WO2015002353A1 - 편광 펄스 uv를 이용한 광배향 방법 및 패턴드 리타더 제조방법 - Google Patents
편광 펄스 uv를 이용한 광배향 방법 및 패턴드 리타더 제조방법 Download PDFInfo
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- WO2015002353A1 WO2015002353A1 PCT/KR2013/010740 KR2013010740W WO2015002353A1 WO 2015002353 A1 WO2015002353 A1 WO 2015002353A1 KR 2013010740 W KR2013010740 W KR 2013010740W WO 2015002353 A1 WO2015002353 A1 WO 2015002353A1
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3083—Birefringent or phase retarding elements
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/00634—Production of filters
- B29D11/00644—Production of filters polarizing
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B30/00—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images
- G02B30/20—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images by providing first and second parallax images to an observer's left and right eyes
- G02B30/22—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images by providing first and second parallax images to an observer's left and right eyes of the stereoscopic type
- G02B30/25—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images by providing first and second parallax images to an observer's left and right eyes of the stereoscopic type using polarisation techniques
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
- G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/13363—Birefringent elements, e.g. for optical compensation
- G02F1/133631—Birefringent elements, e.g. for optical compensation with a spatial distribution of the retardation value
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
Definitions
- the present invention relates to a photo-alignment method and a method of manufacturing a patterned retarder, and more particularly, to a method of forming a photo-alignment layer by irradiating polarization pulse UV to the alignment layer and a method of manufacturing a patterned retarder using the same.
- liquid crystal display devices are widely used in the field of optical information processing.
- TN Transmission Nematic
- the electrodes are installed on two substrates and the liquid crystal directors are arranged to be twisted 90 degrees, and then It is a technique of driving a liquid crystal director by applying a voltage.
- TN type liquid crystal display device provides excellent contrast and color reproducibility, among which vertical alignment (VA) mode in which the long axis of the liquid crystal molecules is arranged perpendicular to the upper and lower display panels without an electric field applied thereto.
- VA vertical alignment
- Liquid crystal display devices are in the spotlight due to their large contrast ratios.
- the TN type liquid crystal display has a problem that the viewing angle is narrow.
- a PVA mode Powered Verticlally Aligned Mode
- IPS mode In-Plane Switching Mode
- the gap between the counter electrode and the pixel electrode is formed to be narrow between the counter electrode and the pixel electrode while the counter electrode and the pixel electrode are formed of a transparent conductor.
- Fringe field switching mode (FFS) for operating liquid crystal molecules has emerged.
- the FIS mode has been developed to solve the problem that the light efficiency of the FFS mode is less than the TN mode, in addition to improving the low transmittance between the pixel electrode in the conventional FFS mode, voltage application method through two thin film transistors As a result, a liquid crystal display device capable of driving a low voltage can be achieved.
- each of these modes has a unique liquid crystal array and optical anisotropy. Therefore, in order to compensate for the phase difference resulting from the optical anisotropy of these liquid crystal modes, the optical retardation film of the optical anisotropy corresponding to each mode is required.
- the optical retardation film was developed as a color compensation film of LCD, but in recent years, various functions such as high wavelength dispersion, wide viewing angle, temperature compensation, and high phase difference film are required.
- stereoscopic images expressing 3D are made by the principle of stereo vision through two eyes, and by using the binocular disparity, which is caused by the disparity of two eyes, that is, the eyes are about 65mm apart.
- a 3D image display device capable of displaying a stereoscopic image has been proposed.
- a typical 3D image display device includes a liquid crystal display that displays an image largely, a patterned retarder attached to an outer surface of the liquid crystal display, and an image that passes through the patterned retarder from the liquid crystal display. It consists of glasses which permeate selectively.
- the patterned retarder may have a different phase value for the left eye image and the right eye image of the 2D image from the liquid crystal display device, such as left circularly polarized light for the left eye image and right circularly polarized light for the right eye image.
- it requires the formation of multi-domain photo-aligned at different angles.
- a number of applications such as Korean Patent Publication No. 10-2013-0035631 have been disclosed.
- the orientation of the liquid crystal molecules controlled in advance is changed to another alignment state by applying an electric field, and the polarization direction or polarization state of the transmitted light is changed, and the change is made into a contrast of contrast with a polarizing plate or the like. It is common to change the display.
- a contact rubbing method is used in which a polymer film such as polyimide is applied to a substrate such as glass, and the surface is rubbed with a fiber such as nylon or polyester in a constant direction.
- the liquid crystal alignment by the contact rubbing method as described above has the advantage of obtaining a simple and stable alignment of the liquid crystal, but when the fiber and the polymer film is rubbed, fine dust or electrostatic discharge (ESD) is generated and the substrate is damaged.
