WO2015119016A1 - 光学製品並びに眼鏡レンズ及び眼鏡 - Google Patents
光学製品並びに眼鏡レンズ及び眼鏡 Download PDFInfo
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- WO2015119016A1 WO2015119016A1 PCT/JP2015/052346 JP2015052346W WO2015119016A1 WO 2015119016 A1 WO2015119016 A1 WO 2015119016A1 JP 2015052346 W JP2015052346 W JP 2015052346W WO 2015119016 A1 WO2015119016 A1 WO 2015119016A1
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- refractive index
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- 230000003287 optical effect Effects 0.000 title claims abstract description 52
- 239000011521 glass Substances 0.000 title description 5
- 239000000758 substrate Substances 0.000 claims abstract description 23
- 239000000463 material Substances 0.000 claims abstract description 17
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 5
- 239000010408 film Substances 0.000 abstract description 72
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 28
- 239000000377 silicon dioxide Substances 0.000 abstract description 14
- 239000012788 optical film Substances 0.000 abstract description 6
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 230000000052 comparative effect Effects 0.000 description 29
- 238000009826 distribution Methods 0.000 description 17
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- 230000003595 spectral effect Effects 0.000 description 14
- 229920005989 resin Polymers 0.000 description 12
- 239000011347 resin Substances 0.000 description 12
- 230000015572 biosynthetic process Effects 0.000 description 11
- 239000000047 product Substances 0.000 description 11
- 235000012239 silicon dioxide Nutrition 0.000 description 8
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- 239000010419 fine particle Substances 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 6
- 150000002500 ions Chemical class 0.000 description 6
- 238000002834 transmittance Methods 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 4
- 229910052809 inorganic oxide Inorganic materials 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 229910001882 dioxygen Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 125000005375 organosiloxane group Chemical group 0.000 description 3
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 3
- 150000003553 thiiranes Chemical class 0.000 description 3
- 239000004408 titanium dioxide Substances 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 230000003301 hydrolyzing effect Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- HFLAMWCKUFHSAZ-UHFFFAOYSA-N niobium dioxide Chemical compound O=[Nb]=O HFLAMWCKUFHSAZ-UHFFFAOYSA-N 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- -1 oxygen ions Chemical class 0.000 description 2
- 229920005749 polyurethane resin Polymers 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- FRWYFWZENXDZMU-UHFFFAOYSA-N 2-iodoquinoline Chemical compound C1=CC=CC2=NC(I)=CC=C21 FRWYFWZENXDZMU-UHFFFAOYSA-N 0.000 description 1
- WSSSPWUEQFSQQG-UHFFFAOYSA-N 4-methyl-1-pentene Chemical compound CC(C)CC=C WSSSPWUEQFSQQG-UHFFFAOYSA-N 0.000 description 1
- 208000002177 Cataract Diseases 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 238000012644 addition polymerization Methods 0.000 description 1
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- LTPBRCUWZOMYOC-UHFFFAOYSA-N beryllium oxide Inorganic materials O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 1
- SYFOAKAXGNMQAX-UHFFFAOYSA-N bis(prop-2-enyl) carbonate;2-(2-hydroxyethoxy)ethanol Chemical compound OCCOCCO.C=CCOC(=O)OCC=C SYFOAKAXGNMQAX-UHFFFAOYSA-N 0.000 description 1
- QHIWVLPBUQWDMQ-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C=C QHIWVLPBUQWDMQ-UHFFFAOYSA-N 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000007859 condensation product Substances 0.000 description 1
- NQKXFODBPINZFK-UHFFFAOYSA-N dioxotantalum Chemical compound O=[Ta]=O NQKXFODBPINZFK-UHFFFAOYSA-N 0.000 description 1
- CWAFVXWRGIEBPL-UHFFFAOYSA-N ethoxysilane Chemical compound CCO[SiH3] CWAFVXWRGIEBPL-UHFFFAOYSA-N 0.000 description 1
- 208000030533 eye disease Diseases 0.000 description 1
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(iv) oxide Chemical compound O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920006295 polythiol Polymers 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02C—SPECTACLES; SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURES AS SPECTACLES; CONTACT LENSES
- G02C7/00—Optical parts
- G02C7/10—Filters, e.g. for facilitating adaptation of the eyes to the dark; Sunglasses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/281—Interference filters designed for the infrared light
- G02B5/282—Interference filters designed for the infrared light reflecting for infrared and transparent for visible light, e.g. heat reflectors, laser protection
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
-
- G—PHYSICS
- G02—OPTICS
- G02C—SPECTACLES; SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURES AS SPECTACLES; CONTACT LENSES
- G02C7/00—Optical parts
- G02C7/10—Filters, e.g. for facilitating adaptation of the eyes to the dark; Sunglasses
- G02C7/104—Filters, e.g. for facilitating adaptation of the eyes to the dark; Sunglasses having spectral characteristics for purposes other than sun-protection
-
- G—PHYSICS
- G02—OPTICS
- G02C—SPECTACLES; SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURES AS SPECTACLES; CONTACT LENSES
- G02C7/00—Optical parts
- G02C7/10—Filters, e.g. for facilitating adaptation of the eyes to the dark; Sunglasses
- G02C7/107—Interference colour filters
-
- G—PHYSICS
- G02—OPTICS
- G02C—SPECTACLES; SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURES AS SPECTACLES; CONTACT LENSES
- G02C2202/00—Generic optical aspects applicable to one or more of the subgroups of G02C7/00
- G02C2202/16—Laminated or compound lenses
Definitions
- the present invention relates to an optical product including a spectacle lens (including a sunglasses lens) having a near-infrared reflection function, and spectacles (including sunglasses) using the spectacle lens.
