WO2014173140A1 - 彩色滤光片、彩色滤光片制作方法和显示装置 - Google Patents

彩色滤光片、彩色滤光片制作方法和显示装置 Download PDF

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Publication number
WO2014173140A1
WO2014173140A1 PCT/CN2013/089218 CN2013089218W WO2014173140A1 WO 2014173140 A1 WO2014173140 A1 WO 2014173140A1 CN 2013089218 W CN2013089218 W CN 2013089218W WO 2014173140 A1 WO2014173140 A1 WO 2014173140A1
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Prior art keywords
color filter
black matrix
transparent conductive
conductive layer
substrate
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PCT/CN2013/089218
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English (en)
French (fr)
Inventor
石岳
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京东方科技集团股份有限公司
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Priority to US14/347,041 priority Critical patent/US10222672B2/en
Publication of WO2014173140A1 publication Critical patent/WO2014173140A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on an electrochromic effect
    • G02F1/153—Constructional details
    • G02F1/157—Structural association of cells with optical devices, e.g. reflectors or illuminating devices
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on an electrochromic effect
    • G02F1/153—Constructional details
    • G02F1/155—Electrodes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2203/00—Function characteristic
    • G02F2203/62—Switchable arrangements whereby the element being usually not switchable

Definitions

  • Color filter color filter manufacturing method and display device
  • Embodiments of the present invention relate to a color filter, a color filter manufacturing method, and a display device. Background technique
  • liquid crystal displays have been more and more widely used in industrial production, and play an increasingly important role in people's lives.
  • the Advanced Super Dimension Switch converts the electric field generated by the edge of the slit electrode in the same plane and the electric field generated between the slit electrode layer and the plate electrode layer to form a multi-dimensional electric field, so that the slit in the liquid crystal cell All the aligned liquid crystal molecules between the electrodes and directly above the electrodes can be rotated, thereby improving the liquid crystal working efficiency and increasing the light transmission efficiency.
  • Advanced super-dimensional field conversion technology can improve the picture quality of TFT-LCD products, with high resolution, high transmittance, low power consumption, wide viewing angle, high aperture ratio, low chromatic aberration, push mura, etc. advantage.
  • ADS technology has improved high-transmission I-ADS technology, high aperture ratio H-ADS and high-resolution S-ADS technology.
  • the ADS mode liquid crystal display panel has the advantage of an ultra-wide viewing angle, but like the ordinary transmissive liquid crystal display, its display effect in sunlight is still poor.
  • Conventional color filters generally include a substrate substrate, a conductive layer, a black matrix, and a color filter layer.
  • the color filter layer generally includes pixel units of three colors of red, green, and blue, and between adjacent filter layers. Black matrix.
  • a transflective technology has been proposed, which has improved the use of the liquid crystal display in the sunlight.
  • a transflective liquid crystal display requires two liquid crystal cells of different thicknesses in one sub-pixel, which adds great difficulty in optical design and fabrication process, especially In the rubbing process, there are many dead angles that cannot be aligned, and at the same time, the liquid crystal cell design mode for the transflective type has substantially no wide viewing angle characteristics.
  • a color filter comprising a substrate substrate, a color filter layer and a black matrix, the black matrix having a plurality of openings for arranging a color filter layer, the black matrix a first transparent conductive layer is disposed on a side of the substrate of the substrate, a second transparent conductive layer is disposed on a side of the black matrix away from the substrate, and the black matrix is made of an electrochromic material.
  • the first transparent conductive layer covers the entire substrate or covers an area where the black matrix is located, and the second transparent conductive layer covers the black matrix.
  • a transparent protective layer is disposed on a side of the second transparent conductive layer away from the substrate substrate.
  • a display device comprising the above-described color filter.
  • a color filter manufacturing method including: forming a first transparent conductive layer on a substrate substrate;
  • a black matrix having a plurality of openings for arranging a color filter layer, the black matrix being made of an electrochromic material; Forming a second transparent conductive layer on a side of the black matrix remote from the first transparent conductive layer;
  • a color filter layer is formed on the substrate of the village, and the color filter layer is disposed in an opening region of the black matrix.
  • the forming a color filter layer on the substrate of the substrate is performed before the first transparent conductive layer is formed on the substrate.
  • the forming a color filter layer on the substrate of the village forms a first transparent conductive layer on the substrate substrate and the remote transparent layer on the first transparent conductive layer
  • One side of the base substrate is formed between black matrices having a plurality of openings for arranging color filter layers.
  • the color filter layer is formed on the substrate of the substrate on the side of the first transparent conductive layer away from the substrate of the substrate to form a color filter layer. And a black matrix of the plurality of openings, and the forming of the second transparent conductive layer on the side of the black matrix away from the first transparent conductive layer.
  • the forming a color filter layer on the substrate of the substrate is performed after the second transparent conductive layer is formed on a side of the black matrix away from the first transparent conductive layer.
  • the first transparent conductive layer covers the entire substrate or covers an area where the black matrix is located, and the second transparent conductive layer covers the black matrix.
  • the color filter manufacturing method further includes: forming a transparent protective layer on a side of the second transparent conductive layer away from the substrate substrate.
  • FIG. 1 is a schematic structural view of a color filter according to an embodiment of the present invention.
