-1[o]c1c2cccc1 Chemical compound CC(C)(c1cc(N(c2ccccc2)c(cc2)ccc2-c(cc2)cc3c2N(c2ccccc2)c2ccccc2C3)ccc1-1)c2c-1[o]c1c2cccc1 NHGZPFUXVCLIIO-UHFFFAOYSA-N 0.000 description 2
- BFSPFSRWCLVOCG-UHFFFAOYSA-N CC(C)(c1c-2ccc(N(c3cc(cccc4)c4cc3)c3cc4ccccc4cc3)c1)c1c-2[o]c2c1cccc2 Chemical compound CC(C)(c1c-2ccc(N(c3cc(cccc4)c4cc3)c3cc4ccccc4cc3)c1)c1c-2[o]c2c1cccc2 BFSPFSRWCLVOCG-UHFFFAOYSA-N 0.000 description 1
- BBCJJBVMBSWAQL-UHFFFAOYSA-N CC1(C)c(cc(cc2)N(c(cc3)ccc3-c(cc3)cc(c4ccccc44)c3[n]4-c3ccccc3)c(cc3)cc(C4(c5ccccc5)c5ccccc5)c3-c3c4c4ccccc4[o]3)c2-c2ccccc12 Chemical compound CC1(C)c(cc(cc2)N(c(cc3)ccc3-c(cc3)cc(c4ccccc44)c3[n]4-c3ccccc3)c(cc3)cc(C4(c5ccccc5)c5ccccc5)c3-c3c4c4ccccc4[o]3)c2-c2ccccc12 BBCJJBVMBSWAQL-UHFFFAOYSA-N 0.000 description 1
- CFNZXFNJXGDMPJ-UHFFFAOYSA-N c1ccc(C(c2c-3ccc(N(c(cc4)ccc4-c4ccccn4)c4cccc5c4cccc5)c2)(c2c-3[s]c3c2cccc3)c2ccccc2)cc1 Chemical compound c1ccc(C(c2c-3ccc(N(c(cc4)ccc4-c4ccccn4)c4cccc5c4cccc5)c2)(c2c-3[s]c3c2cccc3)c2ccccc2)cc1 CFNZXFNJXGDMPJ-UHFFFAOYSA-N 0.000 description 1
- YUZGZWOSRRGYEF-UHFFFAOYSA-N c1ccc(C(c2c-3ccc(N(c4ccccc4)c(cc4)ccc4-c(cc4)ccc4N(c(cc4)ccc4-c4ccccc4)c(cc4)ccc4-c4cc(-[O]5c(-c(cc6)c(C7(c8ccccc8)c8ccccc8)cc6N(c6ccccc6)c(cc6)ccc6-c(cc6)ccc6N(c6cc(cccc8)c8cc6)c6ccc(cccc8)c8c6)c7c6ccccc56)ccc4)c2)(c2c-3[o]c3c2cccc3)c2ccccc2)cc1 Chemical compound c1ccc(C(c2c-3ccc(N(c4ccccc4)c(cc4)ccc4-c(cc4)ccc4N(c(cc4)ccc4-c4ccccc4)c(cc4)ccc4-c4cc(-[O]5c(-c(cc6)c(C7(c8ccccc8)c8ccccc8)cc6N(c6ccccc6)c(cc6)ccc6-c(cc6)ccc6N(c6cc(cccc8)c8cc6)c6ccc(cccc8)c8c6)c7c6ccccc56)ccc4)c2)(c2c-3[o]c3c2cccc3)c2ccccc2)cc1 YUZGZWOSRRGYEF-UHFFFAOYSA-N 0.000 description 1
- JQFQYAIXNXWUMC-UHFFFAOYSA-N c1ccc(C(c2cc(N(c3c4[s]c5ccccc5c4ccc3)c3cccc4c3cccc4)ccc2-2)(c3c-2[s]c2ccccc32)c2ccccc2)cc1 Chemical compound c1ccc(C(c2cc(N(c3c4[s]c5ccccc5c4ccc3)c3cccc4c3cccc4)ccc2-2)(c3c-2[s]c2ccccc32)c2ccccc2)cc1 JQFQYAIXNXWUMC-UHFFFAOYSA-N 0.000 description 1
- DECSCPKJGOLPPW-UHFFFAOYSA-N c1ccc(C(c2cc(N(c3ccccc3)c(cc3)ccc3-c(cc3)ccc3N(c3cccc4c3cccc4)c3cccc4c3cccc4)ccc2-2)(c3c-2[o]c2ccccc32)c2ccccc2)cc1 Chemical compound c1ccc(C(c2cc(N(c3ccccc3)c(cc3)ccc3-c(cc3)ccc3N(c3cccc4c3cccc4)c3cccc4c3cccc4)ccc2-2)(c3c-2[o]c2ccccc32)c2ccccc2)cc1 DECSCPKJGOLPPW-UHFFFAOYSA-N 0.000 description 1
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- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
- C07D307/77—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom ortho- or peri-condensed with carbocyclic rings or ring systems
- C07D307/93—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom ortho- or peri-condensed with carbocyclic rings or ring systems condensed with a ring other than six-membered
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- C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
- C07D333/50—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
- C07D333/78—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems condensed with rings other than six-membered or with ring systems containing such rings
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- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/06—Luminescent, e.g. electroluminescent, chemiluminescent materials containing organic luminescent materials
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- H10K85/631—Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
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- H10K85/60—Organic compounds having low molecular weight
- H10K85/631—Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine
- H10K85/633—Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine comprising polycyclic condensed aromatic hydrocarbons as substituents on the nitrogen atom
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- H10K85/631—Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine
- H10K85/636—Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine comprising heteroaromatic hydrocarbons as substituents on the nitrogen atom
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- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/657—Polycyclic condensed heteroaromatic hydrocarbons
- H10K85/6572—Polycyclic condensed heteroaromatic hydrocarbons comprising only nitrogen in the heteroaromatic polycondensed ring system, e.g. phenanthroline or carbazole
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- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/657—Polycyclic condensed heteroaromatic hydrocarbons
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- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/657—Polycyclic condensed heteroaromatic hydrocarbons
- H10K85/6576—Polycyclic condensed heteroaromatic hydrocarbons comprising only sulfur in the heteroaromatic polycondensed ring system, e.g. benzothiophene
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- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/14—Carrier transporting layers
- H10K50/15—Hole transporting layers
Definitions
- the present invention relates to a novel compound and an organic light emitting device comprising the same.
- an organic light emitting device capable of low voltage driving with a self-luminous type has a superior viewing angle, contrast ratio, and the like, and is lighter and thinner than a liquid crystal display (LCD), which is the mainstream of flat panel display devices.
- LCD liquid crystal display
- the material used as the organic material layer in the organic light emitting device can be largely classified into light emitting materials, hole injection materials, hole transport materials, electron transport materials, electron injection materials and the like depending on the function.
- the present invention has a HOMO energy level easy hole injection, has a high LUMO energy level that can block electrons, excellent hole transport characteristics, hole injection layer of the organic light emitting device or It is an object of the present invention to provide a novel compound that can have excellent low voltage, high efficiency, high Tg stability and long life when applied to a hole transport layer.
- Each X is independently O, S, Se or Te,
- Ar 1 , Ar 2 , Ar 3 and Ar 4 are each independently deuterium, halogen, amino group, nitrile group, nitro group, C 1-30 alkyl group, C 2-30 alkenyl group, C 2-30 an aryl group of an alkynyl group, an alkoxy group of C 1-30, are C 6-30 aryloxy groups, be substituted by a heteroaryl group of the C 6-30 aryl group, or a C 2-30 substituted or the C 6-50; Or deuterium, halogen, amino group, nitrile group, nitro group, C 1-30 alkyl group, C 2-30 alkenyl group, C 2-30 alkynyl group, C 1-30 alkoxy group, C 6-30 aryl Or a C 2-50 heteroaryl group which is unsubstituted or substituted with an oxy group, a C 6-30 aryl group, or a C 2-30 heteroaryl group, and Ar 2 and Ar 3 may be connected to each other,
- R 1 and R 2 are each independently hydrogen; heavy hydrogen; C 1-30 alkyl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; C 2-30 alkenyl groups unsubstituted or substituted with deuterium, halogen, amino, nitrile, and nitro groups; C 2-30 alkynyl group which is unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; A C 1-30 alkoxy group unsubstituted or substituted with deuterium, halogen, amino, nitrile or nitro group; C 6-30 aryloxy group which is unsubstituted or substituted with deuterium, halogen, amino, nitrile or nitro group; C 6-50 aryl group which is optionally substituted with deuterium, halogen, amino group, nitrile group, nitro group; Or a C 2-50 heteroaryl group unsub
- n 1 or 2
- n is an integer from 0 to 2
- the present invention provides an organic light emitting device comprising the compound represented by the formula (1).
- the compound of the present invention has a HOMO energy level that is easy to inject holes, has a high LUMO energy level that can block electrons, excellent hole transport characteristics, excellent low voltage when applied to the hole injection layer or hole transport layer of the organic light emitting device It has high stability, long life due to high efficiency and high Tg.
- FIG. 1 schematically illustrates a cross section of an OLED according to an embodiment of the invention.
- the compound of the present invention is characterized by represented by the following formula (1).
- Each X is independently O, S, Se or Te,
- Ar 1 , Ar 2 , Ar 3 and Ar 4 are each independently deuterium, halogen, amino group, nitrile group, nitro group, C 1-30 alkyl group, C 2-30 alkenyl group, C 2-30 an aryl group of an alkynyl group, an alkoxy group of C 1-30, are C 6-30 aryloxy groups, be substituted by a heteroaryl group of the C 6-30 aryl group, or a C 2-30 substituted or the C 6-50; Or deuterium, halogen, amino group, nitrile group, nitro group, C 1-30 alkyl group, C 2-30 alkenyl group, C 2-30 alkynyl group, C 1-30 alkoxy group, C 6-30 aryl Or a C 2-50 heteroaryl group which is unsubstituted or substituted with an oxy group, a C 6-30 aryl group, or a C 2-30 heteroaryl group, and Ar 2 and Ar 3 may be connected to each other,
- R 1 and R 2 are each independently hydrogen; heavy hydrogen; C 1-30 alkyl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; C 2-30 alkenyl groups unsubstituted or substituted with deuterium, halogen, amino, nitrile, and nitro groups; C 2-30 alkynyl group which is unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; A C 1-30 alkoxy group unsubstituted or substituted with deuterium, halogen, amino, nitrile or nitro group; C 6-30 aryloxy group which is unsubstituted or substituted with deuterium, halogen, amino, nitrile or nitro group; C 6-50 aryl group which is optionally substituted with deuterium, halogen, amino group, nitrile group, nitro group; Or a C 2-50 heteroaryl group unsub
- n 1 or 2
- n is an integer from 0 to 2
- the compound represented by Chemical Formula 1 may be one of those represented by the following Chemical Formula 2 or 3.
- Compound of Formula 1 according to the present invention has a HOMO energy level easy hole injection, has a high LUMO energy level that can block electrons, excellent hole transport characteristics, in the hole injection layer or hole transport layer of the organic light emitting device When applied, it can have excellent low voltage, high efficiency, high Tg stability and long life.
- X, Ar 1 , Ar 2 , Ar 3 , Ar 4 , R 1 , R 2 , m and n are the same as defined in Formula 1, wherein R is R 1 or R 2 .
- the present invention also provides an organic light emitting device comprising the compound represented by Chemical Formula 1 in an organic material layer.
- the compound of the present invention is preferably used alone or in combination with a known compound as a hole injection material or a hole transport material.
- the organic light emitting device of the present invention includes one or more organic material layers including the compound represented by Chemical Formula 1, and the method of manufacturing the organic light emitting device is as follows.
- the organic light emitting device includes an organic material layer such as a hole injection layer (HIL), a hole transport layer (HTL), an emission layer (EML), an electron transport layer (ETL), an electron injection layer (EIL) between an anode and a cathode. It may contain one or more.
- HIL hole injection layer
- HTL hole transport layer
- EML emission layer
- ETL electron transport layer
- EIL electron injection layer
- an anode is formed by depositing a material for an anode electrode having a high work function on the substrate.
- the substrate may be a substrate used in a conventional organic light emitting device, it is particularly preferable to use a glass substrate or a transparent plastic substrate excellent in mechanical strength, thermal stability, transparency, surface smoothness, ease of handling, and waterproof.
- the anode electrode material transparent and excellent indium tin oxide (ITO), indium zinc oxide (IZO), tin oxide (SnO 2 ), zinc oxide (ZnO), and the like may be used.
- the anode electrode material may be deposited by a conventional anode forming method, and specifically, may be deposited by a deposition method or a sputtering method.
