CN201867584U - Mask - Google Patents
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- Publication number
- CN201867584U CN201867584U CN2010206364831U CN201020636483U CN201867584U CN 201867584 U CN201867584 U CN 201867584U CN 2010206364831 U CN2010206364831 U CN 2010206364831U CN 201020636483 U CN201020636483 U CN 201020636483U CN 201867584 U CN201867584 U CN 201867584U
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- Prior art keywords
- mask
- polarizing device
- substrate
- liquid crystal
- light
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Abstract
The utility model discloses a mask comprising a first base plate and a second base plate arranged for a box and a driving unit. Array pixel units are arranged below the first base plate, and each pixel unit comprises a TFT (Thin Film Transistor); a transparent electric conduction layer is arranged above the second base plate; liquid crystal is filled between the transparent electric conduction layer and the array pixel units; alignment film layers are arranged on the surfaces of the transparent electric conduction layer and the array pixel units, and used for arranging liquid crystal molecules along oriented slots on the surfaces of the alignment film layers; a first light polarizing element is arranged above the first base plate; a second light polarizing element is arranged below the second base plate; and the driving unit is used for applying same voltage on the array pixel units so as to control the passing strength of incident light of the mask. For the mask, various light shading patterns can be formed on the mask according to patterns needed by exposure, elements to be exposed can be shielded in the exposure process of the various elements to be exposed, and the application range of the mask is wide.
Description
Technical field
The utility model relates to the mask exposure technology, relates in particular to a kind of mask.
Background technology
At present, mask is widely used in electron trade and shows industry, is mainly used in when exposure, and the exposure device for the treatment of of the surface being smeared the photoresist layer graphically blocks, and realizes treating the surface selectivity exposure of exposure device.
Existing mask, in case preparation is finished, its shading and transmission region are changeless, therefore, only are applicable to the specific exposure device for the treatment of.
The utility model content
The utility model provides a kind of mask, can form different shading graph, to be applicable to the various exposure devices for the treatment of.
The utility model provides a kind of mask, comprising:
First substrate and second substrate to the box setting;
Described first substrate below is provided with the pixelated array unit, and each described pixel cell comprises a thin film transistor (TFT) TFT;
Described second substrate top is provided with transparency conducting layer;
Filling liquid crystal between described transparency conducting layer and the described pixelated array unit;
Described transparency conducting layer and described pixelated array cell surface are respectively equipped with the orientation rete, are used to make liquid crystal molecule to arrange along the orientation slots of described alignment film laminar surface;
Described first substrate top is provided with first polarizing device;
Described second substrate below is provided with second polarizing device;
Also comprise driver element, be used for applying voltage gradation, pass through intensity with the incident light of controlling described mask to described pixelated array unit.
Aforesaid mask, the absorption axes angle of described first polarizing device and described second polarizing device is the 80-90 degree.
Aforesaid mask, the absorption axes angle of described first polarizing device and described second polarizing device is the 0-10 degree.
Aforesaid mask, described first polarizing device top is provided with the blast rete, is used to improve described mask utilization of incident light.
Aforesaid mask, described first polarizing device is the wide-angle polarizing device.
Aforesaid mask, described second polarizing device is the wide-angle polarizing device.
Aforesaid mask, described transparency conducting layer are transparent indium tin metal oxide layer.
The mask that the utility model provides, according to the required figure of exposure, by driver element the pixelated array unit in the mask is applied voltage gradation, incident light with the control mask passes through intensity, the semi-transparent zone and the lightproof area that make and form transmission region on the mask, have different gray scales, thus various light-shielding patterns on mask, formed, can be in the multiple exposure technology for the treatment of exposure device, treat exposure device and block, have wide range of applications.
Description of drawings
The structural representation of liquid crystal display device in the mask that Fig. 1 provides for the utility model;
The electric signal that Fig. 2 applies for driver element and the graph of relation of light penetration;
The light control chart that Fig. 3 exposes for the mask that adopts the utility model to provide.
Reference numeral:
1-first substrate; 2-second substrate; 3-pixelated array unit;
The 4-transparency conducting layer; The 5-liquid crystal; 6-orientation rete;
7-first polarizing device; 8-second polarizing device; 9-treats exposure device;
The 10-transmission region; The 11-lightproof area; The semi-transparent zone of 12-.