  • FIG. 2 is a flow chart of a method for fabricating a color filter according to an embodiment of the present invention
  • FIG. 3 is a flow chart of another method of fabricating a color filter according to an embodiment of the present invention.
  • the words “a”, “an” or “the” do not denote a quantity limitation, but mean that there is at least one.
  • the word “comprising” or “comprises” or the like means that the element or item preceding the word is intended to encompass the element or the item recited after the word and its equivalent, and does not exclude other element or item.
  • Connected” or “connected” and the like are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect.
  • “Upper”, “lower”, “left”, “right”, etc. are only used to indicate the relative positional relationship. When the absolute position of the object being described is changed, the relative positional relationship may also be changed accordingly. Change. Embodiment 1
  • a color filter includes a substrate substrate 1, a color filter layer, and a black matrix 3, and the black matrix 3 has a plurality of openings for setting a color filter layer.
  • the black matrix 3 is provided with a first transparent conductive layer 2 on a side close to the substrate substrate 1, a second transparent conductive layer 4 is disposed on a side of the black matrix away from the substrate substrate 1, and the black matrix 3 is made of an electrochromic material. .
  • the substrate of the village 1 can be a glass, quartz, transparent resin and other materials.
  • the electrochromic material undergoes a stable, reversible color change under the action of an applied electric field.
  • the black matrix 3 made of an electrochromic material exhibits black color, which is suitable for indoor use; when the first transparent conductive layer 2 and the second transparent conductive layer 4 are broken
  • electricity when electricity is used, the black matrix 3 exhibits a transparent state and is suitable for outdoor use.
  • the transmittance of the black matrix 3 can be changed by controlling the voltage across the black matrix 3 according to the intensity of the outdoor sunlight, thereby finding a balance point between outdoor readability and display quality.
  • the first transparent conductive layer 2 covers the entire substrate 1 or covers the area where the black matrix 3 is located, and the second transparent conductive layer 4 covers the black matrix 3.
  • the first transparent conductive layer 2 covers the entire substrate 1 and can simultaneously control the power-on or power-off state of the entire black matrix 3 to ensure uniformity of display.
  • a transparent protective layer 6 may be further disposed on a side of the second transparent conductive layer 4 away from the substrate substrate 1.
  • the width of the black matrix 3 is much smaller than the width of any one of the pixel units in the color filter layer, and thus does not adversely affect the deflection of the liquid crystal molecules.
  • the color filter layer of this embodiment will be described by taking the red pixel unit 51, the green pixel unit 52, and the blue pixel unit 53 as an example. It should be noted that the color filter layer may further include one or more of pixel units of other colors such as a yellow pixel unit, a transparent color pixel unit, and the like according to design requirements, and the present invention is not limited to the above examples.
  • the color filter provided by the above technical solution has a black matrix 3 made of an electrochromic material, and two sides of the black matrix 3 are respectively provided with a first transparent conductive layer 2 and a second transparent conductive layer 4, and are adjusted by The voltage between the first and second transparent conductive layers 2, 4 controls the transmittance of the black matrix 3 in the color filter, so that the transmittance of the black matrix 3 is adjustable, thereby changing the light transmission of the color filter rate.
  • This not only enables the display device to have good readability outdoors, but also has excellent display effects indoors.
  • the embodiment of the invention further provides a display device, which comprises the color filter described in the first embodiment.
  • Light film The display device may be: a liquid crystal panel, a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, and the like, any product or component having a display function.
  • the display device may include the color filter and the switching element array substrate described in Embodiment 1.
  • the black matrix 3 of the color filter of the display device is made of an electrochromic material, and the first transparent conductive layer 2 and the second transparent conductive layer 4 are disposed on both sides of the black matrix 3, and the first and the second are adjusted.
  • the voltage between the two transparent conductive layers 2, 4 controls the transmittance of the black matrix 3 in the color filter, so that the transmittance of the black matrix 3 is adjustable, thereby changing the light transmittance of the color filter.
  • This enables the display device such as the ADS mode to have good readability outdoors, and also has excellent display effects indoors.
  • the liquid crystal panel is suitable for use in large-sized products such as a DID (Digital Information Display) splicing screen for outdoor advertising display.
  • the present invention also provides a method for fabricating a color filter according to the first embodiment, which includes:
  • a transparent conductive film layer may be formed on the substrate 1 by sputtering, spraying, coating or evaporation;
  • the transparent conductive film layer is the first transparent conductive layer 2; when the transparent conductive layer covers only the region where the black matrix 3 is located, the transparent conductive film layer is formed. After that, it is also necessary to form the designed pattern by a patterning process.
  • the patterning process typically includes photoresist coating, exposure, development, etching, photoresist stripping, and the like.
  • a black matrix 3 having a plurality of openings for setting a color filter layer is formed on a side of the first transparent conductive layer 2 away from the substrate substrate 1.
  • the black matrix 3 is made of an electrochromic material;
  • a method of forming the black matrix 3 having a plurality of openings for arranging the color filter layer is: sputtering, spraying, coating, or vapor deposition on the substrate 1 having the first transparent conductive layer 2 Forming a black matrix coating of an electrochromic material, and then coating a layer of photoresist on the black matrix coating, and then forming, using a mask, exposure, development, etching, photoresist stripping, etc.
