WO2015140075A1 - Verfahren zur herstellung von pulvern aus alkalisalzen von silanolen - Google Patents
Verfahren zur herstellung von pulvern aus alkalisalzen von silanolen Download PDFInfo
- Publication number
- WO2015140075A1 WO2015140075A1 PCT/EP2015/055325 EP2015055325W WO2015140075A1 WO 2015140075 A1 WO2015140075 A1 WO 2015140075A1 EP 2015055325 W EP2015055325 W EP 2015055325W WO 2015140075 A1 WO2015140075 A1 WO 2015140075A1
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- WO
- WIPO (PCT)
- Prior art keywords
- powder
- drying
- hydrolysis
- alcohol content
- weight
- Prior art date
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- 239000000843 powder Substances 0.000 title claims abstract description 65
- 150000004819 silanols Chemical class 0.000 title claims abstract description 9
- 150000001447 alkali salts Chemical class 0.000 title claims abstract description 7
- 238000004519 manufacturing process Methods 0.000 title abstract description 4
- -1 methoxy, ethoxy, 1-propoxy Chemical group 0.000 claims abstract description 59
- 238000001035 drying Methods 0.000 claims abstract description 54
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 53
- 238000000034 method Methods 0.000 claims abstract description 47
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 25
- 239000000203 mixture Substances 0.000 claims abstract description 24
- 238000006460 hydrolysis reaction Methods 0.000 claims abstract description 23
- 230000007062 hydrolysis Effects 0.000 claims abstract description 22
- 239000007859 condensation product Substances 0.000 claims abstract description 18
- 239000003513 alkali Substances 0.000 claims abstract description 13
- 150000001768 cations Chemical class 0.000 claims abstract description 11
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 9
- 150000003839 salts Chemical class 0.000 claims abstract description 9
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 6
- 239000010703 silicon Substances 0.000 claims abstract description 5
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 claims abstract description 3
- 229910052783 alkali metal Inorganic materials 0.000 claims description 13
- 239000004566 building material Substances 0.000 claims description 9
- 125000004432 carbon atom Chemical group C* 0.000 claims description 9
- 238000002360 preparation method Methods 0.000 claims description 8
- 239000007921 spray Substances 0.000 claims description 8
- 238000001694 spray drying Methods 0.000 claims description 7
- 239000004215 Carbon black (E152) Substances 0.000 claims description 6
- 125000005843 halogen group Chemical group 0.000 claims description 6
- 229930195733 hydrocarbon Natural products 0.000 claims description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 5
- 239000001257 hydrogen Substances 0.000 claims description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 5
- 150000008044 alkali metal hydroxides Chemical class 0.000 claims description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 4
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 4
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 4
- 125000003277 amino group Chemical group 0.000 claims description 3
- 238000005259 measurement Methods 0.000 claims description 3
- 150000001283 organosilanols Chemical class 0.000 claims description 3
- 239000010409 thin film Substances 0.000 claims description 3
- 229910018540 Si C Inorganic materials 0.000 claims description 2
- 150000004649 carbonic acid derivatives Chemical class 0.000 claims description 2
- 150000001282 organosilanes Chemical class 0.000 claims description 2
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 2
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims description 2
- 229910001854 alkali hydroxide Inorganic materials 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 1
- 239000000413 hydrolysate Substances 0.000 abstract 3
- 239000004035 construction material Substances 0.000 abstract 2
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 60
- 239000007787 solid Substances 0.000 description 21
- 125000005625 siliconate group Chemical group 0.000 description 19
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 18
- 150000001875 compounds Chemical class 0.000 description 17
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 15
- 229920004482 WACKER® Polymers 0.000 description 15
- 239000000243 solution Substances 0.000 description 15
- 239000011591 potassium Substances 0.000 description 14
- 229910052700 potassium Inorganic materials 0.000 description 14
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 12
- HEMHJVSKTPXQMS-UHFFFAOYSA-M sodium hydroxide Inorganic materials [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 11
- 238000006243 chemical reaction Methods 0.000 description 10
- 239000003795 chemical substances by application Substances 0.000 description 9
- 229910052757 nitrogen Inorganic materials 0.000 description 9
- 150000003254 radicals Chemical class 0.000 description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 229910052799 carbon Inorganic materials 0.000 description 8
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 8
- 239000011541 reaction mixture Substances 0.000 description 8
- 239000007789 gas Substances 0.000 description 7
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- 239000000654 additive Substances 0.000 description 6
- 239000011261 inert gas Substances 0.000 description 6
- 238000005481 NMR spectroscopy Methods 0.000 description 5
