WO2015152210A1 - Procédé de retrait d'un ongle artificiel - Google Patents

Procédé de retrait d'un ongle artificiel Download PDF

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Publication number
WO2015152210A1
WO2015152210A1 PCT/JP2015/060069 JP2015060069W WO2015152210A1 WO 2015152210 A1 WO2015152210 A1 WO 2015152210A1 JP 2015060069 W JP2015060069 W JP 2015060069W WO 2015152210 A1 WO2015152210 A1 WO 2015152210A1
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WIPO (PCT)
Prior art keywords
artificial nail
nail
group
polymer
artificial
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PCT/JP2015/060069
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English (en)
Japanese (ja)
Inventor
元気 高梨
朋樹 落水
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富士フイルム株式会社
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Filing date
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Publication of WO2015152210A1 publication Critical patent/WO2015152210A1/fr

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    • A—HUMAN NECESSITIES
    • A45—HAND OR TRAVELLING ARTICLES
    • A45D—HAIRDRESSING OR SHAVING EQUIPMENT; EQUIPMENT FOR COSMETICS OR COSMETIC TREATMENTS, e.g. FOR MANICURING OR PEDICURING
    • A45D29/00—Manicuring or pedicuring implements
    • A45D29/18—Manicure or pedicure sets, e.g. combinations without case, etui, or the like
    • A—HUMAN NECESSITIES
    • A45—HAND OR TRAVELLING ARTICLES
    • A45D—HAIRDRESSING OR SHAVING EQUIPMENT; EQUIPMENT FOR COSMETICS OR COSMETIC TREATMENTS, e.g. FOR MANICURING OR PEDICURING
    • A45D31/00—Artificial nails
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00—Cosmetics or similar toiletry preparations
    • A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/19—Cosmetics or similar toiletry preparations characterised by the composition containing inorganic ingredients
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00—Cosmetics or similar toiletry preparations
    • A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/19—Cosmetics or similar toiletry preparations characterised by the composition containing inorganic ingredients
    • A61K8/20—Halogens; Compounds thereof
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00—Cosmetics or similar toiletry preparations
    • A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/30—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
    • A61K8/33—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing oxygen
    • A61K8/34—Alcohols
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00—Cosmetics or similar toiletry preparations
    • A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/30—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
    • A61K8/33—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing oxygen
    • A61K8/34—Alcohols
    • A61K8/347—Phenols
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00—Cosmetics or similar toiletry preparations
    • A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/30—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
    • A61K8/33—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing oxygen
    • A61K8/35—Ketones, e.g. benzophenone
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00—Cosmetics or similar toiletry preparations
    • A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/30—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
    • A61K8/33—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing oxygen
    • A61K8/36—Carboxylic acids; Salts or anhydrides thereof
    • A61K8/365—Hydroxycarboxylic acids; Ketocarboxylic acids
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00—Cosmetics or similar toiletry preparations
    • A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/30—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
    • A61K8/33—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing oxygen
    • A61K8/37—Esters of carboxylic acids
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61Q—SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
    • A61Q3/00—Manicure or pedicure preparations
    • A61Q3/04—Nail coating removers

Definitions

  • the present invention relates to a method for removing an artificial nail.
  • An object of the present invention is to provide a method for removing an artificial nail having a reduced removal time.
  • ⁇ 1> An interface exposure step of polishing and / or cutting the tip of the artificial nail formed on the nail to expose a part of the interface between the nail and the artificial nail, and a removing liquid at the interface between the nail and the artificial nail
  • a method for removing an artificial nail comprising: a removing liquid contact step for bringing the artificial nail into contact; and a peeling step for peeling the artificial nail from the nail starting from the exposed interface;
  • ⁇ 2> The method for removing an artificial nail according to ⁇ 1>, wherein the artificial nail is formed by curing a curable composition with actinic rays.
  • ⁇ 3> The interface exposure step according to ⁇ 1> or ⁇ 2>, wherein the interface exposure step is a step of polishing a tip of the artificial nail formed on the nail to expose a part of the interface between the nail and the artificial nail.
  • Artificial nail removal method ⁇ 4> The method for removing an artificial nail according to any one of ⁇ 1> to ⁇ 3>, wherein the peeling step is a step of picking up and peeling off the tip of the artificial nail.
  • the angle formed between the nail and the polished and / or cut surface is greater than 0 ° and less than 90 ° (more preferably greater than 1 ° and less than 89 °, more preferably greater than 2 ° and less than 80 °, further
  • the method for removing an artificial nail according to any one of ⁇ 1> to ⁇ 4>, preferably greater than 5 ° and less than 70 °, ⁇ 6> The method for removing an artificial nail according to any one of ⁇ 1> to ⁇ 5>, wherein the removal liquid contact step and the peeling step are repeated.
  • ⁇ 7> The method for removing an artificial nail according to any one of ⁇ 1> to ⁇ 6>, wherein the removal liquid is an organic solvent or an acidic aqueous solution, ⁇ 8>
  • the removal solution is an acidic aqueous solution
  • the pH is 5.0 or less (more preferably 4.0 or less, more preferably 3.0 or less)
  • the pH is 1.0 or more (more preferably 2).
  • the method for removing an artificial nail according to any one of ⁇ 1> to ⁇ 7>, ⁇ 9> The artificial nail according to any one of ⁇ 1> to ⁇ 8>, wherein the artificial nail is an artificial nail formed by photocuring an artificial nail composition containing a polymer having an amino group as component a
  • the method of removing the described artificial nail, ⁇ 10> The method for removing an artificial nail according to ⁇ 9>, wherein the component a is a urethane polymer or an acrylic polymer.
  • the above-mentioned artificial nail composition is a monofunctional compound having, as Component B, an ethylenically unsaturated compound having a hydroxy group (more preferably a hydroxyalkyl (meth) acrylate, more preferably a hydroxyalkyl ester having 3 to 10 carbon atoms)
  • a method for removing an artificial nail having a reduced removal time is provided.
  • the description of “xx to yy” represents a numerical range including xx and yy.
  • “polymerizable compound” or the like is also simply referred to as “component B” or the like.
  • “mass%” and “wt%” are synonymous, and “part by mass” and “part by weight” are synonymous.
  • the “artificial nail composition” is a composition for forming an artificial nail. In the present invention, a combination of two or more preferred embodiments is more preferred.
  • the method for removing an artificial nail includes an interface exposure step (hereinafter simply referred to as “near”) in which a tip of the artificial nail formed on the nail is polished and / or cut to expose a part of the interface between the nail and the artificial nail. Also referred to as an “interface exposure process”), a removal liquid contact process in which the removal liquid is brought into contact with the interface between the nail and the artificial nail (hereinafter also simply referred to as “removal liquid contact process”), and the exposed interface as a starting point. And a peeling step for peeling the artificial nail from the nail (hereinafter also simply referred to as “peeling step”).
  • the surface of the artificial nail is rubbed with a coarse file (nail file) to make it easy to soak up the removal solution, and then an organic solvent such as acetone (removal)
  • the method is to place cotton soaked on the above-mentioned artificial nail, wind it with aluminum foil, leave it as it is to swell the artificial nail, and then peel off this swollen artificial nail using a wooden spatula etc. It was mainstream.
  • the above method has a problem that it takes time to damage the artificial nail or swell the artificial nail.
  • the artificial nail is not sufficiently damaged, it takes time to swell, and the artificial nail remains on the nail.
  • the nail may be damaged.
  • the present inventors exposed the interface between the nail and the artificial nail at the tip of the artificial nail, brought the removal liquid into contact with the exposed interface, and further started the exposed interface (tip of the artificial nail).
  • the removal liquid can be directly contacted with the interface between the nail and the artificial nail, which is the interface to be peeled off, and the external force picking up the polished part is used for peeling the nail from the artificial nail. Since it effectively acts on the required external force, it is presumed that peeling between the nail and the artificial nail was achieved in a short time.
  • FIG. 1 is a schematic diagram showing all steps of the method for removing an artificial nail according to the present invention.
  • FIG. 1 schematically shows a cross-sectional view of a finger.
  • an arbitrary artificial nail 12 is formed on the nail 10.
  • the artificial nail 12 is preferably formed by curing a curable composition (artificial nail composition), and more preferably an artificial nail formed by curing the artificial nail composition with actinic rays.
  • the artificial nail 12 is formed so as to cover at least the tip of the nail 10 and is preferably formed so as to cover the entire surface of the nail 10.
  • the nail 12 in order to extend the nail using a nail foam or the like, it may be formed in a larger shape than the nail.
  • the artificial nail 12 is preferably formed so as to cover the tip of the nail 10 and enter not only the nail surface but also the back surface. This is for suppressing peeling between the nail and the artificial nail.
  • the interface exposure step is performed as the first step.
  • the tip of the artificial nail 12 formed on the nail 10 is polished and / or cut, and a part of the interface 16 between the nail 10 and the artificial nail 12 is obtained.
  • a part of the exposed interface is indicated by ⁇ .
  • the interface between the nail 10 and the artificial nail 12 means an interface where the nail surface and the artificial nail are in contact.
  • the artificial nail is formed so as to cover the tip of the nail before polishing and / or cutting, and the interface between the nail surface and the artificial nail is not exposed. . It is assumed that a part of the nail is exposed over time. However, in order to perform the peeling in a shorter time, polishing and / or cutting is performed so that the interface is exposed in the entire width direction of the nail at the nail tip. It is preferable to carry out.
  • the removing liquid contact step shown in FIG. 1D the removing liquid is brought into contact with the exposed interface between the nail 10 and the artificial nail 12.
  • the artificial nail swells or dissolves to weaken the adhesive force with the nail.
  • a peeling process for peeling the artificial nail 12 from the nail 10 is performed as shown in FIGS. 1 (d) and 1 (e).
  • FIG. 1 (d) the removal interface (not shown) is brought into contact with the exposed interface, and the tip of the artificial nail 12 is picked up by the tweezers 18 to peel the artificial nail 12 from the nail 10. is doing.
  • each process is explained in full detail.
  • the method for removing an artificial nail according to the present invention includes an interface exposure step of polishing and / or cutting the tip of the artificial nail formed on the nail to expose a part of the interface between the nail and the artificial nail.
  • the artificial nail is preferably formed on a human or animal nail or other artificial nail by curing by drying and / or exposure.
  • the artificial nail in the present invention refers to a layer formed on a human or animal nail for the purpose of beauty and / or protection.
  • a resin base material (nail chip) having an arbitrary shape for the purpose of beauty and / or protection of the nail may be used. “Human and animal nails and other artificial nails” are also simply referred to as “nails”.