  • a plurality of openings of the color filter layer that is, a black matrix 3 having a plurality of openings for arranging the color filter layers are formed.
  • the patterning process may omit photoresist coating, etching, and photolithography. Glue stripping process.
  • a transparent conductive film layer may be formed on the substrate 1 by sputtering, spraying, coating, or evaporation.
  • the designed pattern needs to be formed by a patterning process.
  • the patterning process typically includes processes such as photoresist coating, exposure, development, etching, photoresist stripping, and the like.
  • the color filter manufacturing method may further include: forming a color filter layer on the substrate substrate 1, the color filter layer being disposed in the opening region of the black matrix 3.
  • a first transparent conductive layer 2 may be formed on the substrate substrate 1, and then a black matrix 3 having a plurality of openings for arranging a color filter layer may be formed, and then a color filter layer is formed on the black matrix 3.
  • the method of forming the color filter layer and the second transparent conductive layer 4 may be performed by forming a color filter layer on the substrate 1 between steps S2 and S3, or forming color filter on the substrate 1
  • the step of the layer is performed after step S3):
  • Method a firstly adopts a method of sputtering, spraying, coating or evaporation on a black matrix 3 layer having a plurality of openings for setting a color filter layer and forming a second transparency by a patterning process
  • the conductive layer 4 is coated with a pixel resin in an open area of the black matrix 3 having the second transparent conductive layer 4, and is subjected to back exposure and development using a mask to form a color filter layer in the opening region.
  • the three color pixel layers of the color filter layer including red, green, and blue, are taken as an example to form pixel units of the three colors.
  • the pixel resin may be selected from conventional materials including a pigment liquid, an alkali-soluble film-forming resin, a polyfunctional monomer, and a photoinitiator.
  • the film-forming resin is, for example, a methacrylic resin.
  • Method b as shown in FIG. 3, firstly coating a pixel resin in a plurality of open regions of the black matrix 3, performing back exposure and development using a mask, forming a color filter layer in the pixel region, and then in the black matrix 3 And the surface of the color filter layer is sputtered, sprayed, coated or evaporated and the second transparent conductive layer 4 is formed by a patterning process.
  • the color filter layer includes three pixel units of red, green, and blue as an example, and the pixel units of the three colors are formed. It should be noted that the order of making the three pixel units of red, green and blue is not limited, and any order change of the three is within the scope of the invention.
  • the black matrix formed by the first method a described above has better conductivity than the black matrix formed by the second method b.
  • the method may further include the step of forming a color filter layer on the substrate 1 before the step S1.
  • a pixel resin is coated on the substrate 1 and exposed by a mask.
  • Light and development forming a color filter layer in a region of the plurality of openings of the black matrix 3, that is, in the pixel region; then forming a first transparent conductive layer 2, a black matrix on the substrate substrate 1 on which the color filter layer is formed 3 and the second transparent conductive layer 4, the method of forming the above layers is the same as the foregoing embodiment, and details are not described herein again.
  • the method may further include the step of forming a color filter layer on the substrate 1 to be performed between step S1 and step S2.
  • a color filter layer is formed on the first transparent conductive layer 2, and then a black matrix 3 is formed on the color filter layer; for example, first at first Forming a plurality of colors of pixel resin on the transparent conductive layer 2 away from the substrate 1 and exposing and developing the mask to form a color filter layer; and then forming a color filter layer on the substrate substrate 1 Forming a black matrix photoresist (having photosensitive characteristics;), and performing backside exposure and development using the pixel resin layer as a mask to form a black matrix 3.
  • a black matrix photoresist having photosensitive characteristics;
  • the black matrix material does not have a photosensitive property, a photoresist is required.
  • the black matrix 3 is formed by a conventional patterning process (as described in step S2), and will not be described again here; finally, the second transparent conductive layer 4 is formed on the side of the black matrix 3 remote from the first transparent conductive layer 2.
  • the color filter manufacturing method of the embodiment of the present invention further includes: forming a transparent protective layer 6 on a side of the second transparent conductive layer 4 away from the substrate substrate 1.
  • the first transparent conductive layer 2 may cover the entire substrate 1 or cover the area where the black matrix 3 is located, and the second transparent conductive layer 4 covers the black matrix 3.
  • the first transparent conductive layer 2 covers the entire substrate 1 and can simultaneously control the power-on or power-off state of the entire black matrix 3 to ensure uniformity of display.
  • a transparent protective layer 6 is disposed on a side of the second transparent conductive layer 4 away from the substrate substrate 1.
  • the color filter manufacturing method provided by the above technical solution, the manufacturing process, the black matrix 3 is formed by using the electrochromic material, and the first transparent conductive layer 2 and the second transparent conductive layer 4 are formed on both sides of the black matrix 3. Controlling the transmittance of the black matrix 3 in the color filter by adjusting the voltage between the first and second transparent conductive layers 2, 4, so that the transmittance of the black matrix 3 is adjustable, thereby changing the color filter.
