WO2015096204A1 - 基板清洗装置 - Google Patents

基板清洗装置 Download PDF

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Publication number
WO2015096204A1
WO2015096204A1 PCT/CN2014/070242 CN2014070242W WO2015096204A1 WO 2015096204 A1 WO2015096204 A1 WO 2015096204A1 CN 2014070242 W CN2014070242 W CN 2014070242W WO 2015096204 A1 WO2015096204 A1 WO 2015096204A1
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WO
WIPO (PCT)
Prior art keywords
substrate
cleaning
cleaning apparatus
outlet
substrate cleaning
Prior art date
Application number
PCT/CN2014/070242
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English (en)
French (fr)
Inventor
朱美娜
Original Assignee
深圳市华星光电技术有限公司
朱美娜
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 深圳市华星光电技术有限公司, 朱美娜 filed Critical 深圳市华星光电技术有限公司
Priority to US14/235,795 priority Critical patent/US20150183005A1/en
Publication of WO2015096204A1 publication Critical patent/WO2015096204A1/zh

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B08B3/022—Cleaning travelling work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
    • B08B11/04—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto specially adapted for plate glass, e.g. prior to manufacture of windshields
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/041—Cleaning travelling work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B13/00—Machines or plants for applying liquids or other fluent materials to surfaces of objects or other work by spraying, not covered by groups B05B1/00 - B05B11/00
    • B05B13/02—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work
    • B05B13/0278—Arrangement or mounting of spray heads
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B16/00—Spray booths
    • B05B16/90—Spray booths comprising conveying means for moving objects or other work to be sprayed in and out of the booth, e.g. through the booth
    • B05B16/95—Spray booths comprising conveying means for moving objects or other work to be sprayed in and out of the booth, e.g. through the booth the objects or other work to be sprayed lying on, or being held above the conveying means, i.e. not hanging from the conveying means

Definitions

  • the present invention relates to the field of liquid crystal displays, and in particular to a substrate cleaning device.
  • the substrate is usually cleaned before the substrate is subjected to a film forming process, and the surface of the substrate is impacted by a water flow to remove particles on the substrate, thereby cleaning the surface of the substrate.
  • the nozzle of the cleaning machine is facing the surface of the substrate, that is, the ejection outlet direction of the nozzle is perpendicular to the surface of the substrate. This cleaning method is easy to clean most of the impurities on the substrate, but for some stubborn small It is difficult to remove particulate matter, and these small particles will not only lead to a decrease in substrate performance and yield, but also cause secondary pollution as the substrate enters the next process.
  • the main object of the present invention is to provide a substrate cleaning device, which aims to improve the cleaning ability of the substrate, thereby improving product yield and saving cleaning time.
  • the present invention provides a substrate cleaning apparatus including a cleaning chamber provided with an inlet and an outlet, wherein the cleaning chamber is provided with a first cleaning component, a second cleaning component, and the substrate
  • the first cleaning component and the second cleaning component are respectively disposed on upper and lower sides of the conveying component, and the first cleaning component and the second cleaning component are respectively respectively sent from the inlet to the conveying member of the outlet
  • a plurality of nozzles are arranged, and each of the nozzles is sequentially arranged along a conveying direction of the substrate, and an angle between an ejection outlet direction of each of the nozzles and a conveying direction of the substrate is greater than or less than 90°.
  • the first cleaning component and/or the second cleaning component comprise at least one overlapping nozzle group, the overlapping nozzle group comprising at least two nozzles that overlap or partially overlap the ejection regions on the substrate.
  • each of the first cleaning unit and/or the second cleaning unit is divided into two groups from one end of the cleaning chamber inlet to one end of the outlet thereof, two of which are in each group.
  • the ejection regions of the showerhead on the substrate overlap or partially overlap.
  • a single one of the nozzles is disposed between the groups of nozzles, and an opening angle of the opening direction of the single head and the conveying direction of the substrate is an acute angle toward the outlet direction.