Embodiment
For the purpose, technical scheme and the advantage that make the utility model embodiment clearer, below in conjunction with the accompanying drawing among the utility model embodiment, technical scheme among the utility model embodiment is clearly and completely described, obviously, described embodiment is the utility model part embodiment, rather than whole embodiment.Based on the embodiment in the utility model, those of ordinary skills are not making the every other embodiment that is obtained under the creative work prerequisite, all belong to the scope of the utility model protection.
Referring to Fig. 1, mask first embodiment that the utility model provides, this mask comprises: to first substrate 1 and second substrate 2 of box setting;
First substrate, 1 below is provided with pixelated array unit 3, and each pixel cell comprises a thin film transistor (TFT) TFT;
Second substrate, 2 tops are provided with transparency conducting layer 4;
Filling liquid crystal 5 between transparency conducting layer 4 and the pixelated array unit 3;
Transparency conducting layer 4 and 3 surfaces, pixelated array unit are respectively equipped with orientation rete 6, are used to make liquid crystal molecule to arrange along the orientation slots on orientation rete 6 surfaces;
First substrate, 1 top is provided with first polarizing device 7;
Described second substrate 2 belows are provided with second polarizing device 8;
This mask also comprises: the driver element (not shown), be used for applying voltage gradation to pixelated array unit 3, and pass through intensity with the incident light of controlling mask.
The mask that the utility model embodiment provides can be widely used in electron trade and show industry, for example: printed circuit board (PCB) (Printed Circuit Board; PCB) preparation technology, the manufacturing process of LCD etc.
The mask that present embodiment provides, according to the required figure of exposure, by driver element the pixelated array unit in the mask is applied voltage gradation, incident light with the control mask passes through intensity, the semi-transparent zone and the lightproof area that make and form transmission region on the mask, have different gray scales, thus various light-shielding patterns on mask, formed, can be in the multiple exposure technology for the treatment of exposure device, treat exposure device and block, have wide range of applications.
The mask that the utility model provides, Bao Guang figure as required, the zones of different in pixelated array unit 3 applies different voltage gradations, to form transmission region, semi-transparent zone and lightproof area on mask.
In pixelated array unit 3, each pixel cell is arranged, and the shared area of each pixel cell is extremely small, and it is very careful, intensive that the pixel cell in the pixelated array unit 3 distributes.Therefore, driver element applies voltage gradation to array pixel cell 3, specifically can refine to the brightness of each pixel cell is regulated, thereby can form complete transmission region, semi-transparent zone and lightproof area on mask.Because the voltage that applies is voltage gradation, the voltage that promptly applies can have a plurality of grades, the magnitude of voltage that each grade is corresponding different, and therefore, semi-transparent zone can have different gray scales, can realize the various GTGs of various exposure figures and figure.
In order to make the exposure figure that forms on the mask more accurate, can reduce the size of each pixel cell on the pixelated array unit 3 as much as possible, and, increase its aperture opening ratio as much as possible, to improve the utilization factor of light.
In addition, the optical index coefficient of liquid crystal material is one and spectral correlation connection parameter, the optical anisotropy that different wavelength is corresponding different.Therefore, can be according in the exposure technology, the employed spectrum of exposure machine is optimized accordingly, and the liquid crystal material that the selective light specific refractivity is suitable makes it have maximum light penetration, thereby improves the light utilization ratio.
First substrate, 1 top is provided with first polarizing device, 7, the second substrates, 2 belows second polarizing device 8 also is set.There are certain dependence in characteristics such as the transmitance of polarizing device and wavelength, can use in the spectral range at exposure machine in view of the above, select the polarizing device of better transmitance and polarisation efficient, make the spectrum that uses in the exposure machine normally pass through liquid crystal display device.
Driver element is used for applying voltage gradation to pixelated array unit 3, between pixelated array unit 3 below first substrate 1 and transparency conducting layer 4, forming electric potential difference at second substrate 2, under the effect of electric potential difference, change the intensity of pass through of incident light on the mask, make mask formation shading graph.
Second polarizing device 8 of first polarizing device 7 of first substrate, 1 top and second substrate, 2 belows, the absorption axes angle between the two can be the 80-90 degree, and is preferred, the absorption axes angle between the two is 90 degree; Perhaps the absorption axes angle between the two can also be the 0-10 degree, and is preferred, and the absorption axes angle between the two is 0 degree.Filling liquid crystal 5 between first substrate 1 and second substrate 2 by the control of orientation rete 6, makes first substrate 1 become 90 degree twist angles with the liquid crystal material of 2 of second substrates.