- This filter can be used for a filter for an image sensor, a display in a camera or a music player, glass for automobiles, and the like.
- Silica (SiO 2 , silicon dioxide) and titania (TiO 2 , dioxide dioxide) are formed on both sides of the substrate.
- a dielectric multilayer film is formed by alternately stacking 40 layers of 20 layers on each side.
- Patent Documents 1 and 2 although near-infrared rays can be cut, the number of layers of the dielectric multilayer film is 40, resulting in high cost. On the other hand, when the number of layers is 20 or more, the thickness of the dielectric multilayer film increases, and cracks may occur due to the effects of film stress and radiant heat during film formation, and the adhesion to the substrate is relatively lowered. There is a possibility that the substrate may be deformed, and the durability may be relatively inferior. Further, in Patent Documents 1 and 2, there is room for further improving the transmittance (antireflection property) in the visible region (for example, 400 to 780 nm (nanometers) or 400 to 800 nm).
- the transmittance antireflection property
- spectacle lenses are required to have antireflection performance in the visible region.
- the near-infrared cut has not been discussed as compared with the cut of ultraviolet light or blue light.
- cataract which is one of eye diseases, may progress when ultraviolet rays or blue rays pass through a lens that has become hot due to near infrared rays.
- Near-infrared light is, for example, light in the wavelength range of 800 to 2000 nm, is radiated from the sun like the ultraviolet rays and visible light, and falls on the ground. Near-infrared light has a relatively longer wavelength than ultraviolet light and blue light, and the amount of light reaching the ground is relatively small. However, near-infrared light that is close to the visible region is slightly less than ultraviolet light (with an equivalent amount). The amount has reached the ground. If the multilayer film of Patent Documents 1 and 2 is applied to the lens substrate in order to give a near-infrared protection effect to the spectacle lens, the cost is not met, the durability is not satisfactory, and the visible region is not visible.
- the inventions according to claims 1, 4 and 5 are optical products and glasses that have higher antireflection performance in the visible region, lower transmittance of near-infrared light, lower cost, and higher durability.
- the purpose is to provide lenses and glasses.
- the invention according to claim 2 is the above invention, wherein the optical multilayer film further has (6) an average reflectance of 35% or more with respect to one side of light having a wavelength range of 800 nm to 1500 nm. ) The reflectance with respect to one side of light having a wavelength of 1000 nm is 50% or more.
- the invention according to claim 3 is characterized in that, in the above-mentioned invention, the optical multilayer film further satisfies the condition that (8) the visibility reflectance is 2% or less.
- the invention according to claim 4 is an eyeglass lens, wherein the optical product of the invention is used. According to a fifth aspect of the present invention, in the spectacles, the spectacle lens of the above invention is used.
- an optical product, spectacle lens, and spectacles are provided that have sufficient near-infrared protection performance, yet have sufficiently high anti-reflection performance in the visible region, low cost, and sufficient durability. There is an effect that it becomes possible.
- 6 is a graph showing spectral reflectance distributions in the visible region or near infrared region according to Examples 1 to 3.
- 6 is a graph showing spectral reflectance distributions in the visible region according to Examples 1 to 3.
- 7 is a graph showing spectral reflectance distributions in the visible region or near infrared region according to Examples 4 to 6.
- 7 is a graph showing spectral reflectance distributions in the visible region according to Examples 4 to 6.
- 10 is a graph showing spectral reflectance distributions in the visible region or near infrared region according to Examples 7 to 9.
- 10 is a graph showing spectral reflectance distributions in the visible region according to Examples 7 to 9.
- 12 is a graph showing spectral reflectance distributions in the visible region or near infrared region according to Examples 10 to 12.
- 12 is a graph showing spectral reflectance distributions in the visible region according to Examples 10 to 12.
- 6 is a graph showing spectral reflectance distributions in the visible region or near infrared region according to Comparative Examples 1 and 2.
- 6 is a graph showing spectral reflectance distributions in the visible region according to Comparative Examples 1 and 2.
- 6 is a graph showing spectral reflectance distributions in a visible region or a near infrared region according to Comparative Examples 3 and 4.
- 10 is a graph showing spectral reflectance distributions in the visible region according to Comparative Examples 3 and 4.
- an optical multilayer film is formed on one side or both sides of the substrate.
- the substrate may be made of any material, and preferably has translucency.
- the base material include polyurethane resin, thiourethane resin, episulfide resin, polycarbonate resin, polyester resin, acrylic resin, polyethersulfone resin, poly-4-methylpentene-1 resin, and diethylene glycol bisallyl carbonate resin.
- base material include polyurethane resin, thiourethane resin, episulfide resin, polycarbonate resin, polyester resin, acrylic resin, polyethersulfone resin, poly-4-methylpentene-1 resin, and diethylene glycol bisallyl carbonate resin.
- an episulfide resin obtained by addition polymerization of an episulfide group and a polythiol and / or a sulfur-containing polyol.
- the optical multilayer film satisfies the following conditions.
- the optical multilayer film When the optical multilayer film is formed on both sides, preferably all the films satisfy the following conditions, and more preferably all the films have the same laminated structure.
