CN202548530U - Mask plate and mask plate system - Google Patents
Mask plate and mask plate system Download PDFInfo
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- CN202548530U CN202548530U CN2012200069681U CN201220006968U CN202548530U CN 202548530 U CN202548530 U CN 202548530U CN 2012200069681 U CN2012200069681 U CN 2012200069681U CN 201220006968 U CN201220006968 U CN 201220006968U CN 202548530 U CN202548530 U CN 202548530U
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Abstract
The embodiment of the utility model provides a mask plate and a mask plate system and relates to the technical field of photolithography. According to the utility model, the mask plate can be modulated to present different patterns, thereby reducing the quantity of mask plates used in manufacture. The mask plate comprise a pattern display screen and a control unit, wherein the pattern display screen is used for presenting mask patterns; and the control unit is used for controlling the light transmission quantity in different areas of the pattern display screen according to gray scale information of the mask patterns needed in photolithographic process, so as to present the mask patterns. The mask plate and the mask plate system provided by the embodiment of the utility model can be applied to the production of liquid crystal displays.
Description
Technical field
The utility model relates to technical field of lithography, relates in particular to a kind of mask plate and mask plate system.
Background technology
At present, in TFT-LCD (Thin Film Transistor-Liquid Crystal Display, Thin Film Transistor-LCD), display panels is formed box by color membrane substrates and array base palte.In the process of making color membrane substrates and array base palte, need carry out repeatedly photoetching process with the cambium layer structure, and need the how many times photoetching process what generally just need open the mask plate of different pattern in making.
But costing an arm and a leg of these mask plates if any mistake takes place in processes such as design, transportation, will make mask plate to use, and brings very big loss also to bring a lot of inconvenience to the producer to manufacturing enterprise like this.Need the field of photoetching at other, also have identical problem.
The utility model content
The embodiment of the utility model provides a kind of mask plate and mask plate system, but with so that a mask plate modulation presents different pattern, thereby reduce the quantity of using mask plate in the mill.
For achieving the above object, the embodiment of the utility model adopts following technical scheme:
On the one hand, a kind of mask plate is provided, comprises:
The pattern displaying screen is used to appear mask pattern;
Control module is used for controlling the light transmission amount of said pattern displaying screen in zones of different according to the gray level information of the required mask pattern of photoetching process, to present said mask pattern.
On the one hand, a kind of mask plate system is provided, comprises exposure machine, mask plate; Wherein, said mask plate is above-mentioned mask plate, and said exposure machine provides ultraviolet light.
The utility model embodiment provides a kind of mask plate, mask plate system and masking method; Control the light transmission amount of pattern display screen through control module according to the gray level information of mask pattern required in the photoetching process in zones of different; Thereby present required mask pattern at the pattern displaying screen; In the overall optical carving technology; Mask plate among the utility model embodiment can present different mask patterns; With respect to the mask plate that need use many different patterns in the prior art at the overall optical carving technology, the mask plate that provides among the utility model embodiment has reduced the quantity of using mask plate in the manufacture process, has avoided using the inconvenience and the loss that bring in many mask plate processes.
Description of drawings
In order to be illustrated more clearly in the utility model embodiment or technical scheme of the prior art; To do to introduce simply to the accompanying drawing of required use in embodiment or the description of the Prior Art below; Obviously, the accompanying drawing in describing below only is some embodiment of the utility model, for those of ordinary skills; Under the prerequisite of not paying creative work, can also obtain other accompanying drawing according to these accompanying drawings.
The synoptic diagram of a kind of mask plate that Fig. 1 (a) provides for the utility model embodiment;
The synoptic diagram of a kind of mask plate that Fig. 1 (b) provides for the utility model embodiment;
The synoptic diagram of the another kind of mask plate that Fig. 2 (a) provides for the utility model embodiment;
The synoptic diagram of the another kind of mask plate that Fig. 2 (b) provides for the utility model embodiment;
The synoptic diagram of another mask plate that Fig. 3 (a) provides for the utility model embodiment;
The synoptic diagram of another mask plate that Fig. 3 (b) provides for the utility model embodiment;
The synoptic diagram of another mask plate that Fig. 4 (a) provides for the utility model embodiment;
The synoptic diagram of another mask plate that Fig. 4 (b) provides for the utility model embodiment.