- 150000001340 alkali metals Chemical class 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 239000004570 mortar (masonry) Substances 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 4
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 4
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 4
- 238000005979 thermal decomposition reaction Methods 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 125000004122 cyclic group Chemical group 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 238000004821 distillation Methods 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 238000000227 grinding Methods 0.000 description 3
- 150000002367 halogens Chemical group 0.000 description 3
- 230000002209 hydrophobic effect Effects 0.000 description 3
- WCYWZMWISLQXQU-UHFFFAOYSA-N methyl Chemical compound [CH3] WCYWZMWISLQXQU-UHFFFAOYSA-N 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 239000000725 suspension Substances 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 description 2
- 238000005160 1H NMR spectroscopy Methods 0.000 description 2
- GVNVAWHJIKLAGL-UHFFFAOYSA-N 2-(cyclohexen-1-yl)cyclohexan-1-one Chemical compound O=C1CCCCC1C1=CCCCC1 GVNVAWHJIKLAGL-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 101150065749 Churc1 gene Proteins 0.000 description 2
- 239000001692 EU approved anti-caking agent Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- 102100038239 Protein Churchill Human genes 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- CIUQDSCDWFSTQR-UHFFFAOYSA-N [C]1=CC=CC=C1 Chemical compound [C]1=CC=CC=C1 CIUQDSCDWFSTQR-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 2
- 125000002877 alkyl aryl group Chemical group 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 239000004568 cement Substances 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 239000000839 emulsion Substances 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 239000012634 fragment Substances 0.000 description 2
- 229910052602 gypsum Inorganic materials 0.000 description 2
- 239000010440 gypsum Substances 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 229910052500 inorganic mineral Inorganic materials 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000011707 mineral Substances 0.000 description 2
- 235000010755 mineral Nutrition 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000011505 plaster Substances 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 235000019353 potassium silicate Nutrition 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000005871 repellent Substances 0.000 description 2
- 238000007873 sieving Methods 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- WPWHSFAFEBZWBB-UHFFFAOYSA-N 1-butyl radical Chemical compound [CH2]CCC WPWHSFAFEBZWBB-UHFFFAOYSA-N 0.000 description 1
- 125000001637 1-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C(*)=C([H])C([H])=C([H])C2=C1[H] 0.000 description 1
- 125000004343 1-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])(*)C([H])([H])[H] 0.000 description 1
- MFGOFGRYDNHJTA-UHFFFAOYSA-N 2-amino-1-(2-fluorophenyl)ethanol Chemical compound NCC(O)C1=CC=CC=C1F MFGOFGRYDNHJTA-UHFFFAOYSA-N 0.000 description 1
- 125000001622 2-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C(*)C([H])=C([H])C2=C1[H] 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 125000006201 3-phenylpropyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 239000004890 Hydrophobing Agent Substances 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 239000004111 Potassium silicate Substances 0.000 description 1
- UIIMBOGNXHQVGW-DEQYMQKBSA-M Sodium bicarbonate-14C Chemical compound [Na+].O[14C]([O-])=O UIIMBOGNXHQVGW-DEQYMQKBSA-M 0.000 description 1
- PQGAHNJECSVDEI-UHFFFAOYSA-N [CH2]CCCCC Chemical compound [CH2]CCCCC PQGAHNJECSVDEI-UHFFFAOYSA-N 0.000 description 1
- PQSKOVBIFAUVRO-UHFFFAOYSA-N [Na+].[Na+].O[Si](O)(O)O.O[Si](O)(O)O.O[Si](O)([O-])[O-] Chemical compound [Na+].[Na+].O[Si](O)(O)O.O[Si](O)(O)O.O[Si](O)([O-])[O-] PQSKOVBIFAUVRO-UHFFFAOYSA-N 0.000 description 1
- QCGGXGCODUUTLZ-UHFFFAOYSA-N [Na].[Na].[Na].[Na] Chemical compound [Na].[Na].[Na].[Na] QCGGXGCODUUTLZ-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000001464 adherent effect Effects 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 229910000288 alkali metal carbonate Inorganic materials 0.000 description 1
- 150000008041 alkali metal carbonates Chemical class 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 229910052915 alkaline earth metal silicate Inorganic materials 0.000 description 1
- 150000001343 alkyl silanes Chemical class 0.000 description 1
- 229910000323 aluminium silicate Inorganic materials 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- HUCVOHYBFXVBRW-UHFFFAOYSA-M caesium hydroxide Inorganic materials [OH-].[Cs+] HUCVOHYBFXVBRW-UHFFFAOYSA-M 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical class OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 239000012876 carrier material Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000004567 concrete Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- QUPDWYMUPZLYJZ-UHFFFAOYSA-N ethyl Chemical compound C[CH2] QUPDWYMUPZLYJZ-UHFFFAOYSA-N 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000005243 fluidization Methods 0.000 description 1
- 150000004675 formic acid derivatives Chemical class 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 159000000011 group IA salts Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- CZWLNMOIEMTDJY-UHFFFAOYSA-N hexyl(trimethoxy)silane Chemical compound CCCCCC[Si](OC)(OC)OC CZWLNMOIEMTDJY-UHFFFAOYSA-N 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 239000012442 inert solvent Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000003961 organosilicon compounds Chemical class 0.000 description 1