  • the conveying member is disposed at an upper side and/or a lower side of the outlet position, at least one sub-header, and an ejection opening direction of the sub-header and a conveying direction of the substrate, opening toward the outlet The acute angle of the direction.
  • each of the spray heads in the first cleaning assembly and/or the second cleaning assembly is rotatable.
  • the conveying member comprises a plurality of circular shaft bodies, and each of the circular shaft bodies is arranged in parallel and at intervals along one end of the cleaning chamber inlet to one end of the outlet thereof, and each of the second cleaning assembly The ejection area of the ejection head on the substrate is shifted from the position of each of the circular shaft bodies.
  • the nozzle is provided with a control valve for controlling the flow rate of the injection.
  • the substrate cleaning device further includes a control device electrically connected to the control valve.
  • the respective nozzles of the first cleaning component and the second cleaning component are sequentially arranged along the conveying direction of the substrate, and the ejection outlet direction of each nozzle and the substrate are transferred.
  • the angle between the directions is greater than or less than 90°, so that the liquid ejected from the nozzle is inclined with respect to the particles on the surface of the substrate, so that the particles on the surface of the substrate can be washed away with a small force, thereby The cleaning ability of the substrate and the product yield are improved, and the cleaning time is saved.
  • FIG. 1 is a schematic structural view of an embodiment of a substrate cleaning apparatus of the present invention
  • FIG. 2 is a schematic structural view of another embodiment of the substrate cleaning device of the present invention.
  • FIG. 3 is a first state diagram of cleaning particulate matter in an embodiment of the substrate cleaning apparatus of the present invention.
  • FIG. 4 is a second state diagram of cleaning particulate matter in an embodiment of the substrate cleaning apparatus of the present invention.
  • Fig. 5 is a view showing a third state of cleaning particulate matter in an embodiment of the substrate cleaning apparatus of the present invention.
  • FIG. 1 is a schematic structural view of an embodiment of a substrate cleaning apparatus of the present invention
  • FIG. 2 is a schematic structural view of another embodiment of the substrate cleaning apparatus of the present invention
  • Fig. 4 is a second state diagram of cleaning particulate matter in an embodiment of the substrate cleaning apparatus of the present invention
  • Fig. 5 is a third state diagram of cleaning particulate matter in an embodiment of the substrate cleaning apparatus of the present invention.
  • the substrate cleaning apparatus includes a cleaning chamber 10 having an inlet 101 and an outlet 102, and the cleaning chamber 10 is provided with a first a cleaning assembly 20, a second cleaning assembly 30, and a transfer member 50 for transferring the substrate 40 from the inlet 101 to the outlet 102, the first cleaning assembly 20 and the second cleaning assembly 30 being respectively disposed at
  • the first cleaning component 20 and the second cleaning component 30 respectively include a plurality of nozzles 201, and the nozzles 201 are sequentially arranged along the conveying direction of the substrate 40, and each of the upper and lower sides of the conveying member 50
  • the angle between the ejection outlet direction of the head 201 and the conveying direction of the substrate 40 is larger or smaller than 90°.
  • the conveying direction of the substrate 40 is parallel to the horizontal direction
  • the head 201 may include a head having an ejection opening or a nozzle having a plurality of ejection openings.
  • a nozzle having an ejection opening is used.
  • 201 may be specifically selected according to actual needs in other embodiments.
  • the angle between the ejection outlet direction of the shower head 201 and the conveying direction of the substrate 40 is greater than or less than 90°, so that the water jet or the cleaning liquid sprayed by the shower head 201 is on one end of the particulate matter 100 on the surface of the substrate 40 or When both ends are flushed so that the water flow or the cleaning liquid impinges on the particulate matter 100, it is equivalent to pulsing the particulate matter 100 so that one end or both ends thereof are gradually lifted up and fall off.
