CN103955087A - Liquid crystal photomask and application thereof as well as plate making device - Google Patents
Liquid crystal photomask and application thereof as well as plate making device Download PDFInfo
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- CN103955087A CN103955087A CN201410197564.9A CN201410197564A CN103955087A CN 103955087 A CN103955087 A CN 103955087A CN 201410197564 A CN201410197564 A CN 201410197564A CN 103955087 A CN103955087 A CN 103955087A
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- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 107
- 230000003287 optical effect Effects 0.000 claims abstract description 118
- 238000003384 imaging method Methods 0.000 claims abstract description 14
- 230000010287 polarization Effects 0.000 claims abstract description 7
- 230000005540 biological transmission Effects 0.000 claims description 9
- 239000004988 Nematic liquid crystal Substances 0.000 claims description 6
- 230000000694 effects Effects 0.000 claims description 6
- 238000004026 adhesive bonding Methods 0.000 claims description 5
- 238000000034 method Methods 0.000 description 23
- 230000008569 process Effects 0.000 description 17
- 238000007639 printing Methods 0.000 description 12
- 238000004519 manufacturing process Methods 0.000 description 10
- 239000000428 dust Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 5
- 238000004587 chromatography analysis Methods 0.000 description 4
- 238000006073 displacement reaction Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000004804 winding Methods 0.000 description 4
- 239000000969 carrier Substances 0.000 description 3
- 238000001259 photo etching Methods 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 230000003750 conditioning effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 239000004986 Cholesteric liquid crystals (ChLC) Substances 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000005111 flow chemistry technique Methods 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000006552 photochemical reaction Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Liquid Crystal (AREA)
Abstract
The invention discloses a liquid crystal photomask and application thereof as well as a plate making device. The liquid crystal photomask comprises an imaging controller, a light-guiding layer, a first optical deflection piece, a liquid crystal layer and a second optical deflection piece, wherein the liquid crystal layer is arranged between the first optical deflection piece and the second optical deflection piece in a clamping manner; a first transparent electrode layer is arranged on the contact surface of the first optical deflection piece and the liquid crystal layer; a second transparent conductive layer is arranged on the contact surface of the second optical deflection piece and the liquid crystal layer; an included angle between the first optical deflection piece and the second optical deflection piece in the polarization direction is 90 degrees; the light-guiding layer is arranged on the incident side of the first optical deflection piece. The liquid crystal photomask provided by the invention can achieve multi-mask overprinting without replacing the mask, is high in accuracy, adjustable in precision and good in stability and can work for a long time, and is applied to plate making in place of a film.
Description
Technical field
The invention relates to a kind of photomask and relate to wide in range print field, particularly about a kind of liquid crystal photomask, its application and automatic platemaker.
Background technology
At wide in range print field, comprise that in the fields such as the forme printing, circuit printing, photoetching of common indication, photomask is a wherein important ring.Along with the development of the technology such as laser plate-making, electron-beam direct writing, the sight of research is transferred in the field of direct plate-making gradually, by contrast, the research that relies on mask to carry out Plate making printing or exposure image relatively lags behind, but, in the market share and widespread popularity, mask printing is still the most important thing of relevant industries, therefore, resolves the relevant difficult problem in tradition plate-making, be to crack industry decline, make every effort to the key of industrial upgrading.
In typography process, plate-making is consuming time the longest in whole process, and technique is the most complicated, the link that cost is the highest, and realizing accurately plate-making is the key of high quality printing; Manufacture in whole flow process at semiconductor, photomask is one of most important link realizing from domain to circuit board preparation process, is also the highest part of cost in whole flow process.Common photomask has four kinds, chromium plate, dry plate, relief printing plate and liquid relief printing plate.Photomask is mainly made up of two parts, transparent substrates and light-proof material.Existing mask plate, once prepare, its shading and transmission region are changeless, therefore, are only applicable to specific device to be exposed.According to the complexity difference of prepared device, conventionally need many cover photomasks to realize exposure process, greatly increase production cost; In addition,, in this process, the accurate alignment of realizing different photomasks is especially crucial, is usually directed to very complicated alignment process, has increased undoubtedly the difficulty of producing, and has reduced yield rate.