- the optical multilayer film has a seven-layer structure in which low refractive index layers and high refractive index layers are alternately stacked. When the layer closest to the substrate (the layer closest to the substrate) is the first layer, the odd layer is the low refractive index layer and the even layer is the high refractive index layer.
- the low refractive index layer is formed using silica (silicon dioxide, SiO 2 ), and the high refractive index layer is formed using a material having a refractive index of 2.145 or more with respect to light having a wavelength of 500 nm.
- the refractive index of the high refractive index layer includes the material, the degree of vacuum during vapor deposition, the amount of oxygen gas supplied per unit time, the presence of various assists, the film formation speed, etc. It can be changed depending on the film forming conditions. Compared to the difference in refractive index due to the difference in material, the difference in refractive index due to film formation conditions is relatively small, and the change in refractive index due to film formation conditions remains relatively small.
- the rate is fine tuned.
- the physical thickness of the fifth layer (low refractive index layer) is 145 nm or more and 165 nm or less.
- the optical multilayer film is preferably formed by a vacuum deposition method, a sputtering method, or the like.
- the material for the high refractive index layer include titanium dioxide (titania, TiO 2 ), zirconium dioxide (zirconia, ZrO 2 ), tantalum dioxide (TaO 2 ), niobium dioxide (NbO 2 ), and hafnium dioxide (HfO 2 ). Or a combination thereof.
- another type of film such as a hard coat film or a water repellent film may be added between the optical multilayer film and the substrate and / or on the surface of the optical multilayer film.
- the types of different types of films to be added may be changed with each other, and the presence or absence of the film may be changed with each other.
- the hard coat film is preferably formed by uniformly applying a hard coat solution to the surface of the substrate.
- an organosiloxane resin preferably containing inorganic oxide fine particles can be used as the hard coat film.
- the organosiloxane resin is preferably obtained by hydrolyzing and condensing alkoxysilane.
- organosiloxane resin examples include ⁇ -glycidoxypropyltrimethoxysilane, ⁇ -glycidoxypropyltriethoxysilane, methyltrimethoxysilane, ethylsilicate, and combinations thereof.
- These hydrolysis-condensation products of alkoxysilane are produced by hydrolyzing the alkoxysilane compound or a combination thereof with an acidic aqueous solution such as hydrochloric acid.
- the material of the inorganic oxide fine particles zinc oxide, silicon dioxide (silica fine particles), aluminum oxide, titanium oxide (titania fine particles), zirconium oxide (zirconia fine particles), tin oxide, beryllium oxide, antimony oxide, oxidation
- examples thereof include single sols of tungsten and cerium oxide or a mixture of two or more of them.
- the diameter of the inorganic oxide fine particles is preferably 1 nm or more and 100 nm or less, and more preferably 1 nm or more and 50 nm or less, from the viewpoint of ensuring the transparency of the hard coat film.
- the blending amount (concentration) of the inorganic oxide fine particles is not less than 40% by weight and not more than 60% by weight in the total components of the hard coat film from the viewpoint of ensuring an appropriate degree of hardness and toughness in the hard coat film. It is preferable to occupy.
- acetylacetone metal salt and / or ethylenediaminetetraacetic acid metal salt can be added to the hard coat solution as a curing catalyst, and further, ensuring adhesion to the substrate and facilitating formation, desired (semi) transparent
- a surfactant, a colorant, a solvent, and the like can be added as necessary for imparting color.
- the physical thickness of the hard coat film is preferably 0.5 ⁇ m (micrometer) or more and 4.0 ⁇ m or less.
- the lower limit of this film thickness range is determined because it is difficult to obtain sufficient hardness if it is thinner than this range.
- the upper limit is determined by increasing the possibility that problems related to physical properties such as generation of cracks and brittleness will increase dramatically.
- a primer layer may be added between the hard coat film and the substrate surface. Examples of the material for the primer layer include polyurethane resins, acrylic resins, methacrylic resins, organic silicon resins, or combinations thereof.
- the optical product having the optical multilayer film described above has seven optical multilayer films, it is easier to form and costs less than 20 optical multilayer films, and cracks are generated due to stress and radiant heat. Durability can be improved by reducing the possibility or reducing the possibility of peeling or deformation of the substrate by improving the adhesion to the substrate. Further, the above optical product has high transmittance in the visible region (for example, 400 nm to 800 nm, 450 nm to 800 nm, or 450 nm to 750 nm), and has antireflection performance. For example, the maximum reflectance relating to light in the wavelength range of 450 nm to 750 nm is 4% or less. Also, the visibility reflectance is 2% or less.
- the optical product described above has a low transmittance of light having a wavelength in the near infrared region, and has a function of reflecting and cutting near infrared light.
- the light cut does not represent only the case where the light is completely blocked (transmittance 0%), but a predetermined transmittance (for example, 90% or 80%) or less (in other words, reflectivity 10). % Or more or 20% or more).
- the average reflectance on the single-sided substrate relating to light in the wavelength region of 800 nm to 1500 nm is 35% or higher, and the reflectance on the single-sided substrate of light having a wavelength of 1000 nm is 50% or higher. It becomes.
- the base is preferably a spectacle lens base, and the optical product is a spectacle lens.
- the spectacle lens spectacles that cut near infrared rays while preventing reflection of light in the visible region can be manufactured.
- Examples 1 to 12 and Comparative Examples 1 to 4 Next, examples of the present invention according to the above embodiment and comparative examples not belonging to the present invention will be described.
- the embodiments of the present invention are not limited to the following examples.