- ESD electrostatic discharge
- a method for producing a non-contact alignment film there are a photoalignment method, an energy beam alignment method, a vapor deposition orientation method, an etching method using lithography, and the like.
- the photo-orientation method refers to a mechanism in which a photoreaction material bound to a photoreactive polymer by linearly polarized UV causes a photoreaction (photoisomerization, photodimerization, photolysis) to be uniformly arranged, thereby aligning the liquid crystals.
- the photoreactive material when irradiating linearly polarized ultraviolet rays, the photoreactive material should be arranged in a certain direction and angle according to the polarization direction, and the matching with the reactive liquid crystal is well performed so that the liquid crystal alignment is well performed by interaction with the reactive liquid crystal. Should be done.
- the photo-alignment material forming the photo-alignment layer should have good physical properties such as printability, orientation stability, and thermal stability.
- the photoreaction by UV irradiation already includes photopolymerization (photodimerization) reaction of cinnamate, coumarin, chalcone, stilbene, diazo, photoisomerization of cis-trans isomerization, and molecular chain cleavage of decomposition.
- photopolymerization photodimerization
- cinnamate coumarin
- chalcone stilbene
- diazo photoisomerization of cis-trans isomerization
- molecular chain cleavage of decomposition Known.
- the molecular light reaction by ultraviolet rays is applied to the alignment of liquid crystals by ultraviolet irradiation through the design of appropriate alignment layer molecules and optimization of ultraviolet irradiation conditions.
- the liquid crystal alignment ability is imparted by the linearly polarized ultraviolet irradiation, characterized in that having a liquid crystal alignment film and a liquid crystal alignment film
- a liquid crystal display element is disclosed.
- Patents related to the optical alignment method have been filed in a number of applications, particularly in Japan, Korea, Europe, and the United States, which are related to the LCD industry. However, since the initial idea was derived, it has been in mass production but has not been widely applied throughout the industry.
- the photo-alignment method has lower productivity or reliability than the rubbing method.
- the main causes of such problems include low alignment energy (anchoring energy), low orientation stability of the liquid crystal compared to the rubbing method.
- the present invention has been made to solve the problems described above, by shortening the optical alignment process time using polarized pulse UV, optical alignment using polarized pulse UV which has the effect of improving productivity by maximizing the efficiency of optical alignment It is an object of the present invention to provide a method and a method for producing a patterned retarder.
- preparing a substrate (a) preparing a substrate; (b) applying a photoreactant on the substrate to form a photoreactive layer; And (c) irradiating polarization pulse UV to the photoreaction layer to form a photoalignment layer.
- the step (c) may include: (c-1) exposing the photoreaction layer to the entire surface by irradiating polarized pulse UV polarized in a first direction; And (c-2) irradiating the polarization pulse UV polarized in the second direction to the photoreactive layer, blocking a region corresponding to the first domain using a photomask, and only a region corresponding to the second domain. Partial exposure.
- the exposure time and the exposure energy in the step (c-2) are greater than the exposure time and the exposure energy in the step (c-1).
- (d) may further comprise the step of curing and then coating and drying the reactive liquid crystal on the optically exposed layer of the second exposure.
- the polarization pulse UV preferably has a 0.1mJ / pulse ⁇ 500J / pulse energy.
- the polarization pulse UV is preferably irradiated at 1Hz ⁇ 60Hz.
- the flash voltage of the polarization pulse UV is preferably 1kV ⁇ 4kV.
- the exposure time by the said polarization pulse UV is 0.1 second-10.0 second.
- the exposure distance by the polarization pulse UV is preferably 0.5cm ⁇ 10.0cm.
- FIG. 1 is a flow chart of an optical alignment method using a polarized pulse UV according to an embodiment of the present invention.
- 2 is a graph comparing the peak power of the normal UV and pulsed UV.
- 3 is a polarization optical micrograph according to the exposure time of the normal UV and pulsed UV.
- Figure 4 is a graph comparing the unoriented distribution of the optical alignment layer with the exposure time of the normal UV and pulsed UV.
- 5 is a graph comparing the phase difference change of the optical alignment layer according to the exposure time of the general UV and pulse UV.
- FIG. 7 is a graph showing unoriented distribution of the optical alignment layer according to the exposure distance of the polarization pulse UV.
- 10 is a graph showing the unoriented distribution of the optical alignment layer for each flash voltage and frequency of pulse UV at an exposure distance of 1.5 cm.
- 11 is a graph comparing the phase difference change of the optical alignment layer for each flash voltage and frequency of pulse UV at an exposure distance of 1.5 cm.
- FIG. 13 is a graph showing an unoriented distribution diagram of an optical alignment layer according to flash voltage and frequency of pulse UV at an exposure distance of 7.0 cm.
- FIG. 14 is a graph comparing the phase difference change of the optical alignment layer for each flash voltage and frequency of pulse UV at an exposure distance of 7.0 cm.