  • This is just like the principle of using the shovel animal body. By inserting the iron shovel into one end of the object, the animal body can be smashed with minimal force to make the object loose.
  • the injection pressure of the nozzle 201 should be considered, and the injection pressure of the nozzle 201 in the second cleaning assembly 30 should be less than or equal to the injection pressure of the nozzle 201 in the first cleaning assembly 20 to prevent the second cleaning assembly 30 from being inside.
  • the ejection pressure of the head 201 is excessively large, and the substrate 40 is washed away from the conveying member 50, causing the substrate 40 to be displaced or peeled off.
  • the respective heads 201 of the first cleaning unit 20 and the second cleaning unit 30 are sequentially arranged along the conveying direction of the substrate 40, and the ejection outlets of the respective heads 201 are provided on the basis of the prior art.
  • the angle between the direction of the 102 and the conveying direction of the substrate 40 is greater than or less than 90°, so that the liquid ejected from the head 201 is inclined with respect to the particles 100 on the surface of the substrate 40, and therefore, at a small force The particulate matter 100 on the surface of the substrate 40 is washed away, thereby improving the cleaning ability of the substrate 40 and the product yield, and saving the cleaning time.
  • the first cleaning component 20 and/or the second cleaning component 30 in the above embodiment includes at least one overlapping nozzle group 21,
  • the overlapping nozzle group 21 includes at least two of the heads 201 that overlap or partially overlap the ejection regions on the substrate 40.
  • one overlapping nozzle group 21 may be provided, or a plurality of overlapping nozzle groups 21 may be provided.
  • the overlapping nozzle groups 21 overlap or partially overlap the ejection regions on the substrate 40, that is, both ends of the particles 100 on the substrate 40 can be washed by the water flow or the cleaning liquid, so that The particulate matter 100 is more likely to fall off, and therefore, not only the cleaning ability of the substrate 40 is enhanced, but also the cleaning time is saved.
  • each of the showerheads 201 in the first cleaning component 20 and/or the second cleaning component 30 is from one end of the cleaning chamber 10 inlet 101 to its outlet.
  • One end of 102 is sequentially grouped two by two, and the ejection areas of the two of the heads 201 in each group on the substrate 40 overlap or partially overlap.
  • the embodiment specifically includes three implementation methods: the first one is to group all the nozzles 201 in the first cleaning assembly 20 from one end of the cleaning chamber inlet 101 to one end of the outlet 102 thereof; All the nozzles 201 in the second cleaning assembly 30 are sequentially grouped from one end of the inlet 101 of the cleaning chamber 10 to one end of the outlet 102.
  • the third is to divide the first cleaning assembly 20 and the second cleaning assembly 30.
  • All of the heads 201 in the interior are grouped in turn from one end of the inlet 101 of the cleaning chamber 10 to one end of the outlet 102 thereof.
  • each of the heads 201 is sequentially grouped from one end of the inlet 101 of the cleaning chamber 10 to one end of the outlet 102 thereof, and the spray areas of the two nozzles 201 in each group on the substrate 40 are overlapped or Partially overlapping, the two heads 201 in each group can be flushed on both ends of the particles 100 on the substrate 40, thereby improving the continuity and strength of the flushing. Therefore, the cleaning force of the substrate 40 is further improved.
  • the cleanliness of the substrate 40 after cleaning is higher.
  • a single nozzle 201 is disposed between the groups of nozzles in the embodiment, and the single nozzle 201 is sprayed.
  • An acute angle of the opening direction toward the outlet 102 is formed between the exit direction and the conveying direction of the substrate 40.
  • the particulate matter 100 ⁇ on the substrate 40 is loosened by the respective grouping nozzles, and then the loosened particles 100 are flushed toward the inlet 101 of the cleaning chamber 10 through the single nozzle 201, so that the substrate 40 can be loosened.
  • the subsequent particulate matter 100 is flushed out in time to prevent the loose particulate matter 100 from remaining on the substrate 40 to block other particulate matter 100.
