WO2015133338A1 - Dispositif de formation de film - Google Patents

Dispositif de formation de film Download PDF

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Publication number
WO2015133338A1
WO2015133338A1 PCT/JP2015/055291 JP2015055291W WO2015133338A1 WO 2015133338 A1 WO2015133338 A1 WO 2015133338A1 JP 2015055291 W JP2015055291 W JP 2015055291W WO 2015133338 A1 WO2015133338 A1 WO 2015133338A1
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WO
WIPO (PCT)
Prior art keywords
gas
powder
forming apparatus
film forming
area
Prior art date
Application number
PCT/JP2015/055291
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English (en)
Japanese (ja)
Inventor
智資 平野
公一 川崎
Original Assignee
日本発條株式会社
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Filing date
Publication date
Application filed by 日本発條株式会社 filed Critical 日本発條株式会社
Publication of WO2015133338A1 publication Critical patent/WO2015133338A1/fr

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/14—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas designed for spraying particulate materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C23C24/02—Coating starting from inorganic powder by application of pressure only
    • C23C24/04—Impact or kinetic deposition of particles

Definitions

  • the present invention relates to a film forming apparatus using a cold spray method.
  • a cold spray method is known as a method for forming a metal film (see, for example, Patent Document 1).
  • the cold spray method is to form a film on the surface of the substrate by injecting the powder of the material from the nozzle together with an inert gas in the state below the melting point or softening point and colliding with the substrate in the solid state. Is the method.
  • the processing is performed at a lower temperature than the thermal spraying method, it is possible to obtain a metal film having no phase transformation and suppressing oxidation. In addition, the influence of thermal stress can be reduced.
  • both the base material and the material to be the film are metal
  • plastic deformation occurs between the powder and the base material when the metal material powder collides with the base material (or the previously formed film). Since the anchor effect is obtained and the oxide films of each other are destroyed and metal bonds are formed by the new surfaces, a laminate with high adhesion strength can be obtained.
  • a gas powder mixing unit is generally provided upstream of a nozzle, and powder and high-pressure gas supplied from different systems are introduced into the gas powder mixing unit, respectively. Mixed. Then, the powder is sent from the gas powder mixing section to the nozzle by the gas pressure of the high-pressure gas, and sprayed from the tip of the nozzle.
  • the present invention has been made in view of the above, and provides a film forming apparatus that can equalize the amount of powder adhering to the inner wall of a passage through which powder passes in a film forming apparatus using a cold spray method. For the purpose.
  • a film forming apparatus sprays a powder of a material together with a gas from a nozzle, and sprays the powder on the surface of a base material in a solid state.
  • a film forming apparatus for forming a film by depositing a gas powder mixing unit that mixes the gas and the powder and supplies the mixed gas to the nozzle, and the gas powder mixing unit via at least one gas passage port
  • a gas chamber that introduces the gas into the gas powder mixing unit, and a powder supply pipe that supplies the powder to the gas powder mixing unit, the gas chamber passing through the gas chamber, Protruding the gas powder mixing section and arranged around the powder supply pipe in the gas chamber, and rectifying the gas introduced into the gas chamber.
  • the above Characterized in that it comprises a rectifying unit for passing one gas passage openings.
  • the rectifying unit includes a tubular member having both ends opened, the one opening surface of the member is applied to the at least one gas passage port, and the other opening surface is disposed in the gas chamber. It is arrange
  • the area of the region into which the gas introduced into the gas chamber flows in the other opening surface is area A, and the inner wall facing the other opening surface to the other opening surface.
  • the area B is equal to or greater than the area A, where the distance is a height and the area of a column-shaped side surface having the region as a bottom surface is an area B.
  • the area B is not more than 8 times the area A.
  • the rectifying unit further includes a plurality of rectifying members provided on an inner wall surface of the tubular member.
  • the opening surface of the rectifying unit has a shape similar to a cross section orthogonal to the longitudinal direction of the gas powder mixing unit.
  • the opening surface of the rectifying unit has the same shape as a cross section perpendicular to the longitudinal direction of the gas powder mixing unit.
  • the opening surface of the rectifying unit has a circular shape, an elliptical shape, a rectangular shape, or a polygonal shape.
  • the gas powder mixing unit which is a passage through which the powder passes, is provided around the powder supply pipe in the gas chamber because the rectification unit that rectifies the gas introduced into the gas chamber and passes the gas passage port is provided.
  • the powder adhering to the inner wall can be made uniform. As a result, the frequency of cleaning the powder passage can be reduced, and film formation can be performed efficiently.
  • FIG. 1 is a schematic diagram showing a configuration of a film forming apparatus according to an embodiment of the present invention.
  • FIG. 2 is an enlarged sectional view showing the inside of the spray gun shown in FIG.
  • FIG. 3 is an enlarged plan view showing the powder supply pipe support shown in FIG. 4 is a view taken along the arrow X of the rectifying unit shown in FIG. 5 is an enlarged perspective view showing the vicinity of the opening surface of the rectifying unit shown in FIG.
  • FIG. 6 is a plan view showing a modification of the powder supply pipe support shown in FIG.
  • FIG. 7 is a perspective view showing a modification of the rectifying unit shown in FIG.
  • FIG. 8 is a cross-sectional view showing a state where the rectifying unit shown in FIG. 7 is attached to the spray gun.
  • FIG. 9 is a photograph showing the gas powder mixing part after the experiment according to Example 2.
  • FIG. 10 is a photograph showing the gas powder mixing part after the experiment according to Comparative Example 2.
  • FIG. 1 is a schematic diagram showing a configuration of a film forming apparatus according to an embodiment of the present invention.
