WO2015116960A1 - Compositions for high speed printing of conductive materials for electronic circuitry type applications, and methods relating - Google Patents
Compositions for high speed printing of conductive materials for electronic circuitry type applications, and methods relating Download PDFInfo
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- the field of the invention relates generally to dispersions of conductive nanoparticles that can be destabilized with the application of relatively low amounts of heat energy or with relatively low amounts of electromagnetic (e.g., ultra violet or microwave) radiation to purposefully cause the nanoparticles to fall out of
- compositions of the present invention are useful for high speed printing of conductive material for electronic circuitry type applications or the like.
- High vacuum techniques are commonly used, such as, sputtering, chemical vapor deposition (CVD), and atomic layer deposition (ALD). Such techniques are generally able to achieve high-quality conductor deposition, but tend to suffer from low deposition speeds, high cost, limited scalability, and/or high processing temperatures.
- U.S. Patent Application Number 2009/0181 183A1 to Yuming Li, et ai. is directed to stabilized metal nanoparticles and methods for depositing conductive features by intentionally destabilizing the metal nanoparticie suspension.
- U.S. Patent Number 7,138,488 to McCormick, et a!. is directed to a method of generating thio-functionaiized transition metal nanoparticles and surfaces modified by (co)po!ymers synthesized by the RAFT (Reverse Additions-Fragmentation chain Transfer synthesis) methods.
- the methods of the McCormick patent include the steps of forming a (co)poiymer in aqueous solution using the RAFT methodology and forming a colloidal dispersion in a way that minimizes aggregation.
- compositions for high speed printing of conductive materials for electronic circuitry type applications are dispersions having a continuous phase and a discontinuous phase.
- the discontinuous phase comprises a plurality of nanoparticles stabilized with a c!eavab!e stabilizer.
- the nanoparticles comprise: i. at least 50 weight percent silver at the particle surface; ii. an aspect ratio of from 1 -3:1 ; and iii. a particle size of 1 to 100
- the thermally decomposable stabilizer is an ⁇ - ⁇ >- ⁇ - ⁇ block co-polymer or oligomer by Reversible Addition-Fragmentation chain Transfer (RAFT) synthesis.
- the block copolymer or oligomer is applied to the nanoparticles or a nanoparticie precursor in the presence of: i. a reducing agent sufficient to cause a reduction within Y; ii. an increase in pH sufficient to cause hydrolysis within Y; iii. a weak surfactant at the silver surface; or iv. a combination of two or more of L, ii. and iii.
- ⁇ is a polymeric block or series of polymeric blocks that swell and suspend in the continuous phase.
- the polymeric block or series of polymeric blocks may be partially soluble in the continuous phase.
- the polymeric block or series of polymeric blocks may be completely soluble in the continuous phase.
- ⁇ has a weight average molecular weight in a range from 1000 to 150,000.
- b indicates a covending bond between ⁇ and ⁇ .
- ⁇ comprises at least one acrylate, methacryiate or combinations thereof with pendant moieties from the group consisting of tertiary amines, and electron rich aromatics.
- Electron rich aromatics are aromatics with electron donating substituents that donate eiectron(s) to the ring, making the ring electron rich, e.g., aniline (amino benzene), furan, thiophene, pyrrole, oxazole, imidazole, haiogenated aromatics, and the like.
- Y is a dithioester, a xanthate, a dithiocarbamate, a trithiocarbonate or a combination thereof.
- sufficient bond cleavage occurs within Y or between Y and ⁇ to cause at least 50, 80, 70, 80, 90, 95, or 100 weight percent of the nanoparticles to fall out of suspension and agglomerate.
- the resulting agglomerate generally has a sufficiently low resistance to be a useful conductor in many conventional
- the agglomerated nanoparticles are generally sinterable at a temperature in a range between and optionally including any two of the following: 100, 1 10, 120,125, 130, 135, 140,150, 160,170, 180, 190, 200, 250 and 300°C to further reduce resistance.
- the continuous phase comprises a solvent selected from the group consisting of water, alcohols (including in particular: methanol, ethanol, propanoi, isopropanol, butanol, pentanol, hexanoi, heptanoi, octanoi, glycols, and the like), ethers (including in particular tetrahydrofuran), esters, substituted aiiphatics and aromatics amides (including in particular ⁇ , ⁇ -dimethylformamide (DMF)), and combinations thereof.
- alcohols including in particular: methanol, ethanol, propanoi, isopropanol, butanol, pentanol, hexanoi, heptanoi, octanoi, glycols, and the like
- ethers including in particular tetrahydrofuran
- esters substituted aiiphatics and aromatics amides (including in particular ⁇ , ⁇ -dimethylformamide (DMF)), and combinations thereof
- the thermally decomposable stabilizer is in a range between and optionally including any two of the following: 0.01 , 0.02, 0.05, 0.08, 1 , 2, 3, 4 ,5, 8, 7, 8, 9, 10, 1 1 , 12, 13, 14 and 15 weight percent of the total weight of the discontinuous phase.
- the continuous phase is less than 40, 45, 50, 55, 60, 85, or 70wt% of the total weight of the continuous phase and discontinuous phase.
- the dispersion also includes a surfactant to lower the interfacial tension between the continuous phase and discontinuous phase; depending upon the particular embodiment chosen, any one of a large number of surfactants are possible, including cationic, anionic, non-ionic or zwitterion surfactants such as, for example, xanthan gum or any natural gum or natural gum derivative surfactant.
- a surfactant to lower the interfacial tension between the continuous phase and discontinuous phase; depending upon the particular embodiment chosen, any one of a large number of surfactants are possible, including cationic, anionic, non-ionic or zwitterion surfactants such as, for example, xanthan gum or any natural gum or natural gum derivative surfactant.
- the present invention is also directed to a method of printing a conductive feature.
- dispersion as described above is deposited onto a substrate.
- the discontinuous phase is heated to a temperature in a range between and including any two of the following: 100, 1 10, 120, 125, 130, 135, 140, 145, 150 and 160°C for a period of time in a range between and optionally including any two of the following of 0.01 , 0.05, 0.1 , 0.5, 1 , 2, 3, 5, 7, 8, 9, or 10 minutes to cause at least 30, 40, 50, 60, 70, 80, 90, 95 or 100wt% of the nanoparticles to fall out of suspension to form a nanoparticle agglomerate.
- nanoparticle agglomerate can optionally be heated to a temperature above 100, 1 10 or 120°C to optionally further sinter the nanoparticle agglomerate, thereby lowering the resistivity of the nanoparticle agglomerate, in some instances, more than 5, 10, 15, 20, 25, 30, 40, of 50%.