- 15 is a graph comparing the pretilt angle according to the exposure time of the normal UV and pulsed UV.
- 16 is a flow chart of a method for manufacturing a patterned retarder using polarized pulse UV according to an embodiment of the present invention.
- 17a to 17c is a step-by-step process diagram of a method for manufacturing a patterned retarder using polarized pulse UV according to an embodiment of the present invention.
- FIG. 18 is a polarization optical micrograph comparing orientations according to a 0 ° / 45 ° multidomain formation method during polarization pulse UV exposure.
- 19 is a graph comparing orientation according to a 0 ° / 45 ° multi-domain formation method during polarized pulse UV exposure.
- FIG. 20 is a polarization optical micrograph comparing the orientation according to the 0 ° / 90 ° multi-domain formation method during polarized pulse UV exposure.
- FIG. 21 is a graph comparing orientations according to a 0 ° / 90 ° multidomain formation method during polarized pulse UV exposure.
- FIG. 1 is a flow chart of an optical alignment method using a polarized pulse UV according to an embodiment of the present invention.
- an optical alignment method using polarization pulse UV according to an exemplary embodiment of the present invention will be described with reference to FIG. 1.
- the board substrate for forming a photo-alignment layer on the surface is prepared.
- the substrate may be selected in various standards as needed, and may be made of a transparent insulating substrate such as a glass substrate, a film, a flexible substrate, and the like.
- the film is tri-acetate cellulose (TAC), cyclo olefin polymer (COP), cyclic olefin copolymer (COC), poly vinyl alcohol (PVA), polycarbonate (PC), poly methyl methacrylate (PMMA), polyethylene terephthalate (PET) ), Polyethylene naphthalate (PEN), polyethersulfone (PES), polystyrene (PS), polyimide (PI), polyarylate (polyarylate), and PEEK (polyetheretherketon).
- TAC tri-acetate cellulose
- COP cyclo olefin polymer
- COC cyclic olefin copolymer
- PVA poly vinyl alcohol
- PC polycarbonate
- PMMA poly methyl methacrylate
- PET polyethylene terephthalate
- PEN Polyethylene naphthalate
- PES polyethersulfone
- PS polystyrene
- PI polyimide
- polyarylate polyarylate
- the photoreactive agent is apply
- the photoreactive agent may be, for example, polyimide, polyvinyl, polysiloxane, polysiloxane, polysiloxane including a photoreaction such as cinnamate, chalcone, coumarin, stilbene, diazo, etc. It may be made of acrylic (polyacryl) material.
- the photoreaction layer formed on the substrate is irradiated with polarized pulse UV (S31) to form an optical alignment layer having a pretilt angle (S32).
- UV Ultra Violet
- UV having high energy in the form of pulses is irradiated.
- This pulsed UV is only irradiated for a very short time and cooled for a relatively long time. That is, since the duty cycle (the time the pulse is on / the total time the pulse is repeated ⁇ 100 (%)) has a very small value of less than 1%, the overall UV irradiation time is short and the cooling time is long, thus There is an advantage that no heat is generated during the pulse UV irradiation process.
- Figure 2 compares the peak power and irradiation time when normal UV and pulsed UV are irradiated with the same energy of 1200 Watt-seconds.
- Normal UV with a peak power of 10 Watts is irradiated for 120 seconds, whereas pulse UV with a pulse width of 1 millisecond and peak power of 100,000 Watts is 12 for 12 seconds.
- Pulses with multiple pulses (multiple pulses) and a pulse width of 3 milliseconds and a peak power of 400,000 Watts are irradiated with one pulse (single pulse). In other words, pulsed UV is able to irradiate the same energy in a very short time compared to normal UV.
- the polarized pulse UV may be irradiated with a pulse width of 20 microseconds or less and 0.1 mJ / pulse to 500 J / pulse with a waveform of 1 to 60 Hz per second, thus shortening the light irradiation time during optical alignment. By shortening the process time, thereby improving the productivity.
- the flash voltage of polarization pulse UV is 1 kV-4 kV, and exposure time is 0.1 second-10.0 second.
- the light intensity difference between the light intensity at the point corresponding to the center of the lamp and the peripheral portion thereof is more severe. Therefore, although the brightness and uniformity of UV light emitted from the UV lamp during the optical alignment are closer to the substrate, in the conventional case, the minimum exposure distance has to be maintained due to thermal deformation directly received by the substrate. Generally, an exposure distance of about 10 to 15 cm is secured. In this case, the uniformity of the central portion and the peripheral portion of the UV light irradiated onto the substrate is about 30%.
- the exposure distance of the polarization pulse UV is preferably 0.5cm ⁇ 10.0cm.