In recent years, transparent display technique, because of its this characteristic of transparent display board and unique application thereof, more and more receives people's concern.The core of transparent display technique is transparent display board, and transparent display board is a kind of transparent panel that can show image, the pixel cell in transparent display board in the time closing, a just clear glass seemingly of plate; In the time of its work, due to the deflection of liquid crystal, corresponding deflection region presents gray scale, thereby demonstrates corresponding pattern, and meanwhile, undeflected liquid crystal region still presents pellucidity.The preparation that this characteristic of transparent liquid crystal display board is photomask provides new direction.
As prior art:
1. Chinese patent application (application number 201220006968.1) discloses kind mask plate, comprise, pattern displaying screen, be used for presenting mask pattern, control module, for shielding according to pattern displaying described in the gray level information control of the required mask pattern of photoetching process, in the light transmission amount of zones of different, to present described mask pattern.Pattern displaying screen comprises: two transparency carriers, be separately positioned on the polaroid in described two transparency carriers outside, and multiple pixel cells between described two transparency carriers; Each pixel cell comprises liquid crystal, and drives the first electrode and second electrode of liquid crystal rotation.Do not executing under alive condition, utilizing the optical activity of liquid crystal, all transmissions of ultraviolet light, have formed the complete light-transparent pattern district of mask pattern.Apply under certain voltage condition to the first electrode and the second electrode, ultraviolet light can all be absorbed, form the light tight pattern area of mask pattern, further, if employing is GTG exposure technology, the region of exposing at needs half, can be according to the gray level information of mask pattern in the time that the first electrode and the second electrode two ends apply suitable voltage, a ultraviolet light part is absorbed, and another part sees through, thereby control the transit dose of ultraviolet light, formed the semi-transparent pattern area of mask pattern.
2. Chinese patent application (application number 200810247423.8) also discloses a kind of mask plate and manufacture method thereof, and this mask plate, comprising: upper substrate; The first electrically conducting transparent winding displacement, is positioned at described upper substrate and arranges towards first direction; The first transparent insulating film, is positioned at described the first electrically conducting transparent winding displacement top and covers described upper substrate; Infrabasal plate; The second electrically conducting transparent winding displacement, is positioned at described infrabasal plate and arranges towards second direction, and described second direction is perpendicular to described first direction; The second transparent insulating film, is positioned at described the second electrically conducting transparent winding displacement top and covers described infrabasal plate; Between described upper substrate and described infrabasal plate, accompany liquid crystal.Described upper substrate and described infrabasal plate are respectively equipped with alignment films, and the direction of orientation of two alignment films is mutually vertical, and described liquid crystal is the cholesteric liquid crystal that chirality agent and nematic liquid crystal mix.Chinese patent (application number 201020636483.1) also discloses a kind of mask plate, has similar structure.
3. Chinese patent application (application number 200820028195.0) discloses a kind of liquid crystal board and has realized the lithographic equipment of masking plate, utilize the carrier of active liquid crystal board as mask plate, save the manufacturing process of mask plate, and make the detection of himself surface cleanliness become very simple, once self surface speckles with dust or scratches and will be detected very easily, thereby termination photoetching process, while having solved conventional lithography, different graphic must be changed mask plate causes entire block quality problem with can't detect position.
Known according to above-mentioned prior art, adopt liquid crystal board to there is many advantages as mask plate, but, according to existing technology, be applied in actual production, often occur that precision and design accuracy deviation are larger, live width debug difficulties, gray scale is inaccurate, and easily temperature influence, processes the technical matterss such as creep for a long time.Need a kind of precision badly high, good stability, the transparent liquid crystal photomask conditioning oneself to long hours of work.
Summary of the invention
The object of this invention is to provide a kind of precision high, good stability, the transparent liquid crystal photomask conditioning oneself to long hours of work, realize the chromatography of many masks to realize without changing mask, precision is high, and precision is adjustable, can realize gray scale exposure, and gray scale is controlled, good stability, the transparent liquid crystal photomask that can work long hours, to solve the drawback of aforementioned prior art.
Concrete, the present invention is achieved through the following technical solutions:
First, the invention provides a kind of liquid crystal photomask, it is characterized in that, described photomask comprises, imaging controller, optical waveguide layer, the first deflection optical sheet, liquid crystal layer and the second deflection optical sheet; Described liquid crystal layer is located between the first deflection optical sheet and the second deflection optical sheet; On the surface that the first deflection optical sheet contacts with liquid crystal layer, be provided with the first transparent electrode layer; On the surface that the second deflection optical sheet contacts with liquid crystal layer, be provided with the second transparency conducting layer; The polarization direction angle of described the first deflection optical sheet and the second deflection optical sheet is 90 degree; Described optical waveguide layer is arranged at a side of the light incident of the first deflection optical sheet; Described imaging controller, for applying corresponding electric signal at the first transparent electrode layer and the second transparent electrode layer, deflects the liquid crystal of respective regions in described liquid crystal layer, forms described target image, covers exposure light source irradiation light; The region that liquid crystal deflection does not occur becomes light transmission state.。
Concrete, described optical waveguide layer is directional light by incident light through arranging, described directional light incident the first deflection optical sheet.
