WO2014172989A1

WO2014172989A1 - Mask and manufacturing method therefor

Info

Publication number: WO2014172989A1
Application number: PCT/CN2013/077955
Authority: WO
Inventors: 侯学成; 徐少颖; 郭建
Original assignee: 北京京东方光电科技有限公司
Priority date: 2013-04-23
Filing date: 2013-06-26
Publication date: 2014-10-30
Also published as: CN103235451A

Abstract

A mask (1) and a manufacturing method therefor. The mask (1) comprises multiple controllable color change units (11) in array arrangement. The controllable color change units (11) are used for adjusting a light transmittance according to a control signal. By means of the mask (1), the controllable change of a euphotic region and a non-euphotic region can be implemented on a same mask, and frame sealing adhesive solidification can be performed on liquid crystal panels with different sizes by using one mask, thereby saving the manufacturing cost of the liquid crystal panels.

Description

Mask and manufacturing method thereof

The present disclosure relates to a mask and a method of fabricating the same. Background technique

The liquid crystal panel is the main component of the liquid crystal display. The liquid crystal panel includes a pair of box-shaped array substrates and a color filter substrate, and a liquid crystal filled between the array substrate and the color filter substrate. The liquid crystal panel is coated with a sealant to prevent the liquid crystal inside the liquid crystal panel from leaking out. The specific steps of the box include: applying a sealant on the matrix substrate or the color film substrate to form a surrounding space to prevent the instillation of the liquid crystal from flowing freely; filling the liquid crystal in the area surrounded by the sealant; The array substrate and the color film substrate are paired. In order to prevent the sealant from spreading out to contaminate the liquid crystal and cause product quality problems, the sealant is required to be cured.

The existing frame sealant curing is usually cured by ultraviolet light (UV Ultra Violet), but UV has a destructive effect on the liquid crystal. Therefore, it is necessary to make a mask when irradiating and curing the sealant with UV, and Place it on the LCD panel. The mask includes a substrate, and a pattern of a metal layer formed on a portion of the substrate corresponding to the display area of the liquid crystal panel to block UV rays, thereby preventing UV from damaging the liquid crystal. There is no metal layer on the substrate corresponding to the sealant, so the UV light can be irradiated on the sealant through the region to achieve the purpose of curing the sealant.

When the sealant is cured by the above method, since the size of the liquid crystal panel is different, it is necessary to manufacture a mask for each size of the liquid crystal panel, which increases the manufacturing cost of the liquid crystal panel. Summary of the invention

Embodiments of the present disclosure provide a mask and a manufacturing method thereof, which use a mask to cure a frame of a liquid crystal panel of different sizes, thereby saving the manufacturing cost of the panel.

In order to achieve the above object, embodiments of the present disclosure adopt the following technical solutions:

A mask comprising a plurality of controllable color changing units arranged in an array, the controllable color changing unit for adjusting the transmittance of light according to a control signal.

Specifically, the mask further includes a substrate, the controllable color changing unit is disposed on the substrate, and the controllable color changing unit comprises a bottom electrode, an ion storage layer, and an electric layer sequentially formed on the substrate. The cleavage layer, the electrochromic layer, and the top electrode.

In order to achieve controllability of the controllable color changing unit, the mask further includes a plurality of thin film transistors disposed on the substrate for generating the control signal according to an external signal; and a bottom layer of each of the controllable color changing units Electrodes are electrically connected to drains of each of the thin film transistors, respectively.

In order to protect the mask, the mask further includes a passivation layer formed on the thin film transistor and the plurality of color changeable units; the material of the passivation layer is a transparent insulating material.

Specifically, the thin film transistor includes a gate electrode, a gate insulating layer, an active layer, and a source/drain sequentially formed on the substrate.

In order to increase the transmittance of light, the material of the gate is a transparent conductive material.

In order to increase the transmittance of light, the material of the gate insulating layer is a transparent insulating material.

In order to increase the transmittance of light, the materials of the underlying electrode and the top electrode are transparent conductive materials.

A method of manufacturing a mask for forming the mask according to any of the above, the method comprising: forming a plurality of controllable color changing units arranged in an array, the controllable color changing unit being used for controlling The signal adjusts its transmittance to light.