- the hole injection layer material may be formed on the anode by vacuum deposition, spin coating, casting, Langmuir-Blodgett (LB), etc., but it is easy to obtain a uniform film quality and also pinholes. It is preferable to form by the vacuum evaporation method in that it is hard to generate
- the deposition conditions vary depending on the compound used as the material of the hole injection layer, the structure and thermal properties of the desired hole injection layer, and generally, a deposition temperature of 50-500 ° C., It is preferable to select appropriately from a vacuum degree of 10 -8 to 10 -3 torr, a deposition rate of 0.01 to 100 kPa / sec, and a layer thickness of 10 kPa to 5 mu m.
- the compound represented by Formula 1 of the present invention may be used alone or a known hole injection layer material may be used.
- a phthalocyanine compound or starburst such as copper phthalocyanine disclosed in US Pat. No. 4,356,429.
- TCTA 4,4 ', 4 "-tri (N-carbazolyl) triphenylamine
- m-MTDATA (4,4', 4" -tris (3-methylphenylamino) triphenylamine)
- m-MTDAPB 4,4 ', 4 "-tris (3-methylphenylamino) phenoxybenzene
- HI-406 N 1 , N 1 '-(biphenyl-4,4'-diyl) bis (N 1-(naphthalen- 1 -yl) -N 4 , N 4 -diphenylbenzene-1,4-diamine) and the like can be used as the hole injection layer material.
- the hole transport layer material may be formed on the hole injection layer by a method such as vacuum deposition, spin coating, cast, LB, etc., but it is easy to obtain a uniform film quality and is difficult to generate pin holes. It is preferable to form by a vapor deposition method.
- the deposition conditions vary depending on the compound used, but in general, the hole transport layer is preferably selected in the same condition range as the formation of the hole injection layer.
- the hole transport layer material may be a compound represented by the formula (1) of the present invention may be used alone or a mixture of known hole transport layer materials.
- the known hole transport layer material includes carbazole derivatives such as N-phenylcarbazole and polyvinylcarbazole, N, N'-bis (3-methylphenyl) -N, N'-diphenyl- [1, Having an aromatic condensed ring such as 1-biphenyl] -4,4'-diamine (TPD) and N.N'-di (naphthalen-1-yl) -N, N'-diphenyl benzidine ( ⁇ -NPD) Conventional amine derivatives and the like can be used.
- carbazole derivatives such as N-phenylcarbazole and polyvinylcarbazole, N, N'-bis (3-methylphenyl) -N, N'-diphenyl- [1, Having an aromatic condensed ring such as 1-biphenyl] -4,
- the light emitting layer material may be formed on the hole transport layer by a method such as vacuum deposition, spin coating, casting, LB, etc., but the vacuum deposition method is easy to obtain a uniform film quality and hard to generate pin holes. It is preferable to form by.
- the deposition conditions vary depending on the compound used, but in general, it is preferable to select within the same condition range as the formation of the hole injection layer.
- the light emitting layer material may be used as a known host or dopant.
- a fluorescent dopant may be IDE102 or IDE105 available from Idemitsu, or BD142 (N 6 , N 12 -bis (3,4-dimethylphenyl) -N 6 , N 12 -dimethycrylicene- 6,12-diamine) can be used as green phosphorescent dopant Ir (ppy) 3 (tris (2-phenylpyridine) iridium), blue phosphorescent dopant F2Irpic (iridium (III) bis [4,6- Difluorophenyl) -pyridinato-N, C2 '] picolinate), a red phosphorescent dopant RD61 from UDC, and the like can be co-vacuum deposited (doped).
- the doping concentration of the dopant is not particularly limited, but the dopant is preferably doped at 0.01 to 15 parts by weight based on 100 parts by weight of the host.
- the hole suppression material HBL
- HBL hole suppression material
- the hole-suppressing material that can be used at this time is not particularly limited, but any one of the well-known ones used as the hole-inhibiting material can be selected and used.
- an oxadiazole derivative, a triazole derivative, a phenanthroline derivative, or the hole-inhibiting material described in Japanese Patent Laid-Open No. 11-329734 (A1) can be cited.
- Oxy-2-methylquinolinolato) -aluminum biphenoxide), a phenanthrolines-based compound e.g., BCP (vasocuproin) from UDC
- BCP vasocuproin
- An electron transport layer is formed on the light emitting layer formed as above, wherein the electron transport layer is formed by a vacuum deposition method, a spin coating method, a casting method, or the like, and is preferably formed by a vacuum deposition method.
- the electron transport layer material functions to stably transport electrons injected from the electron injection electrode, and the type thereof is not particularly limited, and examples thereof include quinoline derivatives, especially tris (8-quinolinolato) aluminum (Alq 3). ), Or ET4 (6,6 '-(3,4-dimethyl-1,1-dimethyl-1H-silol-2,5-diyl) di-2,2'-bipyridine).
- an electron injection layer (EIL) which is a material having a function of facilitating injection of electrons from the cathode, may be stacked on the electron transport layer, and the electron injection layer material may be LiF, NaCl, CsF, Li 2 O, BaO, or the like. The substance of can be used.
- the deposition conditions of the electron transport layer are different depending on the compound used, it is generally preferable to select within the same condition range as the formation of the hole injection layer.
- an electron injection layer material may be formed on the electron transport layer, wherein the electron transport layer is formed of a conventional electron injection layer material by a vacuum deposition method, a spin coating method, a casting method, and the like. It is preferable to form by.
- a cathode forming metal is formed on the electron injection layer by a method such as vacuum deposition or sputtering and used as a cathode.
- the cathode forming metal may be a metal having low work function, an alloy, an electrically conductive compound, and a mixture thereof. Specific examples include lithium (Li), magnesium (Mg), aluminum (Al), aluminum-lithium (Al-Li), calcium (Ca), magnesium-indium (Mg-In), magnesium-silver (Mg-Ag), and the like. There is this.
- a transmissive cathode using ITO or IZO may be used to obtain the front light emitting device.
- the organic light emitting device of the present invention is not only an anode, a hole injection layer, a hole transport layer, a light emitting layer, an electron transport layer, an electron injection layer, an organic light emitting device of the cathode structure, but also the structure of an organic light emitting device of various structures, 1 It is also possible to form a layer or two intermediate layers.
- each organic material layer formed according to the present invention can be adjusted according to the required degree, preferably 10 to 1,000 nm, more preferably 20 to 150 nm.
- the present invention has an advantage that the organic material layer including the compound represented by Formula 1 has a uniform surface and excellent shape stability because the thickness of the organic material layer can be adjusted in molecular units.
- the organic light emitting device of the present invention has improved hole injection and hole transport characteristics, and at the same time has electron blocking characteristics, and excellent device characteristics such as excellent low voltage, high efficiency, stability due to high Tg, and long life.
- Example 1 N-([1,1'-biphenyl] -4-yl)-[1,1 ': 4', 1 'instead of di ([1,1'-biphenyl] -4-yl) amine
- Compound 3 was synthesized in the same manner as Compound 1 using '-terphenyl] -4-amine.
- Compound 16 was synthesized in the same manner as compound 3 using intermediate C instead of intermediate A.
- An organic light emitting device was manufactured according to the structure of FIG. 1.
- the organic light emitting element is formed from the bottom of the anode (hole injection electrode 11) / hole injection layer 12 / hole transport layer 13 / light emitting layer 14 / electron transfer layer 15 / cathode (electron injection electrode 16) It was laminated in order.
- the hole injection layer 12, the hole transport layer 13, the light emitting layer 14, and the electron transport layer 15 of Examples and Comparative Examples used the following materials.
- a glass substrate coated with an indium tin oxide (ITO) 1500 ⁇ thick thin film was washed by distilled water ultrasonically. After washing the distilled water, ultrasonic cleaning with a solvent such as isopropyl alcohol, acetone, methanol, etc., dried and transferred to a plasma cleaner, and then cleaned the substrate using oxygen plasma for 5 minutes and then a thermal vacuum evaporator (thermal Compound 1 250 Hz was formed into a hole injection layer HT01 600 Hz and a hole transport layer using the evaporator. Next, the light emitting layer was doped with BH01: BD01 5% to form 250 ⁇ . Next, ET01: Liq (1: 1) 300 ⁇ was formed into an electron transport layer, followed by LiF 10 ⁇ and aluminum (Al) 1000 ⁇ .
- ITO indium tin oxide
- a device was manufactured in the same manner as in Example 1, except that Compound 1 was used as NPB instead of Compound 1 as the hole transport layer.
- a device was manufactured in the same manner as in Example 1, except that Compound 1 was used as Comparative Compound 1 instead of Compound 1 as a hole transport layer.
- the embodiments of the present invention can be confirmed that the physical properties are excellent in all aspects compared to Comparative Example 1 and Comparative Example 2. It can be seen that the present compound has low voltage driving, high efficiency and long life due to easy hole injection and excellent hole transport.
- the compound of the present invention has a HOMO energy level that is easy to inject holes, has a high LUMO energy level that can block electrons, excellent hole transport characteristics, excellent low voltage when applied to the hole injection layer or hole transport layer of the organic light emitting device It has high stability, long life due to high efficiency and high Tg.
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Abstract
A compound according to the present invention has a HOMO energy level facilitating hole injection, a high LUMO energy level capable of blocking electrons, a superb hole transport characteristic, and when applied to a hole injection layer or hole transport layer of an organic light-emitting element, can impart stability and extended lifespan thereto due to superbly low voltage, high efficiency and high Tg.
Description
본 발명은 신규한 화합물 및 이를 포함하는 유기발광소자에 관한 것이다.The present invention relates to a novel compound and an organic light emitting device comprising the same.
최근, 자체 발광형으로 저전압 구동이 가능한 유기발광소자는, 평판 표시소자의 주류인 액정디스플레이(LCD, liquid crystal display)에 비해, 시야각, 대조비 등이 우수하고 백라이트가 불필요하여 경량 및 박형이 가능하며 소비전력 측면에서도 유리하고 색 재현 범위가 넓어, 차세대 표시소자로서 주목을 받고 있다.Recently, an organic light emitting device capable of low voltage driving with a self-luminous type has a superior viewing angle, contrast ratio, and the like, and is lighter and thinner than a liquid crystal display (LCD), which is the mainstream of flat panel display devices. In terms of power consumption and wide color reproduction range, it is attracting attention as a next-generation display device.
유기발광소자에서 유기물 층으로 사용되는 재료는 크게 기능에 따라, 발광 재료, 정공주입 재료, 정공수송 재료, 전자수송 재료, 전자주입 재료 등으로 분류될 수 있다. The material used as the organic material layer in the organic light emitting device can be largely classified into light emitting materials, hole injection materials, hole transport materials, electron transport materials, electron injection materials and the like depending on the function.
현재까지 이러한 유기발광소자에 사용되는 정공수송 재료에는 카바졸 골결을 가지는 아민 유도체가 많이 연구되었으나 보다 높은 구동전압, 낮은 효율 및 짧은 수명으로 인해 실용화하는 데에 많은 어려움이 있었다. 따라서, 우수한 특성을 갖는 물질을 이용하여 저전압 구동, 고휘도 및 장수명을 갖는 유기발광소자를 개발하려는 노력이 지속되어 왔다. Until now, a lot of amine derivatives having carbazole bones have been studied in the hole transport material used in the organic light emitting device, but there are many difficulties in practical use due to the higher driving voltage, lower efficiency and shorter lifespan. Therefore, efforts have been made to develop organic light emitting devices having low voltage driving, high brightness and long life using materials having excellent properties.
상기와 같은 문제점을 해결하기 위해, 본 발명은 정공주입이 용이한 HOMO 에너지 레벨을 가지며, 전자를 차단할 수 있는 높은 LUMO 에너지 레벨을 가지며, 정공수송 특성이 우수하고, 유기발광소자의 정공주입층 또는 정공수송층에 적용시 우수한 저전압, 고효율, 높은 Tg로 인한 안정성 및 장수명을 가지게 할 수 있는 신규한 화합물을 제공하는 것을 목적으로 한다.In order to solve the above problems, the present invention has a HOMO energy level easy hole injection, has a high LUMO energy level that can block electrons, excellent hole transport characteristics, hole injection layer of the organic light emitting device or It is an object of the present invention to provide a novel compound that can have excellent low voltage, high efficiency, high Tg stability and long life when applied to a hole transport layer.
본 발명은 또한 상기 화합물을 포함하여 정공주입 및 정공수송 특성이 향상되고, 동시에 전자차단 특성을 가지며, 우수한 저전압, 고효율, 높은 Tg로 인한 안정성 및 장수명을 가지는 유기발광소자를 제공하는 것을 목적으로 한다.It is another object of the present invention to provide an organic light emitting device including the compound, which has improved hole injection and hole transport characteristics, and at the same time has electron blocking characteristics, and has excellent low voltage, high efficiency, stability due to high Tg, and long life. .