- CTA Chain transfer agents
- Free-radical initiators as used herein refer to a species comprising any of the large number of organic compounds with a labile group which can be readily broken by heat or irradiation (UV, gamma, etc.) and have the ability to initiate free radical chain reactions.
- “Monomer” as used herein means a polymerizabie aliyiic, vinyiic, or acrylic compound which may be anionic, cationic, non-ionic, or zwitterionic.
- Adionic copolymers refer to those (co)poiymers which possess a net negative charge.
- anionic monomer refers to a monomer which possesses a net negative charge.
- anionic monomers include metal salts of acrylic acid, sulfopropyl acrylate, methacrylate, or other water-soluble forms of these or other polymerizabie carboxylic acids or suiphonic acids, and the like.
- Carbon (co)po!ymers refer to those (co)polymers which possess a net positive charge.
- “Cationic monomers”, as defined herein, refer to those monomers which possess a net positive charge.
- Representative cationic monomers include the quaternary salts of diaikylaminoalkyi acryiates and niethacrylates, ⁇ , ⁇ -diailydiaikyl ammonium halides (such as DADMAC), ⁇ , ⁇ -dimethylaminoethylacryiate methyl chloride quaternary salt, and the like.
- Nonionic monomers are defined herein to mean a monomer which is electrically neutral.
- Representative nonionic or neutral monomers are acryiamide, N-methylacryiamide, N,N-dimethyl(meth)acrylamide, N-methylolacrylaniide,
- hydrophilic monomers such as ethylene glycol methyacryiate, (meth)acry!ates with poiy(EO) or poly(PO) segments (where EO means ethylene oxide segments and PO means propylene oxide segments).
- Betaine refers to a general class of salt compounds, especially zwitterionic compounds, and include polybetaines.
- betaines which can be used with the present invention include: N,N- dimethyi-N-acryloyloxyethyl ⁇ N-(3-sulfopropyi)-ammonium betaine, N,N ⁇ dimethyl-N ⁇ acrylamidopropyl-N- ⁇ 2-carboxymethyi)-ammonium betaine, N,N-dimethy!-N- acryiamidopropyi-N-(3-sulfopropyi)-ammonium betaine, ⁇ , ⁇ -dimethyl-N- acryiamidopropyi-N-(2-carboxymethyl)-ammonium betaine, 2- ⁇ methylthio)ethyl methacry!oy!-S-(suifopropyi)-sulfonium betaine, 2-
- Zwitterionic refers to a molecule containing both cationic and anionic substituents or electronic charges. Such molecules can have a net neutral overall charge, or can have a net positive or net negative overall electronic charge.
- Zwitterionic (copolymers) refer to (co)poiymers derived from a zwitterionic monomer, a combination of anionic and cationic charged monomers or those derived from a zwitterionic monomer, including betaines, together with a component or components derived from other betaine monomers, ionic monomers, and non-ionic monomer(s), such as a hydrophobic and/or hydrophi!ic monomer. Suitable hydrophobic, hydrophilic, and betaine monomers are any of those known in the art.
- Representative zwitterionic co(poiymers) include homopolymers, terpolymers, and (co)poiymers.
- polybetaines all the polymer chains and segments within those chains are necessarily electrically neutral.
- polybetaines represent a subset of poiyzwitterions, necessarily maintaining charge neutrality across all polymer chains and segments due to both anionic charge and cationic charge being introduced within the same monomer (see, for example, Lowe A. B., et aL, Chemical Reviews 2002, Vol. 102, pp. 4177 4189, which is incorporated herein by reference).
- Zwitterionic monomer means a poiymerizab!e molecule containing cationic and anionic (thus, charged) functionalities in equal proportions, such that the molecule is typically, but not always, electronically neutral overall. Those monomers containing charges on the same monomer are termed "poiybetaines.”
- Transition metal complex or “transition metal sol”, as defined herein, refers to a metal colloid solution/complex, wherein the metal is any of the metals
- “Living polymerization”, as used herein, refers to a process which proceeds by a mechanism whereby most chains continue to grow throughout the polymerization process, and where further addition of monomer results in continued polymerization. The molecular weight is controlled by the stoichiometry of the reaction.
- Radar leaving group refers to a group attached by a bond that is capable of undergoing homo!ytic scission during a reaction, thereby forming a radical.
- “Stabilized” refers to the transition-metai-stabilized nanoparticies of the present invention, and refers to the ability of the colloids to resist aggregation for several weeks after preparation under an air atmosphere.
- “Surface”, as used herein, refers to the exterior, external, upper, or outer boundary of an object or body, and is meant to include a plane or curved two- dimensional locus of points as the boundary of a three-dimensional region, e.g. a plane.
- GPC number average molecular weight (Mn) means a number average molecular weight, determined by Size Exclusion Chromatography (SEC).
- GPC weight average molecular weight means a weight average molecular weight measured by utilizing gel permeation chromatography.
- Polydispersity (Mw/Mn) means the value of the GPC weight average molecular weight divided by the GPC number average molecular weight.
- alkyl groups referred to in this specification can be branched or unbranched and contain from 1 to 20 carbon atoms.
- Aikenyi groups can similarly be branched or unbranched, and contain from 2 to 20 carbon atoms.
- Saturated or unsaturated carbocyclic or heterocyclic rings can contain from 3 to 20 carbon atoms.
- Aromatic carbocyclic or heterocyclic rings can contain from 5 to 20 carbon atoms.
- Substituted means that a group can be substituted with one or more groups that are independently selected from the group consisting of aikyi, aryl, epoxy, hydroxy, aikoxy, oxo, acyi, acyloxy, carboxy, carboxyiate, sulfonic acid, sulfonate, aikoxy- or aryioxy-carbonyl, isocyanafo, cyano, sily!, halo, dia!kylamino, and amido. All substifuents are chosen such that there is no substantial adverse interaction under the conditions of the experiments.
- the terms “comprises,” “comprising,” “includes,” “including,” “has,” “having” or any other variation thereof, are intended to cover a non-exclusive inclusion.
- a method, process, article, or apparatus that comprises a list of elements is not necessarily limited to only those elements but may include other elements not expressly listed or inherent to such method, process, article, or apparatus.
- “or” refers to an inclusive or and not to an exclusive or. For Example, a condition A or B is satisfied by any one of the following: A is true (or present) and B is false (or not present), A is false (or not present) and B is true (or present), and both A and B are true (or present).
- compositions of the present disclosure comprise suspended metal nanoparticle compositions, and methods of making the same, that are stabilized with decomposable stabilizers.