  • the shape of the artificial nail is not particularly limited and may be formed in a desired shape, but it is preferably formed so as to cover at least the tip of the nail and so as to cover the surface of the nail. . In addition, in order to extend the nail using a nail foam or the like, it may be formed in a larger shape than the nail.
  • the thickness of the artificial nail can be controlled by the application amount of the artificial nail composition for forming the artificial nail. The thickness is not particularly limited as long as it can be taken by an artificial nail, but it is preferably in the range of 20 to 1,500 ⁇ m from the viewpoint of practicality and removability.
  • the artificial nail may be formed of a plurality of layers, for example, a primer layer, a base layer, a color layer, and / or a top layer.
  • the artificial nail is preferably formed of a curable composition, more preferably a photocurable artificial nail composition (“artificial nail composition for gel nail”).
  • the artificial nail is preferably formed by curing of the curable composition with actinic rays.
  • actinic rays are radiation that can give energy to generate a starting species in the artificial nail composition by irradiation, and includes ultraviolet light, visible light, and the like. Among these, ultraviolet rays are particularly preferable from the viewpoints of curing sensitivity and device availability.
  • the photocurable artificial nail composition is preferably an artificial nail composition that can be cured by irradiating ultraviolet rays as an actinic ray. Details of the artificial nail composition will be described later.
  • Examples of the method for exposing the interface include a method of cutting and / or polishing a nail and an artificial nail, and any method may be used. Cutting may be performed with nail clippers, scissors, etc., and polishing may be performed with a file (nail file) or the like.
  • the interface exposure process will be described in more detail with reference to FIG. FIG. 2 is a schematic diagram showing an interface exposure step and a preferable interface shape.
  • FIG. 1A an artificial nail 12 is formed on the nail 10.
  • An artificial nail is formed at the tip of the nail, and the interface between the nail and the artificial nail is not exposed.
  • the tip of the artificial nail is polished with a file (file) 14.
  • FIGS. 1B and 1C a part of the interface 16 between the nail 10 and the artificial nail 12 is exposed by polishing.
  • the polished and / or cut surface preferably has an angle at which the end of the artificial nail protrudes from the nail. That is, it is preferable to polish and / or cut so that the distance from the nail root to the tip of the artificial nail is longer than the distance from the nail root to the nail tip.
  • the angle formed between the nail and the polished and / or cut surface is preferably greater than 0 ° and less than 90 °.
  • an angle formed between the nail and the polished and / or cut surface will be described.
  • the angle refers to an angle formed by a perpendicular line drawn from the surface of the nail to the surface of the artificial nail at the tip of the nail, and a straight line perpendicular to the perpendicular line and a polished and / or cut surface. That is, when the polished and / or cut surface is the same as the angle of the perpendicular drawn from the back surface side of the nail to the front surface side of the nail, the angle formed is 90 °.
  • FIG. 3 is an explanatory diagram for obtaining the angle, and a cross-sectional view of the nail 10 and the artificial nail 12 is shown. At the tip of the nail, a perpendicular A is drawn from the surface side 10 ′ of the nail 10 toward the surface side 12 ′ of the artificial nail 12.
  • the angle formed with the polished and / or cut surface is indicated by ⁇ in FIG.
  • the measurement location of an angle is not specifically limited, It is preferable to measure in the center part of the width direction of a nail
  • ⁇ is more preferably greater than 1 ° and less than 89 °, more preferably greater than 2 ° and less than 80 °, and particularly preferably greater than 5 ° and less than 70 °.
  • the interface exposure step if the interface between the nail and the artificial nail is exposed, it may be exposed by polishing, may be exposed by cutting, or both may be used together, although not particularly limited. It is preferable to be exposed. Polishing is preferable because the angle ( ⁇ ) formed above can be easily adjusted to a desired range, and damage to the nail such as cracking or chipping of the nail can be suppressed.
  • the method for removing an artificial nail of the present invention includes a removal liquid contact step (removal solution contact step) in which a removal liquid is brought into contact with the interface between the nail and the artificial nail.
  • the removal liquid is brought into contact with at least the interface between the exposed nail and the artificial nail (hereinafter also simply referred to as “exposed interface”).
  • the method of contacting the interface between the nail and the artificial nail and the removal liquid is not particularly limited, and a method of immersing the tip of the nail including the interface exposed in the removal liquid (immersion method), an interface exposed by a dropper, etc.
  • a method of dripping the removal liquid toward the surface (dropping method), a method of spraying the removal liquid toward the exposed interface (spraying method), moistening cotton with a removal liquid and attaching it to the exposed interface
  • a method of attachment method examples thereof include a method (attachment method).
  • the dipping method is preferable from the viewpoint of easy work.
  • the temperature of the removal liquid is not particularly limited, but it is preferably 5 ° C. or higher and 50 ° C. or lower, and more preferably 10 ° C. or higher and 40 ° C. or lower from the viewpoint that the burden on the finger is small and handling is easy. preferable.
  • the removal liquid is warmed, in the case of the immersion method, the immersion liquid to be immersed may be warmed with a hot water bath or the like, or a container containing the removal liquid may be placed on a hot plate and warmed. Further, the removal liquid may be warmed by warming the tip of the finger including the interface between the nail and the artificial nail with an infrared heater or a warm air heater (including a dryer). When the adhesion method is adopted, a method of warming the finger tip is effective.
  • the removing liquid is not particularly limited, and may be any artificial nail to be used as long as it has an ability to weaken the adhesive force between the nail and the artificial nail by dissolving and / or swelling the artificial nail. Depending on the situation, it may be selected appropriately.
  • an organic solvent or an acidic aqueous solution is preferably exemplified. Details of the removal liquid will be described later.
  • the method for removing an artificial nail according to the present invention includes a peeling step (peeling step) for peeling the nail from the artificial nail starting from the exposed interface.
  • peeling step the artificial nail having weakened adhesive force with the nail is peeled from the nail by swelling, dissolving or the like by contact with the removing liquid.
  • the method for peeling the artificial nail include picking up, picking up, pulling up, and the like.
  • jigs to be picked up include tweezers, tweezers, forceps, and fingers.
  • a finger is exemplified as the jig to be lifted up, and an adhesive seal (an adhesive seal is affixed on the artificial nail and the artificial nail is peeled from the nail while pulling the adhesive seal) is exemplified as the jig to be pulled up. Is done.
  • a method of picking up using a jig such as tweezers or tweezers is preferable.
  • the method for removing an artificial nail of the present invention preferably includes an interface exposure step, a removing liquid contact step, and a peeling step in this order.
  • the removing liquid contact step and the interface exposure step can be performed simultaneously. It is particularly preferable to perform the removing liquid contact step and the peeling step at the same time.
  • it is preferable to perform the interface exposure process prior to the peeling process that is, it is preferable to perform the interface exposure process alone first, or to perform the interface exposure process and the removal liquid contact process at the same time. Is preferably carried out first alone.
  • the tip of the artificial nail is picked up and peeled off while the surface is brought into contact with the removing solution.
  • the total stripping time of the removal liquid contact step and the stripping step per finger is preferably 600 seconds or less.
  • the time is more preferably 300 seconds or shorter, still more preferably 180 seconds or shorter, and particularly preferably 60 seconds or shorter.
  • an artificial nail is formed on the nail prior to the interface exposure step.
  • the process for forming the artificial nail will be described.
  • the step of forming the artificial nail is not particularly limited, but the step of applying the artificial nail composition onto the nail of a human or animal or other artificial nail to form a coating film, and the coating film It is preferable to include a step of drying and / or exposing to form an artificial nail.
  • a dry or exposure forming method can be suitably selected.
  • the artificial nail composition is preferably formed by exposure.
  • the thickness of the layer formed by the artificial nail composition of the present invention in the method for forming an artificial nail of the present invention is not particularly limited, but is preferably 10 to 2,000 ⁇ m, and preferably 20 to 1,500 ⁇ m. More preferably, the thickness is more preferably 20 to 1,000 ⁇ m.
  • the artificial nail formation step of the present invention preferably includes a step (application step) of applying the artificial nail composition of the present invention on a human or animal nail or other artificial nail to form a coating film.
  • Other artificial nails are not particularly limited as long as they are base materials used for artificial nails, and examples thereof include resin base materials (nail chips) and already formed artificial nails.
  • limiting in particular as a coating method Although what is necessary is just to perform by a well-known method, The method of apply
  • the thickness of the coating film is not particularly limited, and the coating thickness may be appropriately adjusted in consideration of the desired thickness of the obtained artificial nail.
  • the method for forming an artificial nail of the present invention preferably includes a step of drying and / or exposing the coating film to form an artificial nail (drying or exposure step).
  • the artificial nail composition to be used preferably contains a solvent.
  • a drying method What is necessary is just to carry out by a well-known method. Specifically, for example, a method of leaving and drying at room temperature (for example, 10 to 30 ° C.), a method of leaving and drying in an air stream, a method of drying by heating, and a method combining these are preferable.
  • the heating method is not particularly limited, and examples thereof include a method of leaving in an atmosphere at a temperature higher than room temperature, a method of leaving in a heated air current, and a method of heating by a heating means such as a heater or an infrared lamp (IR lamp). .
  • the drying time is not particularly limited and may be appropriately adjusted depending on the composition of the artificial nail composition, the drying method, and the coating thickness. From the viewpoint of simplicity and imparting smoothness and gloss by self-leveling, 10 seconds to It is preferably 20 minutes, more preferably 15 seconds to 10 minutes, further preferably 30 seconds to 5 minutes, and particularly preferably 30 seconds to 2 minutes.
  • the artificial nail composition of the present invention to be used preferably contains a polymerizable compound as component B and a photopolymerization initiator as component C.
  • the artificial nail composition of this invention contains the solvent as a component D in addition to the component B and the component C, it is preferable to dry before performing exposure.
  • Examples of light used for exposure include ultraviolet rays and visible rays, and ultraviolet rays are particularly preferable from the viewpoint of curing sensitivity and availability of the apparatus.
  • the exposure means is not particularly limited, and known exposure means can be used. For example, ultraviolet lamps (UV lamps) such as mercury lamps and metal halide lamps, light emitting diodes (LEDs), laser diodes (LDs), etc.
  • UV lamp or an ultraviolet light emitting diode (UV-LED) is preferable.
  • the exposure time is not particularly limited, but is preferably 0.5 to 15 minutes, more preferably 0.5 to 10 minutes, and further preferably 0.5 to 7 minutes.
  • the exposure may be performed intermittently, continuously, or with pulsed light, and may be performed by any method.
  • the artificial nail forming step is performed by drying or exposing the artificial nail obtained after the drying or exposure step from the viewpoint of removing the uncured components when the artificial nail is obtained. It is preferable to further include a step of cleaning or wiping the surface.