Specifically, before the forming the plurality of controllable color changing units, the method further includes: providing a substrate; the forming the plurality of controllable color changing units arranged in the array comprises: step S1, forming a a transparent metal film layer, forming a gate of the thin film transistor and a bottom electrode of the controllable color changing unit by a patterning process; Step S2, sequentially forming a first insulating film layer and a semiconductor film layer on the structure of the step S1, forming a patterning process a gate insulating layer and an active layer of the thin film transistor; Step S3, forming a source/drain metal film layer on the structure of the step S2, forming a source and a drain of the thin film transistor by a patterning process; Step S4, completing step S3 Forming an ion storage membrane layer, an electrolyte membrane layer, an electrochromic membrane layer and a second transparent metal membrane layer in sequence, forming an ion storage layer, an electrolyte layer, an electrochromic layer and a top electrode of the controllable color changing unit by a patterning process Step S5, forming a second insulating film layer on the structure completing step S4, and forming a passivation layer by a patterning process.

The mask provided by the embodiment of the present disclosure includes a plurality of controllable color changing units arranged in an array, because the controllable color changing unit adjusts its transmittance to light according to the control signal, so the mask in the display area of the corresponding display panel On the film panel, by inputting a certain control signal to the controllable color changing unit, the controllable color changing unit is opaque to block the light, thereby preventing the light from damaging the liquid crystal; in the area corresponding to the sealant on the mask board, The control signal is input to the controllable color changing unit, so that the controllable color changing unit is in a light transmitting state, and the light can be irradiated on the sealing frame glue through the area to achieve the purpose of curing the sealing frame glue. Therefore, the controllable change of the range of the transparent region and the range of the opaque region on the same mask can be realized, and a mask can be used to cure the frame of the different sizes of the liquid crystal panel, thereby saving the display. The manufacturing cost of the panel. DRAWINGS

In order to more clearly illustrate the technical solutions in the present disclosure or the prior art, the drawings to be used in the technical solutions provided in the present disclosure or in the description of the prior art will be briefly described below, and obviously, the attached in the following description The drawings are merely illustrative of some specific embodiments of the technical solutions of the present disclosure, and those skilled in the art can obtain other drawings according to the drawings without any creative work.

FIG. 1 is a schematic structural diagram of a mask according to an embodiment of the present disclosure;

Figure 2 is a partial enlarged structural view of the mask shown in Figure 1 including a complete controllable color changing unit;

3 is a flow chart of a manufacturing method of a mask provided by an embodiment of the present disclosure; and FIG. 4 to FIG. 8 are structures formed by each step of another manufacturing method of the mask provided by the embodiment of the present disclosure. A schematic cross-sectional view of the AA position in FIG. detailed description

The technical solutions in the embodiments of the present disclosure are clearly and completely described in the following with reference to the drawings in the embodiments of the present disclosure. It is obvious that the described embodiments are only a part of the embodiments of the present disclosure, and not all of the embodiments. All other embodiments obtained by a person of ordinary skill in the art based on the embodiments of the present disclosure without departing from the inventive scope are the scope of the disclosure.

Unless otherwise defined, technical terms or scientific terms used herein shall be taken to mean the ordinary meaning of the ordinary skill in the art to which the invention pertains. The words "first", "second" and similar terms used in the specification and claims of the disclosure are not intended to indicate any order, quantity, or importance, but only to distinguish different components. Similarly, the words "a" or "an" do not denote a quantity limitation, but rather mean that there is at least one. "Connected" or "connected" and the like are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "Upper", "lower", "left", "right", etc. are only used to indicate the relative positional relationship, and when the absolute position of the object to be described is changed, the relative positional relationship is also changed accordingly. The embodiment of the present disclosure provides a mask. As shown in FIG. 1, the mask 1 includes a plurality of controllable color changing units 11 arranged in an array, and the controllable color changing unit 11 is configured to adjust the light to the light according to the control signal. Transmittance.

The mask 1 provided by the embodiment of the present disclosure includes a plurality of controllable color changing units 11 arranged in an array. Because the controllable color changing unit 11 adjusts its transmittance to light according to the control signal, the controllable color changing unit is input to the controllable color changing unit 11 by inputting a certain control signal on the mask corresponding to the display area of the display panel. 11 is opaque to block light, thereby preventing light from damaging the liquid crystal; in the area corresponding to the sealant on the mask, by inputting a control signal to the controllable color changing unit 11, the controllable color changing unit 11 is in a light transmitting state. The light can be irradiated on the sealant through the area to achieve the purpose of curing the sealant. Therefore, the controllable change of the range of the transparent region and the range of the opaque region on the same mask can be realized, and a mask can be used to cure the frame of different sizes of the display panel, thereby saving manufacturing. cost.