- the decomposable stabilizer can be decomposed thermally and/or with radiation, thereby enabling the composition to quickly precipitate conductive nanoparticles into a desired agglomerated shape; optionally thereafter, the agglomerate can be thermally annealed, preferably at a low temperature, for example, below about 1 10, 120, 130, 140, 150, 160, 170 or 180°C, and thus the compositions of the present disclosure can be used to form conductive features on high speed processes, such as, reel to reel embedding processes, Ink jet printing, screen printing or the like.
- the optional low temperature thermal annealing is generally possible in accordance with the present invention, due to the efficient destabilization of the conductive nanoparticle, allowing metal surface to metal surface contact to form agglomerates which are easily sintered or annealed, generally at lower temperatures than might otherwise be expected.
- the conductive nanoparticle compositions of the present disclosure comprise metal nanoparticles stabilized with a thermally decomposable stabilizer which has been found in some embodiments to also decompose, at least in part, using electromagnetic radiation, such as, ultraviolet or microwave radiation.
- conductive features are provided on a substrate by: providing a solution containing conductive nanoparticles with a stabilizer in
- liquid depositing the solution onto the substrate wherein during the deposition or following the deposition of the solution onto the substrate, removing the stabilizer, by thermal treatment and/or by UV or microwave treatment, at a temperature below about 180, 170, 160, 150, 140 130, or 120°C to form conductive features on the substrate.
- the present disclosure describes an inexpensive and efficient process for preparing suspended nanoparticles having a substantially silver surface which can be taken out of suspension, quickly, accurately and efficiently, when desired, by the application of heat or electromagnetic radiation energy.
- the decomposable stabilizers of the present disclosure are (co)poiymers prepared using the Reversible Addition-Fragmentation chain Transfer (“RAFT”) process.
- the nanoparticles of this disclosure can be synthesized by the reaction of a silver complex such as a silver salt, colloid, or sol (e.g., silver nitrate), with thiocarbonylthio compounds in aqueous solution, either in the presence of a reducing agent or in the presence of high pH to drive a hydrolysis reaction .
- the thiocarbonylthio group does not need a reducing agent or require a hydrolysis reaction through the increase in pH, but rather, is able to displace the dispersing agent on the silver surface, where the dispersing agent is a weakly bonded surfactant (such as, citrate or other similar type weak acid salt) as wholly or partially dispersing the nanoparticle or nanoparticle precursor.
- the dispersing agent is a weakly bonded surfactant (such as, citrate or other similar type weak acid salt) as wholly or partially dispersing the nanoparticle or nanoparticle precursor.
- a weakly bonded surfactant which originally provides at least some dispersion capability on the conductive nanoparticle is intended to mean a surfactant that is only weakly bonded to the silver surface, such as, by little, if any covalent bonding, and in addition having one or more of the following bonding mechanisms dipole-dipole interaction, hydrogen bonding, ion-dipole bonding, cation-pi bonding, pi stacking and London forces.
- the thiocarbonylthio group is a trithiocarbonyi moiety that displaces a weak surfactant at the silver surface, without the need for increased pH (to cause hydrolysis) or without the need of a reducing agent.
- Suitable polymerization monomers and comonomers of the present invention for creating the ⁇ portion of the decomposable stabilizer of the present disclosure by RAFT synthesis include, but are not limited to, methyl methacryiate, ethyl acryiate, propyl methacryiate (ail isomers), butyl methacryiate (ail isomers), 2-ethylhexyl methacryiate, isobornyi methacryiate, methacryiic acid, benzyl methacryiate, phenyl methacryiate, methacrylonitrile, alpha-methylstyrene, methyl acryiate, ethyl acryiate, propyl acryiate (ail isomers), butyl acryiate (ail isomers), 2-ethylhexyi acryiate,
- Additional suitable polymerizabie monomers and comonomers for the ⁇ portion of the decomposable stabilizer of the present disclosure by RAFT synthesis include, but are not limited to, acrylic acids, alkyiacrylates, acrylamides, methacrylic acids, maieic anhydride, alkyimethacryiates, methacrylamides, N-aikyiacrylamides, N-aikylmethacrylamides, aminostyrene, dimethy!aminomethystyrene,
- trimethylammonium ethyl methacrylate trimethylammonium propyl acrylamide, dodecyl acrylate, octadecyl acrylate, and ocfadecyl methacrylate.
- the free-radical polymerization initiators, or free radical source, of the present invention are chosen from the initiators conventionally used in radical polymerization, such as azo-compounds, hydrogen peroxides, redox systems, and reducing sugars. More specifically, the source of free radicals suitable for use with the present invention can also be any suitable method of generating free radicals, including but not limited to thermally induced homoytic scission of a suitable compound or compounds (s) [thermal initiators include peroxides, peroxyesters, and azo- compounds], redox initiating systems, photochemical initiating systems, or high energy radiation such as electron beam, X-ray, microwave, or gamma-ray radiation UV.
- the initiating system is chosen such that under the reaction conditions, there is no substantial adverse interaction of the initiator, the initiator conditions, or the initiating radicals with the transfer agent under the conditions of the procedure.
- the initiator should also have the requisite solubility in the reaction medium or monomer mixture.
- Thermal initiators are chosen to have an appropriate half-life at the
- These initiators can include, but are not limited to, one or more of 2,2'-azobis(isobutyronitrile), 2,2'-azobis(2-cyano-2-butane), dimethyl 2,2'-azobisdimethylisobutyrate, 4 J 4'-azobis(4-cyanopentanoic acid), 1 ,1 * - azobis(cyclohexanecarbonitri!e), 2-(t-butylazo)-2-cyanopropane, 2,2'-azobis[2- methyI-N-(1 ,1 )-bis(hydroxyethyi)]-propionamide, 2,2'-azobis(N,N'- dimethyieneisobutylamine), 2,2'-azobis[2-methyi-N-(2-hydroxyethyl)propionamide] J 2,2 , -azobis(isobutyramide) dihydrate, 2 !
- peroxydicarbonate dicumyl peroxide, dibenzoyi peroxide, diiauroyi peroxide, potassium peroxydisulfate, ammonium peroxydisulfate, di-t-buty! hyponitrite, and dicumyl hyponitrite.
- hydrogen peroxides which may act as free-radical initiators according to the present disclosure include, but are not limited to, tert-butyl hydroperoxide, cumene hydroperoxide, tert-butyl peroxyacetate, iauroyi peroxide, tert-amyi peroxypivalate, tert-butyl peroxypivalate, dicumyl peroxide, hydrogen peroxide, Bz 2 0 2 (dibenzoyi peroxide), potassium persulphate, and ammonium persulphate.
- Redox initiator systems in accordance with the present disclosure are chosen to have the requisite solubility in the reaction medium, monomer mixture, or both, and have an appropriate rate of radical production under the conditions of the specific polymerization.