  • the washing or wiping method include a method of wiping with a wiping base material such as a wipe sheet or a sponge wipe containing a solvent such as ethanol, and a method of washing with a solvent such as ethanol or water.
  • the solvent used for cleaning or wiping is preferably a solvent that does not dissolve the obtained artificial nail.
  • the artificial nail forming step preferably includes a step of roughening the surface of a human or animal nail or other artificial nail before the coating step.
  • claw gel nail obtained by exposure as it is the said aspect.
  • claw surface There is no restriction
  • a method of roughening with a nail file such as a file is preferred.
  • the method for forming an artificial nail may include other known steps.
  • the artificial nail composition is preferably a photocurable artificial nail composition that is cured by actinic rays as described above.
  • a photocurable artificial nail composition a known artificial nail composition may be appropriately selected and is not particularly limited.
  • the photocurable artificial nail composition preferably contains a polymerizable compound as component B and a photopolymerization initiator as component C. Further, in addition to Component B and Component C, it is preferable that Component A contains a film forming agent, and Component D may contain a solvent.
  • component A an embodiment containing the component a: amino group-containing polymer is preferable, and in an embodiment containing the amino group-containing polymer, an acidic aqueous solution is suitably used as the removing solution.
  • an acidic aqueous solution is suitably used as the removing solution.
  • the artificial nail composition of the present invention preferably contains a film forming agent.
  • the film-forming agent means a material that forms a self-supporting film alone when it is formed on a base, and is preferably a film-forming polymer having a weight average molecular weight of 3,000 or more. More preferably, the film-forming polymer is 5,000 or more.
  • the film-forming agent may have an ethylenic double bond in the main chain or side chain.
  • the type of film forming polymer is not particularly limited, and is an acrylic polymer, urethane polymer, cellulose polymer, ester polymer, amide polymer, vinyl polymer, ether polymer, styrene polymer, carbonate polymer, urea.
  • Known polymers such as polymer and ethylene polymer are used. From the viewpoint of film formability and handleability (viscosity), ether polymers, ethylene polymers (especially polyethyleneimine polymers), urethane polymers and acrylic polymers are preferred, urethane polymers and acrylic polymers are more preferred, and urethane polymers are preferred. More preferred are system polymers.
  • acrylic polymer examples include known acrylic acid derivatives (for example, acrylic esters such as methyl acrylate and ethyl acrylate, acrylic amides such as acrylamide and acryloylmorpholine), and methacrylic acid derivatives (for example, methyl methacrylate, methacrylic acid).
  • Any polymer can be suitably used as long as it is a polymer obtained by polymerizing a methacrylic acid ester such as ethyl or a methacrylic acid amide such as methacrylamide or isopropylamide.
  • an acrylic polymer containing an addition polymerizable curable group (for example, (meth) acryl group or the like) in the side chain is preferably used.
  • an acrylic polymer containing an addition polymerizable curable group for example, (meth) acryl group or the like
  • Urethane polymers include known polyisocyanate compounds (for example, tolylene diisocyanate, isophorone diisocyanate, etc.) and known polyol compounds (for example, alkylene diols such as butanediol and hexanediol, benzenediol (catechol, resorcinol, or hydroquinone). ), Arylene diols such as bisnofer A and bisphenol F, polyether diols such as polyethylene glycol and polypropylene glycol, polyester diols such as polyethylene glycol terephthalate, polycarbonate diols such as polyethylene glycol carbonate, etc.) Can be used. However, it is not limited to these examples.
  • cellulose polymer any known cellulose such as carboxymethylcellulose, nitrocellulose, triacetylcellulose, and the like can be preferably used. However, it is not limited to these examples.
  • any polyester comprising a known polycarboxylic acid compound (for example, succinic acid, adipic acid, phthalic acid, etc.) and a known polyol compound can be suitably used.
  • polyesters composed of hydroxycarboxylic acid compounds such as polylactic acid can also be suitably used. However, it is not limited to these examples.
  • any polyamide can be suitably used as long as it is a polyamide comprising a known polycarboxylic acid compound and a known polyamine compound (for example, ethylenediamine, phenylenediamine, etc.).
  • polyamino acids which are proteins composed of amino acids, can also be preferably used. However, it is not limited to these examples.
  • any vinyl polymer obtained by polymerizing a known vinyl compound for example, vinyl acetate, vinyl chloride, butadiene, etc.
  • a known vinyl compound for example, vinyl acetate, vinyl chloride, butadiene, etc.
  • any polyether for example, polyethylene glycol, polypropylene glycol, etc.
  • a known polyol compound for example, polyethylene glycol, polypropylene glycol, etc.
  • any polystyrene can be suitably used as long as it is made of a known styrene compound (for example, styrene, 4-carboxystyrene, 4-acetoxystyrene, etc.). However, it is not limited to these examples.
  • any polycarbonate can be suitably used as long as it is a polycarbonate composed of a known carbonic acid derivative (for example, phosgene, dimethyl carbonate, dimethyl carbonate, etc.) and a known polyol compound. However, it is not limited to these examples.
  • a known carbonic acid derivative for example, phosgene, dimethyl carbonate, dimethyl carbonate, etc.
  • any polyurea composed of a known polyisocyanate compound and a known polyamine compound can be suitably used. However, it is not limited to these examples.
  • the film forming agent contains component a: a polymer having an amino group.
  • component a a polymer having an amino group.
  • the weight average molecular weight of component a is preferably 3,000 or more, more preferably 5,000 or more, and further preferably 5,000 or more and 250,000 or less. It is excellent in the adhesiveness and removability of the obtained artificial nail as it is the said range, and is excellent in temporal stability.
  • component a is not particularly limited and may be any structure, and examples thereof include a chain structure, a branched (branched) structure, a star structure, a crosslinked structure, and a network structure.
  • component a may have an ethylenically unsaturated group.
  • the ethylenically unsaturated group may be present in any of the main chain, side chain, and terminal of the polymer in component a.
  • the amino group in component a may be any of a primary amino group, a secondary amino group, and a tertiary amino group, but is preferably a secondary amino group or a tertiary amino group, More preferably, it is a tertiary amino group.
  • the resulting artificial nail is excellent in removability and water resistance, and is easy to synthesize.
  • the amino group in component a is preferably a monoalkylamino group or a dialkylamino group. It is excellent in the removability, adhesiveness, and water resistance of the artificial nail obtained as it is the said aspect.
  • Component a may have an amino group in the main chain of the polymer or in the side chain, but is preferably a polymer having an amino group in the side chain from the viewpoint of synthesis. .
  • Component a may have one type of amino group or two or more types.
  • the number of amino groups in component a is not particularly limited and may be any number, but preferably has a monomer unit having an amino group.
  • the “monomer unit” in the present invention includes not only a strict monomer-derived constituent unit but also a monomer unit modified by a polymer reaction in which a reaction such as modification is performed after a polymer is obtained.
  • Component a is preferably a polymer having a structure represented by the following formula I, and more preferably a polymer having a structure represented by the following formula I in the side chain.
  • R 1 and R 2 each independently represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, and at least two selected from the group consisting of R 1 , R 2 and L 1 are linked to each other.
  • a ring may be formed, L 1 represents a divalent linking group, and a wavy line represents a bonding position with another structure.
  • R 1 and R 2 in Formula I are each independently preferably an alkyl group having 1 to 10 carbon atoms, and is a methyl group or an ethyl group, from the viewpoint of the balance between solubility in an aqueous acid solution and water resistance. It is more preferable.
  • at least two members selected from the group consisting of R 1 , R 2 and L 1 may be connected to each other to form a ring.
  • L 1 in Formula I is an alkylene group having 1 to 20 carbon atoms which may have a substituent, and a part of the carbon atoms may be replaced with a heteroatom from the viewpoint of the film property of the polymer.
  • alkylene group having 1 to 20 carbon atoms it is preferably an alkylene group having 1 to 20 carbon atoms, an oxyalkylene group having 2 to 20 carbon atoms, or a polyoxyalkylene group having 2 to 20 carbon atoms, and an alkylene group having 1 to 20 carbon atoms or It is more preferably a polyoxyalkylene group having 2 to 20 carbon atoms, particularly preferably an alkylene group having 1 to 20 carbon atoms, and most preferably an alkylene group having 2 or 3 carbon atoms.
  • the heteroatom is preferably a nitrogen atom or an oxygen atom, and more preferably an oxygen atom.
  • the said hetero atom is a nitrogen atom, it is preferable that the remaining group on a nitrogen atom is a hydrogen atom or an alkyl group, and it is more preferable that it is an alkyl group.
  • a monomer having the structure represented by the formula I is subjected to condensation polymerization, addition polymerization, addition condensation, ionic polymerization (cationic polymerization, Examples thereof include a method of polymerizing using a known polymerization reaction such as anionic polymerization.
  • Component a is preferably a polymer having a monomer unit represented by the following formula II from the viewpoint of film properties, handling properties (viscosity), and synthesis for introducing an amino group.
  • R 1 and R 2 each independently represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, and at least two selected from the group consisting of R 1 , R 2 and L 1 are linked to each other.
  • L 1 represents a divalent linking group
  • R 3 represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms
  • X represents an oxygen atom or an NH group.
  • R 1, R 2 and L 1 in formula II are respectively synonymous with R 1, R 2 and L 1 in the formula I, preferable embodiments thereof are also the same.
  • R 3 in Formula II is preferably a hydrogen atom or a methyl group, and more preferably a methyl group, from the viewpoint of synthesis.
  • X in Formula II is preferably an oxygen atom from the viewpoint of water resistance and synthesis of the resulting artificial nail.
  • the component a When the component a has a monomer unit represented by the formula II, it may be used singly or in combination of two or more, or may further have other monomer units.
  • Examples of the monomer that forms the monomer unit represented by the formula II include compounds represented by the following formula II-m.
  • R 1 and R 2 each independently represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, and at least two selected from the group consisting of R 1 , R 2 and L 1 are They may be linked to each other to form a ring, L 1 represents a divalent linking group, R 3 represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and X represents an oxygen atom or an NH group.
  • R 1 ⁇ R 3, L 1 and X in formula II-m are each a R 1 ⁇ R 3, L 1 and X synonymous in above-mentioned formula (II), preferable embodiments thereof are also the same.
  • Component a is preferably a polymer having a monomer unit represented by the following formula III or formula III-b from the viewpoint of film properties, handleability (viscosity), and synthesis for introducing an amino group. More preferred is a urethane polymer having a monomer unit represented by Formula III.