  • the light transmittance which enables the display device to have good readability outdoors, and also has an excellent display effect indoors.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optical Filters (AREA)

Abstract

一种彩色滤光片，包括衬底基板（1）、彩色滤光层和黑矩阵（3），黑矩阵（3）靠近衬底基板（1）的一侧设有第一透明导电层（2），黑矩阵（3）远离衬底基板（1）的一侧设有第二透明导电层（4），黑矩阵（3）采用电致变色材料制成。还提供了一种包括该彩色滤光片的显示装置和该彩色滤光片的制作方法，该彩色滤光片使显示装置在户外有良好的可读性，同时在室内也有优秀的显示效果。

Description

彩色滤光片、 彩色滤光片制作方法和显示装置 技术领域
本发明的实施例涉及一种彩色滤光片、彩色滤光片制作方法和显示装置。 背景技术
目前， 随着科技的发展和社会的进步， 液晶显示器已经越来越广泛地被 人们应用在工业生产中， 并且在人民生活的中也起着越来越重要的作用。
高级超维场转换技术（ ADvanced Super Dimension Switch, ADS )通过同 一平面内狭缝电极边缘所产生的电场以及狭缝电极层与板状电极层间产生的 电场形成多维电场， 使液晶盒内狭缝电极间、 电极正上方所有取向液晶分子 都能够产生旋转， 从而提高了液晶工作效率并增大了透光效率。 高级超维场 转换技术可以提高 TFT-LCD产品的画面品质， 具有高分辨率、 高透过率、 低 功耗、 宽视角、 高开口率、 低色差、 无挤压水波纹（push Mura )等优点。 针 对不同应用， ADS技术的改进技术有高透过率 I-ADS技术、 高开口率 H-ADS 和高分辨率 S-ADS技术等。
ADS模式的液晶显示面板具有超广视角的优点， 但与普通型透射型液晶 显示器一样， 其在阳光下的显示效果依然不佳。
常规的彩色滤光片一般包括村底基板、 导电层、 黑矩阵和彩色滤光层， 彩色滤光层一般包括红、 绿、 蓝三种颜色的像素单元， 并且相邻滤光层之间 为黑矩阵。 为了提升液晶显示的户外可读性， 人们提出了半透半反技术， 该 技术使液晶显示器在阳光下的使用效果得到了一定的提升。 然而， 半透半反 型液晶显示器由于其本身的结构设计， 需要在一个子像素中有两个不同厚度 的液晶盒， 这样， 就在光学设计及制备工艺上增加了很大的难度， 特别是在 摩擦工艺中， 会有很多死角无法进行配向， 同时， 用于半透半反型的液晶盒 设计模式基本上都不具备广视角特性。
目前提出以细化或去除黑矩阵材料的方式来提升像素开口率， 提高数据 线对阳光的反射率，进而提升 ADS模式产品的户外可读性。该方法最大的优 点就是工艺筒单， 但其有可能会造成 "混色" 现象。 当其在户外使用时， 虽 然也有混色现象的发生，但由于外界光强较大， 所以人眼不易察觉， 所以 "混 色" 的现象并不影响其在户外的使用； 但当在室内使用时， "混色" 现象就能 被人眼轻易觉查出， 这样就使其不适合在室内使用。 发明内容
根据本发明的一个方面， 提供一种彩色滤光片， 其包括村底基板、 彩色 滤光层和黑矩阵， 所述黑矩阵具有用于设置彩色滤光层的多个开口， 所述黑 矩阵靠近所述村底基板的一侧设有第一透明导电层， 所述黑矩阵远离所述村 底基板的一侧设有第二透明导电层， 以及所述黑矩阵采用电致变色材料制成。
在一个实施例中， 所述第一透明导电层覆盖整个所述村底基板或者覆盖 所述黑矩阵所在区域， 所述第二透明导电层覆盖所述黑矩阵。
在一个实施例中， 所述第二透明导电层远离所述村底基板的一侧设有透 明保护层。
根据本发明的另一个方面， 提供一种显示装置， 其包括上述的彩色滤光 片。
根据本发明的又一个方面， 提供一种彩色滤光片制作方法， 其包括： 在村底基板上形成第一透明导电层；
在所述第一透明导电层上远离所述村底基板的一侧形成具有用于设置彩 色滤光层的多个开口的黑矩阵， 所述黑矩阵的材质为电致变色材料； 在所述 黑矩阵上远离所述第一透明导电层的一侧形成第二透明导电层； 以及
在所述村底基板上形成彩色滤光层， 所述彩色滤光层设置于所述黑矩阵 的开口区域。
在一个实施例中， 所述在所述村底基板上形成彩色滤光层在所述在村底 基板上形成第一透明导电层之前进行。
在一个实施例中， 所述在所述村底基板上形成彩色滤光层在所述在村底 基板上形成第一透明导电层和所述在所述第一透明导电层上远离所述村底基 板的一侧形成具有用于设置彩色滤光层的多个开口的黑矩阵之间进行。
在一个实施例中， 所述在所述村底基板上形成彩色滤光层于所述在所述 第一透明导电层上远离所述村底基板的一侧形成具有用于设置彩色滤光层的 多个开口的黑矩阵， 和所述在所述黑矩阵上远离所述第一透明导电层的一侧 形成第二透明导电层之间进行。