- Such initiating systems suitable for use with the present disclosure can include combinations of oxidants such as potassium peroxydisulfate, hydrogen peroxide, t-butyl hydroperoxide, and reductants such as iron (II), titanium (III), potassium thiosuifite, and potassium bisulfite.
- oxidants such as potassium peroxydisulfate, hydrogen peroxide, t-butyl hydroperoxide, and reductants such as iron (II), titanium (III), potassium thiosuifite, and potassium bisulfite.
- reductants such as iron (II), titanium (III), potassium thiosuifite, and potassium bisulfite.
- Other suitable initiating systems are described in Moad and Solomon, "The Chemistry of Free Radical
- redox systems suitable for use with the present disclosure include, but are not limited to, mixtures of hydrogen peroxide or alkyl peroxide, peresters, percarbonates, and the like in combination with any one of the salts of iron, titaneous salts, zinc salts, zinc formaldehyde sulphoxyiate, sodium salts, or sodium formaldehyde sulphoxyiate.
- the reactions of the present disclosure can be carried out in any suitable solvent or mixture thereof.
- suitable solvents include, but are not limited to, water, alcohol (e.g.
- the solvents include water, mixtures of water, or mixtures of water and water-miscible organic solvents, such as DMF. In one embodiment, water is the solvent.
- a CTA which has appropriate solubility characteristics.
- aqueous emulsion for aqueous emulsion
- the CTA should preferably partition in favor of the organic (monomer) phase and yet have sufficient aqueous solubility that it is able to distribute between the monomer droplet phase and the polymerization locus.
- the chain transfer reagents (CTAs) of the present disclosure are compounds, such as dithioester compounds, water-soluble dithioester compounds, disuiphides, xanthate disuiphides, thiocarbonylthio compounds, and dithiocarbamates which react with either the primary radical or a propagating polymer chain, thereby forming a new CTA and eliminating the R radical, thereby reinitiating polymerization.
- the CTAs of the present invention are either commercially available, such as carboxymethyl dithiobenzoate, or readily synthesized using known procedures.
- CTAs suitable for use in the present invention are cumyi dithiobenzoate, DTBA (4- cyanopentanoic acid dithiobenzoate), BDB (benzyl dithiobenzoate), CDB (isopropyl cumyl dithiobenzoate), TBP (N,N-dimethy!-s-thiobenzoylthiopropionamide), TBA ( ⁇ , ⁇ -dimethyi-s-thiobenzoy!thioacetamide, trithiocarbonates, dithiocarbamates, (phosphoryl)dithioformates and (thiophosphoryi)dithioformates, bis(thioacyi)disuifides, xanihaies, dithiocarbonate groups used in MADiX (Macromolecuiar Design via Interchange of Xanthate) which are either commercially available, synthesized according to well-established organic synthesis routes, or synthesized as previously described in U.S. Pat, No. 8,
- the choice of polymerization conditions is also important.
- the reaction temperature should generally be chosen such that it will influence rate in the desired manner. For example, higher temperatures will typically increase the rate of fragmentation. Conditions should be chosen such that the number of chains formed from initiator-derived radicals is minimized to an extent consistent with obtaining an acceptable rate of polymerization.
- the polymerization process of the present invention is performed under conditions typical of conventional free-radical polymerization. Polymerization employing the CTAs described above are suitably carried out with temperatures in the range of -20°C to 180°C, preferably in the range of 10°C to 150 C C, and most preferably at temperatures in the range of 10°C to 80°C.
- the pH of a polymerization conducted in an aqueous or semi-aqueous solution can be varied depending upon the conditions and the reactants. Generally, however, the pH is selected so that the selected dithioester is stable and grafting of the polymer can occur. Typically, the pH is from about 0 to about 9, preferably from about 1 to about 7, and more preferably from about 2 to about 7. The pH can be adjusted using any of the means known in the art.
- transition metal sols preferred for use in this invention include, but are not limited to, complexes formed from silver (Ag) and associated salts (e.g., AgN0 3 ).
- anionic (co)polymers include PAMPS (po!y(sodium 2-acrylamido-2- methylpropanesulfonate), PAMBA, and other suitable anionic (co)poiymers known in the art. Preparation of such anionic (co)poiymers is known in the art, and is herein incorporated by reference (Sumer!in, B., et ai. Macromoiecules 2001 , 34, 6561 ).
- Suitable cationic (co)polymers include PVBTAC (poly(4- vinyibenzyi)trimethyiammonium chloride), and other related cationic (co)poiymers which are commercially available or available through known synthetic routes.
- Suitable nonionic, or neutral (co)polymers include representative (co)polymers including, but not limited to, PDMA (poiy(N,N-dimethy!acry!amide), and other related neutral (co)po!ymers which are commercially available or available through known synthetic procedures.
- Suitable zwitterionic (co)polymers include PMAEDAPS-b-PDMA (poiy(3-[2-N- methylacrylamido)-ethyi dimethyl ammonio propanesulfonate-b!ock- ⁇ , ⁇ - dimethyiacrylamide), and other zwitterionic (co)poiymers commercially available or available through known synthetic procedures.
- the zwitterionic co-polymers
- (co)polymer useful in the present invention comprises a component derived from a zwitterionic monomer (betaine) together with a component or components derived from a hydrophobic or hydrophilic monomer or a mixture of components derived from hydrophobic and hydrophilic monomers.
- Suitable betaines include, but are not limited to, ammonium carboxylates, ammonium phosphates, and ammonium suiphonates.
- Particular zwitterionic monomers which can be utilized are N-(3-suiphopropyl)-N-methyiacry!oxyethyl-N,N- dimethy! ammonium betaine, and N-(3-sulphopropyl)-N-ally!-N,N-dimethyl ammonium betaine.
- the dithioester-end capped (co)poiymers used in the present disclosure can be synthesized using a controlled synthesis in aqueous media, employing any number of chain-transfer agents, most preferably a dithiobenzoate or related compound as described above, and a free radical initiator.
- the RAFT processes of the present invention can be carried out in aqueous media, in bulk, solution, emulsion, microemuision, mini-emulsion, inverse emulsion, inverse microemuision, or suspension, in either a batch, semi-batch, continuous, or feed mode.
- the initiators are the free-radical initiators described above, with the azo- initiators being preferred.
- (Co)polymer molecular masses were controlled by varying the monomer- to-CTA molar ratio.
- the CTA-to-initiator molar ratio is at least one thousand-to-one (1000:1 ) to one to one 1 :1 .
- Solution pH can be adjusted as necessary to ensure complete ionization of the monomers, depending on the charge.
- the synthesis begins with the preparation of an aqueous solution of metal salt or sol, for example in one embodiment, the amount of metal salt or sol can be about 0.01 wt %.