  • R 4 , R 5 and R b4 each independently represent a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, and are selected from the group consisting of R 4 , R 5 and L 3. At least two of them may be connected to each other to form a ring, R b4 and L b3 may be connected to each other to form a ring, L 2 represents a trivalent linking group, and L 3 Represents an alkylene group having 1 to 20 carbon atoms, and L b3 independently represents an alkylene group having 1 to 20 carbon atoms.
  • R 4 and R 5 in Formula III are each independently preferably an alkyl group having 1 to 10 carbon atoms, and is a methyl group or an ethyl group, from the viewpoint of the balance between solubility in acidic aqueous solution and water resistance. It is more preferable.
  • at least two selected from the group consisting of R 4 , R 5 and L 3 may be connected to each other to form a ring.
  • L 2 in Formula III is preferably a trivalent linking group having 2 to 20 carbon atoms, more preferably a trivalent hydrocarbon group having 2 to 20 carbon atoms, and 3 having 2 to 20 carbon atoms.
  • L 2 in Formula III is preferably a trivalent aliphatic hydrocarbon group from the viewpoint of the film property of the polymer.
  • L 3 in Formula III is preferably an alkylene group having 1 to 4 carbon atoms, and particularly preferably a methylene group, from the viewpoint of the coating properties of the polymer.
  • R b4 in formula III-b is preferably an alkyl group having 1 to 10 carbon atoms, and preferably an alkyl group having 2 to 8 carbon atoms, from the viewpoint of the balance between solubility in an aqueous acid solution and water resistance. Is more preferable, an alkyl group having 4 to 8 carbon atoms is more preferable, and an n-butyl group is particularly preferable.
  • L b3 is each independently preferably an alkylene group having 2 to 8 carbon atoms, more preferably an ethylene group, from the viewpoint of the coating properties of the polymer. Further, from the viewpoint of synthesis, the two L b3 are preferably the same group.
  • R b4 and L b3 may be connected to each other to form a ring.
  • component a When component a has a monomer unit represented by formula III or formula III-b, it may be used singly or in combination of two or more, or may be further contained Preferred examples of the monomer unit include a monomer unit derived from a diisocyanate component described later.
  • Examples of the monomer that forms the monomer unit represented by the formula III include compounds represented by the following formula III-m.
  • Examples of the monomer that forms the monomer unit represented by the formula III-b include compounds represented by the following formula III-bm.
  • R 4 , R 5 and R b4 each independently represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, and a group consisting of R 4 , R 5 and L 3. At least two selected from the above may be linked together to form a ring, R b4 and L b3 may be linked together to form a ring, L 2 represents a trivalent linking group, L 3 represents an alkylene group having 1 to 20 carbon atoms, and L b3 independently represents an alkylene group having 1 to 20 carbon atoms.
  • R 4, R 5, L 2 and L 3 in formula III-m are respectively synonymous with R 4, R 5, L 2 and L 3 in the formula III, preferred embodiments are also the same.
  • R b4 and L b3 in formula III-bm is respectively R b4 and L b3 synonymous in formula III-b, preferred embodiments are also the same.
  • the component a may be a polymer composed only of a monomer unit having an amino group as a monomer unit, but when the component a has a monomer unit having an amino group and another monomer unit, the monomer unit having an amino group
  • the content is preferably from 5 to 75 mol%, more preferably from 20 to 75 mol%, still more preferably from 20 to 60 mol%, based on all monomer units of component a. It is excellent in the removability and water resistance of the obtained artificial nail as it is the said range.
  • the amine value of component a is preferably 0.001 to 8.5 mmol / g, more preferably 0.001 to 6.0 mmol / g, and 0.005 to 4.0 mmol / g. More preferably, it is preferably 0.01 to 2.0 mmol. It is excellent in the removability and water resistance of the obtained artificial nail as it is the said range.
  • a method for measuring the amine value for example, a sample is weighed in a beaker, acetic acid is added, dissolved by stirring, the measurement temperature is adjusted to 25 ° C., and a 0.1N perchloric acid acetic acid solution is used as a titration reagent. Then, it can be obtained by titrating with a titration apparatus.
  • the amine value represents the amount of perchloric acid consumed when titrated in terms of moles per gram of sample (solid content).
  • the polymer structure in component a is not particularly limited as long as it is a desired polymer structure.
  • polymer structures such as styrene polymer, carbonate polymer, urea polymer, ethylene polymer, and amine polymer.
  • component a may be an ether polymer, an ethylene polymer (particularly a polyethyleneimine polymer), a urethane polymer, or an acrylic polymer.
  • a urethane polymer and an acrylic polymer are more preferable, and an acrylic polymer is still more preferable.
  • a urethane polymer is particularly preferable.
  • acrylic polymer examples include known acrylic acid derivatives (eg, acrylic esters such as methyl acrylate and ethyl acrylate, acrylic amides such as acrylamide and acryloylmorpholine), and methacrylic acid derivatives (eg, methyl methacrylate, methacrylic acid).
  • Any polymer can be suitably used as long as it is a polymer obtained by polymerizing a methacrylic acid ester such as ethyl or a methacrylic acid amide such as methacrylamide or isopropylamide. However, it is not limited to these examples.
  • Examples of the method for introducing an amino group into the acrylic polymer include a method for polymerizing or copolymerizing a (meth) acrylic acid derivative having an amino group, and a method for introducing an amino group by a polymer reaction.
  • Examples of a method for introducing an ethylenically unsaturated group into an acrylic polymer include a method for polymerizing or copolymerizing a (meth) acrylic acid derivative having an ethylenically unsaturated group, and a method for introducing an ethylenically unsaturated group by a polymer reaction. The method to introduce is mentioned.
  • Urethane polymers include known polyisocyanate compounds (for example, methylene diisocyanate, hexamethylene diisocyanate, trimethylhexamethylene diisocyanate, phenyl diisocyanate, tolylene diisocyanate, diphenylmethane diisocyanate, tolidine diisocyanate, naphthalene diisocyanate, triphenylmethane triisocyanate, tris ( Phenyl isocyanate) thiophosphate, phenylene diisocyanate, lysine diisocyanate, xylylene diisocyanate, bis (isocyanatomethyl) cyclohexane, dicyclohexylmethane diisocyanate, isopropylidenebis (cyclohexyl isocyanate), isophorone diisocyanate, dianisidine diisocyanate Diphenyl ether diisocyanate) and known polyol
  • Examples of a method for introducing an amino group into a urethane polymer include a method of performing polycondensation using a polyisocyanate compound and / or a polyol compound having a tertiary amino group or a group in which an amino group is protected, and a polymer reaction.
  • transducing an amino group by is mentioned.
  • the protected amino group may be deprotected by a known method after forming a polymer. The same applies to the following.
  • Examples of the method of introducing an ethylenically unsaturated group into a urethane polymer include a method of introducing by a polymer reaction and a method of polycondensation using a polyol compound or a polyisocyanate compound having an ethylenically unsaturated group. It is done. These compounds are not particularly limited, but for polyols having an ethylenically unsaturated group, (meth) acrylate-containing diol compounds as described in JP 2010-100047 can be preferably used. .
  • a urethane polymer having a polycarbonate structure or a polyester structure, a polybutadiene structure, or a hydrogenated polybutadiene structure is preferable, and a urethane polymer having a polycarbonate structure is more preferable.
  • the polycondensate of a diisocyanate compound and a diol compound can illustrate preferably.
  • the diol component constituting the urethane polymer it is preferable to use polycarbonate diol, polyester diol, polybutadiene diol, and hydrogenated polybutadiene diol from the viewpoint of water resistance, and it is more preferable to use polycarbonate diol.
  • the diisocyanate component is composed of hexamethylene diisocyanate, tolylene diisocyanate, isophorone diisocyanate, diphenylmethane diisocyanate, dicyclohexylmethane-4,4′- from the viewpoint of the solubility of the artificial nail composition and the mechanical strength of the artificial nail to be formed.
  • Diisocyanates are preferred, and isophorone diisocyanate, methylene diphenyl diisocyanate, and dicyclohexylmethane-4,4′-diisocyanate are more preferred. These compounds may be used alone or in combination.
  • diol component / diisocyanate component it may be used in combination with other diol component / diisocyanate component. Further, by using a suitable diol component and a suitable diisocyanate component together, both the water resistance and mechanical strength of the artificial nail can be enhanced.
  • any known cellulose such as carboxymethylcellulose, nitrocellulose, triacetylcellulose, and the like can be preferably used. However, it is not limited to these examples.
  • Examples of a method for introducing an amino group into a cellulose polymer include a method for introducing an amino group by a polymer reaction.
  • Examples of the method for introducing an ethylenically unsaturated group into a cellulose polymer include a method for introducing an ethylenically unsaturated group by a polymer reaction.
  • any polyester comprising a known polycarboxylic acid compound for example, succinic acid, adipic acid, phthalic acid, etc.
  • polyesters composed of hydroxycarboxylic acid compounds such as polylactic acid can also be suitably used.
  • a method for introducing an amino group into an ester polymer include polycondensation using a polycarboxylic acid compound, a polyol compound and / or a hydroxycarboxylic acid compound having a tertiary amino group or a group with a protected amino group.
  • a method of introducing an amino group by a polymer reaction examples of a method for introducing an ethylenically unsaturated group into an ester polymer include a method for introducing an ethylenically unsaturated group by a polymer reaction.
  • any polyamide can be suitably used as long as it is a polyamide comprising a known polycarboxylic acid compound and a known polyamine compound (for example, ethylenediamine, phenylenediamine, etc.).
  • polyamino acids which are proteins composed of amino acids, can also be preferably used.
  • the method for introducing an amino group into the amide polymer include a polycarboxylic acid compound having a tertiary amino group or a group in which the amino group is protected, and / or a tertiary amino group that does not contribute to the polycondensation reaction.
  • a method of polycondensation using a polyamine compound having a group in which an amino group is protected and a method of introducing an amino group by a polymer reaction can be mentioned.
  • Examples of the method for introducing an ethylenically unsaturated group into an amide polymer include a method for introducing an ethylenically unsaturated group by a polymer reaction.
  • any vinyl polymer obtained by polymerizing a known vinyl compound for example, vinyl acetate, vinyl chloride, butadiene, etc.
  • a method for introducing an amino group into a vinyl polymer include a method of polymerizing or copolymerizing a vinyl compound having an amino group, and a method of introducing an amino group by a polymer reaction.
  • Examples of the method for introducing an ethylenically unsaturated group into a vinyl polymer include a method for introducing an ethylenically unsaturated group by a polymer reaction.
  • any polyether for example, polyethylene glycol, polypropylene glycol, etc.
  • a method for introducing an amino group into an ether-based polymer include a method of polycondensation using a polyol compound having a tertiary amino group or a group in which the amino group is protected, and a method of introducing an amino group by a polymer reaction. Is mentioned.