  • At least one sub-header 60 is disposed on the upper side and/or the lower side of the position of the outlet member 102 near the outlet 102, and the ejection outlet direction of the sub-header 60 is opposite to the substrate. Between the conveying directions of 40, there is an acute angle of the opening toward the outlet 102.
  • the ejection direction of the single head 201 is substantially opposite to the inlet 101 of the cleaning chamber 10, so that the loose particles 100 on the substrate 40 are flushed by the sub-header 60 toward the substrate 40 near the cleaning chamber inlet 101. At one end, the particulate matter 100 on the substrate 40 and the washed water flow are prevented from falling through the outlet 102 of the cleaning chamber 10 to the next step.
  • each of the heads 201 in the first cleaning assembly 20 and/or the second cleaning unit 30 can be rotated.
  • the bracket capable of adjusting the angle in the cleaning chamber is connected to the nozzle 201, and the fixing bracket may be rotatably connected to the nozzle 201.
  • the conveying member 50 includes a plurality of rotatable circular shaft bodies, and each of the circular shaft bodies is sequentially parallel and spaced along one end of the cleaning chamber inlet 101 to one end of the outlet port 102, and the second The ejection area of each of the heads 201 in the cleaning unit 30 on the substrate 40 is shifted from the position of each of the circular shaft bodies.
  • the nozzles of the respective heads 201 are respectively aligned with the area between the circular shaft bodies to prevent the conveying member 50 from blocking the flow of water jetted toward the substrate 40 by the heads 201.
  • the nozzle 201 is provided with a control valve for controlling the injection flow rate (not shown).