- a metal colloidal solution can then be preferentially added to a container which has been charged with a dithioester end-capped (co)poiymer, as described above.
- the mixture can then be mixed, in order to ensure homogeneity, and an aqueous solution of reducing agent (1 .0 M) can then be added slowly.
- the mixture can then be stirred, under ambient (about 1 atmosphere) pressure, at room temperature for a time up to about 48 hours.
- the resultant product can be recovered by centrifugation, or any other suitable means of removing the reaction solution from the product of the invention.
- the reducing agent can be a boron hydride compound and/or aluminum hydride compound, or a hydrazine compound. More specifically, the reducing agent can include, but is not limited to, alkali metal borohydrides, alkali earth metal borohydrides, alkali metal aluminum hydrides, dialkyiaiuminum hydrides and diborane, among others. These may be used singly or two or more of them may be used in a suitable combination.
- the salt-forming alkali metal in the reducing agent is, for example, sodium, potassium, or lithium and the alkaline earth metal is calcium or magnesium. In consideration of the case of ease of handling and from other viewpoints, alkali metal borohydrides are preferred, and sodium borohydride can be particularly preferred.
- borohydrides such as lithium borohydride, potassium borohydride, calcium borohydride, magnesium borohydride, zinc borohydride, aluminum borohydride, lithium triethylborohydride [Super Hydride], lithium dimesitylborohydride, lithium trisiamyiborohydride, and sodium
- cyanoborohydride lithium aluminum hydride, alane (AIH.sub.3), aiane-N,N- dimethyiethyiamine complex, L-Selectride i!yi . (lithium tri-sec-butylborohydride), LS- SelectrideTM (lithium trisiamyiborohydride), Red-AI® or Vitride® (sodium bis(2- methoxyethoxy)a!uminum hydride; alkoxyaluminum hydrides such as lithium diethoxyaluminum hydride, lithium trimethoxyaluminum hydride, lithium
- triethoxyaluminum hydride lithium tri-t-butyoxyaiuminum hydride, and lithium ethoxyaiuminum hydride
- alkoxy- and aikylborohydrides such as sodium trimethoxyborohydride and sodium triisopropoxyborohydride
- boranes such as diborane, 9-BBN, and Alpine Borane®
- aluminum hydride and diisobuiyialuminum hydride (Dibal); hydrazine, and the like.
- a suitable activator known in the art may be combined and used for improving the reducing power of the reducing agent.
- the reducing agent can be used in solid form, in solution with a suitable solvent, or can be attached to an inert support, such as polystyrene, alumina, and the like.
- the reducing agent to be used should be mostly soluble in a solvent, particularly in wafer (e.g., NaBH 4 , LiBH 4 , or hydrazine), or alternatively in an organic solvent which is miscible with water.
- a solvent particularly in wafer (e.g., NaBH 4 , LiBH 4 , or hydrazine)
- organic solvent which is miscible with water.
- the process of the present disclosure can be done using an organic solvent such as tetrahydrofuran (THF) or a THF-water mixture with LiBHEt 3 (Super Hydride® as the reducing agent.
- THF tetrahydrofuran
- Super Hydride® Super Hydride®
- the amount of the reducing agent is not particularly restricted, but it is preferred to be in an amount such that reducing agent is provided in an amount not less than the stoichiometric amount relative to the amount of the thiocarbonythio compound.
- the reduction can be effected using sodium borohydride in an amount of not less than 0.5 mole, preferably not less than 1 .0 mole, per mole of the thiocarbonylthio compound.
- the amount of reducing agent is not more than 10.0 moles, and preferably not more than 2.0 moles per mole of the thiocarbonylthio compound.
- the addition of the reducing agent results in the reduction of the dithioester end group of the polymer, resulting in the corresponding thiol functionality on the (co)polymer with the simultaneous reduction of the silver ion to the elemental state.
- the silver nanoparticies or surfaces stabilized or modified by (co)poiymers synthesized using RAFT can be further modified at their terminal functional end group using a variety of reaction conditions, such as reagents, time, and temperature.
- RAFT polymerizations of polymers from a surface such as from a nanoparticies, film, or wafer.
- a surface such as from a nanoparticies, film, or wafer.
- either the free radical initiator or the CTA can be attached to the
- the RAFT polymerizations can be carried out in a variety of solvents, preferably water or water-solvent emulsion,
- the present disclosure relates also to production processes and to substrates provided with conductive metallizations made by said production process.
- Said production process includes the steps:
- step (3) subjecting the conductive composition applied in step (2) to
- the photonic sintering can be done with the aid of a photo acid generator as illustrated in Table 1 below:
- the "surfactant” indicated in Table 1 is intended to mean the thermally decomposable stabilizer of the present disclosure or alternatively, can mean a secondary surfactant in addition to the thermally decomposable stabilizer, wherein the heat or ultra-violet radiation of the photonic curing step will also destabilize the thermally decomposable stabilizer in addition to or separate from the presence of the photo acid.
- the "fine metal particles” indicated in Table 1 is intended to mean nanoparticles comprising silver, at least at the nanoparticie surface.
- photo curing can directly degrade the surfactant
- the surfactant can be a secondary surfactant and/or the thermally decomposable stabilizer of the present disclosure. This embodiment is illustrated in Table 2.
- a substrate is provided.
- the substrate may be comprised of one or more than one material.
- the term "material” used herein in this context refers primarily to the bulk material or the bulk materials the substrate is comprised of. However, if the substrate is comprised of more than one material, the term “material” shall not be misunderstood to exclude materials present as a layer. Rather, substrates comprised of more than one material include substrates comprised of more than one bulk material without any thin layers as well as substrates comprised of one or more than one bulk material and provided with one or more than one thin layer. Examples of said layers include dielectric
- dielectric layers include layers of inorganic dielectric materials like silicon dioxide, zirconia-based materials, alumina, silicon nitride, aluminum nitride and hafnium oxide; and organic dielectric materials, e.g. fiuorinated polymers like PTFE, polyesters and polyimides.
- the dielectric layer can be solid or porous.
- active layer is used in the description and the claims. It shall mean a layer selected from the group including photoactive layers, light-emissive layers, semicoriductive layers and non-metallic conductive layers. In an embodiment, it shall mean layers selected from the group consisting of photoactive layers, light- emissive layers, semiconductive layers and non-metallic conductive layers.
- photoactive used herein shall refer to the property of converting radiant energy (e.g., light) into electric energy.
- photoactive layers include layers based on or including materials like copper indium gallium diselenide, cadmium teiluride, cadmium sulphide, copper zinc tin sulphide, amorphous silicon, organic photoactive compounds or dye- sensitized photoactive compositions.