Of course, the mask of the present embodiment is not limited to use in the manufacturing process of the display panel, and can be applied to other fields requiring a mask.

As shown in Figs. 2 and 8, the mask 1 described in the above embodiment may include a substrate 21 and a controllable color changing unit 11 disposed on the substrate 21. Moreover, the controllable color changing unit 11 can utilize the principle of electrochromic to achieve an adjustable transmittance. Specifically, the controllable color changing unit 11 may include a bottom electrode 111, an ion storage layer 112, an electrolyte layer 113, an electrochromic layer 114, and a top electrode 115 which are sequentially formed on the substrate 21. Both the bottom electrode 111 and the top electrode 115 can be made of a transparent material, and the transmittance of the light of the controllable color changing unit 11 can be increased. The phenomenon that the controllable color changing unit 11 undergoes a stable and reversible color change under the action of an applied electric field exhibits a reversible change in color and transparency in appearance. The ion storage layer 112 is preferably formed of nickel oxide, and the electrolyte layer 113 is preferably a solid lithium salt such as lithium gallate or lithium niobate, and the electrochromic layer 114 is preferably tungsten trioxide or hafnium oxide.

The substrate 21 may be a substrate substrate based on an inorganic material such as a glass substrate or a quartz substrate, or may be a substrate substrate made of an organic material.

Of course, the structure of the controllable color changing unit 11 is not limited to that shown in Fig. 2, and other structures known to those skilled in the art may be employed as long as it can achieve the purpose of adjusting the transmittance of light.

The black solid arrow A in Fig. 2 indicates that the following Figs. 4 to 8 are sectional views at the A-A position. As shown in FIG. 2 and FIG. 8, the mask described in the above embodiment may further include a substrate disposed on the substrate.

A plurality of thin film transistors 12 on 21 are used to generate a control signal based on an external signal. And each controllable The bottom electrode 111 of the color changing unit 11 is electrically connected to the drain 124 of each of the thin film transistors, respectively. The thin film transistor 12 is electrically connected to the bottom transparent electrode 111 of the controllable color changing unit 11 through the drain 124 to input a control signal to the controllable color changing unit 11 to realize control of the controllable color changing unit 11. When the external signals are different, the thin film transistor 12 controls the transmittance of the controllable color changing unit 11 to light. When the sealant in the display panel is cured by using the mask of the embodiment, an external circuit can be connected for inputting an external signal to the thin film transistor 12 in the mask to control the color-controllable unit 11 Transmittance to light.

As shown in FIG. 8, the mask described in the above embodiment may further include a passivation layer 22 formed on the thin film transistor 12 and the plurality of controllable color changing units 11. The passivation layer 22 material may be a transparent insulating material. It is preferably one or more of silicon nitride, a photosensitive resin or a non-photosensitive resin. The passivation layer 22 functions as a protective mask, and the transparent passivation layer 22 material has a high light transmittance.

In the mask described in the above embodiment, as shown in FIG. 8, the patterns of the gate electrode 121, the gate insulating layer 122, the active layer 123, and the source/drain electrodes 124 of the thin film transistor 12 may be sequentially formed on the substrate 21. on. The gate electrode 121, the gate insulating layer 122, the active layer 123, and the source/drain 124 sequentially formed on the substrate 21 constitute a thin film transistor 12, and the thin film transistor 12 is disposed such that the gate of the thin film transistor 12 can be 121 is formed in the same layer as the bottom electrode 111 of the controllable color changing unit 11, that is, the gate electrode 121 and the bottom electrode 111 can be simultaneously formed in one photolithography step, thereby saving process steps and thereby reducing the mask Production costs.

In the mask described in the above embodiment, the material of the gate electrode 121 may be a transparent conductive material. It is preferably indium tin oxide or tin oxide, and the transparent conductive material has a high light transmittance.