- Examples 1 to 12 and Comparative Examples 1 to 4 relating to spectacle lenses were produced by forming different types of intermediate films and optical multilayer films on both surfaces of each spectacle lens base on the same plurality of spectacle lens bases. .
- the spectacle lens base is a spherical lens base made of thiourethane resin and having a power of S-2.00, a refractive index of 1.60, an Abbe number of 41, and is a standard spectacle lens. It was a circular size.
- the intermediate film was a hard coat film formed by applying a hard coat solution.
- the hard coat solution was prepared as follows. First, in a container, 206 g (gram) of methanol, 300 g of methanol-dispersed titania sol (manufactured by JGC Catalysts and Chemicals, solid content 30%), 60 g of ⁇ -glycidoxypropyltrimethoxysilane, ⁇ -glycidoxypropylmethyldi 30 g of ethoxysilane and 60 g of tetraethoxysilane were added dropwise, and a 0.01N (normality) hydrochloric acid aqueous solution was added dropwise to the mixture and stirred for hydrolysis.
- the hard coat solution was applied to each surface of the spectacle lens substrate as follows. That is, the hard coat solution was uniformly spread by a spin coat method, and placed in an environment of 120 ° C. for 1.5 hours, whereby the hard coat solution was heated and cured.
- the hard coat films thus formed all had a physical film thickness of 2.5 ⁇ m.
- the optical multilayer film has the same film structure on both sides in the same spectacle lens substrate, and both have a seven-layer optical multilayer in which a low refractive index layer (silicon dioxide) and a high refractive index layer are alternately deposited. It is a membrane.
- the film thickness of at least one of the low refractive index layer and the high refractive index layer and the refractive index (material and film forming method) of the high refractive index layer are different from each other.
- the optical multilayer films of Examples 1 to 12 and Comparative Examples 1 to 4 were all formed by vacuum deposition.
- the odd layers (1, 3, 5, and 7) are low refractive index layers and are formed of silicon dioxide, and the even layers (2, 4, and 6 layers) are high refractive index layers and are refracted from silicon dioxide. It is made of a highly refractive material with a high rate.
- the refractive index of the high refractive index layer is basically determined by the material to be selected, but can be adjusted by the film formation rate (the speed at which the film is formed), the film formation pressure, the ion assist process, and the like.
- the film formation rate the speed at which the film is formed
- the film formation pressure the ion assist process
- titanium dioxide is selected as the material for the high refractive index layer
- the refractive index is different from each other by changing the pressure during film formation and the ion assist conditions.
- the pressure at the time of film formation is adjusted by the degree of vacuum in the vapor deposition chamber, the introduction amount per unit time when oxygen gas and / or argon gas are slightly introduced, and the like.
- the ion assist condition is defined as an ion gun operation pattern (on / off mode) or voltage when oxygen molecules and argon molecules in oxygen gas and / or argon gas are converted into oxygen ions or argon ions by an ion gun or the like. It can be changed according to the amount of various gases introduced.
- zirconium dioxide was selected as the material for the high refractive index layer, and as in the case of titanium dioxide, the film formation pressure and ion assist conditions were changed. The refractive indexes are different from each other.
- Examples 1 to 12 and Comparative Examples 1 to 4 have an antireflection function in the visible region, but there is still a slight amount of reflected light (with a maximum reflectance of about 3% or less).
- the color of the reflected light is designed to be green.
- the color of the reflected light is blue.
- [Table 1] to [Table 12] show the refractive index and film thickness of each layer of the optical multilayer film according to Examples 1 to 12, and [Table 13] to [Table 16] show Comparative Examples 1 to 4 respectively. The refractive index and film thickness of each layer of the optical multilayer film are shown.
- [Antireflection in the visible region] In the following [Table 17], the reflected color in the reflected light of Examples 1 to 6 and Comparative Examples 1 and 2, the x and y values in the CIE color system, and the luminous reflectance are shown.
- [Table 18] The reflection color in the reflected light of Examples 7 to 12 and Comparative Examples 3 to 4, the x and y values in the CIE color system, and the visibility reflectance are shown. According to the reflection color and x value and y value in the table, the reflection color is green in Examples 1 to 6 and Comparative Examples 1 and 2, and the reflection color is blue in Examples 7 to 12 and Comparative Examples 3 and 4.
- the visibility reflectance is 1.2% or less in any of the examples, and it is visible when viewed in combination with the reflectance distribution of FIGS. It can be seen that the region exhibits antireflection properties. If the visibility reflectance is 2% or less, sufficient antireflection properties can be imparted to improve visibility.
- the physical thickness of the fifth layer (154.84 nm) is in the range of 145 nm to 165 nm, and the total optical thickness (1.323 ⁇ ) of the fourth to sixth layers is 1. Although it is in the range of 3 ⁇ or more and 1.5 ⁇ or less, since the refractive index (2.1071) of the high refractive index layer is less than 2.145, the average reflection related to light in the wavelength range of 800 nm to 1500 nm. The rate (31.88%) is less than 35%, and the reflectance of light with a wavelength of 1000 nm (46.88%) is less than 50%, and the near-infrared cut performance is relatively poor.
- the physical thickness (155.40 nm) of the fifth layer is in the range of 145 nm to 165 nm, but the total optical thickness (1.279 ⁇ ) of the fourth to sixth layers is 1. Since it is out of the range of 3 ⁇ to 1.5 ⁇ and the refractive index (2.0577) of the high refractive index layer is less than 2.145, the average reflectance related to the light in the wavelength range of 800 nm to 1500 nm. (29.12%) is less than 35%, and the reflectance of light with a wavelength of 1000 nm (44.31%) is less than 50%, so that the near-infrared cut performance is relatively poor.