- light-emissive layers include layers based on or including materials like poly(p-phenylene vinyiene), tris(8-hydroxyquinolinato)aluminum or polyfluorene (derivatives).
- semiconductive layers include layers based on or including materials like copper indium gallium diselenide, cadmium teiluride, cadmium sulphide, copper zinc tin sulphide, amorphous silicon or organic semiconductive compounds.
- non-metallic conductive layers include layers based on or including organic conductive materials like poiyaniline, PEDOTPSS (poly-3,4- ethyienedioxythiophene poiystyrenesuifonate), poiythiophene or polydiacetyiene; or based on or including transparent conductive materials like indium tin oxide (ITO), aluminum-doped zinc oxide, fluorine-doped tin oxide, graphene or carbon
- organic conductive materials like poiyaniline, PEDOTPSS (poly-3,4- ethyienedioxythiophene poiystyrenesuifonate), poiythiophene or polydiacetyiene
- transparent conductive materials like indium tin oxide (ITO), aluminum-doped zinc oxide, fluorine-doped tin oxide, graphene or carbon
- the substrate is a temperature-sensitive substrate.
- the material or one or more of the materials the substrate is comprised of are temperature-sensitive.
- the substrate includes at least one of the aforementioned layers wherein the layer or one, more or all layers are temperature-sensitive.
- temperature-sensitive is used with reference to a substrate, a substrate material or a layer of a substrate which does not withstand a high object peak temperature of > 130°C or, in other words, which undergoes an unwanted chemical and/or physical alteration at a high object peak temperature of >130°C. Examples of such unwanted alteration phenomena include degradation, decomposition, chemical conversion, oxidation, phase transition, melting, change of structure, deformation and combinations thereof.
- Object peak temperatures of > 130°C occur for example during a conventional drying or firing process as is typically used in the manufacture of metallizations applied from metal pastes containing conventional polymeric resin binders or glass binders.
- temperature-resistant is used herein with reference to a substrate, a substrate material or a layer of a substrate which withstands an object peak temperature of > 130°G.
- a first group of examples of substrate materials includes organic polymers.
- Organic polymers may be temperature-sensitive.
- suitable organic polymer materials include PET (polyethylene terephthaiate), PEN (polyethylene napthalate), PP (polypropylene), PC (polycarbonate) and polyimide.
- a second group of examples of substrate materials includes materials other than an organic polymer, in particular, inorganic non-metallic materials and metals.
- Inorganic non-metallic materials and metals are typically temperature-resistant.
- inorganic non-metallic materials include inorganic semiconductor materials like monocrysfalline silicon, polycrysta!line silicon, silicon carbide; and inorganic dielectric materials like glass, quartz, zirconia-based materials, alumina, silicon nitride and aluminum nitride.
- inorganic non-metallic materials include inorganic semiconductor materials like monocrysfalline silicon, polycrysta!line silicon, silicon carbide; and inorganic dielectric materials like glass, quartz, zirconia-based materials, alumina, silicon nitride and aluminum nitride.
- metals include aluminum, copper and steel.
- the substrates may take various forms, examples of which include the form of a film, the form of a foil, the form of a sheet, the form of a panel and the form of a wafer.
- step (2) of the process of the invention the conductive composition is applied on the substrate.
- the conductive composition may be applied on such layer.
- the conductive composition may be applied to a dry film thickness of, for example, 0.1 to 100 pm.
- the method of conductive composition application may be printing, for example, fiexographic printing, gravure printing, ink-jet printing, offset printing, screen printing, nozzle/extrusion printing, aerosol jet printing, or it may be pen- writing.
- the variety of application methods enables the conductive composition to be applied to cover the entire surface or only one or more portions of the substrate.
- the conductive composition may be applied in a pattern, wherein the pattern may include fine structures like dots or thin lines with a dry line width as low as, for example 50 or 100 nanometers.
- the conductive composition may be dried in an extra process step prior to performing step (3) or it may directly (i.e. without deliberate delay and without undergoing an especially designed drying step) be subject to the photonic sintering step (3).
- Such extra drying step will typically mean mild drying conditions at a low object peak temperature in the range of 50 to ⁇ 130°C.
- object peak temperature used herein in the context of said optional drying means the substrate peak temperature reached during drying of a conductive metallization applied from the conductive composition of the invention onto the substrate.
- the primary target of said optional drying is the removal of solvent; however, it may also support the densification of the metallization matrix.
- the optional drying may be performed, for example, for a period of 1 to 60 minutes at an object peak temperature in the range of 50 to ⁇ 130°C, or, in an embodiment, 80 to ⁇ 130°C.
- the skilled person will select the object peak temperature considering the thermal stability of the ethyl cellulose resin and of the substrate provided in step (1 ) and the type of diluent included in the conductive composition of the invention.
- the optional drying can be carried out making use of, for example, a belt, rotary or stationary dryer, or a box oven.
- the heat may be applied by convection and/or making use of IR (infrared) radiation.
- the drying may be supported by air blowing.
- the optional drying may be performed using a method which induces a higher local temperature in the metallization than in the substrate as a whole, i.e. in such case the object peak temperature of the substrate may be as low as room temperature during drying.
- drying methods include photonic heating (heating via absorption of high-intensity light), microwave heating and inductive heating.
- step (3) of the process of the invention the conductive metal composition applied in step (2) and optionally dried in the aforementioned extra drying step is subjected to photonic sintering to form the conductive metallization.
- Photonic sintering which may also be referred to as photonic curing uses light, or, to be more precise, high-intensity light to provide high-temperature sintering.
- the light has a wavelength in the range of, for example, 240 to 1000 nm.
- flash lamps are used to provide the source of light and are operated with a short on time of high power and a duty cycle ranging from a few hertz to tens of hertz.
- Each individual flashlight pulse may have a duration in the range of, for example, 100 to 2000 microseconds and an intensity in the range of, for example, 30 to 2000 Joules.
- the flashlight pulse duration may be adjustable in increments of, for example, 5 microseconds.
- the dose of each individual flashlight pulse may be in the range of, for example, 4 to 15 Joule/cm 2 ,
- the entire photonic sintering step (3) is brief and it includes only a small number of flashlight pulses, for example, up to 5 flashlight pulses, or, in an embodiment, 1 or 2 flashlight pulses.
- the conductive composition of the invention unlike known prior art conductive compositions, enables the photonic sintering step (3) to be performed in an unusually short period of time of, for example, ⁇ 1 second, e.g. 0.1 to 1 seconds, or, in an embodiment, ⁇ 0.15 seconds, e.g. 0.1 to 0.15 seconds; i.e. the entire photonic sintering step (3) commencing with the first flashlight pulse and ending with the last flashlight pulse can be as short as, for example, ⁇ 1 second, e.g. 0.1 to 1 seconds, or, in an embodiment, ⁇ 0.15 seconds, e.g. 0.1 to 0.15 seconds.