Because liquid crystal material has optical anisotropy, therefore, liquid crystal material can change the polarization state of light.When driver element applies voltage gradation to array pixel cell 3, with the absorption axes angle between first polarizing device 7 and second polarizing device 8 is that 90 degree are that example describes: electric field is 0 between the transparency conducting layer 4 of the pixel cell on first substrate 1 and second substrate 2, liquid crystal molecule does not deflect, the polarized light polarization direction that liquid crystal layer is injected first polarizing device 7 is revolved and is turn 90 degrees, light can be penetrated by second polarizing device 8, therefore, can form transmission region; And the electric field between the transparency conducting layer 4 of the pixelated array unit 3 on first substrate 1 and second substrate 2 is greater than 0, then liquid crystal molecule deflects, change the phase differential of liquid crystal layer, thereby change the polarization polarized state of light that enters from first polarizing device 7, light can part be passed by second polarizing device 8, the voltage that applies is big more, the light intensity of outgoing is more little, when reaching a saturation voltage, light can not be passed by second polarizing device 8, can form complete lightproof area.
Be that 0 degree is that example describes with the absorption axes angle between first polarizing device 7 and second polarizing device 8 again: electric field is 0 between the transparency conducting layer 4 of the pixel cell on first substrate 1 and second substrate 2, liquid crystal molecule does not deflect, the polarized light polarization direction that liquid crystal layer is injected first polarizing device 7 is revolved and is turn 90 degrees, then light can't penetrate from second polarizing device 8, therefore, can form lightproof area; And the electric field between the transparency conducting layer 4 of the pixelated array unit 3 on first substrate 1 and second substrate 2 is greater than 0, then liquid crystal molecule deflects, change the phase differential of liquid crystal layer, thereby change the polarization polarized state of light that enters from first polarizing device 7, light can part be passed by second polarizing device 8, the voltage that applies is big more, the light intensity of outgoing is big more, and when reaching a saturation voltage, complete second polarizing device of light passes, therefore, can form transmission region.
As seen from the above, the absorption axes angle between second polarizing device 8 of first polarizing device 7 of first substrate, 1 top and second substrate, 2 belows preferably can be the 0-10 degree, can also be the 80-90 degree.When selecting a certain angle, between first substrate 1 and second substrate 2, apply suitable voltage, just can form printing opacity, part printing opacity or lightproof area.
The electric signal that Fig. 2 applies for driver element and the graph of relation of light penetration, ordinate is represented light penetration, scope from 0.0% to 100%, horizontal ordinate is represented in the liquid crystal display device in pixelated array unit 3 below first substrate 1 and the electric potential difference between the transparency conducting layer 4 above second substrate 2, promptly put on the voltage at liquid crystal layer two ends, this voltage can be regulated according to exposure figure by driver element, the corresponding relation of this voltage of liquid crystal layer of curve representation and light penetration.Fig. 2 correspondence be that absorption axes angle between second polarizing device 8 of first polarizing device 7 of first substrate, 1 top and second substrate, 2 belows is the situation of 80-90 when spending, concrete:
Do not having under the situation of impressed voltage, corresponding pixel cell is shown as bright attitude, and light can see through, and along with the increase of voltage, transmitance constantly reduces, and light can partly see through, and when reaching capacity voltage, pixel cell is dark attitude, and light can't pass through.Thereby the semi-transparent zone that can on mask, form transmission region, lightproof area and have different gray scales.
The light control chart that the mask that provides referring to employing the utility model shown in Figure 3 is exposed.Treat exposure device 9 under mask, light is through mask, if the pixel cell of corresponding region is bright attitude on the mask, then light can see through, and forms transmission region 10 on mask; If the pixel cell of corresponding region is dark attitude on the mask, then light can't pass through, and forms lightproof area 11 on mask; If the pixel cell of corresponding region is shown as GTG on the mask, then light can partly see through, and the transmitance of light can be regulated formation semi-transparent regional 12 on mask by driver element.
The mask that the utility model embodiment provides can be widely used in electron trade and show industry, and for example: at present, the product in a lot of fields has all used information system management in production and manufacturing process, identification code need be set on product.And the identification code of every kind of product all is different, the mask that adopts the utility model to provide, form in the technology of identification code figure in exposure, by driver element the liquid crystal display device as mask is applied signal, the zone that forms identification code at needs generates corresponding shading graph, finishes the exposure of identification code and makes, and adopts a mask various identification code figures that just can expose, shorten the production time, saved production cost.