  • a method for introducing an ethylenically unsaturated group into an ether polymer include a method for introducing an ethylenically unsaturated group by a polymer reaction.
  • any polystyrene can be suitably used as long as it is made of a known styrene compound (for example, styrene, 4-carboxystyrene, 4-acetoxystyrene, etc.). However, it is not limited to these examples.
  • the method for introducing an amino group into the styrene polymer include a method for polymerizing or copolymerizing a styrene derivative having an amino group, and a method for introducing an amino group by a polymer reaction.
  • Examples of a method for introducing an ethylenically unsaturated group into a styrenic polymer include a method for introducing an ethylenically unsaturated group by a polymer reaction.
  • any polycarbonate can be suitably used as long as it is a polycarbonate composed of a known carbonic acid derivative (for example, phosgene, dimethyl carbonate, dimethyl carbonate, etc.) and a known polyol compound.
  • a known carbonic acid derivative for example, phosgene, dimethyl carbonate, dimethyl carbonate, etc.
  • the method for introducing an amino group into the carbonate polymer include a method of polycondensation using a polyol compound having a tertiary amino group or a group in which the amino group is protected, and a method of introducing an amino group by a polymer reaction. Is mentioned.
  • Examples of the method for introducing an ethylenically unsaturated group into the carbonate polymer include a method for introducing an ethylenically unsaturated group by a polymer reaction.
  • any polyurea composed of a known polyisocyanate compound and a known polyamine compound can be suitably used.
  • the method for introducing an amino group into the urea polymer include a polyisocyanate compound having a tertiary amino group or a group in which the amino group is protected, and / or a tertiary amino group that does not contribute to the polycondensation reaction, or Examples thereof include a method of polycondensation using a polyamine compound having a group in which an amino group is protected, and a method of introducing an amino group by a polymer reaction.
  • Examples of a method for introducing an ethylenically unsaturated group into a urea polymer include a method for introducing an ethylenically unsaturated group by a polymer reaction.
  • Examples of the amine polymer include known polyamines.
  • Examples of a method for introducing an ethylenically unsaturated group into an amine polymer include a method for introducing an ethylenically unsaturated group by a polymer reaction.
  • Component a may be a copolymer such as a styrene-acrylic copolymer.
  • Component a is preferably a homopolymer or copolymer of a monofunctional (meth) acrylate compound or a polycondensate of a diisocyanate compound and a diol compound from the viewpoint of gloss.
  • component a from the viewpoint of water resistance of the obtained artificial nail, at least a monomer unit having an amino group and a monomer unit derived from a water-insoluble monomer other than the monomer unit having the amino group are used. It is preferable that it is a polymer which has.
  • non-water-soluble refers to that in which a mixed solution with the same volume of pure water maintains a non-uniform appearance under the conditions of 1 atm and 20 ° C.
  • the water-insoluble monomer is preferably a styrene compound or a (meth) acrylate compound, more preferably a (meth) acrylate compound, and still more preferably a (meth) acrylic acid alkyl ester.
  • component a preferably has a monomer unit derived from a compound selected from the group consisting of a styrene compound and a (meth) acrylate compound, in addition to the monomer unit having an amino group, and the monomer unit derived from a (meth) acrylate compound It is more preferable to have a monomer unit derived from (meth) acrylic acid alkyl ester.
  • component a as a monomer copolymerizable with a monomer having an amino group, preferred monomers are, for example, methyl (meth) acrylate, ethyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, 2-hydroxyethyl ( Monofunctional (meth) acrylic esters such as (meth) acrylate and 2-hydroxypropyl (meth) acrylate, monofunctional (meth) acrylic such as 2-hydroxyethyl (meth) acrylamide, isopropylacrylamide and morpholine (meth) acrylamide Vinyl monomers such as acid amides, N-vinylpyrrolidone, vinyl acetate, ethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, tetraethylene glycol di (meth) acrylate, pro Lenglycol di (meth) acrylate, trimethylolpropane tri (meth) acrylate
  • the component a preferably further has a monomer unit represented by the following formula IV in addition to the monomer unit having an amino group, from the viewpoint of water resistance of the artificial nail to be obtained.
  • R 6 represents a hydrogen atom, an alkyl group or a group represented by the following formula V
  • R 7 represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms
  • X ′ represents an oxygen atom or an NH group. Represents.
  • L 4 independently represents an ethylene group or a propylene group, n represents an integer of 1 to 20, R 8 represents a hydrogen atom or an alkyl group, and the wavy line represents the bond with X ′ above. Represents the position.
  • R 6 is preferably an alkyl group or a group represented by the above formula V from the viewpoint of water resistance of the resulting artificial nail, and is an alkyl group having 1 to 20 carbon atoms or a group represented by the above formula V. More preferred is an alkyl group having 3 to 10 carbon atoms, and particularly preferred is a butyl group.
  • R 7 is preferably a hydrogen atom or a methyl group, and more preferably a methyl group, from the viewpoint of synthesis.
  • X ′ is preferably an oxygen atom from the viewpoint of water resistance and synthesis of the resulting artificial nail.
  • L 4 is preferably an ethylene group.
  • n is preferably an integer of 1 to 10 from the viewpoint of the water resistance of the resulting artificial nail.
  • R 8 is preferably an alkyl group having 1 to 10 carbon atoms, and more preferably a methyl group, from the viewpoint of water resistance of the resulting artificial nail.
  • Component a is preferably a polymer having the following structure, and more preferably a polymer having the following structure and a weight average molecular weight. Moreover, the number on the lower right of the parenthesis of each monomer unit represents a molar ratio. The number on the lower right of the parentheses in the alkyleneoxy chain represents the number of repetitions. Moreover, the structural unit described with * shows that the main chain terminal of this polymer has the said structure couple
  • the component a may be contained individually by 1 type, or may use 2 or more types together.
  • the content of component a in the artificial nail composition of the present invention is preferably 5 to 90% by mass and more preferably 10 to 90% by mass with respect to the total mass of the artificial nail composition.
  • component a and a polymer (film forming agent) other than component a may be used in combination, and the polymer other than component a is preferably an acrylic polymer or a urethane polymer from the viewpoint of film properties.
  • paintability may contain the well-known polymer known as a viscosity modifier (thickener etc.) for the purpose of improving applicability
  • paintability may be contained individually by 1 type, or may use 2 or more types together.
  • the content of component a in the artificial nail composition of the present invention is preferably 5 to 90% by mass and more preferably 10 to 90% by mass with respect to
  • the content of the polymer other than component a is preferably less than the content of component a.
  • the total mass is more preferably 40% by mass or less, more preferably 30% by mass or less, and still more preferably 20% by mass or less.
  • the artificial nail composition preferably contains a polymerizable compound as Component B.
  • the artificial nail composition can be suitably used as a photocurable artificial nail composition.
  • the artificial nail composition of this invention contains the component B, it is preferable to further contain the component C mentioned later and a photoinitiator.
  • the artificial nail composition can be more suitably used as a photocurable artificial nail composition.
  • Component B may be a radical polymerizable compound or a cationic polymerizable compound, but is preferably a radical polymerizable compound.
  • Component B is preferably an ethylenically unsaturated compound.
  • the radical polymerizable compound is a compound having an ethylenically unsaturated bond capable of radical polymerization, and may be any compound as long as it has at least one ethylenically unsaturated bond capable of radical polymerization in the molecule. And those having a chemical form such as an oligomer. Only one kind of radically polymerizable compound may be used, or two or more kinds thereof may be used in combination at an arbitrary ratio in order to improve desired properties.
  • Component B is preferably a compound having a molecular weight of less than 3,000, and more preferably a compound having a molecular weight of less than 1,000.
  • Examples of the polymerizable compound having an ethylenically unsaturated bond capable of radical polymerization include unsaturated carboxylic acids such as acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, and salts thereof, Examples thereof include radically polymerizable compounds such as anhydrides having a saturated group, acrylonitrile, styrene, and oligomers such as various unsaturated polyesters, unsaturated polyethers, unsaturated polyamides, and unsaturated urethanes.
  • unsaturated carboxylic acids such as acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, and salts thereof
  • examples thereof include radically polymerizable compounds such as anhydrides having a saturated group, acrylonitrile, styrene, and oligomers such as various unsaturated polyesters, unsaturated polyethers, unsaturated poly
  • the artificial nail composition has, as Component B, an ethylenically unsaturated compound having a hydroxy group or a (poly) alkyleneoxy group from the viewpoint of the removability, adhesion and gloss of the resulting artificial nail. It preferably contains an ethylenically unsaturated compound, more preferably contains a (meth) acrylate compound having a hydroxy group or a (meth) acrylate compound having a (poly) alkyleneoxy group, and has a hydroxy group (meth) It is further preferable to include an acrylate compound, and it is particularly preferable to include a monofunctional (meth) acrylate compound having a hydroxy group.
  • the component B preferably contains a monofunctional (meth) acrylate compound having a hydroxyalkyl ester having 3 or more carbon atoms, and has 3 to 10 carbon atoms. It is more preferable to include a monofunctional (meth) acrylate compound having a hydroxyalkyl ester.
  • Examples of the (meth) acrylate compound having a hydroxy group include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, and 2,3-dihydroxypropyl (meth).
  • hydroxyalkyl (meth) acrylate such as 4-hydroxybutyl (meth) acrylate, polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate, poly (ethylene glycol / propylene glycol) -mono (meth) acrylate, Polyethylene glycol / polypropylene glycol / mono (meth) acrylate, poly (ethylene glycol / tetramethylene glycol) / mono (meth) acrylate, poly ( B propylene glycol tetramethylene glycol) - mono (meth) acrylate, propylene glycol polybutylene glycol - it may be mentioned preferably a mono (meth) acrylate.
  • Examples of the (meth) acrylate compound having a (poly) alkyleneoxy group include methoxypolyethylene glycol- (meth) acrylate, octoxypolyethyleneglycol-polypropyleneglycol- (meth) acrylate, lauroxypolyethyleneglycol- (meth) acrylate, Stearoxy polyethylene glycol- (meth) acrylate, phenoxy polyethylene glycol- (meth) acrylate, phenoxy polyethylene glycol-polypropylene glycol- (meth) acrylate, nonylphenoxy-polyethylene glycol- (meth) acrylate, nonylphenoxy-polypropylene glycol- (meth) ) Acrylate, Nonylphenoxy-Poly (ethylene glycol-propylene glycol)- Meth) acrylate can be a preferably exemplified.
  • (meth) acrylate compound having a hydroxy group and the (meth) acrylate compound having a (poly) alkyleneoxy group can be used as the (meth) acrylate compound having a hydroxy group and the (meth) acrylate compound having a (poly) alkyleneoxy group.