상기 목적을 달성하기 위해 본 발명은 하기 화학식 1로 표시되는 화합물을 제공한다:In order to achieve the above object, the present invention provides a compound represented by the following Chemical Formula 1:
[화학식 1][Formula 1]
상기 식에서,Where
X는 각각 독립적으로 O, S, Se 또는 Te이며,Each X is independently O, S, Se or Te,
Ar1, Ar2, Ar3 및 Ar4는 각각 독립적으로 각각 독립적으로 중수소, 할로겐, 아미노기, 니트릴기, 니트로기, C1-30의 알킬기, C2-30의 알케닐기, C2-30의 알키닐기, C1-30의 알콕시기, C6-30의 아릴옥시기, C6-30의 아릴기, 또는 C2-30의 헤테로아릴기로 치환되거나 치환되지 않은 C6-50의 아릴기; 또는 중수소, 할로겐, 아미노기, 니트릴기, 니트로기, C1-30의 알킬기, C2-30의 알케닐기, C2-30의 알키닐기, C1-30의 알콕시기, C6-30의 아릴옥시기, C6-30의 아릴기, 또는 C2-30의 헤테로아릴기로 치환되거나 치환되지 않은 C2-50의 헤테로아릴기이고, 상기 Ar2와 Ar3는 서로 연결될 수 있으며,Ar 1 , Ar 2 , Ar 3 and Ar 4 are each independently deuterium, halogen, amino group, nitrile group, nitro group, C 1-30 alkyl group, C 2-30 alkenyl group, C 2-30 an aryl group of an alkynyl group, an alkoxy group of C 1-30, are C 6-30 aryloxy groups, be substituted by a heteroaryl group of the C 6-30 aryl group, or a C 2-30 substituted or the C 6-50; Or deuterium, halogen, amino group, nitrile group, nitro group, C 1-30 alkyl group, C 2-30 alkenyl group, C 2-30 alkynyl group, C 1-30 alkoxy group, C 6-30 aryl Or a C 2-50 heteroaryl group which is unsubstituted or substituted with an oxy group, a C 6-30 aryl group, or a C 2-30 heteroaryl group, and Ar 2 and Ar 3 may be connected to each other,
R1 및 R2는 각각 독립적으로 수소; 중수소; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C1-30의 알킬기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-30의 알케닐기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-30의 알키닐기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C1-30의 알콕시기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C6-30의 아릴옥시기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C6-50의 아릴기; 또는 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-50의 헤테로아릴기이며,R 1 and R 2 are each independently hydrogen; heavy hydrogen; C 1-30 alkyl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; C 2-30 alkenyl groups unsubstituted or substituted with deuterium, halogen, amino, nitrile, and nitro groups; C 2-30 alkynyl group which is unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; A C 1-30 alkoxy group unsubstituted or substituted with deuterium, halogen, amino, nitrile or nitro group; C 6-30 aryloxy group which is unsubstituted or substituted with deuterium, halogen, amino, nitrile or nitro group; C 6-50 aryl group which is optionally substituted with deuterium, halogen, amino group, nitrile group, nitro group; Or a C 2-50 heteroaryl group unsubstituted or substituted with deuterium, a halogen, an amino group, a nitrile group, a nitro group,
m은 1 또는 2이며,m is 1 or 2,
n은 0 내지 2의 정수이며, n is an integer from 0 to 2,
*-는 결합부위이다.*-Is a coupling site.
또한, 본 발명은 상기 화학식 1로 표시되는 화합물을 포함하는 유기발광소자를 제공한다.In addition, the present invention provides an organic light emitting device comprising the compound represented by the formula (1).
본 발명의 화합물은 정공주입이 용이한 HOMO 에너지 레벨을 가지며, 전자를 차단할 수 있는 높은 LUMO 에너지 레벨을 가지며, 정공수송 특성이 우수하고, 유기발광소자의 정공주입층 또는 정공수송층에 적용시 우수한 저전압, 고효율, 높은 Tg로 인한 안정성 및 장수명을 가지게 할 수 있다.The compound of the present invention has a HOMO energy level that is easy to inject holes, has a high LUMO energy level that can block electrons, excellent hole transport characteristics, excellent low voltage when applied to the hole injection layer or hole transport layer of the organic light emitting device It has high stability, long life due to high efficiency and high Tg.
도 1은 본 발명의 일 실시예에 따른 OLED의 단면을 개략적으로 도시한 것이다.1 schematically illustrates a cross section of an OLED according to an embodiment of the invention.
도면의 부호Sign of drawing
10 : 기판10: substrate
11 : 양극11: anode
12 : 정공주입층12: hole injection layer
13 : 정공수송층13: hole transport layer
14 : 발광층14: light emitting layer
15 : 전자전달층15: electron transport layer
16: 음극16: cathode
본 발명의 화합물은 하기 화학식 1로 표시되는 것을 특징으로 한다.The compound of the present invention is characterized by represented by the following formula (1).
[화학식 1][Formula 1]
상기 식에서,Where
X는 각각 독립적으로 O, S, Se 또는 Te이며,Each X is independently O, S, Se or Te,
Ar1, Ar2, Ar3 및 Ar4는 각각 독립적으로 각각 독립적으로 중수소, 할로겐, 아미노기, 니트릴기, 니트로기, C1-30의 알킬기, C2-30의 알케닐기, C2-30의 알키닐기, C1-30의 알콕시기, C6-30의 아릴옥시기, C6-30의 아릴기, 또는 C2-30의 헤테로아릴기로 치환되거나 치환되지 않은 C6-50의 아릴기; 또는 중수소, 할로겐, 아미노기, 니트릴기, 니트로기, C1-30의 알킬기, C2-30의 알케닐기, C2-30의 알키닐기, C1-30의 알콕시기, C6-30의 아릴옥시기, C6-30의 아릴기, 또는 C2-30의 헤테로아릴기로 치환되거나 치환되지 않은 C2-50의 헤테로아릴기이고, 상기 Ar2와 Ar3는 서로 연결될 수 있으며,Ar 1 , Ar 2 , Ar 3 and Ar 4 are each independently deuterium, halogen, amino group, nitrile group, nitro group, C 1-30 alkyl group, C 2-30 alkenyl group, C 2-30 an aryl group of an alkynyl group, an alkoxy group of C 1-30, are C 6-30 aryloxy groups, be substituted by a heteroaryl group of the C 6-30 aryl group, or a C 2-30 substituted or the C 6-50; Or deuterium, halogen, amino group, nitrile group, nitro group, C 1-30 alkyl group, C 2-30 alkenyl group, C 2-30 alkynyl group, C 1-30 alkoxy group, C 6-30 aryl Or a C 2-50 heteroaryl group which is unsubstituted or substituted with an oxy group, a C 6-30 aryl group, or a C 2-30 heteroaryl group, and Ar 2 and Ar 3 may be connected to each other,
R1 및 R2는 각각 독립적으로 수소; 중수소; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C1-30의 알킬기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-30의 알케닐기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-30의 알키닐기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C1-30의 알콕시기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C6-30의 아릴옥시기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C6-50의 아릴기; 또는 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-50의 헤테로아릴기이며,R 1 and R 2 are each independently hydrogen; heavy hydrogen; C 1-30 alkyl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; C 2-30 alkenyl groups unsubstituted or substituted with deuterium, halogen, amino, nitrile, and nitro groups; C 2-30 alkynyl group which is unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; A C 1-30 alkoxy group unsubstituted or substituted with deuterium, halogen, amino, nitrile or nitro group; C 6-30 aryloxy group which is unsubstituted or substituted with deuterium, halogen, amino, nitrile or nitro group; C 6-50 aryl group which is optionally substituted with deuterium, halogen, amino group, nitrile group, nitro group; Or a C 2-50 heteroaryl group unsubstituted or substituted with deuterium, a halogen, an amino group, a nitrile group, a nitro group,
m은 1 또는 2이며,m is 1 or 2,
n은 0 내지 2의 정수이며, n is an integer from 0 to 2,
*-는 결합부위이다.*-Is a coupling site.
본 발명에 있어서, 상기 화학식 1로 표시되는 화합물은 하기 화학식 화학식 2 또는 3으로 표시되는 것 중 하나일 수 있다.In the present invention, the compound represented by Chemical Formula 1 may be one of those represented by the following Chemical Formula 2 or 3.
[화학식 2][Formula 2]
[화학식 3][Formula 3]
상기 화학식 2 또는 3에서 X, Ar1, Ar2, Ar4, R1 및 R2는 화학식 1에서 정의한 바와 같으며, R3은 R1의 정의와 같다.In Formula 2 or 3, X, Ar 1 , Ar 2 , Ar 4 , R 1 and R 2 are the same as defined in Formula 1, and R 3 is the same as the definition of R 1 .
본 발명에 있어서, 상기 화학식 1로 표시되는 화합물의 바람직한 예는 다음과 같다:In the present invention, preferred examples of the compound represented by Formula 1 are as follows:
본 발명에 따른 화학식 1의 화합물은 정공주입이 용이한 HOMO 에너지 레벨을 가지며, 전자를 차단할 수 있는 높은 LUMO 에너지 레벨을 가지며, 정공수송 특성이 우수하고, 유기발광소자의 정공주입층 또는 정공수송층에 적용시 우수한 저전압, 고효율, 높은 Tg로 인한 안정성 및 장수명을 가지게 할 수 있다.Compound of Formula 1 according to the present invention has a HOMO energy level easy hole injection, has a high LUMO energy level that can block electrons, excellent hole transport characteristics, in the hole injection layer or hole transport layer of the organic light emitting device When applied, it can have excellent low voltage, high efficiency, high Tg stability and long life.
또한 본 발명의 화합물은 하기 반응식 1로 표시되는 반응식을 통하여 제조될 수 있다:In addition, the compounds of the present invention can be prepared through the reaction scheme represented by Scheme 1:
[반응식 1]Scheme 1
상기 반응식에서 상기 화학식 2 또는 3에서 X, Ar1, Ar2, Ar3, Ar4, R1, R2, m 및 n은 화학식 1에서 정의한 바와 같으며, 상기 R은 R1 또는 R2이다.In Formula 2 or 3, X, Ar 1 , Ar 2 , Ar 3 , Ar 4 , R 1 , R 2 , m and n are the same as defined in Formula 1, wherein R is R 1 or R 2 .
또한, 본 발명은 상기 화학식 1로 표시되는 화합물을 유기물층에 포함하는 유기발광소자를 제공한다. 이때, 본 발명의 화합물은 바람직하기로는 정공주입물질 또는 정공수송물질로 단독으로 사용되거나 또는 공지의 화합물과 함께 사용될 수 있다.The present invention also provides an organic light emitting device comprising the compound represented by Chemical Formula 1 in an organic material layer. At this time, the compound of the present invention is preferably used alone or in combination with a known compound as a hole injection material or a hole transport material.
또한 본 발명의 유기발광소자는 상기 화학식 1로 표시되는 화합물을 포함하는 1층 이상의 유기물층을 포함하는 바, 상기 유기발광소자의 제조방법을 설명하면 다음과 같다.In addition, the organic light emitting device of the present invention includes one or more organic material layers including the compound represented by Chemical Formula 1, and the method of manufacturing the organic light emitting device is as follows.
상기 유기발광소자는 애노드(anode)와 캐소드(cathod) 사이에 정공주입층(HIL), 정공수송층(HTL), 발광층(EML), 전자수송층(ETL), 전자주입층(EIL) 등의 유기물층을 1 개 이상 포함할 수 있다.The organic light emitting device includes an organic material layer such as a hole injection layer (HIL), a hole transport layer (HTL), an emission layer (EML), an electron transport layer (ETL), an electron injection layer (EIL) between an anode and a cathode. It may contain one or more.
먼저, 기판 상부에 높은 일함수를 갖는 애노드 전극용 물질을 증착시켜 애노드를 형성한다. 이때, 상기 기판은 통상의 유기발광소자에서 사용되는 기판을 사용할 수 있으며, 특히 기계적 강도, 열적 안정성, 투명성, 표면평활성, 취급용이성, 및 방수성이 우수한 유리 기판 또는 투명 플라스틱 기판을 사용하는 것이 좋다. 또한, 애노드 전극용 물질로는 투명하고 전도성이 우수한 산화인듐주석(ITO), 산화인듐아연(IZO), 산화주석(SnO2), 산화아연(ZnO) 등을 사용할 수 있다. 상기 애노드 전극용 물질은 통상의 애노드 형성방법에 의해 증착할 수 있으며, 구체적으로 증착법 또는 스퍼터링법에 의해 증착할 수 있다.First, an anode is formed by depositing a material for an anode electrode having a high work function on the substrate. In this case, the substrate may be a substrate used in a conventional organic light emitting device, it is particularly preferable to use a glass substrate or a transparent plastic substrate excellent in mechanical strength, thermal stability, transparency, surface smoothness, ease of handling, and waterproof. In addition, as the anode electrode material, transparent and excellent indium tin oxide (ITO), indium zinc oxide (IZO), tin oxide (SnO 2 ), zinc oxide (ZnO), and the like may be used. The anode electrode material may be deposited by a conventional anode forming method, and specifically, may be deposited by a deposition method or a sputtering method.
