WO2014171678A9 - Photocurable coating composition, coating film using same and polarizing plate - Google Patents

Photocurable coating composition, coating film using same and polarizing plate Download PDF

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Publication number
WO2014171678A9
WO2014171678A9 PCT/KR2014/003180 KR2014003180W WO2014171678A9 WO 2014171678 A9 WO2014171678 A9 WO 2014171678A9 KR 2014003180 W KR2014003180 W KR 2014003180W WO 2014171678 A9 WO2014171678 A9 WO 2014171678A9
Authority
WO
WIPO (PCT)
Prior art keywords
polarizing plate
coating film
same
coating composition
photocurable
Prior art date
Application number
PCT/KR2014/003180
Other languages
French (fr)
Korean (ko)
Other versions
WO2014171678A1 (en
Inventor
정병선
이두봉
임거산
Original Assignee
동우 화인켐 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 동우 화인켐 주식회사 filed Critical 동우 화인켐 주식회사
Priority to JP2016508860A priority Critical patent/JP6348972B2/en
Priority to CN201480022058.4A priority patent/CN105121565B/en
Publication of WO2014171678A1 publication Critical patent/WO2014171678A1/en
Publication of WO2014171678A9 publication Critical patent/WO2014171678A9/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C08F220/343—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate in the form of urethane links
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/104—Esters of polyhydric alcohols or polyhydric phenols of tetraalcohols, e.g. pentaerythritol tetra(meth)acrylate

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Paints Or Removers (AREA)
  • Laminated Bodies (AREA)
  • Polarising Elements (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

The present invention provides a photocurable coating composition having a storage elastic modulus (G') of 4.0E+07 to 7.0E+07 Pa, a coating film formed using same, a polarizing plate having the coating film and a display device. The coating film formed using the photocurable coating composition according to the invention can be effectively used as a protective film of the polarizing plate, etc. due to having excellent optical and mechanical physical properties, and thus having an excellent crack resistance property.
PCT/KR2014/003180 2013-04-15 2014-04-14 Photocurable coating composition, coating film using same and polarizing plate WO2014171678A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2016508860A JP6348972B2 (en) 2013-04-15 2014-04-14 Photo-curing coating composition, coating film and polarizing plate using the same
CN201480022058.4A CN105121565B (en) 2013-04-15 2014-04-14 Photo-curable application composition, coat film and polarizing plate using the photo-curable application composition

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020130041047A KR20140123779A (en) 2013-04-15 2013-04-15 Photocurable Coating Composition, Coating Film and Polarizing Plate Using the Same
KR10-2013-0041047 2013-04-15

Publications (2)

Publication Number Publication Date
WO2014171678A1 WO2014171678A1 (en) 2014-10-23
WO2014171678A9 true WO2014171678A9 (en) 2014-12-11

Family

ID=51731564

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2014/003180 WO2014171678A1 (en) 2013-04-15 2014-04-14 Photocurable coating composition, coating film using same and polarizing plate

Country Status (5)

Country Link
JP (1) JP6348972B2 (en)
KR (1) KR20140123779A (en)
CN (1) CN105121565B (en)
TW (1) TWI627238B (en)
WO (1) WO2014171678A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10465029B2 (en) * 2018-02-02 2019-11-05 Pacific Light & Hologram, Inc. Photosensitive resin and manufacturing method thereof
CN109575764B (en) * 2018-11-09 2021-08-17 宁波激智科技股份有限公司 Coating composition for diffusion brightening composite film laminating layer, diffusion brightening composite film and preparation method thereof

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4100529B2 (en) * 1998-12-05 2008-06-11 大日本印刷株式会社 Liquid crystal display device and manufacturing method thereof
JP2000239333A (en) * 1998-12-21 2000-09-05 Jsr Corp Photo-curable resin composition and optical substance
EP1014113A3 (en) * 1998-12-21 2001-05-09 Dsm N.V. Photo curable resin composition and optical parts
WO2000078887A1 (en) * 1999-06-18 2000-12-28 Hitachi Chemical Company, Ltd. Adhesive, adhesive member, circuit substrate for semiconductor mounting having adhesive member, and semiconductor device containing the same
JP4429862B2 (en) * 2004-10-06 2010-03-10 日東電工株式会社 Hard coat film, antireflection hard coat film, optical element and image display device
JP5359137B2 (en) * 2007-09-12 2013-12-04 大日本印刷株式会社 OPTICAL LAMINATE, ITS MANUFACTURING METHOD, POLARIZING PLATE, AND IMAGE DISPLAY DEVICE
JP2009104002A (en) * 2007-10-24 2009-05-14 Three M Innovative Properties Co Protective film for image display device, and image display device including the same
JP5716881B2 (en) * 2008-10-04 2015-05-13 スリーボンドファインケミカル株式会社 Photocurable adhesive composition
US8697240B2 (en) * 2009-07-22 2014-04-15 Hitachi Chemical Company, Ltd. Photocurable resin composition and cured product of same, resin sheet and production method for same, and display device
JP2011162640A (en) * 2010-02-09 2011-08-25 Shin Etsu Polymer Co Ltd Photocurable resin composition and switch member containing cured product thereof
US9405049B2 (en) * 2010-02-26 2016-08-02 Lg Chem, Ltd. Polarizing plate and liquid crystal display comprising the same
JP2011192342A (en) * 2010-03-12 2011-09-29 Nippon Shokubai Co Ltd Optical recording medium
JP2011210335A (en) * 2010-03-30 2011-10-20 Nippon Shokubai Co Ltd Photopolymerized resin composition for optical recording medium, cured material, and optical recoding medium
JP2012131900A (en) * 2010-12-21 2012-07-12 Sumitomo Bakelite Co Ltd Cured product of ultraviolet-curable resin composition, resin laminate and ultraviolet-curable resin composition
WO2012086551A1 (en) * 2010-12-24 2012-06-28 大日本印刷株式会社 Hard coat film, polarizing plate and image display device
JP2012141459A (en) * 2010-12-28 2012-07-26 Fujifilm Corp Composition for forming hard coat layer, optical film, method for manufacturing optical film, polarizing plate, and image display device
JP2012252748A (en) * 2011-06-03 2012-12-20 Mitsubishi Rayon Co Ltd Active energy ray curable resin composition for optical recording medium and optical recording medium

Also Published As

Publication number Publication date
JP6348972B2 (en) 2018-06-27
TW201500487A (en) 2015-01-01
CN105121565A (en) 2015-12-02
WO2014171678A1 (en) 2014-10-23
KR20140123779A (en) 2014-10-23
JP2016522277A (en) 2016-07-28
TWI627238B (en) 2018-06-21
CN105121565B (en) 2018-01-02

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