Optionally, for realizing the functional reliability of photomask, prevent that the photomask causing because of dust or scuffing from damaging, reduce production costs, optical waveguide layer is set to removable parts, so that the liquid crystal layer of first, second optical polarizer of core and institute's sandwiched thereof avoids changing, described optical waveguide layer and the first deflection optical sheet form physical contact, described physical contact relies on electrostatic force or gluing effect to realize, and realizes harmless contact, quick-replaceable.
Optionally, for realizing the stability working long hours of photomask, especially cause because exposing for a long time that liquid crystal layer intensification causes the variation of the helically twisted power of liquid crystal layer, between described optical waveguide layer and the first deflection optical sheet, form vacuum layer, for reducing the heat conduction of optical waveguide layer and the first deflection optical sheet, ensure that single pattern exposure is consistent with the precision of chromatography exposure.
Further, described liquid crystal layer is for being twisted nematic liquid crystal layer.
Concrete, described optical waveguide layer is Fresnel lens.
For the pollution that prevents from bringing in application process, cause stain, bad point and panel breakage etc., described photomask also comprises schmutzdecke, described schmutzdecke is arranged at the second deflection optical sheet light outgoing one side.
In addition, the present invention also provides a kind of application of above-mentioned liquid crystal photomask, it is characterized in that, described liquid crystal photomask replaces the film as photomask for plate making.
Finally, the invention provides a kind of automatic platemaker, it is characterized in that, described automatic platemaker comprises above-mentioned high-performance liquid crystal photomask, and described liquid crystal photomask replaces the film as photomask for plate making.
The present invention has obvious beneficial effect than prior art, is listed below:
(1) improve plate-making precision: the technological process of having saved sensitive film and preparation thereof comprises the loaded down with trivial details operation links such as darkroom exposure flushing, colour-separation drafting, printing down, the chemical reagent effectively having reduced in this process uses, reduce environmental pollution, be a kind of green plate-making technology; Reduced production cost, reduced image transfer number of times, improved picture quality, owing to not using film, the printing quality of printed matter has clear improvement, because image and site are not subject to tradition to print the impact of those mass attenuations in front technique.The forme of output, better quality, because the influence factor such as dust, scratch on the film does not exist, edge, site is totally sharp keen, loyal original copy.(2) alignment color correction is accurate, becomes version rate high.Reduce printing debug time and spillage of material.Owing to not needing forme location, the therefore better quality of forme, and can, because locating inaccurate need again plate-making, while avoiding being printed on the machine, not spend plenty of time school version.(3) applied widely, precision controllability is high.By regulating the size of minimum display unit of printing images imaging device, can realize the controlled selection of precision, be applicable to different printing demand, adjust the plate-making cycle, rationally enhance productivity.
Brief description of the drawings
Fig. 1 is the structural representation of the liquid crystal photomask of the embodiment of the present invention 1;
Fig. 2 is the first deflection optical sheet and the second deflection optical sheet polarization direction schematic diagram of the liquid crystal photomask of the embodiment of the present invention 1;
Fig. 3 is the structural representation of the liquid crystal photomask of the embodiment of the present invention 2;
Fig. 4 is the structural scheme of mechanism of the liquid crystal photomask of the embodiment of the present invention 3.
Embodiment
For making technical scheme of the present invention and technique effect thereof clearer, clear and definite, be further described below in conjunction with Fig. 1-4 pair specific embodiment of the invention.Should be appreciated that following embodiment, only in order to explain the present invention, is not intended to limit the present invention.