- the polarized pulse UV irradiates the instantaneous pulse wave in a very short time, it has a strong penetration force in the optical orientation. As a result, the polarization pulse UV can evenly orient the thick layer of the photoreactive layer.
- polarized pulse UV lamp can reduce the power consumption by 80% or more than when using a conventional arc discharge UV lamp. This is because polarized pulsed UV uses instantaneous UV energy, which reduces power usage.
- the polarized pulse UV enables instant ON / OFF function, which can turn off the UV lamp when UV irradiation is unnecessary in the process flow, saving energy and eliminating the need for a separate switch such as a shutter.
- a separate switch such as a shutter.
- the cost of replacing consumables, such as a cold mirror and a hot mirror, which are used in the optical alignment using conventional UV there is an advantage in terms of economy.
- a liquid crystal cell was produced and used as follows in order to compare the orientation according to each exposure time.
- a photoreaction layer was prepared by applying a photoreactive agent dissolved in a 1% MEK / toluene organic solvent onto a substrate. Formed.
- the polarized light UV and the polarized pulse UV were irradiated to the photoreaction layer at an exposure distance of 7 cm for 0.1 seconds to 0.4 seconds, respectively, to form a photo alignment layer on the substrate, and the reactive liquid crystal was dissolved in 12% toluene organic solvent for coating and Dried.
- the general polarized UV was irradiated with a power density of 10.5 mW / cm 2
- the polarized pulse UV was irradiated with a flash voltage of 3 kV and a frequency of 50 Hz.
- FIG 3 is a polarized optical microscope (POM) picture according to the exposure time of the normal UV and pulsed UV
- Figure 4 is a graph comparing the unoriented distribution of the optical alignment layer according to the exposure time of the normal UV and pulsed UV
- 5 is a graph comparing the phase difference change of the optical alignment layer according to the exposure time of the general UV and pulse UV.
- the optical alignment process time is reduced by about 50% by improving the optical alignment speed.
- the exposure energy is 5.0 mJ / cm 2 for 0.4 seconds until the unoriented distribution is 1% or less
- the optically oriented layer is irradiated with polarized pulse UV according to an embodiment of the present invention.
- the exposure energy saving effect of about 36% compared to the conventional.
- FIG. 5 shows that the phase difference converges in a range (eg, 125 nm ⁇ 10 nm) within a faster time when using polarized pulse UV, compared to the case of using normal polarized UV. Indicates done.
- the liquid crystal cell When irradiating polarization pulse UV and forming a photo-alignment layer, in order to compare the orientation according to an exposure distance, the liquid crystal cell was produced and used as follows.
- a photoreaction layer was prepared by applying a photoreactive agent dissolved in a 1% MEK / toluene organic solvent onto a substrate. Formed.
- the photoalignment layer was formed by irradiating the polarization pulse UV on the photoreaction layer under severe conditions of exposure time of 0.1 sec. It was dissolved in a solvent and applied and dried.
- the polarization pulse UV was irradiated with a flash voltage of 3 kV and a frequency of 50 Hz.
- FIG. 6 is a polarization optical micrograph according to the exposure distance of the polarization pulse UV
- Figure 7 is a graph showing the unoriented distribution of the optical alignment layer according to the exposure distance of the polarization pulse UV.
- the closer the exposure distance between the UV lamp and the exposure surface (photoreaction layer) irradiating polarized pulse UV the smaller the unoriented distribution and the clearer the black image and the white image.
- the unoriented distribution increases, and the sharpness of the black image and the white image decreases.
- the exposure distance exceeds 7 cm the unoriented distribution distribution with the increased exposure distance is insignificant.
- FIG. 8 is a graph showing a phase difference change of the optical alignment layer according to the exposure distance of the polarization pulse UV, it can be seen that the phase difference decreases with a certain slope as the exposure distance increases.
- the liquid crystal cell When irradiating polarization pulse UV and forming a photo-alignment layer, in order to compare the orientation of each polarization pulse UV light by flash voltage and frequency, the liquid crystal cell was produced and used as follows.
- a photoreaction layer was prepared by applying a photoreactive agent dissolved in a 1% MEK / toluene organic solvent onto a substrate. Formed.
- the polarization pulse UV was irradiated to the photoreaction layer at an exposure time of 0.2 seconds and an exposure distance of 1.5 cm to form a photoalignment layer.
- the reactive liquid crystal was dissolved in 12% toluene organic solvent, and applied and dried.
- the flash voltage of the polarized pulse UV was set to 2.0kV, 2.5kV and 3.0kV, respectively, and the polarized pulse UV of 1Hz, 20Hz, 30Hz, 40Hz, and 50Hz frequency was irradiated at each flash voltage.