- the physical thickness of the fifth layer is in the range of 145 nm to 165 nm, and the total optical thickness of the fourth to sixth layers is 1.3 ⁇ or more. Since it is in the range of 1.5 ⁇ or less and the refractive index of the high refractive index layer is 2.145 or more, the average reflectance relating to light in the wavelength region of wavelength 800 nm or more and 1500 nm or less is 35% or more. In addition, the reflectance of light with a wavelength of 1000 nm is 50% or more, and the near-infrared cut performance is good.
- the physical thickness (145.11 nm) of the fifth layer is in the range of 145 nm to 165 nm
- the total optical thickness (1.394 ⁇ ) of the fourth to sixth layers is Although it is within the range of 1.3 ⁇ or more and 1.5 ⁇ or less, since the refractive index (2.1071) of the high refractive index layer is less than 2.145, it relates to light in the wavelength range of 800 nm to 1500 nm.
- the average reflectance (31.92%) is less than 35%, and the reflectance (47.65%) of light having a wavelength of 1000 nm is less than 50%, so that the near-infrared cut performance is relatively poor.
- the physical thickness (147.51 nm) of the fifth layer is in the range of 145 nm to 165 nm, and the total optical thickness (1.412 ⁇ ) of the fourth to sixth layers is 1.3 ⁇ . Although it is outside the range of 1.5 ⁇ or less, the refractive index (2.0577) of the high refractive index layer is less than 2.145. Therefore, the average reflectance related to light in the wavelength region of wavelengths of 800 nm to 1500 nm. (30.17%) is less than 35%, and the reflectance (44.86%) of light having a wavelength of 1000 nm is less than 50%, and the near-infrared cut performance is relatively poor.
- the physical film thickness of the fifth layer is in the range of 145 nm to 165 nm, and the total optical film thickness of the fourth to sixth layers is 1.3 ⁇ or more. Since the refractive index of the high refractive index layer is 2.145 or more within the range of 1.5 ⁇ or less, the average reflectance with respect to one surface relating to light in the wavelength region of wavelengths of 800 nm to 1500 nm is 35. %, And the reflectance for one surface of light having a wavelength of 1000 nm is 50% or more, and the near-infrared cut performance is good.
- the physical film thickness of the fifth layer is less than 145 nm, the near-infrared cut rate is relatively insufficient, and if it exceeds 165 nm, it becomes difficult to design including the provision of antireflection in the visible region. And the cost of forming increases.
- the lower limit and upper limit of the total optical film thickness of the fourth to sixth layers are the same as the physical film thickness of the fifth layer.
- silica silicon dioxide, SiO 2
- SiO 2 silicon dioxide