Embodiment
To combine the accompanying drawing among the utility model embodiment below, the technical scheme among the utility model embodiment is carried out clear, intactly description, obviously, described embodiment only is the utility model part embodiment, rather than whole embodiment.Based on the embodiment in the utility model, those of ordinary skills are not making the every other embodiment that is obtained under the creative work prerequisite, all belong to the scope of the utility model protection.
The utility model embodiment provides a kind of mask plate, comprising:
The pattern displaying screen is used to appear mask pattern;
Control module is used for controlling the light transmission amount of said pattern displaying screen in zones of different according to the gray level information of the required mask pattern of photoetching process, to present said mask pattern.
In the utility model was implemented, this control module was electrically connected with the pattern displaying screen, so that the pattern displaying screen receives the pairing electric signal of different gray level information of control module output, thereby presented required mask pattern; In addition, control module is not limited to the position of its setting, for example, can be arranged on the periphery of pattern displaying screen, and is concrete, and control module can be for being arranged on the peripheral control circuit of pattern displaying screen.
Further, above-mentioned mask plate also comprises: storage unit, the gray level information that is used for storing the required mask pattern of photoetching process.
Wherein, gray level information comprises the GTG value of required mask pattern each several part.For the mask pattern of the employed mask plate of common masking process; Can be divided into light tight pattern area and complete printing opacity pattern area; Can be 0 (promptly complete black) in the GTG value of light tight pattern area for example, can be 255 (promptly entirely in vain) in the GTG value of printing opacity pattern area fully; For the mask pattern of the employed mask plate of gray level mask technology, also further comprise: semi-transparent pattern area, the GTG value of semi-transparent pattern can be the value between 0～255 as required.
In addition; Storage unit is not limited to the position of its setting; For example, this storage unit is arranged in the computer, can be a kind of GDS (Graphic Data System; Graphic data system) design document, and from this storage unit, read the relevant information of each pattern through operating system and corresponding software.
Below, introduced the structure of above-mentioned mask plate in detail to Fig. 4 (b) with reference to Fig. 1 (a).Need to prove that above-mentioned mask plate all comprises pattern displaying screen and control module, can further include storage unit certainly; But because the important difference of all mask plates is the difference of pattern displaying screen, and control module and storage unit can be identical, so in institute's drawings attached, all do not draw control module and storage unit.
Preferably, pattern displaying in above-mentioned mask plate screen comprises: two transparency carriers are separately positioned on the polaroid in said two transparency carriers outside and a plurality of pixel cells between said two transparency carriers; Each pixel cell comprises liquid crystal, and first electrode and second electrode that drive the liquid crystal rotation.
For example; Mask plate 10 shown in Fig. 1 (a) and Fig. 1 (b); The pattern displaying screen of this mask plate 10 comprises: transparency carrier 101, transparency carrier 102; Be separately positioned on the polaroid 103,104 in transparency carrier 101,102 outsides, and a plurality of pixel cells between transparency carrier 101 and the transparency carrier 102.Need to prove; The display panels display structure is similar in pattern displaying screen in the present embodiment and the prior art; Concrete; The structure of transparency carrier 102 can be identical with the array base palte of display panels in the prior art, do not have color film in the transparency carrier 101 that the difference of display panels is to adopt among the utility model embodiment in transparency carrier 101 and the prior art and color membrane substrates of the prior art comprises color film.