- Figure 9 is a polarizing optical micrograph of the pulse UV and the frequency of the pulse UV at an exposure distance of 1.5cm
- Figure 10 is a graph showing the unoriented distribution of the optical alignment layer for each of the flash voltage and frequency of the pulse UV at an exposure distance of 1.5cm
- 11 is a graph comparing the phase difference change of the optical alignment layer for each flash voltage and frequency of pulse UV at an exposure distance of 1.5 cm.
- the unoriented distribution when the frequency of the polarization pulse UV is 40Hz or more, the unoriented distribution was 1% or less even at the flash voltage of 2.0kV. When the flash voltage was 3kV, the unoriented distribution was 1% or less at the frequency of 20Hz. That is, when the flash voltage of the polarized pulse UV is 3kV, the optimal black image is realized at the frequency of 20 Hz and the unoriented distribution is minimal. When the flash voltage of the polarized pulse UV is 2.0 kV and the 2.5 kV, the optimal black image is performed at the frequency of 40 kV. The image implementation and the unoriented distribution are minimal.
- Figure 12 is a polarizing optical micrograph of the pulse voltage and the frequency of the pulse UV at an exposure distance of 7.0cm
- Figure 13 is a non-orientation distribution of the optical alignment layer by the flash voltage and frequency of the pulse UV at an exposure distance of 7.0cm
- FIG. 14 is a graph comparing the phase difference change of the optical alignment layer for each flash voltage and frequency of pulse UV at an exposure distance of 7.0 cm.
- the optimal black at the frequency 20 Hz when the flash voltage of the polarization pulse UV is 3 kV and at the frequency 40 Hz when the flash voltage is 2.5 kV You can see that the image is implemented.
- the exposure distance is set to 7cm, the unoriented distribution degree is shown to increase as a whole compared to the above-described experimental example with an exposure distance of 1.5cm, which is due to the increased light leakage phenomenon in the outer portion of the liquid crystal cell according to the increase in the exposure distance.
- a liquid crystal cell In the case of forming a photoalignment layer by irradiating general UV and in forming a photoalignment layer by irradiating pulsed UV, in order to compare the pretilt angle according to each exposure time, a liquid crystal cell is manufactured and used as follows. It was.
- a photoreaction layer was prepared by applying a photoreactive agent dissolved in a 1% MEK / toluene organic solvent onto a substrate. Formed.
- the polarized light UV and the polarized pulse UV were irradiated to the photoreaction layer at an exposure distance of 7 cm for 0.1 seconds to 0.4 seconds, respectively, to form a photoalignment layer, and the liquid crystal layer was formed of a twisted nematic liquid crystal (TN). It was.
- the general polarized UV was irradiated with a power density of 10.5 mW / cm 2
- the polarized pulse UV was irradiated with a flash voltage of 3 kV and a frequency of 50 Hz.
- FIG. 15 is a graph comparing pretilt angles according to exposure times of normal polarized light and pulsed polarized light UV.
- FIG. 15 As shown in FIG. 15, both the irradiated normal polarized UV light and the irradiated polarized light UV light tend to decrease the pretilt angle with increasing exposure time.
- the pretilt angle when exposed by polarized pulse UV, the pretilt angle is lower than when exposed by normal polarized UV, and by polarized pulse UV, the pretilt angle converges to a constant value after 0.2 second of exposure time.
- the alignment is performed, whereas in the case of general polarized UV light, the alignment is performed over an exposure time of 0.4 seconds. That is, in the case of using the polarized pulse UV according to an embodiment of the present invention, it can be seen that excellent horizontal orientation can be realized with less energy.
- FIGS. 16 is a flowchart illustrating a method for manufacturing a patterned retarder using polarized pulse UV according to an embodiment of the present invention
- FIGS. 17A to 17C illustrate a patterned retarder manufactured using polarized pulse UV according to an embodiment of the present invention.
- a step-by-step flowchart of the method a method of manufacturing a patterned retarder using polarization pulse UV will be described with reference to FIGS. 16 to 17C.
- the substrate 10 for forming a multi-domain on the surface is prepared.
- the substrate 10 may be selected in various standards as needed, and may be made of a transparent insulating substrate such as a glass substrate, a film, a flexible substrate, and the like.
- the film is tri-acetate cellulose (TAC), cyclo olefin polymer (COP), cyclic olefin copolymer (COC), poly vinyl alcohol (PVA), polycarbonate (PC), poly methyl methacrylate (PMMA), polyethylene terephthalate (PET) ), Polyethylene naphthalate (PEN), polyethersulfone (PES), polystyrene (PS), polyimide (PI), polyarylate (polyarylate), and PEEK (polyetheretherketon).
- TAC tri-acetate cellulose
- COP cyclo olefin polymer
- COC cyclic olefin copolymer
- PVA poly vinyl alcohol
- PC polycarbonate
- the substrate 10 may include a photo-mask 40 for forming a multi-domain pattern.