  • the control valve may be a manual valve or a solenoid valve, and the flow rate of the nozzle 201 can be adjusted.
  • the substrate 40 cleaning device further includes a control device (not shown), and the control device is electrically connected to the control valve.
  • the control device is a main controller of the substrate 40 cleaning device, and can be implemented by a single chip microcomputer or other chip.
  • the control valve uses a solenoid valve, precise control of time, flow rate, etc. can be realized by the control device, so that the control device is Under the control of the cleaning, the cleaning cost can be further saved while achieving the cleaning purpose.
  • the control device can also be used for the controlled operation of the transmission member 50.

Abstract

一种基板清洗装置，该基板清洗装置包括设有进口（101）和出口（102）的清洗腔室（10），清洗腔室（10）内设有第一清洗组件（20）、第二清洗组件（30）及将基板从进口（101）传送至出口（102）的传送件（50），第一清洗组件（20）与第二清洗组件（30）分别设置在传送件（50）的上下两侧，第一清洗组件（20）及第二清洗组件（30）分别包括多个喷头（201），各个喷头（201）沿基板（40）的传送方向依次排布，且各个喷头（201）的喷射出口方向与基板（40）的传送方向之间的夹角大于或者小于90°。可实现提高液晶显示器中基板洗净能力的目的，进而提高产品良率，节约清洗时间。

Description

基板清洗装置
技术领域
　　　本发明涉及液晶显示器领域，特别涉及一种基板清洗装置。　　　
背景技术
　　　在薄膜晶体管液晶显示器生产过程中，为了提高产品的性能及良率，通常在基板进行成膜制程前，对基板进行清洗，通过水流冲击基板表面，以去除基板上的颗粒物，从而达到清洗基板表面的目的。但是，在传统的清洗工艺中，清洗机的喷嘴正对基板表面，即喷头的喷射出口方向与基板表面垂直，这种清洗方式，易于清洗掉基板上大部分的杂质，但对于一些顽固的小颗粒物难以去除，而这些小颗粒物不仅会导致基板性能及良率降低，而且会随着基板进入下道工序，造成二次污染。
　　　上述内容仅用于辅助理解本发明的技术方案，并不代表承认上述内容是现有技术。　　　
发明内容
　　　本发明的主要目的为提供一种基板清洗装置，旨在提高基板的洗净能力，以提高产品良率，并节约清洗时间。
　　　为实现上述目的，本发明提出一种基板清洗装置，该基板清洗装置包括设有进口和出口的清洗腔室，所述清洗腔室内设有第一清洗组件、第二清洗组件及将所述基板从所述进口传送至所述出口的传送件，所述第一清洗组件与所述第二清洗组件分别设置在所述传送件的上下两侧，所述第一清洗组件及第二清洗组件分别包括多个喷头，各个所述喷头沿所述基板的传送方向依次排布，且各个所述喷头的喷射出口方向与所述基板的传送方向之间的夹角大于或者小于90°。
　　　优选地，所述第一清洗组件及/或第二清洗组件包括至少一个重叠喷头分组，所述重叠喷头分组至少包括两个在所述基板上的喷射区域重叠或者部分重叠的所述喷头。
　　　优选地，所述第一清洗组件及/或第二清洗组件内的各个所述喷头从所述清洗腔室进口的一端至其出口的一端依次两两分组，每一分组内的两个所述喷头在所述基板上的喷射区域重叠或者部分重叠。
　　　优选地，所述各组喷头之间设有单个所述喷头，且该单个喷头的喷射出口方向与所述基板的传送方向之间呈开口朝所述出口方向的锐角。