Need to prove; With reference to figure 1 (a), Fig. 1 (b), Fig. 2 (a), Fig. 2 (b), Fig. 3 (a), Fig. 3 (b); The mask plate 10,20,30 that the utility model provides drives the mode of liquid crystal rotation; The voltage that is specially in the control module control pattern display screen 10 first electrode and second electrode in the pixel cell is to drive the mode that liquid crystal rotates in this pixel cell; The liquid crystal rotation mode is identical with driving in the display panels in the prior art, so the type of the mask plate among the utility model embodiment also can be divided into TN (Twisted Nematic, twisted-nematic) type, VA (Vertical Aligment according to the mode that drives the liquid crystal rotation; Homeotropic alignment) type, FFS (Fringe-Field switching, fringe field drives) type etc.In addition, can be divided into normal black pattern and normal white mode with reference to the mode of display panels display pattern in the prior art, the mask plate among the utility model embodiment also can be divided into normal black pattern and normal white mode.
Mask plate with normal white mode is an example, in the complete exposed areas of needs, shown in Fig. 1 (a), under the condition that does not apply voltage; Utilize the optical activity of liquid crystal, all transmissions of ultraviolet light have formed the complete printing opacity pattern area of mask pattern; Shown in Fig. 1 (b), apply under the certain voltage condition for first electrode and second electrode, ultraviolet light can be by whole absorptions; Formed the light tight pattern area of mask pattern, further, if employing is the GTG exposure technology; Then in needs half exposed areas, can be when first electrode and the second electrode two ends apply suitable voltage according to the gray level information of mask pattern, a ultraviolet light part is absorbed; Another part sees through, thereby controls the transit dose of ultraviolet light, has formed the semi-transparent pattern area of mask pattern.
Like this, under said structure and function that pattern displaying screen 10 has, controlled the light transmission amount of mask pattern zones of different according to the gray level information of mask pattern, thereby made pattern displaying screen 10 present required mask pattern through control module.
Preferred again, this pattern displaying screen comprises: two transparency carriers, be arranged on one of them the transparency carrier outside or inboard polaroid, and a plurality of pixel cells between said two transparency carriers; Each pixel cell comprises liquid crystal, and two looks are to dyestuff, and first electrode and second electrode that drive the liquid crystal rotation; Wherein, the polarization direction of said polaroid and said two looks to dyestuff the linearly polarized light component direction that can absorb consistent.
For example; Mask plate 20 shown in Fig. 2 (a) and Fig. 2 (b), the pattern displaying screen of this mask plate 20 comprises: transparency carrier 201, transparency carrier 202; Be arranged on the polaroid 203 in transparency carrier 202 outsides, and a plurality of pixel cells between transparency carrier 201 and the transparency carrier 202.Need to prove that the polaroid 203 among Fig. 2 (a) and Fig. 2 (b) is not limited to the position shown in the figure, also can be positioned at transparency carrier 202 inboards, also or the inboard of transparency carrier 201 or the outside; Need to prove; The display panels display structure is similar in pattern displaying screen in the present embodiment and the prior art; Concrete; The structure of transparency carrier 202 can be identical with the array base palte of display panels in the prior art, do not have color film in the transparency carrier 201 that the difference of display panels is to adopt among the utility model embodiment in transparency carrier 201 and the prior art and color membrane substrates of the prior art comprises color film.
Shown in Fig. 2 (a) and Fig. 2 (b), each pixel cell comprises liquid crystal 204, two looks to dyestuff 205, and first electrode and second electrode that drive the liquid crystal rotation; Wherein, the polarization direction of said polaroid 203 and said two looks to dyestuff the linearly polarized light component direction that can absorb consistent.
Wherein, two looks are dispersed between the liquid crystal 204 to dyestuff 205, and this two look determined it to absorb better to a kind of component in two orhtogonal linear polarizaiton light components of ultraviolet light to the characteristic of dyestuff 205, and another kind absorbs relatively poorly.