  • a film forming apparatus 1 according to the present embodiment is a film forming apparatus using a cold spray method, and a gas heater 2 for heating a high-pressure gas (compressed gas) and a film forming material powder.
  • a powder supply device 3 for storing and supplying to the spray gun 4, a spray gun 4 for mixing the heated high-pressure gas with the powder and introducing it into the nozzle 5, a nozzle 5 for injecting the powder together with the high-pressure gas, and a gas heater 2 and valves 6 and 7 for adjusting the amount of high-pressure gas supplied to the powder supply device 3, respectively.
  • the high-pressure gas helium, nitrogen, air or the like is used.
  • the high-pressure gas supplied to the gas heater 2 is heated to a temperature in a range lower than the melting point of the material powder, and then introduced into the spray gun 4.
  • the heating temperature of the high pressure gas is preferably 300 to 900 ° C.
  • the high-pressure gas supplied to the powder supply device 3 supplies the powder in the powder supply device 3 to the spray gun 4 so that a predetermined discharge amount is obtained.
  • the heated high-pressure gas is jetted as a supersonic flow (about 340 m / s or more) by passing through the nozzle 5.
  • the gas pressure of the high-pressure gas is preferably about 1 to 5 MPa. This is because by adjusting the pressure of the high-pressure gas to this level, the adhesion strength of the film 101 to the substrate 100 can be improved. More preferably, the treatment is performed at a pressure of about 2 to 4 MPa.
  • the base material 100 is arranged facing the spray gun 4, and the film forming material powder is put into the powder supply apparatus 3, and the high-pressure gas to the gas heater 2 and the powder supply apparatus 3.
  • the powder supplied to the spray gun 4 is injected into the supersonic flow of the high-pressure gas, accelerated, and injected from the nozzle 5.
  • the powder 101 collides and deposits on the base material 100 at a high speed in a solid phase state, whereby the coating 101 is formed.
  • FIG. 2 is an enlarged sectional view showing the inside of the spray gun 4 shown in FIG.
  • the spray gun 4 includes a gas powder mixing unit 10 that mixes high pressure gas and powder and supplies the mixture to the nozzle 5, and a gas chamber 11 that is filled with high pressure gas introduced into the gas powder mixing unit 10.
  • a powder supply pipe 12 for supplying powder to the gas powder mixing section 10, a powder supply pipe support section 13 provided at the boundary between the gas powder mixing section 10 and the gas chamber 11, and a powder supply pipe in the gas chamber 11 12 includes a tubular rectification unit 14 provided around 12, and a temperature sensor 15 and a pressure sensor 16 provided in the gas chamber 11.
  • the powder supply pipe support part 13 is provided with at least one gas passage port 13a for allowing the gas powder mixing part 10 and the gas chamber 11 to communicate with each other.
  • the gas powder mixing section 10 has a cross section orthogonal to the longitudinal direction of the nozzle 5 (hereinafter referred to as a transverse section) having a circularly symmetric tubular shape such as a circular shape, an elliptical shape, a rectangular shape, or a polygonal shape. The form is circular. Further, one end region of the gas powder mixing unit 10 is gradually narrowed toward the nozzle 5.
  • the gas powder mixing unit 10 is supplied with powder from the powder supply pipe 12 together with gas, and gas is introduced from the gas chamber 11 through the gas passage port 13a and mixed. The powder mixed with the gas is accelerated by passing through a tapered region on the nozzle 5 side and is sent to the nozzle 5.
  • the heated high pressure gas is introduced into the gas chamber 11 from the gas heater 2 through the gas supply path 17.
  • the pressure in the gas chamber 11 is normally maintained at about 1 to 5 MPa. Due to the pressure difference between the gas chamber 11 and the gas powder mixing unit 10, high-pressure gas is introduced into the gas powder mixing unit 10.
  • the powder supply pipe 12 penetrates the gas chamber 11, and the powder outlet 12 a protrudes into the gas powder mixing unit 10, and the outlet 12 a is arranged toward the nozzle 5.
  • FIG. 3 is an enlarged plan view showing the powder supply pipe support 13.
  • an opening 13b into which the powder supply pipe 12 can be fitted is provided at the center of the powder supply pipe support portion 13, and at least one (in this embodiment) is provided on the outer peripheral side of the opening 13b. 8) gas passage openings 13a are provided.
  • Such a powder supply pipe support part 13 is fitted in the boundary between the gas powder mixing part 10 and the gas chamber 11. Then, by fitting the powder supply pipe 12 into the opening 13 b of the powder supply pipe support section 13, the powder supply pipe 12 is supported along the rotation center axis of the gas powder mixing section 10 and the nozzle 5.
  • the rectifying unit 14 is a tubular member having both ends opened.
  • one opening surface is applied to the gas passage port 13 a, and the other opening surface (opening surface 14 a) is used as the inner wall of the gas chamber 11. It is arrange
  • the high-pressure gas introduced from the gas heater 2 into the gas chamber 11 flows into the rectifying unit 14 from the opening surface 14a, is rectified, and is introduced into the gas powder mixing unit 10 through the gas passage port 13a.
  • FIG. 4 is an X arrow view of the rectifying unit 14 shown in FIG.
  • the opening surface 14 a of the rectifying unit 14 has a rotationally symmetric shape such as a circular shape, an elliptical shape, a rectangular shape, or a polygonal shape according to the cross-sectional shape of the gas powder mixing unit 10. That is, the opening surface 14 a of the rectifying unit 14 is similar or identical to the cross-sectional shape of the gas powder mixing unit 10. As shown in FIGS. 1 and 4, in the first embodiment, the opening surface 14 a has a circular shape having the same diameter as that of the gas powder mixing unit 10.
  • Such a rectification unit 14 may be formed integrally with the powder supply pipe support unit 13. Moreover, in this Embodiment, although the rectification
  • the rectifying unit 14 will be described in detail.
  • the high-pressure gas introduced into the gas chamber 11 flows into the rectifying unit 14 from the opening surface 14 a and is rectified while passing through the rectifying unit 14.
  • the powder supplied from the powder supply pipe 12 to the gas powder mixing unit 10 proceeds along the longitudinal direction of the gas powder mixing unit 10, and the nozzle 5 To be supplied.