- the conductive films created in accordance with the present disclosure can be used as donor substrates for photovoltaic applications, and as such, can be used in association with acceptor substrates.
- the metallized substrate obtained after conclusion of step (3) of the process of the invention may represent an electronic device, for example, a printed electronic device. However, it is also possible that it forms only a part of or an intermediate in the production of an electronic device. Examples of said electronic devices include RFID (radio frequency identification) devices; PV (photovoltaic) or OPV (organic photovoltaic) devices, in particular solar cells; light-emissive devices, for example, displays, LEDs (light emitting diodes), OLEDs (organic light emitting diodes); smart packaging devices; and touchscreen devices.
- RFID radio frequency identification
- PV photovoltaic
- OPV organic photovoltaic
- light-emissive devices for example, displays, LEDs (light emitting diodes), OLEDs (organic light emitting diodes); smart packaging devices; and touchscreen devices.
- the metallized substrate forms only said part or intermediate it is further processed.
- One example of said further processing may be encapsulation of the metallized substrate to protect it from environmental impact.
- Another example of said further processing may be providing the metallization with one or more of the aforementioned dielectric or active layers, wherein in case of an active layer direct or indirect electrical contact is made between metallization and active layer.
- a still further example of said further processing is electroplating or light-induced electroplating of the metallization which then serves as a seed metallization.
- Reaction mixture was diluted with MEK (70 mL), and cooled to room temperature.
- the polymer solution was added slowly to methanol (1 .5L) at 5°C, and stirred for ca. 45 min after addition was complete. The liquid phase was removed. Methanol (1 .5 L) was added and the mixture was stirred for 1 hr. Filtration and drying gave 196.8g of solid.
- a 4-neck flask fitted with addition funnel, condenser, and nitrogen gas inlet, thermocouple + initiator feed line, and an overhead stirrer assembly was charged with stea ryi M A/M MA-ttc (93.5g) and MEK (150 mL).
- V-601 solution was prepared for syringe pump feeding using 475 mg/ 0.00 mL, 0.207mmol/mL, using MEK as solvent.
- the reactor was purged with nitrogen for 20 min.
- DEAEMA monomer 48.8g, 0.253 mol
- 5.0 mL of DEAEMA was added to the vessel, and the temperature was increased to 73°C.
- V-601 initiator 289mg, 1 .26 mmoi) was stage-fed over 16 hr. Remaining DEAEMA monomer was fed over a 4 hr period. Heating was continued for 19hr.
- Reaction mixture was diluted with MEK (150 mL), stirred until uniform and cooled to room temperature. Reaction mixture was added to 3L hexane. After stirring, the liquid phase was removed and another 2L portion of hexane was added and stirring was continued for 1 hr. Filtration and drying afforded 100g of solid, 98.5g. Liquid phase processing gave an additional 30g solid with identical SEC and NMR characteristics.
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- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Conductive Materials (AREA)
- Manufacturing Of Electric Cables (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Graft Or Block Polymers (AREA)
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| Application Number | Priority Date | Filing Date | Title |
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| JP2016549773A JP2017511820A (ja) | 2014-02-03 | 2015-01-30 | 電子回路部品タイプの適用のための導電材料の高速印刷用の組成物、および関連する方法 |
| CN201580006688.7A CN105960440A (zh) | 2014-02-03 | 2015-01-30 | 用于高速印刷用于电子电路型应用的导电材料的组合物及相关方法 |
| DE112015000622.2T DE112015000622B4 (de) | 2014-02-03 | 2015-01-30 | Zusammensetzungen zum Hochgeschwindigkeitsdrucken leitfähiger Materialien für elektrische Schaltungsanwendungen und diese betreffende Verfahren |
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| US201461935108P | 2014-02-03 | 2014-02-03 | |
| US61/935,108 | 2014-02-03 | ||
| US201461944088P | 2014-02-25 | 2014-02-25 | |
| US61/944,088 | 2014-02-25 |
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| PCT/US2015/013830 Ceased WO2015116960A1 (en) | 2014-02-03 | 2015-01-30 | Compositions for high speed printing of conductive materials for electronic circuitry type applications, and methods relating |
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| Country | Link |
|---|---|
| JP (1) | JP2017511820A (https=) |
| CN (1) | CN105960440A (https=) |
| DE (1) | DE112015000622B4 (https=) |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105679649A (zh) * | 2016-01-14 | 2016-06-15 | 上海大学 | 降低溶液法成膜退火温度的方法 |
| CN111574885A (zh) * | 2020-05-19 | 2020-08-25 | 成都怀慈福佑电子科技有限公司 | 一种面向印刷电子技术的生物可降解电子材料 |
| GB2592557A (en) * | 2019-10-22 | 2021-09-08 | Landa Labs 2012 Ltd | Transferable composition and methods for preparing and using the same |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3321332B1 (en) * | 2016-11-10 | 2019-07-31 | Agfa-Gevaert | Method for manufacturing an electronic device, such as printed circuit board |
| US10800938B2 (en) * | 2017-09-16 | 2020-10-13 | Xerox Corporation | Molecular organic reactive inks for conductive metal printing using photoinitiators |
| CN110358368A (zh) * | 2019-05-31 | 2019-10-22 | 南开大学 | 一种可拉伸微电子电路导电油墨及其合成方法 |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998001478A1 (en) | 1996-07-10 | 1998-01-15 | E.I. Du Pont De Nemours And Company | Polymerization with living characteristics |
| US6153705A (en) | 1997-06-23 | 2000-11-28 | Rhodia Chimie | Method for block polymer synthesis by controlled radical polymerisation |
| US20030199653A1 (en) * | 2002-03-27 | 2003-10-23 | Mccormick Charles L | Preparation of transition metal nanoparticles and surfaces modified with (co)polymers synthesized by RAFT |