- 125000003854 p-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Cl 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- WFIZEGIEIOHZCP-UHFFFAOYSA-M potassium formate Chemical compound [K+].[O-]C=O WFIZEGIEIOHZCP-UHFFFAOYSA-M 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical group CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 1
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 1
- 238000000066 reactive distillation Methods 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000011378 shotcrete Substances 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 125000004469 siloxy group Chemical group [SiH3]O* 0.000 description 1
- 238000004513 sizing Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- POWFTOSLLWLEBN-UHFFFAOYSA-N tetrasodium;silicate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-][Si]([O-])([O-])[O-] POWFTOSLLWLEBN-UHFFFAOYSA-N 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B24/00—Use of organic materials as active ingredients for mortars, concrete or artificial stone, e.g. plasticisers
- C04B24/40—Compounds containing silicon, titanium or zirconium or other organo-metallic compounds; Organo-clays; Organo-inorganic complexes
- C04B24/42—Organo-silicon compounds
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B28/00—Compositions of mortars, concrete or artificial stone, containing inorganic binders or the reaction product of an inorganic and an organic binder, e.g. polycarboxylate cements
- C04B28/14—Compositions of mortars, concrete or artificial stone, containing inorganic binders or the reaction product of an inorganic and an organic binder, e.g. polycarboxylate cements containing calcium sulfate cements
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0834—Compounds having one or more O-Si linkage
- C07F7/0836—Compounds with one or more Si-OH or Si-O-metal linkage
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2103/00—Function or property of ingredients for mortars, concrete or artificial stone
- C04B2103/30—Water reducers, plasticisers, air-entrainers, flow improvers
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2111/00—Mortars, concrete or artificial stone or mixtures to prepare them, characterised by specific function, property or use
- C04B2111/00474—Uses not provided for elsewhere in C04B2111/00
- C04B2111/00482—Coating or impregnation materials
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2111/00—Mortars, concrete or artificial stone or mixtures to prepare them, characterised by specific function, property or use
- C04B2111/00474—Uses not provided for elsewhere in C04B2111/00
- C04B2111/00482—Coating or impregnation materials
- C04B2111/00517—Coating or impregnation materials for masonry
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2111/00—Mortars, concrete or artificial stone or mixtures to prepare them, characterised by specific function, property or use
- C04B2111/00474—Uses not provided for elsewhere in C04B2111/00
- C04B2111/00663—Uses not provided for elsewhere in C04B2111/00 as filling material for cavities or the like
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2111/00—Mortars, concrete or artificial stone or mixtures to prepare them, characterised by specific function, property or use
- C04B2111/60—Flooring materials
- C04B2111/62—Self-levelling compositions
Definitions
- the invention relates to a process for the preparation of powder (P) of silanol salts (hereinafter also referred to as siliconates
- alkoxysilanes basic alkali metal salt and water
- powder (P) building material mixtures, as well as components or moldings.
- Alkaliorganosiliconates such as Kaliummethylsiliconat have been used for decades for hydrophobing, in particular of
- Ready-to-use building material mixtures such as cement or gypsum plasters and putties or tile adhesives are mainly delivered as powder in bags or silos to the construction site and only there with the mixing water touched. This requires a solid hydrophobing agent that is ready to use
- Organosiliconates in solid form have proven to be very efficient hydrophobizing additives. Their preparation and use are described, for example, in the following documents:
- WO 12159874 describes solid organosiliconates which are prepared from mixtures of hydrolyzable methyl and alkyl silanes (> C 4 ) and aqueous bases. Their drying is preferably azeotropic.
- Various drying methods for these salts have been described which aim to circumvent the tough phase conditions as drying progresses, for example by drying in the powder bed (WO13075969).
- a disadvantage of this process is the long residence time in the dryer, which can lead to decomposition phenomena in the case of the thermally sensitive siliconate salts, which can cause a reduced effectiveness in the application.
- partially dried medium from the first drying step must be accomplished in a second vacuum-tight process apparatus.
- the siliconates are typically isolated by drying the reaction mixtures of one or more alkoxysilane (s) and a basic salt.
- Reaction mixtures are mostly solutions or dispersions, e.g. Suspensions or emulsions, in addition to the siliconate water and at least that in the reaction
- Alkoxy or halogen residues is needed because an excess of water must be re-energized during drying
- Drying process can not be completely removed from the solid and it remains - depending on
- Alcohol content of the aqueous-alcoholic reaction mixture - in the siliconate powder a residual alkoxy content.