그 다음, 상기 애노드 전극 상부에 정공주입층 물질을 진공증착법, 스핀코팅법, 캐스트법, LB(Langmuir-Blodgett)법 등과 같은 방법에 의해 형성할 수 있지만, 균일한 막질을 얻기 쉽고, 또한 핀정공이 발생하기 어렵다는 등의 점에서 진공증착법에 의해 형성하는 것이 바람직하다. 상기 진공증착법에 의해 정공주입층을 형성하는 경우 그 증착조건은 정공주입층의 재료로서 사용하는 화합물, 목적하는 정공주입층의 구조 및 열적특성 등에 따라 다르지만, 일반적으로 50-500 ℃의 증착온도, 10-8 내지 10-3 torr의 진공도, 0.01 내지 100 Å/sec의 증착속도, 10 Å 내지 5 ㎛의 층 두께 범위에서 적절히 선택하는 것이 바람직하다.Subsequently, the hole injection layer material may be formed on the anode by vacuum deposition, spin coating, casting, Langmuir-Blodgett (LB), etc., but it is easy to obtain a uniform film quality and also pinholes. It is preferable to form by the vacuum evaporation method in that it is hard to generate | occur | produce. When the hole injection layer is formed by the vacuum deposition method, the deposition conditions vary depending on the compound used as the material of the hole injection layer, the structure and thermal properties of the desired hole injection layer, and generally, a deposition temperature of 50-500 ° C., It is preferable to select appropriately from a vacuum degree of 10 -8 to 10 -3 torr, a deposition rate of 0.01 to 100 kPa / sec, and a layer thickness of 10 kPa to 5 mu m.
상기 정공주입층 물질은 본 발명의 화학식 1로 표시되는 화합물이 단독으로 사용되거나 또는 공지의 정공주입층 물질이 사용될 수 있으며, 일예로 미국특허 제4,356,429호에 개시된 구리 프탈로시아닌 등의 프탈로시아닌 화합물 또는 스타버스트형 아민 유도체류인 TCTA(4,4',4"-트리(N-카바졸릴)트리페닐아민), m-MTDATA(4,4',4"-트리스(3-메틸페닐아미노)트리페닐아민), m-MTDAPB(4,4',4"-트리스(3-메틸페닐아미노)페녹시벤젠), HI-406(N1,N1'-(비페닐-4,4'-디일)비스(N1-(나프탈렌-1-일)-N4,N4-디페닐벤젠-1,4-디아민) 등을 정공주입층 물질로 사용할 수 있다.As the hole injection layer material, the compound represented by Formula 1 of the present invention may be used alone or a known hole injection layer material may be used. For example, a phthalocyanine compound or starburst such as copper phthalocyanine disclosed in US Pat. No. 4,356,429. TCTA (4,4 ', 4 "-tri (N-carbazolyl) triphenylamine) and m-MTDATA (4,4', 4" -tris (3-methylphenylamino) triphenylamine) , m-MTDAPB (4,4 ', 4 "-tris (3-methylphenylamino) phenoxybenzene), HI-406 (N 1 , N 1 '-(biphenyl-4,4'-diyl) bis (N 1-(naphthalen- 1 -yl) -N 4 , N 4 -diphenylbenzene-1,4-diamine) and the like can be used as the hole injection layer material.
다음으로 상기 정공주입층 상부에 정공수송층 물질을 진공증착법, 스핀코팅법, 캐스트법, LB법 등과 같은 방법에 의해 형성할 수 있지만, 균일한 막질을 얻기 쉽고, 핀정공이 발생하기 어렵다는 점에서 진공증착법에 의해 형성하는 것이 바람직하다. 상기 진공증착법에 의해 정공수송층을 형성하는 경우 그 증착조건은 사용하는 화합물에 따라 다르지만 일반적으로 정공주입층의 형성과 거의 동일한 조건 범위에서 선택하는 것이 좋다.Next, the hole transport layer material may be formed on the hole injection layer by a method such as vacuum deposition, spin coating, cast, LB, etc., but it is easy to obtain a uniform film quality and is difficult to generate pin holes. It is preferable to form by a vapor deposition method. In the case of forming the hole transport layer by the vacuum deposition method, the deposition conditions vary depending on the compound used, but in general, the hole transport layer is preferably selected in the same condition range as the formation of the hole injection layer.
또한, 상기 정공수송층 물질은 본 발명의 화학식 1로 표시되는 화합물이 단독으로 사용되거나 또는 공지의 정공수송층 물질이 혼합되어 사용될 수 있다. 구체적으로, 상기 공지의 정공수송층 물질로는 N-페닐카바졸, 폴리비닐카바졸 등의 카바졸 유도체, N,N'-비스(3-메틸페닐)-N,N'-디페닐-[1,1-비페닐]-4,4'-디아민(TPD), N.N'-디(나프탈렌-1-일)-N,N'-디페닐 벤지딘(α-NPD) 등의 방향족 축합환을 가지는 통상의 아민 유도체 등이 사용될 수 있다.In addition, the hole transport layer material may be a compound represented by the formula (1) of the present invention may be used alone or a mixture of known hole transport layer materials. Specifically, the known hole transport layer material includes carbazole derivatives such as N-phenylcarbazole and polyvinylcarbazole, N, N'-bis (3-methylphenyl) -N, N'-diphenyl- [1, Having an aromatic condensed ring such as 1-biphenyl] -4,4'-diamine (TPD) and N.N'-di (naphthalen-1-yl) -N, N'-diphenyl benzidine (α-NPD) Conventional amine derivatives and the like can be used.
그 후, 상기 정공수송층 상부에 발광층 물질을 진공증착법, 스핀코팅법, 캐스트법, LB법 등과 같은 방법에 의해 형성할 수 있지만, 균일한 막질을 얻기 쉽고, 핀정공이 발생하기 어렵다는 점에서 진공증착법에 의해 형성하는 것이 바람직하다. 상기 진공증착법에 의해 발광층을 형성하는 경우 그 증착조건은 사용하는 화합물에 따라 다르지만 일반적으로 정공주입층의 형성과 거의 동일한 조건 범위에서 선택하는 것이 좋다. 또한, 상기 발광층 재료는 공지의 호스트 또는 도펀트로 사용할 수 있다. 일예로 형광 도펀트로는 이데미츠사(Idemitsu사)에서 구입 가능한 IDE102 또는 IDE105, 또는 BD142(N6,N12-비스(3,4-디메틸페닐)-N6,N12-디메시틸크리센-6,12-디아민)를 사용할 수 있으며, 인광 도펀트로는 녹색 인광 도펀트 Ir(ppy)3(트리스(2-페닐피리딘) 이리듐), 청색 인광 도펀트인 F2Irpic(이리듐(Ⅲ) 비스[4,6-다이플루오로페닐)-피리디나토-N,C2'] 피콜린산염), UDC사의 적색 인광 도펀트 RD61 등이 공동 진공증착(도핑)될 수 있다. 도펀트의 도핑농도는 특별히 제한되지 않으나, 호스트 100 중량부 대비 도펀트가 0.01 내지 15 중량부로 도핑되는 것이 바람직하다.Thereafter, the light emitting layer material may be formed on the hole transport layer by a method such as vacuum deposition, spin coating, casting, LB, etc., but the vacuum deposition method is easy to obtain a uniform film quality and hard to generate pin holes. It is preferable to form by. In the case of forming the light emitting layer by the vacuum deposition method, the deposition conditions vary depending on the compound used, but in general, it is preferable to select within the same condition range as the formation of the hole injection layer. In addition, the light emitting layer material may be used as a known host or dopant. For example, a fluorescent dopant may be IDE102 or IDE105 available from Idemitsu, or BD142 (N 6 , N 12 -bis (3,4-dimethylphenyl) -N 6 , N 12 -dimethycrylicene- 6,12-diamine) can be used as green phosphorescent dopant Ir (ppy) 3 (tris (2-phenylpyridine) iridium), blue phosphorescent dopant F2Irpic (iridium (III) bis [4,6- Difluorophenyl) -pyridinato-N, C2 '] picolinate), a red phosphorescent dopant RD61 from UDC, and the like can be co-vacuum deposited (doped). The doping concentration of the dopant is not particularly limited, but the dopant is preferably doped at 0.01 to 15 parts by weight based on 100 parts by weight of the host.
또한, 발광층에 인광 도펀트와 함께 사용할 경우에는 삼중항 여기자 또는 정공이 전자수송층으로 확산되는 현상을 방지하기 위하여 정공억제재료(HBL)를 추가로 진공증착법 또는 스핀코팅법에 의해 적층시키는 것이 바람직하다. 이때 사용할 수 있는 정공억제물질은 특별히 제한되지는 않으나, 정공억제재료로 사용되고 있는 공지의 것에서 임의의 것을 선택해서 이용할 수 있다. 예를 들면, 옥사디아졸 유도체나 트리아졸 유도체, 페난트롤린 유도체, 또는 일본특개평 11-329734(A1)에 기재되어 있는 정공억제재료 등을 들 수 있으며, 대표적으로 Balq(비스(8-하이드록시-2-메틸퀴놀리놀나토)-알루미늄 비페녹사이드), 페난트롤린(phenanthrolines)계 화합물(예: UDC사 BCP(바쏘쿠프로인)) 등을 사용할 수 있다.In addition, when using the phosphorescent dopant in the light emitting layer, it is preferable to further laminate the hole suppression material (HBL) by vacuum deposition or spin coating to prevent the triplet excitons or holes from diffusing into the electron transport layer. The hole-suppressing material that can be used at this time is not particularly limited, but any one of the well-known ones used as the hole-inhibiting material can be selected and used. For example, an oxadiazole derivative, a triazole derivative, a phenanthroline derivative, or the hole-inhibiting material described in Japanese Patent Laid-Open No. 11-329734 (A1) can be cited. Oxy-2-methylquinolinolato) -aluminum biphenoxide), a phenanthrolines-based compound (e.g., BCP (vasocuproin) from UDC) can be used.
상기와 같이 형성된 발광층 상부에는 전자수송층이 형성되는데, 이때 상기 전자수송층은 진공증착법, 스핀코팅법, 캐스트법 등의 방법으로 형성되며, 특히 진공증착법에 의해 형성하는 것이 바람직하다.An electron transport layer is formed on the light emitting layer formed as above, wherein the electron transport layer is formed by a vacuum deposition method, a spin coating method, a casting method, or the like, and is preferably formed by a vacuum deposition method.
상기 전자수송층 재료는 전자주입전극으로부터 주입된 전자를 안정하게 수송하는 기능을 하는 것으로서 그 종류가 특별히 제한되지는 않으며, 예를 들어 퀴놀린 유도체, 특히 트리스(8-퀴놀리놀라토)알루미늄(Alq3), 또는 ET4(6,6'-(3,4-디메시틸-1,1-디메틸-1H-실올-2,5-디일)디-2,2'-비피리딘)을 사용할 수 있다. 또한, 전자수송층 상부에 캐소드로부터 전자의 주입을 용이하게 하는 기능을 가지는 물질인 전자주입층(EIL)이 적층될 수 있으며, 전자주입층 물질로는 LiF, NaCl, CsF, Li2O, BaO 등의 물질을 이용할 수 있다.The electron transport layer material functions to stably transport electrons injected from the electron injection electrode, and the type thereof is not particularly limited, and examples thereof include quinoline derivatives, especially tris (8-quinolinolato) aluminum (Alq 3). ), Or ET4 (6,6 '-(3,4-dimethyl-1,1-dimethyl-1H-silol-2,5-diyl) di-2,2'-bipyridine). In addition, an electron injection layer (EIL), which is a material having a function of facilitating injection of electrons from the cathode, may be stacked on the electron transport layer, and the electron injection layer material may be LiF, NaCl, CsF, Li 2 O, BaO, or the like. The substance of can be used.
또한, 상기 전자수송층의 증착조건은 사용하는 화합물에 따라 다르지만, 일반적으로 정공주입층의 형성과 거의 동일한 조건 범위에서 선택하는 것이 좋다.In addition, although the deposition conditions of the electron transport layer are different depending on the compound used, it is generally preferable to select within the same condition range as the formation of the hole injection layer.
그 뒤, 상기 전자수송층 상부에 전자주입층 물질을 형성할 수 있으며, 이때 상기 전자수송층은 통상의 전자주입층 물질을 진공증착법, 스핀코팅법, 캐스트법 등의 방법으로 형성되며, 특히 진공증착법에 의해 형성하는 것이 바람직하다.Subsequently, an electron injection layer material may be formed on the electron transport layer, wherein the electron transport layer is formed of a conventional electron injection layer material by a vacuum deposition method, a spin coating method, a casting method, and the like. It is preferable to form by.