在一个实施例中， 所述在所述村底基板上形成彩色滤光层于所述在所述 黑矩阵上远离所述第一透明导电层的一侧形成第二透明导电层之后进行。 在一个实施例中， 所述第一透明导电层覆盖整个所述村底基板或者覆盖 所述黑矩阵所在区域， 所述第二透明导电层覆盖所述黑矩阵。
在一个实施例中， 所述彩色滤光片制作方法还包括： 在所述第二透明导 电层远离所述村底基板的一侧形成透明保护层。 附图说明
以下将结合附图对本发明的实施例进行更详细的说明， 以使本领域普通 技术人员更加清楚地理解本发明， 其中：
图 1是本发明实施例的彩色滤光片的结构示意图；
图 2是本发明实施例的一种彩色滤光片制作方法的流程图；
图 3是本发明实施例的另一种彩色滤光片制作方法的流程图。
其中， 1、 村底基板； 2、 第一透明导电层； 3、 黑矩阵； 4、 第二透明导 电层； 51、 红色像素单元； 52、 绿色像素单元； 53、 蓝色像素单元； 6、 透明 保护层。 具体实施方式
为了使本发明的实施例的目的、 技术方案和优点更加清楚， 下面将结合 本发明实施例的附图对本发明的实施例的技术方案进行清楚、 完整的描述。 显然， 所描述的实施例仅是本发明的一部分示例性实施例， 而不是全部的实 施例。 基于所描述的本发明的示例性实施例， 本领域普通技术人员在无需创 造性劳动的前提下所获得的所有其它实施例都属于本发明的保护范围。 除非 另作定义， 此处使用的技术术语或者科学术语应当为本发明所属领域内具有 一般技能的人士所理解的通常意义。 本发明专利申请说明书以及权利要求书 中使用的 "第一"、 "第二" 以及类似的词语并不表示任何顺序、 数量或者重 要性， 而只是用来区分不同的组成部分。 同样， "一个"、 "一" 或者 "该" 等 类似词语也不表示数量限制， 而是表示存在至少一个。 "包括" 或者 "包含" 等类似的词语意指出现该词前面的元件或者物件涵盖出现在该词后面列举的 元件或者物件及其等同， 而不排除其他元件或者物件。 "连接" 或者 "相连" 等类似的词语并非限定于物理的或者机械的连接， 而是可以包括电性的连接， 不管是直接的还是间接的。 "上"、 "下"、 "左"、 "右"等仅用于表示相对位置 关系， 当被描述对象的绝对位置改变后， 则该相对位置关系也可能相应地改 变。 实施例一
如图 1所示， 本发明实施例的一种彩色滤光片， 其包括村底基板 1、 彩色 滤光层和黑矩阵 3, 黑矩阵 3具有用于设置彩色滤光层的多个开口， 黑矩阵 3 靠近村底基板 1的一侧设有第一透明导电层 2,黑矩阵远离村底基板 1的一侧 设有第二透明导电层 4, 以及黑矩阵 3采用电致变色材料制成。
村底基板 1可为玻璃、 石英、 透明树脂等材质村底。
电致变色材料在外加电场的作用下可发生稳定、 可逆的颜色变化。 当第 一透明导电层 2和第二透明导电层 4通电，采用电致变色材料制成的黑矩阵 3 呈现黑色， 适合在室内使用； 当第一透明导电层 2和第二透明导电层 4断电， 则黑矩阵 3呈现出透明态， 适合在户外使用。 在户外使用时， 还可以根据户 外阳光的强度， 通过控制黑矩阵 3两端的电压， 使黑矩阵 3的透过率发生变 化， 从而找到一个户外可读性与显示品质的均衡点。
第一透明导电层 2覆盖整个村底基板 1或者覆盖黑矩阵 3所在区域， 第 二透明导电层 4覆盖黑矩阵 3。例如，第一透明导电层 2覆盖整个村底基板 1 , 可同时控制整个黑矩阵 3通电或断电状态， 确保显示的一致性。
另外，第二透明导电层 4远离村底基板 1的一侧还可以设有透明保护层 6。 黑矩阵 3 的宽度远小于彩色滤光层中任何一个像素单元的宽度， 因此不 会对液晶分子的偏转产生不良影响。 本实施例的彩色滤光层以设置红色像素 单元 51、绿色像素单元 52和蓝色像素单元 53为例进行说明。需要说明的是， 彩色滤光层根据设计的需要， 还可以包括黄色像素单元、 透明色像素单元等 其它颜色的像素单元中的一种或几种， 本发明不限于上述示例。
上述技术方案所提供的一种彩色滤光片， 其黑矩阵 3采用电致变色材料 制成， 黑矩阵 3的两侧分别设有第一透明导电层 2和第二透明导电层 4,通过 调节第一与第二透明导电层 2, 4之间的电压来控制彩色滤光片中黑矩阵 3的 透过率， 使得黑矩阵 3 的透过率可调， 从而改变彩色滤光片的透光率。 这样 既能使显示装置在户外有良好的可读性， 同时在室内也有优秀的显示效果。 实施例二
本发明实施例还提供一种显示装置， 其包括上述实施例一所述的彩色滤 光片。 所述显示装置可以为： 液晶面板、 手机、 平板电脑、 电视机、 显示器、 笔记本电脑、 数码相框、 导航仪等任何具有显示功能的产品或部件。 显示装 置可以包括实施例一所述的彩色滤光片和开关元件阵列基板。 该显示装置的 彩色滤光片的黑矩阵 3采用电致变色材料制成， 并在黑矩阵 3的两侧设有第 一透明导电层 2和第二透明导电层 4, 通过调节第一与第二透明导电层 2, 4 之间的电压来控制彩色滤光片中黑矩阵 3的透过率， 使得黑矩阵 3的透过率 可调，从而改变彩色滤光片的透光率。这样既能使 ADS模式等的显示装置在 户外有良好的可读性， 同时在室内也有优秀的显示效果。 例如， 该液晶面板 适合应用于大尺寸产品， 比如应用于户外广告显示的 DID ( Digital Information Display )拼接屏。 实施例三