　　　优选地，所述传送件靠近所述出口位置的上侧及/或下侧设置至少一个副喷头，所述副喷头的喷射出口方向与所述基板的传送方向之间，呈开口朝所述出口方向的锐角。
　　　优选地，所述第一清洗组件及/或所述第二清洗组件内的各个所述喷头可转动。
　　　优选地，所述传送件包括多个圆轴体，各个所述圆轴体沿所述清洗腔室进口的一端至其出口的一端依次平行且间距设置，所述第二清洗组件内的各个所述喷头在所述基板上的喷射区域与各个所述圆轴体的位置错开。
　　　优选地，所述喷头内设有控制其喷射流量的控制阀。
　　　优选地，所述基板清洗装置还包括控制装置，所述控制装置与所述控制阀电连接。
　　　　　　本发明提出的基板清洗装置，通过在现有技术的基础上，将第一清洗组件及第二清洗组件的各个喷头沿基板的传送方向依次排布，且各个喷头的喷射出口方向与基板的传送方向之间的夹角大于或者小于90°，以使喷头喷出的液体相对于基板表面上的颗粒物呈倾斜状，因此，在较小的力度下即可将基板表面上的颗粒物冲刷掉，从而提高了基板的洗净能力以及产品良率，并节约了清洗时间。　　　
附图说明
　　　图1是本发明基板清洗装置一实施例的结构示意图；
　　　图2是本发明基板清洗装置另一实施例的结构示意图；
　　　图3是本发明基板清洗装置一实施例中清洗颗粒物的第一状态图；
　　　图4是本发明基板清洗装置一实施例中清洗颗粒物的第二状态图；
　　　图5是本发明基板清洗装置一实施例中清洗颗粒物的第三状态图。　　　
　　　本发明目的的实现、功能特点及优点将结合实施例，参照附图做进一步说明。　　　
具体实施方式
　　　应当理解，此处所描述的具体实施例仅仅用以解释本发明，并不用于限定本发明。
　　　参照图1至图5所示，图1是本发明基板清洗装置一实施例的结构示意图；图2是本发明基板清洗装置另一实施例的结构示意图；图3是本发明基板清洗装置一实施例中清洗颗粒物的第一状态图；图4是本发明基板清洗装置一实施例中清洗颗粒物的第二状态图；图5是本发明基板清洗装置一实施例中清洗颗粒物的第三状态图。
　　　本发明提供一种基板清洗装置，参照图1至图5，在一实施例中，该基板清洗装置包括设有进口101和出口102的清洗腔室10，所述清洗腔室10内设有第一清洗组件20、第二清洗组件30及将所述基板40从所述进口101传送至所述出口102的传送件50，所述第一清洗组件20与所述第二清洗组件30分别设置在所述传送件50的上下两侧，所述第一清洗组件20及第二清洗组件30分别包括多个喷头201，各个所述喷头201沿所述基板40的传送方向依次排布，且各个所述喷头201的喷射出口方向与所述基板40的传送方向之间的夹角大于或者小于90°。本实施例中，基板40的传送方向与水平方向平行，该喷头201可包括具有一个喷射口的喷头或者是具有多个喷射口的子母喷头，本优选实施例中采用具有一个喷射口的喷头201，当然，在其他实施例中可根据实际需要具体选择。其中，将喷头201的喷射出口方向与所述基板40的传送方向之间的夹角大于或者小于90°，以使得喷头201喷射出的水流或者清洗液对基板40表面上的颗粒物100的一端或者两端进行冲刷，从而使得水流或者清洗液冲击向颗粒物100上时，相当于对颗粒物100进行撬动，使其一端或者两端逐渐翘起，从而脱落。这个就像我们用铁锹撬动物体的原理一样，通过铁锹插入物体的一端，就可以用最小的力撬动物体，使物体松动。另外，设置时，需考虑喷头201喷射压力的大小，第二清洗组件30内的喷头201的喷射压力应当小于等于第一清洗组件20内的喷头201的喷射压力，防止第二清洗组件30内的喷头201的喷射压力过大而将基板40冲离传送件50，造成基板40移位或脱落。
　　　本发明提出的基板清洗装置，通过在现有技术的基础上，将第一清洗组件20及第二清洗组件30的各个喷头201沿基板40的传送方向依次排布，且各个喷头201的喷射出口102方向与基板40的传送方向之间的夹角大于或者小于90°，以使喷头201喷出的液体相对于基板40表面上的颗粒物100呈倾斜状，因此，在较小的力度下即可将基板40表面上的颗粒物100冲刷掉，从而提高了基板40的洗净能力以及产品良率，并节约了清洗时间。