  • Representative examples are Blemmer E, Blemmer PE-90, Blemmer PE-200, Blemmer PE-350, Blemmer P, Blemmer PP-1000, Blemmer PP-500, Blemmer PP-800, Blemmer 50 PEP-300, Blemmer 70 PEP- 350B, Blemmer 55PET-800, Blemmer PPT series, Blemmer 10PPB-500B, Blemmer AE-90, Blemmer AE-200, Blemmer AE-400, Blemmer AP-150, Blemmer AP-400, Blemmer AP-550, Blemmer PME-100 , Blemmer PME-200, Blemmer PME-
  • the number of hydroxy groups in the compound is preferably 1 to 10, more preferably 1 to 5, still more preferably 1 to 3, and particularly preferably 1. preferable.
  • the number of repeating units of the alkyleneoxy group in the compound is preferably 1 to 25, more preferably 1 to 15, and more preferably 1 to 10 Further preferred.
  • Component B preferably contains a hydroxyalkyl (meth) acrylate compound, and contains 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, and 3-hydroxypropyl (meth) acrylate. Is more preferable, and 2-hydroxyethyl (meth) acrylate is further preferably included.
  • Component B is a case where an acidic aqueous solution is used as a removing solution, and when Component A does not contain a polymer having an amino group, it preferably contains an ethylenically unsaturated compound having an amino group.
  • the ethylenically unsaturated compound having an amino group may have any of a primary amino group, a secondary amino group, or a tertiary amino group, and may have a plurality of amino groups. Examples of the ethylenically unsaturated compound having an amino group include the compounds described in JP2009-126833A.
  • Examples of the ethylenically unsaturated compound having an amino group include 2-dimethylaminoethyl (meth) acrylate, dimethylaminopropyl (meth) acrylamide, a compound represented by the following formula I and / or a compound represented by formula II Is done.
  • R 1 represents a hydrogen atom, an alkyl group, a cycloalkyl group, or an aryl group
  • R 2 represents a hydrogen atom or a methyl group
  • p represents an integer of 0 to 50
  • X represents an alkylene group , -COO-, -CONH-, and -C 6 H 4- represent a linking group selected from the group consisting of:
  • Y represents a divalent linking group, and a plurality of Y may be the same or different from each other.
  • X and R 1 may combine to form a ring.
  • R 2 represents a hydrogen atom or a methyl group
  • p represents an integer of 0 to 50
  • X represents an alkylene group, —COO—, —CONH—, and —C 6 H 4 —.
  • Y represents a divalent linking group, and a plurality of Y may be the same or different.
  • R 1 represents a hydrogen atom, an alkyl group, a cycloalkyl group, or an aryl group.
  • the alkyl group that R 1 can adopt preferably has 1 to 6 carbon atoms, and examples thereof include a methyl group, an ethyl group, an isopropyl group, a t-butyl group, and an n-hexyl group.
  • the cycloalkyl group that R 1 can take has preferably 3 to 6 carbon atoms, and more preferably a cyclopentyl group or a cyclohexyl group.
  • the aryl group preferably has 6 to 12 carbon atoms, and more preferably a phenyl group.
  • the ring is preferably a piperidine ring or a pyrrolidine ring.
  • R 1 may have a substituent, if allowed, and the type thereof is not particularly limited, but is preferably a group inert to radical polymerization, more preferably a hydroxyl group.
  • R 1 is preferably a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, more preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and a hydrogen atom, a methyl group, an ethyl group or hydroxyethyl Particularly preferred is a group.
  • R 2 represents a hydrogen atom or a methyl group.
  • p is a repeat number and represents an integer of 0 to 50, preferably an integer of 0 to 30, more preferably an integer of 0 to 20, and further preferably an integer of 0 to 10.
  • X is a linking group selected from the group consisting of an alkylene group, —COO—, —CONH—, and —C 6 H 4 —.
  • the alkylene group preferably has 1 to 4 carbon atoms, more preferably a methylene group or ethylene group, and particularly preferably a methylene group.
  • X is preferably an alkylene group, —COO— or —CONH—, and particularly preferably —CONH—.
  • Y is a divalent linking group, and when p is 2 or more, a plurality of Y may be the same or different from each other. Y and R 1 may be bonded to form a ring.
  • Y preferably represents an alkylene group, an alkyleneoxy group, an alkyleneamino group, a carbonyl group, or a group obtained by combining these.
  • the alkylene group preferably has 1 to 10 carbon atoms, more preferably an ethylene group or a propylene group.
  • an ethyleneoxy group is preferable.
  • Y is particularly preferably an ethylene group or a propylene group, an ethyleneoxy group, a propyleneoxy group, or a butyleneamide group.
  • R 2 , X, Y, and p are the same as defined in Formula I, and preferred ranges are also the same.
  • Formula I is a monofunctional compound having only one radical polymerizable ethylenically unsaturated group
  • Formula II is a bifunctional compound having two radical polymerizable ethylenically unsaturated groups.
  • the use ratio of the monofunctional compound is high, the removal property of the cured film is excellent.
  • the use ratio of the bifunctional compound is high, the curability is excellent. Therefore, both compounds represented by the formulas I and II are mixed at an appropriate ratio. It is preferable to mix and adjust curability, adhesion, and removability as appropriate. In addition, it is excellent in the adhesiveness and removability of the cured film obtained, so that the amine value of the compound represented by Formula I and Formula II is high.
  • Component B preferably contains a polymerizable compound having a urethane bond, more preferably contains a polyfunctional polymerizable compound having a urethane bond, from the viewpoint of removal of the resulting artificial nail and water resistance, More preferably, the polyfunctional (meth) acrylate compound is included.
  • Component B may contain a polyfunctional polymerizable compound having a molecular weight (in the case of having a molecular weight distribution, a weight average molecular weight) of 1,000 or more.
  • Preferred examples of the polyfunctional (meth) acrylate compound having a urethane bond include urethane-based addition polymerizable compounds produced using an addition reaction between an isocyanato group and a hydroxyl group. Two in one molecule obtained by adding a vinyl monomer containing a hydroxyl group represented by the following formula (A) to an isocyanate compound having two or more isocyanate groups in one molecule described in JP-A-48-41708 The vinyl urethane compound etc. containing the above polymerizable vinyl groups are mentioned.
  • the isocyanate compound include hexamethylene diisocyanate, 2,2,4-trimethylhexamethylene diisocyanate, 2,4,4-trimethylhexamethylene diisocyanate, and 2,4-dimethyl diisocyanate.
  • -Trimethylhexamethylene diisocyanate, 2,4,4-trimethylhexamethylene diisocyanate and 2,4-dimethyldiisocyanate are more preferred, and 2,4-dimethyldiisocyanate is more preferred.
  • a polyester diisocyanate, a polyether diisocyanate, or a polycarbonate diisocyanate can be suitably used for the purpose of controlling the molecular weight.
  • These diisocyanate compounds are obtained by reacting polyether diol, polyester diol, and polycarbonate diol with the above-mentioned diisocyanate compounds and other isophorone diisocyanate and methylene diphenyl diisocyanate.
  • a urethane addition polymerizable compound (more preferably a diol compound and / or a diisocyanate compound) having a polyester structure or a polycarbonate structure can be preferably used.
  • Component B may be contained singly or in combination of two or more.
  • the content of component B in the artificial nail composition of the present invention is not particularly limited, but is preferably 1 to 95% by mass, and preferably 5 to 90% by mass, based on the total mass of the artificial nail composition. Is more preferably 10 to 90% by mass, and particularly preferably 40 to 90% by mass. It is excellent in the removability and water resistance of the obtained artificial nail as it is the said range.
  • the content of the polyfunctional polymerizable compound is monofunctional from the viewpoint of the flexibility and adhesion of the resulting artificial nail.
  • the content is preferably higher than the content of the polymerizable compound, and from the viewpoint of the removability and water resistance of the resulting artificial nail, it is preferably lower than the content of the monofunctional polymerizable compound.
  • the artificial nail composition preferably contains a photopolymerization initiator as Component C.
  • the artificial nail composition can be suitably used as a photocurable artificial nail composition.
  • the photopolymerization initiator include a radical photopolymerization initiator and a cationic photopolymerization initiator, but it is more preferable to contain a radical photopolymerization initiator.
  • a known photopolymerization initiator can be used as the photopolymerization initiator.
  • the photoinitiator which can be used for this invention may be used individually by 1 type, and may use 2 or more types together.
  • the photopolymerization initiator that can be used in the present invention is a compound that absorbs light and generates a polymerization initiating species.
  • Examples of light include ⁇ rays, ⁇ rays, electron beams, ultraviolet rays, visible rays, and infrared rays.
  • a compound that absorbs ultraviolet rays and generates a polymerization initiating species is preferable.
  • photopolymerization initiator that can be used in the present invention are as follows. However, it is not limited to these examples.
  • Acetophenone derivatives eg 1-hydroxycyclohexyl phenyl ketone, acetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2,2-diethoxyacetophenone, 2-hydroxy-2-methylpropiophenone, 4′-isopropyl-2 -Hydroxy-2-methylpropiophenone, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholino-1-propane, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -Butan-1-one, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin propyl ether, etc.); Benzophenone derivatives (eg, benzophenone, 4,4′-bis (dimethylamino) benzophenone, 3,
  • the component C is preferably a photopolymerization initiator selected from the group consisting of acetophenone derivatives, phosphine oxide derivatives, metallocene derivatives, and lophine dimer derivatives, and from the group consisting of acetophenone derivatives and phosphine oxide derivatives. It is particularly preferable that the photopolymerization initiator is selected.
  • the content of Component C in the artificial nail composition is preferably 0.01 to 20% by mass and more preferably 0.1 to 15% by mass with respect to the total mass of the artificial nail composition. Preferably, it is 0.5 to 12% by mass. It is excellent in the adhesiveness of the obtained artificial nail, gloss, and water resistance as it is the said range.
  • the artificial nail composition of the present invention may contain a solvent as component D from the viewpoint of applicability, but from the viewpoint of handleability, the content of the solvent is based on the total mass of the artificial nail composition, It is preferably less than 10% by mass, more preferably less than 5% by mass, and particularly preferably the artificial nail composition of the present invention does not contain a solvent.
  • the content of Component D is preferably less than 10% by mass with respect to the total mass of the artificial nail composition, and 5% by mass. More preferably, it is more preferable that the component D is not contained.
  • the solvent any known solvent can be suitably used.
  • alcohol solvents such as ethanol, isopropanol, ethylene glycol monomethyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, diethylene glycol monoethyl ether, dipropylene glycol monomethyl ether and their acetate solvents, ethyl acetate, butyl acetate, etc.