  • the rectifying unit 14 when the rectifying unit 14 is not provided or when the size of the rectifying unit 14 is not appropriate, that is, when the high-pressure gas introduced into the gas powder mixing unit 10 is not sufficiently rectified, it is supplied from the powder supply pipe 12. The traveling direction of the applied powder is biased. Therefore, the powder adheres unevenly to the inner wall of the gas powder mixing unit 10 and deposits locally.
  • the inventors of the present application repeatedly experimented to inject powder from the film forming apparatus 1, and uniformize the powder adhering to the inner wall of the gas powder mixing unit 10 with the high-pressure gas introduced into the gas powder mixing unit 10.
  • the dimensional condition of the rectifying unit 14 that can be sufficiently rectified to the extent that it can be intensively studied.
  • FIG. 5 is an enlarged perspective view showing the vicinity of the opening surface 14 a of the rectifying unit 14.
  • the rectifying unit 14 When the rectifying unit 14 is provided in the gas chamber 11, the rectifying unit 14 includes a columnar region 20 having an opening surface 14 a as a bottom surface and a height L 3 from the opening surface 14 a to the inner wall of the gas chamber 11. High pressure gas flows in. High-pressure gas flows into the columnar region 20 from the side surface of the columnar region 20, and high-pressure gas flows out from the opening surface 14a. Therefore, when the area of the opening surface 14a is A and the area of the side surface of the columnar region 20 is B, the areas A and B can be expressed by the following expressions (1) and (2).
  • A ⁇ ( ⁇ 1 2 ⁇ 2 2 ) / 4
  • the powder supplied from the powder supply pipe 12 in the gas powder mixing unit 10 is defined by defining the length of the rectifying unit 14 so as to satisfy the expression (3). Can be prevented from adhering to the inner wall and depositing locally. Moreover, the powder itself adhering to the inner wall of the gas powder mixing part 10 can be reduced. As a result, the frequency of cleaning the gas powder mixing unit 10 can be reduced, and film formation can be performed efficiently over a long period of time.
  • the gas supply port 13a is provided by forming a plurality of openings in the powder supply pipe support 13 (see FIG. 3), but the number and shape of the gas flow ports 13a are not limited thereto. .
  • a powder supply pipe support portion 30 shown in FIG. 6 may be applied instead of the powder supply pipe support portion 13.
  • the powder supply pipe support part 30 is in contact with the outer peripheral ring 31 that can be fitted to the boundary between the gas powder mixing part 10 and the gas chamber 11 and the outer peripheral side surface of the powder supply pipe 12. And a plurality of (four in FIG. 6) support rods 32 to be supported.
  • the area of the gas passage port 30a can be increased compared to the gas passage port 13a shown in FIG.
  • the number of support bars 32 is not particularly limited as long as the powder supply pipe 12 can be supported. In this case, the gas passage port 30a can be integrated.
  • the rectifying unit 14 is illustrated as an independent member. However, as described above, the rectifying unit 14 may be formed integrally with the powder supply pipe support unit 13.
  • the rectifying unit 14 may be formed integrally with the gas powder mixing unit 10.
  • the powder supply pipe support part 13 may be fitted inside the integrally formed gas powder mixing part 10 and rectification part 14, or in addition to the gas powder mixing part 10 and rectification part 14, the powder supply pipe support part 13. These three may be integrally formed.
  • the rectifying unit 14 may be formed integrally with the gas chamber 11.
  • the powder supply pipe support 13 may be fitted into the gas chamber 11 and the rectification unit 14 that are integrally formed.
  • three powder supply pipe support parts 13 may be provided. You may form integrally.
  • the rectifying unit 14 may be formed integrally with the powder supply pipe 12.
  • the three powder supply pipe support parts 13 may be integrally formed, or separately from the powder supply pipe support part 13, via a support part that supports the powder supply pipe 12 with respect to the rectifying part 14. Both may be formed integrally.
  • FIG. 7 is a perspective view showing a modification of the rectifying unit.
  • the rectifying unit 40 shown in FIG. 7 includes a tubular portion 41 having a tubular shape with both ends opened, and a plurality (four in FIG. 7) of rectifying fins 42 provided on the inner wall of the tubular portion 41.
  • Each of the rectifying fins 42 is a plate-like rectifying member, and is arranged such that its longitudinal direction is parallel to the height direction of the cylindrical portion 41 and one end in the longitudinal direction is aligned with one end surface of the cylindrical portion 41.
  • the length of each rectifying fin 42 in the longitudinal direction is shorter than the height of the cylindrical portion 41, but the length of each rectifying fin 42 is extended to the same extent as the height of the cylindrical portion 41. Also good.
  • FIG. 8 is a cross-sectional view showing a state where the rectifying unit 40 shown in FIG. 7 is attached to the spray gun 4 shown in FIG. 2 instead of the rectifying unit 14.
  • the rectifying unit 40 provided with the rectifying fins 42 inside, the rectifying effect of the high-pressure gas flowing from the gas chamber 11 through the rectifying unit 40 into the gas powder mixing unit 10 can be further enhanced.
  • the cylindrical portion 41 may be formed integrally with the gas powder mixing portion 10, the gas chamber 11, the powder supply tube 12, or the powder supply tube support portion 13. .
  • the ratio B / A of the area B to the area A is about 1.0, which satisfies the expression (3).
  • the temperature in the gas chamber 11 was maintained at 800 ° C. and the pressure at 4 MPa, and film formation was performed using 4 kg of copper powder. Then, when the gas powder mixing part 10 was removed and the inner wall was observed visually, the powder adhered almost uniformly.
  • the ratio B / A of the area B to the area A is about 3.0, which satisfies the formula (3).
  • FIG. 9 is a photograph showing the gas powder mixing unit 10 after the experiment according to Example 2.
  • a black area 111 shown in FIG. 9 is an area where powder is adhered. As shown in FIG. 9, the powder adhered to the inner wall of the gas powder mixing unit 10 almost uniformly.
  • the ratio B / A of the area B to the area A is about 8.0, which satisfies the expression (3).
  • FIG. 10 is a photograph showing the gas powder mixing unit 10 after the experiment according to Comparative Example 2.
  • a black area 121 shown in FIG. 10 is an area where the powder adheres.
  • the powder did not adhere much to the region 122 on the side facing the region 121.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Nozzles (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Abstract