In the mask described in the above embodiment, the gate insulating layer 122 may be a transparent insulating material. The transparent insulating material has a high light transmittance, preferably silicon nitride, a resin material or a non-resin material. In the mask described in the above embodiments, the materials of the bottom electrode 111 and the top electrode 115 may be transparent conductive materials. Preferably, each is indium tin oxide or tin oxide, and the transparent conductive material has a high light transmittance.

Embodiments of the present disclosure further provide a method of fabricating a mask for forming the mask described in the above embodiments. The method comprises: forming a plurality of controllable color changing units arranged in an array on a substrate, the controllable color changing unit for adjusting the transmittance of the light according to the control signal.

The mask provided by the embodiment of the present disclosure includes a plurality of controllable color changing units arranged in an array. Because the controllable color changing unit adjusts its transmittance to light according to the control signal, the control signal is changed by inputting a certain control signal to the controllable color changing unit on the mask corresponding to the display area of the display panel. The color unit is opaque to block light, thereby preventing light from damaging the liquid crystal; in the area corresponding to the sealant on the mask, the controllable color changing unit controls the signal, so that the controllable color changing unit is in a light transmitting state. Light can be irradiated on the sealant through the area to achieve the purpose of curing the sealant. Therefore, the controllable change of the range of the transparent region and the range of the opaque region on the same mask can be realized, and a mask can be used to cure the frame of the different sizes of the liquid crystal panel, thereby saving the display. The manufacturing cost of the panel.

As a further refinement of the method described in the above embodiments, the embodiment of the present disclosure also provides a method of manufacturing a mask. As shown in FIG. 3 and FIG. 4 to FIG. 8 , the method specifically includes the following steps.

Step 301, providing a substrate 21.

Step 302: forming a first transparent metal film layer on the substrate 21, and forming a pattern including the gate electrode 121 and the bottom electrode 111 by a patterning process.

As shown in FIG. 4, the first transparent metal film layer having a thickness of 100 nm to 300 nm is formed on the substrate 21, and the gate electrode 121 and the bottom electrode layer 111 are simultaneously formed by one patterning process, thereby increasing the light. Transmittance saves process steps.

Step 303, sequentially forming a first insulating film layer and a semiconductor film layer on the structure of the step 302, and forming the gate insulating layer 122 and the active layer 123 by a patterning process, respectively.

As shown in FIG. 5, the first insulating film layer having a thickness of 300 nm to 500 nm and the semiconductor film layer having a thickness of 30 nm to 250 nm are sequentially formed, and the gate insulating layer 122 and the active layer are simultaneously formed by one patterning process. Layer 123 saves process steps.

Step 304: Form a source/drain metal film layer on the structure of the step 303, and form a source and a drain 124 by a patterning process.

This step is shown in Fig. 6. The source and drain electrodes 124 are electrode structures whose names are interchangeable. A source-drain metal film layer having a thickness of 200 nm to 450 nm is formed, and the source-drain metal film layer is preferably a phase, an aluminum, an aluminum alloy, and a multilayer combination thereof, and the source and drain electrodes 124 are formed by one patterning process.

Step 305, sequentially forming an ion storage membrane layer, an electrolyte membrane layer, an electrochromic film layer, and a top transparent electrode film layer on the structure of the step 304, and forming an ion storage layer 112, an electrolyte layer 113, and an electrochromic layer by a patterning process. 114 and top electrode 115. The bottom electrode 111, the ion storage layer 112, the electrolyte layer 113, the electrochromic layer 114, and the top electrode 115 constitute a controllable color changing unit 11.

This step is as shown in FIG. 7, and an ion storage membrane layer, an electrolyte membrane layer, and an electrochromic film are sequentially formed. Layer and top transparent electrode film layer, forming ion storage layer 112 and electrolyte layer by one patterning process

113. Electrochromic layer 114 and top transparent electrode 115. Further, the bottom transparent electrode 111 formed in the step 302 forms the controllable color changing unit 11, and the pattern of the controllable color changing unit 11 is formed by two patterning processes, and the production step is single.

Step 306, forming a second insulating film layer on the structure of the step 305, and forming a passivation layer 22 by a patterning process.

This step is shown in Fig. 8. The final step is to form a second insulating film layer having a thickness of 150 nm to 1500 nm, and a passivation layer 22 is formed by one patterning process to protect the mask plate manufactured in this embodiment.