Concrete, ultraviolet light is divided into the linearly polarized light component of two quadratures: component M, with component N, be example with TN type mask plate; Do not needing exposed areas; Like Fig. 2 (a), when liquid crystal 204 was orientated with respect to base plan abreast, component M was absorbed to dyestuff by two looks; Because of the polarization direction of polaroid 203 with two looks consistent to the linearly polarized light component direction that 205 of dyestuffs can absorb; Make component N can't pass through polaroid 203, it is better that pattern displaying screen 20 absorbs incident light ultraviolet light effect like this, thereby formed the light tight pattern area of mask pattern; In the needs exposed areas, shown in Fig. 2 (b), when liquid crystal 204 vertically is orientated with respect to base plan; To dyestuff, ultraviolet light was at when the polaroid 203 o'clock through two looks for component M, and its component N is absorbed by polaroid 203; Component M also just makes branch's light arrive the photoresist zone and makes public, further through polaroid 203; If what adopt is the GTG exposure technology; Then, can apply suitable voltage to first electrode and second electrode in the pattern displaying screen 20, form the semi-transparent pattern area in the mask pattern according to the gray level information of mask pattern in needs half exposed areas; Thereby controlled the light transmission amount of mask pattern zones of different, presented required mask pattern.
Preferred again, the pattern displaying screen comprises: two transparency carriers, be arranged on one of them the transparency carrier outside or inboard right-hand circular polarization sheet, and a plurality of pixel cells between said two transparency carriers; Each pixel cell comprises liquid crystal, and first electrode and second electrode that drive the liquid crystal rotation;
For example; Mask plate 30 shown in Fig. 3 (a) and Fig. 3 (b); The pattern displaying of this mask plate 30 screen comprises: transparency carrier 301, transparency carrier 302, be arranged on the inboard right-hand circular polarization sheet 303 of transparency carrier 302, and a plurality of pixel cells between transparency carrier 301 and the transparency carrier 302.Need to prove that the polaroid 303 among Fig. 3 (a) and Fig. 3 (b) is not limited to the position shown in the figure, also can be positioned at transparency carrier 302 outsides, also or the inboard of transparency carrier 301 or the outside; Need to prove; The display panels display structure is similar in pattern displaying screen in the present embodiment and the prior art; Concrete; The structure of transparency carrier 302 can be identical with the array base palte of display panels in the prior art, do not have color film in the transparency carrier 301 that the difference of display panels is to adopt among the utility model embodiment in transparency carrier 301 and the prior art and color membrane substrates of the prior art comprises color film.
Wherein, said liquid crystal is a cholesteric liquid crystal 310.This cholesteric liquid crystal 310 has the dextrorotation structure, is example with TN type mask plate, is not needing exposed areas; Shown in Fig. 3 (a), when cholesteric liquid crystal 310 is orientated with respect to base plan abreast, the right-circularly polarized light 305 in the light reflection ultraviolet 304; Left circularly polarized light 306 can pass through cholesteric liquid crystal, behind right-hand circular polarization sheet 303 on the card, left circularly polarized light 306 is absorbed; Thereby prevented light leakage phenomena effectively, formed the light tight pattern area of mask pattern.
In the needs exposed areas, shown in Fig. 3 (b), when cholesteric liquid crystal 310 vertically is orientated with respect to base plan; Ultraviolet light 304 is not absorbed by this cholesteric liquid crystal, and when through right-hand circular polarization sheet 303, left circularly polarized light 306 is absorbed; Right-circularly polarized light 305 sees through, further, if adopt the GTG exposure technology; Then in needs half exposed areas; Gray level information according to mask pattern applies suitable voltage to first electrode and second electrode in the pattern displaying screen 30, thereby has controlled the light transmission amount of mask pattern zones of different, has formed the semi-transparent pattern area in the mask pattern; Thereby controlled the light transmission amount of mask pattern zones of different, made pattern displaying screen 30 present required mask pattern.