本发明还提供一种实施例一的彩色滤光片的制作方法， 其包括：
51、 在村底基板 1上形成第一透明导电层 2;
例如， 可采用溅射、 喷涂、 涂覆或蒸镀的方式在村底基板 1上形成透明 导电膜层；
其中需要说明的是， 当透明导电层覆盖整个村底基板 1 时， 上述透明导 电膜层为第一透明导电层 2; 当透明导电层仅覆盖黑矩阵 3所在区域时，在形 成透明导电膜层之后， 还需要通过构图工艺形成所设计的图案。 构图工艺通 常包括光刻胶涂敷、 曝光、 显影、 刻蚀、 光刻胶剥离等工艺。
52、 在第一透明导电层 2上远离村底基板 1的一侧形成具有用于设置彩 色滤光层的多个开口的黑矩阵 3 , 黑矩阵 3的材质为电致变色材料；
例如， 形成具有用于设置彩色滤光层的多个开口的黑矩阵 3 的方法为： 在具有第一透明导电层 2的村底基板 1上采用溅射、 喷涂、 涂覆或蒸镀等方 式形成一电致变色材料的黑矩阵涂层， 然后再在黑矩阵涂层上涂覆一层光刻 胶， 之后采用掩模板进行曝光、 显影、 刻蚀、 光刻胶剥离等工艺形成用于设 置彩色滤光层的多个开口， 即形成了具有用于设置彩色滤光层的多个开口的 黑矩阵 3。 需要说明的是， 对于需要制作图案的膜层（例如本发明实施例中的 黑矩阵涂层）， 如果膜层材料本身具备感光特性， 构图工艺可以省略光刻胶涂 覆、 刻蚀和光刻胶剥离工艺。
53、 在黑矩阵 3上远离第一透明导电层 2的一侧形成第二透明导电层 4; 例如， 可采用溅射、 喷涂、 涂覆或蒸镀的方式在村底基板 1上形成透明 导电膜层。
需要说明的是， 因第二透明导电层 4仅覆盖黑矩阵 3所在区域， 在形成 透明导电膜层之后， 还需要通过构图工艺形成所设计的图案。 构图工艺通常 包括光刻胶涂敷、 曝光、 显影、 刻蚀、 光刻胶剥离等工艺。
并且， 彩色滤光片制作方法还可以包括： 在村底基板 1上形成彩色滤光 层， 该彩色滤光层设置于黑矩阵 3的开口区域。
例如， 首先可以在村底基板 1上形成第一透明导电层 2,接着可以形成具 有用于设置彩色滤光层的多个开口的黑矩阵 3,然后在该黑矩阵 3上形成彩色 滤光层和第二透明导电层 4。形成彩色滤光层和第二透明导电层 4的方法可以 为在村底基板 1上形成彩色滤光层的步骤在步骤 S2和步骤 S3之间进行， 或 者在村底基板 1上形成彩色滤光层的步骤在步骤 S3之后进行 ):
方法 a, 如图 2所示， 首先在具有用于设置彩色滤光层的多个开口的黑矩 阵 3层上采用溅射、 喷涂、 涂覆或蒸镀的方式并通过构图工艺形成第二透明 导电层 4, 再以具有第二透明导电层 4的黑矩阵 3的开口区域涂覆像素树脂， 采用掩膜板进行背面曝光并显影， 在开口区域内形成彩色滤光层。 本实施例 以彩色滤光层包括红、 绿、 蓝色三种像素单元为例进行说明， 形成该三种颜 色的像素单元。 需要说明的是， 红、 绿、 蓝色三种像素单元的制作顺序不受 限制， 三者的任何顺序变化都在本发明范围内。 所述像素树脂可以选用常规 的材料， 其包括颜料液、 碱溶性成膜树脂、 多官能单体和光引发剂。 成膜树 脂例如为甲基丙烯酸类树脂。
方法 b , 如图 3所示， 首先在黑矩阵 3的多个开口区域涂覆像素树脂， 并 采用掩膜板进行背面曝光并显影， 在像素区域内形成彩色滤光层， 然后在黑 矩阵 3和彩色滤光层的表面采用溅射、 喷涂、 涂覆或蒸镀的方式并通过构图 工艺形成第二透明导电层 4。 本实施例以彩色滤光层包括红、 绿、 蓝色三种像 素单元为例， 形成该三种颜色的像素单元。 需要说明的是， 红、 绿、 蓝色三 种像素单元的制作顺序不受限制， 三者的任何顺序变化都在本发明范围内。
用上述第一个方法 a形成的黑矩阵的导电性能比用第二个方法 b形成的 黑矩阵的导电性能更好。
例如， 所述方法还可以为， 在村底基板 1上形成彩色滤光层的步骤在步 骤 S1之前。 例如， 首先在村底基板 1上涂覆像素树脂， 并采用掩膜板进行曝 光并显影， 在黑矩阵 3的多个开口所在区域即在像素区域内形成彩色滤光层； 然后再在形成有彩色滤光层的村底基板 1上形成第一透明导电层 2、 黑矩阵 3 和第二透明导电层 4,形成上述各层的方法与前述实施例相同，在此不再赘述。
例如， 所述方法还可以为， 在村底基板 1上形成彩色滤光层的步骤在步 骤 S1和步骤 S2之间进行。 例如， 在村底基板 1上形成第一透明导电层 2后， 接着在第一透明导电层 2上形成彩色滤光层， 然后在彩色滤光层上形成黑矩 阵 3; 例如， 首先在第一透明导电层 2上远离村底基板 1的一侧形成涂覆多种 颜色的像素树脂并采用掩模板进行曝光、 显影以形成彩色滤光层； 然后再在 形成彩色滤光层的村底基板 1上形成黑矩阵用光刻胶（具备感光特性；)， 并以 像素树脂层作为掩膜板进行背面曝光并显影形成黑矩阵 3 ,若黑矩阵用材质不 具备感光性质， 则需要采用光刻胶并通过常规的构图工艺形成黑矩阵 3 (如步 骤 S2中所述）， 在此不再赘述； 最后在黑矩阵 3上远离第一透明导电层 2的 一侧形成第二透明导电层 4。
例如，本发明实施例的彩色滤光片制作方法还包括： 在第二透明导电层 4 远离村底基板 1的一侧形成透明保护层 6。