Embodiment 1
Referring to Fig. 1, this specific embodiment 1 provides a kind of liquid crystal photomask, it is characterized in that, described photomask comprises, imaging controller (not shown), optical waveguide layer 106, the first deflection optical sheets 101, liquid crystal layer 103 and the second deflection optical sheet 102; Described liquid crystal layer 102 is located between the first deflection optical sheet 101 and the second deflection optical sheet 102; Described liquid crystal layer 103 is twisted nematic liquid crystal layer.On the surface that the first deflection optical sheet 101 contacts with liquid crystal layer 103, be provided with the first transparent electrode layer 104; On the surface that the second deflection optical sheet 102 contacts with liquid crystal layer 103, be provided with the second transparency conducting layer 105.
Referring to Fig. 2, the polarization direction angle of the first deflection optical sheet 101 and the second deflection optical sheet 102 is 90 degree; Described optical waveguide layer 106 is arranged at a side of the light incident of the first deflection optical sheet 101.
Imaging controller, for applying corresponding electric signal at the first transparent electrode layer 104 and the second transparent electrode layer 105, deflects the liquid crystal of respective regions in described liquid crystal layer 103, forms described target image, covers exposure light source irradiation light; The region that liquid crystal deflection does not occur becomes light transmission state.
Optical waveguide layer 106 is directional light by incident light through arranging, described directional light incident the first deflection optical sheet 101, and described optical waveguide layer 106 can be Fresnel lens.For realizing the functional reliability of photomask, prevent that the photomask causing because of dust or scuffing from damaging, reduce production costs, optical waveguide layer is set to removable parts, so that the liquid crystal layer of first, second optical polarizer of core and institute's sandwiched thereof avoids changing, described optical waveguide layer 106 and the first deflection optical sheet 101 form physical contact, and described physical contact relies on electrostatic force or gluing effect to realize, realize harmless contact, quick-replaceable.
This liquid crystal photomask replaces the film as photomask for plate making, and specific works process brief description is as follows:
Exposure light source, liquid crystal photomask and forme are coaxially arranged, the plane at above-mentioned three part places is parallel to each other, start exposure light source, make after its steady operation a period of time, input imaging controller by external data, imaging controller applies corresponding electric signal at the first transparent electrode layer and the second transparent electrode layer, and the liquid crystal of respective regions in described liquid crystal layer is deflected, and forms described target image.Open the shutter of exposure light source, now, form the region of target image, the light that exposure light source irradiates is covered in the region that liquid crystal deflects, and the region one-tenth light transmission state of liquid crystal deflection does not occur.Light is covered and is radiated on forme through the part of liquid crystal photomask, thereby the photosensitive material generation photochemical reaction on the forme of illuminated part is solidified.According to the physical and chemical performance of photosensitive material, after exposure certain hour and intensity, form target forme finished product, send into follow-up flow processing.
Embodiment 2
Referring to Fig. 3, this specific embodiment 2 provides a kind of liquid crystal photomask, it is characterized in that, described photomask comprises, imaging controller, optical waveguide layer 206, the first deflection optical sheets 201, liquid crystal layer 203 and the second deflection optical sheet 202; Described liquid crystal layer 203 is located between the first deflection optical sheet 201 and the second deflection optical sheet 202; Described liquid crystal layer 203 is twisted nematic liquid crystal layer.On the surface that the first deflection optical sheet 201 contacts with liquid crystal layer 203, be provided with the first transparent electrode layer 204; On the surface that the second deflection optical sheet 202 contacts with liquid crystal layer 203, be provided with the second transparency conducting layer 205; The polarization direction angle of described the first deflection optical sheet 201 and the second deflection optical sheet 202 is 90 degree (with embodiment 1, no longer diagrams); Described optical waveguide layer 206 is arranged at a side of the light incident of the first deflection optical sheet 201; Described imaging controller, for applying corresponding electric signal at the first transparent electrode layer 204 and the second transparent electrode layer 205, deflects the liquid crystal of respective regions in described liquid crystal layer 203, forms described target image, covers exposure light source irradiation light; The region that liquid crystal deflection does not occur becomes light transmission state.Described optical waveguide layer 206 is directional light by incident light through arranging, described directional light incident the first deflection optical sheet 201, and described optical waveguide layer 206 is Fresnel lens.For realizing the functional reliability of photomask, prevent that the photomask causing because of dust or scuffing from damaging, reduce production costs, optical waveguide layer is set to removable parts, so that the liquid crystal layer of first, second optical polarizer of core and institute's sandwiched thereof avoids changing, described optical waveguide layer and the first deflection optical sheet form physical contact, and described physical contact relies on electrostatic force or gluing effect to realize, realize harmless contact, quick-replaceable.