Further, preferred, transparency conducting layer 4 can be transparent indium tin metal oxide layer (ITO);
In addition, can also above first polarizing device 7, the blast rete be set, further improve the utilization factor of light.
Further, because there is the problem at visual angle in liquid crystal display device, promptly to inject the transmitance of LCD from different perspectives be different to light.For the light penetration that makes zones of different homogeneous more, first polarizing device 7 and second polarizing device 8 can adopt the wide viewing angle polarizing device, and the light penetration that makes the exposure area diverse location is homogeneous more.
It should be noted that at last: above embodiment only in order to the explanation the technical solution of the utility model, is not intended to limit; Although the utility model is had been described in detail with reference to previous embodiment, those of ordinary skill in the art is to be understood that: it still can be made amendment to the technical scheme that aforementioned each embodiment put down in writing, and perhaps part technical characterictic wherein is equal to replacement; And these modifications or replacement do not make the essence of appropriate technical solution break away from the spirit and scope of each embodiment technical scheme of the utility model.
Claims (7)
1. a mask is characterized in that, comprising:
First substrate and second substrate to the box setting;
Described first substrate below is provided with the pixelated array unit, and each described pixel cell comprises a thin film transistor (TFT) TFT;
Described second substrate top is provided with transparency conducting layer;
Filling liquid crystal between described transparency conducting layer and the described pixelated array unit;
Described transparency conducting layer and described pixelated array cell surface are respectively equipped with the orientation rete, are used to make liquid crystal molecule to arrange along the orientation slots of described alignment film laminar surface;
Described first substrate top is provided with first polarizing device;
Described second substrate below is provided with second polarizing device;
Also comprise driver element, be used for applying voltage gradation, pass through intensity with the incident light of controlling described mask to described pixelated array unit.
2. mask according to claim 1 is characterized in that, the absorption axes angle of described first polarizing device and described second polarizing device is the 80-90 degree.
3. mask according to claim 1 is characterized in that, the absorption axes angle of described first polarizing device and described second polarizing device is the 0-10 degree.
4. according to each described mask of claim 1-3, it is characterized in that described first polarizing device top is provided with the blast rete, is used to improve described mask utilization of incident light.
5. mask according to claim 4 is characterized in that, described first polarizing device is the wide-angle polarizing device.
6. mask according to claim 5 is characterized in that, described second polarizing device is the wide-angle polarizing device.
7. mask according to claim 6 is characterized in that, described transparency conducting layer is transparent indium tin metal oxide layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010206364831U CN201867584U (en) | 2010-11-26 | 2010-11-26 | Mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010206364831U CN201867584U (en) | 2010-11-26 | 2010-11-26 | Mask |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201867584U true CN201867584U (en) | 2011-06-15 |
Family
ID=44138736
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010206364831U Expired - Lifetime CN201867584U (en) | 2010-11-26 | 2010-11-26 | Mask |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201867584U (en) |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103235451A (en) * | 2013-04-23 | 2013-08-07 | 北京京东方光电科技有限公司 | Mask and production method thereof |
| CN103955088A (en) * | 2014-05-12 | 2014-07-30 | 青岛斯博锐意电子技术有限公司 | High-performance liquid crystal photomask and application thereof |