- a photoreactant is applied to a surface of the prepared substrate 10 to form a photoreaction layer 20 as an alignment layer.
- the photoreactive agent may be, for example, polyimide, polyvinyl, polysiloxane, polysiloxane, polysiloxane including a photoreaction such as cinnamate, chalcone, coumarin, stilbene, diazo, etc. It may be made of acrylic (polyacryl) material.
- the optical alignment layer 30 By irradiating polarization pulse UV to the photoreaction layer 20 on the substrate 10, the optical alignment layer 30 in which the stripe type first domain 31 and the second domain 32 are alternately continuous.
- the first domain 31 is oriented in the first direction by the polarization pulse UV polarized in the first direction (eg 0 °)
- the second domain 32 is in the second direction (eg 45 ° or 90 °). Oriented in the second direction by polarization pulse UV polarized by °).
- the polarized pulse UV polarized in the first direction is irradiated to the entire area of the photoreaction layer 20, so that the photoreaction layer 20 is moved in the first direction.
- the photoreaction layer 20 is moved in the first direction.
- a photo-mask 40 having a light transmission area TA and a blocking area BA is positioned on the substrate 10, and the photomask 40 may be disposed on the substrate 10.
- the polarization pulse UV polarized in the second direction from the top is irradiated perpendicularly to the substrate 10 direction.
- a region corresponding to the transmissive region TA of the photomask 40 is partially exposed and has a state of being photo-oriented in a second direction. (32) is achieved.
- the photoreaction layer 20 is subjected to the entire surface exposure step and the partial exposure step by the polarization pulse UV, the first domain 31 oriented in the first direction and the second domain 32 oriented in the second direction
- the alternating continuous optical alignment layer 30 will be formed.
- the first and second domains 31 and 2 having different orientations in the photoalignment layer 30 are formed by the front exposure of the photoreactive layer 20 and the partial exposure using the photomask 40. 32 has been described, but the method of forming the optical alignment layer 30 having the multi-domain may be variously performed.
- the second region is secondarily formed using a second photomask in which the region corresponding to the first domain 31 is a blocking region BA and the region corresponding to the second domain 32 is a transmission region TA. It is also possible to form a multi-domain by exposing.
- the method of forming the multi-domain by using the first photomask and the second photomask is inferior to the process shown in FIGS. 17B and 17C, and the method of forming the multi-domain by performing full exposure after partial exposure is The orientation is lower than the embodiment shown in Figs. 17B and 17C. This will be described later with reference to FIGS. 18 to 21.
- the method of manufacturing a patterned retarder using polarized pulse UV according to an embodiment of the present invention is characterized by using polarized pulse UV during exposure for forming a multi-domain.
- the multi-domains were formed by three different methods as follows.
- a glass substrate or a triacetate (TAC) substrate was used, and a photoreactive layer was dissolved by applying a photoreactive agent dissolved in a 1% MEK / toluene organic solvent onto a substrate. Formed.
- exposure for forming a multi-domain was performed by polarized pulse UV irradiation with a flash voltage of 3 kV, a frequency of 50 Hz, and an exposure distance of 7 cm. Then, the reactive liquid crystal was dissolved in 12% toluene organic solvent, and applied and dried.
- the first domain is exposed to the first domain.
- the multi-domain was formed by secondary exposure using a second photomask in which the corresponding region was the blocking region and the region corresponding to the second domain was the transmission region.
- the first domain is formed by primary exposure irradiating polarized pulse UV polarized in the first direction
- the second domain is formed by secondary exposure irradiated polarized pulse UV polarized in the second direction.
- the first front exposure is performed by irradiating polarized pulse UV polarized in the first direction to the entire area of the photoreactive layer, and then the area corresponding to the first domain is a blocking region and the second domain Multi-domain was formed by performing secondary partial exposure using a photomask having the region as a transmissive region.
- the first domain is formed by the first front exposure to irradiate the polarized pulse UV polarized in the first direction
- the second domain is formed by the second partial exposure to irradiate the polarized pulse UV polarized in the second direction. do.
- the third method was performed in the reverse order to the second method, first forming the first domain by primary partial exposure, and then forming the second domain by secondary front exposure. That is, first, the photoreactive layer is first partially exposed using a photomask having a region corresponding to the first domain as a transmissive region and a region corresponding to the second domain as a blocking region, and then partially exposed to the first domain. The entire area of the formed photoreaction layer was secondarily exposed to form a second domain. At this time, the polarization pulse UV polarized in the first direction is irradiated to the photoreaction layer through the photomask during the first partial exposure, and the polarization pulse UV polarized in the second direction during the second front exposure is partially in the first domain. The total area of the formed photoreaction layer was irradiated.