Preferred again, the pattern displaying screen comprises: two transparency carriers, and a plurality of pixel cells between said two transparency carriers;
Each pixel cell comprises a closed chamber; Be respectively arranged with top electrode, bottom electrode on the upper and lower surfaces of said closed chamber; Be respectively arranged with left electrode, right electrode on two faces about said closed chamber, above-mentioned four electrodes do not have electrical connection between any two and are transparency electrode; Said closed chamber is full of and contains black and the electrochromism particle of transparent demonstration conversion or the clear, colorless solvent of electrophoresis particle.
For example, the mask plate 40 shown in Fig. 4 (a) and Fig. 4 (b), the pattern displaying of this mask plate 40 screen comprises: transparency carrier 401, transparency electrode 402, and a plurality of pixel cells between the transparency carrier 401, transparency electrode 402;
Each pixel cell comprises a closed chamber; Be respectively arranged with top electrode 403, bottom electrode 404 on the upper and lower surfaces of said closed chamber; Be respectively arranged with left electrode 405, right electrode 406 about said closed chamber on two faces, above-mentioned four electrodes do not have between any two and are electrically connected and are transparency electrode; Said closed chamber is full of and contains black and the electrochromism particle of transparent demonstration conversion or the clear, colorless solvent of electrophoresis particle 400.
In this pattern displaying screen 40, because of top electrode 403, bottom electrode 404, left electrode 405,406 4 electrodes of right electrode do not have electrical connection between any two, between any two insulation course 410 can be set, each closed chamber outer wall is provided with divider wall 411.
Shown in Fig. 4 (a); When to top electrode 403, when bottom electrode 404 applies voltage, electrochromism particle or electrophoresis particle 400 move to closed chamber above, thereby shown black pattern; See through thereby blocked ultraviolet light, formed the light tight pattern area of mask pattern.Under this situation, because the bistable effect of electrochromism particle or electrophoresis particle can be removed top electrode 403, bottom electrode 404 voltage.
On the other hand, like Fig. 4 (b), to left electrode 405, when right electrode 406 applies voltage; Electrochromism particle or electrophoresis particle 400 move to the sidewall of closed chamber, thereby make ultraviolet light all see through, and have formed the complete printing opacity pattern area of mask pattern; Further, according to the gray level information of mask pattern, between a plurality of pixel cells between transparency carrier 401, the transparency electrode 402; When left electrode 405 and/or right electrode 406 and/or top electrode 403 and/or bottom electrode 404 are applied suitable voltage; Make electrochromism particle or electrophoresis particle 400 position, arrangement mode etc. in closed chamber, for example, the control through voltage makes electrochromism particle or electrophoresis particle 400 be suspended in the cavity; Thereby make and have only part light to see through, also just formed the semi-transparent pattern area in the mask pattern.
The utility model embodiment also provides a kind of mask plate system, comprises exposure machine, mask plate; Wherein, said mask plate is above-mentioned mask plate, and said exposure machine provides ultraviolet light.
The utility model embodiment also provides a kind of masking method, comprising:
Control module is controlled the light transmission amount of pattern display screen in zones of different according to the gray level information of mask pattern required in the photoetching process;
The pattern displaying screen demonstrates said mask pattern;
The light transmission that exposure machine sends has presented the pattern displaying screen of mask pattern, realizes treating the mask exposure of exposure base.
The utility model embodiment provides a kind of mask plate, mask plate system and masking method; Control the light transmission amount of pattern display screen through control module according to the gray level information of mask pattern required in the photoetching process in zones of different; Thereby present said required mask pattern at the pattern displaying screen; Then in the overall optical carving technology; Mask plate among the utility model embodiment can present different mask patterns; With respect to the mask plate that in the overall optical carving technology, needs to use many different patterns in the prior art, the mask plate that provides among the utility model embodiment has reduced the quantity of using mask plate in the manufacture process, has avoided using the inconvenience and the loss that bring in many mask plate processes.
One of ordinary skill in the art will appreciate that: all or part of step that realizes said method embodiment can be accomplished through the relevant hardware of programmed instruction; Aforesaid program can be stored in the computer read/write memory medium; This program the step that comprises said method embodiment when carrying out; And aforesaid storage medium comprises: various media that can be program code stored such as ROM, RAM, magnetic disc or CD.