  • ester solvents such as acetone, methyl ethyl ketone, methyl isobutyl ketone and cyclohexanone
  • ether solvents such as tetrahydrofuran and methyl t-butyl ether.
  • the boiling point of the solvent is preferably 30 to 130 ° C, more preferably 35 to 100 ° C, still more preferably 40 to 90 ° C, and more preferably 50 to 85 ° C. Is particularly preferred. It is excellent in drying property and applicability
  • Component D may be used alone or in combination of two or more.
  • Component D preferably includes an alcohol solvent and / or a ketone solvent, and more preferably includes an alcohol solvent and a ketone solvent.
  • the content of component D is based on the total mass of the artificial nail composition from the viewpoint of applicability, removal of the resulting artificial nail and adhesion. It is preferably 1 to 90% by mass, more preferably 5 to 80% by mass, still more preferably 10 to 80% by mass, and particularly preferably 15 to 50% by mass.
  • an additive component that can generally be blended in the artificial nail composition is arbitrarily blended within a range not impairing the effects of the present invention.
  • Such additive components include antifoaming agents, buffering agents, chelating agents, dispersing agents, dyes, fillers, pigments, preservatives, resin powders (for example, poly (meth) acrylic acid), inorganic powders, and the like. (For example, silica gel, etc.), thickeners, wetting agents and the like. However, it is not limited to these examples.
  • the range is preferably from 0.1 to 25/5 to 90/0 to 50/0 to 20. It is excellent in applicability
  • the method for removing an artificial nail includes a removal liquid contact step (removal solution contact step) in which a removal liquid is brought into contact with the interface between the nail and the artificial nail.
  • the removal liquid is preferably an organic solvent or an acidic aqueous solution.
  • Organic solvents include acetone, ethanol, n-propyl alcohol, isopropyl alcohol, benzyl alcohol, ethyl acetate, butyl acetate, amyl acetate, ethyl lactate, butyl lactate, toluene, methyl ethyl ketone, isobutyl acetate, propyl acetate, isopropyl acetate, propyl alcohol Glycerin, propylene glycol, 1,3-butylene glycol, polyethylene glycol, sorbitol, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, ethylene glycol monomethyl ether, ethylene glycol dimethyl ether, diethylene glycol dimethyl ether, diethylene glycol dimethyl ether, diethylene glycol dimethyl ether, diethylene glycol dimethyl ether, diethylene glycol dimethyl ether, di
  • the organic solvent may contain water, a thickener, a humectant, a fragrance, a dye, a surfactant, or the like, if necessary.
  • thickener examples include hydroxypropyl cellulose, hydroxyethyl cellulose, carboxyvinyl polymer, gum arabic, carrageenan, caraya gum, gum tragacanth, carob gum, quince seed, casein, dextrin, gelatin, sodium pectate, sodium alginate, methyl cellulose, ethyl cellulose Carboxymethyl cellulose (CMC), sodium polyacrylate, guar gum, tamarint gum, cellulose dialkyldimethylammonium sulfate, xanthan gum and the like.
  • the blending amount of the thickener is preferably 0.5 to 5% by mass, more preferably 2 to 4% by mass, based on the total mass of the removal liquid, as the thickener solid content. When it is 0.5% by mass or more, a sufficient thickening effect is obtained, and when it is 5% by mass or less, there is no stickiness after use.
  • a humectant may be added to the removal liquid.
  • a moisturizer oil
  • damage to nails and skin can be further reduced.
  • the humectant include hydrocarbon compounds such as liquid paraffin, olive oil, castor oil, almond oil, squalane, jojoba oil, silicone oil, fatty acid ester, and the like.
  • the removal liquid may contain a surfactant in order to promote dissolution or dispersion of the artificial nail.
  • a surfactant an anionic, cationic, zwitterionic or nonionic surfactant can be used.
  • These surfactants are not particularly limited, and conventionally known surfactants can be used.
  • anionic surfactants are: alipates, abiates, hydroxyalkane sulfonates, alkane sulfonates, dialkyl sulfosuccinates, linear alkyl benzene sulfonates, branched alkyl benzene sulfonates , Alkylnaphthalene sulfonates, alkylphenoxy polyoxyethylene propyl sulfonates, salts of polyoxyethylene alkyl sulfophenyl ethers, sodium N-methyl-N-oleylaminoethanesulfonate, disodium N-alkylsulfosuccinate monoamide, Petroleum sulfonates, sulfated castor oil, sulfated beef tallow oil, sulfates of aliphatic alkyl esters, sulfates of alkyl sulfates , Sulfates of polyoxyethylene alkyl ethers,
  • Examples of the cationic surfactant include alkylamine salts, quaternary ammonium salts, polyoxyethylene alkylamine salts, and polyethylene polyamine derivatives.
  • nonionic surfactants include polyoxyethylene alkyl ethers, polyoxyethylene alkyl aryl ethers in which the aryl group can be a phenyl group, naphthyl group or aromatic heterocyclic group, polyoxyethylene polystyryl phenyl Ethers, polyoxyethylene polyoxypropylene alkyl ethers, polyoxyethylene polyoxypropylene block polymers, partial esters of glycerin aliphatic acids, partial esters of sorbitan aliphatic acids, pentaerythritol aliphatic acid moieties Esters, propylene glycol monoaliphatic esters, partial esters of sucrose aliphatic acids, partial esters of polyoxyethylene sorbitan aliphatic acids, partial esters of polyoxyethylene sorbitol aliphatic acids Polyethylene glycol aliphatic esters, partial esters of poly-glycerin aliphatic acids, polyoxyethylenated castor oil, partial esters of poly(
  • zwitterionic surfactants include amine oxides such as alkyldimethylamine oxide, betaines such as alkylbetaines, and amino acids such as alkylamino fatty acid sodium.
  • alkyldimethylamine oxide which may have a substituent alkylcarboxybetaine which may have a substituent, and alkylsulfobetaine which may have a substituent are preferably used.
  • Surfactant may be used individually by 1 type, or may be used in combination of 2 or more type.
  • the addition amount of the surfactant is not particularly limited, but is preferably 0.01 to 30% by mass, and more preferably 0.05 to 20% by mass with respect to the total mass of the removal liquid.
  • the artificial nail composition can be removed with an organic solvent such as acetone, which is a conventional removal solution, but it may be removed more safely with an acidic aqueous solution without burdening the skin and nails.
  • the removal liquid suitably used in the present invention preferably comprises an organic / inorganic acid component for making it acidic, water, optionally a stabilizer, and optionally a surfactant.
  • acidic aqueous solution when using acidic aqueous solution as a removal liquid, it may contain the component a: the polymer which has an amino group as component A, and / or the ethylenically unsaturated compound which has an amino group as component B.
  • the component A contains a component a: a polymer having an amino group, or the component B contains an ethylenically unsaturated compound having an amino group, and the component A has a component a: an amino group. More preferably, it contains a polymer.
  • Organic / inorganic acid components A known inorganic acid (phosphoric acid, hydrochloric acid, etc.) or organic acid can be used for the acidic aqueous solution in order to make the aqueous solution acidic.
  • the acid component used in the acidic aqueous solution it is preferable to use an organic acid that is generally contained in foods and food additives.
  • Preferred organic acids include citric acid, gluconic acid, lactic acid, malic acid, amino acids (such as aspartic acid and glutamic acid), and carbonic acid.
  • an acid salt In order to prevent the pH from fluctuating due to external factors such as aging or dilution / concentration of the solution, it is preferable to add an acid salt to make a buffer solution.
  • the acid salt preferably sodium salt (sodium citrate, sodium gluconate, sodium carbonate, disodium phosphate) with the acid is mentioned, but it is particularly limited. It is not something.
  • the acidic aqueous solution may be a concentrated solution from the viewpoint of cost, transportability, and storability, and may be an embodiment in which the concentrated solution is diluted with water or the like to be used as a removing solution when used.
  • the pH of the acidic aqueous solution is preferably 5.0 or less, more preferably 4.0 or less from the viewpoint of ionization ability of the polymer having an amino group contained in the artificial nail of the present invention, that is, removability. Preferably, it is 3.0 or less.
  • the pH of the removal liquid is preferably 1.0 or more, and more preferably 2.0 or more, from the viewpoint of reducing the burden on the skin and nails. In order to prevent the pH from fluctuating due to external factors such as aging or dilution / concentration of the solution, it is preferable to add an acid salt to make a buffer solution.
  • the acid salt preferably sodium salt (sodium citrate, sodium gluconate, sodium carbonate, disodium phosphate) with the acid is mentioned, but it is particularly limited. It is not something.
  • the acidic aqueous solution used in the present invention may optionally contain a stabilizer.
  • a stabilizer By adding a stabilizer, the coloring of the liquid over time, the occurrence of corrosion and mold, etc. can be suppressed.
  • the stabilizer is not particularly limited, and known industrial preservatives, food preservatives, pharmaceutical preservatives, antioxidants / light stabilizers, and the like can be used. Among these, as the stabilizer, a paraoxybenzoic acid ester compound is preferable.
  • the amount of the stabilizer to be added is not particularly limited, and is preferably 0.001 to 10% by mass, more preferably 0.005 to 5% by mass, based on the total mass of the removal liquid. More preferably, the content is 01 to 2% by mass.
  • Organic solvent may be optionally added for the purpose of preventing precipitation, re-adhesion and reduction in removability of the artificial nail lysate caused by increasing the concentration of the removed artificial nail.
  • the organic solvent to be added can be used without particular limitation as long as it is a solvent miscible with the acid aqueous solution, and specific examples include isopropyl alcohol, benzyl alcohol, ethanol and the like.
  • the addition amount of the organic solvent is not particularly limited, and is preferably 0.1 to 20% by mass, more preferably 0.1 to 10% by mass with respect to the total mass of the removal liquid.
  • surfactant thickener, humectant, fragrance, dye, and the like may be added to the acidic aqueous solution.
  • the removal solution is heated to such an extent that safety is not impaired.
  • the heating is preferably 30 ° C. to 45 ° C., more preferably 35 ° C. to 45 ° C., and particularly preferably 40 ° C. to 45 ° C.
  • the immersion liquid may be stirred.
  • the base gel was applied to the nail using a brush with a UV lamp (36 W) for 2 minutes, and then applied to a film thickness of about 100 ⁇ m ( ⁇ 10 ⁇ m). Thereafter, commercially available calgel # CG03 fresh pink (manufactured by Moga Brook Co., Ltd.) was applied as a color layer with a brush, and then irradiated with an ultraviolet lamp (36 W) for 5 minutes. Furthermore, as a top layer, a commercially available top gel (Cargel # 00, manufactured by Moga Brook Co., Ltd.) was applied with a brush, and similarly irradiated with an ultraviolet lamp (36 W) for 5 minutes. When the formed artificial nail was confirmed by visual observation and finger touch, it was completely solidified. The total film thickness of the color layer and the top layer was about 250 ⁇ m. Thereafter, the surface was wiped off with ethanol.