- the first domain and the second domain were optically aligned at 0 ° and 45 °, respectively, and observed with a polarization optical microscope. Black and white images appeared alternately clearly. This indicates that the multi-domain including the first domain and the second domain is formed in the photoalignment layer. Accordingly, it can be seen that the patterned retarder can be manufactured using the polarization pulse UV in the exposure process.
- FIG 19 is a graph comparing the orientations according to the 0 ° / 45 ° multi-domain formation method during polarization pulse UV exposure, and shows an orientation angle ⁇ according to the exposure time.
- the orientation angle ⁇ shown in the drawing indicates an angle between the liquid crystal optical axis oriented by the primary exposure and the liquid crystal optical axis oriented by the secondary exposure.
- the time exposure time was 0.2 second-1.4 second.
- the orientation angle ⁇ increases as the secondary partial exposure time increases, and the orientation angle ⁇ is 45 ° when the exposure time is 0.8 seconds. That is, it is preferable that the exposure time and exposure energy at the time of secondary partial exposure are larger than the exposure time and exposure energy at the time of primary front surface exposure. Then, the orientation angle ⁇ decreases as the secondary partial exposure time passes 0.8 seconds. In the second method (Case 2), the primary front exposure time is 0.2 seconds, and the secondary partial exposure time is 0.8 seconds. It can be seen that the best orientation when.
- the orientation angle ⁇ increases as the primary partial exposure time increases, and then the orientation angle ⁇ decreases as the primary partial exposure time passes 0.8 seconds. have. That is, the third method (Case 3) can be seen that the most excellent orientation when the first partial exposure time is 0.8 seconds, the second front exposure time is 0.2 seconds. However, according to the third method (Case 3), the orientation angle ( ⁇ ) is less than 45 ° regardless of the exposure time, which results in a lower orientation than the second method (Case 2). .
- the second method (Case 2) is superior to the first method (Case 1) and the third method (Case 3).
- Figure 21 is the orientation according to the 0 ° / 90 ° multi-domain formation method in the polarization pulse UV exposure It is a graph comparing.
- the second method (Case 2) showed the best results, and the second method (Case 2) showed the highest orientation at the first front exposure time of 0.2 seconds and the second partial exposure time of 0.8 seconds. Excellent.
- various applications may be manufactured by the optical alignment method using the polarization pulse UV and the patterned retarder manufacturing method as described above.
- the optical alignment method using the polarization pulse UV and the patterned retarder manufacturing method as described above.
- by irradiating the polarization pulse UV on the photoreaction layer formed on the substrate it is possible to obtain a photo-alignment film photo-aligned in at least one direction, in particular by using a photo-mask, in different directions
- a film-type patterned retarder (FPR) having a photo-alignment layer in which two photo-aligned domains are alternately continuous may be manufactured.
- a liquid crystal display including such a photoalignment film can be manufactured.
- an optical film eg, ⁇ / 4 or ⁇ / 2 retardation film, polarizing film, etc.
- an optical alignment film formed by polarized pulse UV irradiation may be prepared, and the optical film may be attached to the surface of a 3D display lens. Manufacturing is also possible.
- an optical alignment method using a polarized pulse UV and a method of manufacturing a patterned retarder According to an optical alignment method using a polarized pulse UV and a method of manufacturing a patterned retarder according to an exemplary embodiment of the present invention, shortening the time for forming an optical alignment layer or a multi-domain by an exposure process using polarized pulsed UV and energy required Since it is possible to reduce, productivity and mass production are easy.
- the photoalignment layer or the multi-domain can have the orientation and the orientation stability to have an excellent retardation ability.
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Abstract
Description
Claims (24)
- (a) 기판을 준비하는 단계;(b) 상기 기판 상에 광반응제를 도포하여 광반응층을 형성하는 단계; 및(c) 상기 광반응층에 편광 펄스 UV를 조사하여 광배향층을 형성하는 단계를 포함하는 편광 펄스 UV를 이용한 광배향 방법.
- 청구항 1에 있어서,상기 편광 펄스 UV는 0.1mJ/pulse ~ 500J/pulse 에너지를 갖는 것을 특징으로 하는 편광 펄스 UV를 이용한 광배향 방법.
- 청구항 1에 있어서,상기 편광 펄스 UV는 1Hz ~ 60Hz로 조사되는 것을 특징으로 하는 편광 펄스 UV를 이용한 광배향 방법.
- 청구항 1에 있어서,상기 편광 펄스 UV의 플래시 전압이 1kV ~ 4kV인 것을 특징으로 하는 편광 펄스 UV를 이용한 광배향 방법.
- 청구항 1에 있어서,상기 편광 펄스 UV에 의한 노광시간이 0.1초 ~ 10.0초인 것을 특징으로 하는 편광 펄스 UV를 이용한 광배향 방법.