The above; Be merely the embodiment of the utility model; But the protection domain of the utility model is not limited thereto; Any technician who is familiar with the present technique field can expect changing or replacement in the technical scope that the utility model discloses easily, all should be encompassed within the protection domain of the utility model.Therefore, the protection domain of the utility model should be as the criterion with the protection domain of said claim.
Claims (7)
1. a mask plate is characterized in that, comprising:
The pattern displaying screen is used to appear mask pattern;
Control module is used for controlling the light transmission amount of said pattern displaying screen in zones of different according to the gray level information of the required mask pattern of photoetching process, to present said mask pattern.
2. mask plate according to claim 1 is characterized in that, also comprises: storage unit, the gray level information that is used for storing the required mask pattern of photoetching process.
3. mask plate according to claim 1 and 2 is characterized in that, said pattern displaying screen comprises: two transparency carriers are separately positioned on the polaroid in said two transparency carriers outside and a plurality of pixel cells between said two transparency carriers;
Each pixel cell comprises liquid crystal, and first electrode and second electrode that drive the liquid crystal rotation.
4. mask plate according to claim 1 and 2 is characterized in that, said pattern displaying screen comprises: two transparency carriers, be arranged on one of them the transparency carrier outside or inboard polaroid, and a plurality of pixel cells between said two transparency carriers;
Each pixel cell comprises liquid crystal, and two looks are to dyestuff, and first electrode and second electrode that drive the liquid crystal rotation;
Wherein, the polarization direction of said polaroid and said two looks to dyestuff the linearly polarized light component direction that can absorb consistent.
5. mask plate according to claim 1 and 2; It is characterized in that; Said pattern displaying screen comprises: two transparency carriers, be arranged on one of them the transparency carrier outside or inboard right-hand circular polarization sheet, and a plurality of pixel cells between said two transparency carriers;
Each pixel cell comprises liquid crystal, and first electrode and second electrode that drive the liquid crystal rotation;
Wherein, said liquid crystal is a cholesteric liquid crystal.
6. mask plate according to claim 1 and 2 is characterized in that, said pattern displaying screen comprises: two transparency carriers, and a plurality of pixel cells between said two transparency carriers;
Each pixel cell comprises a closed chamber; Be respectively arranged with top electrode, bottom electrode on the upper and lower surfaces of said closed chamber; Be respectively arranged with left electrode, right electrode on two faces about said closed chamber, above-mentioned four electrodes do not have electrical connection between any two and are transparency electrode; Said closed chamber is full of and contains black and the electrochromism particle of transparent demonstration conversion or the clear, colorless solvent of electrophoresis particle.
7. a mask plate system is characterized in that, comprises exposure machine, mask plate; Wherein, said mask plate is the described mask plate of each claim of claim 1～6, and said exposure machine provides ultraviolet light.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012200069681U CN202548530U (en) | 2012-01-09 | 2012-01-09 | Mask plate and mask plate system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012200069681U CN202548530U (en) | 2012-01-09 | 2012-01-09 | Mask plate and mask plate system |