The thickness of each of the above film layers is in a preferred range. If the film layers are too thin, the electrical resistance is too large, which affects the introduction of electrical signals. If the film layers are too thick, the time of each production process is extended and the layers are made. When it is lapped, it is easy to break at the lap joint. The above-mentioned methods for forming each film layer are usually deposited, coated, sputtered, etc.; the patterning process generally includes a process of photoresist coating, exposure, development, etching, photoresist stripping, and the like.

The mask provided by the embodiment of the present disclosure includes a plurality of controllable color changing units arranged in an array, because the controllable color changing unit adjusts its transmittance to light according to the control signal, so the mask in the display area of the corresponding display panel On the film panel, by inputting a certain control signal to the controllable color changing unit, the controllable color changing unit is opaque to block the light, thereby preventing the light from damaging the liquid crystal; in the area corresponding to the sealant on the mask board, The control signal is input to the controllable color changing unit, so that the controllable color changing unit is in a light transmitting state, and the light can be irradiated on the sealing frame glue through the area to achieve the purpose of curing the sealing frame glue. Therefore, the controllable change of the range of the transparent region and the range of the opaque region on the same mask can be realized, and a mask can be used to cure the frame of the different sizes of the liquid crystal panel, thereby saving the display. The manufacturing cost of the panel.

The embodiments of the present disclosure are mainly applicable to the design and manufacture of a mask in the field of mask exposure technology. The above embodiments are merely illustrative of the disclosure, and are not intended to limit the scope of the disclosure, and various changes and modifications may be made without departing from the spirit and scope of the disclosure. The equivalent technical solutions are also within the scope of the disclosure, and the scope of the patent protection of the disclosure should be defined by the claims.

Claims

claims

1. A mask, characterized in that it includes a plurality of controllable color-changing units arranged in an array, and the controllable color-changing units are used to adjust their transmittance to light according to a control signal.

2. The mask according to claim 1, further comprising a substrate, the controllable discoloration unit is disposed on the substrate, and the controllable discoloration unit includes elements formed sequentially on the substrate. Bottom electrode, ion storage layer, electrolyte layer, electrochromic layer and top electrode.

3. The mask according to claim 2, further comprising a plurality of thin film transistors disposed on the substrate for generating the control signal according to external signals; and each of the controllable discoloration The bottom electrode of the unit is electrically connected to the drain of each thin film transistor respectively.

4. The mask of claim 3, further comprising a passivation layer formed on the thin film transistor and the plurality of controllable color changing units; the passivation layer is made of a transparent insulating material. Material.

5. The mask according to claim 3, wherein the thin film transistor includes a gate electrode, a gate insulating layer, an active layer and a source/drain electrode formed sequentially on the substrate.

6. The mask plate according to claim 5, characterized in that the material of the gate electrode is a transparent conductive material.

7. The mask plate according to claim 5, characterized in that the material of the gate insulating layer is a transparent insulating material.

8. The mask according to claim 2, characterized in that the materials of the bottom electrode and the top electrode are transparent conductive materials.

9. A method for manufacturing a mask, characterized in that it is used to form the mask according to any one of claims 1 to 8, and the method includes:

A plurality of controllable color-changing units are formed in an array arrangement, and the controllable color-changing units are used to adjust their transmittance to light according to the control signal.

10. The manufacturing method of a mask according to claim 9, characterized in that, before forming the plurality of controllable discoloration units, it further includes: providing a substrate;

The plurality of controllable color-changing units forming an array arrangement include:

Step S1, forming a first transparent metal film layer on the substrate, and forming the gate electrode of the thin film transistor and the bottom electrode of the controllable color change unit through a patterning process;

Step S2, sequentially forming a first insulating film layer and a semiconductor film layer on the structure that completed step S1, Form the gate insulating layer and active layer of the thin film transistor through a patterning process;

Step S3: Form a source and drain metal film layer on the structure that completed step S2, and form the source and drain of the thin film transistor through a patterning process;

Step S4: sequentially form an ion storage film layer, an electrolyte film layer, an electrochromic film layer and a second transparent metal film layer on the structure that completed step S3, and form the ion storage layer and electrolyte of the controllable color change unit through a patterning process. layer, electrochromic layer and top electrode; and

Step S5: Form a second insulating film layer on the structure completed in step S4, and form a passivation layer through a patterning process.