　　　进一步地，参照图1、图2及图3，为了提高基板上颗粒物100的去除能力，上述实施例中第一清洗组件20及/或第二清洗组件30包括至少一个重叠喷头分组21，所述重叠喷头分组21至少包括两个在所述基板40上的喷射区域重叠或者部分重叠的所述喷头201。本实施例中，可以设置一个重叠喷头分组21，也可以设置多个，当然重叠喷头分组21越多，清除基板40上的颗粒物100的能力越强。其中，重叠喷头分组21中至少有两个或者多个喷头201在基板40上的喷射区域重叠或者部分重叠，即可以保证基板40上颗粒物100的两端都能受到水流或者清洗液的冲刷，使颗粒物100更容易脱落，因此，不仅加强了基板40的洗净能力，而且节约了清洗时间。
　　　此外，参照图1及图3，在其他实施例中，上述第一清洗组件20及/或第二清洗组件30内的各个所述喷头201从所述清洗腔室10进口101的一端至其出口102的一端依次两两分组，每一分组内的两个所述喷头201在所述基板40上的喷射区域重叠或者部分重叠。本实施例具体包括三种实施方法：第一种是将第一清洗组件20的内的所有喷头201从所述清洗腔室进口101的一端至其出口102的一端依次两两分组；第二种是将第二清洗组件30内的所有喷头201从所述清洗腔室10进口101的一端至其出口102的一端依次两两分组；第三种是将第一清洗组件20及第二清洗组件30内的所有喷头201从所述清洗腔室10进口101的一端至其出口102的一端依次两两分组。其中，将各个喷头201从清洗腔室10进口101的一端至其出口102的一端依次两两分组，并且设置每一分组内的两个所述喷头201在所述基板40上的喷射区域重叠或者部分重叠，可以使得每一分组内的两个喷头201，都对基板40上颗粒物100的两端进行一次冲刷，提高了冲刷的连续性及强度，因此，进一步提高了基板40的清洗力度，使得基板40清洗后的洁净度更高。
　　　进一步地，参照图1至5所示，为了将基板40上松动后的颗粒物100及时冲刷掉，本实施例中上述各组喷头之间设有单个所述喷头201，且该单个喷头201的喷射出口方向与所述基板40的传送方向之间呈开口朝所述出口102方向的锐角。本实施例中，利用各分组喷头将基板40上的颗粒物100撬松动，然后通过该单个喷头201将松动后的颗粒物100大致朝着清洗腔室10的进口101方向冲刷，可以将基板40上松动后的颗粒物100及时冲刷掉，以防止松动的颗粒物100继续留在基板40上对其他的颗粒物100造成阻挡。
　　　进一步地，参照图1至5所示，所述传送件50靠近所述出口102位置的上侧及/或下侧设置至少一个副喷头60，所述副喷头60的喷射出口方向与所述基板40的传送方向之间，呈开口朝所述出口102方向的锐角。本实施例中，利用该单个喷头201的喷射方向大致对着清洗腔室10的进口101，使得基板40上被撬松动的颗粒物100被该副喷头60冲刷向基板40靠近清洗腔室进口101的一端，防止基板40上的颗粒物100及清洗后的水流通过清洗腔室10的出口102落入至下道工序。
　　　进一步地，参照图1及图2，为了方便调节喷头201的角度，所述第一清洗组件20及/或所述第二清洗组件30内的各个所述喷头201可转动。其中，清洗腔室中可设置可调节角度的支架与喷头201连接，也可以设置固定支架与喷头201转动连接。
　　　进一步地，所述传送件50包括多个可转动的圆轴体，各个所述圆轴体沿所述清洗腔室进口101的一端至其出口102的一端依次平行且间距设置，所述第二清洗组件30内的各个所述喷头201在所述基板40上的喷射区域与各个所述圆轴体的位置错开。本实施例中是将各喷头201的喷嘴分别对准圆轴体之间的区域，以防止传送件50对喷头201喷射向基板40的水流进行阻挡。
　　　进一步地，参照图1及图2，为了提高对喷头201流量的控制，以在达到洗净目的的同时节约清洗成本，所述喷头201内设有控制其喷射流量的控制阀（图未示）。该控制阀可以是手动阀，也可以电磁阀，能够调节喷头201的流量。
　　　进一步地，参照图1及图2，所述基板40清洗装置还包括控制装置（图未示），所述控制装置与所述控制阀电连接。该控制装置为基板40清洗装置的主控制器，可以采用单片机或者其他芯片实现，当所述控制阀采用电磁阀时，可通过该控制装置实现时间、流量等的精确控制，使得在该控制装置的控制下可以在达到洗净目的的同时，进一步地节约清洗成本。当然，该控制装置还可以用于传动件50的控制运行。　　　
　　　以上所述仅为本发明的优选实施例，并非因此限制本发明的专利范围，凡是利用本发明说明书及附图内容所作的等效结构或等效流程变换，或直接或间接运用在其他相关的技术领域，均同理包括在本发明的专利保护范围内。