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| Publication Number | Publication Date |
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| CN202548530U true CN202548530U (en) | 2012-11-21 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN2012200069681U Expired - Fee Related CN202548530U (en) | 2012-01-09 | 2012-01-09 | Mask plate and mask plate system |
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| CN (1) | CN202548530U (en) |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103091906A (en) * | 2013-01-30 | 2013-05-08 | 北京京东方光电科技有限公司 | Mask |
| CN103235451A (en) * | 2013-04-23 | 2013-08-07 | 北京京东方光电科技有限公司 | Mask and production method thereof |
| CN105116682A (en) * | 2015-09-30 | 2015-12-02 | 京东方科技集团股份有限公司 | Mask plate and preparation method thereof |
| CN105182628A (en) * | 2015-10-26 | 2015-12-23 | 京东方科技集团股份有限公司 | Mask plate and composition process system and method |
| CN105892111A (en) * | 2016-06-14 | 2016-08-24 | 深圳市华星光电技术有限公司 | Photomask equipment and method of manufacturing photocured product |
| WO2016161707A1 (en) * | 2015-04-10 | 2016-10-13 | 深圳市华星光电技术有限公司 | Gray tone mask and manufacturing method therefor |
| CN106597815A (en) * | 2017-01-20 | 2017-04-26 | 京东方科技集团股份有限公司 | Illumination intensity regulation device, system and method |
| CN106647090A (en) * | 2017-03-10 | 2017-05-10 | 合肥鑫晟光电科技有限公司 | Mask plate and manufacturing method thereof, as well as shading device and control method thereof |
| CN107976873A (en) * | 2018-01-02 | 2018-05-01 | 京东方科技集团股份有限公司 | Mask plate and exposure method |
| CN109031882A (en) * | 2018-09-20 | 2018-12-18 | 京东方科技集团股份有限公司 | Mask set and mask control method |
| CN111929993A (en) * | 2020-08-20 | 2020-11-13 | 深圳市爱普拓思科技有限公司 | Exposure device |
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2012
- 2012-01-09 CN CN2012200069681U patent/CN202548530U/en not_active Expired - Fee Related
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103091906B (en) * | 2013-01-30 | 2016-12-28 | 北京京东方光电科技有限公司 | A kind of mask plate |
| CN103091906A (en) * | 2013-01-30 | 2013-05-08 | 北京京东方光电科技有限公司 | Mask |
| CN103235451A (en) * | 2013-04-23 | 2013-08-07 | 北京京东方光电科技有限公司 | Mask and production method thereof |
| WO2014172989A1 (en) * | 2013-04-23 | 2014-10-30 | 北京京东方光电科技有限公司 | Mask and manufacturing method therefor |
| WO2016161707A1 (en) * | 2015-04-10 | 2016-10-13 | 深圳市华星光电技术有限公司 | Gray tone mask and manufacturing method therefor |
| CN105116682A (en) * | 2015-09-30 | 2015-12-02 | 京东方科技集团股份有限公司 | Mask plate and preparation method thereof |
| CN105182628A (en) * | 2015-10-26 | 2015-12-23 | 京东方科技集团股份有限公司 | Mask plate and composition process system and method |
| WO2017071354A1 (en) * | 2015-10-26 | 2017-05-04 | 京东方科技集团股份有限公司 | Mask plate, exposure system and exposure method |
| US10620541B2 (en) | 2015-10-26 | 2020-04-14 | Boe Technology Group Co., Ltd. | Mask plate, exposure system and exposure method |
| US20170285480A1 (en) * | 2015-10-26 | 2017-10-05 | Boe Technology Group Co., Ltd. | Mask plate, exposure system and exposure method |
| CN105892111B (en) * | 2016-06-14 | 2019-05-07 | 深圳市华星光电技术有限公司 | Light shield equipment and the method for making photocuring product |
| CN105892111A (en) * | 2016-06-14 | 2016-08-24 | 深圳市华星光电技术有限公司 | Photomask equipment and method of manufacturing photocured product |
| CN106597815A (en) * | 2017-01-20 | 2017-04-26 | 京东方科技集团股份有限公司 | Illumination intensity regulation device, system and method |
| CN106647090A (en) * | 2017-03-10 | 2017-05-10 | 合肥鑫晟光电科技有限公司 | Mask plate and manufacturing method thereof, as well as shading device and control method thereof |
| CN107976873A (en) * | 2018-01-02 | 2018-05-01 | 京东方科技集团股份有限公司 | Mask plate and exposure method |
| CN109031882A (en) * | 2018-09-20 | 2018-12-18 | 京东方科技集团股份有限公司 | Mask set and mask control method |
| CN111929993A (en) * | 2020-08-20 | 2020-11-13 | 深圳市爱普拓思科技有限公司 | Exposure device |
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