- Alcohol levels also stabilize the solutions of the siliconate salts, so that rainfall through
- the object of the invention was to find a technically easy to implement process that allows the production of siliconeate powders with significantly reduced alcohol content from their alcoholic-aqueous hydrolyzate precursors while reducing the drying time and the disadvantages of
- the invention relates to a process for the preparation of powder (P) from salts of silanols, of which
- Hydrolysis / condensation products or of silanols together with their hydrolysis / condensation products and cations selected from alkali cations in which the
- Cation to silicon molar ratio 0.1 to 3 comprising, in a first step, organoalkoxysilanes, their hydrolysis / condensation products or organoalkoxysilanes together with their hydrolysis / condensation products, the alkoxy group being selected from methoxy, ethoxy, 1-propoxy and 2-propoxy group, with a basic alkali salt and optionally water to a hydrolyzate with a
- Alcohol content of 2 to 38 weight percent can be implemented in a second step from the first step
- the process differs from the prior art by a stepwise drying process.
- the reactions of alkoxysilanes with basic alkali metal salts which are carried out in step 1 give aqueous-alcoholic solutions or dispersions of siliconates, the preparation of which is described, for example, in WO 12022544 and DE 4336600.
- second step is the solutions or dispersions of Siliconates converted by drying in a free-flowing powder.
- the powder produced in the second step is subjected to a post-treatment to reduce the alcohol content.
- the aftertreatment is preferably carried out by means of
- the individual steps may be in a single apparatus in time directly consecutive or in separate, time-separated sections in the same or each one for the
- steps 1, 2 and 3 are carried out in different apparatuses.
- the advantage of the method according to the invention lies in the - compared to the prior art - much faster and thus gentler and more cost-effective transfer of the alcohol-containing hydrolyzate in a dry, low-alcohol or even alcohol-free organosilanol salt or Siliconat- powder (P). Salts of organosilanols are referred to as siliconates.
- salts of organosilanols are prepared in the process according to the invention, wherein in the first step
- R 1 , R 2 is a monovalent Si-C bonded unsubstituted or substituted by halogen atoms, amino groups, Ci-e-alkyl or Ci- 6 - alkoxy or silyl groups
- R 3 is hydrogen, a monovalent unsubstituted or substituted by halogen atoms or NH 2 groups
- Hydrocarbon radical having 1 to 8 carbon atoms Hydrocarbon radical having 1 to 8 carbon atoms
- R 4 is methyl, ethyl, 1-propyl or 2-propyl
- a is the values 1, 2 or 3 and
- b, c, d are 0, 1, 2 or 3
- Organoalkoxysilanes of the general formula 1 If present, formed by hydrolysis silanol groups in the compounds of general formula 1 or their oligomers do not interfere.
- R 1 , R 2 may be linear, branched, cyclic, aromatic, saturated or unsaturated.
- amino groups in R 1 , R 2 are radicals -NR 5 R 6 , where R 5 and R 6 are hydrogen, a radical C 1 -C 8 -alkyl, Cycloalkyl, aryl, arylalkyl, alkylaryl, which may be substituted by -OR 7 , where R 7 may be C 1 -C 8 -alkyl, aryl, arylalkyl, alkylaryl.
- R 5 , R 6 are alkyl radicals, non-adjacent CH 2 units may be replaced by groups -O-, -S-, or -NR 3 -.
- R 5 and R 6 may also be a cycle.
- R 5 is preferably hydrogen or an alkyl radical having 1 to 6 carbon atoms.
- R 1 , R 2 in the general formula 1 is preferably a monovalent unsubstituted or substituted by halogen atoms, amino, alkoxy or silyl hydrocarbon radical having 1 to 18 carbon atoms. Particularly preferred are unsubstituted alkyl radicals, cycloalkyl radicals, alkylaryl radicals, arylalkyl radicals and phenyl radicals.
- the alkyl radicals cycloalkyl radicals, alkylaryl radicals, arylalkyl radicals and phenyl radicals.
- Hydrocarbon radicals R 1 , R 2 have 1 to 6 carbon atoms
- radicals R 1 , R 2 are:
- n, m, o and p are values of 1 to 10, in particular 1, 2, 3 and R 8 , R 9 and R 10 have the meanings of R 5 , R 6 .
- R 3 is preferably hydrogen or a
- Alkyl radical having 1 to 6 carbon atoms examples of R 3 are listed above for R 1 .
- d is 0.
- at most at 20 mol%, in particular at most 5 mol% of the compounds of general formula 1 d is 1, 2 or 3.