Claims (20)

  1. 一种基板清洗装置，包括设有进口和出口的清洗腔室，所述清洗腔室内设有第一清洗组件、第二清洗组件及将所述基板从所述进口传送至所述出口的传送件，其中，所述第一清洗组件与所述第二清洗组件分别设置在所述传送件的上下两侧，所述第一清洗组件及第二清洗组件分别包括多个喷头，各个所述喷头沿所述基板的传送方向依次排布，且各个所述喷头的喷射出口方向与所述基板的传送方向之间的夹角大于或者小于90°。
  2. 如权利要求1所述的基板清洗装置，其中，所述传送件靠近所述出口位置的上侧及/或下侧设置至少一个副喷头，所述副喷头的喷射出口方向与所述基板的传送方向之间，呈开口朝所述出口方向的锐角。
  3. 如权利要求2所述的基板清洗装置，其中，所述第一清洗组件及/或所述第二清洗组件内的各个所述喷头可转动。
  4. 如权利要求2所述的基板清洗装置，其中，所述传送件包括多个圆轴体，各个所述圆轴体沿所述清洗腔室进口的一端至其出口的一端依次平行且间距设置，所述第二清洗组件内的各个所述喷头在所述基板上的喷射区域与各个所述圆轴体的位置错开。
  5. 如权利要求2所述的基板清洗装置，其中，所述喷头内设有控制其喷射流量的控制阀。
  6. 如权利要求5所述的基板清洗装置，其中，所述基板清洗装置还包括控制装置，所述控制装置与所述控制阀电连接。
  7. 如权利要求1所述的基板清洗装置，其中，所述第一清洗组件及/或第二清洗组件包括至少一个重叠喷头分组，所述重叠喷头分组至少包括两个在所述基板上的喷射区域重叠或者部分重叠的所述喷头。
  8. 如权利要求7所述的基板清洗装置，其中，所述传送件靠近所述出口位置的上侧及/或下侧设置至少一个副喷头，所述副喷头的喷射出口方向与所述基板的传送方向之间，呈开口朝所述出口方向的锐角。
  9. 如权利要求8所述的基板清洗装置，其中，所述第一清洗组件及/或所述第二清洗组件内的各个所述喷头可转动。
  10. 如权利要求8所述的基板清洗装置，其中，所述传送件包括多个圆轴体，各个所述圆轴体沿所述清洗腔室进口的一端至其出口的一端依次平行且间距设置，所述第二清洗组件内的各个所述喷头在所述基板上的喷射区域与各个所述圆轴体的位置错开。
  11. 如权利要求8所述的基板清洗装置，其中，所述喷头内设有控制其喷射流量的控制阀。
  12. 如权利要求11所述的基板清洗装置，其中，所述基板清洗装置还包括控制装置，所述控制装置与所述控制阀电连接。
  13. 如权利要求1所述的基板清洗装置，其中，所述第一清洗组件及/或第二清洗组件内的各个所述喷头从所述清洗腔室进口的一端至其出口的一端依次两两分组，每一分组内的两个所述喷头在所述基板上的喷射区域重叠或者部分重叠。
  14. 如权利要求13所述的基板清洗装置，其中，所述各组喷头之间设有单个所述喷头，且该单个喷头的喷射出口方向与所述基板的传送方向之间呈开口朝所述出口方向的锐角。
  15. 如权利要求14所述的基板清洗装置，其中，所述传送件靠近所述出口位置的上侧及/或下侧设置至少一个副喷头，所述副喷头的喷射出口方向与所述基板的传送方向之间，呈开口朝所述出口方向的锐角。
  16. 如权利要求13所述的基板清洗装置，其中，所述传送件靠近所述出口位置的上侧及/或下侧设置至少一个副喷头，所述副喷头的喷射出口方向与所述基板的传送方向之间，呈开口朝所述出口方向的锐角。
  17. 如权利要求16所述的基板清洗装置，其中，所述第一清洗组件及/或所述第二清洗组件内的各个所述喷头可转动。
  18. 如权利要求16所述的基板清洗装置，其中，所述传送件包括多个圆轴体，各个所述圆轴体沿所述清洗腔室进口的一端至其出口的一端依次平行且间距设置，所述第二清洗组件内的各个所述喷头在所述基板上的喷射区域与各个所述圆轴体的位置错开。
  19. 如权利要求16所述的基板清洗装置，其中，所述喷头内设有控制其喷射流量的控制阀。
  20. 如权利要求19所述的基板清洗装置，其中，所述基板清洗装置还包括控制装置，所述控制装置与所述控制阀电连接。
PCT/CN2014/070242 2013-12-27 2014-01-07 基板清洗装置 WO2015096204A1 (zh)

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