As different from Example 1, in embodiment 2, be the stability working long hours that realizes photomask, especially cause because exposing for a long time that liquid crystal layer intensification causes the variation of the helically twisted power of liquid crystal layer, between described optical waveguide layer 206 and the first deflection optical sheet 201, form vacuum layer 207, for reducing the heat conduction of optical waveguide layer 206 and the first deflection optical sheet 201, ensure that single pattern exposure is consistent with the precision of chromatography exposure.
This liquid crystal photomask replaces the film as photomask for plate making, and specific works process is identical with embodiment 1.
Embodiment 3
Referring to Fig. 4, this specific embodiment 2 provides a kind of liquid crystal photomask, it is characterized in that, described photomask comprises, imaging controller, leaded light, 206, the first deflection optical sheets 301, liquid crystal layer 303 and the second deflection optical sheet 302; Described liquid crystal layer 303 is located between the first deflection optical sheet 301 and the second deflection optical sheet 302; Described liquid crystal layer 303 is twisted nematic liquid crystal layer.On the surface that the first deflection optical sheet 301 contacts with liquid crystal layer 303, be provided with the first transparent electrode layer 304; On the surface that the second deflection optical sheet 302 contacts with liquid crystal layer 303, be provided with the second transparency conducting layer 305; The polarization direction angle of described the first deflection optical sheet 301 and the second deflection optical sheet 302 is 90 degree; Described optical waveguide layer 306 is arranged at a side of the light incident of the first deflection optical sheet 301; Described imaging controller, for applying corresponding electric signal at the first transparent electrode layer 304 and the second transparent electrode layer 305, deflects the liquid crystal of respective regions in described liquid crystal layer 303, forms described target image, covers exposure light source irradiation light; The region that liquid crystal deflection does not occur becomes light transmission state.Described optical waveguide layer 306 is directional light by incident light through arranging, described directional light incident the first deflection optical sheet 301, and described optical waveguide layer 306 is Fresnel lens.For realizing the functional reliability of photomask, prevent that the photomask causing because of dust or scuffing from damaging, reduce production costs, optical waveguide layer is set to removable parts, so that the liquid crystal layer of first, second optical polarizer of core and institute's sandwiched thereof avoids changing, described optical waveguide layer and the first deflection optical sheet form physical contact, and described physical contact relies on electrostatic force or gluing effect to realize, realize harmless contact, quick-replaceable.For realizing the stability working long hours of photomask, especially cause because exposing for a long time that liquid crystal layer intensification causes the variation of the helically twisted power of liquid crystal layer, between described optical waveguide layer 306 and the first deflection optical sheet 301, form vacuum layer 307, for reducing the heat conduction of optical waveguide layer 306 and the first deflection optical sheet 301, ensure that single pattern exposure is consistent with the precision of chromatography exposure.
As different from Example 2, be the pollution that prevents from bringing in application process, cause stain, bad point and panel breakage etc., described photomask also comprises schmutzdecke 308, described schmutzdecke is arranged at the second deflection optical sheet light outgoing one side.
This liquid crystal photomask replaces the film as photomask for plate making, and specific works process is identical with embodiment 1.
The foregoing is only preferred embodiment of the present invention, all equalizations of doing according to the present patent application the scope of the claims change and modify, and all should belong to covering scope of the present invention.
Claims (10)
1. a liquid crystal photomask, is characterized in that, described photomask comprises: imaging controller, optical waveguide layer, the first deflection optical sheet, liquid crystal layer and the second deflection optical sheet; Described liquid crystal layer is located between the first deflection optical sheet and the second deflection optical sheet; On the surface that the first deflection optical sheet contacts with liquid crystal layer, be provided with the first transparent electrode layer; On the surface that the second deflection optical sheet contacts with liquid crystal layer, be provided with the second transparency conducting layer; The polarization direction angle of described the first deflection optical sheet and the second deflection optical sheet is 90 degree; Described optical waveguide layer is arranged at a side of the light incident of the first deflection optical sheet; Described imaging controller, for applying corresponding electric signal at the first transparent electrode layer and the second transparent electrode layer, deflects the liquid crystal of respective regions in described liquid crystal layer, forms described target image, covers exposure light source irradiation light; The region that liquid crystal deflection does not occur becomes light transmission state.
2. liquid crystal photomask according to claim 1, is characterized in that, described optical waveguide layer arranges incident light for directional light, described directional light incident the first deflection optical sheet.