- Examples of compounds of general formula 1, wherein a 1 means are:
- MeSi (OMe) 3 MeSi (OEt) 3 , eSi (OMe) 2 (OEt), eSi (OMe) (OEt) 2 ,
- MeSi (OMe) 3 MeSi (OEt) 3 , (H 3 C) 2 CHCH 2 -Si (OMe) 3 and PhSi (OMe) 3 , where methyltrimethoxysilane or its
- Me 2 Si (OMe) 2 Me 2 Si (OEt) 2 , Me 2 Si (OCH (CH 3 ) 2 ) 2 , MeSi (OMe) 2 CH 2 CH 2 CH 3 , Et 2 Si (OMe) 2 , Me 2 Si (OCH 2 CH 2 OCH 3 ) 2, MeSi (OMe) 2 Et, (H 3 C) 2 CH-Si (OMe) 2 Me, Ph-Si (OMe) 2 Me, t-Bu-Si (OMe ) 2 Me, Ph 2 Si (OMe) 2 ,
- H 2 C CH-Si (OMe) 2 Me
- H 2 C CH-CH 2 -Si (OMe) 2 Me
- cy-Hex-Si (OMe) 2 Me n-Hex-Si (OMe) 2 Me
- H 2 C CH- (CH 2 ) 9 -Si (OMe) 2 Me
- Me 2 Si (OMe) 2 , Me 2 Si (OEt) 2 , MeSi (OMe) 2 CH 2 CH 2 CH 3 and Ph-Si (OMe) 2 Me are preferred, Me 2 Si (OMe) 2 and MeSi ( OMe) 2 CH 2 CH 2 CH 3
- Me is methyl
- Et is ethyl
- Ph is phenyl
- t-Bu is 2, 2-dimethylpropyl
- cy-Hex is cyclohexyl
- n-hex is n-hexyl
- hexadecyl is n-hexadecyl.
- a 1 or 2.
- At least 50% preferably at least 60%, particularly preferably at least 70% and at most 80%,
- the basic alkali metal salts preferably have a pk B value of at most 12, particularly preferably at most 10, in particular at most 5.
- Basic alkaline salts used are compounds which form solvated hydroxide ions in water and contain alkali ions as cations.
- the alkali metal salts used are preferably the alkali metal hydroxides, such as lithium hydroxide,
- alkali metal salts are alkali metal carbonates, such as
- Alkali hydrogen carbonates such as sodium bicarbonate
- Alkali formates such as potassium formate, alkali silicates (water glass) such as sodium orthosilicate, disodium metasilicate,
- Disodium disodium, disodium trisilicate or potassium silicate Disodium disodium, disodium trisilicate or potassium silicate. Furthermore, alkali oxides, alkali metal or
- Alkali alcoholates are used, preferably those which release the same alcohol as the used
- Grades of basic salts i.e., at purities between 80 and 99% by weight
- water or other salt content e.g.
- Alkaliorganosiliconaten in particular aqueous or aqueous-alcoholic preparations of Alkaliorganosiliconaten
- a compound of general formula 1 can be reacted with an aqueous solution of a potassium methyl siliconate (eg WACKER SILRES® BS 16).
- a potassium methyl siliconate eg WACKER SILRES® BS 16
- preferred compounds of general formula 1 which are reacted with commercially available alkali metal methylsiliconates are Me-Si (O Me) 3 , Et-Si (Oe) 3 , Ph-Si (OMe) 3 , propyl-Si (OMe) 3 , Butyl-Si (0Me) 3 , hexyl-Si (OMe) 3 , octyl-Si (OMe) 3 , as well as their possible constitutional or stereoisomers, where Me is the methyl radical, Et is the ethyl radical, Ph is the phenyl radical, propyl is a 1-propyl or a 2-propyl radical, butyl is an n-butyl or a branche
- Steps 1 and 2 can be summarized in the inventive method by solid alkali metal organosiliconates, preferably powdered Alkaliorganosiliconate, with
- Alkali organosiliconates such as, for example, SILRES® BS Powder S (a powdered potassium methylsiliconate from WACKER CHEMIE AG).
- SILRES® BS Powder S a powdered potassium methylsiliconate from WACKER CHEMIE AG.
- This approach is particularly advantageous when siliconate Powders are to be produced which contain other radicals R 1 and R 2 in addition to methyl radicals.
- the methyl silicate powder can be reacted with compounds of the general formula 1 in which R 1 and R 2 or R 1 or R 2 do not correspond to the methyl radical.
- the amount of alkali metal salt is preferably chosen so that the resulting molar ratio of cation to silicon is at least 0.2, preferably at least 0.4, more preferably at least 0.5, particularly preferably at least 0.6 and at most 3.0, preferably at most 1.0 particularly preferably at most 0.8, in particular preferably at most 0.7.