마지막으로 전자주입층 상부에 캐소드 형성용 금속을 진공증착법이나 스퍼터링법 등의 방법에 의해 형성하고 캐소드로 사용한다. 여기서 캐소드 형성용 금속으로는 낮은 일함수를 가지는 금속, 합금, 전기전도성 화합물, 및 이들의 혼합물을 사용할 수 있다. 구체적인 예로는 리튬(Li), 마그네슘(Mg), 알루미늄(Al), 알루미늄-리튬(Al-Li), 칼슘(Ca), 마그네슘-인듐(Mg-In), 마그네슘-은(Mg-Ag) 등이 있다. 또한, 전면 발광소자를 얻기 위하여 ITO, IZO를 사용한 투과형 캐소드를 사용할 수도 있다.Finally, a cathode forming metal is formed on the electron injection layer by a method such as vacuum deposition or sputtering and used as a cathode. The cathode forming metal may be a metal having low work function, an alloy, an electrically conductive compound, and a mixture thereof. Specific examples include lithium (Li), magnesium (Mg), aluminum (Al), aluminum-lithium (Al-Li), calcium (Ca), magnesium-indium (Mg-In), magnesium-silver (Mg-Ag), and the like. There is this. In addition, a transmissive cathode using ITO or IZO may be used to obtain the front light emitting device.
본 발명의 유기발광소자는 애노드, 정공주입층, 정공수송층, 발광층, 전자수송층, 전자주입층, 캐소드 구조의 유기발광소자 뿐만 아니라, 다양한 구조의 유기발광소자의 구조가 가능하며, 필요에 따라 1층 또는 2층의 중간층을 더 형성하는 것도 가능하다.The organic light emitting device of the present invention is not only an anode, a hole injection layer, a hole transport layer, a light emitting layer, an electron transport layer, an electron injection layer, an organic light emitting device of the cathode structure, but also the structure of an organic light emitting device of various structures, 1 It is also possible to form a layer or two intermediate layers.
상기와 같이 본 발명에 따라 형성되는 각 유기물층의 두께는 요구되는 정도에 따라 조절할 수 있으며, 바람직하게는 10 내지 1,000 ㎚이며, 더욱 바람직하게는 20 내지 150 ㎚인 것이 좋다.As described above, the thickness of each organic material layer formed according to the present invention can be adjusted according to the required degree, preferably 10 to 1,000 nm, more preferably 20 to 150 nm.
또한 본 발명은 상기 화학식 1로 표시되는 화합물을 포함하는 유기물층은 유기물층의 두께를 분자 단위로 조절할 수 있기 때문에 표면이 균일하며, 형태안정성이 뛰어난 장점이 있다.In addition, the present invention has an advantage that the organic material layer including the compound represented by Formula 1 has a uniform surface and excellent shape stability because the thickness of the organic material layer can be adjusted in molecular units.
본 발명의 유기발광소자는 정공주입 및 정공수송 특성이 향상되고, 동시에 전자차단 특성을 가지며, 우수한 저전압, 고효율, 높은 Tg로 인한 안정성 및 장수명 등의 우수한 소자 특성을 가진다.The organic light emitting device of the present invention has improved hole injection and hole transport characteristics, and at the same time has electron blocking characteristics, and excellent device characteristics such as excellent low voltage, high efficiency, stability due to high Tg, and long life.
이하, 본 발명의 이해를 돕기 위하여 바람직한 실시예를 제시하나, 하기 실시예는 본 발명을 예시하는 것일 뿐 본 발명의 범위가 하기 실시예에 한정되는 것은 아니다.Hereinafter, preferred examples are provided to help understanding of the present invention, but the following examples are merely to illustrate the present invention, and the scope of the present invention is not limited to the following examples.
중간체 A의 합성Synthesis of Intermediate A
[A-1의 합성][Synthesis of A-1]
둥근바닥플라스크에 benzofuran-2-ylboronic acid 28.5 g, methyl 5-bromo-2-iodobenzoate 50 g을 톨루엔 600 ml에 녹이고, K2CO3(2M) 220 ml와 Pd(PPh3)4 5.1 g을 넣은 후 환류 교반하였다. TLC로 반응을 확인하고 물을 첨가 후 반응을 종결시켰다. 유기층을 EA로 추출하고 감압여과한 후 컬럼정제하여 중간체 A-1 35.8 g (수율 72%)를 얻었다.In a round bottom flask, 28.5 g of benzofuran-2-ylboronic acid and 50 g of methyl 5-bromo-2-iodobenzoate were dissolved in 600 ml of toluene, and 220 ml of K 2 CO 3 (2M) and 5.1 g of Pd (PPh 3 ) 4 were added. After stirring under reflux. The reaction was confirmed by TLC and the reaction was terminated after the addition of water. The organic layer was extracted with EA, filtered under reduced pressure and purified by column to obtain 35.8 g (72%) of intermediate A-1.
[A-2의 합성][Synthesis of A-2]
상기 A-1 35 g을 THF 800 ml에 녹인 후, 0 ℃까지 온도를 내렸다. CH3MgBr 105 ml를 천천히 첨가하고 상온으로 천천히 올려 1시간 교반 후 환류 교반하였다. 유기층을 MC로 추출하고 감압여과한 후 컬럼정제하여 중간체 A-2 25.2 g (수율 70%)를 얻었다.35 g of A-1 was dissolved in 800 ml of THF, and the temperature was lowered to 0 ° C. 105 ml of CH 3 MgBr was slowly added and slowly raised to room temperature, followed by stirring for 1 hour, followed by stirring under reflux. The organic layer was extracted with MC, filtered under reduced pressure and purified by column to obtain 25.2 g (70% yield) of intermediate A-2.
[A의 합성][Synthesis of A]
상기 A-2 25 g에 아세트산 250 ml와 염산 1 ml를 넣은 후 24시간 동안 환류 교반시킨 후 상온으로 온도를 내렸다. 석출된 고체를 필터 후 컬럼정제하여 중간체 A 14.2 g (수율 60%)를 얻었다.250 g of acetic acid and 1 ml of hydrochloric acid were added to 25 g of A-2, and the mixture was stirred under reflux for 24 hours, and then cooled to room temperature. The precipitated solid was filtered and then column purified to give 14.2 g (60% yield) of intermediate A.
중간체 B의 합성Synthesis of Intermediate B
[B-1의 합성][Synthesis of B-1]
둥근바닥플라스크에 benzofuran-2-ylboronic acid 28.5 g, methyl 5-bromo-2-iodobenzoate 50 g을 톨루엔 600 ml에 녹이고, K2CO3(2M) 220 ml와 Pd(PPh3)4 5.1 g을 넣은 후 환류 교반하였다. TLC로 반응을 확인하고 물을 첨가 후 반응을 종결시켰다. 유기층을 EA로 추출하고 감압여과한 후 컬럼정제하여 중간체 B-1 35.8 g (수율 72%)를 얻었다.In a round bottom flask, 28.5 g of benzofuran-2-ylboronic acid and 50 g of methyl 5-bromo-2-iodobenzoate were dissolved in 600 ml of toluene, and 220 ml of K 2 CO 3 (2M) and 5.1 g of Pd (PPh 3 ) 4 were added. After stirring under reflux. The reaction was confirmed by TLC and the reaction was terminated after the addition of water. The organic layer was extracted with EA, filtered under reduced pressure and purified by column to obtain 35.8 g (72%) of intermediate B-1.
[B-2의 합성]Synthesis of B-2
상기 B-1 35 g을 THF 850 ml에 녹인 후, 0 ℃까지 온도를 내렸다. PhMgBr 105 ml를 천천히 첨가하고 상온으로 천천히 올려 1시간 교반 후 환류 교반하였다. 유기층을 MC로 추출하고 감압여과한 후 컬럼정제하여 중간체 B-2 33.7 g (수율 70%)를 얻었다.35 g of B-1 was dissolved in 850 ml of THF, and the temperature was lowered to 0 ° C. 105 ml of PhMgBr was slowly added and slowly raised to room temperature, followed by stirring for 1 hour, followed by stirring under reflux. The organic layer was extracted with MC, filtered under reduced pressure and purified by column to obtain 33.7 g (70% yield) of intermediate B-2.
[B의 합성][Synthesis of B]
상기 B-2 33 g에 아세트산 330 ml와 염산 1.3 ml를 넣은 후 24시간 동안 환류 교반시킨 후 상온으로 온도를 내렸다. 석출된 고체를 필터 후 컬럼정제하여 중간체 B 20. 6g (수율 65%)를 얻었다.330 ml of acetic acid and 1.3 ml of hydrochloric acid were added to 33 g of B-2, and the mixture was stirred under reflux for 24 hours, and then cooled to room temperature. The precipitated solid was filtered and then column purified to obtain 20 g of intermediate B (65% yield).
중간체 C의 합성Synthesis of Intermediate C
[C-1의 합성][Synthesis of C-1]
둥근바닥플라스크에 benzo[b]thiophen-2-ylboronic acid 31.3 g, methyl 5-bromo-2-iodobenzoate 50 g을 톨루엔 600 ml에 녹이고 K2CO3(2M) 220 ml와 Pd(PPh3)4 5.1 g을 넣은 후 환류 교반하였다. TLC로 반응을 확인하고 물을 첨가 후 반응을 종결시켰다. 유기층을 EA로 추출하고 감압여과한 후 컬럼정제하여 중간체 C-1 38.2 g (수율 75%)를 얻었다.In a round bottom flask, 31.3 g of benzo [b] thiophen-2-ylboronic acid and 50 g of methyl 5-bromo-2-iodobenzoate are dissolved in 600 ml of toluene, 220 ml of K 2 CO 3 (2M) and Pd (PPh 3 ) 4 5.1 g was added and stirred under reflux. The reaction was confirmed by TLC and the reaction was terminated after the addition of water. The organic layer was extracted with EA, filtered under reduced pressure and purified by column to obtain 38.2 g (yield 75%) of intermediate C-1.
[C-2의 합성][Synthesis of C-2]
상기 C-1 38 g을 THF 900 ml에 녹인 후, 0 ℃까지 온도를 내렸다. CH3MgBr 110 ml를 천천히 첨가하고 상온으로 천천히 올려 1시간 교반 후 환류 교반하였다. 유기층을 MC로 추출하고 감압여과한 후 컬럼정제하여 중간체 C-2 26.6 g (수율 70%)를 얻었다.38 g of C-1 was dissolved in 900 ml of THF, and the temperature was lowered to 0 ° C. 110 ml of CH 3 MgBr was slowly added and slowly raised to room temperature, followed by stirring for 1 hour, followed by stirring under reflux. The organic layer was extracted with MC, filtered under reduced pressure and purified by column to obtain 26.6 g of Intermediate C-2 (yield 70%).
[C의 합성][Synthesis of C]
상기 C-2 26 g에 아세트산 260 ml와 염산 1 ml를 넣은 후 24시간 동안 환류 교반시킨 후 상온으로 온도를 내렸다. 석출된 고체를 필터 후 컬럼정제하여 중간체 C 14.8 g (수율 60%)를 얻었다.260 ml of acetic acid and 1 ml of hydrochloric acid were added to 26 g of C-2, and the mixture was stirred under reflux for 24 hours, and then cooled to room temperature. The precipitated solid was filtered and then column purified to give 14.8 g (60% yield) of intermediate C.
중간체 D의 합성Synthesis of Intermediate D
[D-1의 합성]Synthesis of D-1
둥근바닥플라스크에 benzo[b]thiophen-2-ylboronic acid 31.3 g, methyl 5-bromo-2-iodobenzoate 50 g을 톨루엔 600 ml에 녹이고 K2CO3(2M) 220 ml와 Pd(PPh3)4 5.1 g을 넣은 후 환류 교반하였다. TLC로 반응을 확인하고 물을 첨가 후 반응을 종결시켰다. 유기층을 EA로 추출하고 감압여과한 후 컬럼정제하여 중간체 D-1 38.2 g (수율 75%)를 얻었다.In a round bottom flask, 31.3 g of benzo [b] thiophen-2-ylboronic acid and 50 g of methyl 5-bromo-2-iodobenzoate are dissolved in 600 ml of toluene, 220 ml of K 2 CO 3 (2M) and Pd (PPh 3 ) 4 5.1 g was added and stirred under reflux. The reaction was confirmed by TLC and the reaction was terminated after the addition of water. The organic layer was extracted with EA, filtered under reduced pressure and purified by column to obtain 38.2 g of Intermediate D-1 (yield 75%).
[D-2의 합성]Synthesis of D-2
상기 D-1 38 g을 THF 900 ml에 녹인 후, 0 ℃까지 온도를 내렸다. PhMgBr 110 ml를 천천히 첨가하고 상온으로 천천히 올려 1시간 교반 후 환류 교반하였다. 유기층을 MC로 추출하고 감압여과한 후 컬럼정제하여 중간체 D-2 36.6 g (수율 71%)를 얻었다.38 g of D-1 was dissolved in 900 ml of THF, and the temperature was lowered to 0 ° C. 110 ml of PhMgBr was slowly added thereto and slowly raised to room temperature, followed by stirring for 1 hour, followed by stirring under reflux. The organic layer was extracted with MC, filtered under reduced pressure and purified by column to obtain 36.6 g of Intermediate D-2 (yield 71%).