3. according to the liquid crystal photomask described in claim 1-2, it is characterized in that, described optical waveguide layer and the first deflection optical sheet form physical contact.
4. according to the liquid crystal photomask described in claim 1-3, it is characterized in that, described physical contact relies on electrostatic force or gluing effect to realize.
5. according to the liquid crystal photomask described in claim 1-4, it is characterized in that, between described optical waveguide layer and the first deflection optical sheet, form vacuum layer, for reducing the heat conduction of optical waveguide layer and the first deflection optical sheet.
6. according to the liquid crystal photomask described in claim 1-5, it is characterized in that, described liquid crystal layer is twisted nematic liquid crystal layer.
7. according to the liquid crystal photomask described in claim 1-6, it is characterized in that, described optical waveguide layer is Fresnel lens.
8. according to the liquid crystal photomask described in claim 1-7, it is characterized in that, described photomask also comprises schmutzdecke, and described schmutzdecke is arranged at the second deflection optical sheet light outgoing one side.
9. according to the application of the liquid crystal photomask described in claim 1-8, it is characterized in that, described liquid crystal photomask replaces the film as photomask for plate making.
10. an automatic platemaker, is characterized in that, described automatic platemaker comprises the high-performance liquid crystal photomask described in claim 1-8, and described liquid crystal photomask replaces the film as photomask for plate making.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410197564.9A CN103955087B (en) | 2014-05-12 | 2014-05-12 | Liquid crystal photomask, application thereof and plate making device |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410197564.9A CN103955087B (en) | 2014-05-12 | 2014-05-12 | Liquid crystal photomask, application thereof and plate making device |
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| CN103955087A true CN103955087A (en) | 2014-07-30 |
| CN103955087B CN103955087B (en) | 2017-01-04 |
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| CN201410197564.9A Active CN103955087B (en) | 2014-05-12 | 2014-05-12 | Liquid crystal photomask, application thereof and plate making device |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108051982A (en) * | 2018-01-03 | 2018-05-18 | 京东方科技集团股份有限公司 | A kind of mask plate and preparation method thereof, photolithography method |
| CN109856919A (en) * | 2017-11-30 | 2019-06-07 | 上海微电子装备（集团）股份有限公司 | Diaphragm mask device, edge exposure camera lens and lithography system |
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| JP2007121344A (en) * | 2005-10-25 | 2007-05-17 | V Technology Co Ltd | Exposure apparatus |
| CN100999038A (en) * | 2006-12-22 | 2007-07-18 | 江苏大学 | Method and device of laser impact sheet metal mouldless shaping based on liquid crystal mask |
| CN101770091A (en) * | 2008-12-31 | 2010-07-07 | 北京京东方光电科技有限公司 | Mask plate and manufacturing method thereof |
| CN201867584U (en) * | 2010-11-26 | 2011-06-15 | 京东方科技集团股份有限公司 | Mask |
| CN103119481A (en) * | 2010-07-26 | 2013-05-22 | Lg化学株式会社 | Mask and optical filter manufacturing apparatus including same |
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- 2014-05-12 CN CN201410197564.9A patent/CN103955087B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007121344A (en) * | 2005-10-25 | 2007-05-17 | V Technology Co Ltd | Exposure apparatus |
| CN100999038A (en) * | 2006-12-22 | 2007-07-18 | 江苏大学 | Method and device of laser impact sheet metal mouldless shaping based on liquid crystal mask |
| CN101770091A (en) * | 2008-12-31 | 2010-07-07 | 北京京东方光电科技有限公司 | Mask plate and manufacturing method thereof |
| CN103119481A (en) * | 2010-07-26 | 2013-05-22 | Lg化学株式会社 | Mask and optical filter manufacturing apparatus including same |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN109856919A (en) * | 2017-11-30 | 2019-06-07 | 上海微电子装备（集团）股份有限公司 | Diaphragm mask device, edge exposure camera lens and lithography system |
| CN109856919B (en) * | 2017-11-30 | 2020-04-10 | 上海微电子装备（集团）股份有限公司 | Diaphragm blocking piece device, edge exposure lens and photoetching system |
| CN108051982A (en) * | 2018-01-03 | 2018-05-18 | 京东方科技集团股份有限公司 | A kind of mask plate and preparation method thereof, photolithography method |
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| Publication number | Publication date |
|---|---|
| CN103955087B (en) | 2017-01-04 |
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