　L'invention concerne un dispositif de formation de film à système de pulvérisation à froid dans lequel la quantité de poudre adhérant aux parois internes des canaux qu'elle traverse peut être uniformisée. Le dispositif de formation de film comprend : une partie de mélange gaz/poudre pour mélanger un gaz et une poudre, et alimenter une buse (5) en gaz et en poudre ; une chambre de gaz (11) communiquant avec la partie de mélange gaz/poudre (10) via au moins un orifice de passage de gaz (13a), ladite chambre de gaz (11), ladite chambre de gaz introduisant le gaz dans la partie de mélange gaz/poudre (10) ; un tube d'alimentation en poudre (12) pour alimenter en poudre la partie de mélange gaz/poudre (10), ledit tube (12) traversant la chambre de gaz (11) et amenant une ouverture de sortie de poudre (12a) à faire saillie dans la partie de mélange gaz/poudre (10), et étant tourné vers la direction de la pointe de la buse (5) ; et une partie de réglage d'écoulement (14) disposée autour du tube d'alimentation en poudre (12) à l'intérieur de la chambre de gaz (11) régulant l'écoulement du gaz introduit dans la chambre de gaz (11) et amenant le gaz à traverser l'orifice de passage de gaz. (13A)
PCT/JP2015/055291 2014-03-07 2015-02-24 Dispositif de formation de film WO2015133338A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014045459A JP6321407B2 (ja) 2014-03-07 2014-03-07 成膜装置
JP2014-045459 2014-03-07