| WO2006037161A1 (en) * | 2004-10-04 | 2006-04-13 | The University Of Sydney | Surface polymerisation process and polymer product using raft agent |
| EP1650264A1 (en) * | 2003-07-25 | 2006-04-26 | Kaneka Corporation | Resin composition containing ultrafine particles |
| WO2007025189A2 (en) * | 2005-08-26 | 2007-03-01 | Carnegie Mellon University | Electrically conductive blockcopolymers and controlled radical polymerization |
| US20090181183A1 (en) | 2008-01-14 | 2009-07-16 | Xerox Corporation | Stabilized Metal Nanoparticles and Methods for Depositing Conductive Features Using Stabilized Metal Nanoparticles |
| US20120232206A1 (en) * | 2011-03-07 | 2012-09-13 | Xerox Corporation | Solvent-based inks comprising silver nanoparticles |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10236133A1 (de) * | 2002-08-07 | 2004-02-26 | Byk-Chemie Gmbh | Verwendung von Gradientencopolymeren als Dispergiermittel zur Behandlung von Pigmenten und Feststoffen |
| KR20060056900A (ko) * | 2003-06-24 | 2006-05-25 | 폴리머스 오스트레일리아 프로프라이어터리 리미티드 | 나노복합체 중의 아크릴 분산제 |
| KR100740634B1 (ko) * | 2003-09-12 | 2007-07-18 | 내셔날 인스티튜트 오브 어드밴스드 인더스트리얼 사이언스 앤드 테크놀로지 | 미세한 액적(液滴)의 형상으로 분사해, 적층 도포 가능한금속 나노 입자 분산액 |
| US7632905B2 (en) | 2004-04-09 | 2009-12-15 | L'oreal S.A. | Block copolymer, composition comprising it and cosmetic treatment process |
| JP2008527169A (ja) * | 2005-01-10 | 2008-07-24 | イシウム リサーチ デベロップメント カンパニー オブ ザ ヘブリュー ユニバーシティー オブ イエルサレム | 金属ナノ粒子の水系分散物 |
| JP2008528782A (ja) * | 2005-02-04 | 2008-07-31 | アグフア・グラフイクス・ナームローゼ・フエンノートシヤツプ | イオン性芳香族モノマーから成るブロックコポリマーを含んでなる安定な顔料分散系 |
| TWI312799B (en) * | 2005-12-30 | 2009-08-01 | Ind Tech Res Inst | Viscosity controllable highly conductive ink composition and method for fabricating a metal conductive pattern |
| GB0624729D0 (en) * | 2006-12-12 | 2007-01-17 | Univ Leeds | Reversible micelles and applications for their use |
| JP2009170447A (ja) * | 2008-01-10 | 2009-07-30 | Sharp Corp | 導電性パターン形成材料、導電性パターン形成方法および配線基板 |
| EP2285881B1 (en) * | 2008-05-16 | 2014-01-22 | The University Of Sydney | Polymer microgel beads and preparative method thereof |
| EP2444462A4 (en) * | 2009-06-16 | 2014-03-05 | Bando Chemical Ind | ELECTRICALLY CONDUCTIVE INK AND METHOD OF MANUFACTURING BASE MATERIALS WITH ELECTRICALLY CONDUCTIVE COATING FILM FIXED AND USED THEREOF |
| EP2369597B1 (de) * | 2010-03-12 | 2014-06-25 | Clariant International AG | Herstellung leitfähiger Oberflächenbeschichtungen mit Dispersion mit elektrostatisch stabilisierten Silbernanopartikeln |
| JP5798396B2 (ja) * | 2011-07-14 | 2015-10-21 | リンテック株式会社 | ブロック共重合体、その製造方法、粘着組成物及び粘着シート |
| US20130224905A1 (en) * | 2012-02-27 | 2013-08-29 | E I Du Pont De Nemours And Company | Silver paste and use thereof in the production of solar cells |
| US20140349025A1 (en) * | 2013-05-23 | 2014-11-27 | E I Du Pont De Nemours And Company | Conductive compositions and methods relating thereto |
-
2015
- 2015-01-30 CN CN201580006688.7A patent/CN105960440A/zh active Pending
- 2015-01-30 WO PCT/US2015/013830 patent/WO2015116960A1/en not_active Ceased
- 2015-01-30 DE DE112015000622.2T patent/DE112015000622B4/de not_active Expired - Fee Related
- 2015-01-30 JP JP2016549773A patent/JP2017511820A/ja active Pending
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998001478A1 (en) | 1996-07-10 | 1998-01-15 | E.I. Du Pont De Nemours And Company | Polymerization with living characteristics |
| US6153705A (en) | 1997-06-23 | 2000-11-28 | Rhodia Chimie | Method for block polymer synthesis by controlled radical polymerisation |
| US20030199653A1 (en) * | 2002-03-27 | 2003-10-23 | Mccormick Charles L | Preparation of transition metal nanoparticles and surfaces modified with (co)polymers synthesized by RAFT |
| US7138468B2 (en) | 2002-03-27 | 2006-11-21 | University Of Southern Mississippi | Preparation of transition metal nanoparticles and surfaces modified with (CO)polymers synthesized by RAFT |
| EP1650264A1 (en) * | 2003-07-25 | 2006-04-26 | Kaneka Corporation | Resin composition containing ultrafine particles |
| WO2006037161A1 (en) * | 2004-10-04 | 2006-04-13 | The University Of Sydney | Surface polymerisation process and polymer product using raft agent |
| WO2007025189A2 (en) * | 2005-08-26 | 2007-03-01 | Carnegie Mellon University | Electrically conductive blockcopolymers and controlled radical polymerization |
| US20090181183A1 (en) | 2008-01-14 | 2009-07-16 | Xerox Corporation | Stabilized Metal Nanoparticles and Methods for Depositing Conductive Features Using Stabilized Metal Nanoparticles |
| US20120232206A1 (en) * | 2011-03-07 | 2012-09-13 | Xerox Corporation | Solvent-based inks comprising silver nanoparticles |
Non-Patent Citations (3)
| Title |
|---|
| LOWE A. B. ET AL., CHEMICAL REVIEWS, vol. 102, 2002, pages 4177 - 4189 |
| MOAD; SOLOMON: "The Chemistry of Free Radical Polymerization", 1995, PERGAMON, pages: 53 - 95 |
| SUMERLIN, B. ET AL., MACROMOLECULES, vol. 34, 2001, pages 6561 |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105679649A (zh) * | 2016-01-14 | 2016-06-15 | 上海大学 | 降低溶液法成膜退火温度的方法 |
| GB2592557A (en) * | 2019-10-22 | 2021-09-08 | Landa Labs 2012 Ltd | Transferable composition and methods for preparing and using the same |
| GB2592557B (en) * | 2019-10-22 | 2024-07-10 | Lumet Tech Ltd | Transferable composition and methods for preparing and using the same |
| US12595361B2 (en) | 2019-10-22 | 2026-04-07 | Lumet Technologies Ltd. | Transferable composition and methods for preparing and using the same |
| CN111574885A (zh) * | 2020-05-19 | 2020-08-25 | 成都怀慈福佑电子科技有限公司 | 一种面向印刷电子技术的生物可降解电子材料 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE112015000622T5 (de) | 2016-10-20 |
| JP2017511820A (ja) | 2017-04-27 |
| DE112015000622B4 (de) | 2023-09-28 |
| CN105960440A (zh) | 2016-09-21 |
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