- 청구항 1에 있어서,상기 편광 펄스 UV에 의한 노광거리가 0.5cm ~ 10.0cm인 것을 특징으로 하는 편광 펄스 UV를 이용한 광배향 방법.
- 청구항 1 내지 청구항 6 중 어느 한 항에 기재된 방법에 의해 제조되는 것을 특징으로 하는 광배향막.
- 청구항 1 내지 청구항 6 중 어느 한 항에 기재된 방법에 의해 제조되는 것을 특징으로 하는 패턴드 리타더.
- 청구항 1 내지 청구항 6 중 어느 한 항에 기재된 방법에 의해 제조되는 것을 특징으로 하는 액정 디스플레이.
- 청구항 1 내지 청구항 6 중 어느 한 항에 기재된 방법에 의해 제조되는 것을 특징으로 하는 광학필름.
- 청구항 1 내지 청구항 6 중 어느 한 항에 기재된 방법에 의해 제조되는 것을 특징으로 하는 3D 디스플레이 렌즈.
- (a) 기판을 준비하는 단계;(b) 상기 기판 상에 광반응제를 도포하여 광반응층을 형성하는 단계; 및(c) 상기 광반응층을 노광하여 스트라이프 타입의 제1 도메인과 제2 도메인이 교대로 연속하는 광배향층을 형성하는 단계;를 포함하며,상기 제1 도메인은 편광 펄스 UV에 의해 제1 방향으로 광배향되고, 상기 제2 도메인은 편광 펄스 UV에 의해 제2 방향으로 광배향되는 것을 특징으로 하는 편광 펄스 UV를 이용한 패턴드 리타더 제조방법.
- 청구항 12에 있어서, 상기 (c) 단계는,(c-1) 상기 광반응층에 제1 방향으로 편광된 편광 펄스 UV를 조사하여 전면 노광하는 단계; 및(c-2) 상기 광반응층에 제2 방향으로 편광된 편광 펄스 UV를 조사하되, 포토마스크를 이용하여 상기 제1 도메인에 대응되는 영역을 차단하고, 상기 제2 도메인에 대응되는 영역만 부분 노광하는 단계를 포함하는 편광 펄스 UV를 이용한 패턴드 리타더 제조방법.
- 청구항 12에 있어서,(d) 2차 노광된 상기 광배향층 위에 반응성 액정을 도포 및 건조한 후 경화하는 단계를 더 포함하는 것을 특징으로 하는 편광 펄스 UV를 이용한 패턴드 리타더 제조방법.
- 청구항 12에 있어서,상기 편광 펄스 UV는 0.1mJ/pulse ~ 500J/pulse 에너지를 갖는 것을 특징으로 하는 편광 펄스 UV를 이용한 패턴드 리타더 제조방법.
- 청구항 12에 있어서,상기 편광 펄스 UV는 1Hz ~ 60Hz로 조사되는 것을 특징으로 하는 편광 펄스 UV를 이용한 패턴드 리타더 제조방법.
- 청구항 12에 있어서,상기 편광 펄스 UV의 플래시 전압이 1kV ~ 4kV인 것을 특징으로 하는 편광 펄스 UV를 이용한 패턴드 리타더 제조방법.
- 청구항 12에 있어서,상기 편광 펄스 UV에 의한 노광시간이 0.1초 ~ 10.0초인 것을 특징으로 하는 편광 펄스 UV를 이용한 패턴드 리타더 제조방법.
- 청구항 13에 있어서,상기 (c-2) 단계에서의 노광시간 및 노광 에너지가, 상기 (c-1) 단계에서의 노광시간 및 노광 에너지보다 큰 것을 특징으로 하는 편광 펄스 UV를 이용한 패턴드 리타더 제조방법.
- 청구항 12에 있어서,상기 편광 펄스 UV에 의한 노광거리가 0.5cm ~ 10.0cm인 것을 특징으로 하는 편광 펄스 UV를 이용한 패턴드 리타더 제조방법.
- 청구항 12 내지 청구항 20 중 어느 한 항에 기재된 방법에 의해 제조되는 것을 특징으로 하는 광 배향막.
- 청구항 12 내지 청구항 20 중 어느 한 항에 기재된 방법에 의해 제조되는 것을 특징으로 하는 액정 디스플레이.
- 청구항 12 내지 청구항 20 중 어느 한 항에 기재된 방법에 의해 제조되는 것을 특징으로 하는 광학필름.
- 청구항 12 내지 청구항 20 중 어느 한 항에 기재된 방법에 의해 제조되는 것을 특징으로 하는 3D 디스플레이 렌즈.
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KR10-2013-0077384 | 2013-07-02 | ||
KR1020130077385A KR101527165B1 (ko) | 2013-07-02 | 2013-07-02 | 편광 펄스 uv를 이용한 패턴드 리타더 제조방법 |
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