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WO2015133338A1 true WO2015133338A1 (fr) 2015-09-11

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TWI688992B (zh) * 2016-08-12 2020-03-21 漢民科技股份有限公司 用於半導體製程之氣體噴射器及成膜裝置
CN106367749B (zh) * 2016-09-26 2019-01-25 西北工业大学 一种管道内壁涂层的制备方法
KR101839030B1 (ko) * 2017-08-22 2018-03-15 가람환경기술(주) 이중관 타입 노즐을 구비한 수지분말 코팅장치
KR102150586B1 (ko) * 2018-08-22 2020-09-01 아이원스 주식회사 가이드 노즐을 갖는 피막 형성 장치
JP7120451B2 (ja) * 2019-03-29 2022-08-17 日産自動車株式会社 コールドスプレー装置

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US5302414A (en) * 1990-05-19 1994-04-12 Anatoly Nikiforovich Papyrin Gas-dynamic spraying method for applying a coating
JPH06165952A (ja) * 1992-11-30 1994-06-14 Kyocera Corp 溶射用チャンバー及びそれを用いた溶射方法
JP2004076157A (ja) * 2002-08-13 2004-03-11 Howmet Research Corp ＭＣｒＡｌＸコーティングの溶射方法

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US20050214474A1 (en) * 2004-03-24 2005-09-29 Taeyoung Han Kinetic spray nozzle system design
JP4765103B2 (ja) * 2006-09-29 2011-09-07 日本ケミコン株式会社 コンデンサ
JP2008302311A (ja) * 2007-06-08 2008-12-18 Ihi Corp コールドスプレー方法
JP2010047825A (ja) * 2008-08-25 2010-03-04 Mitsubishi Heavy Ind Ltd 金属皮膜の形成方法及び航空宇宙構造部材
US8020509B2 (en) * 2009-01-08 2011-09-20 General Electric Company Apparatus, systems, and methods involving cold spray coating
JP2011240314A (ja) * 2010-05-21 2011-12-01 Kobe Steel Ltd コールドスプレー装置
JP4677050B1 (ja) * 2010-07-20 2011-04-27 スタータック株式会社 被膜形成方法及びその方法により形成される複合材
ES2670824T3 (es) * 2011-09-30 2018-06-01 L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude Procedimiento y dispositivo para descargar una corriente de medio refrigerante
CN103521404B (zh) * 2013-10-25 2015-12-02 中国船舶重工集团公司第七二五研究所 一种便携式低压冷喷涂装置

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Publication number Priority date Publication date Assignee Title
US5302414A (en) * 1990-05-19 1994-04-12 Anatoly Nikiforovich Papyrin Gas-dynamic spraying method for applying a coating
US5302414B1 (en) * 1990-05-19 1997-02-25 Anatoly N Papyrin Gas-dynamic spraying method for applying a coating
JPH06165952A (ja) * 1992-11-30 1994-06-14 Kyocera Corp 溶射用チャンバー及びそれを用いた溶射方法
JP2004076157A (ja) * 2002-08-13 2004-03-11 Howmet Research Corp ＭＣｒＡｌＸコーティングの溶射方法

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JP2015168861A (ja) 2015-09-28
TW201544193A (zh) 2015-12-01
TWI603784B (zh) 2017-11-01
JP6321407B2 (ja) 2018-05-09

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