- the reflection color can be (very light) green as in Examples 1 to 6, or the reflection color can be (very light) blue as in Examples 7 to 12. While satisfying the condition of the layer structure in the optical multilayer film, the reflected color can be changed to another color.
- the spectacle lenses of Examples 1 to 12 it is possible to produce spectacles that achieve both the antireflection property in the visible region and the cut of near infrared rays.
- optical products such as window films (buildings, vehicles, etc.) and camera lens filters having the same characteristics as in Examples 1 to 12 can be produced.
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Abstract
Description
又、20層以上ともなると、誘電体多層膜の膜厚が厚くなり、膜応力や成膜中の輻射熱の影響によって、クラックが発生するおそれがあるし、基体に対する密着性が比較的に低下するおそれがあるし、基体が変形するおそれがあり、耐久性が比較的に劣ってしまう可能性がある。
更に、特許文献1,2のものでは、可視領域(例えば400~780nm(ナノメートル),あるいは400~800nm)における透過率(反射防止性)をより一層良好にする余地がある。
特に、眼鏡レンズにおいては、可視領域における反射防止性能が求められる。
又、眼鏡レンズにおいては、紫外線や青色光のカットに比べ、近赤外線のカットが議論されてこなかったが、次の理由から、近赤外線のカットを行った方が良いものである。即ち、眼の水晶体の約70%(パーセント)は水であるところ、水は近赤外線をよく吸収し(水の近赤外線吸収係数が高い)、温度上昇を始めとして眼に悪影響を少しずつ及ぼす可能性がある。例えば、眼疾患の一つである白内障は、近赤外線により高温となった水晶体を紫外線や青色光線が通過することで進行するものである可能性がある。近赤外線は、例えば800~2000nmの波長域の光であり、紫外線や可視光線と同様に太陽から放射され、地上に降り注いでいる。近赤外線は、紫外線や青色光線より波長が比較的に長く、その分地上への到達量が比較的に少なくなるが、それでも可視領域に近い近赤外線は、紫外線より僅かに減少した(同等量と言っても差し支えない程度の)量、地上に到達している。
眼鏡レンズに対して、近赤外線からの保護効果を付与すべく、特許文献1,2の多層膜をレンズ基体に施したとすると、コストが見合わず、耐久性に満足がいかず、可視領域の反射防止性が充分でなく視認性に満足できない可能性がある。
そこで、請求項1,4,5に記載の発明は、可視領域の反射防止性能がより高く、近赤外線光の透過率がより低く、コストがより低廉で、耐久性がより高い光学製品,眼鏡レンズ,眼鏡を提供することを目的とするものである。
請求項2に記載の発明は、上記発明にあって、前記光学多層膜は更に(6)波長800nm以上1500nm以下の波長域の光に係る片面に対する平均反射率が35%以上であり、(7)波長1000nmの光に係る片面に対する反射率が50%以上であることを特徴とするものである。
請求項3に記載の発明は、上記発明において、前記光学多層膜は更に(8)視感度反射率が2%以下であるという条件を満たすことを特徴とするものである。
請求項4に記載の発明は、眼鏡レンズにあって、上記発明の光学製品を用いたことを特徴とするものである。
請求項5に記載の発明は、眼鏡にあって、上記発明の眼鏡レンズを用いたことを特徴とするものである。
本発明において、基体はどのような材質であっても良く、好ましくは透光性を有する。基体の材料(基材)として、例えばポリウレタン樹脂、チオウレタン樹脂、エピスルフィド樹脂、ポリカーボネート樹脂、ポリエステル樹脂、アクリル樹脂、ポリエーテルサルホン樹脂、ポリ4-メチルペンテン-1樹脂、ジエチレングリコールビスアリルカーボネート樹脂を採用することができる。又、屈折率が高く(特に眼鏡レンズ用として)好適なものとして、エピスルフィド基とポリチオール及び/又は含硫黄ポリオールとを付加重合して得られるエピスルフィド樹脂を挙げることができる。
まず、光学多層膜は、低屈折率層と高屈折率層を交互に積層した7層構造である。最も基体側の層(基体に最も近い層)を1層目とすると、奇数層目が低屈折率層であり、偶数層目が高屈折率層である。
次に、低屈折率層は、シリカ(二酸化ケイ素,SiO2)を用いて形成され、高屈折率層は、波長500nmの光に対する屈折率が2.145以上である材料を用いて形成される。尚、高屈折率層の屈折率は、一般の薄膜において知られているように、材質の他、蒸着時の真空度や単位時間当たり酸素ガス供給量や各種アシストの有無や成膜速度等の成膜条件により変化させることができる。材質の相違による屈折率の相違に比べ、成膜条件による屈折率の相違は比較的に小さく、成膜条件による屈折率変化は比較的に微量に留まり、成膜条件によって高屈折率層の屈折率は微調整される。
更に、5層目(低屈折率層)の物理膜厚は、145nm以上165nm以下である。
加えて、4層目(高屈折率層),5層目(低屈折率層),及び6層目(高屈折率層)の光学膜厚(λ=500nm)の総和が1.3λ以上1.5λ以下である。
又、高屈折率層の材料の例として、二酸化チタン(チタニア,TiO2)、二酸化ジルコニウム(ジルコニア,ZrO2)、二酸化タンタル(TaO2)、二酸化ニオブ(NbO2)、二酸化ハフニウム(HfO2)、又はこれらの組合せが挙げられる。
光学多層膜と基体の間に付加する膜として、ハードコート膜を採用する場合、ハードコート膜は、好適には基体の表面にハードコート液を均一に施すことで形成される。