[D의 합성]Synthesis of D
상기 D-2 36 g에 아세트산 360 ml와 염산 1.5 ml를 넣은 후 24시간 동안 환류 교반시킨 후 상온으로 온도를 내렸다. 석출된 고체를 필터 후 컬럼정제하여 중간체 D 23.2 g (수율 67%)를 얻었다.In 36 g of D-2, 360 ml of acetic acid and 1.5 ml of hydrochloric acid were added, and the mixture was stirred under reflux for 24 hours, and then cooled to room temperature. The precipitated solid was filtered and then column purified to obtain 23.2 g of intermediate D (yield 67%).
OP의 합성OP synthesis
목적 화합물 합성을 위해 OP의 준비는 하기 단계를 거쳐 합성하였다.Preparation of OP for the synthesis of the desired compound was carried out through the following steps.
OP1의 합성Synthesis of OP1
둥근바닥플라스크에 diphenylamine 15 g, 4-bromo-4'-iodo-1,1'-biphenyl 47.7 g, t-BuONa 12.8 g, Pd2(dba)3 3.3 g,(t-Bu)3P 5.4 ml를 톨루엔 600 ml에 녹인 후 50 ℃로 교반하였다. TLC로 반응을 확인하고 물을 첨가 후 반응을 종결하였다. 유기층을 EA로 추출하고 감압여과한 후 컬럼정제하여 중간체 OP1-1 15.26 g (수율 43%)를 얻었다.15 g of diphenylamine in a round bottom flask, 47.7 g of 4-bromo-4'-iodo-1,1'-biphenyl, 12.8 g of t-BuONa, 3.3 g of Pd 2 (dba) 3 , 5.4 ml of (t-Bu) 3 P Was dissolved in 600 ml of toluene and stirred at 50 ° C. The reaction was confirmed by TLC and the reaction was terminated after the addition of water. The organic layer was extracted with EA, filtered under reduced pressure and purified by column to obtain 15.26 g (yield 43%) of intermediate OP1-1.
상기 중간체 OP1-1 15 g, [1,1'-biphenyl]-4-amine 7.0 g, t-BuONa 5.4 g, Pd2(dba)3 1.4 g,(t-Bu)3P 1.7 ml를 톨루엔 200 ml에 녹인 후 환류 교반하였다. TLC로 반응을 확인하고 물을 첨가 후 반응을 종결하였다. 유기층을 EA로 추출하고 감압여과한 후 컬럼정제하여 중간체 OP1 9.15 g (수율 50%)를 얻었다.15 g of the intermediate OP1-1, 7.0 g of [1,1'-biphenyl] -4-amine, 5.4 g of t-BuONa, 1.4 g of Pd 2 (dba) 3 , 1.7 ml of (t-Bu) 3 P and toluene 200 It was dissolved in ml and stirred under reflux. The reaction was confirmed by TLC and the reaction was terminated after the addition of water. The organic layer was extracted with EA, filtered under reduced pressure and purified by column to obtain 9.15 g (50% yield) of intermediate OP1.
상기 OP1과 같은 방법으로 하기 중간체를 합성하였다.The following intermediate was synthesized in the same manner as in OP1.
실시예 1: 화합물 1의 합성Example 1 Synthesis of Compound 1
둥근바닥플라스크에 중간체 A 2.5 g, di([1,1'-biphenyl]-4-yl)amine 3.08 g, t-BuONa 1.15 g, Pd2(dba)3 0.3 g,(t-Bu)3P 0.4 ml를 톨루엔 60 ml에 녹인 후 환류 교반하였다. TLC로 반응을 확인하고 물을 첨가 후 반응을 종결하였다. 유기층을 EA로 추출하고 감압여과한 후 컬럼정제하여 화합물 1 2.56 g (수율 58%)를 얻었다.In a round bottom flask, Intermediate A 2.5 g, di ([1,1'-biphenyl] -4-yl) amine 3.08 g, t-BuONa 1.15 g, Pd 2 (dba) 3 0.3 g, (t-Bu) 3 P 0.4 ml was dissolved in 60 ml of toluene and stirred at reflux. The reaction was confirmed by TLC and the reaction was terminated after the addition of water. The organic layer was extracted with EA, filtered under reduced pressure and purified by column to obtain 2.56 g (yield 58%) of compound 1.
m/z: 553.24 (100.0%), 554.24 (44.8%), 555.25 (9.8%), 556.25 (1.5%)m / z: 553.24 (100.0%), 554.24 (44.8%), 555.25 (9.8%), 556.25 (1.5%)
실시예 2: 화합물 2의 합성Example 2: Synthesis of Compound 2
상기 실시예 1에서 di([1,1'-biphenyl]-4-yl)amine 대신 N-([1,1'-biphenyl]-4-yl)-9,9-dimethyl-9H-fluoren-2-amine을 사용하여 화합물 1과 같은 방법으로 화합물 2를 합성하였다.N-([1,1'-biphenyl] -4-yl) -9,9-dimethyl-9H-fluoren-2 instead of di ([1,1'-biphenyl] -4-yl) amine in Example 1 Compound 2 was synthesized in the same manner as Compound 1 using -amine.
m/z: 593.27 (100.0%), 594.28 (48.0%), 595.28 (11.5%), 596.28 (1.9%)m / z: 593.27 (100.0%), 594.28 (48.0%), 595.28 (11.5%), 596.28 (1.9%)
실시예 3: 화합물 3의 합성Example 3: Synthesis of Compound 3
상기 실시예 1에서 di([1,1'-biphenyl]-4-yl)amine 대신 N-([1,1'-biphenyl]-4-yl)-[1,1':4',1''-terphenyl]-4-amine을 사용하여 화합물 1과 같은 방법으로 화합물 3을 합성하였다.In Example 1, N-([1,1'-biphenyl] -4-yl)-[1,1 ': 4', 1 'instead of di ([1,1'-biphenyl] -4-yl) amine Compound 3 was synthesized in the same manner as Compound 1 using '-terphenyl] -4-amine.
m/z: 629.27 (100.0%), 630.28 (51.3%), 631.28 (13.1%), 632.28 (2.3%)m / z: 629.27 (100.0%), 630.28 (51.3%), 631.28 (13.1%), 632.28 (2.3%)
실시예 4: 화합물 4의 합성Example 4: Synthesis of Compound 4
상기 실시예 1에서 di([1,1'-biphenyl]-4-yl)amine 대신 중간체 OP1을 사용하여 화합물 1과 같은 방법으로 화합물 4를 합성하였다.Compound 4 was synthesized in the same manner as in compound 1, using Intermediate OP1 instead of di ([1,1′-biphenyl] -4-yl) amine in Example 1.
m/z: 720.31 (100.0%), 721.32 (57.8%), 722.32 (16.6%), 723.32 (3.2%)m / z: 720.31 (100.0%), 721.32 (57.8%), 722.32 (16.6%), 723.32 (3.2%)
실시예 5: 화합물 5의 합성Example 5: Synthesis of Compound 5
상기 실시예 1에서 di([1,1'-biphenyl]-4-yl)amine 대신 중간체 OP2를 사용하여 화합물 1과 같은 방법으로 화합물 5를 합성하였다.Compound 5 was synthesized in the same manner as in compound 1, using Intermediate OP2 instead of di ([1,1′-biphenyl] -4-yl) amine in Example 1.
m/z: 694.30 (100.0%), 695.30 (56.4%), 696.31 (15.2%), 697.31 (2.8%)m / z: 694.30 (100.0%), 695.30 (56.4%), 696.31 (15.2%), 697.31 (2.8%)
실시예 6: 화합물 6의 합성Example 6: Synthesis of Compound 6
상기 실시예 1에서 di([1,1'-biphenyl]-4-yl)amine 대신 중간체 OP3을 사용하여 화합물 1과 같은 방법으로 화합물 6을 합성하였다.Compound 6 was synthesized in the same manner as in compound 1, using Intermediate OP3 instead of di ([1,1′-biphenyl] -4-yl) amine in Example 1.
m/z: 642.27 (100.0%), 643.27 (51.3%), 644.27 (13.2%), 645.28 (2.1%)m / z: 642.27 (100.0%), 643.27 (51.3%), 644.27 (13.2%), 645.28 (2.1%)
실시예 7: 화합물 7의 합성Example 7: Synthesis of Compound 7
상기 실시예 1에서 di([1,1'-biphenyl]-4-yl)amine 대신 중간체 OP4를 사용하여 화합물 1과 같은 방법으로 화합물 9를 합성하였다. Compound 9 was synthesized in the same manner as in compound 1, using Intermediate OP4 instead of di ([1,1′-biphenyl] -4-yl) amine in Example 1.
m/z: 718.30 (100.0%), 719.30 (58.5%), 720.31 (16.4%), 721.31 (3.2%)m / z: 718.30 (100.0%), 719.30 (58.5%), 720.31 (16.4%), 721.31 (3.2%)
실시예 8: 화합물 8의 합성Example 8: Synthesis of Compound 8
상기 실시예 1에서 di([1,1'-biphenyl]-4-yl)amine 대신 중간체 OP5를 사용하여 화합물 1과 같은 방법으로 화합물 8을 합성하였다.Compound 8 was synthesized in the same manner as in compound 1, using Intermediate OP5 instead of di ([1,1′-biphenyl] -4-yl) amine in Example 1.
m/z: 760.35 (100.0%), 761.35 (61.1%), 762.35 (19.0%), 763.36 (3.6%)m / z: 760.35 (100.0%), 761.35 (61.1%), 762.35 (19.0%), 763.36 (3.6%)
실시예 9: 화합물 9의 합성Example 9: Synthesis of Compound 9
중간체 A 대신 중간체 B를 사용하여 화합물 1과 같은 방법으로 화합물 9를 합성하였다. Compound 9 was synthesized in the same manner as Compound 1 using Intermediate B instead of Intermediate A.
m/z: 677.27 (100.0%), 678.28 (55.6%), 679.28 (15.4%), 680.28 (2.9%)m / z: 677.27 (100.0%), 678.28 (55.6%), 679.28 (15.4%), 680.28 (2.9%)
실시예 10: 화합물 10의 합성Example 10 Synthesis of Compound 10
중간체 A 대신 중간체 B를 사용하여 화합물 2와 같은 방법으로 화합물 10을 합성하였다. Compound 10 was synthesized in the same manner as Compound 2 using Intermediate B instead of Intermediate A.
m/z: 717.30 (100.0%), 718.31 (58.9%), 719.31 (17.2%), 720.31 (3.3%)m / z: 717.30 (100.0%), 718.31 (58.9%), 719.31 (17.2%), 720.31 (3.3%)
실시예 11: 화합물 11의 합성Example 11: Synthesis of Compound 11
중간체 A 대신 중간체 B를 사용하여 화합물 4와 같은 방법으로 화합물 11을 합성하였다. Compound 11 was synthesized in the same manner as Compound 4 using Intermediate B instead of Intermediate A.
m/z: 844.35 (100.0%), 845.35 (68.7%), 846.35 (23.9%), 847.36 (5.1%)m / z: 844.35 (100.0%), 845.35 (68.7%), 846.35 (23.9%), 847.36 (5.1%)
실시예 12: 화합물 12의 합성Example 12: Synthesis of Compound 12
중간체 A 대신 중간체 B를 사용하여 화합물 7과 같은 방법으로 화합물14를 합성하였다. Compound 14 was synthesized in the same manner as Compound 7 using Intermediate B instead of Intermediate A.
m/z: 842.33 (100.0%), 843.33 (68.9%), 844.34 (23.2%), 845.34 (5.3%)m / z: 842.33 (100.0%), 843.33 (68.9%), 844.34 (23.2%), 845.34 (5.3%)
실시예 13: 화합물 13의 합성Example 13: Synthesis of Compound 13
중간체 A 대신 중간체 B를 사용하여 화합물 8과 같은 방법으로 화합물 13을 합성하였다. Compound 13 was synthesized in the same manner as Compound 8 using Intermediate B instead of Intermediate A.
m/z: 884.38 (100.0%), 885.38 (72.0%), 886.38 (25.9%), 887.39 (5.9%), 888.39 (1.1%)m / z: 884.38 (100.0%), 885.38 (72.0%), 886.38 (25.9%), 887.39 (5.9%), 888.39 (1.1%)
실시예 14: 화합물 14의 합성Example 14 Synthesis of Compound 14
중간체 A 대신 중간체 C를 사용하여 화합물 1과 같은 방법으로 화합물 14를 합성하였다. Compound 14 was synthesized in the same manner as compound 1 using intermediate C instead of intermediate A.
m/z: 569.22 (100.0%), 570.22 (45.5%), 571.22 (10.1%), 571.21 (4.5%), 572.22 (2.1%), 572.23 (1.4%)m / z: 569.22 (100.0%), 570.22 (45.5%), 571.22 (10.1%), 571.21 (4.5%), 572.22 (2.1%), 572.23 (1.4%)
실시예 15: 화합물 15의 합성Example 15 Synthesis of Compound 15
중간체 A 대신 중간체 C를 사용하여 화합물 2와 같은 방법으로 화합물 15를 합성하였다. Compound 15 was synthesized in the same manner as compound 2 using intermediate C instead of intermediate A.