第一透明导电层 2可以覆盖整个村底基板 1或者覆盖黑矩阵 3所在区域， 第二透明导电层 4覆盖黑矩阵 3。例如， 第一透明导电层 2覆盖整个村底基板 1 , 可同时控制整个黑矩阵 3通电或断电状态， 确保显示的一致性。 第二透明 导电层 4远离村底基板 1的一侧设有透明保护层 6。
上述技术方案所提供的彩色滤光片制作方法， 制作工艺筒单， 采用电致 变色材料制作黑矩阵 3,并在黑矩阵 3的两侧形成第一透明导电层 2和第二透 明导电层 4,通过调节第一与第二透明导电层 2, 4之间的电压来控制彩色滤光 片中黑矩阵 3的透过率， 使得黑矩阵 3的透过率可调， 从而改变彩色滤光片 的透光率， 这样既能使显示装置在户外有良好的可读性， 同时在室内也有优 秀的显示效果。
以上所述仅是本发明的示例性实施方式， 应当指出， 对于所属技术领域 的普通技术人员来说， 在不脱离本发明技术原理的前提下， 还可以做出若干 改进和替换， 这些改进和替换也应视为本发明的保护范围。

Claims

权利要求书
1、 一种彩色滤光片， 包括村底基板、 彩色滤光层和黑矩阵， 所述黑矩阵 具有用于设置彩色滤光层的多个开口， 所述黑矩阵靠近所述村底基板的一侧 设有第一透明导电层， 所述黑矩阵远离所述村底基板的一侧设有第二透明导 电层， 所述黑矩阵采用电致变色材料制成。
2、 如权利要求 1所述的彩色滤光片， 其中所述第一透明导电层覆盖整个 所述村底基板或者覆盖所述黑矩阵所在区域， 所述第二透明导电层覆盖所述 黑矩阵。
3、 如权利要求 1或 2所述的彩色滤光片， 其中所述第二透明导电层远离 所述村底基板的一侧设有透明保护层。
4、 一种显示装置， 包括如权利要求 1-3任一项所述的彩色滤光片。
5、 一种彩色滤光片制作方法， 包括：
在村底基板上形成第一透明导电层；
在所述第一透明导电层上远离所述村底基板的一侧形成具有用于设置彩 色滤光层的多个开口的黑矩阵， 所述黑矩阵的材质为电致变色材料；
在所述黑矩阵上远离所述第一透明导电层的一侧形成第二透明导电层； 以及
在所述村底基板上形成彩色滤光层， 所述彩色滤光层设置于所述黑矩阵 的开口区 i或。
6、 如权利要求 5所述的彩色滤光片制作方法， 其中所述在所述村底基板 上形成彩色滤光层的步骤在所述在村底基板上形成第一透明导电层之前进 行。
7、 如权利要求 5所述的彩色滤光片制作方法， 其特征在于， 所述在所述 村底基板上形成彩色滤光层在所述在村底基板上形成第一透明导电层和所述 在所述第一透明导电层上远离所述村底基板的一侧形成具有用于设置彩色滤 光层的多个开口的黑矩阵之间进行。
8、 如权利要求 5所述的彩色滤光片制作方法， 其中所述在所述村底基板 上形成彩色滤光层的步骤于所述在所述第一透明导电层上远离所述村底基板 的一侧形成具有用于设置彩色滤光层的多个开口的黑矩阵， 和所述在所述黑 矩阵上远离所述第一透明导电层的一侧形成第二透明导电层之间进行。
9、 如权利要求 5所述的彩色滤光片制作方法， 其特征在于， 所述在所述 村底基板上形成彩色滤光层的步骤于所述在所述黑矩阵上远离所述第一透明 导电层的一侧形成第二透明导电层之后进行。
10、如权利要求 5-9任一项所述的彩色滤光片制作方法，其中所述第一透 明导电层覆盖整个所述村底基板或者覆盖所述黑矩阵所在区域， 所述第二透 明导电层覆盖所述黑矩阵。
11、 如权利要求 5-9任一项所述的彩色滤光片制作方法， 还包括： 在所 述第二透明导电层远离所述村底基板的一侧形成透明保护层。
PCT/CN2013/089218 2013-04-24 2013-12-12 彩色滤光片、彩色滤光片制作方法和显示装置 WO2014173140A1 (zh)

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Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103217832B (zh) 2013-04-24 2015-06-17 京东方科技集团股份有限公司 彩色滤光片、彩色滤光片制作方法和显示装置
CN103439846B (zh) * 2013-08-23 2016-04-20 京东方科技集团股份有限公司 一种显示面板、显示装置
CN103499850B (zh) 2013-09-29 2015-10-21 京东方科技集团股份有限公司 一种狭缝光栅结构及显示装置
CN103744227B (zh) * 2014-01-06 2016-01-27 京东方科技集团股份有限公司 一种彩膜基板及制作方法、显示装置
CN103760730B (zh) * 2014-01-08 2017-03-22 京东方科技集团股份有限公司 一种黑矩阵及其制造方法、显示面板及显示装置
CN104375314B (zh) * 2014-11-13 2017-01-25 深圳市华星光电技术有限公司 透明显示面板及其彩色滤光片基板
CN104749850B (zh) 2015-04-17 2017-11-07 京东方科技集团股份有限公司 电致变色显示面板及其驱动方法、显示装置