| CN103955087A (en) * | 2014-05-12 | 2014-07-30 | 青岛斯博锐意电子技术有限公司 | Liquid crystal photomask and application thereof as well as plate making device |
| CN105182628A (en) * | 2015-10-26 | 2015-12-23 | 京东方科技集团股份有限公司 | Mask plate and composition process system and method |
| CN105301892A (en) * | 2015-11-09 | 2016-02-03 | 中国船舶重工集团公司第七一九研究所 | Method for making real-time mask on basis of OLED/OLEC luminous principle |
| CN105892111A (en) * | 2016-06-14 | 2016-08-24 | 深圳市华星光电技术有限公司 | Photomask equipment and method of manufacturing photocured product |
| WO2018161560A1 (en) * | 2017-03-10 | 2018-09-13 | 京东方科技集团股份有限公司 | Mask plate and manufacturing method thereof, and light-shielding device and control method thereof |
| CN108628053A (en) * | 2018-05-09 | 2018-10-09 | 深圳市华星光电技术有限公司 | UV mask plates and preparation method thereof |
| CN108873598A (en) * | 2018-08-16 | 2018-11-23 | 京东方科技集团股份有限公司 | Mask set and its control method |
| CN109856919A (en) * | 2017-11-30 | 2019-06-07 | 上海微电子装备（集团）股份有限公司 | Diaphragm mask device, edge exposure camera lens and lithography system |
| CN111142326A (en) * | 2020-01-02 | 2020-05-12 | 京东方科技集团股份有限公司 | Digital exposure machine |
-
2010
- 2010-11-26 CN CN2010206364831U patent/CN201867584U/en not_active Expired - Lifetime
Cited By (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103235451A (en) * | 2013-04-23 | 2013-08-07 | 北京京东方光电科技有限公司 | Mask and production method thereof |
| CN103955087B (en) * | 2014-05-12 | 2017-01-04 | 青岛斯博锐意电子技术有限公司 | Liquid crystal photomask, application thereof and plate making device |
| CN103955088A (en) * | 2014-05-12 | 2014-07-30 | 青岛斯博锐意电子技术有限公司 | High-performance liquid crystal photomask and application thereof |
| CN103955087A (en) * | 2014-05-12 | 2014-07-30 | 青岛斯博锐意电子技术有限公司 | Liquid crystal photomask and application thereof as well as plate making device |
| CN103955088B (en) * | 2014-05-12 | 2017-02-22 | 青岛斯博锐意电子技术有限公司 | Liquid crystal photomask and application thereof |
| CN105182628A (en) * | 2015-10-26 | 2015-12-23 | 京东方科技集团股份有限公司 | Mask plate and composition process system and method |
| WO2017071354A1 (en) * | 2015-10-26 | 2017-05-04 | 京东方科技集团股份有限公司 | Mask plate, exposure system and exposure method |
| US10620541B2 (en) | 2015-10-26 | 2020-04-14 | Boe Technology Group Co., Ltd. | Mask plate, exposure system and exposure method |
| CN105301892A (en) * | 2015-11-09 | 2016-02-03 | 中国船舶重工集团公司第七一九研究所 | Method for making real-time mask on basis of OLED/OLEC luminous principle |
| CN105892111A (en) * | 2016-06-14 | 2016-08-24 | 深圳市华星光电技术有限公司 | Photomask equipment and method of manufacturing photocured product |
| CN105892111B (en) * | 2016-06-14 | 2019-05-07 | 深圳市华星光电技术有限公司 | Light shield equipment and the method for making photocuring product |
| WO2018161560A1 (en) * | 2017-03-10 | 2018-09-13 | 京东方科技集团股份有限公司 | Mask plate and manufacturing method thereof, and light-shielding device and control method thereof |
| US10969643B2 (en) | 2017-03-10 | 2021-04-06 | Boe Technology Group Co., Ltd. | Mask and manufacturing method thereof, and light shielding device and control method thereof |
| CN109856919B (en) * | 2017-11-30 | 2020-04-10 | 上海微电子装备（集团）股份有限公司 | Diaphragm blocking piece device, edge exposure lens and photoetching system |
| CN109856919A (en) * | 2017-11-30 | 2019-06-07 | 上海微电子装备（集团）股份有限公司 | Diaphragm mask device, edge exposure camera lens and lithography system |
| WO2019214002A1 (en) * | 2018-05-09 | 2019-11-14 | 深圳市华星光电技术有限公司 | Uv mask plate and fabrication method therefor |
| CN108628053A (en) * | 2018-05-09 | 2018-10-09 | 深圳市华星光电技术有限公司 | UV mask plates and preparation method thereof |
| CN108873598A (en) * | 2018-08-16 | 2018-11-23 | 京东方科技集团股份有限公司 | Mask set and its control method |
| CN108873598B (en) * | 2018-08-16 | 2021-10-12 | 京东方科技集团股份有限公司 | Mask device and control method thereof |
| US11194193B2 (en) | 2018-08-16 | 2021-12-07 | Boe Technology Group Co., Ltd. | Mask assembly, mask apparatus and mask control method |
| CN111142326A (en) * | 2020-01-02 | 2020-05-12 | 京东方科技集团股份有限公司 | Digital exposure machine |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20110615 |