又、ハードコート膜として、好ましくは無機酸化物微粒子を含むオルガノシロキサン系樹脂を用いることができる。オルガノシロキサン系樹脂は、アルコキシシランを加水分解し縮合させることで得られるものが好ましい。又、オルガノシロキサン系樹脂の具体例として、γ-グリシドキシプロピルトリメトキシシラン、γ-グリシドキシプロピルトリエトキシシラン、メチルトリメトキシシラン、エチルシリケート、又はこれらの組合せが挙げられる。これらアルコキシシランの加水分解縮合物は、当該アルコキシシラン化合物あるいはそれらの組合せを、塩酸等の酸性水溶液で加水分解することにより製造される。
一方、無機酸化物微粒子の材質の具体例として、酸化亜鉛、二酸化ケイ素(シリカ微粒子)、酸化アルミニウム、酸化チタン(チタニア微粒子)、酸化ジルコニウム(ジルコニア微粒子)、酸化スズ、酸化ベリリウム、酸化アンチモン、酸化タングステン、酸化セリウムの各ゾルを単独であるいは何れか2種以上を混晶化したものが挙げられる。無機酸化物微粒子の直径は、ハードコート膜の透明性確保の観点から、1nm以上100nm以下であることが好ましく、1nm以上50nm以下であるとより好ましい。又、無機酸化物微粒子の配合量(濃度)は、ハードコート膜における硬度や強靱性の適切な度合での確保という観点から、ハードコート膜の全成分中の40重量%以上60重量%以下を占めることが好ましい。加えて、ハードコート液には、硬化触媒としてアセチルアセトン金属塩、及び/又はエチレンジアミン四酢酸金属塩等を付加することができ、更に基体に対する密着性確保や形成の容易化、所望の(半)透明色の付与等の必要に応じて界面活性剤、着色剤、溶媒等を添加することができる。
ハードコート膜の物理膜厚は、0.5μm(マイクロメートル)以上4.0μm以下とすると好ましい。この膜厚範囲の下限については、これより薄いと充分な硬度を得難いことから定まる。一方、上限については、これより厚くするとクラックや脆さの発生等、物性に関する問題の生ずる可能性が飛躍的に高まることから定まる。
更に、ハードコート膜と基体表面の間に、プライマー層を付加しても良い。プライマー層の材質として、例えばポリウレタン系樹脂、アクリル系樹脂、メタクリル樹脂、有機ケイ素系樹脂、又はこれらの組合せが挙げられる。
又、上記の光学製品は、可視領域(例えば400nm以上800nm以下、450nm以上800nm以下、又は450nm以上750nm以下等)において透過率が高く、反射防止性能を有する。例えば、波長450nm以上750nm以下の波長域の光に係る最大反射率が、4%以下となる。又、視感度反射率が2%以下となる。
しかも、上記の光学製品は、近赤外域の波長の光の透過率が低く、近赤外線を反射してカットする機能を有する。尚、本願において、光のカットは、光を完全に遮断する場合(透過率0%)のみを表すものではなく、所定の透過率(例えば90%又は80%)以下(換言すれば反射率10%以上又は20%以上)とする場合も含む。
上記の光学多層膜においては、波長800nm以上1500nm以下の波長域の光に係る基材片面における平均反射率が35%以上となり、且つ、波長1000nmの光の基材片面における反射率が50%以上となる。
又、上記の光学多層膜において、上記の条件を満足しつつ、可視領域において僅かに反射する(微量の)反射光の色につき、緑色を始めとする各種の色に調節することが可能である。
次いで、上記実施形態に係る本発明の実施例、及び本発明に属さない比較例を説明する。尚、本発明の実施形態は、以下の実施例に限定されない。
互いに同じ複数の眼鏡レンズ基体に対し、各眼鏡レンズ基体の両面においてそれぞれ異なる種類の中間膜や光学多層膜を形成して、眼鏡レンズに係る実施例1~12,比較例1~4を作製した。
ハードコート液は、次のように作製した。
まず、容器中にメタノール206g(グラム)、メタノール分散チタニア系ゾル(日揮触媒化成株式会社製,固形分30%)300g、γ-グリシドキシプロピルトリメトキシシラン60g、γ-グリシドキシプロピルメチルジエトキシシラン30g、テトラエトキシシラン60gを滴下し、その混合液中に0.01N(規定度)の塩酸水溶液を滴下、撹拌して加水分解を行った。
次いで、フロー調整剤0.5g及び触媒1.0gを加え、室温で3時間撹拌した。
ハードコート液は、眼鏡レンズ基材の各面に対し、次のように塗布した。
即ち、スピンコート法によりハードコート液を均一に行き渡らせ、120℃の環境に1.5時間置くことで、ハードコート液を加熱硬化させた。
このようにして形成されたハードコート膜は、何れも物理膜厚が2.5μmとなった。
実施例1~12,比較例1~4の光学多層膜は、何れも真空蒸着法により形成した。
奇数層目(1,3,5,7層目)は低屈折率層で、二酸化ケイ素により形成され、偶数層目(2,4,6層目)は高屈折率層で、二酸化ケイ素より屈折率の大きい高屈折材料で形成される。
実施例1~4,7~10では、高屈折率層の材料として二酸化チタンを選択し、成膜時圧力及びイオンアシスト条件を変えることで、互いに屈折率の異なったものとされている。成膜時圧力は、蒸着チャンバ内の真空度や、酸素ガス及び/又はアルゴンガスを僅かに導入した場合の単位時間当たりの導入量等により調節される。又、イオンアシスト条件は、酸素ガス及び/又はアルゴンガス中の酸素分子やアルゴン分子をイオン銃等により酸素イオンやアルゴンイオンとする場合の、イオン銃の作動パターン(オンオフの態様)や電圧、あるいは各種ガスの導入量により変更可能である。
実施例5,6,11,12や比較例1~4では、高屈折率層の材料として二酸化ジルコニウムを選択し、二酸化チタンの場合と同様に、成膜時圧力及びイオンアシスト条件を変えることで、互いに屈折率の異なったものとされている。
実施例1~12,比較例1~4では、可視領域において反射防止機能を有するが、それでも僅かに(最大3%以下程度の反射率で)反射光が存在する。実施例1~6や比較例1,2では、その反射光の色が緑色になるように設計されており、実施例7~12や比較例3,4では、その反射光の色が青色になるように設計されている。
次の[表1]~[表12]において実施例1~12に係る光学多層膜の各層の屈折率や膜厚等を示し、[表13]~[表16]において比較例1~4に係る光学多層膜の各層の屈折率や膜厚等を示す。
実施例1~12,比較例1~4における、可視領域ないし近赤外域に係る分光反射率分布を図1,3,5,7,9,11に示し、可視領域に係る分光反射率分布を図2,4,6,8,10,12に示す。
実施例1~3については図1,2に、実施例4~6については図3,4に、実施例7~9については図5,6に、実施例10~12については図7.8に、比較例1,2については図9,10に、比較例3,4については図11,12に示す。