CN106154635B (zh) * 2016-09-22 2019-07-09 京东方科技集团股份有限公司 对盒基板和显示面板
CN106707595A (zh) * 2016-12-09 2017-05-24 武汉华星光电技术有限公司 一种无边框液晶显示装置及显示方法
TWI640075B (zh) 2017-10-31 2018-11-01 友達光電股份有限公司 像素發光裝置
CN108987451B (zh) * 2018-08-01 2021-09-24 京东方科技集团股份有限公司 显示面板及其控制方法和显示装置
CN111863888B (zh) * 2020-07-06 2023-05-30 武汉华星光电半导体显示技术有限公司 显示装置及显示装置的制备方法
CN112259594B (zh) * 2020-10-23 2024-05-07 京东方科技集团股份有限公司 色阻结构、显示面板及显示装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002365671A (ja) * 2001-06-07 2002-12-18 Toppan Printing Co Ltd 表示装置
CN101097343A (zh) * 2006-06-29 2008-01-02 Lg.菲利浦Lcd株式会社 视角可控滤色器基板、具有该基板的液晶显示器及其制造方法
US20110261301A1 (en) * 2010-04-27 2011-10-27 Samsung Electronics Co., Ltd Display device
CN102879946A (zh) * 2012-09-26 2013-01-16 京东方科技集团股份有限公司 彩膜基板、液晶面板及彩膜基板的制备方法
CN103217832A (zh) * 2013-04-24 2013-07-24 京东方科技集团股份有限公司 彩色滤光片、彩色滤光片制作方法和显示装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2708170B1 (fr) * 1993-07-19 1995-09-08 Innovation Dev Cie Gle Circuits électroniques à très haute conductibilité et de grande finesse, leurs procédés de fabrication, et dispositifs les comprenant.
KR100980353B1 (ko) 2003-11-19 2010-09-07 유니버시티 오브 플로리다 리서치 파운데이션, 아이엔씨. 다공성 기판상에 패턴화된 전극을 접촉시키는 방법 및 이에의한 소자
KR100732849B1 (ko) * 2005-12-21 2007-06-27 삼성에스디아이 주식회사 유기 발광 표시장치
TWI266901B (en) * 2005-12-26 2006-11-21 Au Optronics Corp Color filter and method for fabricating the same
KR101246005B1 (ko) * 2006-03-29 2013-03-20 엘지디스플레이 주식회사 전기 습윤 표시장치
CN100523880C (zh) * 2007-01-25 2009-08-05 北京京东方光电科技有限公司 一种彩色滤光片结构
TW201207536A (en) * 2010-08-10 2012-02-16 J Touch Corp Electrochromic module and display device integrated with the same
CN102944952A (zh) * 2012-11-13 2013-02-27 京东方科技集团股份有限公司 一种彩膜基板及其制作方法和显示面板

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002365671A (ja) * 2001-06-07 2002-12-18 Toppan Printing Co Ltd 表示装置
CN101097343A (zh) * 2006-06-29 2008-01-02 Lg.菲利浦Lcd株式会社 视角可控滤色器基板、具有该基板的液晶显示器及其制造方法
US20110261301A1 (en) * 2010-04-27 2011-10-27 Samsung Electronics Co., Ltd Display device
CN102879946A (zh) * 2012-09-26 2013-01-16 京东方科技集团股份有限公司 彩膜基板、液晶面板及彩膜基板的制备方法
CN103217832A (zh) * 2013-04-24 2013-07-24 京东方科技集团股份有限公司 彩色滤光片、彩色滤光片制作方法和显示装置

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