- reaction of the compounds of general formula 1 with basic salts is usually exothermic and therefore preferably takes place under temperature-controlled dosing
- Component to another or parallel metering optionally to a reaction mixture already prepared at temperatures of preferably at least 0 ° C, more preferably at least 10 ° C, more preferably at least 20 ° C, preferably up to the boiling point of the liberated alcohol, preferably under an inert gas (nitrogen, argon , Lean air) at the pressure of
- reaction can also be carried out at higher or lower pressure, with pressures above 10,000 hPa offering no advantages. It can also be at the
- solvents are present, which ensure a better solubility of the components, such as alcohols, for example, methanol, ethanol or isopropanol, ketones, such as acetone and methyl isobutyl ketone (MIBK),
- alcohols for example, methanol, ethanol or isopropanol
- ketones such as acetone and methyl isobutyl ketone (MIBK)
- Sulfoxides such as dimethylsulfoxide (DMSO), amides such as N, -
- DMF Dimethylformamide
- NMP N-methylpyrrolidone
- ethers such as methyl t-butyl ether (MTBE), diethyl ether and dibutyl ether or polyethers such as polyethylene glycols having molecular weights between 100 and 300 g / mol and thus contribute to an acceleration of the reaction.
- the proportion is added
- Solvent at most 40 wt .-%, more preferably
- the reaction can be carried out in the so-called batch process, e.g. in a stirred tank or continuously, e.g. in a loop reactor (loop) or tube reactor or a reactive distillation
- Step 1 is preferably at least 3 wt .-% and
- step 2 the hydrolyzate from step 1 becomes
- Fluidized bed dryer or spray dryer accomplished. Depending on the alcohol content of the mixture, the drying is under
- Inert gas e.g., nitrogen, argon, helium, lean air with a maximum of 2% oxygen.
- the drying in the paddle dryer or fluidized bed dryer can be carried out according to the methods described in WO 13075969 and WO 13041385.
- the spray-drying can be used in any spray-drying of liquids
- suitable and already widely known devices for example those with at least one two-fluid nozzle, a carbide or hollow cone nozzle or a swirl atomizing nozzle or with a rotating
- air, lean air or nitrogen, in the spray-drying apparatus is 110 ° C to 350 ° C, especially
- step 2 is implemented by spray drying in a spray dryer or drying in a fluidized bed dryer, more preferably by spray drying in a spray dryer.
- the powders obtained in step 2 are preferably free-flowing and have an alcohol content of preferably at most 5 percent by weight, more preferably at most 4
- the alcohol content includes both the chemically bound and adsorbed alcohol. It is preferably determined by NMR spectroscopy on a solution of the powder. It can the
- Alcohol content is indicated.
- suspensions may also be used in the second step in which siliconate salt is undissolved. It is also possible to use mixtures of alcoholic-aqueous mixtures
- step 3 is preferably adherent and bound residual alcohol and the existing or
- Condensation processes formed water removed. Preference is given here to a residual moisture content in a measurement with the solids balance HR73 Halogen Moisture Analyzer Mettler Toledo or a comparable instrument at 160 ° C in powder (P) of at most 3 wt .-%, more preferably at most 1 wt .-%, in particular a maximum of 0.5 wt .-% based on the weight dried. Preferably, both steps are carried out with exclusion of oxygen, in particular under an inert gas atmosphere, e.g. out
- the alcohol content in the powder (P) produced according to the invention is preferably at most 1% by weight, more preferably at most 0.8% by weight, even more preferably at most 0.1% by weight and in particular at most 0.05% by weight, preferably according to the above definition.
- the drying or wall temperature is preferably selected so that the TMR ac i is at least 200%, preferably at least 150%, particularly preferably at least 100% of the drying time. This results in the maximum achievable degree of drying in step 2 and step 3: At higher temperatures gives a lower
- Paddle dryer thin film evaporator or
- Fluidized bed dryer the drying or
- Wall temperature in step 2 preferably at least 70 ° C, more preferably at least 90 ° C, especially at least 100 ° C and preferably at most 250 ° C, more preferably at most 200 ° C, in particular at most 150 ° C, provided that no disturbing thermal decomposition at these temperatures and the selected contact times occurs. If step 2 or step 3 can proceed under reduced pressure, the lowest possible pressure is advantageous, because - at the same temperature - it reduces the duration of drying or, with the same residence time, allows a reduction in temperature. at Carrying out step 2 or step 3 in the paddle dryer or agitator is preferably the highest after the
- a heated dry or steam-humidified gas stream air, or inert gas, such as nitrogen or argon
- air, or inert gas, such as nitrogen or argon is preferably passed through a powder bed at normal pressure or a slight overpressure so that fluidization takes place.
- Drying temperatures are selected as in direct
- the gas or vapor temperature in the fluidized bed process in step 3 is at least 100 ° C and at most 300 ° C, more preferably at least 150 ° C and at most 250 ° C.