m/z: 609.25 (100.0%), 610.25 (48.8%), 611.26 (11.3%), 611.24 (4.5%), 612.25 (2.2%), 612.26 (1.8%)m / z: 609.25 (100.0%), 610.25 (48.8%), 611.26 (11.3%), 611.24 (4.5%), 612.25 (2.2%), 612.26 (1.8%)
실시예 16: 화합물 16의 합성Example 16: Synthesis of Compound 16
중간체 A 대신 중간체 C를 사용하여 화합물 3과 같은 방법으로 화합물 16을 합성하였다. Compound 16 was synthesized in the same manner as compound 3 using intermediate C instead of intermediate A.
m/z: 645.25 (100.0%), 646.25 (52.0%), 647.26 (12.9%), 647.24 (4.5%), 648.25 (2.4%), 648.26 (2.2%)m / z: 645.25 (100.0%), 646.25 (52.0%), 647.26 (12.9%), 647.24 (4.5%), 648.25 (2.4%), 648.26 (2.2%)
실시예 17: 화합물 17의 합성Example 17 Synthesis of Compound 17
중간체 A 대신 중간체 C를 사용하여 화합물 4와 같은 방법으로 화합물 17을 합성하였다.Compound 17 was synthesized in the same manner as compound 4 using intermediate C instead of intermediate A.
m/z: 736.29 (100.0%), 737.29 (58.9%), 738.30 (16.4%), 738.29 (5.4%), 739.30 (3.2%), 739.29 (2.7%)m / z: 736.29 (100.0%), 737.29 (58.9%), 738.30 (16.4%), 738.29 (5.4%), 739.30 (3.2%), 739.29 (2.7%)
실시예 18: 화합물 18의 합성Example 18: Synthesis of Compound 18
중간체 A 대신 중간체 C를 사용하여 화합물 5와 같은 방법으로 화합물 18을 합성하였다.Compound 18 was synthesized in the same manner as Compound 5 using Intermediate C instead of Intermediate A.
m/z: 710.28 (100.0%), 711.28 (55.6%), 712.28 (15.8%), 712.27 (4.5%), 713.29 (2.7%), 713.27 (2.5%), 711.27 (1.5%)m / z: 710.28 (100.0%), 711.28 (55.6%), 712.28 (15.8%), 712.27 (4.5%), 713.29 (2.7%), 713.27 (2.5%), 711.27 (1.5%)
실시예 19: 화합물 19의 합성Example 19: Synthesis of Compound 19
중간체 A 대신 중간체 C를 사용하여 화합물 6과 같은 방법으로 화합물 19를 합성하였다.Compound 19 was synthesized in the same manner as Compound 6 using Intermediate C instead of Intermediate A.
m/z: 658.24 (100.0%), 659.25 (51.2%), 660.25 (13.3%), 660.24 (4.9%), 661.24 (2.3%), 661.25 (2.3%), 659.24 (1.5%)m / z: 658.24 (100.0%), 659.25 (51.2%), 660.25 (13.3%), 660.24 (4.9%), 661.24 (2.3%), 661.25 (2.3%), 659.24 (1.5%)
실시예 20: 화합물 20의 합성Example 20 Synthesis of Compound 20
중간체 A 대신 중간체 C를 사용하여 화합물 7과 같은 방법으로 화합물 20을 합성하였다.Compound 20 was synthesized in the same manner as compound 7 using intermediate C instead of intermediate A.
m/z: 734.28 (100.0%), 735.28 (57.8%), 736.28 (17.0%), 736.27 (4.5%), 737.29 (3.0%), 737.27 (2.6%), 735.27 (1.5%)m / z: 734.28 (100.0%), 735.28 (57.8%), 736.28 (17.0%), 736.27 (4.5%), 737.29 (3.0%), 737.27 (2.6%), 735.27 (1.5%)
실시예 21: 화합물 21의 합성Example 21: Synthesis of Compound 21
중간체 A 대신 중간체 C를 사용하여 화합물 8과 같은 방법으로 화합물 21을 합성하였다.Compound 21 was synthesized in the same manner as compound 8 using intermediate C instead of intermediate A.
m/z: 776.32 (100.0%), 777.33 (61.1%), 778.33 (18.8%), 778.32 (5.0%), 779.33 (3.8%), 779.32 (2.8%), 777.32 (1.5%)m / z: 776.32 (100.0%), 777.33 (61.1%), 778.33 (18.8%), 778.32 (5.0%), 779.33 (3.8%), 779.32 (2.8%), 777.32 (1.5%)
실시예 22: 화합물 22의 합성Example 22: Synthesis of Compound 22
중간체 A 대신 중간체 D를 사용하여 화합물 1과 같은 방법으로 화합물 22를 합성하였다.Compound 22 was synthesized in the same manner as Compound 1 using Intermediate D instead of Intermediate A.
m/z: 693.25 (100.0%), 694.25 (56.3%), 695.26 (15.1%), 695.24 (4.5%), 696.26 (2.8%), 696.25 (2.6%)m / z: 693.25 (100.0%), 694.25 (56.3%), 695.26 (15.1%), 695.24 (4.5%), 696.26 (2.8%), 696.25 (2.6%)
실시예 23: 화합물 23의 합성Example 23: Synthesis of Compound 23
중간체 A 대신 중간체 D를 사용하여 화합물 2와 같은 방법으로 화합물 23을 합성하였다.Compound 23 was synthesized in the same manner as Compound 2 using Intermediate D instead of Intermediate A.
m/z: 733.28 (100.0%), 734.28 (59.6%), 735.29 (17.0%), 735.28 (5.2%), 736.29 (3.4%), 736.28 (2.7%)m / z: 733.28 (100.0%), 734.28 (59.6%), 735.29 (17.0%), 735.28 (5.2%), 736.29 (3.4%), 736.28 (2.7%)
실시예 24: 화합물 24의 합성Example 24: Synthesis of Compound 24
중간체 A 대신 중간체 D를 사용하여 화합물 4와 같은 방법으로 화합물 24를 합성하였다.Compound 24 was synthesized in the same manner as Compound 4 using Intermediate D instead of Intermediate A.
m/z: 860.32 (100.0%), 861.33 (68.6%), 862.33 (23.7%), 863.33 (5.4%), 862.32 (5.0%), 863.32 (3.1%), 861.32 (1.5%), 864.33 (1.1%)m / z: 860.32 (100.0%), 861.33 (68.6%), 862.33 (23.7%), 863.33 (5.4%), 862.32 (5.0%), 863.32 (3.1%), 861.32 (1.5%), 864.33 (1.1% )
실시예 25: 화합물 25의 합성Example 25 Synthesis of Compound 25
중간체 A 대신 중간체 D를 사용하여 화합물 7과 같은 방법으로 화합물 25를 합성하였다.Compound 25 was synthesized in the same manner as Compound 7 using Intermediate D instead of Intermediate A.
m/z: 858.31 (100.0%), 859.31 (69.4%), 860.31 (23.9%), 861.32 (5.1%), 860.30 (4.5%), 861.31 (3.5%), 862.31 (1.1%)m / z: 858.31 (100.0%), 859.31 (69.4%), 860.31 (23.9%), 861.32 (5.1%), 860.30 (4.5%), 861.31 (3.5%), 862.31 (1.1%)
실시예 26: 화합물 26의 합성Example 26: Synthesis of Compound 26
중간체 A 대신 중간체 D를 사용하여 화합물 8과 같은 방법으로 화합물 26을 합성하였다.Compound 26 was synthesized in the same manner as Compound 8 using Intermediate D instead of Intermediate A.
m/z: 900.35 (100.0%), 901.36 (71.9%), 902.36 (26.1%), 903.36 (6.2%), 902.35 (5.1%), 903.35 (3.3%), 901.35 (1.5%), 904.36 (1.2%), 904.37 (1.0%)m / z: 900.35 (100.0%), 901.36 (71.9%), 902.36 (26.1%), 903.36 (6.2%), 902.35 (5.1%), 903.35 (3.3%), 901.35 (1.5%), 904.36 (1.2% ), 904.37 (1.0%)
유기발광소자의 제조Fabrication of Organic Light Emitting Diode
도 1에 기재된 구조에 따라 유기발광소자를 제조하였다. 유기발광소자는 아래로부터 양극(정공주입전극(11))/정공주입층(12)/정공수송층(13)/발광층(14)/전자전달층(15)/음극(전자주입전극(16)) 순으로 적층시켰다.An organic light emitting device was manufactured according to the structure of FIG. 1. The organic light emitting element is formed from the bottom of the anode (hole injection electrode 11) / hole injection layer 12 / hole transport layer 13 / light emitting layer 14 / electron transfer layer 15 / cathode (electron injection electrode 16) It was laminated in order.
실시예 및 비교예의 정공주입층(12), 정공전달층(13), 발광층(14), 전자전달층(15)는 아래와 같은 물질을 사용하였다.The hole injection layer 12, the hole transport layer 13, the light emitting layer 14, and the electron transport layer 15 of Examples and Comparative Examples used the following materials.
실시예 27Example 27
인듐틴옥사이드(ITO)가 1500 Å 두께가 박막 코팅된 유리 기판을 증류수 초음파로 세척하였다. 증류수 세척이 끝나면 이소프로필알코올, 아세톤, 메탄올 등의 용제로 초음파 세척을 하고 건조시킨 후 플라즈마 세정기로 이송시킨 다음 산소 플라즈마를 이용하여 상기 기판을 5분간 세정 한 후 ITO 기판 상부에 열 진공 증착기(thermal evaporator)를 이용하여 정공주입층 HT01 600 Å, 정공수송층으로 화합물 1 250 Å를 제막하였다. 다음으로 상기 발광층으로 BH01:BD01 5%로 도핑하여 250 Å 제막하였다. 다음으로 전자전달층으로 ET01:Liq(1:1) 300 Å 제막한 후 LiF 10 Å, 알루미늄(Al) 1000 Å 제막하고, 이 소자를 글로브 박스에서 밀봉(Encapsulation)함으로써 유기발광소자를 제작하였다.A glass substrate coated with an indium tin oxide (ITO) 1500 Å thick thin film was washed by distilled water ultrasonically. After washing the distilled water, ultrasonic cleaning with a solvent such as isopropyl alcohol, acetone, methanol, etc., dried and transferred to a plasma cleaner, and then cleaned the substrate using oxygen plasma for 5 minutes and then a thermal vacuum evaporator (thermal Compound 1 250 Hz was formed into a hole injection layer HT01 600 Hz and a hole transport layer using the evaporator. Next, the light emitting layer was doped with BH01: BD01 5% to form 250 Å. Next, ET01: Liq (1: 1) 300 Å was formed into an electron transport layer, followed by LiF 10 Å and aluminum (Al) 1000 막.
실시예 28 내지 실시예 52Examples 28-52
실시예 27과 같은 방법으로 정공주입층 및 정공전달층을 각각 화합물 2 내지 26을 사용하여 제막한 유기발광소자를 제작하였다.In the same manner as in Example 27, an organic light emitting diode was manufactured in which the hole injection layer and the hole transport layer were formed using the compounds 2 to 26, respectively.
비교예 1 Comparative Example 1
상기 실시예 1의 정공수송층으로 화합물 1을 대신하여 NPB로 사용한 것을 제외하고는 동일한 방법으로 소자를 제작하였다.A device was manufactured in the same manner as in Example 1, except that Compound 1 was used as NPB instead of Compound 1 as the hole transport layer.
비교예 2 Comparative Example 2
상기 실시예 1의 정공수송층으로 화합물 1을 대신하여 비교화합물 1로 사용한 것을 제외하고는 동일한 방법으로 소자를 제작하였다.A device was manufactured in the same manner as in Example 1, except that Compound 1 was used as Comparative Compound 1 instead of Compound 1 as a hole transport layer.
유기발광소자의 성능평가Performance Evaluation of Organic Light Emitting Diode
키슬리 2400 소스 메져먼트 유닛(Kiethley 2400 source measurement unit)으로 전압을 인가하여 전자 및 정공을 주입하고 코니카 미놀타(Konica Minolta) 분광복사계(CS-2000)를 이용하여 빛이 방출될 때의 휘도를 측정함으로써, 실시예 및 비교예의 유기발광소자의 성능을 인가전압에 대한 전류 밀도 및 휘도를 대기압 조건하에 측정하여 평가하였으며, 그 결과를 표 1에 나타내었다.Inject electrons and holes by applying voltage to a Keithley 2400 source measurement unit and measure the luminance when light is emitted using the Konica Minolta Spectroradiometer (CS-2000) Thus, the performance of the organic light emitting diodes of Examples and Comparative Examples was evaluated by measuring the current density and luminance with respect to the applied voltage under atmospheric pressure conditions, and the results are shown in Table 1.