これらの図で示された反射率分布においても、以下に説明する可視域での反射防止性能や近赤外域でのカット性能が分かる。
次の[表17]において、実施例1~6,比較例1~2の反射光における反射色、CIE表色系におけるx値とy値、及び視感度反射率を示し、[表18]において、実施例7~12,比較例3~4の反射光における反射色、CIE表色系におけるx値とy値、及び視感度反射率を示す。
同表の反射色やx値とy値によれば、実施例1~6や比較例1,2では反射色が緑色になり、実施例7~12や比較例3,4では反射色が青色になることが分かる。
又、同表の視感度反射率によれば、何れの例においても、視感度反射率が1.2%以下となっており、図1~12の反射率分布と適宜併せて見れば、可視領域において反射防止性を呈することが分かる。尚、視感度反射率は2%以下であれば、視認性を良好にするために充分な反射防止性を付与することができる。
次の[表19]において、実施例1~6,比較例1~2の近赤外域(波長800nm以上1500nm以下)における平均反射率、及び波長1000nmにおける反射率を示し、[表20]において、実施例7~12,比較例3~4の近赤外域(波長800nm以上1500nm以下)における平均反射率、及び波長1000nmにおける反射率を示す。
同表や図1~12によれば、比較例1~4では近赤外域の平均反射率が30%前後で最大でも31.92%(比較例3)であるのに対し、実施例1~12では、最低の反射率でも35.27%(実施例10)であって何れも35%以上となっており、実施例1~12において充分な近赤外線のカット性能を具備していることが分かる。
比較例2では、5層目の物理膜厚(155.40nm)が145nm以上165nm以下の範囲内となっているが、4~6層目の光学膜厚の総和(1.279λ)が1.3λ以上1.5λ以下の範囲外となっており、高屈折率層の屈折率(2.0577)が2.145未満であるため、波長800nm以上1500nm以下の波長域の光に係る平均反射率(29.12%)が35%未満となり、且つ、波長1000nmの光の反射率(44.31%)が50%未満となって、近赤外線のカット性能が比較的に劣る。
これに対し、実施例1~6では、何れも5層目の物理膜厚が145nm以上165nm以下の範囲内となっており、又4~6層目の光学膜厚の総和が1.3λ以上1.5λ以下の範囲内となっており、更に高屈折率層の屈折率が2.145以上となっているため、波長800nm以上1500nm以下の波長域の光に係る平均反射率が35%以上となり、且つ、波長1000nmの光の反射率が50%以上となって、近赤外線のカット性能が良好なものとなる。
比較例4では、5層目の物理膜厚(147.51nm)が145nm以上165nm以下の範囲内となっており、4~6層目の光学膜厚の総和(1.412λ)が1.3λ以上1.5λ以下の範囲外となっているが、高屈折率層の屈折率(2.0577)が2.145未満であるため、波長800nm以上1500nm以下の波長域の光に係る平均反射率(30.17%)が35%未満となり、且つ、波長1000nmの光の反射率(44.86%)が50%未満となって、近赤外線のカット性能が比較的に劣る。
これに対し、実施例7~12では、何れも5層目の物理膜厚が145nm以上165nm以下の範囲内となっており、又4~6層目の光学膜厚の総和が1.3λ以上1.5λ以下の範囲内となっており、更に高屈折率層の屈折率が2.145以上となっているため、波長800nm以上1500nm以下の波長域の光に係る片面に対する平均反射率が35%以上となり、且つ、波長1000nmの光の片面に対する反射率が50%以上となって、近赤外線のカット性能が良好なものとなる。
尚、5層目の物理膜厚が145nm未満であると近赤外線のカット率が比較的に不十分となり、165nmを超えると可視領域の反射防止性の付与を含めて設計が難しくなるし、材料や形成等のコストが嵩む。4~6層目の光学膜厚の総和の下限や上限についても、5層目の物理膜厚と同様である。
実施例1~12のように、低屈折率層と高屈折率層を交互に積層した7層構造の光学多層膜において、低屈折率層にシリカ(二酸化ケイ素,SiO2)を用い、高屈折率層に波長500nmの光に対する屈折率が2.145以上である材料を用い、5層目(低屈折率層)の物理膜厚を145nm以上165nm以下とし、4~6層目(高屈折率層)の光学膜厚(λ=500nm)の総和が1.3λ以上1.5λ以下とすると、形成が容易で、耐久性を向上することがで、コストを低廉化することができ、可視領域において充分な反射防止性能を有し、近赤外域において充分なカット性能を有する眼鏡レンズを提供することができる。
しかも、実施例1~6のように、反射色を(極薄い)緑色にしたり、実施例7~12のように、反射色を(極薄い)青色にしたりすることが可能である。上記の光学多層膜における層構造の条件を満たしながら、反射色を他の色にすることも可能である。
実施例1~12の眼鏡レンズを用いて、可視領域の反射防止性と近赤外線のカットを両立した眼鏡を作製することができる。又、実施例1~12と同様の特性を有する窓用フィルム(建物や車両等)やカメラレンズ用フィルタ等の光学製品を作製することができる。
Claims (5)
- 下記の各条件を全て満たす光学多層膜を基体の片面又は両面に対して形成したことを特徴とする光学製品。
(1)低屈折率層と高屈折率層を交互に積層した7層構造である。
(2)前記低屈折率層は、SiO2を用いて形成される。
(3)前記高屈折率層は、波長500nmの光に対する屈折率が2.145以上である材料を用いて形成される。
(4)前記基体に最も近い層を1層目として、前記低屈折率層である5層目の物理膜厚は、145nm以上165nm以下である。
(5)4層目ないし6層目の光学膜厚(λ=500nm)の総和が、1.3λ以上1.5λ以下である。 - 前記光学多層膜は更に下記の各条件を全て満たすことを特徴とする請求項1に記載の光学製品。
(6)波長800nm以上1500nm以下の波長域の光に係る片面に対する平均反射率が35%以上である。
(7)波長1000nmの光に係る片面に対する反射率が50%以上である。 - 前記光学多層膜は更に下記の条件を満たすことを特徴とする請求項1又は請求項2に記載の光学製品。
(8)視感度反射率が2%以下である。 - 請求項1ないしは請求項3の何れかに記載の光学製品を用いた
ことを特徴とする眼鏡レンズ。 - 請求項4に記載の眼鏡レンズを用いた
ことを特徴とする眼鏡。
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