  • the film thickness was measured by measuring the thickness of an artificial nail using a digital micrometer (MCD203-25SA) manufactured by Mitutoyo Corporation.
  • Base gel The following base gels were used: Base gel 1: Calgel CG00 (manufactured by Moga Brook) Base gel 2: Base gel 2 was obtained by uniformly mixing the following various components with reference to JP-A-2009-126833. 2-dimethylaminoethyl methacrylate: 33.0 parts by mass Polyurethane methacrylate: 50.0 parts by mass 2-hydroxyethyl methacrylate: 6.7 parts by mass 2-hydroxypropyl methacrylate: 6.7 parts by mass t-butyl acetate: 2.3 1 part by mass of 1-hydroxycyclohexyl phenyl ketone
  • Base gel 3 Base gel 3 was obtained by uniformly mixing the following components.
  • Amino group-containing polymer 30.0 parts by mass Urethane oligomer (UV-3310B, manufactured by Nippon Synthetic Chemical Industry Co., Ltd.): 30.0 parts by mass 2-hydroxyethyl methacrylate: 20.0 parts by mass 2-hydroxypropyl methacrylate: 19 0.0 part by mass 1-hydroxycyclohexyl phenyl ketone: 1.0 part by mass
  • Mw 28,000 was used as the amino group-containing polymer.
  • the numbers on the lower right of the parentheses of each monomer unit represent the molar ratio.
  • ⁇ Measuring method of angle between nail and ground and / or cutting surface The tip of the evaluation sample is polished, the length of the artificial nail protruding from the nail (Y in FIG. 3) is measured, and the nail is polished and / or cut by the tangent theorem from the thickness (X) and length (Y). The angle made with the surface was calculated. A microscope was used to measure the length.
  • evaluation method 1 Evaluation when the order of steps is changed
  • the order of the peeling steps was changed as follows, or the steps were performed simultaneously, and the removal time was measured.
  • the removal time is the time required from the time when the removal is started until the removal is completed. That is, the time required from the start of the interface exposure process, the removal liquid contact process, or the peeling process until the artificial nail completely peels from the nail.
  • X Interface exposure process (polishing or cutting process) (180G file was used to polish the tip of the nail.
  • the protruding length of the polished part (Y in FIG. 3) was 350 to 606 ⁇ m. (It took 30 seconds to polish.)
  • Y Removal liquid contact step (immersed in the removal liquid)
  • Z Peeling process (The polished part was picked up using tweezers.)
  • the interface exposure step (polishing step) as the first step, the removing liquid contact step as the second step, and the peeling step as the third step can be performed in this order in a short time. Further, the removal process can be performed in a shorter time by simultaneously performing the polishing process as the first process and the removing liquid contact process and the peeling process in the second process.
  • the film thickness is about 100 ⁇ m after being irradiated with an ultraviolet lamp (36 W) for 2 minutes. It was applied so as to be about ( ⁇ 10 ⁇ m). Thereafter, commercially available calgel # CG03 fresh pink (manufactured by Moga Brook Co., Ltd.) was applied as a color layer with a brush, and then irradiated with an ultraviolet lamp (36 W) for 5 minutes.
  • top layer a commercially available top gel (Cargel # 00, manufactured by Moga Brook Co., Ltd.) was applied with a brush, and similarly irradiated with an ultraviolet lamp (36 W) for 5 minutes.
  • an ultraviolet lamp 36 W
  • the total film thickness of the color layer and the top layer was about 250 ⁇ m.
  • the surface was wiped off with ethanol.
  • the surface roughness of the general nail is 13.9% as a result of measuring ⁇ S using an atomic force microscope (AFM), and an aluminum plywood (thickness is 0.3 ⁇ m) to match the value.
  • JIS 1050, JIS 1100, JIS 3003 and other aluminum alloys The brush process was produced as follows.
  • the surface of the aluminum alloy plate sample is grained and washed with water. Washed. This sample was immersed in a 25 mass% sodium hydroxide aqueous solution at 70 ° C. for 25 seconds for etching and washed with water. Next, the washed sample was immersed in a 20% nitric acid aqueous solution at 60 ° C. for 20 seconds and washed with water.
  • an aluminum alloy such as JIS1050, JIS1100, and JIS3003 having a thickness of 0.3 ⁇ m was used.
  • evaluation method 2 Removal time dependency evaluation by polishing or cutting angle
  • the aluminum tip of the evaluation sample was polished for 30 seconds using a 180G count file so as to have the following angle (angle formed by the nail and file shown in the above figure) and immersed in the removal solution. Then, the tip of the artificial nail was picked using tweezers and peeled in the removing solution.
  • the removal time means the time from when the polishing is started until the artificial nail is peeled off from the nail.
  • the angle was calculated
  • the exposed length of the artificial nail changes depending on the thickness thereof, and is not limited to this. As described above, the thickness of the artificial nail (X in FIG. 3) was 350 ⁇ m.
  • the length of the artificial nail exposed and the polishing angle are as follows. A: When the exposed length of the artificial nail exceeded 606 ⁇ m, the polishing angle exceeded 0 ° and was less than 30 °. B: When the length of the artificial nail exposed was more than 350 ⁇ m and less than 606 ⁇ m, the polishing angle was 30 ° or more and less than 45 °. C: When the length of the exposed artificial nail was more than 202 ⁇ m and not more than 350 ⁇ m, the polishing angle was 45 ° or more and less than 60 °. D: When the length of the exposed artificial nail was more than 0 ⁇ m and less than 202 ⁇ m, the polishing angle was 60 ° or more and less than 90. E: When the length of the exposed base layer was 0 ⁇ m, the polishing angle was 90 ° or more.
  • Removal method ⁇ The tip of the nail of the evaluation sample was polished with a 180G count file. A protrusion having a protruding length (Y in FIG. 3) of 1,000 to 1,732 ⁇ m was used for evaluation. The polishing time required 30 seconds. Thereafter, the tip of the artificial nail was picked using a tweezer while being immersed in the removing solution, and peeled off. The removal time was evaluated from the time when polishing was started until the artificial nail peeled from the nail.
  • Removal method ⁇ the surface of the evaluation sample was polished with a 180G count file and immersed in a removal solution. Next, each sample (cured film) taken out was peeled by performing a peeling treatment in which it was peeled off with a wooden spatula. The removal time was evaluated from the polishing start time until the artificial nail was peeled off from the nail.
  • top layer a commercially available top gel (Cargel # 00, manufactured by Moga Brook Co., Ltd.) was applied with a brush, and similarly irradiated with an ultraviolet lamp (36 W) for 5 minutes. When the formed artificial nail was confirmed by visual observation and finger touch, it was completely solidified. The total film thickness of the color layer and the top layer was about 250 ⁇ m. Thereafter, the surface was wiped off with ethanol.
  • the surface roughness of the general nail is 13.9% as a result of measuring ⁇ S using an atomic force microscope (AFM), and an aluminum plywood (thickness is 0.3 ⁇ m) to match the value.
  • JIS 1050, JIS 1100, JIS 3003 and other aluminum alloys The brush process was produced as follows. Using three bundle-planted nylon brushes with a bristle diameter of 0.3 mm and a pumice-water suspension with a median diameter of 25 ⁇ m (specific gravity 1.1 g / cm 3 ), the surface of the aluminum alloy plate sample is grained and washed with water. Washed. This sample was immersed in a 25 mass% sodium hydroxide aqueous solution at 70 ° C.
  • the washed sample was immersed in a 20% nitric acid aqueous solution at 60 ° C. for 20 seconds and washed with water.
  • an aluminum alloy such as JIS1050, JIS1100, and JIS3003 having a thickness of 0.3 ⁇ m was used.
  • Removal method ⁇ The tip of the nail of the evaluation sample was polished with a 180G count file. A protrusion having a length of protrusion (Y in FIG. 3) of 350 to 606 ⁇ m was used for evaluation. The polishing time required 30 seconds. Then, after being immersed in a removal liquid, it removed from the removal liquid, the tip of the artificial nail was picked and peeled using tweezers. The removal time was evaluated from the time when the polishing was started until the artificial nail was peeled from the aluminum.
  • Removal method ⁇ A sample was prepared by polishing the surface of the artificial nail with a 180G file. A cotton dampened with acetone is placed on the artificial nail, wound with aluminum foil and left to swell the artificial nail, and then the swollen artificial nail is pushed off with a wooden spatula. The artificial nail was removed. The removal time was evaluated from the time when the polishing was started until the artificial nail was peeled from the aluminum.

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Abstract

　L'invention concerne un procédé permettant de retirer des ongles artificiels tout en réduisant le délai du retrait. Le procédé selon l'invention est caractérisé par une phase d'exposition de l'interface consistant à polir et/ou à couper le bout de l'ongle artificiel recouvrant l'ongle naturel et à exposer une partie de l'interface ongle naturel-ongle artificiel, une phase de contact avec un liquide de retrait consistant à mettre en contact un liquide de retrait avec l'interface ongle naturel-ongle artificiel, et une phase de détachement consistant à détacher l'ongle artificiel de l'ongle naturel en utilisant l'interface exposée comme point de départ. L'ongle artificiel est de préférence formé en photopolymérisant une composition vulcanisable avec une lumière active.
PCT/JP2015/060069 2014-03-31 2015-03-31 Procédé de retrait d'un ongle artificiel WO2015152210A1 (fr)

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Cited By (1)

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EP3868249A4 (fr) * 2018-10-15 2022-06-15 AI Co., Ltd Faux-ongles et procédé d'application de ceux-ci

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JP2009126833A (ja) * 2007-11-26 2009-06-11 Shiseido Co Ltd 人工爪組成物
JP2013503918A (ja) * 2009-09-08 2013-02-04 クリエイティブ ネイル デザイン インコーポレイテッド 人工爪コーティングのための除去可能な着色性ゲルベースコートおよびそれらのための方法
WO2014157271A1 (fr) * 2013-03-29 2014-10-02 富士フイルム株式会社 Composition d'ongle artificiel, ongle artificiel, procédé de formation d'ongle artificiel, procédé d'élimination d'ongle artificiel, et trousse à ongles
WO2014157272A1 (fr) * 2013-03-29 2014-10-02 富士フイルム株式会社 Composition d'ongle artificiel, ongle artificiel, procédé de formation d'ongle artificiel et trousse de décoration des ongles

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