표 1
Table 1
Op. V | mA/cm2 | Cd/A | lm/w | CIEx | CIEy | 수명 | |
실시예 27 | 4.031 | 10 | 6.09 | 3.80 | 0.141 | 0.121 | 27 |
실시예 28 | 4.052 | 10 | 6.25 | 3.79 | 0.141 | 0.120 | 30 |
실시예 29 | 4.013 | 10 | 5.98 | 3.91 | 0.142 | 0.120 | 29 |
실시예 30 | 4.031 | 10 | 5.95 | 3.89 | 0.139 | 0.119 | 33 |
실시예 31 | 4.054 | 10 | 6.17 | 3.91 | 0.140 | 0.118 | 34 |
실시예 32 | 4.056 | 10 | 6.10 | 3.92 | 0.140 | 0.117 | 41 |
실시예 33 | 4.035 | 10 | 6.13 | 3.87 | 0.138 | 0.118 | 42 |
실시예 34 | 4.041 | 10 | 5.99 | 3.89 | 0.141 | 0.119 | 37 |
실시예 35 | 4.028 | 10 | 6.00 | 3.90 | 0.142 | 0.116 | 39 |
실시예 36 | 4.021 | 10 | 6.27 | 3.93 | 0.141 | 0.115 | 45 |
실시예 37 | 4.031 | 10 | 6.03 | 3.88 | 0.142 | 0.115 | 40 |
실시예 38 | 4.061 | 10 | 6.17 | 3.90 | 0.141 | 0.116 | 40 |
실시예 39 | 4.052 | 10 | 5.98 | 3.85 | 0.141 | 0.114 | 32 |
실시예 40 | 4.061 | 10 | 5.80 | 3.80 | 0.142 | 0.114 | 29 |
실시예 41 | 4.067 | 10 | 5.79 | 3.80 | 0.142 | 0.116 | 29 |
실시예 42 | 4.067 | 10 | 5.78 | 3.81 | 0.142 | 0.116 | 31 |
실시예 43 | 4.051 | 10 | 5.82 | 3.79 | 0.141 | 0.117 | 30 |
실시예 44 | 4.068 | 10 | 5.87 | 3.77 | 0.141 | 0.114 | 30 |
실시예 45 | 4.059 | 10 | 5.80 | 3.77 | 0.141 | 0.114 | 27 |
실시예 46 | 4.057 | 10 | 5.82 | 3.80 | 0.141 | 0.114 | 29 |
실시예 47 | 4.060 | 10 | 5.87 | 3.85 | 0.140 | 0.115 | 35 |
실시예 48 | 4.060 | 10 | 5.89 | 3.79 | 0.141 | 0.115 | 33 |
실시예 49 | 4.059 | 10 | 5.90 | 3.78 | 0.142 | 0.115 | 33 |
실시예 50 | 4.058 | 10 | 5.87 | 3.84 | 0.142 | 0.114 | 30 |
실시예 51 | 4.055 | 10 | 5.90 | 3.87 | 0.141 | 0.113 | 29 |
실시예 52 | 4.060 | 10 | 5.85 | 3.87 | 0.141 | 0.113 | 27 |
비교예 1 | 5.032 | 10 | 4.67 | 3.26 | 0.143 | 0.128 | 12 |
비교예 2 | 4.737 | 10 | 4.78 | 3.54 | 0.141 | 0.122 | 15 |
Op. V | mA / cm2 | Cd / A | lm / w | CIEx | CIEy | life span | |
Example 27 | 4.031 | 10 | 6.09 | 3.80 | 0.141 | 0.121 | 27 |
Example 28 | 4.052 | 10 | 6.25 | 3.79 | 0.141 | 0.120 | 30 |
Example 29 | 4.013 | 10 | 5.98 | 3.91 | 0.142 | 0.120 | 29 |
Example 30 | 4.031 | 10 | 5.95 | 3.89 | 0.139 | 0.119 | 33 |
Example 31 | 4.054 | 10 | 6.17 | 3.91 | 0.140 | 0.118 | 34 |
Example 32 | 4.056 | 10 | 6.10 | 3.92 | 0.140 | 0.117 | 41 |
Example 33 | 4.035 | 10 | 6.13 | 3.87 | 0.138 | 0.118 | 42 |
Example 34 | 4.041 | 10 | 5.99 | 3.89 | 0.141 | 0.119 | 37 |
Example 35 | 4.028 | 10 | 6.00 | 3.90 | 0.142 | 0.116 | 39 |
Example 36 | 4.021 | 10 | 6.27 | 3.93 | 0.141 | 0.115 | 45 |
Example 37 | 4.031 | 10 | 6.03 | 3.88 | 0.142 | 0.115 | 40 |
Example 38 | 4.061 | 10 | 6.17 | 3.90 | 0.141 | 0.116 | 40 |
Example 39 | 4.052 | 10 | 5.98 | 3.85 | 0.141 | 0.114 | 32 |
Example 40 | 4.061 | 10 | 5.80 | 3.80 | 0.142 | 0.114 | 29 |
Example 41 | 4.067 | 10 | 5.79 | 3.80 | 0.142 | 0.116 | 29 |
Example 42 | 4.067 | 10 | 5.78 | 3.81 | 0.142 | 0.116 | 31 |
Example 43 | 4.051 | 10 | 5.82 | 3.79 | 0.141 | 0.117 | 30 |
Example 44 | 4.068 | 10 | 5.87 | 3.77 | 0.141 | 0.114 | 30 |
Example 45 | 4.059 | 10 | 5.80 | 3.77 | 0.141 | 0.114 | 27 |
Example 46 | 4.057 | 10 | 5.82 | 3.80 | 0.141 | 0.114 | 29 |
Example 47 | 4.060 | 10 | 5.87 | 3.85 | 0.140 | 0.115 | 35 |
Example 48 | 4.060 | 10 | 5.89 | 3.79 | 0.141 | 0.115 | 33 |
Example 49 | 4.059 | 10 | 5.90 | 3.78 | 0.142 | 0.115 | 33 |
Example 50 | 4.058 | 10 | 5.87 | 3.84 | 0.142 | 0.114 | 30 |
Example 51 | 4.055 | 10 | 5.90 | 3.87 | 0.141 | 0.113 | 29 |
Example 52 | 4.060 | 10 | 5.85 | 3.87 | 0.141 | 0.113 | 27 |
Comparative Example 1 | 5.032 | 10 | 4.67 | 3.26 | 0.143 | 0.128 | 12 |
Comparative Example 2 | 4.737 | 10 | 4.78 | 3.54 | 0.141 | 0.122 | 15 |
상기 표 1에 나타나는 바와 같이 본 발명의 실시예들은 비교예 1 및 비교예 2에 비하여 모든 면에서 물성이 우수함을 확인할 수 있다. 이는 본 화합물이 정공 주입이 용이하고 정공 수송이 뛰어나 저전압 구동, 고효율 및 장수명을 가진 것을 알 수 있다.As shown in Table 1, the embodiments of the present invention can be confirmed that the physical properties are excellent in all aspects compared to Comparative Example 1 and Comparative Example 2. It can be seen that the present compound has low voltage driving, high efficiency and long life due to easy hole injection and excellent hole transport.
본 발명의 화합물은 정공주입이 용이한 HOMO 에너지 레벨을 가지며, 전자를 차단할 수 있는 높은 LUMO 에너지 레벨을 가지며, 정공수송 특성이 우수하고, 유기발광소자의 정공주입층 또는 정공수송층에 적용시 우수한 저전압, 고효율, 높은 Tg로 인한 안정성 및 장수명을 가지게 할 수 있다.The compound of the present invention has a HOMO energy level that is easy to inject holes, has a high LUMO energy level that can block electrons, excellent hole transport characteristics, excellent low voltage when applied to the hole injection layer or hole transport layer of the organic light emitting device It has high stability, long life due to high efficiency and high Tg.
Claims (6)
- 하기 화학식 1로 표시되는 화합물:Compound represented by the following formula (1):[화학식 1][Formula 1]상기 식에서,WhereX는 각각 독립적으로 O, S, Se 또는 Te이며,Each X is independently O, S, Se or Te,Ar1, Ar2, Ar3 및 Ar4는 각각 독립적으로 각각 독립적으로 중수소, 할로겐, 아미노기, 니트릴기, 니트로기, C1-30의 알킬기, C2-30의 알케닐기, C2-30의 알키닐기, C1-30의 알콕시기, C6-30의 아릴옥시기, C6-30의 아릴기, 또는 C2-30의 헤테로아릴기로 치환되거나 치환되지 않은 C6-50의 아릴기; 또는 중수소, 할로겐, 아미노기, 니트릴기, 니트로기, C1-30의 알킬기, C2-30의 알케닐기, C2-30의 알키닐기, C1-30의 알콕시기, C6-30의 아릴옥시기, C6-30의 아릴기, 또는 C2-30의 헤테로아릴기로 치환되거나 치환되지 않은 C2-50의 헤테로아릴기이고, 상기 Ar2와 Ar3는 서로 연결될 수 있으며,Ar 1 , Ar 2 , Ar 3 and Ar 4 are each independently deuterium, halogen, amino group, nitrile group, nitro group, C 1-30 alkyl group, C 2-30 alkenyl group, C 2-30 an aryl group of an alkynyl group, an alkoxy group of C 1-30, are C 6-30 aryloxy groups, be substituted by a heteroaryl group of the C 6-30 aryl group, or a C 2-30 substituted or the C 6-50; Or deuterium, halogen, amino group, nitrile group, nitro group, C 1-30 alkyl group, C 2-30 alkenyl group, C 2-30 alkynyl group, C 1-30 alkoxy group, C 6-30 aryl Or a C 2-50 heteroaryl group which is unsubstituted or substituted with an oxy group, a C 6-30 aryl group, or a C 2-30 heteroaryl group, and Ar 2 and Ar 3 may be connected to each other,R1 및 R2는 각각 독립적으로 수소; 중수소; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C1-30의 알킬기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-30의 알케닐기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-30의 알키닐기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C1-30의 알콕시기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C6-30의 아릴옥시기; 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C6-50의 아릴기; 또는 중수소, 할로겐, 아미노기, 니트릴기, 니트로기로 치환되거나 치환되지 않은 C2-50의 헤테로아릴기이며,R 1 and R 2 are each independently hydrogen; heavy hydrogen; C 1-30 alkyl group unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; C 2-30 alkenyl groups unsubstituted or substituted with deuterium, halogen, amino, nitrile, and nitro groups; C 2-30 alkynyl group which is unsubstituted or substituted with deuterium, halogen, amino group, nitrile group, nitro group; A C 1-30 alkoxy group unsubstituted or substituted with deuterium, halogen, amino, nitrile or nitro group; C 6-30 aryloxy group which is unsubstituted or substituted with deuterium, halogen, amino, nitrile or nitro group; C 6-50 aryl group which is optionally substituted with deuterium, halogen, amino group, nitrile group, nitro group; Or a C 2-50 heteroaryl group unsubstituted or substituted with deuterium, a halogen, an amino group, a nitrile group, a nitro group,m은 1 또는 2이며,m is 1 or 2,n은 0 내지 2의 정수이며, n is an integer from 0 to 2,*-는 결합부위이다.*-Is a coupling site.
- 제1항에 있어서,The method of claim 1,하기 화학식 2 내지 3으로 표시되는 것 중 하나로 표시되는 것을 특징으로 하는 화합물:Compounds characterized in that represented by one of the following formulas 2 to 3:[화학식 2][Formula 2][화학식 3][Formula 3]상기 화학식 2 또는 3에서 X, Ar1, Ar2, Ar4, R1 및 R2는 화학식 1에서 정의한 바와 같으며, R3은 R1의 정의와 같다.In Formula 2 or 3, X, Ar 1 , Ar 2 , Ar 4 , R 1 and R 2 are the same as defined in Formula 1, and R 3 is the same as the definition of R 1 .
- 하기 반응식 1로 표시되는 화학식 1의 제조방법:The preparation method of Chemical Formula 1 represented by Scheme 1 below:[반응식 1]Scheme 1상기 반응식에서 상기 화학식 2 또는 3에서 X, Ar1, Ar2, Ar3, Ar4, R1, R2, m 및 n은 화학식 1에서 정의한 바와 같으며, 상기 R은 R1 또는 R2이다.In Formula 2 or 3, X, Ar 1 , Ar 2 , Ar 3 , Ar 4 , R 1 , R 2 , m and n are the same as defined in Formula 1, wherein R is R 1 or R 2 .
- 애노드(anode), 캐소드(cathode) 및 두 전극 사이에 제1항 기재의 화합물을 함유하는 1층 이상의 유기물층을 포함하는 유기발광소자.An organic light emitting device comprising an anode, a cathode and at least one organic layer containing the compound of claim 1 between two electrodes.
- 제5항에 있어서,The method of claim 5,상기 유기물층이 정공주입층 또는 정공수송층인 것을 특징으로 하는 유기발광소자.The organic light emitting device, characterized in that the organic material layer is a hole injection layer or a hole transport layer.
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