- the inventive method allows an incomplete but significantly shorter drying to an alcoholic powder in step 2, which is then post-dried in step 3. Since the free-flowing powder isolated in step 2 already occupies significantly less volume than the liquid mixture from step 1, the dimension of the apparatuses for step 3 may also be lower than in step 2, which allows a better heat transfer during the after-drying. This is a considerable advantage over that in WO 13041385
- Fluidized bed dryer implemented in a fluidized bed and thus allows continuous drying.
- Carrier materials may be added during steps 2 or 3 to improve and accelerate grain formation, e.g.
- additives such.
- Antifoams, anti-caking agents, anti-caking agents and moisture binders are added.
- the powders (P) and forms or solutions which can be prepared therefrom can be used as auxiliaries for reducing the
- hydrophobizing additives Water absorption of building materials are used, so-called hydrophobizing additives. Here, they are usually first added by dry-mix process factory dry mortar, which is then, usually on the site, mixed with the mixing water, these additives then develop their hydrophobic effect in the resulting slurry ("slurry")
- Dry mortars may be e.g. Plasters, screeds,
- Set droplet size distribution of the spray material and in the exemplary case of the fine putties from 0 to 150 or up to a maximum of 180 microns can be preselected, without subsequent grinding, sieving and sifting is required. In the application of fine putties, it happens that when filling and finishing the mass undesirable
- Coarse grains with a grain size of greater than 180 microns lead to defects, traces and scratches, which cause the
- hydrophobizing additives do not occur these defects, which is a clear advantage.
- Building material mixtures which include for example plaster or cement ⁇ based dry mortar, plaster, filling compounds,
- Formulas is the silicon atom tetravalent.
- the solids content is determined in each case with the solid-content balance HR73 Halogen Moisture Analyzer from Mettler Toledo at 160 ° C
- step 1 100 g of WACKER SILRES® BS 16 (sold by WACKER CHEMIE AG, aqueous solution of potassium methylsiliconate having a solids content of 54% by weight) and in a nitrogen-inerted 500 ml five-necked glass flask with stirrer, thermometer and distillation bridge a potassium content of 0.41 mol / 100g) at 22 ° C. With vigorous stirring, 31.2 g (0.225 mol) of methyltrimethoxysilane (commercially available from WACKER CHEMIE AG, 98% purity) within 20
- step 3 the powder from step 2 is applied in a fluidized bed reactor (reverse frit) with a tempered at 160 ° C Stickstoffström at an overpressure of 10 hPa at 10 1 / min. After 30 minutes, the methanol / methoxy content is 0.9 wt .-%, after another 20 minutes at 0.63 wt .-%.
- a fluidized bed reactor reverse frit
- Example 2 Inventive Three-Stage Process for
- step 1 in a 500 ml five-neck glass flask with paddle stirrer, thermometer and inert gas inertized with nitrogen
- Kaliummethylsiliconat with a molar ratio K: Si of 0.65) at 100 ° C and 2 hPa presented.
- K: Si molar ratio
- 28.7 g (0.135 mol) of n-hexyltrimethoxysilane prepared from 1-hexene and trichlorosilane and subsequent reaction with
- step 1 a hydrolyzate H1 analogous to Example 1 in DE 4336600 from one molar equivalent of methyltrimethoxysilane
- Solid content 43 wt .-% (according to X H-NMR 38 wt .-% methanol and 18.7 wt .-% water).
- the viscosity is 22 mm 2 / s. 500 g solution from step 1 are heated in step 2 at 3 hPa within 40 minutes to a temperature of 130 ° C and stirred
- Solid content is 99.8 wt .-%.
- Methoxy / methanol is determined by NMR spectroscopy: it is 0.13 wt .-% based on the sum of MeSi0 3/2 , MeOi / 2 - and MeOH shares.
- Drying time is therefore about 80 minutes.
- the time required to produce a comparable grade of methylsiliconate powder is reduced from 2 hours to approximately 1.5 hours.
- step 1 in a 500 ml five-neck glass flask with paddle stirrer, thermometer and inert gas inertized with nitrogen
- Distillation bridge is 100 g WACKER SILRES® BS 16
- Methyltrimethoxysilane (commercially available from WACKER CHEMIE AG, 98% purity) is metered in within 20 minutes. The temperature of the reaction mixture rises to 33.degree. This gives a clear solution having a solids content of 53 wt .-% and a
- step 2 130 g of the solution from step 1 at 3 hPa within 15 minutes on a 150 ° C tempered and stirred bed of 150 g WACKER
- SILRES® BS powder S (commercially available from WACKER CHEMIE AG, potassium methylsiliconate with a K: Si molar ratio of 0.65). 214 g of a white, dry one are isolated
- step 3 the powder from step 2 in a
- Fluidized bed reactor (reverse frit) with a to 180 ° C.
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Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US15/127,538 US20170137445A1 (en) | 2014-03-20 | 2015-03-13 | Method for producing powders from alkali salts of silanols |
EP15709939.1A EP3119788A1 (de) | 2014-03-20 | 2015-03-13 | Verfahren zur herstellung von pulvern aus alkalisalzen von silanolen |
CN201580015002.0A CN106164012A (zh) | 2014-03-20 | 2015-03-13 | 由硅烷醇的碱金属盐生产粉末的方法 |
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DE102014205258.0A DE102014205258A1 (de) | 2014-03-20 | 2014-03-20 | Verfahren zur Herstellung von Pulvern aus Alkalisalzen von Silanolen |
DE102014205258.0 | 2014-03-20 |
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WO2015140075A1 true WO2015140075A1 (de) | 2015-09-24 |
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PCT/EP2015/055325 WO2015140075A1 (de) | 2014-03-20 | 2015-03-13 | Verfahren zur herstellung von pulvern aus alkalisalzen von silanolen |
Country Status (5)
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US (1) | US20170137445A1 (de) |
EP (1) | EP3119788A1 (de) |
CN (1) | CN106164012A (de) |
DE (1) | DE102014205258A1 (de) |
WO (1) | WO2015140075A1 (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102015224732A1 (de) | 2015-12-09 | 2017-06-14 | Wacker Chemie Ag | Verfahren zur Herstellung von Siloxanolen aus Metallsalzen von Silanolen |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102015204263A1 (de) * | 2015-03-10 | 2016-09-15 | Wacker Chemie Ag | Verfahren zur Herstellung von pulverförmigen Feststoffen aus Alkalisalzen von Silanolen |
CN109843982B (zh) * | 2017-04-04 | 2021-11-19 | 瓦克化学股份公司 | 反应性硅氧烷及其制备方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
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DE102010031624A1 (de) * | 2010-07-21 | 2012-01-26 | Wacker Chemie Ag | Wasserlösliche Organosiliconatpulver |
Family Cites Families (7)
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US2438055A (en) * | 1947-01-10 | 1948-03-16 | Corning Glass Works | Preparation of salts of monoorgano silanols |
US2567110A (en) * | 1947-07-12 | 1951-09-04 | Corning Glass Works | Organopolysiloxanes prepared by the reaction of salts of silanols with halosilanes |
DE4336600C1 (de) | 1993-10-27 | 1994-10-20 | Nuenchritz Chemie Gmbh | Verfahren zur kontinuierlichen Herstellung wäßriger Alkali-Alkylsiliconatlösungen |
KR101591156B1 (ko) | 2011-05-23 | 2016-02-02 | 와커 헤미 아게 | 유기실리코네이트 분말, 이의 제조 방법 및 무기 건축 자재의 소수화를 위한 이의 용도 |
DE102011083109A1 (de) * | 2011-09-21 | 2013-03-21 | Wacker Chemie Ag | Verfahren zur Herstellung von Pulvern aus Alkalisalzen von Silanolen |
DE102011086812A1 (de) | 2011-11-22 | 2013-05-23 | Wacker Chemie Ag | Verfahren zur Herstellung von Feststoffen aus Alkalisalzen von Silanolen |
DE102012208471A1 (de) | 2012-05-21 | 2013-11-21 | Wacker Chemie Ag | Verfahren zur Herstellung von Feststoffen aus Alkalisalzen von Silanolen |
-
2014
- 2014-03-20 DE DE102014205258.0A patent/DE102014205258A1/de not_active Withdrawn
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2015
- 2015-03-13 CN CN201580015002.0A patent/CN106164012A/zh active Pending
- 2015-03-13 US US15/127,538 patent/US20170137445A1/en not_active Abandoned
- 2015-03-13 WO PCT/EP2015/055325 patent/WO2015140075A1/de active Application Filing
- 2015-03-13 EP EP15709939.1A patent/EP3119788A1/de not_active Withdrawn
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
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DE102010031624A1 (de) * | 2010-07-21 | 2012-01-26 | Wacker Chemie Ag | Wasserlösliche Organosiliconatpulver |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102015224732A1 (de) | 2015-12-09 | 2017-06-14 | Wacker Chemie Ag | Verfahren zur Herstellung von Siloxanolen aus Metallsalzen von Silanolen |
WO2017097550A1 (de) | 2015-12-09 | 2017-06-15 | Wacker Chemie Ag | Verfahren zur herstellung von siloxanolen aus metallsalzen von silanolen |
US10196408B2 (en) | 2015-12-09 | 2019-02-05 | Wacker Chemie Ag | Process for preparing siloxanols from metal salts of silanols |
Also Published As
Publication number | Publication date |
---|---|
CN106164012A (zh) | 2016-11-23 |
EP3119788A1 (de) | 2017-01-25 |
DE102014205258A1 (de) | 2015-09-24 |
US20170137445A1 (en) | 2017-05-18 |
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